WO2019051975A1 - 一种紫外辐照装置 - Google Patents

一种紫外辐照装置 Download PDF

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Publication number
WO2019051975A1
WO2019051975A1 PCT/CN2017/110194 CN2017110194W WO2019051975A1 WO 2019051975 A1 WO2019051975 A1 WO 2019051975A1 CN 2017110194 W CN2017110194 W CN 2017110194W WO 2019051975 A1 WO2019051975 A1 WO 2019051975A1
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WO
WIPO (PCT)
Prior art keywords
ultraviolet
chamber
ultraviolet irradiation
irradiation apparatus
reflection structure
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PCT/CN2017/110194
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English (en)
French (fr)
Inventor
史婷
Original Assignee
深圳市华星光电半导体显示技术有限公司
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Application filed by 深圳市华星光电半导体显示技术有限公司 filed Critical 深圳市华星光电半导体显示技术有限公司
Priority to US15/577,026 priority Critical patent/US20190080812A1/en
Publication of WO2019051975A1 publication Critical patent/WO2019051975A1/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation

Definitions

  • the invention relates to the field of ultraviolet light technology, in particular to an ultraviolet irradiation device.
  • Ultraviolet light cleaning technology utilizes the photosensitive oxidation of organic compounds to remove organic substances adhering to the surface of the material.
  • the surface of the material after light cleaning can achieve atomic cleanliness.
  • it can greatly improve the surface wettability of the substrate and enhance the adhesion of the surface of the substrate;
  • the density of integrated circuits is getting higher and higher, the crystal lattice is becoming more and more dense, and the surface cleanliness is required to be higher and higher.
  • semiconductor production the silicon wafer is coated with a protective film and the aluminum evaporation film is light-cleaned to improve adhesion and prevent pinholes and cracks. After the optical glass is cleaned by ultraviolet light, the coating quality is better.
  • UV light is also used in radiation curing.
  • Radiation curing is the use of electromagnetic radiation (such as ultraviolet UV or electron beam EB irradiation coating) to produce radiation polymerization, radiation crosslinking and other reactions.
  • electromagnetic radiation such as ultraviolet UV or electron beam EB irradiation coating
  • the system contains no solvent or a very small amount of solvent. After irradiation, the liquid film is almost 100% solidified, so VOC (volatile organic compound) emissions are very low.
  • the prior art ultraviolet irradiation device has a phenomenon of uneven ultraviolet radiation, which is affected by the uneven distribution of ultraviolet light in the chamber, thereby affecting the ultraviolet cleaning performance and the ultraviolet radiation curing effect, in a large size.
  • the production process is more obvious.
  • the invention provides an ultraviolet irradiation device, which can increase the uniformity of ultraviolet irradiation, and can effectively improve the ultraviolet cleaning effect or the ultraviolet curing effect.
  • the invention provides an ultraviolet irradiation device comprising:
  • An ultraviolet lamp for emitting ultraviolet light disposed opposite the sample stage, at the top or bottom of the chamber;
  • a specular reflection structure disposed in the chamber for reflecting ultraviolet light emitted by the ultraviolet lamp
  • the specular reflection structure comprises an ordered arrangement of protrusions or depressions for reflecting the ultraviolet light irradiated to the specular reflection structure in various directions; the specular reflection structure is arranged in the chamber Position, the predetermined position of the chamber includes at least one of a circumference, a top, and a bottom of the chamber.
  • the projections or depressions are distributed throughout the specularly reflective structure.
  • the protrusion or the recess has a conical shape, a pyramid shape, a prismatic shape, a pointed convex shape, or a circular convex shape.
  • the surface of the projection or depression is a mirror surface.
  • the ultraviolet lamp illumination range is greater than the sample stage range.
  • the chamber comprises at least two of the sample stages, at least two of which are located on the same side of the top or bottom of the chamber for carrying at least one of the substrates.
  • the ultraviolet irradiation device includes at least two of the ultraviolet lamps, and at least two of the ultraviolet lamps are symmetrically distributed at the top or the bottom of the chamber.
  • the UV lamp is an ultraviolet lamp panel that covers the entire top or bottom of the chamber.
