WO2020099363A1 - Dispositif de production de flux et procédé de production de flux destiné à un dispositif de fabrication additive d'un objet tridimensionnel - Google Patents

Dispositif de production de flux et procédé de production de flux destiné à un dispositif de fabrication additive d'un objet tridimensionnel Download PDF

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Publication number
WO2020099363A1
WO2020099363A1 PCT/EP2019/080943 EP2019080943W WO2020099363A1 WO 2020099363 A1 WO2020099363 A1 WO 2020099363A1 EP 2019080943 W EP2019080943 W EP 2019080943W WO 2020099363 A1 WO2020099363 A1 WO 2020099363A1
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WO
WIPO (PCT)
Prior art keywords
gas
distribution unit
process chamber
gas distribution
energy beam
Prior art date
Application number
PCT/EP2019/080943
Other languages
German (de)
English (en)
Inventor
Alexander Schilling
Sebastian MEHL
Original Assignee
Eos Gmbh Electro Optical Systems
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eos Gmbh Electro Optical Systems filed Critical Eos Gmbh Electro Optical Systems
Publication of WO2020099363A1 publication Critical patent/WO2020099363A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/30—Process control
    • B22F10/32—Process control of the atmosphere, e.g. composition or pressure in a building chamber
    • B22F10/322—Process control of the atmosphere, e.g. composition or pressure in a building chamber of the gas flow, e.g. rate or direction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/20—Direct sintering or melting
    • B22F10/28—Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
    • B22F12/40—Radiation means
    • B22F12/49—Scanners
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
    • B22F12/70—Gas flow means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/141—Processes of additive manufacturing using only solid materials
    • B29C64/153—Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/30—Auxiliary operations or equipment
    • B29C64/364—Conditioning of environment
    • B29C64/371—Conditioning of environment using an environment other than air, e.g. inert gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y40/00—Auxiliary operations or equipment, e.g. for material handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/25—Process efficiency

Definitions

  • the present invention relates to a flow device and a flow method for a device for additively producing a three-dimensional object by applying and selectively solidifying a building material, preferably a powder, and to such an additive manufacturing device.
  • Devices and methods of this type are used for example in rapid prototyping, rapid tooling or additive manufacturing.
  • An example of such a process is known under the names "selective laser sintering" or “selective laser melting”.
  • a thin layer of a powdery building material is repeatedly applied and the building material in each layer is selectively solidified by selectively irradiating at least one laser beam from points corresponding to a cross section of the object to be produced.
  • a laser When a laser is used to selectively irradiate an applied layer of the building material, in particular a metal powder, spatter, smoke, vapors and / or gases can arise which can be found in the installation space (e.g. in a process chamber). spread into it and can interfere with the manufacturing process. Among other things, they can deposit or accumulate on the coupling window through which the laser radiation enters the process chamber, which, among other things, leads to a loss of radiation power, thus leading to deviations from a predetermined energy input into a layer and ultimately properties of a product to be produced Can negatively affect the object.
  • a metal powder, spatter, smoke, vapors and / or gases can arise which can be found in the installation space (e.g. in a process chamber). spread into it and can interfere with the manufacturing process. Among other things, they can deposit or accumulate on the coupling window through which the laser radiation enters the process chamber, which, among other things, leads to a loss of radiation power, thus leading to deviations from a pre
  • Document WO 0030789 A1 therefore proposes a process chamber in the ceiling area of which an elevated area with side surfaces is provided.
  • the coupling window is arranged in this raised area and a gas flows around it, which is introduced into the raised area through inlet openings in the side faces. This allows smoke, vapors and condensate to be kept away from the coupling window during the construction process.
  • the gas flow is not active between two production processes or if the production process is interrupted, so that there is a risk of contamination of the coupling window, for example due to impurities (e.g. dust) entering from outside the process chamber and / or smoke present in the process chamber , Vapors and / or gases.
  • impurities e.g. dust
  • the object of the present invention is to provide an alternative or improved flow device or an alternative or improved flow process for a device for additively producing a three-dimensional object by applying layers and selectively solidifying a building material, in particular in which a gas flow for keeping clean of the coupling window is generated, which is active in particular when the manufacturing process is interrupted and / or between two manufacturing processes.
  • a first aspect of the present invention relates to a flow device for a plurality of energy beam outlet regions in an additive production device for additively producing a three-dimensional object by layer-by-layer application and selective solidification of a building material by irradiation by means of energy radiation, the flow device comprising a process chamber with a ceiling wall, wherein the energy beam outlet areas are arranged in the top wall of the process chamber in a reference plane, and wherein a plurality of energy beam deflection units of the additive manufacturing device is arranged above the energy beam outlet areas.
  • the flow device comprises at least one gas distribution unit and a plurality of gas outlets for discharging a gas into the process chamber, the gas outlets being at least partially formed by the gas distribution unit, and the gas distribution unit at least in an operating position on the ceiling wall and inside the process chamber from the Ceiling wall or the reference plane emerges so that it protrudes into the process chamber.
  • the gas outlets are provided at least in the operating position of the gas distribution unit in an upper height region of the process chamber and are directed into the process chamber in such a way that gas at least partially sweeps over the reference plane during operation.
  • At least one gas supply line for supplying the gas to the gas distribution unit is arranged above the ceiling wall, in particular outside the process chamber, an end section of the gas supply line being arranged between at least two of the energy beam deflection units.
  • the process chamber is understood to be a cavity which is delimited by a process chamber wall.
  • the process chamber is preferably at least partially covered by a construction field. limits in which the three-dimensional object can be produced.
  • a construction container for the three-dimensional object to be produced is preferably provided below the construction field.
  • the process chamber can be a substantially closed cavity with the exception of a number of gas inlets and gas outlets. It can comprise a door to an area outside the additive manufacturing device, which is preferably closed at least during a manufacturing process of the three-dimensional object or objects.
  • An upper height range of the process chamber denotes a near-ceiling, i.e. H. area of the process chamber remote from the construction field, d. H. an area that is closer to the process chamber ceiling than to the construction site.
  • the upper height range is preferably arranged in an uppermost half, more preferably an uppermost third, particularly preferably an uppermost fifth of a maximum clear height of the process chamber.
  • the maximum clear height of the process chamber, including the process chamber height is understood to mean a maximum distance of the construction field from the process chamber ceiling, i. H. a maximum vertical extension of the process chamber.
  • An energy beam outlet area is understood as a surface of a coupling window provided in the process chamber ceiling, which surface faces the process chamber, through which the energy radiation enters the process chamber during the layered production of the three-dimensional object or at least as a region of a coupling window that is produced during the layered production of the three-dimensional object used by the energy radiation, d. H. is crossed by it.
  • the energy beam outlet region preferably designates precisely that area of a coupling window that intersects an energy radiation or an energy beam when it completely scans a circumference of a maximum working area assigned to it on the construction field.
  • the energy radiation can be an energy radiation suitable for the selective solidification of the building material, e.g. B. a laser or electron beam. Alternatively or additionally, the energy radiation can be thermal radiation which is used for heating the process chamber or the surface of the building material. Alles- The term “energy radiation” generally refers to energy radiation that is specifically used in the additive manufacturing process as a delimitation from, for example, ambient radiation (eg ambient light).
  • the reference plane in which the energy beam outlet areas are arranged in the top wall of the process chamber can, for. B. be the side facing the construction site or surface of the energy beam outlet areas. The reference plane can thus be identical to one or more surfaces that actually lie in a single plane. However, it can also be an imaginary level, the z. B.
  • the reference plane can thus be understood as a kind of spatial averaging of the surfaces arranged in this area.
  • the energy beam deflection units of the additive manufacturing device are arranged above the energy beam outlet areas, that is to say in an area of the additive manufacturing device outside the process chamber or above the process chamber wall.
  • An energy beam deflection unit can be designed, for example, as a laser scanner unit which, for. B. a scanner (with a number of movable mirrors), a drive for moving the scanner mirror or mirrors and optics, eg. B. may include an F-theta lens.
  • a laser scanner unit which, for. B. a scanner (with a number of movable mirrors), a drive for moving the scanner mirror or mirrors and optics, eg. B. may include an F-theta lens.
  • Not every energy beam deflection unit has to contain the components mentioned by way of example, it is also possible for one or more of the components to be used together for a plurality of energy beam deflection units.
  • An energy beam outlet region preferably adjoins each energy beam deflection unit, ie exactly one energy beam deflection unit is assigned to each energy beam outlet region, which directly, ie without a distance, adjoins the energy beam outlet regions or vertically therefrom (ie in one direction) perpendicular to the construction site).
  • the operating position of the gas distribution unit denotes a position of the gas distribution unit in the process chamber in which it is provided in the process chamber in its intended operation, ie in the installed and activated state.
  • the term “operating position” does not mean that the gas distribution unit or flow device is absolutely in operation, but only that it can or would be operational.
  • a gas outlet at least partially formed by the gas distribution unit can be an uninterrupted or interrupted opening for the discharge of gas.
  • An intermittent opening may comprise a field or a grid of openings, e.g. B. is formed by a grid or a number of struts extending in any direction in the gas outlet.
  • Gas that flows into the process chamber from the gas outlets of the gas distribution unit during operation of the flow device is also referred to as a clean gas flow, in particular as a delimitation to a process gas flow that is at least temporarily supplied to the process chamber through one or more gas inlets during the manufacturing process.
  • An at least partial sweep of the reference plane can mean touching in the sense of at least one partial gas stream which is directed obliquely at the reference plane.
  • partial sweeping also includes
  • the gas distribution unit is preferably designed such that it distributes gas to the plurality of gas outlets during operation.
  • the gas distribution unit can be supplied with gas by a gas supply device which, for. B. is promoted from a gas supply.
  • the gas distribution unit is preferably connected in a gas-conducting manner, inter alia, via the gas supply line to the gas supply device or the gas supply, so that the gas is supplied to the gas distribution unit during operation via the gas supply line.
  • One end of the end section of the gas supply line can connect to the gas distribution unit. when it is in the operating position. In other words, the end section can end at an interface of the gas supply line with the gas distribution unit.
  • the term “arranged between at least two of the energy beam deflection units” means that the end section of the gas supply line is arranged completely within a minimally surrounding rectangle or cuboid as a frame (“bounding box”) which encloses the at least two energy beam deflection units.
