WO2019104488A1 - Method for etching pattern on polymer dispersed liquid crystal film - Google Patents

Method for etching pattern on polymer dispersed liquid crystal film Download PDF

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Publication number
WO2019104488A1
WO2019104488A1 PCT/CN2017/113417 CN2017113417W WO2019104488A1 WO 2019104488 A1 WO2019104488 A1 WO 2019104488A1 CN 2017113417 W CN2017113417 W CN 2017113417W WO 2019104488 A1 WO2019104488 A1 WO 2019104488A1
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Prior art keywords
film
pattern
light
liquid crystal
conductive
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PCT/CN2017/113417
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French (fr)
Chinese (zh)
Inventor
胡康军
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深圳市柔宇科技有限公司
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Application filed by 深圳市柔宇科技有限公司 filed Critical 深圳市柔宇科技有限公司
Priority to CN201780096340.0A priority Critical patent/CN111492306B/en
Priority to PCT/CN2017/113417 priority patent/WO2019104488A1/en
Priority to TW107142082A priority patent/TWI694284B/en
Publication of WO2019104488A1 publication Critical patent/WO2019104488A1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes

Definitions

  • the present invention relates to the field of electronic light control technology, and relates to a method for manufacturing a light control film, and more particularly to a method for patterning a light control film.
  • the dimming film is a new type of electronic light control product.
  • the electronically controlled intelligent dimming film device injects a liquid crystal/polymer hybrid material between two transparent conductive films.
  • the conditioning membrane is in an opaque state.
  • the liquid crystal molecules are arranged in an orderly manner, and the electro-dimming film is converted from an opaque state to a transparent state (ON state).
  • ON state a transparent state
  • a specific pattern is formed on the light-adjusting film by: preparing a specific electrode pattern on the conductive layer of the light-adjusting film, and then coating the liquid crystal/polymer mixed material, and then presenting the specificity after being electrified picture of.
  • this method requires designing a pattern on the electrode of the dimming film in advance, and the pattern cannot be changed after it is made. Therefore, this method of production is limited.
  • a specific pattern is formed on the light-adjusting film by: preparing a specific electrode pattern on the conductive layer of the light-adjusting film, and then coating the liquid crystal/polymer mixed material, and then presenting the specificity after being electrified picture of.
  • this method requires designing a pattern on the electrode of the dimming film in advance, and the pattern cannot be changed after it is made. Therefore, this method of production is limited.
  • the technical problem to be solved by the present invention is that, in view of the prior art, it is necessary to design a pattern on the electrode of the light control film in advance, and the defect that cannot be changed after the pattern is formed is provided, thereby providing a more flexible and product changeable property.
  • a method of patterning a pattern on a light control film comprising the steps of: ⁇ 0 2019/104488 ⁇ (:17(: ⁇ 2017/113417
  • the dimming film is energized to make the dimming film appear transparent;
  • the dimming film liquid crystal is light-shielded until the light-adjusting film liquid crystal is in a transparent state
  • the two conductive films are spaced apart, leaving a gap between them, the light-adjusting film liquid crystal is coated in the gap between the two conductive films;
  • the laminated dimming film is photocured or heat cured under ultraviolet light.
  • the liquid crystal of the light adjustment film selects a polymer having high transmittance in an infrared band, an ultraviolet band, or a green band.
  • the liquid crystal, and the transmittance of the light-adjusting film liquid crystal is smaller than the transmittance of the conductive film.
  • the light adjustment film liquid crystal is made of a raw material nematic liquid crystal, an acrylate mixture, and a prepolymer.
  • the light adjustment film liquid crystal further includes a photoinitiator.
  • the acrylate mixture is preferably at least one of butyl methacrylate, butyl acrylate, and ethyl acrylate.
  • the conductive film is a transparent conductive film, and the indium tin oxide transparent conductive film and the nano silver conductive film are selected.
  • the conductive film is a transparent conductive film, and the indium tin oxide transparent conductive film and the nano silver conductive film are selected.
  • the method further includes sub-step 8 : 4 : transparent conductive conductive with a special band cut off at least one layer on the surface of the conductive film
  • the material cut-off layer, the special band cutoff refers to the infrared band, the ultraviolet band or the green band cutoff. ⁇ 0 2019/104488 ⁇ (:17(: ⁇ 2017/113417
  • the material selected from the transparent conductive material cut-off layer is MgF ⁇ 2 0 3 , 11 3 0 310 2 or 31 .
  • the transparent conductive material cut-off layer is plated on the surface of the conductive film, and is formed by alternately stacking materials of high refractive index and low refractive index.
  • the energization voltage is 20 to 30 in the step 8.
  • the step (: includes the following substeps:
  • the patterned or non-patterned regions are respectively energized, and the etching pattern integrity is checked by the transparent state of the patterned or non-patterned regions.
  • the laser wavelength is selected from an ultraviolet band 35511111, a green band 53211111 or an infrared band 106411111.
  • the pattern area of the light adjustment film is energized, and when the voltage reaches the transparent state threshold, the pattern area is in a transparent state;
  • the non-pattern area is energized, and when the voltage reaches the transparent state threshold, the pattern area exhibits a fog state, and the non-pattern area exhibits a transparent state.
  • the method further includes:
  • the transmittance is poor, and the liquid crystal molecules absorb a certain amount of laser energy; after the dimming film is energized, the liquid crystal molecules exhibit a certain regularity.
  • ⁇ I optical transmittance is greatly improved, so that light that is not permeable to liquid crystal or absorbed by liquid crystal molecules can pass through regularly arranged liquid crystal molecules, thereby reducing laser energy absorbed by liquid crystal molecules.
  • the invention is in communication ⁇ 0 2019/104488 ⁇ (:17(: ⁇ 2017/113417) Under the electrical condition, the laser acts on the conductive layer on the transparent conductive film.
  • the position where the laser reaches will absorb the laser energy of a specific wavelength to remove the corresponding conductive layer. Forming a pattern. Etching under energized conditions can reduce or avoid the scattering and absorption ratio of the laser in the dimming film, thereby suppressing the formation of defects, avoiding the absorption of the laser by the transparent conductive layer in the fog state, and additionally After passing through the dimming liquid crystal layer, the absorption and scattering of the laser by the dimming liquid crystal layer may affect the appearance of the dimming film, such as the formation of bubbles, color changes, and regional failure of the dimming film, etc.
  • the present invention can also be: 1.
  • the pattern can be processed in the later stage, so that the product can be highly transformed. 2. Only the pre-designed dimming is required. Membrane products, can be customized according to customer needs, with a larger space for use. 3. No need for dimming film structure and cost Much has changed, you can achieve product diversity. 4, without increasing the process steps.
  • 1 is a flow chart of an embodiment of the present invention.
