WO2019091113A1 - Slowly-lifting water removing device - Google Patents

Slowly-lifting water removing device Download PDF

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Publication number
WO2019091113A1
WO2019091113A1 PCT/CN2018/091384 CN2018091384W WO2019091113A1 WO 2019091113 A1 WO2019091113 A1 WO 2019091113A1 CN 2018091384 W CN2018091384 W CN 2018091384W WO 2019091113 A1 WO2019091113 A1 WO 2019091113A1
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Prior art keywords
plate
support plate
fixed
movable plate
silicon wafer
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PCT/CN2018/091384
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French (fr)
Chinese (zh)
Inventor
胡琴
房江明
张凯胜
姚伟忠
孙铁囤
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常州亿晶光电科技有限公司
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Publication of WO2019091113A1 publication Critical patent/WO2019091113A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • the invention relates to the technical field of solar cell sheet preparation devices, in particular to a slow pulling dewatering device.
  • the silicon wafer In the preparation process of the solar cell, the silicon wafer needs to be pickled to remove the surface oxide of the silicon wafer, and then the silicon wafer is washed with water, then dried and then moved to the next process, and when the silicon wafer is cleaned from the cleaning tank,
  • the surface of the silicon wafer is easy to carry more water droplets, which leads to traces on the surface of the silicon wafer after drying, and the silicon wafer with more water droplets on the surface requires a longer drying time in the drying process, which is undoubtedly increased. Energy consumption reduces drying efficiency.
  • the technical problem to be solved by the present invention is that in order to solve the problem that the surface of the silicon wafer is easy to carry more water droplets when the silicon wafer is lifted out from the cleaning tank in the prior art, a slow pulling and dewatering equipment is provided.
  • the technical solution adopted by the present invention to solve the technical problem thereof is: a slow pulling and dehydrating device, and the dehydration setting includes:
  • a movable plate hinged at a left end of the support plate the hinge between the movable plate and the support plate forms a hinge point, and a distance between the left end end surface of the support plate and the hinge point is smaller than a right end end surface of the support plate and a hinge point Distance between
  • the output end of the lifting mechanism is drivingly connected to the movable plate, and the lifting mechanism is configured to drive the movable plate to rise or fall;
  • a pressure block fixed to the lifting mechanism the pressure block being located on the left side of the movable plate, the support plate being located below the pressure block.
  • the movable plate and the support plate are rotatably connected by a pin.
  • the lifting mechanism includes a base, a vertical plate, a motor and a lead screw, the vertical plate is fixed on the base, the motor is fixed on the vertical plate, and the lead screw is fixedly connected with the output end of the motor.
  • a threaded drive is connected to the sliding screw, and the sliding seat is slidably connected to the vertical plate.
  • the sliding seat is fixed with a cross bar, and the horizontal bar is fixed with a lifting rod, and the bottom end of the hanging rod is The movable plate is fixedly connected, and the pressing block is fixed on the base.
  • the vertical plate is provided with a guide rail parallel to the lead screw, and the guide rail is slidably provided with a guiding block, and the sliding seat is fixed on the guiding block.
  • the invention has the beneficial effects that the slow pulling and dehydrating device of the invention can realize the inclined water discharge of the silicon wafer, so that the silicon wafer has a better dehydration effect and facilitates the drying of the silicon wafer after the process.
  • Figure 1 is a schematic view of the slow pull dewatering apparatus of the present invention
  • FIG. 2 is a schematic view showing the slow pull-up dehydration device of the present invention installed on a cleaning tank;
  • FIG. 3 is a schematic view showing the lifting of the left end of the support plate when the movable plate is lifted upward by the movable plate in the slow lifting and dewatering device of the present invention
  • FIG. 4 is a schematic view showing the left end of the support plate abutting on the pressing block and lifting the right end when the movable plate is lifted upward by the movable plate in the slow lifting and dewatering device of the present invention.
  • Fig. 5 is a schematic view showing the contact of the silicon wafer with the liquid in the cleaning tank when the silicon wafer is tilted with the support plate in the slow pulling dewatering apparatus of the present invention.
  • a slow pull dewatering device includes:
  • the movable plate 4 is hinged at the left end of the support plate 1, and a hinge point is formed at a hinge between the movable plate 4 and the support plate 1.