  • the gas outlets are preferably provided in the process chamber at a distance from the reference plane, at least in the operating position of the gas distribution unit. Although this does not preclude the gas outlets from directly adjoining the reference plane in a direction perpendicular to the reference plane, it does mean that a significant (area) proportion of the gas outlets is spaced from the reference plane, i.e. it is not in the reference plane itself. For example, the opening areas of the gas outlets can intersect the reference plane.
  • This provides a flow device that is designed to generate a clean gas flow in the process chamber, which can also protect the surfaces of the energy beam outlet regions from contamination, for example, when a process gas flow is not active.
  • the clean gas flow runs unguided, i.e. it does not run in a channel or other structural device, but is shaped by the gas distribution unit (e.g. through an outlet of the gas distribution unit) in such a way that the flow at least over a distance that corresponds to a dimension of the or
  • Energy beam outlet area (s) corresponds to the minimum requirements for speed and / or pressure and / or homogeneity and / or dimensions (i.e. the spread), etc. This has the advantage, for example, that the energy beam outlet areas are not covered by a gas guiding element that could block an energy beam that strikes the construction site.
  • the gas distribution unit is supplied with gas through a gas supply line, the end section of which is arranged between at least two of the energy beam deflection units.
  • Another aspect of the present invention relates to a flow device for a plurality of energy beam outlet areas in an additive manufacturing device for additive manufacturing of a three-dimensional object by layer-by-layer application and selective solidification of a building material by irradiation by means of energy radiation
  • the flow device being a process chamber with a ceiling wall comprises, wherein the energy beam outlet areas are arranged in the top wall of the process chamber in a reference plane.
  • the flow device further comprises at least one gas distribution unit and a plurality of gas outlets for discharging a gas into the process chamber, the gas outlets being at least partially formed by the gas distribution unit, the gas distribution unit being at least in an operating position on the ceiling wall and within the process chamber from the ceiling wall or the reference plane emerges so that it protrudes into the process chamber.
  • the gas outlets are provided at least in the operating position of the gas distribution unit in an upper height region of the process chamber and are directed into the process chamber in such a way that gas at least partially sweeps over the reference plane during operation.
  • the top wall of the process chamber further comprises a number of top gas outlets for supplying the gas to the gas distribution unit, the top gas outlet or the top gas outlets in a bottom view, ie from the inside of the process chamber or from the construction field, of the top wall between at least two of the energy jet outlet areas is or are arranged.
  • the flow device preferably further comprises a gas supply line, the gas supply line comprising an end section opening into at least one of the ceiling gas outlets.
  • ceiling gas outlet means a passage through the process chamber ceiling, which allows a gas-conducting connection from a gas supply device to the gas distribution unit through the process chamber ceiling.
  • a ceiling gas outlet can be, for example, an opening in the process chamber ceiling and / or a gas supply line described above, in particular an end section of the gas supply line.
  • the opening cross section of the ceiling gas outlet or the ceiling gas outlets preferably has a maximum extension, for example a diameter or a longest diagonal, of at most 5 cm, more preferably of at most 3 cm, even more preferably of at most 1 cm, particularly preferably of at most 5 mm.
  • the term “arranged between at least two of the energy beam outlet regions” means that the ceiling gas outlet or the ceiling gas outlets is or are arranged completely within a minimally surrounding rectangle as a frame (“bounding box”), which encloses the at least two energy beam outlet regions.
  • the end section of the gas supply line preferably extends essentially perpendicular to the reference plane, ie preferably a main direction of extension, in particular a longitudinal direction, of the end section of the gas supply line extends essentially perpendicular to the reference plane.
  • the direction of extension of the end section is particularly preferably straight.
  • the term “essentially” expresses that deviations from the vertical of less than 20 °, preferably less than 10 °, are also included.
  • the end of the end section can include a ceiling gas outlet. On the one hand, this can lead to structural advantages, i.e. a smaller space requirement for the gas supply line, and on the other hand it can also improve the flow properties of the partial gas flows flowing into the process chamber through the gas distribution unit during operation, since the vertical end section represents a distance in which the homogeneity of the gas flow increases with length increases.
  • an end section whose length (ie extension perpendicular to the reference plane) is a multiple of its width (maximum dimension parallel to the reference plane) and / or whose cross-sectional area parallel to the reference plane is essentially constant over the length of the end section.
  • its length can be ten times, twenty times or thirty times its width.
  • a first number of gas outlets is preferably provided on a first side of the gas distribution unit and a second number of gas outlets is provided on a second side of the gas distribution unit opposite the first side.
  • each energy beam outlet area is preferably accurate in a bottom view of the top wall of the process chamber facing a gas outlet and more preferably a maximum extension of the gas outlet is greater than or equal to a maximum extension of the respective energy beam outlet region to which the gas outlet is facing.
  • a plurality of gas outlets are preferably facing a plurality of gas outlets, further preferably a maximum extension of an area of the gas distribution unit that is a minimally surrounding rectangle in which the gas outlets facing the respective energy outlets are completely arranged (also referred to as "bounding box”), is greater than or equal to a maximum extent of the respective energy beam outlet area to which the respective gas outlets face.
  • maximum extension of the gas outlet or area refers to the opening of the gas outlet or gas outlets. This can be a long side of a rectangular gas outlet opening or the rectangular area.
  • a maximum extension of the energy beam outlet area can e.g. B. be a diameter or a longest diagonal of the energy beam outlet region. In this way, for example, a width of the partial gas flow entering the process chamber can be achieved, which ensures reliable and / or complete overflow or flow through the respective energy beam outlet area.
  • the flow device preferably fulfills at least one, preferably at least two, of the following criteria:
  • the opening cross sections of the gas outlets have the same area and / or
  • the gas outlets have the same geometric shape and / or
  • the gas outlets are at the same minimum distance from the energy beam outlet areas assigned to them and / or
  • An average velocity of the partial gas flows emerging from the gas outlets during operation is at least 1 m / s, preferably at least 3 m / s, particularly preferably at least 5 m / s and / or
  • At least one gas outlet preferably all gas outlets, has an essentially rectangular cross section, one long side, preferably the
  • the gas outlets in the operating position of the gas distribution unit is / are arranged essentially parallel to the reference plane.
  • Deviations from a rectangular cross section can also include, for example, rounded corners and / or cutouts in the sides of the rectangle and / or an inclination and / or curvature of a side (in this case a tangent is formed).
  • the above-mentioned criteria can, for example, improve the distribution of the gas flowing into the process chamber from the gas distribution unit during operation to the energy beam outlet regions.
  • the gas outlets of the flow device can only be kept in the gas distribution unit.
  • the gas outlets can be formed in cooperation with the gas distribution unit in the operating position and the top wall of the process chamber. This provides two alternative embodiments for the gas outlets.
  • gas outlets held exclusively in the gas distribution unit it is understood that the gas outlets are completely enclosed by a wall of the gas distribution unit, ie are formed solely by the gas distribution unit (ie not in cooperation with the ceiling wall).
  • the flow device comprises exactly one ceiling gas outlet at one end of the end section of the gas supply line, with an area center of gravity in an orthogonal projection of the ceiling gas outlet and a total of the energy beam outlet areas in a same plane, more preferably in a plane essentially parallel to the construction field the sum of the projected areas of the energy beam outlet areas lies within the projected opening area of the ceiling gas outlet, more preferably is identical to a centroid of the projected opening area of the ceiling gas outlet.
  • the ceiling gas outlet is thus provided centrally between the energy jet outlet areas, which in turn ensures, for example, a uniform overflow of the energy jet
  • the gas distribution unit preferably comprises at least one gas inlet for introducing the gas into the gas distribution unit.
  • This can comprise, for example, an opening in the gas distribution unit and / or a gas line, preferably in the extension of the end section of the gas supply line, and is preferably provided in the operating position of the gas distribution unit on a side of the gas distribution unit facing the ceiling wall or the gas supply line or the ceiling gas outlet.
  • the at least one gas inlet of the gas distribution unit is further preferably connected in a gas-conducting manner to the end of the end section of the gas supply line or the ceiling gas outlet in the operating position of the gas distribution unit.
  • a gas supply to the gas distribution unit can thus be made possible, for example.
  • the gas-introducing function of the gas inlets and the gas-discharging function of the gas outlets of the gas distribution unit are separate from one another, ie the gas inlet (s) cannot also serve as gas outlets and vice versa.
  • the direction of flow of the gas is clearly defined during operation: the gas flows through the gas inlet or the gas inlets of the gas distribution unit into the gas distribution unit and through the gas outlets out of it and into the process chamber a.
  • the opening planes of at least one gas inlet, preferably all gas inlets, and the gas outlet omissions can be essentially perpendicular to each other.
  • the number of ceiling gas outlets or the end sections of the gas supply line (s) of the flow device is preferably matched, particularly preferably identical, to the number of gas inlets of the gas distribution unit.
  • the gas inlet or the gas inlets and / or the ceiling gas outlet or the ceiling gas outlets or the end section (s) are preferably designed or arranged in such a way that in the operating position of the gas distribution unit the positions of the gas inlets and the Ceiling gas outlets correspond with each other so that they connect directly to one another, for example.
  • the at least one gas inlet is further preferably arranged in a central section of the gas distribution unit, the extent of which in the direction of a maximum extent of the gas distribution unit corresponds to at most 30%, preferably at most 20%, particularly preferably at most 10% of the maximum extent of the gas distribution unit.
  • the middle section can be, for example, exactly the middle third, preferably exactly the middle fifth, further preferably exactly the middle tenth of the maximum extent of the gas distribution unit.
  • the flow device comprises exactly one gas inlet and at least two, preferably at least three, more preferably at least four, even more preferably at least six, even more preferably at least eight gas outlets.
  • a ratio of an opening cross-sectional area of the precisely one gas inlet to a sum of the opening cross-sectional areas of the gas outlets is selected as a function of a predefined outflow speed at which the gas exits the gas outlets during operation.
  • the outflow rate can be, for example, an average and / or minimum and / or maximum outflow rate.
  • the flow device comprises exactly one ceiling gas outlet at one end of the end section of the gas supply line and in an orthogonal projection of the gas inlet and the ceiling gas outlet in a same plane, preferably in a plane essentially parallel to the construction field, the center of gravity of the gas inlet of the gas distribution unit lies within the projected opening area of the ceiling gas outlet, preferably, the centroids of the gas inlet of the gas distribution unit and the ceiling gas outlet are identical.
