WO2020115111A3 - Verfahren zum bilden von nanostrukturen an einer oberfläche und optisches element - Google Patents
Verfahren zum bilden von nanostrukturen an einer oberfläche und optisches element Download PDFInfo
- Publication number
- WO2020115111A3 WO2020115111A3 PCT/EP2019/083628 EP2019083628W WO2020115111A3 WO 2020115111 A3 WO2020115111 A3 WO 2020115111A3 EP 2019083628 W EP2019083628 W EP 2019083628W WO 2020115111 A3 WO2020115111 A3 WO 2020115111A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- optical element
- radiation
- nanostructures
- fuv
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
- H01S3/0346—Protection of windows or mirrors against deleterious effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
- G02B2207/101—Nanooptics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020217020407A KR20210097175A (ko) | 2018-12-07 | 2019-12-04 | 표면 상에 나노구조를 형성하기 위한 방법 및 광학 요소 |
US17/341,239 US11982788B2 (en) | 2018-12-07 | 2021-06-07 | Method for forming nanostructures on a surface and optical element |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102018221189.2 | 2018-12-07 | ||
DE102018221189.2A DE102018221189A1 (de) | 2018-12-07 | 2018-12-07 | Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US17/341,239 Continuation US11982788B2 (en) | 2018-12-07 | 2021-06-07 | Method for forming nanostructures on a surface and optical element |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2020115111A2 WO2020115111A2 (de) | 2020-06-11 |
WO2020115111A3 true WO2020115111A3 (de) | 2020-08-13 |
Family
ID=68835194
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2019/083628 WO2020115111A2 (de) | 2018-12-07 | 2019-12-04 | Verfahren zum bilden von nanostrukturen an einer oberfläche und optisches element |
Country Status (4)
Country | Link |
---|---|
US (1) | US11982788B2 (de) |
KR (1) | KR20210097175A (de) |
DE (1) | DE102018221189A1 (de) |
WO (1) | WO2020115111A2 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230045243A (ko) | 2021-09-28 | 2023-04-04 | 경희대학교 산학협력단 | 나노 구조를 가지는 고분자 물질 및 이의 형성방법 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1707994A1 (de) * | 2005-03-28 | 2006-10-04 | Matsushita Electric Works, Ltd. | Laser-Oberflächenbehandlung |
Family Cites Families (27)
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JP3924806B2 (ja) | 1996-06-10 | 2007-06-06 | 株式会社ニコン | 反射防止膜 |
DE19708776C1 (de) | 1997-03-04 | 1998-06-18 | Fraunhofer Ges Forschung | Entspiegelungsschicht sowie Verfahren zur Herstellung derselben |
JPH11172421A (ja) | 1997-10-09 | 1999-06-29 | Nikon Corp | フッ化物薄膜の製造方法および製造装置 |
JPH11140617A (ja) | 1997-11-10 | 1999-05-25 | Nikon Corp | 金属フッ化物含有膜の形成方法 |
JP2001100017A (ja) | 1999-09-29 | 2001-04-13 | Canon Inc | 光学素子 |
US6466365B1 (en) | 2000-04-07 | 2002-10-15 | Corning Incorporated | Film coated optical lithography elements and method of making |
ATE453232T1 (de) | 2001-04-04 | 2010-01-15 | Coherent Deos | Gütegeschalteter co2 laser für materialbearbeitung |
JP2003193231A (ja) | 2001-12-27 | 2003-07-09 | Nikon Corp | スパッタ源、スパッタ成膜装置、スパッタ成膜方法、光学多層膜、光学部材及び投影露光装置 |
JP2004347860A (ja) | 2003-05-22 | 2004-12-09 | Showa Denko Kk | フッ化物光学薄膜の緻密化処理方法及びフッ化物光学素子 |
US20040006249A1 (en) | 2002-07-08 | 2004-01-08 | Showa Denko K.K., Nikon Corporation | Fluorination treatment apparatus, process for producing fluorination treated substance, and fluorination treated substance |
US6872479B2 (en) | 2003-04-11 | 2005-03-29 | Corning Incorporated | Coated optics to improve durability |