  • the distance between the left end face of the support plate 1 and the hinge point is smaller than the right end face of the support plate 1 and the hinge point
  • the distance between the movable plate 4 and the support plate 1 is rotatably connected by the pin 8, that is, the distance between the end surface of the left end of the support plate 1 and the pin 8 is smaller than the distance between the end surface of the right end of the support plate 1 and the pin 8. .
  • the fixing plate 5 is fixed at the right end of the supporting plate 1;
  • the lifting mechanism 6 the output end of the lifting mechanism 6 is drivingly connected with the movable plate 4 , and the lifting mechanism 6 is used for driving the movable plate 4 to rise or fall;
  • the pressing block 7 is fixed on the lifting mechanism 6, the pressing block 7 is located on the left side of the movable plate 4, and the supporting plate 1 is located below the pressing block 7.
  • the lifting mechanism 6 includes a base 6-1, a vertical plate 6-2, a motor 6-3, and a lead screw 6-4.
  • the vertical plate 6-2 is fixed on the base 6-1
  • the motor 6-3 is fixed on the vertical plate 6.
  • the lead screw 6-4 is fixedly connected with the output end of the motor 6-3
  • the screw 6-4 is screwed to the sliding seat 6-5
  • the sliding seat 6-5 is slidably connected with the vertical plate 6-2.
  • a crossbar 6-6 is fixed on the sliding seat 6-5
  • a hanging rod 6-7 is fixed on the crossbar 6-6.
  • the bottom end of the hanging rod 6-7 is fixedly connected with the movable plate 4, and the pressing block 7 is fixed on the base. 6-1.
  • the vertical plate 6-2 is provided with a guide rail 6-8 parallel to the lead screw 6-4.
  • the guide rail 6-8 is slidably provided with a guide block 6-9, and the slide seat 6-5 is fixed to the guide block 6-9.
  • the starting motor 6-3 drives the screw 6-4 to rotate, and the threaded transmission between the screw 6-4 and the sliding seat 6-5 is utilized, so that the lifting rod 6 is driven by the sliding seat 6-5. 7 rise or fall;
  • the motor 6-3 When the water is discharged, the motor 6-3 is started, and the movable plate 4 is driven by the boom 6-7 to pull the support plate 1 upward. Since the support plate 1 is located at the right side of the movable plate 4, the support 6 is supported by the hanger 6-7.
  • the left end of the support plate 1 is first lifted upward, and the flower basket 3 is tilted together with the support plate 1 to realize the inclined water discharge of the silicon wafer 2; when the left end of the support plate 1 abuts against the lower surface of the pressing block 7, The boom 6-7 continues to pull the support plate 1 upward, and the support plate 1 rotates with the contact portion of the left end and the pressing block 7 as a fulcrum, that is, the right end of the support plate 1 is lifted up until the support plate 1 is in a horizontal position.
  • the silicon wafer 2 in the flower basket 3 is separated from the liquid in the cleaning tank 9;
  • the water discharge speed of the silicon wafer 2 can be reduced, and at the same time, silicon After the sheet 2 is tilted, the water on the upper end surface and the lower end surface of the silicon wafer 2 can flow down the inclined surface, thereby achieving rapid separation of the silicon wafer 2 and water.
  • the dehydration effect of the flower basket 3 is also very good. In the inclined state, the water is easily detached from the flower basket 3, so that when the silicon wafer 2 is detached from the cleaning tank 9, it has a good dehydration effect and is convenient. After the drying of the silicon wafer 2, the water in the cleaning tank 9 can be heated to reduce the tension of the water on the silicon wafer 2.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

The present invention relates to the technical field of solar cell piece preparation apparatuses, and in particular to a slowly-lifting water removing device. The dehydration equipment comprises: a support plate, used for placing a flower basket loaded with a silicon wafer; a movable plate, hingedly connected to a left end of the support plate, a hinge support point being formed at a hinge connection position between the movable plate and the support plate, and a distance between an end surface of the left end of the support plate and the hinge support being is smaller than a distance between an end surface of a right end of the support plate and the hinge support point; a fixed plate, fixed at the right end of the support plate; a height-adjustment mechanism, an output end of the height adjustment mechanism being transmittingly connected to the movable plate, and the height-adjustment mechanism being used for driving the movable plate to ascend or descend; and a press block, fixed on the height-adjustment mechanism and located at a left side of the movable plate. The support plate is located below the press block. According to the present invention, the slowly-lifting water removing device can achieve an inclined water outlet of a silicon wafer, so that the silicon wafer has a relatively good water removing effect, and drying of the silicon wafer in a subsequent process is facilitated.

