WO2019153753A1 - 一种触摸屏及其制作方法、触控显示装置 - Google Patents

一种触摸屏及其制作方法、触控显示装置 Download PDF

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WO2019153753A1
WO2019153753A1 PCT/CN2018/107009 CN2018107009W WO2019153753A1 WO 2019153753 A1 WO2019153753 A1 WO 2019153753A1 CN 2018107009 W CN2018107009 W CN 2018107009W WO 2019153753 A1 WO2019153753 A1 WO 2019153753A1
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Prior art keywords
layer
touch
reflection layer
touch screen
display device
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PCT/CN2018/107009
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English (en)
French (fr)
Inventor
杨忠正
张明
陈启程
马伟杰
都智
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京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Priority to US16/328,826 priority Critical patent/US11392229B2/en
Publication of WO2019153753A1 publication Critical patent/WO2019153753A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds

Definitions

  • the present disclosure relates to a touch screen, a method of fabricating the same, and a touch display device.
  • the OGS (One Glass Solution) touch screen is a capacitive touch screen that directly forms a touch electrode on a glass substrate, so that a glass substrate can simultaneously serve as a protective glass and a touch sensor, thereby saving the glass substrate.
  • the number reduces the production cost of the touch display device.
  • the touch display device when the touch display device is off, the touch display device cannot realize the mirror display because the reflectivity of the integrated touch touch screen is low.
  • the present disclosure discloses a touch screen comprising: a substrate; a first anti-reflection layer disposed on the first surface of the substrate; a second anti-reflection layer disposed on the second surface of the substrate; a touch function layer disposed on a surface of the second anti-reflection layer away from the substrate;
  • first surface and the second surface are opposite.
  • the material of the first anti-reflection layer is ruthenium oxide.
  • the thickness of the first anti-reflection layer is not
  • the second anti-reflection layer comprises a ruthenium oxide layer, and the thickness of the ruthenium oxide layer is
  • the second anti-reflective layer further includes a silicon oxide layer on a side of the yttrium oxide layer facing away from the substrate, the thickness of the silicon oxide layer is
  • the touch screen further includes an anti-shadow layer, the anti-shadow layer being located on a side of the touch function layer facing away from the second anti-reflection layer.
  • the touch screen further includes an anti-fingerprint layer, the anti-fingerprint layer being located on a side of the first anti-reflective layer facing away from the substrate.
  • the disclosure also discloses a method for manufacturing a touch screen, including:
  • the first anti-reflection layer and the second anti-reflection layer are both formed by a sputtering process.
  • the present disclosure also discloses a touch display device, including a display screen and the touch screen described above.
  • the touch display device further includes an optical transparent adhesive disposed between the display screen and the touch screen, and the optical transparent adhesive is used to fit the display screen and the touch screen.
  • the display screen is an LCD (Liquid Crystal Display) display or an OLED (Organic Light Emitting Diode) display.
  • LCD Liquid Crystal Display
  • OLED Organic Light Emitting Diode
  • first anti-reflection layer on the first surface of the base substrate, forming a second anti-reflection layer on the second surface of the base substrate, and forming a touch function layer on the second anti-reflection layer, based on the first anti-reflection layer
  • the high reflectivity of the second anti-reflection layer can improve the reflectivity of the touch screen, so that the reflectivity of the touch display device formed by the subsequent bonding can reach 30%-50%, and the touch display device has a mirror display when the screen is off.
  • the function also makes the display effect of the touch display device on the bright screen not greatly affected, and enriches the function of the touch screen.
  • FIG. 1 is a schematic structural diagram of a touch screen according to an embodiment of the present disclosure
  • FIG. 2 is a schematic structural diagram of another touch screen according to an embodiment of the present disclosure.
  • FIG. 3 is a schematic structural diagram of still another touch screen according to an embodiment of the present disclosure.
  • FIG. 4 is a flow chart showing a method of fabricating a touch screen according to an embodiment of the present disclosure
  • FIG. 5 is a schematic structural diagram of a touch display device according to an embodiment of the present disclosure.
