WO2019210773A1 - 彩膜基板及其制备方法以及显示面板 - Google Patents

彩膜基板及其制备方法以及显示面板 Download PDF

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Publication number
WO2019210773A1
WO2019210773A1 PCT/CN2019/082790 CN2019082790W WO2019210773A1 WO 2019210773 A1 WO2019210773 A1 WO 2019210773A1 CN 2019082790 W CN2019082790 W CN 2019082790W WO 2019210773 A1 WO2019210773 A1 WO 2019210773A1
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Prior art keywords
substrate
color filter
elastic
spacers
spacer
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PCT/CN2019/082790
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English (en)
French (fr)
Inventor
王琳琳
罗程远
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京东方科技集团股份有限公司
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Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/649,073 priority Critical patent/US11289545B2/en
Publication of WO2019210773A1 publication Critical patent/WO2019210773A1/zh
Priority to US17/680,085 priority patent/US11812650B2/en

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • H10K59/871—Self-supporting sealing arrangements
    • H10K59/8723—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a color filter substrate, a method of fabricating the same, and a display panel.
  • a color film substrate includes: a first substrate; at least one spacer on one side of the first substrate; at least one on a side of the at least one spacer away from the first substrate An electrode; and at least two elastic supports, the at least two elastic supports and the at least one spacer being on the same side of the first substrate.
  • At least two of the elastic supports are disposed at an outer circumference of each of the spacers in a plane parallel to the extended face of the first substrate. The sum of the thicknesses of each of the spacers and the electrodes thereon is smaller than the height of each of the elastic supports at the outer circumference thereof in a direction perpendicular to the extended face of the first substrate.
  • each of the spacers are uniformly disposed in a plane parallel to the extended surface of the first substrate The elastic support member.
  • the elastic support member includes a rigid segment and an elastic segment that are connected to each other, the rigid segment being closer to the first substrate than the elastic segment.
  • the height of the rigid segment is the total height of the elastic support in a direction perpendicular to the extended surface of the first substrate. One quarter to one third.
  • the rigid segment includes a silica gel and a nano material
  • the nano material is selected from at least one of a nanocolumn and a nanosphere
  • the elastic segment includes silicone.
  • each of the spacers and the elastic support member at the outer periphery thereof is 0-0.5 microns.
  • the sum of the thicknesses of each of the spacers and the electrodes thereon in a direction perpendicular to the extended surface of the first substrate is as small as 0.3 - 0.5 ⁇ m.
  • the elastic support has a size of 5 to 10 ⁇ m in a plane parallel to the extended surface of the first substrate.
  • the color filter substrate provided by the embodiment of the present disclosure further includes: a black matrix layer between the first substrate and the at least one spacer, the black matrix layer including a plurality of layers spaced apart from each other The first opening.
  • An orthogonal projection of each of the spacers and the elastic support on the first substrate on the first substrate is a portion of a black matrix layer between adjacent two first openings on the first substrate The orthographic projection on the overlay.
  • a display panel is also provided.
  • the display panel includes the color filter substrate according to any of the preceding embodiments.
  • the display panel provided by the embodiment of the present disclosure further includes: an array substrate disposed opposite to the color filter substrate.
  • the array substrate includes a second substrate, a thin film transistor array, a pixel defining layer, and a cathode layer which are sequentially disposed in a direction toward the color filter substrate.
  • the pixel defining layer includes a plurality of second openings, each of which is overlapped with a corresponding anode and an organic light emitting layer.
  • Each of the electrodes on the color filter substrate is in contact with a corresponding portion of the cathode layer on the array substrate due to shrinkage of the elastic support.
  • a method for fabricating a color filter substrate includes the steps of: forming at least one spacer on one side of the first substrate; forming at least one electrode on a side of the at least one spacer away from the first substrate; and being parallel to In a plane of the extended face of the first substrate, at least two elastic supports are formed at an outer circumference of each of the spacers, wherein, in a direction perpendicular to an extended face of the first substrate, each The sum of the thicknesses of the spacers and the electrodes thereon is smaller than the height of each of the elastic supports at its outer circumference.
  • the step of forming the at least two elastic supports comprises the substep of: uniformizing at the outer circumference of each of the spacers At least the two elastic supports are formed.
  • the step of forming the at least two elastic supports includes the following sub-steps: mixing silica gel, nano material, and solvent to obtain an ink; And applying the ink to the outer periphery of each of the spacers by inkjet printing and baking the same to form the elastic support, wherein the nanomaterial is selected from the group consisting of nanopillars and nanospheres At least one.
  • the ink in the method for fabricating a color filter substrate provided by an embodiment of the present disclosure, contains 5-10% of the nano material and 30-40% of the silica gel by mass percentage. And the rest are all the solvent.
  • FIG. 1 is a schematic structural view of a color filter substrate according to an embodiment of the present disclosure.
  • FIG. 2 is a schematic structural view of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 3 is a schematic structural view of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 4 is a schematic structural view of a color filter substrate according to another embodiment of the present disclosure.
  • FIG. 5 is a schematic structural view of a display panel according to an embodiment of the present disclosure.
  • FIG. 6 is a schematic structural view of a display panel according to another embodiment of the present disclosure.
  • FIG. 7 is a schematic flow chart of a method for preparing a color filter substrate according to an embodiment of the present disclosure.
  • FIG. 8 is a flow diagram of a step for preparing an elastic support in accordance with an embodiment of the present disclosure.
  • an auxiliary electrode can be added to reduce the voltage gradient on the external circuit, thereby increasing the luminous efficiency of the OLED display panel and increasing the driving of the OLED assembly. Voltage.
  • auxiliary electrode In order to add an auxiliary electrode, it is common practice to prepare a spacer on a color filter substrate and form an electrode on the surface of the spacer. Thereby, the electrode is brought into contact with the cathode on the array substrate by press-fitting, thereby achieving lap joint.
  • the spacer material Due to the presence of the filling layer between the array substrate and the color filter substrate, the spacer material is difficult to achieve high elasticity, and thus a crushing phenomenon due to excessive force may occur during the process, thereby causing defects.
  • the force is too small, the problem of poor contact or inability to contact may occur, and thus the display panel may be unevenly displayed in different degrees.
  • the inventors have found that at least two elastic supports can be disposed (particularly uniformly) around the spacers and around the spacers. Furthermore, the height of the elastic support can also be chosen to be greater than the sum of the height of the spacer and the height of the electrodes on the spacer. Thereby, when the pressing is performed, due to the elastic supporting action of the elastic supporting member, the electrode can be effectively prevented from being crushed, and the effective overlapping of the electrode on the color filter substrate and the cathode on the array substrate can be achieved.