  • the sample stage is used for picking up and dropping the substrate by raising or lowering.
  • the invention also provides an ultraviolet irradiation device comprising:
  • An ultraviolet lamp for emitting ultraviolet light disposed opposite the sample stage, at the top or bottom of the chamber;
  • a specular reflection structure disposed in the chamber for reflecting ultraviolet light emitted by the ultraviolet lamp
  • the specular reflection structure comprises an ordered arrangement of protrusions or depressions for reflecting the ultraviolet light irradiated to the specular reflection structure in various directions.
  • the projections or depressions are distributed throughout the specularly reflective structure.
  • the protrusion or the recess has a conical shape, a pyramid shape, a prismatic shape, a pointed convex shape, or a circular convex shape.
  • the surface of the projection or depression is a mirror surface.
  • the ultraviolet lamp illumination range is greater than the sample stage range.
  • the chamber comprises at least two of the sample stages, at least two of which are located on the same side of the top or bottom of the chamber for carrying at least one of the substrates.
  • the ultraviolet irradiation device includes at least two of the ultraviolet lamps, and at least two of the ultraviolet lamps are symmetrically distributed at the top or the bottom of the chamber.
  • the UV lamp is an ultraviolet lamp panel that covers the entire top or bottom of the chamber.
  • the sample stage is used for picking up and dropping the substrate by raising or lowering.
  • the ultraviolet irradiation device of the present invention has a specular reflection structure disposed around the device, and the light is irradiated to the convex or concave portion of the specular reflection structure. Reflecting in different directions, thereby increasing the uniformity of ultraviolet irradiation, effectively improving the ultraviolet cleaning effect or the ultraviolet curing effect, improving the uniformity of the ultraviolet cleaning or the ultraviolet curing, and the improvement effect in the production process of the large-sized display panel is more obvious.
  • FIG. 1 is a schematic view of an ultraviolet irradiation device according to Embodiment 1 of the present invention.
  • FIG. 2 is a schematic diagram of an ultraviolet irradiation apparatus according to Embodiment 2 of the present invention.
  • FIG. 3 is a schematic diagram of another specular reflection structure according to Embodiment 3 of the present invention.
  • the invention is directed to the prior art ultraviolet irradiation device, which has the phenomenon of uneven ultraviolet radiation, and the technical problem of affecting the ultraviolet cleaning performance and the ultraviolet radiation curing effect due to the uneven distribution of the ultraviolet light in the chamber, the present embodiment
  • the example can solve this defect.
  • FIG. 1 is a schematic diagram of an ultraviolet irradiation apparatus according to Embodiment 1 of the present invention.
  • the ultraviolet irradiation apparatus includes a chamber 101 for accommodating a substrate, and a sample stage 102 for carrying the substrate. Located at the bottom of the chamber 101, there is a gap between the periphery of the sample stage 102 and the chamber 101; an ultraviolet lamp 103 for emitting ultraviolet light, disposed opposite to the sample stage 102, located in the chamber 101
  • the ultraviolet irradiation device includes at least two ultraviolet lamps 103, at least two of the ultraviolet lamps 103 are symmetrically distributed at the top of the chamber 101, and the ultraviolet lamp 103 is irradiated in a range larger than the sample table 102;
  • the ultraviolet lamp 103 may also be an ultraviolet lamp panel covering the entire top of the chamber 101; and a specular reflection structure 104 disposed in the chamber 101 for reflecting the ultraviolet lamp 103 emission The ultraviolet light; wherein the specular reflection structure 104 includes an ordered array of protrusions 10
  • the protrusions 1041 or the recesses are distributed throughout the specular reflection structure 104; the protrusions 1041 or the recesses may have a shape such as a cone shape, a pyramid shape, a prism shape, a convex shape, or a circular convex shape.
  • the protrusion 1041 of the embodiment has a semi-arc shape, and the surface of the protrusion 1041 is a mirror surface.
  • the chamber 101 includes at least two of the sample stages 102, and at least two of the sample stages 102 are located at the bottom of the chamber 101 for carrying at least one of the substrates.
