WO2017217157A1 - Gas dissolving apparatus - Google Patents

Gas dissolving apparatus Download PDF

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Publication number
WO2017217157A1
WO2017217157A1 PCT/JP2017/018005 JP2017018005W WO2017217157A1 WO 2017217157 A1 WO2017217157 A1 WO 2017217157A1 JP 2017018005 W JP2017018005 W JP 2017018005W WO 2017217157 A1 WO2017217157 A1 WO 2017217157A1
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WO
WIPO (PCT)
Prior art keywords
gas
liquid
float chamber
dissolution
flow path
Prior art date
Application number
PCT/JP2017/018005
Other languages
French (fr)
Japanese (ja)
Inventor
前田　康成
伊藤　良泰
一成 川原
Original Assignee
パナソニックＩｐマネジメント株式会社
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Publication of WO2017217157A1 publication Critical patent/WO2017217157A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
    • B01F35/7176—Feed mechanisms characterised by the means for feeding the components to the mixer using pumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/20—Jet mixers, i.e. mixers using high-speed fluid streams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/712—Feed mechanisms for feeding fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/75—Discharge mechanisms
    • B01F35/754—Discharge mechanisms characterised by the means for discharging the components from the mixer
    • B01F35/7547—Discharge mechanisms characterised by the means for discharging the components from the mixer using valves, gates, orifices or openings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/18—Actuating devices; Operating means; Releasing devices actuated by fluid actuated by a float

Definitions

  • the present invention relates to a gas dissolving apparatus.
  • a conventional gas dissolving apparatus includes a gas dissolving apparatus that mixes a gas and a liquid to dissolve the gas into the liquid (for example, Patent Document 1).
  • the gas dissolving device of Patent Document 1 includes a dissolution tank for dissolving a gas into a liquid.
  • the inside of the dissolution tank is partitioned into a plurality of spaces, and a liquid in which the gas is dissolved is generated in the process in which the gas-liquid mixed fluid in which the liquid and the gas are mixed flows in these spaces.
  • the gas dissolving device of Patent Document 1 is provided with a float chamber for discharging undissolved gas in the dissolving tank to the outside.
  • an object of the present invention is to provide a gas dissolving apparatus with improved reliability in solving the above-mentioned problems.
  • a gas dissolving apparatus includes an inlet for introducing a gas-liquid mixed fluid obtained by mixing a gas with a liquid, and a flow path for the gas-liquid mixed fluid flowing from the inlet.
  • a dissolution tank having a dissolution channel for dissolving the gas in the gas, and an outflow port for allowing the liquid in which the gas is dissolved to flow out of the dissolution channel, and a gas-liquid mixed fluid flowing into the dissolution tank.
  • An inflow path An outflow path connected to the outflow port for discharging a liquid in which gas is dissolved, and a float chamber for discharging undissolved gas in the dissolution flow path to the outside, communicating with the dissolution flow path And the dissolution flow path at a location different from the communication location where the float chamber communicates with the dissolution flow path, or the bypass flow path connecting the inflow path or the outflow path and the float chamber.
  • the reliability can be improved.
  • FIG. 9 is a longitudinal sectional view of a dissolving tank of the gas dissolving apparatus according to the embodiment (cross section taken along the line AA in FIG. 9).
  • FIG. 10 is a longitudinal sectional view of a dissolution tank of the gas dissolving apparatus according to the embodiment (a sectional view taken along line BB in FIG. 10).
  • FIG. 1 is a diagram illustrating a schematic configuration of a gas dissolving apparatus 2 according to the first embodiment.
  • the gas dissolving device 2 generates a fine bubble by decompressing a gas dissolved in a liquid using a decompression device 14 described later, and supplies a liquid containing the fine bubble to a bathtub or the like.
  • the gas dissolving apparatus 2 of Embodiment 1 includes an inflow path 4, a gas supply mechanism 6, a pump 8, a dissolution tank 10, an outflow path 12, a decompression device 14, and a float chamber 16. And a bypass channel 18.
  • a gas-liquid mixed fluid in which a liquid and a gas are mixed flows into the dissolution tank 10 from the inflow path 4, and the gas is dissolved in the liquid in the dissolution tank 10. Thereafter, the liquid in which the gas is dissolved flows out to the outflow passage 12 and is generated as fine bubbles by reducing the pressure by the decompression device 14.
  • undissolved gas that has not been dissolved in the liquid is stored in the float chamber 16 and is discharged to the outside of the dissolution tank 10.
  • a bypass flow path 18 for flowing a fluid into the float chamber 16 is provided.
  • the mixed fluid is allowed to flow in the float chamber 16 where a fluid flow does not normally occur, and the inside of the float chamber 16 can be cleaned.
  • each structure of the gas dissolving apparatus 2 is demonstrated in order.
  • the inflow path 4 is a flow path for allowing the gas-liquid mixed fluid to flow into the dissolution tank 10.
  • the inflow path 4 is constituted by a pipe, for example.
  • the upstream side of the inflow path 4 is connected to a liquid supply source (not shown), and is configured to be able to supply liquid into the inflow path 4.
  • the downstream side of the inflow path 4 is connected to the inlet 20 of the dissolution tank 10.
  • a gas supply mechanism 6 and a pump 8 are provided in the middle of the inflow path 4.
  • the gas supply mechanism 6 is a mechanism for supplying gas into the inflow path 4.
  • the gas supply mechanism 6 is configured to include, for example, a pipe or the like. In the first embodiment, the configuration of the gas supply mechanism 6 will be described in a simplified manner.
  • the gas supply mechanism 6 supplies gas into the inflow passage 4 to generate a gas-liquid mixed fluid in which liquid and gas are mixed.
  • the pump 8 is a pump provided on the downstream side of the gas supply mechanism 6.
  • the pump 8 pumps the gas-liquid mixed fluid in the inflow passage 4 toward the inlet 20 of the dissolution tank 10.
  • the operation of the pump 8 is controlled by a control device described later.
  • the flow rate of the gas-liquid mixed fluid supplied to the dissolution tank 10 can be adjusted by controlling the rotation speed of the pump 8.
  • the dissolution tank 10 is a container for storing the gas-liquid mixed fluid supplied from the inflow passage 4 and dissolving the gas in the liquid.
  • the dissolution tank 10 has the inflow port 20, the dissolution flow path 22, and the outflow port 24 described above.
  • the dissolution channel 22 is a channel for flowing the gas-liquid mixed fluid that has flowed in from the inlet 20, and is formed by the inner wall of the dissolution tank 10.
  • the dissolution channel 22 is composed of a plurality of spaces, and a detailed configuration will be described later.
  • the upstream end of the dissolution channel 22 starts at the inlet 20 and the downstream end of the dissolution channel 22 ends at the outlet 24.
  • the outlet 24 is an outlet for allowing the liquid in which the gas is dissolved in the dissolution channel 22 to flow out of the dissolution tank 10. Both the inlet 20 and the outlet 24 are formed as openings at the bottom of the dissolution tank 10.
  • the outflow path 12 is a flow path for flowing out the fluid from the dissolution tank 10 to a bathtub or the like.
  • the outflow path 12 is constituted by, for example, piping.
  • the upstream end of the outflow path 12 is connected to the outlet 24 of the dissolution tank 10, and the downstream end is connected to a bathtub or the like.
  • a decompression device 14 is provided at a position adjacent to the outlet 24 in the outflow passage 12.
  • the decompression device 14 is a device that decompresses the liquid flowing out from the outlet 24 of the dissolution tank 10. When the decompression device 14 decompresses the liquid, the gas dissolved in the liquid can be generated as fine bubbles in the outflow passage 12.
  • the decompression device 14 and the outflow path 12 constitute a miniaturization unit that microbubbles the gas dissolved in the liquid.
  • the float chamber 16 is a mechanism for discharging undissolved gas that has not been dissolved in the liquid in the dissolution tank 10 to the outside.
  • the float chamber 16 is attached to the upper part of the dissolution tank 10 so as to communicate with the dissolution flow path 22 in the dissolution tank 10.
  • the float chamber 16 is preferably communicated with the downstream side of the dissolution channel 22 in the dissolution tank 10.
  • the float chamber 16 is provided so as to communicate with the most downstream space (a gas-liquid separation chamber 40 described later) in the dissolution tank 10.
  • the float chamber 16 includes a float 26, a valve body 28, and a discharge port 30.
  • the float 26 is a member that floats on the liquid level in the float chamber 16.
  • the float 26 moves up and down according to the height (water level) of the liquid level in the float chamber 16.
  • the float 26 is connected to the valve body 28.
  • the valve body 28 is a member which closes the discharge port 30 so that opening and closing is possible.
  • the discharge port 30 is an opening for discharging the gas in the float chamber 16 to the outside.
  • the discharge port 30 is provided on the upper surface of the float chamber 16 and communicates the inside and the outside of the float chamber 16.
  • the outlet 30 when the water level in the float chamber 16 is higher than the predetermined water level, the outlet 30 is closed by the valve body 28, and when the water level in the float chamber 16 is lower than the predetermined water level, the discharge port 30 is discharged. It functions to open the outlet 30. Detailed functions of the float chamber 16 will be described later.
  • the bypass channel 18 is a channel for supplying a fluid into the float chamber 16.
  • the bypass flow path 18 forms a fluid flow in the float chamber 16 to prevent the float chamber 16 from being contaminated or to clean the adhered dirt.
  • the bypass channel 18 in the first embodiment is provided so as to communicate the side wall of the float chamber 16 with the outer wall of the dissolution tank 10 on the upstream side of the float chamber 16.
  • a location where the float chamber 16 and the bypass channel 18 are connected is a communication location where the float chamber 16 communicates with the dissolution tank 10 (a bottom wall opening (not shown) of the float chamber 16). Is another part.
  • the bypass flow path 18 is connected so as to communicate with the most upstream space (gas-liquid mixing chamber 36 described later) in the dissolution tank 10.
  • the dissolution tank 10 has an internal space partitioned by a plurality of walls.
  • the dissolution tank 10 in the first embodiment includes two partition walls 32 and 34.
  • the first partition wall 32 is a wall extending downward from the upper end portion of the inner wall of the dissolution tank 10.
  • the first partition wall 32 does not reach the lower end portion of the inner wall of the dissolution tank 10 and forms a first communication port 33 as a gap with the lower end portion of the inner wall.
  • the second partition wall 34 is a wall extending upward from the lower end portion of the inner wall of the dissolution tank 10.
  • the second partition wall 34 does not reach the upper end of the inner wall of the dissolution tank 10, and forms a second communication port 35 as a gap with the upper end of the inner wall.
  • a dissolution channel 22 is formed by the space.
  • a space (intermediate chamber 38) between them and a space (gas-liquid separation chamber 40) on the downstream side of the second partition wall 34 are partitioned.
  • the upstream end of the gas-liquid mixing chamber 36 is connected to the inlet 20, and the downstream end of the gas-liquid separation chamber 40 is connected to the outlet 24. Further, the upstream end portion of the bypass channel 18 is connected to the gas-liquid mixing chamber 36, and the float chamber 16 communicates with the gas-liquid separation chamber 40.
  • a gas-liquid mixed fluid in which liquid and gas are mixed is supplied to the dissolution tank 10.
  • the gas-liquid mixed fluid enters the gas-liquid mixing chamber 36 through the inlet 20.
  • the gas-liquid mixed fluid that has entered the gas-liquid mixing chamber 36 is ejected upward from the bottom of the inner wall of the dissolution tank 10.
  • the gas-liquid mixed fluid collides with the upper end of the inner wall of the dissolution tank 10 and the first partition wall 32 and rebounds.
  • the gas-liquid mixed fluid that collides with the upper end of the inner wall of the dissolution tank 10 and the first partition wall 32 and rebounds stirs the gas-liquid mixed fluid in the gas-liquid mixing chamber 36.
  • the gas mixed through the gas supply mechanism 6 and the gas previously stored in the gas-liquid mixing chamber 36 are vigorously mixed with the liquid as the solvent.
  • the gas-liquid mixed fluid is stirred, and the gas is dissolved in the liquid under pressure, whereby a liquid in which the gas is dissolved is generated.
  • Such dissolution of gas is promoted by shearing by stirring to subdivide the gas mixed as gas bubbles in the gas-liquid mixed fluid and increase the surface area in contact with the liquid.
  • the homogenization by stirring reduces the gas dissolution concentration in the vicinity of the liquid surface, which is also promoted by increasing the gas dissolution rate in the liquid.
  • the generated gas-liquid mixed fluid flows out into the intermediate chamber 38 through the first communication port 33 between the lower end of the first partition wall 32 and the bottom of the inner wall of the dissolution tank 10.
  • the liquid flowing out into the intermediate chamber 38 flows from the upper end of the second partition wall 34 through the second communication port 35 and out into the gas-liquid separation chamber 40.
  • the gas-liquid separation chamber 40 is a space that separates gas that cannot be dissolved in the liquid from the liquid as bubbles. Since the liquid flow is lifted up to the vicinity of the liquid surface, which is the gas-liquid interface, the bubbles move upward by buoyancy and flow into the float chamber 16.
  • the liquid flowing out into the gas-liquid separation chamber 40 flows out into the outflow path 12 through the outflow port 24. Since the outflow port 24 is provided at the bottom of the gas-liquid separation chamber 40, outflow of large bubbles existing near the liquid surface to the outside is prevented.
  • the gas flowing into the float chamber 16 accumulates in the space inside the float chamber 16.