  • the color filter substrate includes: a substrate 100; at least one spacer 200; and at least two elastic supports 300.
  • the spacer 200 is disposed on the lower side of the substrate 100, and the electrode 210 is further disposed on the lower surface of the spacer 200 (ie, the surface away from the substrate 1).
  • the at least two elastic supports 300 and the spacers 200 are disposed on the same side of the substrate 100, that is, on the same surface.
  • at least two of the elastic support members 300 are disposed on the outer circumference of each of the spacers 200.
  • the at least two elastic supports 300 may be evenly spaced along the outer circumference of the spacer 200.
  • the height h of each of the elastic support members 300 is greater than the sum of the height H of the intermediate spacers 200 and the thickness d of the corresponding electrode 210.
  • the structure of the provided color film substrate is simple and easy to implement. When such a color filter substrate and the array substrate are joined together, the bonding effect between the electrodes on the color filter substrate and the cathode on the array substrate is better. At the same time, under the action of the elastic support member, the electrode on the color filter substrate and the cathode on the array substrate are hardly damaged.
  • the height of each elastic support member is greater than the sum of the height of the intermediate spacer and the height of the corresponding electrode” means that the distance from the surface of the elastic support member away from the substrate to the substrate is greater than that from the spacer.
  • the upper electrode is away from the surface of the substrate to the substrate.
  • the elastic support member 300 may be designed to include the rigid segment 310 and the elastic segment 320 that are connected to each other.
  • the rigid section 310 is closer to the substrate 100 than the elastic section 320.
  • the rigid segments in the resilient support member can provide effective support for the elastic segments while the resilient support members do not undergo excessive deformation when mated.
  • the material forming the rigid segment may include silica gel and a nano material, wherein the nano material is selected from a nano column (eg, the nano column may include, but is not limited to, nano column zirconia, etc.) and a nano ball (eg, nano The ball may include, but is not limited to, at least one of carbon nanotubes and the like.
  • the rigid segments formed from the nanomaterials described above will have better stiffness and better support.
  • the precision of the formed elastic support is high.
  • the material forming the elastic segment comprises silica gel. Thereby, the formed elastic segments will have a more suitable elasticity, and a suitable deformation can be produced under the support of the rigid segments, so that the use performance is better.
  • the height of the rigid section may be selected to be one quarter to one third of the total height of the elastic support.
  • the support effect of the rigid section is better, while the elasticity of the elastic section is more suitable.
  • the elastic support member can be appropriately deformed.
  • the height of the elastic support is 0.3-0.5 micrometers larger than the sum of the height of the spacer and the height of the electrode.
  • the height of the elastic support may be greater than the sum of the height of the spacer and the height of the electrode by 0.3 microns, 0.32 microns, 0.34 microns, 0.36 microns, 0.38 microns, 0.4 microns, 0.42 microns, 0.44 microns, 0.46 microns, 0.48 microns, 0.5 micron, etc.
  • the elastic support member hardly damages the cathode on the array substrate, so that the contact effect between the electrodes on the color filter substrate and the cathode on the array substrate is better.
  • the height of the elastic support member is excessively different from the sum of the height of the spacer and the height of the electrode, the contact effect between the electrode and the cathode is less than ideal due to the excessive height of the elastic support member at the time of the mating.
  • this is still superior to the effect of the alignment between the color filter substrate and the array substrate which does not include any elastic support members.
  • the elastic support member when the height of the elastic support member is too small from the sum of the height of the spacer and the height of the electrode, the elastic support member does not function effectively, thereby easily causing crushing of the spacer against the electrode or the cathode. However, this is still superior to the effect of the matching between the color filter substrate and the array substrate which does not include any elastic support members.
  • the elastic support member has a size, for example, a width in the extended face of the color filter substrate, of 5 to 10 ⁇ m.
  • the elastic support may have a width of 5 microns, 6 microns, 7 microns, 8 microns, 9 microns, 10 microns, and the like.
  • the width of the elastic support member within the above range does not affect the light emission; meanwhile, on the other hand, the crushing of the first electrode or the cathode by the spacer spacer can be effectively avoided.
  • the elastic support and the spacer are spaced apart, for example, at a separation distance of 0 to 0.5 ⁇ m for the purpose of convenience of preparation. Thereby, it is possible to facilitate the preparation of the elastic support. Moreover, the elastic support members and spacers within the above-described interval range do not affect the light emission.
  • the color filter substrate may further include a black matrix layer 400.
  • the black matrix 400 layer is disposed between the substrate 100 and the spacers 200. Additionally, the black matrix layer 400 further includes a plurality of mutually spaced openings 410. An orthographic projection of each of the spacers 200 and its outer periphery on the substrate 100 on a portion of a black matrix layer between adjacent two openings 410 on the substrate 100 Orthographic projection. That is, the spacer and its outer peripheral elastic support are disposed on the side of the black matrix layer away from the substrate. Thereby, the light emission is not affected, thereby ensuring better use performance.
  • the color filter substrate may further include a flat layer 500.
  • the flat layer 500 is disposed between the black matrix layer 400 and the spacer 200 and covers the black matrix layer 400.
  • both the elastic support member 300 and the spacer 200 may be disposed on the surface of the flat layer 500 away from the substrate 100.
  • the material used to form the flat layer is a conventional material, for example, including but not limited to a transparent optical glue, and the like, and will not be further described herein.
  • the number of the spacers is not particularly limited as long as the requirements can be satisfied. It should be understood by those skilled in the art that the case of only one spacer is illustrated in the drawings herein, but this is not to be construed as limiting the disclosure.
  • the color filter substrate may also include a plurality of spacers. Moreover, when the color filter substrate contains a plurality of spacers, the spacers can be flexibly arranged according to actual needs.
  • the material for forming the spacer is a conventional material, and will not be described too much herein.
  • the electrode disposed on the lower surface of the spacer may be formed using a metal such as AlNd or Ag, and the conductive effect is better.
  • an embodiment further provides a display panel.
  • the display panel includes the color film substrate described above.
  • Such a display panel has a simple structure, is easy to implement, has a uniform display brightness, a high display quality, and is excellent in use performance.
  • the display panel may further include an array substrate. That is, the display panel can be formed by combining the color filter substrate and the array substrate.
  • the display panel includes: a first substrate (eg, the substrate described above with reference to FIGS. 1-4) 100 and a second substrate 600 disposed opposite to each other; and a first substrate 100 disposed on the first substrate 100
  • a black matrix layer 400, a planarization layer 500, at least one spacer 200, at least two elastic supports 300, a cathode 630, a pixel defining layer 621, and a thin film transistor array 610 are interposed between the second substrate 600 and the second substrate 600.