Description

慢提拉脱水设备Slow pulling dewatering equipment 技术领域Technical field
本发明涉及太阳能电池片制备装置技术领域，尤其是一种慢提拉脱水设备。The invention relates to the technical field of solar cell sheet preparation devices, in particular to a slow pulling dewatering device.
背景技术Background technique
在太阳能电池片制备过程中，硅片需要经过酸洗去除硅片表面氧化物，然后硅片需经过水洗，接着烘干后进入下一道工序，而硅片从清洗槽中清洗后提升出来时,硅片表面容易携带较多的水珠，导致烘干后硅片表面会留下痕迹,且表面携带较多水珠的硅片在烘干工序中所需的烘干时间较长，这无疑增加了能源消耗，降低了烘干效率。In the preparation process of the solar cell, the silicon wafer needs to be pickled to remove the surface oxide of the silicon wafer, and then the silicon wafer is washed with water, then dried and then moved to the next process, and when the silicon wafer is cleaned from the cleaning tank, The surface of the silicon wafer is easy to carry more water droplets, which leads to traces on the surface of the silicon wafer after drying, and the silicon wafer with more water droplets on the surface requires a longer drying time in the drying process, which is undoubtedly increased. Energy consumption reduces drying efficiency.
发明内容Summary of the invention
本发明要解决的技术问题是：为了解决现有技术中硅片从清洗槽中提升出来时,其表面容易携带较多水珠的问题,现提供一种慢提拉脱水设备。The technical problem to be solved by the present invention is that in order to solve the problem that the surface of the silicon wafer is easy to carry more water droplets when the silicon wafer is lifted out from the cleaning tank in the prior art, a slow pulling and dewatering equipment is provided.
本发明解决其技术问题所采用的技术方案是：一种慢提拉脱水设备，该脱水设置包括：The technical solution adopted by the present invention to solve the technical problem thereof is: a slow pulling and dehydrating device, and the dehydration setting includes:
支撑板，用于放置装有硅片的花篮；a support plate for placing a flower basket with a silicon wafer;
活动板，铰接在支撑板的左端，所述活动板与支撑板之间的铰接处形成铰支点，所述支撑板左端端面与铰支点之间的距离小于所述支撑板右端端面与铰支点之间的距离；a movable plate hinged at a left end of the support plate, the hinge between the movable plate and the support plate forms a hinge point, and a distance between the left end end surface of the support plate and the hinge point is smaller than a right end end surface of the support plate and a hinge point Distance between
固定板，所述固定板固定在支撑板的右端；a fixing plate fixed to a right end of the support plate;
升降机构，所述升降机构的输出端与活动板传动连接，所述升降机构用于带动活动板上升或下降；a lifting mechanism, the output end of the lifting mechanism is drivingly connected to the movable plate, and the lifting mechanism is configured to drive the movable plate to rise or fall;
以及压块，所述压块固定在升降机构上，所述压块位于活动板的左侧，所述支撑板位于压块下方。And a pressure block fixed to the lifting mechanism, the pressure block being located on the left side of the movable plate, the support plate being located below the pressure block.
具体地，所述活动板与支撑板之间通过销轴转动连接。Specifically, the movable plate and the support plate are rotatably connected by a pin.
进一步地，所述升降机构包括基座、立板、电机及丝杠，所述立板固定在基座上，所述电机固定在立板上，所述丝杠与电机的输出端固定连接，所述丝杠上螺纹传动连接有滑座，所述滑座与立板滑动连接，所述滑座上固定有横杆，所述横杆上固定有吊杆，所述吊杆的底端与活动板固定连接，所述压块固定在基座上。Further, the lifting mechanism includes a base, a vertical plate, a motor and a lead screw, the vertical plate is fixed on the base, the motor is fixed on the vertical plate, and the lead screw is fixedly connected with the output end of the motor. a threaded drive is connected to the sliding screw, and the sliding seat is slidably connected to the vertical plate. The sliding seat is fixed with a cross bar, and the horizontal bar is fixed with a lifting rod, and the bottom end of the hanging rod is The movable plate is fixedly connected, and the pressing block is fixed on the base.
