WO2020019787A1 - 显示面板及显示装置 - Google Patents

显示面板及显示装置 Download PDF

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Publication number
WO2020019787A1
WO2020019787A1 PCT/CN2019/084268 CN2019084268W WO2020019787A1 WO 2020019787 A1 WO2020019787 A1 WO 2020019787A1 CN 2019084268 W CN2019084268 W CN 2019084268W WO 2020019787 A1 WO2020019787 A1 WO 2020019787A1
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WIPO (PCT)
Prior art keywords
substrate
display panel
groove
layer
panel according
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PCT/CN2019/084268
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English (en)
French (fr)
Inventor
徐琳
袁波
刘如胜
黄根茂
盛翠翠
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云谷（固安）科技有限公司
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Priority to US16/746,978 priority Critical patent/US11152586B2/en
Publication of WO2020019787A1 publication Critical patent/WO2020019787A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/813—Anodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H10K59/8051—Anodes
    • H10K59/80515—Anodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/873—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02366—Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/311—Flexible OLED

Definitions

  • the present application relates to display technology, for example, to a display panel and a display device.
  • a display device includes a display panel.
  • the display panel includes a substrate and a thin-film transistor (TFT) layer provided on the substrate.
  • the TFT layer includes a plurality of pixel circuits.
  • the display panel is a flexible panel, the display panel needs to be repeatedly bent multiple times.
  • the present application provides a display panel.
  • a display panel includes:
  • a substrate, the surface of the substrate is provided with a plurality of first grooves
  • a TFT layer is provided on a side of the substrate on which the first groove is provided.
  • the TFT layer includes a plurality of pixel circuits, and the pixel circuits are located in the first groove.
  • the substrate is a flexible substrate.
  • a region of the surface of the substrate where the first groove is not provided is uneven.
  • a plurality of second grooves are provided on an area of the surface of the substrate where the first grooves are not provided.
  • a depth of the second groove is smaller than a depth of the first groove.
  • a side of a cross section of the first groove is non-linear in a direction perpendicular to a surface of the substrate.
  • a side of a cross section of the first groove is wavy or toothed.
  • the substrate includes a PI layer, and the first groove is provided on the PI layer.
  • the substrate includes a plurality of PI layers, and the first groove is provided on at least one PI layer near the TFT layer.
  • the first groove is provided on a plurality of continuous PI layers close to the TFT layer.
  • a barrier layer is provided between two adjacent PI layers.
  • the second groove is filled with a buffer material, and the buffer material is more flexible than the substrate.
  • a plurality of independent support portions are provided on an area of the surface of the substrate where the first groove is not provided.
  • each of the first grooves has one of the pixel circuits.
  • a flat layer is provided on a side of the TFT layer remote from the substrate.
  • it further includes an OLED device layer provided on a side of the TFT layer remote from the substrate, the OLED device layer includes a plurality of light emitting elements, and the light emitting elements are located on the first Inside the groove.
  • the invention also provides a display device.
  • a display device includes a display panel provided in the present application.
  • FIG. 1 is a schematic cross-sectional view of a display panel provided by an exemplary embodiment of the present application.
  • FIG. 2 is an enlarged view of a region A in FIG. 1.
  • FIG. 3 is an enlarged view of a region A in FIG. 1.
  • FIG. 4 is a schematic cross-sectional view of a display panel provided by an exemplary embodiment of the present application.
  • the phenomenon of local stress concentration is prone to occur.
  • it may cause the display panel to fail to display normally.
  • the display panel is a flexible panel, after the display panel is repeatedly bent multiple times, due to the uneven force inside the display panel, the stress concentration in some areas cannot be dispersed and the internal components are damaged, which limits the scope of application of the flexible display panel and Bend way.
  • the external force acts on the display panel. After the external force is transmitted, it acts on the pixel circuit, causing the pixel circuit to have a stress concentration phenomenon. However, it may cause damage to the pixel circuit, and even cause the pixel circuit to be disconnected or virtual. Part is not displayed properly.
  • the present application provides a display panel for reducing the stress acting on the pixel circuit of the TFT layer, thereby protecting the sub-pixels and preventing the display panel from being unable to display normally.
  • a display panel 100 provided by an exemplary embodiment of the present application includes a substrate 110 and a TFT layer 130 provided on the substrate 110.
  • the surface of the substrate 110 is provided with a plurality of first grooves 111.
  • the TFT layer 130 is disposed on a side of the substrate 110 having the first groove 111.