  • the black matrix layer 400 is disposed on a surface of the first substrate 100 adjacent to the second substrate 600 and includes a plurality of spaced apart first openings (eg, openings previously described with reference to FIGS. 1-4) 410.
  • the flat layer 500 is disposed on a surface of the black matrix layer 400 away from the first substrate 100 and covers the black matrix layer 400.
  • the at least one spacer 200 is disposed on a surface of the flat layer 500 away from the first substrate 100, and the electrode 210 is disposed on the lower surface.
  • the at least two elastic supports 300 are disposed on a surface of the flat layer 500 away from the first substrate 100, and at least two of the elastic supports 300 are disposed on an outer circumference of each of the spacers 200.
  • the at least two elastic supports 300 may be evenly spaced along the outer circumference of the spacer 200.
  • the thin film transistor array 610 is disposed on a surface of the second substrate 600 close to the first substrate 100.
  • the pixel defining layer 621 is disposed on a surface of the thin film transistor array 610 away from the second substrate 600 and includes a plurality of second openings 622.
  • the orthographic projection of the pixel defining layer 621 on the substrate 100 covers the orthographic projection of the black matrix layer 400 on the substrate 100, and the orthographic projection of the second opening 622 over the substrate 100 covers the first opening 410 at the substrate 100. Orthographic projection on.
  • an OLED light-emitting layer and an anode of the OLED light-emitting element 620 are also provided.
  • the cathode 630 is disposed on a surface of the OLED light emitting element 620 remote from the second substrate 600 and covers the OLED light emitting element 620 and the pixel defining layer 621.
  • the elastic support member 300 will be in a contracted state and have an elastic force toward the cathode 630.
  • the height of the contracted elastic support 300 will be equal to the sum of the height of the spacer 200 and the height of the electrode 210.
  • a material for forming a cathode may be indium tin oxide (ITO), indium zinc oxide (IZO), or the like.
  • a filling layer 700 may further be included between the color filter substrate and the array substrate.
  • the fill layer 700 is located between the cathode 630 and the flat layer 500 and is at least partially in contact with the electrode 210 and the elastic support 300. Thereby, the filling layer can function as a package.
  • the material for forming the filling layer may be photoresist or glass, etc., and will not be described too much herein.
  • the display panel is an OLED display panel, which may or may not include a color filter.
  • the display panel may further include an encapsulant, an electrode line, and the like, and will not be described in detail herein.
  • an embodiment further provides a method for preparing a color filter substrate. According to an embodiment of the present disclosure, referring to FIG. 7, the method includes the following steps.
  • S100 forming at least one spacer on one side of the substrate.
  • a method of forming a spacer may include photolithography or the like.
  • a method of forming a spacer may include depositing a full layer of insulating material on a side of the planar layer away from the substrate, and then patterning the insulating material to form the spacer Things. Regarding the specific patterning method, etching or the like may be included.
  • a black matrix layer and a flat layer may be first formed on the substrate before forming the spacer.
  • the method for forming the black matrix and the flat layer is a conventional method, and will not be described too much herein.
  • S200 forming at least one electrode on a side of the at least one spacer away from the first substrate.
  • a method for forming an electrode may include forming a whole layer of a conductive material on a surface of the flat layer away from the substrate by magnetron sputtering, thermal evaporation, plating, or the like, such that the entire layer A conductive material covers the spacers, and then the entire layer of conductive material is patterned to obtain the at least one electrode.
  • etching or the like may be included.
  • At least two elastic supports are formed at the outer circumference of each of the spacers in a plane parallel to the extended face of the first substrate, in particular, uniformly formed.
  • the elastic support and the spacer are disposed on the same side of the substrate.
  • the elastic support is disposed on a surface of the flat layer away from the substrate, and the height of the elastic support is greater than a sum of a height of the intermediate spacer and a height of the corresponding first electrode.
  • the elastic support is the same as the elastic support previously described with reference to Figures 1-6, and will not be described again here.
  • the step of forming the at least two elastic supports includes the following sub-steps.
  • S310 mixing silica gel, nano material, and solvent to obtain an ink.
  • the ink in order to provide the elastic support finally obtained with better performance, contains 5-10% of the nanomaterial and 30-40% of the silica gel by mass percentage, and The rest are the solvents.
  • the formed elastic support member after the inkjet printing and drying, the formed elastic support member has a better supporting effect, is more suitable for elasticity, and has better usability.
  • the nanomaterial is selected from at least one of a nanocolumn and a nanosphere.
  • the nano-pillars or nanospheres are consistent with the previously described and will not be repeated here.
  • the above solvent may be selected from an aromatic solvent (for example, cyclohexylbenzene or the like), cyclohexanol or an ether or the like.
  • S320 Applying the ink to the outer circumference of each of the spacers by inkjet printing and baking it to form the elastic support.
  • the amount of ink ejection forming each elastic support may be 10 to 100 picoliters.
  • the formed elastic support member has a moderate height and is excellent in use performance. Due to the high density of the nanomaterials, under the action of gravity, the nanomaterial will be deposited on the surface of the flat layer away from the substrate. The solvent can be volatilized more completely by baking the ink at 100 °C. Finally, the silica gel is coated on the outer surface of the nanomaterial to form an elastic support having a rigid section and an elastic section.
  • the above operation is simple, convenient, easy to implement and has high precision. Therefore, an elastic support member which is more suitable in elasticity and has a better supporting effect can be obtained.
  • the inventors have found that the above-described method of preparing a color filter substrate is simple, convenient, and easy to implement. Moreover, during the alignment of the obtained color filter substrate and the array substrate, it is also possible to effectively prevent the spacer from being crushed on the electrode on the color filter substrate or the cathode on the array substrate. Thereby, the bonding effect between the electrodes on the color filter substrate and the cathode on the array substrate is better.
  • the color filter substrate prepared by the above method is aligned with the array substrate at 80 ° C in a vacuum environment, and a display panel having a high yield can be obtained. Moreover, the phenomenon that the display panel is uneven in display brightness is improved, the picture quality is high, and the use performance is better.
  • the overlap between the external circuit and the cathode of the array substrate is assisted by forming a spacer.
  • the elasticity of the spacer is limited due to the presence of the filling layer, which in turn causes a phenomenon of crushing or other contact failure of the spacer on the electrode on the color filter substrate or the cathode on the array substrate during the bonding process.
  • by providing at least two elastic supports (in particular, evenly spaced elastic supports) on the outer circumference of each spacer it is possible to effectively prevent any spacer to the color filter substrate during the bonding process. A crush on the upper electrode or the cathode on the array substrate. Thereby, a better protection effect is provided, and an effective overlap between the external circuit and the cathode of the array substrate can be achieved, so that the use performance is better.