  • the amount of gas accumulated in the float chamber 16 increases, and the liquid level in the float chamber 16 decreases accordingly.
  • the float 26 also descends.
  • the valve body 28 connected to the float 26 switches between opening and closing of the discharge port 30 according to the height position of the float 26. Specifically, when the water level in the float chamber 16 is high and the position of the float 26 is above a predetermined position, the valve body 28 closes the discharge port 30. On the other hand, when the water level in the float chamber 16 becomes low and the position of the float 26 is below the predetermined position, the valve body 28 opens the discharge port 30.
  • the gas is controlled not to be discharged through the drain port 30 but to be accumulated.
  • gas accumulates in the float chamber 16, and when the water level in the float chamber 16 falls, the float 26 also descends.
  • the valve body 28 opens the discharge port 30. Thereby, the gas is discharged through the discharge port 30.
  • the discharge port 30 is closed again.
  • a bypass flow path 18 that connects the float chamber 16 and the space (gas-liquid mixing chamber 36) in the dissolution tank 10 is provided so that the gas-liquid mixed fluid can flow into the float chamber 16.
  • the bypass flow path 18 is not provided, the liquid flow basically does not occur in the float chamber 16 although the liquid level moves up and down. For this reason, the inside of the float chamber 16 tends to accumulate dirt. For example, when the bacteria in the liquid die and become a jelly-like lump adheres to the side wall of the float chamber 16 or the float 26, the operation of the float 26 is hindered. There is.
  • the gas dissolving device 2 when used for supplying a liquid to the “bathtub”, an additive such as oil may be added to the liquid. It becomes easy to get dirty.
  • the bypass flow path 18 is provided so that the gas-liquid mixed fluid flows into the float chamber 16. Thereby, the gas-liquid mixed fluid can be flowed into the float chamber 16 to clean the inside of the float chamber 16, and the float 26 can be prevented from malfunctioning due to dirt on the wall surface in the float chamber 16, etc. The reliability of the gas dissolving device 2 can be improved.
  • the bypass flow path 18 is connected to the gas-liquid mixing chamber 36 which is the most upstream space in the dissolution tank 10. For this reason, by utilizing the pressure difference between the gas-liquid mixing chamber 36 and the float chamber 16, the gas-liquid mixed fluid having a high pressure on the upstream side can be flowed into the float chamber 16, and a strong flow is generated in the float chamber 16. Can be generated. Thereby, the detergency which cleans the float chamber 16 improves and the reliability of the gas dissolving apparatus 2 can be improved.
  • the float chamber 16 communicates with the gas-liquid separation chamber 40 which is the most downstream space in the dissolution tank 10. For this reason, the pressure difference of the fluid tends to occur between the upstream side and the downstream side in the bypass flow path 18, and the gas-liquid mixed fluid can flow more reliably to the float chamber 16.
  • bypass channel 18 connects the gas-liquid mixing chamber 36 and the float chamber 16
  • the present invention is not limited to such a case.
  • the bypass flow path 52 in the gas dissolving device 50 shown in FIG. 2 is provided so as to communicate the float chamber 16 and the gas-liquid separation chamber 40.
  • the bypass passage 52 communicates with the gas-liquid separation chamber 40 at a point downstream of the communication location (the bottom wall opening of the float chamber 16) where the float chamber 16 and the gas-liquid separation chamber 40 communicate. Connected to do.
  • the gas-liquid mixed fluid is caused to flow from the high-pressure float chamber 16 to the low-pressure gas-liquid separation chamber 40 using the pressure difference between the float chamber 16 and the gas-liquid separation chamber 40. Can do. Thereby, the flow of the gas-liquid mixed fluid is generated in the float chamber 16 and the inside of the float chamber 16 can be cleaned.
  • the float chamber 16 is on the low pressure side in the bypass flow path 18, and the space (gas-liquid mixing chamber 36) in the dissolution tank 10 is on the high pressure side. Therefore, the fluid is always supplied to the float chamber 16 through the bypass channel 18, and the float chamber 16 can always be cleaned. Further, since the high-pressure side of the bypass channel 18 is connected to the gas-liquid mixing chamber 36, a gas-liquid mixed fluid containing a large amount of bubbles is supplied to the float chamber 16 from the gas-liquid mixing chamber 36 where the gas and the liquid are intensively mixed. Is done.
  • the float chamber 16 in the bypass channel 52 is on the high pressure side, and the space (gas-liquid separation chamber 40) in the dissolution tank 10 is on the low pressure side. Therefore, the fluid flows into the bypass channel 52 only when the water level rises to the height position of the bypass channel 52 in the float chamber 16. As described above, the float chamber 16 is not always washed, and the liquid flowing through the bypass passage 52 contains almost no bubbles.
  • the bypass flow paths 18 and 52 are the most upstream space (gas-liquid mixing chamber 36) or the most downstream space (of the plurality of spaces in the dissolution tank 10 ( The gas-liquid separation chamber 40) and the float chamber 16 are connected. According to such a configuration, a pressure difference is easily generated in the fluid flowing in the bypass flow paths 18 and 52, and a strong flow can be generated in the float chamber 16. Thereby, the detergency which cleans the float chamber 16 improves, and the reliability of the gas dissolving apparatuses 2 and 50 can be improved.
  • Embodiment 1 and the modification demonstrated the case where the bypass flow paths 18 and 52 were connected with the gas-liquid mixing chamber 36 and the gas-liquid separation chamber 40, respectively, it is not restricted to such a case.
  • the float chamber 16 may be connected to an arbitrary position as long as it is a location different from the communication location where the float chamber 16 and the dissolution channel 22 communicate with each other. As a result, a pressure difference is generated between the upstream side and the downstream side of the bypass flow paths 18 and 52, so that the fluid can flow through the bypass flow paths 18 and 52 and the float chamber 16 can be washed.
  • Embodiment 2 Next, the gas dissolving apparatus 60 concerning Embodiment 2 is demonstrated using FIG.
  • the bypass flow paths 18 and 52 are provided so as to connect the float chamber 16 and the space in the dissolution tank 10, but in the second embodiment, not the space in the dissolution tank 10 but the inflow path. 4 is connected to the bypass flow path 62.
  • the difference from the first embodiment will be mainly described.
  • the gas dissolving device 60 includes a bypass channel 62 that connects the inflow channel 4 and the float chamber 16.
  • the upstream side of the bypass channel 62 is connected to a position on the downstream side of the pump 8 in the inflow channel 4.
  • the downstream side of the bypass flow path 62 is connected to the side wall of the float chamber 16 as in the first embodiment.
  • the gas dissolving device 60 further includes an on-off valve 64 and a check valve 66 as a configuration provided in the middle of the bypass flow path 62.
  • the gas dissolving device 60 further includes a control device 68 and a switch 69.
  • the on / off valve 64 is a valve (bypass channel on / off valve) that switches between opening and closing of the bypass channel 62.
  • the on-off valve 64 for example, an electromagnetic valve or an electric valve is used.
  • a check valve 66 is provided on the downstream side of the on-off valve 64 in the bypass passage 62.
  • the check valve 66 is a valve that prevents a back flow in the bypass flow path 62, and acts to flow the gas-liquid mixed fluid only in the direction of flowing from the inflow path 4 toward the float chamber 16.
  • the control device 68 is a device for controlling the operation of the on-off valve 64 and the pump 8.
  • the control device 68 is constituted by a microcomputer, for example.
  • a switch 69 is connected to the control device 68.
  • the switch 69 is a member for the user to operate ON / OFF of the operation of the gas dissolving device 60.
  • FIG. 4 shows an example of a method for controlling the pump 8 and the on-off valve 64 by the control device 68 in such a configuration.
  • the operation of the pump 8 is started in response to the ON signal of the gas dissolving device 60 being input by the switch 69. Specifically, the pump 8 is operated so as to increase the rotational speed to a predetermined rotational speed, and thereafter controlled to be maintained at the predetermined rotational speed (first operation). During this time, the on-off valve 64 is closed. That is, the gas-liquid mixed fluid is controlled to flow only from the inflow path 4 to the dissolution tank 10 without flowing the gas-liquid mixed fluid through the bypass channel 62.
  • the float chamber 16 is not washed until the input of the OFF signal of the gas dissolving device 2 by the switch 69 is received, and the gas is dissolved in the liquid by the dissolving tank 10 and fine bubbles are generated by the decompression device 14 and the outflow passage 12.
  • the 1st operation which generates is performed.
  • control is performed so that the rotational speed of the pump 8 is gradually increased as time passes. Thereby, the pump 8 is controlled so as not to take in a large amount of gas abruptly.
  • the control device 68 stops the operation of the pump 8. Specifically, the operation is performed until the pump 8 is stopped while the rotational speed of the pump 8 is decreased (second operation).
  • the on-off valve 64 is controlled to open during the second operation. That is, the float chamber 16 is cleaned immediately before the operation of the gas dissolving device 60 is completed. According to such control, in the first operation in which fine bubbles are generated, the gas-liquid mixed fluid is not supplied to the float chamber 16, and the rotation speed of the pump 8 is reduced in the second operation after the first operation. Wash while you are.
  • the gas-liquid mixed fluid having a desired flow rate is supplied to the dissolution tank 10, and the float chamber 16 that does not affect the first operation according to the end of the first operation is supplied. Washing can be performed. In this way, the first operation for generating fine bubbles and the second operation for cleaning the float chamber 16 can be efficiently made compatible.
  • the gas is compressed and the pressure of the liquid is high.
  • the rotation speed of the pump 8 is rapidly decreased in the second operation, the dissolution tank 10 The gas expands rapidly. In this case, gas may flow into the outflow passage 12 instead of the float chamber 16.
  • control is performed such that the rotational speed of the pump 8 is gradually decreased with the passage of time. This prevents the above-described phenomenon from occurring.
  • the decrease speed of the rotation speed of the pump 8 in the second operation is controlled slower than the increase speed of the rotation speed of the pump 8 at the start of the first operation. Thereby, the phenomenon mentioned above can be prevented more effectively.
  • the gas dissolving apparatus 60 includes the on-off valve (bypass passage on-off valve) 64 that opens and closes the bypass passage 62. As a result, it is possible to control the fluid to flow through the bypass channel 62 when desired.
  • the pump 8 is operated in a first operation that is operated at a predetermined rotational speed, and in the second operation until the pump 8 is stopped while decreasing the rotational speed of the pump 8 from the first operation. It is controlled to execute the operation.
  • the on-off valve 64 is controlled to open during the second operation of the pump 8.
  • the bypass flow path 62 connects the float chamber 16 and a position downstream of the pump 8 in the inflow path 4.
  • Embodiment 3 Next, the gas dissolving apparatus 70 concerning Embodiment 3 is demonstrated using FIG.
  • a gas supply path 72, an on-off valve 74, and a check valve 76 are provided. Since other configurations are the same as those of the second embodiment, description thereof is omitted.
  • the gas supply path 72 is a gas flow path for supplying gas to the inflow path 4.
  • the gas supply path 72 is constituted by, for example, a pipe.
  • the upstream side of the gas supply path 72 is connected to a gas supply source (not shown), and the downstream side of the gas supply path 72 is connected to the inflow path 4.
  • the gas supply path 72 is connected to the inflow path 4 at a position upstream of the pump 8.
  • An opening / closing valve 74 and a check valve 76 are provided in the middle of the gas supply path 72.
  • the on / off valve 74 is a valve (gas supply path on / off valve) that switches between opening and closing of the gas supply path 72.
  • As the on-off valve 74 for example, an electromagnetic valve or an electric valve is used.
  • a check valve 76 is provided upstream of the on-off valve 74 in the gas supply path 72.
  • the check valve 76 is a valve that prevents a back flow in the gas supply path 72, and acts to flow the gas only in the direction of flowing from the gas supply source toward the inflow path 4.
  • control device 68 controls the on-off valve 74 in addition to the pump 8 and the on-off valve 64.
  • An example of a method for controlling the pump 8, the on-off valve 64, and the on-off valve 74 by the control device 68 is shown in FIG.
  • the control method shown in FIG. 6 is common to the second embodiment with respect to the control of the pump 8 and the on-off valve 64, and only the control of the on-off valve 74 is different from the second embodiment. Hereinafter, the difference will be mainly described.
  • the control device 68 controls to open the on-off valve 74 during the first operation.
  • the on-off valve 74 is controlled to be closed during the second operation. That is, in the first operation, which is an operation for generating fine bubbles, gas is supplied to the inflow passage 4 to generate a gas-liquid mixed fluid.
  • the second operation for cleaning the float chamber 16 only the liquid is mainly supplied to the bypass channel 62 without supplying the gas to the inflow channel 4.
  • the gas-liquid mixed fluid containing a desired amount of gas is supplied to the dissolution tank 10 during the first operation, and the gas is not supplied to the inflow passage 4 during the second operation.
  • the gas dissolving apparatus 70 is a gas supply path 72 that supplies gas to a position upstream of the pump 8 in the inflow path 4 and an open / close valve that opens and closes the gas supply path 72. And a valve (gas supply passage opening / closing valve) 74.
  • the on-off valve 74 is controlled so that the pump 8 opens during the first operation and closes during the second operation. According to such control, while the gas is mixed and the gas-liquid mixed fluid is supplied in the first operation, the output by the pump 8 can be increased by not mixing the gas in the second operation, and the bypass A stronger flow can be generated through the channel 62. Thereby, the detergency which cleans the float chamber 16 improves, and the reliability of the gas dissolving apparatus 70 can be improved.