  • a method for patterning a light-adjusting film includes the following steps:
  • step eight includes the following sub-steps:
  • the dimming film liquid crystal selects a polymer liquid crystal having a high transmittance in an infrared band, an ultraviolet band, or a green band, and the transmittance of the dimming film liquid crystal is smaller than that of the conductive film.
  • the dimming film liquid crystal can be selected from a plurality of different types of liquid crystals.
  • the dimming film liquid crystal of the present invention is preferably composed of a nematic liquid crystal, an acrylate mixture, and Made of prepolymer. Specifically, the following parts by weight of raw materials are included: nematic liquid crystal 20-85, propylene ⁇ 0 2019/104488 ⁇ (:17(: ⁇ 2017/113417 acid ester mixture 10-75, prepolymer 1-10.
  • the light-adjusting film liquid crystal also includes 0.5 parts by weight) 2 photoinitiator.
  • the following parts by weight of the raw materials can be selected:
  • the acrylate mixture is at least one of butyl methacrylate, butyl acrylate, and ethyl acrylate.
  • the prepolymer is polyethylene or polypropylene.
  • the dimming film liquid crystal is statically set, the standing time is 1-1011, until the liquid crystal of the dimming film is transparent, ready for use;
  • the two conductive films are spaced apart, leaving a gap therebetween, and the liquid crystal of the light-adjusting film is coated in the gap between the two conductive films; specifically, the liquid crystal of the light-adjusting film is transferred into the coating.
  • the coater mouth is located between two transparent conductive films, and the coater coats the liquid crystal between the two conductive films at a set speed.
  • the conductive film is a transparent conductive film, and one of an indium tin oxide transparent conductive film, a nano silver conductive film, a high molecular polymer conductive film or a carbon nanotube conductive film is selected.
  • Indium tin oxide ⁇ 0 2019/104488 ⁇ (:17(: ⁇ 2017/113417 Transparent conductive film, nano silver conductive film, polymer conductive film or carbon nanotube conductive film is not limited, you can choose one or two For two conductive films.
  • the size of the conductive film is set according to actual needs.
  • the two conductive films are roll-bonded, and the distance between the two conductive layers formed by the conductive film after rolling is 1 ⁇ 25.
  • the two layers of conductive film are between the two layers of the light-adjusting film liquid crystal layer, and the distance between the two conductive layers is the thickness of the liquid crystal layer of the light-adjusting film.
  • the laminated dimming film is photocured or heat cured under ultraviolet light.
  • UV curing When curing by ultraviolet light, it is necessary to add 0.5-2 parts of a photoinitiator, which is a photoinitiator 184 or a photoinitiator 1173.
  • the parameters of UV curing are: the wavelength is 36511111, the ultraviolet light intensity is 10-100 ⁇ / ⁇ 1 2 , and the irradiation time is 308-1011 ⁇ 11.
  • the light-adjusting film after the bonding is heated to a curing temperature, and the curing conditions can be set according to actual needs, and the heat curing is a conventional technique, and details are not described herein again.
  • a base layer for protecting the conductive film is bonded to the outside of the conductive film. This step is a preferred step.
  • the dimming film is energized to make the dimming film appear transparent; the power supply voltage is 20 ⁇ 30.
  • Step (: may include the following sub-steps:
  • the laser wavelength can select the ultraviolet band 35511111, the green band 53
  • infrared band 106411111 is preferred.
  • the selection of the liquid crystal of the dimming film is closely related to the laser wavelength selected by the etching, it is necessary to select a dimming film liquid crystal having a high transmittance in a specific laser band, or to select a liquid crystal for the existing dimming film. Less specific laser bands. Therefore, the present invention selects the above-mentioned applicable laser band.
  • the raw material is preferably a nematic liquid crystal, an acrylate mixture and a prepolymer, and the dimming film liquid crystal produced by the liquid crystal on the infrared laser has a high transmittance at 1064!1111, and the wavelength is selected to reduce the influence of the infrared laser on the dimming film. .
  • [0065] 02 horizontally placing the material on the laser etching equipment platform; adjusting the height of the platform to adjust the laser focusing surface to focus on the conductive film of the dimming film.
  • the distance from the focal plane of the laser to the surface of the platform is ⁇ 1.
  • the distance ⁇ 2 from the surface of the pre-patterned conductive film to the surface of the platform can be converted.
  • the distance from the focal plane to the pre-patterned conductive film is 01 2, and the height of the platform can be translated upwards by 01 2 .
  • the patterned or non-patterned regions are respectively energized, and the etching pattern integrity is checked by the transparent state of the patterned or non-patterned regions.
  • the pattern area of the light-adjusting film is energized, and when the voltage reaches the transparent state threshold, the pattern area is in a transparent state; or the non-pattern area is energized, and when the voltage reaches the transparent state threshold, the pattern area is fogged, and the non-pattern area is transparent.
  • a transparent conductive material cut-off layer plated with at least one layer of a special band cutoff preferably further comprising a step 8 : in step 8 : at least one layer of a special band cut-off transparent conductive material cut-off layer is plated on the surface of the conductive film, the special Band cutoff refers to the cutoff of the infrared, ultraviolet or green band (cutoff refers to reflection).
  • the transparent conductive material cut-off layer is made of MgF2, ⁇ 1 2 3 3 , 11 3 ⁇ 5 ⁇ 810 2 or ⁇ .
  • the above-mentioned material may be arbitrarily selected, and the transparent conductive material cut-off layer is plated on the surface of the conductive film, and is formed by alternately stacking the above-mentioned high refractive index and low refractive index materials.
  • a refractive index of 1 MgF 2! 1.38 (55,011,111)
  • the refractive index of eight 1203 11 1.63 (55011111)
  • Refractive index 1! 2.2-2.4 (50 ⁇ 11111), 810 2
  • the refractive index of 1! 1.46 (550 legs), the refractive index of 1 is 11.92-2.3 (550 legs), so that the high refractive index of di 3 0 5 and SiNx and the low refractive index of MgF 2 , 1 2 0 3 or 33 ⁇ 4) 2 alternately stack multiple layers of coating to form an infrared, ultraviolet or green band cutoff.
  • the laser focused at the focus mainly etches the transparent conductive layer to form a predetermined pattern; the majority of the transparent conductive layer is transparent conductive material
  • the cutoff layer is turned off (ie, reflected off), thereby reducing the effect of the laser on the liquid crystal of the dimming film.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Laminated Bodies (AREA)

Abstract

A method for etching a pattern on a polymer dispersed liquid crystal (PDLC) film, comprising the following steps of: A: preparing a PDLC film; B: energizing the PDLC film, so that the PDLC film is in a transparent state; and C: performing laser etching on the PDLC film in an energized state, and a laser etching a preset pattern on a conductive layer of the PDLC film. The present invention provides a method enabling more flexible pattern etching on a PDLC film, with a product being easily changeable.