  • the gas distribution unit further preferably comprises a number of cavities and the end section of the gas supply line or the ceiling gas outlet is in the operating position of the gas distribution unit in a designated direction of the gas flow within the flow device exclusively via at least one of the number of cavities with the gas outlets and / or with connected to the process chamber in a gas-conducting manner.
  • the at least one cavity can be structured, but is preferably not continuously separated from another cavity which is also connected in a gas-conducting manner to the gas inlet and / or the gas outlets. In this way, for example, a simple and / or inexpensive construction of the gas distribution unit can be provided.
  • At least one of the number of cavities comprises at least one section in which a cross section of the cavity tapers in a direction of extension of the cavity from the end section of the gas supply line to a gas outlet of the gas distribution unit, preferably to all gas outlets, preferably the taper in at least two, more preferably at least three, even more preferably at least four stages.
  • the tapering can be made continuously, ie continuously or in the mathematical sense following a smooth function. The taper can only be formed in a partial area of the cavity, ie two-dimensionally, in particular on a bottom of the cavity, ie the surface of the cavity that is most distant from the reference plane.
  • the taper can be designed over the entire cross-sectional area of the cavity, ie three-dimensionally.
  • the tapering can, for example, achieve the most uniform possible distribution of the gas to the gas outlets of the gas distribution unit.
  • the cavity in the operating position of the gas distribution unit is formed at least in a sectional plane parallel to the reference plane and is essentially axisymmetric and / or rotationally symmetrical.
  • a body of the gas distribution unit as a whole can also be essentially axially symmetrical and / or rotationally symmetrical, in particular the internal geometry of the cavity of the gas distribution unit.
  • the axis symmetry and / or rotational symmetry of the cavity or body of the gas distribution unit are preferably formed in a top view from below and / or above and / or in a sectional view of the gas distribution unit, the sectional view in the operating position in a horizontal plane and / or is formed in a plane parallel to the construction site.
  • a rotationally symmetrical configuration of the gas distribution unit it is particularly preferably designed such that the (virtual) axis of rotation runs through the center of gravity of the opening area of the gas inlet of the gas distribution unit.
  • the gas distribution unit can comprise a plurality of sections, in particular elongated sections, ie arms, which are identical and / or axially symmetrical and / or are arranged rotationally symmetrically relative to the gas inlet of the gas distribution unit.
  • the gas distribution unit preferably comprises a baffle plate and a number of feet or fastening elements, which more preferably corresponds to the number of energy beam outlet regions, the baffle plate being attachable by means of the feet to the ceiling wall or to the end section of the gas supply line or the ceiling gas outlet.
  • the baffle plate is further preferably spaced from the ceiling wall and arranged opposite a ceiling gas outlet or the end section of the gas supply line in such a way that the baffle completely covers the ceiling gas outlet or the end section in a bottom view of the process chamber wall. In a bottom view means from the construction site of the process chamber.
  • an orientation of an impact surface of the impact plate deviates from an orientation of the reference plane by at most 20 °, by at most 10 °, more preferably by at most 5 °, particularly preferably the impact surface is essentially parallel to the reference plane.
  • an orientation of a guide surface of the feet deviates from a perpendicular to the reference plane, preferably by at most 40 °, preferably by at most 30 °, more preferably by at most 20 °, particularly preferably the guide surface is essentially perpendicular to the reference plane.
  • the feet or their guide surface (s) preferably cause the inflowing gas volume to be divided into a plurality of partial gas volumes, which more preferably corresponds to the number of energy beam outlet areas and / or to limit the partial gas flows emerging into the process chamber by one Limit the exit angle of the partial gas flows.
  • the baffle of the baffle plate preferably causes a deflection of the gas stream flowing into the gas distribution unit and impinging on the baffle in a direction parallel to the reference plane.
  • the gas outlets of the gas distribution unit are preferably formed by the ceiling wall of the process chamber, the baffle plate and the feet.
  • a surface area of the baffle surface of the baffle plate is preferably greater than or equal to a cross-sectional area of the ceiling gas outlet.
  • This provides, for example, a simple and / or inexpensive embodiment of a gas distribution unit according to the invention.
  • the gas distribution unit and / or the ceiling wall of the process chamber and / or the end section of the gas supply line or the ceiling gas outlet preferably comprise or comprise an interface for releasably fastening the gas distribution unit to the ceiling wall of the process chamber and / or at the end section of the gas supply line.
  • This can be done, for example, as a mechanical connection by means of clips, latching, clamping, plugging, screwing, Velcro and / or as a chemical Connection by means of gluing and / or as a magnetic connection.
  • the gas distribution unit can be permanently attached to the ceiling wall and / or can be formed integrally with the ceiling wall.
  • the gas distribution unit is preferably detachably and / or pivotably and / or retractably arranged on the top wall of the process chamber. This means that the gas distribution unit can be brought into an operating position and into a rest position that is preferably spaced apart from the operating position, for. B. can be removed from the process chamber.
  • the gas distribution unit is preferably arranged in such a way that in the operating position of the gas distribution unit the exactly one ceiling gas outlet and the exactly one gas inlet of the gas distribution unit lie opposite one another or are coaxial with one another or connect to one another.
  • the flow device preferably further comprises at least one gas supply to which the gas distribution unit is connected at least in the operating position, the at least one gas supply feeding the gas distribution unit with inert gas and / or air and / or an ionized gas during operation.
  • An inert gas is particularly preferably used when the process chamber is closed and / or air and / or an ionized gas is used when the process chamber is open, ie in a period in which the additive manufacturing of the three-dimensional object does not take place in the additive manufacturing device.
  • the inert gas does not have to be 100% pure, but can comprise customary proportions of further gases, in other words is typically a gas mixture with a high proportion of inert gas.
  • the closed process chamber is defined, for example, in that a door of the process chamber is closed, e.g. B. for preparation and / or post-processing and / or implementation of an additive manufacturing process.
  • the open process chamber is defined, for example, in that the door of the process chamber is open, e.g. B. to carry out cleaning and / or maintenance work.
  • the gas supply can be a gas supply provided separately from a process gas supply of the additive manufacturing device.
  • the gas supply, to which the gas distribution unit at least is connected in the operating position a common process gas supply of the additive manufacturing device, from which a protective gas stream or process gas stream is generated in the process chamber during the additive manufacturing of the three-dimensional object.
  • the flow device preferably comprises exactly one gas distribution unit and / or the gas distribution unit is formed in one piece.
  • This provides, for example, a simple embodiment of a flow device.
  • An inventive flow method is used to generate a gas flow in a process chamber of a manufacturing device for additively manufacturing a three-dimensional object by applying layers and selectively solidifying a building material by irradiation by means of energy radiation, wherein a plurality of energy jet outlet areas in one in a ceiling wall of the process chamber of the additive manufacturing device Reference plane are arranged and a plurality of energy beam deflection units of the additive manufacturing device is arranged above the energy beam outlet regions.
  • the flow method comprises a step of discharging a gas through a plurality of gas outlets of a gas distribution unit into the process chamber, the gas outlets being at least partially formed by the gas distribution unit, and the gas distribution unit emerging from the ceiling wall or within the process chamber from the ceiling wall or the reference plane , so that it protrudes into the process chamber, the gas outlets of the gas distribution unit are provided in an upper height region of the process chamber and are directed into the process chamber in such a way that the gas at least partially sweeps over the reference plane, and the flow-through method comprises a step of supplying the gas at least one gas supply line, which is arranged above the ceiling wall, to the gas distribution Unit comprises, wherein an end portion of the gas supply line is arranged between at least two of the energy beam deflection units. It is thus possible, for example, to achieve the effects described above in relation to the flow device in a flow process.
  • the gas is preferably supplied to the gas distribution unit or the process chamber depending on an operating state of the additive manufacturing device when a manufacturing process of the three-dimensional object is interrupted and / or ended and / or when the process chamber is open and / or when a construction container or swap body from the additive manufacturing device is removed or introduced into this.
  • the gas distribution unit is preferably designed and arranged in the process chamber in such a way that a gas stream flowing into the gas distribution unit through the gas supply line is deflected and / or deflected such that the total volume flow of the inflowing gas stream is divided into a plurality of gas partial volume flows.
  • the partial gas volume flows are further preferably generated by the gas flowing out of the various gas outlets.
  • At least one first gas partial volume flow essentially has a predetermined first main flow direction or a predetermined first distribution of flow directions
  • at least one second gas partial volume flow essentially has a predetermined second main flow direction different from the first or a predetermined second flow direction Distribution different second distribution of flow directions and / or at least one first energy jet outlet area is assigned at least one first gas partial volume flow and at least one second gas jet outlet area is assigned at least one second gas partial volume flow.
  • An additive manufacturing device is used for the additive manufacturing of a three-dimensional object by applying layers and selectively solidifying a building material by irradiation by means of energy radiation, and comprises a process chamber with a ceiling wall, a plurality of Energy beam outlet areas are arranged in the ceiling wall in a reference plane and wherein a plurality of energy beam deflection units of the additive manufacturing device are arranged above the energy beam outlet areas, at least one gas distribution unit and a plurality of gas outlets for discharging a gas into the process chamber, the Gas outlets are at least partially formed by the gas distribution unit, and the gas distribution unit emerges from the ceiling wall or the reference plane at least in an operating position on the ceiling wall and within the process chamber, so that it projects into the process chamber, the gas outlets at least in the operating position of the gas distribution Unit are provided in an upper height area of the process chamber and are directed into the process chamber in such a way that during operation gas at least partially sweeps over the reference plane and at least one gas supply line for supply above the ceiling wall Ren of the gas to
  • a gas distribution unit is used for a plurality of energy jet outlet areas in a process chamber of an additive manufacturing device for the additive manufacturing of a three-dimensional object by applying layers and selectively solidifying a building material by irradiation by means of energy radiation, the energy jet outlet areas in a ceiling wall of the process chamber in a reference plane are arranged, a plurality of energy beam deflection units of the additive manufacturing device are arranged above the energy beam outlet regions and at least one gas supply line for supplying the gas to the gas distribution unit is arranged above the top wall of the process chamber, an end section of the gas supply line between at least two of the energy beam -Direction units is arranged.
  • the gas distribution unit is a gas distribution unit in a flow device described above.
