WO2019000577A1 - 内嵌式触摸屏 - Google Patents

内嵌式触摸屏 Download PDF

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Publication number
WO2019000577A1
WO2019000577A1 PCT/CN2017/096387 CN2017096387W WO2019000577A1 WO 2019000577 A1 WO2019000577 A1 WO 2019000577A1 CN 2017096387 W CN2017096387 W CN 2017096387W WO 2019000577 A1 WO2019000577 A1 WO 2019000577A1
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WO
WIPO (PCT)
Prior art keywords
common electrode
layer
insulating layer
sensing electrode
lines
Prior art date
Application number
PCT/CN2017/096387
Other languages
English (en)
French (fr)
Inventor
黄耀立
贺兴龙
Original Assignee
武汉华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武汉华星光电技术有限公司 filed Critical 武汉华星光电技术有限公司
Priority to EP17915590.8A priority Critical patent/EP3647864B1/en
Priority to JP2019568224A priority patent/JP2020523637A/ja
Priority to US15/572,806 priority patent/US10331253B2/en
Priority to KR1020207002606A priority patent/KR102290684B1/ko
Publication of WO2019000577A1 publication Critical patent/WO2019000577A1/zh

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
    • G02F1/133507—Films for enhancing the luminance
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line

Definitions

  • the present invention relates to the field of liquid crystal display technologies, and in particular, to an in-cell touch panel.
  • touch screen is the most simple, convenient and natural way of human-computer interaction.
  • Liquid crystal Liquid Crystal
  • Due to its good electrical controllability, is increasingly used in display panels; therefore, touch screens are usually integrated into liquid crystal display panels to form various electronic products, such as mobile phones, notebook computers, MP3/MP4, and the like.
  • a conventional In-cell achieves a touch effect by sharing and displaying a common common electrode.
  • the prior art In-cell The structure of the structure includes a color film substrate and an array substrate.
  • the color film substrate includes a first glass substrate 101, a color resist layer 102, and a black matrix 103.
  • the array substrate includes a second glass substrate 104, a buffer layer 105, and a gate insulating layer which are sequentially stacked.
  • the layer is patterned into a plurality of electrode plates 113, and a gap between the common electrode plates 113 is disposed directly under the black matrix 103. There is no electrode layer between the common electrode plate 113 and the common electrode plate 113, so there is no electric field in the region corresponding to the gap between adjacent electrode plates, so the liquid crystal flip direction here is inconsistent with the rest, resulting in display brightness and the rest here.
  • the occlusion area of the array matrix corresponding to the black matrix 103 has no common electrode, the corresponding liquid crystal molecules are reversed abnormally, and the brightness of the area is different from other areas, thereby making the liquid crystal
  • the display panel displays bright lines or dark lines when displayed at a large viewing angle, which affects the viewing effect.
  • the present invention provides an in-cell touch panel capable of normally flipping liquid crystal molecules corresponding to a black matrix occlusion region, thereby enabling the region to have a normal display effect, to solve the prior art in-cell touch panel, since the array substrate corresponds to black
  • the occlusion area of the matrix has no common electrode, which causes the liquid crystal molecules corresponding to the surface to be reversed abnormally, which causes the brightness of the area to be different from other areas, thereby causing the liquid crystal display panel to appear bright lines or dark lines when displaying at a large viewing angle, thereby affecting the viewing effect. technical problem.
  • the invention provides an in-cell touch screen, comprising:
  • a color filter substrate comprising a color resist layer and a black matrix
  • the black matrix comprises a plurality of horizontal light shielding strips for shielding scanning lines, and a plurality of vertical light shielding strips for shielding data lines;
  • An array substrate disposed opposite to the color filter substrate; the array substrate includes:
  • a first insulating layer is prepared on the surface of the gate insulating layer
  • a planarization layer is prepared on the surface of the first insulating layer
  • a common electrode layer is prepared on the surface of the planarization layer; the common electrode layer is patterned to form a plurality of common electrode plates arranged in an array, and horizontal gaps and vertical gaps are formed between adjacent common electrode plates. The horizontal gap is blocked by the horizontal light bar, and the vertical gap is blocked by the vertical light bar;
  • a second insulating layer is formed on the surface of the common electrode layer, and the second insulating layer is provided with a plurality of first metal vias and second metal vias; the second metal vias are closely attached to the The edge of the common electrode plate is set;
  • sensing electrode lines distributed on the surface of the second insulating layer, each of the sensing electrode lines being parallel to each other, wherein the sensing electrode line is connected to the common electrode plate through the first metal via;
  • a plurality of secondary sensing electrode lines are disposed on the surface of the second insulating layer, and the secondary sensing electrode lines are connected to the common electrode plate through the second metal via;
  • the secondary sensing electrode line and the sensing electrode line are parallel to each other; and one of the secondary sensing electrode lines is located between any of the vertical light shielding strips and the corresponding vertical gap.
  • a surface of the second insulating layer is prepared with a passivation layer, and a surface of the passivation layer is provided with a plurality of pixel electrodes arranged in an array, and the secondary sensing electrode line is formed with the pixel electrode.
  • the vertical gap between the two adjacent columns of the common electrode plates is correspondingly disposed with one of the secondary sensing electrode lines, and the secondary sensing electrode lines are connected to the two columns of the common electrode plate. Any of the common electrode plates.
  • the vertical gap between two adjacent columns of the common electrode plates corresponds to the plurality of segments of the secondary sensing electrode lines vertically spaced and spaced apart, and the adjacent two segments of the secondary sensing electrode lines
  • the spacing distance is the same as the width of the horizontal gap, and a section of the secondary sensing electrode line is connected to a common electrode plate on one side thereof.
  • the second metal via has a smaller aperture than the first metal via.