  • bypass flow path 62 is connected to the inflow path 4
  • the present invention is not limited to this case, and the outflow path 12 may be connected. Even in such a case, a pressure difference is generated between the upstream side and the downstream side of the bypass flow path, so that the fluid can flow through the bypass flow path and the float chamber 16 can be washed.
  • Embodiment 1-3 in order to form a bypass flow path that generates a flow of fluid in the float chamber 16, as in Embodiment 1, a communication location where the float chamber 16 and the dissolution flow path 22 communicate with each other.
  • the dissolution channel 22 and the float chamber 16 may be connected at a different location.
  • the inflow path 4 and the float chamber 16 may be connected as in the second and third embodiments, or the outflow path 12 and the float chamber 16 may be connected.
  • FIGS. 7 to 11 are examples based on the first embodiment described above.
  • 7 and 8 are partially exploded perspective views (front side and back side) of the dissolution tank 10
  • FIG. 9 is a plan view of the dissolution tank 10.
  • 10 is a cross-sectional view taken along the line AA in FIG. 9, and
  • FIG. 11 is a cross-sectional view taken along the line BB in FIG.
  • the float chamber 16 is provided on the upper surface of the outer wall of the dissolution tank 10, and the contact wall 78 is provided so as to contact the side wall of the float chamber 16. .
  • the contact wall 78 is a part of the outer wall upper surface 79 that forms the gas-liquid mixing chamber 36 in the dissolution tank 10.
  • the intermediate chamber 38 in the dissolution tank 10 is provided at a position different from the AA cross section of FIG. 9, it is not shown in FIG. 10, and the gas-liquid mixing chamber 36 and the gas-liquid separation chamber 40 are not shown. Only is shown.
  • a through-hole penetrating the float chamber 16 and the contact wall 78 is provided.
  • the through hole penetrates the float chamber 16 and the side wall of the contact wall 78 in the lateral direction (through the contact wall 78, the float chamber 16 and the gas-liquid mixing chamber 36 are communicated).
  • a path 18 is formed.
  • a temporary liquid level 80 in the float chamber 16 is illustrated, and the bypass channel 18 is provided in the vicinity of the liquid level 80.
  • the outer wall (outer wall upper surface 79) of the dissolving tank 10 constituting the most upstream space (gas-liquid mixing chamber 36) in the dissolving tank 10 is in contact with the float chamber 16. It has a wall 78. Further, the bypass channel 18 is formed by a through hole that communicates the contact wall 78 and the float chamber 16. In this way, the bypass channel 18 can be formed without providing other parts such as piping by forming the bypass channel 18 by the through-hole communicating with the contact wall 78 and the float chamber 16, and thus a simple configuration is adopted. Thus, the manufacturing cost of the gas dissolving device 2 can be reduced.
  • the present invention has been described with reference to the above-described embodiment 1-3 and examples, the present invention is not limited to the above-described embodiment 1-3.
  • Embodiment 1-3 the case where the bypass channel is connected to the side wall portion of the float chamber 16 has been described, but the present invention is not limited to such a case.
  • the bypass channel may be connected to an arbitrary position. In the float chamber 16, dirt is most likely to adhere to the vicinity of the liquid surface 80. Therefore, by connecting a bypass channel to the side wall of the float chamber 16 and ejecting fluid near the liquid surface 80. The inside of the float chamber 16 can be cleaned more efficiently.
  • the internal space of the dissolution tank 10 is partitioned by two partition walls 32 and 34, and the dissolution flow path 22 has three spaces (gas-liquid mixing chamber 36, intermediate chamber 38, and gas-liquid separation chamber 40).
  • the present invention is not limited to such a case. Any structure may be adopted as long as the gas can be dissolved in the liquid in the dissolution flow path 22 of the dissolution tank 10.
  • Embodiment 1-3 the case where the float chamber 16 is provided so as to communicate with the gas-liquid separation chamber 40 which is the most downstream space of the dissolution tank 10 has been described. It may be provided at an arbitrary position as long as it is downstream of the mixing chamber 36.
  • the gas dissolving apparatus can be applied to an application for generating a liquid in which a gas is dissolved and supplying the liquid without generating fine bubbles.
  • a gas dissolving device can be used as a means for generating a cleaning liquid for cleaning an object or as a means for generating a liquid used for health use.
  • the present invention is applicable to any gas dissolving apparatus that dissolves gas into liquid.

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Abstract

This gas dissolving apparatus is provided with: a dissolution tank having an inlet through which a gas-liquid mixed fluid obtained by mixing a gas with a liquid flows in, a dissolution passage through which the gas is dissolved in the liquid and which is a passage for the gas-liquid mixed fluid that has flown in through the inlet, and an outlet through which the liquid having the gas dissolved therein flows out from the dissolution passage; an in-flow passage through which the gas-liquid mixed fluid flows into the dissolution tank and which is connected to the inlet; an out-flow passage through which the liquid having the gas dissolved therein flows out and which is connected to the outlet; a float chamber that is connected with the dissolution passage and is for discharging undissolved gas in the dissolution passage to the outside; and a bypass passage that connects the float chamber with the dissolution passage, the in-flow passage, or the out-flow passage at a spot different from the connection spot at which the float chamber is connected with the dissolution passage. Thus, reliability can be improved.

Description

気体溶解装置Gas dissolving device
　本発明は、気体溶解装置に関する。 The present invention relates to a gas dissolving apparatus.
　従来の気体溶解装置には、気体と液体を混合して気体を液体に溶解させる気体溶解装置がある（例えば、特許文献１）。 A conventional gas dissolving apparatus includes a gas dissolving apparatus that mixes a gas and a liquid to dissolve the gas into the liquid (for example, Patent Document 1).
　特許文献１の気体溶解装置は、気体を液体に溶解させるための溶解タンクを備える。溶解タンクの内部は複数の空間に仕切られており、液体と気体を混合した気液混合流体がこれらの空間を流れる過程で、気体が溶解した液体が生成される。このような構成において、特許文献１の気体溶解装置は、溶解タンクにおける未溶解の気体を外部に排出するためのフロート室が設けられている。 The gas dissolving device of Patent Document 1 includes a dissolution tank for dissolving a gas into a liquid. The inside of the dissolution tank is partitioned into a plurality of spaces, and a liquid in which the gas is dissolved is generated in the process in which the gas-liquid mixed fluid in which the liquid and the gas are mixed flows in these spaces. In such a configuration, the gas dissolving device of Patent Document 1 is provided with a float chamber for discharging undissolved gas in the dissolving tank to the outside.
特開２０１３－６６８１５号公報JP 2013-66815 A
　しかしながら、昨今では、気体溶解装置の信頼性を向上させることが求められている。特許文献１の気体溶解装置は、長期間使用する場合には、フロートを収容するフロート室内に汚れが溜まり、フロートの動作不良が生じるおそれがある等、気体溶解装置の信頼性を向上させるという観点では改善の余地があるといえる。 However, recently, it is required to improve the reliability of the gas dissolving apparatus. When the gas dissolving apparatus of Patent Document 1 is used for a long period of time, dirt accumulates in the float chamber that accommodates the float, which may cause malfunction of the float. So there is room for improvement.
　従って、本発明の目的は、上記問題を解決することにあって、信頼性を向上させた気体溶解装置を提供することにある。 Therefore, an object of the present invention is to provide a gas dissolving apparatus with improved reliability in solving the above-mentioned problems.
　上記目的を達成するために、本発明の気体溶解装置は、液体に気体を混合した気液混合流体を流入させる流入口と、前記流入口から流入した気液混合流体の流路であって液体に気体を溶解させる溶解流路と、気体が溶解した液体を前記溶解流路から流出させる流出口とを有する溶解タンクと、前記流入口に接続され、前記溶解タンクに気液混合流体を流入させる流入路と、前記流出口に接続され、気体が溶解した液体を流出させる流出路と、前記溶解流路に連通し、前記溶解流路内の未溶解の気体を外部に排出するためのフロート室と、前記フロート室と前記溶解流路が連通する連通箇所とは別の箇所における前記溶解流路、又は、前記流入路若しくは前記流出路と、前記フロート室とを接続するバイパス流路と、を備える。 In order to achieve the above object, a gas dissolving apparatus according to the present invention includes an inlet for introducing a gas-liquid mixed fluid obtained by mixing a gas with a liquid, and a flow path for the gas-liquid mixed fluid flowing from the inlet. A dissolution tank having a dissolution channel for dissolving the gas in the gas, and an outflow port for allowing the liquid in which the gas is dissolved to flow out of the dissolution channel, and a gas-liquid mixed fluid flowing into the dissolution tank. An inflow path, an outflow path connected to the outflow port for discharging a liquid in which gas is dissolved, and a float chamber for discharging undissolved gas in the dissolution flow path to the outside, communicating with the dissolution flow path And the dissolution flow path at a location different from the communication location where the float chamber communicates with the dissolution flow path, or the bypass flow path connecting the inflow path or the outflow path and the float chamber. Prepare.
　本発明の気体溶解装置によれば、信頼性を向上させることができる。 According to the gas dissolving apparatus of the present invention, the reliability can be improved.
　本発明のこれらの態様と特徴は、添付された図面についての好ましい実施形態に関連した次の記述から明らかになる。
実施形態１にかかる気体溶解装置の概略図 実施形態１の変形例にかかる気体溶解装置の概略図 実施形態２にかかる気体溶解装置の概略図 実施形態２にかかる気体溶解装置の制御例を示す図 実施形態３にかかる気体溶解装置の概略図 実施形態３にかかる気体溶解装置の制御例を示す図 実施例にかかる気体溶解装置の溶解タンクの一部分解斜視図（表側） 実施例にかかる気体溶解装置の溶解タンクの一部分解斜視図（裏側） 実施例にかかる気体溶解装置の溶解タンクの平面図 実施例にかかる気体溶解装置の溶解タンクの縦断面図（図９のＡ－Ａ断面図） 実施例にかかる気体溶解装置の溶解タンクの縦断面図（図１０のＢ－Ｂ断面図） These aspects and features of the invention will become apparent from the following description, taken in conjunction with the preferred embodiments with reference to the accompanying drawings, in which:
Schematic of the gas dissolution apparatus concerning Embodiment 1 Schematic of the gas dissolving apparatus concerning the modification of Embodiment 1. Schematic of the gas dissolving apparatus concerning Embodiment 2. The figure which shows the example of control of the gas dissolving apparatus concerning Embodiment 2. Schematic of the gas dissolving apparatus concerning Embodiment 3. The figure which shows the example of control of the gas dissolving apparatus concerning Embodiment 3. Partially exploded perspective view (front side) of a dissolution tank of a gas dissolution apparatus according to an embodiment Partially exploded perspective view (back side) of dissolution tank of gas dissolving apparatus according to embodiment The top view of the dissolution tank of the gas dissolution apparatus concerning an Example FIG. 9 is a longitudinal sectional view of a dissolving tank of the gas dissolving apparatus according to the embodiment (cross section taken along the line AA in FIG. 9). FIG. 10 is a longitudinal sectional view of a dissolution tank of the gas dissolving apparatus according to the embodiment (a sectional view taken along line BB in FIG. 10).
　以下に、本発明にかかる実施形態１－３および実施例を図面に基づいて詳細に説明する。 Embodiments 1-3 and examples according to the present invention will be described below in detail with reference to the drawings.
（実施形態１）
　図１は、実施形態１にかかる気体溶解装置２の概略構成を示す図である。 (Embodiment 1)
FIG. 1 is a diagram illustrating a schematic configuration of a gas dissolving apparatus 2 according to the first embodiment.
　図１に示す気体溶解装置２は、液体（例えば水）と気体（例えば空気）を混合した気液混合流体を流すとともに、後述する溶解タンク１０により液体に気体を溶解させる装置である。気体溶解装置２は、液体に溶解した気体を後述する減圧装置１４を用いて減圧することにより、微細気泡として発生させて、微細気泡を含む液体を浴槽等に供給するものである。 1 is a device for flowing a gas-liquid mixed fluid in which a liquid (for example, water) and a gas (for example, air) are mixed, and for dissolving the gas in the liquid by a dissolution tank 10 described later. The gas dissolving device 2 generates a fine bubble by decompressing a gas dissolved in a liquid using a decompression device 14 described later, and supplies a liquid containing the fine bubble to a bathtub or the like.
　図１に示すように、実施形態１の気体溶解装置２は、流入路４と、気体供給機構６と、ポンプ８と、溶解タンク１０と、流出路１２と、減圧装置１４と、フロート室１６と、バイパス流路１８とを備える。このような構成において、液体と気体を混合した気液混合流体を流入路４から溶解タンク１０に流入させ、溶解タンク１０において気体を液体に溶解させる。その後、気体が溶解した液体を流出路１２へ流出するとともに、減圧装置１４により減圧することで微細気泡として発生させる。溶解タンク１０においては、液体に溶解しなかった未溶解の気体はフロート室１６に溜められ、溶解タンク１０外部に排出される。 As shown in FIG. 1, the gas dissolving apparatus 2 of Embodiment 1 includes an inflow path 4, a gas supply mechanism 6, a pump 8, a dissolution tank 10, an outflow path 12, a decompression device 14, and a float chamber 16. And a bypass channel 18. In such a configuration, a gas-liquid mixed fluid in which a liquid and a gas are mixed flows into the dissolution tank 10 from the inflow path 4, and the gas is dissolved in the liquid in the dissolution tank 10. Thereafter, the liquid in which the gas is dissolved flows out to the outflow passage 12 and is generated as fine bubbles by reducing the pressure by the decompression device 14. In the dissolution tank 10, undissolved gas that has not been dissolved in the liquid is stored in the float chamber 16 and is discharged to the outside of the dissolution tank 10.