  • first, second, etc. are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implied the number of technical features involved. Thus, features defined by “first”, “second”, etc. may include one or more such features, either explicitly or implicitly. In the description of the present disclosure, the meaning of "a plurality" is two or more unless otherwise specifically defined.
  • installation is to be understood broadly unless otherwise specifically defined or defined.
  • it can be a fixed connection, a detachable connection, or an integral.
  • it can also be a mechanical connection or an electrical connection.
  • it may be directly connected or indirectly connected through an intermediate medium.
  • it can also be the internal communication of two components or the interaction of two components.
  • the specific meaning of the above terms in the present disclosure can be understood by one of ordinary skill in the art based on the specific circumstances.
  • the first feature "on” or “below” the second feature may be a direct contact of the first feature and the second feature, or may be a first feature and a second feature, unless explicitly stated or defined otherwise. Indirect contact through intermediate media.
  • the first feature "above”, “above” and “above” the second feature may be that the first feature is directly above or above the second feature, or may only indicate that the level of the first feature is higher than the second feature.
  • the level of the level The first feature “below”, “below” and “below” the second feature may mean that the first feature is directly below or below the second feature, or may only indicate that the level of the first feature is less than the second feature. Level height.

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Abstract

彩膜基板及其制备方法以及显示面板。彩膜基板包括：第一衬底（100）；位于所述第一衬底（100）的一侧上的至少一个间隔物（200）；位于所述至少一个间隔物（200）远离所述第一衬底（100）的一侧上的至少一个第一电极（210）；至少两个弹性支撑件（300），所述至少两个弹性支撑件（300）与所述至少一个间隔物（200）位于所述第一衬底（100）的同一侧上。在平行于所述第一衬底（100）的延伸面的平面中，每个所述间隔物（200）的外周处设置有至少两个所述弹性支撑件（300）。在垂直于所述第一衬底（100）的延伸面的方向上，每个所述间隔物（200）及其上的第一电极（210）的厚度之和小于其外周处的每个所述弹性支撑件（300）的高度。

Description

彩膜基板及其制备方法以及显示面板
对相关申请的交叉引用
本申请要求2018年5月4日提交的中国专利申请号201810434263.1的优先权，该中国专利申请以其整体通过引用并入本文。
技术领域
本公开涉及显示技术领域，并且具体地，涉及彩膜基板及其制备方法以及显示面板。
背景技术
在OLED显示面板中，如果外部线路过长或过细，那么将容易在外部电路上造成严重的电压梯度，使得真正到达OLED组件的电压较低。而且，由于OLED组件是利用电流进行驱动的，所以上述外部电压的降低将会导致显示面板的发光强度减少。
发明内容
根据本公开的一个方面，提供了一种彩膜基板。所述彩膜基板包括：第一衬底；位于所述第一衬底的一侧上的至少一个间隔物；位于所述至少一个间隔物远离所述第一衬底的一侧上的至少一个电极；以及至少两个弹性支撑件，所述至少两个弹性支撑件与所述至少一个间隔物位于所述第一衬底的同一侧上。在平行于所述第一衬底的延伸面的平面中，每个所述间隔物的外周处设置有至少两个所述弹性支撑件。在垂直于所述第一衬底的延伸面的方向上，每个所述间隔物及其上的电极的厚度之和小于其外周处的每个所述弹性支撑件的高度。
根据具体实现方案，在由本公开的实施例提供的彩膜基板中，在平行于所述第一衬底的延伸面的平面中，每个所述间隔物的外周处均匀地设置有至少两个所述弹性支撑件。
根据具体实现方案，在由本公开的实施例提供的彩膜基板中，所述弹性支撑件包括彼此连接的刚性段和弹性段，所述刚性段比弹性段更靠近所述第一衬底。
根据具体实现方案，在由本公开的实施例提供的彩膜基板中，在垂直于所述第一衬底的延伸面的方向上，所述刚性段的高度为所述弹性支撑件的总高度的四分之一到三分之一。