  • the gas distribution unit at least partially forms a plurality of gas outlets for discharging a gas into the process chamber and the gas distribution unit is provided at least in an operating position on the ceiling wall and within the process chamber so that it emerges from the ceiling wall or the reference plane so that it projects into the process chamber, and the gas outlets are at least in an upper position in the operating position of the gas distribution unit Height range of the process chamber and are directed into the process chamber in such a way that gas at least partially sweeps over the reference plane during operation.
  • a gas distribution unit is thus provided, for example, with which an additive manufacturing device can be equipped or retrofitted in order to carry out a flow method described above.
  • FIG. 1 is a schematic view, partially in section, of an embodiment of a device according to the invention for additively producing a three-dimensional object.
  • FIGS. 2a and 2b are schematic views of a partially shown in section
  • FIG. 2a schematically showing a gas distribution unit according to a second embodiment of the invention, which is shown in FIG. 6, in an operating position
  • FIG. 2b schematically showing a gas distribution unit according to a first embodiment of the invention, which is shown in Figs. 4 and 5, shows in an operating position.
  • FIG. 3a is a schematic bottom view of a portion of the process chamber ceiling shown in FIGS. 1 through 2b with a gas distribution unit according to the first and second embodiments of the present invention in an operating position
  • FIG. 3b is a schematic view of the portion shown in FIG. 3a the process chamber ceiling according to a development of the gas distribution unit shown in FIG. 3a
  • 4 is a schematic perspective view of a gas distribution unit according to the first embodiment of the present invention.
  • FIG. 5 is a schematic sectional view of the gas distribution unit shown in FIG. 4 in an operating position.
  • FIG. 6 is a schematic perspective view of a gas distribution unit according to the second embodiment of the present invention.
  • FIG. 7 is a schematic bottom view of a portion of the process chamber ceiling shown in FIGS. 1 through 2b with a gas distribution unit according to a third embodiment of the present invention in an operating position.
  • FIGS. 1 to 2b are schematic views of a section of the process chamber ceiling shown in FIGS. 1 to 2b from below with various exemplary embodiments and possible arrangements of gas distribution units according to the invention.
  • FIG. 1 An example of an additive manufacturing device with which the present invention can be carried out is described below with reference to FIGS. 1 to 2b.
  • the device shown in FIG. 1 is a laser sintering or laser melting device 1.
  • an upwardly open container 5 with a container wall 6 is arranged.
  • a working level 7 is defined through the upper opening of the container 5, the area of the working level 7 which lies within the opening and which can be used for the construction of the object 2, being referred to as construction field 8.
  • the working level 7 and the construction field 8 are spaced a distance of the process chamber height T from the chamber ceiling 9 of the process chamber 3.
  • the process chamber height he T is also referred to as the maximum clear height of the process chamber, since a ceiling area of the process chamber 3 has a non-uniform height level, e.g. B. with sloping ceilings.
  • a carrier 10 Arranged in the container 5 is a carrier 10 which can be moved in a vertical direction V and on which a base plate 11 is attached, which closes the container 5 at the bottom and thus forms the bottom thereof.
  • the base plate 11 may be a plate formed separately from the carrier 10, which is fixed to the carrier 10, or it may be formed integrally with the carrier 10.
  • a building platform 12 can be attached to the base plate 11 as a building base on which the object 2 is built.
  • the object 2 can also be built on the base plate 11 itself, which then serves as a construction document. 1 shows the object 2 to be formed in the container 5 on the building platform 12 below the working level 7 in an intermediate state with a plurality of solidified layers, surrounded by building material 13 which has remained unconsolidated.
  • the laser sintering device 1 further contains a storage container 14 for a powdery building material 15 which can be solidified by electromagnetic radiation and a coater 16 which can be moved in a horizontal direction H for applying the building material 15 within the building field 8.
  • the coater 16 extends across the whole direction of movement area to be coated.
  • At least one process gas inlet 18a is provided for generating a process gas flow in the process chamber 3, in particular in a region of the process chamber 3 between the construction field 8 and the chamber ceiling 9.
  • At least one process gas outlet 18b is preferably also provided in the process chamber 3, the process gas inlet 18a and the process gas outlet 18b preferably being provided at opposite ends of the process chamber 3, so that a directed process gas stream 28 can be passed through the process chamber 3.
  • the process gas inlet 18a and the process gas outlet 18b are not shown via te gas supply and discharge channels connected to a process gas supply device, also not shown.
  • a gas distribution unit 17, 17 ', 117 for generating a clean gas flow is arranged in the process chamber 3 below the process chamber ceiling 9. 1, 2a and 2b, the gas distribution unit 17, 17 ', 117 is in each case arranged in an operating position in the process chamber 3 in which it can or would be operational.
  • the gas distribution unit 17, 17 ', 117 can directly adjoin the underside of the chamber ceiling 9 (see FIG. 2b) or, as shown in FIGS. 1 and 2a, be spaced apart from it and will continue to be described in more detail below with reference to FIGS. 3a to 8g.
  • the gas distribution unit 17, 17 ', 117 is arranged in an upper flute area of the process chamber, for example in an uppermost fifth of the process chamber height T.
  • the gas distribution unit 17, 17 ', 117 comprises a gas inlet 26 (not shown in FIG. 1), which is connected in a gas-conducting manner to an end section 61 of a gas supply line 60 (see FIGS. 2a, 2b).
  • the gas supply line 60 communicates with a clean gas supply device (not shown) and a clean gas supply (not shown).
  • the clean gas supply device can be identical to the process gas supply device or can be provided as a separate gas supply device. Likewise, the clean gas supply can be provided identically to a process gas supply or provided separately from it.
  • the gas distribution unit is preferably formed in one piece.
  • a radiation heater is arranged in the process chamber 3, which serves to heat the applied building material 15.
  • a radiation heater is arranged in the process chamber 3, which serves to heat the applied building material 15.
  • an infrared radiator can be provided as the radiant heater.
  • the laser sintering device 1 also contains an exposure device 20 with a plurality of, in FIG. 1, two lasers, ie a first laser 21a and a second laser 21b.
  • the first laser 21a generates a first laser beam 22a, which is deflected by a first deflection device 23a and by a first focusing device, both for example, a first F-theta lens 24a is projected onto the working plane 7 via a first coupling window (first energy beam outlet area) 25a, which is attached to the top of the process chamber 3 in the process chamber ceiling 9.
  • the second laser 21b generates a second laser beam 22b, which is deflected via a second deflection device 23b and projects through a second focusing device, for example a second F-theta lens 24b, via a second coupling window (second energy beam outlet area) 25b onto the working plane 7 becomes.
  • the respective elements can be grouped as two separate exposure units 20a, 20b, the first exposure unit 20a comprising the elements shown on the left in FIG. 1 and marked with the suffix "a" and the second exposure unit 20b comprises the elements shown on the right in FIG. 1 and marked with the suffix "b".
  • the exposure units 20a, 20b are arranged in two different and spaced apart housing sections and are also referred to as “energy beam deflection units”.
  • At least one of the exposure units 20a, 20b can also comprise only one or a part of the elements mentioned.
  • the exposure device 20 can also comprise only a laser that generates a laser beam, which is then divided into two or more laser beams by a beam splitter.
  • the exposure device 20 can be designed such that the areas of incidence of the two laser beams 22a, 22b in the working plane 7 can each reach the entire construction field 8.
  • the construction field 8 can also be divided into processing areas, each of which is assigned a laser and which can partially overlap.
  • the device 1 can have further exposure units which are not visible in the sectional view shown in FIG. 1 and which are preferably arranged and / or designed similarly to the exposure units 20a, 20b shown in FIGS. 2a, 2b.
  • the device 1 can have a total of four or six exposure units include.
  • the coupling windows can each be separate windows in the process chamber ceiling 9, as shown in FIGS. 1, 2a and 2b.
  • each coupling window or at least a partial area of each coupling window is also referred to as the energy beam outlet area.
  • one or more coupling windows to be provided in the process chamber ceiling 9, with a plurality of laser beams from the exposure device 20 entering the process chamber 3 through at least one of the coupling windows.
  • each laser or each laser beam is preferably assigned a partial area (energy beam outlet area) of a coupling window through which the laser beam enters the process chamber 3. Therefore, the following is the general name
  • an energy beam outlet area can denote an entire coupling window or only a partial area of a coupling window.
  • the surfaces A of the energy beam outlet regions 25a, 25b facing the interior of the process chamber 3 lie in a common plane, which is referred to as reference plane R. 2a, 2b, the reference plane R is at the same time the underside 19, i. H. the side facing the interior of the process chamber 3, the process chamber ceiling 9.
  • the reference plane R can also be spaced from the underside 19 of the process chamber ceiling 9 and, for example, be offset into the process chamber 3 or upwards from the interior of the process chamber 3, i. H. into the process chamber ceiling 9. 1, 2a, 2b, the gas distribution unit 17, 17 ',
  • 117 is arranged in the operating position in the process chamber 3 such that it emerges from the ceiling wall 9 or the reference plane R, so that it projects into the process chamber 3.
  • An end section 61 of a gas supply line 60, not shown in the figures, above the process chamber ceiling 9 extends essentially perpendicular to the reference plane R and is provided between the exposure units 20a, 20b, preferably centrally between the exposure units 20a, 20b.
  • the end section 61 is passed through the process chamber ceiling 9 and ends in the plane the underside 19 of the process chamber ceiling 9, in this case in the reference plane R, in a ceiling gas outlet 27.
  • the ceiling gas outlet 27 is provided between, preferably centrally between, the energy beam outlet regions 25a, 25b.
  • the gas distribution unit 17, 117 can directly connect to the ceiling gas outlet 27 (see FIG. 2b). In this case there is a gas inlet 26 of the gas distribution unit 17,
  • a gas inlet 26 of the gas distribution unit 17 ' can be provided, which connects directly to the ceiling gas outlet 27 in order to supply the gas to the gas distribution unit 17' during operation of the gas supply device.
  • the gas inlet 26 of the gas distribution unit 17 ′ is preferably designed as a further gas line, more preferably as an extension of the end section 61, so that a cross-sectional area of the end section 61 and the gas inlet 26 is essentially constant over the entire length s of the end section and the length of the gas inlet and an extension direction of the end section 61 and an extension direction of the gas inlet 26 perpendicular to the reference plane R are identical.