进一步地，所述立板上设置有与丝杠平行的导轨，所述导轨上滑动设置有导向块，所述滑座固定在导向块上。Further, the vertical plate is provided with a guide rail parallel to the lead screw, and the guide rail is slidably provided with a guiding block, and the sliding seat is fixed on the guiding block.
本发明的有益效果是：本发明慢提拉脱水设备可实现硅片倾斜式出水，使硅片具有较好的脱水效果，便于硅片后道工序的烘干。The invention has the beneficial effects that the slow pulling and dehydrating device of the invention can realize the inclined water discharge of the silicon wafer, so that the silicon wafer has a better dehydration effect and facilitates the drying of the silicon wafer after the process.
附图说明DRAWINGS
下面结合附图和实施例对本发明进一步说明。The invention will now be further described with reference to the drawings and embodiments.
图1是本发明慢提拉脱水设备的示意图；Figure 1 is a schematic view of the slow pull dewatering apparatus of the present invention;
图2是本发明慢提拉脱水设备安装在清洗槽上的示意图；2 is a schematic view showing the slow pull-up dehydration device of the present invention installed on a cleaning tank;
图3是本发明慢提拉脱水设备中活动板向上提升支撑板时支撑板左端上抬的示意图；3 is a schematic view showing the lifting of the left end of the support plate when the movable plate is lifted upward by the movable plate in the slow lifting and dewatering device of the present invention;
图4是本发明慢提拉脱水设备中活动板向上提升支撑板时支撑板左端抵在压块上且右端上抬的示意图。4 is a schematic view showing the left end of the support plate abutting on the pressing block and lifting the right end when the movable plate is lifted upward by the movable plate in the slow lifting and dewatering device of the present invention.
图5是本发明慢提拉脱水设备中硅片随支撑板倾斜时与清洗槽中液体的接 触示意图。Fig. 5 is a schematic view showing the contact of the silicon wafer with the liquid in the cleaning tank when the silicon wafer is tilted with the support plate in the slow pulling dewatering apparatus of the present invention.
图中：1、支撑板，2、硅片，3、花篮，4、活动板，5、固定板，6、升降机构，6-1、基座，6-2、立板，6-3、电机，6-4、丝杠，6-5、滑座，6-6、横杆，6-7、吊杆，6-8、导轨，6-9、导向块，7、压块，8、销轴，9、清洗槽。In the figure: 1, support plate, 2, silicon wafer, 3, flower basket, 4, movable board, 5, fixed board, 6, lifting mechanism, 6-1, base, 6-2, vertical board, 6-3, Motor, 6-4, lead screw, 6-5, slide, 6-6, crossbar, 6-7, boom, 6-8, guide rail, 6-9, guide block, 7, clamp, 8, Pin, 9, cleaning tank.
具体实施方式Detailed ways
现在结合附图对本发明作进一步详细的说明。这些附图均为简化的示意图，仅以示意方式说明本发明的基本结构，因此其仅显示与本发明有关的构成，方向和参照(例如，上、下、左、右、等等)可以仅用于帮助对附图中的特征的描述。因此，并非在限制性意义上采用以下具体实施方式，并且仅仅由所附权利要求及其等同形式来限定所请求保护的主题的范围。The invention will now be described in further detail with reference to the drawings. The drawings are simplified schematic diagrams, only to illustrate the basic structure of the present invention in a schematic manner, and thus only show the configurations related to the present invention, and the directions and references (eg, up, down, left, right, etc.) may only Used to assist in the description of the features in the drawings. The scope of the claimed subject matter is therefore not to be construed in a
实施例1Example 1
如图1-5所示，一种慢提拉脱水设备，该脱水设置包括：As shown in Figure 1-5, a slow pull dewatering device includes:
支撑板1，用于放置装有硅片2的花篮3；a support plate 1 for placing a flower basket 3 containing the silicon wafer 2;
活动板4，铰接在支撑板1的左端，活动板4与支撑板1之间的铰接处形成铰支点，支撑板1左端端面与铰支点之间的距离小于支撑板1右端端面与铰支点之间的距离，当活动板4与支撑板1之间通过销轴8转动连接时，即支撑板1左端端面与销轴8之间的距离小于支撑板1右端端面与销轴8之间的距离。The movable plate 4 is hinged at the left end of the support plate 1, and a hinge point is formed at a hinge between the movable plate 4 and the support plate 1. The distance between the left end face of the support plate 1 and the hinge point is smaller than the right end face of the support plate 1 and the hinge point The distance between the movable plate 4 and the support plate 1 is rotatably connected by the pin 8, that is, the distance between the end surface of the left end of the support plate 1 and the pin 8 is smaller than the distance between the end surface of the right end of the support plate 1 and the pin 8. .