  • FIG. 6 is a graph showing a comparison of reflectances of a touch display device and a conventional touch display device according to an embodiment of the present disclosure.
  • the integrated touch touch screen and the display screen can form a TLCM (Touch Liquid Crystal Module).
  • TLCM Touch Liquid Crystal Module
  • the integrated touch screen has a transmittance of 80%-90%, so that it is formed after bonding.
  • the reflectivity of the touch display device is 5%-10%, and the touch display device has a good display effect when the screen is bright, but the mirror display cannot be realized when the screen is off.
  • FIG. 1 a schematic structural diagram of a touch screen according to an embodiment of the present disclosure is shown.
  • An embodiment of the present disclosure provides a touch screen including: a base substrate 11, a first anti-reflection layer 12 formed on a first surface of the base substrate 11, and a second anti-reflection layer 13 formed on the second surface of the base substrate 11. And a touch function layer 14 formed on the second anti-reflection layer 13 away from the surface of the substrate; wherein the first surface and the second surface are opposite.
  • the material of the first anti-reflection layer 12 is yttrium oxide Nb 2 O 5 . In an exemplary embodiment, other materials such as zirconia ZrO 2 and the like may also be used; the thickness of the first anti-reflection layer 12 is In some embodiments, the thickness of the first anti-reflection layer 12 is
  • the touch screen in the embodiment of the present disclosure may be an integrated touch touch screen;
  • the base substrate 11 may be a glass substrate, and in an exemplary embodiment, a substrate of other materials, such as a quartz substrate, a resin substrate, or the like, may be used, and the present disclosure is implemented. This example does not limit this.
  • the first anti-reflection layer 12 is formed on the first surface of the base substrate 11, and the second anti-reflection layer 13 is formed on the second surface of the base substrate 11.
  • the reflectivity of the touch screen is greatly improved, so that the touch formed by the subsequent bonding is formed.
  • the reflectivity of the display device can reach 30%-50%. If the first anti-reflection layer 12 is formed only on the first surface of the substrate substrate 11, or the second anti-reflection layer 13 is formed only on the second surface of the substrate substrate 11, The reflectivity of the touch screen is improved to some extent, but the reflectivity of the touch display device formed by subsequent bonding cannot reach 30%. Therefore, only the first anti-reflection layer 12 or the second anti-reflection layer is formed on the base substrate 11. 13.
  • the touch display device formed by the subsequent bonding cannot realize the mirror display function when the screen is turned off.
  • FIG. 2 a schematic structural diagram of another touch screen of an embodiment of the present disclosure is shown.
  • the touch screen shown in FIG. 2 differs from the touch screen shown in FIG. 1 in that the structure of the second anti-reflection layer 13 is different.
  • the second anti-reflection layer 13 includes a ruthenium oxide layer, and the thickness of the ruthenium oxide layer is In some embodiments, the thickness of the yttrium oxide layer is
  • the second anti-reflection layer 13 further includes a silicon oxide layer 132 on the side of the yttrium oxide layer 131 facing away from the substrate 11, and the thickness of the silicon oxide layer 132 is In some embodiments, the thickness of the silicon oxide layer 132 is
  • the yttria layer in the second anti-reflection layer 13 may also be replaced with a zirconia layer.
  • FIG. 3 a schematic structural diagram of still another touch screen of an embodiment of the present disclosure is shown.
  • the touch screen further includes an erasing layer 15 on the side of the touch function layer 14 facing away from the second anti-reflection layer 13.
  • the material of the color erasing layer 15 is silicon oxynitride SiO x N y , which is used to improve the obvious pattern of the touch function layer 14 and realize the elimination of the touch function layer 14 .
  • the touch screen further includes an anti-fingerprint layer 16 on the side of the first anti-reflective layer 12 facing away from the substrate 11.
  • an anti-fingerprint layer 16 on the side of the first anti-reflective layer 12 facing away from the substrate 11.
  • the anti-fingerprint layer 16 can also be called an ASF (Anti Finger Film).
  • the material of the anti-fingerprint layer 16 is an organic high molecular polymer.