  • the end section 61 Perpendicular to the reference plane R, d. H. in the longitudinal direction of the end section 61, the end section 61 extends straight over a length s which is a multiple (eg ten or twenty times) of its maximum extension d parallel to the reference plane R.
  • a cross-sectional area of the end section 61 perpendicular to its length s is preferably constant over the entire length s.
  • the end section 61 can be, for example, a tubular line section with a round cross-sectional area, the maximum extent d being the diameter of the round cross-sectional area.
  • the laser sintering device 1 shown in FIG. 1 contains a control unit 29, via which the individual components of the device 1 are controlled in a coordinated manner in order to carry out the construction process.
  • the control unit can also be attached partially or entirely outside the device 1.
  • the control unit can contain a CPU, the operation of which is controlled by a computer program (software).
  • the computer program can be separate from the device 1 be stored on a storage medium from which it can be loaded into the device 1, in particular into the control unit.
  • the carrier 10 is first lowered by a height which corresponds to the desired layer thickness.
  • the coater 16 first moves to the storage container 14 and takes from it a sufficient amount of the building material 15 to apply a layer. Then he drives over the building site 8, applies powdered building material 15 there to the building base or an already existing powder layer and pulls it out into a powder layer.
  • the application takes place at least over the entire cross section of the object 2 to be produced, preferably over the entire construction field 8, that is to say the area delimited by the container wall 6.
  • the powdery building material 15 is heated to a working temperature by means of radiant heating.
  • the cross section of the object 2 to be produced is then scanned by the laser beam 22, so that the powdery building material 15 is solidified at the points which correspond to the cross section of the object 2 to be produced.
  • the powder grains are partially or completely melted at these points by means of the energy introduced by the radiation, so that after cooling they are connected to one another as solid bodies. These steps are repeated until the object 2 is finished and can be removed from the process chamber 3.
  • a process gas is supplied to the process chamber 3 through the process gas inlet 18a and is removed again from the process chamber 3 through the process gas outlet 18b.
  • a process gas stream 28 is thereby created.
  • the process gas inlet 18a and the process gas outlet 18b are arranged in a lower, that is to say near the construction site, height region of the process chamber 3, so that the process gas stream 28 essentially through an area of the process chamber 3 which is close above the construction site 8 lies, flows to z.
  • B. Remove smoke, gases and / or condensate from this area.
  • a further process gas stream or at least a partial stream of the further process gas stream is passed over an area of the process chamber 3 which is close to the energy jet outlet areas 25a, 25b or away from the construction field 8, in order to protect the energy jet outlet areas from contamination.
  • the process gas is, for example, a protective gas or protective gas mixture which is essentially inert to the building material under the conditions prevailing when the object 2 is manufactured, e.g. an inert gas or nitrogen.
  • a protective gas or protective gas mixture which is essentially inert to the building material under the conditions prevailing when the object 2 is manufactured, e.g. an inert gas or nitrogen.
  • air or mixtures of different gases is also possible.
  • gas is at least temporarily supplied to the process chamber 3 through the gas distribution unit 17, 17 ', 117.
  • This clean gas flow (not shown in FIGS. 1, 2a and 2b) can be supplied to the process chamber, for example, when it is open (for example in order to insert and / or remove a construction container 5 designed as an interchangeable container) and / or before or after production of the three-dimensional object 2 and / or when the production process is interrupted.
  • a clean gas flow is generated at a flow rate of at least 1 m / s, preferably at least 3 m / s, more preferably at least 5 m / s.
  • the clean gas flow preferably flows essentially through an upper height range of the process chamber 3, for example at most a range of an upper tenth of the process chamber height T.
  • the desired effects occur with a thickness, ie. H. a vertical extension of the clean gas flow on a horizontal surface of a coupling window of a few centimeters.
  • an upper speed threshold is set, which is 10% of the maximum flow rate of the clean gas flow.
  • the clean gas flow is at least at a section (energy beam outlet area) of the process chamber-side surface facing the construction field 8 A is guided along in the reference plane R of the coupling window (s).
  • the section advantageously has an extent within which electromagnetic radiation and / or particle radiation passes through the coupling window during the manufacture of an object and melts the building material. Outside this actually used area of the coupling window, cleaning or keeping it free by means of the clean gas flow is not absolutely necessary, since radiation that crosses this area does not strike the construction site or is used to produce the object.
  • the clean gas flow can be designed, for example, in two ways. According to the first variant, it flows over the surfaces A of the energy beam outlet regions 25a, 25b at a distance without touching the surfaces A itself, so that a kind of protective screen or curtain is formed in front of the surface, which keeps contaminants away from it.
  • the cleaning gas stream contacts the surfaces A of the energy beam outlet regions 25a, 25b, so that it not only prevents particles from touching or adhering to the surfaces A, but also transports contaminants away from the surfaces A, i. H. the clean gas flow can be directed towards the surfaces A, for example.
  • a gas stream that leaves an opening of the gas distribution unit 17, 17 ', 117, not shown in FIGS. 1 to 2b, parallel to the surfaces A of the energy beam outlet regions 25a, 25b and at a distance from it can also , hit the surfaces A diagonally after a short distance and then flow along them in constant contact.
  • ambient air in particular ionized air
  • the clean gas can also be an inert gas or an inert gas mixture or another gas used as a process gas and / or an ionized gas.
  • the process gas flow and the clean gas flow can be controlled separately by the control unit 29 and / or at least partially have separate feed lines.
  • gene ie they can be fed to the process chamber 3 independently of one another. As described above, they can be fed from the same gas reservoir or from different gas reservoirs.
  • Operation of the gas distribution unit 17, 17 ', 117 without protective gas is possible in particular if the production process is not running or is interrupted or ended.
  • the clean gas flow is preferably switched off during the production of the three-dimensional object, but at least during the selective solidification of the building material. Operation of the gas distribution unit 17, 17 ', 117 with protective gas is particularly necessary if the clean gas flow is generated during the manufacturing process.
  • Fig. 3a shows a view of a gas distribution unit 17, 17 'according to a first and second embodiment of the invention, which will be described later with reference to Figs. 4, 5 and 6 when the gas distribution unit 17, 17' in the operating position in the Process chamber 3 is arranged.
  • Fig. 3a is a bottom view of the gas distribution unit, i.e. from the construction site 8 or the interior of the process chamber 3.
  • the gas distribution unit 17, 17 ' is arranged between four energy beam outlet regions 25a, 25b, 25c, 25d provided in the process chamber ceiling 9, each energy beam outlet region 25a, 25b, 25c, 25d facing the inside of the process chamber 3 (ie to the construction field 8).
  • pointing surface A The surfaces A lie in the reference plane R (see FIGS.
  • An energy beam outlet region 25a, 25b, 25c, 25d can, as described above, comprise an entire coupling window or only a partial region of a coupling window through which at least one laser beam enters the process chamber during the manufacture of an object.
  • the surfaces A of the energy beam outlet regions 25a, 25b, 25c, 25d shown in FIG. 3a each have a rectangular outline and are spaced apart from one another within a rectangular outline in the process chamber ceiling 9 such that they are separated from one another by a cruciform intermediate region (ie two energy beam outlet areas are next to each other and in Top view arranged one below the other).
  • the energy beam outlet regions 25a and 25b thus form a first (upper) line of energy beam outlet regions (in the x direction) and the energy beam outlet regions 25c and 25d form a second (lower) line (in the x direction).
  • the energy beam outlet regions 25a and 25c form a first (left) column (in the y direction) and the energy beam outlet regions 25b and 25d form a second (right) column (in the y direction).
  • the gas distribution unit 17, 17 ' is arranged parallel to the lines, ie in the x direction, in such a way that it does not cover the energy beam outlet regions 25a, 25b, 25c, 25d, at least in a plan view, that is, it extends over a width B (in the y direction) which is smaller than or equal to the distance between the first and the second line of energy beam outlet regions.
  • the gas distribution unit 17, 17 ' has a dimension L in the longitudinal direction perpendicular to its width B, i. H. in the x-direction, the dimension L essentially preferably corresponding to the total width of the two columns of energy beam outlet regions (with an intermediate space).
  • the dimension L is preferably not an outer dimension of the gas distribution unit itself, but rather relates to a dimension and / or arrangement of gas outlet openings of the gas distribution unit.
  • the gas inlet 26 of the gas distribution unit 17, 17 ' is shown schematically in section in FIG. 3a, which is provided in the middle between the energy beam outlet regions 25a, 25b, 25c, 25d.
  • the gas inlet 26 is preferably central, i. H. centrally, on the gas distribution unit 17, 17 'provided with respect to the extension of the gas distribution unit in its longitudinal direction.
  • the gas inlet 26 divides the gas distribution unit 17, 17 'in its longitudinal direction into two arms 170d, 170b, which are preferably formed symmetrically to one another with the gas inlet 26 as a center of symmetry.
  • FIG. 3a is schematically by arrows the clean gas flow or partial gas flows flowing in from the gas distribution unit 17, 17 'into the process chamber 3 during operation, and from the gas distribution unit 17, 17' into the process chamber during operation 3 flow in and form the clean gas flow, shown.
  • the gas distribution unit 17, 17 ' is designed in such a way that the gas flows into the process chamber 3 on both sides, ie on opposite sides of the gas distribution unit 17, 17' with respect to its longitudinal extent.
  • all of the energy beam inlet regions 25a, 25b, 25c, 25d are flowed over or flowed over by the clean gas flow.
  • FIG. 1 is schematically by arrows the clean gas flow or partial gas flows flowing in from the gas distribution unit 17, 17 'into the process chamber 3 during operation, and from the gas distribution unit 17, 17' into the process chamber during operation 3 flow in and form the clean gas flow, shown.
  • the gas distribution unit 17, 17 ' is designed in such a way that the gas flows into the process chamber 3 on both sides, ie
  • the energy beam inlet regions 25a, 25c of the first (left) column are overflowed by gas which in operation emerges from the left arm 170d of the gas distribution unit 17, 17 'and the energy beam inlet regions 25b, 25d of the The second (right) column is overflowed by gas, which in operation emerges from the right arm 170b of the gas distribution unit 17, 17 '.
  • FIG. 3b shows a development of the gas distribution unit 17, 17 'shown in FIG. 3a in a view from below, that is to say from FIG. H. from the construction site 8 or the interior of the process chamber 3.