　実施形態１の気体溶解装置２では特に、フロート室１６内に流体を流入するためのバイパス流路１８を設けている。バイパス流路１８を設けることにより、流体の流れが通常生じないフロート室１６内に混合流体を流し、フロート室１６内を洗浄可能としている。これにより、フロート室１６内のフロート２６がフロート室１６内の汚れによって動作不良となることを防ぎ、気体溶解装置２の信頼性を向上させるものである。以下、気体溶解装置２の各構成について順に説明する。 In the gas dissolving device 2 of the first embodiment, in particular, a bypass flow path 18 for flowing a fluid into the float chamber 16 is provided. By providing the bypass flow path 18, the mixed fluid is allowed to flow in the float chamber 16 where a fluid flow does not normally occur, and the inside of the float chamber 16 can be cleaned. This prevents the float 26 in the float chamber 16 from malfunctioning due to dirt in the float chamber 16 and improves the reliability of the gas dissolving apparatus 2. Hereinafter, each structure of the gas dissolving apparatus 2 is demonstrated in order.
　流入路４は、溶解タンク１０に気液混合流体を流入するための流路である。流入路４は例えば配管により構成される。流入路４の上流側は液体の供給源（図示せず）に接続されており、流入路４内に液体を供給可能に構成される。流入路４の下流側は溶解タンク１０の流入口２０に接続されている。流入路４の途中には、気体供給機構６およびポンプ８が設けられている。 The inflow path 4 is a flow path for allowing the gas-liquid mixed fluid to flow into the dissolution tank 10. The inflow path 4 is constituted by a pipe, for example. The upstream side of the inflow path 4 is connected to a liquid supply source (not shown), and is configured to be able to supply liquid into the inflow path 4. The downstream side of the inflow path 4 is connected to the inlet 20 of the dissolution tank 10. In the middle of the inflow path 4, a gas supply mechanism 6 and a pump 8 are provided.
　気体供給機構６は、流入路４内に気体を供給する機構である。気体供給機構６は例えば配管などを含んで構成されるが、実施形態１では、気体供給機構６の構成を簡略化して説明する。気体供給機構６は流入路４内に気体を供給することで、液体と気体を混合した気液混合流体を生成する。 The gas supply mechanism 6 is a mechanism for supplying gas into the inflow path 4. The gas supply mechanism 6 is configured to include, for example, a pipe or the like. In the first embodiment, the configuration of the gas supply mechanism 6 will be described in a simplified manner. The gas supply mechanism 6 supplies gas into the inflow passage 4 to generate a gas-liquid mixed fluid in which liquid and gas are mixed.
　ポンプ８は、気体供給機構６の下流側に設けられたポンプである。ポンプ８は、流入路４内の気液混合流体を溶解タンク１０の流入口２０に向けて圧送する。ポンプ８の運転は後述する制御装置によって制御される。ポンプ８の回転数を制御することで、溶解タンク１０に供給する気液混合流体の流量を調整可能である。 The pump 8 is a pump provided on the downstream side of the gas supply mechanism 6. The pump 8 pumps the gas-liquid mixed fluid in the inflow passage 4 toward the inlet 20 of the dissolution tank 10. The operation of the pump 8 is controlled by a control device described later. The flow rate of the gas-liquid mixed fluid supplied to the dissolution tank 10 can be adjusted by controlling the rotation speed of the pump 8.
　溶解タンク１０は、流入路４から供給されてくる気液混合流体を収容して気体を液体に溶解させるための容器である。溶解タンク１０は、前述した流入口２０と、溶解流路２２と、流出口２４とを有する。溶解流路２２は、流入口２０から流入した気液混合流体を流すための流路であり、溶解タンク１０の内壁によって形成されている。溶解流路２２は複数の空間によって構成されており、詳細な構成については後述する。溶解流路２２の上流端は流入口２０から始まり、溶解流路２２の下流端は流出口２４で終了する。流出口２４は、溶解流路２２において気体が溶解した液体を溶解タンク１０から流出するための出口である。流入口２０および流出口２４はともに溶解タンク１０の底部における開口として形成される。 The dissolution tank 10 is a container for storing the gas-liquid mixed fluid supplied from the inflow passage 4 and dissolving the gas in the liquid. The dissolution tank 10 has the inflow port 20, the dissolution flow path 22, and the outflow port 24 described above. The dissolution channel 22 is a channel for flowing the gas-liquid mixed fluid that has flowed in from the inlet 20, and is formed by the inner wall of the dissolution tank 10. The dissolution channel 22 is composed of a plurality of spaces, and a detailed configuration will be described later. The upstream end of the dissolution channel 22 starts at the inlet 20 and the downstream end of the dissolution channel 22 ends at the outlet 24. The outlet 24 is an outlet for allowing the liquid in which the gas is dissolved in the dissolution channel 22 to flow out of the dissolution tank 10. Both the inlet 20 and the outlet 24 are formed as openings at the bottom of the dissolution tank 10.
　流出路１２は、溶解タンク１０からの流体を浴槽などに流出するための流路である。流出路１２は例えば配管により構成される。流出路１２の上流端は溶解タンク１０の流出口２４に接続されており、下流端は浴槽などに接続されている。流出路１２における流出口２４に隣接する位置には減圧装置１４が設けられている。 The outflow path 12 is a flow path for flowing out the fluid from the dissolution tank 10 to a bathtub or the like. The outflow path 12 is constituted by, for example, piping. The upstream end of the outflow path 12 is connected to the outlet 24 of the dissolution tank 10, and the downstream end is connected to a bathtub or the like. A decompression device 14 is provided at a position adjacent to the outlet 24 in the outflow passage 12.
　減圧装置１４は、溶解タンク１０の流出口２４から流出してきた液体を減圧する装置である。減圧装置１４が液体を減圧することにより、液体に溶解していた気体を流出路１２において微細気泡として発生させることができる。減圧装置１４および流出路１２により、液体に溶解した気体を微細気泡化する微細化部が構成される。 The decompression device 14 is a device that decompresses the liquid flowing out from the outlet 24 of the dissolution tank 10. When the decompression device 14 decompresses the liquid, the gas dissolved in the liquid can be generated as fine bubbles in the outflow passage 12. The decompression device 14 and the outflow path 12 constitute a miniaturization unit that microbubbles the gas dissolved in the liquid.
　フロート室１６は、溶解タンク１０において液体に溶解しなかった未溶解の気体を外部に排出するための機構である。実施形態１では、フロート室１６は溶解タンク１０内の溶解流路２２に連通するように、溶解タンク１０の上部に取り付けられている。フロート室１６は、溶解タンク１０内の溶解流路２２における下流側に連通させることが好ましい。本実施形態１では、図１に示すように、フロート室１６は、溶解タンク１０内の最も下流側の空間（後述する気液分離室４０）に連通するように設けられている。 The float chamber 16 is a mechanism for discharging undissolved gas that has not been dissolved in the liquid in the dissolution tank 10 to the outside. In the first embodiment, the float chamber 16 is attached to the upper part of the dissolution tank 10 so as to communicate with the dissolution flow path 22 in the dissolution tank 10. The float chamber 16 is preferably communicated with the downstream side of the dissolution channel 22 in the dissolution tank 10. In the first embodiment, as shown in FIG. 1, the float chamber 16 is provided so as to communicate with the most downstream space (a gas-liquid separation chamber 40 described later) in the dissolution tank 10.
　フロート室１６は、フロート２６と、弁体２８と、排出口３０とを備える。フロート２６は、フロート室１６内の液面に浮かぶ部材である。フロート２６は、フロート室１６内の液面の高さ（水位）に準じて上下に移動する。フロート２６は、弁体２８に接続されている。弁体２８は、排出口３０を開閉可能に閉じる部材である。排出口３０は、フロート室１６内の気体を外部に排出するための開口部である。排出口３０はフロート室１６の上面に設けられており、フロート室１６の内部と外部とを連通する。このような構成において、フロート室１６内の水位が所定水位よりも高い場合には、弁体２８によって排出口３０が閉じられ、フロート室１６内の水位が所定水位よりも低い場合には、排出口３０が開かれるように機能する。フロート室１６の詳細な機能については後述する。 The float chamber 16 includes a float 26, a valve body 28, and a discharge port 30. The float 26 is a member that floats on the liquid level in the float chamber 16. The float 26 moves up and down according to the height (water level) of the liquid level in the float chamber 16. The float 26 is connected to the valve body 28. The valve body 28 is a member which closes the discharge port 30 so that opening and closing is possible. The discharge port 30 is an opening for discharging the gas in the float chamber 16 to the outside. The discharge port 30 is provided on the upper surface of the float chamber 16 and communicates the inside and the outside of the float chamber 16. In such a configuration, when the water level in the float chamber 16 is higher than the predetermined water level, the outlet 30 is closed by the valve body 28, and when the water level in the float chamber 16 is lower than the predetermined water level, the discharge port 30 is discharged. It functions to open the outlet 30. Detailed functions of the float chamber 16 will be described later.
　バイパス流路１８は、フロート室１６内に流体を供給する流路である。バイパス流路１８はフロート室１６内部に流体の流れを形成することで、フロート室１６内部に汚れがつくことを防止する、あるいは付着した汚れを洗浄するものである。実施形態１におけるバイパス流路１８は、フロート室１６の側壁と、フロート室１６よりも上流側における溶解タンク１０の外壁とを連通するように設けられている。フロート室１６とバイパス流路１８が接続される箇所（フロート室１６の側壁）は、フロート室１６が溶解タンク１０と連通する連通箇所（フロート室１６の底壁開口部（図示せず））とは別の箇所である。本実施形態１では、図１に示すように、バイパス流路１８は、溶解タンク１０内の最も上流側の空間（後述する気液混合室３６）に連通するように接続される。 The bypass channel 18 is a channel for supplying a fluid into the float chamber 16. The bypass flow path 18 forms a fluid flow in the float chamber 16 to prevent the float chamber 16 from being contaminated or to clean the adhered dirt. The bypass channel 18 in the first embodiment is provided so as to communicate the side wall of the float chamber 16 with the outer wall of the dissolution tank 10 on the upstream side of the float chamber 16. A location where the float chamber 16 and the bypass channel 18 are connected (side wall of the float chamber 16) is a communication location where the float chamber 16 communicates with the dissolution tank 10 (a bottom wall opening (not shown) of the float chamber 16). Is another part. In the first embodiment, as shown in FIG. 1, the bypass flow path 18 is connected so as to communicate with the most upstream space (gas-liquid mixing chamber 36 described later) in the dissolution tank 10.
　次に、溶解タンク１０の内部構成について説明する。 Next, the internal configuration of the dissolution tank 10 will be described.
　溶解タンク１０は、複数の壁によって内部空間が仕切られている。具体的には、実施形態１における溶解タンク１０は、２つの仕切り壁３２、３４を備える。第１仕切り壁３２は、溶解タンク１０の内壁上端部から下方に延びる壁である。第１仕切り壁３２は溶解タンク１０の内壁下端部には到達しておらず、内壁下端部との間に隙間としての第１連通口３３を形成する。第２仕切り壁３４は、溶解タンク１０の内壁下端部から上方に延びる壁である。第２仕切り壁３４は溶解タンク１０の内壁上端部には到達しておらず、内壁上端部との間に隙間としての第２連通口３５を形成する。このような第１仕切り壁３２および第２仕切り壁３４によって、溶解タンク１０内の空間が複数の空間に仕切られている。当該空間によって溶解流路２２が形成されている。このような構成によれば、溶解タンク１０内の溶解流路２２として、第１仕切り壁３２の上流側の空間（気液混合室３６）と、第１仕切り壁３２と第２仕切り壁３４の間の空間（中間室３８）と、第２仕切り壁３４の下流側の空間（気液分離室４０）とに区画される。気液混合室３６と中間室３８は第１連通口３３にて連通し、中間室３８と気液分離室４０は第２連通口３５にて連通する。気液混合室３６の上流端は流入口２０に接続し、気液分離室４０の下流端は流出口２４に接続する。また、気液混合室３６にはバイパス流路１８の上流端部が接続され、気液分離室４０にはフロート室１６が連通する。 The dissolution tank 10 has an internal space partitioned by a plurality of walls. Specifically, the dissolution tank 10 in the first embodiment includes two partition walls 32 and 34. The first partition wall 32 is a wall extending downward from the upper end portion of the inner wall of the dissolution tank 10. The first partition wall 32 does not reach the lower end portion of the inner wall of the dissolution tank 10 and forms a first communication port 33 as a gap with the lower end portion of the inner wall. The second partition wall 34 is a wall extending upward from the lower end portion of the inner wall of the dissolution tank 10. The second partition wall 34 does not reach the upper end of the inner wall of the dissolution tank 10, and forms a second communication port 35 as a gap with the upper end of the inner wall. The first partition wall 32 and the second partition wall 34 as described above partition the space in the dissolution tank 10 into a plurality of spaces. A dissolution channel 22 is formed by the space. According to such a configuration, as the dissolution flow path 22 in the dissolution tank 10, the space upstream of the first partition wall 32 (gas-liquid mixing chamber 36), the first partition wall 32, and the second partition wall 34. A space (intermediate chamber 38) between them and a space (gas-liquid separation chamber 40) on the downstream side of the second partition wall 34 are partitioned. The gas-liquid mixing chamber 36 and the intermediate chamber 38 communicate with each other through the first communication port 33, and the intermediate chamber 38 and the gas-liquid separation chamber 40 communicate with each other through the second communication port 35. The upstream end of the gas-liquid mixing chamber 36 is connected to the inlet 20, and the downstream end of the gas-liquid separation chamber 40 is connected to the outlet 24. Further, the upstream end portion of the bypass channel 18 is connected to the gas-liquid mixing chamber 36, and the float chamber 16 communicates with the gas-liquid separation chamber 40.