Description

\¥0 2019/104488 卩＜：!7 \2017/113417  \¥0 2019/104488 卩<:!7 \2017/113417
在调光膜上刻画图案的方法 Method of patterning a light-adjusting film
技术领域 Technical field
[0001] 本发明属于电子控光技术领域， 涉及一种调光膜的制造方法， 尤其涉及一种在 调光膜上刻画图案的方法。  [0001] The present invention relates to the field of electronic light control technology, and relates to a method for manufacturing a light control film, and more particularly to a method for patterning a light control film.
背景技术  Background technique
[0002] 调光膜是一种新型的电子控光产品， 电控智能调光膜器件是在两张透明导电膜 中间注入液晶 /聚合物混合材料， 在没有电场作用的情况下， 电控智能调控膜处 于不透明状态。 当通电时， 液晶分子实现有序排列， 这时电致调光膜便从不透 明态（〇??态）转换为透明态（ON态）。 通过电场作用， 能够实现从开态®关态、 关 态®开态之间的快速转换。  [0002] The dimming film is a new type of electronic light control product. The electronically controlled intelligent dimming film device injects a liquid crystal/polymer hybrid material between two transparent conductive films. In the absence of an electric field, electronically controlled intelligence The conditioning membrane is in an opaque state. When energized, the liquid crystal molecules are arranged in an orderly manner, and the electro-dimming film is converted from an opaque state to a transparent state (ON state). Through the action of the electric field, a fast transition from the on state to the off state and off state can be achieved.
[0003] 目前在调光膜上制成特定图案的制作方法为： 在调光膜的导电层上先制作特定 的电极图案， 然后再涂布液晶/聚合物混合材料， 通电后即可呈现特定的图案。 但是， 这种方法需要提前在调光膜的电极上设计好图案， 图案制作好之后无法 更改。 因此， 这种制作方法局限较大。  [0003] At present, a specific pattern is formed on the light-adjusting film by: preparing a specific electrode pattern on the conductive layer of the light-adjusting film, and then coating the liquid crystal/polymer mixed material, and then presenting the specificity after being electrified picture of. However, this method requires designing a pattern on the electrode of the dimming film in advance, and the pattern cannot be changed after it is made. Therefore, this method of production is limited.
技术问题  technical problem
[0004] 目前在调光膜上制成特定图案的制作方法为： 在调光膜的导电层上先制作特定 的电极图案， 然后再涂布液晶/聚合物混合材料， 通电后即可呈现特定的图案。 但是， 这种方法需要提前在调光膜的电极上设计好图案， 图案制作好之后无法 更改。 因此， 这种制作方法局限较大。  [0004] At present, a specific pattern is formed on the light-adjusting film by: preparing a specific electrode pattern on the conductive layer of the light-adjusting film, and then coating the liquid crystal/polymer mixed material, and then presenting the specificity after being electrified picture of. However, this method requires designing a pattern on the electrode of the dimming film in advance, and the pattern cannot be changed after it is made. Therefore, this method of production is limited.
问题的解决方案  Problem solution
技术解决方案  Technical solution
[0005] 本发明要解决的技术问题在于， 针对现有技术的需要提前在调光膜的电极上设 计好图案， 图案制作好之后无法更改的缺陷， 提供一种更为灵活、 产品可变换 性强的在调光膜上刻画图案的方法。  [0005] The technical problem to be solved by the present invention is that, in view of the prior art, it is necessary to design a pattern on the electrode of the light control film in advance, and the defect that cannot be changed after the pattern is formed is provided, thereby providing a more flexible and product changeable property. A strong method of patterning on a dimming film.
[0006] 本发明解决其技术问题所采用的技术方案是：  [0006] The technical solution adopted by the present invention to solve the technical problem thereof is:
[0007] 一种在调光膜上刻画图案的方法， 包括以下步骤： \¥0 2019/104488 卩（：17（：\2017/113417 [0007] A method of patterning a pattern on a light control film, comprising the steps of: \¥0 2019/104488 卩(:17(:\2017/113417
[0008] 八、 制备调光膜； [0008] VIII, preparing a dimming film;
[0009] 6. 将调光膜进行通电， 使得调光膜呈现透明状态；  [0009] 6. The dimming film is energized to make the dimming film appear transparent;
[0010] (:、 对通电状态的调光膜进行激光蚀刻， 激光在调光膜的导电层上刻画出预先 设定好的图案。 [0010] ( :: laser etching is performed on the light-adjusting film in an energized state, and the laser pattern is patterned on the conductive layer of the light-adjusting film.
[0011] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤八中， 包括以 下子步骤：  [0011] Further, in the method for patterning a pattern on the light control film, preferably in the step VIII, the following substeps are included:
[0012] 1、 在遮光环境下， 取用调制好的调光膜液晶加热至 20° (:〜 50° (:， 搅拌均匀； [0012] 1, in a light-shielding environment, take the prepared dimming film liquid crystal heated to 20 ° (: ~ 50 ° (:, stirring evenly;
[0013] 八2、 将调光膜液晶遮光静置， 直至调光膜液晶呈现透明状态； [0013] 八2, the dimming film liquid crystal is light-shielded until the light-adjusting film liquid crystal is in a transparent state;
[0014] 3、 将两张导电薄膜间隔设置， 二者之间留有间隙， 将调光膜液晶涂布在两张 导电薄膜之间的间隙中；  [0014] 3, the two conductive films are spaced apart, leaving a gap between them, the light-adjusting film liquid crystal is coated in the gap between the two conductive films;
[0015] 八4、 对两张导电薄膜进行辊压贴合， 辊压后导电薄膜所形成的两个导电层之间 间距为
Figure imgf000004_0001
[0015] VIII. The two conductive films are roll-bonded, and the spacing between the two conductive layers formed by the conductive film after rolling is
Figure imgf000004_0001
[0016] 5、 贴合后的调光膜在紫外光下进行光固化或加热固化。  [0016] 5. The laminated dimming film is photocured or heat cured under ultraviolet light.
[0017] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤 中， 所述调 光膜液晶选择在红外波段、 紫外波段或绿光波段透过率高的聚合物液晶， 且调 光膜液晶的透过率小于导电薄膜的透过率。  [0017] Further, in the method for patterning a pattern on a light control film, preferably, in the step, the liquid crystal of the light adjustment film selects a polymer having high transmittance in an infrared band, an ultraviolet band, or a green band. The liquid crystal, and the transmittance of the light-adjusting film liquid crystal is smaller than the transmittance of the conductive film.
[0018] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述调光膜液晶由原料 向列型液晶、 丙烯酸酯混合物和预聚物制成。  [0018] Further, in the method of patterning a pattern on a light control film, it is preferable that the light adjustment film liquid crystal is made of a raw material nematic liquid crystal, an acrylate mixture, and a prepolymer.