  • the gas distribution unit 17, 17 'shown in FIG. 3b differs from the gas distribution unit shown in FIG. 3a in that it has four arms 170a to 170d, i. H. two additional arms 170a, 170c.
  • the four arms 170a to 170d are arranged in a cross shape, i. H. Adjacent arms essentially form a right angle with one another.
  • the gas inlet 26 is provided centrally in the crossover area of the arms 170a to 170d.
  • each of the four arms 170a to 170d of the gas distribution unit 17, 17 ' is provided between two of the energy beam outlet regions 25a, 25b, 25c, 25d, so that each energy beam outlet region is in operation of the gas distribution unit 17, 17' 25a, 25b, 25c, 25d is flowed over from two directions, which essentially enclose an angle of 90 ° with one another, as shown schematically by arrows in FIG. 3b.
  • FIG. 4 A first exemplary embodiment of a gas distribution unit is described below with reference to FIGS. 4 and 5.
  • the gas distribution unit 17 shown in FIG. 4 comprises a body 31, which is shown in perspective in FIG. 4 and in a sectional view in FIG. 5.
  • Fig. 4 shows the body 31 of the gas distribution unit 17 as a separate provided element, while the gas distribution unit 17 is shown in the view shown in FIG. 5 in an operating position, ie when it is arranged in its intended operation in the process chamber 3.
  • the body 31 is provided directly below the underside 19 of the process chamber ceiling 9 (see also FIG. 2b).
  • the body 31 comprises a cavity, which is referred to below as the deflection chamber 32.
  • the deflection chamber 32 is delimited at the bottom by a deflection chamber floor which is formed in the body 31 and, in the operating position (see FIG. 5), is delimited at the top by the process chamber ceiling 9 or its underside 19.
  • the deflection chamber 32 is in the operating position in a gas-conducting manner with the gas supply line 60 (not shown in FIGS. 4 and 5).
  • the ceiling gas outlet 27 also forms the gas inlet 26 of the gas distribution unit 17.
  • the body 31 extends from a first end E1 to a second end E2 over a length G and is essentially elongated, i. H. the length G is greater than a dimension (width B) of the body 31 transverse to the longitudinal direction G.
  • the body 31 comprises, in addition to the deflection chamber 32, a wall 35 which laterally delimits it and which is formed at the ends E1 and E2 as well as in the middle in relation to its length G.
  • the elevations 40 at the ends E1, E2 and the central elevations 49 serve as fastening points for attaching the deflection chamber 32 to the underside 19 of the process chamber ceiling 9.
  • the wall sections lying between the lateral elevations 40 and the central elevations 49 thus do not touch the underside 19 of the chamber ceiling 9 and thus form gas outlets in the form of slot-shaped openings 30 between the underside 19 and the deflection chamber wall 35 when the gas distribution unit 17 is in the operating position in the process chamber 3 is attached (see FIG. 5).
  • the central elevations 49 of the wall 35 are when gas is attached to the chamber ceiling 9
  • Distribution unit 17 is arranged in relation to the longitudinal direction G at the level of the ceiling gas outlet 27, so that the slot-shaped openings 30 are located in the longitudinal direction G of the deflection device 31 in front of or behind the ceiling gas outlet 27, ie the gas inlet 26.
  • the deflection chamber 32 thus forms the only gas-conducting connection from the ceiling gas outlet 27 or the gas inlet 26 of the gas distribution unit 17 to the gas outlets, ie the slot-shaped openings 30.
  • the slot-shaped openings 30 directly adjoin the underside 19 of the process chamber ceiling 9, ie the reference plane R, on. Due to their vertical extent, ie perpendicular to the reference plane R, the major part of the opening cross-sectional area of the openings 30 is spaced from the reference plane 30.
  • the openings 30 also have a substantially rectangular cross section, the long sides of the openings 30 being arranged essentially parallel to the reference plane R in the operating position of the gas distribution unit 17.
  • a maximum extension of the slot-shaped openings 30 extends essentially over the length L of a row of energy beam outlet regions parallel to the latter.
  • a horizontal extension of the central elevations 49 of the wall 35 between the slit-shaped openings 30 in the operating position of the gas distribution unit 17 preferably corresponds essentially to the distance between two energy beam outlet regions 25a and 25b or 25c and 25d of a row (the distances in FIG x direction).
  • the arrangement and extension of the slot-shaped openings 30 is thus adapted to the arrangement of the surfaces A of the energy beam outlet regions 25a to 25d in the x / y direction on the process chamber ceiling 9 and to their horizontal extension.
  • the bottom of the deflection chamber 32 which delimits the deflection chamber 32 downwards (in FIG. 4 and in the operating position shown in FIG. 5), is step-shaped.
  • the stepped deflection chamber floor is characterized by horizontal floor sections 41, 42, 43 and formed by vertical bottom portions 44, 45, 46 provided between them.
  • the horizontal base sections 41, 42 and 43 are each spaced apart from the underside 19 of the chamber ceiling 9 by a height S1, S2 and S3, the heights S1, S2, S3 of the base sections being arranged from the central one below the gas inlet 26 Remove the bottom section 41 towards the front and rear bottom sections 43 in the longitudinal direction G (ie towards the ends E1 and E2).
  • the vertical sections 44, 45, 46 each connect two floor sections, so that a stepped deflection chamber floor is formed.
  • Both the body 31 of the gas distribution unit 17 and the deflection chamber 32 are thus symmetrical (axisymmetric with respect to a perpendicular to the reference plane R through a center of gravity of the gas inlet 26).
  • gas in the form of a gas stream 50 is supplied to the gas distribution unit 17 through the gas inlet 26 or the ceiling gas outlet 27, which gas thus reaches the deflection chamber 32.
  • This preferably takes place at least temporarily when the manufacturing process of the three-dimensional object 2 has been interrupted or ended.
  • the gas stream 50 is directed continuously or continuously towards the central base section 41, its main flow direction being essentially perpendicular to the base section 41. Due to this geometric arrangement, the beam 50 penetrating into the deflection chamber 32 is deflected uniformly in the longitudinal direction G toward the opposite ends E1, E2, which are each at the same distance from the gas inlet 26.
  • the vertical sections 44, 45, 46 each deflect partial flows upward towards the openings 30, where the partial flows each strike the underside 19 of the process chamber ceiling 9 and again laterally (ie parallel to the underside 19) in the direction of the openings 30 get distracted.
  • Flow vortices on the vertical sections 44, 45, 46 do not deflect the entire partial gas volume impinging on the respective vertical section upwards, ie towards the process chamber ceiling 9. Rather, the flow vortices cause partial gas volumes to flow towards the ends E1, E2.
  • different partial flows of the gas flow 50 entering the deflection chamber 32 are in each case substantially verticalized on the vertical sections 44, 45, 46. Kal deflected upwards to the chamber ceiling 9.
  • the description of the flow profiles is largely schematic and greatly simplifies an actual spreading and direction of the flow within the process chamber up to its exit.
  • the shape and dimensions of the deflection chamber can be symmetrical, so that a flow of gas that has flowed in can be divided into four approximately equal gas volumes with a similar speed profile, a degree of homogeneity in the distribution of the volume flow or the speed of the escaping gas over the surface of the opening cross-section is increased in a targeted manner by a multiple deflection of the gas flow within the deflection chamber, since this extends the length of time that the gas stays within the deflection chamber on its way through the deflection chamber.
  • the stepping of the deflection chamber floor leads to a staggered and thus uniform deflection of the gas towards the process chamber ceiling over the longitudinal extent of the slots.
  • the stepping thus reduces a tendency for an excessive volume flow at the outermost ends of the deflection chamber 32.
  • Due to the staggered and continuous upward flow towards the process chamber ceiling the gas in each arm of the deflection chamber becomes continuously parallel in one direction after impacting the underside 19 of the process chamber ceiling 9 pushed away to the process chamber ceiling.
  • the partial gas flows then escape through the slots 30 into the process chamber, in which the ambient pressure is considerably lower than in the deflection chamber.
  • a main flow direction of the partial gas flows is approximately horizontal.
  • a gas outlet essentially parallel to the underside 19 occurs through the slot-shaped openings 30.
  • the clean gas flow thus generated flows at least partially along the surfaces A of the energy beam outlet regions 25a, 25b, 25c, 25d.
  • the clean gas flow preferably flows through at most a region of an upper tenth of the process chamber height T.
  • Exactly one gas outlet 30 faces each energy beam outlet region 25a, 25b, 25c, 25d (see FIG. 3a).
  • a maximum extension of the gas outlet 30 in the longitudinal direction L is greater than or equal to the maximum extension of the respective one Energy beam outlet region 25a, 25b, 25c, 25d, which the gas outlet 30 faces, so that the entire area A of the energy beam outlet region is flowed through.
  • FIG. 6 shows a second exemplary embodiment of a gas distribution unit 17 ′, which comprises a body 3T and a gas inlet 26 connected to the body 3T, for example in the form of a tubular line section.
  • the gas inlet 26 is connected to the clean gas supply (not shown) during operation of the gas distribution unit 17 'or in its operating position on the process chamber ceiling 9 of the manufacturing device 1 via the end section 61 and the gas supply line 60 (see FIG. 2a).
  • the body 3T extends from a first end E1 to a second end E2 over a length G 'and is essentially elongated, i. H. the length G 'is greater than a dimension (width B) of the body 3T transverse to the longitudinal direction G'.
  • the body 3T of the gas distribution unit 17 'shown in FIG. 6 is tubular or a hollow profile. At the ends E1, E2, elevations 40 'serving as fastening sections are provided for releasably fitting and / or fastening the gas distribution unit 17' to the underside 19 of the chamber ceiling 9. As a result, the body 3T is spaced from the chamber ceiling 9 when the gas distribution unit 17 ' is attached to the chamber ceiling 9 in the process chamber 3.
  • the gas inlet 26 is provided in relation to the longitudinal extent G 'centrally on the upper side of the body 3T (ie in an operating position in the manufacturing device facing the process chamber ceiling 9).
  • the gas inlet 26 is arranged centrally on the gas distribution unit 17 'in such a way that its gas-conducting interior is symmetrical in shape and size, with one The axis of symmetry intersects the gas inlet in the middle.
  • the gas distribution unit 17 ' comprises a plurality of preferably circular openings 33, which are each arranged on one side (i.e. in FIG. 6 a forward and a rearward side) of the deflection device along the longitudinal direction G'.