JP2005054220A (ja) | 2003-08-01 | 2005-03-03 | Canon Inc | フッ化物薄膜の形成方法及びその形成装置 |
DE10350114B4 (de) | 2003-10-28 | 2006-01-12 | Tuilaser Ag | Optisches Element sowie Excimerlaser mit optischem Element |
US7924397B2 (en) * | 2003-11-06 | 2011-04-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-corrosion layer on objective lens for liquid immersion lithography applications |
US7268948B2 (en) | 2004-03-31 | 2007-09-11 | Canon Kabushiki Kaisha | Optical element and optical scanning device using the same |
US7170666B2 (en) | 2004-07-27 | 2007-01-30 | Hewlett-Packard Development Company, L.P. | Nanostructure antireflection surfaces |
US7128984B2 (en) | 2004-08-31 | 2006-10-31 | Corning Incorporated | Surfacing of metal fluoride excimer optics |
US7561611B2 (en) | 2005-02-03 | 2009-07-14 | Corning Incorporated | Extended-lifetime elements for excimer lasers |
US7327769B2 (en) | 2005-10-18 | 2008-02-05 | Coherent, Inc. | Injection locking Q-switched and Q-switched cavity dumped CO2 lasers for extreme UV generation |
US7903699B2 (en) | 2007-05-24 | 2011-03-08 | Coherent, Inc. | Acousto-optically Q-switched CO2 laser |
EP2185298B1 (de) | 2007-07-31 | 2012-07-04 | Corning Incorporated | Reinigungsverfahren für optische duv-elemente zur verlängerung ihrer lebenszeit |
DE102008002193A1 (de) * | 2007-08-29 | 2009-03-05 | Carl Zeiss Smt Ag | Optisches Element mit hydrophober Oberfläche und Projektionsbelichtungsanlage für die Immersionslithographie damit |
US8399110B2 (en) | 2008-05-29 | 2013-03-19 | Corning Incorporated | Adhesive, hermetic oxide films for metal fluoride optics and method of making same |
EP2372404B1 (de) | 2008-10-17 | 2013-01-16 | Carl Zeiss SMT GmbH | Projektionsobjektiv mit hoher Transmission und hoher Apertur sowie Projektionsbelichtungsvorrichtung |
KR101286398B1 (ko) | 2011-05-18 | 2013-07-15 | 경희대학교 산학협력단 | 광파장 이하의 격자 미세 구조물을 갖는 반사 방지막과 그 제조방법 |
DE102011054837A1 (de) | 2011-10-26 | 2013-05-02 | Carl Zeiss Laser Optics Gmbh | Optisches Element |
US9530636B2 (en) | 2014-03-20 | 2016-12-27 | Kla-Tencor Corporation | Light source with nanostructured antireflection layer |
-
2018
- 2018-12-07 DE DE102018221189.2A patent/DE102018221189A1/de not_active Ceased
-
2019
- 2019-12-04 WO PCT/EP2019/083628 patent/WO2020115111A2/de active Application Filing
- 2019-12-04 KR KR1020217020407A patent/KR20210097175A/ko not_active Application Discontinuation
-
2021
- 2021-06-07 US US17/341,239 patent/US11982788B2/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1707994A1 (de) * | 2005-03-28 | 2006-10-04 | Matsushita Electric Works, Ltd. | Laser-Oberflächenbehandlung |
Non-Patent Citations (1)
Title |
---|
AZUMI M ET AL: "Laser damage of calcium fluoride by ArF excimer laser irradiation", BIOMEDICAL PHOTONICS AND OPTOELECTRONIC IMAGING : 8 - 10 NOVEMBER 2000, BEIJING, CHINA; [PROCEEDINGS // SPIE, INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING : P, ISSN 0038-7355], SPIE, BELLINGHAM, WASH., US, vol. 9632, 23 November 2015 (2015-11-23), pages 963213 - 963213, XP060063634, ISBN: 978-1-62841-832-3, DOI: 10.1117/12.2192195 * |
Also Published As
Publication number | Publication date |
---|---|
WO2020115111A2 (de) | 2020-06-11 |
US20210293996A1 (en) | 2021-09-23 |
DE102018221189A1 (de) | 2020-06-10 |
KR20210097175A (ko) | 2021-08-06 |
US11982788B2 (en) | 2024-05-14 |
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