WO2017142184A1 - Functional optical film and transparent display device comprising same - Google Patents

Functional optical film and transparent display device comprising same Download PDF

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Publication number
WO2017142184A1
WO2017142184A1 PCT/KR2016/015183 KR2016015183W WO2017142184A1 WO 2017142184 A1 WO2017142184 A1 WO 2017142184A1 KR 2016015183 W KR2016015183 W KR 2016015183W WO 2017142184 A1 WO2017142184 A1 WO 2017142184A1
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Prior art keywords
optical film
functional
functional optical
group
base layer
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PCT/KR2016/015183
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French (fr)
Korean (ko)
Inventor
최진희
한지영
박시균
김주희
강경구
우창수
Original Assignee
삼성에스디아이 주식회사
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Priority claimed from KR1020160162319A external-priority patent/KR102027567B1/en
Application filed by 삼성에스디아이 주식회사 filed Critical 삼성에스디아이 주식회사
Publication of WO2017142184A1 publication Critical patent/WO2017142184A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/01Hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477Six-membered rings
    • C08K5/3492Triazines
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/32Holograms used as optical elements

Definitions

  • the present invention relates to a functional optical film and a transparent display device including the same.
  • Transparent displays are displays that have high transparency and are visible on the back of the screen. Recently, transparent displays have been applied to not only flat panel displays but also flexible displays that can be folded and unfolded.
  • the transparent display may adopt OLED, LCD, thin film electroluminescent (TFEL), or the like.
  • the transparent display may be used in fields such as advertisements exposed to the outside.
  • the organic light emitting diode may damage the organic light emitting material, in particular the blue light emitting material, by long-term UV exposure, thereby causing discoloration and shortening the lifespan.
  • a UV absorber is included in the polarizer to impart UV absorption.
  • a transparent display cannot use a polarizing plate. Therefore, short-wavelength ultraviolet rays that can be absorbed by the polarizing plate can reach the organic light emitting device as it is.
  • the transparent display does not have a viewing angle compensation effect against external light.
  • the problem to be solved by the present invention is to provide a functional optical film having a viewing angle compensation effect for the external light without a polarizing plate when applied to a transparent display.
  • Another object of the present invention is to provide a functional optical film capable of minimizing damage, discoloration, or shortening of life of organic light emitting devices due to low transmittance of light having a wavelength of 400 nm or less.
  • Another problem to be solved by the present invention is to provide a functional optical film that can block light with a wavelength of less than 400nm and no precipitation of UV absorbers.
  • Another object of the present invention is to provide a functional optical film that can be applied to a transparent display device, in particular a transparent organic light emitting display device.
  • the functional optical film of the present invention includes a base layer, a functional coating layer formed on one side of the base layer, and an adhesive layer formed on the other side of the base layer, and includes at least one of the base layer, the functional coating layer, and the adhesive layer. At least one includes a UV absorber, and the base layer may include a retardation film.
  • the functional optical film of the present invention includes a base layer, a pressure-sensitive adhesive layer formed on the base layer, and a functional coating layer formed on the pressure-sensitive adhesive layer, wherein at least one or more of the base layer, the pressure-sensitive adhesive layer, and the functional coating layer is a UV absorber. It includes, and the base layer may include a retardation film.
  • the transparent display device of the present invention may include the functional optical film of the present invention.
  • the present invention provides a functional optical film capable of compensating a viewing angle for external light even without a polarizing plate when applied to a transparent display.
  • the present invention provides a functional optical film capable of minimizing damage, discoloration, or shortening of life of an organic light emitting device due to low transmittance of light having a wavelength of 400 nm or less.
  • the present invention provides a functional optical film that can block light having a wavelength of 400 nm or less and is free of precipitation of a UV absorber.
  • the present invention provides a functional optical film that can be applied to a transparent display device, in particular a transparent organic light emitting display device.