  • the bottom of the sample stage 102 has adjustment means for picking up and dropping the substrate by raising or lowering.
  • the sample stage 102 is provided with a card slot for fixing the substrate, and the number of the card slots can be set according to requirements, so that a plurality of the substrates can be placed at the same time.
  • the sample stage 102 may be provided with a clamping portion for clamping the upper and lower ends of the substrate for fixing the substrate, wherein the lower clamping portion is horizontally movable along the sample stage 102, and is clamped upward.
  • the portion is parallel and opposite to the lower clamping portion, and the upper clamping portion and the lower clamping portion are reciprocable, whereby the substrate clamped can be at an angle to the sample stage 102
  • Both the front side and the back side of the substrate can face the ultraviolet lamp 103, and both of them can be illuminated by the ultraviolet lamp 103.
  • the material of the specular reflection structure 104 is a material having high reflection performance, which can efficiently reflect the ultraviolet light back into the chamber 101, thereby improving the utilization of light; the ultraviolet light is irradiated to the protrusion 1041 or the recessed surface, since the surface of the protrusion 1041 or the recess is not in the same plane as the surface of the non-convex or non-recessed area of the specular reflection structure 104, in other words, at an angle, so the illumination
  • the ultraviolet light to the specular reflection structure 104 is reflected toward various directions, thereby improving the uniformity of the ultraviolet light irradiation in the chamber 101, and improving the light radiation in the chamber 101. According to the phenomenon of inhomogeneity.
  • FIG. 2 is a schematic diagram of an ultraviolet irradiation apparatus according to Embodiment 2 of the present invention.
  • the ultraviolet irradiation apparatus includes a chamber 201 for accommodating a substrate, and a sample stage 202 for carrying the substrate. Located at the top of the chamber 201, there is a gap between the periphery of the sample stage 202 and the chamber 201; an ultraviolet lamp 203 for emitting ultraviolet light, disposed opposite to the sample stage 202, located in the chamber 201
  • the ultraviolet irradiation device includes at least two ultraviolet lamps 203, at least two of the ultraviolet lamps 203 are symmetrically distributed at the bottom of the chamber 201, and the ultraviolet lamp 203 has an irradiation range greater than the range of the sample stage 202;
  • the specular reflection structure 204 is disposed in the chamber 201 for reflecting the ultraviolet light emitted by the ultraviolet lamp 203; wherein the specular reflection structure 204 comprises an ordered array of protrusions 2041, which may also be recesses.
  • the substrate can be attached to the surface of the sample stage 202.
  • the sample stage 202 is provided with a card slot or a buckle for fixing the substrate.
  • the sample stage 202 is disposed in the chamber 201. The top is convenient for handling the substrate.
  • FIG. 3 is a schematic diagram of another specular reflection structure according to Embodiment 3 of the present invention.
  • the specular reflection structure 301 includes a planar area and a non-planar area, where the non-planar area is a protrusion 302 or a recess.
  • An array of protrusions 302 is distributed on the surface of the specular reflection structure 301.
  • the gap is a plane of a predetermined width, and each surface of the protrusion 302 and the plane
  • the protrusions 302 of the embodiment are triangular pyramids, and the surfaces of the protrusions 302 are mirror surfaces, which can reflect ultraviolet light in various directions.
  • the protrusions 302 or depressions are not specifically defined in shape, and the ultraviolet light can be reflected to different directions as long as it is at an angle to the plane.
  • the principle of ultraviolet light cleaning technology is to use the photosensitive oxidation of organic compounds to remove the organic substances adhering to the surface of the material.
  • the surface of the material can not only achieve atomic cleanliness, but also The uniformity of the cleanliness of the material is also ensured, and since the distribution of the ultraviolet light in the device is relatively uniform, a good uniform cleanness can be ensured at all angles of the substrate.
  • it needs to be cleaned before coating photoresist, PI glue, oriented film, chrome film and color film.
  • the uniformity of light directly affects the effect of light cleaning.
  • the ultraviolet irradiation device of the present invention greatly improving the cleanliness and cleaning effect of the material, saving cleaning time.