  • the TFT layer 130 includes a plurality of pixel circuits 131, and the pixel circuits 131 are located in the first groove 111.
  • the area where the first groove 111 is not provided on the substrate 110 first receives and disperses the stress, thereby reducing the stress on the pixel circuit 131, and thereby effectively preventing the pixel circuit 131 from being excessively stressed. It is damaged to prevent the display panel 100 from being partially displayed normally.
  • the pixel circuit in the exemplary embodiment of the present application is located in the first groove, that is, the pixel circuit is completely received by the first groove.
  • the side of the pixel circuit remote from the substrate is located in the first groove, that is, the thickness of the pixel circuit 131 is smaller than the depth of the first groove 111.
  • the depth of the first groove 111 may be set according to the thickness of the pixel circuit 131.
  • the width of the first groove 111 is based on the position where the pixel circuit 131 can be placed.
  • the width of the first groove 111 needs to be set reasonably, so as to prevent the area of the substrate 110 where the first groove 111 is not provided from losing its supporting ability due to the small area.
  • the substrate 110 is a flexible substrate, that is, the substrate 110 has a certain flexibility, so that the stress can be better relieved, and the effect on the pixel circuit 131 can be better reduced. stress.
  • the inventor's research found that the use of flexible display panels, although to a certain extent, has the characteristics of being portable.
  • the bending area of the flexible display panel may generate bending stress.
  • the bending stress will act on the pixel circuit in the bending area of the flexible display panel, resulting in stress concentration in the pixel circuit in the bending area of the flexible display panel.
  • it will cause the pixel circuit in the bending area of the flexible display panel. It is damaged due to excessive bending stress, and may cause partial display failure in the bending area of the display panel.
  • the first groove 111 can alleviate the stress acting on the pixel circuit 131, reduce the bending stress acting on the pixel circuit 131, and thereby prevent the pixel circuit 131 from being subjected to Excessive stress causes damage, thereby effectively preventing the display panel 100 from being partially displayed normally.
  • the arrangement of the first groove increases the bending resistance of the substrate.
  • a small deformation occurs in the area where the first groove is not provided, which reduces the bending stress on the substrate, thereby reducing the stress on the pixel circuit and avoiding The pixel circuit is damaged due to excessive bending stress, which prevents the display panel from displaying normally due to bending deformation.
  • the substrate may also be a non-flexible substrate
  • the display panel may also be a non-flexible display panel.
  • the exemplary embodiment in the present application provides a groove on a flexible substrate and the pixel circuit 131 of the TFT layer is provided in the groove.
  • the inventive concept can also be applied to a non-flexible display panel.
  • the surface of the substrate 110 has a concave-convex structure.
  • the first groove 111 is a recessed area of the uneven structure, and the remaining area is a raised area of the uneven structure.
  • an area of the surface of the substrate 110 where the first groove 111 is not provided is uneven.
  • the surface of the convex region of the uneven structure near the TFT layer 130 is uneven.
  • the area of the surface of the substrate 110 where the first groove 111 is not provided is uneven, which can increase the flexibility of the convex area, thereby better buffering the stress acting on the convex area, and further reducing the pixel circuit 131 This further prevents the pixel circuit 131 from being damaged due to excessive stress, and more effectively prevents the display panel from being displayed normally.
  • a plurality of second grooves 113 are provided in a region of the surface of the substrate 110 where the first grooves 111 are not provided.
  • the unevenness is achieved by providing a groove in the convex area on the surface of the substrate 110.
  • first groove 111 and the second groove 113 are both formed on the same surface of the substrate 110, a mask can be used to pattern the surface of the substrate 110 to achieve the effect of grooving on the surface of the substrate 110.
  • the depth of the second groove 113 is smaller than the depth of the first groove 111.
  • the mask can be used twice to form the first groove 111 and the second groove 113, respectively.
  • a half-tone mask can also be used to form the first groove 111 and the second groove 113 at the same time.
  • the first groove 111 and the second groove 113 are not limited to being formed by a mask.
  • the patterned flexible substrate may be directly formed, or the first groove 111 and the second groove 113 may be formed by laser slotting or the like.
  • the raised area is not limited to be uneven by means of slotting.
  • a plurality of independent support portions may be provided in the raised area to make the raised area appear uneven.
  • the second groove 113 may be filled with a flexible material, and the flexibility of the flexible material is greater than the flexibility of the substrate 110, so that the deformation of the flexible material filled in the second groove 113 is better. Ground buffer stress.
