WO2019153753A1 - 一种触摸屏及其制作方法、触控显示装置 - Google Patents
一种触摸屏及其制作方法、触控显示装置 Download PDFInfo
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- WO2019153753A1 WO2019153753A1 PCT/CN2018/107009 CN2018107009W WO2019153753A1 WO 2019153753 A1 WO2019153753 A1 WO 2019153753A1 CN 2018107009 W CN2018107009 W CN 2018107009W WO 2019153753 A1 WO2019153753 A1 WO 2019153753A1
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- layer
- touch
- reflection layer
- touch screen
- display device
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds
Definitions
- the present disclosure relates to a touch screen, a method of fabricating the same, and a touch display device.
- the OGS (One Glass Solution) touch screen is a capacitive touch screen that directly forms a touch electrode on a glass substrate, so that a glass substrate can simultaneously serve as a protective glass and a touch sensor, thereby saving the glass substrate.
- the number reduces the production cost of the touch display device.
- the touch display device when the touch display device is off, the touch display device cannot realize the mirror display because the reflectivity of the integrated touch touch screen is low.
- the present disclosure discloses a touch screen comprising: a substrate; a first anti-reflection layer disposed on the first surface of the substrate; a second anti-reflection layer disposed on the second surface of the substrate; a touch function layer disposed on a surface of the second anti-reflection layer away from the substrate;
- first surface and the second surface are opposite.
- the material of the first anti-reflection layer is ruthenium oxide.
- the thickness of the first anti-reflection layer is not
- the second anti-reflection layer comprises a ruthenium oxide layer, and the thickness of the ruthenium oxide layer is
- the second anti-reflective layer further includes a silicon oxide layer on a side of the yttrium oxide layer facing away from the substrate, the thickness of the silicon oxide layer is
- the touch screen further includes an anti-shadow layer, the anti-shadow layer being located on a side of the touch function layer facing away from the second anti-reflection layer.
- the touch screen further includes an anti-fingerprint layer, the anti-fingerprint layer being located on a side of the first anti-reflective layer facing away from the substrate.
- the disclosure also discloses a method for manufacturing a touch screen, including:
- the first anti-reflection layer and the second anti-reflection layer are both formed by a sputtering process.
- the present disclosure also discloses a touch display device, including a display screen and the touch screen described above.
- the touch display device further includes an optical transparent adhesive disposed between the display screen and the touch screen, and the optical transparent adhesive is used to fit the display screen and the touch screen.
- the display screen is an LCD (Liquid Crystal Display) display or an OLED (Organic Light Emitting Diode) display.
- LCD Liquid Crystal Display
- OLED Organic Light Emitting Diode
- first anti-reflection layer on the first surface of the base substrate, forming a second anti-reflection layer on the second surface of the base substrate, and forming a touch function layer on the second anti-reflection layer, based on the first anti-reflection layer
- the high reflectivity of the second anti-reflection layer can improve the reflectivity of the touch screen, so that the reflectivity of the touch display device formed by the subsequent bonding can reach 30%-50%, and the touch display device has a mirror display when the screen is off.
- the function also makes the display effect of the touch display device on the bright screen not greatly affected, and enriches the function of the touch screen.
- FIG. 1 is a schematic structural diagram of a touch screen according to an embodiment of the present disclosure
- FIG. 2 is a schematic structural diagram of another touch screen according to an embodiment of the present disclosure.
- FIG. 3 is a schematic structural diagram of still another touch screen according to an embodiment of the present disclosure.
- FIG. 4 is a flow chart showing a method of fabricating a touch screen according to an embodiment of the present disclosure
- FIG. 5 is a schematic structural diagram of a touch display device according to an embodiment of the present disclosure.
- FIG. 6 is a graph showing a comparison of reflectances of a touch display device and a conventional touch display device according to an embodiment of the present disclosure.
- the integrated touch touch screen and the display screen can form a TLCM (Touch Liquid Crystal Module).
- TLCM Touch Liquid Crystal Module
- the integrated touch screen has a transmittance of 80%-90%, so that it is formed after bonding.
- the reflectivity of the touch display device is 5%-10%, and the touch display device has a good display effect when the screen is bright, but the mirror display cannot be realized when the screen is off.
- FIG. 1 a schematic structural diagram of a touch screen according to an embodiment of the present disclosure is shown.
- An embodiment of the present disclosure provides a touch screen including: a base substrate 11, a first anti-reflection layer 12 formed on a first surface of the base substrate 11, and a second anti-reflection layer 13 formed on the second surface of the base substrate 11. And a touch function layer 14 formed on the second anti-reflection layer 13 away from the surface of the substrate; wherein the first surface and the second surface are opposite.