  • the ultraviolet irradiation device of the present invention is also used in radiation curing. Irradiating the coating with ultraviolet light, part of the ultraviolet light is reflected by the specular reflection structure disposed at a predetermined position of the device, and the ultraviolet light is reflected to different directions, thereby increasing the uniformity of ultraviolet irradiation, thereby making the coating
  • the layer cures quickly and ensures uniformity of cure of the coating.
  • the ultraviolet irradiation device of the present invention has a specular reflection structure disposed around the device, and reflects light in various directions after the light is irradiated to the convex or concave portion of the specular reflection structure, thereby increasing
  • the uniformity of ultraviolet irradiation effectively improves the ultraviolet cleaning effect or the ultraviolet curing effect, and improves the uniformity of ultraviolet cleaning or ultraviolet curing, and the improvement effect in the production process of the large-sized display panel is more obvious.

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  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
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  • Oral & Maxillofacial Surgery (AREA)
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Abstract

一种紫外辐照装置，包括：腔室（101），用于容置基材；样品台（102），用于承载所述基材，位于所述腔室（101）顶部或底部；紫外灯（103），与所述样品台（102）相对设置；以及镜面反射结构（104），设置在所述腔室（101）内；其中，所述镜面反射结构（104）包括有序排列的凸起（1041）或凹陷，用于将照射到所述镜面反射结构（104）的所述紫外光朝各个方向反射。

Description

一种紫外辐照装置 技术领域
本发明涉及紫外光技术领域，尤其涉及一种紫外辐照装置。
 背景技术
紫外光清洗技术是利用有机化合物的光敏氧化作用达到去除黏附在材料表面上的有机物质，经过光清洗后的材料表面可以达到原子清洁度。在LCD、OLED生产中，在涂光刻胶、PI胶、定向膜、铬膜、色膜前经过光清洗，可以极大的提高基体表面润湿性，增强基体表面的粘合力；大规模集成电路的密度越来越高，晶格的微细化越来越密，要求表面的洁净度越来越高。在半导体生产中，硅晶片涂保护膜、铝蒸发膜前进行光清洗，可以提高粘合力，防止针孔、裂缝的发生。光学玻璃经过紫外光清洗后，镀膜质量更好。