  • FIG. 1 is a cross-sectional view of a functional optical film according to an embodiment of the present invention.
  • FIG. 2 is a cross-sectional view of a functional optical film according to another embodiment of the present invention.
  • FIG 3 is a partial cross-sectional view of a transparent display device according to an embodiment of the present invention.
  • (meth) acryl refers to acrylic and / or methacryl.
  • in-plane retardation (Re) may be represented by the following formula A
  • Thickness direction retardation (Rth) may be represented by the following formula B:
  • nx is the refractive index of the optical element in the x-axis direction at the measurement wavelength
  • ny is the refractive index in the y-axis direction of the optical element at the measurement wavelength
  • nz is the z-axis of the optical element at the measurement wavelength
  • d is the thickness of the optical element (unit: nm)
  • retardation film refers to a film having a Re of about 5 nm or more at a wavelength of 550 nm
  • solid content in the “solid content basis” refers to the entirety of the composition except for the solvent.
  • FIG. 1 is a cross-sectional view of a functional optical film of an embodiment of the present invention.
  • the functional optical film 100 may include a functional coating layer 120, a base layer 110, and an adhesive layer 130.
  • the base layer 110 may support the functional optical film 100.
  • the base layer 110 may include a retardation film. Therefore, the functional optical film 100 may have a predetermined phase difference.
  • the base layer 110 may work together with the functional coating layer 120 or the adhesive layer 130 may have a functional anti-reflection effect and a viewing angle compensation effect against external light.
  • the functional optical film 100 has a ratio of in-plane retardation of the following formula 1 about 0.90 to about 1.20, specifically about 0.95 to about 1.10, for example, about 0.90, 0.95, 1.00, 1.05, 1.10, 1.15, 1.20 Can be.
  • the functional optical film may have an antireflection effect and a viewing angle compensation effect against external light without a polarizing plate:
  • Ratio of in-plane retardation Re (450 nm) / Re (550 nm)
  • Re (450nm) is the in-plane retardation (unit: nm) of the functional optical film at wavelength 450nm
  • Re (550nm) is the in-plane retardation (unit: nm) of the functional optical film at a wavelength of 550nm.
  • the functional optical film 100 has Re (450 nm) and Re (550 nm) of about 125 nm to about 160 nm, specifically about 130 nm to about 155 nm, for example, about 125, 130, 135, 140, 145, 150, 155, It can be 160 nm. In the above range, there may be a viewing angle compensation effect for the external light.
  • the functional optical film 100 has a thickness direction retardation Rth of about 50 nm to about 200 nm, for example, about 50, 60, 70, 80, 90, 100, 110, 120, 130, and 140 at a wavelength of 450 nm and a wavelength of 550 nm, respectively. , 150, 160, 170, 180, 190, 200 nm. In this range, there may be a viewing angle compensation effect. Therefore, the functional optical film can be used as a viewing angle compensation film.
  • the substrate layer 110 has an in-plane retardation of about 240 nm to about 300 nm, specifically about 250 nm to about 300 nm, more specifically about 260 nm to about 280 nm, for example about 240, 241, for wavelength 550 nm incident light.
  • the substrate layer may be a ⁇ / 2 retardation film.
  • the substrate layer has an in-plane retardation of about 110 nm to about 160 nm, specifically about 130 nm to about 150 nm, for example about 110, 111, 112, 113, 114, 115, 116, 117, for wavelength 550 nm incident light.
  • the base layer may be a ⁇ / 4 retardation film.
  • the substrate layer may be a ⁇ / 2 or ⁇ / 4 retardation film.
  • the base layer 110 may be formed of an optically transparent material.
  • the base layer may be formed of an optically transparent base layer forming resin.
  • the resin for forming the base layer may be a polyester resin, a polycarbonate (PC) resin, or a poly-terephthalate (PET), a polyethylene naphthalate (PEN), a polybutylene terephthalate, a polybutylene naphthalate, or the like.