- the material of the first anti-reflection layer 12 is yttrium oxide Nb 2 O 5 . In an exemplary embodiment, other materials such as zirconia ZrO 2 and the like may also be used; the thickness of the first anti-reflection layer 12 is In some embodiments, the thickness of the first anti-reflection layer 12 is
- the touch screen in the embodiment of the present disclosure may be an integrated touch touch screen;
- the base substrate 11 may be a glass substrate, and in an exemplary embodiment, a substrate of other materials, such as a quartz substrate, a resin substrate, or the like, may be used, and the present disclosure is implemented. This example does not limit this.
- the first anti-reflection layer 12 is formed on the first surface of the base substrate 11, and the second anti-reflection layer 13 is formed on the second surface of the base substrate 11.
- the reflectivity of the touch screen is greatly improved, so that the touch formed by the subsequent bonding is formed.
- the reflectivity of the display device can reach 30%-50%. If the first anti-reflection layer 12 is formed only on the first surface of the substrate substrate 11, or the second anti-reflection layer 13 is formed only on the second surface of the substrate substrate 11, The reflectivity of the touch screen is improved to some extent, but the reflectivity of the touch display device formed by subsequent bonding cannot reach 30%. Therefore, only the first anti-reflection layer 12 or the second anti-reflection layer is formed on the base substrate 11. 13.
- the touch display device formed by the subsequent bonding cannot realize the mirror display function when the screen is turned off.
- FIG. 2 a schematic structural diagram of another touch screen of an embodiment of the present disclosure is shown.
- the touch screen shown in FIG. 2 differs from the touch screen shown in FIG. 1 in that the structure of the second anti-reflection layer 13 is different.
- the second anti-reflection layer 13 includes a ruthenium oxide layer, and the thickness of the ruthenium oxide layer is In some embodiments, the thickness of the yttrium oxide layer is
- the second anti-reflection layer 13 further includes a silicon oxide layer 132 on the side of the yttrium oxide layer 131 facing away from the substrate 11, and the thickness of the silicon oxide layer 132 is In some embodiments, the thickness of the silicon oxide layer 132 is
- the yttria layer in the second anti-reflection layer 13 may also be replaced with a zirconia layer.
- FIG. 3 a schematic structural diagram of still another touch screen of an embodiment of the present disclosure is shown.
- the touch screen further includes an erasing layer 15 on the side of the touch function layer 14 facing away from the second anti-reflection layer 13.
- the material of the color erasing layer 15 is silicon oxynitride SiO x N y , which is used to improve the obvious pattern of the touch function layer 14 and realize the elimination of the touch function layer 14 .
- the touch screen further includes an anti-fingerprint layer 16 on the side of the first anti-reflective layer 12 facing away from the substrate 11.
- an anti-fingerprint layer 16 on the side of the first anti-reflective layer 12 facing away from the substrate 11.
- the anti-fingerprint layer 16 can also be called an ASF (Anti Finger Film).
- the material of the anti-fingerprint layer 16 is an organic high molecular polymer.
- the erasing layer 15 and the anti-fingerprint layer 16 may also be formed on the touch screen shown in FIG. 1, and the specific positions of the erasing layer 15 and the anti-fingerprint layer 16 are the same as those shown in FIG. This will not be repeated here.
- a second anti-reflection layer is formed on a second surface of the base substrate by forming a first anti-reflection layer on the first surface of the base substrate, and the second anti-reflection layer is away from the base substrate on the second anti-reflection layer
- Forming a touch function layer on the surface can improve the reflectivity of the touch screen, by adding the silicon oxynitride layer only in the second anti-reflection layer, through the level matching
- the reflectivity of the touch display device formed by the subsequent bonding can reach 30%-50%, and the touch display device has a mirror display function when the screen is off, and the display effect of the touch display device is not affected when the screen is bright. Larger impact, enriching the functionality of the touch screen.
- FIG. 4 a flowchart of a method for fabricating a touch screen according to an embodiment of the present disclosure may be specifically included.
- Step 401 forming a first anti-reflection layer on the first surface of the base substrate.
- the first anti-reflection layer 12 may be formed on the first surface of the base substrate 11 by a sputtering process.
- the base substrate 11 may be a glass substrate, a quartz substrate, a resin substrate or the like; the material of the first anti-reflection layer 12 may be yttrium oxide Nb 2 O 5 or zirconium oxide ZrO 2 , etc., and the thickness of the first anti-reflection layer 12 is
- Step 402 forming a second anti-reflection layer on the second surface of the base substrate; the first surface and the second surface are opposite.
- the second anti-reflection layer 13 may be formed on the second surface of the substrate substrate 11 by a sputtering process, and the first surface and the second surface are opposite to each other on both sides of the substrate substrate 11.