此外，紫外光也用于辐射固化中。辐射固化是利用电磁辐射（如紫外线UV或电子束EB照射涂层），产生辐射聚合、辐射交联等反应。迅速将低分子量物质转变成高分子量产物的化学过程，体系中不含溶剂或含极少量溶剂，辐照后液膜几乎100%固化，因而VOC（挥发性有机化合物）排放量很低。
综上所述，现有技术的紫外辐照装置，存在着紫外辐照不均匀的现象，由于紫外光在腔室中分布的不均匀，从而影响紫外清洗性能与紫外辐射固化效果，在大尺寸生产过程中更为明显。
 技术问题
本发明提供一种紫外辐照装置，能够增加紫外辐照的均匀性，可有效提高紫外清洗作用或紫外固化效果。
 技术解决方案
为解决上述问题，本发明提供的技术方案如下：
本发明提供一种紫外辐照装置，包括：
腔室，用于容置基材；
样品台，用于承载所述基材，位于所述腔室顶部或底部；
紫外灯，用于发射紫外光，与所述样品台相对设置，位于所述腔室顶部或底部；以及
镜面反射结构，设置在所述腔室内，用于反射所述紫外灯发射的紫外光；
其中，所述镜面反射结构包括有序排列的凸起或凹陷，用于将照射到所述镜面反射结构的所述紫外光朝各个方向反射；所述镜面反射结构设置在所述腔室的预定位置，所述腔室的预定位置至少包括所述腔室的四周、顶部、底部中的一者。
根据本发明一优选实施例，所述凸起或凹陷分布于整个所述镜面反射结构。
根据本发明一优选实施例，所述凸起或凹陷呈圆锥状、棱锥状、棱台状、尖凸状或者圆凸状等。
根据本发明一优选实施例，所述凸起或凹陷的表面为镜面。
根据本发明一优选实施例，所述紫外灯照射范围大于所述样品台范围。
根据本发明一优选实施例，所述腔室至少包括两所述样品台，至少两所述样品台位于所述腔室顶部或底部同侧，用于承载至少一个所述基材。
根据本发明一优选实施例，所述紫外辐照装置至少包括两所述紫外灯，至少两所述紫外灯中心对称分布于所述腔室顶部或底部。
根据本发明一优选实施例，所述紫外灯为紫外灯板，所述紫外灯板覆盖整个所述腔室顶部或底部。
根据本发明一优选实施例，所述样品台通过上升或下降用以取放所述基材。
本发明还提供一种紫外辐照装置，包括：
腔室，用于容置基材；
样品台，用于承载所述基材，位于所述腔室顶部或底部；
紫外灯，用于发射紫外光，与所述样品台相对设置，位于所述腔室顶部或底部；以及
镜面反射结构，设置在所述腔室内，用于反射所述紫外灯发射的紫外光；
其中，所述镜面反射结构包括有序排列的凸起或凹陷，用于将照射到所述镜面反射结构的所述紫外光朝各个方向反射。
根据本发明一优选实施例，所述凸起或凹陷分布于整个所述镜面反射结构。
根据本发明一优选实施例，所述凸起或凹陷呈圆锥状、棱锥状、棱台状、尖凸状或者圆凸状等。
根据本发明一优选实施例，所述凸起或凹陷的表面为镜面。
根据本发明一优选实施例，所述紫外灯照射范围大于所述样品台范围。
根据本发明一优选实施例，所述腔室至少包括两所述样品台，至少两所述样品台位于所述腔室顶部或底部同侧，用于承载至少一个所述基材。
根据本发明一优选实施例，所述紫外辐照装置至少包括两所述紫外灯，至少两所述紫外灯中心对称分布于所述腔室顶部或底部。
根据本发明一优选实施例，所述紫外灯为紫外灯板，所述紫外灯板覆盖整个所述腔室顶部或底部。
根据本发明一优选实施例，所述样品台通过上升或下降用以取放所述基材。
 有益效果
本发明的有益效果为：相较于现有的紫外辐照装置，本发明的紫外辐照装置，通过在装置四周设置镜面反射结构，在光线照射到镜面反射结构的凸起或凹陷后会朝各个不同方向反射，从而增加紫外辐照的均匀性，有效提高紫外清洗作用或紫外固化效果，改善了紫外清洗或紫外固化的均匀性，在大尺寸显示面板生产过程中的改善作用更为明显。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例一提供的紫外辐照装置示意图；
图2为本发明实施例二提供的紫外辐照装置示意图；
图3为本发明实施例三提供的另一种镜面反射结构示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本发明针对现有技术的紫外辐照装置，存在着紫外辐照不均匀的现象，由于紫外光在腔室中分布的不均匀，从而影响紫外清洗性能与紫外辐射固化效果的技术问题，本实施例能够解决该缺陷。