  • a poly (meth) acrylate resin a silicone resin, a cyclic olefin polymer (COP) including a mid (PI) resin, a polystyrene resin, a polyether sulfone (PES) resin, a polymethyl methacrylate, and the like It may include, but is not limited thereto.
  • the base layer 110 may further include a reinforcing material such as glass fiber to increase the strength of the base layer.
  • the base layer 110 has a thickness of about 10 ⁇ m to about 200 ⁇ m, specifically about 30 ⁇ m to about 100 ⁇ m, for example, about 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200 ⁇ m. It can be used in the functional optical film in the above range.
  • the functional coating layer 120 may be formed on one surface of the base layer 110 to provide an additional function to the functional optical film 100.
  • the functional coating layer may provide a hard coating function to increase the hardness of the functional optical film.
  • the functional coating layer 120 may be formed directly on the base layer 110.
  • the functional optical film 100 may be used as an optical film, that is, a window film, which is positioned at the outermost side of the display device.
  • the functional coating layer 120 may be formed of a composition for a functional coating layer comprising a resin having one or more crosslinkable functional groups.
  • the resin having at least one crosslinkable functional group may form a crosslinked structure to form a matrix of the functional coating layer and increase the pencil hardness of the functional optical film.
  • the functional optical film 100 may have a pencil hardness of about 4H or more, specifically about 4H to about 10H. It can be used as a window film of the transparent display device in the above range can protect the organic light emitting device from the outside.
  • crosslinkable functional group is cured by heat or light or a combination of heat and light, and includes an epoxy group, a vinyl group, a (meth) acrylamide group or the like including a (meth) acrylate group, an alicyclic epoxy group or a glycidyl group, or the like. It may include allyl groups.
  • the resin having a crosslinkable functional group may include at least one of a siloxane resin having a crosslinkable functional group and a (meth) acrylic resin having a crosslinkable functional group. These may be included alone or in combination of two or more.
  • the siloxane resin having a crosslinkable functional group is a hydrolysis and condensation reaction of an alkoxy silane having a crosslinkable functional group alone, or a mixture of alkoxy silane having a crosslinkable functional group and a heterogeneous alkoxy silane having no crosslinkable functional group. It may be prepared through, but is not limited thereto.
  • the alkoxy silane having the crosslinkable functional group may be represented by the following Chemical Formula 1
  • the heterogeneous alkoxy silane having no crosslinkable functional group may be represented by the following Chemical Formula 2. These may be included alone or in combination of two or more:
  • R 1 is a linear or branched alkyl group having 1 to 6 carbon atoms containing a crosslinkable functional group, wherein the crosslinkable functional group is a (meth) acrylate group, an alicyclic epoxy group, a glycidyl group, a vinyl group , (Meth) acrylamide group or allyl group, R 2 is a linear or branched alkyl group having 1 to 7 carbon atoms, n is an integer of 1 to 3).
  • R 3 is an unsubstituted alkyl group having 1 to 20 carbon atoms, cycloalkyl group having 3 to 8 carbon atoms, alkenyl group having 2 to 20 carbon atoms, alkynyl group having 2 to 20 carbon atoms, aryl group having 6 to 20 carbon atoms.
  • C1-C20 having a halogen, an amino group, a mercapto group, an ether group, an ester group, a carbonyl group, a carboxyl group, a nitro group, a sulfone group, an alkyd group, a carboxylic acid group, an alkyl group having 1 to 20 carbon atoms or an amino group
  • An alkyl group, R 4 is an alkyl group having 1 to 7 carbon atoms, and m is an integer of 0 to 3).
