WO2020125468A1 - 腔室进气结构以及反应腔室 - Google Patents
腔室进气结构以及反应腔室 Download PDFInfo
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- WO2020125468A1 WO2020125468A1 PCT/CN2019/123984 CN2019123984W WO2020125468A1 WO 2020125468 A1 WO2020125468 A1 WO 2020125468A1 CN 2019123984 W CN2019123984 W CN 2019123984W WO 2020125468 A1 WO2020125468 A1 WO 2020125468A1
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- chamber
- uniform flow
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- air
- plate body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
Definitions
- the invention relates to the technical field of semiconductor manufacturing, in particular to a chamber air intake structure and a reaction chamber.
- silicon-based materials such as silicon or polysilicon.
- the surface of the silicon (or polysilicon) placed in the air will naturally oxidize a dense SiO 2 layer.
- the film should be in direct contact with the silicon substrate. If there is a layer of SiO 2 on the surface of the substrate, the resistivity of the film will increase, which will affect the device performance. For this reason, this layer of SiO 2 needs to be removed before the subsequent process.
- embodiments of the present invention provide a chamber air intake structure and a reaction chamber.
- a chamber air intake structure including a jet disk assembly, the jet disk assembly including a jet surface; and, the jet disk assembly is provided with a first central channel and a A second central channel, a first uniform channel and a second uniform channel isolated from each other, and a first uniform channel and a second uniform channel isolated from each other, ,
- the air inlet end of the first uniform flow channel is connected to the air outlet end of the first central channel through the first uniform flow cavity, and there are multiple air outlet ends of the first uniform flow channel, which are evenly distributed in all On the surface of the jet;
- the air inlet end of the second uniform flow channel is connected to the air outlet end of the second central channel through the second uniform flow cavity, and there are multiple air outlet ends of the second uniform flow channel, which are evenly distributed in the Described on the surface of the jet.
- the jet disk assembly includes:
- An air intake component is provided on the upper cover of the chamber, and both the first center channel and the second center channel are provided in the air intake component, and the air intake component includes an air outlet surface and the air intake surface A first central boss on the air outlet surface, the air outlet end of the first central channel is located on the table surface of the first central boss, and the air outlet end of the second central channel is located on the air outlet surface;
- the air jet disk is spaced apart from the upper cover of the chamber to form the second uniform flow cavity, and the air jet disk is sealingly butted with the table surface of the first central boss.
- the air jet disk includes a first plate body and a second plate body stacked on top of each other; wherein,
- the first plate body is spaced from the chamber upper cover to form the second uniform flow cavity, and the first plate body is sealingly butted with the table of the first central boss, and the first plate body A central through hole and a plurality of first through holes are provided in the center, and both ends of the central through hole communicate with the first central channel and the first uniform flow cavity respectively;
- the second plate body is located on the first A side of a plate body far away from the upper cover of the chamber, and a plurality of second through holes are provided in the second plate body, the number of the second through holes is the same as the number of the first through holes , And provided in a one-to-one correspondence, the first through hole and the second through hole corresponding thereto constitute the second uniform flow channel;
- At least one of the two opposite surfaces of the first plate body and the second plate body is provided with a uniform flow channel for forming between the first plate body and the second plate body
- the first uniform flow cavity; and, the surface of the second plate body away from the first plate body is the jet surface, and a plurality of A third through hole of the first uniform flow channel, one end of the third through hole communicates with the uniform flow channel, and the other end is located on the air jet surface.
- a plurality of concentric ring-shaped bosses are provided on at least one of the two opposite surfaces of the first plate body and the second plate body, and two adjacent rings
- An annular groove is formed between the convex bosses; and each of the annular bosses includes a plurality of sub-bosses arranged at intervals along the circumferential direction thereof, and the sub-groove and phase between two adjacent sub-bosses The adjacent annular grooves are connected to form the uniform flow channel;
- Each second through hole is provided corresponding to each annular boss; each third through hole is provided corresponding to each annular groove.
- each of the sub-grooves and the adjacent sub-grooves are arranged along the radial direction of the second plate body, so as to form a plurality of radial grooves in a radial shape at the center.
