WO2018190324A1 - Antifungal agent containing pyridone compound as active component, and use method thereof - Google Patents

Antifungal agent containing pyridone compound as active component, and use method thereof Download PDF

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WO2018190324A1
WO2018190324A1 PCT/JP2018/015007 JP2018015007W WO2018190324A1 WO 2018190324 A1 WO2018190324 A1 WO 2018190324A1 JP 2018015007 W JP2018015007 W JP 2018015007W WO 2018190324 A1 WO2018190324 A1 WO 2018190324A1
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group
substituent
optionally substituted
formula
solvents
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PCT/JP2018/015007
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French (fr)
Japanese (ja)
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豪毅 梅谷
智 湯谷
英明 生島
良平 内藤
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三井化学アグロ株式会社
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Priority to JP2019512517A priority Critical patent/JP7089506B2/en
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00—Medicinal preparations containing organic active ingredients
    • A61K31/33—Heterocyclic compounds
    • A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/44—Non condensed pyridines; Hydrogenated derivatives thereof
    • A61K31/4418—Non condensed pyridines; Hydrogenated derivatives thereof having a carbocyclic group directly attached to the heterocyclic ring, e.g. cyproheptadine
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00—Medicinal preparations containing organic active ingredients
    • A61K31/33—Heterocyclic compounds
    • A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/44—Non condensed pyridines; Hydrogenated derivatives thereof
    • A61K31/4427—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems
    • A61K31/443—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems containing a five-membered ring with oxygen as a ring hetero atom
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00—Medicinal preparations containing organic active ingredients
    • A61K31/33—Heterocyclic compounds
    • A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/44—Non condensed pyridines; Hydrogenated derivatives thereof
    • A61K31/4427—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems
    • A61K31/444—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems containing a six-membered ring with nitrogen as a ring heteroatom, e.g. amrinone
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
    • A61P31/10—Antimycotics
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/80—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
    • C07D211/84—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen directly attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/80—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
    • C07D211/84—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen directly attached to ring carbon atoms
    • C07D211/86—Oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/63—One oxygen atom
    • C07D213/64—One oxygen atom attached in position 2 or 6
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/70—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links

Definitions

  • the present invention relates to an antifungal agent containing a pyridone compound as an active ingredient.
  • Non-Patent Document 1 In human infectious diseases, many bacterial infectious diseases have been expelled due to recent rapid progress in research and development of antibacterial agents (antibiotics). On the other hand, research on antifungal agents used for the prevention and treatment of fungal infections has not been sufficiently advanced, and fungal infections such as candidiasis and aspergillosis occur frequently and cause death. It is heavily involved. In particular, patients with impaired immune function due to the use of immunodeficiencies and immunosuppressants and elderly people often develop fungal infections, which poses a serious threat in highly medically developed and aging societies. (See Non-Patent Document 1). Therefore, in the near future, new measures against fungal infections are expected to be one of the important issues.
  • azole antifungal agents such as fluconazole and itraconazole
  • benzylamine antifungal agents such as butenafine
  • allylamine antifungal agents such as terbinafine, amorolfine and the like
  • Formoline antifungal agents thiocarbamine antifungal agents such as rilanaphthalate and tolnaftate
  • imidazole antifungal agents such as miconazole, ketoconazole and clotrimazole
  • echinocandin antifungal agents such as echinocandin
  • Micafungin Antifungal agents such as candin antifungal agents such as spofungin, polyene antifungal agents such as amphoteicin B and nystatin, fluopyridine antifungal agents such as flucytosine, and glycan antifungal agents such as griseofulvin Known but not manyAs such, the emergence of resistant bacteria to any major
  • 1,3,5,6-substituted-2-pyridone compounds for example, 1,3,5,6-substituted-2 having an aryl group or heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand.
  • -Pyridone compounds have been disclosed (see eg WO 98/55480).
  • 1,3,5,6-substituted-2-pyridone compounds having a carboxyl group at the 3-position have been disclosed as therapeutic agents for bacterial infections (see, for example, European Patent No. 0308020).
  • An object of the present invention is to provide an antifungal agent having excellent antifungal activity.
  • the present inventors have conducted extensive studies on the 1,3,5,6-substituted-2-pyridone compound group and the 1,5,6-substituted-2-pyridone compound group.
  • 6-position in the 2-pyridone skeleton it has been found that a group of compounds introduced with an aryl group or heteroaryl group having a substituent at the ortho-position exhibits excellent antifungal activity, and the present invention has been completed. .
  • R1 is a hydroxyl group, A cyano group, A C1-C6 alkyl group optionally substituted with substituent A, A C1-C6 haloalkyl group, A C3-C8 cycloalkyl group optionally substituted with the substituent A, A C2-C6 alkenyl group optionally substituted with the substituent A, A C2-C6 haloalkenyl group, A C2-C6 alkynyl group optionally substituted with substituent A, A C2-C6 haloalkynyl group, A C1-C6 alkoxy group optionally substituted with the substituent A, A C1-C6 haloalkoxy group, A C3-C8 cycloalkoxy group optionally substituted with the substituent A, A C2-C6 alkenyloxy group optionally substituted with the substituent A, A C2-C6 haloalkenyloxy group, A C3
  • R20C ( ⁇ O) O— (wherein R20 has the same meaning as above), A 3- to 6-membered group containing 1 to 2 oxygen atoms, R23-L2- (wherein, R23 represents a C1 alkyl group ⁇ C6 or C1 ⁇ C6 haloalkyl group,, L2 represents S, SO, or SO 2.), R21R22N- (wherein R21 and R22 are as defined above), Or R24C ( ⁇ O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is optional
  • Substituent B1 is At least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group
  • Substituent C is Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R31R32N- (wherein R31 and R32 are the same as R21 And R22), and R30-L3- (wherein R30 has the same meaning as R14 and L3 has the same meaning as L1), and at least one selected from the group consisting of Seeds
  • Substituent D is At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C
  • R1 is a cyano group, A C1-C6 alkyl group optionally substituted with substituent A, A C1-C6 haloalkyl group, A C3-C8 cycloalkyl group optionally substituted with the substituent A, A C2-C6 alkenyl group optionally substituted with the substituent A, A C2-C6 haloalkenyl group, A C2-C6 alkynyl group optionally substituted with substituent A, Or R10R11N— (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group); R2 is a halogen atom, Hydroxyl group, A cyano group, A C1-C6 alkyl group optionally substituted with the substituent B, A C1-C6 haloalkyl group, A C1-C6 alkoxy group optionally substituted with the substituent B, A C1-C6 haloalkoxy group, A C3-C8
  • R1 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group optionally substituted with the substituent A
  • R2 represents a halogen atom, a C1-C6 alkyl group optionally substituted with the substituent B, or a C1-C6 alkoxy group optionally substituted with the substituent B
  • R3 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C, the antifungal agent comprising the compound according to [2] or a salt thereof as an active ingredient.
  • [4] A method for preventing and / or treating a fungal infection using the antifungal agent according to [1].
  • [5] A method for preventing and / or treating a fungal infection, the method comprising administering an effective amount of the compound or a salt thereof according to [1] to a subject in need thereof.
  • the fungal infection is a fungal infection selected from deep mycosis, deep cutaneous mycosis, and superficial mycosis.
  • Fungal infections include Candida spp., Aspergillus spp., Cryptococcus spp., Microsporum spp., Trichophyton sp.
  • [6] caused by one or more fungi selected from the group consisting of Fusarium spp.
  • Fungal infections include Candida spp., Aspergillus spp., Cryptococcus spp., Microsporum spp., Trichophyton sp.
  • the compound or salt thereof according to [9] caused by one or more fungi selected from the group consisting of Fusarium spp. And Fusarium spp.
  • the fungal infection can be prevented or / and treated by the novel pyridone compound of the present invention.
  • the method using the pyridone compound of the present invention can provide an effective method for preventing and / or treating fungal infections.
  • DMF N, N-dimethylformamide
  • THF tetrahydrofuran
  • Me methyl group
  • Et ethyl group
  • Pr propyl group
  • Bu butyl group
  • Pentyl pentyl group
  • Hexyl hexyl group
  • Ac acetyl group
  • Ph Phenyl group
  • Py pyridyl group
  • i iso
  • sec secondary
  • ⁇ triple bond.
  • a single “-” means no substitution
  • Pr, Bu, Pentyl, and Hexyl means normal when there is no prefix.
  • Cx-Cy has x to y carbon atoms.
  • optionally substituted means substituted or unsubstituted. When this term is used, the number of substituents is 1 when the number of substituents is not specified.
  • the C1-C6 alkyl group may be linear or branched, and is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl.
  • the halogen atom is a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or the like.
  • the C1-C6 haloalkyl group represents a group in which the hydrogen in the C1-C6 alkyl group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C1-C6 haloalkyl group examples include a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a monochloromethyl group, a monobromomethyl group, a monoiodomethyl group, a chlorodifluoromethyl group, a bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2
  • the C3-C8 cycloalkyl group includes a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and the like.
  • the C2-C6 alkenyl group represents an unsaturated hydrocarbon group which has one or more double bonds and is linear or branched.
  • C2 to C6 alkenyl groups include vinyl, 1-propenyl, allyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentenyl, and 3-pentenyl.
  • the C2-C6 haloalkenyl group represents a group in which the hydrogen atom in the C2-C6 alkenyl group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C2-C6 haloalkenyl group examples include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples include 3-dichloroallyl group, 4,4-difluoro-3-butenyl group, 5,5-difluoro-4-pentenyl group, 6,6-difluoro-5-hexenyl group and the like.
  • the C2-C6 alkynyl group represents an unsaturated hydrocarbon group having one or more triple bonds and being linear or branched. Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, and 3-pentynyl.
  • the C2-C6 haloalkynyl group represents a group in which the hydrogen atom in the C2-C6 alkynyl group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C2-C6 haloalkynyl group examples include 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro -3,3-difluoro-1-propynyl group, 3-bromo-3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 4,4-difluoro-1-butynyl Group, 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro-1-butynyl group, 4-chloro-4,4-difluoro-2-butynyl group, 4-bromo-4,4 -Difluoro-1-butynyl group, 4-bromo-4,4-Di
  • the C1-C6 alkoxy group represents a group in which the C1-C6 alkyl group is bonded via an oxygen atom.
  • Specific examples of the C1-C6 alkoxy group include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a pentyloxy group, and an isopentyloxy group.
  • the C1-C6 haloalkoxy group represents a group in which the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C1-C6 haloalkoxy group examples include difluoromethoxy group, trifluoromethoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2 -Trifluoroethoxy group, 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tri Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 , 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pent
  • the C3-C8 cycloalkoxy group represents a group in which the C3-C8 cycloalkyl group is bonded via an oxygen atom.
  • Specific examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group.
  • the C2-C6 alkenyloxy group is a group in which the C2-C6 alkenyl group is bonded through an oxygen atom.
  • E-form and Z-form or a mixture of E-form and Z-form in an arbitrary ratio, is not particularly limited as long as it is within the specified carbon number range. None happen.
  • C2-C6 alkenyloxy group examples include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group 3-pentenyloxy group, 4-pentenyloxy group, 3-methyl-2-butenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3-hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group Group, 4-methyl-3-pentenyloxy group, 3-methyl-2-pentenyloxy group and the like.
  • the C2-C6 haloalkenyloxy group represents a group in which the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • Specific examples of the C2-C6 haloalkenyloxy group include 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2-dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoro.
  • the C3-C6 alkynyloxy group represents a group in which the C3-C6 alkynyl group is bonded through an oxygen atom among the C2-C6 alkynyl groups.
  • Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1,1 -Dimethyl-2-propynyloxy group, 2-hexynyloxy group, 3-hexynyloxy group, 4-hexynyloxy group, 5-hexynyloxy group and the like.
  • the C3-C6 haloalkynyloxy group represents a group in which the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted with one or more halogen atoms.
  • the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent.
  • C3-C6 haloalkynyloxy group examples include 1,1-difluoro-2-propynyloxy group, 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro-2-butynyloxy group 4-bromo-4,4-difluoro-2-butynyloxy group, 4,4,4-trifluoro-2-butynyloxy group, 5,5-difluoro-3-pentynyloxy group, 5-chloro-5,5 -Difluoro-3-pentynyloxy group, 5-bromo-5,5-difluoro-3-pentynyloxy group, 5,5,5-trifluoro-3-pentynyloxy group, 6,6-difluoro-4 -Hexynyloxy group, 6-chloro-6,6-difluoro-4-hexynyloxy group, 6-bromo-6
  • the C2-C6 alkoxyalkoxy group is a group in which the hydrogen atom in the C1-C5 alkoxy group in the C1-C6 alkoxy group is optionally substituted with one or more C1-C5 alkoxy groups Represents. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range.
  • C2-C6 alkoxyalkoxy groups include methoxymethoxy, ethoxymethoxy, propyloxymethoxy, isopropyloxymethoxy, methoxyethoxy, ethoxyethoxy, propyloxyethoxy, isopropyloxyethoxy, methoxypropyl Examples thereof include an oxy group, an ethoxypropyloxy group, a propyloxypropyloxy group, and an isopropyloxypropyloxy group.
  • 3- to 6-membered ring group containing 1 to 2 oxygen atoms include 1,2-epoxyethanyl group, oxetanyl group, oxolanyl group, oxanyl group, 1,3-dioxolanyl group, 1,3- Examples thereof include a dioxanyl group and a 1,4-dioxanyl group.
  • the pyridone compound of the present invention includes a compound represented by the following formula (1) and a salt thereof (hereinafter simply referred to as a compound represented by the formula (1) or the present compound).
  • R1 in the formula (1) is a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-C8 optionally substituted with a substituent A.
  • a hydrogen atom or an alkyl group C1 ⁇ C6,) represents a.
  • R1 is a cyano group, a C1-C6 alkyl group optionally substituted with the substituent A, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with the substituent A, a substituted group.
  • a C1-C6 alkyl group or a C1-C6 haloalkyl group which may be optionally substituted with the substituent A is preferable.
  • the “substituent A” in the formula (1) is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, R12R13N.
  • R12 and R13 are each independently a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 are , Together with the nitrogen atom to which it is attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (where R14 is represents a C1 alkyl group ⁇ C6 or C1 ⁇ C6 haloalkyl group,, L1 is, S, SO, or SO 2 Represents at least one selected from the group consisting of:
  • the substituent A is preferably a cyano group, a C1-C6 alkoxy group, or R14-L1- (wherein R14 and L1 are as defined above), In particular, a cyano group or a C1-C6 alkoxy group is preferable.
  • substituent A examples include a hydroxyl group; a cyano group; As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group; A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group; C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group; As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclo
  • substituent A a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group; R12R13N- (wherein R12 and R13 have the same meanings as described above), dimethylamino group, ethylmethylamino group, and diethylamino group; And R14-L1- (wherein R14 and L1 are as defined above) include a methylthio
  • R1 in the formula (1) includes a hydroxyl group and a cyano group.
  • the C1-C6 alkyl group of the “C1-C6 alkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group or an ethyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
  • the “C1-C6 haloalkyl group” in R1 of the formula (1) has the same definition as described above, preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, a 2,2,2-trifluoro group.
  • the C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
  • the C2-C6 alkenyl group of the “C2-C6 alkenyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkenyl group” in R1 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or A 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same meaning as defined above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, more preferably a propargyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkynyl group” in R1 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group or 4,4,4-trifluoro-2-butynyl group, more preferably 4,4-difluoro-2-butynyl Or a 4,4,4-trifluoro-2-butynyl group.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group or an ethoxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
  • the “C1-C6 haloalkoxy group” in R1 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3-C8 cycloalkoxy group in the “C3-C8 cycloalkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted with the substituent A.
  • the C2-C6 alkenyloxy group of “C2-C6 alkenyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably a vinyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
  • the “C2-C6 haloalkenyloxy group” in R1 of the formula (1) has the same definition as above, preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 3-fluoro An allyloxy group or a 3,3-difluoroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluorovinyloxy group.
  • the C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyl group is optionally substituted by the substituent A.
  • the “C3-C6 haloalkynyloxy group” in R1 of the formula (1) has the same definition as described above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- A difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2 -Butynyloxy group or 4,4,4-trifluoro-2-butynyloxy group.
  • R10R11N— The C1-C6 alkyl group of “R10R11N—” in R1 of the formula (1) (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group) Synonymous with definition.
  • R10R11N— is preferably an amino group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group, more preferably an amino group and a dimethylamino group.
  • R2 is a halogen atom, a hydroxyl group, a cyano group, a nitro group, a C1-C6 alkyl group that may be optionally substituted with a substituent B, a C1-C6 haloalkyl group, and a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent B, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent B, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent B, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent B, substituted C2-C6 alkenyloxy group optionally substituted with group B, C2-C6 haloalkenyloxy group, C3-
  • R24C ( ⁇ O) N (R25) (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is a hydrogen atom or a substituent B1. Place Which may be C1 ⁇ C6 alkyl group, a cycloalkyl group of haloalkyl group having C1 ⁇ C6 or C3 ⁇ C8,. ).
  • R2 is a halogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or a C1-C6 optionally substituted with a substituent B.
  • Substituent B in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2 To C6 alkoxyalkoxy groups, R21R22N- (wherein R21 and R22 are as defined above), R23-L2- (wherein R23 and L2 are as defined above), R26R27R28Si- ( Here, R26, R27, and R28 are each independently a C1-C6 alkyl group.), R26R27R28Si— (CH 2 ) s—O— (wherein s is an integer of 1 to 3) R26, R27, and R28 are as defined above, R20C ( ⁇ O) — (wherein R20 is as defined above for R20), and ⁇ Represents at least one member selected from the group consist
  • the substituent B is a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C2-C6 alkoxyalkoxy group, R23-L2- (wherein R23 and L2 are as defined above).
  • R26R27R28Si— wherein R26, R27, and R28 are as defined above
  • R26R27R28Si— CH 2 ) s—O—
  • s, R26, R27, and R28 are R20C ( ⁇ O) —
  • R20 is as defined above
  • a 3- to 6-membered ring group containing 1 to 2 oxygen atoms is preferred, In particular, a cyano group or a C1-C6 alkoxy group is preferable.
  • Preferred specific examples of the substituent B include a hydroxyl group; a cyano group; As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group; A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group; C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group; As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a
  • substituent B a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group; A methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group as the C2-C6 alkoxyalkoxy group; R21R22N— (wherein R21 and R22 have the same meanings as described above),
  • Examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include a 1,3-dioxolanyl group and a 1,3-dioxanyl group.
  • the “substituent B1” in the formula (1) is at least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group.
  • the substituent B1 is preferably a cyano group or a C1-C6 alkoxy group.
  • substituent B1 examples include a cyano group;
  • a C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
  • C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
  • examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
  • substituent B1 a cyano group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; As the C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group can be mentioned.
  • the halogen atom in R2 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
  • R2 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
  • the C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group, or an isopropyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent B.
  • the “C1-C6 haloalkyl group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, and preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent B.
  • the C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent B” in R2 of formula (1) has the same definition as above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent B.
  • the “C2-C6 haloalkenyl group” in R2 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent B.
  • the “C2-C6 haloalkynyl group” in R2 of the formula (1) has the same definition as above, preferably 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, preferably a methoxy group, an ethoxy group Propyloxy group, isopropyloxy group, butoxy group, isobutoxy group or pentyloxy group, more preferably methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butoxy group or pentyloxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent B.
  • the “C1-C6 haloalkoxy group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C3-C8 cycloalkoxy group of the “C3-C8 cycloalkoxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group.
  • the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent B.
  • the C2-C6 alkenyloxy group of the “C2-C6 alkenyloxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a vinyloxy group, A 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group, or a 3-butenyloxy group, and more preferably a vinyloxy group, a 1-propenyloxy group, or an allyloxy group.
  • the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent B.
  • the “C2-C6 haloalkenyloxy group” in R2 of the formula (1) has the same definition as above, and preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or 2,2-difluoro It is a vinyloxy group.
  • the C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent B” in R2 of formula (1) is as defined above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group.
  • the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent B.
  • the “C3-C6 haloalkynyloxy group” in R2 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyloxy group, a 4-chloro-4,4-difluoro group.
  • R20C ( ⁇ O) — in R2 of the formula (1) (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 are each independently a hydrogen atom or a C1-C6 group optionally substituted with a substituent B1).
  • R20C ( ⁇ O) — is preferably an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, a 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, pyrrolidinylcarbonyl group, and piperidinylcarbonyl group More preferably, acetyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl
  • R20 of “R20C ( ⁇ O) O—” in R2 of the formula (1) has the same meaning as described above.
  • “R20C ( ⁇ O) O—” is preferably an acetyloxy group, a propionyloxy group, a difluoroacetyloxy group, a trifluoroacetyloxy group, a cyclopropanecarbonyloxy group, a methoxycarbonyloxy group, an ethoxycarbonyloxy group, 2 , 2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, cyclopropyloxycarbonyloxy group, aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group Group, pyrrolidinylcarbonyloxy group, and piperidinylcarbonyloxy group, more preferably acetyloxy group,
  • Shi group methoxycarbonyloxy group, ethoxycarbonyloxy group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylamino carbonyloxy groups, and diethylamino carbonyl group.
  • the “3- to 6-membered ring group containing 1 to 2 oxygen atoms” in R2 of the formula (1) has the same definition as above, and preferably an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group Or a 1,3-dioxanyl group, and more preferably a 1,3-dioxolanyl group or a 1,3-dioxanyl group.
  • R23-L2- in R2 of Formula (1) (wherein R23 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L2 represents S, SO, or SO 2 ). ) Are as defined above. “R23-L2-” is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, a trifluoromethanesulfonyl group, a (chloromethyl) thio group, or a (chloromethane) sulfinyl group.
  • chloromethane sulfonyl group, more preferably, methylthio group, methanesulfinyl group, methanesulfonyl group, (chloromethyl) thio group, (chloromethane) sulfinyl group, and (chloromethane) sulfonyl group. It is done.
  • R21 and R22 of “R21R22N-” in R2 of the formula (1) have the same meanings as described above.
  • “R21R22N—” preferably includes an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, and a piperidinyl group, and more preferably a dimethylamino group, an ethylmethylamino group, and a diethylamino group. Is mentioned.
  • R24C ( ⁇ O) N (R25) — in R2 of the formula (1) (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group) , C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are as defined above), and R25 represents hydrogen.
  • R24 is preferably a hydrogen atom, methyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy.
  • Group cyclopropyloxy group, amino group, dimethylamino group, ethylmethylamino group, diethylamino group, pyrrolidinyl group, and piperidinyl group, and more preferably a hydrogen atom, a methyl group, a difluoromethyl group, a trifluoromethyl group.
  • R25 is preferably a hydrogen atom, methyl group, ethyl group, propyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, cyanomethyl group, 2-cyanoethyl group, 2,2-difluoroethyl.
  • Group, 2,2,2-trifluoroethyl group, and cyclopropyl group more preferably hydrogen atom, methyl group, ethyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, A cyanomethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group can be mentioned.
  • N in the formula (1) is an integer of 0 to 5.
  • n 2 or more
  • two or more R2s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
  • R3 in formula (1) may be optionally substituted with a hydrogen atom, a halogen atom, a nitro group, a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, or a substituent C.
  • R3 is a hydrogen atom, a halogen atom, a C1-C6 alkyl group that may be optionally substituted with a substituent C, a C3-C8 cycloalkyl group that may be optionally substituted with a substituent C, or a substituent C as appropriate.
  • a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C is preferable.
  • the “substituent C” in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, R31R32N. -(Wherein R31 and R32 are as defined above for R21 and R22), and R30-L3- (wherein R30 is as defined above for R14, and L3 is as defined above for L1).
  • the substituent C is preferably a cyano group, a C1-C6 alkoxy group, or R30-L3- (wherein R30 and L3 are as defined above), In particular, a cyano group or a C1-C6 alkoxy group is preferable.
  • substituent C examples include a hydroxyl group; a cyano group; As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group; A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group; C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group; As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a
  • substituent C a hydroxyl group; a cyano group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group and an ethoxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group; R31R32N— (wherein R31 and R32 have the same meanings as described above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group; And R30-L3- (wherein R30 and L3 are as defined above) include
  • R3 in the formula (1) includes a hydrogen atom and a nitro group.
  • the “halogen atom” in R3 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
  • the C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with substituent C” in R3 of the formula (1) has the same definition as described above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, or a propyl group.
  • the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
  • the “C1-C6 haloalkyl group” in R3 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
  • the C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group.
  • the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
  • the C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, or an isopropyloxy group.
  • the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with the substituent C.
  • the “C1-C6 haloalkoxy group” in R3 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
  • the C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent C” in R3 of formula (1) is as defined above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group.
  • the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkenyl group” in R3 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
  • the C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as defined above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group.
  • the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
  • the “C2-C6 haloalkynyl group” in R3 of the formula (1) has the same definition as described above, and is preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
  • R30-L3- in R3 of the formula (1), R30 has the same meaning as R23, and L3 has the same meaning as L2.
  • R30-L3- preferably includes a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group. Groups, and methanesulfonyl groups.
  • R31R32N— in R3 of the formula (1) has the same meaning as R21 and R22, and is preferably an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, or A piperidinyl group, more preferably a dimethylamino group, an ethylmethylamino group, or a diethylamino group.
  • R33C ( ⁇ O) — (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group) in R3 of the formula (1).
  • Terminology is as defined above.
  • “R33C ( ⁇ O) —” preferably includes an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, and a cyclopropanecarbonyl group, and more preferably an acetyl group, a difluoroacetyl group, and a triphenyl group.
  • a fluoroacetyl group is mentioned.
  • X in the formula (1) represents an oxygen atom or a sulfur atom.
  • Preferred X is an oxygen atom.
  • Y in Formula (1) represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group.
  • the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately.
  • the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace.
  • the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0-2.
  • “Substituent D” in formula (1) is selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group Represents at least one kind.
  • the substituent D is preferably a halogen atom or a C1-C6 alkyl group, In particular, a halogen atom is preferable.
  • substituent D As a preferable specific example of the substituent D, As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom; A methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group; A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group as the C1-C6 haloalkyl group; A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group; And C1-C6 haloalkoxy groups include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-d
  • examples of the C1-C6 haloalkoxy group include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group.
  • the “substituent D1” in formula (1) is a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 And at least one selected from the group consisting of C3-C8 cycloalkoxy groups.
  • the substituent D1 is preferably a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkyl group, More preferably, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkoxy group is preferable.
  • substituent D1 a hydroxyl group;
  • a halogen atom a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom;
  • a methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group;
  • a C3-C8 cycloalkyl group a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
  • a C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group,
  • substituent D1 a hydroxyl group; A halogen atom, a fluorine atom, a chlorine atom, and a bromine atom; A methyl group and an ethyl group as the C1-C6 alkyl group; A difluoromethyl group and a trifluoromethyl group as a C1-C6 haloalkyl group; A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group; A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group; A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group; As the C3-C8 cycloalkoxy
  • Y is a phenyl group
  • Y is represented by the formula (a) (Wherein D and D1 are as defined above, and ma represents an integer of 0 to 4).
  • ma represents an integer of 0 to 4.
  • 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
  • the ortho position means the position of the phenyl group having the substituent D as shown in the formula (a).
  • the phenyl group in which the substituent D is located in the ortho position is a feature of the present invention.
  • a preferred combination of the formula (a) is a 2-D-6-D1-phenyl group, a 2-D-4-D1-phenyl group, or a 2-D-4-D1-6-D1-phenyl group.
  • 2-D-6-D1-phenyl group means a disubstituted phenyl group having a substituent D at the 2-position and a substituent D1 at the 6-position, and the following description is also the same.
  • Y is a group represented by the formula (b) (Wherein D and D1 are as defined above, and mb represents an integer of 0 to 3).
  • G1, G2, G3 and G4 in the formula (b) are each independently a carbon atom or a nitrogen atom. However, at least one of G1, G2, G3 and G4 is a nitrogen atom. Preferred G1, G2, G3 and G4 are any one of G1, G2, G3 and G4 being a nitrogen atom. That is, it is a pyridyl group.
  • mb represents an integer of 0 to 3. When mb in the formula (b) is 2 or more, 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
  • the ortho position means a 6-membered ring having a substituent D as shown in the formula (b).
  • Means the position of Specific examples of the partial structure of the formula (b) are shown below.
  • a pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group in which the substituent D is located in the ortho position is a feature of the present invention.
  • Preferred combinations of formula (b) are 3-D-2-pyridyl group, 3-D-5-D1-2-pyridyl group, 2-D-3-pyridyl group, 2-D-4-D1-3- Pyridyl group, 2-D-6-D1-3-pyridyl group, 2-D-4-D1-6-D1-3-pyridyl group, 4-D-3-pyridyl group, 4-D-2-D1- 3-pyridyl group, 4-D-6-D1-3-pyridyl group, 4-D-2-D1-6-D1-3-pyridyl group, 3-D-4-pyridyl group, or 3-D-5 -D1-4-pyridyl group.
  • Y is a group represented by the formula (c-1) Formula (c-2) Or the formula (c-3) (Wherein D and D1 are as defined above, and mc represents an integer of 0 to 2).
  • G5 and G6 in formula (c-1), formula (c-2) and formula (c-3) are each independently a carbon atom or a nitrogen atom.
  • mc represents an integer of 0 to 2.
  • D1 in 2 represents an independent substituent, and may be the same or different and arbitrarily selected can do.
  • the ortho position is represented by the formula (c-1), the formula (c-2), and the formula (c-3).
  • the thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group in which the substituent D is located in the ortho position is a feature of the present invention.
  • the bond including the broken line in Equation (1) is This represents the location represented by.
  • the bond including the broken line part in Formula (1) represents a double bond or a single bond.
  • R3 in the formula (1b) is a substituent other than hydrogen, only one of the R-form and S-form, or a mixture of the R-form and the S-form in an arbitrary ratio.
  • the compound represented by formula (1) may have one or two axial asymmetry.
  • the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by Formula (1) may contain an asymmetric atom.
  • the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by Formula (1) may contain geometric isomers.
  • the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
  • the compound represented by the formula (1) may be able to form a salt.
  • Examples include acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid and maleic acid, and metal salts such as sodium, potassium and calcium, but there is no particular limitation as long as they can be used as antifungal agents. .
  • the specific compound of the present invention is represented by a combination of the structural formula shown in Table 1, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. These compounds are for illustrative purposes, and the present invention is not limited thereto.
  • the description “2-F—” in Table 2 means that a fluorine atom is bonded to the 2-position of the phenyl group to which (R2) n is bonded, and “2-F-3”
  • the description “—HO—” means that a fluorine atom is bonded to the 2-position and a hydroxyl group is bonded to the 3-position.
  • the description of “2,3-di-F” means that the 2-position and 3 This means that a fluorine atom is bonded to the position, and other descriptions are the same.
  • R4 is a hydrogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group that may be optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent A, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent A, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent A, substituted A C2-C6 alkenyloxy group optionally substituted with the group A, a C2-C6 haloalkenyloxy group, a C3-C8
  • Production method A is a method for obtaining a compound represented by the formula (1b-a) containing the compound of the present invention and a production intermediate of the compound of the present invention, wherein the compound represented by formula (3) and R4NH 2 are obtained. , A production method comprising reacting in the presence of an acid.
  • R4NH 2 used in this reaction can be produced by obtaining or known manner as a commercially available product.
  • R4NH 2 are hydrochloric, may be those forming a salt with an acidic compound such as acetic acid, it is not particularly limited as long as the reaction proceeds to the desired.
  • R4NH 2 used in this reaction may if 1 equivalent or more relative to the compound represented by formula (3), but are not particularly limited as long as the reaction proceeds to the desired, preferably, 1 Equivalent to 200 equivalents.
  • Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid, and p-toluenesulfonic acid, and are particularly limited as long as the target reaction proceeds. Although not preferred, acetic acid is preferred. Further, when using salts with R4NH 2 and the acidic compound, the use of acid is not essential.
  • the amount of the acid used in this reaction may if 1 equivalent or more relative to the R4NH 2, is not limited in particular as long as the reaction proceeds to the desired, preferably, one or more equivalents 200 equivalent or less is there.
  • the acid to be used is a liquid, it can also be used as a solvent.
  • a solvent can be used for this reaction, it is not necessarily essential.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran, dioxane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, butyl acetate, etc.
  • Ester solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea systems such as 1,3-dimethyl-2-imidazolidinone solvent Dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the solvent is preferably an acidic solvent, more preferably acetic acid.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1b-a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b-a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the compound represented by formula (2) which can be produced when R4 represents a hydrogen atom in the compound represented by formula (1b-a), It can be a useful production intermediate for obtaining the compound represented by 1b).
  • a specific example of the production intermediate represented by the formula (2) is represented by a combination of the structural formula shown in Table 3, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. These compounds are for illustrative purposes, and the present invention is not limited thereto.
  • Lv represents a methanesulfonyl group, a trifluoromethanesulfonyl group, a p-toluenesulfonyl group, a leaving group such as a halogen atom, and R1, R2, R3, X, Y, and n are as defined above.
  • Production method B is a method for obtaining a compound represented by formula (1b), which comprises reacting the production intermediate represented by formula (2) with R1Lv in a solvent in the presence of a base. It is a manufacturing method.
  • R1Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of R1Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
  • Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, and sodium hydride, but are particularly limited as long as the intended reaction proceeds. It will never be done.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Ch
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (2). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • SR represents a sulfurizing agent
  • R1, R2, R3, Y, and n are as defined above.
  • Production method C is a production method for obtaining a compound represented by formula (1b-c) among the compounds represented by formula (1b), wherein the compound represented by formula (1b-b) is sulfurated. It is a manufacturing method including making an agent (SR) react in a solvent.
  • SR agent
  • sulfurizing agent examples include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
  • the amount of the sulfurizing agent used in this reaction may be 0.5 equivalent or more with respect to the compound represented by the formula (1b-b), and is not particularly limited as long as the target reaction proceeds. However, it is preferably 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • liquid separation operation is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b-c) obtained after the solvent is distilled off can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3a is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C2-C6 alkenyl group optionally substituted with C, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent C, or C2-C6 haloalkynyl group , Lv, R1, R2, X, Y, and n are as defined above.
  • R3a is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C.
  • R3aLv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of R3aLv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but is preferably Is 1 equivalent or more and 1.8 equivalent or less.
  • Bases used in this reaction include metal hydrides such as sodium hydride, organic lithiums such as methyl lithium, butyl lithium, sec-butyl lithium, t-butyl lithium, hexyl lithium, lithium diisopropylamide, hexamethyldisilazane
  • metal hydrides such as sodium hydride
  • organic lithiums such as methyl lithium, butyl lithium, sec-butyl lithium, t-butyl lithium, hexyl lithium, lithium diisopropylamide, hexamethyldisilazane
  • metal amides such as lithium, sodium hexamethyldisilazane, and potassium hexamethyldisilazane.
  • the amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-d). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from ⁇ 80 ° C. to 100 ° C. or the boiling point of the solvent.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent that is not compatible with water such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1b-e) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1b-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1b-e) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • Ox represents an oxidizing agent
  • R1, R2, R3, X, Y, and n are as defined above.
  • Production method E is a method for obtaining a compound represented by formula (1a), which comprises reacting a compound represented by formula (1b) with an oxidizing agent (Ox) in a solvent. is there.
  • oxidizing agent used in this reaction examples include metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile, and benzoyl peroxide.
  • the oxidizing agent is a metal oxide.
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 200 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • liquid separation operation is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the oxidizing agent is a benzoquinone.
  • the amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 20 equivalents.
  • the solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • liquid separation operation is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the oxidizing agent is a combination of a radical initiator and a halogenating agent. If the amount of the radical initiator and the halogenating agent used in this reaction is 0.01 equivalent or more and 1.0 equivalent or more with respect to the compound represented by the formula (1b), the target reaction proceeds. As long as it does, it will not specifically limit.
  • the radical initiator is 0.01 equivalent to 1 equivalent and the halogenating agent is 1 equivalent to 3 equivalent.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • halogenated benzene solvents such as chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate.
  • the solvent include halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • a solvent that is not compatible with water such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3b represents a halogen atom
  • HalR represents a halogenating agent
  • R1, R2, X, Y, and n are as defined above.
  • Production method F is a production method for obtaining a compound represented by formula (1a-b) in which R3b represents a halogen atom among the compounds represented by formula (1a), which is represented by formula (1a-a). And a halogenating agent (HalR) in a solvent.
  • selectfluoro N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-a). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
  • the halogenating agent used in this reaction is an iodinating agent
  • an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid.
  • the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1a-a), although it does not restrict
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-a). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1a-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1a-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a-b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3c is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C
  • J represents an oxygen atom or a sulfur atom
  • Q represents a hydrogen atom or a metal
  • R1, R2, R3b, X, Y, and n have the same meanings as described above.
  • R3c is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C.
  • C3-C8 cycloalkyl group C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C Or a haloalkynyl group of C2 to C6, wherein J is an oxygen atom or a sulfur atom, and is a method of synthesizing a compound represented by the formula (1a-b) A compound obtained by a coupling reaction in which R3c-JQ is reacted in the presence of a transition metal.
  • R 3b is a chlorine atom, a bromine atom, or an iodine atom.
  • R3c-JQ used in this reaction is obtained as a commercial product or can be produced by a known method.
  • Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
  • the amount of R3c-JQ used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b).
  • Q is a hydrogen atom, it can also be used as a solvent.
  • the transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • a ligand such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • the amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. None happen.
  • triphenylphosphine 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t -A phosphine ligand such as butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
  • the base used in this reaction is an inorganic base such as sodium carbonate, potassium carbonate or cesium carbonate, or an organic base such as triethylamine, tributylamine or diisopropylethylamine.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but R3c-JH (wherein R3c has the same meaning as described above and J is an oxygen atom).
  • ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, and benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. It is done.
  • ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane
  • benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. It is
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
  • the reaction mixture containing the compound represented by the formula (1a-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3d is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C Represents an optionally substituted C2-C6 alkenyl group or C2-C6 haloalkenyl group, R3d-B represents an organic boronic acid, and R1, R2, R3b, X, Y and n are as defined above. It is.
  • R3d in the compound represented by the formula (1a) is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C.
  • a compound represented by the formula (1a-d) which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, or a C2-C6 haloalkenyl group.
  • a method of synthesis comprising obtaining a compound of formula (1a-b) and an organoboronic acid (R3d-B) by a Suzuki-Miyaura coupling in the presence of a transition metal and a base Is the method.
  • R 3b is a chlorine atom, a bromine atom, or an iodine atom.
  • R3d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or produced by a known method.
  • the amount of R3d-B used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
  • the transition metals used in this reaction are palladium, nickel, ruthenium, etc., and may have a ligand.
  • Palladium is mentioned.
  • the amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. None happen.
  • phosphine ligands such as triphenylphosphine and tricyclohexylphosphine can be added.
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
  • the base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate
  • metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
  • reaction mixture containing the compound represented by the formula (1a-d) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • reaction mixture containing the compound represented by formula (1a-d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R3e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C
  • R1, R2, R3b, X, Y and n are as defined above.
  • R3e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C (1a-)
  • R 3b is a chlorine atom, a bromine atom, or an iodine atom.
  • the terminal alkyne compound used in this reaction can be obtained as a commercial product or produced by a known method. Trimethylsilylacetylene can also be used as the terminal alkyne compound. In this case, it is necessary to perform desilylation after introducing a trimethylsilylethynyl group into the compound represented by the formula (1a-b).
  • For the desilylation Journal of the American Chemical Society, Vol. 131, No. 2, pp. 634-643 (2009), Journal of the American Chemical Society. And Journal of Organometallic Chemistry (Vol. 696, No. 25, pages 4039-4045 (2011)), Journal of Organometallic Chemistry (Journal of Organometallic Chemistry). It can carry out with reference to nonpatent literatures, such as.
  • the amount of the terminal alkyne compound used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
  • the transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • a ligand such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
  • coppers such as copper chloride, copper bromide and copper iodide are also used at the same time.
  • the amount of the transition metal used in this reaction may be 0.001 equivalent or more with respect to the compound represented by the formula (1a-b) for palladium and the like, respectively, and the target reaction proceeds. There is no particular limitation as long as it does. A preferable amount is 0.001 equivalent or more and 1 equivalent or less for both.
  • Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine
  • inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
  • the organic base when it is liquid, it can be used as a solvent.
  • a phosphine ligand such as tri-t-butylphosphine or 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added to allow the reaction to proceed efficiently, but it is not essential. .
  • the amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, tri
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane.
  • these solvents can be used alone, or two or more of them can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
  • the reaction mixture containing the compound represented by the formula (1a-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1a-e) obtained after the solvent is distilled off can be purified with an appropriate solvent by washing, reprecipitation, recrystallization, column chromatography or the like. What is necessary is just to set suitably according to the target purity.
  • R2a represents a C1 to C6 alkoxy group
  • nb represents an integer of 0 to 4 (provided that when nb is 2 or more, each of R2 and 2 represents an independent substituent)
  • R1 , R2, R3, X, Y and the broken line part have the same meanings as described above.
  • Production method J is a method for synthesizing a compound represented by formula (1-b) having a hydroxyl group among the compounds represented by formula (1), wherein R2a is a C1-C6 alkoxy group ( This is a production method comprising obtaining the compound represented by 1-a) by reacting with an acid.
  • the acid used for this reaction includes boron halides such as boron trichloride and boron tribromide.
  • the amount of acid used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-a), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, and nitrile solvents such as acetonitrile. And halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-a). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from ⁇ 80 ° C. to 100 ° C. or the boiling point of the solvent.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • a desiccant such as sodium sulfate or magnesium sulfate
  • the reaction mixture containing the compound represented by the formula (1-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2b—O— is a C1-C6 alkoxy group optionally substituted with the substituent B, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy optionally substituted with the substituent B.
  • R2b—O— may be optionally substituted with a substituent B, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a substituent C3-C8 cycloalkoxy group optionally substituted with B, C2-C6 alkenyloxy group optionally substituted with substituent B, C2-C6 haloalkenyloxy group, optionally substituted with substituent B
  • a process for synthesizing a compound represented by formula (1-b) comprising reacting a compound represented by formula (1-b) with R2b-Lv in a solvent in the presence of a base.
  • R2b-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • R2b-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
  • Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride, and organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride
  • organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine.
  • organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine.
  • the base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
  • the solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Ch
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-b). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the reaction mixture containing the compound represented by the formula (1-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2c represents a halogen atom
  • R2d is a C1-C6 alkyl group optionally substituted with the substituent B, a C1-C6 haloalkyl group, a C3-C8 optionally substituted with the substituent B
  • R2d-B represents an organic boronic acid, R1, R2, R3, nb, X, Y, and the broken line are as defined above.
  • R2d is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent B which may be optionally substituted with a substituent B.
  • R2d is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent B which may be optionally substituted with a substituent B.
  • the compound represented by the formula (1-e) which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with the substituent B, or a C2-C6 haloalkenyl group.
  • a synthesis method comprising obtaining by a Suzuki-Miyaura coupling in which a compound represented by the formula (1-d) and an organic boronic acid (R2d-B) are reacted.
  • R2c is preferably a chlorine atom, a bromine atom, or an iodine atom.
  • production method H By using the compound represented by formula (1a-b) and R3d-B in production method H instead of the compound represented by formula (1-d) and R2d-B, respectively, production method H
  • the production method L can be carried out according to the above.
  • R2e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with the substituent B, and R1, R2, R2c, R3, nb, X, Y and the broken line part It is synonymous with the above.
  • R2e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with a substituent B
  • a method for synthesizing the compound represented by f which comprises obtaining the compound represented by the formula (1-d) by Sonogashira coupling with a terminal alkyne compound.
  • R2c is a chlorine atom, a bromine atom, or an iodine atom.
  • the production method M can be carried out according to the production method I. .
  • Da represents a halogen atom
  • D1a represents a halogen atom
  • D1b represents a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group
  • E represents a halogen atom.
  • R 1, R 2, R 3, n, X, Q, and a broken line part are as defined above.
  • D1b is a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group
  • E is a halogen atom.
  • D1b-Q used in this reaction can be obtained as a commercial product or can be produced by a known method.
  • Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
  • the amount of D1b-Q used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). Preferably, it is 1 equivalent or more and 30 equivalent or less. Moreover, when Q represents a hydrogen atom, it can be used as a solvent.
  • the base used in this reaction is preferably an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate or sodium hydride. Further, when Q is an alkali metal, the use of a base is not essential.
  • the amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). 1 equivalent or more and 30 equivalent or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but alcohol solvents represented by D1b-H, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, chloroform, carbon te
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-g). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-h) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
  • the reaction mixture containing the compound represented by the formula (1-h) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-h) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2e represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B
  • R2f represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B
  • R2g represents a halogen atom.
  • HalR, R1, R3, X, Y and the broken line part are as defined above.
  • R2e is a C1-C6 alkoxy group which may be appropriately substituted with the substituent B
  • R2f may be appropriately substituted with the substituent B.
  • selectfluoro N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)
  • N-chlorosuccinimide N-bromosuccinimide
  • N-iodosuccinimide 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
  • the amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-i). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
  • the halogenating agent used in this reaction is an iodinating agent
  • an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid.
  • the halogenating agent used in this reaction is an iodinating agent
  • the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1-i), and the target reaction
  • it is 0.1 equivalent or more and 3 equivalent or less.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but usually 3 to 200 times by weight with respect to the compound represented by the formula (1-i). It is as follows.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (1-j) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (1-j) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (1-j) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • La represents S
  • Lb represents SO or SO 2
  • Ox ′ represents an oxidizing agent
  • Production method P during the compound represented by formula (1) a process for the preparation of a compound represented by R1, Lb contained in R2 and R3 is SO or SO 2 wherein (Lb), the general formula In (1), this is a production method comprising reacting a compound represented by the formula (La) in which La contained in R1, R2 or R3 is S with an oxidizing agent (Ox ′) in a solvent.
  • oxidizing agent used in this reaction examples include peroxides such as hydrogen peroxide and meta-chloroperbenzoic acid.
  • transition metals such as sodium tungstate can be added.
  • the amount of the oxidizing agent used in this reaction is usually 1.0 equivalent or more and 1.2 equivalent or less with respect to the compound represented by the formula (La) when producing SO, and produces SO 2 . When doing, it is usually 2 equivalents or more and 10 equivalents or less. Moreover, when adding transition metals, it is 0.001 equivalent or more and 1 equivalent or less normally.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an aqueous solvent, an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc.
  • an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc.
  • examples thereof include benzene solvents, nitrile solvents such as acetonitrile, and halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 times the weight of the compound represented by the formula (1) having the formula (La). More than 200 weight times.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 10 ° C. or higher and 120 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid
  • An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl
  • Solvents that are not compatible with water such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add.
  • these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio.
  • the number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (Lb) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (Lb) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (Lb) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R2, R3, R5, n, X and Y have the same meanings as described above.
  • Production method Q is a production method of a production intermediate represented by formula (3), in which a compound represented by formula (4) and a compound represented by formula (5) are mixed in a solvent in the presence of a base. It is a manufacturing method including making it react with.
  • the compound represented by the formula (4) used in this reaction is, for example, Green Chemistry, Vol. 41, pages 580-585, The Journal of Organic Chemistry, No. 65, No. 20, pages 6458-6461 (2000). Etc. can be synthesized by reference.
  • the compound represented by Formula (5) used for this reaction can be obtained as a commercial product or can be produced by a known method.
  • the amount of the compound represented by the formula (5) used in this reaction is particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (4). However, it is preferably 1 equivalent or more and 3 equivalents or less.
  • the base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate
  • metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
  • the base used in this reaction can be carried out in a catalytic amount, and is not particularly limited as long as the target reaction proceeds, but preferably the compound represented by formula (4) is used. On the other hand, it is 0.01 equivalent or more and 3 equivalent or less.
  • Solvents used in this reaction are ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl -2-Urea solvents such as imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, sulfur solvents such as dimethyl sulfox
  • the amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (4). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 50 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (3) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (3) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by the formula (3) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • R5a represents a C1 to C6 alkyl group
  • R2, R3, n, X, and Y are as defined above.
  • Production method R is a production method of a production intermediate represented by formula (3b) among the compounds represented by formula (3), wherein the compound represented by formula (3a) is subjected to acidic conditions or a base. It is a manufacturing method including making it react in a solvent on sexual conditions.
  • the reaction under acidic conditions will be described.
  • the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid, and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid.
  • inorganic acids such as hydrochloric acid, hydrobromic acid, and phosphoric acid
  • organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid.
  • the amount of the acid used in this reaction may be a catalytic amount, and is not particularly limited as long as the target reaction proceeds.
  • the amount of the acid is 0. 0 with respect to the compound represented by the formula (3a). 01 equivalents or more.
  • liquid acids can be used as solvents.
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but is not limited to an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Ether solvents such as butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate and acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-d
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 0 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide, and potassium hydroxide, but are not particularly limited as long as the target reaction proceeds.
  • the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by formula (3a), but preferably 1 equivalent or more. 30 equivalents or less,
  • the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc.
  • Solvents alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitriles such as acetonitrile Solvents, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane Down, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
  • the amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
  • the temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually ⁇ 20 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
  • reaction under acidic conditions and the reaction under basic conditions can be performed by a common method.
  • a liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture.
  • an aqueous solution an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. are dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, saline, etc. are optional.
  • benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene
  • ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
  • the reaction mixture containing the compound represented by the formula (3b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
  • the reaction mixture containing the compound represented by the formula (3b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
  • the reaction mixture containing the compound represented by formula (3b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography, etc. with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
  • the compound represented by the formula (3b) is represented by the formula (3b ′) (Wherein R2, R3, n, X and Y are as defined above.)
  • the compound represented by the formula (3b ′) can be handled in the same manner as the compound represented by the formula (3b), and the production method A can be applied. Further, the compound represented by the formula (3b ′) contains an asymmetric carbon, but the isomer mixing ratio may be single or a mixture of any ratio. Further, it may be a mixture of the compound represented by the formula (3b) and the compound represented by the formula (3b ′), and the isomer mixing ratio may be a single compound or a mixture of any ratio.
  • the compound represented by the formula (1) can be produced by arbitrarily combining the production methods A to R shown above. Alternatively, the compound represented by the formula (1) can also be produced by arbitrarily combining known methods and production methods A to R.
  • fungal infection in the present invention means that “fungus” is parasitic or established in mammals (eg, humans, mice, rats, hamsters, rabbits, cats, dogs, cows, sheep, monkeys, etc.) and birds. Or it is a symptom caused as a result of infection, and is classified into superficial mycosis, deep mycosis, and deep skin mycosis according to the symptom.
  • Superficial mycosis is a mycosis caused by infection of fungi only on the surface layer of the skin of mammals and the like (corneal layer), nail, hair or squamous epithelial mucosa adjacent to the skin, for example, Various types of ringworm, melanosis, scabies, psoriasis, skin / mucosal Candida infection, malassezia fullflu infection, and the like, are not limited thereto.
  • Deep mycosis is a mycosis caused by fungus invading the subcutaneous tissue, bones, joints, internal organs, central nerves, etc. of mammals, etc. From an epidemiological and etiological point of view, It is divided into epidemic infections (import).
  • Opportunistic infections are fungal diseases in which fungi are infected to mammals with reduced immunity, such as Candida infection, Aspergillus infection, cryptococcosis, zygomycosis, tricosporin infection, pneumocystis infection, Fusarium infection, Pseudolescheria infection, Peromyces infection, Malassezia infection, Rhodotorula infection, Alternaria infection and fungal meningitis caused by these, endophthalmitis, fungal respiratory infection, fungal blood Insects, urinary tract mycoses, and the like, but are not limited thereto.
  • Local epidemic mycosis is a mycosis caused by a fungus that lives only in regions of specific geographical and climatic conditions on the earth, such as coccidioidomycosis, histoplasmosis, parasitism. Examples include, but are not limited to, coccidioidomycosis, marnefei-type penicillosis, blastosis, and the like.
  • Deep cutaneous mycosis is a mycosis caused by a specific fungus inhabiting soil or plant surface accidentally entering a living tissue through skin puncture or wound. Examples include, but are not limited to, cis schenky infection, black fungal infection, and fungal mycomas.
  • Fungi that cause fungal infections that is, pathogenic fungi that are pathogenic to mammals and the like are included in the taxonomic classification of fungi (fungi), such as ascomycetes, basidiomycetes, zygotes, and incomplete fungi.
  • fungi fungi
  • Aspergillus spp. Histoplasma spp.
  • Blastmyces spp. Is an ascomycete
  • Cryptococcus spp. Is a basidiomycete
  • Mucor spp. Mucor spp.
  • Rhizopus spp. Absidia spp.
  • fungi are classified into filamentous fungi and yeasts based on the form and appearance of cells that ingest nutrients. For example, Aspergillus spp., Mucor spp. And the like are classified as filamentous fungi, and Candida spp. Are classified as yeast.