如图1所示，为本发明实施例一提供的紫外辐照装置示意图，所述紫外辐照装置包括：腔室101，用于容置基材；样品台102，用于承载所述基材，位于所述腔室101底部，所述样品台102的四周与所述腔室101存在间隙；紫外灯103，用于发射紫外光，与所述样品台102相对设置，位于所述腔室101顶部，所述紫外辐照装置至少包括两所述紫外灯103，至少两所述紫外灯103中心对称分布于所述腔室101顶部，所述紫外灯103照射范围大于所述样品台102范围；所述紫外灯103还可以为紫外灯板，所述紫外灯板覆盖整个所述腔室101顶部；以及镜面反射结构104，设置在所述腔室101内，用于反射所述紫外灯103发射的紫外光；其中，所述镜面反射结构104包括有序排列的凸起1041，或者是凹陷，所述凸起1041或所述凹陷用于将照射到所述镜面反射结构104的所述紫外光朝各个方向反射；所述镜面反射结构104设置在所述腔室101的预定位置，所述腔室101的预定位置至少包括所述腔室101的四周、顶部、底部中的一者。所述凸起1041或所述凹陷分布于整个所述镜面反射结构104；所述凸起1041或所述凹陷可以呈圆锥状、棱锥状、棱台状、尖凸状或者圆凸状等形状。本实施例所述凸起1041为半圆弧状，且所述凸起1041的表面为镜面。
所述腔室101至少包括两所述样品台102，至少两所述样品台102位于所述腔室101底部，用于承载至少一个所述基材。所述样品台102底部有调节装置，通过上升或下降用以取放所述基材。所述样品台102上设置有卡槽，用以固定所述基材，所述卡槽数量可依据需求进行设定，可实现同时放置多个所述基材。或者所述样品台102上也可设置夹持部，夹持所述基材上下两端用以固定所述基材，其中，下夹持部可沿所述样品台102水平移动，上夹持部与所述下夹持部平行且相向运动，所述上夹持部与所述下夹持部可往复运动，由此被夹持的所述基材可与所述样品台102呈一定角度，所述基材的正面与背面均能朝向所述紫外灯103，均可被所述紫外灯103照射。
所述镜面反射结构104的材料为具有高反射性能的材料，能将所述紫外光高效的反射回所述腔室101内，提高了光的利用率；所述紫外光照射到所述凸起1041或者所述凹陷表面时，由于所述凸起1041或所述凹陷的表面与所述镜面反射结构104的非凸起或非凹陷区域的表面不在同一平面上，换言之即呈一定角度，所以照射到所述镜面反射结构104的所述紫外光会朝向各个方向反射，由此，提高了所述腔室101内的所述紫外光辐照的均匀性，改善了所述腔室101内光线辐照不均一的现象。
如图2所示，为本发明实施例二提供的紫外辐照装置示意图，所述紫外辐照装置包括：腔室201，用于容置基材；样品台202，用于承载所述基材，位于所述腔室201顶部，所述样品台202的四周与所述腔室201存在间隙；紫外灯203，用于发射紫外光，与所述样品台202相对设置，位于所述腔室201底部，所述紫外辐照装置至少包括两所述紫外灯203，至少两所述紫外灯203中心对称分布于所述腔室201底部，所述紫外灯203照射范围大于所述样品台202范围；以及镜面反射结构204，设置在所述腔室201内，用于反射所述紫外灯203发射的紫外光；其中，所述镜面反射结构204包括有序排列的凸起2041，也可以为凹陷，所述凸起2041用于将照射到所述镜面反射结构204的所述紫外光朝各个方向反射，使所述腔室201内的所述紫外光能够辐照均一。
其中，所述基材可贴设于所述样品台202表面，所述样品台202设置有卡槽或卡扣，用以固定所述基材；所述样品台202设置于所述腔室201顶部，便于取放所述基材。
如图3所示，为本发明实施例三提供的另一种镜面反射结构示意图，所述镜面反射结构301包括平面区域与非平面区域，所述非平面区域处为凸起302或凹陷，所述凸起302阵列分布于所述镜面反射结构301的表面，相邻两所述凸起302间存在间隙，所述间隙处为预定宽度的平面，所述凸起302的各个表面与所述平面呈一定角度，本实施例所述凸起302为三棱锥，所述凸起302的各个表面均为镜面，能够很好的将紫外光反射到各个方向。在此，对所述凸起302或凹陷不做具体形状上的限定，只要与所述平面呈一定角度，能将所述紫外光反射到不同方向即可。