- the second through holes corresponding to the same annular boss are evenly distributed along the circumferential direction of the annular boss; the third through holes corresponding to the same annular groove are along The circumferential direction of the annular groove is evenly distributed.
- the air intake structure of the chamber further includes a uniform flow plate, the uniform flow plate is disposed between the upper cover of the chamber and the air jet plate, and is sealed with the table of the first central boss Docking
- the uniform flow plate and the air jet disk are spaced apart to divide the second uniform flow chamber into a third uniform flow chamber and a fourth uniform flow chamber, and the second uniform flow channel communicates with the third uniform flow chamber
- a second center boss is provided on the surface of the uniform flow plate opposite to the air jet plate, the second central boss is sealingly butted with the air jet plate, and a center is provided in the uniform flow plate
- a connection hole and a plurality of uniform flow holes wherein the inlet end of the central connection hole communicates with the outlet end of the first central channel, and the outlet end of the center connection hole is located on the table of the second central boss And communicate with the first uniform flow chamber; the two ends of each uniform flow hole communicate with the third uniform flow chamber and the fourth uniform flow chamber, respectively.
- each of the uniform flow holes and the intake end of the second uniform flow channel are interleaved with each other.
- the air intake structure of the chamber further includes a connector device, and the connector device includes a first connector, the first connector is stacked on a side of the air intake member that is far from the jet disc On the side surface, and a first intake passage and a second intake passage which are spaced apart from each other are provided in the first connecting member, and the respective outlet ends of the first intake passage and the second intake passage are respectively The respective intake ends of the first central channel and the second central channel are connected; the respective intake ends of the first and second intake channels are located at different orientations of the first connector On both surfaces.
- the chamber air intake structure further includes a second connector, the second connector is stacked on the surface where the air inlet end of the second air inlet channel of the first connector is located; And a recess is provided on at least one of two surfaces of the second connector and the first connector opposite to form a mixing chamber between the second connector and the first connector ;
- the second connecting piece is further provided with a mixing channel, an inlet end of the mixing channel is connected to a plurality of gas pipelines, and an outlet end of the mixing channel is in communication with the mixing chamber.
- the present invention also provides a reaction chamber, including: a chamber and a chamber upper cover provided on the top of the chamber, the chamber upper cover is provided with the above-mentioned chamber provided by the present invention Intake structure.
- the chamber air intake structure provided by the invention uses two isolated air intake paths in the jet disc assembly to realize the independent delivery of gas into the chamber, which can prevent the gas from mixing and reacting before entering the chamber; at the same time, due to the two Each air intake path adopts central air intake, which can avoid the gas distribution offset in the chamber, and the two air intake paths use the uniform flow cavity and the uniform air channel to achieve uniform flow, which can ensure that the two intake air The path enters the gas uniformity in the chamber.
- the structure of the air jet disk is simple and easy to process.
- the reaction chamber provided by the present invention by adopting the above-mentioned chamber intake structure provided by the present invention, can not only avoid the occurrence of gas distribution bias in the chamber, but also improve the uniformity of gas distribution.
- FIG. 1 is a schematic structural diagram of an embodiment of a chamber air intake structure according to an embodiment of the present invention
- FIG. 2 is a partially enlarged schematic view of part I of an embodiment of a chamber air intake structure according to an embodiment of the present invention
- FIG. 3 is a schematic front view of an air jet disk according to an embodiment of a chamber air intake structure provided by an embodiment of the present invention
- FIG. 4 is a schematic top view of a second plate body of a gas jet disk according to an embodiment of a chamber intake structure provided by an embodiment of the present invention
- FIG. 5 is a schematic plan view of a first plate body of a gas jet disk according to an embodiment of a chamber intake structure provided by an embodiment of the present invention
- 6A, 6B, and 6C are schematic diagrams of a top view, a side view, and a bottom view of a uniform flow plate according to an embodiment of a chamber air intake structure according to an embodiment of the present invention
- 7A and 7B are respectively a bottom view and an A-A cross-sectional schematic view of an air intake part of an embodiment of a chamber air intake structure according to an embodiment of the present invention
- 8A, 8B, and 8C are respectively a top view, a A-A cross-sectional view, and a bottom view of a first connector of an embodiment of a chamber air intake structure according to an embodiment of the present invention
- 9A, 9B, and 9C are schematic diagrams of a top view, A-A cross-section, and bottom view of a second connector of an embodiment of a chamber air intake structure according to an embodiment of the present invention.