　このような構成を有する溶解タンク１０の内部における気液混合流体の作用について説明する。 The operation of the gas-liquid mixed fluid in the dissolution tank 10 having such a configuration will be described.
　まず、ポンプ８が作動することにより、液体と気体が混合された気液混合流体が溶解タンク１０に供給される。気液混合流体は流入口２０を通じて気液混合室３６に入る。気液混合室３６に入った気液混合流体は、溶解タンク１０の内壁底部から上方に向かって噴出する。気液混合流体は、溶解タンク１０の内壁上端部や第１仕切り壁３２に衝突し、跳ね返る。溶解タンク１０の内壁上端部や第１仕切り壁３２に衝突し、跳ね返る気液混合流体は、気液混合室３６内の気液混合流体を撹拌する。このとき、気体供給機構６を通じて混合された気体および気液混合室３６にあらかじめ貯留していた気体が、溶媒である液体と激しく混合される。気液混合流体は撹拌され、加圧下で気体が液体中に溶解することで、気体が溶解した液体が生成される。このような気体の溶解は、撹拌による剪断によって、気液混合流体に気泡として混合されている気体が細分化され、液体と接触する表面積が大きくなることによって促進される。さらに、撹拌による均一化によって、液面付近における気体の溶解濃度が低減され、液体への気体の溶解速度が上昇することによっても促進される。 First, when the pump 8 is operated, a gas-liquid mixed fluid in which liquid and gas are mixed is supplied to the dissolution tank 10. The gas-liquid mixed fluid enters the gas-liquid mixing chamber 36 through the inlet 20. The gas-liquid mixed fluid that has entered the gas-liquid mixing chamber 36 is ejected upward from the bottom of the inner wall of the dissolution tank 10. The gas-liquid mixed fluid collides with the upper end of the inner wall of the dissolution tank 10 and the first partition wall 32 and rebounds. The gas-liquid mixed fluid that collides with the upper end of the inner wall of the dissolution tank 10 and the first partition wall 32 and rebounds stirs the gas-liquid mixed fluid in the gas-liquid mixing chamber 36. At this time, the gas mixed through the gas supply mechanism 6 and the gas previously stored in the gas-liquid mixing chamber 36 are vigorously mixed with the liquid as the solvent. The gas-liquid mixed fluid is stirred, and the gas is dissolved in the liquid under pressure, whereby a liquid in which the gas is dissolved is generated. Such dissolution of gas is promoted by shearing by stirring to subdivide the gas mixed as gas bubbles in the gas-liquid mixed fluid and increase the surface area in contact with the liquid. Further, the homogenization by stirring reduces the gas dissolution concentration in the vicinity of the liquid surface, which is also promoted by increasing the gas dissolution rate in the liquid.
　生成された気液混合流体は、第１仕切り壁３２の下端と溶解タンク１０の内壁底部との間の第１連通口３３を通って中間室３８に流出する。中間室３８に流出した液体は、第２仕切り壁３４の上端部から第２連通口３５を越流して気液分離室４０に流出する。気液分離室４０は、液体に溶解し切れない気体を気泡として液体から分離する空間である。気液界面である液面付近にまで液体の流れが持ち上げられるので、気泡は浮力によって上方へ移動し、フロート室１６に流入する。一方、気液分離室４０に流出した液体は、流出口２４を通じて流出路１２に流出する。流出口２４は気液分離室４０の底部に設けられているので、液面付近に存在する大きな気泡の外部への流出は防止される。 The generated gas-liquid mixed fluid flows out into the intermediate chamber 38 through the first communication port 33 between the lower end of the first partition wall 32 and the bottom of the inner wall of the dissolution tank 10. The liquid flowing out into the intermediate chamber 38 flows from the upper end of the second partition wall 34 through the second communication port 35 and out into the gas-liquid separation chamber 40. The gas-liquid separation chamber 40 is a space that separates gas that cannot be dissolved in the liquid from the liquid as bubbles. Since the liquid flow is lifted up to the vicinity of the liquid surface, which is the gas-liquid interface, the bubbles move upward by buoyancy and flow into the float chamber 16. On the other hand, the liquid flowing out into the gas-liquid separation chamber 40 flows out into the outflow path 12 through the outflow port 24. Since the outflow port 24 is provided at the bottom of the gas-liquid separation chamber 40, outflow of large bubbles existing near the liquid surface to the outside is prevented.
　フロート室１６に流入した気体は、フロート室１６内の空間に溜まっていく。ポンプ８の運転が継続するにつれて、フロート室１６内に溜まる気体の量が増加し、それに伴いフロート室１６内の液面が下がる。フロート室１６内の液面の低下に応じてフロート２６も下降する。フロート２６に接続されている弁体２８は、フロート２６の高さ位置に応じて排出口３０の開閉を切り替える。具体的には、フロート室１６内の水位が高く、フロート２６の位置が所定位置よりも上方にあるときは、弁体２８は排出口３０を閉じる。一方で、フロート室１６内の水位が低くなり、フロート２６の位置が所定位置よりも下方にあるときは、弁体２８は排出口３０を開く。 The gas flowing into the float chamber 16 accumulates in the space inside the float chamber 16. As the operation of the pump 8 continues, the amount of gas accumulated in the float chamber 16 increases, and the liquid level in the float chamber 16 decreases accordingly. As the liquid level in the float chamber 16 decreases, the float 26 also descends. The valve body 28 connected to the float 26 switches between opening and closing of the discharge port 30 according to the height position of the float 26. Specifically, when the water level in the float chamber 16 is high and the position of the float 26 is above a predetermined position, the valve body 28 closes the discharge port 30. On the other hand, when the water level in the float chamber 16 becomes low and the position of the float 26 is below the predetermined position, the valve body 28 opens the discharge port 30.
　このようなフロート２６および弁体２８の制御によれば、フロート室１６内に未溶解の気体が溜まり始めるうちは、排水口３０を通じて気体を排出せず、気体を溜めるように制御される。時間の経過とともにフロート室１６内に気体が溜まり、フロート室１６内の水位が下がると、フロート２６も下降する。フロート２６が所定位置まで下がると、弁体２８は排出口３０を開く。これにより、排出口３０を通じて気体が排出される。気体が排出されると、フロート室１６内の水位は再び上昇し、フロート２６も上方に移動する。これにより、排出口３０は再度閉じられる。このような動作により、気体を溜める動作と、気体を排出する動作とが交互に繰り返され、未溶解の気体をフロート室１６から間欠的に排出することができる。 According to the control of the float 26 and the valve body 28 as described above, while the undissolved gas starts to be accumulated in the float chamber 16, the gas is controlled not to be discharged through the drain port 30 but to be accumulated. As time passes, gas accumulates in the float chamber 16, and when the water level in the float chamber 16 falls, the float 26 also descends. When the float 26 is lowered to a predetermined position, the valve body 28 opens the discharge port 30. Thereby, the gas is discharged through the discharge port 30. When the gas is discharged, the water level in the float chamber 16 rises again, and the float 26 moves upward. Thereby, the discharge port 30 is closed again. By such an operation, an operation for accumulating gas and an operation for discharging gas are alternately repeated, and undissolved gas can be intermittently discharged from the float chamber 16.
　さらに実施形態１では、フロート室１６と溶解タンク１０内の空間（気液混合室３６）とを接続するバイパス流路１８を設け、フロート室１６内に気液混合流体を流入可能としている。バイパス流路１８が設けられていない場合には、フロート室１６内において液面の上下動はあるものの液体の流れは基本的に生じない。このため、フロート室１６内部は汚れが溜まりやすく、例えば液体中の菌が死んでゼリー状の塊となったものがフロート室１６の側壁やフロート２６に付着する等、フロート２６の動作を妨げる場合がある。特に、気体溶解装置２が「浴槽」に液体を供給するために使用される場合には、液体にオイルなどの添加物を添加する場合があり、そのような場合にはフロート室１６内部がより汚れやすくなる。これを受けて、実施形態１ではバイパス流路１８を設け、フロート室１６内に気液混合流体を流入させる構成としている。これにより、フロート室１６に気液混合流体を流してフロート室１６内を洗浄することができ、フロート室１６内の壁面の汚れなどによってフロート２６が動作不良を起こすことを防止することができ、気体溶解装置２の信頼性を向上させることができる。 Furthermore, in the first embodiment, a bypass flow path 18 that connects the float chamber 16 and the space (gas-liquid mixing chamber 36) in the dissolution tank 10 is provided so that the gas-liquid mixed fluid can flow into the float chamber 16. When the bypass flow path 18 is not provided, the liquid flow basically does not occur in the float chamber 16 although the liquid level moves up and down. For this reason, the inside of the float chamber 16 tends to accumulate dirt. For example, when the bacteria in the liquid die and become a jelly-like lump adheres to the side wall of the float chamber 16 or the float 26, the operation of the float 26 is hindered. There is. In particular, when the gas dissolving device 2 is used for supplying a liquid to the “bathtub”, an additive such as oil may be added to the liquid. It becomes easy to get dirty. In response to this, in the first embodiment, the bypass flow path 18 is provided so that the gas-liquid mixed fluid flows into the float chamber 16. Thereby, the gas-liquid mixed fluid can be flowed into the float chamber 16 to clean the inside of the float chamber 16, and the float 26 can be prevented from malfunctioning due to dirt on the wall surface in the float chamber 16, etc. The reliability of the gas dissolving device 2 can be improved.
　上述したように、実施形態１では、バイパス流路１８を溶解タンク１０内における最も上流側の空間である気液混合室３６と接続している。このため、気液混合室３６とフロート室１６との圧力差を利用して、上流側における圧力の高い気液混合流体をフロート室１６内に流入させることができ、フロート室１６に強い流れを生じさせることができる。これにより、フロート室１６を洗浄する洗浄力が向上し、気体溶解装置２の信頼性を向上させることができる。 As described above, in the first embodiment, the bypass flow path 18 is connected to the gas-liquid mixing chamber 36 which is the most upstream space in the dissolution tank 10. For this reason, by utilizing the pressure difference between the gas-liquid mixing chamber 36 and the float chamber 16, the gas-liquid mixed fluid having a high pressure on the upstream side can be flowed into the float chamber 16, and a strong flow is generated in the float chamber 16. Can be generated. Thereby, the detergency which cleans the float chamber 16 improves and the reliability of the gas dissolving apparatus 2 can be improved.
　さらに、実施形態１では、フロート室１６を溶解タンク１０内における最も下流側の空間である気液分離室４０と連通している。このため、バイパス流路１８における上流側と下流側で流体の圧力差が生じやすくなり、フロート室１６へより確実に気液混合流体を流すことができる。 Furthermore, in the first embodiment, the float chamber 16 communicates with the gas-liquid separation chamber 40 which is the most downstream space in the dissolution tank 10. For this reason, the pressure difference of the fluid tends to occur between the upstream side and the downstream side in the bypass flow path 18, and the gas-liquid mixed fluid can flow more reliably to the float chamber 16.
（変形例）
　実施形態１では、バイパス流路１８が気液混合室３６とフロート室１６を接続する場合について説明したが、このような場合に限らない。例えば、図２に示すような位置にバイパス流路５２を設けてもよい。図２に示す気体溶解装置５０におけるバイパス流路５２は、フロート室１６と気液分離室４０とを連通するように設けられている。より具体的には、フロート室１６と気液分離室４０が連通する連通箇所（フロート室１６の底壁開口部）よりも下流側の地点において、バイパス流路５２を気液分離室４０と連通するように接続している。このような場合であっても、フロート室１６と気液分離室４０との圧力差を利用して、圧力の高いフロート室１６から圧力の低い気液分離室４０へ気液混合流体を流すことができる。これにより、フロート室１６内に気液混合流体の流れを生じさせ、フロート室１６内を洗浄することができる。 (Modification)
In the first embodiment, the case where the bypass channel 18 connects the gas-liquid mixing chamber 36 and the float chamber 16 has been described. However, the present invention is not limited to such a case. For example, you may provide the bypass flow path 52 in a position as shown in FIG. The bypass flow path 52 in the gas dissolving device 50 shown in FIG. 2 is provided so as to communicate the float chamber 16 and the gas-liquid separation chamber 40. More specifically, the bypass passage 52 communicates with the gas-liquid separation chamber 40 at a point downstream of the communication location (the bottom wall opening of the float chamber 16) where the float chamber 16 and the gas-liquid separation chamber 40 communicate. Connected to do. Even in such a case, the gas-liquid mixed fluid is caused to flow from the high-pressure float chamber 16 to the low-pressure gas-liquid separation chamber 40 using the pressure difference between the float chamber 16 and the gas-liquid separation chamber 40. Can do. Thereby, the flow of the gas-liquid mixed fluid is generated in the float chamber 16 and the inside of the float chamber 16 can be cleaned.