  • Trichophyton spp. examples include Trichophyton ajelloi, Trichophyton mentagrophytes, Trichophyton tmentagrophytons, Trichophyton mentagrophytons Trichophyton terrestre, Trichophyton rubrum, Trichophyton megnini, Trichophyton le echineum (Trichophyton equinum) Iton rubrum (Trichophyton ruburum), Trichophyton Yaundei (Trichophyton yaoundei), Trichophyton Kuinkeanamu (Trichophyton quinkeanum), Trichophyton tonsurans (Trichophyton tonsurans), Trichophyton Berukosumu (Trichophyton verrucosum), Trichophyton violaceum (Trichophyton violaceum), Trichophyton ⁇ ⁇ ⁇ interdigitale, Trichophyton ⁇ soudanense; Microsporum s p.), for example, Microsporum s p.), for example, Microsporum s
  • Candida sppp For example, Epidermophyton floccosum; Candida sppp., For example, Candida la glabrata, Candida albicans, a pida, C -Candida tropicalis, Candida guilliermondii, Candida krusei, Candida kefyr, eg Malassezia flus. Asseria furfur), Malassezia pachydermatis; Scopulariopsis spp .; Scytalidium spp., for example, ), Stachylidium lignicola, and the like, but are not particularly limited thereto.
  • pathogenic fungi that cause deep mycoses include, for example, Absida spp .; Acremonium spp .; Alternaria spp .; Aspergillus spp.
  • Aspergillus clavus Aspergillus ululgis (Aspergillus ulniger), Aspergillus ulspel, Aspergillus spspel, Aspergillus spspel Rreus
  • Candida aaseri for example, Candida aaseri, Candida ⁇ albicans, Candida gilliermondi, Candida la la Candida, Candida krucei), Kanji ⁇ Candida lambica, Candida lipolytica, Candida lucidanie (Candida pastisis), Candida paraspidisis (Candida parapilisis), Candida roparopidas , Candida u rugosa, Candida ⁇ stellatoidea, Candida kefyr, Candida ro tropicalis, Candida and tropicaloids zeylanoides); Konideoborusu genus fungi (Conidiobolus spp.
  • Cryptococcus spp. For example, Cryptococcus neoformans, Cryptococcus cervidus, Cryptococcus genus Cryptococcus (Cryptococcus re terreus), Cryptococcus i unigutulatus; Fusarium spp., For example, Fusarium solani, Fusari Um oxysporum, Fusarium proliferatum, Fusarium verticilloids; a genus H Fungi (Paecilomyces spp.); Penicillium spp., Such as Penicillium marnefei; Rhizopus spp., Such as Rhizopus oryz Rhizopus microspores; Trichoderma spp .; Mucor spp., Such as Mucor Circinelloides; Fullass (Malassezia furfur), Malassezia ⁇ pachydermatis; Trichosporon ⁇ spp., For example, Trichosporon ⁇
  • Pneumocystis jeroveciii Pneumocystis carinii; for example, Rhodotorula spp., For example, Rhodotorula spil.
  • Rhodotorula spil examples thereof include, but are not limited to, Scedosporiaum apiosperum, Scedosporum prolifecans, and the like.
  • pathogenic fungi causing deep dermatomycosis include, for example, Acremonium spp .; Arthrographis spp .; Sporothrix spp. Sporothrix ch schenckii; Fonsecea spp., Such as Fonsecea pedrosoi; Exophiala spp.
  • Mysetomatis (Madurela mycetomatis); Clados Cladosporia spp., For example, Cladosporia carrionii; Phyalophora spp., For example, Phialophora verrucoz, Ruricosporum; , Rhizomucor miehei, Rhizomucor ⁇ ⁇ pusillus, and the like, but are not particularly limited thereto.
  • the “antifungal agent” means a prophylactic and / or therapeutic agent for fungal infection.
  • the compound of the present invention can be used in combination with one or more components selected from the known antifungal agents and antibacterial agents (antibiotics) described below.
  • the antifungal agents include azole antifungal agents such as fluconazole, itraconazole, phosphofluconazole, voriconazole and salts thereof, benzylamine antifungal agents such as butenafine and salts thereof, and allylamine antifungi such as terbinafine and salts thereof.
  • Agents formolin antifungal agents such as amorolfine and its salts, thiocarbamine antifungal agents such as rylanaphthalate, tolnaftate, tolsiclate and tilcyclate, miconazole, ketoconazole, clotrimazole, econazole, isoconazole, sulconazole, oxyconazole, croconazole , Bifonazole, itraconazole, thioconazole, omoconazole, sulconazole, neticonazole, ranoconazole, luliconazole and their salts
  • Anti-fungal agents such as dazole antifungal agents, echinocandin antifungal agents such as echinocandin, canine antifungal agents such as Micafungin and Caspofungin, and polyene antifungal agents such as amphotericin B, ribosome amphotericin B, and nystatin Agents,
  • the dosage form of the antifungal agent containing the compound of the present invention as an active ingredient may be oral administration or parenteral administration (for example, intravenous injection, intramuscular injection, subcutaneous administration, rectal administration, transdermal administration).
  • parenteral administration for example, intravenous injection, intramuscular injection, subcutaneous administration, rectal administration, transdermal administration.
  • the dosage form include tablets, powders, capsules, granules, extracts, syrups, coated tablets, powders, pills, fine granules, lozenges, orally administered or injections, drops, suppositories. , Ointments, creams, solutions, lotions, nasal drops, eye drops, and the like, but are not limited thereto.
  • the compound of the present invention When the compound of the present invention is administered orally or parenterally, it is not particularly limited, but in addition to the compound of the present invention, an excipient, a binder, a lubricant, a disintegrant, a coating agent, a plasticizer, Suspending or emulsifying agents, sugar-coating agents, moisture-proofing agents, fluidizing agents, surfactants, dispersing agents, tonicity agents, aqueous bases, oily bases, emulsifiers, suspending agents, emulsion stabilizers, solubilizing agents, Powder component, polymer component, adhesion improver, film forming agent, pH adjuster, antioxidant, stabilizer, preservative, preservative, shape-retaining agent, moisturizer, skin protectant, skin penetration agent, refreshing Agents, fragrances, colorants, chelating agents, lubricants, keratin softeners, blood circulation promoters, astringents, tissue repair promoters, antiperspirants, plant extract ingredients,
  • excipients include D-mannitol, lactose, sucrose, sodium chloride, sodium bicarbonate, corn starch, potato starch, wheat starch, rice starch, partially pregelatinized starch, crystalline cellulose, light anhydrous silicic acid, anhydrous calcium phosphate Precipitated calcium carbonate, calcium silicate, etc .
  • binder include povidone, dextrin, hydroxypropylcellulose, hydroxypropylmethylcellulose, hydroxyethylcellulose, hydroxypropyl starch, ethylcellulose, methylcellulose, carrageenan, polyvinyl alcohol, polyvinylpyrrolidone, carboxyvinyl polymer, gelatin, agar, copolyvidone, and purified shellac.
  • Pregelatinized starch sodium alginate, vinylpyrrolidone / vinyl acetate copolymer, pectin, polyvinyl alcohol polyethylene glycol graft copolymer, hypromellose, polyvinyl alcohol, methacrylic acid copolymer L, methacrylic acid copolymer LD, methacrylic acid copolymer S, pullulan, gum arabic
  • the lubricant include hardened oil, hardened castor oil, behenic acid glyceride, sodium stearyl fumarate, talc, titanium oxide, glycerin, glycerin fatty acid ester, wheat starch, sucrose fatty acid ester, stearyl alcohol, stearic acid and the like.
  • salts cetanol, gelatin, polyoxyethylene polyoxypropylene glycols, polysorbates, macrogols, glyceryl monostearate and sodium lauryl sulfate, etc .
  • the disintegrant include carmellose, sodium carboxymethyl starch, crospovidone, corn starch, starch, crystalline cellulose, stearic acid and salts thereof, talc, crospovidone and cellulose or derivatives thereof
  • the coating agent include hydroxypropylcellulose, hydroxypropylmethylcellulose, ethylcellulose, hydroxypropylmethylcellulose phthalate, carboxymethylethylcellulose, carmellose sodium, carmellose potassium, cellulose acetate, cellulose acetate phthalate and other cellulose derivatives such as ethyl acrylate, Methyl methacrylate copolymer dispersion, aminoalkyl methacrylate copolymer E, aminoalkyl methacrylate copolymer RS, methacryl
  • fluidizing agents include hydrous silicon dioxide, light anhydrous silicic acid, heavy anhydrous silicic acid, crystalline cellulose, synthetic aluminum silicate, magnesium alumina hydroxide, magnesium aluminate metasilicate, titanium oxide, stearic acid and salts thereof.
  • the surfactant include phospholipid, glycerin fatty acid ester, polyoxyethylene fatty acid ester, sorbitan fatty acid ester, polyethylene glycol fatty acid ester, polyoxyethylene hydrogenated castor oil, polyoxyethylene alkyl ether, sucrose fatty acid ester, lauryl sulfate Sodium, polysorbates, sodium hydrogen phosphates and potassium hydrogen phosphates, etc .
  • the dispersant include Tween 80, polyethylene glycol, carboxymethyl cellulose, sodium alginate and the like;
  • preservatives include methyl paraben, propyl paraben, benzyl alcohol, chlorobutanol, and phenol;
  • isotonic agents include sodium chloride, glycerin, sorbitol, glucose and the like;
  • the aqueous base include distilled water, physiological saline, Ringer's solution and the like
  • Examples of the polymer component include acrylic acid polymers, carboxyvinyl polymers, polysaccharides such as xanthan gum, polypeptides, and the like;
  • Examples of the tackifier include higher alcohols such as cetostearyl alcohol, polysaccharides such as acrylic acid polymer, carboxyvinyl polymer, xanthan gum, and polypeptides;
  • Examples of the film forming agent include higher alcohols such as cetostearyl alcohol, polysaccharides such as acrylic acid polymer, carboxyvinyl polymer, and xanthan gum, polypeptides, collodion, polyvinylpyrrolidone, polyvinyl alcohol, and celluloses such as nitrocellulose.
  • Examples of the pH adjuster include citric acid, phosphoric acid, lactic acid, carbonic acid, tartaric acid, stearic acid, fumaric acid, acetic acid, palmitic acid, oleic acid, amino acids, succinic acid, lactic acid and other organic acids, sodium pyrophosphate and the like.
  • Organic acid salts inorganic bases such as sodium hydroxide, organic amines such as diisopropanolamine, triethanolamine, etc .
  • antioxidants include ascorbic acid and its esters, L-cysteine, natural vitamin E, sodium edetate, cysteine hydrochloride, sodium bisulfite, dibutylhydroxytoluene, butylhydroxyanisole, ⁇ -tocopherol, erythorbic acid, pyrosulfite.
  • stabilizer include EDTA-2 sodium and the like
  • preservatives or preservatives include chlorine dioxide, quaternary ammonium compounds, cetrimide, mercury agents, alcohol agents, antibacterial esters, parabens such as chlorocresol and methylparaben, benzyl alcohol, sodium dehydroacetate, chlorobutanol, Phenol, sorbic acid, benzoic acid, etc .
  • Examples of the shape-retaining agent include plant texitoline and sucrose ester
  • humectants include saccharides such as sodium hyaluronate, sodium chondroitin sulfate, glycosyl trehalose, xylitol, sorbitol, proteins and amino acids such as collagen, arginine, hydrolyzed silk, sericin, sodium
  • Examples of skin protectants include vitamin derivatives such as sodium riboflavin phosphate, magnesium ascorbyl phosphate and cyanocobalamin, polyphenols such as glycosyl rutin, hydroxyproline such as hydroxyproline and dipalmitoylhydroxyproline, or derivatives thereof, ceramide, aminocapron Acid, stearoxymethyl polysiloxane, siloxane derivatives such as trimethylsiloxysilicic acid, glycolipids such as cerebroside, etc .;
  • Examples of skin penetrants include ethyl alcohol, 2-propanol, octylphenyl polyethylene glycol, oleic acid, polyethylene glycol, propylene glycol, and fatty acid esters;
  • Examples of the refreshing agent include mint oil, camphor, ethanol, eucalyptus oil, etc .;
  • Examples of flavoring agents include menthol, bran oil, lemon oil, orange oil and the like;
  • Examples of the colorant include edible yellow
  • tar-based dyes such as aluminum chelate, Titanium oxide, zinc oxide, talc, turmeric extract, caramel, carotene solution, beta-carotene, copper chlorophyll, copper chlorophyllin sodium, riboflavin, carbon black, medicinal charcoal, etc .
  • the chelating agent include edetate, etidronate 4 sodium, triphosphate 5 sodium, pentetate 5 sodium, etc .
  • the lubricant include silica, calcium stearate, magnesium stearate and the like
  • the keratin softener include organic acid esters such as urea and diethyl phthalate, organic acids such as lactic acid, fats and oils such as spermaceti and cholesterol
  • the blood circulation promoter include benzyl nicotinate, heparin-like substance, pepper
  • Plant extract components include aloe extract, dragonfly extract, Sakuhachi extract, peach leaf extract, gardenia leaf extract, prawn extract, grasshopper extract, hypericum extract, rice bran extract, green tea extract, licorice extract, red algae extract, clove extract , Toki extract, red pepper extract, rosemary oil, etc .
  • Animal extract components include, for example, cordyceps extract, royal jelly extract
  • additives include lactose, corn starch, sucrose, glucose, mannitol, sorbitol, crystalline cellulose, silicon dioxide, polyvinyl alcohol, polyvinyl ether, methyl cellulose, ethyl cellulose, gum arabic, tragacanth, gelatin, shellac, hydroxypropyl methylcellulose, hydroxypropyl Cellulose, polyvinyl pyrrolidone, polypropylene glyco
  • the invention also relates to a method for preventing and / or treating a fungal infection comprising administering to a subject in need thereof an effective amount of a compound of the invention.
  • the object refers to the aforementioned mammals and birds.
  • the dosage of the antifungal agent containing the compound of the present invention as an active ingredient is appropriately determined according to each case in consideration of symptoms, age of the administration subject, body weight, sex, etc., and is not particularly limited. In general, 0.1-1000 mg is appropriate for oral administration per adult and 0.01-100 mg is appropriate for parenteral administration, and this is administered once or several times a day. Since the dosage varies depending on various conditions, an amount smaller than the above dosage range may be sufficient.
  • Step 2 Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one (Compound No. 52)
  • the obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 109 mg off-white solid.
  • the resulting white solid was the title compound, 2.24 g. Further, the filtrate produced when the precipitate was washed was evaporated under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The white solid obtained from the filtrate was also the title compound, 0.46 g. 1 H-NMR (CDCl 3 ) ⁇ : 7.28-7.26 (1H, m), 7.18 (1H, br s), 6.86-6.83 (1H, m), 6.74- 6.72 (1H, m), 6.61-6.59 (2H, br m), 2.85-2.74 (4H, br m).
  • Step 2 Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one (compound Number 320)
  • Step 2 Synthesis of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
  • Step 1 Synthesis of 2- (2-chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone
  • Step 2 Synthesis of ethyl 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoate
  • Step 3 Synthesis of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid
  • Step 1 Synthesis of N ′-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonyl hydrazide
  • Step 2 Synthesis of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone
  • Step 3 Synthesis of ethyl 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
  • Step 4 Synthesis of 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
  • Step 1 Synthesis of N ′-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonyl hydrazide
  • Step 2 Synthesis of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone
  • Step 3 Synthesis of ethyl 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
  • Step 4 Synthesis of 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
  • Structure B represents the following:
  • Structure C represents:
  • Structure D represents:
  • the compound of the present invention is specifically shown to be effective for fungal infections, but is not limited to these examples.
  • Candida albicans, Cryptococcus neoformans, Aspergillus fumigatus, Fusarium solani, Fusarium oxysporum, Trichophyton rubrum, Microsporum gypse were used as test bacteria.
  • Tests were conducted using 683, 779, 816 and amphotericin B (used by dissolving in dimethyl sulfoxide). Each test compound is 0 using a test medium Roswell Park Memorial Laboratory Medium (hereinafter referred to as RPMI 1640 medium; + 3-morpholino propanesulfonic acid (final concentration 0.165 mol / mL), + glutamine, and sodium bicarbonate). Diluted to a concentration of .0005 to 32 ⁇ g / mL and tested.
  • RPMI 1640 medium Roswell Park Memorial Laboratory Medium
  • Candida albicans, Cryptococcus neoformans Sabouraud dextrose agar medium (hereinafter referred to as SDA) (pepton 10 g, glucose 40 g, Agar 15 g / L), sterilized saline containing 0.05% Tween 80 after culturing for 2 days The solution was diluted with a photometer and adjusted so that the absorbance at a wavelength of 530 nm was 0.09 to 0.22, and then diluted 50 times with a test medium to obtain an inoculum.
  • SDA Sabouraud dextrose agar medium
  • Aspergillus fumigatus Potato dextrose (hereinafter referred to as PDA) agar medium, subcultured twice at 25 ° C., and then formed conidia were diluted with sterile physiological saline containing 0.05% Tween 80 to a cell strainer of 70 ⁇ m. The conidia suspension from which the mycelium was removed was used as the inoculum.
  • Fusarium genus after shaking culture at 25 ° C. in a spore-forming medium, using a photometer to adjust the spore concentration so that the absorbance at a wavelength of 530 nm is 0.09-0.22, and then 50 times in the test medium Diluted to make an inoculum.
  • Dermatophytes (Trichophyton rubrum, Microsporum gypseum): After culturing at 25 ° C. using a high-salt medium excellent in spore formation or potato dextrose broth (hereinafter referred to as PDB), the conidia is 0.05% Tween 80 Diluted with a sterilized physiological saline solution, the mycelium was removed with a cell strainer of 70 ⁇ m. The spore suspension obtained using a photometer was adjusted to have a spore concentration of 0.09-0.22 at a wavelength of 530 nm and then diluted 50-fold with a test medium to obtain an inoculum.
  • PDB potato dextrose broth
  • test compound was diluted with RPMI 1640 medium to a predetermined concentration, and 100 ⁇ L was dispensed into each well of a 96-well microplate. Thereafter, 100 ⁇ L of the inoculum prepared for each test bacterium was dispensed into each well, and the antibacterial activity was evaluated after culturing for a predetermined period.
  • the surveys were Candida albicans and Aspergillus fumigatus after 2 days of culture, Cryptococcus neoformans, Fusarium solani and Fusarium oxyrrumum after 3 days of culture, and Trichophyton rubrum after 7 days of culture.
  • Minimum inhibitory concentration MIC of fungal growth is clearly suppressed as compared to the untreated area containing no test compound (M inimum I nhibitory C oncetration, hereinafter referred to as MIC.) was determined.
  • MIC Minimum inhibitory concentration
  • AMPH amphotericin B
  • E, H, and M each indicate that the MIC is less than 1 ppm, 1 ppm or more and less than 10 ppm, 10 ppm or more and less than 30 ppm, and ⁇ indicates that the test has not been performed.
  • Test results Table 76 shows MICs of various compounds against various test bacteria.
  • novel pyridone compound of the present invention can prevent and / or treat fungal infections, it is useful as an antifungal agent.

Abstract

An antifungal agent with excellent antifungal activity is provided. An antifungal agent is provided which contains the pyridone compound represented by formula (1), or a salt thereof, as an active component. In the formula, R1 represents an optionally substituted C1-C6 alkyl group, a C1-C6 haloalkyl group, etc., R2 represents a halogen atom, an optionally substituted C1-C6 alkyl group, an optionally substituted C1-C6 alkoxy group, etc., R3 represents a hydrogen atom, a halogen atom, an optionally substituted C1-C6 alkyl group, etc., n represents an integer 0-5, X represents an oxygen atom or a sulfur atom, Y represents a phenyl group having a substituent in an ortho position, a pyridyl group and the bond that includes the dashed line represents a double bond or a single bond.

Description

ピリドン化合物を有効成分として含有する抗真菌剤およびその使用方法Antifungal agent containing pyridone compound as active ingredient and method of use thereof
　本発明は、ピリドン化合物を有効成分として含有する抗真菌剤に関するものである。 The present invention relates to an antifungal agent containing a pyridone compound as an active ingredient.
　ヒトの感染症において、近年の抗細菌剤（抗生物質）に関する研究開発の急速な進歩により、細菌性感染症の多くが駆逐されている。一方で、真菌感染症の予防および治療に用いられる抗真菌剤に関する研究は十分には進められておらず、カンジダ症やアスペルギルス症をはじめとする真菌感染症が、高い頻度で発生し、死因に大きく関わっている。特に、免疫不全症や免疫抑制剤の使用により免疫機能が低下した患者や高齢者が真菌感染症を発症することが多く、高度に医療が発達した社会や高齢化社会において重大な脅威となっている（非特許文献１参照）。そこで、近い将来、新たな真菌感染症対策が重要な課題の一つとなると見込まれる。 In human infectious diseases, many bacterial infectious diseases have been expelled due to recent rapid progress in research and development of antibacterial agents (antibiotics). On the other hand, research on antifungal agents used for the prevention and treatment of fungal infections has not been sufficiently advanced, and fungal infections such as candidiasis and aspergillosis occur frequently and cause death. It is heavily involved. In particular, patients with impaired immune function due to the use of immunodeficiencies and immunosuppressants and elderly people often develop fungal infections, which poses a serious threat in highly medically developed and aging societies. (See Non-Patent Document 1). Therefore, in the near future, new measures against fungal infections are expected to be one of the important issues.
　従来、真菌感染症の治療に使用される抗真菌剤の分野では、フルコナゾール、イトラコナゾール等のアゾール系抗真菌剤、ブテナフィン等のベンジルアミン系抗真菌剤、テルビナフィン等のアリルアミン系抗真菌剤、アモロルフィン等のホルモリン系抗真菌剤、リラナフタート、トルナフテート等のチオカルバミン系抗真菌剤、ミコナゾール、ケトコナゾール、クロトリマゾール等のイミダゾール系抗真菌剤、エキノキャンディン等のエキノキャンディン系抗真菌剤、ミカファンギン、キャスポファンギン等のキャンディン系抗真菌剤、アンフォテイシンＢ、ナイスタチン等のポリエン系抗真菌剤、フルシトシン等のフルオピリジン系抗真菌剤、グリセオフルビン等のグリサン系抗真菌剤等の抗真菌剤が知られているが、その数は多くない。それだけに、一つでも主要な抗真菌剤に対する耐性菌が発生すると、真菌感染症の予防および治療に大きな影響を及ぼす。実際、主要な抗真菌剤に対する耐性菌の検出頻度は近年増加傾向にあり、深刻な状況に直面している（例えば、非特許文献２参照）。従って、既存の耐性菌に有効な新規の抗真菌剤の開発が望まれている。 Conventionally, in the field of antifungal agents used for the treatment of fungal infections, azole antifungal agents such as fluconazole and itraconazole, benzylamine antifungal agents such as butenafine, allylamine antifungal agents such as terbinafine, amorolfine and the like Formoline antifungal agents, thiocarbamine antifungal agents such as rilanaphthalate and tolnaftate, imidazole antifungal agents such as miconazole, ketoconazole and clotrimazole, echinocandin antifungal agents such as echinocandin, Micafungin, Antifungal agents such as candin antifungal agents such as spofungin, polyene antifungal agents such as amphoteicin B and nystatin, fluopyridine antifungal agents such as flucytosine, and glycan antifungal agents such as griseofulvin Known but not manyAs such, the emergence of resistant bacteria to any major antifungal agent has a profound effect on the prevention and treatment of fungal infections. In fact, the frequency of detection of resistant bacteria against major antifungal agents has been increasing in recent years, and faces a serious situation (for example, see Non-Patent Document 2). Therefore, development of a novel antifungal agent effective for existing resistant bacteria is desired.
　ところで、１，３，５，６－置換－２－ピリドン化合物に関して、例えば、ＧＡＢＡアルファー２／３リガンドとして、３位にアリール基またはヘテロアリール基を有する１，３，５，６－置換－２－ピリドン化合物が開示されている（例えば、国際公開第９８／５５４８０号参照）。また、細菌性感染症の治療薬として、３位にカルボキシル基を有する１，３，５，６－置換－２－ピリドン化合物が開示されている（例えば、欧州特許第０３０８０２０明細書参照）。 By the way, for 1,3,5,6-substituted-2-pyridone compounds, for example, 1,3,5,6-substituted-2 having an aryl group or heteroaryl group at the 3-position as a GABA alpha-2 / 3 ligand. -Pyridone compounds have been disclosed (see eg WO 98/55480). In addition, 1,3,5,6-substituted-2-pyridone compounds having a carboxyl group at the 3-position have been disclosed as therapeutic agents for bacterial infections (see, for example, European Patent No. 0308020).
国際公開第９８／５５４８０号International Publication No. 98/55480 欧州特許第０３０８０２０明細書EP 0308020 specification
　しかしながら、国際公開第９８／５５４８０号および欧州特許第０３０８０２０明細書に記載されている化合物の用途は、それぞれ抗精神病剤や抗細菌剤に関するものであり、本発明に係る抗真菌剤とは相違する。
　本発明の課題は、優れた抗真菌活性を有する抗真菌剤を提供することである。 However, the uses of the compounds described in WO 98/55480 and EP 0308020 are respectively related to antipsychotic agents and antibacterial agents, and are different from the antifungal agents according to the present invention. .
An object of the present invention is to provide an antifungal agent having excellent antifungal activity.
　本発明者らは、前記課題を解決すべく、１，３，５，６－置換－２－ピリドン化合物群および１，５，６－置換－２－ピリドン化合物群について鋭意検討を行った結果、当該２－ピリドン骨格中の６位に関して、オルト位に置換基を有するアリール基またはヘテロアリール基を導入した化合物群が優れた抗真菌活性を発揮することを見出し、本発明を完成するに至った。 In order to solve the above problems, the present inventors have conducted extensive studies on the 1,3,5,6-substituted-2-pyridone compound group and the 1,5,6-substituted-2-pyridone compound group. With regard to the 6-position in the 2-pyridone skeleton, it has been found that a group of compounds introduced with an aryl group or heteroaryl group having a substituent at the ortho-position exhibits excellent antifungal activity, and the present invention has been completed. .
　すなわち、本発明は、以下の通りである。
［１］
　式（１）
Figure JPOXMLDOC01-appb-C000002
［式中、Ｒ１は、水酸基、
　シアノ基、
　置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
　Ｃ１～Ｃ６のハロアルキル基、
　置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
　Ｃ２～Ｃ６のハロアルケニル基、
　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
　Ｃ２～Ｃ６のハロアルキニル基、
　置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
　Ｃ１～Ｃ６のハロアルコキシ基、
　置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、
　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、
　Ｃ２～Ｃ６のハロアルケニルオキシ基、
　置換基Ａで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、
　Ｃ３～Ｃ６のハロアルキニルオキシ基、
　またはＲ１０Ｒ１１Ｎ－（ここで、Ｒ１０およびＲ１１は、それぞれ独立していて、水素原子、またはＣ１～Ｃ６のアルキル基を表す。）を表し；
Ｒ２は、ハロゲン原子、
　水酸基、
　シアノ基、
　ニトロ基、
　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
　Ｃ１～Ｃ６のハロアルキル基、
　置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
　Ｃ２～Ｃ６のハロアルケニル基、
　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
　Ｃ２～Ｃ６のハロアルキニル基、
　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
　Ｃ１～Ｃ６のハロアルコキシ基、
　置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、
　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、
　Ｃ２～Ｃ６のハロアルケニルオキシ基、
　置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、
　Ｃ３～Ｃ６のハロアルキニルオキシ基、
　Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、それぞれ独立していて、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ２１およびＲ２２は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）を表す。）、
　Ｒ２０Ｃ（＝Ｏ）Ｏ－（ここで、Ｒ２０は、前記と同義である。）、
　１～２個の酸素原子を含む３～６員環の基、
　Ｒ２３－Ｌ２－（ここで、Ｒ２３は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ２は、Ｓ、ＳＯ、またはＳＯ２を表す。）、
　Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）、
　またはＲ２４Ｃ（＝Ｏ）Ｎ（Ｒ２５）－（ここで、Ｒ２４は、水素原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）を表し、Ｒ２５は、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）を表し；
Ｒ３は、水素原子、
　ハロゲン原子、
　ニトロ基、
　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
　Ｃ１～Ｃ６のハロアルキル基、
　置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
　Ｃ１～Ｃ６のハロアルコキシ基、
　置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
　Ｃ２～Ｃ６のハロアルケニル基、
　置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
　Ｃ２～Ｃ６のハロアルキニル基、
　Ｒ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ２３と同義であり、Ｌ３は、前記のＬ２と同義である。）、
　Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記のＲ２１およびＲ２２と同義である。）、
　またはＲ３３Ｃ（＝Ｏ）－（ここで、Ｒ３３は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）を表し；
ｎは、０～５の整数（ただし、ｎが２以上のとき、２以上のＲ２は、それぞれ独立した置換基を表す。）を表し；
Ｘは、酸素原子、または硫黄原子を表し；
Ｙは、フェニル基、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基を表し、
　該フェニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～４置換し、
　該ピリジル基、該ピラジニル基、該ピリミジニル基、該ピリダジニル基、該トリアジニル基、または該テトラジニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～３置換し、
　該チエニル基、該チアゾリル基、該イソチアゾリル基、または該チアジアゾリル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～２置換し；
破線部を含む結合は、二重結合、または単結合を表し、
　そして、置換基Ａは、
　水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｒ１２Ｒ１３Ｎ－（ここで、Ｒ１２およびＲ１３は、それぞれ独立していて、水素原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ１２およびＲ１３は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）、およびＲ１４－Ｌ１－（ここで、Ｒ１４は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ１は、Ｓ、ＳＯ、またはＳＯ２を表す。）からなる群から選択される少なくとも１種であり；
置換基Ｂは、
　水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｃ２～Ｃ６のアルコキシアルコキシ基、Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）、Ｒ２３－Ｌ２－（ここで、Ｒ２３およびＬ２は、前記と同義である。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ここで、Ｒ２６、Ｒ２７およびＲ２８は、それぞれ独立していてＣ１～Ｃ６のアルキル基を表す。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ＣＨ２）ｓ－Ｏ－（ここで、ｓは、１～３の整数を表し、Ｒ２６、Ｒ２７およびＲ２８は、前記と同義である。）、Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、前記と同義である。）、および１～２個の酸素原子を含む３～６員環の基からなる群から選択される少なくとも１種であり；
置換基Ｂ１は、
　シアノ基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、およびＣ３～Ｃ８のシクロアルコキシ基からなる群から選択される少なくとも１種であり；
置換基Ｃは、
　水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記のＲ２１およびＲ２２と同義である。）、およびＲ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ１４と同義であり、Ｌ３は、前記のＬ１と同義である。）からなる群から選択される少なくとも１種であり；
置換基Ｄは、
　ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ１～Ｃ６のアルコキシ基、およびＣ１～Ｃ６のハロアルコキシ基からなる群から選択される少なくとも１種であり；
置換基Ｄ１は、
　　水酸基、ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、およびＣ３～Ｃ８のシクロアルコキシ基からなる群から選択される少なくとも１種である。］で表される化合物、またはその塩を有効成分として含有する抗真菌剤。
［２］
　Ｒ１は、シアノ基、
　置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
　Ｃ１～Ｃ６のハロアルキル基、
　置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
　Ｃ２～Ｃ６のハロアルケニル基、
　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
　またはＲ１０Ｒ１１Ｎ－（ここで、Ｒ１０およびＲ１１は、それぞれ独立していて、水素原子、またはＣ１～Ｃ６のアルキル基を表す。）を表し；
Ｒ２は、ハロゲン原子、
　水酸基、
　シアノ基、
　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
　Ｃ１～Ｃ６のハロアルキル基、
　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
　Ｃ１～Ｃ６のハロアルコキシ基、
　置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、
　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、
　置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、
　Ｒ２０Ｃ（＝Ｏ）Ｏ－（ここで、Ｒ２０は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、それぞれ独立していて、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ２１およびＲ２２は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）、
　またはＲ２３－Ｌ２－（ここで、Ｒ２３は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ２は、Ｓ、ＳＯ、またはＳＯ２を表す。）を表し；
Ｒ３は、水素原子、
　ハロゲン原子、
　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
　置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
　置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
　またはＲ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ２３と同義であり、Ｌ３は、前記のＬ２と同義である。）を表し；
Ｙは、フェニル基、またはピリジル基を表し、
　該フェニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～４置換し、
　該ピリジル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～３置換する、［１］に記載の化合物、またはその塩を有効成分として含有する抗真菌剤。
［３］
　Ｒ１は、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し；
Ｒ２は、ハロゲン原子、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、または置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基を表し；
Ｒ３は、水素原子、ハロゲン原子、または置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基を表す、［２］に記載の化合物、またはその塩を有効成分として含有する抗真菌剤。
［４］
　［１］に記載の抗真菌剤を用いて真菌感染症を予防および／または治療する方法。
［５］
　真菌感染症を予防および／または治療する方法であって、それを必要とする対象に［１］に記載の化合物またはその塩の有効量を投与することを含む方法。
［６］
　真菌感染症が、深在性真菌症、深部皮膚真菌症、表在性真菌症から選ばれる真菌感染症である、［４］または［５］に記載の方法。
［７］
　真菌感染症が、カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）、アスペルギルス属真菌（Ａｓｐｅｒｇｉｌｌｕｓ　ｓｐｐ．）、クリプトコッカス属真菌（Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｓｐｐ．）、ミクロスポルム属真菌（Ｍｉｃｒｏｓｐｏｒｕｍ ｓｐｐ．）、トリコフィトン属真菌（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｓｐｐ．）およびフザリウム属真菌（Ｆｕｓａｒｉｕｍ ｓｐｐ．）よりなる群から選択される１種以上の真菌により引き起こされる、［６］に記載の方法。
［８］
　真菌感染症の予防および／または治療に使用するための［１］に記載の化合物またはその塩。
［９］
　真菌感染症が、深在性真菌症、深部皮膚真菌症、表在性真菌症から選ばれる真菌感染症である、［８］に記載の化合物またはその塩。
［１０］
　真菌感染症が、カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）、アスペルギルス属真菌（Ａｓｐｅｒｇｉｌｌｕｓ　ｓｐｐ．）、クリプトコッカス属真菌（Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｓｐｐ．）、ミクロスポルム属真菌（Ｍｉｃｒｏｓｐｏｒｕｍ ｓｐｐ．）、トリコフィトン属真菌（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｓｐｐ．）およびフザリウム属真菌（Ｆｕｓａｒｉｕｍ ｓｐｐ．）よりなる群から選択される１種以上の真菌により引き起こされる、［９］に記載の化合物またはその塩。 That is, the present invention is as follows.
[1]
Formula (1)
Figure JPOXMLDOC01-appb-C000002
[Wherein R1 is a hydroxyl group,
A cyano group,
A C1-C6 alkyl group optionally substituted with substituent A,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with the substituent A,
A C2-C6 alkenyl group optionally substituted with the substituent A,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent A,
A C2-C6 haloalkynyl group,
A C1-C6 alkoxy group optionally substituted with the substituent A,
A C1-C6 haloalkoxy group,
A C3-C8 cycloalkoxy group optionally substituted with the substituent A,
A C2-C6 alkenyloxy group optionally substituted with the substituent A,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group optionally substituted with the substituent A,
A C3-C6 haloalkynyloxy group,
Or R10R11N— (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
R2 is a halogen atom,
Hydroxyl group,
A cyano group,
Nitro group,
A C1-C6 alkyl group optionally substituted with the substituent B,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with the substituent B,
A C2-C6 alkenyl group optionally substituted with the substituent B,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent B,
A C2-C6 haloalkynyl group,
A C1-C6 alkoxy group optionally substituted with the substituent B,
A C1-C6 haloalkoxy group,
A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
A C2-C6 alkenyloxy group optionally substituted with the substituent B,
A C2-C6 haloalkenyloxy group,
A C3-C6 alkynyloxy group optionally substituted with the substituent B,
A C3-C6 haloalkynyloxy group,
R20C (═O) — (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, A C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, a C1-C6 Represents a haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22, together with the nitrogen atom to which they are attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Represents what is to be formed.)
R20C (═O) O— (wherein R20 has the same meaning as above),
A 3- to 6-membered group containing 1 to 2 oxygen atoms,
R23-L2- (wherein, R23 represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L2 represents S, SO, or SO 2.),
R21R22N- (wherein R21 and R22 are as defined above),
Or R24C (═O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is optionally substituted with a hydrogen atom or substituent B1. Represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, which may be
R3 is a hydrogen atom,
Halogen atoms,
Nitro group,
A C1-C6 alkyl group optionally substituted with substituent C,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with substituent C,
A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
A C1-C6 haloalkoxy group,
A C2-C6 alkenyl group optionally substituted with substituent C,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent C,
A C2-C6 haloalkynyl group,
R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above),
R31R32N- (wherein R31 and R32 have the same meanings as R21 and R22 above),
Or R33C (═O) — (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group);
n represents an integer of 0 to 5 (provided that when n is 2 or more, each R2 of 2 or more represents an independent substituent);
X represents an oxygen atom or a sulfur atom;
Y represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group;
In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately,
In the pyridyl group, the pyrazinyl group, the pyrimidinyl group, the pyridazinyl group, the triazinyl group, or the tetrazinyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace
In the thienyl group, the thiazolyl group, the isothiazolyl group, or the thiadiazolyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 2 appropriately;
A bond including a broken line part represents a double bond or a single bond,
And the substituent A is
Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R12R13N- (wherein R12 and R13 are each independently Each represents a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 together with the nitrogen atom to which they are attached, is an aziridinyl group , An azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (wherein R14 is a C1-C6 alkyl group or a C1-C6 haloalkyl group) represents a group, is selected L1 is, S, SO, or from the group consisting of.) representing the SO 2, At least one selected from;
Substituent B is
Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, C2-C6 alkoxyalkoxy group, R21R22N- R21 and R22 are as defined above), R23-L2- (where R23 and L2 are as defined above), R26R27R28Si— (wherein R26, R27 and R28 are each independently And represents an alkyl group of C1 to C6), R26R27R28Si— (CH 2 ) s—O— (wherein s represents an integer of 1 to 3, and R26, R27 and R28 are as defined above) ), R20C (═O) — (wherein R20 is as defined above), and a group of 3 to 6 membered ring containing 1 to 2 oxygen atoms. That is at least one selected from the group;
Substituent B1 is
At least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group;
Substituent C is
Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R31R32N- (wherein R31 and R32 are the same as R21 And R22), and R30-L3- (wherein R30 has the same meaning as R14 and L3 has the same meaning as L1), and at least one selected from the group consisting of Seeds;
Substituent D is
At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group;
Substituent D1 is
Hydroxyl group, halogen atom, C1-C6 alkyl group, C1-C6 haloalkyl group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, and C3-C8 cycloalkoxy group Is at least one selected from the group consisting of ] The antifungal agent which contains the compound represented by this, or its salt as an active ingredient.
[2]
R1 is a cyano group,
A C1-C6 alkyl group optionally substituted with substituent A,
A C1-C6 haloalkyl group,
A C3-C8 cycloalkyl group optionally substituted with the substituent A,
A C2-C6 alkenyl group optionally substituted with the substituent A,
A C2-C6 haloalkenyl group,
A C2-C6 alkynyl group optionally substituted with substituent A,
Or R10R11N— (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
R2 is a halogen atom,
Hydroxyl group,
A cyano group,
A C1-C6 alkyl group optionally substituted with the substituent B,
A C1-C6 haloalkyl group,
A C1-C6 alkoxy group optionally substituted with the substituent B,
A C1-C6 haloalkoxy group,
A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
A C2-C6 alkenyloxy group optionally substituted with the substituent B,
A C3-C6 alkynyloxy group optionally substituted with the substituent B,
R20C (═O) O— (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group) , C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, C1-C6 Or a cycloalkyl group of C3 to C8, or R21 and R22 together with the nitrogen atom to which they are bonded, an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group ),
Or R23-L2- (wherein, R23 represents an alkyl group or a C1 ~ C6 haloalkyl group, a C1 ~ C6, L2 is S, SO, or an SO 2.) Represents;
R3 is a hydrogen atom,
Halogen atoms,
A C1-C6 alkyl group optionally substituted with substituent C,
A C3-C8 cycloalkyl group optionally substituted with substituent C,
A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
A C2-C6 alkynyl group optionally substituted with substituent C,
Or R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above);
Y represents a phenyl group or a pyridyl group;
In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately,
The pyridyl group is a compound containing the compound or a salt thereof according to [1], wherein the substituent D is substituted at the ortho position and the substituent D1 is independently independently substituted with 0 to 3 as an active ingredient. Fungicide.
[3]
R1 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group optionally substituted with the substituent A;
R2 represents a halogen atom, a C1-C6 alkyl group optionally substituted with the substituent B, or a C1-C6 alkoxy group optionally substituted with the substituent B;
R3 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C, the antifungal agent comprising the compound according to [2] or a salt thereof as an active ingredient.
[4]
A method for preventing and / or treating a fungal infection using the antifungal agent according to [1].
[5]
A method for preventing and / or treating a fungal infection, the method comprising administering an effective amount of the compound or a salt thereof according to [1] to a subject in need thereof.
[6]
The method according to [4] or [5], wherein the fungal infection is a fungal infection selected from deep mycosis, deep cutaneous mycosis, and superficial mycosis.
[7]
Fungal infections include Candida spp., Aspergillus spp., Cryptococcus spp., Microsporum spp., Trichophyton sp. And the method of [6] caused by one or more fungi selected from the group consisting of Fusarium spp.
[8]
The compound or salt thereof according to [1] for use in the prevention and / or treatment of fungal infections.
[9]
The compound or salt thereof according to [8], wherein the fungal infection is a fungal infection selected from deep mycosis, deep cutaneous mycosis, and superficial mycosis.
[10]
Fungal infections include Candida spp., Aspergillus spp., Cryptococcus spp., Microsporum spp., Trichophyton sp. And the compound or salt thereof according to [9], caused by one or more fungi selected from the group consisting of Fusarium spp. And Fusarium spp.
　本発明の新規なピリドン化合物により、真菌感染症を予防または／および治療することができる。また、本発明のピリドン化合物を用いた方法により、真菌感染症に対する有効な予防および／または治療方法を提供することができる。  The fungal infection can be prevented or / and treated by the novel pyridone compound of the present invention. In addition, the method using the pyridone compound of the present invention can provide an effective method for preventing and / or treating fungal infections.
　以下、本発明を実施するための形態について詳細に説明する。
　なお、特許請求の範囲および明細書中において用いられる各用語は、特に断らない限り、当該技術分野において一般的に用いられる定義によるものとする。
　本明細書において、使用する略号を以下に説明する。
ＤＭＦ：Ｎ，Ｎ－ジメチルホルムアミド、ＴＨＦ：テトラヒドロフラン、Ｍｅ：メチル基、Ｅｔ：エチル基、Ｐｒ：プロピル基、Ｂｕ：ブチル基、Ｐｅｎｔｙｌ：ペンチル基、Ｈｅｘｙｌ：ヘキシル基、Ａｃ：アセチル基、Ｐｈ：フェニル基、Ｐｙ：ピリジル基、ｉ：イソ、ｓｅｃ：セカンダリ、ｔ：ターシャリ、ｃ：シクロ、＝：二重結合、≡：三重結合を表す。表のカラム中、単独の“－”は無置換を意味し、Ｐｒ、Ｂｕ、Ｐｅｎｔｙｌ、Ｈｅｘｙｌに関しては、接頭辞がない場合は、ノルマルを意味する。 Hereinafter, embodiments for carrying out the present invention will be described in detail.
It should be noted that each term used in the claims and the specification is defined according to a definition generally used in the technical field unless otherwise specified.
In the present specification, abbreviations used are described below.
DMF: N, N-dimethylformamide, THF: tetrahydrofuran, Me: methyl group, Et: ethyl group, Pr: propyl group, Bu: butyl group, Pentyl: pentyl group, Hexyl: hexyl group, Ac: acetyl group, Ph: Phenyl group, Py: pyridyl group, i: iso, sec: secondary, t: tertiary, c: cyclo, =: double bond, ≡: triple bond. In the table columns, a single “-” means no substitution, and Pr, Bu, Pentyl, and Hexyl means normal when there is no prefix.
　以下に、本明細書中に使用される用語の定義を説明する。
　Ｃｘ～Ｃｙとの記載は、ｘ個からｙ個の炭素原子を有することを表す。
　用語「適宜置換されてもよい」とは、置換または無置換であることを意味する。この用語を用いる際、置換基の数が明示されていないときは、置換基の数は１であることを表す。
　Ｃ１～Ｃ６のアルキル基とは、直鎖状または分岐状でよく、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、ｓｅｃ－ブチル基、ｔ－ブチル基、ペンチル基、イソペンチル基、２－メチルブチル基、ネオペンチル基、１－エチルプロピル基、ヘキシル基、４－メチルペンチル基、３－メチルペンチル基、２－メチルペンチル基、１－メチルペンチル基、３，３－ジメチルブチル基、２，２－ジメチルブチル基、１，１－ジメチルブチル基、１，２－ジメチルブチル基、１，３－ジメチルブチル基、２，３－ジメチルブチル基、または２－エチルブチル基等である。 The definitions of terms used in the present specification are explained below.
The description Cx-Cy has x to y carbon atoms.
The term “optionally substituted” means substituted or unsubstituted. When this term is used, the number of substituents is 1 when the number of substituents is not specified.
The C1-C6 alkyl group may be linear or branched, and is methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, t-butyl, pentyl, isopentyl. Group, 2-methylbutyl group, neopentyl group, 1-ethylpropyl group, hexyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3,3-dimethylbutyl group 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3-dimethylbutyl group, 2-ethylbutyl group and the like.
　ハロゲン原子とは、フッ素原子、塩素原子、臭素原子、またはヨウ素原子等である。 The halogen atom is a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or the like.
　Ｃ１～Ｃ６のハロアルキル基とは、前記のＣ１～Ｃ６のアルキル基における水素が１個または２個以上のハロゲン原子によって任意に置換されたものを表す。２個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。Ｃ１～Ｃ６のハロアルキル基の具体例として、モノフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、モノクロロメチル基、モノブロモメチル基、モノヨードメチル基、クロロジフルオロメチル基、ブロモジフルオロメチル基、１－フルオロエチル基、２－フルオロエチル基、１，１－ジフルオロエチル基、２，２－ジフルオロエチル基、２，２，２－トリフルオロエチル基、１，１，２，２－テトラフルオロエチル基、ペンタフルオロエチル基、２，２，２－トリクロロエチル基、３，３－ジフルオロプロピル基、３，３，３－トリフルオロプロピル基、ヘプタフルオロプロピル基、ヘプタフルオロイソプロピル基、２，２，２－トリフルオロ－１－（トリフルオロメチル）エチル基、ノナフルオロブチル基、ノナフルオロ－ｓｅｃ－ブチル基、３，３，４，４，５，５，５－ヘプタフルオロペンチル基、ウンデカフルオロペンチル基、トリデカフルオロヘキシル基等が挙げられる。 The C1-C6 haloalkyl group represents a group in which the hydrogen in the C1-C6 alkyl group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C1-C6 haloalkyl group include a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a monochloromethyl group, a monobromomethyl group, a monoiodomethyl group, a chlorodifluoromethyl group, a bromodifluoromethyl group, 1 -Fluoroethyl group, 2-fluoroethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group , Pentafluoroethyl group, 2,2,2-trichloroethyl group, 3,3-difluoropropyl group, 3,3,3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl group, 2,2,2 -Trifluoro-1- (trifluoromethyl) ethyl group, nonafluorobutyl group, nonafluoro sec- butyl group, 3,3,4,4,5,5,5-heptafluoro-pentyl group, undecyl decafluoropentyl, tridecafluorohexyl group, and the like.
　Ｃ３～Ｃ８のシクロアルキル基とは、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、またはシクロオクチル基等である。 The C3-C8 cycloalkyl group includes a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and the like.
　Ｃ２～Ｃ６のアルケニル基とは、１個もしくは２個以上の二重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。また、幾何異性体がある場合、Ｅ体またはＺ体のどちらか一方のみ、あるいはＥ体とＺ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に限定されることはない。Ｃ２～Ｃ６のアルケニル基の具体例として、ビニル基、１－プロペニル基、アリル基、１－ブテニル基、２－ブテニル基、３－ブテニル基、１－ペンテニル基、２－ペンテニル基、３－ペンテニル基、４－ペンテニル基、３－メチル－２－ブテニル基、１－ヘキセニル基、２－ヘキセニル基、３－ヘキセニル基、４－ヘキセニル基、５－ヘキセニル基、４－メチル－３－ペンテニル基、３－メチル－２－ペンテニル基等が挙げられる。 The C2-C6 alkenyl group represents an unsaturated hydrocarbon group which has one or more double bonds and is linear or branched. In addition, when there is a geometric isomer, only one of E-form and Z-form, or a mixture of E-form and Z-form in an arbitrary ratio, it is particularly limited as long as it is in the range of the designated carbon number. Never happen. Specific examples of C2 to C6 alkenyl groups include vinyl, 1-propenyl, allyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-pentenyl, 2-pentenyl, and 3-pentenyl. Group, 4-pentenyl group, 3-methyl-2-butenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group, 4-methyl-3-pentenyl group, And 3-methyl-2-pentenyl group.
　Ｃ２～Ｃ６のハロアルケニル基とは、前記のＣ２～Ｃ６のアルケニル基における水素原子が１個または２個以上のハロゲン原子によって任意に置換されたものを表す。２個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。Ｃ２～Ｃ６のハロアルケニル基の具体例として、２－フルオロビニル基、２，２－ジフルオロビニル基、２，２－ジクロロビニル基、３－フルオロアリル基、３，３－ジフルオロアリル基、３，３－ジクロロアリル基、４，４－ジフルオロ－３－ブテニル基、５，５－ジフルオロ－４－ペンテニル基、６，６－ジフルオロ－５－ヘキセニル基等が挙げられる。 The C2-C6 haloalkenyl group represents a group in which the hydrogen atom in the C2-C6 alkenyl group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkenyl group include 2-fluorovinyl group, 2,2-difluorovinyl group, 2,2-dichlorovinyl group, 3-fluoroallyl group, 3,3-difluoroallyl group, 3, Examples include 3-dichloroallyl group, 4,4-difluoro-3-butenyl group, 5,5-difluoro-4-pentenyl group, 6,6-difluoro-5-hexenyl group and the like.
　Ｃ２～Ｃ６のアルキニル基とは、１個もしくは２個以上の三重結合を有し、直鎖状または分岐状である不飽和炭化水素基のものを表す。Ｃ２～Ｃ６のアルキニル基の具体例として、エチニル基、１－プロピニル基、プロパルギル基、１－ブチニル基、２－ブチニル基、３－ブチニル基、１－ペンチニル基、２－ペンチニル基、３－ペンチニル基、４－ペンチニル基、１，１－ジメチル－２－プロピニル基、１－ヘキシニル基、２－ヘキシニル基、３－ヘキシニル基、４－ヘキシニル基、５－ヘキシニル基等が挙げられる。 The C2-C6 alkynyl group represents an unsaturated hydrocarbon group having one or more triple bonds and being linear or branched. Specific examples of the C2-C6 alkynyl group include ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, and 3-pentynyl. Group, 4-pentynyl group, 1,1-dimethyl-2-propynyl group, 1-hexynyl group, 2-hexynyl group, 3-hexynyl group, 4-hexynyl group, 5-hexynyl group and the like.
　Ｃ２～Ｃ６のハロアルキニル基とは、前記のＣ２～Ｃ６のアルキニル基における水素原子が１個または２個以上のハロゲン原子によって任意に置換されたものを表す。２個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。Ｃ２～Ｃ６のハロアルキニル基の具体例として、２－フルオロエチニル基、２－クロロエチニル基、２－ブロモエチニル基、２－ヨードエチニル基、３，３－ジフルオロ－１－プロピニル基、３－クロロ－３，３－ジフルオロ－１－プロピニル基、３－ブロモ－３，３－ジフルオロ－１－プロピニル基、３，３，３－トリフルオロ－１－プロピニル基、４，４－ジフルオロ－１－ブチニル基、４，４－ジフルオロ－２－ブチニル基、４－クロロ－４，４－ジフルオロ－１－ブチニル基、４－クロロ－４，４－ジフルオロ－２－ブチニル基、４－ブロモ－４，４－ジフルオロ－１－ブチニル基、４－ブロモ－４，４－ジフルオロ－２－ブチニル基、４，４，４－トリフルオロ－１－ブチニル基、４，４，４－トリフルオロ－２－ブチニル基、５，５－ジフルオロ－３－ペンチニル基、５－クロロ－５，５－ジフルオロ－３－ペンチニル基、５－ブロモ－５，５－ジフルオロ－３－ペンチニル基、５，５，５－トリフルオロ－３－ペンチニル基、６，６－ジフルオロ－４－ヘキシニル基、６－クロロ－６，６－ジフルオロ－４－ヘキシニル基、６－ブロモ－６，６－ジフルオロ－４－ヘキシニル基、６，６，６－トリフルオロ－４－ヘキシニル基等が挙げられる。 The C2-C6 haloalkynyl group represents a group in which the hydrogen atom in the C2-C6 alkynyl group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkynyl group include 2-fluoroethynyl group, 2-chloroethynyl group, 2-bromoethynyl group, 2-iodoethynyl group, 3,3-difluoro-1-propynyl group, 3-chloro -3,3-difluoro-1-propynyl group, 3-bromo-3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 4,4-difluoro-1-butynyl Group, 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro-1-butynyl group, 4-chloro-4,4-difluoro-2-butynyl group, 4-bromo-4,4 -Difluoro-1-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, 4,4,4-trifluoro-2-butynyl group 5 5-difluoro-3-pentynyl group, 5-chloro-5,5-difluoro-3-pentynyl group, 5-bromo-5,5-difluoro-3-pentynyl group, 5,5,5-trifluoro-3- Pentynyl group, 6,6-difluoro-4-hexynyl group, 6-chloro-6,6-difluoro-4-hexynyl group, 6-bromo-6,6-difluoro-4-hexynyl group, 6,6,6- And a trifluoro-4-hexynyl group.