- an embodiment of the present invention provides a reaction chamber, which includes a chamber 305 and a chamber upper cover 304 disposed at the top of the chamber 305, and disposed in the chamber 305 for carrying a workpiece to be processed
- the base 307 is also provided with a pipeline for passing heated liquid and back-blowing gas.
- the reaction chamber also includes vacuum system, vacuum measurement equipment and other related equipment.
- the present invention also provides a chamber air intake structure, the chamber air intake structure is disposed on the chamber upper cover 304, and is located below the chamber upper cover 304.
- the air intake structure of the chamber includes a jet disc assembly including a connector device, an air intake part 310, a uniform flow plate 309, and a jet disc 308.
- the air intake member 310 is provided on the chamber upper cover 304, specifically, a through hole penetrating in the vertical direction is provided in the chamber upper cover 304, and the air intake member 310 is installed in the through hole.
- the intake member 310 is provided with a first central channel 041 and a second central channel 043, as shown in FIGS. 9B and 9C, the first central channel 041 is a straight through hole vertically penetrating through the intake member 310, the straight through hole
- the axis of is coincident with the axis of the upper cover 304 of the chamber, so as to realize the central air intake and avoid the gas distribution offset in the chamber.
- the second center channel 043 surrounds the first center channel 041 and is isolated from each other. As shown in FIG.
- the second central channel 043 includes a plurality of straight through holes that vertically penetrate the air intake member 310, and is symmetrically distributed around the first central channel 041. Since the second center channel 043 surrounds the first center channel 041, and the center of the surround coincides with the axis of the chamber upper cover 304, this can also achieve central air intake and avoid gas distribution offset in the chamber. Of course, in practical applications, the second central channel 043 may also use a closed annular through hole.
- the air intake member 310 includes an air outlet surface B and a first center boss 3101 provided on the air outlet surface B, and the air outlet end of the first center channel 041 is located on the table C of the first center boss 3101;
- the outlet end of the second central channel 043 is located on the outlet surface B.
- the air-jet disc 308 and the chamber upper cover 304 are spaced apart, and a second uniform flow cavity is formed between the two, and the uniform flow plate 309 is provided between the chamber upper cover 304 and the air-jet disc 308 to divide the second uniform flow chamber into the first Three uniform flow chambers 313 and a fourth uniform flow chamber 314.
- the outlet end of the second central channel 043 communicates with the third uniform flow chamber 313.
- the uniform flow plate 309 is sealingly butted with the mesa C of the first central boss 3101, in other words, the first central boss 3101 passes through the third uniform flow chamber 313 and is sealingly butted with the uniform plate 309 so as to be located on the mesa C
- the gas outlet of the first central channel 041 on the upper side can be isolated from the third uniform flow cavity 313, so as to ensure that the gas in the first central channel 041 will not mix with the gas in the third uniform flow cavity 313.
- the air-jet disk 308 includes a first plate 3081 and a second plate 3082 that are stacked on each other.
- the first plate 3081 and the second plate 3082 are fixedly connected, for example, welding or other connection methods may be used.
- a fourth uniform flow cavity 314 is formed between the uniform flow plate 309 and the first plate body 3081, and, as shown in FIG. 5, the first plate body 3081 is provided with a central through hole 11 vertically penetrating the first plate body 3081 And a plurality of first through holes 12, wherein the axis of the central through hole 11 coincides with the axis of the first plate 3081; the plurality of first through holes 12 are evenly distributed with respect to the plane where the first plate 3081 is located.
- the surface of the uniform flow plate 309 opposite to the first plate body 3081 is provided with a second center boss, which is sealingly butted with the first plate body 3081, in other words, the second center convex
- the stage passes through the fourth uniform flow chamber 314 and is sealed and docked with the first plate 3081.