  • the invention provides an in-cell touch screen, comprising:
  • a color filter substrate comprising a color resist layer and a black matrix
  • the black matrix comprises a plurality of horizontal light shielding strips for shielding scanning lines, and a plurality of vertical light shielding strips for shielding data lines;
  • An array substrate disposed opposite to the color filter substrate; the array substrate includes:
  • a first insulating layer is prepared on the surface of the gate insulating layer
  • a planarization layer is prepared on the surface of the first insulating layer
  • a common electrode layer is prepared on the surface of the planarization layer; the common electrode layer is patterned to form a plurality of common electrode plates arranged in an array, and horizontal gaps and vertical gaps are formed between adjacent common electrode plates. The horizontal gap is blocked by the horizontal light bar, and the vertical gap is blocked by the vertical light bar;
  • a second insulating layer is formed on the surface of the common electrode layer, and the second insulating layer is provided with a plurality of first metal vias and second metal vias;
  • sensing electrode lines distributed on the surface of the second insulating layer, each of the sensing electrode lines being parallel to each other, wherein the sensing electrode line is connected to the common electrode plate through the first metal via;
  • a plurality of secondary sensing electrode lines are disposed on the surface of the second insulating layer, and the secondary sensing electrode lines are connected to the common electrode plate through the second metal via;
  • the secondary sensing electrode line and the sensing electrode line are parallel to each other; and one of the secondary sensing electrode lines is located between any of the vertical light shielding strips and the corresponding vertical gap.
  • a surface of the second insulating layer is prepared with a passivation layer, and a surface of the passivation layer is provided with a plurality of pixel electrodes arranged in an array, and the secondary sensing electrode line is formed with the pixel electrode.
  • the vertical gap between the two adjacent columns of the common electrode plates is correspondingly disposed with one of the secondary sensing electrode lines, and the secondary sensing electrode lines are connected to the two columns of the common electrode plate. Any of the common electrode plates.
  • the vertical gap between two adjacent columns of the common electrode plates corresponds to the plurality of segments of the secondary sensing electrode lines vertically spaced and spaced apart, and the adjacent two segments of the secondary sensing electrode lines
  • the spacing distance is the same as the width of the horizontal gap, and a section of the secondary sensing electrode line is connected to a common electrode plate on one side thereof.
  • the second metal via has a smaller aperture than the first metal via.
  • an in-cell touch panel including:
  • a color filter substrate comprising a color resist layer and a black matrix
  • the black matrix comprises a plurality of horizontal light shielding strips for shielding scanning lines, and a plurality of vertical light shielding strips for shielding data lines;
  • An array substrate disposed opposite to the color filter substrate; the array substrate includes:
  • a first insulating layer is prepared on the surface of the gate insulating layer
  • a planarization layer is prepared on the surface of the first insulating layer
  • a common electrode layer is prepared on the surface of the planarization layer; the common electrode layer is patterned to form a plurality of common electrode plates arranged in an array, and horizontal gaps and vertical gaps are formed between adjacent common electrode plates. The horizontal gap is blocked by the horizontal light bar, and the vertical gap is blocked by the vertical light bar;
  • a second insulating layer is formed on the surface of the common electrode layer, and a plurality of first metal vias are defined in the second insulating layer;
  • each of the sensing electrode lines is parallel to each other, and the sensing electrode line is connected to the common electrode plate through the first metal via;
  • a passivation layer is formed on the surface of the second insulating layer; a plurality of second metal vias are disposed through the passivation layer to the second insulating layer;
  • a transparent electrode layer is prepared on the surface of the passivation layer; the transparent electrode layer is patterned to form a plurality of pixel electrodes arranged in an array, and a gap is formed between adjacent two pixel electrodes;
  • a sub-pixel electrode is disposed between any of the vertical light-shielding strips and the corresponding vertical gap.
  • the sub-pixel electrode is located between two adjacent pixel electrodes, and the sub-pixel electrode and the pixel electrode on both sides thereof form an electric field for driving liquid crystal molecules to deflect.
  • the vertical gap between two adjacent columns of the common electrode plates is correspondingly disposed with a column of the sub-pixel electrodes, and the sub-pixel electrodes are connected to any of the two columns of the common electrode plates.
  • a common electrode plate is correspondingly disposed with a column of the sub-pixel electrodes, and the sub-pixel electrodes are connected to any of the two columns of the common electrode plates.
  • the pitch of two adjacent sub-pixel electrodes is equal to the width of the horizontal gap.
  • the second metal via has a smaller aperture than the first metal via.
  • the beneficial effects of the present invention are: compared to the in-cell touch screen of the prior art; the in-cell touch screen provided by the present invention, by arranging the metal at the position blocked by the black matrix, so that the liquid crystal molecules corresponding to the black matrix occlusion area are normally flipped Therefore, the area has a normal display effect; the in-cell touch panel of the prior art is solved. Since the array substrate has no common electrode corresponding to the occlusion area of the black matrix, the corresponding liquid crystal molecules are reversed abnormally, resulting in brightness of the area. Different from other areas, the liquid crystal display panel may appear bright line or dark line when displayed at a large viewing angle, which affects the technical problem of the viewing effect.
  • FIG. 1 is a structural diagram of a conventional in-cell touch screen film layer
  • FIG. 2 is a structural diagram of an in-cell touch panel film layer according to an embodiment of the present invention.
  • FIG 3 is a structural diagram of a film layer of an in-cell touch panel according to a second embodiment of the present invention.
  • the present invention is directed to the in-cell touch panel of the prior art. Since the array substrate has no common electrode corresponding to the occlusion region of the black matrix, the corresponding liquid crystal molecules are reversed abnormally, and the brightness of the region is different from other regions, so that the liquid crystal display panel is This embodiment can solve the drawback in that a bright line or a dark line appears when viewed from a large angle of view, which affects the technical effect of the viewing effect.
  • the in-cell touch panel provided by the present invention comprises: a color film substrate, an array substrate disposed opposite to the color film substrate, and a liquid crystal layer between the color film substrate and the array substrate.
  • the color filter substrate includes a color resist layer and a black matrix; the black matrix includes a plurality of horizontal light-shielding strips for shielding the scan lines, and a plurality of vertical light-shielding strips for shielding the data lines.