根据具体实现方案，在由本公开的实施例提供的彩膜基板中，所述刚性段包括硅胶和纳米材料，所述纳米材料选自纳米柱和纳米球中的至少一种，并且所述弹性段包括硅胶。
根据具体实现方案，在由本公开的实施例提供的彩膜基板中，在平行于所述第一衬底的延伸面的平面中，每个所述间隔物与其外周处的所述弹性支撑件的间距为0-0.5微米。
根据具体实现方案，在由本公开的实施例提供的彩膜基板中，在垂直于所述第一衬底的延伸面的方向上，每个所述间隔物及其上的电极的厚度之和比其外周处的每个所述弹性支撑件的高度小0.3-0.5微米。
根据具体实现方案，在由本公开的实施例提供的彩膜基板中，在平行于所述第一衬底的延伸面的平面中，所述弹性支撑件的尺寸为5-10微米。
根据具体实现方案，由本公开的实施例提供的彩膜基板，还包括：位于所述第一衬底和所述至少一个间隔物之间的黑矩阵层，所述黑矩阵层包括相互间隔的多个第一开口。每个所述间隔物及其外周处的所述弹性支撑件在所述第一衬底上的正投影被相邻两个第一开口之间的黑矩阵层的部分在所述第一衬底上的正投影覆盖。
根据本公开的另一方面，还提供了一种显示面板。所述显示面板包括：根据前面任一个实施例所述的彩膜基板。
根据具体实现方案，由本公开的实施例提供的显示面板，还包括：与所述彩膜基板相对设置的阵列基板。所述阵列基板包括在朝向所述彩膜基板的方向上依次设置的第二衬底、薄膜晶体管阵列、像素定义层和阴极层。所述像素定义层包括多个第二开口，每一个第二开口中彼此叠置有对应的阳极和有机发光层。所述彩膜基板上的每个所述电极由于所述弹性支撑件的收缩而与所述阵列基板上的阴极层的对应部分相接触。
根据本公开的又一方面，还提供了一种用于制作彩膜基板的方法。所述方法包括以下步骤：在第一衬底的一侧上形成至少一个间隔物； 在所述至少一个间隔物远离所述第一衬底的一侧上形成至少一个电极；以及在平行于所述第一衬底的延伸面的平面中，在每个所述间隔物的外周处形成至少两个弹性支撑件，其中，在垂直于所述第一衬底的延伸面的方向上，每个所述间隔物及其上的电极的厚度之和小于其外周处的每个所述弹性支撑件的高度。
根据具体实现方案，在由本公开的实施例提供的用于制作彩膜基板的方法中，形成所述至少两个弹性支撑件的步骤包括以下子步骤：在每个所述间隔物的外周处均匀地形成至少所述两个弹性支撑件。
根据具体实现方案，在由本公开的实施例提供的用于制作彩膜基板的方法中，形成所述至少两个弹性支撑件的步骤包括以下子步骤：混合硅胶、纳米材料和溶剂以得到墨水；以及利用喷墨打印将所述墨水施加于每个所述间隔物的外周处并且对其进行烘烤，以形成所述弹性支撑件，其中，所述纳米材料选自纳米柱和纳米球中的至少一种。
根据具体实现方案，在由本公开的实施例提供的用于制作彩膜基板的方法中，按照质量百分比计，所述墨水含有5-10％的所述纳米材料和30-40％的所述硅胶，并且其余全部为所述溶剂。
附图说明
图1是根据本公开的一个实施例的彩膜基板的结构示意图。
图2是根据本公开的另一个实施例的彩膜基板的结构示意图。
图3是根据本公开的另一个实施例的彩膜基板的结构示意图。
图4是根据本公开的另一个实施例的彩膜基板的结构示意图。
图5是根据本公开的一个实施例的显示面板的结构示意图。
图6是根据本公开的另一个实施例的显示面板的结构示意图。
图7是根据本公开的一个实施例的用于制备彩膜基板的方法的流程示意图。
图8是根据本公开的一个实施例的用于制备弹性支撑件的步骤的流程示意图。
具体实施方式
下面详细描述本公开中的实施例。下面描述的实施例是示例性的，仅用于解释本公开，而不能理解为对本公开的任何限制。对于实施例 中未注明具体技术或条件的情况，一般按照本领域内的文献所描述的技术或条件或者按照产品说明书进行。所用试剂或仪器未注明生产厂商者，并且均为可以通过市购获得的常规产品。
为了避免外部线路过长或过细所导致的OLED组件电压偏低的不利现象，通常，可以增加一个辅助电极以降低外部电路上的电压梯度，进而增加OLED显示面板的发光效率并且增加OLED组件的驱动电压。
为了增加辅助电极，通常的做法是在彩膜基板上制备间隔物，并且在间隔物的表面上形成电极。由此，通过压合，使得该电极与阵列基板上的阴极相接触，从而实现搭接。然而，由于阵列基板与彩膜基板之间的填充层的存在，使得间隔物材料较难实现高弹性，因而在工艺过程中会发生由于用力过大而导致的压伤现象，从而产生缺陷。相应地，用力过小则会发生接触不良或无法接触的问题，进而容易造成显示面板出现不同程度的显示画面不均匀的现象。
针对上述技术问题，通过深入研究，发明人已经发现，可以在每个间隔物的四周并且围绕间隔物设置(特别地，均匀地)至少两个弹性支撑件。此外，还可以将弹性支撑件的高度选择为大于间隔物的高度和位于间隔物上的电极的高度之和。由此，在进行压合时，由于弹性支撑件的弹性支撑作用，可以有效避免电极被压伤，并且能够实现彩膜基板上的电极与阵列基板上的阴极的有效搭接。
有鉴于此，在本公开的一个方面中，实施例提供了一种彩膜基板。根据本公开的实施例，参照图1，该彩膜基板包括：衬底100；至少一个间隔物200；以及至少两个弹性支撑件300。具体地，间隔物200设置在所述衬底100的下侧上，并且在间隔物200的下表面(即，远离衬底1的表面)上还设置有电极210。进一步地，所述至少两个弹性支撑件300与间隔物200设置在所述衬底100的同一侧上，即，同在下表面上。此外，每个所述间隔物200的外周设置有至少两个所述弹性支撑件300。特别地，所述至少两个弹性支撑件300可以沿所述间隔物200的外周均匀地间隔设置。另外，每个所述弹性支撑件300的高度h大于中间间隔物200的高度H和对应电极210的厚度d之和。根据本公开的实施例，所提供的彩膜基板的结构简单并且易于实现。当将这样的彩膜基板与阵列基板对合到一起时，彩膜基板上的电极与阵列基板上的阴极之间的搭接效果较佳。同时，在弹性支撑件的作用下，还 几乎不会损伤彩膜基板上的电极和阵列基板上的阴极。而且，通过在每个间隔物的外周均设置弹性支撑件，还可以有效避免任一个间隔物对彩膜基板上的电极或者阵列基板上的阴极的压伤，使得良率较高。
需要说明的是，以上表述“每个弹性支撑件的高度大于中间间隔物的高度和对应电极的高度之和”指的是从弹性支撑件远离衬底的表面到衬底的距离大于从间隔物上的电极远离衬底的表面到衬底的距离。