- the uniform flow plate 309 is provided with a central connection hole 3091 and a plurality of uniform flow holes 3092; wherein, the intake end of the central connection hole 3091 and the first central channel 041 The air outlet is connected, and the air outlet of the central connection hole 3091 is located on the table surface of the second central boss and communicates with the central through hole 11 because the second central boss is sealingly butted with the first plate body 3081, thereby ensuring the central through hole Both 11 and the central connection hole 3091 are isolated from the fourth uniform flow cavity 314. Both ends of each uniform flow hole 3092 communicate with the third uniform flow chamber 313 and the fourth uniform flow chamber 314, respectively.
- the edge of the uniform flow plate 309 is provided with convex edges 3093 respectively protruding upward and downward, to achieve the uniform flow plate 309 and the chamber upper cover 304 and the air jet disc respectively 308 are spaced apart to form a third uniform flow chamber 313 and a fourth uniform flow chamber 314.
- the above-mentioned uniform flow plate 309 may not be provided.
- the air jet disk 308 may be spaced from the chamber upper cover 304 to form the above-mentioned second uniform flow chamber, and the air jet disk 308 Sealed butt with the mesa C of the first center boss 3101.
- the second plate body 3082 is located on the side of the first plate body 3081 away from the chamber upper cover 304, and the second plate body 3082 is provided with a plurality of second
- the number of the through holes 13 and the number of the second through holes 13 are the same as the number of the first through holes 12 and are provided in a one-to-one correspondence.
- the first through holes 12 and the corresponding second through holes 13 constitute a second uniform flow channel.
- At least one of the two opposite surfaces of the first plate body 3081 and the second plate body 3082 is provided with a uniform flow channel 14 for forming a first plate body 3081 and the second plate body 3082 between the first plate body 3081 and the second plate body 3082.
- a uniform flow cavity for example, the uniform flow channel 14 is provided on the second plate body 3082 to form a closed first uniform flow chamber with the lower surface of the first plate body 3081.
- the surface of the second plate body 3082 on the side away from the first plate body 3081 is a jet surface A, which is exposed in the process space in the cavity 305.
- the second plate body 3082 is provided with a plurality of third through holes 16.
- the third through hole 16 communicates with the uniform flow channel 14, and the other end is located on the air injection surface A.
- the third through hole 16 serves as a first uniform flow channel for delivering gas into the process space in the cavity 305.
- the gas outlets of the plurality of third through holes 16 are evenly distributed on the gas injection surface A, so that the gas can be evenly delivered into the cavity 305.
- the surface of the second plate 3082 opposite to the first plate 3081 is provided with a plurality of concentric annular bosses 15, and two adjacent annular Ring-shaped grooves are formed between the bosses 15; and each ring-shaped boss 15 includes a plurality of sub-bosses 151 arranged at intervals along its circumferential direction, and sub-grooves 152 between each adjacent two sub-bosses 151 Communicating with the adjacent annular groove constitutes the above-mentioned uniform flow channel 14.
- each second through hole 13 is provided corresponding to each annular boss 15; each third through hole 16 is provided corresponding to each annular groove.
- each annular groove can be communicated through each sub-groove 152 to form a uniform flow channel 14, and the second through hole 13 can also be made
- the outlet end of the third outlet 16 and the outlet end of the third through hole 16 can be staggered in the radial direction of the jet surface A, which is more conducive to the two types of outlets from the outlet end of the second through hole 13 and the outlet end of the third through hole 16
- the mixing of gases further improves the uniformity of gas mixing.
- each sub-groove 152 and the adjacent sub-groove 152 are arranged in the radial direction of the second plate body 3082 to form a plurality of radial grooves that are radial in the center , So as to realize the interconnection of the annular grooves on the circumferences of different radii in the radial direction.
- the second through holes 13 corresponding to the same annular boss 15 are evenly distributed along the circumferential direction of the annular boss 15; the third through holes 16 corresponding to the same annular groove are along the circumference of the annular groove To evenly distributed. This can improve the uniformity of the distribution in the circumferential direction of the air-blast surface A.
- the number of second through holes 13 provided on the annular boss 15 on the inner ring is generally less than the number of second through holes 13 provided on the annular boss 15 on the outer ring. Quantity.
- the diameter of the central through hole 11 in the first plate body 3081 is larger than the diameter of the first through hole 12 to ensure that the flow rate of the central intake air meets the requirements.