固定板5，固定板5固定在支撑板1的右端；a fixing plate 5, the fixing plate 5 is fixed at the right end of the supporting plate 1;
升降机构6，升降机构6的输出端与活动板4传动连接，升降机构6用于带动活动板4上升或下降；The lifting mechanism 6 , the output end of the lifting mechanism 6 is drivingly connected with the movable plate 4 , and the lifting mechanism 6 is used for driving the movable plate 4 to rise or fall;
以及压块7，压块7固定在升降机构6上，压块7位于活动板4的左侧，支撑板1位于压块7下方。And the pressing block 7, the pressing block 7 is fixed on the lifting mechanism 6, the pressing block 7 is located on the left side of the movable plate 4, and the supporting plate 1 is located below the pressing block 7.
升降机构6包括基座6-1、立板6-2、电机6-3及丝杠6-4，立板6-2固定在基座6-1上，电机6-3固定在立板6-2上，丝杠6-4与电机6-3的输出端固定连接，丝杠6-4上螺纹传动连接有滑座6-5，滑座6-5与立板6-2滑动连接，滑座6-5上固定有横杆6-6，横杆6-6上固定有吊杆6-7，吊杆6-7的底端与活动板4固定连接，压块7固定在基座6-1上。The lifting mechanism 6 includes a base 6-1, a vertical plate 6-2, a motor 6-3, and a lead screw 6-4. The vertical plate 6-2 is fixed on the base 6-1, and the motor 6-3 is fixed on the vertical plate 6. -2, the lead screw 6-4 is fixedly connected with the output end of the motor 6-3, the screw 6-4 is screwed to the sliding seat 6-5, and the sliding seat 6-5 is slidably connected with the vertical plate 6-2. A crossbar 6-6 is fixed on the sliding seat 6-5, and a hanging rod 6-7 is fixed on the crossbar 6-6. The bottom end of the hanging rod 6-7 is fixedly connected with the movable plate 4, and the pressing block 7 is fixed on the base. 6-1.
立板6-2上设置有与丝杠6-4平行的导轨6-8，导轨6-8上滑动设置有导向块6-9，滑座6-5固定在导向块6-9上。The vertical plate 6-2 is provided with a guide rail 6-8 parallel to the lead screw 6-4. The guide rail 6-8 is slidably provided with a guide block 6-9, and the slide seat 6-5 is fixed to the guide block 6-9.
上述慢提拉脱水设备的工作原理如下：The working principle of the above slow pulling dewatering equipment is as follows:
升降机构6在运行时，启动电机6-3驱动丝杠6-4转动，利用丝杠6-4与滑座6-5之间的螺纹传动，从而由滑座6-5带动吊杆6-7上升或下降；When the lifting mechanism 6 is in operation, the starting motor 6-3 drives the screw 6-4 to rotate, and the threaded transmission between the screw 6-4 and the sliding seat 6-5 is utilized, so that the lifting rod 6 is driven by the sliding seat 6-5. 7 rise or fall;
入水，通过将装入有硅片2的花篮3放置在支撑板1上，然后启动电机6-3，通过吊杆6-7带动活动板4下降，实现将支撑板1及花篮3上的硅片2浸没在清洗槽9内的液体中，进行硅片2的清洗；Into the water, by placing the flower basket 3 loaded with the silicon wafer 2 on the support plate 1, and then starting the motor 6-3, and driving the movable plate 4 down by the hanger 6-7, the silicon on the support plate 1 and the flower basket 3 is realized. The sheet 2 is immersed in the liquid in the cleaning tank 9, and the silicon wafer 2 is cleaned;