  • a side of a cross section of the first groove 111 is non-linear. That is, in the direction perpendicular to the surface of the substrate 110, the side of the cross section of the convex area of the concave-convex structure is non-linear, thereby increasing the flexibility of the convex area of the concave-convex structure in this direction and better alleviating the effect. Stress in the raised area.
  • the side of the cross section of the first groove 111 is tooth-shaped in a direction perpendicular to the surface of the substrate 110.
  • the side of the cross section of the first groove 111 is wavy in a direction perpendicular to the surface of the substrate 110.
  • the substrate 110 includes a PI (Polyimide) layer 112, that is, a layer made of polyimide.
  • the plurality of first grooves 111 are disposed on the PI layer 112. Further, the substrate 110 includes a plurality of PI layers 112. The first groove 111 is provided on a PI layer 112 on the side of the substrate 110 near the TFT layer 130, or on two consecutive PI layers on the substrate 110 near the TFT layer 130.
  • a barrier layer is provided between the substrate 110 and the TFT layer to block water and oxygen and prevent the external water and oxygen from attacking the pixel circuit 131.
  • a barrier layer is disposed between two adjacent PI layers. It can be understood that at least one barrier layer is disposed in the first groove 111.
  • a flattening layer is further provided on a side of the TFT layer 130 away from the substrate 110, so that a surface of the TFT layer 130 away from the substrate 110 is flat, which is convenient for forming an OLED device layer.
  • a side of the TFT layer 130 away from the substrate includes a recessed region 133 corresponding to the first groove 111.
  • the display panel further includes an OLED device layer 150 disposed on a side of the TFT layer 130 remote from the substrate.
  • the OLED device layer includes a plurality of light emitting elements 151, and the light emitting elements 151 are disposed in the recessed area 133. In this embodiment, the light emitting element 151 is further located in the first groove 111.
  • the raised area of the uneven structure on the substrate first receives and disperses stress, thereby alleviating the stress on the light-emitting element and preventing the light-emitting element from being damaged due to stress concentration . It should be noted that the surface of the TFT layer far from the substrate at this time is no longer flat.