- the first through hole 12 and the second through hole 13 have the same diameter.
- the uniform flow holes 3092 in each uniform flow plate 309 and the first through holes 12 in the first plate body 3081 are staggered with each other to improve the degree of diffusion of gas in the fourth uniform flow chamber 314.
- the connector device may have various structures.
- the connector device includes: a first connector 311 and a second connector 312.
- the first connector 311 is stacked on the side surface of the air intake member 310 away from the air jet disc 308, and the first connectors 311 are provided with spaced apart first inlets.
- the air passage 031 and the second intake passage 032, and the respective outlet ends of the first intake passage 031 and the second intake passage 032 are connected to the respective intake ends of the first central passage 041 and the second central passage 043, respectively.
- the intake ends of the first intake passage 031 and the second intake passage 032 are respectively located on two surfaces of the first connector 311 facing different directions.
- the first intake passage 031 is provided on the circumferential side wall of the first connector 311, and the second intake passage 032 is provided on the upper end surface of the first connector 311. In this way, it can be easily connected with different gas pipelines.
- the second air intake channel 032 is a plurality of straight through holes vertically penetrating the first connector 311, and the air intake member 310 has a plurality of straight through holes forming the second central channel 043 Set one by one.
- an annular recess 042 is further provided on the surface of the air intake member 310 butted against the first connector 311, and the annular recess 042 is used for the air intake member 310 and the first connector 311 A buffer space is formed between them to ensure that the gas flow rate of the second intake passage 032 can meet the process requirements.
- the second connecting piece 312 is superposed on the surface where the intake end of the second intake passage 032 of the first connecting piece 311 is located. Also, as shown in FIGS. 7A and 7B, a recess is provided on at least one of the two surfaces of the second connector 312 and the first connector 311 opposite to the second connector 312 and the first connector A mixing chamber 022 is formed between 311; and, a mixing channel 021 is also provided in the second connector 312, and the intake end of the mixing channel 021 is connected to a plurality of gas pipelines, which can pass in a variety of different gases for mixing The gas outlet of the channel 021 communicates with the mixing chamber 022.
- the gas can be mixed in advance before entering the chamber, so that the gas mixing uniformity can be improved; at the same time, the buffer space formed by the annular recess 042 can also be used for secondary mixing. Thereby further improving the gas mixing uniformity.
- a sealing ring is provided on the butting surface between the two components to achieve a sealed butt joint, for example, a sealing ring is provided between two surfaces of the second connector 312 and the first connector 311 opposite to each other .
- the two separate intake paths in the chamber air intake structure are used to realize the independent delivery of the gas into the cavity 305, so as to prevent the gas from mixing and occurring before entering the chamber reaction.
- the mixing chamber 022 and the gas mixing channel 021 in the second connecting member 312 can also be used to mix at least two gases that do not react in advance.
- the chamber air intake structure has two mutually separate air intake paths, namely a first air intake path and a second air intake path, wherein the first air intake path is connected to the The two pipes 301 and 302 are connected; the second intake path is connected to the pipe 303 through the first connector 311.
- the two gases in the two pipes 301 and 302 will not react, and can enter the mixing chamber 022 through the gas mixing channel 021 and be mixed in advance in the mixing chamber 022.
- the second intake passage 032 in the first connecting piece 311 and the second central passage 043 in the intake member 310 in sequence, the buffer space formed by the annular recess 042 is entered, and secondary mixing can also be performed.
- the mixed gas after the second mixing enters the fourth uniform flow chamber 314 through the third uniform flow chamber 313 and the uniform flow holes 3092 in the uniform flow plate 309 in sequence, and the first uniform flow is realized at this time; the fourth The mixed gas in the uniform flow chamber 314 then enters the cavity 305 through the first through holes 12 in the first plate 3081 and the second through holes 13 in the second plate 3082, at which time the second uniform flow. It can be seen from the above that since the mixed gas undergoes secondary mixing and secondary uniform flow before entering the chamber, the uniformity of the mixing and diffusion of the reactive gas above the workpiece to be processed can be effectively improved.