出水，启动电机6-3，通过吊杆6-7带动活动板4将支撑板1向上拉，由于支撑板1位于活动板4右侧的部位较重，因此，在吊杆6-7将支撑板1向上拉动时，支撑板1的左端会先向上抬，花篮3随支撑板1一起倾斜，实现硅片2倾斜式出水；当支撑板1的左端抵在压块7下表面时，随着吊杆6-7继续将支撑板1向上拉动，支撑板1会以其左端与压块7的接触部位为支点进行转动，即支撑板1的右端向上抬，直至支撑板1处于水平位置，此时花篮3中的硅片2与清洗槽9内的液体脱离；When the water is discharged, the motor 6-3 is started, and the movable plate 4 is driven by the boom 6-7 to pull the support plate 1 upward. Since the support plate 1 is located at the right side of the movable plate 4, the support 6 is supported by the hanger 6-7. When the plate 1 is pulled upward, the left end of the support plate 1 is first lifted upward, and the flower basket 3 is tilted together with the support plate 1 to realize the inclined water discharge of the silicon wafer 2; when the left end of the support plate 1 abuts against the lower surface of the pressing block 7, The boom 6-7 continues to pull the support plate 1 upward, and the support plate 1 rotates with the contact portion of the left end and the pressing block 7 as a fulcrum, that is, the right end of the support plate 1 is lifted up until the support plate 1 is in a horizontal position. The silicon wafer 2 in the flower basket 3 is separated from the liquid in the cleaning tank 9;
花篮3随支撑板1一起倾斜时，硅片2的正面及背面与水平面逐渐发生倾斜；When the flower basket 3 is tilted together with the support plate 1, the front and back surfaces of the silicon wafer 2 are gradually inclined with the horizontal plane;
通过首先将支撑板1的左端上抬，然后再将支撑板1的右端上抬，实现支撑板1上花篮3中的硅片2倾斜式出水，可降低硅片2的出水速度，同时，硅片2倾斜后，硅片2上端面和下端面的水可以沿着倾斜面流下，实现硅片2和水的快速分离。再次采用本设计，对花篮3的脱水效果也非常好，在倾斜状态下，水极易从花篮3上进行脱离，使得硅片2从清洗槽9中脱离时，具有较好的脱水效果，便于硅片2后道的烘干，将清洗槽9中的水可采用温水，从而减小水在硅片2上的张力。By first lifting the left end of the support plate 1 and then lifting the right end of the support plate 1 to realize the inclined water discharge of the silicon wafer 2 in the flower basket 3 on the support plate 1, the water discharge speed of the silicon wafer 2 can be reduced, and at the same time, silicon After the sheet 2 is tilted, the water on the upper end surface and the lower end surface of the silicon wafer 2 can flow down the inclined surface, thereby achieving rapid separation of the silicon wafer 2 and water. By adopting this design again, the dehydration effect of the flower basket 3 is also very good. In the inclined state, the water is easily detached from the flower basket 3, so that when the silicon wafer 2 is detached from the cleaning tank 9, it has a good dehydration effect and is convenient. After the drying of the silicon wafer 2, the water in the cleaning tank 9 can be heated to reduce the tension of the water on the silicon wafer 2.
上述依据本发明的理想实施例为启示，通过上述的说明内容，相关工作人员完全可以在不偏离本项发明技术思想的范围内，进行多样的变更以及修改。本项发明的技术性范围并不局限于说明书上的内容，必须要根据权利要求范围来确定其技术性范围。The above-described embodiments of the present invention are intended to be variously modified and modified by those skilled in the art without departing from the scope of the present invention. The technical scope of the present invention is not limited to the contents of the specification, and the technical scope thereof must be determined according to the scope of the claims.