  • the array substrate includes a substrate, a buffer layer, a gate insulating layer, a first insulating layer, a planarization layer, a common electrode layer, a second insulating layer, and a plurality of sensing electrode lines.
  • the common electrode layer is patterned to form a plurality of common electrode plates distributed in an array, and horizontal gaps and vertical gaps are formed between the adjacent common electrode plates, and the horizontal gaps are blocked by the horizontal light shielding strips. The vertical gap is blocked by the vertical light bar.
  • the array substrate further includes: a plurality of secondary sensing electrode lines or a plurality of sub-pixel electrodes; wherein the secondary sensing electrode lines or the secondary pixel electrodes are located in any of the vertical light shielding strips and corresponding vertical gaps
  • the secondary sensing electrode line or the secondary pixel electrode is connected to the common electrode plate through a metal via, and the secondary sensing electrode line or the sub-pixel electrode forms an electric field with the pixel electrode, thereby driving the vertical light shielding strip
  • the liquid crystal molecules of the corresponding regions are normally flipped so that the region has the same display effect as other display regions.
  • an embodiment of the present invention provides an in-cell touch panel, including: a color filter substrate, the color film substrate includes a first glass substrate 201, a color resist layer 202, and a black matrix 203;
  • the strip is used to block the horizontal shading strip of the scan line, and a plurality of vertical shading strips for blocking the data line.
  • the array substrate includes a film layer structure as follows.
  • a second glass substrate 204 a surface of the second glass substrate 204 is prepared with a metal light shielding layer 205 of a thin film transistor.
  • a buffer layer 206 is prepared on the surface of the second glass substrate 204; an surface of the buffer layer 206 is prepared with an active layer 207 of a thin film transistor, the active layer 207 includes a channel, and is located at one side of the channel A source ion doped region and a drain ion doped region on the other side of the channel.
  • a gate insulating layer 208 is prepared on the surface of the buffer layer 206; a surface of the gate insulating layer 208 is prepared with a gate electrode 209 of a thin film transistor and a gate line connecting the gate electrode 209.
  • a first insulating layer 210 is formed on the surface of the gate insulating layer 208; a surface of the first insulating layer 210 is prepared with a source metal line 211 and a drain metal line 212, and the source metal line 211 passes through the via hole.
  • the source ion doped region is connected, and the drain metal line 212 is connected to the drain ion doped region through another via.
  • a planarization layer 213 is formed on the surface of the first interlayer insulating layer 210.
  • a common electrode layer is prepared on the surface of the planarization layer 213; the common electrode layer is patterned to form a plurality of common electrode plates 214 distributed in an array, and horizontal gaps are formed between the adjacent common electrode plates 214 and a vertical gap that is obscured by the horizontal shade, the vertical gap being obscured by the vertical shade.
  • the second insulating layer 215 is formed on the surface of the common electrode layer, and the second insulating layer 215 is provided with a plurality of first metal vias 216 and second metal vias 217.
  • a plurality of sensing electrode lines 218 are distributed on the surface of the second insulating layer 215, and the sensing electrode lines 218 are parallel to each other, and one of the sensing electrode lines 218 is connected to the first metal via 216.
  • a plurality of secondary sensing electrode lines 219 are distributed on the surface of the second insulating layer 215, and the secondary sensing electrode lines 219 are connected to the common electrode plate 214 through the second metal vias 217;
  • the sensing electrode line 219 and the sensing electrode line 218 are parallel to each other; one of the secondary sensing electrode lines 219 is located between any of the vertical light shielding strips and the corresponding vertical gap; the second metal via 217
  • the edge of the common electrode plate 214 is disposed close to the width of the secondary sensing electrode line 219 to ensure the pixel aperture ratio.
  • the secondary sensing electrode line 219 and the sensing electrode line 218 are made of the same material, and the secondary sensing electrode line 219 and the sensing electrode line 218 are formed by using the same mask.
  • the width of the secondary sensing electrode line 219 is greater than the width of the vertical gap, such that the secondary sensing electrode line 219 can cover the vertical gap, and a portion of the width can be reserved for connection with the common electrode plate 214.
  • the passivation layer 220 is prepared on the surface of the second insulating layer 215, and the surface of the passivation layer 220 is prepared with a plurality of pixel electrodes 221 distributed in an array.
  • the secondary sensing electrode line 219 is supplied with current by the common electrode plate 214 connected thereto, and the secondary sensing electrode line 219 forms an electric field with the nearby pixel electrode 221 to drive the two laterally disposed common electrode plates.
  • the liquid crystal molecules corresponding to the gaps between the 214 and the liquid crystal molecules of other regions have a uniform flip angle, thereby eliminating the poor display of the bright lines and the dark lines when the liquid crystal display panel is viewed from a large viewing angle.
  • the aperture of the second metal via 217 is set smaller than the aperture of the first metal via 216 to minimize the width of the secondary sensing electrode line 219. Guarantee the pixel opening area.
  • the vertical gap between the two adjacent columns of the common electrode plates 214 may be correspondingly disposed with one of the secondary sensing electrode lines 219, and the secondary sensing electrode lines 219 may be connected to any of the two columns of the common electrode plates 214.
  • the vertical gap between the two adjacent columns of the common electrode plates 214 may further correspond to the plurality of segments of the secondary sensing electrode lines 219 that are vertically distributed and spaced apart, and the adjacent two segments of the secondary sensing electrode lines 219
  • the spacing distance is the same as the width of the horizontal gap, and a section of the secondary sensing electrode line 219 is connected to a common electrode plate 214 on one side thereof; and the secondary sensing electrode line 219 of the above structure is used.
  • a plurality of the secondary sensing electrode lines 219 are correspondingly disposed in the vertical gap, and each of the secondary sensing electrode lines 219 is connected to one of the common electrode plates 214, and the current flowing through the secondary sensing electrode lines 219 is relatively stable.
  • the secondary sensing electrode line 219 is prevented from being long and the impedance is increased, thereby causing the current on the secondary sensing electrode line 219 to be unstable; moreover, each of the secondary sensing electrode lines 219 is independent of each other.