- the pipeline 303 Since the pipeline 303 is used to pass gases that react with the two gases in the two pipelines 301 and 302, the second intake path and the first intake path are isolated from each other, which can ensure the gas in the pipeline 303 The gas in the two pipes 301, 302 will not mix before entering the chamber.
- the gas in the pipeline 303 passes through the first intake passage 031 in the first connection piece 311, the first central passage 041 in the intake member 310, and the central connection hole in the uniform flow plate 309 in sequence 3091.
- the central through hole 11 in the first plate 3081 enters the uniform flow channel 14 (ie, the first uniform flow cavity), and then enters the cavity 305 via the third through holes 16. Thereby, a uniform flow effect is achieved, ensuring the uniformity of the gas entering the chamber from the second intake path.
- the chamber air intake structure provided by the embodiment of the present invention uses two isolated air intake paths in the jet disc assembly to realize the independent delivery of gas into the chamber, which can prevent the gas from mixing and entering before entering the chamber. Reaction occurs; at the same time, since the two air intake paths use central air intake, this can avoid the occurrence of gas distribution bias in the chamber, and the two air intake paths use the uniform flow cavity and the uniform gas channel to achieve uniform flow. It can ensure the uniformity of the gas entering the chamber from the two intake paths.
- the structure of the air jet disk is simple and easy to process.
- an embodiment of the present invention provides a reaction chamber, which includes a chamber 305, a chamber upper cover 304 disposed on the top of the chamber 305, and disposed within the chamber 305
- the base 307 for carrying the workpiece 306 to be processed.
- the base 307 is also provided with a pipeline for passing heated liquid and back-blowing gas.
- the reaction chamber also includes vacuum system, vacuum measurement equipment and other related equipment.
- the reaction chamber provided by the embodiment of the present invention further includes the chamber air intake structure as in any of the above embodiments.
- the chamber air intake structure is provided on the chamber upper cover 304.
- the reaction chamber provided by the embodiment of the present invention by adopting the above-mentioned chamber intake structure provided by the present invention, can not only avoid the occurrence of gas distribution bias in the chamber, but also improve the uniformity of gas distribution.
- a fixed connection can be understood as: a detachable fixed connection (for example, using a bolt or screw connection), or It is understood as: a non-removable fixed connection (such as riveting and welding).