  • the erasing layer 15 and the anti-fingerprint layer 16 may also be formed on the touch screen shown in FIG. 1, and the specific positions of the erasing layer 15 and the anti-fingerprint layer 16 are the same as those shown in FIG. This will not be repeated here.
  • a second anti-reflection layer is formed on a second surface of the base substrate by forming a first anti-reflection layer on the first surface of the base substrate, and the second anti-reflection layer is away from the base substrate on the second anti-reflection layer
  • Forming a touch function layer on the surface can improve the reflectivity of the touch screen, by adding the silicon oxynitride layer only in the second anti-reflection layer, through the level matching
  • the reflectivity of the touch display device formed by the subsequent bonding can reach 30%-50%, and the touch display device has a mirror display function when the screen is off, and the display effect of the touch display device is not affected when the screen is bright. Larger impact, enriching the functionality of the touch screen.
  • FIG. 4 a flowchart of a method for fabricating a touch screen according to an embodiment of the present disclosure may be specifically included.
  • Step 401 forming a first anti-reflection layer on the first surface of the base substrate.
  • the first anti-reflection layer 12 may be formed on the first surface of the base substrate 11 by a sputtering process.
  • the base substrate 11 may be a glass substrate, a quartz substrate, a resin substrate or the like; the material of the first anti-reflection layer 12 may be yttrium oxide Nb 2 O 5 or zirconium oxide ZrO 2 , etc., and the thickness of the first anti-reflection layer 12 is
  • Step 402 forming a second anti-reflection layer on the second surface of the base substrate; the first surface and the second surface are opposite.
  • the second anti-reflection layer 13 may be formed on the second surface of the substrate substrate 11 by a sputtering process, and the first surface and the second surface are opposite to each other on both sides of the substrate substrate 11.
  • a ruthenium oxide layer can be directly formed on the second surface of the base substrate 11 by a sputtering process, and the material thereof is ruthenium oxide Nb 2 O 5 . , thickness is
  • a ruthenium oxide layer 131 may be formed on the second surface of the base substrate 11 by a sputtering process.
  • the material of the yttria layer 131 is yttrium oxide Nb 2 O 5 and has a thickness of
  • a silicon oxide layer 132 is formed on the side of the yttrium oxide layer 131 facing away from the substrate 11 by a sputtering process.
  • the silicon oxide layer 132 is made of silicon oxide SiO 2 and has a thickness of
  • both the first anti-reflection layer 12 and the second anti-reflection layer 13 are formed by a sputtering process, and the structures of the first anti-reflection layer 12 and the second anti-reflection layer 13 are easy to implement, no need to add equipment, and the process cost is low. Easy to achieve mass production.
  • the sputtering process bombards the target with particles of a certain energy, such as ions, neutral atoms, molecules, etc., so that the atoms or molecules on the surface of the target obtain sufficient energy to finally escape the target, the atoms that escape or Molecules are deposited onto the surface of the substrate being plated to form the desired film.
  • a certain energy such as ions, neutral atoms, molecules, etc.
  • a ruthenium oxide layer is formed by a sputtering process
  • the surface of the ruthenium oxide is bombarded by particles of a certain energy, such that atoms or molecules on the surface of the ruthenium oxide escape, and finally deposited on the substrate 11
  • a silicon oxide layer is formed by a sputtering process
  • the silicon oxide surface is bombarded by particles of a certain energy such that atoms or molecules on the surface of the silicon oxide escape and finally deposit on the yttrium oxide layer 131.
  • Step 403 forming a touch function layer on the surface of the second anti-reflection layer away from the substrate.
  • the touch function layer 14 is formed on the second anti-reflection layer 13 by a patterning process.
  • the patterning process generally includes a substrate cleaning, film formation, photoresist coating, exposure, development, etching, photoresist stripping, etc.; the metal layer is usually formed by physical vapor deposition (for example, magnetron sputtering).
  • a pattern is formed by wet etching, and a film is usually formed by chemical vapor deposition for a non-metal layer, and a pattern is formed by dry etching.