- a ruthenium oxide layer can be directly formed on the second surface of the base substrate 11 by a sputtering process, and the material thereof is ruthenium oxide Nb 2 O 5 . , thickness is
- a ruthenium oxide layer 131 may be formed on the second surface of the base substrate 11 by a sputtering process.
- the material of the yttria layer 131 is yttrium oxide Nb 2 O 5 and has a thickness of
- a silicon oxide layer 132 is formed on the side of the yttrium oxide layer 131 facing away from the substrate 11 by a sputtering process.
- the silicon oxide layer 132 is made of silicon oxide SiO 2 and has a thickness of
- both the first anti-reflection layer 12 and the second anti-reflection layer 13 are formed by a sputtering process, and the structures of the first anti-reflection layer 12 and the second anti-reflection layer 13 are easy to implement, no need to add equipment, and the process cost is low. Easy to achieve mass production.
- the sputtering process bombards the target with particles of a certain energy, such as ions, neutral atoms, molecules, etc., so that the atoms or molecules on the surface of the target obtain sufficient energy to finally escape the target, the atoms that escape or Molecules are deposited onto the surface of the substrate being plated to form the desired film.
- a certain energy such as ions, neutral atoms, molecules, etc.
- a ruthenium oxide layer is formed by a sputtering process
- the surface of the ruthenium oxide is bombarded by particles of a certain energy, such that atoms or molecules on the surface of the ruthenium oxide escape, and finally deposited on the substrate 11
- a silicon oxide layer is formed by a sputtering process
- the silicon oxide surface is bombarded by particles of a certain energy such that atoms or molecules on the surface of the silicon oxide escape and finally deposit on the yttrium oxide layer 131.
- Step 403 forming a touch function layer on the surface of the second anti-reflection layer away from the substrate.
- the touch function layer 14 is formed on the second anti-reflection layer 13 by a patterning process.
- the patterning process generally includes a substrate cleaning, film formation, photoresist coating, exposure, development, etching, photoresist stripping, etc.; the metal layer is usually formed by physical vapor deposition (for example, magnetron sputtering).
- a pattern is formed by wet etching, and a film is usually formed by chemical vapor deposition for a non-metal layer, and a pattern is formed by dry etching.
- the erasing layer 15 may also be formed on the touch function layer 14 to form an anti-fingerprint layer 16 on the first anti-reflection layer 12.
- a first anti-reflection layer is formed on the first surface of the base substrate
- a second anti-reflection layer is formed on the second surface of the base substrate
- a touch function layer is formed on the second anti-reflection layer.
- the reflectivity of the touch screen can be improved based on the high reflectivity of the first anti-reflection layer and the second anti-reflection layer, so that the reflectivity of the touch display device formed by the subsequent bonding can reach 30%-50%, and the touch display device
- the screen display function is provided when the screen is off, and the display effect of the touch display device on the bright screen is not greatly affected, and the function of the touch screen is enriched.
- FIG. 5 a schematic structural diagram of a touch display device according to an embodiment of the present disclosure is shown.
- Embodiments of the present disclosure provide a touch display device including a display screen 51 and the touch screen described above.
- the display screen 51 and the touch screen are pasted by the optical transparent adhesive 52.
- the optical transparent adhesive can also be called OCR (Optical Clear Resin), and the display screen 51 is attached to the touch screen by using the optical transparent adhesive 52, so that the display screen 51 has good adhesion to the touch screen, and the touch display is good.
- the display of the device has less impact.
- the display screen 21 is an LCD display screen or an OLED display screen.
- FIG. 6 a comparison graph of reflectances of a touch display device and a conventional touch display device according to an embodiment of the present disclosure is shown.
- the abscissa in FIG. 6 represents the wavelength of the light
- the ordinate represents the reflectance of the touch display device
- the curve indicated by the solid line refers to the reflectance of the touch display device of the present disclosure, that is, the mirror TLCM reflectance
- the dotted line refers to the reflectivity of the existing touch display device, that is, the ordinary TLCM reflectance.
- the contrast graph of the reflectance shown in FIG. 6 is experimentally determined. As can be seen from FIG. 6, the reflectance of the touch display device of the present disclosure is greater than the range of light of different wavelengths (400 nm to 700 nm). The reflectivity of the existing touch display device, and the reflectivity of the touch display device of the present disclosure can reach 30%-50%.
- the touch display device may be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a navigator, and the like.
- the touch display device includes a display screen and the touch screen, and a second anti-reflection layer is formed on the second surface of the substrate by forming a first anti-reflection layer on the first surface of the substrate.