　Ｃ１～Ｃ６のアルコキシ基とは、前記のＣ１～Ｃ６のアルキル基が酸素原子を介して結合したものを表す。Ｃ１～Ｃ６のアルコキシ基として、具体的には、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、ｓｅｃ－ブトキシ基、ｔ－ブトキシ基、ペンチルオキシ基、イソペンチルオキシ基、２－メチルブトキシ基、ネオペンチルオキシ基、１－エチルプロピルオキシ基、ヘキシルオキシ基、４－メチルペンチルオキシ基、３－メチルペンチルオキシ基、２－メチルペンチルオキシ基、１－メチルペンチルオキシ基、３，３－ジメチルブトキシ基、２，２－ジメチルブトキシ基、１，１－ジメチルブトキシ基、１，２－ジメチルブトキシ基、１，３－ジメチルブトキシ基、２，３－ジメチルブトキシ基、および２－エチルブトキシ基等が挙げられる。 The C1-C6 alkoxy group represents a group in which the C1-C6 alkyl group is bonded via an oxygen atom. Specific examples of the C1-C6 alkoxy group include a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, a sec-butoxy group, a t-butoxy group, a pentyloxy group, and an isopentyloxy group. Group, 2-methylbutoxy group, neopentyloxy group, 1-ethylpropyloxy group, hexyloxy group, 4-methylpentyloxy group, 3-methylpentyloxy group, 2-methylpentyloxy group, 1-methylpentyloxy group Group, 3,3-dimethylbutoxy group, 2,2-dimethylbutoxy group, 1,1-dimethylbutoxy group, 1,2-dimethylbutoxy group, 1,3-dimethylbutoxy group, 2,3-dimethylbutoxy group, And 2-ethylbutoxy group.
　Ｃ１～Ｃ６のハロアルコキシ基とは、前記のＣ１～Ｃ６のアルコキシ基における水素原子が１個または２個以上のハロゲン原子によって任意に置換されたものを表す。２個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。Ｃ１～Ｃ６のハロアルコキシ基の具体例として、ジフルオロメトキシ基、トリフルオロメトキシ基、クロロジフルオロメトキシ基、ブロモジフルオロメトキシ基、２－フルオロエトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、１，１，２，２－テトラフルオロエトキシ基、ペンタフルオロエトキシ基、２，２，２－トリクロロエトキシ基、３，３－ジフルオロプロピルオキシ基、３，３，３－トリフルオロプロピルオキシ基、ヘプタフルオロプロピルオキシ基、ヘプタフルオロイソプロピルオキシ基、２，２，２－トリフルオロ－１－（トリフルオロメチル）－エトキシ基、ノナフルオロブトキシ基、ノナフルオロ－ｓｅｃ－ブトキシ基、３，３，４，４，５，５，５－ヘプタフルオロペンチルオキシ基、ウンデカフルオロペンチルオキシ基、トリデカフルオロヘキシルオキシ基等が挙げられる。 The C1-C6 haloalkoxy group represents a group in which the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C1-C6 haloalkoxy group include difluoromethoxy group, trifluoromethoxy group, chlorodifluoromethoxy group, bromodifluoromethoxy group, 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2 -Trifluoroethoxy group, 1,1,2,2-tetrafluoroethoxy group, pentafluoroethoxy group, 2,2,2-trichloroethoxy group, 3,3-difluoropropyloxy group, 3,3,3-tri Fluoropropyloxy group, heptafluoropropyloxy group, heptafluoroisopropyloxy group, 2,2,2-trifluoro-1- (trifluoromethyl) -ethoxy group, nonafluorobutoxy group, nonafluoro-sec-butoxy group, 3 , 3,4,4,5,5,5-heptafluoropentyloxy group Undecafluoro pentyloxy group, tridecafluorohexyl group, and the like.
　Ｃ３～Ｃ８のシクロアルコキシ基とは、前記のＣ３～Ｃ８のシクロアルキル基が酸素原子を介して結合したものを表す。Ｃ３～Ｃ８のシクロアルコキシ基として、具体的には、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基、シクロヘプチルオキシ基、およびシクロオクチルオキシ基等が挙げられる。 The C3-C8 cycloalkoxy group represents a group in which the C3-C8 cycloalkyl group is bonded via an oxygen atom. Specific examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group.
　Ｃ２～Ｃ６のアルケニルオキシ基とは、前記のＣ２～Ｃ６のアルケニル基が酸素原子を介して結合したものを表す。また、幾何異性体がある場合、Ｅ体またはＺ体のどちらか一方のみ、あるいはＥ体とＺ体との任意の割合の混合物であり、指定される炭素数の範囲であれば、特に制限されることはない。Ｃ２～Ｃ６のアルケニルオキシ基の具体例として、ビニルオキシ基、１－プロペニルオキシ基、アリルオキシ基、１－ブテニルオキシ基、２－ブテニルオキシ基、３－ブテニルオキシ基、１－ペンテニルオキシ基、２－ペンテニルオキシ基、３－ペンテニルオキシ基、４－ペンテニルオキシ基、３－メチル－２－ブテニルオキシ基、１－ヘキセニルオキシ基、２－ヘキセニルオキシ基、３－ヘキセニルオキシ基、４－ヘキセニルオキシ基、５－ヘキセニルオキシ基、４－メチル－３－ペンテニルオキシ基、３－メチル－２－ペンテニルオキシ基等が挙げられる。 The C2-C6 alkenyloxy group is a group in which the C2-C6 alkenyl group is bonded through an oxygen atom. In addition, when there is a geometric isomer, only one of E-form and Z-form, or a mixture of E-form and Z-form in an arbitrary ratio, is not particularly limited as long as it is within the specified carbon number range. Never happen. Specific examples of the C2-C6 alkenyloxy group include vinyloxy group, 1-propenyloxy group, allyloxy group, 1-butenyloxy group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group 3-pentenyloxy group, 4-pentenyloxy group, 3-methyl-2-butenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3-hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group Group, 4-methyl-3-pentenyloxy group, 3-methyl-2-pentenyloxy group and the like.
　Ｃ２～Ｃ６のハロアルケニルオキシ基とは、前記のＣ２～Ｃ６のアルケニルオキシ基における水素原子が１個または２個以上のハロゲン原子によって任意に置換されたものを表す。２個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。Ｃ２～Ｃ６のハロアルケニルオキシ基の具体例として、２－フルオロビニルオキシ基、２，２－ジフルオロビニルオキシ基、２，２－ジクロロビニルオキシ基、３－フルオロアリルオキシ基、３，３－ジフルオロアリルオキシ基、３，３－ジクロロアリルオキシ基、４，４－ジフルオロ－３－ブテニルオキシ基、５，５－ジフルオロ－４－ペンテニルオキシ基、６，６－ジフルオロ－５－ヘキセニルオキシ基等が挙げられる。 The C2-C6 haloalkenyloxy group represents a group in which the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C2-C6 haloalkenyloxy group include 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 2,2-dichlorovinyloxy group, 3-fluoroallyloxy group, 3,3-difluoro. Allyloxy group, 3,3-dichloroallyloxy group, 4,4-difluoro-3-butenyloxy group, 5,5-difluoro-4-pentenyloxy group, 6,6-difluoro-5-hexenyloxy group, etc. It is done.
　Ｃ３～Ｃ６のアルキニルオキシ基とは、前記のＣ２～Ｃ６のアルキニル基のうち、Ｃ３～Ｃ６のアルキニル基が酸素原子を介して結合したのものを表す。Ｃ３～Ｃ６のアルキニルオキシ基の具体例として、プロパルギルオキシ基、２－ブチニルオキシ基、３－ブチニルオキシ基、２－ペンチニルオキシ基、３－ペンチニルオキシ基、４－ペンチニルオキシ基、１，１－ジメチル－２－プロピニルオキシ基、２－ヘキシニルオキシ基、３－ヘキシニルオキシ基、４－ヘキシニルオキシ基、５－ヘキシニルオキシ基等が挙げられる。 The C3-C6 alkynyloxy group represents a group in which the C3-C6 alkynyl group is bonded through an oxygen atom among the C2-C6 alkynyl groups. Specific examples of the C3-C6 alkynyloxy group include propargyloxy group, 2-butynyloxy group, 3-butynyloxy group, 2-pentynyloxy group, 3-pentynyloxy group, 4-pentynyloxy group, 1,1 -Dimethyl-2-propynyloxy group, 2-hexynyloxy group, 3-hexynyloxy group, 4-hexynyloxy group, 5-hexynyloxy group and the like.
　Ｃ３～Ｃ６のハロアルキニルオキシ基とは、前記のＣ３～Ｃ６のアルキニルオキシ基における水素原子が１個または２個以上のハロゲン原子によって任意に置換されたものを表す。２個以上のハロゲン原子で置換される場合、それらのハロゲン原子は同一または異なっていてよく、その置換数は置換基として存在することができる限り特に制限はない。Ｃ３～Ｃ６のハロアルキニルオキシ基の具体例として、１，１－ジフルオロ－２－プロピニルオキシ基、４，４－ジフルオロ－２－ブチニルオキシ基、４－クロロ－４，４－ジフルオロ－２－ブチニルオキシ基、４－ブロモ－４，４－ジフルオロ－２－ブチニルオキシ基、４，４，４－トリフルオロ－２－ブチニルオキシ基、５，５－ジフルオロ－３－ペンチニルオキシ基、５－クロロ－５，５－ジフルオロ－３－ペンチニルオキシ基、５－ブロモ－５，５－ジフルオロ－３－ペンチニルオキシ基、５，５，５－トリフルオロ－３－ペンチニルオキシ基、６，６－ジフルオロ－４－ヘキシニルオキシ基、６－クロロ－６，６－ジフルオロ－４－ヘキシニルオキシ基、６－ブロモ－６，６－ジフルオロ－４－ヘキシニルオキシ基、６，６，６－トリフルオロ－４－ヘキシニルオキシ基等が挙げられる。 The C3-C6 haloalkynyloxy group represents a group in which the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted with one or more halogen atoms. When substituted with two or more halogen atoms, the halogen atoms may be the same or different, and the number of substitutions is not particularly limited as long as it can be present as a substituent. Specific examples of the C3-C6 haloalkynyloxy group include 1,1-difluoro-2-propynyloxy group, 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4-difluoro-2-butynyloxy group 4-bromo-4,4-difluoro-2-butynyloxy group, 4,4,4-trifluoro-2-butynyloxy group, 5,5-difluoro-3-pentynyloxy group, 5-chloro-5,5 -Difluoro-3-pentynyloxy group, 5-bromo-5,5-difluoro-3-pentynyloxy group, 5,5,5-trifluoro-3-pentynyloxy group, 6,6-difluoro-4 -Hexynyloxy group, 6-chloro-6,6-difluoro-4-hexynyloxy group, 6-bromo-6,6-difluoro-4-hexynyloxy group, 6,6,6- Trifluoroacetic 4- hexynyloxy group.
　Ｃ２～Ｃ６のアルコキシアルコキシ基とは、前記のＣ１～Ｃ６のアルコキシ基のうちＣ１～Ｃ５のアルコシキ基における水素原子が、１個または２個以上のＣ１～Ｃ５アルコキシ基で任意に置換されたものを表す。炭素数の総和が指定される炭素数の範囲であれば、特に限定されることはない。Ｃ２～Ｃ６のアルコキシアルコキシ基の具体例として、メトキシメトキシ基、エトキシメトキシ基、プロピルオキシメトキシ基、イソプロピルオキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、プロピルオキシエトキシ基、イソプロピルオキシエトキシ基、メトキシプロピルオキシ基、エトキシプロピルオキシ基、プロピルオキシプロピルオキシ基、イソプロピルオキシプロピルオキシ基等が挙げられる。 The C2-C6 alkoxyalkoxy group is a group in which the hydrogen atom in the C1-C5 alkoxy group in the C1-C6 alkoxy group is optionally substituted with one or more C1-C5 alkoxy groups Represents. There is no particular limitation as long as the total number of carbon atoms is within the specified carbon number range. Specific examples of C2-C6 alkoxyalkoxy groups include methoxymethoxy, ethoxymethoxy, propyloxymethoxy, isopropyloxymethoxy, methoxyethoxy, ethoxyethoxy, propyloxyethoxy, isopropyloxyethoxy, methoxypropyl Examples thereof include an oxy group, an ethoxypropyloxy group, a propyloxypropyloxy group, and an isopropyloxypropyloxy group.
　１～２個の酸素原子を含む３～６員環の基の具体例として、１，２－エポキシエタニル基、オキセタニル基、オキソラニル基、オキサニル基、１，３－ジオキソラニル基、１，３－ジオキサニル基、１，４－ジオキサニル基等が挙げられる。 Specific examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include 1,2-epoxyethanyl group, oxetanyl group, oxolanyl group, oxanyl group, 1,3-dioxolanyl group, 1,3- Examples thereof include a dioxanyl group and a 1,4-dioxanyl group.
　本発明のピリドン化合物は、下記式（１）で表される化合物とその塩（以下、単に式（１）で表される化合物、本発明化合物と呼ぶことがある）を包含する。 The pyridone compound of the present invention includes a compound represented by the following formula (1) and a salt thereof (hereinafter simply referred to as a compound represented by the formula (1) or the present compound).
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
　以下、式（１）について説明する。
　式（１）のＲ１は、水酸基、シアノ基、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、Ｃ２～Ｃ６のハロアルキニル基、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、Ｃ２～Ｃ６のハロアルケニルオキシ基、置換基Ａで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、Ｃ３～Ｃ６のハロアルキニルオキシ基、またはＲ１０Ｒ１１Ｎ－（ここで、Ｒ１０およびＲ１１は、それぞれ独立していて、水素原子、またはＣ１～Ｃ６のアルキル基を表す。）を表す。 Hereinafter, Formula (1) is demonstrated.
R1 in the formula (1) is a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-C8 optionally substituted with a substituent A. A C2-C6 alkenyl group optionally substituted with a substituent A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent A, C2-C6 Haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent A, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent A, substituent C2-C6 alkenyloxy group optionally substituted with A, C2-C6 haloalkenyloxy group, C3-C6 alkynyloxy group optionally substituted with substituent A, C3-C6 Halo alkynyloxy group, or R10R11N- (wherein, R10, and R11 are each independent represent. A hydrogen atom or an alkyl group C1 ~ C6,) represents a.
　中でもＲ１は、シアノ基、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＲ１０Ｒ１１Ｎ－（ここで、Ｒ１０およびＲ１１は、前記と同義である。）が好ましく、
　特に、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基が好ましい。 Among them, R1 is a cyano group, a C1-C6 alkyl group optionally substituted with the substituent A, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with the substituent A, a substituted group. A C2-C6 alkenyl group optionally substituted with a group A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent A, or R10R11N- (where R10 and R11 is as defined above.)
In particular, a C1-C6 alkyl group or a C1-C6 haloalkyl group which may be optionally substituted with the substituent A is preferable.
　式（１）の「置換基Ａ」とは、水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｒ１２Ｒ１３Ｎ－（ここで、Ｒ１２およびＲ１３は、それぞれ独立していて、水素原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ１２およびＲ１３は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）、およびＲ１４－Ｌ１－（ここで、Ｒ１４は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ１は、Ｓ、ＳＯ、またはＳＯ２を表す。）からなる群から選択される少なくとも１種を表す。 The “substituent A” in the formula (1) is a hydroxyl group, a cyano group, a C3 to C8 cycloalkyl group, a C1 to C6 alkoxy group, a C1 to C6 haloalkoxy group, a C3 to C8 cycloalkoxy group, R12R13N. -(Wherein R12 and R13 are each independently a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 are , Together with the nitrogen atom to which it is attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (where R14 is represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L1 is, S, SO, or SO 2 Represents at least one selected from the group consisting of:
　中でも置換基Ａは、シアノ基、Ｃ１～Ｃ６のアルコキシ基、またはＲ１４－Ｌ１－（ここで、Ｒ１４およびＬ１は、前記と同義である。）が好ましく、
　特に、シアノ基、またはＣ１～Ｃ６のアルコキシ基が好ましい。 Among them, the substituent A is preferably a cyano group, a C1-C6 alkoxy group, or R14-L1- (wherein R14 and L1 are as defined above),
In particular, a cyano group or a C1-C6 alkoxy group is preferable.
　置換基Ａの好ましい具体例として、水酸基；シアノ基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、および３，３，３－トリフルオロプロピルオキシ基；
Ｃ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基；
Ｒ１２Ｒ１３Ｎ－（ここで、Ｒ１２およびＲ１３は、前記と同義である。）として、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基；
ならびにＲ１４－Ｌ１－（ここで、Ｒ１４およびＬ１は、前記と同義である。）として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基が挙げられる。 Preferred specific examples of the substituent A include a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
R12R13N— (wherein R12 and R13 have the same meanings as described above), an amino group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group;
And R14-L1- (wherein R14 and L1 are as defined above), a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group Can be mentioned.
　置換基Ａのさらに好ましい具体例として、水酸基；シアノ基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、およびシクロブチル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、およびエトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、および２，２，２－トリフルオロエトキシ基；
Ｃ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基；
Ｒ１２Ｒ１３Ｎ－（ここで、Ｒ１２およびＲ１３は、前記と同義である。）として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基；
ならびにＲ１４－Ｌ１－（ここで、Ｒ１４およびＬ１は、前記と同義である。）として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基が挙げられる。 As more preferred specific examples of the substituent A, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group;
R12R13N- (wherein R12 and R13 have the same meanings as described above), dimethylamino group, ethylmethylamino group, and diethylamino group;
And R14-L1- (wherein R14 and L1 are as defined above) include a methylthio group, a methanesulfinyl group, and a methanesulfonyl group.
　式（１）のＲ１には、水酸基、およびシアノ基が含まれる。
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基」のＣ１～Ｃ６のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、またはエチル基である。置換基Ａを有する場合、Ｃ１～Ｃ６のアルキル基における水素原子が、置換基Ａによって任意に置換される。 R1 in the formula (1) includes a hydroxyl group and a cyano group.
The C1-C6 alkyl group of the “C1-C6 alkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group or an ethyl group. In the case of having the substituent A, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent A.
　式（１）のＲ１における「Ｃ１～Ｃ６のハロアルキル基」は、前記の定義と同義であり、好ましくは、２－フルオロエチル基、２，２－ジフルオロエチル基、２，２，２－トリフルオロエチル基、３，３－ジフルオロプロピル基、または３，３，３－トリフルオロプロピル基であり、さらに好ましくは、２－フルオロエチル基、２，２－ジフルオロエチル基、または２，２，２－トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R1 of the formula (1) has the same definition as described above, preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, a 2,2,2-trifluoro group. An ethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, and more preferably a 2-fluoroethyl group, a 2,2-difluoroethyl group, or a 2,2,2- A trifluoroethyl group.
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基」のＣ３～Ｃ８のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Ａを有する場合、Ｃ３～Ｃ８のシクロアルキル基における水素原子が、置換基Ａによって任意に置換される。 The C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. In the case of having the substituent A, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent A.
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基」のＣ２～Ｃ６のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、１－プロペニル基、またはアリル基であり、さらに好ましくは、ビニル基、またはアリル基である。置換基Ａを有する場合、Ｃ２～Ｃ６のアルケニル基における水素原子が、置換基Ａによって任意に置換される。 The C2-C6 alkenyl group of the “C2-C6 alkenyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a vinyl group, 1- It is a propenyl group or an allyl group, more preferably a vinyl group or an allyl group. In the case of having the substituent A, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent A.
　式（１）のＲ１における「Ｃ２～Ｃ６のハロアルケニル基」は、前記の定義と同義であり、好ましくは、２－フルオロビニル基、２，２－ジフルオロビニル基、３－フルオロアリル基、または３，３－ジフルオロアリル基であり、さらに好ましくは、２－フルオロビニル基、または２，２－ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” in R1 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 3-fluoroallyl group, or A 3,3-difluoroallyl group, more preferably a 2-fluorovinyl group or a 2,2-difluorovinyl group.
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基」のＣ２～Ｃ６のアルキニル基は、前記の定義と同義であり、好ましくは、プロパルギル基、２－ブチニル基、または３－ブチニル基であり、さらに好ましくは、プロパルギル基である。置換基Ａを有する場合、Ｃ２～Ｃ６のアルキニル基における水素原子が、置換基Ａによって任意に置換される。 The C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent A” in R1 of the formula (1) has the same meaning as defined above, preferably a propargyl group, 2- It is a butynyl group or a 3-butynyl group, more preferably a propargyl group. In the case of having the substituent A, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent A.
　式（１）のＲ１における「Ｃ２～Ｃ６のハロアルキニル基」は、前記の定義と同義であり、好ましくは、４，４－ジフルオロ－２－ブチニル基、４－クロロ－４，４－ジフルオロ－２－ブチニル基、４－ブロモ－４，４－ジフルオロ－２－ブチニル基、または４，４，４－トリフルオロ－２－ブチニル基であり、さらに好ましくは、４，４－ジフルオロ－２－ブチニル基、または４，４，４－トリフルオロ－２－ブチニル基である。 The “C2-C6 haloalkynyl group” in R1 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyl group, 4-chloro-4,4-difluoro- 2-butynyl group, 4-bromo-4,4-difluoro-2-butynyl group or 4,4,4-trifluoro-2-butynyl group, more preferably 4,4-difluoro-2-butynyl Or a 4,4,4-trifluoro-2-butynyl group.
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基」のＣ１～Ｃ６のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、またはエトキシ基である。置換基Ａを有する場合、Ｃ１～Ｃ６のアルコキシ基における水素原子が、置換基Ａによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group or an ethoxy group. In the case of having the substituent A, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent A.
　式（１）のＲ１における「Ｃ１～Ｃ６のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、または３，３，３－トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、または２，２，２－トリフルオロエトキシ基である。 The “C1-C6 haloalkoxy group” in R1 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基」のＣ３～Ｃ８のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Ａを有する場合、Ｃ３～Ｃ８のシクロアルコキシ基における水素原子が、置換基Ａによって任意に置換される。 The C3-C8 cycloalkoxy group in the “C3-C8 cycloalkoxy group optionally substituted with the substituent A” in R1 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. In the case of having the substituent A, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted with the substituent A.
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基」のＣ２～Ｃ６のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、１－プロペニルオキシ基、またはアリルオキシ基であり、さらに好ましくは、ビニルオキシ基である。置換基Ａを有する場合、Ｃ２～Ｃ６のアルケニルオキシ基における水素原子が、置換基Ａによって任意に置換される。 The C2-C6 alkenyloxy group of “C2-C6 alkenyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a vinyloxy group, It is a 1-propenyloxy group or an allyloxy group, and more preferably a vinyloxy group. In the case of having the substituent A, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent A.
　式（１）のＲ１における「Ｃ２～Ｃ６のハロアルケニルオキシ基」とは、前記の定義と同義であり、好ましくは、２－フルオロビニルオキシ基、２，２－ジフルオロビニルオキシ基、３－フルオロアリルオキシ基、または３，３－ジフルオロアリルオキシ基であり、さらに好ましくは、２－フルオロビニルオキシ基、または２，２－ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” in R1 of the formula (1) has the same definition as above, preferably 2-fluorovinyloxy group, 2,2-difluorovinyloxy group, 3-fluoro An allyloxy group or a 3,3-difluoroallyloxy group, more preferably a 2-fluorovinyloxy group or a 2,2-difluorovinyloxy group.
　式（１）のＲ１における「置換基Ａで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基」のＣ３～Ｃ６のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、２－ブチニルオキシ基、または３－ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Ａを有する場合、Ｃ３～Ｃ６のアルキニル基における水素原子が、置換基Ａによって任意に置換される。 The C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent A” in R1 of formula (1) has the same definition as above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group. In the case of having the substituent A, the hydrogen atom in the C3-C6 alkynyl group is optionally substituted by the substituent A.
　式（１）のＲ１における「Ｃ３～Ｃ６のハロアルキニルオキシ基」とは、前記の定義と同義であり、好ましくは、４，４－ジフルオロ－２－ブチニルオキシ基、４－クロロ－４，４－ジフルオロ－２－ブチニルオキシ基、４－ブロモ－４，４－ジフルオロ－２－ブチニルオキシ基、または４，４，４－トリフルオロ－２－ブチニルオキシ基であり、さらに好ましくは、４，４－ジフルオロ－２－ブチニルオキシ基、または４，４，４－トリフルオロ－２－ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R1 of the formula (1) has the same definition as described above, and is preferably a 4,4-difluoro-2-butynyloxy group, 4-chloro-4,4- A difluoro-2-butynyloxy group, a 4-bromo-4,4-difluoro-2-butynyloxy group, or a 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2 -Butynyloxy group or 4,4,4-trifluoro-2-butynyloxy group.
　式（１）のＲ１における「Ｒ１０Ｒ１１Ｎ－」（ここで、Ｒ１０およびＲ１１は、それぞれ独立していて、水素原子またはＣ１～Ｃ６のアルキル基を表す。）のＣ１～Ｃ６のアルキル基は、前記の定義と同義である。「Ｒ１０Ｒ１１Ｎ－」として、好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基が挙げられ、さらに好ましくは、アミノ基、およびジメチルアミノ基が挙げられる。 The C1-C6 alkyl group of “R10R11N—” in R1 of the formula (1) (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group) Synonymous with definition. “R10R11N—” is preferably an amino group, a dimethylamino group, an ethylmethylamino group, and a diethylamino group, more preferably an amino group and a dimethylamino group.
　Ｒ２は、ハロゲン原子、水酸基、シアノ基、ニトロ基、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、Ｃ２～Ｃ６のハロアルキニル基、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、Ｃ２～Ｃ６のハロアルケニルオキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、Ｃ３～Ｃ６のハロアルキニルオキシ基、Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、それぞれ独立していて、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ２１およびＲ２２は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）を表す。）、Ｒ２０Ｃ（＝Ｏ）Ｏ－（ここで、Ｒ２０は、前記と同義である。）、１～２個の酸素原子を含む３～６員環の基、Ｒ２３－Ｌ２－（ここで、Ｒ２３は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ２は、Ｓ、ＳＯ、またはＳＯ２を表す。）、Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）、またはＲ２４Ｃ（＝Ｏ）Ｎ（Ｒ２５）－（ここで、Ｒ２４は、水素原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）を表し、Ｒ２５は、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）を表す。 R2 is a halogen atom, a hydroxyl group, a cyano group, a nitro group, a C1-C6 alkyl group that may be optionally substituted with a substituent B, a C1-C6 haloalkyl group, and a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent B, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent B, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent B, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent B, substituted C2-C6 alkenyloxy group optionally substituted with group B, C2-C6 haloalkenyloxy group, C3-C6 alkynyloxy group optionally substituted with substituent B A C3 to C6 haloalkynyloxy group, R20C (═O) — (wherein R20 is a C1 to C6 alkyl group, a C1 to C6 haloalkyl group, a C3 to C8 cycloalkyl group, a C1 to C6 cycloalkyl group, An alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 are each independently substituted with a hydrogen atom or a substituent B1). Represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22 together with the nitrogen atom to which they are bonded, an aziridinyl group, an azetidinyl group, a pyrrolidinyl group , Represents a piperidinyl group, a homopiperidinyl group, or an azocanyl group.), R 0C (═O) O— (where R20 is as defined above), a 3- to 6-membered ring group containing 1 to 2 oxygen atoms, R23-L2- (where R23 is Represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, L2 represents S, SO, or SO 2 ), R21R22N— (wherein R21 and R22 are as defined above). Or R24C (═O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is a hydrogen atom or a substituent B1. Place Which may be C1 ~ C6 alkyl group, a cycloalkyl group of haloalkyl group having C1 ~ C6 or C3 ~ C8,. ).
　中でもＲ２は、ハロゲン原子、水酸基、シアノ基、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、Ｒ２０Ｃ（＝Ｏ）Ｏ－（ここで、Ｒ２０は、前記と同義である。）、またはＲ２３－Ｌ２－（ここで、Ｒ２３およびＬ２は、前記と同義である。）が好ましく、
　特に、ハロゲン原子、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、または置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基が好ましい。 Among them, R2 is a halogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group optionally substituted with a substituent B, a C1-C6 haloalkyl group, or a C1-C6 optionally substituted with a substituent B. An alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group optionally substituted with the substituent B, a C2-C6 alkenyloxy group optionally substituted with the substituent B, a substituent B Or an optionally substituted C3-C6 alkynyloxy group, R20C (═O) O— (wherein R20 is as defined above), or R23-L2- (wherein R23 and L2 are , As defined above) is preferred,
In particular, a halogen atom, a C1-C6 alkyl group that may be optionally substituted with the substituent B, or a C1-C6 alkoxy group that may be optionally substituted with the substituent B is preferable.
　式（１）の「置換基Ｂ」とは、水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｃ２～Ｃ６のアルコキシアルコキシ基、Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）、Ｒ２３－Ｌ２－（ここで、Ｒ２３およびＬ２は、前記と同義である。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ここで、Ｒ２６、Ｒ２７、およびＲ２８は、それぞれ独立していて、Ｃ１～Ｃ６のアルキル基を表す。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ＣＨ２）ｓ－Ｏ－（ここで、ｓは、１～３の整数を表し、Ｒ２６、Ｒ２７、およびＲ２８は、前記と同義である。）、Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、前記のＲ２０と同義である。）、および１～２個の酸素原子を含む３～６員環の基からなる群から選択される少なくとも１種を表す。 “Substituent B” in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, a C2 To C6 alkoxyalkoxy groups, R21R22N- (wherein R21 and R22 are as defined above), R23-L2- (wherein R23 and L2 are as defined above), R26R27R28Si- ( Here, R26, R27, and R28 are each independently a C1-C6 alkyl group.), R26R27R28Si— (CH 2 ) s—O— (wherein s is an integer of 1 to 3) R26, R27, and R28 are as defined above, R20C (═O) — (wherein R20 is as defined above for R20), and ~ Represents at least one member selected from the group consisting of groups 3 to 6-membered ring containing two oxygen atoms.
　中でも置換基Ｂは、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ２～Ｃ６のアルコキシアルコキシ基、Ｒ２３－Ｌ２－（ここで、Ｒ２３およびＬ２は、前記と同義である。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ここで、Ｒ２６、Ｒ２７、およびＲ２８は、前記と同義である。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ＣＨ２）ｓ－Ｏ－（ここで、ｓ、Ｒ２６、Ｒ２７、およびＲ２８は、前記と同義である。）、Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、前記と同義である。）、または１～２個の酸素原子を含む３～６員環の基が好ましく、
　特に、シアノ基、またはＣ１～Ｃ６のアルコキシ基が好ましい。 Among them, the substituent B is a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C2-C6 alkoxyalkoxy group, R23-L2- (wherein R23 and L2 are as defined above). ), R26R27R28Si— (wherein R26, R27, and R28 are as defined above), R26R27R28Si— (CH 2 ) s—O— (wherein s, R26, R27, and R28 are R20C (═O) — (wherein R20 is as defined above), or a 3- to 6-membered ring group containing 1 to 2 oxygen atoms is preferred,
In particular, a cyano group or a C1-C6 alkoxy group is preferable.
　置換基Ｂの好ましい具体例として、水酸基；シアノ基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、およびイソブトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、および３，３，３－トリフルオロプロピルオキシ基；
Ｃ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基；
Ｃ２～Ｃ６のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、エトキシエトキシ基、およびメトキシプロピルオキシ基；
Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記のと同義である。）として、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基；
Ｒ２３－Ｌ２－（ここで、Ｒ２３およびＬ２は、前記と同義である。）として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基；
Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ここで、Ｒ２６、Ｒ２７、およびＲ２８は、前記と同義である。）として、トリメチルシリル基、およびトリエチルシリル基；
Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ＣＨ２）ｓ－Ｏ－（ここで、ｓ、Ｒ２６、Ｒ２７、およびＲ２８は、前記と同義である。）として、２－（トリメチルシリル）エトキシ基、および２－（トリエチルシリル）エトキシ基；
Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、前記と同義である。）として、アセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、２，２－ジフルオロエトキシカルボニル基、３，３，３－トリフルオロプロピルオキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、ピロリジニルカルボニル基、およびピペリジニルカルボニル基；
ならびに１～２個の酸素原子を含む３～６員環の基として、オキソラニル基、オキサニル基、１，３－ジオキソラニル基、および１，３－ジオキサニル基が挙げられる。 Preferred specific examples of the substituent B include a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
Methoxymethoxy, ethoxymethoxy, methoxyethoxy, ethoxyethoxy, and methoxypropyloxy groups as C2-C6 alkoxyalkoxy groups;
R21R22N— (wherein R21 and R22 have the same meanings as described above), and include amino group, dimethylamino group, ethylmethylamino group, diethylamino group, pyrrolidinyl group, and piperidinyl group;
R23-L2- (wherein R23 and L2 have the same meanings as described above), methylthio group, methanesulfinyl group, methanesulfonyl group, trifluoromethylthio group, trifluoromethanesulfinyl group, and trifluoromethanesulfonyl group;
R26R27R28Si- (wherein R26, R27, and R28 are as defined above), a trimethylsilyl group, and a triethylsilyl group;
R26R27R28Si— (CH 2 ) s—O— (wherein s, R26, R27, and R28 have the same meanings as described above), 2- (trimethylsilyl) ethoxy group, and 2- (triethylsilyl) ethoxy group ;
R20C (═O) — (wherein R20 has the same meaning as above), acetyl group, propionyl group, difluoroacetyl group, trifluoroacetyl group, cyclopropanecarbonyl group, methoxycarbonyl group, ethoxycarbonyl group, 2,2-difluoroethoxycarbonyl group, 3,3,3-trifluoropropyloxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, pyrrolidinyl A carbonyl group and a piperidinylcarbonyl group;
In addition, examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group, and a 1,3-dioxanyl group.
　置換基Ｂのさらに好ましい具体例として、水酸基；シアノ基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、およびシクロブチル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、およびエトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、および２，２，２－トリフルオロエトキシ基；
Ｃ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基；
Ｃ２～Ｃ６のアルコキシアルコキシ基として、メトキシメトキシ基、エトキシメトキシ基、メトキシエトキシ基、およびエトキシエトキシ基；
Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基；
Ｒ２３－Ｌ２－（ここで、Ｒ２３およびＬ２は、前記と同義である。）として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基；
Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ここで、Ｒ２６、Ｒ２７、およびＲ２８は、前記と同義である。）として、トリメチルシリル基；
Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ＣＨ２）ｓ－Ｏ－（ここで、ｓ、Ｒ２６、Ｒ２７、およびＲ２８は、前記と同義である。）として、２－（トリメチルシリル）エトキシ基；
Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、前記と同義である。）として、アセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、およびジエチルアミノカルボニル基；
ならびに１～２個の酸素原子を含む３～６員環の基として、１，３－ジオキソラニル基、および１，３－ジオキサニル基が挙げられる。 As more preferred specific examples of the substituent B, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group;
A methoxymethoxy group, an ethoxymethoxy group, a methoxyethoxy group, and an ethoxyethoxy group as the C2-C6 alkoxyalkoxy group;
R21R22N— (wherein R21 and R22 have the same meanings as described above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group;
R23-L2- (wherein R23 and L2 are as defined above), a methylthio group, a methanesulfinyl group, and a methanesulfonyl group;
R26R27R28Si- (wherein R26, R27, and R28 are as defined above), a trimethylsilyl group;
2- (trimethylsilyl) ethoxy group as R26R27R28Si— (CH 2 ) s—O— (wherein s, R26, R27 and R28 are as defined above);
R20C (═O) — (wherein R20 has the same meaning as described above), and includes an acetyl group, a difluoroacetyl group, a trifluoroacetyl group, a methoxycarbonyl group, an ethoxycarbonyl group, an aminocarbonyl group, and a dimethylaminocarbonyl group. , Ethylmethylaminocarbonyl group, and diethylaminocarbonyl group;
Examples of the 3- to 6-membered ring group containing 1 to 2 oxygen atoms include a 1,3-dioxolanyl group and a 1,3-dioxanyl group.
　式（１）の「置換基Ｂ１」とは、シアノ基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、およびＣ３～Ｃ８のシクロアルコキシ基からなる群から選択される少なくとも１種を表す。中でも置換基Ｂ１は、シアノ基、またはＣ１～Ｃ６のアルコキシ基が好ましい。 The “substituent B1” in the formula (1) is at least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group. To express. Among these, the substituent B1 is preferably a cyano group or a C1-C6 alkoxy group.
　置換基Ｂ１の好ましい具体例として、シアノ基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、およびイソブトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、および３，３，３－トリフルオロプロピルオキシ基；
ならびにＣ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基が挙げられる。 Preferred specific examples of the substituent B1 include a cyano group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
In addition, examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
　置換基Ｂ１のさらに好ましい具体例として、シアノ基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、およびエトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、および２，２，２－トリフルオロエトキシ基；
ならびにＣ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基が挙げられる。 As a more preferred specific example of the substituent B1, a cyano group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
As the C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group can be mentioned.
　式（１）のＲ２におけるハロゲン原子は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子である。
　式（１）のＲ２には、水酸基、シアノ基、およびニトロ基が含まれる。 The halogen atom in R2 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
R2 in the formula (1) includes a hydroxyl group, a cyano group, and a nitro group.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基」のＣ１～Ｃ６のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、プロピル基、またはイソプロピル基である。置換基Ｂを有する場合、Ｃ１～Ｃ６のアルキル基における水素原子が、置換基Ｂによって任意に置換される。 The C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, a propyl group, or an isopropyl group. In the case of having the substituent B, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent B.
　式（１）のＲ２における「Ｃ１～Ｃ６のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、２，２－ジフルオロエチル基、２，２，２－トリフルオロエチル基、３，３－ジフルオロプロピル基、または３，３，３－トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、２，２－ジフルオロエチル基、または２，２，２－トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基」のＣ３～Ｃ８のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Ｂを有する場合、Ｃ３～Ｃ８のシクロアルキル基における水素原子が、置換基Ｂによって任意に置換される。 The C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, and preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. In the case of having the substituent B, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent B.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニル基」のＣ２～Ｃ６のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、１－プロペニル基、アリル基、１－ブテニル基、２－ブテニル基、または３－ブテニル基であり、さらに好ましくは、ビニル基、１－プロペニル基、またはアリル基である。置換基Ｂを有する場合、Ｃ２～Ｃ６のアルケニル基における水素原子が、置換基Ｂによって任意に置換される。 The C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent B” in R2 of formula (1) has the same definition as above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group. In the case of having the substituent B, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent B.
　式（１）のＲ２における「Ｃ２～Ｃ６のハロアルケニル基」は、前記の定義と同義であり、好ましくは、２－フルオロビニル基、２，２－ジフルオロビニル基、２，２－ジクロロビニル基、３－フルオロアリル基、３，３－ジフルオロアリル基、または３，３－ジクロロアリル基であり、さらに好ましくは、２－フルオロビニル基、または２，２－ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” in R2 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルキニル基」のＣ２～Ｃ６のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、１－プロピニル基、プロパルギル基、１－ブチニル基、２－ブチニル基、または３－ブチニル基であり、さらに好ましくは、エチニル基、１－プロピニル基、またはプロパルギル基である。置換基Ｂを有する場合、Ｃ２～Ｃ６のアルキニル基における水素原子が、置換基Ｂによって任意に置換される。 The C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group. In the case of having the substituent B, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent B.
　式（１）のＲ２における「Ｃ２～Ｃ６のハロアルキニル基」は、前記の定義と同義であり、好ましくは、３，３－ジフルオロ－１－プロピニル基、３，３，３－トリフルオロ－１－プロピニル基、４，４－ジフルオロ－１－ブチニル基、４，４－ジフルオロ－２－ブチニル基、４，４，４－トリフルオロ－１－ブチニル基、または４，４，４－トリフルオロ－２－ブチニル基であり、さらに好ましくは、３，３－ジフルオロ－１－プロピニル基、または３，３，３－トリフルオロ－１－プロピニル基である。 The “C2-C6 haloalkynyl group” in R2 of the formula (1) has the same definition as above, preferably 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基」のＣ１～Ｃ６のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、またはペンチルオキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはペンチルオキシ基である。置換基Ｂを有する場合、Ｃ１～Ｃ６のアルコキシ基における水素原子が、置換基Ｂによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent B” in R2 of the formula (1) is as defined above, preferably a methoxy group, an ethoxy group Propyloxy group, isopropyloxy group, butoxy group, isobutoxy group or pentyloxy group, more preferably methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butoxy group or pentyloxy group. In the case of having the substituent B, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted by the substituent B.
　式（１）のＲ２における「Ｃ１～Ｃ６のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、または３，３，３－トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、または２，２，２－トリフルオロエトキシ基である。 The “C1-C6 haloalkoxy group” in R2 of the formula (1) has the same definition as above, and is preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基」のＣ３～Ｃ８のシクロアルコキシ基は、前記の定義と同義であり、好ましくは、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、またはシクロヘキシルオキシ基であり、さらに好ましくは、シクロプロピルオキシ基、またはシクロブトキシ基である。置換基Ｂを有する場合、Ｃ３～Ｃ８のシクロアルコキシ基における水素原子が、置換基Ｂによって任意に置換される。 The C3-C8 cycloalkoxy group of the “C3-C8 cycloalkoxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as described above, preferably cyclopropyloxy Group, a cyclobutoxy group, a cyclopentyloxy group, or a cyclohexyloxy group, and more preferably a cyclopropyloxy group or a cyclobutoxy group. In the case of having the substituent B, the hydrogen atom in the C3-C8 cycloalkoxy group is optionally substituted by the substituent B.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基」のＣ２～Ｃ６のアルケニルオキシ基は、前記の定義と同義であり、好ましくは、ビニルオキシ基、１－プロペニルオキシ基、アリルオキシ基、１－ブテニルオキシ基、２－ブテニルオキシ基、または３－ブテニルオキシ基であり、さらに好ましくは、ビニルオキシ基、１－プロペニルオキシ基、またはアリルオキシ基である。置換基Ｂを有する場合、Ｃ２～Ｃ６のアルケニルオキシ基における水素原子が、置換基Ｂによって任意に置換される。 The C2-C6 alkenyloxy group of the “C2-C6 alkenyloxy group optionally substituted with the substituent B” in R2 of the formula (1) has the same definition as above, preferably a vinyloxy group, A 1-propenyloxy group, an allyloxy group, a 1-butenyloxy group, a 2-butenyloxy group, or a 3-butenyloxy group, and more preferably a vinyloxy group, a 1-propenyloxy group, or an allyloxy group. In the case of having the substituent B, the hydrogen atom in the C2-C6 alkenyloxy group is optionally substituted by the substituent B.
　式（１）のＲ２における「Ｃ２～Ｃ６のハロアルケニルオキシ基」は、前記の定義と同義であり、好ましくは、２－フルオロビニルオキシ基、２，２－ジフルオロビニルオキシ基、２，２－ジクロロビニルオキシ基、３－フルオロアリルオキシ基、３，３－ジフルオロアリルオキシ基、または３，３－ジクロロアリルオキシ基であり、さらに好ましくは、２－フルオロビニルオキシ基、または２，２－ジフルオロビニルオキシ基である。 The “C2-C6 haloalkenyloxy group” in R2 of the formula (1) has the same definition as above, and preferably a 2-fluorovinyloxy group, a 2,2-difluorovinyloxy group, a 2,2- A dichlorovinyloxy group, a 3-fluoroallyloxy group, a 3,3-difluoroallyloxy group, or a 3,3-dichloroallyloxy group, more preferably a 2-fluorovinyloxy group or 2,2-difluoro It is a vinyloxy group.
　式（１）のＲ２における「置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基」のＣ３～Ｃ６のアルキニルオキシ基は、前記の定義と同義であり、好ましくは、プロパルギルオキシ基、２－ブチニルオキシ基、または３－ブチニルオキシ基であり、さらに好ましくは、プロパルギルオキシ基である。置換基Ｂを有する場合、Ｃ３～Ｃ６のアルキニルオキシ基における水素原子が、置換基Ｂによって任意に置換される。 The C3-C6 alkynyloxy group of “C3-C6 alkynyloxy group optionally substituted with substituent B” in R2 of formula (1) is as defined above, preferably a propargyloxy group , 2-butynyloxy group, or 3-butynyloxy group, and more preferably a propargyloxy group. In the case of having the substituent B, the hydrogen atom in the C3-C6 alkynyloxy group is optionally substituted by the substituent B.
　式（１）のＲ２における「Ｃ３～Ｃ６のハロアルキニルオキシ基」は、前記の定義と同義であり、好ましくは、４，４－ジフルオロ－２－ブチニルオキシ基、４－クロロ－４，４－ジフルオロ－２－ブチニルオキシ基、４－ブロモ－４，４－ジフルオロ－２－ブチニルオキシ基、または４，４，４－トリフルオロ－２－ブチニルオキシ基であり、さらに好ましくは、４，４－ジフルオロ－２－ブチニルオキシ基、または４，４，４－トリフルオロ－２－ブチニルオキシ基である。 The “C3-C6 haloalkynyloxy group” in R2 of the formula (1) has the same definition as above, and is preferably a 4,4-difluoro-2-butynyloxy group, a 4-chloro-4,4-difluoro group. -2-butynyloxy group, 4-bromo-4,4-difluoro-2-butynyloxy group, or 4,4,4-trifluoro-2-butynyloxy group, more preferably 4,4-difluoro-2- A butynyloxy group or a 4,4,4-trifluoro-2-butynyloxy group.
　式（１）のＲ２における「Ｒ２０Ｃ（＝Ｏ）－」（ここで、Ｒ２０は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、それぞれ独立していて、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ２１およびＲ２２は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）を表す。）の各用語は、前記の定義と同義である。「Ｒ２０Ｃ（＝Ｏ）－」として、好ましくは、アセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、シクロプロパンカルボニル基、メトキシカルボニル基、エトキシカルボニル基、２，２－ジフルオロエトキシカルボニル基、２，２，２－トリフルオロエトキシカルボニル基、シクロプロピルオキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、ジエチルアミノカルボニル基、ピロリジニルカルボニル基、およびピペリジニルカルボニル基が挙げられ、さらに好ましくは、アセチル基、ジフルオロアセチル基、トリフルオロアセチル基、メトキシカルボニル基、エトキシカルボニル基、アミノカルボニル基、ジメチルアミノカルボニル基、エチルメチルアミノカルボニル基、およびジエチルアミノカルボニル基が挙げられる。 “R20C (═O) —” in R2 of the formula (1) (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group) , A C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 are each independently a hydrogen atom or a C1-C6 group optionally substituted with a substituent B1). Represents a C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22, together with the nitrogen atom to which they are attached, are aziridinyl, azetidinyl, pyrrolidinyl, piperidinyl Each of which represents a group, a homopiperidinyl group, or an azocanyl group). Righteousness and are synonymous. “R20C (═O) —” is preferably an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, a cyclopropanecarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, a 2,2-difluoroethoxycarbonyl group, 2,2,2-trifluoroethoxycarbonyl group, cyclopropyloxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylaminocarbonyl group, diethylaminocarbonyl group, pyrrolidinylcarbonyl group, and piperidinylcarbonyl group More preferably, acetyl group, difluoroacetyl group, trifluoroacetyl group, methoxycarbonyl group, ethoxycarbonyl group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethyl group Bruno carbonyl group, and a diethylamino group.
　式（１）のＲ２における「Ｒ２０Ｃ（＝Ｏ）Ｏ－」のＲ２０は、前記と同義である。「Ｒ２０Ｃ（＝Ｏ）Ｏ－」として、好ましくは、アセチルオキシ基、プロピオニルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、シクロプロパンカルボニルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、２，２－ジフルオロエトキシカルボニルオキシ基、２，２，２－トリフルオロエトキシカルボニルオキシ基、シクロプロピルオキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、ジエチルアミノカルボニルオキシ基、ピロリジニルカルボニルオキシ基、およびピペリジニルカルボニルオキシ基が挙げられ、より好ましくは、アセチルオキシ基、ジフルオロアセチルオキシ基、トリフルオロアセチルオキシ基、メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、アミノカルボニルオキシ基、ジメチルアミノカルボニルオキシ基、エチルメチルアミノカルボニルオキシ基、およびジエチルアミノカルボニルオキシ基が挙げられる。 R20 of “R20C (═O) O—” in R2 of the formula (1) has the same meaning as described above. “R20C (═O) O—” is preferably an acetyloxy group, a propionyloxy group, a difluoroacetyloxy group, a trifluoroacetyloxy group, a cyclopropanecarbonyloxy group, a methoxycarbonyloxy group, an ethoxycarbonyloxy group, 2 , 2-difluoroethoxycarbonyloxy group, 2,2,2-trifluoroethoxycarbonyloxy group, cyclopropyloxycarbonyloxy group, aminocarbonyloxy group, dimethylaminocarbonyloxy group, ethylmethylaminocarbonyloxy group, diethylaminocarbonyloxy group Group, pyrrolidinylcarbonyloxy group, and piperidinylcarbonyloxy group, more preferably acetyloxy group, difluoroacetyloxy group, trifluoroacetyloxy group. Shi group, methoxycarbonyloxy group, ethoxycarbonyloxy group, aminocarbonyl group, dimethylaminocarbonyl group, ethylmethylamino carbonyloxy groups, and diethylamino carbonyl group.
　式（１）のＲ２における「１～２個の酸素原子を含む３～６員環の基」は、前記の定義と同義であり、好ましくは、オキソラニル基、オキサニル基、１，３－ジオキソラニル基、または１，３－ジオキサニル基であり、さらに好ましくは、１，３－ジオキソラニル基、または１，３－ジオキサニル基である。 The “3- to 6-membered ring group containing 1 to 2 oxygen atoms” in R2 of the formula (1) has the same definition as above, and preferably an oxolanyl group, an oxanyl group, a 1,3-dioxolanyl group Or a 1,3-dioxanyl group, and more preferably a 1,3-dioxolanyl group or a 1,3-dioxanyl group.
　式（１）のＲ２における「Ｒ２３－Ｌ２－」（ここで、Ｒ２３は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ２は、Ｓ、ＳＯ、またはＳＯ２を表す。）の各用語は、前記の定義と同義である。「Ｒ２３－Ｌ２－」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、トリフルオロメタンスルホニル基、（クロロメチル）チオ基、（クロロメタン）スルフィニル基、および（クロロメタン）スルホニル基が挙げられ、さらに好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、（クロロメチル）チオ基、（クロロメタン）スルフィニル基、および（クロロメタン）スルホニル基が挙げられる。 “R23-L2-” in R2 of Formula (1) (wherein R23 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group, and L2 represents S, SO, or SO 2 ). ) Are as defined above. “R23-L2-” is preferably a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, a trifluoromethanesulfonyl group, a (chloromethyl) thio group, or a (chloromethane) sulfinyl group. And (chloromethane) sulfonyl group, more preferably, methylthio group, methanesulfinyl group, methanesulfonyl group, (chloromethyl) thio group, (chloromethane) sulfinyl group, and (chloromethane) sulfonyl group. It is done.
　式（１）のＲ２における「Ｒ２１Ｒ２２Ｎ－」のＲ２１およびＲ２２は、前記と同義である。「Ｒ２１Ｒ２２Ｎ－」として、好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基が挙げられ、さらに好ましくは、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基が挙げられる。 R21 and R22 of “R21R22N-” in R2 of the formula (1) have the same meanings as described above. “R21R22N—” preferably includes an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, and a piperidinyl group, and more preferably a dimethylamino group, an ethylmethylamino group, and a diethylamino group. Is mentioned.