紫外光清洗技术的原理是利用有机化合物的光敏氧化作用达到去除黏附在材料表面上的有机物质，采用本发明的紫外辐照装置进行紫外光清洗操作后，材料表面不仅可以达到原子清洁度，而且还保证了材料清洁程度的均一性，由于紫外光在装置中的分布比较均一，所以在基材的各个角度均能保证良好均一的清洁度。在LCD、OLED生产中，在涂光刻胶、PI胶、定向膜、铬膜、色膜前都需要经过光清洗，光的均一性直接影响到光清洗的效果，本发明的紫外辐照装置，大大提升了材料的清洁度及清洁效果，节省了清洁时间。
此外，本发明的紫外辐照装置也用于辐射固化中。利用紫外光照射涂层，部分所述紫外光通过在所述装置预定位置设置的镜面反射结构，将所述紫外光反射到各个不同方向，增加了紫外辐照的均匀性，从而使所述涂层快速固化，并保证所述涂层固化的均一性。
相较于现有的紫外辐照装置，本发明的紫外辐照装置，通过在装置四周设置镜面反射结构，在光线照射到镜面反射结构的凸起或凹陷后会朝各个不同方向反射，从而增加紫外辐照的均匀性，有效提高紫外清洗作用或紫外固化效果，改善了紫外清洗或紫外固化的均匀性，在大尺寸显示面板生产过程中的改善作用更为明显。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (18)

  1. 一种紫外辐照装置，其包括：
    腔室，用于容置基材；
    样品台，用于承载所述基材，位于所述腔室顶部或底部；
    紫外灯，用于发射紫外光，与所述样品台相对设置，位于所述腔室顶部或底部；以及
    镜面反射结构，设置在所述腔室内，用于反射所述紫外灯发射的紫外光；
    其中，所述镜面反射结构包括有序排列的凸起或凹陷，用于将照射到所述镜面反射结构的所述紫外光朝各个方向反射；所述镜面反射结构设置在所述腔室的预定位置，所述腔室的预定位置至少包括所述腔室的四周、顶部、底部中的一者。
  2. 根据权利要求1所述的紫外辐照装置，其中，所述凸起或凹陷分布于整个所述镜面反射结构。
  3. 根据权利要求2所述的紫外辐照装置，其中，所述凸起或凹陷呈圆锥状、棱锥状、棱台状、尖凸状或者圆凸状等。
  4. 根据权利要求1所述的紫外辐照装置，其中，所述凸起或凹陷的表面为镜面。
  5. 根据权利要求1所述的紫外辐照装置，其中，所述紫外灯照射范围大于所述样品台范围。
  6. 根据权利要求1所述的紫外辐照装置，其中，所述腔室至少包括两所述样品台，至少两所述样品台位于所述腔室顶部或底部同侧，用于承载至少一个所述基材。
  7. 根据权利要求1所述的紫外辐照装置，其中，所述紫外辐照装置至少包括两所述紫外灯，至少两所述紫外灯中心对称分布于所述腔室顶部或底部。
  8. 根据权利要求1所述的紫外辐照装置，其中，所述紫外灯为紫外灯板，所述紫外灯板覆盖整个所述腔室顶部或底部。
  9. 根据权利要求1所述的紫外辐照装置，其中，所述样品台通过上升或下降用以取放所述基材。
  10. 一种紫外辐照装置，其包括：
    腔室，用于容置基材；
    样品台，用于承载所述基材，位于所述腔室顶部或底部；
    紫外灯，用于发射紫外光，与所述样品台相对设置，位于所述腔室顶部或底部；以及
    镜面反射结构，设置在所述腔室内，用于反射所述紫外灯发射的紫外光；
    其中，所述镜面反射结构包括有序排列的凸起或凹陷，用于将照射到所述镜面反射结构的所述紫外光朝各个方向反射。
  11. 根据权利要求1所述的紫外辐照装置，其中，所述凸起或凹陷分布于整个所述镜面反射结构。
  12. 根据权利要求11所述的紫外辐照装置，其中，所述凸起或凹陷呈圆锥状、棱锥状、棱台状、尖凸状或者圆凸状等。
  13. 根据权利要求1所述的紫外辐照装置，其中，所述凸起或凹陷的表面为镜面。
  14. 根据权利要求1所述的紫外辐照装置，其中，所述紫外灯照射范围大于所述样品台范围。
  15. 根据权利要求1所述的紫外辐照装置，其中，所述腔室至少包括两所述样品台，至少两所述样品台位于所述腔室顶部或底部同侧，用于承载至少一个所述基材。
  16. 根据权利要求1所述的紫外辐照装置，其中，所述紫外辐照装置至少包括两所述紫外灯，至少两所述紫外灯中心对称分布于所述腔室顶部或底部。
  17. 根据权利要求1所述的紫外辐照装置，其中，所述紫外灯为紫外灯板，所述紫外灯板覆盖整个所述腔室顶部或底部。
  18. 根据权利要求1所述的紫外辐照装置，其中，所述样品台通过上升或下降用以取放所述基材。
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