  • the openings 33 of which only the openings arranged on the forward-facing side of the body can be seen in FIG. 6, are arranged on each side of the body over a distance of length L, a central region of the body 3T around the Gas inlet 26 is recessed around openings 33.
  • This central region, which is left free of openings, preferably essentially corresponds to the distance between two energy beam outlet regions 25a and 25b or 25c and 25d of a row in the arrangement of the gas distribution unit 17 ′ shown in FIG.
  • the length L over which the circular openings 33 are arranged preferably corresponds essentially to the length of a row of energy beam outlet regions (cf. FIG. 3a).
  • the arrangement of the openings 33 is thus adapted to the arrangement and horizontal extent of the surfaces A of the energy beam outlet regions of the chamber ceiling.
  • the openings 33 are connected to the gas inlet 26 via a cavity provided in the interior of the tubular body 3T.
  • gas is supplied to the gas distribution unit 17 'through the gas inlet 26, which gas thus enters the cavity of the body 3T. It then emerges from the cavity through the openings 33 in the form of a clean gas flow, which flows along the surfaces A of the energy beam outlet regions 25a, 25b, 25c, 25d (see FIG. 3a) and preferably touched them.
  • the clean gas flow emerges at a distance from the surfaces A of the energy beam outlet regions essentially parallel to the underside 19 of the process chamber ceiling 9.
  • the average velocity of the clean gas flow is determined in particular by the cross-sectional area of the openings 33 and the volume flow with which the gas is fed through the gas inlet 26 to the gas distribution unit 17 '.
  • the body 31' of the gas distribution unit 17 ' comprises a row of openings interrupted in the middle at opposite points on the lateral surface of its cylindrical hollow space 33.
  • “Opposite” in this context means that there is a distance between two openings from different lines that corresponds at least to the diameter of the cylinder.
  • Such a gas distribution unit 17 'thus basically fulfills the same function as a gas distribution unit 17 according to FIGS. 4 and 5, which is also designed to flow or flow over four separate surfaces A with the clean gas flow.
  • the gas distribution unit 17, 17 'shown in FIGS. 4 and 5 and / or the one shown in FIG. 6 can also be designed to move each of the surfaces of the four energy beam outlet regions 25a, 25b, 25c, 25d from two directions that are one with the other enclose right angle to flow (see Fig. 3b).
  • the two additional arms are identical to the arms shown in FIGS. 4, 5 and 6 and are arranged at a right angle to them, as already described above with reference to FIG. 3b.
  • FIG. 7 shows a third exemplary embodiment of a gas distribution unit 117.
  • the gas distribution unit 117 is arranged centrally between four circular energy beam outlet regions 125a, 125b, 125c, 125d with surfaces A pointing towards the construction field 8.
  • the surfaces A of the energy beam outlet regions are arranged in the reference plane (not shown in FIG. 7).
  • the energy beam outlet areas 125a, 125b, 125c, 125d are arranged fourfold in a rotationally symmetrical manner in the process chamber ceiling 9, the pivot point simultaneously corresponding to the center point of a circular cross section of the ceiling gas outlet 27, which is provided in the process chamber ceiling 9 (see also FIGS. 2a, 2b).
  • the ceiling gas outlet 27 is, as shown in FIG. 7, arranged in the middle between the surfaces A of the energy beam outlet regions 125a, 125b, 125c, 125d.
  • the gas distribution unit 117 comprises a baffle plate 131, which in this example is designed as a square plate and is arranged below the ceiling gas outlet 27 in the process chamber 3 at a distance from this and thus also from the reference plane R.
  • the baffle plate 131 is designed and arranged in the process chamber 3 such that it completely covers the ceiling gas outlet 27 in a bottom view of the process chamber ceiling 9 (i.e. viewed from the construction site), as shown in FIG. 7.
  • a baffle surface (not shown) of the baffle plate 131 lying opposite the ceiling gas outlet 27 is preferably arranged essentially parallel to the reference plane R.
  • a gas flow through the ceiling gas outlet 27 is directed essentially perpendicularly onto the baffle plate 131 and is deflected by the baffle plate essentially parallel to the baffle surface of the baffle plate 131.
  • the clean gas flow thus generated flows along the surfaces A of the energy beam outlet regions 125a, 125b, 125c, 125d.
  • a number of feet 132 can be arranged in the ceiling gas outlet 27 or between the ceiling gas outlet 27 and the baffle plate 131.
  • B. is identical to the number of surfaces to be flowed or overflowing the energy beam outlet areas.
  • the guide surfaces of the feet 132 are preferably arranged essentially perpendicular to the reference plane. In the example shown in FIG.
  • four feet 132 are provided which are arranged at right angles to one another so that they form an isosceles cross.
  • the center of the cross ie the area in which the four feet meet, lies in an orthogonal projection of the baffle plate 131, the feet 132 and the ceiling gas outlet 27 in a common plane, preferably a plane parallel to the construction field, in the projected area of the ceiling gas outlet 27 and in the projected area of the baffle plate 131.
  • the center of the cross in the orthogonal projection is preferably identical to a centroid of the ceiling gas outlet 27 and a centroid of the (baffle surface of the) baffle plate 131.
  • the cross legs or the individual feet 132 are preferably opposite the sides of the here shown square baffle plate 131 in a plan view or in the orthogonal projection rotated by 45 °.
  • a narrow side of the cross lies opposite the opening of the ceiling gas outlet 27 and is therefore opposed to the incoming gas flow in a flow-favorable manner.
  • the feet 132 or their guide surfaces ensure a more reliable and stable and more precise volume distribution of the inflowing gas volume during operation and give the free jet at a distance between the ceiling gas outlet 27 and the baffle plate 131 a lower susceptibility to faults which, for. B. caused by an uneven flow profile (volume flow or speed) of the incoming gas flow or by uncontrolled cross-currents that deflect the free jet laterally.
  • the gas outlets of the gas distribution unit 117 are formed by the process chamber ceiling 9, the baffle surface of the baffle plate 131 and the guide surfaces of the feet 132.
  • the feet 132 are preferably further as fastening elements for the releasable application and / or fastening of the baffle plate 131 to the underside 19 of the chamber ceiling 9 or on the end section 61 of the gas supply line 60 or the ceiling gas outlet 27.
  • a blocking element (not shown) can be provided at each corner of the square baffle plate 131, which limit a spectrum of radiation directions or a maximum radiation angle of the clean gas flow.
  • the blocking elements limit a theoretically possible radiation angle of 360 ° to four separate angular ranges (segments) which, for. B. be 70 ° or 80 °. This makes it possible to define an emission angle of the clean gas flow so that at least in one direction transverse to the central flow direction in each segment no more than the necessary proportion of a surface A of an energy beam outlet area to be acted upon is swept by a share of the clean gas flow.
  • the blocking elements can also be designed as fastening elements for attaching the baffle plate 131 to the process chamber ceiling 9.
  • the geometric arrangement of the components involved created an important prerequisite for dividing the jet flowing in through the ceiling gas outlet 27 into four similar volume fractions without further control.
  • the gas distribution unit 17, 17 ', 117 is designed to be foldable and / or retractable and / or foldable and / or retractable to the chamber ceiling 9 and / or chamber wall.
  • This allows the gas distribution unit, for. B. sunk or folded into a recess in the process chamber ceiling and / or folded away, so that the gas distribution unit rests on the chamber ceiling 9 or chamber wall of the process chamber and, for example, is flush with it or not from the level of the process chamber ceiling in the process chamber protrudes.
  • the gas distribution unit is not active, ie if no clean gas flow is supplied to the process chamber, in particular if a process gas flow is supplied to the process chamber, it can be sunk or folded away. Contamination of the gas distribution unit can thereby be avoided.
  • At least one further gas outlet (not shown in the figures) is additionally provided in the process chamber for discharging, optionally extracting, a clean gas. It is thus possible, for example, to generate a directed process gas flow between the gas distribution unit and the at least one gas outlet, which is conducted along at least a portion of the surface of the energy beam outlet region or regions at a distance from this or not at a distance therefrom and keeps or removes contaminants from the surface.
  • one or more coupling windows that is, for coupling the laser radiation into the process chamber.
  • H. transparent windows from z. B. glass are provided, so other optical elements, such as. B. lenses, for introducing the laser radiation into the process chamber.
  • 3a, 3b and 7 each show four energy beam outlet areas, but the invention is not restricted to this number of energy beam outlet areas. Rather, z. B. only two or three energy beam outlet areas can be provided or more than four energy beam outlet areas (ie coupling window or laser windows or lenses or the like) can be provided.
  • the arrangement of the energy beam outlet areas in the process chamber ceiling 9 or in the reference plane R is not limited to the arrangement shown in FIGS. 3a, 3b and 7 within a rectangle and to the rotationally symmetrical arrangement shown in FIG. Outlet areas can also be arranged differently in the process chamber ceiling 9.
  • FIGS. 8a to 8g each show, analogously to FIGS. 3a, 3b and 7, a view of the process chamber ceiling 9 from below of the gas distribution unit, ie from the construction field 8 or the interior of the process chamber 3.
  • the energy beam outlet regions 225a to 225f or their surfaces A in the reference plane R are shown as circular regions purely by way of example.
  • the shape of the energy beam outlet regions 225a to 225f is not limited to a circular shape, rather the energy beam outlet regions 225a to 225f shown in the figures can also have any other geometric shape, for example a rectangular or any other regular polygonal or irregular geometric shape.
  • the energy beam outlet regions 225a to 225f can also be designed differently with regard to their geometric shape and / or size.
  • 8a to 8f show further developments of the present invention using a gas distribution unit 17, 17 'according to the first and / or second embodiment (s) described above with reference to FIGS. 3a to 6.
  • 8f shows a development of the present invention using a gas distribution unit 117 according to the third embodiment described above with reference to FIG. 7.
  • FIG. 8a A total of six energy beam outlet regions 225a to 225f are shown in FIG. 8a, the energy beam outlet regions being arranged one below the other or next to one another in two rows and three columns.
  • the gas distribution unit 17, 17 ' is provided parallel to the rows of energy beam outlet regions between them, so that the energy beam outlet regions 225a, 225b, 225c of the upper line in FIG. 8a and the energy beam Outlet regions 225d, 225e, 225f of the lower line in FIG. 8a are arranged on sides of the gas distribution unit 17, 17 ′ which are facing away from and opposite one another.