　式（１）のＲ２における「Ｒ２４Ｃ（＝Ｏ）Ｎ（Ｒ２５）－」（ここで、Ｒ２４は、水素原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）を表し、Ｒ２５は、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）の各用語は、前記の定義と同義である。Ｒ２４として、好ましくは、水素原子、メチル基、エチル基、ジフルオロメチル基、トリフルオロメチル基、シクロプロピル基、メトキシ基、エトキシ基、２，２－ジフルオロエトキシ、２，２，２－トリフルオロエトキシ基、シクロプロピルオキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基が挙げられ、さらに好ましくは、水素原子、メチル基、ジフルオロメチル基、トリフルオロメチル基、メトキシ基、エトキシ基、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基が挙げられる。また、Ｒ２５として、好ましくは、水素原子、メチル基、エチル基、プロピル基、メトキシメチル基、エトキシメチル基、メトキシエチル基、エトキシエチル基、シアノメチル基、２－シアノエチル基、２，２－ジフルオロエチル基、２，２，２－トリフルオロエチル基、およびシクロプロピル基が挙げられ、さらに好ましくは、水素原子、メチル基、エチル基、メトキシメチル基、エトキシメチル基、メトキシエチル基、エトキシエチル基、シアノメチル基、２，２－ジフルオロエチル基、および２，２，２－トリフルオロエチル基が挙げられる。 “R24C (═O) N (R25) —” in R2 of the formula (1) (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group) , C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are as defined above), and R25 represents hydrogen. And each term of C1-C6 alkyl group, C1-C6 haloalkyl group, or C3-C8 cycloalkyl group optionally substituted with substituent B1 is as defined above. . R24 is preferably a hydrogen atom, methyl group, ethyl group, difluoromethyl group, trifluoromethyl group, cyclopropyl group, methoxy group, ethoxy group, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy. Group, cyclopropyloxy group, amino group, dimethylamino group, ethylmethylamino group, diethylamino group, pyrrolidinyl group, and piperidinyl group, and more preferably a hydrogen atom, a methyl group, a difluoromethyl group, a trifluoromethyl group. Methoxy group, ethoxy group, amino group, dimethylamino group, ethylmethylamino group, and diethylamino group. R25 is preferably a hydrogen atom, methyl group, ethyl group, propyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, cyanomethyl group, 2-cyanoethyl group, 2,2-difluoroethyl. Group, 2,2,2-trifluoroethyl group, and cyclopropyl group, more preferably hydrogen atom, methyl group, ethyl group, methoxymethyl group, ethoxymethyl group, methoxyethyl group, ethoxyethyl group, A cyanomethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group can be mentioned.
　式（１）のｎは、０～５の整数である。ただし、ｎが２以上のとき、２以上のＲ２は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 N in the formula (1) is an integer of 0 to 5. However, when n is 2 or more, two or more R2s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
　式（１）のＲ３は、水素原子、ハロゲン原子、ニトロ基、置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、Ｃ２～Ｃ６のハロアルキニル基、Ｒ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ２３と同義であり、Ｌ３は、前記のＬ２と同義である。）、Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記のＲ２１およびＲ２２と同義である。）、またはＲ３３Ｃ（＝Ｏ）－（ここで、Ｒ３３は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）を表す。 R3 in formula (1) may be optionally substituted with a hydrogen atom, a halogen atom, a nitro group, a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, or a substituent C. Good C3-C8 cycloalkyl group, C1-C6 alkoxy group optionally substituted with substituent C, C1-C6 haloalkoxy group, C2-C6 alkenyl group optionally substituted with substituent C C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent C, C2-C6 haloalkynyl group, R30-L3- (wherein R30 has the same meaning as R23 above) L3 is as defined above for L2, and R31R32N— (wherein R31 and R32 are as defined above for R21 and R22), or R33C (═O) — ( In this, R33 represents represents.) An alkyl group of C1 ~ C6, haloalkyl group of C1 ~ C6, or C3 ~ C8 cycloalkyl group,.
　中でもＲ３は、水素原子、ハロゲン原子、置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＲ３０－Ｌ３－（ここで、Ｒ３０およびＬ３は、前記と同義である。）が好ましく、
　特に、水素原子、ハロゲン原子、または置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基が好ましい。 Among them, R3 is a hydrogen atom, a halogen atom, a C1-C6 alkyl group that may be optionally substituted with a substituent C, a C3-C8 cycloalkyl group that may be optionally substituted with a substituent C, or a substituent C as appropriate. An optionally substituted C1-C6 alkoxy group, a C2-C6 alkynyl group optionally substituted with a substituent C, or R30-L3- (wherein R30 and L3 are as defined above). Is preferred,
In particular, a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C is preferable.
　式（１）の「置換基Ｃ」とは、水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記のＲ２１およびＲ２２と同義である。）、およびＲ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ１４と同義であり、Ｌ３は、前記のＬ１と同義である。）からなる群から選択される少なくとも１種を表す。中でも置換基Ｃは、シアノ基、Ｃ１～Ｃ６のアルコキシ基、またはＲ３０－Ｌ３－（ここで、Ｒ３０およびＬ３は、前記と同義である。）が好ましく、
　特に、シアノ基、またはＣ１～Ｃ６のアルコキシ基が好ましい。 The “substituent C” in formula (1) is a hydroxyl group, a cyano group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy group, R31R32N. -(Wherein R31 and R32 are as defined above for R21 and R22), and R30-L3- (wherein R30 is as defined above for R14, and L3 is as defined above for L1). Represents at least one selected from the group consisting of: Among them, the substituent C is preferably a cyano group, a C1-C6 alkoxy group, or R30-L3- (wherein R30 and L3 are as defined above),
In particular, a cyano group or a C1-C6 alkoxy group is preferable.
　置換基Ｃの好ましい具体例として、水酸基；シアノ基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、およびイソブトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、および３，３，３－トリフルオロプロピルオキシ基；
Ｃ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基；
Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記のＲ２１およびＲ２２と同義である。）として、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、およびピペリジニル基；
ならびにＲ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ１４と同義であり、Ｌ３は、前記のＬ１と同義である。）として、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基が挙げられる。 Preferred specific examples of the substituent C include a hydroxyl group; a cyano group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, and an isobutoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
As a C3-C8 cycloalkoxy group, a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group;
R31R32N— (wherein R31 and R32 have the same meanings as R21 and R22 above), an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, and a piperidinyl group;
And R30-L3- (wherein R30 has the same meaning as R14, and L3 has the same meaning as L1), a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, Examples thereof include a trifluoromethanesulfinyl group and a trifluoromethanesulfonyl group.
　置換基Ｃのさらに好ましい具体例として、水酸基；シアノ基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、およびシクロブチル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、およびエトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、および２，２，２－トリフルオロエトキシ基；
Ｃ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基；
Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記と同義である。）として、ジメチルアミノ基、エチルメチルアミノ基、およびジエチルアミノ基；
ならびにＲ３０－Ｌ３－（ここで、Ｒ３０およびＬ３は、前記と同義である。）として、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基が挙げられる。 As more preferred specific examples of the substituent C, a hydroxyl group; a cyano group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group and an ethoxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
A cyclopropyloxy group and a cyclobutoxy group as a C3-C8 cycloalkoxy group;
R31R32N— (wherein R31 and R32 have the same meanings as described above), a dimethylamino group, an ethylmethylamino group, and a diethylamino group;
And R30-L3- (wherein R30 and L3 are as defined above) include a methylthio group, a methanesulfinyl group, and a methanesulfonyl group.
　式（１）のＲ３には、水素原子、およびニトロ基が含まれる。
　式（１）のＲ３における「ハロゲン原子」は、前記の定義と同義であり、好ましくはフッ素原子、塩素原子、臭素原子、またはヨウ素原子である。 R3 in the formula (1) includes a hydrogen atom and a nitro group.
The “halogen atom” in R3 of the formula (1) has the same definition as described above, and is preferably a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.
　式（１）のＲ３における「置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基」のＣ１～Ｃ６のアルキル基は、前記の定義と同義であり、好ましくは、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、またはイソブチル基であり、さらに好ましくは、メチル基、エチル基、またはプロピル基である。置換基Ｃを有する場合、Ｃ１～Ｃ６のアルキル基における水素原子が、置換基Ｃによって任意に置換される。 The C1-C6 alkyl group in the “C1-C6 alkyl group optionally substituted with substituent C” in R3 of the formula (1) has the same definition as described above, preferably a methyl group, an ethyl group , A propyl group, an isopropyl group, a butyl group, or an isobutyl group, and more preferably a methyl group, an ethyl group, or a propyl group. In the case of having the substituent C, the hydrogen atom in the C1-C6 alkyl group is optionally substituted by the substituent C.
　式（１）のＲ３における「Ｃ１～Ｃ６のハロアルキル基」は、前記の定義と同義であり、好ましくは、ジフルオロメチル基、トリフルオロメチル基、２，２－ジフルオロエチル基、２，２，２－トリフルオロエチル基、３，３－ジフルオロプロピル基、または３，３，３－トリフルオロプロピル基であり、さらに好ましくは、ジフルオロメチル基、トリフルオロメチル基、２，２－ジフルオロエチル基、または２，２，２－トリフルオロエチル基である。 The “C1-C6 haloalkyl group” in R3 of the formula (1) has the same meaning as defined above, and is preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, 2,2,2 A trifluoroethyl group, a 3,3-difluoropropyl group, or a 3,3,3-trifluoropropyl group, more preferably a difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, or 2,2,2-trifluoroethyl group.
　式（１）のＲ３における「置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基」のＣ３～Ｃ８のシクロアルキル基は、前記の定義と同義であり、好ましくは、シクロプロピル基、シクロブチル基、シクロペンチル基、またはシクロヘキシル基であり、さらに好ましくは、シクロプロピル基、またはシクロブチル基である。置換基Ｃを有する場合、Ｃ３～Ｃ８のシクロアルキル基における水素原子が、置換基Ｃによって任意に置換される。 The C3-C8 cycloalkyl group in the “C3-C8 cycloalkyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a cyclopropyl group , A cyclobutyl group, a cyclopentyl group, or a cyclohexyl group, and more preferably a cyclopropyl group or a cyclobutyl group. In the case of having the substituent C, the hydrogen atom in the C3-C8 cycloalkyl group is optionally substituted by the substituent C.
　式（１）のＲ３における「置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基」のＣ１～Ｃ６のアルコキシ基は、前記の定義と同義であり、好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、またはイソブトキシ基であり、さらに好ましくは、メトキシ基、エトキシ基、プロピルオキシ基、またはイソプロピルオキシ基である。置換基Ｃを有する場合、Ｃ１～Ｃ６のアルコキシ基における水素原子が、置換基Ｃによって任意に置換される。 The C1-C6 alkoxy group of the “C1-C6 alkoxy group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as above, preferably a methoxy group, an ethoxy group , A propyloxy group, an isopropyloxy group, a butoxy group, or an isobutoxy group, and more preferably a methoxy group, an ethoxy group, a propyloxy group, or an isopropyloxy group. In the case of having the substituent C, the hydrogen atom in the C1-C6 alkoxy group is optionally substituted with the substituent C.
　式（１）のＲ３における「Ｃ１～Ｃ６のハロアルコキシ基」は、前記の定義と同義であり、好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、または３，３，３－トリフルオロプロピルオキシ基であり、さらに好ましくは、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、または２，２，２－トリフルオロエトキシ基である。 The “C1-C6 haloalkoxy group” in R3 of the formula (1) has the same definition as above, preferably a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, 2,2, 2-trifluoroethoxy group, 3,3-difluoropropyloxy group, or 3,3,3-trifluoropropyloxy group, more preferably difluoromethoxy group, trifluoromethoxy group, 2,2-difluoroethoxy group Or a 2,2,2-trifluoroethoxy group.
　式（１）のＲ３における「置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基」のＣ２～Ｃ６のアルケニル基は、前記の定義と同義であり、好ましくは、ビニル基、１－プロペニル基、アリル基、１－ブテニル基、２－ブテニル基、または３－ブテニル基であり、さらに好ましくは、ビニル基、１－プロペニル基、またはアリル基である。置換基Ｃを有する場合、Ｃ２～Ｃ６のアルケニル基における水素原子が、置換基Ｃによって任意に置換される。 The C2-C6 alkenyl group of “C2-C6 alkenyl group optionally substituted with substituent C” in R3 of formula (1) is as defined above, preferably a vinyl group, 1- A propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, or a 3-butenyl group, more preferably a vinyl group, a 1-propenyl group, or an allyl group. In the case of having the substituent C, the hydrogen atom in the C2-C6 alkenyl group is optionally substituted by the substituent C.
　式（１）のＲ３における「Ｃ２～Ｃ６のハロアルケニル基」は、前記の定義と同義であり、好ましくは、２－フルオロビニル基、２，２－ジフルオロビニル基、２，２－ジクロロビニル基、３－フルオロアリル基、３，３－ジフルオロアリル基、または３，３－ジクロロアリル基であり、さらに好ましくは、２－フルオロビニル基、または２，２－ジフルオロビニル基である。 The “C2-C6 haloalkenyl group” in R3 of the formula (1) has the same definition as above, preferably a 2-fluorovinyl group, a 2,2-difluorovinyl group, a 2,2-dichlorovinyl group. , 3-fluoroallyl group, 3,3-difluoroallyl group, or 3,3-dichloroallyl group, more preferably 2-fluorovinyl group or 2,2-difluorovinyl group.
　式（１）のＲ３における「置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基」のＣ２～Ｃ６のアルキニル基は、前記の定義と同義であり、好ましくは、エチニル基、１－プロピニル基、プロパルギル基、１－ブチニル基、２－ブチニル基、または３－ブチニル基であり、さらに好ましくは、エチニル基、１－プロピニル基、またはプロパルギル基である。置換基Ｃを有する場合、Ｃ２～Ｃ６のアルキニル基における水素原子が、置換基Ｃによって任意に置換される。 The C2-C6 alkynyl group of the “C2-C6 alkynyl group optionally substituted with the substituent C” in R3 of the formula (1) has the same definition as defined above, preferably an ethynyl group, 1- A propynyl group, a propargyl group, a 1-butynyl group, a 2-butynyl group, or a 3-butynyl group, and more preferably an ethynyl group, a 1-propynyl group, or a propargyl group. In the case of having the substituent C, the hydrogen atom in the C2-C6 alkynyl group is optionally substituted by the substituent C.
　式（１）のＲ３における「Ｃ２～Ｃ６のハロアルキニル基」は、前記の定義と同義であり、好ましくは、３，３－ジフルオロ－１－プロピニル基、３，３，３－トリフルオロ－１－プロピニル基、４，４－ジフルオロ－１－ブチニル基、４，４－ジフルオロ－２－ブチニル基、４，４，４－トリフルオロ－１－ブチニル基、または４，４，４－トリフルオロ－２－ブチニル基であり、さらに好ましくは、３，３－ジフルオロ－１－プロピニル基、または３，３，３－トリフルオロ－１－プロピニル基である。 The “C2-C6 haloalkynyl group” in R3 of the formula (1) has the same definition as described above, and is preferably a 3,3-difluoro-1-propynyl group, 3,3,3-trifluoro-1 -Propynyl group, 4,4-difluoro-1-butynyl group, 4,4-difluoro-2-butynyl group, 4,4,4-trifluoro-1-butynyl group, or 4,4,4-trifluoro- A 2-butynyl group, more preferably a 3,3-difluoro-1-propynyl group, or a 3,3,3-trifluoro-1-propynyl group.
　式（１）のＲ３における「Ｒ３０－Ｌ３－」は、Ｒ３０が前記のＲ２３と同義であり、Ｌ３が前記のＬ２と同義である。「Ｒ３０－Ｌ３－」として、好ましくは、メチルチオ基、メタンスルフィニル基、メタンスルホニル基、トリフルオロメチルチオ基、トリフルオロメタンスルフィニル基、およびトリフルオロメタンスルホニル基が挙げられ、さらに好ましくは、メチルチオ基、メタンスルフィニル基、およびメタンスルホニル基が挙げられる。 In “R30-L3-” in R3 of the formula (1), R30 has the same meaning as R23, and L3 has the same meaning as L2. “R30-L3-” preferably includes a methylthio group, a methanesulfinyl group, a methanesulfonyl group, a trifluoromethylthio group, a trifluoromethanesulfinyl group, and a trifluoromethanesulfonyl group, and more preferably a methylthio group, a methanesulfinyl group. Groups, and methanesulfonyl groups.
　式（１）のＲ３における「Ｒ３１Ｒ３２Ｎ－」は、Ｒ３１およびＲ３２が、前記のＲ２１およびＲ２２と同義であり、好ましくは、アミノ基、ジメチルアミノ基、エチルメチルアミノ基、ジエチルアミノ基、ピロリジニル基、またはピペリジニル基であり、さらに好ましくは、ジメチルアミノ基、エチルメチルアミノ基、またはジエチルアミノ基である。 “R31R32N—” in R3 of the formula (1) has the same meaning as R21 and R22, and is preferably an amino group, a dimethylamino group, an ethylmethylamino group, a diethylamino group, a pyrrolidinyl group, or A piperidinyl group, more preferably a dimethylamino group, an ethylmethylamino group, or a diethylamino group.
　式（１）のＲ３における「Ｒ３３Ｃ（＝Ｏ）－」（ここで、Ｒ３３は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）の各用語は、前記の定義と同義である。「Ｒ３３Ｃ（＝Ｏ）－」として、好ましくは、アセチル基、プロピオニル基、ジフルオロアセチル基、トリフルオロアセチル基、およびシクロプロパンカルボニル基が挙げられ、さらに好ましくは、アセチル基、ジフルオロアセチル基、およびトリフルオロアセチル基が挙げられる。 Each of “R33C (═O) —” (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group) in R3 of the formula (1). Terminology is as defined above. “R33C (═O) —” preferably includes an acetyl group, a propionyl group, a difluoroacetyl group, a trifluoroacetyl group, and a cyclopropanecarbonyl group, and more preferably an acetyl group, a difluoroacetyl group, and a triphenyl group. A fluoroacetyl group is mentioned.
　式（１）のＸは、酸素原子、または硫黄原子を表す。好ましいＸは、酸素原子である。 X in the formula (1) represents an oxygen atom or a sulfur atom. Preferred X is an oxygen atom.
　式（１）のＹは、フェニル基、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基を表す。
　該フェニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～４置換する。
　該ピリジル基、該ピリダジニル基、該ピリミジニル基、該ピラジニル基、該トリアジニル基、または該テトラジニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～３置換する。
　該チエニル基、該チアゾリル基、該イソチアゾリル基、または該チアジアゾリル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～２置換する。 Y in Formula (1) represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group.
In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately.
In the pyridyl group, the pyridazinyl group, the pyrimidinyl group, the pyrazinyl group, the triazinyl group, or the tetrazinyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace.
In the thienyl group, the thiazolyl group, the isothiazolyl group, or the thiadiazolyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0-2.
　式（１）の「置換基Ｄ」とは、ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ１～Ｃ６のアルコキシ基、およびＣ１～Ｃ６のハロアルコキシ基からなる群から選択される少なくとも１種を表す。
　中でも置換基Ｄは、ハロゲン原子、またはＣ１～Ｃ６のアルキル基が好ましく、
　特に、ハロゲン原子が好ましい。 “Substituent D” in formula (1) is selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group Represents at least one kind.
Among them, the substituent D is preferably a halogen atom or a C1-C6 alkyl group,
In particular, a halogen atom is preferable.
　置換基Ｄの好ましい具体例として、
ハロゲン原子として、フッ素原子、塩素原子、臭素原子、およびヨウ素原子；
Ｃ１～Ｃ６のアルキル基として、メチル基、エチル基、およびプロピル基；
Ｃ１～Ｃ６のハロアルキル基として、ジフルオロメチル基、トリフルオロメチル基、２，２－ジフルオロエチル基、および２，２，２－トリフルオロエチル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、およびｔ－ブトキシ基；
ならびにＣ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、および３，３，３－トリフルオロプロピルオキシ基が挙げられる。 As a preferable specific example of the substituent D,
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom;
A methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group;
A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group as the C1-C6 haloalkyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group;
And C1-C6 haloalkoxy groups include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, a 3,3-difluoropropyloxy group, and 3, A 3,3-trifluoropropyloxy group may be mentioned.
　置換基Ｄのさらに好ましい具体例として、
ハロゲン原子として、フッ素原子、塩素原子、および臭素原子；
Ｃ１～Ｃ６のアルキル基として、メチル基、およびエチル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基；
ならびにＣ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、および２，２，２－トリフルオロエトキシ基が挙げられる。 As a more preferred specific example of the substituent D,
A halogen atom, a fluorine atom, a chlorine atom, and a bromine atom;
A methyl group and an ethyl group as the C1-C6 alkyl group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group;
In addition, examples of the C1-C6 haloalkoxy group include a difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group.
　式（１）の「置換基Ｄ１」とは、水酸基、ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、およびＣ３～Ｃ８のシクロアルコキシ基からなる群から選択される少なくとも１種を表す。
　中でも置換基Ｄ１は、水酸基、ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のアルコキシ基、またはＣ１～Ｃ６のハロアルキル基が好ましく、
　さらに好ましくは、ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のアルコキシ基、またはＣ１～Ｃ６のハロアルコキシ基が好ましい。 The “substituent D1” in formula (1) is a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 And at least one selected from the group consisting of C3-C8 cycloalkoxy groups.
Among them, the substituent D1 is preferably a hydroxyl group, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkyl group,
More preferably, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 haloalkoxy group is preferable.
　置換基Ｄ１の好ましい具体例として、水酸基；
ハロゲン原子として、フッ素原子、塩素原子、臭素原子、およびヨウ素原子；
Ｃ１～Ｃ６のアルキル基として、メチル基、エチル基、およびプロピル基；
Ｃ１～Ｃ６のハロアルキル基として、ジフルオロメチル基、トリフルオロメチル基、２，２－ジフルオロエチル基、および２，２，２－トリフルオロエチル基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、シクロブチル基、シクロペンチル基、およびシクロヘキシル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基、ブトキシ基、イソブトキシ基、およびｔ－ブトキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、２，２，２－トリフルオロエトキシ基、３，３－ジフルオロプロピルオキシ基、および３，３，３－トリフルオロプロピルオキシ基；
ならびにＣ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、シクロブトキシ基、シクロペンチルオキシ基、およびシクロヘキシルオキシ基が挙げられる。 As a preferable specific example of the substituent D1, a hydroxyl group;
As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom;
A methyl group, an ethyl group, and a propyl group as the C1-C6 alkyl group;
A difluoromethyl group, a trifluoromethyl group, a 2,2-difluoroethyl group, and a 2,2,2-trifluoroethyl group as the C1-C6 haloalkyl group;
As a C3-C8 cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group;
A C1-C6 alkoxy group as a methoxy group, an ethoxy group, a propyloxy group, an isopropyloxy group, a butoxy group, an isobutoxy group, and a t-butoxy group;
C1-C6 haloalkoxy groups include difluoromethoxy, trifluoromethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 3,3-difluoropropyloxy, and 3,3 , 3-trifluoropropyloxy group;
In addition, examples of the C3-C8 cycloalkoxy group include a cyclopropyloxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
　置換基Ｄ１のさらに好ましい具体例として、水酸基；
ハロゲン原子として、フッ素原子、塩素原子、および臭素原子；
Ｃ１～Ｃ６のアルキル基として、メチル基、およびエチル基；
Ｃ１～Ｃ６のハロアルキル基として、ジフルオロメチル基、およびトリフルオロメチル基；
Ｃ３～Ｃ８のシクロアルキル基として、シクロプロピル基、およびシクロブチル基；
Ｃ１～Ｃ６のアルコキシ基として、メトキシ基、エトキシ基、プロピルオキシ基、およびイソプロピルオキシ基；
Ｃ１～Ｃ６のハロアルコキシ基として、ジフルオロメトキシ基、トリフルオロメトキシ基、２，２－ジフルオロエトキシ基、および２，２，２－トリフルオロエトキシ基；
ならびにＣ３～Ｃ８のシクロアルコキシ基として、シクロプロピルオキシ基、およびシクロブトキシ基が挙げられる。 As a more preferred specific example of the substituent D1, a hydroxyl group;
A halogen atom, a fluorine atom, a chlorine atom, and a bromine atom;
A methyl group and an ethyl group as the C1-C6 alkyl group;
A difluoromethyl group and a trifluoromethyl group as a C1-C6 haloalkyl group;
A cyclopropyl group and a cyclobutyl group as the C3-C8 cycloalkyl group;
A methoxy group, an ethoxy group, a propyloxy group, and an isopropyloxy group as the C1-C6 alkoxy group;
A difluoromethoxy group, a trifluoromethoxy group, a 2,2-difluoroethoxy group, and a 2,2,2-trifluoroethoxy group as the C1-C6 haloalkoxy group;
As the C3-C8 cycloalkoxy group, a cyclopropyloxy group and a cyclobutoxy group can be mentioned.
　以下、式（１）のＹの具体的例を詳細に説明する。
　Ａ）　Ｙがフェニル基であるとき、Ｙは、式（ａ）
Figure JPOXMLDOC01-appb-C000004
で表される部分構造（ここで、ＤおよびＤ１は前記と同義であり、ｍａは０～４の整数を表す。）を表す。 Hereinafter, a specific example of Y in formula (1) will be described in detail.
A) When Y is a phenyl group, Y is represented by the formula (a)
Figure JPOXMLDOC01-appb-C000004
(Wherein D and D1 are as defined above, and ma represents an integer of 0 to 4).
　式（ａ）のｍａは、０～４の整数を表す。
　式（ａ）のｍａが２以上の場合、２以上のＤ１は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。
　本明細書においてＹがフェニル基の場合、オルト位とは、式（ａ）に示されるように、置換基Ｄがあるフェニル基の位置を意味する。
　置換基Ｄがオルト位に位置したフェニル基は、本発明の特徴をなしている。 In the formula (a), ma represents an integer of 0 to 4.
When ma in the formula (a) is 2 or more, 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
In the present specification, when Y is a phenyl group, the ortho position means the position of the phenyl group having the substituent D as shown in the formula (a).
The phenyl group in which the substituent D is located in the ortho position is a feature of the present invention.
　式（ａ）の好ましい組み合わせは、２－Ｄ－６－Ｄ１－フェニル基、２－Ｄ－４－Ｄ１－フェニル基、または２－Ｄ－４－Ｄ１－６－Ｄ１－フェニル基である。ここで、例えば、「２－Ｄ－６－Ｄ１－フェニル基」は、２位に置換基Ｄ、６位に置換基Ｄ１を有する二置換フェニル基を意味し、以下の記載も同様である。 A preferred combination of the formula (a) is a 2-D-6-D1-phenyl group, a 2-D-4-D1-phenyl group, or a 2-D-4-D1-6-D1-phenyl group. Here, for example, “2-D-6-D1-phenyl group” means a disubstituted phenyl group having a substituent D at the 2-position and a substituent D1 at the 6-position, and the following description is also the same.
　Ｂ）　Ｙが、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、またはテトラジニル基のとき、Ｙは、式（ｂ）
Figure JPOXMLDOC01-appb-C000005
で表される部分構造（ここで、ＤおよびＤ１は前記と同義であり、ｍｂは０～３の整数を表す。）を表す。 B) When Y is a pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group, Y is a group represented by the formula (b)
Figure JPOXMLDOC01-appb-C000005
(Wherein D and D1 are as defined above, and mb represents an integer of 0 to 3).
　式（ｂ）のＧ１、Ｇ２、Ｇ３およびＧ４は、それぞれ独立していて、炭素原子または窒素原子を表す。ただし、Ｇ１、Ｇ２、Ｇ３およびＧ４のうち、少なくとも一つは窒素原子である。好ましいＧ１、Ｇ２、Ｇ３およびＧ４は、Ｇ１、Ｇ２、Ｇ３およびＧ４のうち、いずれか一つが窒素原子である。すなわち、ピリジル基である。
　式（ｂ）のｍｂは、０～３の整数を表す。
　式（ｂ）のｍｂが２以上の場合、２以上のＤ１は、それぞれ独立した置換基を表し、同一、または異なっていてよく、任意に選択することができる。 G1, G2, G3 and G4 in the formula (b) are each independently a carbon atom or a nitrogen atom. However, at least one of G1, G2, G3 and G4 is a nitrogen atom. Preferred G1, G2, G3 and G4 are any one of G1, G2, G3 and G4 being a nitrogen atom. That is, it is a pyridyl group.
In the formula (b), mb represents an integer of 0 to 3.
When mb in the formula (b) is 2 or more, 2 or more D1s each represent an independent substituent, may be the same or different, and can be arbitrarily selected.
　本明細書においてＹがピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、またはテトラジニル基の場合、オルト位とは、式（ｂ）に示されるように、置換基Ｄがある６員環の位置を意味する。
　式（ｂ）の部分構造の具体例を以下に示す。 In the present specification, when Y is a pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group, the ortho position means a 6-membered ring having a substituent D as shown in the formula (b). Means the position of
Specific examples of the partial structure of the formula (b) are shown below.
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
　置換基Ｄがオルト位に位置したピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、またはテトラジニル基は、本発明の特徴をなしている。 A pyridyl group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, or tetrazinyl group in which the substituent D is located in the ortho position is a feature of the present invention.
　式（ｂ）の好ましい組み合わせは、３－Ｄ－２－ピリジル基、３－Ｄ－５－Ｄ１－２－ピリジル基、２－Ｄ－３－ピリジル基、２－Ｄ－４－Ｄ１－３－ピリジル基、２－Ｄ－６－Ｄ１－３－ピリジル基、２－Ｄ－４－Ｄ１－６－Ｄ１－３－ピリジル基、４－Ｄ－３－ピリジル基、４－Ｄ－２－Ｄ１－３－ピリジル基、４－Ｄ－６－Ｄ１－３－ピリジル基、４－Ｄ－２－Ｄ１－６－Ｄ１－３－ピリジル基、３－Ｄ－４－ピリジル基、または３－Ｄ－５－Ｄ１－４－ピリジル基である。 Preferred combinations of formula (b) are 3-D-2-pyridyl group, 3-D-5-D1-2-pyridyl group, 2-D-3-pyridyl group, 2-D-4-D1-3- Pyridyl group, 2-D-6-D1-3-pyridyl group, 2-D-4-D1-6-D1-3-pyridyl group, 4-D-3-pyridyl group, 4-D-2-D1- 3-pyridyl group, 4-D-6-D1-3-pyridyl group, 4-D-2-D1-6-D1-3-pyridyl group, 3-D-4-pyridyl group, or 3-D-5 -D1-4-pyridyl group.
　Ｃ）　Ｙが、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基のとき、Ｙは、式（ｃ－１）
Figure JPOXMLDOC01-appb-C000007
 式（ｃ－２）
Figure JPOXMLDOC01-appb-C000008
 または、式（ｃ－３）
Figure JPOXMLDOC01-appb-C000009
で表される部分構造（ここで、ＤおよびＤ１は前記と同義であり、ｍｃは０～２の整数を表す。）を表す。 C) When Y is a thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group, Y is a group represented by the formula (c-1)
Figure JPOXMLDOC01-appb-C000007
 Formula (c-2)
Figure JPOXMLDOC01-appb-C000008
 Or the formula (c-3)
Figure JPOXMLDOC01-appb-C000009
(Wherein D and D1 are as defined above, and mc represents an integer of 0 to 2).
　式（ｃ－１）、式（ｃ－２）および式（ｃ－３）におけるＧ５とＧ６は、それぞれ独立していて、炭素原子または窒素原子を表す。
　式（ｃ－１）、式（ｃ－２）および式（ｃ－３）のｍｃは、０～２の整数を表す。
　式（ｃ－１）、式（ｃ－２）および式（ｃ－３）のｍｃが２の場合、２のＤ１は、それぞれ独立した置換基を表し、同一または異なっていてよく、任意に選択することができる。 G5 and G6 in formula (c-1), formula (c-2) and formula (c-3) are each independently a carbon atom or a nitrogen atom.
In the formula (c-1), the formula (c-2) and the formula (c-3), mc represents an integer of 0 to 2.
When mc in formula (c-1), formula (c-2), and formula (c-3) is 2, D1 in 2 represents an independent substituent, and may be the same or different and arbitrarily selected can do.
　本明細書においてＹがチエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基の場合、オルト位とは、式（ｃ－１）、式（ｃ－２）および式（ｃ－３）に示されるように、置換基Ｄがある５員環の位置を意味する。
　式（ｃ－１）の部分構造の具体例を以下に示す。 In the present specification, when Y is a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group, the ortho position is represented by the formula (c-1), the formula (c-2), and the formula (c-3). Means the position of the 5-membered ring having the substituent D.
Specific examples of the partial structure of the formula (c-1) are shown below.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
　式（ｃ－２）の部分構造の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000011
 Specific examples of the partial structure of the formula (c-2) are shown below.
Figure JPOXMLDOC01-appb-C000011
　式（ｃ－３）の部分構造の置換基の具体例を以下に示す。
Figure JPOXMLDOC01-appb-C000012
 Specific examples of the substituent of the partial structure of the formula (c-3) are shown below.
Figure JPOXMLDOC01-appb-C000012
　置換基Ｄがオルト位に位置したチエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基は、本発明の特徴をなしている。 The thienyl group, thiazolyl group, isothiazolyl group, or thiadiazolyl group in which the substituent D is located in the ortho position is a feature of the present invention.
　式（１）における破線部を含む結合は、
Figure JPOXMLDOC01-appb-C000013
で表される箇所を表す。
　式（１）における破線部を含む結合は、二重結合または単結合を表す。 The bond including the broken line in Equation (1) is
Figure JPOXMLDOC01-appb-C000013
This represents the location represented by.
The bond including the broken line part in Formula (1) represents a double bond or a single bond.
　式（１）における破線部を含む結合が二重結合の場合は、式（１ａ）
Figure JPOXMLDOC01-appb-C000014
 When the bond including the broken line in formula (1) is a double bond, formula (1a)
Figure JPOXMLDOC01-appb-C000014
（式中、Ｒ１、Ｒ２、Ｒ３、Ｘ、Ｙおよびｎは、式（１）と同義である。）で表される化合物、またはその塩を表す。 (Wherein R1, R2, R3, X, Y and n are as defined in formula (1)), or a salt thereof.
　式（１）における破線部を含む結合が単結合の場合は、式（１ｂ）
Figure JPOXMLDOC01-appb-C000015
 When the bond including the broken line in Formula (1) is a single bond, Formula (1b)
Figure JPOXMLDOC01-appb-C000015
（式中、Ｒ１、Ｒ２、Ｒ３、Ｘ、Ｙおよびｎは、式（１）と同義である。）で表される化合物、またはその塩を表す。 (Wherein R1, R2, R3, X, Y and n are as defined in formula (1)), or a salt thereof.
　式（１ｂ）におけるＲ３が水素以外の置換基の場合、Ｒ体もしくはＳ体のどちらか一方のみ、またはＲ体とＳ体との任意の割合の混合物である。 When R3 in the formula (1b) is a substituent other than hydrogen, only one of the R-form and S-form, or a mixture of the R-form and the S-form in an arbitrary ratio.
　式（１）で表される化合物は、１個または２個の軸不斉を有することがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。
　式（１）で表される化合物は、不斉原子を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。
　式（１）で表される化合物は、幾何異性体を含むことがある。この際の異性体比は、単独または任意の割合の混合比であり、特に限定されることはない。 The compound represented by formula (1) may have one or two axial asymmetry. In this case, the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
The compound represented by Formula (1) may contain an asymmetric atom. In this case, the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
The compound represented by Formula (1) may contain geometric isomers. In this case, the isomer ratio is a single or an arbitrary mixing ratio, and is not particularly limited.
　式（１）で表される化合物は、塩を形成できることがある。塩酸、硫酸、酢酸、フマル酸、マレイン酸のような酸塩や、ナトリウム、カリウム、カルシウムのような金属塩等が例示されるが、抗真菌剤として使用できる限り、特に限定されることはない。 The compound represented by the formula (1) may be able to form a salt. Examples include acid salts such as hydrochloric acid, sulfuric acid, acetic acid, fumaric acid and maleic acid, and metal salts such as sodium, potassium and calcium, but there is no particular limitation as long as they can be used as antifungal agents. .
　次に、本発明の具体的な化合物は表１に示す構造式と、表２に示す（Ｒ２）ｎと、酸素原子または硫黄原子であるＸとの組み合わせによって表される。これらの化合物は例示のためのものであって、本発明はこれらに限定されるものではない。 Next, the specific compound of the present invention is represented by a combination of the structural formula shown in Table 1, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. These compounds are for illustrative purposes, and the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000024
Figure JPOXMLDOC01-appb-T000024
Figure JPOXMLDOC01-appb-T000025
Figure JPOXMLDOC01-appb-T000025
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000026
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000029
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000031
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000033
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000035
　以下、例えば、表２中の「２－Ｆ－」との記載は、（Ｒ２）ｎが結合するフェニル基の２位にフッ素原子が結合していることを意味し、「２－Ｆ－３－ＨＯ－」との記載は、２位にフッ素原子が結合し、３位に水酸基が結合していることを意味し、「２，３－ｄｉ－Ｆ」との記載は、２位と３位にフッ素原子が結合していることを意味し、他の記載も同様である。 Hereinafter, for example, the description “2-F—” in Table 2 means that a fluorine atom is bonded to the 2-position of the phenyl group to which (R2) n is bonded, and “2-F-3” The description “—HO—” means that a fluorine atom is bonded to the 2-position and a hydroxyl group is bonded to the 3-position. The description of “2,3-di-F” means that the 2-position and 3 This means that a fluorine atom is bonded to the position, and other descriptions are the same.
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000037
Figure JPOXMLDOC01-appb-T000037
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000046
Figure JPOXMLDOC01-appb-T000047
Figure JPOXMLDOC01-appb-T000047
Figure JPOXMLDOC01-appb-T000048
Figure JPOXMLDOC01-appb-T000048
Figure JPOXMLDOC01-appb-T000049
Figure JPOXMLDOC01-appb-T000049
Figure JPOXMLDOC01-appb-T000050
Figure JPOXMLDOC01-appb-T000050
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000052
Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000053
Figure JPOXMLDOC01-appb-T000054
Figure JPOXMLDOC01-appb-T000054
Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000055
Figure JPOXMLDOC01-appb-T000056
Figure JPOXMLDOC01-appb-T000056
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000057
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000059
Figure JPOXMLDOC01-appb-T000060
Figure JPOXMLDOC01-appb-T000060
Figure JPOXMLDOC01-appb-T000061
Figure JPOXMLDOC01-appb-T000061
Figure JPOXMLDOC01-appb-T000062
Figure JPOXMLDOC01-appb-T000062
Figure JPOXMLDOC01-appb-T000063
Figure JPOXMLDOC01-appb-T000063
　以下に、式（１）で表される化合物の製造方法を例示する。
［製造方法Ａ］ Below, the manufacturing method of the compound represented by Formula (1) is illustrated.
[Production Method A]
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000064
　式中、Ｒ４は、水素原子、水酸基、シアノ基、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、Ｃ２～Ｃ６のハロアルキニル基、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、Ｃ２～Ｃ６のハロアルケニルオキシ基、置換基Ａで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、Ｃ３～Ｃ６のハロアルキニルオキシ基、またはＲ１０Ｒ１１Ｎ－（ここで、Ｒ１０およびＲ１１は、それぞれ独立していて、水素原子、またはＣ１～Ｃ６のアルキル基を表す。）を表し、Ｒ５は、水素原子、またはＣ１～Ｃ６のアルキル基を表し、ｎ、Ｒ２、Ｒ３、ＸおよびＹは、前記と同義である。 In the formula, R4 is a hydrogen atom, a hydroxyl group, a cyano group, a C1-C6 alkyl group that may be optionally substituted with a substituent A, a C1-C6 haloalkyl group, or a C3-optionally substituted C3- A C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with substituent A, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with substituent A, C2- C6 haloalkynyl group, C1-C6 alkoxy group optionally substituted with substituent A, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group optionally substituted with substituent A, substituted A C2-C6 alkenyloxy group optionally substituted with the group A, a C2-C6 haloalkenyloxy group, a C3-C6 alkynyloxy group optionally substituted with the substituent A, Represents a 3-C6 haloalkynyloxy group, or R10R11N- (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group), R5 represents a hydrogen atom, Alternatively, it represents a C1-C6 alkyl group, and n, R2, R3, X and Y are as defined above.
　製造方法Ａは、本発明化合物および本発明化合物の製造中間体を含む式（１ｂ－ａ）で表される化合物を得る方法であって、式（３）で表される化合物とＲ４ＮＨ２とを、酸存在下で反応させることを含む製造方法である。 Production method A is a method for obtaining a compound represented by the formula (1b-a) containing the compound of the present invention and a production intermediate of the compound of the present invention, wherein the compound represented by formula (3) and R4NH 2 are obtained. , A production method comprising reacting in the presence of an acid.
　本反応に使用するＲ４ＮＨ２は、市販品として入手または公知の方法で製造することができる。Ｒ４ＮＨ２は、塩酸、酢酸のような酸性化合物との塩を形成したものでもよく、目的とする反応が進行する限りにおいて特に限定されることはない。 R4NH 2 used in this reaction can be produced by obtaining or known manner as a commercially available product. R4NH 2 are hydrochloric, may be those forming a salt with an acidic compound such as acetic acid, it is not particularly limited as long as the reaction proceeds to the desired.
　本反応に使用するＲ４ＮＨ２は、式（３）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上２００当量以下である。 R4NH 2 used in this reaction may if 1 equivalent or more relative to the compound represented by formula (3), but are not particularly limited as long as the reaction proceeds to the desired, preferably, 1 Equivalent to 200 equivalents.
　本反応に使用する酸として、塩酸、硫酸等の無機酸類や、酢酸、メタンスルホン酸、ｐ－トルエンスルホン酸等の有機酸類が例示され、目的とする反応が進行する限りにおいて特に限定することはないが、好ましくは、酢酸である。また、Ｒ４ＮＨ２と酸性化合物との塩を使用する際には、酸の使用は必須ではない。 Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid and sulfuric acid, and organic acids such as acetic acid, methanesulfonic acid, and p-toluenesulfonic acid, and are particularly limited as long as the target reaction proceeds. Although not preferred, acetic acid is preferred. Further, when using salts with R4NH 2 and the acidic compound, the use of acid is not essential.
　本反応に使用する酸の量は、Ｒ４ＮＨ２に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上２００当量以下である。また、使用する酸が液体である場合には、溶媒として使用することも可能である。 The amount of the acid used in this reaction may if 1 equivalent or more relative to the R4NH 2, is not limited in particular as long as the reaction proceeds to the desired, preferably, one or more equivalents 200 equivalent or less is there. Moreover, when the acid to be used is a liquid, it can also be used as a solvent.
　本反応には溶媒を使用することができるが、必ずしも必須ではない。
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。溶媒として、好ましくは、酸性系溶媒が挙げられ、さらに好ましくは、酢酸が挙げられる。 Although a solvent can be used for this reaction, it is not necessarily essential.
The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as acetic acid and methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran, dioxane, alcohol solvents such as methanol, ethanol, isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ethyl acetate, isopropyl acetate, butyl acetate, etc. Ester solvents, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea systems such as 1,3-dimethyl-2-imidazolidinone solvent Dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more. The solvent is preferably an acidic solvent, more preferably acetic acid.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（３）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、５０℃以上１８０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１ｂ－ａ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b-a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１ｂ－ａ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ｂ－ａ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1b-a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b-a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
　製造方法Ａによると、式（１ｂ－ａ）で表される化合物においてＲ４が水素原子を表すときに製造することができる式（２）で表される化合物は、本発明化合物のうち、式（１ｂ）で表される化合物を得る有用な製造中間体となりうる。 According to production method A, the compound represented by formula (2), which can be produced when R4 represents a hydrogen atom in the compound represented by formula (1b-a), It can be a useful production intermediate for obtaining the compound represented by 1b).
　式（２）で表される製造中間体の具体例は、表３に示す構造式と、表２に示す（Ｒ２）ｎと、酸素原子または硫黄原子であるＸとの組み合せによって表される。これらの化合物は、例示のためのものであって、本発明はこれらに限定されるものではない。 A specific example of the production intermediate represented by the formula (2) is represented by a combination of the structural formula shown in Table 3, (R2) n shown in Table 2, and X which is an oxygen atom or a sulfur atom. These compounds are for illustrative purposes, and the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-T000069
Figure JPOXMLDOC01-appb-T000069
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000071
Figure JPOXMLDOC01-appb-T000071
　この式（２）で表される化合物を製造中間体として利用し、本発明の式（１ｂ）を得る方法を説明する。 A method for obtaining the formula (1b) of the present invention using the compound represented by the formula (2) as a production intermediate will be described.
［製造方法Ｂ］
Figure JPOXMLDOC01-appb-C000072
 [Production Method B]
Figure JPOXMLDOC01-appb-C000072
　式中、Ｌｖはメタンスルホニル基、トリフルオロメタンスルホニル基、ｐ－トルエンスルホニル基、ハロゲン原子等の脱離基を表し、Ｒ１、Ｒ２、Ｒ３、Ｘ、Ｙおよびｎは、前記と同義である。 In the formula, Lv represents a methanesulfonyl group, a trifluoromethanesulfonyl group, a p-toluenesulfonyl group, a leaving group such as a halogen atom, and R1, R2, R3, X, Y, and n are as defined above.
　製造方法Ｂは、式（１ｂ）で表される化合物を得る方法であって、式（２）で表される製造中間体とＲ１Ｌｖとを、塩基の存在下、溶媒中で反応させることを含む製造方法である。 Production method B is a method for obtaining a compound represented by formula (1b), which comprises reacting the production intermediate represented by formula (2) with R1Lv in a solvent in the presence of a base. It is a manufacturing method.
　本反応に使用するＲ１Ｌｖは、市販品として入手または公知の方法で製造することができる。 R1Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
　本反応に使用するＲ１Ｌｖの量は、式（２）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。 The amount of R1Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
　本反応に使用する塩基として、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Examples of the base used in this reaction include inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, and sodium hydride, but are particularly limited as long as the intended reaction proceeds. It will never be done.
　本反応に使用する塩基の量は、式（２）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (2), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（２）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (2). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１ｂ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１ｂ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ｂ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｃ］
Figure JPOXMLDOC01-appb-C000073
 [Production Method C]
Figure JPOXMLDOC01-appb-C000073
　式中、ＳＲは硫黄化剤を表し、Ｒ１、Ｒ２、Ｒ３、Ｙおよびｎは前記と同義である。 In the formula, SR represents a sulfurizing agent, and R1, R2, R3, Y, and n are as defined above.
　製造方法Ｃは、式（１ｂ）で表される化合物のうち、式（１ｂ－ｃ）で表される化合物を得る製造方法であって、式（１ｂ－ｂ）で表される化合物と硫黄化剤（ＳＲ）とを、溶媒中で反応させることを含む製造方法である。 Production method C is a production method for obtaining a compound represented by formula (1b-c) among the compounds represented by formula (1b), wherein the compound represented by formula (1b-b) is sulfurated. It is a manufacturing method including making an agent (SR) react in a solvent.
　本反応に使用する硫黄化剤としては、ローソン試薬（２，４－ビス（４－メトキシフェニル）－１，３－ジチア－２，４－ジホスフェタン－２，４－ジスルフィド）等が挙げられる。 Examples of the sulfurizing agent used in this reaction include Lawesson's reagent (2,4-bis (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide).
　本反応に使用する硫黄化剤の量は、式（１ｂ－ｂ）で表される化合物に対して０．５当量以上あればよく、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上１０当量以下である。 The amount of the sulfurizing agent used in this reaction may be 0.5 equivalent or more with respect to the compound represented by the formula (1b-b), and is not particularly limited as long as the target reaction proceeds. However, it is preferably 1 equivalent or more and 10 equivalents or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ｂ－ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-b). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、５０℃以上１８０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 50 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応においては、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. In this reaction, a liquid separation operation is not essential.
　前記で得られた式（１ｂ－ｃ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
　前記で得られた式（１ｂ－ｃ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ｂ－ｃ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1b-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b-c) obtained after the solvent is distilled off can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｄ］
Figure JPOXMLDOC01-appb-C000074
 [Production Method D]
Figure JPOXMLDOC01-appb-C000074
　式中、Ｒ３ａは、置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基を表し、Ｌｖ、Ｒ１、Ｒ２、Ｘ、Ｙおよびｎは前記と同義である。 In the formula, R3a is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C2-C6 alkenyl group optionally substituted with C, C2-C6 haloalkenyl group, C2-C6 alkynyl group optionally substituted with substituent C, or C2-C6 haloalkynyl group , Lv, R1, R2, X, Y, and n are as defined above.
　製造方法Ｄは、式（１ｂ）で表される化合物のうち、Ｒ３ａが置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基である式（１ｂ－ｅ）で表される化合物の合成方法であって、式（１ｂ－ｄ）で表される化合物とＲ３ａＬｖとを、塩基の存在下、溶媒中で反応させることを含む製造方法である。 In the production method D, in the compound represented by the formula (1b), R3a is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C. C3-C8 cycloalkyl group, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C A method for synthesizing a compound represented by the formula (1b-e), which is an alkynyl group or a C2-C6 haloalkynyl group, comprising the step of synthesizing a compound represented by the formula (1b-d) with R3aLv in the presence of a base It is a manufacturing method including making it react in a solvent below.
　本反応に使用するＲ３ａＬｖは、市販品として入手または公知の方法で製造することができる。
　本反応に使用するＲ３ａＬｖの量は、式（１ｂ－ｄ）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１．８当量以下である。 R3aLv used in this reaction can be obtained as a commercial product or can be produced by a known method.
The amount of R3aLv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but is preferably Is 1 equivalent or more and 1.8 equivalent or less.
　本反応に使用する塩基として、水素化ナトリウム等の金属ヒドリド類、メチルリチウム、ブチルリチウム、ｓｅｃ－ブチルリチウム、ｔ－ブチルリチウム、ヘキシルリチウム等の有機リチウム類や、リチウムジイソプロピルアミド、ヘキサメチルジシラザンリチウム、ヘキサメチルジシラザンナトリウム、ヘキサメチルジシラザンカリウム等の金属アミド類が例示される。 Bases used in this reaction include metal hydrides such as sodium hydride, organic lithiums such as methyl lithium, butyl lithium, sec-butyl lithium, t-butyl lithium, hexyl lithium, lithium diisopropylamide, hexamethyldisilazane Examples thereof include metal amides such as lithium, sodium hexamethyldisilazane, and potassium hexamethyldisilazane.
　本反応に使用する塩基の量は、式（１ｂ－ｄ）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。 The amount of the base used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1b-d), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Examples thereof include benzene-based solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ｂ－ｄ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1b-d). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、－８０℃以上１００℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from −80 ° C. to 100 ° C. or the boiling point of the solvent.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl It is possible to add a solvent that is not compatible with water, such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane. Is possible. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１ｂ－ｅ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1b-e) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１ｂ－ｅ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ｂ－ｅ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1b-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1b-e) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｅ］
Figure JPOXMLDOC01-appb-C000075
 [Production Method E]
Figure JPOXMLDOC01-appb-C000075
　式中、Ｏｘは酸化剤を表し、Ｒ１、Ｒ２、Ｒ３、Ｘ、Ｙおよびｎは、前記と同義である。 In the formula, Ox represents an oxidizing agent, and R1, R2, R3, X, Y, and n are as defined above.
　製造方法Ｅは、式（１ａ）で表される化合物を得る方法であって、式（１ｂ）で表される化合物と酸化剤（Ｏｘ）とを、溶媒中で反応させることを含む製造方法である。 Production method E is a method for obtaining a compound represented by formula (1a), which comprises reacting a compound represented by formula (1b) with an oxidizing agent (Ox) in a solvent. is there.
　本反応に使用する酸化剤としては、二酸化マンガン等の金属酸化物類、２，３－ジクロロ－５，６－ジシアノ－ｐ－ベンゾキノン等のベンゾキノン類、アゾビスイソブチロニトリル、過酸化ベンゾイル等のラジカル開始剤とＮ－クロロスクシンイミド、Ｎ－ブロモスクシンイミド、Ｎ－ヨードスクシンイミド、１，３－ジクロロ－５，５－ジメチルヒダントイン、１，３－ジブロモ－５，５－ジメチルヒダントイン、１，３－ジヨード－５，５－ジメチルヒダントイン等のハロゲン化剤とを組み合わせたもの等を使用することができる。 Examples of the oxidizing agent used in this reaction include metal oxides such as manganese dioxide, benzoquinones such as 2,3-dichloro-5,6-dicyano-p-benzoquinone, azobisisobutyronitrile, and benzoyl peroxide. Radical initiators of N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1,3-dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3- A combination with a halogenating agent such as diiodo-5,5-dimethylhydantoin can be used.
　以下、酸化剤が金属酸化物類である方法について説明する。
　本反応に使用する酸化剤の量は、式（１ｂ）に表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、１当量以上２００当量以下である。 Hereinafter, a method in which the oxidizing agent is a metal oxide will be described.
The amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 200 equivalents.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、溶解していない金属類を濾過することにより除去することが可能である。さらに、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to remove undissolved metals by filtering. Furthermore, it is possible to carry out a liquid separation operation by adding water or a suitable aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. In this reaction, a liquid separation operation is not essential.