- a touch function layer is formed on the second anti-reflection layer, and based on the high reflectivity of the first anti-reflection layer and the second anti-reflection layer, the reflectivity of the touch screen can be improved, so that the reflection of the touch display device formed by subsequent bonding
- the rate can reach 30%-50%, and the touch display device has a mirror display function when the screen is off, and the display effect of the touch display device on the bright screen is not greatly affected, and the function of the touch screen is enriched.
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Abstract
Description
Claims (12)
- 一种触摸屏,其中,包括:衬底基板;第一增反层,设置在所述衬底基板的第一表面;第二增反层,设置在所述衬底基板的第二表面;触控功能层,设置在所述第二增反层远离所述衬底基板的表面;其中,所述第一表面和所述第二表面相对。
- 根据权利要求1所述的触摸屏,其中,所述第一增反层的材料为氧化铌。
- 根据权利要求1-5中任一项所述的触摸屏,其中,所述触摸屏还包括消影层,所述消影层位于所述触控功能层背离所述第二增反层的一侧。
- 根据权利要求1-6中任一项所述的触摸屏,其中,所述触摸屏还包括防指纹层,所述防指纹层位于所述第一增反层上背离所述衬底基板的一侧。
- 一种触摸屏的制作方法,其中,包括:在衬底基板的第一表面形成第一增反层;在所述衬底基板的第二表面形成第二增反层;所述第一表面和所述第二表面相对;在所述第二增反层远离所述衬底基板的表面形成触控功能层。
- 根据权利要求8所述的制作方法,其中,所述第一增反层和所述第二增反层均采用溅射工艺形成。
- 一种触控显示装置,其中,包括显示屏及如权利要求1-7中任一项所述的触摸屏。
- 根据权利要求10所述的触控显示装置,其中,还包括光学透明胶,设置于所述显示屏与所述触摸屏之间,所述光学透明胶用于贴合所述显示屏与所述触摸屏。
- 根据权利要求10或11所述的触控显示装置,其中,所述显示屏为LCD显示屏或OLED显示屏。
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US16/328,826 US11392229B2 (en) | 2018-02-07 | 2018-09-21 | Touch screen having high reflectivity, manufacturing method thereof, and touch display device |
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CN201810124353.0A CN108319404A (zh) | 2018-02-07 | 2018-02-07 | 一种触摸屏及其制作方法、触控显示装置 |
CN201810124353.0 | 2018-02-07 |
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Citations (5)
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CN101615093A (zh) * | 2009-07-29 | 2009-12-30 | 深圳莱宝高科技股份有限公司 | 一种兼顾反射和透过效果的触摸屏及其制造方法 |
CN104020880A (zh) * | 2014-05-27 | 2014-09-03 | 京东方科技集团股份有限公司 | 一种触摸显示装置 |
US20140267168A1 (en) * | 2013-03-14 | 2014-09-18 | Esat Yilmaz | Reduction of Touch Sensor Pattern Visibility Using Beamsplitters |
CN204178342U (zh) * | 2014-07-24 | 2015-02-25 | 宸鸿科技(厦门)有限公司 | 触控显示设备 |
CN108319404A (zh) * | 2018-02-07 | 2018-07-24 | 京东方科技集团股份有限公司 | 一种触摸屏及其制作方法、触控显示装置 |
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US7510741B2 (en) * | 2004-06-01 | 2009-03-31 | 3M Innovative Properties Company | Method of making multilayer cholesteric liquid crystal optical bodies |
KR102311316B1 (ko) * | 2017-04-24 | 2021-10-13 | 삼성디스플레이 주식회사 | 표시장치 및 그 제조방법 |
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2018
- 2018-02-07 CN CN201810124353.0A patent/CN108319404A/zh active Pending
- 2018-09-21 US US16/328,826 patent/US11392229B2/en active Active
- 2018-09-21 WO PCT/CN2018/107009 patent/WO2019153753A1/zh active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101615093A (zh) * | 2009-07-29 | 2009-12-30 | 深圳莱宝高科技股份有限公司 | 一种兼顾反射和透过效果的触摸屏及其制造方法 |
US20140267168A1 (en) * | 2013-03-14 | 2014-09-18 | Esat Yilmaz | Reduction of Touch Sensor Pattern Visibility Using Beamsplitters |
CN104020880A (zh) * | 2014-05-27 | 2014-09-03 | 京东方科技集团股份有限公司 | 一种触摸显示装置 |
CN204178342U (zh) * | 2014-07-24 | 2015-02-25 | 宸鸿科技(厦门)有限公司 | 触控显示设备 |
CN108319404A (zh) * | 2018-02-07 | 2018-07-24 | 京东方科技集团股份有限公司 | 一种触摸屏及其制作方法、触控显示装置 |
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US11392229B2 (en) | 2022-07-19 |
US20210365138A1 (en) | 2021-11-25 |
CN108319404A (zh) | 2018-07-24 |
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