  • the length L of the gas distribution unit 17, 17 ' preferably corresponds to the length of a row of energy beam outlet areas, ie the total width of the three columns of energy beam outlet areas (with an intermediate space).
  • the dimension As described above, L is preferably not an external dimension of the gas distribution unit itself, but rather relates to a dimension and / or arrangement of gas outlet openings of the gas distribution unit.
  • the gas inlet 26 of the gas distribution unit 17, 17 ' is provided centrally or centrally between the energy beam outlet regions 25a, 25b, 25c, 25d, i. H. in the longitudinal direction in the middle of the middle column of energy beam outlet regions 225b, 225e.
  • the energy beam outlet regions 225a to 225f are flowed over on one side during operation of the gas distribution unit 17, 17 ', the gas being on both sides, ie. H. flows into the process chamber 3 on opposite and opposite longitudinal sides of the gas distribution unit 17, 17 '(shown schematically by arrows in FIG. 8a).
  • arms of the gas distribution unit 17, 17 ' can also be provided (not shown).
  • the arms can, for example, each be provided vertically between horizontally adjacent energy beam outlet regions 225a to 225f and, analogously to FIG. 3b, enable two-sided overflow of the energy beam outlet regions 225a to 225f.
  • 8b shows an embodiment of the present invention, in which only two energy beam outlet regions 225a, 225b are provided in the process chamber ceiling 9.
  • the gas distribution unit 17, 17 ' is arranged centrally between the energy beam outlet regions 225a, 225b, so that each energy beam
  • Outlet area 225a, 225b is overflowed on one side by the gas flowing into the process chamber from the gas distribution unit 17, 17 'during operation.
  • the length L of the gas distribution unit 17, 17 'in the longitudinal direction also preferably corresponds to a maximum extension of the energy beam outlet regions 225a, 225b in a direction parallel to the longitudinal direction of the gas distribution unit 17, 17'.
  • the gas inlet 26 is also provided centrally on the gas distribution unit 17, 17 'with respect to the length L of the gas distribution unit, ie in the middle between the Energy beam outlet regions 225a, 225b, ie the gas distribution unit shown in FIG. 8b has two arms.
  • the gas distribution unit can also have only one arm, the gas inlet 26 being provided at one end of the gas distribution unit (with respect to its longitudinal direction).
  • the gas distribution unit 17, 17 ' according to the first and second embodiment, which was described above with reference to FIGS. 3a, 3b and 4 to 6, as well as FIGS. 8a and 8b, is designed such that gas during operation is bilateral, i.e. flows from the gas distribution unit into the process chamber 3 on opposite and opposite longitudinal sides of the gas distribution unit.
  • the gas distribution unit 17, 17 ′ according to the first and second embodiment can also be designed such that gas only flows out of the gas distribution unit on one side during operation, ie. H. the gas distribution unit 17, 17 'can also be designed to generate a clean gas stream flowing out on one side. This is shown by way of example in FIG.
  • the length L of the gas distribution unit 17, 17 ' being a maximum extension of the energy beam outlet region 225a in a direction parallel to the longitudinal direction of the gas distribution unit 17, 17', i.e. H. 8c is adapted or corresponds to a diameter of the round energy beam outlet region 225a.
  • the corresponding openings of the gas distribution unit 17, 17 ' can be covered, for example, or the gas distribution unit can be designed without the corresponding openings, i. H. be formed with openings on one side only.
  • FIGS. 8d and 8e show further embodiments of the present invention, in which three energy beam outlet regions 225a, 225b, 225c are provided in the process chamber ceiling 9.
  • the surfaces A of the energy beam outlet regions 225a, 225b, 225c are arranged three times in a rotationally symmetrical manner in the process chamber ceiling 9, the pivot point simultaneously corresponding to the center point of a circular cross section of the inlet 26 of the gas distribution unit 17, 17 '.
  • FIGS. 8d and 8e there is a gas distribution unit 17, 17 'with three arms 170a, 170b, 170c between each Energy beam outlet regions 225a, 225b, 225c are provided, one of the arms 170a, 170b, 170c being arranged centrally between two of the energy beam outlet regions 225a, 225b, 225c.
  • the gas distribution units 17, 17 'in FIGS. 8d and 8e differ in that the arms 170a, 170b, 170c of the gas distribution unit 17, 17' shown in FIG. 8d are designed to discharge the gas on one side (cf. 8c), while the arms 170a, 170b, 170c of the gas distribution unit 17, 17 'shown in FIG.
  • each energy jet outlet region 225a, 225b, 225c is thus flowed through by gas emerging from an arm, ie from one direction, while during operation of the gas distribution unit 17 shown in FIG. 8e, 17 ', each energy beam outlet region 225a, 225b, 225c is flowed through by two arms, ie from two directions, as shown schematically by arrows in FIGS. 8d and 8e.
  • 8f shows an arrangement of a gas distribution unit 17, 17 'with five arms 170a to 170f between five energy beam outlet regions 225a to 225f analogous to FIG. 8d or FIG. 8e.
  • the gas distribution unit is five-fold rotationally symmetrical with respect to its arms, the center of rotation corresponding to a center of area or center of the gas inlet 26.
  • FIG. 8e shows, as an alternative to the use of a gas distribution unit 17, 17 ′ according to the first or second embodiment described above, a gas distribution unit 117 according to the third embodiment described above, which is arranged centrally between the five energy beam outlet regions 225a to 225f. is not.
  • the shape of the baffle plate 231 is adapted to the geometric arrangement of the energy beam outlet regions in the reference plane, so that it likewise has a five-fold rotational symmetry.
  • the five feet 232 with baffles are each arranged in such a way that their extension is directed in each case into a central region between two energy beam outlet regions.
  • each of the gas distribution units preferably comprises a separate gas inlet which is connected to an end section of a supply line.
  • end sections can be provided, preferably the number of end sections of the gas supply line (s) corresponds to the number of gas distribution units.
  • the gas distribution unit shown in FIG. 6 can also be arranged directly below the process chamber ceiling 9 and an opening in the process chamber ceiling 9 can then form the gas inlet 26.
  • the gas distribution unit shown in FIGS. 4 and 5 have a separate ceiling, so that this is not formed by the process chamber ceiling 9. The gas distribution unit can then have a gas inlet formed separately from the process chamber ceiling 9.
  • the present invention has been described with the aid of a laser sintering or laser melting device, it is not restricted to laser sintering or laser melting. It can be applied to any method for additively producing a three-dimensional object by applying layers and selectively solidifying a building material, in which electromagnetic radiation and / or particle radiation is used to solidify the building material, the solidifying process being a targeted local attachment and / or melting of the building material and subsequent solidification.
  • the imagesetter can, for example, one or more gas or solid-state lasers or any other type of laser such as.
  • B. laser diodes in particular VCSEL (Vertical Cavity Surface Emitting Laser) or VECSEL (Vertical External Cavity Surface Emitting Laser).
  • any device can be used as an imagesetter with which energy as wave or particle radiation can be selectively applied to a layer of the building material.
  • a laser for example, another whose light source, an electron beam or any other energy or radiation source are used which is suitable for solidifying the building material.
  • powder can be used as the building material, in particular metal powder, plastic powder, ceramic powder, sand, filled or mixed powders.
  • powder other suitable materials can also be used as the building material.

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Abstract

L'invention concerne un dispositif de production d'un flux servant à une pluralité de zones de sortie de faisceau d'énergie (25a-25d, 125a-125d, 225a-225f) dans un dispositif de fabrication additive (1) destiné à la fabrication additive d'un objet tridimensionnel (2) par application par couches et consolidation sélective d'un matériau de construction par irradiation au moyen d'un faisceau d'énergie. Le dispositif de production d'un flux comprend une chambre de traitement (3) dotée d'une paroi de recouvrement (9), les zones de sortie de faisceau d'énergie (25a-25d, 125a-125d, 225a-225f) étant agencées dans la paroi de recouvrement (9) de la chambre de traitement (3) dans un plan de référence (R), et une pluralité d'unités de déviation de faisceau d'énergie (20a, 20b) du dispositif de fabrication additive (1) étant agencées au-dessus des zones de sortie de faisceau d'énergie (25a-25d, 125a-125d, 225a-225f). Le dispositif de production d'un flux comprend en outre au moins unité de distribution de gaz (17, 17', 117) et une pluralité de sorties de gaz (30, 33) destinées à faire sortir un gaz dans la chambre de traitement (3), les sorties de gaz (30, 33) étant formées au moins partiellement par l'unité de distribution de gaz (17, 17', 117). L'unité de distribution de gaz (17, 17', 117) fait saillie au moins dans une position de fonctionnement sur la paroi de recouvrement (9) et au sein de la chambre de traitement (3) hors de la paroi de recouvrement (9) ou du plan de référence (R), de sorte qu'elle dépasse dans la chambre de traitement (3). Les sorties de gaz (30, 33) sont disposées au moins dans la position de fonctionnement de l'unité de distribution de gaz (17, 17', 117) dans une zone de hauteur supérieure de la chambre de traitement (3), et sont dirigées dans la chambre de traitement (3) de façon à ce que, lors du fonctionnement, du gaz recouvre le plan de référence (R) au moins partiellement. Au moins une conduite d'amenée de gaz (60) est en outre agencée au-dessus de la paroi de recouvrement (9) pour amener le gaz vers l'unité de distribution de gaz (17, 17'), une partie d'extrémité (61) de la conduite d'amenée de gaz (60) étant agencée entre au moins deux unités de déviation de faisceau d'énergie (20a, 20b).
PCT/EP2019/080943 2018-11-12 2019-11-12 Dispositif de production de flux et procédé de production de flux destiné à un dispositif de fabrication additive d'un objet tridimensionnel WO2020099363A1 (fr)

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DE102018219305.3A DE102018219305A1 (de) 2018-11-12 2018-11-12 Beströmungsvorrichtung und Beströmungsverfahren für eine Vorrichtung zum additiven Herstellen eines dreidimensionalen Objekts

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
US20240139819A1 (en) * 2022-11-01 2024-05-02 General Electric Company Direct metal laser printing gas manifold

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WO2000030789A1 (fr) 1998-11-23 2000-06-02 Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Chambre de processus pour la fusion selective par laser
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