  • the common electrode plate 214 is damaged and does not affect the normal use of the other of the secondary sensing electrode lines 219 corresponding to the same vertical gap.
  • an in-cell touch panel includes: a color filter substrate including a first glass substrate 301, a color resist layer 302, and a black matrix 303; and the black matrix 303 includes A plurality of horizontal shading strips for shielding the scanning lines, and a plurality of vertical shading strips for shielding the data lines.
  • the array substrate includes a film layer structure as follows.
  • a second glass substrate 304 a surface of the second glass substrate 304 is prepared with a metal light shielding layer 305 of a thin film transistor.
  • a buffer layer 306 is prepared on the surface of the second glass substrate 304; an surface of the buffer layer 306 is prepared with an active layer 307 of a thin film transistor, the active layer 307 includes a channel, and is located on one side of the channel A source ion doped region and a drain ion doped region on the other side of the channel.
  • a gate insulating layer 308 is prepared on the surface of the buffer layer 306; a surface of the gate insulating layer 308 is prepared with a gate 309 of a thin film transistor and a gate line connecting the gate 309.
  • a first insulating layer 310 is formed on the surface of the gate insulating layer 308; a surface of the first insulating layer 310 is prepared with a source metal line 311 and a drain metal line 312, and the source metal line 311 passes through the metal A hole is connected to the source ion doped region, and the drain metal line 312 is connected to the drain ion doped region through another metal via.
  • a planarization layer 313 is prepared on the surface of the first interlayer insulating layer 310.
  • a common electrode layer is prepared on the surface of the planarization layer 313; the common electrode layer is patterned to form a plurality of common electrode plates 314 distributed in an array, and horizontal gaps are formed between the adjacent common electrode plates 314 and a vertical gap that is obscured by the horizontal shade, the vertical gap being obscured by the vertical shade.
  • a second insulating layer 315 is formed on the surface of the common electrode layer, and a plurality of first metal vias 316 are defined in the second insulating layer 315.
  • a plurality of sensing electrode lines 318 are distributed on the surface of the second insulating layer 315, and the sensing electrode lines 318 are parallel to each other, and one of the sensing electrode lines 318 is connected to the first metal via 316.
  • the passivation layer 320 is prepared on the surface of the second insulating layer 315; the passivation layer 320 to the second insulating layer 315 are provided with a plurality of second metal vias 317.
  • a transparent electrode layer is prepared on the surface of the passivation layer 320.
  • the transparent electrode layer is patterned to form a plurality of pixel electrodes 321 arranged in an array, and a gap is formed between the adjacent two pixel electrodes 321 .