　前述した実施形態１では、バイパス流路１８においてフロート室１６が低圧側であり、溶解タンク１０内の空間（気液混合室３６）が高圧側である。よって、バイパス流路１８を通じてフロート室１６に常時流体を供給し、フロート室１６の洗浄が常時可能である。また、バイパス流路１８の高圧側は気液混合室３６に接続されているため、気体と液体が激しく混ざり合う気液混合室３６から、気泡を多く含む気液混合流体がフロート室１６に供給される。一方、上記変形例では、バイパス流路５２におけるフロート室１６が高圧側であり、溶解タンク１０内の空間（気液分離室４０）が低圧側である。よって、フロート室１６内においてバイパス流路５２の高さ位置まで水位が上がったときのみ、バイパス流路５２に流体が流れる。このように、フロート室１６の洗浄を常時行うものではなく、また、バイパス流路５２を流れる液体には気泡はほとんど含まれない。 In the first embodiment described above, the float chamber 16 is on the low pressure side in the bypass flow path 18, and the space (gas-liquid mixing chamber 36) in the dissolution tank 10 is on the high pressure side. Therefore, the fluid is always supplied to the float chamber 16 through the bypass channel 18, and the float chamber 16 can always be cleaned. Further, since the high-pressure side of the bypass channel 18 is connected to the gas-liquid mixing chamber 36, a gas-liquid mixed fluid containing a large amount of bubbles is supplied to the float chamber 16 from the gas-liquid mixing chamber 36 where the gas and the liquid are intensively mixed. Is done. On the other hand, in the above modification, the float chamber 16 in the bypass channel 52 is on the high pressure side, and the space (gas-liquid separation chamber 40) in the dissolution tank 10 is on the low pressure side. Therefore, the fluid flows into the bypass channel 52 only when the water level rises to the height position of the bypass channel 52 in the float chamber 16. As described above, the float chamber 16 is not always washed, and the liquid flowing through the bypass passage 52 contains almost no bubbles.
　上述した実施形態１および変形例で示すように、バイパス流路１８、５２は、溶解タンク１０における複数の空間のうち、最も上流側の空間（気液混合室３６）又は最も下流側の空間（気液分離室４０）とフロート室１６とを接続する。このような構成によれば、バイパス流路１８、５２に流れる流体に圧力差が生じやすくなり、フロート室１６に強い流れを生じさせることができる。これにより、フロート室１６を洗浄する洗浄力が向上し、気体溶解装置２、５０の信頼性を向上させることができる。 As shown in the first embodiment and the modification described above, the bypass flow paths 18 and 52 are the most upstream space (gas-liquid mixing chamber 36) or the most downstream space (of the plurality of spaces in the dissolution tank 10 ( The gas-liquid separation chamber 40) and the float chamber 16 are connected. According to such a configuration, a pressure difference is easily generated in the fluid flowing in the bypass flow paths 18 and 52, and a strong flow can be generated in the float chamber 16. Thereby, the detergency which cleans the float chamber 16 improves, and the reliability of the gas dissolving apparatuses 2 and 50 can be improved.
　なお、実施形態１および変形例では、バイパス流路１８、５２をそれぞれ気液混合室３６および気液分離室４０と接続する場合について説明したが、このような場合に限らない。フロート室１６と溶解流路２２が連通する連通箇所とは別の箇所であれば、任意の位置にフロート室１６を接続してもよい。これにより、バイパス流路１８、５２の上流側と下流側で圧力差が生じるため、バイパス流路１８、５２を通じて流体を流し、フロート室１６を洗浄することができる。 In addition, although Embodiment 1 and the modification demonstrated the case where the bypass flow paths 18 and 52 were connected with the gas-liquid mixing chamber 36 and the gas-liquid separation chamber 40, respectively, it is not restricted to such a case. The float chamber 16 may be connected to an arbitrary position as long as it is a location different from the communication location where the float chamber 16 and the dissolution channel 22 communicate with each other. As a result, a pressure difference is generated between the upstream side and the downstream side of the bypass flow paths 18 and 52, so that the fluid can flow through the bypass flow paths 18 and 52 and the float chamber 16 can be washed.
（実施形態２）
　次に、実施形態２にかかる気体溶解装置６０について、図３を用いて説明する。実施形態１および変形例では、バイパス流路１８、５２をフロート室１６と溶解タンク１０内の空間とを接続するように設けたが、実施形態２では、溶解タンク１０内の空間ではなく流入路４にバイパス流路６２を接続するものである。以下、実施形態１との相違点を中心に説明する。 (Embodiment 2)
Next, the gas dissolving apparatus 60 concerning Embodiment 2 is demonstrated using FIG. In the first embodiment and the modification, the bypass flow paths 18 and 52 are provided so as to connect the float chamber 16 and the space in the dissolution tank 10, but in the second embodiment, not the space in the dissolution tank 10 but the inflow path. 4 is connected to the bypass flow path 62. Hereinafter, the difference from the first embodiment will be mainly described.
　図３に示すように、気体溶解装置６０は、流入路４とフロート室１６とを接続するバイパス流路６２を備える。バイパス流路６２の上流側は、流入路４におけるポンプ８の下流側の位置に接続される。バイパス流路６２の下流側は、実施形態１と同様にフロート室１６の側壁に接続される。 As shown in FIG. 3, the gas dissolving device 60 includes a bypass channel 62 that connects the inflow channel 4 and the float chamber 16. The upstream side of the bypass channel 62 is connected to a position on the downstream side of the pump 8 in the inflow channel 4. The downstream side of the bypass flow path 62 is connected to the side wall of the float chamber 16 as in the first embodiment.
　気体溶解装置６０はさらに、バイパス流路６２の途中に設けられる構成として、開閉弁６４と、逆止弁６６とを備える。気体溶解装置６０はさらに、制御装置６８と、スイッチ６９とを備える。 The gas dissolving device 60 further includes an on-off valve 64 and a check valve 66 as a configuration provided in the middle of the bypass flow path 62. The gas dissolving device 60 further includes a control device 68 and a switch 69.
　開閉弁６４は、バイパス流路６２の開閉を切り替える弁（バイパス流路開閉弁）である。開閉弁６４としては例えば、電磁弁あるいは電動弁が用いられる。バイパス流路６２における開閉弁６４の下流側に逆止弁６６が設けられている。逆止弁６６はバイパス流路６２内の逆流を防止する弁であり、流入路４からフロート室１６に向かって流れる方向にのみ気液混合流体を流すように作用する。 The on / off valve 64 is a valve (bypass channel on / off valve) that switches between opening and closing of the bypass channel 62. As the on-off valve 64, for example, an electromagnetic valve or an electric valve is used. A check valve 66 is provided on the downstream side of the on-off valve 64 in the bypass passage 62. The check valve 66 is a valve that prevents a back flow in the bypass flow path 62, and acts to flow the gas-liquid mixed fluid only in the direction of flowing from the inflow path 4 toward the float chamber 16.
　制御装置６８は、開閉弁６４およびポンプ８などの運転を制御するための装置である。制御装置６８は例えばマイクロコンピュータなどにより構成される。制御装置６８には、スイッチ６９が接続されている。スイッチ６９は、気体溶解装置６０の運転のＯＮ／ＯＦＦなどをユーザが操作するための部材である。 The control device 68 is a device for controlling the operation of the on-off valve 64 and the pump 8. The control device 68 is constituted by a microcomputer, for example. A switch 69 is connected to the control device 68. The switch 69 is a member for the user to operate ON / OFF of the operation of the gas dissolving device 60.
　このような構成において、制御装置６８によるポンプ８および開閉弁６４の制御方法の一例を図４に示す。 FIG. 4 shows an example of a method for controlling the pump 8 and the on-off valve 64 by the control device 68 in such a configuration.
　図４に示す制御方法によれば、スイッチ６９によって気体溶解装置６０のＯＮ信号が入力されることに応じて、ポンプ８の運転を開始する。具体的には、ポンプ８の回転数を所定回転数まで増加させるように運転し、その後、所定回転数にて維持するように制御する（第１運転）。この間、開閉弁６４は閉じた状態とする。すなわち、バイパス流路６２には気液混合流体を流さずに、流入路４から溶解タンク１０にのみ気液混合流体を流すように制御する。これにより、スイッチ６９による気体溶解装置２のＯＦＦ信号の入力を受信するまで、フロート室１６の洗浄を行わず、溶解タンク１０により液体に気体を溶解して減圧装置１４および流出路１２により微細気泡を発生させる第１運転を行う。 According to the control method shown in FIG. 4, the operation of the pump 8 is started in response to the ON signal of the gas dissolving device 60 being input by the switch 69. Specifically, the pump 8 is operated so as to increase the rotational speed to a predetermined rotational speed, and thereafter controlled to be maintained at the predetermined rotational speed (first operation). During this time, the on-off valve 64 is closed. That is, the gas-liquid mixed fluid is controlled to flow only from the inflow path 4 to the dissolution tank 10 without flowing the gas-liquid mixed fluid through the bypass channel 62. As a result, the float chamber 16 is not washed until the input of the OFF signal of the gas dissolving device 2 by the switch 69 is received, and the gas is dissolved in the liquid by the dissolving tank 10 and fine bubbles are generated by the decompression device 14 and the outflow passage 12. The 1st operation which generates is performed.
　第１運転におけるポンプ８の始動時には、図４に示すように、時間の経過とともに徐々にポンプ８の回転数を増加させるように制御している。これにより、ポンプ８が大量の気体を急激に取り込まないように制御している。 At the start of the pump 8 in the first operation, as shown in FIG. 4, control is performed so that the rotational speed of the pump 8 is gradually increased as time passes. Thereby, the pump 8 is controlled so as not to take in a large amount of gas abruptly.
　その後、スイッチ６９から気体溶解装置６０のＯＦＦ信号を受信すると、制御装置６８はポンプ８の運転を停止する。具体的には、ポンプ８の回転数を減少させながら、ポンプ８が停止するまで運転を行う（第２運転）。ここで、第２運転の間に開閉弁６４を開くように制御する。すなわち、気体溶解装置６０の運転が終了する直前にフロート室１６の洗浄を行う。このような制御によれば、微細気泡を発生させる第１運転では、フロート室１６には気液混合流体を供給せずに、第１運転後の第２運転においてポンプ８の回転数が減少している最中に洗浄を行う。これにより、微細気泡を発生させる第１運転では、所望の流量の気液混合流体を溶解タンク１０に供給しつつ、第１運転の終了に応じて、第１運転には影響しないフロート室１６の洗浄を実施することができる。このようにして、微細気泡を発生させる第１運転と、フロート室１６内の洗浄を行う第２運転とを効率良く両立させることができる。 Thereafter, when an OFF signal of the gas dissolving device 60 is received from the switch 69, the control device 68 stops the operation of the pump 8. Specifically, the operation is performed until the pump 8 is stopped while the rotational speed of the pump 8 is decreased (second operation). Here, the on-off valve 64 is controlled to open during the second operation. That is, the float chamber 16 is cleaned immediately before the operation of the gas dissolving device 60 is completed. According to such control, in the first operation in which fine bubbles are generated, the gas-liquid mixed fluid is not supplied to the float chamber 16, and the rotation speed of the pump 8 is reduced in the second operation after the first operation. Wash while you are. As a result, in the first operation for generating fine bubbles, the gas-liquid mixed fluid having a desired flow rate is supplied to the dissolution tank 10, and the float chamber 16 that does not affect the first operation according to the end of the first operation is supplied. Washing can be performed. In this way, the first operation for generating fine bubbles and the second operation for cleaning the float chamber 16 can be efficiently made compatible.
　なお、第１運転直後の溶解タンク１０内においては気体が圧縮されて液体の圧力が高くなっている状態であり、第２運転においてポンプ８の回転数を急激に低下させると、溶解タンク１０において気体が急激に膨張する。この場合、フロート室１６ではなく、流出路１２へ気体が流れこむ可能性がある。これを受けて、図４に示すように、第２運転においても、時間の経過とともにポンプ８の回転数を徐々に減少させるように制御している。これにより、前述した現象の発生を防止するようにしている。なお、図４に示す制御例では、第１運転の始動時におけるポンプ８の回転数の増加速度よりも、第２運転におけるポンプ８の回転数の減少速度を遅く制御している。これにより、前述した現象をより効果的に防止することができる。 In the dissolution tank 10 immediately after the first operation, the gas is compressed and the pressure of the liquid is high. When the rotation speed of the pump 8 is rapidly decreased in the second operation, the dissolution tank 10 The gas expands rapidly. In this case, gas may flow into the outflow passage 12 instead of the float chamber 16. In response to this, as shown in FIG. 4, also in the second operation, control is performed such that the rotational speed of the pump 8 is gradually decreased with the passage of time. This prevents the above-described phenomenon from occurring. In the control example shown in FIG. 4, the decrease speed of the rotation speed of the pump 8 in the second operation is controlled slower than the increase speed of the rotation speed of the pump 8 at the start of the first operation. Thereby, the phenomenon mentioned above can be prevented more effectively.
　上述したように、実施形態２における気体溶解装置６０は、バイパス流路６２を開閉する開閉弁（バイパス流路開閉弁）６４を備えている。これにより、所望の場合にバイパス流路６２に流体を流すという制御が可能となる。 As described above, the gas dissolving apparatus 60 according to the second embodiment includes the on-off valve (bypass passage on-off valve) 64 that opens and closes the bypass passage 62. As a result, it is possible to control the fluid to flow through the bypass channel 62 when desired.