  • the display panel further includes an encapsulation layer and the like provided on the TFT layer.
  • the structures of the OLED device layer and the encapsulation layer may be set by using conventional technical means in the art.
  • the TFT layer in the exemplary embodiment of the present application further includes a gate insulating layer, a dielectric layer, an interlayer insulating layer, and the like.
  • the structure of the gate insulation layer, dielectric layer, and interlayer insulation layer such as the thickness of the gate insulation layer, dielectric layer, and interlayer insulation layer, and whether the gate insulation layer, dielectric layer, and interlayer insulation layer are provided with grooves. Conventional technical means in the art are sufficient.
  • An exemplary embodiment of the present application further provides a display device including the above display panel.

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  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本申请提供一种显示面板，包括：衬底，所述衬底的表面设有多个第一凹槽；TFT层，设于所述衬底的设有所述第一凹槽的一侧，所述TFT层包括多个像素电路，所述像素电路位于所述第一凹槽内。

Description

显示面板及显示装置
援引加入
本申请要求于2018年7月23日提交中国专利局、申请号为201810809722.X、发明名称为“显示面板及显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术，例如涉及显示面板及显示装置。
背景技术
随着信息技术的发展，手机等显示装置已经成为人们生活中不可或缺的工具。
一般地，显示装置包括显示面板。显示面板包括衬底以及设于衬底上的薄膜晶体管(Thin-film transistor，TFT)层。TFT层包括多个像素电路。当显示面板为柔性面板时，显示面板需要被反复弯折多次。
发明内容
本申请提供一种显示面板。
一种显示面板，包括：
衬底，所述衬底的表面设有多个第一凹槽；
TFT层，设于所述衬底的设有所述第一凹槽的一侧，所述TFT层包括多个像素电路，所述像素电路位于所述第一凹槽内。
在其中一个实施例中，所述衬底为柔性衬底。
在其中一个实施例中，所述衬底的表面的未设置所述第一凹槽的区域呈不平坦状。
在其中一个实施例中，所述衬底的表面的未设置所述第一凹槽的区域设有多个第二凹槽。
在其中一个实施例中，所述第二凹槽的深度小于所述第一凹槽的深度。
在其中一个实施例中，在垂直于所述衬底的表面的方向上，所述第一凹槽的截面的侧边呈非直线状。
在其中一个实施例中，在垂直于所述衬底的表面的方向上，所述第一凹槽的截面的侧边呈波浪状或齿状。
在其中一个实施例中，所述衬底包括PI层，所述第一凹槽设于所述PI层上。
在其中一个实施例中，所述衬底包括多个PI层，所述第一凹槽设于靠近所述TFT层的至少一层PI层上。
在其中一个实施例中，所述第一凹槽设于靠近所述TFT层的连续的多个PI层上。
在其中一个实施例中，相邻两个PI层之间设置有阻隔层。在其中一个实施例中，所述第二凹槽内填充有缓冲材料，所述缓冲材料的柔韧性大于所述衬底的柔韧性。
在其中一个实施例中，所述衬底的表面的未设置所述第一凹槽的区域设有多个相互独立的支撑部。在其中一个实施例中，每个所述第一凹槽内具有一个所述像素电路。
在其中一个实施例中，所述衬底与所述TFT层之间具有阻隔层。
在其中一个实施例中，所述TFT层的远离所述衬底的一侧设有平坦层。
在其中一个实施例中，还包括设于所述TFT层的远离所述衬底的一侧的OLED器件层，所述OLED器件层包括多个发光元件，且所述发光元件位于所述第一凹槽内。
本发明还提供一种显示装置。
一种显示装置，包括本申请提供的显示面板。
附图说明
图1为本申请一示例性的实施例提供的显示面板的截面示意图。
图2为图1的区域A的放大图。
图3为图1的区域A的放大图。
图4为本申请一示例性的实施例提供的显示面板的截面示意图。
具体实施方式