  • the array substrate further includes: a plurality of sub-pixel electrodes 319 distributed on the surface of the passivation layer 320, and the sub-pixel electrode 319 is connected to the common electrode plate 314 through the second metal via 317; A sub-pixel electrode 319 is located between any of the vertical light-shielding strips and the corresponding vertical gap.
  • the sub-pixel electrode 319 is supplied with current by the common electrode, and forms an electric field with the pixel electrode 321 in the vicinity to drive liquid crystal molecules corresponding to the gap between the two laterally disposed common electrode plates 314 and other
  • the liquid crystal molecules in the region have a uniform flip angle, thereby eliminating the poor display of bright lines and dark lines when the liquid crystal display panel is viewed from a large viewing angle.
  • the working principle of the in-cell touch panel of the second embodiment is similar to that of the in-cell touch panel of the first embodiment.
  • the beneficial effects of the present invention are: compared to the in-cell touch screen of the prior art; the in-cell touch screen provided by the present invention, by arranging the metal at the position blocked by the black matrix, so that the liquid crystal molecules corresponding to the black matrix occlusion area are normally flipped Therefore, the area has a normal display effect; the in-cell touch panel of the prior art is solved. Since the array substrate has no common electrode corresponding to the occlusion area of the black matrix, the corresponding liquid crystal molecules are reversed abnormally, resulting in brightness of the area. Different from other areas, the liquid crystal display panel may appear bright line or dark line when displayed at a large viewing angle, which affects the technical problem of the viewing effect.

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Abstract

一种内嵌式触摸屏，包括阵列基板；阵列基板的公共电极板(214,314)之间的缝隙中增设金属(219,319)；该金属(219,319)连接公共电极板(214,314)，与像素电极(221,321)形成电场，从而驱动公共电极板缝隙对应区域的液晶分子正常翻转，使得该区域与其他显示区具有相同的显示效果。

Description

内嵌式触摸屏 技术领域
本发明涉及液晶显示技术领域，尤其涉及一种内嵌式触摸屏。
 背景技术
触摸屏作为一种输入媒介，是目前最简单、方便、自然的一种人机交互方式。液晶（Liquid Crystal），由于其良好的电可控性，越来越多地使用在显示面板中；因此，通常触摸屏集成于液晶显示面板中形成各种电子产品，例如手机、笔记本电脑、MP3/MP4等。
传统In-cell（内嵌式触摸屏）通过和显示共用公共电极实现触摸效果。如图1所示，现有技术的In-cell 结构示意图，包括彩膜基板与阵列基板，彩膜基板包括第一玻璃基板101、色阻层102及黑色矩阵103；阵列基板：包括依次层叠设置的第二玻璃基板104、缓冲层105、栅绝缘层106、间绝缘层107、平坦化层108、公共电极层、介质层109、感应电极线110、钝化层111以及像素电极114；感应电极线通过过孔112与公共电极层连接；公共电极层被图案化成若干电极板113，公共电极板113之间的间隙设置在黑色矩阵103正下方。公共电极板113与公共电极板113之间没有电极层，因此相邻电极板间的缝隙所对应的区域没有电场，因此此处的液晶翻转方向和其余地方不一致，导致此处的显示亮度和其余地方不一致，会出现显示问题；虽然此处有黑色矩阵103遮挡，但在大视角斜视时，仍然能看到显示差异，具体表现为亮线纹或暗线纹，影响显示效果。
另外，所述黑色矩阵103中的水平遮光条用以遮挡薄膜晶体管及扫描线，水平遮光条的宽度大于仅用以遮挡数据线的垂直遮光条，因此，出现亮线纹或暗线纹的显示问题主要表现于垂直遮光条对应区域。
综上所述，现有技术的内嵌式触摸屏，由于阵列基板对应黑色矩阵103的遮挡区域没有公共电极，导致该处对应的液晶分子翻转异常，导致该区域亮度与其他区域不同，进而使得液晶显示面板在大视角显示时出现亮线纹或暗线纹，影响观看效果。
 技术问题
本发明提供一种内嵌式触摸屏，能够使对应于黑色矩阵遮挡区域的液晶分子正常翻转，从而使该区域具有正常的显示效果，以解决现有技术的内嵌式触摸屏，由于阵列基板对应黑色矩阵的遮挡区域没有公共电极，导致该处对应于的液晶分子翻转异常，导致该区域亮度与其他区域不同，进而使得液晶显示面板在大视角显示时出现亮线纹或暗线纹，影响观看效果的技术问题。
 技术解决方案
为解决上述问题，本发明提供的技术方案如下：
本发明提供一种内嵌式触摸屏，包括：
彩膜基板，包括色阻层及黑色矩阵；所述黑色矩阵包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条；
阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
基板；
缓冲层，制备于所述基板表面；
栅绝缘层，制备于所述缓冲层表面；
第一间绝缘层，制备于所述栅绝缘层表面；
平坦化层，制备于所述第一间绝缘层表面；
公共电极层，制备于所述平坦化层表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板，相邻所述公共电极板之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡；
第二间绝缘层，制备于所述公共电极层表面，所述第二间绝缘层上开设有多个第一金属过孔与第二金属过孔；所述第二金属过孔紧贴所述公共电极板的边缘设置；