Claims (4)

  1. 一种慢提拉脱水设备，其特征在于：该脱水设置包括：A slow pull dewatering device, characterized in that the dehydration setting comprises:
    支撑板(1)，用于放置装有硅片(2)的花篮(3)；a support plate (1) for placing a flower basket (3) equipped with a silicon wafer (2);
    活动板(4)，铰接在支撑板(1)的左端，所述活动板(4)与支撑板(1)之间的铰接处形成铰支点，所述支撑板(1)左端端面与铰支点之间的距离小于所述支撑板(1)右端端面与铰支点之间的距离；a movable plate (4) hinged at a left end of the support plate (1), a hinge point formed between the movable plate (4) and the support plate (1), the left end face and the hinge point of the support plate (1) The distance between them is smaller than the distance between the end surface of the right end of the support plate (1) and the hinge point;
    固定板(5)，所述固定板(5)固定在支撑板(1)的右端；a fixing plate (5), the fixing plate (5) being fixed at a right end of the support plate (1);
    升降机构(6)，所述升降机构(6)的输出端与活动板(4)传动连接，所述升降机构(6)用于带动活动板(4)上升或下降；a lifting mechanism (6), the output end of the lifting mechanism (6) is drivingly connected to the movable plate (4), and the lifting mechanism (6) is used for driving the movable plate (4) to rise or fall;
    以及压块(7)，所述压块(7)固定在升降机构(6)上，所述压块(7)位于活动板(4)的左侧，所述支撑板(1)位于压块(7)下方。And a pressing block (7) fixed to the lifting mechanism (6), the pressing block (7) being located on the left side of the movable plate (4), the supporting plate (1) being located at the pressing block (7) Below.
  2. 根据权利要求1所述的慢提拉脱水设备，其特征在于：所述活动板(4)与支撑板(1)之间通过销轴(8)转动连接。The slow-drawing dewatering apparatus according to claim 1, characterized in that the movable plate (4) and the support plate (1) are rotatably connected by a pin (8).
  3. 根据权利要求1所述的慢提拉脱水设备，其特征在于：所述升降机构(6)包括基座(6-1)、立板(6-2)、电机(6-3)及丝杠(6-4)，所述立板(6-2)固定在基座(6-1)上，所述电机(6-3)固定在立板(6-2)上，所述丝杠(6-4)与电机(6-3)的输出端固定连接，所述丝杠(6-4)上螺纹传动连接有滑座(6-5)，所述滑座(6-5)与立板(6-2)滑动连接，所述滑座(6-5)上固定有横杆(6-6)，所述横杆(6-6)上固定有吊杆(6-7)，所述吊杆(6-7)的底端与活动板(4)固定连接，所述压块(7)固定在基座(6-1)上。The slow-drawing dewatering apparatus according to claim 1, wherein said lifting mechanism (6) comprises a base (6-1), a vertical plate (6-2), a motor (6-3), and a lead screw. (6-4), the vertical plate (6-2) is fixed on the base (6-1), and the motor (6-3) is fixed on the vertical plate (6-2), the lead screw ( 6-4) fixedly connected to the output end of the motor (6-3), the screw (6-4) is screwed to the sliding seat (6-5), and the sliding seat (6-5) is opposite to the vertical a plate (6-2) is slidably connected, a crossbar (6-6) is fixed on the sliding seat (6-5), and a boom (6-7) is fixed on the crossbar (6-6). The bottom end of the boom (6-7) is fixedly connected to the movable plate (4), and the pressing block (7) is fixed to the base (6-1).
  4. 根据权利要求3所述的慢提拉脱水设备，其特征在于：所述立板(6-2)上设置有与丝杠(6-4)平行的导轨(6-8)，所述导轨(6-8)上滑动设置有导向块(6-9)，所述滑座(6-5)固定在导向块(6-9)上。The slow-drawing dewatering apparatus according to claim 3, characterized in that: the vertical plate (6-2) is provided with a guide rail (6-8) parallel to the lead screw (6-4), the guide rail ( 6-8) The upper slide is provided with a guide block (6-9) which is fixed to the guide block (6-9).
PCT/CN2018/091384 2017-11-10 2018-06-15 Slowly-lifting water removing device WO2019091113A1 (en)

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CN107681023B (en) * 2017-11-10 2023-12-01 常州亿晶光电科技有限公司 Slow lifting dewatering equipment
CN110211904A (en) * 2019-06-28 2019-09-06 阜宁协鑫光伏科技有限公司 Slow pulling apparatus and silicon wafer cleaner
CN110752263B (en) * 2019-11-19 2021-08-13 晶海洋半导体材料（东海）有限公司 Pulling method and device for single crystal texturing
CN111341856A (en) * 2020-02-28 2020-06-26 通威太阳能(眉山)有限公司 Dewatering and drying method for texturing
CN217847907U (en) * 2022-06-14 2022-11-18 天津市环欧新能源技术有限公司 Slowly, carry and draw control system and be equipped with this control system's cleaning machine

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