  • the erasing layer 15 may also be formed on the touch function layer 14 to form an anti-fingerprint layer 16 on the first anti-reflection layer 12.
  • a first anti-reflection layer is formed on the first surface of the base substrate
  • a second anti-reflection layer is formed on the second surface of the base substrate
  • a touch function layer is formed on the second anti-reflection layer.
  • the reflectivity of the touch screen can be improved based on the high reflectivity of the first anti-reflection layer and the second anti-reflection layer, so that the reflectivity of the touch display device formed by the subsequent bonding can reach 30%-50%, and the touch display device
  • the screen display function is provided when the screen is off, and the display effect of the touch display device on the bright screen is not greatly affected, and the function of the touch screen is enriched.
  • FIG. 5 a schematic structural diagram of a touch display device according to an embodiment of the present disclosure is shown.
  • Embodiments of the present disclosure provide a touch display device including a display screen 51 and the touch screen described above.
  • the display screen 51 and the touch screen are pasted by the optical transparent adhesive 52.
  • the optical transparent adhesive can also be called OCR (Optical Clear Resin), and the display screen 51 is attached to the touch screen by using the optical transparent adhesive 52, so that the display screen 51 has good adhesion to the touch screen, and the touch display is good.
  • the display of the device has less impact.
  • the display screen 21 is an LCD display screen or an OLED display screen.
  • FIG. 6 a comparison graph of reflectances of a touch display device and a conventional touch display device according to an embodiment of the present disclosure is shown.
  • the abscissa in FIG. 6 represents the wavelength of the light
  • the ordinate represents the reflectance of the touch display device
  • the curve indicated by the solid line refers to the reflectance of the touch display device of the present disclosure, that is, the mirror TLCM reflectance
  • the dotted line refers to the reflectivity of the existing touch display device, that is, the ordinary TLCM reflectance.
  • the contrast graph of the reflectance shown in FIG. 6 is experimentally determined. As can be seen from FIG. 6, the reflectance of the touch display device of the present disclosure is greater than the range of light of different wavelengths (400 nm to 700 nm). The reflectivity of the existing touch display device, and the reflectivity of the touch display device of the present disclosure can reach 30%-50%.
  • the touch display device may be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a navigator, and the like.
  • the touch display device includes a display screen and the touch screen, and a second anti-reflection layer is formed on the second surface of the substrate by forming a first anti-reflection layer on the first surface of the substrate.
  • a touch function layer is formed on the second anti-reflection layer, and based on the high reflectivity of the first anti-reflection layer and the second anti-reflection layer, the reflectivity of the touch screen can be improved, so that the reflection of the touch display device formed by subsequent bonding
  • the rate can reach 30%-50%, and the touch display device has a mirror display function when the screen is off, and the display effect of the touch display device on the bright screen is not greatly affected, and the function of the touch screen is enriched.