　また、実施形態２における気体溶解装置６０では、ポンプ８は、所定の回転数で運転される第１運転と、第１運転からポンプ８の回転数を減少させながら停止するまで運転される第２運転とを実行するように制御される。開閉弁６４は、ポンプ８の第２運転中に開くように制御される。このように、ポンプ８の第２運転の間に開閉弁６４を開いてフロート室１６の洗浄を実施することで、フロート室１６の洗浄に伴う第１運転への流量等の影響を低減することができる。これにより、気体溶解装置６０をより安定的に稼働させることができ、気体溶解装置６０の信頼性を向上させることができる。 Further, in the gas dissolving device 60 in the second embodiment, the pump 8 is operated in a first operation that is operated at a predetermined rotational speed, and in the second operation until the pump 8 is stopped while decreasing the rotational speed of the pump 8 from the first operation. It is controlled to execute the operation. The on-off valve 64 is controlled to open during the second operation of the pump 8. Thus, by opening the on-off valve 64 during the second operation of the pump 8 and cleaning the float chamber 16, the influence of the flow rate and the like on the first operation accompanying the cleaning of the float chamber 16 is reduced. Can do. Thereby, the gas dissolving apparatus 60 can be operated more stably, and the reliability of the gas dissolving apparatus 60 can be improved.
　また、実施形態２における気体溶解装置６０では、バイパス流路６２は、流入路４におけるポンプ８よりも下流側の位置とフロート室１６とを接続する。流入路４におけるポンプ８よりも下流側の位置からフロート室１６に流体を流すことで、ポンプ８による推進力を受けてフロート室１６に確実に流体を流すことができる。 In the gas dissolving device 60 according to the second embodiment, the bypass flow path 62 connects the float chamber 16 and a position downstream of the pump 8 in the inflow path 4. By flowing the fluid from the position downstream of the pump 8 in the inflow path 4 to the float chamber 16, the fluid can be reliably flowed to the float chamber 16 by receiving the propulsive force from the pump 8.
（実施形態３）
　次に、実施形態３にかかる気体溶解装置７０について、図５を用いて説明する。実施形態３では、気体供給機構６の詳細な構成として、気体供給路７２と、開閉弁７４と、逆止弁７６とを備える。その他の構成については実施形態２と共通するため、説明を省略する。 (Embodiment 3)
Next, the gas dissolving apparatus 70 concerning Embodiment 3 is demonstrated using FIG. In the third embodiment, as a detailed configuration of the gas supply mechanism 6, a gas supply path 72, an on-off valve 74, and a check valve 76 are provided. Since other configurations are the same as those of the second embodiment, description thereof is omitted.
　気体供給路７２は、流入路４に気体を供給するための気体の流路である。気体供給路７２は例えば配管により構成される。気体供給路７２の上流側は気体の供給源（図示せず）に接続されており、気体供給路７２の下流側は流入路４に接続されている。図５に示すように、気体供給路７２はポンプ８よりも上流側の位置で流入路４に接続されている。気体供給路７２の途中には、開閉弁７４と、逆止弁７６とが設けられている。 The gas supply path 72 is a gas flow path for supplying gas to the inflow path 4. The gas supply path 72 is constituted by, for example, a pipe. The upstream side of the gas supply path 72 is connected to a gas supply source (not shown), and the downstream side of the gas supply path 72 is connected to the inflow path 4. As shown in FIG. 5, the gas supply path 72 is connected to the inflow path 4 at a position upstream of the pump 8. An opening / closing valve 74 and a check valve 76 are provided in the middle of the gas supply path 72.
　開閉弁７４は、気体供給路７２の開閉を切り替える弁（気体供給路開閉弁）である。開閉弁７４としては例えば、電磁弁あるいは電動弁が用いられる。気体供給路７２における開閉弁７４の上流側に逆止弁７６が設けられている。逆止弁７６は、気体供給路７２内の逆流を防止する弁であり、気体の供給源から流入路４に向かって流れる方向にのみ気体を流すように作用する。 The on / off valve 74 is a valve (gas supply path on / off valve) that switches between opening and closing of the gas supply path 72. As the on-off valve 74, for example, an electromagnetic valve or an electric valve is used. A check valve 76 is provided upstream of the on-off valve 74 in the gas supply path 72. The check valve 76 is a valve that prevents a back flow in the gas supply path 72, and acts to flow the gas only in the direction of flowing from the gas supply source toward the inflow path 4.
　このような構成において、制御装置６８は、ポンプ８および開閉弁６４に加えて開閉弁７４を制御する。制御装置６８によるポンプ８、開閉弁６４および開閉弁７４の制御方法の一例を図６に示す。 In such a configuration, the control device 68 controls the on-off valve 74 in addition to the pump 8 and the on-off valve 64. An example of a method for controlling the pump 8, the on-off valve 64, and the on-off valve 74 by the control device 68 is shown in FIG.
　図６に示す制御方法は、ポンプ８および開閉弁６４の制御については実施形態２と共通し、開閉弁７４の制御のみが実施形態２と相違する。以下、相違点を中心に説明する。 The control method shown in FIG. 6 is common to the second embodiment with respect to the control of the pump 8 and the on-off valve 64, and only the control of the on-off valve 74 is different from the second embodiment. Hereinafter, the difference will be mainly described.
　図６に示すように、制御装置６８は、第１運転時には開閉弁７４を開くように制御する。一方で、第２運転時には開閉弁７４を閉じるように制御する。すなわち、微細気泡を発生させる運転である第１運転時には、流入路４に気体を供給して気液混合流体を生成する。また、フロート室１６の洗浄を行う第２運転時には、流入路４に気体を供給せずにバイパス流路６２に主に液体のみを供給するようにしている。このような制御方法によれば、第１運転時には所望の量の気体を含んだ気液混合流体を溶解タンク１０に供給しつつ、第２運転時には流入路４に気体を供給しないことで、気体が含まれることによるポンプ８の圧送性能の低下を防ぐことができる。これにより、第２運転時において、バイパス流路６２へ所望の流量の液体を供給することができ、フロート室１６の洗浄をより確実に実施することができる。 As shown in FIG. 6, the control device 68 controls to open the on-off valve 74 during the first operation. On the other hand, the on-off valve 74 is controlled to be closed during the second operation. That is, in the first operation, which is an operation for generating fine bubbles, gas is supplied to the inflow passage 4 to generate a gas-liquid mixed fluid. In the second operation for cleaning the float chamber 16, only the liquid is mainly supplied to the bypass channel 62 without supplying the gas to the inflow channel 4. According to such a control method, the gas-liquid mixed fluid containing a desired amount of gas is supplied to the dissolution tank 10 during the first operation, and the gas is not supplied to the inflow passage 4 during the second operation. It is possible to prevent the pumping performance of the pump 8 from being deteriorated due to the inclusion of. Thereby, in the second operation, a liquid having a desired flow rate can be supplied to the bypass passage 62, and the float chamber 16 can be more reliably cleaned.
　上述したように、実施形態３における気体溶解装置７０は、流入路４におけるポンプ８よりも上流側の位置に気体を供給する気体供給路７２と、気体供給路７２を開閉する開閉弁である開閉弁（気体供給路開閉弁）７４とを備える。開閉弁７４は、ポンプ８が第１運転の間に開き、第２運転の間に閉じるように制御される。このような制御によれば、第１運転時には気体を混合させて気液混合流体を供給する一方で、第２運転時には気体を混合させないことで、ポンプ８による出力を上昇させることができ、バイパス流路６２を通じてより強い流れを生じさせることができる。これにより、フロート室１６を洗浄する洗浄力が向上し、気体溶解装置７０の信頼性を向上させることができる。 As described above, the gas dissolving apparatus 70 according to the third embodiment is a gas supply path 72 that supplies gas to a position upstream of the pump 8 in the inflow path 4 and an open / close valve that opens and closes the gas supply path 72. And a valve (gas supply passage opening / closing valve) 74. The on-off valve 74 is controlled so that the pump 8 opens during the first operation and closes during the second operation. According to such control, while the gas is mixed and the gas-liquid mixed fluid is supplied in the first operation, the output by the pump 8 can be increased by not mixing the gas in the second operation, and the bypass A stronger flow can be generated through the channel 62. Thereby, the detergency which cleans the float chamber 16 improves, and the reliability of the gas dissolving apparatus 70 can be improved.
　なお、上述の実施形態２、３では、バイパス流路６２を流入路４と接続する場合について説明したが、このような場合に限らず、流出路１２と接続してもよい。このような場合であっても、バイパス流路の上流側と下流側で圧力差が生じるため、バイパス流路を通じて流体を流し、フロート室１６を洗浄することができる。 In the second and third embodiments, the case where the bypass flow path 62 is connected to the inflow path 4 has been described. However, the present invention is not limited to this case, and the outflow path 12 may be connected. Even in such a case, a pressure difference is generated between the upstream side and the downstream side of the bypass flow path, so that the fluid can flow through the bypass flow path and the float chamber 16 can be washed.
　以上、実施形態１－３によれば、フロート室１６に流体の流れを生じさせるバイパス流路を形成するには、実施形態１のように、フロート室１６と溶解流路２２が連通する連通箇所とは別の箇所における溶解流路２２とフロート室１６を接続してもよい。また、実施形態２、３のように流入路４とフロート室１６とを接続する、あるいは、流出路１２とフロート室１６とを接続するようにしてもよい。 As described above, according to Embodiment 1-3, in order to form a bypass flow path that generates a flow of fluid in the float chamber 16, as in Embodiment 1, a communication location where the float chamber 16 and the dissolution flow path 22 communicate with each other. Alternatively, the dissolution channel 22 and the float chamber 16 may be connected at a different location. Further, the inflow path 4 and the float chamber 16 may be connected as in the second and third embodiments, or the outflow path 12 and the float chamber 16 may be connected.
（実施例）
　次に、本発明の実施例について、図７－図１１を用いて説明する。図７―図１１に示す実施例は、上述した実施形態１に基づく実施例である。図７、図８は、溶解タンク１０の一部分解斜視図（表側、裏側）であり、図９は、溶解タンク１０の平面図である。図１０は、図９におけるＡ－Ａ断面図であり、図１１は、図１０におけるＢ－Ｂ断面図である。 (Example)
Next, an embodiment of the present invention will be described with reference to FIGS. The examples shown in FIGS. 7 to 11 are examples based on the first embodiment described above. 7 and 8 are partially exploded perspective views (front side and back side) of the dissolution tank 10, and FIG. 9 is a plan view of the dissolution tank 10. 10 is a cross-sectional view taken along the line AA in FIG. 9, and FIG. 11 is a cross-sectional view taken along the line BB in FIG.
　図７などに示すように、実施例における溶解タンク１０では、溶解タンク１０の外壁上面にフロート室１６が設けられるとともに、フロート室１６の側壁に接触するように、接触壁７８が設けられている。接触壁７８は、図１０に示すように、溶解タンク１０内の気液混合室３６を形成する外壁上面７９の一部である。このような構成により、フロート室１６と気液混合室３６とが接触壁７８を介して隣接する。 As shown in FIG. 7 and the like, in the dissolution tank 10 in the embodiment, the float chamber 16 is provided on the upper surface of the outer wall of the dissolution tank 10, and the contact wall 78 is provided so as to contact the side wall of the float chamber 16. . As shown in FIG. 10, the contact wall 78 is a part of the outer wall upper surface 79 that forms the gas-liquid mixing chamber 36 in the dissolution tank 10. With such a configuration, the float chamber 16 and the gas-liquid mixing chamber 36 are adjacent to each other through the contact wall 78.
　なお、溶解タンク１０内の中間室３８は、図９のＡ－Ａ断面とは異なる位置に設けられているため、図１０では図示されておらず、気液混合室３６および気液分離室４０のみが図示されている。 Since the intermediate chamber 38 in the dissolution tank 10 is provided at a position different from the AA cross section of FIG. 9, it is not shown in FIG. 10, and the gas-liquid mixing chamber 36 and the gas-liquid separation chamber 40 are not shown. Only is shown.
　本実施例では、フロート室１６と接触壁７８を貫通する貫通孔が設けられている。貫通孔はフロート室１６と接触壁７８の側壁を横方向に貫通するものであり（接触壁７８を貫通してフロート室１６と気液混合室３６とを連通させる）、当該貫通孔によってバイパス流路１８が形成される。図１０では、フロート室１６内の一時的な液面８０が図示されており、バイパス流路１８は液面８０付近に設けられている。 In this embodiment, a through-hole penetrating the float chamber 16 and the contact wall 78 is provided. The through hole penetrates the float chamber 16 and the side wall of the contact wall 78 in the lateral direction (through the contact wall 78, the float chamber 16 and the gas-liquid mixing chamber 36 are communicated). A path 18 is formed. In FIG. 10, a temporary liquid level 80 in the float chamber 16 is illustrated, and the bypass channel 18 is provided in the vicinity of the liquid level 80.