[0019] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述调光膜液晶还包括 光引发剂。  [0019] Further, in the method for patterning a pattern on a light control film, preferably, the light adjustment film liquid crystal further includes a photoinitiator.
[0020] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述丙烯酸酯混合物为 甲基丙烯酸丁酯、 丙烯酸丁酯、 丙烯酸乙酯中的至少一种。  [0020] Further, in the method of patterning a pattern on the light control film, the acrylate mixture is preferably at least one of butyl methacrylate, butyl acrylate, and ethyl acrylate.
[0021] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤八3中， 所述导 电薄膜为透明导电薄膜， 选用铟锡氧化物透明导电薄膜、 纳米银导电薄膜、 高 分子聚合物导电薄膜或碳纳米管导电薄膜中的一种。  [0021] Further, in the method for patterning a pattern on the light control film, preferably, in the step VIII, the conductive film is a transparent conductive film, and the indium tin oxide transparent conductive film and the nano silver conductive film are selected. One of a polymer conductive film or a carbon nanotube conductive film.
[0022] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤八中， 还包括 子步骤八4: 在导电薄膜表面镀有至少一层的特殊波段截止的透明导电材料截止 层， 所述特殊波段截止是指红外波段、 紫外波段或绿光波段截止。 \¥0 2019/104488 卩（：17（：\2017/113417 [0022] Further, in the method for patterning a pattern on the light-adjusting film, preferably in the step VIII, the method further includes sub-step 8 : 4 : transparent conductive conductive with a special band cut off at least one layer on the surface of the conductive film The material cut-off layer, the special band cutoff refers to the infrared band, the ultraviolet band or the green band cutoff. \¥0 2019/104488 卩(:17(:\2017/113417
[0023] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述透明导电材料截止 层选用的材料为 MgF 八1 20 3、 11 30 310 2或31 。 [0023] Further, in the method for patterning the pattern on the light-adjusting film, it is preferable that the material selected from the transparent conductive material cut-off layer is MgF 八2 0 3 , 11 3 0 310 2 or 31 .
[0024] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述透明导电材料截止 层在导电薄膜表面镀多层， 由高折射率和低折射率的材料交替叠合形成。  [0024] Further, in the method for patterning a pattern on a light control film, preferably, the transparent conductive material cut-off layer is plated on the surface of the conductive film, and is formed by alternately stacking materials of high refractive index and low refractive index. .
[0025] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤 8中， 通电电 压为 20~30 。  [0025] Further, in the method for patterning the pattern on the light control film, it is preferable that the energization voltage is 20 to 30 in the step 8.
[0026] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤（:中， 包括以 下子步骤：  [0026] Further, in the method for patterning a pattern on a light control film, preferably, the step (: includes the following substeps:
[0027] 0、 选用适用激光波长；  [0027] 0, select the applicable laser wavelength;
[0028] 02. 调整激光聚焦面聚焦在调光膜的导电薄膜上；  [0028] 02 adjusting the laser focus surface is focused on the conductive film of the light control film;
[0029] 03、 根据设定图案进行激光蚀刻， 去除导电薄膜上对应图案位置的导电层， 形 成图案；  [0029] 03, performing laser etching according to the set pattern, removing the conductive layer on the conductive film corresponding to the pattern position, and forming a pattern;
[0030] 04、 蚀刻完成后， 分别对图案或非图案区进行通电， 通过图案或非图案区透明 状态， 来检查蚀刻图案完整性。  [0030] 04. After the etching is completed, the patterned or non-patterned regions are respectively energized, and the etching pattern integrity is checked by the transparent state of the patterned or non-patterned regions.
[0031] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤（：1中， 所述激 光波长选用紫外波段 35511111、 绿光波段 53211111或红外波段 106411111。  [0031] Further, in the method for patterning a pattern on the light control film, preferably, in the step (1), the laser wavelength is selected from an ultraviolet band 35511111, a green band 53211111 or an infrared band 106411111.
[0032] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述步骤 04中， 给调光 膜的图案区域通电， 电压达到透明态阈值时， 图案区域呈现透明状态；  [0032] Further, in the method for patterning the pattern on the light control film, preferably, in the step 04, the pattern area of the light adjustment film is energized, and when the voltage reaches the transparent state threshold, the pattern area is in a transparent state;
[0033] 或者给非图案区域通电， 电压达到透明态阈值时， 图案区域呈现雾态， 非图案 区域呈现透明状态。  [0033] Alternatively, the non-pattern area is energized, and when the voltage reaches the transparent state threshold, the pattern area exhibits a fog state, and the non-pattern area exhibits a transparent state.
[0034] 进一步地， 所述的在调光膜上刻画图案的方法中， 优选所述方法还包括： [0034] Further, in the method for marking a pattern on the light control film, preferably, the method further includes:
[0035] 八6、 在固化后， 在导电薄膜外粘接有用于保护导电薄膜的基层。 [0035] VIII. After curing, a base layer for protecting the conductive film is bonded to the outside of the conductive film.
发明的有益效果  Advantageous effects of the invention
有益效果  Beneficial effect
[0036] 本发明中， 由于调光膜在通电前， 液晶分子处于杂乱状态， 透过率差， 液晶分 子会吸收的一定的激光能量； 对调光膜进行通电后， 液晶分子呈现一定规律排 歹I光学透过率会大大提高， 使得原本无法透过液晶或者被液晶分子吸收的光 线透过规律排列的液晶分子， 从而减少液晶分子吸收的激光能量。 本发明在通 \¥0 2019/104488 卩（：17（：\2017/113417 电条件下， 通过激光作用在透明导电薄膜上的导电层上， 激光到达的位置会吸 收特定波长的激光能量从而去掉相应的导电层， 从而形成图案。 在通电条件下 蚀刻， 可以减少或避免激光在调光膜中的散射与吸收比率， 从而抑制缺陷形成 ， 避免了在雾态下， 激光除了被透明导电层吸收外， 另外还会经过调光液晶层 ， 调光液晶层对激光的吸收和散射会影响调光膜的外观效果， 如形成气泡、 颜 色变化、 调光膜区域性失效等雾态下就可以看到蚀刻造成的缺陷问题。 除了上 述工艺上带来的优点外， 本发明还可以做到： 1、 无需预先设计好图案， 图案可 以在后期制程， 使得产品可变换性强。 2、 只需预先设计好调光膜产品， 可以根 据客户需求定制化特定的图案， 具有更大的使用空间。 3、 调光膜结构和成本上 无需做太大的改变， 可以实现产品多样性。 4、 制程上无需增加工序。 [0036] In the present invention, since the liquid crystal molecules are in a disordered state before the energization of the dimming film, the transmittance is poor, and the liquid crystal molecules absorb a certain amount of laser energy; after the dimming film is energized, the liquid crystal molecules exhibit a certain regularity.光学I optical transmittance is greatly improved, so that light that is not permeable to liquid crystal or absorbed by liquid crystal molecules can pass through regularly arranged liquid crystal molecules, thereby reducing laser energy absorbed by liquid crystal molecules. The invention is in communication \¥0 2019/104488 卩(:17(:\2017/113417) Under the electrical condition, the laser acts on the conductive layer on the transparent conductive film. The position where the laser reaches will absorb the laser energy of a specific wavelength to remove the corresponding conductive layer. Forming a pattern. Etching under energized conditions can reduce or avoid the scattering and absorption ratio of the laser in the dimming film, thereby suppressing the formation of defects, avoiding the absorption of the laser by the transparent conductive layer in the fog state, and additionally After passing through the dimming liquid crystal layer, the absorption and scattering of the laser by the dimming liquid crystal layer may affect the appearance of the dimming film, such as the formation of bubbles, color changes, and regional failure of the dimming film, etc. In addition to the advantages brought by the above process, the present invention can also be: 1. No need to pre-design the pattern, the pattern can be processed in the later stage, so that the product can be highly transformed. 2. Only the pre-designed dimming is required. Membrane products, can be customized according to customer needs, with a larger space for use. 3. No need for dimming film structure and cost Much has changed, you can achieve product diversity. 4, without increasing the process steps.