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Abstract

本公开提供了一种触摸屏及其制作方法、触控显示装置，涉及显示技术领域。本公开通过在衬底基板的第一表面形成第一增反层，在衬底基板的第二表面形成第二增反层，在第二增反层远离所述衬底基板的表面形成触控功能层，基于第一增反层和第二增反层的高反射率，可提高触摸屏的反射率，使得后续贴合形成的触控显示装置的反射率可达到30％-50％，触控显示装置在熄屏时具有镜面显示功能，同时使得触控显示装置在亮屏时的显示效果不受较大的影响，丰富触摸屏的功能。 (图1)

Description

一种触摸屏及其制作方法、触控显示装置
交叉引用
本申请要求于2018年2月7日提交的申请号为201810124353.0、的中国专利申请的优先权，该中国专利申请的全部内容通过引用全部并入本文。
技术领域
本公开涉及一种触摸屏及其制作方法、触控显示装置。
背景技术
OGS(One Glass Solution，一体化触控)触摸屏是一种在玻璃基板上直接形成触控电极的电容式触摸屏，使得一块玻璃基板同时起到保护玻璃和触摸传感器的双重作用，能够节约玻璃基板的数量，降低触控显示装置的生产成本。
但是，触控显示装置在熄屏时，由于一体化触控触摸屏的反射率较低，导致触控显示装置无法实现镜面显示。
发明内容
本公开公开了一种触摸屏，包括：衬底基板；第一增反层，设置在所述衬底基板的第一表面；第二增反层，设置在所述衬底基板的第二表面；触控功能层，设置在所述第二增反层远离所述衬底基板的表面；
其中，所述第一表面和所述第二表面相对。
可选地，所述第一增反层的材料为氧化铌。
可选地，所述第一增反层的厚度为
Figure PCTCN2018107009-appb-000001
可选地，所述第二增反层包括氧化铌层，所述氧化铌层的厚度为
Figure PCTCN2018107009-appb-000002
可选地，所述第二增反层还包括位于所述氧化铌层背离所述衬底基板一侧的氧化硅层，所述氧化硅层的厚度为
Figure PCTCN2018107009-appb-000003
可选地，所述触摸屏还包括消影层，所述消影层位于所述触控功能层背离所述第二增反层的一侧。
可选地，所述触摸屏还包括防指纹层，所述防指纹层位于所述第一增反层上背离所 述衬底基板的一侧。
本公开还公开了一种触摸屏的制作方法，包括：
在衬底基板的第一表面形成第一增反层；
在所述衬底基板的第二表面形成第二增反层；所述第一表面和所述第二表面相对；
在所述第二增反层远离所述衬底基板的表面形成触控功能层。
可选地，所述第一增反层和所述第二增反层均采用溅射工艺形成。
本公开还公开了一种触控显示装置，包括显示屏及上述的触摸屏。
可选地，所述触控显示装置还包括光学透明胶，设置于所述显示屏与所述触摸屏之间，所述光学透明胶用于贴合所述显示屏与所述触摸屏。
可选地，所述显示屏为LCD(Liquid Crystal Display，液晶显示器)显示屏或OLED(Organic Light Emitting Diode，有机发光二极管)显示屏。
本公开包括以下优点：
通过在衬底基板的第一表面形成第一增反层，在衬底基板的第二表面形成第二增反层，在第二增反层上形成触控功能层，基于第一增反层和第二增反层的高反射率，可提高触摸屏的反射率，使得后续贴合形成的触控显示装置的反射率可达到30％-50％，触控显示装置在熄屏时具有镜面显示功能，同时使得触控显示装置在亮屏时的显示效果不受较大的影响，丰富触摸屏的功能。
附图说明
图1示出了本公开实施例的一种触摸屏的结构示意图；
图2示出了本公开实施例的另一种触摸屏的结构示意图；
图3示出了本公开实施例的再一种触摸屏的结构示意图；
图4示出了本公开实施例的一种触摸屏的制作方法的流程图；
图5示出了本公开实施例的一种触控显示装置的结构示意图；
图6示出了本公开实施例的触控显示装置和现有的触控显示装置的反射率的对比曲线图。
具体实施方式
为使本公开的上述目的、特征和优点能够更加明显易懂，下面结合附图和具体实施 方式对本公开作进一步详细的说明。
将一体化触控触摸屏与显示屏贴合后可以形成TLCM(Touch Liquid Crystal Module，触控显示装置)，通常一体化触控触摸屏的透过率为80％-90％，因此，贴合后形成的触控显示装置的反射率为5％-10％，触控显示装置在亮屏时有很好的显示效果，但是在熄屏时无法实现镜面显示。