多条感应电极线，分布于所述第二间绝缘层表面，各所述感应电极线之间相互平行，所述感应电极线通过所述第一金属过孔连接于所述公共电极板；以及
多条次感应电极线，分布于所述第二间绝缘层表面，所述次感应电极线通过所述第二金属过孔连接于所述公共电极板；其中，
所述次感应电极线与所述感应电极线相互平行；一条所述次感应电极线，位于任一所述垂直遮光条与相对应的所述垂直空隙之间。
根据本发明一优选实施例，所述第二间绝缘层表面制备有钝化层，所述钝化层表面制备有若干呈阵列分布的像素电极，所述次感应电极线与所述像素电极形成用以驱动液晶分子偏转的电场。
根据本发明一优选实施例，相邻两列所述公共电极板之间的所述垂直空隙，对应设置一条所述次感应电极线，所述次感应电极线连接两列所述公共电极板中的任一所述公共电极板。
根据本发明一优选实施例，相邻两列所述公共电极板之间的所述垂直空隙，对应多段垂直分布且间隔设置的所述次感应电极线，相邻两段所述次感应电极线的间隔距离与所述水平空隙的宽度相同，并且，一段所述次感应电极线与位于其一侧的一所述公共电极板相连。
根据本发明一优选实施例，所述第二金属过孔的孔径小于所述第一金属过孔的孔径。
本发明提供一种内嵌式触摸屏，包括：
彩膜基板，包括色阻层及黑色矩阵；所述黑色矩阵包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条；
阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
基板；
缓冲层，制备于所述基板表面；
栅绝缘层，制备于所述缓冲层表面；
第一间绝缘层，制备于所述栅绝缘层表面；
平坦化层，制备于所述第一间绝缘层表面；
公共电极层，制备于所述平坦化层表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板，相邻所述公共电极板之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡；
第二间绝缘层，制备于所述公共电极层表面，所述第二间绝缘层上开设有多个第一金属过孔与第二金属过孔；
多条感应电极线，分布于所述第二间绝缘层表面，各所述感应电极线之间相互平行，所述感应电极线通过所述第一金属过孔连接于所述公共电极板；以及
多条次感应电极线，分布于所述第二间绝缘层表面，所述次感应电极线通过所述第二金属过孔连接于所述公共电极板；其中，
所述次感应电极线与所述感应电极线相互平行；一条所述次感应电极线，位于任一所述垂直遮光条与相对应的所述垂直空隙之间。
根据本发明一优选实施例，所述第二间绝缘层表面制备有钝化层，所述钝化层表面制备有若干呈阵列分布的像素电极，所述次感应电极线与所述像素电极形成用以驱动液晶分子偏转的电场。
根据本发明一优选实施例，相邻两列所述公共电极板之间的所述垂直空隙，对应设置一条所述次感应电极线，所述次感应电极线连接两列所述公共电极板中的任一所述公共电极板。
根据本发明一优选实施例，相邻两列所述公共电极板之间的所述垂直空隙，对应多段垂直分布且间隔设置的所述次感应电极线，相邻两段所述次感应电极线的间隔距离与所述水平空隙的宽度相同，并且，一段所述次感应电极线与位于其一侧的一所述公共电极板相连。
根据本发明一优选实施例，所述第二金属过孔的孔径小于所述第一金属过孔的孔径。
根据本发明上述目的，还提供一种内嵌式触摸屏，包括：
彩膜基板，包括色阻层及黑色矩阵；所述黑色矩阵包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条；
阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
基板；
缓冲层，制备于所述基板表面；
栅绝缘层，制备于所述缓冲层表面；
第一间绝缘层，制备于所述栅绝缘层表面；
平坦化层，制备于所述第一间绝缘层表面；
公共电极层，制备于所述平坦化层表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板，相邻所述公共电极板之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡；
第二间绝缘层，制备于所述公共电极层表面，所述第二间绝缘层上开设有多个第一金属过孔；
多条感应电极线，分布于所述第二间绝缘层表面，各所述感应电极线之间相互平行，所述感应电极线通过所述第一金属过孔连接于所述公共电极板；
钝化层，制备于所述第二间绝缘层表面；所述钝化层至所述第二间绝缘层贯穿设置有若干第二金属过孔；
透明电极层，制备于所述钝化层表面；所述透明电极层经图案化处理，形成若干呈阵列分布的像素电极，相邻两像素电极之间具有空隙；以及
多个次像素电极，分布于所述钝化层表面，所述次像素电极通过所述第二金属过孔连接于所述公共电极板；其中，
一所述次像素电极，位于任一所述垂直遮光条与相对应的所述垂直空隙之间。
根据本发明一优选实施例，所述次像素电极，位于相邻两所述像素电极之间，所述次像素电极与位于其两侧的所述像素电极形成用以驱动液晶分子偏转的电场。
根据本发明一优选实施例，相邻两列所述公共电极板之间的所述垂直空隙，对应设置一列所述次像素电极，所述次像素电极连接两列所述公共电极板中的任一所述公共电极板。
根据本发明一优选实施例，位于同一列的所述次像素电极中，相邻两所述次像素电极的间距等于所述水平空隙的宽度。根据本发明一优选实施例，所述第二金属过孔的孔径小于所述第一金属过孔的孔径。
 有益效果
本发明的有益效果为：相较于现有技术的内嵌式触摸屏；本发明提供的内嵌式触摸屏，通过在黑色矩阵遮挡的位置设置金属，使得对应于黑色矩阵遮挡区域的液晶分子正常翻转，从而使该区域具有正常的显示效果；解决了现有技术的内嵌式触摸屏，由于阵列基板对应于黑色矩阵的遮挡区域没有公共电极，导致该处对应的液晶分子翻转异常，导致该区域亮度与其他区域不同，进而使得液晶显示面板在大视角显示时出现亮线纹或暗线纹，影响观看效果的技术问题。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为一种现有内嵌式触摸屏膜层结构图；
图2为本发明实施例一内嵌式触摸屏膜层结构图；
图3为本发明实施例二内嵌式触摸屏膜层结构图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本发明针对现有技术的内嵌式触摸屏，由于阵列基板对应于黑色矩阵的遮挡区域没有公共电极，导致该处对应的液晶分子翻转异常，进而导致该区域亮度与其他区域不同，使得液晶显示面板在大视角观看时出现亮线纹或暗线纹，影响观看效果的技术问题，本实施例能够解决该缺陷。
本发明提供的内嵌式触摸屏，包括：彩膜基板、与所述彩膜基板相对设置的阵列基板、以及位于所述彩膜基板与所述阵列基板之间的液晶层。
所述彩膜基板，包括色阻层及黑色矩阵；所述黑色矩阵包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条。
所述阵列基板包括：基板、缓冲层、栅绝缘层、第一间绝缘层、平坦化层、公共电极层、第二间绝缘层以及多条感应电极线。所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板，相邻所述公共电极板之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡。
所述阵列基板还包括：多条次感应电极线或多个次像素电极；所述次感应电极线或所述次像素电极，位于任一所述垂直遮光条与相对应的所述垂直空隙之间；所述次感应电极线或所述次像素电极通过金属过孔连接所述公共电极板，所述次感应电极线或次像素电极与所述像素电极形成电场，从而驱动所述垂直遮光条对应区域的液晶分子正常翻转，使得该区域与其他显示区具有相同的显示效果。