对附图的简要说明  Brief description of the drawing
附图说明  DRAWINGS
[0037] 下面将结合附图及实施例对本发明作进一步说明， 附图中：  [0037] The present invention will be further described below in conjunction with the accompanying drawings and embodiments, in which:
[0038] 图 1是本发明实施例的流程图。  1 is a flow chart of an embodiment of the present invention.
实施该发明的最佳实施例  BEST MODE FOR CARRYING OUT THE INVENTION
本发明的最佳实施方式  BEST MODE FOR CARRYING OUT THE INVENTION
[0039] 为了对本发明的技术特征、 目的和效果有更加清楚的理解， 现对照附图详细说 明本发明的具体实施方式。  [0039] In order to more clearly understand the technical features, objects and advantages of the present invention, the embodiments of the present invention will be described in detail with reference to the accompanying drawings.
[0040] 如图 1所示， 一种在调光膜上刻画图案的方法， 包括以下步骤：  [0040] As shown in FIG. 1, a method for patterning a light-adjusting film includes the following steps:
[0041] 八、 制备调光膜；  [0041] VIII, preparing a dimming film;
[0042] 其中， 步骤八包括以下子步骤：  [0042] wherein, step eight includes the following sub-steps:
[0043] 1、 在遮光环境下， 取用调制好的调光膜液晶加热至 20° (: -50° (:， 转速 4500转/ 分钟以上并且持续时间不少于 10小时的充分搅拌， 搅拌均匀。 其中， 调光膜液 晶选择在红外波段、 紫外波段或绿光波段透过率高的聚合物液晶， 且调光膜液 晶的透过率小于导电薄膜的透过率。  [0043] 1, in a light-shielded environment, take the prepared dimming film liquid crystal heated to 20 ° (: -50 ° (:, the speed of 4,500 rev / min and the duration of not less than 10 hours of full mixing, stirring Uniformly, the dimming film liquid crystal selects a polymer liquid crystal having a high transmittance in an infrared band, an ultraviolet band, or a green band, and the transmittance of the dimming film liquid crystal is smaller than that of the conductive film.
[0044] 其中， 调光膜液晶可以选用多种不同类型的液晶， 根据液晶的不同选择的原料 、 配比和制备方法不同， 本发明优选调光膜液晶由向列型液晶、 丙烯酸酯混合 物和预聚物制成。 具体地， 包括以下重量份数的原料： 向列型液晶 20-85、 丙烯 \¥0 2019/104488 卩（：17（：\2017/113417 酸酯混合物 10-75、 预聚物 1-10。 在进行光固化时， 所述调光膜液晶还包括重量 份数为 0.5-2的光引发剂。 [0044] wherein, the dimming film liquid crystal can be selected from a plurality of different types of liquid crystals. According to different raw materials, ratios, and preparation methods of the liquid crystal, the dimming film liquid crystal of the present invention is preferably composed of a nematic liquid crystal, an acrylate mixture, and Made of prepolymer. Specifically, the following parts by weight of raw materials are included: nematic liquid crystal 20-85, propylene \¥0 2019/104488 卩(:17(:\2017/113417 acid ester mixture 10-75, prepolymer 1-10. When photocuring, the light-adjusting film liquid crystal also includes 0.5 parts by weight) 2 photoinitiator.
[0045] 具体可以选择以下重量份数的原料：  [0045] Specifically, the following parts by weight of the raw materials can be selected:
[] [表 1]  [] [Table 1]
Figure imgf000007_0001
Figure imgf000007_0001
[0046] 将上述配比的原料进行混合。  [0046] The raw materials of the above ratios are mixed.
[0047] 向列型液晶可以选择市售商品， 在此不作限定。  [0047] Commercially available products can be selected for the nematic liquid crystal, which is not limited herein.
[0048] 所述丙烯酸酯混合物为甲基丙烯酸丁酯、 丙烯酸丁酯、 丙烯酸乙酯中的至少一 种。  [0048] The acrylate mixture is at least one of butyl methacrylate, butyl acrylate, and ethyl acrylate.
[0049] 所述预聚物为聚乙烯或聚丙烯。  [0049] The prepolymer is polyethylene or polypropylene.
[0050] 上述调光膜液晶的选择只是对本发明进行列举说明， 并不影响对调光膜液晶的 其他选择， 在本技术领域， 现有的液晶中， 只要适用于调光膜的其他液晶也同 样适用本发明。  [0050] The selection of the above-mentioned light-adjusting film liquid crystal is merely illustrative of the present invention, and does not affect other options for the liquid crystal of the light-adjusting film. In the prior art, in the prior art liquid crystal, other liquid crystals suitable for the light-adjusting film are also used. The invention is equally applicable.
[0051] 八2、 将调光膜液晶遮光静置， 静置时间在 1-1011， 直至调光膜液晶呈现透明状 态， 备用；  [0051] VIII, the dimming film liquid crystal is statically set, the standing time is 1-1011, until the liquid crystal of the dimming film is transparent, ready for use;
[0052] 八3、 将两张导电薄膜间隔设置， 二者之间留有间隙， 将调光膜液晶涂布在两张 导电薄膜之间的间隙中； 具体为将调光膜液晶转入涂布机， 涂布机口位于两张 透明导电膜之间， 涂布机按照设定好的速度将液晶涂布在两张导电薄膜之间。  [0052] VIII. The two conductive films are spaced apart, leaving a gap therebetween, and the liquid crystal of the light-adjusting film is coated in the gap between the two conductive films; specifically, the liquid crystal of the light-adjusting film is transferred into the coating. In the cloth machine, the coater mouth is located between two transparent conductive films, and the coater coats the liquid crystal between the two conductive films at a set speed.