参照图1，示出了本公开实施例的一种触摸屏的结构示意图。
本公开实施例提供了一种触摸屏，包括：衬底基板11、形成在衬底基板11第一表面的第一增反层12，形成在衬底基板11第二表面的第二增反层13，以及形成在第二增反层13远离所述衬底基板表面上的触控功能层14；其中，第一表面和第二表面相对。
第一增反层12的材料为氧化铌Nb 2O 5，在示例性实施例中，也可采用其他材料，如氧化锆ZrO 2等；第一增反层12的厚度为
Figure PCTCN2018107009-appb-000004
在一些实施例中，第一增反层12的厚度为
Figure PCTCN2018107009-appb-000005
本公开实施例中的触摸屏可以为一体化触控触摸屏；衬底基板11可以采用玻璃基板，在示例性实施例中，也可采用其他材料的基板，如石英基板、树脂基板等，本公开实施例对此不做限制。
其中，在衬底基板11第一表面形成第一增反层12，在衬底基板11第二表面形成第二增反层13，使得触摸屏的反射率大大提高，使得后续贴合形成的触控显示装置的反射率可达到30％-50％，若只在衬底基板11第一表面形成第一增反层12，或者只在衬底基板11第二表面形成第二增反层13，可在一定程度上提高触摸屏的反射率，但是后续贴合形成的触控显示装置的反射率无法达到30％，因此，只在衬底基板11上形成第一增反层12或第二增反层13，后续贴合形成的触控显示装置在熄屏时无法实现镜面显示功能。
参照图2，示出了本公开实施例的另一种触摸屏的结构示意图。
图2所示的触摸屏与图1所示的触摸屏的区别在于，第二增反层13的结构不同。
如图1所示，第二增反层13包括氧化铌层，氧化铌层的厚度为
Figure PCTCN2018107009-appb-000006
在一些实施例中，氧化铌层的厚度为
Figure PCTCN2018107009-appb-000007
如图2所示，在图1的基础上，第二增反层13还包括位于氧化铌层131背离衬底基板11一侧的氧化硅层132，氧化硅层132的厚度为
Figure PCTCN2018107009-appb-000008
在一些实施例中，氧化硅层132的厚度为
Figure PCTCN2018107009-appb-000009
基于光学匹配设计，如图2所示，通过在氧化铌层131上增加一层氧化硅层132，进一步提高触摸屏的反射率。
在示例性实施例中，第二增反层13中的氧化铌层也可用氧化锆层代替。
参照图3，示出了本公开实施例的再一种触摸屏的结构示意图。
在图2的基础上，触摸屏还包括消影层15，消影层15位于触控功能层14背离第二增反层13的一侧。该消影层15的材料为氮氧化硅SiO xN y，用于改善触控功能层14图案明显的问题，实现触控功能层14的消影。
在本公开实施例中，触摸屏还包括防指纹层16，防指纹层16位于第一增反层12上背离衬底基板11的一侧。通过在第一增反层12上增加防指纹层16，防止手指直接触摸第一增反层12导致指纹残留，该防指纹层16也可称为ASF(Anti Finger Film，防指纹层)，该防指纹层16的材料为有机高分子聚合物。
在示例性实施例中，也可以在图1所示的触摸屏上形成消影层15和防指纹层16，消影层15和防指纹层16的具***置与图3所示的位置相同，在此不再赘述。
在本公开实施例中，通过在衬底基板的第一表面形成第一增反层，在衬底基板的第二表面形成第二增反层，在第二增反层远离所述衬底基板表面上形成触控功能层，基于第一增反层和第二增反层的高反射率，可提高触摸屏的反射率，，通过仅在第二增反层增加氮氧化硅层，通过层级配合，使得后续贴合形成的触控显示装置的反射率可达到30％-50％，触控显示装置在熄屏时具有镜面显示功能，同时使得触控显示装置在亮屏时的显示效果不受较大的影响，丰富触摸屏的功能。
参照图4，示出了本公开实施例的一种触摸屏的制作方法的流程图，具体可以包括如下步骤：
步骤401，在衬底基板的第一表面形成第一增反层。
在本公开实施例中，可采用溅射工艺在衬底基板11的第一表面形成第一增反层12。
其中，衬底基板11可以采用玻璃基板、石英基板、树脂基板等；第一增反层12的材料可以为氧化铌Nb 2O 5或氧化锆ZrO 2等，第一增反层12的厚度为