　前記で得られた式（１ａ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１ａ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ａ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
　　以下、酸化剤がベンゾキノン類である方法について説明する。
　本反応に使用する酸化剤の量は、式（１ｂ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、１当量以上２０当量以下である。 Hereinafter, a method in which the oxidizing agent is a benzoquinone will be described.
The amount of the oxidizing agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1b). Equivalent to 20 equivalents.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the intended reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, dichloromethane, dichloroethane, chloroform, And halogen-based solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、本反応において、分液操作は必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. In this reaction, a liquid separation operation is not essential.
　前記で得られた式（１ａ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１ａ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ａ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
　以下、酸化剤がラジカル開始剤とハロゲン化剤との組み合わせである方法について説明する。
　本反応に使用するラジカル開始剤とハロゲン化剤の量は、それぞれ、式（１ｂ）で表される化合物に対して０．０１当量以上と１．０当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。好ましくは、ラジカル開始剤が０．０１当量以上１当量以下であり、ハロゲン化剤が１当量以上３当量以下である。 Hereinafter, a method in which the oxidizing agent is a combination of a radical initiator and a halogenating agent will be described.
If the amount of the radical initiator and the halogenating agent used in this reaction is 0.01 equivalent or more and 1.0 equivalent or more with respect to the compound represented by the formula (1b), the target reaction proceeds. As long as it does, it will not specifically limit. Preferably, the radical initiator is 0.01 equivalent to 1 equivalent and the halogenating agent is 1 equivalent to 3 equivalent.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、クロロベンゼン、ジクロロベンゼン等のハロゲン化ベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but halogenated benzene solvents such as chlorobenzene and dichlorobenzene, and ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate. Examples of the solvent include halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (1b). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、２０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl It is possible to add a solvent that is not compatible with water, such as an ether solvent such as t-butyl ether, a halogen solvent such as dichloromethane, dichloroethane, or chloroform, or a hydrocarbon solvent such as hexane, heptane, cyclohexane, or methylcyclohexane. Is possible. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１ａ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１ａ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ａ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1a) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｆ］
Figure JPOXMLDOC01-appb-C000076
 [Production Method F]
Figure JPOXMLDOC01-appb-C000076
　式中、Ｒ３ｂはハロゲン原子を表し、ＨａｌＲはハロゲン化剤を表し、Ｒ１、Ｒ２、Ｘ、Ｙおよびｎは前記と同義である。 In the formula, R3b represents a halogen atom, HalR represents a halogenating agent, and R1, R2, X, Y, and n are as defined above.
　製造方法Ｆは、式（１ａ）で表される化合物のうち、Ｒ３ｂがハロゲン原子を表す式（１ａ－ｂ）で表される化合物を得る製造方法であって、式（１ａ－ａ）で表される化合物とハロゲン化剤（ＨａｌＲ）とを、溶媒中で反応させることを含む製造方法である。 Production method F is a production method for obtaining a compound represented by formula (1a-b) in which R3b represents a halogen atom among the compounds represented by formula (1a), which is represented by formula (1a-a). And a halogenating agent (HalR) in a solvent.
　本反応に使用するハロゲン化剤としては、セレクトロフルオル（Ｎ－フルオロ－Ｎ’－トリエチレンジアミン　ビス（テトラフルオロボラート））、Ｎ－クロロスクシンイミド、Ｎ－ブロモスクシンイミド、Ｎ－ヨードスクシンイミド、１，３－ジクロロ－５，５－ジメチルヒダントイン、１，３－ジブロモ－５，５－ジメチルヒダントイン、１，３－ジヨード－５，５－ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectfluoro (N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
　本反応に使用するハロゲン化剤の量は、式（１ａ－ａ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、０．５当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、好ましくは、１当量以上５当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-a). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
　本反応に使用するハロゲン化剤がヨウ素化剤である場合、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸を加えることができる。
　本反応に使用するハロゲン化剤がヨウ素化剤である場合に使用する酸の量は、式（１ａ－ａ）で表される化合物に対して０．０１当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、０．１当量以上３当量以下である。 When the halogenating agent used in this reaction is an iodinating agent, add an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid. Can do.
When the halogenating agent used in this reaction is an iodinating agent, the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1a-a), Although it does not restrict | limit especially as long as it advances, Preferably it is 0.1 equivalent or more and 3 equivalent or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ａ－ａ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-a). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１ａ－ｂ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1a-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１ａ－ｂ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ａ－ｂ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1a-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a-b) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｇ］
Figure JPOXMLDOC01-appb-C000077
 [Production Method G]
Figure JPOXMLDOC01-appb-C000077
　式中、Ｒ３ｃは置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基を表し、Ｊは酸素原子または硫黄原子を表し、Ｑは水素原子または金属を表し、Ｒ１、Ｒ２、Ｒ３ｂ、Ｘ、Ｙおよびｎは前記と同義である。 In the formula, R3c is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C A C2-C6 alkenyl group optionally substituted with C2, a C2-C6 haloalkenyl group, a C2-C6 alkynyl group optionally substituted with a substituent C, or a C2-C6 haloalkynyl group, J represents an oxygen atom or a sulfur atom, Q represents a hydrogen atom or a metal, and R1, R2, R3b, X, Y, and n have the same meanings as described above.
　製造方法Ｇは、式（１ａ）で表される化合物のうち、Ｒ３ｃが、置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、Ｃ２～Ｃ６のハロアルケニル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基を表し、Ｊが酸素原子または硫黄原子を表す式（１ａ－ｃ）で表される化合物の合成法であって、式（１ａ－ｂ）で表される化合物とＲ３ｃ－Ｊ－Ｑとを、遷移金属類の存在下に反応させるカップリング反応によって得ることを含む製造方法である。 In the production method G, in the compound represented by the formula (1a), R3c is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C. C3-C8 cycloalkyl group, C2-C6 alkenyl group optionally substituted with substituent C, C2-C6 haloalkenyl group, C2-C6 optionally substituted with substituent C Or a haloalkynyl group of C2 to C6, wherein J is an oxygen atom or a sulfur atom, and is a method of synthesizing a compound represented by the formula (1a-b) A compound obtained by a coupling reaction in which R3c-JQ is reacted in the presence of a transition metal.
　式（１ａ－ｂ）で表される化合物中、好ましいＲ３ｂは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1a-b), preferred R 3b is a chlorine atom, a bromine atom, or an iodine atom.
　本反応に使用するＲ３ｃ－Ｊ－Ｑは、市販品として入手または公知の方法で製造できる。好ましいＱは、水素原子、または、ナトリウム、カリウム等のアルカリ金属類である。
　本反応に使用するＲ３ｃ－Ｊ－Ｑの量は、式（１ａ－ｂ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはない。Ｑが水素原子のときは、溶媒としても使用可能である。 R3c-JQ used in this reaction is obtained as a commercial product or can be produced by a known method. Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
The amount of R3c-JQ used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). . When Q is a hydrogen atom, it can also be used as a solvent.
　本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、［１，１’－ビス（ジフェニルホスフィノ）フェロセン］パラジウムジクロリド、トリス（ジベンジリデンアセトン）ジパラジウム、テトラキス（トリフェニルホスフィン）パラジウム、ビス（トリフェニルホスフィン）パラジウムジクロリド等のパラジウム類等である。 The transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride.
　本反応に使用する遷移金属類の量は、式（１ａ－ｂ）で表される化合物に対して０．００１当量以上１当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. Never happen.
　本反応を効率的に進行させるために、トリフェニルホスフィン、１，１’－ビス（ジフェニルホスフィノ）フェロセン、２－ジシクロヘキシルホスフィノ－２’４’６’－トリイソプロピルビフェニル、２－ジ－ｔ－ブチルホスフィノ－２’４’６’－トリイソプロピルビフェニル等のホスフィン配位子を添加することができる。 In order to make this reaction proceed efficiently, triphenylphosphine, 1,1′-bis (diphenylphosphino) ferrocene, 2-dicyclohexylphosphino-2′4′6′-triisopropylbiphenyl, 2-di-t -A phosphine ligand such as butylphosphino-2'4'6'-triisopropylbiphenyl can be added.
　本反応に使用するホスフィン配位子の量は、式（１ａ－ｂ）で表される化合物に対して０．００１当量以上１当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
　本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウムのような無機塩基類やトリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン等の有機塩基類等である。 The base used in this reaction is an inorganic base such as sodium carbonate, potassium carbonate or cesium carbonate, or an organic base such as triethylamine, tributylamine or diisopropylethylamine.
　本反応に使用する塩基の量は、式（１ａ－ｂ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上５０当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、Ｒ３ｃ－Ｊ－Ｈ（式中、Ｒ３ｃは前記と同義であり、Ｊは酸素原子である）で表されるアルコール溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but R3c-JH (wherein R3c has the same meaning as described above and J is an oxygen atom). And ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, and benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. It is done. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ａ－ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、３０℃以上２００℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
　前記で得られた式（１ａ－ｃ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ａ－ｃ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1a-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｈ］
Figure JPOXMLDOC01-appb-C000078
 [Production Method H]
Figure JPOXMLDOC01-appb-C000078
　式中、Ｒ３ｄは置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、またはＣ２～Ｃ６のハロアルケニル基を表し、Ｒ３ｄ－Ｂは有機ボロン酸類を表し、Ｒ１、Ｒ２、Ｒ３ｂ、Ｘ、Ｙおよびｎは前記と同義である。 In the formula, R3d is a C1-C6 alkyl group optionally substituted with a substituent C, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group optionally substituted with a substituent C, a substituent C Represents an optionally substituted C2-C6 alkenyl group or C2-C6 haloalkenyl group, R3d-B represents an organic boronic acid, and R1, R2, R3b, X, Y and n are as defined above. It is.
　製造方法Ｈは、式（１ａ）で表される化合物のうち、Ｒ３ｄが置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、またはＣ２～Ｃ６のハロアルケニル基である式（１ａ－ｄ）で表される化合物の合成方法であって、式（１ａ－ｂ）で表される化合物と有機ボロン酸類（Ｒ３ｄ－Ｂ）とを遷移金属類および塩基の存在下で反応させる鈴木－宮浦カップリングによって得ることを含む製造方法である。 In the production method H, R3d in the compound represented by the formula (1a) is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent C, which may be optionally substituted with a substituent C. A compound represented by the formula (1a-d), which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent C, or a C2-C6 haloalkenyl group. A method of synthesis comprising obtaining a compound of formula (1a-b) and an organoboronic acid (R3d-B) by a Suzuki-Miyaura coupling in the presence of a transition metal and a base Is the method.
　式（１ａ－ｂ）中、好ましいＲ３ｂは、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (1a-b), preferred R 3b is a chlorine atom, a bromine atom, or an iodine atom.
　本反応に使用するＲ３ｄ－Ｂは、有機ボロン酸や有機ボロン酸エステル等の有機ボロン酸類を表し、市販品として入手または公知の方法で製造できる。
　本反応に使用するＲ３ｄ－Ｂの量は、式（１ａ－ｂ）で表される化合物に対して、１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上１０当量以下である。 R3d-B used in this reaction represents an organic boronic acid such as an organic boronic acid or an organic boronic acid ester, and can be obtained as a commercial product or produced by a known method.
The amount of R3d-B used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
　本反応に使用する遷移金属類は、パラジウム、ニッケル、ルテニウム等であり、配位子を有してよい。好ましくは、酢酸パラジウム、［１，１’－ビス（ジフェニルホスフィノ）フェロセン］パラジウムジクロリド、トリス（ジベンジリデンアセトン）ジパラジウム、テトラキス（トリフェニルホスフィン）パラジウム、ビス（トリフェニルホスフィン）パラジウムジクロリド等のパラジウム類が挙げられる。 The transition metals used in this reaction are palladium, nickel, ruthenium, etc., and may have a ligand. Preferably, palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis (triphenylphosphine) palladium, bis (triphenylphosphine) palladium dichloride, etc. Palladium is mentioned.
　本反応に使用する遷移金属類の量は、式（１ａ－ｂ）で表される化合物に対して０．００１当量以上１当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the transition metal used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. Never happen.
　本反応を効率的に進行させるために、トリフェニルホスフィン、トリシクロヘキシルホスフィン等のホスフィン配位子を添加することができる。
　本反応に使用するホスフィン配位子の量は、式（１ａ－ｂ）で表される化合物に対して０．００１当量以上１当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 In order to advance this reaction efficiently, phosphine ligands such as triphenylphosphine and tricyclohexylphosphine can be added.
The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
　本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、カリウム　ｔ－ブトキシド等の金属アルコキシド類等である。 The base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
　本反応に使用する塩基の量は、式（１ａ－ｂ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上５０当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. And benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ａ－ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、３０℃以上２００℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 30 ° C. or higher and 200 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
　前記で得られた式（１ａ－ｄ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。 The reaction mixture containing the compound represented by the formula (1a-d) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
　溶媒留去後に得られた式（１ａ－ｄ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by formula (1a-d) obtained after evaporation of the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｉ］
Figure JPOXMLDOC01-appb-C000079
 [Production Method I]
Figure JPOXMLDOC01-appb-C000079
　式中、Ｒ３ｅは置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基を表し、Ｒ１、Ｒ２、Ｒ３ｂ、Ｘ、Ｙおよびｎは前記と同義である。 In the formula, R3e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C, and R1, R2, R3b, X, Y and n are as defined above. .
　製造方法Ｉは、式（１ａ）で表される化合物のうち、Ｒ３ｅが置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基である式（１ａ－ｅ）で表される化合物の合成方法であって、（１ａ－ｂ）で表される化合物と末端アルキン化合物とを遷移金属類および塩基の存在下で反応させる園頭カップリングによって得ることを含む製造方法である。 In the production method I, in the compound represented by the formula (1a), R3e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group optionally substituted with a substituent C (1a- A method for synthesizing the compound represented by e), comprising obtaining the compound represented by (1a-b) and the terminal alkyne compound by Sonogashira coupling in the presence of a transition metal and a base. It is a manufacturing method.
　式（１ａ－ｂ）中、好ましいＲ３ｂは、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (1a-b), preferred R 3b is a chlorine atom, a bromine atom, or an iodine atom.
　本反応に使用する末端アルキン化合物は、市販品として入手または公知の方法で製造することができる。また、末端アルキン化合物として、トリメチルシリルアセチレンも使用することができる。この場合は、式（１ａ－ｂ）で表される化合物にトリメチルシリルエチニル基を導入後、脱シリル化を行う必要がある。脱シリル化については、ジャーナル　オブ　ザ　アメリカン　ケミカル　ソサエティー（Ｊｏｕｒｎａｌ　ｏｆ　ｔｈｅ　Ａｍｅｒｉｃａｎ　Ｃｈｅｍｉｃａｌ　Ｓｏｃｉｅｔｙ）、第１３１巻、２号、６３４－６４３頁（２００９）．およびジャーナル　オブ　オルガノメタリック　ケミストリー（Ｊｏｕｒｎａｌ　ｏｆ　Ｏｒｇａｎｏｍｅｔａｌｌｉｃ　Ｃｈｅｍｉｓｔｒｙ）、６９６巻、２５号、４０３９－４０４５頁（２０１１）．等の非特許文献を参考にして行うことができる。 The terminal alkyne compound used in this reaction can be obtained as a commercial product or produced by a known method. Trimethylsilylacetylene can also be used as the terminal alkyne compound. In this case, it is necessary to perform desilylation after introducing a trimethylsilylethynyl group into the compound represented by the formula (1a-b). For the desilylation, Journal of the American Chemical Society, Vol. 131, No. 2, pp. 634-643 (2009), Journal of the American Chemical Society. And Journal of Organometallic Chemistry (Vol. 696, No. 25, pages 4039-4045 (2011)), Journal of Organometallic Chemistry (Journal of Organometallic Chemistry). It can carry out with reference to nonpatent literatures, such as.
　本反応に使用する末端アルキン化合物の量は、式（１ａ－ｂ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上１０当量以下である。 The amount of the terminal alkyne compound used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). Preferably, it is 1 equivalent or more and 10 equivalents or less.
　本反応に使用する遷移金属類は、配位子を有してよく、酢酸パラジウム、［１，１’－ビス（ジフェニルホスフィノ）フェロセン］パラジウムジクロリド、トリス（ジベンジリデンアセトン）ジパラジウム、テトラキス（トリフェニルホスフィン）パラジウム、ビス（トリフェニルホスフィン）パラジウムジクロリド等のパラジウム類等である。また、塩化銅、臭化銅、ヨウ化銅等の銅類も同時に使用する。 The transition metal used in this reaction may have a ligand, such as palladium acetate, [1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris (dibenzylideneacetone) dipalladium, tetrakis ( Palladiums such as triphenylphosphine) palladium and bis (triphenylphosphine) palladium dichloride. Further, coppers such as copper chloride, copper bromide and copper iodide are also used at the same time.
　本反応に使用する遷移金属類の量は、パラジウム類等および銅類が、それぞれ式（１ａ－ｂ）で表される化合物に対して０．００１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはない。好ましい量は、双方ともに０．００１当量以上１当量以下である。 The amount of the transition metal used in this reaction may be 0.001 equivalent or more with respect to the compound represented by the formula (1a-b) for palladium and the like, respectively, and the target reaction proceeds. There is no particular limitation as long as it does. A preferable amount is 0.001 equivalent or more and 1 equivalent or less for both.
　本反応に使用する塩基は、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン類や、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩基類等が挙げられる。 Examples of the base used in this reaction include organic amines such as triethylamine, tributylamine, isopropylamine, diethylamine, diisopropylamine and diisopropylethylamine, and inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate.
　本反応に使用する塩基の量は、式（１ａ－ｂ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上５０当量以下である。また、有機塩基で液体状のものに関しては、溶媒として使用することができる。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1a-b). 1 equivalent or more and 50 equivalents or less. In addition, when the organic base is liquid, it can be used as a solvent.
　本反応を効率的に進行させるために、トリｔ－ブチルホスフィン、２－ジシクロヘキシルホスフィノ－２’４’６’－トリイソプロピルビフェニル等のホスフィン配位子を添加することができるが、必須ではない。 A phosphine ligand such as tri-t-butylphosphine or 2-dicyclohexylphosphino-2'4'6'-triisopropylbiphenyl can be added to allow the reaction to proceed efficiently, but it is not essential. .
　本反応に使用するホスフィン配位子の量は、式（１ａ－ｂ）で表される化合物に対して０．００１当量以上１当量以下であるが、目的とする反応が進行する限りにおいて特に限定されることはない。 The amount of the phosphine ligand used in this reaction is 0.001 equivalent or more and 1 equivalent or less with respect to the compound represented by the formula (1a-b), but is particularly limited as long as the target reaction proceeds. It will never be done.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、トリエチルアミン、トリブチルアミン、イソプロピルアミン、ジエチルアミン、ジイソプロピルアミン、ジイソプロピルエチルアミン等の有機アミン溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, N-methylpyrrolidone, N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, triethylamine, Butylamine, isopropylamine, diethylamine, diisopropylamine, organic amine solvents such as diisopropylethylamine. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１ａ－ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1a-b). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。また、濾過操作を行うことにより、不溶物を除去することも可能であるが必須ではない。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more of them can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield. Further, it is possible to remove insoluble matters by performing a filtration operation, but this is not essential.
　前記で得られた式（１ａ－ｅ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１ａ－ｅ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1a-e) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1a-e) obtained after the solvent is distilled off can be purified with an appropriate solvent by washing, reprecipitation, recrystallization, column chromatography or the like. What is necessary is just to set suitably according to the target purity.
［製造方法Ｊ］
Figure JPOXMLDOC01-appb-C000080
 [Production Method J]
Figure JPOXMLDOC01-appb-C000080
　式中、Ｒ２ａはＣ１～Ｃ６のアルコキシ基を表し、ｎｂは０～４の整数（ただし、ｎｂが２以上のときは、２以上のＲ２はそれぞれ独立した置換基を表す。）を表し、Ｒ１、Ｒ２、Ｒ３、Ｘ、Ｙおよび破線部は前記と同義である。 In the formula, R2a represents a C1 to C6 alkoxy group, nb represents an integer of 0 to 4 (provided that when nb is 2 or more, each of R2 and 2 represents an independent substituent), R1 , R2, R3, X, Y and the broken line part have the same meanings as described above.
　製造方法Ｊは、式（１）で表される化合物のうち、水酸基を有する式（１－ｂ）で表される化合物の合成方法であって、Ｒ２ａがＣ１～Ｃ６のアルコキシ基である式（１－ａ）で表される化合物と酸とを反応させることによって得ることを含む製造方法である。 Production method J is a method for synthesizing a compound represented by formula (1-b) having a hydroxyl group among the compounds represented by formula (1), wherein R2a is a C1-C6 alkoxy group ( This is a production method comprising obtaining the compound represented by 1-a) by reacting with an acid.
　本反応に使用する酸として、三塩化ホウ素、三臭化ホウ素等のハロゲン化ホウ素類等がある。 The acid used for this reaction includes boron halides such as boron trichloride and boron tribromide.
　本反応に使用する酸の量は、式（１－ａ）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。 The amount of acid used in this reaction may be 1 equivalent or more with respect to the compound represented by the formula (1-a), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、アセトニトリル等のニトリル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, and nitrile solvents such as acetonitrile. And halogen solvents such as dichloromethane, dichloroethane, chloroform and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane and methylcyclohexane. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１－ａ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-a). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、－８０℃以上１００℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually from −80 ° C. to 100 ° C. or the boiling point of the solvent.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１－ｂ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１－ｂ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１－ｂ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｋ］
Figure JPOXMLDOC01-appb-C000081
 [Production Method K]
Figure JPOXMLDOC01-appb-C000081
　式中、Ｒ２ｂ－Ｏ－は、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、Ｃ２～Ｃ６のハロアルケニルオキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、Ｃ３～Ｃ６のハロアルキニルオキシ基、またはＲ２０Ｃ（＝Ｏ）Ｏ－基を表し、Ｌｖ、Ｒ１、Ｒ２、Ｒ３、Ｒ２０、Ｘ、Ｙ、ｎｂおよび破線部は前記と同義である。 In the formula, R2b—O— is a C1-C6 alkoxy group optionally substituted with the substituent B, a C1-C6 haloalkoxy group, a C3-C8 cycloalkoxy optionally substituted with the substituent B. Group, C2 to C6 alkenyloxy group optionally substituted with substituent B, C2 to C6 haloalkenyloxy group, C3 to C6 alkynyloxy group optionally substituted with substituent B, C3 to C6 A haloalkynyloxy group or an R20C (═O) O— group, and Lv, R1, R2, R3, R20, X, Y, nb and the broken line are as defined above.
　製造方法Ｋは、式（１）で表される化合物のうち、Ｒ２ｂ－Ｏ－が、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、Ｃ２～Ｃ６のハロアルケニルオキシ基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、Ｃ３～Ｃ６のハロアルキニルオキシ基、またはＲ２０Ｃ（＝Ｏ）Ｏ－基（Ｒ２０は、前記と同義である。）を表す式（１－ｃ）で表される化合物の合成方法であって、式（１－ｂ）で表される化合物とＲ２ｂ－Ｌｖとを、塩基存在下、溶媒中で反応させることを含む製造方法である。 In the production method K, in the compound represented by the formula (1), R2b—O— may be optionally substituted with a substituent B, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, a substituent C3-C8 cycloalkoxy group optionally substituted with B, C2-C6 alkenyloxy group optionally substituted with substituent B, C2-C6 haloalkenyloxy group, optionally substituted with substituent B A C3-C6 alkynyloxy group, a C3-C6 haloalkynyloxy group, or an R20C (═O) O— group (wherein R20 is as defined above). A process for synthesizing a compound represented by formula (1-b) comprising reacting a compound represented by formula (1-b) with R2b-Lv in a solvent in the presence of a base.
　本反応に使用するＲ２ｂ－Ｌｖは、市販品として入手または公知の方法で製造することができる。
　本反応に使用するＲ２ｂ－Ｌｖは、式（１－ｂ）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。 R2b-Lv used in this reaction can be obtained as a commercial product or can be produced by a known method.
R2b-Lv used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds, but preferably Is 1 equivalent or more and 10 equivalents or less.
　本反応に使用する塩基として、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類や、トリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン、ピリジン、４－ジメチルアミノピリジン、コリジン、ルチジン等の有機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Bases used in this reaction include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride, and organic bases such as triethylamine, tributylamine, diisopropylethylamine, pyridine, 4-dimethylaminopyridine, collidine, and lutidine. However, there is no particular limitation as long as the target reaction proceeds.
　本反応に使用する塩基は、式（１－ｂ）で表される化合物に対して１当量以上あればよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。 The base used in this reaction may be 1 equivalent or more with respect to the compound represented by formula (1-b), and is not particularly limited as long as the target reaction proceeds. 1 equivalent or more and 10 equivalents or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the desired reaction proceeds, but ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, Alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, Chloroform, halogenated solvents such as carbon tetrachloride, dimethyl sulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１－ｂ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-b). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、－２０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −20 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１－ｃ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-c) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
　前記で得られた式（１－ｃ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１－ｃ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-c) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-c) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｌ］
Figure JPOXMLDOC01-appb-C000082
 [Production Method L]
Figure JPOXMLDOC01-appb-C000082
　式中、Ｒ２ｃはハロゲン原子を表し、Ｒ２ｄは置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、またはＣ２～Ｃ６のハロアルケニル基を表し、Ｒ２ｄ－Ｂは有機ボロン酸類を表し、Ｒ１、Ｒ２、Ｒ３、ｎｂ、Ｘ、Ｙおよび破線部は前記と同義である。 In the formula, R2c represents a halogen atom, and R2d is a C1-C6 alkyl group optionally substituted with the substituent B, a C1-C6 haloalkyl group, a C3-C8 optionally substituted with the substituent B A cycloalkyl group, a C2-C6 alkenyl group optionally substituted with a substituent B, or a C2-C6 haloalkenyl group, R2d-B represents an organic boronic acid, R1, R2, R3, nb, X, Y, and the broken line are as defined above.
　製造方法Ｌは、式（１）で表される化合物のうち、Ｒ２ｄが置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、またはＣ２～Ｃ６のハロアルケニル基である式（１－ｅ）で表される化合物の合成方法であって、式（１－ｄ）で表される化合物と有機ボロン酸類（Ｒ２ｄ－Ｂ）とを反応させる鈴木－宮浦カップリングによって得ることを含む製造方法である。 In the production method L, among the compounds represented by the formula (1), R2d is optionally substituted with a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a substituent B which may be optionally substituted with a substituent B. Of the compound represented by the formula (1-e), which may be a C3-C8 cycloalkyl group, a C2-C6 alkenyl group optionally substituted with the substituent B, or a C2-C6 haloalkenyl group. A synthesis method comprising obtaining by a Suzuki-Miyaura coupling in which a compound represented by the formula (1-d) and an organic boronic acid (R2d-B) are reacted.
　式（１－ｄ）中、好ましいＲ２ｃは、塩素原子、臭素原子、またはヨウ素原子である。 In the formula (1-d), R2c is preferably a chlorine atom, a bromine atom, or an iodine atom.
　製造方法Ｈにおける式（１ａ－ｂ）で表される化合物とＲ３ｄ－Ｂとを、それぞれ式（１－ｄ）で表される化合物とＲ２ｄ－Ｂとに代えて使用することにより、製造方法Ｈに準じて製造方法Ｌを実施することができる。 By using the compound represented by formula (1a-b) and R3d-B in production method H instead of the compound represented by formula (1-d) and R2d-B, respectively, production method H The production method L can be carried out according to the above.
［製造方法Ｍ］
Figure JPOXMLDOC01-appb-C000083
 [Production method M]
Figure JPOXMLDOC01-appb-C000083
　式中、Ｒ２ｅは置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基を表し、Ｒ１、Ｒ２、Ｒ２ｃ、Ｒ３、ｎｂ、Ｘ、Ｙおよび破線部は前記と同義である。 In the formula, R2e represents a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with the substituent B, and R1, R2, R2c, R3, nb, X, Y and the broken line part It is synonymous with the above.
　製造方法Ｍは、式（１）で表される化合物のうち、Ｒ２ｅが置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、またはＣ２～Ｃ６のハロアルキニル基である式（１－ｆ）で表される化合物の合成方法であって、式（１－ｄ）で表される化合物と末端アルキン化合物とを反応させる園頭カップリングによって得ることを含む製造方法である。 In the production method M, among the compounds represented by the formula (1), R2e is a C2-C6 alkynyl group or a C2-C6 haloalkynyl group which may be optionally substituted with a substituent B (1- A method for synthesizing the compound represented by f), which comprises obtaining the compound represented by the formula (1-d) by Sonogashira coupling with a terminal alkyne compound.
　式（１－ｄ）で表される化合物中、好ましいＲ２ｃは、塩素原子、臭素原子、またはヨウ素原子である。 In the compound represented by the formula (1-d), preferable R2c is a chlorine atom, a bromine atom, or an iodine atom.
　製造方法Ｉにおける式（１ａ－ｂ）で表される化合物を式（１－ｄ）で表される化合物に代えて使用することにより、製造方法Ｉに準じて製造方法Ｍを実施することができる。 By using the compound represented by the formula (1a-b) in the production method I instead of the compound represented by the formula (1-d), the production method M can be carried out according to the production method I. .
［製造方法Ｎ］
Figure JPOXMLDOC01-appb-C000084
 [Production Method N]
Figure JPOXMLDOC01-appb-C000084
　式中、Ｄａはハロゲン原子を表し、Ｄ１ａはハロゲン原子を表し、Ｄ１ｂはＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、またはＣ３～Ｃ８のシクロアルコキシ基を表し、Ｅはハロゲンで置換された炭素原子または窒素原子を表し、Ｒ１、Ｒ２、Ｒ３、ｎ、Ｘ、Ｑおよび破線部は前記と同義である。 In the formula, Da represents a halogen atom, D1a represents a halogen atom, D1b represents a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group, and E represents a halogen atom. Represents a carbon atom or a nitrogen atom, and R 1, R 2, R 3, n, X, Q, and a broken line part are as defined above.
　製造方法Ｎは、式（１）で表される化合物のうち、Ｄ１ｂがＣ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、またはＣ３～Ｃ８のシクロアルコキシ基であり、Ｅがハロゲン原子で置換された炭素原子または窒素原子である式（１－ｈ）で表される化合物の合成方法であって、式（１－ｇ）で表される化合物とＤ１ｂ－Ｑとを、溶媒中で反応させることを含む製造方法である。 In the production method N, among the compounds represented by the formula (1), D1b is a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, or a C3-C8 cycloalkoxy group, and E is a halogen atom. A method for synthesizing a compound represented by formula (1-h), which is a substituted carbon atom or nitrogen atom, comprising reacting a compound represented by formula (1-g) with D1b-Q in a solvent. Manufacturing method.
　本反応で使用されるＤ１ｂ－Ｑは、市販品として入手または公知の方法で製造することができる。好ましいＱは、水素原子、またはナトリウム、カリウム等のアルカリ金属類である。 D1b-Q used in this reaction can be obtained as a commercial product or can be produced by a known method. Preferred Q is a hydrogen atom or an alkali metal such as sodium or potassium.
　本反応で使用されるＤ１ｂ－Ｑの量は、式（１－ｇ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上３０当量以下である。また、Ｑが水素原子を表すときは、溶媒として使用することができる。 The amount of D1b-Q used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). Preferably, it is 1 equivalent or more and 30 equivalent or less. Moreover, when Q represents a hydrogen atom, it can be used as a solvent.
　本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水素化ナトリウム等の無機塩基類が好ましい。また、Ｑがアルカリ金属類のときは、塩基の使用は、必須ではない。 The base used in this reaction is preferably an inorganic base such as sodium carbonate, potassium carbonate, cesium carbonate or sodium hydride. Further, when Q is an alkali metal, the use of a base is not essential.
　本反応に使用する塩基の量は、式（１－ｇ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上３０当量以下である。 The amount of the base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-g). 1 equivalent or more and 30 equivalent or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、Ｄ１ｂ－Ｈで表されるアルコール系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but alcohol solvents represented by D1b-H, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxy Ether solvents such as ethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitrile solvents such as acetonitrile, Amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane, chloroform, carbon tetrachloride etc Halogenated solvents, dimethylsulfoxide, sulfur-based solvents such as sulfolane, acetone, methyl ethyl ketone, ketone solvents such as methyl isobutyl ketone. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１－ｇ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by the formula (1-g). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１－ｈ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-h) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but it is not essential.
　前記で得られた式（１－ｈ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１－ｈ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-h) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-h) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｏ］
Figure JPOXMLDOC01-appb-C000085
 [Production Method O]
Figure JPOXMLDOC01-appb-C000085
　式中、Ｒ２ｅは置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基を表し、Ｒ２ｆは置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基を表し、Ｒ２ｇはハロゲン原子を表し、ＨａｌＲ、Ｒ１、Ｒ３、Ｘ、Ｙおよび破線部は前記と同義である。 In the formula, R2e represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B, R2f represents a C1-C6 alkoxy group that may be optionally substituted with the substituent B, and R2g represents a halogen atom. In the formula, HalR, R1, R3, X, Y and the broken line part are as defined above.
　製造方法Ｏは、式（１）で表される化合物のうち、Ｒ２ｅが置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基であり、Ｒ２ｆが置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基であり、Ｒ２ｇがハロゲン原子である式（１－ｊ）で表される化合物を得る製造方法であって、式（１－ｉ）で表される化合物とハロゲン化剤（ＨａｌＲ）とを、溶媒中で反応させることを含む製造方法である。 In the production method O, among the compounds represented by the formula (1), R2e is a C1-C6 alkoxy group which may be appropriately substituted with the substituent B, and R2f may be appropriately substituted with the substituent B. A production method for obtaining a compound represented by the formula (1-j), which is a C1-C6 alkoxy group and R2g is a halogen atom, comprising a compound represented by the formula (1-i) and a halogenating agent ( HalR) in a solvent.
　本反応に使用するハロゲン化剤としては、セレクトロフルオル（Ｎ－フルオロ－Ｎ’－トリエチレンジアミン　ビス（テトラフルオロボラート））、Ｎ－クロロスクシンイミド、Ｎ－ブロモスクシンイミド、Ｎ－ヨードスクシンイミド、１，３－ジクロロ－５，５－ジメチルヒダントイン、１，３－ジブロモ－５，５－ジメチルヒダントイン、１，３－ジヨード－５，５－ジメチルヒダントイン、臭素、ヨウ素等が挙げられる。 As the halogenating agent used in this reaction, selectfluoro (N-fluoro-N′-triethylenediamine bis (tetrafluoroborate)), N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, 1 1,3-Dichloro-5,5-dimethylhydantoin, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-diiodo-5,5-dimethylhydantoin, bromine, iodine and the like.
　本反応に使用するハロゲン化剤の量は、式（１－ｉ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、１当量以上１０当量以下である。ただし、ヒダントインを含むハロゲン化剤の量は、０．５当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはなく、好ましくは１当量以上５当量以下である。 The amount of the halogenating agent used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (1-i). Preferably, it is 1 equivalent or more and 10 equivalents or less. However, the amount of the halogenating agent containing hydantoin is not particularly limited as long as the target reaction proceeds as long as it is 0.5 equivalent or more, and preferably 1 equivalent or more and 5 equivalents or less.
　本反応に使用するハロゲン化剤がヨウ素化剤である場合、塩酸、硫酸等の無機酸類や、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の有機酸のような酸を加えることができる。
　本反応に使用するハロゲン化剤がヨウ素化剤である場合に使用する酸の量は、式（１－ｉ）で表される化合物に対して０．０１当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、０．１当量以上３当量以下である。 When the halogenating agent used in this reaction is an iodinating agent, add an acid such as an inorganic acid such as hydrochloric acid or sulfuric acid, or an organic acid such as acetic acid, trifluoroacetic acid, methanesulfonic acid, or trifluoromethanesulfonic acid. Can do.
When the halogenating agent used in this reaction is an iodinating agent, the amount of acid used is 0.01 equivalent or more with respect to the compound represented by formula (1-i), and the target reaction Although it does not restrict | limit especially as long as it advances, Preferably it is 0.1 equivalent or more and 3 equivalent or less.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、硫酸、酢酸、トリフルオロ酢酸、メタンスルホン酸、トリフルオロメタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but acidic solvents such as sulfuric acid, acetic acid, trifluoroacetic acid, methanesulfonic acid and trifluoromethanesulfonic acid, diethyl ether , Ether solvents such as diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide 1,3-dimethyl-2-urea-based solvent-imidazolidinone, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（１－ｉ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but usually 3 to 200 times by weight with respect to the compound represented by the formula (1-i). It is as follows.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually 0 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（１－ｊ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (1-j) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（１－ｊ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（１－ｊ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (1-j) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (1-j) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｐ］
Figure JPOXMLDOC01-appb-C000086
 [Production Method P]
Figure JPOXMLDOC01-appb-C000086
　式中、ＬａはＳを表し、ＬｂはＳＯまたはＳＯ２を表し、Ｏｘ’は酸化剤を表す。 In the formula, La represents S, Lb represents SO or SO 2 , and Ox ′ represents an oxidizing agent.
　製造方法Ｐは、式（１）で表される化合物中、Ｒ１、Ｒ２およびＲ３に含まれるＬｂがＳＯまたはＳＯ２である式（Ｌｂ）で表される化合物の製造方法であって、一般式（１）中、Ｒ１、Ｒ２またはＲ３に含まれるＬａがＳである式（Ｌａ）で表される化合物と酸化剤（Ｏｘ’）とを、溶媒中で反応させることを含む製造方法である。 Production method P during the compound represented by formula (1), a process for the preparation of a compound represented by R1, Lb contained in R2 and R3 is SO or SO 2 wherein (Lb), the general formula In (1), this is a production method comprising reacting a compound represented by the formula (La) in which La contained in R1, R2 or R3 is S with an oxidizing agent (Ox ′) in a solvent.
　本反応に使用する酸化剤は、過酸化水素水、メタ－クロロ過安息酸等の過酸化物類等が挙げられる。また、タングステン酸ナトリウムのような遷移金属類を添加することもできる。 Examples of the oxidizing agent used in this reaction include peroxides such as hydrogen peroxide and meta-chloroperbenzoic acid. In addition, transition metals such as sodium tungstate can be added.
　本反応に使用する酸化剤の量は、ＳＯを製造する際には式（Ｌａ）で表される化合物に対して、通常、１．０当量以上１．２当量以下であり、ＳＯ２を製造する際には、通常、２当量以上１０当量以下である。また、遷移金属類を添加する際には、通常、０．００１当量以上１当量以下である。 The amount of the oxidizing agent used in this reaction is usually 1.0 equivalent or more and 1.2 equivalent or less with respect to the compound represented by the formula (La) when producing SO, and produces SO 2 . When doing, it is usually 2 equivalents or more and 10 equivalents or less. Moreover, when adding transition metals, it is 0.001 equivalent or more and 1 equivalent or less normally.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、酢酸等の酸性系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、アセトニトリル等のニトリル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an aqueous solvent, an acidic solvent such as acetic acid, benzene, toluene, xylene, mesitylene, chlorobenzene, dichlorobenzene, etc. Examples thereof include benzene solvents, nitrile solvents such as acetonitrile, and halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（Ｌａ）を有する式（１）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 times the weight of the compound represented by the formula (1) having the formula (La). More than 200 weight times.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、－１０℃以上１２０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −10 ° C. or higher and 120 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、チオ硫酸ナトリウム、亜硫酸ナトリウム等の硫黄を含む塩を溶解した水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, sodium thiosulfate, sulfurous acid An aqueous solution or a salt solution in which a salt containing sulfur such as sodium is dissolved can be arbitrarily used. During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（Ｌｂ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (Lb) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（Ｌｂ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（Ｌｂ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (Lb) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (Lb) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
　次に製造方法Ａに記載されている式（３）で表される化合物の合成方法について記載する。
［製造方法Ｑ］ 
Figure JPOXMLDOC01-appb-C000087
 Next, a method for synthesizing the compound represented by Formula (3) described in Production Method A will be described.
[Production method Q]
Figure JPOXMLDOC01-appb-C000087
　式中、Ｒ２、Ｒ３、Ｒ５、ｎ、ＸおよびＹは、前記と同義である。 In the formula, R2, R3, R5, n, X and Y have the same meanings as described above.
　製造方法Ｑは、式（３）で表される製造中間体の製造方法であって、式（４）で表される化合物と式（５）で表される化合物とを、塩基存在下溶媒中で反応させることを含む製造方法である。 Production method Q is a production method of a production intermediate represented by formula (3), in which a compound represented by formula (4) and a compound represented by formula (5) are mixed in a solvent in the presence of a base. It is a manufacturing method including making it react with.
　本反応に使用する式（４）で表される化合物は、例えば、グリーン　ケミストリー（Ｇｒｅｅｎ　Ｃｈｅｍｉｓｔｒｙ）、第４１巻、５８０－５８５頁や、ザ　ジャーナル　オブ　オルガニック　ケミストリー（Ｔｈｅ　Ｊｏｕｒｎａｌ　ｏｆ　Ｏｒｇａｎｉｃ　Ｃｈｅｍｉｓｔｒｙ）、第６５巻、２０号、６４５８－６４６１頁（２０００）．等を参照に合成することができる。 The compound represented by the formula (4) used in this reaction is, for example, Green Chemistry, Vol. 41, pages 580-585, The Journal of Organic Chemistry, No. 65, No. 20, pages 6458-6461 (2000). Etc. can be synthesized by reference.
　本反応に使用する式（５）で表される化合物は、市販品として入手または公知の方法で製造することができる。
　本反応に使用する式（５）で表される化合物の量は、式（４）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは１当量以上３当量以下である。 The compound represented by Formula (5) used for this reaction can be obtained as a commercial product or can be produced by a known method.
The amount of the compound represented by the formula (5) used in this reaction is particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by the formula (4). However, it is preferably 1 equivalent or more and 3 equivalents or less.
　本反応に使用する塩基は、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウムのような無機塩基類やナトリウムメトキシド、ナトリウムエトキシド、カリウム　ｔ－ブトキシド等の金属アルコキシド類等である。 The base used in this reaction includes inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, and tripotassium phosphate, and metal alkoxides such as sodium methoxide, sodium ethoxide, and potassium t-butoxide.
　本反応に使用する塩基は、触媒量で実施することが可能であり、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、式（４）で表される化合物に対して０．０１当量以上３当量以下である。 The base used in this reaction can be carried out in a catalytic amount, and is not particularly limited as long as the target reaction proceeds, but preferably the compound represented by formula (4) is used. On the other hand, it is 0.01 equivalent or more and 3 equivalent or less.
　本反応に使用する溶媒は、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ジメチルスルホキシド、スルホラン等の硫黄系溶媒、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 Solvents used in this reaction are ether solvents such as diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, Ester solvents such as ethyl acetate, isopropyl acetate, butyl acetate, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl -2-Urea solvents such as imidazolidinone, halogen solvents such as dichloromethane, dichloroethane, chloroform, carbon tetrachloride, sulfur solvents such as dimethyl sulfoxide, sulfolane, acetone, methyl ethyl ketone, methyl Ketone solvents such as Sobuchiruketon like. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（４）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (4). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、－５０℃以上１５０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −50 ° C. or higher and 150 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理としては、反応混合物に対して、水または適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液や食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As a post-treatment of the reaction, it is possible to perform a liquid separation operation by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid or the like is dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like is dissolved, or an arbitrary aqueous solution is used. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（３）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (3) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（３）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（３）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (3) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by the formula (3) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography or the like with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
［製造方法Ｒ］
Figure JPOXMLDOC01-appb-C000088
 [Production method R]
Figure JPOXMLDOC01-appb-C000088
　式中、Ｒ５ａはＣ１～Ｃ６のアルキル基を表し、Ｒ２、Ｒ３、ｎ、ＸおよびＹは前記と同義である。 In the formula, R5a represents a C1 to C6 alkyl group, and R2, R3, n, X, and Y are as defined above.
　製造方法Ｒは、式（３）で表される化合物のうち、式（３ｂ）で表される製造中間体の製造方法であって、式（３ａ）で表される化合物を、酸性条件または塩基性条件下、溶媒中で反応させることを含む製造方法である。 Production method R is a production method of a production intermediate represented by formula (3b) among the compounds represented by formula (3), wherein the compound represented by formula (3a) is subjected to acidic conditions or a base. It is a manufacturing method including making it react in a solvent on sexual conditions.
　まず、酸性条件の反応について説明する。
　本反応に使用する酸は、塩酸、臭化水素酸、リン酸等の無機酸類や、酢酸、メタンスルホン酸、ｐ－トルエンスルホン酸、トリフルオロ酢酸等の有機酸類が例示される。目的とする反応が進行する限り特に制限されることはない。 First, the reaction under acidic conditions will be described.
Examples of the acid used in this reaction include inorganic acids such as hydrochloric acid, hydrobromic acid, and phosphoric acid, and organic acids such as acetic acid, methanesulfonic acid, p-toluenesulfonic acid, and trifluoroacetic acid. There is no particular limitation as long as the target reaction proceeds.
　本反応に使用する酸の量は、触媒量でもよく、目的とする反応が進行する限りにおいて特に制限されることはないが、好ましくは、式（３ａ）で表される化合物に対して０．０１当量以上である。また、液体状の酸に関しては溶媒として使用することも可能である。 The amount of the acid used in this reaction may be a catalytic amount, and is not particularly limited as long as the target reaction proceeds. Preferably, the amount of the acid is 0. 0 with respect to the compound represented by the formula (3a). 01 equivalents or more. Further, liquid acids can be used as solvents.
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、酢酸、メタンスルホン酸等の酸性系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but is not limited to an aqueous solvent, an acidic solvent such as acetic acid or methanesulfonic acid, diethyl ether, diisopropyl ether, methyl-t- Ether solvents such as butyl ether, dimethoxyethane, tetrahydrofuran and dioxane, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ethyl acetate, isopropyl acetate and acetic acid Ester solvents such as butyl, nitrile solvents such as acetonitrile, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, etc. No A solvent, dichloromethane, dichloroethane, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（３ａ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、０℃以上１８０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the target reaction proceeds, but is usually 0 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
　次に、塩基性条件の反応について説明する。
　本反応に使用する塩基は、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等の無機塩基類が例示されるが、目的とする反応が進行する限りにおいて特に限定されることはない。 Next, the reaction under basic conditions will be described.
Examples of the base used in this reaction include inorganic bases such as lithium hydroxide, sodium hydroxide, and potassium hydroxide, but are not particularly limited as long as the target reaction proceeds.
　本反応に使用する塩基は、式（３ａ）で表される化合物に対して１当量以上あれば、目的とする反応が進行する限りにおいて特に限定されることはないが、好ましくは、１当量以上３０当量以下である、 The base used in this reaction is not particularly limited as long as the target reaction proceeds as long as it is 1 equivalent or more with respect to the compound represented by formula (3a), but preferably 1 equivalent or more. 30 equivalents or less,
　本反応に使用する溶媒は、目的とする反応が進行する限りにおいて特に限定されることはないが、水溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、メタノール、エタノール、イソプロパノール等のアルコール系溶媒、ベンゼン、トルエン、キシレン、メシチレン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、アセトニトリル等のニトリル系溶媒、Ｎ－メチルピロリドン、Ｎ，Ｎ－ジメチルホルムアミド、Ｎ，Ｎ－ジメチルアセトアミド等のアミド系溶媒、１，３－ジメチル－２－イミダゾリジノン等のウレア系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒等が挙げられる。これらの溶媒は、単独または２種類以上を任意の割合で混合して使用することができる。 The solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but an ether such as an aqueous solvent, diethyl ether, diisopropyl ether, methyl-t-butyl ether, dimethoxyethane, tetrahydrofuran, dioxane, etc. Solvents, alcohol solvents such as methanol, ethanol and isopropanol, benzene solvents such as benzene, toluene, xylene, mesitylene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, nitriles such as acetonitrile Solvents, amide solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, urea solvents such as 1,3-dimethyl-2-imidazolidinone, dichloromethane, dichloroethane Down, chloroform, and halogen solvents such as carbon tetrachloride. These solvents can be used alone or in admixture of two or more.
　本反応に使用する溶媒量は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、式（３ａ）で表される化合物に対して３重量倍以上２００重量倍以下である。 The amount of the solvent used in this reaction is not particularly limited as long as the target reaction proceeds, but it is usually 3 to 200 times by weight with respect to the compound represented by formula (3a). is there.
　本反応を行う際の温度は、目的とする反応が進行する限りにおいて特に限定されることはないが、通常、－２０℃以上１８０℃以下または溶媒の沸点以下である。 The temperature at which this reaction is carried out is not particularly limited as long as the intended reaction proceeds, but is usually −20 ° C. or higher and 180 ° C. or lower or the boiling point of the solvent or lower.
　反応の後処理は、酸性条件での反応と塩基性条件の反応は共通の方法で行える。反応混合物に対して、水、もしくは適当な水溶液を加えることにより、分液操作を行うことが可能である。水溶液を使用する場合は、塩酸、硫酸等を溶解した酸性水溶液、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム等を溶解したアルカリ水溶液、食塩水等を任意に使用することができる。分液操作の際に、必要に応じて、トルエン、キシレン、ベンゼン、クロロベンゼン、ジクロロベンゼン等のベンゼン系溶媒、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル系溶媒、ジエチルエーテル、ジイソプロピルエーテル、メチル－ｔ－ブチルエーテル等のエーテル系溶媒、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素等のハロゲン系溶媒、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン等の炭化水素系溶媒等の水と相溶することのない溶媒を追加することが可能である。また、これらの溶媒は、単独で使用することも、２種類以上で任意の割合で混合することも可能である。分液の回数は特に制限されることがなく、目的とする純度や収量に応じて実施することができる。 As for the post-treatment of the reaction, the reaction under acidic conditions and the reaction under basic conditions can be performed by a common method. A liquid separation operation can be performed by adding water or an appropriate aqueous solution to the reaction mixture. When using an aqueous solution, an acidic aqueous solution in which hydrochloric acid, sulfuric acid, etc. are dissolved, an alkaline aqueous solution in which potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, etc. are dissolved, saline, etc. are optional. Can be used for During the liquid separation operation, benzene solvents such as toluene, xylene, benzene, chlorobenzene and dichlorobenzene, ester solvents such as ethyl acetate, isopropyl acetate and butyl acetate, diethyl ether, diisopropyl ether, methyl Solvents that are not compatible with water, such as ether solvents such as t-butyl ether, halogen solvents such as dichloromethane, dichloroethane, chloroform, and carbon tetrachloride, and hydrocarbon solvents such as hexane, heptane, cyclohexane, and methylcyclohexane. It is possible to add. Moreover, these solvents can be used alone, or two or more kinds can be mixed in an arbitrary ratio. The number of times of liquid separation is not particularly limited, and can be carried out according to the target purity and yield.
　前記で得られた式（３ｂ）で表される化合物を含む反応混合物は、硫酸ナトリウムや硫酸マグネシウム等の乾燥剤で水分を除去することができるが、必須ではない。 The reaction mixture containing the compound represented by the formula (3b) obtained above can remove moisture with a desiccant such as sodium sulfate or magnesium sulfate, but is not essential.
　前記で得られた式（３ｂ）で表される化合物を含む反応混合物は、化合物が分解しない限りにおいて、減圧下で溶媒留去することが可能である。
　溶媒留去後に得られた式（３ｂ）で表される化合物を含む反応混合物は、適当な溶媒により、洗浄、再沈殿、再結晶、カラムクロマトグラフィー等にて精製することができる。目的とする純度に応じて適宜設定すればよい。 The reaction mixture containing the compound represented by the formula (3b) obtained above can be distilled off under reduced pressure as long as the compound is not decomposed.
The reaction mixture containing the compound represented by formula (3b) obtained after distilling off the solvent can be purified by washing, reprecipitation, recrystallization, column chromatography, etc. with an appropriate solvent. What is necessary is just to set suitably according to the target purity.
　式（３ｂ）で表される化合物は、式（３ｂ’）
Figure JPOXMLDOC01-appb-C000089
（式中、Ｒ２、Ｒ３、ｎ、ＸおよびＹは前記と同義である。） The compound represented by the formula (3b) is represented by the formula (3b ′)
Figure JPOXMLDOC01-appb-C000089
(Wherein R2, R3, n, X and Y are as defined above.)
で表される異性体も含む。式（３ｂ’）で表される化合物は、式（３ｂ）で表される化合物と同様に取り扱うことが可能であり、製造方法Ａを適応することができる。また、式（３ｂ’）で表される化合物は不斉炭素を含むが、その異性体混合比は、単独でも任意の割合の混合物でもよい。さらに、式（３ｂ）で表される化合物と式（３ｂ’）で表される化合物との混合物でもよく、その異性体混合比は、単独でも任意の割合の混合物でもよい。 Is also included. The compound represented by the formula (3b ′) can be handled in the same manner as the compound represented by the formula (3b), and the production method A can be applied. Further, the compound represented by the formula (3b ′) contains an asymmetric carbon, but the isomer mixing ratio may be single or a mixture of any ratio. Further, it may be a mixture of the compound represented by the formula (3b) and the compound represented by the formula (3b ′), and the isomer mixing ratio may be a single compound or a mixture of any ratio.