[0053] 其中， 所述导电薄膜为透明导电薄膜， 选用铟锡氧化物透明导电薄膜、 纳米银 导电薄膜、 高分子聚合物导电薄膜或碳纳米管导电薄膜中的一种。 铟锡氧化物 \¥0 2019/104488 卩（：17（：\2017/113417 透明导电薄膜、 纳米银导电薄膜、 高分子聚合物导电薄膜或碳纳米管导电薄膜 的选择不作限定， 可以任意选用一种或两种， 用于两个导电薄膜。 导电薄膜的 尺寸根据实际需要设定。 [0053] wherein the conductive film is a transparent conductive film, and one of an indium tin oxide transparent conductive film, a nano silver conductive film, a high molecular polymer conductive film or a carbon nanotube conductive film is selected. Indium tin oxide \¥0 2019/104488 卩(:17(:\2017/113417 Transparent conductive film, nano silver conductive film, polymer conductive film or carbon nanotube conductive film is not limited, you can choose one or two For two conductive films. The size of the conductive film is set according to actual needs.
[0054] 八4、 调光膜液晶涂布完成后， 对两张导电薄膜进行辊压贴合， 辊压后导电薄膜 所形成的两个导电层之间间距为 1〇~25—。 两层导电薄膜之间为调光膜液晶层， 两个导电层之间的间距即为调光膜液晶层的厚度。  [0054] VIII. After the liquid crystal coating of the dimming film is completed, the two conductive films are roll-bonded, and the distance between the two conductive layers formed by the conductive film after rolling is 1〇~25. The two layers of conductive film are between the two layers of the light-adjusting film liquid crystal layer, and the distance between the two conductive layers is the thickness of the liquid crystal layer of the light-adjusting film.
[0055] 5、 贴合后的调光膜在紫外光下进行光固化或加热固化。  [0055] 5. The laminated dimming film is photocured or heat cured under ultraviolet light.
[0056] 当通过紫外线固化时， 需要添加 0.5-2份的光引发剂， 所述光引发剂为光引发剂 184或光引发剂 1173。 紫外线固化的参数为： 波长为 36511111， 紫外光强为 10-100 \¥/〇12， 辐照时间为 308-1011^11。 [0056] When curing by ultraviolet light, it is necessary to add 0.5-2 parts of a photoinitiator, which is a photoinitiator 184 or a photoinitiator 1173. The parameters of UV curing are: the wavelength is 36511111, the ultraviolet light intensity is 10-100 \¥/〇1 2 , and the irradiation time is 308-1011^11.
[0057] 在采用加热固化时， 将贴合后的调光膜加热至固化温度， 固化条件可以根据实 际需要设定， 该加热固化为常规技术， 在此不再赘述。  [0057] When the heat curing is performed, the light-adjusting film after the bonding is heated to a curing temperature, and the curing conditions can be set according to actual needs, and the heat curing is a conventional technique, and details are not described herein again.
[0058] 6、 在固化后， 在导电薄膜外粘接有用于保护导电薄膜的基层。 本步骤为优选 步骤。  [0058] 6. After curing, a base layer for protecting the conductive film is bonded to the outside of the conductive film. This step is a preferred step.
[0059] 6. 将调光膜进行通电， 使得调光膜呈现透明状态； 通电电压为 20~30 。  [0059] 6. The dimming film is energized to make the dimming film appear transparent; the power supply voltage is 20~30.
[0060] (:、 对通电状态的调光膜进行激光蚀刻， 激光在调光膜的导电层上刻画出预先 设定好的图案。 [0060] ( :: laser etching is performed on the light-adjusting film in an energized state, and the laser pattern is patterned on the conductive layer of the light-adjusting film.
[0061] 步骤 (:可包含如下子步骤：  [0061] Step (: may include the following sub-steps:
[0062] 0、 选用适用激光波长； 所述激光波长可以选用紫外波段 35511111、 绿光波段 53 [0062] 0, select the applicable laser wavelength; the laser wavelength can select the ultraviolet band 35511111, the green band 53
211111或红外波段 106411111。 优选红外波段 106411111。 211111 or infrared band 106411111. The infrared band 106411111 is preferred.
[0063] 由于调光膜液晶的选择与蚀刻所选择的激光波段有密切关联， 因此， 需要选择 在特定激光波段透光率高的调光膜液晶， 或者是选择对于已有调光膜液晶吸收 少的特定激光波段。 因此， 本发明选择上述适用的激光波段。  [0063] Since the selection of the liquid crystal of the dimming film is closely related to the laser wavelength selected by the etching, it is necessary to select a dimming film liquid crystal having a high transmittance in a specific laser band, or to select a liquid crystal for the existing dimming film. Less specific laser bands. Therefore, the present invention selects the above-mentioned applicable laser band.
[0064] 原料优选为向列型液晶、 丙烯酸酯混合物和预聚物， 制成的调光膜液晶对红外 激光在 1064!1111透光率高， 选择该波段降低红外激光对调光膜的影响。  [0064] The raw material is preferably a nematic liquid crystal, an acrylate mixture and a prepolymer, and the dimming film liquid crystal produced by the liquid crystal on the infrared laser has a high transmittance at 1064!1111, and the wavelength is selected to reduce the influence of the infrared laser on the dimming film. .
[0065] 02、 将材料水平放置在激光蚀刻设备平台上； 调整平台高度， 来调整激光聚焦 面聚焦在调光膜的导电薄膜上。 激光聚焦面到平台表面的距离为〇1， 根据调光 膜各叠层厚度可知预图案化的导电薄膜到平台表面的距离〇2, 可以换算出激光 \¥0 2019/104488 卩（：17（：\2017/113417 焦面到预图案化的导电薄膜距离为 01 2， 平台高度往上平移 01 2即可。 [0065] 02, horizontally placing the material on the laser etching equipment platform; adjusting the height of the platform to adjust the laser focusing surface to focus on the conductive film of the dimming film. The distance from the focal plane of the laser to the surface of the platform is 〇1. According to the thickness of each laminate of the dimming film, the distance 〇2 from the surface of the pre-patterned conductive film to the surface of the platform can be converted. \¥0 2019/104488 卩(:17(:\2017/113417 The distance from the focal plane to the pre-patterned conductive film is 01 2, and the height of the platform can be translated upwards by 01 2 .