Figure PCTCN2018107009-appb-000010
步骤402，在所述衬底基板的第二表面形成第二增反层；所述第一表面和所述第二表面相对。
在本公开实施例中，可采用溅射工艺在衬底基板11的第二表面形成第二增反层13， 第一表面和第二表面相对，分别位于衬底基板11的两侧。
如图1所示，当第二增反层13为氧化铌层时，可采用溅射工艺在衬底基板11的第二表面直接形成一层氧化铌层，其材料为氧化铌Nb 2O 5，厚度为
Figure PCTCN2018107009-appb-000011
如图2所示，当第二增反层13为氧化铌层131和氧化硅层132的复合层时，可采用溅射工艺在衬底基板11的第二表面先形成一层氧化铌层131，该氧化铌层131的材料为氧化铌Nb 2O 5，厚度为
Figure PCTCN2018107009-appb-000012
然后在氧化铌层131上背离衬底基板11的一侧也采用溅射工艺形成一层氧化硅层132，该氧化硅层132的材料为氧化硅SiO 2，厚度为
Figure PCTCN2018107009-appb-000013
也就是说，第一增反层12和第二增反层13均采用溅射工艺形成，第一增反层12和第二增反层13的结构易实现，无需增加设备，工艺成本低，易实现量产。
其中，溅射工艺是以一定能量的粒子轰击靶材，如离子、中性原子、分子等，使靶材表面的原子或分子获得足够大的能量而最终逸出靶材，逸出的原子或分子沉积到被镀衬底的表面，形成所需要的薄膜。
当采用溅射工艺形成氧化铌层时，通过一定能量的粒子轰击氧化铌表面，使得氧化铌表面的原子或分子逸出，最终沉积到衬底基板11上；当采用溅射工艺形成氧化硅层132时，通过一定能量的粒子轰击氧化硅表面，使得氧化硅表面的原子或分子逸出，最终沉积到氧化铌层131上。
步骤403，在所述第二增反层远离所述衬底基板表面上形成触控功能层。
在本公开实施例中，采用构图工艺在第二增反层13上形成触控功能层14。构图工艺通常包括基板清洗、成膜、光刻胶涂覆、曝光、显影、刻蚀、光刻胶剥离等工序；对于金属层通常采用物理气相沉积方式(例如磁控溅射法)成膜，通过湿法刻蚀形成图形，而对于非金属层通常采用化学气相沉积方式成膜，通过干法刻蚀形成图形。
在本公开一种的实施例中，还可以在触控功能层14上形成消影层15，在第一增反层12上形成防指纹层16。
在本公开实施例中，通过在衬底基板的第一表面形成第一增反层，在衬底基板的第二表面形成第二增反层，在第二增反层上形成触控功能层，基于第一增反层和第二增反层的高反射率，可提高触摸屏的反射率，使得后续贴合形成的触控显示装置的反射率可达到30％-50％，触控显示装置在熄屏时具有镜面显示功能，同时使得触控显示装置在亮 屏时的显示效果不受较大的影响，丰富触摸屏的功能。
参照图5，示出了本公开实施例的一种触控显示装置的结构示意图。
本公开实施例提供了一种触控显示装置，包括显示屏51及上述的触摸屏。
关于触摸屏的具体描述可以参照实施例一和实施例二的描述，本公开实施例对此不再赘述。
在本公开实施例中，显示屏51和触摸屏之间通过光学透明胶52贴合。光学透明胶也可称为OCR(Optical Clear Resin，光学透明胶)，通过使用光学透明胶52将显示屏51与触摸屏贴合，使得显示屏51与触摸屏的粘结性好，且对触控显示装置的显示影响较小。
需要说明的是，显示屏21为LCD显示屏或OLED显示屏。
参照图6，示出了本公开实施例的触控显示装置和现有的触控显示装置的反射率的对比曲线图。
图6中的横坐标表示光线的波长，纵坐标表示触控显示装置的反射率，实线所示的曲线指的是本公开的触控显示装置的反射率，即镜面TLCM反射率，虚线所示的曲线指的是现有的触控显示装置的反射率，即普通TLCM反射率。
图6所示的反射率的对比曲线图是通过实验测定的，从图6中可以看出，在不同波长(400nm-700nm)的光线范围内，本公开的触控显示装置的反射率均大于现有的触控显示装置的反射率，且本公开的触控显示装置的反射率可达到30％-50％。
在实际应用中，所述触控显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、导航仪等任何具有显示功能的产品或部件。