　以上に示した、製造方法Ａ～製造方法Ｒを任意に組み合わせて、式（１）で表される化合物を製造することができる。もしくは、公知の方法と製造方法Ａ～製造方法Ｒとを任意に組み合わせても、式（１）で表される化合物を製造することができる。 The compound represented by the formula (1) can be produced by arbitrarily combining the production methods A to R shown above. Alternatively, the compound represented by the formula (1) can also be produced by arbitrarily combining known methods and production methods A to R.
　本発明における「真菌感染症」とは、哺乳動物（例えば、ヒト、マウス、ラット、ハムスター、ウサギ、ネコ、イヌ、ウシ、ヒツジ、サル等）や鳥類等に「真菌」が寄生・定着および／または感染した結果、引き起こされる症状であり、その症状により表在性真菌症、深在性真菌症、深部皮膚真菌症に分類される。
　表在性真菌症とは、哺乳動物等の皮膚の表層（角層）、爪、毛髪または皮膚に隣接する扁平上皮粘膜等表層のみに真菌が感染することで引き起こされる真菌症であり、例えば、各種白癬、黒色癬、頑癬、乾癬、皮膚・粘膜カンジダ感染症、マラセチア・フルフル感染症等が挙げられるが、これらに限定されるものではない。深在性真菌症とは、哺乳動物等の皮下組織、骨や関節、内臓、中枢神経等に真菌が侵入することで引き起こされる真菌症であり、疫学的ならびに病因的論点から日和見感染症と地域流行型感染症（輸入）に分けられる。日和見感染症とは、免疫力の低下した哺乳動物等に真菌が感染する真菌症であり、例えば、カンジダ感染症、アスペルギルス感染症、クリプトコッカス症、接合菌感染症、トリコスポリン感染症、ニューモシスチス感染症、フザリウム感染症、シュードアレシェリア感染症、ペロミセス感染症、マラセチア感染症、ロドトルラ感染症、アルタナリア感染症およびこれらが原因となる真菌性髄膜炎、眼内炎、真菌性呼吸器感染症、真菌血症、尿路真菌症等が挙げられるが、これらに限定されるものではない。地域流行型真菌症（輸入真菌症）とは、地球上の特定の地理的・気候的条件の地域に限って生息する真菌によって引き起こされる真菌症であり、例えば、コクジオイデス症、ヒストプラズマ症、パラコクシジオイデス症、マルネフェイ型ペニシリウム症、ブラストミセス症等が挙げられるが、これらに限定されるものではない。深部皮膚真菌症とは、土壌中や植物表面に生息する特定の真菌が皮膚の穿刺・創傷を介して偶発的に生体組織内へ侵入することによって引き起こされる真菌症であり、例えば、スポロトリコーシス・シェンキー感染症、黒色真菌感染症、真菌性菌腫等が挙げられるが、これらに限定されるものではない。 The term “fungal infection” in the present invention means that “fungus” is parasitic or established in mammals (eg, humans, mice, rats, hamsters, rabbits, cats, dogs, cows, sheep, monkeys, etc.) and birds. Or it is a symptom caused as a result of infection, and is classified into superficial mycosis, deep mycosis, and deep skin mycosis according to the symptom.
Superficial mycosis is a mycosis caused by infection of fungi only on the surface layer of the skin of mammals and the like (corneal layer), nail, hair or squamous epithelial mucosa adjacent to the skin, for example, Various types of ringworm, melanosis, scabies, psoriasis, skin / mucosal Candida infection, malassezia fullflu infection, and the like, are not limited thereto. Deep mycosis is a mycosis caused by fungus invading the subcutaneous tissue, bones, joints, internal organs, central nerves, etc. of mammals, etc. From an epidemiological and etiological point of view, It is divided into epidemic infections (import). Opportunistic infections are fungal diseases in which fungi are infected to mammals with reduced immunity, such as Candida infection, Aspergillus infection, cryptococcosis, zygomycosis, tricosporin infection, pneumocystis infection, Fusarium infection, Pseudolescheria infection, Peromyces infection, Malassezia infection, Rhodotorula infection, Alternaria infection and fungal meningitis caused by these, endophthalmitis, fungal respiratory infection, fungal blood Insects, urinary tract mycoses, and the like, but are not limited thereto. Local epidemic mycosis (imported mycosis) is a mycosis caused by a fungus that lives only in regions of specific geographical and climatic conditions on the earth, such as coccidioidomycosis, histoplasmosis, parasitism. Examples include, but are not limited to, coccidioidomycosis, marnefei-type penicillosis, blastosis, and the like. Deep cutaneous mycosis is a mycosis caused by a specific fungus inhabiting soil or plant surface accidentally entering a living tissue through skin puncture or wound. Examples include, but are not limited to, cis schenky infection, black fungal infection, and fungal mycomas.
　真菌感染症を引き起こす真菌、すなわち、哺乳動物等に病原性を示す病原性真菌は、真菌（菌類）の分類学上、子嚢菌類、担子菌類、接合菌類、不完全菌類等に含まれる。例えば、アスペルギルス属真菌（Ａｓｐｅｒｇｉｌｌｕｓ　ｓｐｐ．）、ヒストプラズマ属真菌（Ｈｉｓｔｏｐｌａｓｍａ ｓｐｐ．）、ブラストマイセス属菌（Ｂｌａｓｔｏｍｙｃｅｓ ｓｐｐ．）は子嚢菌類、クリプトコッカス属真菌（Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｓｐｐ．）は担子菌類、リゾムコール属真菌（Ｒｈｉｚｏｍｕｃｏｒ ｓｐｐ．）、ムコール属真菌（Ｍｕｃｏｒ　ｓｐｐ．）、リゾプス属真菌（Ｒｈｉｚｏｐｕｓ ｓｐｐ．）、アブシダ属真菌（Ａｂｓｉｄｉａ　ｓｐｐ．）、コニデオボルス属真菌（Ｃｏｎｉｄｉｏｂｏｌｕｓ　ｓｐｐ．）、バシデオボルス属真菌（Ｂａｓｉｄｉｏｂｏｌｕｓ　ｓｐｐ．）は接合菌類、カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）、フォンセカエラ属真菌（Ｆｏｎｓｅｃａｅｒａ　ｓｐｐ．）、マラセッジア属真菌（Ｍａｌａｓｓｅｚｉａ　ｓｐｐ．）、トリコスポリウム属真菌（Ｔｒｉｃｈｏｓｐｏｒｉｕｍ ｓｐｐ．）、スポロソリックス属真菌（Ｓｐｏｒｏｔｈｒｉｘ　ｓｐｐ）、トリコスポロン属菌（Ｔｒｉｃｈｏｓｐｏｒｏｎ　ｓｐｐ．）、マラセッジア属真菌（Ｍａｌａｓｓｅｚｉａ　ｓｐｐ．）は不完全菌類に分類される。また、真菌は栄養を摂取する細胞の形態・外観から、糸状菌、酵母に分類されている。例えば、アスペルギルス属真菌（Ａｓｐｅｒｇｉｌｌｕｓ　ｓｐｐ．）、ムコール属真菌（Ｍｕｃｏｒ　ｓｐｐ．）等は糸状菌、カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）は酵母に分類される。 Fungi that cause fungal infections, that is, pathogenic fungi that are pathogenic to mammals and the like are included in the taxonomic classification of fungi (fungi), such as ascomycetes, basidiomycetes, zygotes, and incomplete fungi. For example, Aspergillus spp., Histoplasma spp., Blastmyces spp. Is an ascomycete, Cryptococcus spp. Is a basidiomycete, Fungi (Rhizomucor spp.), Mucor spp., Rhizopus spp., Absidia spp., Conidiobolus spp. ) Are zygomycetes, Candida spp., Fonsecaera sp p.), Malassezia spp., Trichosporium spp., Sporothrix spp, Trichosporon spp., Malassezia sp. ) Is classified as incomplete fungi. In addition, fungi are classified into filamentous fungi and yeasts based on the form and appearance of cells that ingest nutrients. For example, Aspergillus spp., Mucor spp. And the like are classified as filamentous fungi, and Candida spp. Are classified as yeast.
　表在性真菌症を引き起こす病原性真菌としては、例えば、トリコフィトン属真菌（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｓｐｐ．）、例えば、トリコフィトン・アジェロイ（Ｔｒｉｃｈｏｐｈｙｔｏｎ ａｊｅｌｌｏｉ）、トリコフィトン・メンタグロフィテス（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｍｅｎｔａｇｒｏｐｈｙｔｅｓ）、トリコフィトン・テレストレ（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｔｅｒｒｅｓｔｒｅ）、トリコフィトン・ルブルム（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｒｕｂｒｕｍ）、トリコフィトン・メグニニイ（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｍｅｇｎｉｎｉｉ）、トリコフィトン・エクイヌム（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｅｑｕｉｎｕｍ）、トリコフィトン・シェーンライニイ（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｓｈｏｅｈｌｅｉｎｉｉ）、トリコフィトン・ルブルム（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｒｕｂｕｒｕｍ）、トリコフィトン・ヤウンデイ（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｙａｏｕｎｄｅｉ）、トリコフィトン・クインケアナム（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｑｕｉｎｋｅａｎｕｍ）、トリコフィトン・トンズランス（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｔｏｎｓｕｒａｎｓ）、トリコフィトン・ベルコスム（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｖｅｒｒｕｃｏｓｕｍ）、トリコフィトン・ビオラセウム（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｖｉｏｌａｃｅｕｍ）、トリコフィトン・インテルジギターレ（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｉｎｔｅｒｄｉｇｉｔａｌｅ）、トリコフィトン・ソウダネンセ（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｓｏｕｄａｎｅｎｓｅ）；ミクロスポルム属真菌（Ｍｉｃｒｏｓｐｏｒｕｍ ｓｐｐ．）、例えば、ミクロスポルム・ガリネ（Ｍｉｃｒｏｓｐｏｒｕｍ ｇａｌｌｉｎａｅ）、ミクロスポルム・フェルギネウム（Ｍｉｃｒｏｓｐｏｒｕｍ ｆｅｒｒｕｇｉｎｅｕｍ）、ミクロスポルム・オーズイニイ（Ｍｉｃｒｏｓｐｏｒｕｍ ａｕｄｏｕｉｎｉｉ）、ミクロスポルム・ジストルツム（Ｍｉｃｒｏｓｐｏｒｕｍ ｄｉｓｔｏｒｔｕｍ）、ミクロスポルム・ナヌム（Ｍｉｃｒｏｓｐｏｒｕｍ ｎａｎｕｍ）、ミクロスポルム・カニス（Ｍｉｃｒｏｓｐｏｒｕｍ ｃａｎｉｓ）、ミクロスポルム・ジプセウム（Ｍｉｃｒｏｓｐｏｒｕｍ ｇｙｐｓｅｕｍ）、ミクロスポルム・クーケイ（Ｍｉｃｒｏｓｐｏｒｕｍ ｃｏｏｋｅｉ）、ミクロスポルム・バンブルーゼゲミイ（Ｍｉｃｒｏｓｐｏｒｕｍ ｖａｎｂｒｅｕｓｅｇｈｅｍｉｉ）；エピデルモフィトン属真菌（Ｅｐｉｄｅｒｍｏｐｈｙｔｏｎ ｓｐｐ．）、例えば、エピデルモフィトン・フロコッサム（Ｅｐｉｄｅｒｍｏｐｈｙｔｏｎ ｆｌｏｃｃｏｓｕｍ）；カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）、例えば、カンジダ・グラブラタ（Ｃａｎｄｉｄａ ｇｌａｂｒａｔａ）、カンジダ・アルビカンス（Ｃａｎｄｉｄａ ａｌｂｉｃａｎｓ）、カンジダ・パラピシロシシ（Ｃａｎｄｉｄａ　ｐａｒａｐｓｉｌｏｓｉｓ）、カンジダ・トロピカリス（Ｃａｎｄｉｄａ　ｔｒｏｐｉｃａｌｉｓ）、カンジダ・ギリエロモンディ（Ｃａｎｄｉｄａ　ｇｕｉｌｌｉｅｒｍｏｎｄｉｉ）、カンジダ・クルセイ（Ｃａｎｄｉｄａ　ｋｒｕｓｅｉ）、カンジダ・ケフィール（Ｃａｎｄｉｄａ　ｋｅｆｙｒ）；マラセチア属真菌（Ｍａｌａｓｓｅｚｉａ ｓｐｐ．）、例えば、マラセチア・フルフル（Ｍａｌａｓｓｅｚｉａ ｆｕｒｆｕｒ）、マラセチア・パキデルマチス（Ｍａｌａｓｓｅｚｉａ ｐａｃｈｙｄｅｒｍａｔｉｓ）；スコプラリオプシス属真菌（Ｓｃｏｐｕｌａｒｉｏｐｓｉｓ　ｓｐｐ．）；スキタリジウム属真菌（Ｓｃｙｔａｌｉｄｉｕｍ　ｓｐｐ．）、例えば、スキタリジウム・ディミディアツム（Ｓｃｙｔａｌｉｄｉｕｍ　ｄｉｍｉｄｉａｔｕｍ）、スキタリジウム・ヒアリナム（Ｓｃｙｔａｌｉｄｉｕｍ ｈｙａｌｉｎｕｍ）、スタキリジウム・リグニコラ（Ｓｃｙｔａｌｉｄｉｕｍ ｌｉｇｎｉｃｏｌａ）等が挙げられるが、特にこれらに限定されるものではない。 Examples of pathogenic fungi that cause superficial mycosis include Trichophyton spp., For example, Trichophyton ajelloi, Trichophyton mentagrophytes, Trichophyton ｔmentagrophytons, Trichophyton mentagrophytons Trichophyton terrestre, Trichophyton rubrum, Trichophyton megnini, Trichophyton ｌｅ echineum (Trichophyton equinum) Iton rubrum (Trichophyton ruburum), Trichophyton Yaundei (Trichophyton yaoundei), Trichophyton Kuinkeanamu (Trichophyton quinkeanum), Trichophyton tonsurans (Trichophyton tonsurans), Trichophyton Berukosumu (Trichophyton verrucosum), Trichophyton violaceum (Trichophyton violaceum), Trichophyton ギ タ ー interdigitale, Trichophyton ダ soudanense; Microsporum s p.), for example, Microsporum gallinae, Microsporum porum, Microsporum murinum, Microsporum porum Microsporum canis, Microsporum gypseum, Microsporum cookei, Microsporum vanbreusegemii Epi Epidermophyton phytone genus fungi (Epidermophyton spp. ), For example, Epidermophyton floccosum; Candida sppp., For example, Candida ｌａ glabrata, Candida albicans, a pida, C -Candida tropicalis, Candida guilliermondii, Candida krusei, Candida kefyr, eg Malassezia flus. Asseria furfur), Malassezia pachydermatis; Scopulariopsis spp .; Scytalidium spp., for example, ), Stachylidium lignicola, and the like, but are not particularly limited thereto.
　深在性真菌症を引き起こす病原性真菌として、例えば、アブシダ属真菌（Ａｂｓｉｄａ　ｓｐｐ．）；アクレモニウム属真菌（Ａｃｒｅｍｏｎｉｕｍ　ｓｐｐ．）；アルタナリア属真菌（Ａｌｔｅｒｎａｒｉａ　ｓｐｐ．）；アスペルギルス属真菌（Ａｓｐｅｒｇｉｌｌｕｓ　ｓｐｐ．）、例えば、アスペルギルス・クラツバス（Ａｓｐｅｒｇｉｌｌｕｓ ｃｌａｖａｔｕｓ）、アスペルギルス・フミガーツス（Ａｓｐｅｒｇｉｌｌｕｓ ｆｕｍｉｇａｔｕｓ）、アスペルギルス・ニゲル（Ａｓｐｅｒｇｉｌｌｕｓ ｎｉｇｅｒ）、アスペルギルス・フラブス（Ａｓｐｅｒｇｉｌｌｕｓ ｆｌａｖｕｓ）、アスペルギルス・ニドランス（Ａｓｐｅｒｇｉｌｌｕｓ ｎｉｄｕｌａｎｓ）、アスペルギルス・テレウス（Ａｓｐｅｒｇｉｌｌｕｓ ｔｅｒｒｅｕｓ）；バイポラリス属真菌（Ｂｉｐｏｌａｒｉｓ　ｓｐｐ．）；バシデオボルス属真菌（Ｂａｓｉｄｉｏｂｏｌｕｓ　ｓｐｐ．）；ブラストシゾミセス属真菌（Ｂｌａｓｔｏｃｈｉｚｏｍｙｃｅｓ ｓｐｐ．）；ブラストマイセス属真菌（Ｂｌａｓｔｏｍｙｃｅｓ ｓｐｐ．）；カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）、例えば、カンジダ・アアセリ（Ｃａｎｄｉｄａ ａａｓｅｒｉ）、カンジダ・アルビカンス（Ｃａｎｄｉｄａ ａｌｂｉｃａｎｓ）、カンジダ・ギリエルモンジイ（Ｃａｎｄｉｄａ ｇｕｉｌｌｉｅｒｍｏｎｄｉｉ）、カンジダ・フミコラ（Ｃａｎｄｉｄａ ｈｕｍｉｃｏｌａ）、カンジダ・グラブラタ（Ｃａｎｄｉｄａ ｇｌａｂｒａｔａ）、カンジダ・クルセイ（Ｃａｎｄｉｄａ ｋｒｕｃｅｉ）、カンジダ・ランビカ（Ｃａｎｄｉｄａ ｌａｍｂｉｃａ）、カンジダ・リポリチカ（Ｃａｎｄｉｄａ ｌｉｐｏｌｙｔｉｃａ）、カンジダ・ルシタニエ（Ｃａｎｄｉｄａ ｌｕｓｉｔａｎｉｅ）、カンジダ・パラプシロシス（Ｃａｎｄｉｄａ ｐａｒａｐｓｉｌｏｓｉｓ）、カンジダ・パラトロピカリス（Ｃａｎｄｉｄａ ｐａｒａｔｒｏｐｉｃａｌｉｓ）、カンジダ・シュードトロピカリス（Ｃａｎｄｉｄａ ｐｓｅｕｄｏｔｒｏｐｉｃａｌｉｓ）、カンジダ・ルゴーサ（Ｃａｎｄｉｄａ ｒｕｇｏｓａ）、カンジダ・ステラトイデア（Ｃａｎｄｉｄａ ｓｔｅｌｌａｔｏｉｄｅａ）、カンジダ・ケフィル（Ｃａｎｄｉｄａ ｋｅｆｙｒ）、カンジダ・トロピカリス（Ｃａｎｄｉｄａ ｔｒｏｐｉｃａｌｉｓ）、カンジダ・ゼイラノイデス（Ｃａｎｄｉｄａ ｚｅｙｌａｎｏｉｄｅｓ）；コニデオボルス属真菌（Ｃｏｎｉｄｉｏｂｏｌｕｓ　ｓｐｐ．）；クリプトコッカス属真菌（Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｓｐｐ．）、例えば、クリプトコッカス・ネオフォルマンス（Ｃｒｙｐｔｏｃｏｃｃｕｓ ｎｅｏｆｏｒｍａｎｓ）、クリプトコッカス・アルビズス（Ｃｒｙｐｔｏｃｏｃｃｕｓ ａｌｂｉｄｕｓ）、クリプトコッカス・ガストリクス（Ｃｒｙｐｔｏｃｏｃｃｕｓ ｇａｓｔｒｉｃｓ）、クリプトコッカス・ラウレンチイ（Ｃｒｙｐｔｏｃｏｃｃｕｓ ｌａｕｒｅｎｔｉｉ）、クリプトコッカス・テレウス（Ｃｒｙｐｔｏｃｏｃｃｕｓ ｔｅｒｒｅｕｓ）、クリプトコッカス・ユニグツラーツス（Ｃｒｙｐｔｏｃｏｃｃｕｓ ｕｎｉｇｕｔｔｕｌａｔｕｓ）；フザリウム属真菌（Ｆｕｓａｒｉｕｍ ｓｐｐ．）、例えば、フザリウム・ソラニ（Ｆｕｓａｒｉｕｍ ｓｏｌａｎｉ）、フザリウム・オキシスポラム（Ｆｕｓａｒｉｕｍ ｏｘｙｓｐｏｒｕｍ）、フザリウム・プロリフェラツム（Ｆｕｓａｒｉｕｍ ｐｒｏｌｉｆｅｒａｔｕｍ）、フザリウム・ベルチシリオイデス（Ｆｕｓａｒｉｕｍ ｖｅｒｔｉｃｉｌｌｉｏｉｄｅｓ）；ヒストプラズマ属真菌（Ｈｉｓｔｏｐｌａｓｍａ ｓｐｐ．）、例えば、ヒストプラズマ・デルマチチデズ（Ｈｉｓｔｏｐｌａｓｍａ ｄｅｒｍａｔｉｔｉｄｉｓ）；パエシロミセス属真菌（Ｐａｅｃｉｌｏｍｙｃｅｓ　ｓｐｐ．）；ペニシリウム属真菌（Ｐｅｎｉｃｉｌｌｉｕｍ ｓｐｐ．）、例えば、ペニシリウム・マルネフェイ（Ｐｅｎｉｃｉｌｌｉｕｍ ｍａｒｎｅｆｆｅｉ）；リゾプス属真菌（Ｒｈｉｚｏｐｕｓ ｓｐｐ．）、例えば、リゾプス・オリゼ（Ｒｈｉｚｏｐｕｓ ｏｒｙｚａｅ）、リゾプス・ミクロスポルス（Ｒｈｉｚｏｐｕｓ ｍｉｃｒｏｓｐｏｒｅｓ）；トリコデルマ属真菌（Ｔｒｉｃｈｏｄｅｒｍａ ｓｐｐ．）；ムコール属真菌（Ｍｕｃｏｒ　ｓｐｐ．）、例えば、ムコール・シルシネロイデス（Ｍｕｃｏｒ ｃｉｒｃｉｎｅｌｌｏｉｄｅｓ）；マラセチア属真菌（Ｍａｌａｓｓｅｚｉａ ｓｐｐ．）、例えば、マラセチア・フルフル（Ｍａｌａｓｓｅｚｉａ ｆｕｒｆｕｒ）、マラセチア・パキデルマチス（Ｍａｌａｓｓｅｚｉａ ｐａｃｈｙｄｅｒｍａｔｉｓ）；トリコスポロン属真菌（Ｔｒｉｃｈｏｓｐｏｒｏｎ ｓｐｐ．）、例えば、トリコスポロン・ベイゲリ（Ｔｒｉｃｈｏｓｐｏｒｏｎ ｂｅｉｇｌｉｉ）、トリコスポロン・カビターツム（Ｔｒｉｃｈｏｓｐｏｒｏｎ ｃａｐｉｔａｔｕｍ）、トリコスポロン・フェルメンタス（Ｔｒｉｃｈｏｓｐｏｒｏｎ ｆｅｒｍｅｎｔａｎｓ）、トリコスポロン・プルランス（Ｔｒｉｃｈｏｓｐｏｒｏｎ ｐｕｌｌｕｌａｎｓ）；ニューモシスチス属真菌（Ｐｎｅｕｍｏｃｙｓｔｉｓ　ｓｐｐ．）、例えば、ニューモシスチス・イロヴェチ（Ｐｎｅｕｍｏｃｙｓｔｉｓ　ｊｅｒｏｖｅｃｉｉ）、ニューモシスチス・カリニ（Ｐｎｅｕｍｏｃｙｓｔｉｓ　ｃａｒｉｎｉｉ）；ロドトルラ属真菌（Ｒｈｏｄｏｔｏｒｕｌａ　ｓｐｐ．）、例えば、ロドトルラ・ムシラギノーサ（Ｒｈｏｄｏｔｏｒｕｌａ　ｍｕｃｉｌａｇｉｎｏｓａ）；スケドスポリウム属真菌（Ｓｃｅｄｏｓｐｏｒｉｕｍ ｓｐｐ．）、例えば、スケドスポリウム・アピオスペルムム（Ｓｃｅｄｏｓｐｏｒｉｕｍ ａｐｉｏｓｐｅｒｍｕｍ）、スケドスポリウム・プロリフィカンス（Ｓｃｅｄｏｓｐｏｒｉｕｍ ｐｒｏｌｉｆｉｃａｎｓ）等が挙げられるが、特にこれらに限定されるものではない。 Examples of pathogenic fungi that cause deep mycoses include, for example, Absida spp .; Acremonium spp .; Alternaria spp .; Aspergillus spp. For example, Aspergillus clavus, Aspergillus ｕｌulgis (Aspergillus ｕｌniger), Aspergillus ｕｌspel, Aspergillus ｓｐspel, Aspergillus ｓｐspel Rreus); Bipolaris spp .; Basidiobolus spp .; Blastchizomyces spp .; Blastomyces spp. spp.), for example, Candida aaseri, Candida ビ albicans, Candida gilliermondi, Candida la la Candida, Candida krucei), Kanji・ Candida lambica, Candida lipolytica, Candida lucidanie (Candida pastisis), Candida paraspidisis (Candida parapilisis), Candida ｒｏparopidas , Candida ｕ rugosa, Candida ラ stellatoidea, Candida kefyr, Candida ｒｏ tropicalis, Candida ａｎｄ tropicaloids zeylanoides); Konideoborusu genus fungi (Conidiobolus spp. Cryptococcus spp., For example, Cryptococcus neoformans, Cryptococcus cervidus, Cryptococcus genus Cryptococcus (Cryptococcus ｒｅ terreus), Cryptococcus ｉ unigutulatus; Fusarium spp., For example, Fusarium solani, Fusari Um oxysporum, Fusarium proliferatum, Fusarium verticilloids; a genus H Fungi (Paecilomyces spp.); Penicillium spp., Such as Penicillium marnefei; Rhizopus spp., Such as Rhizopus oryz Rhizopus microspores; Trichoderma spp .; Mucor spp., Such as Mucor Circinelloides; Fullass (Malassezia furfur), Malassezia キ pachydermatis; Trichosporon 真菌 spp., For example, Trichosporon ゲ beiglii (Trichosporon beigliii), Trichosporon beiglii Poron-Fermentas (Trichosporon fermentans), Trichosporon pullulans (Trichosporon pullulans); Pneumocystis spp fungi (Pneumocystis spp. ), For example, Pneumocystis jeroveciii, Pneumocystis carinii; for example, Rhodotorula spp., For example, Rhodotorula spil. Examples thereof include, but are not limited to, Scedosporiaum apiosperum, Scedosporum prolifecans, and the like.
　深部皮膚真菌症を引き起こす病原性真菌としては、例えば、アクレモニウム属真菌（Ａｃｒｅｍｏｎｉｕｍ ｓｐｐ．）；アルスログラフィス属真菌（Ａｒｔｈｒｏｇｒａｐｈｉｓ ｓｐｐ．）；スポロトリックス属真菌（Ｓｐｏｒｏｔｈｒｉｘ ｓｐｐ．）、例えば、スポロトリックス・シェンキイ（Ｓｐｏｒｏｔｈｒｉｘ ｓｃｈｅｎｃｋｉｉ）；フォンセケア属真菌（Ｆｏｎｓｅｃａｅａ　ｓｐｐ．）、例えば、フォンセケア・ペドロソイ（Ｆｏｎｓｅｃａｅａ　ｐｅｄｒｏｓｏｉ）；エクソフィアラ属真菌（Ｅｘｏｐｈｉａｌａ　ｓｐｐ．）、例えば、エクソフィアラ・デルマチチデス（Ｅｘｏｐｈｉａｌａ　ｄｅｒｍａｔｉｔｉｄｉｓ）；マヅレラ・マイセトマティス（Ｍａｄｕｒｅｌｌａ　ｍｙｃｅｔｏｍａｔｉｓ）；クラドスポリウム属真菌（Ｃｌａｄｏｓｐｏｒｉｕｍ　ｓｐｐ．）、例えば、クラドスポリウム・カリオニ（Ｃｌａｄｏｓｐｏｒｉｕｍ　ｃａｒｒｉｏｎｉｉ）；フィアロフォラ属真菌（Ｐｈｉａｌｏｐｈｏｒａ　ｓｐｐ．）、例えば、フィアロフォラ・ベルコーサ（Ｐｈｉａｌｏｐｈｏｒａ　ｖｅｒｒｕｃｏｓａ）；リゾムコール属真菌（Ｒｈｉｚｏｍｕｃｏｒ ｓｐｐ．）、例えば、リゾムコール・ミーヘイ（Ｒｈｉｚｏｍｕｃｏｒ ｍｉｅｈｅｉ）、リゾムコール・プシルス（Ｒｈｉｚｏｍｕｃｏｒ ｐｕｓｉｌｌｕｓ）等が挙げられるが、特にこれらに限定されるものではない。 Examples of pathogenic fungi causing deep dermatomycosis include, for example, Acremonium spp .; Arthrographis spp .; Sporothrix spp. Sporothrix ｃｈ schenckii; Fonsecea spp., Such as Fonsecea pedrosoi; Exophiala spp. Mysetomatis (Madurela mycetomatis); Clados Cladosporia spp., For example, Cladosporia carrionii; Phyalophora spp., For example, Phialophora verrucoz, Ruricosporum; , Rhizomucor miehei, Rhizomucor シ ル pusillus, and the like, but are not particularly limited thereto.
　本発明における「抗真菌剤」とは、真菌感染症の予防剤および／または治療剤を意味する。また、本発明化合物は、下記に記される既知の抗真菌剤、抗細菌剤（抗生物質）から選ばれる１つまたはそれ以上の成分と組合せて使用することができる。抗真菌剤としては、例えば、フルコナゾール、イトラコナゾール、ホスホフルコナゾール、ボリコナゾールおよびその塩等のアゾール系抗真菌剤、ブテナフィンおよびその塩等のベンジルアミン系抗真菌剤、テルビナフィンおよびその塩等のアリルアミン系抗真菌剤、アモロルフィンおよびその塩等のホルモリン系抗真菌剤、リラナフタート、トルナフテート、トルシクラートおよびチルシクラート等のチオカルバミン系抗真菌剤、ミコナゾール、ケトコナゾール、クロトリマゾール、エコナゾール、イソコナゾール、スルコナゾール、オキシコナゾール、クロコナゾール、ビフォナゾール、イトラコナゾール、チオコナゾール、オモコナゾール、スルコナゾール、ネチコナゾール、ラノコナゾール、ルリコナゾールおよびこれらの塩等のイミダゾール系抗真菌剤、エキノキャンディン等のエキノキャンディン系抗真菌剤、ミカファンギン、キャスポファンギン等のキャンディン系抗真菌剤、アンフォテイシンＢ、リボゾームアムホテリシンＢ、ナイスタチン等のポリエン系抗真菌剤、フルシトシン等のフルオピリジン系抗真菌剤、グリセオフルビン等のグリサン系抗真菌剤等が挙げられるが、これらに限定されるものではない。また、既知の抗細菌剤としては、例えば、ジフェニルエーテル系抗細菌剤、カルバニリド系抗細菌剤、フェノール系抗細菌剤等が挙げられるが、これらに限定されるものではない。 In the present invention, the “antifungal agent” means a prophylactic and / or therapeutic agent for fungal infection. The compound of the present invention can be used in combination with one or more components selected from the known antifungal agents and antibacterial agents (antibiotics) described below. Examples of the antifungal agents include azole antifungal agents such as fluconazole, itraconazole, phosphofluconazole, voriconazole and salts thereof, benzylamine antifungal agents such as butenafine and salts thereof, and allylamine antifungi such as terbinafine and salts thereof. Agents, formolin antifungal agents such as amorolfine and its salts, thiocarbamine antifungal agents such as rylanaphthalate, tolnaftate, tolsiclate and tilcyclate, miconazole, ketoconazole, clotrimazole, econazole, isoconazole, sulconazole, oxyconazole, croconazole , Bifonazole, itraconazole, thioconazole, omoconazole, sulconazole, neticonazole, ranoconazole, luliconazole and their salts Anti-fungal agents such as dazole antifungal agents, echinocandin antifungal agents such as echinocandin, canine antifungal agents such as Micafungin and Caspofungin, and polyene antifungal agents such as amphotericin B, ribosome amphotericin B, and nystatin Agents, fluopyridine antifungal agents such as flucytosine, and glycan antifungal agents such as griseofulvin, but are not limited thereto. Examples of known antibacterial agents include, but are not limited to, diphenyl ether antibacterial agents, carbanilide antibacterial agents, and phenolic antibacterial agents.
　本発明化合物は、その使用目的に合わせて、投与方法、剤型を適宜決定することができる。例えば、本発明化合物を有効成分として含有する抗真菌剤の投与形態は、経口投与でも非経口投与（例えば、静注、筋注、皮下投与、直腸投与、経皮投与）でもよい。剤型としては、例えば、錠剤、粉剤、カプセル剤、顆粒剤、エキス剤、シロップ、被覆錠剤、散剤、丸剤、細粒剤、トローチ剤等の経口投与剤または注射剤、点滴剤、坐剤、軟膏、クリーム、液剤、ローション、点鼻剤、点眼剤等の非経口投与剤を挙げることができるが、これらに限定されるものではない。 The administration method and dosage form of the compound of the present invention can be appropriately determined according to the purpose of use. For example, the dosage form of the antifungal agent containing the compound of the present invention as an active ingredient may be oral administration or parenteral administration (for example, intravenous injection, intramuscular injection, subcutaneous administration, rectal administration, transdermal administration). Examples of the dosage form include tablets, powders, capsules, granules, extracts, syrups, coated tablets, powders, pills, fine granules, lozenges, orally administered or injections, drops, suppositories. , Ointments, creams, solutions, lotions, nasal drops, eye drops, and the like, but are not limited thereto.
　本発明化合物を経口的または非経口的に投与する場合、特に限定されるものではないが、本発明化合物の他、賦形剤、結合剤、滑沢剤、崩壊剤、コーティング剤、可塑剤、懸濁剤または乳化剤、糖衣剤、防湿剤、流動化剤、界面活性剤、分散剤、等張化剤、水性基剤、油性基剤、乳化剤、懸濁剤、乳化安定剤、溶解補助剤、粉末成分、高分子成分、粘着性改良剤、被膜形成剤、ｐＨ調整剤、抗酸化剤、安定化剤、防腐剤、保存剤、保型剤、保湿剤、皮膚保護剤、皮膚浸透剤、清涼化剤、香料、着色剤、キレート剤、潤沢剤、角質軟化剤、血行促進剤、収斂剤、組織修復促進剤、制汗剤、植物抽出成分、動物抽出成分、添加剤等を必要に応じて配合し、製剤化することができる。また、必要に応じて、抗炎症剤を配合し、製剤化することができる。 When the compound of the present invention is administered orally or parenterally, it is not particularly limited, but in addition to the compound of the present invention, an excipient, a binder, a lubricant, a disintegrant, a coating agent, a plasticizer, Suspending or emulsifying agents, sugar-coating agents, moisture-proofing agents, fluidizing agents, surfactants, dispersing agents, tonicity agents, aqueous bases, oily bases, emulsifiers, suspending agents, emulsion stabilizers, solubilizing agents, Powder component, polymer component, adhesion improver, film forming agent, pH adjuster, antioxidant, stabilizer, preservative, preservative, shape-retaining agent, moisturizer, skin protectant, skin penetration agent, refreshing Agents, fragrances, colorants, chelating agents, lubricants, keratin softeners, blood circulation promoters, astringents, tissue repair promoters, antiperspirants, plant extract ingredients, animal extract ingredients, additives, etc. as required Can be formulated and formulated. Moreover, an anti-inflammatory agent can be mix | blended and formulated as needed.
　製剤化に用いられる成分としては、特に限定されるものではないが、下記の成分が挙げられる。
　賦形剤としては、例えば、Ｄ－マンニトール、乳糖、白糖、塩化ナトリウム、炭酸水素ナトリウム、トウモロコシデンプン、バレイショデンプン、コムギデンプン、コメデンプン、部分アルファー化デンプン、結晶セルロース、軽質無水ケイ酸、無水リン酸カルシウム、沈降炭酸カルシウム、ケイ酸カルシウム等；
結合剤としては、例えば、ポビドン、デキストリン、ヒドロキシプロピルセルロース、ヒドロキシプロピルメチルセルロース、ヒドロキシエチルセルロース、ヒドロキシプロピルスターチ、エチルセルロース、メチルセルロース、カラギーナン、ポリビニルアルコール、ポリビニルピロリドン、カルボキシビニルポリマー、ゼラチン、寒天、コポリビドン、精製セラック、アルファー化デンプン、アルギン酸ナトリウム、ビニルピロリドン・酢酸ビニル共重合物、ペクチン、ポリビニルアルコールポリエチレングリコールグラフトコポリマー、ヒプロメロース、ポリビニルアルコール、メタクリル酸コポリマーＬ、メタクリル酸コポリマーＬＤ、メタクリル酸コポリマーＳ、プルラン、アラビアゴム末等；
滑沢剤としては、例えば、硬化油、硬化ヒマシ油、ベヘン酸グリセリド、フマル酸ステアリルナトリウム、タルク、酸化チタン、グリセリン、グリセリン脂肪酸エステル、コムギデンプン、ショ糖脂肪酸エステル、ステアリルアルコール、ステアリン酸およびその塩、セタノール、ゼラチン、ポリオキシエチレンポリオキシプロピレングリコール類、ポリソルベート類、マクロゴール類、モノステアリン酸グリセリンおよびラウリル硫酸ナトリウム等；
崩壊剤としては、例えば、カルメロース、カルボキシメチルスターチナトリウム、クロスポビドン、トウモロコシデンプン、デンプン、結晶セルロース、ステアリン酸およびその塩、タルク、クロスポビドンおよびセルロースまたはその誘導体等；
コーティング剤としては、例えば、ヒドロキシプロピルセルロース、ヒドロキシプロピルメチルセルロース、エチルセルロース、ヒドロキシプロピルメチルセルロースフタレート、カルボキシメチルエチルセルロース、カルメロースナトリウム、カルメロースカリウム、酢酸セルロース、酢酸フタル酸セルロース等のセルロース誘導体、アクリル酸エチル・メタクリル酸メチルコポリマー分散液、アミノアルキルメタクリレートコポリマーＥ 、アミノアルキルメタクリレートコポリマーＲ Ｓ、メタクリル酸コポリマーＬ、メタクリル酸コポリマーＬＤ、メタクリル酸コポリマーＳ、２－メチル－５－ビニルピリジンメチルアクリレート・メタクリル酸コポリマー、ジメチルアミノエチルメタアクリレート・メチルメタアクリレートコポリマ等のアクリル酸系高分子、ポリビニルピロリドン、ポリビニルアセタールジエチルアミノアセテート、ポリビニルアルコール、ポリオキシエチレンポリオキシプロピレングリコール、マクロゴール等の合成高分子物質、プルラン、キトサン等の多糖類やゼラチン、コハク化ゼラチン、アラビアゴム、セラック等；
可塑剤としては、例えば、アジピン酸ジオクチル、クエン酸トリエチル、トリアセチン、グリセリン、濃グリセリン、プロピレングリコール、ポリエチレングリコール、ポリソルベート８０、セバシン酸ジエチル、セバシン酸ジブチル、ステアリン酸等；
糖衣剤としては、例えば、白糖、乳糖、水アメ、沈降炭酸カルシウム、アラビアゴム、カルナウバロウ、セラック、ミツロウ、マクロゴール、エチルセルロース、メチルセルロース、ポピドン等；
防湿剤としては、例えば、ケイ酸マグネシウム、軽質無水ケイ酸、硬化油、ステアリン酸、ステアリン酸マグネシウム、パラフィン、ヒマシ油、マクロゴール、酢酸ビニル樹脂、酢酸フタル酸セルロース、ポリビニルアセタールジエチルアミノアセテート、セラック等；
流動化剤としては、例えば、含水二酸化ケイ素、軽質無水ケイ酸、重質無水ケイ酸、結晶セルロース、合成ケイ酸アルミニウム、水酸化アルミナマグネシウム、メタケイ酸アルミン酸マグネシウム、酸化チタン、ステアリン酸およびその塩、第三リン酸カルシウム、タルク、トウモロコシデンプン等；
界面活性剤としては、例えば、リン脂質、グリセリン脂肪酸エステル、ポリオキシエチレン脂肪酸エステル、ソルビタン脂肪酸エステル、ポリエチレングリコール脂肪酸エステル、ポリオキシエチレン硬化ヒマシ油、ポリオキシエチレンアルキルエーテル、ショ糖脂肪酸エステル、ラウリル硫酸ナトリウム、ポリソルベート類、リン酸水素ナトリウム類およびリン酸水素カリウム類等；
分散剤としては、例えば、ツイーン８ ０、ポリエチレングリコール、カルボキシメチルセルロース、アルギン酸ナトリウム等；
保存剤としては、例えば、メチルパラベン、プロピルパラベン、ベンジルアルコール、クロロブタノール、フェノール等；
等張化剤としては、例えば、塩化ナトリウム、グリセリン、ソルビトール、ブドウ糖等；
水性基剤としては、例えば、蒸留水、生理食塩水、リンゲル液等；
油性基剤としては、例えば、オレイルアルコール、ステアリルアルコール、セトステアリルアルコール、セタノール、ベンジルアルコール等の高級アルコール類、酢酸エチル、酢酸イソプロピル、酢酸ブチル、アジピン酸ジイソプロピル、セバシン酸ジエチル、ミリスチン酸イソプロピル、オレイン酸オクチルドデシル、ミリスチン酸オクチルドデシル、ミリスチン酸イソステアリル、ラノリン等の脂肪酸エステル類、大豆油、牛脂、オリーブ油、ゴマ油、綿実油、コーン油等の中鎖脂肪酸トリグリセリド類、スクワレン、スクワラン等の脂肪酸、ホホバ油、ゲイロウ、白色ワセリン、流動パラフィン、マイクロクリスタリンワックス、ｌ－メントール、ｄ－カンファー、シネオール、ゲラニオール、リモネン、プレゴン、チモール、アフィジコリン、ホルスコリン、フィタン酸、フィトール等のテルペン類、乳酸メンチル等のテルペノイドのカルボン酸エステル類、クロタミトン、ジエチルエーテル、イソプロピルエーテル、テトラヒドロフラン、ジオキサン、２－メトキシエタノール、１，２－ジメトキシエタン等のエーテル類等；
乳化剤または懸濁剤としては、例えば、ポリオキシエチレン硬化ヒマシ油、ポリグリセリン脂肪酸エステル、モノステアリン酸ソルビタン、モノパルミチン酸ソルビタン、モノステアリン酸グリセリン、モノラウリン酸ソルビタン、ポリオキシエチレンポリオキシプロピレンブロックコポリマー、ポリソルベート類、ラウリル硫酸ナトリウム、ショ糖脂肪酸エステル、レシチン等；
乳化安定剤としては、例えば、セトステアリルアルコール等の高級アルコール類、アクリル酸ポリマー、カルボキシビニルポリマー、キサンタンガム等の多糖類等；
溶解補助剤としては、例えば、プロピレングリコール、１，３－ブチレングリコール、グリセリン等の多価アルコール類、メチルエチルケトン、シクロヘキサノン等の低分子ケトン類、マクロゴール類等；
粉末成分としては、例えば、酸化亜鉛、酸化チタン、ステアリン酸マグネシウム、タルク、炭酸マグネシウム、酸化マグネシウム、無水ケイ酸、含水ケイ酸、ケイ酸マグネシウム、カオリン、アエロジル、酸性白土、マイカ、トウモロコシデンプン、メタケイ酸アルミニウム等；
高分子成分としては、例えば、アクリル酸ポリマー、カルボキシビニルポリマー、例えばキサンタンガム等の多糖類、ポリペプチド等；
粘着性改良剤としては、例えば、セトステアリルアルコール等の高級アルコール類、アクリル酸ポリマー、カルボキシビニルポリマー、キサンタンガム等の多糖類、ポリペプチド等；
被膜形成剤としては、例えば、セトステアリルアルコール等の高級アルコール類、アクリル酸ポリマー、カルボキシビニルポリマー、キサンタンガム等の多糖類、ポリペプチド、コロジオン、ポリビニルピロリドン、ポリビニルアルコール、例えば、ニトロセルロース等のセルロース類等；
ｐＨ調整剤としては、例えば、クエン酸、リン酸、乳酸、炭酸、酒石酸、ステアリン酸、フマル酸、酢酸、パルミチン酸、オレイン酸、アミノ酸、コハク酸、乳酸等の有機酸類、ピロリン酸ナトリウム等の有機酸塩類、水酸化ナトリウム等の無機塩基類、ジイソプロパノールアミン、トリエタノールアミン等の有機アミン類等；
抗酸化剤としては、例えば、アスコルビン酸およびそのエステル、Ｌ－システイン、天然ビタミンＥ、エデト酸ナトリウム、塩酸システイン、重亜硫酸ナトリウム、ジブチルヒドロキシトルエン、ブチルヒドロキシアニソール、α－トコフェロール、エリソルビン酸、ピロ亜硫酸ナトリウム、クエン酸水和剤、ジブチルヒドロキシトルエン、大豆レシチン、ブチルヒドロキシアニソール、没食子酸プロピル等；
安定化剤としては、例えば、ＥＤＴＡ－２ナトリウム等；
防腐剤または保存剤としては、例えば、二酸化塩素、第四級アンモニウム化合物、セトリミド、水銀剤、アルコール剤、抗菌性エステル、クロロクレゾール、メチルパラベン等のパラベン類、ベンジルアルコール、デヒドロ酢酸ナトリウム、クロロブタノール、フェノール、ソルビン酸、安息香酸等；
保型剤としては、例えば、植物性テキシトリン、ショ糖エステル等；
保湿剤としては、例えば、ヒアルロン酸ナトリウム、コンドロイチン硫酸ナトリウム、グリコシルトレハロース、キシリトール、ソルビトール等の糖類、コラーゲン、アルギニン、加水分解シルク、セリシン等の蛋白質やアミノ酸類、乳酸ナトリウム、後述の植物抽出成分等；
皮膚保護剤としては、例えば、リボフラビンリン酸ナトリウム、リン酸アスコルビルマグネシウム、シアノコバラミン等のビタミン誘導体類、グリコシルルチン等のポリフェノール類、ヒドロキシプロリン、ジパルミトイルヒドロキシプロリン等のヒドロキシプロリンまたはその誘導体、セラミド、アミノカプロン酸、ステアロキシメチルポリシロキサン、トリメチルシロキシケイ酸等のシロキサン誘導体、セレブロシド等の糖脂質類等；
皮膚浸透剤としては、例えば、エチルアルコール、２－プロパノール、オクチルフェニルポリエチレングリコール、オレイン酸、ポリエチレングリコール、プロピレングリコール、脂肪酸エステル等；
清涼化剤としては、例えば、ハッカ油、カンフル、エタノール、ユーカリ油等；
着香剤としては、例えば、メントール、はっか油、レモン油、オレンジ油等；
着色剤としては、例えば、食用黄色４号、食用黄色５号、食用赤色２号、食用赤色１０２号、食用青色１号、食用青色２号、食用黄色４号、アルミニウムキレート等のタール系色素、酸化チタン、酸化亜鉛、タルク、ウコン抽出液、カラメル、カロチン液、ベータカロテン、銅クロロフィル、銅クロロフィリンナトリウム、リボフラビン、カーボンブラック、薬用炭等；
キレート剤としては、例えば、エデト酸塩、エチドロン酸４ナトリウム、三リン酸５ナトリウム、ペンテト酸５ナトリウム等；
潤沢剤としては、例えば、シリカ、ステアリン酸カルシウム、ステアリン酸マグネシウム等；
角質軟化剤としては、例えば、尿素、フタル酸ジエチル等の有機酸エステル類、乳酸等の有機酸類、鯨蝋、コレステロール等の油脂類等；
血行促進剤としては、例えば、ニコチン酸ベンジル、ヘパリン類似物質、トウガラシ等；
収斂剤としては、例えば、塩化アルミニウム、アルジオキサ等；
組織修復促進剤としては、例えば、アルミニウムクロロヒドロキシアラントイネート、塩化リゾチーム等；
制汗剤としては、例えば、ハロゲン化アルミニウム、ヒドロキシハロゲン化アルミニウム、オキシハロゲン化ジルコニウム、ヒドロキシハロゲン化ジルコニウム、およびそれらの混合物のようなアルミニウム塩およびジルコニウム塩等のアルミニウム、ジルコニウムおよび亜鉛の無機塩および有機塩若しくは錯体およびそれらの混合物等、クエン酸、乳酸、こうじ酸、メントール等；
植物抽出成分としては、例えば、アロエエキス、オウゴンエキス、ソウハクヒエキス、モモ葉エキス、クチナシ葉エキス、エゾウゴキエキス、オウバクエキス、オトギリソウエキス、米糠エキス、緑茶エキス、甘草エキス、紅藻エキス、チョウジエキス、トウキエキス、トウガラシエキス、ローズマリー油等；
動物抽出成分としては、例えば、冬虫夏草エキス、ローヤルゼリーエキス等；
添加剤としては、例えば、乳糖、コーンスターチ、白糖、ブドウ糖、マンニトール、ソルビット、結晶セルロース、二酸化ケイ素、ポリビニルアルコール、ポリビニルエーテル、メチルセルロース、エチルセルロース、アラビアゴム、トラガント、ゼラチン、シェラック、ヒドロキシプロピルメチルセルロース、ヒドロキシプロピルセルロース、ポリビニルピロリドン、ポリプロピレングリコール、ポリオキシエチレン、ブロックポリマー、メグルミン、澱粉、寒天、ゼラチン末、結晶セルロース、炭酸カルシウム、炭酸水素ナトリウム、クエン酸カルシウム、デキストリン、ペクチン、カルボキシメチルセルロース、カルシウム、ステアリン酸マグネシウム、タルク、ポリエチレングリコール、シリカ、硬化植物油等；
抗炎症剤としては、例えば、クロタミトン、グリチルリチン酸塩、オレアノール酸等のサポゲニン類、ジフェンヒドラミン、クロルフェニラミン、マレイン酸クロルフェニラミン、ジメンヒドリナート、プロメタジン等の抗ヒスタミン剤、リドカイン、ジブカイン、プロカイン、アミノ安息香酸エチルおよびこれらの塩等の局所麻酔剤、アラントイン、オキシポリエントキシドデカン等が挙げられるが、これらに限定されるものではない。 Although it does not specifically limit as a component used for formulation, The following component is mentioned.