为了使本申请的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本申请进行进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本申请，并不用于限定本申请。
显示面板在使用过程中，因受到外力冲击，容易发生局部应力集中的现象，严重的，将导致显示面板局部无法正常显示。尤其当显示面板为柔性面板时，显示面板被反复弯折多次后，由于显示面板内部受力不均，部分区域应力集中无法分散导致内部元器件受损，限制了柔性显示面板的适用范围和弯折方式。
外力作用在显示面板上，外力被传递后，作用在像素电路上，导致像素电路产生应力集中的现象，严重的，可能导致像素电路受损，甚至导致像素电路断路或虚接，进而使得显示面板局部无法正常显示。
基于此，本申请提供一种显示面板，用于减小作用在TFT层的像素电路上的应力，从而对子像素进行保护，防止显示面板出现局部无法正常显示的现象。
如图1所示，本申请一示例性的实施例提供的显示面板100，包括衬底110以及设于衬底110上的TFT层130。
具体地，衬底110的表面设有多个第一凹槽111。TFT层130设于衬底110的具有第一凹槽111的一侧。TFT层130包括多个像素电路131，像素电路131位于第一凹槽111内。
当显示面板100受到外力冲击时，衬底110上未设第一凹槽111的区域首先承受并分散应力，从而减小作用在像素电路131上的应力，进而有效避免像素电路131因应力过大而受损，避免显示面板100局部无法正常显示。
需要说明的是，本申请的示例性的实施例中的像素电路位于第一凹槽内，即像素电路被第一凹槽完全容纳。换言之，像素电路的远离衬底的一侧位于第一凹槽内，也即，像素电路131的厚度小于第一凹槽111的深度。
具体地，第一凹槽111的深度可以根据像素电路131的厚度进行设置。
另外，第一凹槽111的宽度以能放置像素电路131为准。第一凹槽111的宽度需要合理设置，以免衬底110的未设置第一凹槽111的区域因面积过小而失去支撑能力。
本申请另一示例性的实施例中，衬底110为柔性衬底，即衬底110具有一定的柔韧性，这样能更好的缓解应力，从而更好地减小作用在像素电路131上的应力。
另外，随着信息技术的发展，为了获取更好的视觉效果，手机等显示装置的尺寸越来越大。但是尺寸较大的显示装置又不便于携带。柔性显示面板因其可弯折的特性被越来越多地应用到显示装置中。
发明人研究发现，柔性显示面板的使用虽然在一定程度上具有便于携带的特性。但是在柔性显示面板被弯折时，柔性显示面板的弯折区会产生弯折应力。该弯折应力会作用在柔性显示面板的弯折区的像素电路上，导致柔性显示面板的弯折区的像素电路发生应力集中的现象，严重的，导致柔性显示面板的弯折区的像素电路因所受到过大的弯折应力而受损，并且可能导致显示面板弯折区局部无法正常显示。
本实施例中，在显示面板100被弯折时，第一凹槽111可以缓解作用在像素电路131上的应力，减小作用在像素电路131上的弯折应力，进而避免像素电路131因受到过大的应力而受损，从而有效避免显示面板100局部无法正常显示。
此外，第一凹槽的设置增加了衬底的抗弯能力。当显示面板在外力作用下弯曲变形时，未设置第一凹槽的区域发生较小的形变，减小了作用在衬底上的弯折应力，从而减小作用在像素电路上的应力，避免像素电路因受到过大的弯折应力而受损，避免显示面板因弯折形变而无法正常显示。
当然，基板也可以是非柔性基板，显示面板也可以是非柔性显示面板。换言之，本申请中的示例性的实施例在柔性衬底上设置凹槽，并将TFT层的像素电路131设置于该凹槽内的发明构思也可以用于非柔性显示面板上。
由于在衬底的表面设置了多个第一凹槽111，使得衬底110的表面呈凹凸结构。第一凹槽111即为凹凸结构的凹陷区，剩余区域为凹凸结构的凸起区。
本实施例中，衬底110的表面的未设置第一凹槽111的区域呈不平坦状。换言之，凹凸结构的凸起区的靠近TFT层130的表面呈不平坦状。
衬底110的表面的未设置第一凹槽111的区域呈不平坦状，可以增加凸起区的柔韧性，从而更好的缓冲作用在凸起区的应力，进一步减小作用在像素电路131上的应力，进而更有效避免像素电路131因受到过大的应力而受损，更有效地避免显示面板局部无法正常显示。
在本申请的一示例性的实施例中，衬底110的表面的未设置第一凹槽111的区域设有多个第二凹槽113。通过在衬底110表面的凸起区设置凹槽的方式实现不平坦状。
由于第一凹槽111和第二凹槽113均形成于衬底110的同一表面，故可采用掩膜版将衬底110的表面图形化，以实现在衬底110表面开槽的效果。
为了防止凸起区开槽后出现歪斜，使得衬底失去支撑作用，第二凹槽113的深度小于第一凹槽111的深度。可以采用两次掩膜版以分别形成第一凹槽111和第二凹槽113。也可以采用半色调掩膜版以同时形成第一凹槽111和第二凹槽113。
当然，在其他示例性的实施例中，不限于通过掩膜版的方式形成第一凹槽111和第二凹槽113。例如，可以直接形成图形化的柔性衬底，或者通过激 光开槽等方式形成第一凹槽111和第二凹槽113。
在其他示例性的实施例中，不限于通过开槽的方式使凸起区呈不平坦状。例如，可以在凸起区设置多个独立的支撑部以使凸起区呈现不平坦状。
在其他示例性的实施例中，第二凹槽113内可以填充柔性材料，且柔性材料的柔韧性大于衬底110的柔韧性，以通过第二凹槽113内填充的柔性材料的变形更好地缓冲应力。
本申请的一示例性的实施例中，在垂直于衬底110表面的方向上，第一凹槽111的截面的侧边呈非直线状。即在垂直于衬底110表面的方向上，凹凸结构的凸起区的截面的侧边呈非直线状，从而增大凹凸结构的凸起区在该方向上的柔韧性，更好地缓解作用在凸起区的应力。