在本公开实施例中，该触控显示装置包括显示屏及上述的触摸屏，通过在衬底基板的第一表面形成第一增反层，在衬底基板的第二表面形成第二增反层，在第二增反层上形成触控功能层，基于第一增反层和第二增反层的高反射率，可提高触摸屏的反射率，使得后续贴合形成的触控显示装置的反射率可达到30％-50％，触控显示装置在熄屏时具有镜面显示功能，同时使得触控显示装置在亮屏时的显示效果不受较大的影响，丰富触摸屏的功能。
对于前述的方法实施例，为了简单描述，故将其都表述为一系列的动作组合，但是本领域技术人员应该知悉，本公开并不受所描述的动作顺序的限制，因为依据本公开，某些步骤可以采用其他顺序或者同时进行。其次，本领域技术人员也应该知悉，说明书 中所描述的实施例均属于优选实施例，所涉及的动作和模块并不一定是本公开所必须的。
本说明书中的各个实施例均采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似的部分互相参见即可。
最后，还需要说明的是，在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、商品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、商品或者设备所固有的要素。在没有更多限制的情况下，由语句“包括一个……”限定的要素，并不排除在包括所述要素的过程、方法、商品或者设备中还存在另外的相同要素。
以上对本公开所提供的一种触摸屏及其制作方法、触控显示装置，进行了详细介绍，本文中应用了具体个例对本公开的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本公开的方法及其核心思想；同时，对于本领域的一般技术人员，依据本公开的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本公开的限制。

Claims (12)

  1. 一种触摸屏，其中，包括：
    衬底基板；
    第一增反层，设置在所述衬底基板的第一表面；
    第二增反层，设置在所述衬底基板的第二表面；
    触控功能层，设置在所述第二增反层远离所述衬底基板的表面；
    其中，所述第一表面和所述第二表面相对。
  2. 根据权利要求1所述的触摸屏，其中，所述第一增反层的材料为氧化铌。
  3. 根据权利要求1或2所述的触摸屏，其中，所述第一增反层的厚度为
    Figure PCTCN2018107009-appb-100001
    Figure PCTCN2018107009-appb-100002
  4. 根据权利要求1或2所述的触摸屏，其中，所述第二增反层包括氧化铌层，所述氧化铌层的厚度为
    Figure PCTCN2018107009-appb-100003
  5. 根据权利要求4所述的触摸屏，其中，所述第二增反层还包括位于所述氧化铌层背离所述衬底基板一侧的氧化硅层，所述氧化硅层的厚度为
    Figure PCTCN2018107009-appb-100004
  6. 根据权利要求1-5中任一项所述的触摸屏，其中，所述触摸屏还包括消影层，所述消影层位于所述触控功能层背离所述第二增反层的一侧。
  7. 根据权利要求1-6中任一项所述的触摸屏，其中，所述触摸屏还包括防指纹层，所述防指纹层位于所述第一增反层上背离所述衬底基板的一侧。
  8. 一种触摸屏的制作方法，其中，包括：
    在衬底基板的第一表面形成第一增反层；
    在所述衬底基板的第二表面形成第二增反层；所述第一表面和所述第二表面相对；
    在所述第二增反层远离所述衬底基板的表面形成触控功能层。
  9. 根据权利要求8所述的制作方法，其中，所述第一增反层和所述第二增反层均采用溅射工艺形成。
  10. 一种触控显示装置，其中，包括显示屏及如权利要求1-7中任一项所述的触摸屏。
  11. 根据权利要求10所述的触控显示装置，其中，还包括光学透明胶，设置于所述显示屏与所述触摸屏之间，所述光学透明胶用于贴合所述显示屏与所述触摸屏。
  12. 根据权利要求10或11所述的触控显示装置，其中，所述显示屏为LCD显示屏或OLED显示屏。
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