Examples of excipients include D-mannitol, lactose, sucrose, sodium chloride, sodium bicarbonate, corn starch, potato starch, wheat starch, rice starch, partially pregelatinized starch, crystalline cellulose, light anhydrous silicic acid, anhydrous calcium phosphate Precipitated calcium carbonate, calcium silicate, etc .;
Examples of the binder include povidone, dextrin, hydroxypropylcellulose, hydroxypropylmethylcellulose, hydroxyethylcellulose, hydroxypropyl starch, ethylcellulose, methylcellulose, carrageenan, polyvinyl alcohol, polyvinylpyrrolidone, carboxyvinyl polymer, gelatin, agar, copolyvidone, and purified shellac. , Pregelatinized starch, sodium alginate, vinylpyrrolidone / vinyl acetate copolymer, pectin, polyvinyl alcohol polyethylene glycol graft copolymer, hypromellose, polyvinyl alcohol, methacrylic acid copolymer L, methacrylic acid copolymer LD, methacrylic acid copolymer S, pullulan, gum arabic The end;
Examples of the lubricant include hardened oil, hardened castor oil, behenic acid glyceride, sodium stearyl fumarate, talc, titanium oxide, glycerin, glycerin fatty acid ester, wheat starch, sucrose fatty acid ester, stearyl alcohol, stearic acid and the like. Salts, cetanol, gelatin, polyoxyethylene polyoxypropylene glycols, polysorbates, macrogols, glyceryl monostearate and sodium lauryl sulfate, etc .;
Examples of the disintegrant include carmellose, sodium carboxymethyl starch, crospovidone, corn starch, starch, crystalline cellulose, stearic acid and salts thereof, talc, crospovidone and cellulose or derivatives thereof;
Examples of the coating agent include hydroxypropylcellulose, hydroxypropylmethylcellulose, ethylcellulose, hydroxypropylmethylcellulose phthalate, carboxymethylethylcellulose, carmellose sodium, carmellose potassium, cellulose acetate, cellulose acetate phthalate and other cellulose derivatives such as ethyl acrylate, Methyl methacrylate copolymer dispersion, aminoalkyl methacrylate copolymer E, aminoalkyl methacrylate copolymer RS, methacrylic acid copolymer L, methacrylic acid copolymer LD, methacrylic acid copolymer S, 2-methyl-5-vinylpyridine methyl acrylate / methacrylic acid copolymer, Dimethylaminoethyl methacrylate / methyl methacrylate copolymer Acrylic polymer, polyvinyl pyrrolidone, polyvinyl acetal diethylaminoacetate, polyvinyl alcohol, polyoxyethylene polyoxypropylene glycol, macrogol and other polysaccharides, pullulan, chitosan and other polysaccharides and gelatin, succinated gelatin, arabic Rubber, shellac, etc .;
Examples of the plasticizer include dioctyl adipate, triethyl citrate, triacetin, glycerin, concentrated glycerin, propylene glycol, polyethylene glycol, polysorbate 80, diethyl sebacate, dibutyl sebacate, stearic acid, and the like;
Examples of the sugar coating agent include sucrose, lactose, water candy, precipitated calcium carbonate, gum arabic, carnauba wax, shellac, beeswax, macrogol, ethyl cellulose, methyl cellulose, popidone and the like;
Examples of the moisture-proofing agent include magnesium silicate, light anhydrous silicic acid, hardened oil, stearic acid, magnesium stearate, paraffin, castor oil, macrogol, vinyl acetate resin, cellulose acetate phthalate, polyvinyl acetal diethylaminoacetate, shellac and the like. ;
Examples of fluidizing agents include hydrous silicon dioxide, light anhydrous silicic acid, heavy anhydrous silicic acid, crystalline cellulose, synthetic aluminum silicate, magnesium alumina hydroxide, magnesium aluminate metasilicate, titanium oxide, stearic acid and salts thereof. , Tricalcium phosphate, talc, corn starch, etc .;
Examples of the surfactant include phospholipid, glycerin fatty acid ester, polyoxyethylene fatty acid ester, sorbitan fatty acid ester, polyethylene glycol fatty acid ester, polyoxyethylene hydrogenated castor oil, polyoxyethylene alkyl ether, sucrose fatty acid ester, lauryl sulfate Sodium, polysorbates, sodium hydrogen phosphates and potassium hydrogen phosphates, etc .;
Examples of the dispersant include Tween 80, polyethylene glycol, carboxymethyl cellulose, sodium alginate and the like;
Examples of preservatives include methyl paraben, propyl paraben, benzyl alcohol, chlorobutanol, and phenol;
Examples of isotonic agents include sodium chloride, glycerin, sorbitol, glucose and the like;
Examples of the aqueous base include distilled water, physiological saline, Ringer's solution and the like;
Examples of the oily base include higher alcohols such as oleyl alcohol, stearyl alcohol, cetostearyl alcohol, cetanol, benzyl alcohol, ethyl acetate, isopropyl acetate, butyl acetate, diisopropyl adipate, diethyl sebacate, isopropyl myristate, olein Fatty acid esters such as octyldodecyl acid, octyldodecyl myristate, isostearyl myristate, lanolin, medium chain fatty acid triglycerides such as soybean oil, beef tallow, olive oil, sesame oil, cottonseed oil, corn oil, fatty acids such as squalene, squalane, jojoba Oil, gay wax, white petrolatum, liquid paraffin, microcrystalline wax, l-menthol, d-camphor, cineole, geraniol, limonene, pregon, thymol, affi Terpenes such as choline, forskolin, phytanic acid and phytol, terpenoid carboxylic acid esters such as menthyl lactate, ethers such as crotamiton, diethyl ether, isopropyl ether, tetrahydrofuran, dioxane, 2-methoxyethanol, 1,2-dimethoxyethane Etc .;
Examples of the emulsifier or suspending agent include polyoxyethylene hydrogenated castor oil, polyglycerin fatty acid ester, sorbitan monostearate, sorbitan monopalmitate, glyceryl monostearate, sorbitan monolaurate, polyoxyethylene polyoxypropylene block copolymer, Polysorbates, sodium lauryl sulfate, sucrose fatty acid ester, lecithin, etc .;
Examples of the emulsion stabilizer include higher alcohols such as cetostearyl alcohol, polysaccharides such as acrylic acid polymer, carboxyvinyl polymer, and xanthan gum;
Examples of the solubilizer include polyhydric alcohols such as propylene glycol, 1,3-butylene glycol and glycerin, low molecular ketones such as methyl ethyl ketone and cyclohexanone, macrogol and the like;
Examples of the powder component include zinc oxide, titanium oxide, magnesium stearate, talc, magnesium carbonate, magnesium oxide, anhydrous silicic acid, hydrous silicic acid, magnesium silicate, kaolin, aerosil, acid clay, mica, corn starch, metasilicate. Aluminum oxide, etc .;
Examples of the polymer component include acrylic acid polymers, carboxyvinyl polymers, polysaccharides such as xanthan gum, polypeptides, and the like;
Examples of the tackifier include higher alcohols such as cetostearyl alcohol, polysaccharides such as acrylic acid polymer, carboxyvinyl polymer, xanthan gum, and polypeptides;
Examples of the film forming agent include higher alcohols such as cetostearyl alcohol, polysaccharides such as acrylic acid polymer, carboxyvinyl polymer, and xanthan gum, polypeptides, collodion, polyvinylpyrrolidone, polyvinyl alcohol, and celluloses such as nitrocellulose. etc;
Examples of the pH adjuster include citric acid, phosphoric acid, lactic acid, carbonic acid, tartaric acid, stearic acid, fumaric acid, acetic acid, palmitic acid, oleic acid, amino acids, succinic acid, lactic acid and other organic acids, sodium pyrophosphate and the like. Organic acid salts, inorganic bases such as sodium hydroxide, organic amines such as diisopropanolamine, triethanolamine, etc .;
Examples of antioxidants include ascorbic acid and its esters, L-cysteine, natural vitamin E, sodium edetate, cysteine hydrochloride, sodium bisulfite, dibutylhydroxytoluene, butylhydroxyanisole, α-tocopherol, erythorbic acid, pyrosulfite. Sodium, citric acid wettable powder, dibutylhydroxytoluene, soybean lecithin, butylhydroxyanisole, propyl gallate, etc .;
Examples of the stabilizer include EDTA-2 sodium and the like;
Examples of preservatives or preservatives include chlorine dioxide, quaternary ammonium compounds, cetrimide, mercury agents, alcohol agents, antibacterial esters, parabens such as chlorocresol and methylparaben, benzyl alcohol, sodium dehydroacetate, chlorobutanol, Phenol, sorbic acid, benzoic acid, etc .;
Examples of the shape-retaining agent include plant texitoline and sucrose ester;
Examples of humectants include saccharides such as sodium hyaluronate, sodium chondroitin sulfate, glycosyl trehalose, xylitol, sorbitol, proteins and amino acids such as collagen, arginine, hydrolyzed silk, sericin, sodium lactate, plant extract components described below, etc. ;
Examples of skin protectants include vitamin derivatives such as sodium riboflavin phosphate, magnesium ascorbyl phosphate and cyanocobalamin, polyphenols such as glycosyl rutin, hydroxyproline such as hydroxyproline and dipalmitoylhydroxyproline, or derivatives thereof, ceramide, aminocapron Acid, stearoxymethyl polysiloxane, siloxane derivatives such as trimethylsiloxysilicic acid, glycolipids such as cerebroside, etc .;
Examples of skin penetrants include ethyl alcohol, 2-propanol, octylphenyl polyethylene glycol, oleic acid, polyethylene glycol, propylene glycol, and fatty acid esters;
Examples of the refreshing agent include mint oil, camphor, ethanol, eucalyptus oil, etc .;
Examples of flavoring agents include menthol, bran oil, lemon oil, orange oil and the like;
Examples of the colorant include edible yellow No. 4, edible yellow No. 5, edible red No. 2, edible red No. 102, edible blue No. 1, edible blue No. 2, edible yellow No. 4, edible yellow No. 4, tar-based dyes such as aluminum chelate, Titanium oxide, zinc oxide, talc, turmeric extract, caramel, carotene solution, beta-carotene, copper chlorophyll, copper chlorophyllin sodium, riboflavin, carbon black, medicinal charcoal, etc .;
Examples of the chelating agent include edetate, etidronate 4 sodium, triphosphate 5 sodium, pentetate 5 sodium, etc .;
Examples of the lubricant include silica, calcium stearate, magnesium stearate and the like;
Examples of the keratin softener include organic acid esters such as urea and diethyl phthalate, organic acids such as lactic acid, fats and oils such as spermaceti and cholesterol;
Examples of the blood circulation promoter include benzyl nicotinate, heparin-like substance, pepper, etc .;
Examples of astringents include aluminum chloride and aldioxa;
Examples of the tissue repair promoter include aluminum chlorohydroxy allantoinate, lysozyme chloride and the like;
Antiperspirants include, for example, aluminum, zirconium and zinc inorganic salts such as aluminum salts and zirconium salts, such as aluminum halides, hydroxy aluminum halides, zirconium oxyhalides, zirconium hydroxy halides, and mixtures thereof. Organic salts or complexes and mixtures thereof, citric acid, lactic acid, kojic acid, menthol, etc .;
Examples of plant extract components include aloe extract, dragonfly extract, Sakuhachi extract, peach leaf extract, gardenia leaf extract, prawn extract, grasshopper extract, hypericum extract, rice bran extract, green tea extract, licorice extract, red algae extract, clove extract , Toki extract, red pepper extract, rosemary oil, etc .;
Animal extract components include, for example, cordyceps extract, royal jelly extract;
Examples of additives include lactose, corn starch, sucrose, glucose, mannitol, sorbitol, crystalline cellulose, silicon dioxide, polyvinyl alcohol, polyvinyl ether, methyl cellulose, ethyl cellulose, gum arabic, tragacanth, gelatin, shellac, hydroxypropyl methylcellulose, hydroxypropyl Cellulose, polyvinyl pyrrolidone, polypropylene glycol, polyoxyethylene, block polymer, meglumine, starch, agar, gelatin powder, crystalline cellulose, calcium carbonate, sodium bicarbonate, calcium citrate, dextrin, pectin, carboxymethyl cellulose, calcium, magnesium stearate , Talc, polyethylene glycol, silica, hydrogenated vegetable oil, etc .;
Anti-inflammatory agents include, for example, sapogenins such as crotamiton, glycyrrhizinate, oleanolic acid, antihistamines such as diphenhydramine, chlorpheniramine, chlorpheniramine maleate, dimenhydrinate, promethazine, lidocaine, dibucaine, procaine, aminobenzoic acid Examples include, but are not limited to, local anesthetics such as ethyl acid and salts thereof, allantoin, oxypolyentoxide decane, and the like.
　本発明は、真菌感染症を予防および／または治療する方法であって、それを必要とする対象に本発明化合物の有効量を投与することを含む方法にも関する。ここで、対象とは、前述の哺乳動物及び鳥類等をいう。
　本発明化合物を有効成分として含む抗真菌剤の投与量は症状、投与対象の年齢、体重、性別等を考慮して、個々の場合に応じて適宜決定され、特に限定されるものではないが、通常、成人１人当たりの経口投与の場合、０．１－１０００ｍｇ、非経口投与の場合０．０１－１００ｍｇ程度が適当であり、これを１日に１回または複数回投与する。投与量は種々の条件で変動するので、上記投与量範囲より少ない量で充分な場合もある。 The invention also relates to a method for preventing and / or treating a fungal infection comprising administering to a subject in need thereof an effective amount of a compound of the invention. Here, the object refers to the aforementioned mammals and birds.
The dosage of the antifungal agent containing the compound of the present invention as an active ingredient is appropriately determined according to each case in consideration of symptoms, age of the administration subject, body weight, sex, etc., and is not particularly limited. In general, 0.1-1000 mg is appropriate for oral administration per adult and 0.01-100 mg is appropriate for parenteral administration, and this is administered once or several times a day. Since the dosage varies depending on various conditions, an amount smaller than the above dosage range may be sufficient.
　以下に、合成例、参考例、および試験例を挙げて、本発明をさらに詳細に示すが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to synthesis examples, reference examples, and test examples, but the present invention is not limited thereto.
［合成例１］
　ステップ１：５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成 [Synthesis Example 1]
Step 1: Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000090
Figure JPOXMLDOC01-appb-C000090
　４－（２－クロロ－５－メトキシフェニル）－５－（２，６－ジフルオロフェニル）－５－オキソペンタン酸　１．４７ｇと酢酸アンモニウム　６．７５ｇを含む酢酸溶液　１０ｍｌを、１３０℃にて１４時間反応した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層に水を加え、さらに発砲がおさまるまで炭酸カリウムを加えた後に分液した。次いで、有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行った後に、ジイソプロピルエーテルにより析出物を洗浄した。得られた紫色固体は表題の化合物であり、０．９８ｇであった。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．２５－７．２１　（１Ｈ，　ｍ），　７．１９　（１Ｈ，　ｄ，　Ｊ　＝　８．８　Ｈｚ），　６．８３－６．７６　（３Ｈ，　ｍ），　６．６５　（１Ｈ，　ｄｄ，　Ｊ　＝　８．８，　３．４　Ｈｚ），　６．５３　（１Ｈ，　ｄ，　Ｊ　＝　３．４　Ｈｚ），　３．６１　（３Ｈ，　ｓ），　２．９１－２．７６　（４Ｈ，　ｍ）． 10 ml of an acetic acid solution containing 1.47 g of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid and 6.75 g of ammonium acetate was added at 130 ° C. Reacted for hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. Water was added to the obtained organic layer, and potassium carbonate was further added until the firing was stopped, followed by liquid separation. Next, the organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the precipitate was washed with diisopropyl ether. The resulting purple solid was the title compound, 0.98 g.
1 H-NMR (CDCl 3 ) δ: 7.25-7.21 (1H, m), 7.19 (1H, d, J = 8.8 Hz), 6.83-6.76 (3H, m ), 6.65 (1H, dd, J = 8.8, 3.4 Hz), 6.53 (1H, d, J = 3.4 Hz), 3.61 (3H, s), 2.91 -2.76 (4H, m).
　ステップ２：５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチル－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成（化合物番号５２） Step 2: Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one (Compound No. 52)
Figure JPOXMLDOC01-appb-C000091
Figure JPOXMLDOC01-appb-C000091
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オン　０．５０ｇを含むＤＭＦ溶液　５ｍｌに、ヨウ化エチル　３４６μｌと炭酸セシウム　１．４１ｇを加えて、６０℃で２時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物は０．５４ｇの白色固体として得られた。 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one in 5 ml of DMF solution containing 0.50 g and 346 μl of ethyl iodide And 1.41 g of cesium carbonate were added and stirred at 60 ° C. for 2 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.54 g of a white solid.
［合成例２］
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オンの合成（化合物番号５３） [Synthesis Example 2]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 53)
Figure JPOXMLDOC01-appb-C000092
Figure JPOXMLDOC01-appb-C000092
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチル－３，４－ジヒドロピリジン－２（１Ｈ）－オン　５２０ｍｇを含む四塩化炭素溶液　２０ｍｌに、Ｎ－ブロモスクシンイミド　２５８ｍｇとアゾビスイソブチロニトリル　２３ｍｇを加えて、８０℃で９０分間撹拌した。室温まで冷却した後に、反応混合物に水を加えて、減圧下で四塩化炭素を留去した。これに酢酸エチルを加えて分液した後に、得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が４６７ｍｇの白色固体として得られた。 To 20 ml of a carbon tetrachloride solution containing 520 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one, N-bromosuccinimide (258 mg) and azobisisobutyronitrile (23 mg) were added, and the mixture was stirred at 80 ° C. for 90 minutes. After cooling to room temperature, water was added to the reaction mixture, and carbon tetrachloride was distilled off under reduced pressure. Ethyl acetate was added thereto for liquid separation, and the obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 467 mg of a white solid.
［合成例３］
　３－クロロ－５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オンの合成（化合物番号５４） [Synthesis Example 3]
Synthesis of 3-chloro-5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 54)
Figure JPOXMLDOC01-appb-C000093
Figure JPOXMLDOC01-appb-C000093
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オン　１１０ｍｇを含むＤＭＦ溶液　２ｍｌにＮ－クロロスクシンイミド　４３ｍｇを加えて、７０℃で１時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層を飽和食塩水にて洗浄した後に、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製を行った。表題の化合物が１１４ｍｇの白色固体として得られた。 Add 43 mg of N-chlorosuccinimide to 2 ml of DMF solution containing 110 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one , And stirred at 70 ° C. for 1 hour. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 114 mg of a white solid.
［合成例４］
　５－（２－クロロ－５－ヒドロキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オンの合成（化合物番号２３４） [Synthesis Example 4]
Synthesis of 5- (2-chloro-5-hydroxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 234)
Figure JPOXMLDOC01-appb-C000094
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オン　４．０ｇを含むジクロロメタン溶液　４０ｍｌを氷冷し、１．０ｍｏｌ／ｌの三臭化ホウ素のジクロロメタン溶液　２３．４ｍｌを滴下した。氷冷下で３０分間撹拌した後に、反応混合物に水を加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液および飽和炭酸水素ナトリウム水溶液で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をヘキサンで洗浄した。表題の化合物が３．９ｇの白色固体として得られた。
Figure JPOXMLDOC01-appb-C000094
40 ml of dichloromethane solution containing 4.0 g of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one was ice-cooled. 23.4 ml of 0 mol / l boron tribromide in dichloromethane was added dropwise. After stirring for 30 minutes under ice cooling, water was added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with an aqueous sodium thiosulfate solution and a saturated aqueous sodium bicarbonate solution, and dried over sodium sulfate. After distilling off the solvent under reduced pressure, the resulting residue was washed with hexane. The title compound was obtained as 3.9 g of a white solid.
［合成例５］
　５－（２－クロロ－５－（メトキシメトキシ）フェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オンの合成（化合物番号９７） [Synthesis Example 5]
Synthesis of 5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 97)
Figure JPOXMLDOC01-appb-C000095
Figure JPOXMLDOC01-appb-C000095
　水素化ナトリウム（約６０重量％、流動パラフィンに分散した状態）　０．０８ｇと５－（２－クロロ－５－ヒドロキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オン　０．６２ｇを含むＴＨＦ溶液に、クロロメチルメチルエーテル　０．０８ｇを加えて、室温で３時間撹拌した。反応混合物に水および酢酸エチルを加えて分液した後に、得られた有機層を硫酸マグネシウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が０．４６ｇの白色固体として得られた。 Sodium hydride (approximately 60% by weight, dispersed in liquid paraffin) 0.08 g and 5- (2-chloro-5-hydroxyphenyl) -6- (2,6-difluorophenyl) -1-ethylpyridine-2 0.08 g of chloromethyl methyl ether was added to a THF solution containing 0.62 g of (1H) -one, and the mixture was stirred at room temperature for 3 hours. Water and ethyl acetate were added to the reaction mixture for liquid separation, and the obtained organic layer was dried over magnesium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.46 g of a white solid.
［合成例６］
　３－クロロ－５－（２－クロロ－５－（メトキシメトキシ）フェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オンの合成（化合物番号１２７） [Synthesis Example 6]
Synthesis of 3-chloro-5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 127)
Figure JPOXMLDOC01-appb-C000096
Figure JPOXMLDOC01-appb-C000096
　５－（２－クロロ－５－（メトキシメトキシ）フェニル）－６－（２，６－ジフルオロフェニル）－１－エチルピリジン－２（１Ｈ）－オン　２１９ｍｇとＮ－クロロスクシンイミド　７９ｍｇを含むＤＭＦ溶液　３ｍｌを７０℃にて１時間撹拌した。室温まで冷却した後に、反応混合物に飽和炭酸水素ナトリウム水溶液と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が２０３ｍｇの黄色ガム状物質として得られた。 3-ml DMF solution containing 219 mg 5- (2-chloro-5- (methoxymethoxy) phenyl) -6- (2,6-difluorophenyl) -1-ethylpyridin-2 (1H) -one and 79 mg N-chlorosuccinimide Was stirred at 70 ° C. for 1 hour. After cooling to room temperature, a saturated aqueous sodium hydrogen carbonate solution and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 203 mg of a yellow gum.
［合成例７］
　５－（２－クロロ－５－メトキシフェニル）－１－（２，２－ジフルオロエチル）－６－（２，６－ジフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成（化合物番号１９２） [Synthesis Example 7]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one Compound No. 192)
Figure JPOXMLDOC01-appb-C000097
Figure JPOXMLDOC01-appb-C000097
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オン　０．５０ｇ、ｐ－トルエンスルホン酸２，２－ジフルオロエチル　０．６８ｇと炭酸セシウム　１．４０ｇを含むＤＭＦ溶液１０ｍｌを、８０℃で４時間撹拌した。反応混合物に水と酢酸エチルを加えて分液した後に、得られた有機層を１規定の塩酸、飽和炭酸水素ナトリウム水溶液および飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が０．４８ｇの白色固体として得られた。 5- (2-Chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one 0.50 g, 2,2-difluoro p-toluenesulfonic acid 10 ml of a DMF solution containing 0.68 g of ethyl and 1.40 g of cesium carbonate was stirred at 80 ° C. for 4 hours. Water and ethyl acetate were added to the reaction mixture for liquid separation, and the obtained organic layer was washed successively with 1N hydrochloric acid, saturated aqueous sodium hydrogen carbonate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.48 g of a white solid.
［合成例８］
　５－（２－クロロ－５－メトキシフェニル）－１－（２，２－ジフルオロエチル）－６－（２，６－ジフルオロフェニル）ピリジン－２（１Ｈ）－オンの合成（化合物番号１９４） [Synthesis Example 8]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridin-2 (1H) -one (Compound No. 194)
Figure JPOXMLDOC01-appb-C000098
Figure JPOXMLDOC01-appb-C000098
　５－（２－クロロ－５－メトキシフェニル）－１－（２，２－ジフルオロエチル）－６－（２，６－ジフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オン　０．４２ｇを含む四塩化炭素溶液　１５ｍｌに、Ｎ－ブロモスクシンイミド　１９０ｍｇとアゾビスイソブチロニトリル　１６ｍｇを加えて、８０℃で１５分間撹拌した。室温まで冷却した後に、反応混合物に水を加えて、減圧下で四塩化炭素を留去した。これに酢酸エチルを加えて分液した後に、得られた有機層をチオ硫酸ナトリウム水溶液および飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が０．３８ｇの白色固体として得られた。 5- (2-Chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) -3,4-dihydropyridin-2 (1H) -one 0.42 g N-bromosuccinimide 190 mg and azobisisobutyronitrile 16 mg were added to a carbon tetrachloride solution containing 15 ml, and the mixture was stirred at 80 ° C. for 15 minutes. After cooling to room temperature, water was added to the reaction mixture, and carbon tetrachloride was distilled off under reduced pressure. Ethyl acetate was added thereto for liquid separation, and the obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.38 g of a white solid.
［合成例９］
　３－ブロモ－５－（２－クロロ－５－メトキシフェニル）－１－（２，２－ジフルオロエチル）－６－（２，６－ジフルオロフェニル）ピリジン－２（１Ｈ）－オンの合成（化合物番号１９８） [Synthesis Example 9]
Synthesis of 3-bromo-5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridin-2 (1H) -one (compound Number 198)
Figure JPOXMLDOC01-appb-C000099
Figure JPOXMLDOC01-appb-C000099
　５－（２－クロロ－５－メトキシフェニル）－１－（２，２－ジフルオロエチル）－６－（２，６－ジフルオロフェニル）ピリジン－２（１Ｈ）－オン　１２５ｍｇとＮ－ブロモスクシンイミド　６５ｍｇを含むＤＭＦ溶液　５ｍｌを７０℃で２時間撹拌した。これにＮ－ブロモスクシンイミド　２７ｍｇを追加して、さらに７０℃で２時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去をした後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が１０９ｍｇのオフホワイト固体として得られた。 5- (2-chloro-5-methoxyphenyl) -1- (2,2-difluoroethyl) -6- (2,6-difluorophenyl) pyridin-2 (1H) -one (125 mg) and N-bromosuccinimide (65 mg) The DMF solution containing 5 ml was stirred at 70 ° C. for 2 hours. To this was added 27 mg of N-bromosuccinimide, and the mixture was further stirred at 70 ° C. for 2 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 109 mg off-white solid.
［合成例１０］
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチル－３－メチル－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成 [Synthesis Example 10]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methyl-3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000100
Figure JPOXMLDOC01-appb-C000100
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチル－３，４－ジヒドロピリジン－２（１Ｈ）－オン　５００ｍｇを含むＴＨＦ溶液　１０ｍｌを－７８℃に冷却し、１．０９ｍｏｌ／ｌのリチウムジイソプロピルアミドのＴＨＦ溶液　１．３３ｍｌを滴下して、同温で３０分間撹拌した。次いで、これにヨウ化メチル　８２μｌを含むＴＨＦ溶液　２ｍｌを滴下して－７８℃で２時間撹拌した後に、室温まで昇温した。さらに室温で２時間撹拌した後に、反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が１０１ｍｇの白色固体として得られた。また、得られた表題の化合物は立体異性混合物であった。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．２４－７．１７　（１Ｈ，　ｍ：ｍｉｘｔｕｒｅ），　７．１５－７．１３　（１Ｈ，　ｍ：ｍｉｘｔｕｒｅ），　６．８７－６．７１　（２Ｈ，　ｍ：ｍｉｘｔｕｒｅ），　６．５７－６．４９　（２Ｈ，　ｍ：ｍｉｘｔｕｒｅ），　３．７０－３．１４　（２Ｈ，　ｍ：ｍｉｘｔｕｒｅ），　３．６５　（３Ｈ，　ｓ：ｍａｊｏｒ），　３．５８　（３Ｈ，　ｓ：ｍｉｎｏｒ），　２．９８－２．７０　（２Ｈ，　ｍ：ｍｉｘｔｕｒｅ），　２．４６－２．３７　（１Ｈ，　ｍ：ｍｉｘｔｕｒｅ），　１．３５　（３Ｈ，　ｄ，　Ｊ　＝　６．７　Ｈｚ：ｍｉｎｏｒ），　１．３３　（３Ｈ，　ｄ，　Ｊ　＝　７．０　Ｈｚ：ｍａｊｏｒ），　１．００－０．９６　（３Ｈ，　ｍ）．
立体異性混合物比：約５７：４３ 10 ml of a THF solution containing 500 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3,4-dihydropyridin-2 (1H) -one at −78 ° C. Then, 1.33 ml of a THF solution of 1.09 mol / l lithium diisopropylamide was added dropwise and stirred at the same temperature for 30 minutes. Next, 2 ml of a THF solution containing 82 μl of methyl iodide was added dropwise thereto, followed by stirring at −78 ° C. for 2 hours, and then the temperature was raised to room temperature. After further stirring at room temperature for 2 hours, a saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate the layers. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 101 mg of a white solid. The obtained title compound was a stereoisomeric mixture.
1 H-NMR (CDCl 3 ) δ: 7.24-7.17 (1H, m: mixure), 7.15-7.13 (1H, m: mixure), 6.87-6.71 (2H, m: mixture), 6.57-6.49 (2H, m: mixture), 3.70-3.14 (2H, m: mixture), 3.65 (3H, s: major), 3.58 ( 3H, s: minor), 2.98-2.70 (2H, m: mixture), 2.46-2.37 (1H, m: mixture), 1.35 (3H, d, J = 6.7). Hz: minor), 1.33 (3H, d, J = 7.0 Hz: major), 1.00-0.96 (3H, m).
Stereoisomeric mixture ratio: about 57:43
［合成例１１］
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチル－３－メチルピリジン－２（１Ｈ）－オンの合成（化合物番号３２９） [Synthesis Example 11]
Synthesis of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methylpyridin-2 (1H) -one (Compound No. 329)
Figure JPOXMLDOC01-appb-C000101
Figure JPOXMLDOC01-appb-C000101
　５－（２－クロロ－５－メトキシフェニル）－６－（２，６－ジフルオロフェニル）－１－エチル－３－メチル－３，４－ジヒドロピリジン－２（１Ｈ）－オン　４１３ｍｇと二酸化マンガン　５．４８ｇを含むジクロロメタン溶液　１０ｍｌを加熱還流下で１１時間撹拌した。さらに二酸化マンガン　１．８３ｇを追加して、加熱還流下で３時間撹拌した。室温まで冷却した後に、反応混合物をセライト濾過した。濾液を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が２９１ｍｇの白色固体として得られた。 4. 413 mg of 5- (2-chloro-5-methoxyphenyl) -6- (2,6-difluorophenyl) -1-ethyl-3-methyl-3,4-dihydropyridin-2 (1H) -one and manganese dioxide 10 ml of a dichloromethane solution containing 48 g was stirred for 11 hours under heating and reflux. Further, 1.83 g of manganese dioxide was added, and the mixture was stirred for 3 hours with heating under reflux. After cooling to room temperature, the reaction mixture was filtered through celite. After the solvent was distilled off from the filtrate under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 291 mg of a white solid.
［合成例１２］
　ステップ１：５－（２－クロロ－５－フルオロフェニル）－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成 [Synthesis Example 12]
Step 1: Synthesis of 5- (2-chloro-5-fluorophenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000102
Figure JPOXMLDOC01-appb-C000102
　４－（２－クロロ－５－フルオロフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸　４．４６ｇと酢酸アンモニウム　４５．９ｇを含む酢酸溶液　２５ｍｌを１３０℃で２時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層に水を加え、さらに発泡がおさまるまで炭酸カリウムを加えた後に分液した。次いで、有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、ジイソプロピルエーテルで析出物を洗浄した。得られた白色固体は表題の化合物であり、２．２４ｇであった。また、析出物を洗浄した際に生じた濾液を、減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。濾液から得た白色固体も表題の化合物であり、０．４６ｇであった。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．２８－７．２６　（１Ｈ，　ｍ），　７．１８　（１Ｈ，　ｂｒ　ｓ），　６．８６－６．８３　（１Ｈ，　ｍ），　６．７４－６．７２　（１Ｈ，　ｍ），　６．６１－６．５９　（２Ｈ，　ｂｒ　ｍ），　２．８５－２．７４　（４Ｈ，　ｂｒ　ｍ）． 25 ml of acetic acid solution containing 4.46 g of 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid and 45.9 g of ammonium acetate at 130 ° C. Stir for 2 hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. Water was added to the obtained organic layer, and potassium carbonate was further added until foaming stopped, followed by liquid separation. Next, the organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the precipitate was washed with diisopropyl ether. The resulting white solid was the title compound, 2.24 g. Further, the filtrate produced when the precipitate was washed was evaporated under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The white solid obtained from the filtrate was also the title compound, 0.46 g.
1 H-NMR (CDCl 3 ) δ: 7.28-7.26 (1H, m), 7.18 (1H, br s), 6.86-6.83 (1H, m), 6.74- 6.72 (1H, m), 6.61-6.59 (2H, br m), 2.85-2.74 (4H, br m).
　ステップ２：５－（２－クロロ－５－フルオロフェニル）－１－エチル－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成（化合物番号３２０） Step 2: Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one (compound Number 320)
Figure JPOXMLDOC01-appb-C000103
Figure JPOXMLDOC01-appb-C000103
　５－（２－クロロ－５－フルオロフェニル）－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オン　２．７０ｇ、炭酸セシウム　７．４２ｇとヨウ化エチル　３．５５ｇを含むＤＭＦ溶液　３２ｍｌを、５５℃で２時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと水を加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が２．４７ｇの赤紫色ガム状物質として得られた。 5- (2-chloro-5-fluorophenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one 2.70 g, cesium carbonate 7.42 g and iodine 32 ml of DMF solution containing 3.55 g of ethyl chloride was stirred at 55 ° C. for 2 hours. After cooling to room temperature, ethyl acetate and water were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 2.47 g of a magenta gum.
［合成例１３］
　５－（２－クロロ－５－フルオロフェニル）－１－エチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オンの合成（化合物番号３２１） [Synthesis Example 13]
Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 321)
Figure JPOXMLDOC01-appb-C000104
Figure JPOXMLDOC01-appb-C000104
　５－（２－クロロ－５－フルオロフェニル）－１－エチル－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オン　０．２１ｇと二酸化マンガン　１．４２ｇを含むトルエン溶液　５ｍｌを、９０℃で５時間撹拌した。室温まで冷却した後に、反応混合物をセライト濾過した。濾液を減圧下で溶媒留去をした後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が０．１４ｇの白色固体として得られた。 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one 0.21 g and manganese dioxide 1 5 ml of a toluene solution containing .42 g was stirred at 90 ° C. for 5 hours. After cooling to room temperature, the reaction mixture was filtered through celite. After the solvent was distilled off from the filtrate under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.14 g of a white solid.
［合成例１４］
　３－ブロモ－５－（２－クロロ－５－フルオロフェニル）－１－エチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オンの合成（化合物番号３８１） [Synthesis Example 14]
Synthesis of 3-bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 381)
Figure JPOXMLDOC01-appb-C000105
Figure JPOXMLDOC01-appb-C000105
　５－（２－クロロ－５－フルオロフェニル）－１－エチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オン　０．６０ｇとＮ－ブロモスクシンイミド　０．３３ｇを含むＤＭＦ溶液　３０ｍｌを７５℃で２．５時間撹拌した。さらに、Ｎ－ブロモスクシンイミド　０．１０ｇを追加して、７５℃で１．５時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水にて洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が０．６４ｇの白色固体として得られた。 5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (0.60 g) and N-bromosuccinimide (0.33 g) 30 ml of the DMF solution contained was stirred at 75 ° C. for 2.5 hours. Further, 0.10 g of N-bromosuccinimide was added and stirred at 75 ° C. for 1.5 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 0.64 g of a white solid.
［合成例１５］
　５－（２－クロロ－５－フルオロフェニル）－１－エチル－３－メチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オンの合成（化合物番号４６１） [Synthesis Example 15]
Synthesis of 5- (2-chloro-5-fluorophenyl) -1-ethyl-3-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 461)
Figure JPOXMLDOC01-appb-C000106
Figure JPOXMLDOC01-appb-C000106
　３－ブロモ－５－（２－クロロ－５－フルオロフェニル）－１－エチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オン　２５０ｍｇ、メチルボロン酸４９ｍｇ、酢酸パラジウム（ＩＩ）６ｍｇ、リン酸三カリウム４０３ｍｇとトリシクロヘキシルホスフィン　１５ｍｇを含むトルエン　８ｍｌと水　０．８ｍｌの混合溶液を、１００℃で７時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が１１６ｍｇの白色固体として得られた。 3-Bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one 250 mg, methylboronic acid 49 mg, palladium acetate (II) A mixed solution of 8 ml of toluene and 0.8 ml of water containing 6 mg, 403 mg of tripotassium phosphate and 15 mg of tricyclohexylphosphine was stirred at 100 ° C. for 7 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 116 mg of a white solid.
［合成例１６］
　３－ブロモ－５－（２－クロロ－５－フルオロフェニル）－６－（２，６－ジフルオロ－４－メトキシフェニル）－１－エチルピリジン－２（１Ｈ）－オンの合成（化合物番号４７６） [Synthesis Example 16]
Synthesis of 3-bromo-5- (2-chloro-5-fluorophenyl) -6- (2,6-difluoro-4-methoxyphenyl) -1-ethylpyridin-2 (1H) -one (Compound No. 476)
　３－ブロモ－５－（２－クロロ－５－フルオロフェニル）－１－エチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オン　３００ｍｇのメタノール溶液　８ｍｌに２８重量％のナトリウムメトキシドのメタノール溶液　０．６３ｍｌを加えて、加熱還流下で１３時間撹拌した。室温まで冷却した後に、反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が２７１ｍｇの白色固体として得られた。 3-Bromo-5- (2-chloro-5-fluorophenyl) -1-ethyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one 28 mg in 8 ml of 300 mg methanol solution 0.63 ml of a methanol solution of% sodium methoxide was added, and the mixture was stirred for 13 hours under heating and reflux. After cooling to room temperature, a saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 271 mg of a white solid.
［合成例１７］
　ステップ１：５－（３，５－ジメトキシフェニル）－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成 [Synthesis Example 17]
Step 1: Synthesis of 5- (3,5-dimethoxyphenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000108
Figure JPOXMLDOC01-appb-C000108
　参考例３で得られた未精製の４－（３，５－ジメトキシフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸に、酢酸アンモニウム　１４．１８ｇと酢酸　１５ｍｌを加えて、１２０℃で１０時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を飽和炭酸水素ナトリウム水溶液と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた固体にイソプロピルエーテルを加えて洗浄した。表題の化合物が０．９９ｇの褐色固体として得られた。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　６．６８　（１Ｈ，　ｓ），　６．６２　（２Ｈ，　ｔｄ，　Ｊ　＝　８．７，　１．４　Ｈｚ），　６．２６　（１Ｈ，　ｔ，　Ｊ　＝　２．１　Ｈｚ），　６．１６　（２Ｈ，　ｄ，　Ｊ　＝　２．１　Ｈｚ），　３．６５　（６Ｈ，　ｓ），　２．８７－２．８６　（２Ｈ，　ｍ），　２．７３－２．７１　（２Ｈ，　ｍ）． To the crude 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid obtained in Reference Example 3, 14.18 g of ammonium acetate and 15 ml of acetic acid And stirred at 120 ° C. for 10 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, isopropyl ether was added to the obtained solid and washed. The title compound was obtained as a 0.99 g brown solid.
1 H-NMR (CDCl 3 ) δ: 6.68 (1H, s), 6.62 (2H, td, J = 8.7, 1.4 Hz), 6.26 (1H, t, J = 2) .1 Hz), 6.16 (2H, d, J = 2.1 Hz), 3.65 (6H, s), 2.87-2.86 (2H, m), 2.73-2.71 (2H, m).
　ステップ２：５－（３，５－ジメトキシフェニル）－１－メチル－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オンの合成 Step 2: Synthesis of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one
Figure JPOXMLDOC01-appb-C000109
Figure JPOXMLDOC01-appb-C000109
　５－（３，５－ジメトキシフェニル）－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オン　３４３ｍｇ、ヨウ化メチル　１７６μｌと炭酸セシウム　１．８５ｇを含むＤＭＦ溶液　６ｍｌを室温で３時間撹拌した。反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を水、チオ硫酸ナトリウム水溶液と飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が３４６ｍｇの白色固体として得られた。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　６．６２－６．６０　（２Ｈ，　ｍ），　６．２３　（１Ｈ，　ｔ，　Ｊ　＝　２．１　Ｈｚ），　６．１３　（２Ｈ，　ｄ，　Ｊ　＝　２．１　Ｈｚ），　３．６５　（６Ｈ，　ｓ），　２．８７　（３Ｈ，　ｓ），　２．７６－２．７４　（４Ｈ，　ｍ）． 5- (3,5-dimethoxyphenyl) -6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one 343 mg, methyl iodide 176 μl and cesium carbonate 1.85 g 6 ml of the DMF solution was stirred for 3 hours at room temperature. Water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with water, aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 346 mg of a white solid.
1 H-NMR (CDCl 3 ) δ: 6.62-6.60 (2H, m), 6.23 (1H, t, J = 2.1 Hz), 6.13 (2H, d, J = 2) .1 Hz), 3.65 (6H, s), 2.87 (3H, s), 2.76-2.74 (4H, m).
［合成例１８］
　５－（３，５－ジメトキシフェニル）－１－メチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オンの合成（化合物番号１３４） [Synthesis Example 18]
Synthesis of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 134)
Figure JPOXMLDOC01-appb-C000110
Figure JPOXMLDOC01-appb-C000110
　５－（３，５－ジメトキシフェニル）－１－メチル－６－（２，４，６－トリフルオロフェニル）－３，４－ジヒドロピリジン－２（１Ｈ）－オン　３２０ｍｇと二酸化マンガン　４．４２ｇを含むジクロロメタン溶液　１２ｍｌを、加熱還流下で５時間撹拌した。室温まで冷却した後に、反応混合物をセライト濾過した。濾液を減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が２６３ｍｇの白色固体として得られた。 Contains 320 mg of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) -3,4-dihydropyridin-2 (1H) -one and 4.42 g of manganese dioxide 12 ml of a dichloromethane solution was stirred for 5 hours under heating to reflux. After cooling to room temperature, the reaction mixture was filtered through celite. After the solvent was distilled off from the filtrate under reduced pressure, the obtained residue was purified by silica gel column chromatography. The title compound was obtained as 263 mg of a white solid.
［合成例１９］
　５－（２－クロロ－３，５－ジメトキシフェニル）－１－メチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オンの合成（化合物番号１３６） [Synthesis Example 19]
Synthesis of 5- (2-chloro-3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one (Compound No. 136)
Figure JPOXMLDOC01-appb-C000111
Figure JPOXMLDOC01-appb-C000111
　５－（３，５－ジメトキシフェニル）－１－メチル－６－（２，４，６－トリフルオロフェニル）ピリジン－２（１Ｈ）－オン　１６３ｍｇとＮ－クロロスクシンイミド　６４ｍｇを含むＤＭＦ溶液　６ｍｌを、８０℃で５時間撹拌した。さらにＮ－クロロスクシンイミド　４５ｍｇを追加して、１００℃で４時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層をチオ硫酸ナトリウム水溶液と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が１５０ｍｇの白色固体として得られた。 6 ml of a DMF solution containing 163 mg of 5- (3,5-dimethoxyphenyl) -1-methyl-6- (2,4,6-trifluorophenyl) pyridin-2 (1H) -one and 64 mg of N-chlorosuccinimide, Stir at 80 ° C. for 5 hours. Further, 45 mg of N-chlorosuccinimide was added and stirred at 100 ° C. for 4 hours. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with aqueous sodium thiosulfate solution and saturated brine, and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 150 mg of a white solid.
〈参考例１〉
　ステップ１：２－（２－クロロ－５－メトキシフェニル）－１－（２，６－ジフルオロフェニル）エタノンの合成 <Reference Example 1>
Step 1: Synthesis of 2- (2-chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone
Figure JPOXMLDOC01-appb-C000112
Figure JPOXMLDOC01-appb-C000112
　２－（２－クロロ－５－メトキシフェニル）酢酸　２．０５ｇを含むＴＨＦ溶液　３０ｍｌを－７８℃に冷却した後に、１．９ｍｏｌ／ＬのヘキサメチルジシラザンナトリウムのＴＨＦ溶液　１７．２１ｍｌを－５０℃以下で滴下して、－７８℃で４０分間撹拌した。これに２，６－ジフルオロ安息香酸メチル　１．７６ｇを含むＴＨＦ溶液　１０ｍｌを－７８℃で滴下した後に、室温まで昇温して１．５時間撹拌した。反応混合物に飽和塩化アンモニウム水溶液を加えて撹拌した後に、酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄して、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製することにより、表題の化合物を２．５８ｇの黄色油状物質として得た。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．４０－７．３８　（１Ｈ，　ｍ），　７．２８－７．２７　（１Ｈ，　ｍ），　６．９６－６．９４　（２Ｈ，　ｍ），　６．８３　（１Ｈ，　ｄ，　Ｊ　＝　３．１　Ｈｚ），　６．７８　（１Ｈ，　ｄｄ，　Ｊ　＝　８．９，　３．１　Ｈｚ），　４．２７　（２Ｈ，　ｓ），　３．７９　（３Ｈ，　ｓ）． After cooling 30 ml of a THF solution containing 2.05 g of 2- (2-chloro-5-methoxyphenyl) acetic acid to −78 ° C., 17.21 ml of a THF solution of 1.9 mol / L hexamethyldisilazane sodium was added to −50 The solution was added dropwise at not more than 0 ° C. and stirred at −78 ° C. for 40 minutes. To this was added dropwise 10 ml of a THF solution containing 1.76 g of methyl 2,6-difluorobenzoate at −78 ° C., and then the mixture was warmed to room temperature and stirred for 1.5 hours. A saturated aqueous ammonium chloride solution was added to the reaction mixture and stirred, and then ethyl acetate was added to separate the layers. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. After the solvent was distilled off under reduced pressure, the obtained residue was purified by silica gel column chromatography to obtain the title compound as 2.58 g of a yellow oily substance.
1 H-NMR (CDCl 3 ) δ: 7.40-7.38 (1H, m), 7.28-7.27 (1H, m), 6.96-6.94 (2H, m), 6 .83 (1H, d, J = 3.1 Hz), 6.78 (1H, dd, J = 8.9, 3.1 Hz), 4.27 (2H, s), 3.79 (3H, s).
　ステップ２：４－（２－クロロ－５－メトキシフェニル）－５－（２，６－ジフルオロフェニル）－５－オキソペンタン酸エチルの合成 Step 2: Synthesis of ethyl 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoate
Figure JPOXMLDOC01-appb-C000113
Figure JPOXMLDOC01-appb-C000113
　２－（２－クロロ－５－メトキシフェニル）－１－（２，６－ジフルオロフェニル）エタノン　１．３０ｇを含むＴＨＦ溶液　１５ｍｌに、カリウム　ｔ－ブトキシド　９８ｍｇとアクリル酸エチル　５２５μｌを加えて、氷冷下で終夜で撹拌した。反応混合物に１規定の塩酸と酢酸エチルを加えて分液した後に、得られた有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。減圧下にて溶媒留去した後に、表題の化合物を１．６９ｇの黄色油状物質として得た。これ以上精製することなく、次の反応に使用した。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．３６－７．２５　（１Ｈ，　ｍ），　７．１９　（１Ｈ，　ｄ，　Ｊ　＝　８．９　Ｈｚ），　６．８３　（２Ｈ，　ｔ，　Ｊ　＝　８．１　Ｈｚ），　６．７４－６．７１　（２Ｈ，　ｍ），　４．９１　（１Ｈ，　ｔ，　Ｊ　＝　７．２　Ｈｚ），　４．１３　（２Ｈ，　ｑ，　Ｊ　＝　７．１　Ｈｚ），　３．７６　（３Ｈ，　ｓ），　２．５７－２．５３　（１Ｈ，　ｍ），　２．４２－２．２９　（２Ｈ，　ｍ），　２．１６－２．０７　（１Ｈ，　ｍ），　１．２５　（３Ｈ，　ｔ，　Ｊ　＝　７．１　Ｈｚ）． 2- (2-Chloro-5-methoxyphenyl) -1- (2,6-difluorophenyl) ethanone To 15 ml of a THF solution containing 1.30 g, 98 mg of potassium t-butoxide and 525 μl of ethyl acrylate were added, and the mixture was ice-cooled. Stirred overnight. 1N Hydrochloric acid and ethyl acetate were added to the reaction mixture for liquid separation, and the obtained organic layer was washed with saturated brine and dried over sodium sulfate. After evaporating the solvent under reduced pressure, the title compound was obtained as 1.69 g of a yellow oil. Used in the next reaction without further purification.
1 H-NMR (CDCl 3 ) δ: 7.36-7.25 (1H, m), 7.19 (1H, d, J = 8.9 Hz), 6.83 (2H, t, J = 8 .1 Hz), 6.74-6.71 (2H, m), 4.91 (1H, t, J = 7.2 Hz), 4.13 (2H, q, J = 7.1 Hz), 3.76 (3H, s), 2.57-2.53 (1H, m), 2.42-2.29 (2H, m), 2.16-2.07 (1H, m), 25 (3H, t, J = 7.1 Hz).
　ステップ３：４－（２－クロロ－５－メトキシフェニル）－５－（２，６－ジフルオロフェニル）－５－オキソペンタン酸の合成 Step 3: Synthesis of 4- (2-chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid
Figure JPOXMLDOC01-appb-C000114
Figure JPOXMLDOC01-appb-C000114
　４－（２－クロロ－５－メトキシフェニル）－５－（２，６－ジフルオロフェニル）－５－オキソペンタン酸エチル　１．６９ｇを含むＴＨＦ　４０ｍｌと水　１０ｍｌとの混合溶液に、水酸化リチウム１水和物　０．７４ｇを加えて、６０℃で３時間撹拌した。室温まで冷却した後に、液量が半分程度になるまで反応混合物の溶媒を留去した。これに水とジエチルエーテルを加えて分液し、得られた水層に濃塩酸と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水にて洗浄し、硫酸ナトリウムで乾燥した。次いで、減圧下にて溶媒留去した後に、表題の化合物を１．４７ｇの黄色ガム状物質として得た。これ以上精製することなく、次の反応に使用した。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．２８－７．２７　（１Ｈ，　ｍ），　７．１９　（１Ｈ，　ｄ，　Ｊ　＝　８．６　Ｈｚ），　６．８３　（２Ｈ，　ｔ，　Ｊ　＝　８．３　Ｈｚ），　６．７５－６．７４　（１Ｈ，　ｍ），　６．７１　（１Ｈ，　ｄｄ，　Ｊ　＝　８．６，　３．１　Ｈｚ），　４．９２　（１Ｈ，　ｔ，　Ｊ　＝　７．３　Ｈｚ），　３．７５　（３Ｈ，　ｓ），　２．６０－２．３４　（３Ｈ，　ｍ），　２．１５－２．１２　（１Ｈ，　ｍ）． 4- (2-Chloro-5-methoxyphenyl) -5- (2,6-difluorophenyl) -5-oxopentanoic acid ethyl 1.69 g of THF mixed with 40 ml of THF and 10 ml of water were mixed with lithium hydroxide 1 The hydrate 0.74g was added and it stirred at 60 degreeC for 3 hours. After cooling to room temperature, the solvent of the reaction mixture was distilled off until the liquid volume became about half. Water and diethyl ether were added thereto for liquid separation, and the obtained aqueous layer was separated by adding concentrated hydrochloric acid and ethyl acetate. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. Then after distilling off the solvent under reduced pressure, the title compound was obtained as 1.47 g of a yellow gum. Used in the next reaction without further purification.
1 H-NMR (CDCl 3 ) δ: 7.28-7.27 (1H, m), 7.19 (1H, d, J = 8.6 Hz), 6.83 (2H, t, J = 8 .3 Hz), 6.75-6.74 (1H, m), 6.71 (1H, dd, J = 8.6, 3.1 Hz), 4.92 (1H, t, J = 7. 3 Hz), 3.75 (3H, s), 2.60-2.34 (3H, m), 2.15-2.12 (1H, m).
〈参考例２〉
　ステップ１：Ｎ’－（２－クロロ－５－フルオロベンジリデン）－４－メチルベンゼンスルホニルヒドラジドの合成 <Reference Example 2>
Step 1: Synthesis of N ′-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonyl hydrazide
Figure JPOXMLDOC01-appb-C000115
Figure JPOXMLDOC01-appb-C000115
　２－クロロ－５－フルオロベンズアルデヒド　２５．４３ｇと４－メチルベンゼンスルホニルヒドラジド　２９．８７ｇを含むエタノール溶液　２５０ｍｌを室温で４時間撹拌した。次いで、反応混合物を氷冷下で１時間撹拌した後に析出物を濾過し、表題の化合物を４０．７４ｇの白色固体として得た。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　８．２７　（１Ｈ，　ｓ），　８．１０　（１Ｈ，　ｄ，　Ｊ　＝　１．８　Ｈｚ），　７．８８　（２Ｈ，　ｄ，　Ｊ　＝　８．２　Ｈｚ），　７．５８　（１Ｈ，　ｄｄ，　Ｊ　＝　９．２，　３．１　Ｈｚ），　７．３４　（２Ｈ，　ｄ，　Ｊ　＝　８．２　Ｈｚ），　７．３０－７．２８　（１Ｈ，　ｍ），　７．０２－６．９９　（１Ｈ，　ｍ），　２．４３　（３Ｈ，　ｓ）． 250 ml of an ethanol solution containing 25.43 g of 2-chloro-5-fluorobenzaldehyde and 29.87 g of 4-methylbenzenesulfonyl hydrazide was stirred at room temperature for 4 hours. The reaction mixture was then stirred for 1 hour under ice cooling and the precipitate was filtered to give the title compound as 40.74 g of a white solid.
1 H-NMR (CDCl 3 ) δ: 8.27 (1H, s), 8.10 (1H, d, J = 1.8 Hz), 7.88 (2H, d, J = 8.2 Hz) 7.58 (1H, dd, J = 9.2, 3.1 Hz), 7.34 (2H, d, J = 8.2 Hz), 7.30-7.28 (1H, m), 7.02-6.99 (1H, m), 2.43 (3H, s).
　ステップ２：２－（２－クロロ－５－フルオロフェニル）－１－（２，４，６－トリフルオロフェニル）エタノンの合成 Step 2: Synthesis of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone
Figure JPOXMLDOC01-appb-C000116
Figure JPOXMLDOC01-appb-C000116
　水酸化ナトリウム　４．０ｇを含む水溶液　６００ｍｌに、Ｎ’－（２－クロロ－５－フルオロベンジリデン）－４－メチルベンゼンスルホニルヒドラジド　３２．７ｇと２，４，６－トリフルオロベンズアルデヒド　８．０ｇを加えて、８０℃で１時間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルと塩化アンモニウム　１５．０ｇを加えて撹拌し、分液した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去し、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が６．１３ｇの淡黄色固体として得られた。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．３６－７．３４　（１Ｈ，　ｍ），　７．０４－７．０２　（１Ｈ，　ｍ），　６．９８－６．９６　（１Ｈ，　ｍ），　６．７６－６．７２　（２Ｈ，　ｍ）　４．２６　（２Ｈ，　ｓ）． To 600 ml of an aqueous solution containing 4.0 g of sodium hydroxide, 32.7 g of N ′-(2-chloro-5-fluorobenzylidene) -4-methylbenzenesulfonylhydrazide and 8.0 g of 2,4,6-trifluorobenzaldehyde were added. And stirred at 80 ° C. for 1 hour. After cooling to room temperature, ethyl acetate and 15.0 g of ammonium chloride were added to the reaction mixture, and the mixture was stirred and separated. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 6.13 g of a pale yellow solid.