- the fixed connection can also be replaced by an integrated structure (for example, manufactured by integral molding using a casting process) (except that it is obviously impossible to use an integrated molding process).
- any component provided by the present invention may be assembled from a plurality of separate components, or may be a separate component manufactured by an integral molding process.
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Abstract
Description
Claims (11)
- 一种腔室进气结构,其特征在于,包括喷气盘组件,所述喷气盘组件包括喷气表面;并且,所述喷气盘组件中设置有第一中心通道和设置在所述第一中心通道周围且与之相互隔离的第二中心通道、相互隔离的第一匀流通道和第二匀流通道,以及相互隔离的第一匀流腔和第二匀流腔,其中,所述第一匀流通道的进气端通过所述第一匀流腔与所述第一中心通道的出气端连接,所述第一匀流通道的出气端为多个,且均匀分布在所述喷气表面上;所述第二匀流通道的进气端通过所述第二匀流腔与所述第二中心通道的出气端连接,所述第二匀流通道的出气端为多个,且均匀分布在所述喷气表面上。
- 如权利要求1所述的腔室进气结构,其特征在于,所述喷气盘组件包括:进气部件,设置在腔室上盖上,且所述第一中心通道和所述第二中心通道均设置在所述进气部件中,并且所述进气部件包括出气表面和设置在所述出气表面上的第一中心凸台,所述第一中心通道的出气端位于所述第一中心凸台的台面上,所述第二中心通道的出气端位于所述出气表面上;喷气盘,与所述腔室上盖间隔构成所述第二匀流腔,且所述喷气盘与所述第一中心凸台的台面密封对接。
- 如权利要求2所述的腔室进气结构,其特征在于,所述喷气盘包括相互叠置的第一板体和第二板体;其中,所述第一板体与所述腔室上盖间隔构成所述第二匀流腔,且所述第一板体与所述第一中心凸台的台面密封对接,并且所述第一板体中设置有中心通孔和多个第一通孔,所述中心通孔的两端分别与所述第一中心通道和所述第 一匀流腔连通;所述第二板***于所述第一板体的远离所述腔室上盖的一侧,且所述第二板体中设置有多个第二通孔,所述第二通孔的数量和所述第一通孔的数量相同,且一一对应地设置,所述第一通孔和与之对应的所述第二通孔构成所述第二匀流通道;所述第一板体和所述第二板体相对的两个表面中的至少一个表面上设置有匀流凹道,用以在所述第一板体和所述第二板体之间构成所述第一匀流腔;并且,所述第二板体的远离所述第一板体一侧的表面为所述喷气表面,且所述第二板体中设置有多个用作所述第一匀流通道的第三通孔,所述第三通孔的一端与所述匀流凹道连通,另一端位于所述喷气表面上。
- 如权利要求3所述的腔室进气结构,其特征在于,所述第一板体和所述第二板体相对的两个表面中的至少一个表面上设置有多个同心的环状凸台,且在各相邻的两个所述环状凸台之间形成环状凹槽;并且,各所述环状凸台包括沿其周向间隔排布的多个子凸台,各相邻的两个子凸台之间的子凹槽和相邻的所述环状凹槽连通构成所述匀流凹道;各所述第二通孔对应各所述环状凸台设置;各所述第三通孔对应各所述环状凹槽设置。
- 如权利要求4所述的腔室进气结构,其特征在于,各所述子凹槽和与之相邻的所述子凹槽沿所述第二板体的径向排列,以构成呈中心放射状的多条径向凹道。
- 如权利要求4所述的腔室进气结构,其特征在于,与同一所述环状凸台对应的所述第二通孔沿所述环状凸台的周向均匀分布;与同一所述环状凹槽对应的所述第三通孔沿所述环状凹槽的周向均匀分布。
- 如权利要求2-5任意一项所述的腔室进气结构,其特征在于,所述 腔室进气结构还包括匀流板,所述匀流板设置在所述腔室上盖与所述喷气盘之间,并且与所述第一中心凸台的台面密封对接;所述匀流板与所述喷气盘间隔设置,将所述第二匀流腔分隔为第三匀流腔和第四匀流腔,所述第二匀流通道连通所述第三匀流腔,且所述匀流板的与所述喷气盘相对的表面上设置有第二中心凸台,所述第二中心凸台与所述喷气盘密封对接,且所述匀流板中设置有中心连接孔和多个匀流孔;其中,所述中心连接孔的进气端与所述第一中心通道的出气端连通,所述中心连接孔的出气端位于所述第二中心凸台的台面上,且与所述第一匀流腔连通;各所述匀流孔的两端分别与所述第三匀流腔和所述第四匀流腔连通。
- 如权利要求7所述的腔室进气结构,其特征在于,各所述匀流孔与所述第二匀流通道的进气端相互交错。
- 如权利要求2-5任意一项所述的腔室进气结构,其特征在于,所述腔室进气结构还包括连接件装置,所述连接件装置包括第一连接件,所述第一连接件叠置在所述进气部件的远离所述喷气盘的一侧表面上,且在所述第一连接件中设置有相互间隔的第一进气通道和第二进气通道,并且所述第一进气通道和第二进气通道各自的出气端分别与所述第一中心通道和所述第二中心通道各自的进气端连接;所述第一进气通道和第二进气通道各自的进气端分别位于所述第一连接件的朝向不同的两个表面上。
- 如权利要求9所述的腔室进气结构,其特征在于,所述腔室进气结构还包括第二连接件,所述第二连接件叠置在所述第一连接件的所述第二进气通道的进气端所在的表面上;并且在所述第二连接件和所述第一连接件相对的两个表面中的至少一个表面上设置有凹部,以在所述第二连接件和所述第一连接件之间构成混合腔;所述第二连接件中还设置有混合通道,所述混合通道的进气端与多个气 体管路连接,所述混合通道的出气端与所述混合腔连通。
- 一种反应腔室,其特征在于,包括:腔体和设置在所述腔体顶部的腔室上盖,所述腔室上盖上设置有如权利要求1至10任一项所述的腔室进气结构。
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