[0066] 03、 设置加工参数， 根据设定图案进行激光蚀刻， 去除导电薄膜上对应图案位 置的导电层， 形成图案；  [0066] 03, setting processing parameters, performing laser etching according to the set pattern, removing the conductive layer on the conductive film corresponding pattern position, forming a pattern;
[0067] 04、 蚀刻完成后， 分别对图案或非图案区进行通电， 通过图案或非图案区透明 状态， 来检查蚀刻图案完整性。 给调光膜的图案区域通电， 电压达到透明态阈 值时， 图案区域呈现透明状态； 或者给非图案区域通电， 电压达到透明态阈值 时， 图案区域呈现雾态， 非图案区域呈现透明状态。  [0067] 04. After the etching is completed, the patterned or non-patterned regions are respectively energized, and the etching pattern integrity is checked by the transparent state of the patterned or non-patterned regions. The pattern area of the light-adjusting film is energized, and when the voltage reaches the transparent state threshold, the pattern area is in a transparent state; or the non-pattern area is energized, and when the voltage reaches the transparent state threshold, the pattern area is fogged, and the non-pattern area is transparent.
[0068] 由于导电薄膜为两层， 如果对单层导电薄膜进行蚀刻， 由于在蚀刻图案时， 激 光会穿透调光膜液晶对另一导电薄膜产生影响， 因此， 需要在该层导电薄膜表 面镀有至少一层的特殊波段截止的透明导电材料截止层， 优选在步骤八中还包括 步骤八4: 在导电薄膜表面镀有至少一层的特殊波段截止的透明导电材料截止层 ， 所述特殊波段截止是指红外波段、 紫外波段或绿光波段截止 （截止指反射掉 ） 。 优选所述透明导电材料截止层选用的材料为 MgF2、 八1 20 3、 11 3〇5 ^ 810 2 或 \。 上述材料可以任意选择， 所述透明导电材料截止层在导电薄膜表面镀 多层， 由上述高折射率和低折射率的材料交替叠合形成。 其中， MgF 2 的折射率1!= 1.38（55011111）， 八1 20 3的折射率 11=1.63（55011111）、 II 30 5 [0068] Since the conductive film is two layers, if the single-layer conductive film is etched, since the laser light penetrates the light-adjusting film liquid crystal to affect another conductive film when etching the pattern, it is required to be on the surface of the conductive film of the layer. a transparent conductive material cut-off layer plated with at least one layer of a special band cutoff, preferably further comprising a step 8 : in step 8 : at least one layer of a special band cut-off transparent conductive material cut-off layer is plated on the surface of the conductive film, the special Band cutoff refers to the cutoff of the infrared, ultraviolet or green band (cutoff refers to reflection). Preferably, the transparent conductive material cut-off layer is made of MgF2, 八 1 2 3 3 , 11 3 〇 5 ^ 810 2 or \. The above-mentioned material may be arbitrarily selected, and the transparent conductive material cut-off layer is plated on the surface of the conductive film, and is formed by alternately stacking the above-mentioned high refractive index and low refractive index materials. Wherein a refractive index of 1 MgF 2! = 1.38 (55,011,111), the refractive index of eight 1203 11 = 1.63 (55011111), II 3 0 5
的折射率1!=2.2-2.4（50〇11111）、 810 2 Refractive index 1!=2.2-2.4 (50〇11111), 810 2
的折射率1!=1.46（550腿）， 1 的折射率 11=1.92-2.3（550腿）， 这样将高折射率的丁 i 30 5和SiNx与低折射率的MgF 2、 1 20 3或3¾）2交替叠合多层镀膜， 形成红外波 段、 紫外波段或绿光波段截止。 The refractive index of 1!=1.46 (550 legs), the refractive index of 1 is 11.92-2.3 (550 legs), so that the high refractive index of di 3 0 5 and SiNx and the low refractive index of MgF 2 , 1 2 0 3 or 33⁄4) 2 alternately stack multiple layers of coating to form an infrared, ultraviolet or green band cutoff.
[0069] 采用截止层， 在调光膜进行透明导电层图案化蚀刻时， 聚焦在焦点处的激光 主要对透明导电层蚀刻形成预设图案； 透过透明导电层的绝大部分被透明导电 材料截止层截止 （即被反射掉） ， 从而减少激光对调光膜液晶造成的影响。  [0069] using a cut-off layer, when the light-adjusting film is patterned and etched by the transparent conductive layer, the laser focused at the focus mainly etches the transparent conductive layer to form a predetermined pattern; the majority of the transparent conductive layer is transparent conductive material The cutoff layer is turned off (ie, reflected off), thereby reducing the effect of the laser on the liquid crystal of the dimming film.

Claims

\¥0 2019/104488 卩（：17（：\2017/113417 权利要求书 \¥0 2019/104488 卩(:17(:\2017/113417 Claims)
[权利要求 1] 一种在调光膜上刻画图案的方法， 其特征在于， 包括以下步骤： 八、 制备调光膜；  [Claim 1] A method for patterning a pattern on a light control film, comprising the steps of: VIII. preparing a light control film;
6. 将调光膜进行通电， 使得调光膜呈现透明状态；  6. The dimming film is energized to make the dimming film transparent;
(:、 对通电状态的调光膜进行激光蚀刻， 激光在调光膜的导电层上 刻画出预先设定好的图案。 ( :, laser etching is performed on the light-adjusting film of the energized state, and the laser pattern is patterned on the conductive layer of the light-adjusting film.
[权利要求 2] 根据权利要求 1所述的在调光膜上刻画图案的方法， 其特征在于， 所 述步骤八中， 包括以下子步骤：  [Claim 2] The method for patterning a pattern on a light control film according to claim 1, wherein the step (8) includes the following substeps:
八1、 在遮光环境下， 取用调制好的调光膜液晶加热至 20° (: -50° (:， 搅拌均匀；  8.1 In a light-shielded environment, use a prepared dimming film to heat the liquid crystal to 20° (: -50° (:, stir evenly;
八2、 将调光膜液晶遮光静置， 直至调光膜液晶呈现透明状态； 八3、 将两张导电薄膜间隔设置， 二者之间留有间隙， 将调光膜液 晶涂布在两张导电薄膜之间的间隙中；  VIII. The liquid crystal of the dimming film is statically set until the liquid crystal of the dimming film is transparent; VIII. The two conductive films are spaced apart, leaving a gap between the two, and the liquid crystal of the dimming film is coated on two In the gap between the conductive films;
八4、 对两张导电薄膜进行辊压贴合， 辊压后导电薄膜所形成的两 个导电层之间间距为 10-25^；  VIII. The two conductive films are roll-bonded, and the distance between the two conductive layers formed by the conductive film after rolling is 10-25^;
八5、 贴合后的调光膜在紫外光下进行光固化或加热固化。  VIII. The laminated dimming film is photocured or heat cured under ultraviolet light.
[权利要求 3] 据权利要求 2所述的在调光膜上刻画图案的方法， 其特征在于， 所述 步骤 中， 所述调光膜液晶选择在红外波段、 紫外波段或绿光波段 透过率高的聚合物液晶， 且调光膜液晶的透过率小于导电薄膜的透过 率。  [Claim 3] The method for patterning a light-adjusting film according to claim 2, wherein, in the step, the liquid crystal of the light-adjusting film is selected to pass through in an infrared band, an ultraviolet band, or a green band. The polymer liquid crystal has a high rate, and the transmittance of the liquid crystal of the light control film is smaller than the transmittance of the conductive film.