1 H-NMR (CDCl 3 ) δ: 7.36-7.34 (1H, m), 7.04-7.02 (1H, m), 6.98-6.96 (1H, m), 6 .76-6.72 (2H, m) 4.26 (2H, s).
　ステップ３：４－（２－クロロ－５－フルオロフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸エチルの合成 Step 3: Synthesis of ethyl 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
Figure JPOXMLDOC01-appb-C000117
Figure JPOXMLDOC01-appb-C000117
　２－（２－クロロ－５－フルオロフェニル）－１－（２，４，６－トリフルオロフェニル）エタノン　６．１３ｇを含むＴＨＦ溶液　７５ｍｌを氷冷し、カリウム　ｔ－ブトキシド　０．４５ｇとアクリル酸エチル　２．２３ｇを加えて、室温で８時間撹拌した。反応混合物に１０％の塩酸を加えた後に、水と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去して、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が４．９７ｇの淡黄色油状物質として得られた。１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．３０　（１Ｈ，　ｄｄ，　Ｊ　＝　８．９，　５．２　Ｈｚ），　７．０１－６．９８　（１Ｈ，　ｍ），　６．９２－６．９０　（１Ｈ，　ｍ），　６．６６－６．６０　（２Ｈ，　ｍ），　４．８９　（１Ｈ，　ｔ，　Ｊ　＝　７．２　Ｈｚ），　４．１３　（２Ｈ，　ｑ，　Ｊ　＝　７．２　Ｈｚ），　２．５４－２．５２　（１Ｈ，　ｍ），　２．３５－２．３１　（２Ｈ，　ｍ），　２．１２－２．０９　（１Ｈ，　ｍ），　１．２５　（３Ｈ，　ｔ，　Ｊ　＝　７．２　Ｈｚ）． 75 ml of THF solution containing 6.13 g of 2- (2-chloro-5-fluorophenyl) -1- (2,4,6-trifluorophenyl) ethanone was ice-cooled, 0.45 g of potassium t-butoxide and acrylic acid Ethyl 2.23g was added and it stirred at room temperature for 8 hours. After 10% hydrochloric acid was added to the reaction mixture, water and ethyl acetate were added to separate the layers. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 4.97 g of a pale yellow oil. 1 H-NMR (CDCl 3 ) δ: 7.30 (1H, dd, J = 8.9, 5.2 Hz), 7.01-6.98 (1H, m), 6.92-6.90 (1H, m), 6.66-6.60 (2H, m), 4.89 (1H, t, J = 7.2 Hz), 4.13 (2H, q, J = 7.2 Hz) , 2.54-2.52 (1H, m), 2.35-2.31 (2H, m), 2.12-2.09 (1H, m), 1.25 (3H, t, J = 7.2 Hz).
　ステップ４：４－（２－クロロ－５－フルオロフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸の合成 Step 4: Synthesis of 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
Figure JPOXMLDOC01-appb-C000118
Figure JPOXMLDOC01-appb-C000118
　４－（２－クロロ－５－フルオロフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸エチル　４．９７ｇを含むＴＨＦ溶液　１００ｍｌに、水　２５ｍｌと水酸化リチウム１水和物２．５９ｇを加えて、６０℃で２時間撹拌した。室温まで冷却した後に、反応混合物を減圧下で溶媒留去した。これに、水とジエチルエーテルを加えて分液を行った。次いで、得られた水層に濃塩酸を加えて酸性化した後に、酢酸エチルで抽出した。得られた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、表題の化合物が４．４６ｇの無色透明ガム状物質として得られた。これ以上精製することなく、次の反応に使用した。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　７．３２－７．２９　（１Ｈ，　ｍ），　７．００－６．９７　（１Ｈ，　ｍ），　６．９４－６．８９　（１Ｈ，　ｍ），　６．６４－６．６０　（２Ｈ，　ｍ），　４．８９　（１Ｈ，　ｔ，　Ｊ　＝　７．２　Ｈｚ），　２．５８－２．０６　（４Ｈ，　ｍ）． 4- (2-chloro-5-fluorophenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate 4.97 g in THF solution 100 ml, water 25 ml and lithium hydroxide 1 2.59 g of hydrate was added and stirred at 60 ° C. for 2 hours. After cooling to room temperature, the reaction mixture was evaporated under reduced pressure. Water and diethyl ether were added thereto for liquid separation. Next, the obtained aqueous layer was acidified with concentrated hydrochloric acid, and extracted with ethyl acetate. The obtained organic layer was washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the title compound was obtained as 4.46 g of a colorless transparent gum. Used in the next reaction without further purification.
1 H-NMR (CDCl 3 ) δ: 7.32-7.29 (1H, m), 7.00-6.97 (1H, m), 6.94-6.89 (1H, m), 6 .64-6.60 (2H, m), 4.89 (1H, t, J = 7.2 Hz), 2.58-2.06 (4H, m).
〈参考例３〉
　ステップ１：Ｎ’－（３，５－ジメトキシベンジリデン）－４－メチルベンゼンスルホニルヒドラジドの合成 <Reference Example 3>
Step 1: Synthesis of N ′-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonyl hydrazide
Figure JPOXMLDOC01-appb-C000119
Figure JPOXMLDOC01-appb-C000119
　３，５－ジメトキシベンズアルデヒド　１０．０ｇと４－メチルベンゼンスルホニルヒドラジド　１１．２ｇを含むエタノール溶液　１００ｍｌを室温で５時間撹拌した。得られた反応混合物を減圧下で溶媒留去した後に、表題の化合物が２０．０ｇの黄色固体として得られた。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　８．１３　（１Ｈ，　ｓ），　７．８７　（２Ｈ，　ｄ，　Ｊ　＝　７．８　Ｈｚ），　７．６８　（１Ｈ，　ｓ），　７．３０　（２Ｈ，　ｄ，　Ｊ　＝　７．８　Ｈｚ），　６．７２　（２Ｈ，　ｄ，　Ｊ　＝　２．４　Ｈｚ），　６．４６　（１Ｈ，　ｔ，　Ｊ　＝　２．４　Ｈｚ），　３．７９　（６Ｈ，　ｓ），　２．４０　（３Ｈ，　ｓ）． 100 ml of an ethanol solution containing 10.0 g of 3,5-dimethoxybenzaldehyde and 11.2 g of 4-methylbenzenesulfonyl hydrazide was stirred at room temperature for 5 hours. The resulting reaction mixture was evaporated under reduced pressure to give the title compound as 20.0 g of a yellow solid.
1 H-NMR (CDCl 3 ) δ: 8.13 (1H, s), 7.87 (2H, d, J = 7.8 Hz), 7.68 (1H, s), 7.30 (2H, d, J = 7.8 Hz), 6.72 (2H, d, J = 2.4 Hz), 6.46 (1H, t, J = 2.4 Hz), 3.79 (6H, s) , 2.40 (3H, s).
　ステップ２：２－（３，５－ジメトキシフェニル）－１－（２，４，６－トリフルオロフェニル）エタノンの合成 Step 2: Synthesis of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone
Figure JPOXMLDOC01-appb-C000120
Figure JPOXMLDOC01-appb-C000120
　Ｎ’－（３，５－ジメトキシベンジリデン）－４－メチルベンゼンスルホニルヒドラジド　６．６８ｇを含む水溶液　１００ｍｌに、水酸化ナトリウム　０．８０ｇを溶解した水溶液　２０ｍｌと　２，４，６－トリフルオロベンズアルデヒド　１．６０ｇを加えて、８０℃で９０分間撹拌した。室温まで冷却した後に、反応混合物に酢酸エチルを加えて分液した。得られた有機層を飽和塩化アンモニウム水溶液と飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が１．８５ｇの黄色油状物質として得られた。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　６．６８－６．６６　（２Ｈ，　ｍ），　６．３５　（３Ｈ，　ｓ），４．０６　（２Ｈ，ｓ），　３．７５　（６Ｈ，　ｓ）． 20 ml of an aqueous solution in which 0.80 g of sodium hydroxide is dissolved in 100 ml of an aqueous solution containing 6.68 g of N ′-(3,5-dimethoxybenzylidene) -4-methylbenzenesulfonylhydrazide and 2,4,6-trifluorobenzaldehyde 60 g was added and stirred at 80 ° C. for 90 minutes. After cooling to room temperature, ethyl acetate was added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with saturated aqueous ammonium chloride solution and saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 1.85 g of a yellow oil.
1 H-NMR (CDCl 3 ) δ: 6.68-6.66 (2H, m), 6.35 (3H, s), 4.06 (2H, s), 3.75 (6H, s).
　ステップ３：４－（３，５－ジメトキシフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸エチルの合成 Step 3: Synthesis of ethyl 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate
Figure JPOXMLDOC01-appb-C000121
Figure JPOXMLDOC01-appb-C000121
　２－（３，５－ジメトキシフェニル）－１－（２，４，６－トリフルオロフェニル）エタノン　１．８５ｇを含むＴＨＦ溶液　１８ｍｌに、カリウム　ｔ－ブトキシド　６７ｍｇとアクリル酸エチル　７１４μｌを加えて、氷冷下で終夜撹拌した。反応混合物に飽和塩化アンモニウム水溶液と酢酸エチルを加えて分液した。得られた有機層を飽和食塩水で洗浄した後に、硫酸ナトリウムで乾燥した。減圧下で溶媒留去を行い、得られた残渣をシリカゲルカラムクロマトグラフィーにて精製した。表題の化合物が１．５１ｇの褐色油状物質として得られた。
１Ｈ－ＮＭＲ　（ＣＤＣｌ３）　δ：　６．６１－６．５７　（２Ｈ，　ｍ），　６．３１－６．２９　（３Ｈ，　ｍ），　４．１９　（１Ｈ，　ｔ，　Ｊ　＝　７．３　Ｈｚ），　４．１３　（２Ｈ，　ｑ，　Ｊ　＝　７．１　Ｈｚ），　３．７３　（６Ｈ，　ｓ），　２．４９－２．４７　（１Ｈ，　ｍ），　２．３０　（２Ｈ，　ｔ，　Ｊ　＝　７．５　Ｈｚ），　２．０９－２．０７　（１Ｈ，　ｍ），　１．２５　（３Ｈ，　ｔ，　Ｊ　＝　７．１　Ｈｚ） To 18 ml of THF solution containing 1.85 g of 2- (3,5-dimethoxyphenyl) -1- (2,4,6-trifluorophenyl) ethanone, 67 mg of potassium t-butoxide and 714 μl of ethyl acrylate were added, and iced. Stir overnight under cold. A saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction mixture to separate the layers. The obtained organic layer was washed with saturated brine, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure, and the resulting residue was purified by silica gel column chromatography. The title compound was obtained as 1.51 g of a brown oil.
1 H-NMR (CDCl 3 ) δ: 6.61-6.57 (2H, m), 6.31-6.29 (3H, m), 4.19 (1H, t, J = 7.3 Hz ), 4.13 (2H, q, J = 7.1 Hz), 3.73 (6H, s), 2.49-2.47 (1H, m), 2.30 (2H, t, J = 7.5 Hz), 2.09-2.07 (1H, m), 1.25 (3H, t, J = 7.1 Hz)
　ステップ４：４－（３，５－ジメトキシフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸の合成 Step 4: Synthesis of 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoic acid
Figure JPOXMLDOC01-appb-C000122
Figure JPOXMLDOC01-appb-C000122
　４－（３，５－ジメトキシフェニル）－５－オキソ－５－（２，４，６－トリフルオロフェニル）ペンタン酸エチル　１．５１ｇと濃塩酸３ｍｌを含む酢酸溶液　１５ｍｌを６０℃で３時間撹拌した。室温まで冷却した後に、反応混合物に水と酢酸エチルを加えて分液した。得られた有機層を水と飽和食塩水で順次洗浄して、硫酸ナトリウムで乾燥した。減圧下で溶媒留去し、表題の化合物が得られた。これ以上精製することなく、次工程の反応に使用した。 15 ml of acetic acid solution containing 1.51 g of ethyl 4- (3,5-dimethoxyphenyl) -5-oxo-5- (2,4,6-trifluorophenyl) pentanoate and 3 ml of concentrated hydrochloric acid is stirred at 60 ° C. for 3 hours. did. After cooling to room temperature, water and ethyl acetate were added to the reaction mixture for liquid separation. The obtained organic layer was washed successively with water and saturated brine, and dried over sodium sulfate. The solvent was distilled off under reduced pressure to give the title compound. Used in the next step reaction without further purification.
　表４に、前記した実施例に準じて合成した化合物を示すが、本発明化合物はこれらに限定されるものではない。
　構造Ａは以下を表す。 Although the compound synthesize | combined according to the above-mentioned Example is shown in Table 4, this invention compound is not limited to these.
Structure A represents:
Figure JPOXMLDOC01-appb-C000123
Figure JPOXMLDOC01-appb-C000123
構造Ｂは以下を表す。 Structure B represents the following:
Figure JPOXMLDOC01-appb-C000124
Figure JPOXMLDOC01-appb-C000124
構造Ｃは以下を表す。 Structure C represents:
Figure JPOXMLDOC01-appb-C000125
Figure JPOXMLDOC01-appb-C000125
構造Ｄは以下を表す。 Structure D represents:
Figure JPOXMLDOC01-appb-C000126
Figure JPOXMLDOC01-appb-C000126
Figure JPOXMLDOC01-appb-T000127
Figure JPOXMLDOC01-appb-T000127
Figure JPOXMLDOC01-appb-T000128
Figure JPOXMLDOC01-appb-T000128
Figure JPOXMLDOC01-appb-T000129
Figure JPOXMLDOC01-appb-T000129
Figure JPOXMLDOC01-appb-T000130
Figure JPOXMLDOC01-appb-T000130
Figure JPOXMLDOC01-appb-T000131
Figure JPOXMLDOC01-appb-T000131
Figure JPOXMLDOC01-appb-T000132
Figure JPOXMLDOC01-appb-T000132
Figure JPOXMLDOC01-appb-T000133
Figure JPOXMLDOC01-appb-T000133
Figure JPOXMLDOC01-appb-T000134
Figure JPOXMLDOC01-appb-T000134
Figure JPOXMLDOC01-appb-T000135
Figure JPOXMLDOC01-appb-T000135
Figure JPOXMLDOC01-appb-T000136
Figure JPOXMLDOC01-appb-T000136
Figure JPOXMLDOC01-appb-T000137
Figure JPOXMLDOC01-appb-T000137
Figure JPOXMLDOC01-appb-T000138
Figure JPOXMLDOC01-appb-T000138
Figure JPOXMLDOC01-appb-T000139
Figure JPOXMLDOC01-appb-T000139
Figure JPOXMLDOC01-appb-T000140
Figure JPOXMLDOC01-appb-T000140
Figure JPOXMLDOC01-appb-T000141
Figure JPOXMLDOC01-appb-T000141
Figure JPOXMLDOC01-appb-T000142
Figure JPOXMLDOC01-appb-T000142
Figure JPOXMLDOC01-appb-T000143
Figure JPOXMLDOC01-appb-T000143
Figure JPOXMLDOC01-appb-T000144
Figure JPOXMLDOC01-appb-T000144
Figure JPOXMLDOC01-appb-T000145
Figure JPOXMLDOC01-appb-T000145
Figure JPOXMLDOC01-appb-T000146
Figure JPOXMLDOC01-appb-T000146
　次に、表４に記載の化合物について、表５にそれらの１Ｈ－ＮＭＲデータを示す。 Next, for the compounds described in Table 4, their 1 H-NMR data are shown in Table 5.
Figure JPOXMLDOC01-appb-T000147
Figure JPOXMLDOC01-appb-T000147
Figure JPOXMLDOC01-appb-T000148
Figure JPOXMLDOC01-appb-T000148
Figure JPOXMLDOC01-appb-T000149
Figure JPOXMLDOC01-appb-T000149
Figure JPOXMLDOC01-appb-T000150
Figure JPOXMLDOC01-appb-T000150
Figure JPOXMLDOC01-appb-T000151
Figure JPOXMLDOC01-appb-T000151
Figure JPOXMLDOC01-appb-T000152
Figure JPOXMLDOC01-appb-T000152
Figure JPOXMLDOC01-appb-T000153
Figure JPOXMLDOC01-appb-T000153
Figure JPOXMLDOC01-appb-T000154
Figure JPOXMLDOC01-appb-T000154
Figure JPOXMLDOC01-appb-T000155
Figure JPOXMLDOC01-appb-T000155
Figure JPOXMLDOC01-appb-T000156
Figure JPOXMLDOC01-appb-T000156
Figure JPOXMLDOC01-appb-T000157
Figure JPOXMLDOC01-appb-T000157
Figure JPOXMLDOC01-appb-T000158
Figure JPOXMLDOC01-appb-T000158
Figure JPOXMLDOC01-appb-T000159
Figure JPOXMLDOC01-appb-T000159
Figure JPOXMLDOC01-appb-T000160
Figure JPOXMLDOC01-appb-T000160
Figure JPOXMLDOC01-appb-T000161
Figure JPOXMLDOC01-appb-T000161
Figure JPOXMLDOC01-appb-T000162
Figure JPOXMLDOC01-appb-T000162
Figure JPOXMLDOC01-appb-T000163
Figure JPOXMLDOC01-appb-T000163
Figure JPOXMLDOC01-appb-T000164
Figure JPOXMLDOC01-appb-T000164
Figure JPOXMLDOC01-appb-T000165
Figure JPOXMLDOC01-appb-T000165
Figure JPOXMLDOC01-appb-T000166
Figure JPOXMLDOC01-appb-T000166
Figure JPOXMLDOC01-appb-T000167
Figure JPOXMLDOC01-appb-T000167
Figure JPOXMLDOC01-appb-T000168
Figure JPOXMLDOC01-appb-T000168
Figure JPOXMLDOC01-appb-T000169
Figure JPOXMLDOC01-appb-T000169
Figure JPOXMLDOC01-appb-T000170
Figure JPOXMLDOC01-appb-T000170
Figure JPOXMLDOC01-appb-T000171
Figure JPOXMLDOC01-appb-T000171
Figure JPOXMLDOC01-appb-T000172
Figure JPOXMLDOC01-appb-T000172
Figure JPOXMLDOC01-appb-T000173
Figure JPOXMLDOC01-appb-T000173
Figure JPOXMLDOC01-appb-T000174
Figure JPOXMLDOC01-appb-T000174
Figure JPOXMLDOC01-appb-T000175
Figure JPOXMLDOC01-appb-T000175
Figure JPOXMLDOC01-appb-T000176
Figure JPOXMLDOC01-appb-T000176
Figure JPOXMLDOC01-appb-T000177
Figure JPOXMLDOC01-appb-T000177
Figure JPOXMLDOC01-appb-T000178
Figure JPOXMLDOC01-appb-T000178
Figure JPOXMLDOC01-appb-T000179
Figure JPOXMLDOC01-appb-T000179
Figure JPOXMLDOC01-appb-T000180
Figure JPOXMLDOC01-appb-T000180
Figure JPOXMLDOC01-appb-T000181
Figure JPOXMLDOC01-appb-T000181
Figure JPOXMLDOC01-appb-T000182
Figure JPOXMLDOC01-appb-T000182
Figure JPOXMLDOC01-appb-T000183
Figure JPOXMLDOC01-appb-T000183
Figure JPOXMLDOC01-appb-T000184
Figure JPOXMLDOC01-appb-T000184
Figure JPOXMLDOC01-appb-T000185
Figure JPOXMLDOC01-appb-T000185
Figure JPOXMLDOC01-appb-T000186
Figure JPOXMLDOC01-appb-T000186
Figure JPOXMLDOC01-appb-T000187
Figure JPOXMLDOC01-appb-T000187
Figure JPOXMLDOC01-appb-T000188
Figure JPOXMLDOC01-appb-T000188
Figure JPOXMLDOC01-appb-T000189
Figure JPOXMLDOC01-appb-T000189
Figure JPOXMLDOC01-appb-T000190
Figure JPOXMLDOC01-appb-T000190
Figure JPOXMLDOC01-appb-T000191
Figure JPOXMLDOC01-appb-T000191
Figure JPOXMLDOC01-appb-T000192
Figure JPOXMLDOC01-appb-T000192
Figure JPOXMLDOC01-appb-T000193
Figure JPOXMLDOC01-appb-T000193
Figure JPOXMLDOC01-appb-T000194
Figure JPOXMLDOC01-appb-T000194
Figure JPOXMLDOC01-appb-T000195
Figure JPOXMLDOC01-appb-T000195
Figure JPOXMLDOC01-appb-T000196
Figure JPOXMLDOC01-appb-T000196
Figure JPOXMLDOC01-appb-T000197
Figure JPOXMLDOC01-appb-T000197
Figure JPOXMLDOC01-appb-T000198
Figure JPOXMLDOC01-appb-T000198
Figure JPOXMLDOC01-appb-T000199
Figure JPOXMLDOC01-appb-T000199
Figure JPOXMLDOC01-appb-T000200
Figure JPOXMLDOC01-appb-T000200
Figure JPOXMLDOC01-appb-T000201
Figure JPOXMLDOC01-appb-T000201
Figure JPOXMLDOC01-appb-T000202
Figure JPOXMLDOC01-appb-T000202
Figure JPOXMLDOC01-appb-T000203
Figure JPOXMLDOC01-appb-T000203
　以下、本発明化合物が真菌感染症に有効であることを具体的に示すが、これらの例に限定されるものではない。 Hereinafter, the compound of the present invention is specifically shown to be effective for fungal infections, but is not limited to these examples.
　［試験例］
　供試菌としてＣａｎｄｉｄａ　ａｌｂｉｃａｎｓ、Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｎｅｏｆｏｒｍａｎｓ、Ａｓｐｅｒｇｉｌｌｕｓ　ｆｕｍｉｇａｔｕｓ、Ｆｕｓａｒｉｕｍ　ｓｏｌａｎｉ、Ｆｕｓａｒｉｕｍ　ｏｘｙｓｐｏｒｕｍ、Ｔｒｉｃｈｏｐｈｙｔｏｎ　ｒｕｂｒｕｍ、Ｍｉｃｒｏｓｐｏｒｕｍ　ｇｙｐｓｅｕｍを用いて試験を行った。 [Test example]
Candida albicans, Cryptococcus neoformans, Aspergillus fumigatus, Fusarium solani, Fusarium oxysporum, Trichophyton rubrum, Microsporum gypse were used as test bacteria.
　供試化合物として化合物番号３２、５４、７５、８２、９８、１３６、１９７、２２４、３２２、３４２、３８６、４０３、４０４、４１６、４２１、４６１、４８８、４９０、５０４、５８５、５８７、６５２、６８３、７７９、８１６およびアムホテリシン　Ｂ（ジメチルスルホシキドに溶解させて使用した）を用いて試験を行った。なお、各供試化合物は供試培地ロズウェルパーク記念研究所培地（以下、ＲＰＭＩ１６４０培地と称する；＋３－ｍｏｒｐｈｏｌｉｎｏｐｒｏｐａｎｅｓｕｌｆｏｎｉｃ　ａｃｉｄ（最終濃度０．１６５ｍｏｌ／ｍＬ）、＋グルタミン、－炭酸水素ナトリウム）を用いて０．０００５～３２μｇ／ｍＬの濃度に希釈し、供試した。 Compound numbers 32, 54, 75, 82, 98, 136, 197, 224, 322, 342, 386, 403, 404, 416, 421, 461, 488, 490, 504, 585, 587, 652, Tests were conducted using 683, 779, 816 and amphotericin B (used by dissolving in dimethyl sulfoxide). Each test compound is 0 using a test medium Roswell Park Memorial Laboratory Medium (hereinafter referred to as RPMI 1640 medium; + 3-morpholino propanesulfonic acid (final concentration 0.165 mol / mL), + glutamine, and sodium bicarbonate). Diluted to a concentration of .0005 to 32 μg / mL and tested.
　各種供試菌を以下に示す方法で調整し、各供試化合物の抗菌活性を測定した。
　Ｃａｎｄｉｄａ　ａｌｂｉｃａｎｓ、Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｎｅｏｆｏｒｍａｎｓ：サブロー・デキストロース寒天培地（以下、ＳＤＡと称する）（ペプトン １０ｇ、 ブドウ糖　４０ｇ 、Ａｇａｒ　１５ｇ／Ｌ）上で２日間培養後、数コロニーを０．０５％Ｔｗｅｅｎ８０含有滅菌生理食塩水で希釈、フォトメーターを用いて波長５３０ｎｍでの吸光度が０．０９－０．２２となるように調整後、試験培地で５０倍希釈し接種菌液とした。
　Ａｓｐｅｒｇｉｌｌｕｓ　ｆｕｍｉｇａｔｕｓ：ポテト・デキストロース（以下、ＰＤＡと称する）寒天培地で２５℃、２回継代培養後、形成した分生子を０．０５％Ｔｗｅｅｎ８０含有滅菌生理食塩水で希釈、セル・ストレイナー７０μｍにて菌糸塊を除去した分生子懸濁液を接種菌液とした。
　Ｆｕｓａｒｉｕｍ属菌：胞子形成培地中で２５℃で振とう培養後、フォトメーターを用いて波長５３０ｎｍでの吸光度が０．０９－０．２２となるように胞子濃度を調整後、試験培地で５０倍希釈し接種菌液とした。
　皮膚糸状菌（Ｔｒｉｃｈｏｐｈｙｔｏｎ　ｒｕｂｒｕｍ、Ｍｉｃｒｏｓｐｏｒｕｍ　ｇｙｐｓｅｕｍ）：胞子着生に優れた高塩培地または、ポテトデキストロースブロス（以下、ＰＤＢと称する）培地を用いて２５℃で培養後、分生子を０．０５％Ｔｗｅｅｎ８０含有滅菌生理食塩水で希釈、セル・ストレイナー７０μｍにて菌糸塊を除去した。フォトメーターを用いて得られた胞子懸濁液を波長５３０ｎｍでの吸光度が０．０９－０．２２となるように胞子濃度を調整後、試験培地で５０倍希釈し接種菌液とした。
　各供試化合物を所定の濃度になるようにＲＰＭＩ１６４０培地で希釈し、９６穴マイクロプレートの各ウェルに１００μＬずつ分注した。その後、各供試菌について調製した接種菌液を各ウェルに１００μＬずつ分注し、所定の期間培養後、抗菌活性を評価した。
　調査は、Ｃａｎｄｉｄａ　ａｌｂｉｃａｎｓおよびＡｓｐｅｒｇｉｌｌｕｓ　ｆｕｍｉｇａｔｕｓは培養２日後、Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｎｅｏｆｏｒｍａｎｓ、Ｆｕｓａｒｉｕｍ　ｓｏｌａｎｉおよびＦｕｓａｒｉｕｍ　ｏｘｙｒｐｏｒｕｍは培養３日後、Ｔｒｉｃｈｏｐｈｙｔｏｎ　ｒｕｂｒｕｍおよびＭｉｃｒｏｓｐｏｒｕｍ　ｇｙｐｓｅｕｍは培養７日後に実施した。
　供試化合物を含まない無処理区に比べて菌の増殖が明らかに抑制される最小生育阻止濃度ＭＩＣ（Ｍｉｎｉｍｕｍ　Ｉｎｈｉｂｉｔｏｒｙ　Ｃｏｎｃｅｔｒａｔｉｏｎ、以下、ＭＩＣと称する。）を求めた。なお、対照剤として、アムホテリシン　Ｂ（以下、ＡＭＰＨと称する。）を用いた。なお表中、Ｅ、Ｈ、ＭはそれぞれＭＩＣが１ｐｐｍ未満、１ｐｐｍ以上１０ｐｐｍ未満、１０ｐｐｍ以上３０ｐｐｍ未満であることを、－は試験未実施であることを表す。 Various test bacteria were prepared by the method shown below, and the antibacterial activity of each test compound was measured.
Candida albicans, Cryptococcus neoformans: Sabouraud dextrose agar medium (hereinafter referred to as SDA) (pepton 10 g, glucose 40 g, Agar 15 g / L), sterilized saline containing 0.05% Tween 80 after culturing for 2 days The solution was diluted with a photometer and adjusted so that the absorbance at a wavelength of 530 nm was 0.09 to 0.22, and then diluted 50 times with a test medium to obtain an inoculum.
Aspergillus fumigatus: Potato dextrose (hereinafter referred to as PDA) agar medium, subcultured twice at 25 ° C., and then formed conidia were diluted with sterile physiological saline containing 0.05% Tween 80 to a cell strainer of 70 μm. The conidia suspension from which the mycelium was removed was used as the inoculum.
Fusarium genus: after shaking culture at 25 ° C. in a spore-forming medium, using a photometer to adjust the spore concentration so that the absorbance at a wavelength of 530 nm is 0.09-0.22, and then 50 times in the test medium Diluted to make an inoculum.
Dermatophytes (Trichophyton rubrum, Microsporum gypseum): After culturing at 25 ° C. using a high-salt medium excellent in spore formation or potato dextrose broth (hereinafter referred to as PDB), the conidia is 0.05% Tween 80 Diluted with a sterilized physiological saline solution, the mycelium was removed with a cell strainer of 70 μm. The spore suspension obtained using a photometer was adjusted to have a spore concentration of 0.09-0.22 at a wavelength of 530 nm and then diluted 50-fold with a test medium to obtain an inoculum.
Each test compound was diluted with RPMI 1640 medium to a predetermined concentration, and 100 μL was dispensed into each well of a 96-well microplate. Thereafter, 100 μL of the inoculum prepared for each test bacterium was dispensed into each well, and the antibacterial activity was evaluated after culturing for a predetermined period.
The surveys were Candida albicans and Aspergillus fumigatus after 2 days of culture, Cryptococcus neoformans, Fusarium solani and Fusarium oxyrrumum after 3 days of culture, and Trichophyton rubrum after 7 days of culture.
Minimum inhibitory concentration MIC of fungal growth is clearly suppressed as compared to the untreated area containing no test compound (M inimum I nhibitory C oncetration, hereinafter referred to as MIC.) Was determined. As a control agent, amphotericin B (hereinafter referred to as AMPH) was used. In the table, E, H, and M each indicate that the MIC is less than 1 ppm, 1 ppm or more and less than 10 ppm, 10 ppm or more and less than 30 ppm, and − indicates that the test has not been performed.
試験結果
　各種化合物の各種供試菌に対するＭＩＣを表７６に示す。 Test results Table 76 shows MICs of various compounds against various test bacteria.
Figure JPOXMLDOC01-appb-T000204
Figure JPOXMLDOC01-appb-T000204
　本発明の新規なピリドン化合物は、真菌感染症を予防および／または治療することができるので、抗真菌剤としての利用価値がある。 Since the novel pyridone compound of the present invention can prevent and / or treat fungal infections, it is useful as an antifungal agent.

Claims (10)

  1. 　式（１）
    Figure JPOXMLDOC01-appb-C000001
    [式中、Ｒ１は、水酸基、
    　シアノ基、
    　置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
    　Ｃ１～Ｃ６のハロアルキル基、
    　置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
    　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
    　Ｃ２～Ｃ６のハロアルケニル基、
    　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
    　Ｃ２～Ｃ６のハロアルキニル基、
    　置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
    　Ｃ１～Ｃ６のハロアルコキシ基、
    　置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、
    　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、
    　Ｃ２～Ｃ６のハロアルケニルオキシ基、
    　置換基Ａで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、
    　Ｃ３～Ｃ６のハロアルキニルオキシ基、
    　またはＲ１０Ｒ１１Ｎ－（ここで、Ｒ１０およびＲ１１は、それぞれ独立していて、水素原子、またはＣ１～Ｃ６のアルキル基を表す。）を表し；
    Ｒ２は、ハロゲン原子、
    　水酸基、
    　シアノ基、
    　ニトロ基、
    　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
    　Ｃ１～Ｃ６のハロアルキル基、
    　置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
    　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
    　Ｃ２～Ｃ６のハロアルケニル基、
    　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
    　Ｃ２～Ｃ６のハロアルキニル基、
    　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
    　Ｃ１～Ｃ６のハロアルコキシ基、
    　置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、
    　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、
    　Ｃ２～Ｃ６のハロアルケニルオキシ基、
    　置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、
    　Ｃ３～Ｃ６のハロアルキニルオキシ基、
    　Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、それぞれ独立していて、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ２１およびＲ２２は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）を表す。）、
    　Ｒ２０Ｃ（＝Ｏ）Ｏ－（ここで、Ｒ２０は、前記と同義である。）、
    　１～２個の酸素原子を含む３～６員環の基、
    　Ｒ２３－Ｌ２－（ここで、Ｒ２３は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ２は、Ｓ、ＳＯ、またはＳＯ２を表す。）、
    　Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）、
    　またはＲ２４Ｃ（＝Ｏ）Ｎ（Ｒ２５）－（ここで、Ｒ２４は、水素原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）を表し、Ｒ２５は、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）を表し；
    Ｒ３は、水素原子、
    　ハロゲン原子、
    　ニトロ基、
    　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
    　Ｃ１～Ｃ６のハロアルキル基、
    　置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
    　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
    　Ｃ１～Ｃ６のハロアルコキシ基、
    　置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
    　Ｃ２～Ｃ６のハロアルケニル基、
    　置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
    　Ｃ２～Ｃ６のハロアルキニル基、
    　Ｒ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ２３と同義であり、Ｌ３は、前記のＬ２と同義である。）、
    　Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記のＲ２１およびＲ２２と同義である。）、
    　またはＲ３３Ｃ（＝Ｏ）－（ここで、Ｒ３３は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表す。）を表し；
    ｎは、０～５の整数（ただし、ｎが２以上のとき、２以上のＲ２は、それぞれ独立した置換基を表す。）を表し；
    Ｘは、酸素原子、または硫黄原子を表し；
    Ｙは、フェニル基、ピリジル基、ピリダジニル基、ピリミジニル基、ピラジニル基、トリアジニル基、テトラジニル基、チエニル基、チアゾリル基、イソチアゾリル基、またはチアジアゾリル基を表し、
    　該フェニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～４置換し、
    　該ピリジル基、該ピラジニル基、該ピリミジニル基、該ピリダジニル基、該トリアジニル基、または該テトラジニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～３置換し、
    　該チエニル基、該チアゾリル基、該イソチアゾリル基、または該チアジアゾリル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～２置換し；
    破線部を含む結合は、二重結合、または単結合を表し、
    　そして、置換基Ａは、
    　水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｒ１２Ｒ１３Ｎ－（ここで、Ｒ１２およびＲ１３は、それぞれ独立していて、水素原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ１２およびＲ１３は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）、およびＲ１４－Ｌ１－（ここで、Ｒ１４は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ１は、Ｓ、ＳＯ、またはＳＯ２を表す。）からなる群から選択される少なくとも１種であり；
    置換基Ｂは、
    　水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｃ２～Ｃ６のアルコキシアルコキシ基、Ｒ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、前記と同義である。）、Ｒ２３－Ｌ２－（ここで、Ｒ２３およびＬ２は、前記と同義である。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ここで、Ｒ２６、Ｒ２７およびＲ２８は、それぞれ独立していてＣ１～Ｃ６のアルキル基を表す。）、Ｒ２６Ｒ２７Ｒ２８Ｓｉ－（ＣＨ２）ｓ－Ｏ－（ここで、ｓは、１～３の整数を表し、Ｒ２６、Ｒ２７およびＲ２８は、前記と同義である。）、Ｒ２０Ｃ（＝Ｏ）－（ここで、Ｒ２０は、前記と同義である。）、および１～２個の酸素原子を含む３～６員環の基からなる群から選択される少なくとも１種であり；
    置換基Ｂ１は、
    　シアノ基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、およびＣ３～Ｃ８のシクロアルコキシ基からなる群から選択される少なくとも１種であり；
    置換基Ｃは、
    　水酸基、シアノ基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、Ｒ３１Ｒ３２Ｎ－（ここで、Ｒ３１およびＲ３２は、前記のＲ２１およびＲ２２と同義である。）、およびＲ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ１４と同義であり、Ｌ３は、前記のＬ１と同義である。）からなる群から選択される少なくとも１種であり；
    置換基Ｄは、
    　ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ１～Ｃ６のアルコキシ基、およびＣ１～Ｃ６のハロアルコキシ基からなる群から選択される少なくとも１種であり；
    置換基Ｄ１は、
    　水酸基、ハロゲン原子、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、およびＣ３～Ｃ８のシクロアルコキシ基からなる群から選択される少なくとも１種である。］で表される化合物、またはその塩を有効成分として含有する抗真菌剤。     Formula (1)
    Figure JPOXMLDOC01-appb-C000001
    [Wherein R1 is a hydroxyl group,
    A cyano group,
    A C1-C6 alkyl group optionally substituted with substituent A,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with the substituent A,
    A C2-C6 alkenyl group optionally substituted with the substituent A,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent A,
    A C2-C6 haloalkynyl group,
    A C1-C6 alkoxy group optionally substituted with the substituent A,
    A C1-C6 haloalkoxy group,
    A C3-C8 cycloalkoxy group optionally substituted with the substituent A,
    A C2-C6 alkenyloxy group optionally substituted with the substituent A,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group optionally substituted with the substituent A,
    A C3-C6 haloalkynyloxy group,
    Or R10R11N— (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
    R2 is a halogen atom,
    Hydroxyl group,
    A cyano group,
    Nitro group,
    A C1-C6 alkyl group optionally substituted with the substituent B,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with the substituent B,
    A C2-C6 alkenyl group optionally substituted with the substituent B,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent B,
    A C2-C6 haloalkynyl group,
    A C1-C6 alkoxy group optionally substituted with the substituent B,
    A C1-C6 haloalkoxy group,
    A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
    A C2-C6 alkenyloxy group optionally substituted with the substituent B,
    A C2-C6 haloalkenyloxy group,
    A C3-C6 alkynyloxy group optionally substituted with the substituent B,
    A C3-C6 haloalkynyloxy group,
    R20C (═O) — (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, A C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, a C1-C6 Represents a haloalkyl group, or a C3-C8 cycloalkyl group, or R21 and R22, together with the nitrogen atom to which they are attached, represents an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group. Represents what is to be formed.)
    R20C (═O) O— (wherein R20 has the same meaning as above),
    A 3- to 6-membered group containing 1 to 2 oxygen atoms,
    R23-L2- (wherein, R23 represents a C1 alkyl group ~ C6 or C1 ~ C6 haloalkyl group,, L2 represents S, SO, or SO 2.),
    R21R22N- (wherein R21 and R22 are as defined above),
    Or R24C (═O) N (R25) — (wherein R24 is a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, or R21R22N— (wherein R21 and R22 have the same meanings as described above), and R25 is optionally substituted with a hydrogen atom or substituent B1. Represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, which may be
    R3 is a hydrogen atom,
    Halogen atoms,
    Nitro group,
    A C1-C6 alkyl group optionally substituted with substituent C,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with substituent C,
    A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
    A C1-C6 haloalkoxy group,
    A C2-C6 alkenyl group optionally substituted with substituent C,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent C,
    A C2-C6 haloalkynyl group,
    R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above),
    R31R32N- (wherein R31 and R32 have the same meanings as R21 and R22 above),
    Or R33C (═O) — (wherein R33 represents a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group);
    n represents an integer of 0 to 5 (provided that when n is 2 or more, each R2 of 2 or more represents an independent substituent);
    X represents an oxygen atom or a sulfur atom;
    Y represents a phenyl group, a pyridyl group, a pyridazinyl group, a pyrimidinyl group, a pyrazinyl group, a triazinyl group, a tetrazinyl group, a thienyl group, a thiazolyl group, an isothiazolyl group, or a thiadiazolyl group;
    In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately,
    In the pyridyl group, the pyrazinyl group, the pyrimidinyl group, the pyridazinyl group, the triazinyl group, or the tetrazinyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently selected from 0 to 3 Replace
    In the thienyl group, the thiazolyl group, the isothiazolyl group, or the thiadiazolyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 2 appropriately;
    A bond including a broken line part represents a double bond or a single bond,
    And the substituent A is
    Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R12R13N- (wherein R12 and R13 are each independently Each represents a hydrogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, or a C3-C8 cycloalkyl group, or R12 and R13 together with the nitrogen atom to which they are attached, is an aziridinyl group , An azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group), and R14-L1- (wherein R14 is a C1-C6 alkyl group or a C1-C6 haloalkyl group) represents a group, is selected L1 is, S, SO, or from the group consisting of.) representing the SO 2, At least one selected from;
    Substituent B is
    Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, C2-C6 alkoxyalkoxy group, R21R22N- R21 and R22 are as defined above), R23-L2- (where R23 and L2 are as defined above), R26R27R28Si— (wherein R26, R27 and R28 are each independently And represents an alkyl group of C1 to C6), R26R27R28Si— (CH 2 ) s—O— (wherein s represents an integer of 1 to 3, and R26, R27 and R28 are as defined above) ), R20C (═O) — (wherein R20 is as defined above), and a group of 3 to 6 membered ring containing 1 to 2 oxygen atoms. That is at least one selected from the group;
    Substituent B1 is
    At least one selected from the group consisting of a cyano group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group, and a C3-C8 cycloalkoxy group;
    Substituent C is
    Hydroxyl group, cyano group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, C3-C8 cycloalkoxy group, R31R32N- (wherein R31 and R32 are the same as R21 And R22), and R30-L3- (wherein R30 has the same meaning as R14 and L3 has the same meaning as L1), and at least one selected from the group consisting of Seeds;
    Substituent D is
    At least one selected from the group consisting of a halogen atom, a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkoxy group, and a C1-C6 haloalkoxy group;
    Substituent D1 is
    Hydroxyl group, halogen atom, C1-C6 alkyl group, C1-C6 haloalkyl group, C3-C8 cycloalkyl group, C1-C6 alkoxy group, C1-C6 haloalkoxy group, and C3-C8 cycloalkoxy group Is at least one selected from the group consisting of ] The antifungal agent which contains the compound represented by this, or its salt as an active ingredient.
  2. 　Ｒ１は、シアノ基、
    　置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
    　Ｃ１～Ｃ６のハロアルキル基、
    　置換基Ａで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
    　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルケニル基、
    　Ｃ２～Ｃ６のハロアルケニル基、
    　置換基Ａで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
    　またはＲ１０Ｒ１１Ｎ－（ここで、Ｒ１０およびＲ１１は、それぞれ独立していて、水素原子、またはＣ１～Ｃ６のアルキル基を表す。）を表し；
    Ｒ２は、ハロゲン原子、
    　水酸基、
    　シアノ基、
    　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
    　Ｃ１～Ｃ６のハロアルキル基、
    　置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
    　Ｃ１～Ｃ６のハロアルコキシ基、
    　置換基Ｂで適宜置換されてもよいＣ３～Ｃ８のシクロアルコキシ基、
    　置換基Ｂで適宜置換されてもよいＣ２～Ｃ６のアルケニルオキシ基、
    　置換基Ｂで適宜置換されてもよいＣ３～Ｃ６のアルキニルオキシ基、
    　Ｒ２０Ｃ（＝Ｏ）Ｏ－（ここで、Ｒ２０は、Ｃ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、Ｃ３～Ｃ８のシクロアルキル基、Ｃ１～Ｃ６のアルコキシ基、Ｃ１～Ｃ６のハロアルコキシ基、Ｃ３～Ｃ８のシクロアルコキシ基、またはＲ２１Ｒ２２Ｎ－（ここで、Ｒ２１およびＲ２２は、それぞれ独立していて、水素原子、置換基Ｂ１で適宜置換されてもよいＣ１～Ｃ６のアルキル基、Ｃ１～Ｃ６のハロアルキル基、またはＣ３～Ｃ８のシクロアルキル基を表すか、あるいはＲ２１およびＲ２２は、結合する窒素原子と一緒になって、アジリジニル基、アゼチジニル基、ピロリジニル基、ピペリジニル基、ホモピペリジニル基、またはアゾカニル基を形成するものを表す。）、
    　またはＲ２３－Ｌ２－（ここで、Ｒ２３は、Ｃ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し、Ｌ２は、Ｓ、ＳＯ、またはＳＯ２を表す。）を表し；
    Ｒ３は、水素原子、
    　ハロゲン原子、
    　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基、
    　置換基Ｃで適宜置換されてもよいＣ３～Ｃ８のシクロアルキル基、
    　置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基、
    　置換基Ｃで適宜置換されてもよいＣ２～Ｃ６のアルキニル基、
    　またはＲ３０－Ｌ３－（ここで、Ｒ３０は、前記のＲ２３と同義であり、Ｌ３は、前記のＬ２と同義である。）を表し；
    Ｙは、フェニル基、またはピリジル基を表し、
    　該フェニル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～４置換し、
    　該ピリジル基は、置換基Ｄがオルト位に置換し、さらに置換基Ｄ１が、それぞれ独立して適宜０～３置換する、
    請求項１に記載の化合物、またはその塩を有効成分として含有する抗真菌剤。     R1 is a cyano group,
    A C1-C6 alkyl group optionally substituted with substituent A,
    A C1-C6 haloalkyl group,
    A C3-C8 cycloalkyl group optionally substituted with the substituent A,
    A C2-C6 alkenyl group optionally substituted with the substituent A,
    A C2-C6 haloalkenyl group,
    A C2-C6 alkynyl group optionally substituted with substituent A,
    Or R10R11N— (wherein R10 and R11 are each independently a hydrogen atom or a C1-C6 alkyl group);
    R2 is a halogen atom,
    Hydroxyl group,
    A cyano group,
    A C1-C6 alkyl group optionally substituted with the substituent B,
    A C1-C6 haloalkyl group,
    A C1-C6 alkoxy group optionally substituted with the substituent B,
    A C1-C6 haloalkoxy group,
    A C3-C8 cycloalkoxy group optionally substituted with the substituent B,
    A C2-C6 alkenyloxy group optionally substituted with the substituent B,
    A C3-C6 alkynyloxy group optionally substituted with the substituent B,
    R20C (═O) O— (wherein R20 is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C3-C8 cycloalkyl group, a C1-C6 alkoxy group, a C1-C6 haloalkoxy group) , C3-C8 cycloalkoxy group, or R21R22N- (wherein R21 and R22 are each independently a hydrogen atom, a C1-C6 alkyl group optionally substituted with a substituent B1, C1-C6 Or a cycloalkyl group of C3 to C8, or R21 and R22 together with the nitrogen atom to which they are bonded, an aziridinyl group, an azetidinyl group, a pyrrolidinyl group, a piperidinyl group, a homopiperidinyl group, or an azocanyl group ),
    Or R23-L2- (wherein, R23 represents an alkyl group or a C1 ~ C6 haloalkyl group, a C1 ~ C6, L2 is S, SO, or an SO 2.) Represents;
    R3 is a hydrogen atom,
    Halogen atoms,
    A C1-C6 alkyl group optionally substituted with substituent C,
    A C3-C8 cycloalkyl group optionally substituted with substituent C,
    A C1-C6 alkoxy group that may be optionally substituted with a substituent C;
    A C2-C6 alkynyl group optionally substituted with substituent C,
    Or R30-L3- (wherein R30 has the same meaning as R23 above, and L3 has the same meaning as L2 above);
    Y represents a phenyl group or a pyridyl group;
    In the phenyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 4 appropriately,
    In the pyridyl group, the substituent D is substituted at the ortho position, and the substituent D1 is independently independently substituted with 0 to 3 appropriately.
    An antifungal agent comprising the compound according to claim 1 or a salt thereof as an active ingredient.
  3. Ｒ１は、置換基Ａで適宜置換されてもよいＣ１～Ｃ６のアルキル基、またはＣ１～Ｃ６のハロアルキル基を表し；
    Ｒ２は、ハロゲン原子、置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルキル基、または置換基Ｂで適宜置換されてもよいＣ１～Ｃ６のアルコキシ基を表し；
    Ｒ３は、水素原子、ハロゲン原子、または置換基Ｃで適宜置換されてもよいＣ１～Ｃ６のアルキル基を表す、請求項２に記載の化合物、またはその塩を有効成分として含有する抗真菌剤。     R1 represents a C1-C6 alkyl group or a C1-C6 haloalkyl group optionally substituted with the substituent A;
    R2 represents a halogen atom, a C1-C6 alkyl group optionally substituted with the substituent B, or a C1-C6 alkoxy group optionally substituted with the substituent B;
    The antifungal agent comprising, as an active ingredient, the compound according to claim 2, or a salt thereof, wherein R3 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally substituted with a substituent C.
  4. 　請求項１に記載の抗真菌剤を用いて真菌感染症を予防および／または治療する方法。 A method for preventing and / or treating a fungal infection using the antifungal agent according to claim 1.
  5. 　真菌感染症を予防および／または治療する方法であって、それを必要とする対象に請求項１に記載の化合物またはその塩の有効量を投与することを含む方法。 A method for preventing and / or treating a fungal infection, the method comprising administering an effective amount of the compound or a salt thereof according to claim 1 to a subject in need thereof.
  6. 　真菌感染症が、深在性真菌症、深部皮膚真菌症、表在性真菌症から選ばれる真菌感染症である、請求項４または５に記載の方法。 The method according to claim 4 or 5, wherein the fungal infection is a fungal infection selected from deep mycosis, deep skin mycosis, and superficial mycosis.
  7. 　真菌感染症が、カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）、アスペルギルス属真菌（Ａｓｐｅｒｇｉｌｌｕｓ　ｓｐｐ．）、クリプトコッカス属真菌（Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｓｐｐ．）、ミクロスポルム属真菌（Ｍｉｃｒｏｓｐｏｒｕｍ ｓｐｐ．）、トリコフィトン属真菌（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｓｐｐ．）およびフザリウム属真菌（Ｆｕｓａｒｉｕｍ ｓｐｐ．）よりなる群から選択される１種以上の真菌により引き起こされる請求項６に記載の方法。 Fungal infections include Candida spp., Aspergillus spp., Cryptococcus spp., Microsporum spp., Trichophyton sp. And the method of claim 6 caused by one or more fungi selected from the group consisting of Fusarium spp.
  8. 　真菌感染症の予防および／または治療に使用するための請求項１に記載の化合物またはその塩。 The compound according to claim 1 or a salt thereof for use in the prevention and / or treatment of fungal infections.
  9. 　真菌感染症が、深在性真菌症、深部皮膚真菌症、表在性真菌症から選ばれる真菌感染症である、請求項８に記載の化合物またはその塩。 The compound or salt thereof according to claim 8, wherein the fungal infection is a fungal infection selected from deep mycosis, deep skin mycosis, and superficial mycosis.
  10. 　真菌感染症が、カンジダ属真菌（Ｃａｎｄｉｄａ ｓｐｐ．）、アスペルギルス属真菌（Ａｓｐｅｒｇｉｌｌｕｓ　ｓｐｐ．）、クリプトコッカス属真菌（Ｃｒｙｐｔｏｃｏｃｃｕｓ　ｓｐｐ．）、ミクロスポルム属真菌（Ｍｉｃｒｏｓｐｏｒｕｍ ｓｐｐ．）、トリコフィトン属真菌（Ｔｒｉｃｈｏｐｈｙｔｏｎ ｓｐｐ．）およびフザリウム属真菌（Ｆｕｓａｒｉｕｍ ｓｐｐ．）よりなる群から選択される１種以上の真菌により引き起こされる請求項９に記載の化合物またはその塩。 Fungal infections include Candida spp., Aspergillus spp., Cryptococcus spp., Microsporum spp., Trichophyton sp. And the compound or salt thereof according to claim 9 caused by one or more fungi selected from the group consisting of Fusarium spp. And Fusarium spp.
PCT/JP2018/015007 2017-04-10 2018-04-10 Antifungal agent containing pyridone compound as active component, and use method thereof WO2018190324A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010093595A1 (en) * 2009-02-10 2010-08-19 E. I. Du Pont De Nemours And Company Fungicidal 2-pyridones
WO2015200843A1 (en) * 2014-06-27 2015-12-30 Quanticel Pharmaceuticals, Inc. Inhibitors of lysine specific demethylase-1
WO2017061525A1 (en) * 2015-10-09 2017-04-13 三井化学アグロ株式会社 Pyridone compound and agricultural/horticultural bactericide including same as active ingredient

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010093595A1 (en) * 2009-02-10 2010-08-19 E. I. Du Pont De Nemours And Company Fungicidal 2-pyridones
WO2015200843A1 (en) * 2014-06-27 2015-12-30 Quanticel Pharmaceuticals, Inc. Inhibitors of lysine specific demethylase-1
WO2017061525A1 (en) * 2015-10-09 2017-04-13 三井化学アグロ株式会社 Pyridone compound and agricultural/horticultural bactericide including same as active ingredient

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