根据本公开的实施例，为了使弹性支撑件具备较为合适的弹性，参照图2，可以将弹性支撑件300设计为包括相互连接的刚性段310和弹性段320。具体地，所述刚性段310比所述弹性段320更靠近所述衬底100。以这样的方式，弹性支撑件中的上述刚性段可以对弹性段起到有效的支撑作用，同时弹性支撑件在对合时还不会产生过大的形变。最终，一方面，借助于间隔物实现了彩膜基板上的电极与阵列基板上的阴极的搭接；同时，另一方面，还有效地避免间隔物对上述电极或者阴极的不利压伤。根据本公开的实施例，形成刚性段的材料可以包括硅胶和纳米材料，其中，纳米材料选自纳米柱(例如，纳米柱可以包括但不限于纳米柱氧化锆等)和纳米球(例如，纳米球可以包括但不限于碳纳米管等)中的至少一种。由此，由上述纳米材料形成的刚性段将具有较佳的刚性和较佳的支撑效果。同时，所形成的弹性支撑件的精度较高。根据本公开的实施例，形成所述弹性段的材料包括硅胶。由此，形成的弹性段将具有较为合适的弹性，并且在刚性段的支撑下可以产生适当的形变，从而使用性能较佳。
根据本公开的实施例，为了获得弹性更为合适的弹性支撑件，所述刚性段的高度可以选择为所述弹性支撑件的总高度的四分之一到三分之一。由此，刚性段的支撑效果较佳，而同时弹性段的弹性较合适。在这样的情况下，当将彩膜基板和阵列基板对合到一起时，弹性支撑件可以产生适当的形变。最终，一方面，可以实现彩膜基板上的电极与阵列基板上的阴极之间的搭接，同时另一方面，还有效保护上述电极或者阴极不受间隔物的压伤。当刚性段占所述弹性支撑件的总高度的占比过低时，弹性支撑件的支撑效果不佳，从而在对合时容易导致由于弹性段的形变量过大进而使得间隔物压伤上述电极或者阴极的现象。然而，这还是要优于不包含任何弹性支撑件的彩膜基板与阵列基板之间的对合效果。与此相反，当刚性段占所述弹性支撑件的总高度 的占比过大时，弹性段的弹性不佳。因此，在对合时，弹性段容易压坏阵列基板上的阴极。同样地，这还是要优于不包含任何弹性支撑件的彩膜基板与阵列基板之间的对合效果。
根据本公开的实施例，所述弹性支撑件的高度比所述间隔物的高度和所述电极的高度之和大0.3-0.5微米。例如，弹性支撑件的高度可以比间隔物的高度和电极的高度之和大0.3微米、0.32微米、0.34微米、0.36微米、0.38微米、0.4微米、0.42微米、0.44微米、0.46微米、0.48微米、0.5微米等。由此，弹性支撑件的支撑效果较佳，并且在彩膜基板和阵列基板对合时还可以有效避免间隔物对上述电极或者阴极的压伤。而且，弹性支撑件还几乎不会对阵列基板上的阴极造成损伤，使得彩膜基板上的电极与阵列基板上的阴极之间的接触效果较佳。当弹性支撑件的高度与间隔物的高度和电极的高度之和相差过大时，在对合时由于弹性支撑件的高度过大会导致电极与阴极之间的接触效果不太理想。然而，这还是要优于不包含任何弹性支撑件的彩膜基板与阵列基板之间的对合效果。相应地，当弹性支撑件的高度与间隔物的高度和电极的高度之和相差过小时，弹性支撑件不能起到有效的支撑作用，从而容易导致间隔物对电极或者阴极的压伤。然而，这依然是要优于不包含任何弹性支撑件的彩膜基板与阵列基板之间的对合效果。
根据本公开的实施例，所述弹性支撑件在彩膜基板的延伸面中的尺寸，例如，宽度，为5-10微米。例如，所述弹性支撑件的宽度可以为5微米、6微米、7微米、8微米、9微米、10微米等。一方面，在上述范围内的弹性支撑件的宽度不会影响光的出射；同时，另一方面，还可以有效避免对合时间隔物对第一电极或者阴极的压伤。当弹性支撑件的宽度过大时，容易导致在对合时由于弹性支撑件的弹力过大而压坏阵列基板的阴极，从而可能会遮挡出射的光线。然而，这依然是要优于不包含任何弹性支撑件的彩膜基板与阵列基板之间的对合效果。与此相反，当宽度过小时，在对合过程中往往不能起到有效支撑的作用，使得间隔物容易压坏第一电极或者阴极。然而，这依然是要优于不包含任何弹性支撑件的彩膜基板与阵列基板之间的对合效果。根据本公开的实施例，出于制备方便的目的，所述弹性支撑件和所述间隔物间隔设置，例如，间隔距离为0-0.5微米。由此，可以便于制备弹性支撑件。而且，在上述间隔范围内的弹性支撑件和间隔物还不会 影响光的出射。
根据本公开的实施例，参照图3，彩膜基板还可以包括黑矩阵层400。该黑矩阵400层设置在衬底100和间隔物200之间。此外，所述黑矩阵层400还包括多个相互间隔的开口410。每个所述间隔物200及其外周的所述弹性支撑件300在所述衬底100上的正投影被相邻两个开口410之间的黑矩阵层的部分在所述衬底100上的正投影覆盖。也就是说，间隔物及其外周的弹性支撑件均设置在黑矩阵层远离衬底的一侧上。由此，不会影响光的出射，从而保证较佳的使用性能。
根据本公开的实施例，为了获得黑矩阵层相对比较平坦的表面，参照图4，彩膜基板还可以包括平坦层500。所述平坦层500设置在黑矩阵层400与间隔物200之间并且覆盖所述黑矩阵层400。与此同时，弹性支撑件300和间隔物200均可以设置在平坦层500远离衬底100的表面上。需要说明的是，用于形成平坦层的材料为常规材料，例如，包括但不限于透明光学胶等，并且在此不再过多赘述。
根据本公开的实施例，间隔物的数量没有特别限制，只要能够满足要求。本领域技术人员应当理解到，在本文的附图中仅以一个间隔物的情况为例进行说明，但是这并不能解读为对本公开的任何限制。事实上，彩膜基板还可以包括多个间隔物。而且，当彩膜基板含有多个间隔物时，这些间隔物可以根据实际需要灵活地布置。此外，用于形成间隔物的材料为常规材料，并且在此不再过多赘述。作为示例，设置在间隔物的下表面上的电极可以使用AlNd或者Ag等金属形成，其导电效果较佳。虽然在本文的附图中仅以两个弹性支撑件的情况为例进行说明，但是这并不能理解为对本公开的任何限制。关于弹性支撑件的具体数量，本领域技术人员能够依照本公开的教导而根据根据实际需要灵活地选择。
在本公开的另一方面，实施例还提供了一种显示面板。根据本公开的实施例，该显示面板包括前面所述的彩膜基板。这样的显示面板的结构简单，易于实现，显示亮度较为均匀，显示画面质量较高，并且使用性能较佳。
根据本公开的实施例，除了前面所述的彩膜基板之外，显示面板还可以包括阵列基板。即，通过将彩膜基板和阵列基板对合在一起，可以形成所述显示面板。具体地，参照图5，该显示面板包括：相对设 置的第一衬底(例如，前面参照图1-4所述的衬底)100和第二衬底600；以及设置在第一衬底100与第二衬底600之间的黑矩阵层400、平坦层500、至少一个间隔物200、至少两个弹性支撑件300、阴极630、像素界定层621和薄膜晶体管阵列610。所述黑矩阵层400设置在第一衬底100靠近第二衬底600的表面上，并且包括多个间隔设置的第一开口(例如，前面参照图1-4所述的开口)410。所述平坦层500设置在黑矩阵层400远离第一衬底100的表面上，并且覆盖黑矩阵层400。所述至少一个间隔物200设置在平坦层500远离第一衬底100的表面上，并且下表面上设置有电极210。所述至少两个弹性支撑件300设置在平坦层500远离第一衬底100的表面上，并且每个所述间隔物200的外周设置有至少两个所述弹性支撑件300。