[权利要求 4] 根据权利要求 3所述的在调光膜上刻画图案的方法， 其特征在于， 所 述调光膜液晶由原料向列型液晶、 丙烯酸酯混合物和预聚物制成。  [Claim 4] The method of patterning a light-adjusting film according to claim 3, wherein the light-adjusting film liquid crystal is made of a raw material nematic liquid crystal, an acrylate mixture, and a prepolymer.
[权利要求 5] 根据权利要求 4所述的在调光膜上刻画图案的方法， 其特征在于， 所 述调光膜液晶还包括光引发剂。 [Claim 5] The method of patterning a light-adjusting film according to claim 4, wherein the light-adjusting film liquid crystal further comprises a photoinitiator.
[权利要求 6] 根据权利要求 5所述的在调光膜上刻画图案的方法， 其特征在于， 所 述丙烯酸酯混合物为甲基丙烯酸丁酯、 丙烯酸丁酯、 丙烯酸乙酯中的 至少一种； 所述预聚物为聚乙烯或聚丙烯。 [Claim 6] The method of patterning a pattern on a light control film according to claim 5, wherein the acrylate mixture is at least one of butyl methacrylate, butyl acrylate, and ethyl acrylate. The prepolymer is polyethylene or polypropylene.
[权利要求 7] 根据权利要求 2所述的在调光膜上刻画图案的方法， 其特征在于， 所 \¥0 2019/104488 卩（：17（：\2017/113417 述步骤八3中， 所述导电薄膜为透明导电薄膜， 选用铟锡氧化物透明 导电薄膜、 纳米银导电薄膜、 高分子聚合物导电薄膜或碳纳米管导电 薄膜中的一种。 [Claim 7] A method of patterning a pattern on a light control film according to claim 2, wherein \¥0 2019/104488 卩(:17(:\2017/113417) In step VIII, the conductive film is a transparent conductive film, indium tin oxide transparent conductive film, nano silver conductive film, high molecular polymer conductive One of a thin film or a carbon nanotube conductive film.
[权利要求 8] 根据权利要求 2所述的在调光膜上刻画图案的方法， 其特征在于， 所 述步骤八中， 还包括子步骤八4: 在导电薄膜表面镀有至少一层的特殊 波段截止的透明导电材料截止层， 所述特殊波段截止是指红外波段、 紫外波段或绿光波段截止。 [Claim 8] The method for patterning a pattern on a light-adjusting film according to claim 2, wherein the step 8 further comprises a sub-step 8 : a special plating of at least one layer on the surface of the conductive film. The band-cut transparent conductive material cut-off layer, the special band cutoff refers to the infrared band, the ultraviolet band or the green band cutoff.
[权利要求 9] 根据权利要求 8所述的在调光膜上刻画图案的方法， 其特征在于， 所 述透明导电材料截止层选用的材料为 MgF 八1 20 11 3〇5 ^ 810 2 或 。 [Claim 9] The method for patterning a pattern on a light-adjusting film according to claim 8, wherein the material of the transparent conductive material cut-off layer is MgF 八 1 2 0 11 3 〇 5 ^ 810 2 or .
[权利要求 10] 根据权利要求 9所述的在调光膜上刻画图案的方法， 其特征在于， 所 述透明导电材料截止层在导电薄膜表面镀多层， 由高折射率和低折射 率的材料交替叠合形成。  [Claim 10] The method for patterning a light-adjusting film according to claim 9, wherein the transparent conductive material cut-off layer is plated on the surface of the conductive film by a high refractive index and a low refractive index The materials are alternately stacked to form.
[权利要求 11] 根据权利要求 1所述的在调光膜上刻画图案的方法， 其特征在于， 所 述步骤 8中， 通电电压为 20~30 。  [Claim 11] The method for patterning a pattern on a light control film according to claim 1, wherein in the step 8, the energization voltage is 20 to 30.
[权利要求 12] 根据权利要求 1所述的在调光膜上刻画图案的方法， 其特征在于， 所 述步骤（:中， 包括以下子步骤： [Claim 12] The method for patterning a pattern on a light control film according to claim 1, wherein the step (: includes the following substeps:
〇、 选用适用激光波长；  〇, select the applicable laser wavelength;
02. 调整激光聚焦面聚焦在调光膜的导电薄膜上；  02. Adjusting the laser focusing surface to focus on the conductive film of the dimming film;
03、 根据设定图案进行激光蚀刻， 去除导电薄膜上对应图案位 置的导电层， 形成图案；  03, performing laser etching according to the set pattern, removing the conductive layer corresponding to the pattern position on the conductive film to form a pattern;
04. 蚀刻完成后， 分别对图案或非图案区进行通电， 通过图案 或非图案区透明状态， 来检查蚀刻图案完整性。  04. After the etching is completed, the pattern or non-pattern area is energized separately, and the etching pattern integrity is checked by the transparent state of the pattern or the non-pattern area.
[权利要求 13] 根据权利要求 1所述的在调光膜上刻画图案的方法， 其特征在于， 所 述步骤（：1中， 所述激光波长选用紫外波段 355!1111、 绿光波段 532!1111或 红外波段 106411111。  [Claim 13] The method for patterning a light-adjusting film according to claim 1, wherein in the step (1), the laser wavelength is selected from the ultraviolet band 355!1111 and the green band 532! 1111 or infrared band 106411111.
[权利要求 14] 根据权利要求 1所述的在调光膜上刻画图案的方法， 其特征在于， 所 述步骤 04中， 给调光膜的图案区域通电， 电压达到透明态阈值时， \¥0 2019/104488 卩（：17（：\2017/113417 图案区域呈现透明状态； [Claim 14] The method for patterning a pattern on a light-adjusting film according to claim 1, wherein in the step 04, the pattern region of the light-adjusting film is energized, and when the voltage reaches a transparent threshold, \¥0 2019/104488 卩(:17(:\2017/113417 The pattern area is transparent);
或者给非图案区域通电， 电压达到透明态阈值时， 图案区域呈现雾 态， 非图案区域呈现透明状态。  Or, the non-pattern area is energized, and when the voltage reaches the transparent threshold, the pattern area is fogged, and the non-pattern area is transparent.
[权利要求 15] 根据权利要求 2所述的在调光膜上刻画图案的方法， 其特征在于， 所 述方法还包括：  The method of claim 2, wherein the method further comprises:
在步骤八中， 6、 在固化后， 在导电薄膜外粘接有用于保护导电薄膜 的基层。  In the eighth step, 6, after curing, a base layer for protecting the conductive film is adhered to the outside of the conductive film.
PCT/CN2017/113417 2017-11-28 2017-11-28 Method for etching pattern on polymer dispersed liquid crystal film WO2019104488A1 (en)

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