实施例一
如图2所示，本发明实施例提供一种内嵌式触摸屏，包括：彩膜基板，彩膜基板包括第一玻璃基板201、色阻层202及黑色矩阵203；所述黑色矩阵203包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条。
以及阵列基板，与所述彩膜基板相对设置；所述阵列基板包括如下膜层结构。
第二玻璃基板204；所述第二玻璃基板204表面制备有薄膜晶体管的金属遮光层205。
缓冲层206，制备于所述第二玻璃基板204表面；所述缓冲层206表面制备有薄膜晶体管的有源层207，所述有源层207包括沟道、以及位于所述沟道一侧的源极离子掺杂区与位于所述沟道另一侧的漏极离子掺杂区。
栅绝缘层208，制备于所述缓冲层206表面；所述栅绝缘层208表面制备有薄膜晶体管的栅极209以及连接所述栅极209的栅线。
第一间绝缘层210，制备于所述栅绝缘层208表面；所述第一间绝缘层210表面制备有源极金属线211以及漏极金属线212，所述源极金属线211通过过孔连接所述源极离子掺杂区，所述漏极金属线212通过另一过孔连接所述漏极离子掺杂区。
平坦化层213，制备于所述第一间绝缘层210表面。
公共电极层，制备于所述平坦化层213表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板214，相邻所述公共电极板214之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡。
第二间绝缘层215，制备于所述公共电极层表面，所述第二间绝缘层215上开设有多个第一金属过孔216以及第二金属过孔217。
多条感应电极线218，分布于所述第二间绝缘层215表面，各所述感应电极线218之间相互平行，一条所述感应电极线218通过一所述第一金属过孔216连接于一所述公共电极板214。
多条次感应电极线219，分布于所述第二间绝缘层215表面，所述次感应电极线219通过所述第二金属过孔217连接于所述公共电极板214；其中，所述次感应电极线219与所述感应电极线218相互平行；一条所述次感应电极线219，位于任一所述垂直遮光条与相对应的所述垂直空隙之间；所述第二金属过孔217紧贴所述公共电极板214的边缘设置，以降低所述次感应电极线219的宽度，保证像素开口率。
所述次感应电极线219与所述感应电极线218采用相同材质，并且所述次感应电极线219与所述感应电极线218使用同一道光罩形成。
所述次感应电极线219的宽度大于所述垂直空隙的宽度，使得所述次感应电极线219能够覆盖所述垂直空隙，并且能够预留出部分宽度与所述公共电极板214连接。
钝化层220，制备于所述第二间绝缘层215表面，所述钝化层220表面制备有若干呈阵列分布的像素电极221。
所述次感应电极线219由与之相连的所述公共电极板214提供电流，所述次感应电极线219与附近的所述像素电极221形成电场，以驱动两横向设置的所述公共电极板214之间的缝隙所对应的液晶分子与其他区域的液晶分子具有一致的翻转角度，进而消除液晶显示面板在大视角观看时出现亮线纹与暗线纹的不良显示。
为了尽可能的保证像素的开口面积，将所述第二金属过孔217的孔径设置为小于所述第一金属过孔216的孔径，以最大限度的降低所述次感应电极线219的宽度，保证像素开口面积。
相邻两列所述公共电极板214之间的所述垂直空隙，可以对应设置一条所述次感应电极线219，所述次感应电极线219连接两列所述公共电极板214中的任一所述公共电极板214；采用上述结构的所述次感应电极线219，在制备工艺中，光罩设计结构相对简单，形成对应于一所述垂直空隙的所述次感应电极线219，光罩对应位置只需要设计一条狭缝，而且用于连接所述公共电极板214的所述第二金属过孔217只需要一个，使得光罩精度要求相对较低，成品率提高。
又如，相邻两列所述公共电极板214之间的所述垂直空隙，还可以对应多段垂直分布且间隔设置的所述次感应电极线219，相邻两段所述次感应电极线219的间隔距离与所述水平空隙的宽度相同，并且，一段所述次感应电极线219与位于其一侧的一所述公共电极板214相连；采用上述结构的所述次感应电极线219，一所述垂直空隙中对应设置多段所述次感应电极线219，每段所述次感应电极线219连接一块所述公共电极板214，各段所述次感应电极线219通入的电流相对稳定，避免了所述次感应电极线219较长而使阻抗增大，进而导致所述次感应电极线219上的电流不稳定；而且，各段所述次感应电极线219相互独立，当一部分所述公共电极板214损坏，不会影响对应于同一所述垂直空隙的其它所述次感应电极线219的正常使用。
实施例二
如图3所示，本发明另一实施例提供的内嵌式触摸屏，包括：彩膜基板，彩膜基板包括第一玻璃基板301、色阻层302及黑色矩阵303；所述黑色矩阵303包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条。
以及阵列基板，与所述彩膜基板相对设置；所述阵列基板包括如下膜层结构。
第二玻璃基板304；所述第二玻璃基板304表面制备有薄膜晶体管的金属遮光层305。
缓冲层306，制备于所述第二玻璃基板304表面；所述缓冲层306表面制备有薄膜晶体管的有源层307，所述有源层307包括沟道、以及位于所述沟道一侧的源极离子掺杂区与位于所述沟道另一侧的漏极离子掺杂区。
栅绝缘层308，制备于所述缓冲层306表面；所述栅绝缘层308表面制备有薄膜晶体管的栅极309以及连接所述栅极309的栅线。
第一间绝缘层310，制备于所述栅绝缘层308表面；所述第一间绝缘层310表面制备有源极金属线311以及漏极金属线312，所述源极金属线311通过金属过孔连接所述源极离子掺杂区，所述漏极金属线312通过另一金属过孔连接所述漏极离子掺杂区。
平坦化层313，制备于所述第一间绝缘层310表面。
公共电极层，制备于所述平坦化层313表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板314，相邻所述公共电极板314之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡。
第二间绝缘层315，制备于所述公共电极层表面，所述第二间绝缘层315上开设有多个第一金属过孔316。
多条感应电极线318，分布于所述第二间绝缘层315表面，各所述感应电极线318之间相互平行，一条所述感应电极线318通过一所述第一金属过孔316连接于一所述公共电极板314。
钝化层320，制备于所述第二间绝缘层315表面；所述钝化层320至所述第二间绝缘层315贯穿设置有若干第二金属过孔317。
透明电极层，制备于所述钝化层320表面；所述透明电极层经图案化处理，形成若干呈阵列分布的像素电极321，相邻两像素电极321之间具有空隙。
所述阵列基板还包括：多个次像素电极319，分布于所述钝化层320表面，所述次像素电极319通过所述第二金属过孔317连接于所述公共电极板314；其中，一所述次像素电极319，位于任一所述垂直遮光条与相对应的所述垂直空隙之间。
所述次像素电极319由所述公共电极提供电流，与所述附近的所述像素电极321形成电场，以驱动两横向设置的所述公共电极板314之间的缝隙所对应的液晶分子与其他区域的液晶分子具有一致的翻转角度，进而消除液晶显示面板在大视角观看时出现亮线纹与暗线纹的不良显示。
实施例二的内嵌式触摸屏的工作原理跟上述实施例一的内嵌式触摸屏的工作原理类似，具体可参考实施例一的内嵌式触摸屏的工作原理，此处不再做赘述。