特别地，所述至少两个弹性支撑件300可以沿所述间隔物200的外周均匀地间隔设置。所述薄膜晶体管阵列610设置在第二衬底600靠近第一衬底100的表面上。所述像素界定层621设置在薄膜晶体管阵列610远离第二衬底600的表面上，并且包括多个第二开口622。而且，像素界定层621在衬底100上的正投影覆盖黑矩阵层400在衬底100上的正投影，并且第二开口622在衬底100上的正投影覆盖第一开口410在衬底100上的正投影。此外，在第二开口622中，还提供有OLED发光元件620的OLED发光层和阳极。所述阴极630设置在OLED发光元件620远离第二衬底600的表面上，并且覆盖OLED发光元件620和像素界定层621。在该显示面板中，即，在彩膜基板与阵列基板对合到一起之后，弹性支撑件300将处于收缩状态，并且具有朝向阴极630的弹力。在这样的情况下，收缩后的弹性支撑件300的高度将等于间隔物200的高度和电极210的高度之和。最终，使得彩膜基板上的电极210可以与阵列基板上的阴极630至少部分地接触。上述显示面板的结构简单，并且易于实现。而且，在弹性支撑件的支撑下，彩膜基板上的电极和阵列基板上的阴极几乎不会在压合期间被间隔物压伤。此外，弹性支撑件也几乎不会损坏阴极。由此，每一个间隔物上的电极与对应阵列基板上的阴极之间的接触效果较佳，进而在很大程度上减少显示画面不均匀的现象。最终，保证了整个显示面板的显示质量较高并且使用性能较佳。根据本公开的实施例，用于形成阴极的材料可以为氧化铟锡(ITO)、氧化铟锌(IZO)等。
根据本公开的实施例，参照图6，在彩膜基板和阵列基板之间还可以包括填充层700。所述填充层700位于阴极630和平坦层500之间，并且与电极210和弹性支撑件300至少部分地接触。由此，填充层可以起到封装的作用。用于形成填充层的材料可以为光刻胶或者玻璃等，并且在此不再过多赘述。
根据本公开的实施例，上述显示面板为OLED显示面板，其可以包括彩色滤光片，也可以不包括彩色滤光片。除了上述彩膜基板和阵列基板之外，显示面板还可以包括封装胶、电极线等，并且在此不再过多赘述。
在本公开的另一方面，实施例还提供了一种用于制备彩膜基板的方法。根据本公开的实施例，参照图7，该方法包括以下步骤。
S100：在衬底的一侧上形成至少一个间隔物。
根据本公开的实施例，所述间隔物与前面参照图1-6描述的间隔物相同，并且在此不再过多赘述。根据本公开的实施例，形成间隔物的方法可以包括光刻等。根据本公开的一个具体实施例，形成间隔物的方法可以包括在平坦层远离衬底的一侧上沉积一整层绝缘材料，并且然后对这一层绝缘材料进行图案化处理，以形成上述间隔物。关于具体的图案化方法，可以包括刻蚀等。
此外，根据本公开的实施例，在形成间隔物之前，还可以首先在衬底上形成黑矩阵层和平坦层。用于形成黑矩阵和平坦层的方法为常规方法，并且在此不再过多赘述。
S200：在所述至少一个间隔物远离所述第一衬底的一侧上形成至少一个电极。
根据本公开的实施例，所述电极与前面参照图1-6描述的电极210相同，并且在此不再过多赘述。根据本公开的一个具体实施例，用于形成电极的方法可以包括通过磁控溅射、热蒸发和电镀等方法在平坦层远离衬底的表面上形成一整层导电材料，使得这一整层导电材料覆盖上述间隔物，并且然后对这一整层导电材料进行图案化处理，以得到上述至少一个电极。关于具体的图案化方法，可以包括刻蚀等。
S300：在平行于所述第一衬底的延伸面的平面中，在每个所述间隔物的外周处形成至少两个弹性支撑件，特别地，均匀地形成。
根据本公开的实施例，所述弹性支撑件与所述间隔物设置在所述 衬底的同侧。具体地，弹性支撑件设置在平坦层远离衬底的表面上，并且所述弹性支撑件的高度大于中间间隔物的高度和对应第一电极的高度之和。
根据本公开的实施例，弹性支撑件与前面参照图1-6描述的弹性支撑件相同，并且在此不再过多赘述。
根据本公开的实施例，参照图8，形成所述至少两个弹性支撑件的步骤包括以下子步骤。
S310：混合硅胶、纳米材料和溶剂以得到墨水。
根据本公开的实施例，为了使最终获得的弹性支撑件具备较佳的性能，按照质量百分比计，所述墨水含有5-10％的所述纳米材料和30-40％的所述硅胶，并且其余均为所述溶剂。由此，在经过喷墨打印和烘干之后，所形成的弹性支撑件的支撑效果较佳，弹性较为合适，并且使用性能较佳。
根据本公开的实施例，所述纳米材料选自纳米柱和纳米球中的至少一种。而且，纳米柱或者纳米球与前面描述的情况保持一致，并且在此不再过多赘述。作为示例，上述溶剂可以选自芳香类溶剂(例如，环己基苯等)、环己醇或者醚类等。
S320：利用喷墨打印将所述墨水施加于每个所述间隔物的外周处并且对其进行烘烤，以形成所述弹性支撑件。
根据本公开的实施例，形成每个弹性支撑件的喷墨量可以为10-100皮升。由此，形成的弹性支撑件的高度适中，并且使用性能较佳。由于纳米材料的密度较大，所以在重力的作用下，纳米材料将沉积在平坦层远离衬底的表面上。通过将墨水在100℃下进行烘烤，可以使溶剂挥发得比较完全。最终，硅胶包覆在纳米材料的外表面上，从而形成具有刚性段和弹性段的弹性支撑件。上述操作简单、方便、易于实现并且精度较高。因此，可以获得弹性较为合适且支撑作用较佳的弹性支撑件。
发明人发现，上述彩膜基板的制备方法的操作简单、方便并且易于实现。而且，在所制得的彩膜基板与阵列基板的对合期间，还可以有效地避免间隔物对彩膜基板上的电极或者阵列基板上的阴极的压伤。由此，使得彩膜基板上的电极与阵列基板上的阴极之间的搭接效果较佳。
根据本公开的实施例，将通过以上方法制得的彩膜基板与阵列基板在真空环境中80℃下进行对合，即可获得良率较高的显示面板。而且，显示面板的显示亮度不均匀的现象得到改善，画面质量较高，并且使用性能较佳。
根据本公开的实施例，在一般的显示面板中，为了降低外部电路的消耗，通过形成间隔物来辅助外部电路与阵列基板的阴极之间的搭接。但是，由于填充层的存在使得间隔物的弹性受限，进而导致在对合过程中间隔物对彩膜基板上的电极或者阵列基板上的阴极的压伤或者其它接触不良等现象。而在本申请中，通过在每个间隔物的外周设置至少两个弹性支撑件(特别地，均匀间隔设置的弹性支撑件)，可以有效阻止在对合过程中任一个间隔物对彩膜基板上的电极或者阵列基板上的阴极的压伤。由此，提供较佳的保护效果，并且能够实现外部电路与阵列基板的阴极之间的有效搭接，使得使用性能较佳。
需要理解的是，在本公开的描述中，通过诸如“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等的术语指示的方位或位置关系为基于附图所示的方位或位置关系。这样的目的仅是为了便于描述本公开和/或简化描述，而不是指示或暗示所涉及的装置或元件必须具有特定的方位或者以特定的方位构造和操作。因此，这样的面朴树不能理解为对本公开的任何限制。