请参阅图2，本申请的一示例性的实施例中，在垂直于衬底110的表面的方向上，第一凹槽111的截面的侧边呈齿状。
请参阅图3，本申请的另一示例性的实施例中，在垂直于衬底110的表面的方向上，第一凹槽111的截面的侧边呈波浪状。
本申请又一个示例性的实施例中，每个第一凹槽111内具有一个像素电路131，这样能保证凹凸结构的凸起区分布于靠近每个像素电路131的位置，从而能够更好的缓解像素电路131周围的应力，进而更好的缓解作用在像素电路131上的应力。
本实施例中，衬底110包括PI(Polyimide)层112，即由聚酰亚胺制成的层，前述多个第一凹槽111设于PI层112上。进一步地，衬底110包括多层PI层112。第一凹槽111设于衬底110的靠近TFT层130一侧的一层PI层112上，或者设于衬底110的靠近TFT层130的连续的两层或多层PI层上。
在本申请一示例性的实施例中，衬底110与TFT层之间设有阻隔层，用来阻隔水氧，防止外部的水氧侵蚀像素电路131。当衬底110包含至少两层PI层，相邻两层PI层之间设置阻隔层。可以理解的是，第一凹槽111内设有至少一层阻隔层。
在本申请一示例性的实施例中，TFT层130的远离衬底110的一侧还设有平坦化层，使得TFT层130的远离衬底110的表面呈平坦状，便于形成OLED器件层。
在本申请一示例性的实施例中，请参阅图4，TFT层130远离衬底的一侧包括与第一凹槽111对应的凹陷区133。显示面板还包括设于TFT层130的远离衬底的一侧的OLED器件层150。OLED器件层包括多个发光元件151，且发光元件151设置在所述凹陷区133内。本实施例中，发光元件151进一步位于第一凹槽111内。当显示面板受到外力冲击时，相较于发光元件，衬底上的凹凸结构的凸起区首先承受并分散应力，从而缓解了作用在发光元件上的应力，进而防止发光元件因应力集中而损伤。需要说明的是，此时的TFT层的远离衬底的表面不再呈平坦状。
需要说明的是，显示面板还包括设于TFT层上的封装层等。OLED器件层以及封装层等的结构，采用本领域的常规技术手段进行设置即可。
进一步地，本申请示例性的实施例中的TFT层还包括栅绝缘层、电介质层以及层间绝缘层等。栅绝缘层、电介质层以及层间绝缘层等的结构如栅绝缘层、电介质层以及层间绝缘层等的厚度，栅绝缘层、电介质层以及层间绝缘层等是否设有凹槽等，采用本领域的常规技术手段即可。
本申请的示例性的实施例还提供一种显示装置，包括本上述显示面板。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本申请的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对申请保护范围的限制。对于本领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干变形和改进，这些都属于本申请的保护范围。本申请的保护范围应以所附权利要求为准。

Claims (18)

  1. 一种显示面板，包括：
    衬底，所述衬底的表面设有多个第一凹槽；
    TFT层，设于所述衬底的设有所述第一凹槽的一侧；所述TFT层包括多个像素电路，所述像素电路位于所述第一凹槽内。
  2. 根据权利要求1所述的显示面板，其中，所述衬底为柔性衬底。
  3. 根据权利要求1所述的显示面板，其中，所述衬底的表面的未设置所述第一凹槽的区域呈不平坦状。
  4. 根据权利要求3所述的显示面板，其中，所述衬底的表面的未设置所述第一凹槽的区域设有多个第二凹槽。
  5. 根据权利要求4所述的显示面板，其中，所述第二凹槽的深度小于所述第一凹槽的深度。
  6. 根据权利要求1所述的显示面板，其中，在垂直于所述衬底的表面的方向上，所述第一凹槽的截面的侧边呈非直线状。
  7. 根据权利要求6所述的显示面板，其中，在垂直于所述衬底的表面的方向上，所述第一凹槽的截面的侧边呈波浪状或齿状。
  8. 根据权利要求1所述的显示面板，其中，所述衬底包括PI层，所述第一凹槽设于所述PI层上。
  9. 根据权利要求8所述的显示面板，其中，所述衬底包括若干PI层，所述第一凹槽设于靠近所述TFT层的至少一层PI层上。
  10. 根据权利要求8所述的显示面板，其中，所述第一凹槽设于靠近所述TFT层的连续的多个PI层上。
  11. 根据权利要求8所述的显示面板，其中，相邻两个PI层之间设置有阻隔层。
  12. 根据权利要求4所述的显示面板，其中，所述第二凹槽内填充有缓冲材料，所述缓冲材料的柔韧性大于所述衬底的柔韧性。
  13. 根据权利要求3所述的显示面板，其中，所述衬底的表面的未设置所述第一凹槽的区域设有多个相互独立的支撑部。
  14. 根据权利要求1所述的显示面板，其中，每个所述第一凹槽内具有一个所述像素电路。
  15. 根据权利要求1所述的显示面板，其中，所述衬底与所述TFT层之间具有阻隔层。
  16. 根据权利要求1所述的显示面板，其中，所述TFT层的远离所述衬底的一侧设有平坦层。
  17. 根据权利要求1所述的显示面板，还包括设于所述TFT层的远离所述衬底的一侧的OLED器件层，所述OLED器件层包括多个发光元件，且所述发光元件位于所述第一凹槽内。
  18. 一种显示装置，包括权利要求1所述的显示面板。
PCT/CN2019/084268 2018-07-23 2019-04-25 显示面板及显示装置 WO2020019787A1 (zh)

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