本发明的有益效果为：相较于现有技术的内嵌式触摸屏；本发明提供的内嵌式触摸屏，通过在黑色矩阵遮挡的位置设置金属，使得对应于黑色矩阵遮挡区域的液晶分子正常翻转，从而使该区域具有正常的显示效果；解决了现有技术的内嵌式触摸屏，由于阵列基板对应于黑色矩阵的遮挡区域没有公共电极，导致该处对应的液晶分子翻转异常，导致该区域亮度与其他区域不同，进而使得液晶显示面板在大视角显示时出现亮线纹或暗线纹，影响观看效果的技术问题。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (15)

  1. 一种内嵌式触摸屏，其包括：
    彩膜基板，包括色阻层及黑色矩阵；所述黑色矩阵包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条；
    阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
    基板；
    缓冲层，制备于所述基板表面；
    栅绝缘层，制备于所述缓冲层表面；
    第一间绝缘层，制备于所述栅绝缘层表面；
    平坦化层，制备于所述第一间绝缘层表面；
    公共电极层，制备于所述平坦化层表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板，相邻所述公共电极板之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡；
    第二间绝缘层，制备于所述公共电极层表面，所述第二间绝缘层上开设有多个第一金属过孔与第二金属过孔；所述第二金属过孔紧贴所述公共电极板的边缘设置；
    多条感应电极线，分布于所述第二间绝缘层表面，各所述感应电极线之间相互平行，所述感应电极线通过所述第一金属过孔连接所述公共电极板；以及
    多条次感应电极线，分布于所述第二间绝缘层表面，所述次感应电极线通过所述第二金属过孔连接于所述公共电极板；其中，
    所述次感应电极线与所述感应电极线相互平行；一条所述次感应电极线，位于任一所述垂直遮光条与相对应的所述垂直空隙之间。
  2. 根据权利要求1所述的内嵌式触摸屏，其中，所述第二间绝缘层表面制备有钝化层，所述钝化层表面制备有若干呈阵列分布的像素电极，所述次感应电极线与所述像素电极形成用以驱动液晶分子偏转的电场。
  3. 根据权利要求1所述的内嵌式触摸屏，其中，相邻两列所述公共电极板之间的所述垂直空隙，对应设置一条所述次感应电极线，所述次感应电极线连接两列所述公共电极板中的任一所述公共电极板。
  4. 根据权利要求1所述的内嵌式触摸屏，其中，相邻两列所述公共电极板之间的所述垂直空隙，对应多段垂直分布且间隔设置的所述次感应电极线，相邻两段所述次感应电极线的间隔距离与所述水平空隙的宽度相同，并且，一段所述次感应电极线与位于其一侧的一所述公共电极板相连。
  5. 根据权利要求4所述的内嵌式触摸屏，其中，
    所述第二金属过孔的孔径小于所述第一金属过孔的孔径。
  6. 一种内嵌式触摸屏，其包括：
    彩膜基板，包括色阻层及黑色矩阵；所述黑色矩阵包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条；
    阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
    基板；
    缓冲层，制备于所述基板表面；
    栅绝缘层，制备于所述缓冲层表面；
    第一间绝缘层，制备于所述栅绝缘层表面；
    平坦化层，制备于所述第一间绝缘层表面；
    公共电极层，制备于所述平坦化层表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板，相邻所述公共电极板之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡；
    第二间绝缘层，制备于所述公共电极层表面，所述第二间绝缘层上开设有多个第一金属过孔与第二金属过孔；
    多条感应电极线，分布于所述第二间绝缘层表面，各所述感应电极线之间相互平行，所述感应电极线通过所述第一金属过孔连接所述公共电极板；以及
    多条次感应电极线，分布于所述第二间绝缘层表面，所述次感应电极线通过所述第二金属过孔连接于所述公共电极板；其中，
    所述次感应电极线与所述感应电极线相互平行；一条所述次感应电极线，位于任一所述垂直遮光条与相对应的所述垂直空隙之间。
  7. 根据权利要求6所述的内嵌式触摸屏，其中，所述第二间绝缘层表面制备有钝化层，所述钝化层表面制备有若干呈阵列分布的像素电极，所述次感应电极线与所述像素电极形成用以驱动液晶分子偏转的电场。
  8. 根据权利要求6所述的内嵌式触摸屏，其中，相邻两列所述公共电极板之间的所述垂直空隙，对应设置一条所述次感应电极线，所述次感应电极线连接两列所述公共电极板中的任一所述公共电极板。
  9. 根据权利要求6所述的内嵌式触摸屏，其中，相邻两列所述公共电极板之间的所述垂直空隙，对应多段垂直分布且间隔设置的所述次感应电极线，相邻两段所述次感应电极线的间隔距离与所述水平空隙的宽度相同，并且，一段所述次感应电极线与位于其一侧的一所述公共电极板相连。
  10. 根据权利要求9所述的内嵌式触摸屏，其中，
    所述第二金属过孔的孔径小于所述第一金属过孔的孔径。
  11. 一种内嵌式触摸屏，其包括：
    彩膜基板，包括色阻层及黑色矩阵；所述黑色矩阵包括多条用于遮挡扫描线的水平遮光条，以及多条用于遮挡数据线的垂直遮光条；
    阵列基板，与所述彩膜基板相对设置；所述阵列基板包括：
    基板；
    缓冲层，制备于所述基板表面；
    栅绝缘层，制备于所述缓冲层表面；
    第一间绝缘层，制备于所述栅绝缘层表面；
    平坦化层，制备于所述第一间绝缘层表面；
    公共电极层，制备于所述平坦化层表面；所述公共电极层经图案化处理，形成若干呈阵列分布的公共电极板，相邻所述公共电极板之间形成有水平空隙以及垂直空隙，所述水平空隙被所述水平遮光条遮挡，所述垂直空隙被所述垂直遮光条遮挡；
    第二间绝缘层，制备于所述公共电极层表面，所述第二间绝缘层上开设有多个第一金属过孔；
    多条感应电极线，分布于所述第二间绝缘层表面，各所述感应电极线之间相互平行，所述感应电极线通过所述第一金属过孔连接于所述公共电极板；
    钝化层，制备于所述第二间绝缘层表面；所述钝化层至所述第二间绝缘层贯穿设置有若干第二金属过孔；
    透明电极层，制备于所述钝化层表面；所述透明电极层经图案化处理，形成若干呈阵列分布的像素电极，相邻两像素电极之间具有空隙；以及
    多个次像素电极，分布于所述钝化层表面，所述次像素电极通过所述第二金属过孔连接于所述公共电极板；其中，
    一所述次像素电极，位于任一所述垂直遮光条与相对应的所述垂直空隙之间。
  12. 根据权利要求11所述的内嵌式触摸屏，其中，所述次像素电极，位于相邻两所述像素电极之间，所述次像素电极与位于其两侧的所述像素电极形成用以驱动液晶分子偏转的电场。
  13. 根据权利要求11所述的内嵌式触摸屏，其中，相邻两列所述公共电极板之间的所述垂直空隙，对应设置一列所述次像素电极，所述次像素电极连接两列所述公共电极板中的任一所述公共电极板。
  14. 根据权利要求11所述的内嵌式触摸屏，其中，
    位于同一列的所述次像素电极中，相邻两所述次像素电极的间距等于所述水平空隙的宽度。
  15. 根据权利要求14任一权利要求所述的内嵌式触摸屏，其中，所述第二金属过孔的孔径小于所述第一金属过孔的孔径。
PCT/CN2017/096387 2017-06-30 2017-08-08 内嵌式触摸屏 WO2019000577A1 (zh)

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