此外，诸如“第一”、“第二”等的术语仅用于描述性目的，而不能理解为指示或暗示相对重要性或者隐含所涉及的技术特征的数量。由此，利用“第一”、“第二”等限定的特征可以明确地或者隐含地包括一个或者更多个这样的特征。在本公开的描述中，除非另有明确的限定，否则“多个”的含义是两个或两个以上。
在本公开中，除非另有明确的规定或限定，否则诸如“安装”、“相连”、“连接”、“固定”等的术语应做广义理解。例如，它可以是固定连接，也可以是可拆卸连接，或成一体。可替换地，它也可以是机械连接或电连接。进一步地，它还可以是直接相连，或者通过中间媒介的间接相连。当然，它还可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具 体情况理解上述术语在本公开中的具体含义。
在本公开中，除非另有明确的规定或限定，否则第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触，也可以是第一特征和第二特征通过中间媒介间接接触。而且，第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方，也可以仅仅表示第一特征的水平高度高于第二特征的水平高度。第一特征在第二特征“之下”、“下方”和“下面”可以是指第一特征在第二特征正下方或斜下方，也可以仅仅表示第一特征的水平高度小于第二特征的水平高度。
在本说明书的描述中，诸如“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的参照性描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本公开的至少一个实施例或示例中。在本说明书中，对上述术语的示意性表述未必针对的是相同的实施例或示例。而且，所描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外，在不相互矛盾的情况下，本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。
尽管上面已经示出和描述了本公开的实施例，但是可以理解的是，上述实施例是示例性的，并且不能理解为对本公开的任何限制。本领域的普通技术人员在本公开的范围内可以对上述实施例进行变化、修改、替换和变型。

Claims (15)

  1. 一种彩膜基板，包括：
    第一衬底；
    位于所述第一衬底的一侧上的至少一个间隔物；
    位于所述至少一个间隔物远离所述第一衬底的一侧上的至少一个电极；以及
    至少两个弹性支撑件，所述至少两个弹性支撑件与所述至少一个间隔物位于所述第一衬底的同一侧上，其中
    在平行于所述第一衬底的延伸面的平面中，每个所述间隔物的外周处设置有至少两个所述弹性支撑件，并且
    在垂直于所述第一衬底的延伸面的方向上，每个所述间隔物及其上的电极的厚度之和小于其外周处的每个所述弹性支撑件的高度。
  2. 根据权利要求1所述的彩膜基板，其中，
    在平行于所述第一衬底的延伸面的平面中，每个所述间隔物的外周处均匀地设置有至少两个所述弹性支撑件。
  3. 根据权利要求1或2所述的彩膜基板，其中，
    所述弹性支撑件包括彼此连接的刚性段和弹性段，所述刚性段比弹性段更靠近所述第一衬底。
  4. 根据权利要求3所述的彩膜基板，其中，
    在垂直于所述第一衬底的延伸面的方向上，所述刚性段的高度为所述弹性支撑件的总高度的四分之一到三分之一。
  5. 根据权利要求3所述的彩膜基板，其中，
    所述刚性段包括硅胶和纳米材料，所述纳米材料选自纳米柱和纳米球中的至少一种，并且
    所述弹性段包括硅胶。
  6. 根据权利要求3所述的彩膜基板，其中，
    在平行于所述第一衬底的延伸面的平面中，每个所述间隔物与其外周处的所述弹性支撑件的间距为0-0.5微米。
  7. 根据权利要求3所述的彩膜基板，其中，
    在垂直于所述第一衬底的延伸面的方向上，每个所述间隔物及其上的电极的厚度之和比其外周处的每个所述弹性支撑件的高度小 0.3-0.5微米。
  8. 根据权利要求3所述的彩膜基板，其中，
    在平行于所述第一衬底的延伸面的平面中，所述弹性支撑件的尺寸为5-10微米。
  9. 根据权利要求1或2所述的彩膜基板，还包括：
    位于所述第一衬底和所述至少一个间隔物之间的黑矩阵层，所述黑矩阵层包括相互间隔的多个第一开口，其中
    每个所述间隔物及其外周处的所述弹性支撑件在所述第一衬底上的正投影被相邻两个第一开口之间的黑矩阵层的部分在所述第一衬底上的正投影覆盖。
  10. 一种显示面板，包括：根据权利要求1-9中任一项所述的彩膜基板。
  11. 根据权利要求10所述的显示面板，还包括：与所述彩膜基板相对设置的阵列基板，其中
    所述阵列基板包括在朝向所述彩膜基板的方向上依次设置的第二衬底、薄膜晶体管阵列、像素定义层和阴极层，
    所述像素定义层包括多个第二开口，每一个第二开口中彼此叠置有对应的阳极和有机发光层，并且
    所述彩膜基板上的每个所述电极由于所述弹性支撑件的收缩而与所述阵列基板上的阴极层的对应部分相接触。
  12. 一种用于制作彩膜基板的方法，包括：
    在第一衬底的一侧上形成至少一个间隔物；
    在所述至少一个间隔物远离所述第一衬底的一侧上形成至少一个电极；以及
    在平行于所述第一衬底的延伸面的平面中，在每个所述间隔物的外周处形成至少两个弹性支撑件，其中，
    在垂直于所述第一衬底的延伸面的方向上，每个所述间隔物及其上的电极的厚度之和小于其外周处的每个所述弹性支撑件的高度。
  13. 根据权利要求12所述的方法，其中，形成所述至少两个弹性支撑件的步骤包括：
    在每个所述间隔物的外周处均匀地形成至少所述两个弹性支撑件。
  14. 根据权利要求12或13所述的方法，其中，形成所述至少两个弹性支撑件的步骤包括：
    混合硅胶、纳米材料和溶剂以得到墨水；以及
    利用喷墨打印将所述墨水施加于每个所述间隔物的外周处并且对其进行烘烤，以形成所述弹性支撑件，其中
    所述纳米材料选自纳米柱和纳米球中的至少一种。
  15. 根据权利要求14所述的方法，其中，
    按照质量百分比计，所述墨水含有5-10％的所述纳米材料和30-40％的所述硅胶，并且其余全部为所述溶剂。
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