　このような構成において、気液混合室３６とフロート室１６では流体の圧力差が存在し、圧力の高い気液混合室３６から圧力の低いフロート室１６への流れが生じる。これにより、バイパス流路１８を通じてフロート室１６へ気液混合流体を流し、フロート室１６内を洗浄することができる。図１０の矢印で示すように、フロート室１６内に流れ込んだ気液混合流体は、フロート２６とフロート室１６の内壁との間の空間を周方向に旋回するように流れている。 In such a configuration, there is a fluid pressure difference between the gas-liquid mixing chamber 36 and the float chamber 16, and a flow from the high-pressure gas-liquid mixing chamber 36 to the low-pressure float chamber 16 occurs. Thereby, the gas-liquid mixed fluid can be flowed to the float chamber 16 through the bypass flow path 18 and the inside of the float chamber 16 can be washed. As shown by the arrows in FIG. 10, the gas-liquid mixed fluid that has flowed into the float chamber 16 flows so as to swirl in the circumferential direction in the space between the float 26 and the inner wall of the float chamber 16.
　本実施例による気体溶解装置２によれば、溶解タンク１０における最も上流側の空間（気液混合室３６）を構成する溶解タンク１０の外壁（外壁上面７９）は、フロート室１６と接触する接触壁７８を有する。また、接触壁７８とフロート室１６を連通する貫通孔によってバイパス流路１８が形成される。このように、接触壁７８とフロート室１６を連通する貫通孔によってバイパス流路１８を形成することで、配管等の別部品を設けることなくバイパス流路１８を形成できるため、簡単な構成を採用して気体溶解装置２の製造コストを低減することができる。 According to the gas dissolving device 2 according to the present embodiment, the outer wall (outer wall upper surface 79) of the dissolving tank 10 constituting the most upstream space (gas-liquid mixing chamber 36) in the dissolving tank 10 is in contact with the float chamber 16. It has a wall 78. Further, the bypass channel 18 is formed by a through hole that communicates the contact wall 78 and the float chamber 16. In this way, the bypass channel 18 can be formed without providing other parts such as piping by forming the bypass channel 18 by the through-hole communicating with the contact wall 78 and the float chamber 16, and thus a simple configuration is adopted. Thus, the manufacturing cost of the gas dissolving device 2 can be reduced.
　以上、上述の実施形態１－３および実施例を挙げて本発明を説明したが、本発明は上述の実施形態１－３に限定されない。例えば、実施形態１－３では、バイパス流路をフロート室１６の側壁部分に接続する場合について説明したが、このような場合に限らない。フロート室１６内を洗浄するように流体を噴出できる位置であれば、任意の位置にバイパス流路を接続してもよい。なお、フロート室１６内においては、液面８０付近に汚れが最も付着しやすいため、バイパス流路をフロート室１６の側壁に接続して液面８０の近傍に流体を噴出するようにすることで、フロート室１６内をより効率的に洗浄することができる。 As mentioned above, although the present invention has been described with reference to the above-described embodiment 1-3 and examples, the present invention is not limited to the above-described embodiment 1-3. For example, in Embodiment 1-3, the case where the bypass channel is connected to the side wall portion of the float chamber 16 has been described, but the present invention is not limited to such a case. As long as the fluid can be ejected so as to clean the inside of the float chamber 16, the bypass channel may be connected to an arbitrary position. In the float chamber 16, dirt is most likely to adhere to the vicinity of the liquid surface 80. Therefore, by connecting a bypass channel to the side wall of the float chamber 16 and ejecting fluid near the liquid surface 80. The inside of the float chamber 16 can be cleaned more efficiently.
　実施形態１－３では、溶解タンク１０の内部空間が２つの仕切り壁３２、３４によって仕切られ、溶解流路２２が３つの空間（気液混合室３６、中間室３８、気液分離室４０）によって形成される場合について説明したが、このような場合に限らない。溶解タンク１０の溶解流路２２において液体に気体を溶解させることができる構成であれば、任意の構造を採用してもよい。 In Embodiment 1-3, the internal space of the dissolution tank 10 is partitioned by two partition walls 32 and 34, and the dissolution flow path 22 has three spaces (gas-liquid mixing chamber 36, intermediate chamber 38, and gas-liquid separation chamber 40). However, the present invention is not limited to such a case. Any structure may be adopted as long as the gas can be dissolved in the liquid in the dissolution flow path 22 of the dissolution tank 10.
　また実施形態１－３では、フロート室１６を溶解タンク１０の最も下流側の空間である気液分離室４０に連通するように設ける場合について説明したが、このような場合に限らず、気液混合室３６よりも下流側であれば任意の位置に設けてもよい。 In Embodiment 1-3, the case where the float chamber 16 is provided so as to communicate with the gas-liquid separation chamber 40 which is the most downstream space of the dissolution tank 10 has been described. It may be provided at an arbitrary position as long as it is downstream of the mixing chamber 36.
　また実施形態１－３では、気体が溶解した液体を減圧して微細気泡を発生させる減圧装置１４を設ける場合について説明したが、減圧装置１４を設けない場合であってもよい。すなわち、微細気泡を発生させずに、気体が溶解した液体を生成しその液体を供給する用途にも気体溶解装置は適用可能である。例えば、物体を洗浄するための洗浄液を生成する手段として、あるいは、健康用途に用いる液体などを生成する手段として、気体溶解装置を利用することもできる。 Further, in Embodiment 1-3, the case where the pressure reducing device 14 that generates a fine bubble by reducing the pressure of the liquid in which the gas is dissolved is described, but the case where the pressure reducing device 14 is not provided may be used. That is, the gas dissolving apparatus can be applied to an application for generating a liquid in which a gas is dissolved and supplying the liquid without generating fine bubbles. For example, a gas dissolving device can be used as a means for generating a cleaning liquid for cleaning an object or as a means for generating a liquid used for health use.
　なお、上記様々な実施形態のうちの任意の実施形態を適宜組み合わせることにより、それぞれの有する効果を奏するようにすることができる。 It should be noted that, by appropriately combining arbitrary embodiments of the above-described various embodiments, the effects possessed by them can be produced.
　本発明は、気体を液体に溶解させる気体溶解装置であれば適用可能である。 The present invention is applicable to any gas dissolving apparatus that dissolves gas into liquid.
　本発明は、添付図面を参照しながら好ましい実施形態に関連して充分に記載されているが、この技術の熟練した人々にとっては種々の変形や修正は明白である。そのような変形や修正は、添付した請求の範囲による本開示の範囲から外れない限りにおいて、その中に含まれると理解されるべきである。 Although the present invention has been fully described in connection with preferred embodiments with reference to the accompanying drawings, various variations and modifications will be apparent to those skilled in the art. Such changes and modifications are to be understood as included within the scope of the present disclosure as set forth in the appended claims.
（台湾は本段落なし）
　２０１６年６月１３日に出願された日本国特許出願Ｎｏ．２０１６－１１７１５２号の明細書、図面、及び特許請求の範囲の開示内容は、全体として参照されて本明細書の中に取り入れられるものである。 (Taiwan has no paragraph)
Japanese Patent Application No. 1 filed on June 13, 2016. The disclosures of the specification, drawings, and claims of 2016-117152 are hereby incorporated by reference in their entirety.

Claims (10)

  1. 　液体に気体を混合した気液混合流体を流入させる流入口と、前記流入口から流入した気液混合流体の流路であって液体に気体を溶解させる溶解流路と、気体が溶解した液体を前記溶解流路から流出させる流出口とを有する溶解タンクと、
    　前記流入口に接続され、前記溶解タンクに気液混合流体を流入させる流入路と、
    　前記流出口に接続され、気体が溶解した液体を流出させる流出路と、
    　前記溶解流路に連通し、前記溶解流路内の未溶解の気体を外部に排出するためのフロート室と、
    　前記フロート室と前記溶解流路が連通する連通箇所とは別の箇所における前記溶解流路、又は、前記流入路若しくは前記流出路と、前記フロート室とを接続するバイパス流路と、
    　を備える、気体溶解装置。     An inflow port for introducing a gas-liquid mixed fluid in which a gas is mixed with a liquid, a flow path for a gas-liquid mixed fluid flowing in from the inflow port, a dissolution channel for dissolving the gas in the liquid, and a liquid in which the gas is dissolved A dissolution tank having an outlet for flowing out of the dissolution channel;
    An inflow path connected to the inflow port and allowing a gas-liquid mixed fluid to flow into the dissolution tank;
    An outflow path connected to the outflow port for allowing the gas dissolved liquid to flow out;
    A float chamber for communicating with the dissolution channel and discharging undissolved gas in the dissolution channel to the outside;
    A bypass flow path that connects the float chamber and the dissolution flow path in a place different from the communication location where the float flow path and the dissolution flow path communicate with each other, or the inflow path or the outflow path;
    A gas dissolving device.
  2. 　前記溶解タンクの内部は、前記溶解流路を形成するように互いに連通する複数の空間によって区画されており、
    　前記バイパス流路は、前記溶解タンクにおける複数の空間のうち、最も上流側又は最も下流側の空間と前記フロート室とを接続する、請求項１に記載の気体溶解装置。     The inside of the dissolution tank is partitioned by a plurality of spaces communicating with each other so as to form the dissolution flow path,
    2. The gas dissolving device according to claim 1, wherein the bypass flow path connects the most upstream or most downstream space among the plurality of spaces in the dissolution tank and the float chamber.
  3. 　前記フロート室は、前記溶解タンクにおける前記複数の空間のうち、最も下流側の空間と連通しており、
    　前記バイパス流路は、前記溶解タンクにおける前記複数の空間のうち、最も上流側の空間と前記フロート室とを接続する、請求項２に記載の気体溶解装置。     The float chamber communicates with the most downstream space among the plurality of spaces in the dissolution tank,
    3. The gas dissolving device according to claim 2, wherein the bypass flow path connects the most upstream space of the plurality of spaces in the dissolution tank and the float chamber.
  4. 　前記溶解タンクにおける前記最も上流側の空間を構成する前記溶解タンクの外壁は、前記フロート室と接触する接触壁を有し、前記接触壁と前記フロート室を連通する貫通孔によって前記バイパス流路が形成される、請求項３に記載の気体溶解装置。 The outer wall of the dissolution tank that constitutes the most upstream space in the dissolution tank has a contact wall that contacts the float chamber, and the bypass flow path is formed by a through hole that communicates the contact wall and the float chamber. The gas dissolving device according to claim 3, which is formed.
  5. 　前記バイパス流路を開閉する開閉弁をさらに備える、請求項１から３のいずれか１つに記載の気体溶解装置。 The gas dissolving device according to any one of claims 1 to 3, further comprising an on-off valve that opens and closes the bypass flow path.
  6. 　前記流入路の途中に設けられ、前記流入口に向けて気液混合流体を送るポンプをさらに備え、
    　前記バイパス流路は、前記流入路における前記ポンプよりも下流側の位置と前記フロート室とを接続する、請求項１に記載の気体溶解装置。     A pump that is provided in the middle of the inflow path and sends a gas-liquid mixed fluid toward the inlet;
    2. The gas dissolving device according to claim 1, wherein the bypass flow path connects a position downstream of the pump in the inflow path and the float chamber.
  7. 　前記バイパス流路を開閉する開閉弁であるバイパス流路開閉弁と、
    　前記バイパス流路開閉弁および前記ポンプの運転を制御する制御装置とをさらに備え、
    　前記制御装置は、前記ポンプを、所定の回転数で運転する第１運転と、前記第１運転から前記ポンプの回転数を減少させながら停止するまで運転する第２運転とを実行するように制御し、かつ、前記バイパス流路開閉弁を、前記ポンプの前記第２運転の間に開くように制御する、請求項６に記載の気体溶解装置。     A bypass flow path opening / closing valve that is an open / close valve for opening and closing the bypass flow path;
    A controller for controlling the operation of the bypass flow path opening and closing valve and the pump,
    The control device controls the pump to perform a first operation that operates at a predetermined rotational speed and a second operation that operates from the first operation until the pump is stopped while decreasing the rotational speed of the pump. The gas dissolving device according to claim 6, wherein the bypass flow path opening / closing valve is controlled to open during the second operation of the pump.
  8. 　前記流入路における前記ポンプよりも上流側の位置に気体を供給する気体供給路と、
    　前記気体供給路を開閉する開閉弁であり、前記制御装置によって運転を制御される気体供給路開閉弁と、をさらに備え、
    　前記制御装置は、前記気体供給路開閉弁を前記ポンプの前記第１運転の間に開き、前記第２運転の間に閉じるように制御する、請求項７に記載の気体溶解装置。     A gas supply path for supplying gas to a position upstream of the pump in the inflow path;
    An on-off valve for opening and closing the gas supply path, further comprising a gas supply path on-off valve whose operation is controlled by the control device,
    The gas dissolution apparatus according to claim 7, wherein the control device controls the gas supply path opening / closing valve to be opened during the first operation of the pump and closed during the second operation.
  9. 　前記フロート室は、前記フロート室内の気体を排出する排出口と、前記排出口を開閉可能に閉じる弁体と、前記弁体に連結されたフロートとを有する、請求項１から８のいずれか１つに記載の気体溶解装置。 The said float chamber has a discharge port which discharges | emits the gas in the said float chamber, the valve body which closes the said discharge port so that opening and closing is possible, and the float connected to the said valve body, Any one of Claim 1 to 8 The gas dissolving apparatus described in 1.
  10. 　液体に溶解した気体を減圧して前記流出路において微細気泡として発生させる減圧装置をさらに備える、請求項１から９のいずれか１つに記載の気体溶解装置。 The gas dissolving device according to any one of claims 1 to 9, further comprising a decompressing device that decompresses the gas dissolved in the liquid to generate fine bubbles in the outflow path.
PCT/JP2017/018005 2016-06-13 2017-05-12 Gas dissolving apparatus WO2017217157A1 (en)

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