  • alkoxy silane represented by the formula (1) examples include 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane and vinyltrimethoxy Silane, vinyltriethoxysilane, vinyltripropoxysilane, N- (3-acryloxy-2-hydroxypropyl) -3-aminopropyltrimethoxysilane, N- (3-acryloxy-2-hydroxy Propyl) -3-aminopropyltriethoxysilane, N- (3-acryloxy-2-hydroxypropyl) -3-aminopropyltripropoxysilane, 3-acryloxypropylmethylbis (trimethoxy) silane, 3- (meth) acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3- (meth) acryloxypropyltripropoxysilane, 3- (meth
  • alkoxy silane represented by the formula (2) examples include tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, dimethyldimethoxysilane and dimethyldi Ethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, triphenylmethoxysilane, triphenylethoxysilane, ethyltriethoxysilane, propylethyl Trimethoxysilane, N- (aminoethyl-3-aminopropyl) trimethoxysilane, N- (2-aminoethyl-3-aminopropyl) triethoxysilane, 3-aminopropyltrimethoxysilane, 3- Amino
  • hydrolysis and condensation reactions are commonly known to those skilled in the art. Specifically, the hydrolysis and condensation reaction may be performed by mixing a organosilane having a crosslinkable functional group and an alkoxysilane group and a predetermined solvent, and may further include a catalyst to control the reaction rate.
  • the catalyst may be an acid catalyst such as hydrochloric acid, acetic acid, hydrogen fluoride, nitric acid, sulfuric acid, chlorosulfonic acid and iodic acid; Base catalysts such as ammonia, potassium hydroxide, sodium hydroxide, barium hydroxide and imidazole; Ion exchange resins such as Amberite IRA-400, IRA-67 and the like can be used.
  • the hydrolysis and condensation reaction may be performed at room temperature for about 12 hours to about 7 days, and may be performed at about 60 ° C. to about 100 ° C. for about 2 hours to about 72 hours to facilitate the reaction, but is not limited thereto.
  • the solvent in the hydrolysis and condensation reaction is not particularly limited.
  • water, methanol, ethanol, propanol, isopropanol, n-butanol, tert-butanol, methoxypropanol may be used alone or in combination of two or more thereof.
  • siloxane resin having the crosslinkable functional group may be represented by the following Chemical Formula 3:
  • R 1 is a crosslinkable functional group or a crosslinkable functional group-containing functional group
  • R 2 and R 3 are each independently hydrogen, a crosslinkable functional group, a crosslinkable functional group-containing functional group, an unsubstituted or substituted C1 to C20 alkyl group, or an unsubstituted or substituted C5 to C20 cycloalkyl group;
  • R 1 is an epoxy group or an epoxy group-containing functional group, for example, a C1 to C20 alkyl group having an epoxidized C4 to C20 cycloalkyl group, a C1 to C20 alkyl group having a glycidoxy group, more specifically an epoxycyclohexylethyl group Or a glycidoxypropyl group.
  • R 2 and R 3 may each independently be a C1 to C20 alkyl group having an epoxidized C4 to C20 cycloalkyl group, an unsubstituted C1 to C10 alkyl group, more specifically an epoxycyclohexylethyl group or a methyl group.
  • the functional coating layer is not only excellent in hardness but also excellent in flexibility and can be applied to a flexible display device.
  • the siloxane resin having a crosslinkable functional group may be a siloxane resin having an alicyclic epoxy group.
  • the siloxane resin having a crosslinkable functional group includes an alicyclic epoxy group (e.g., C1 to C20 alkyl group having epoxidized C4 to C20 cycloalkyl group or C1 to C20 alkyl group having glycidoxy group).
  • an alicyclic epoxy group e.g., C1 to C20 alkyl group having epoxidized C4 to C20 cycloalkyl group or C1 to C20 alkyl group having glycidoxy group.
  • One or more of the polysilsesquioxane resin which has, or the polysilsesquioxane resin which has a (meth) acrylate group can be included.
  • the (meth) acrylic resin having a crosslinkable functional group may include a bifunctional to 10 functional (meth) acrylate-based resin.
  • the (meth) acrylate resin may be a product synthesized or commercially available using conventional (meth) acrylic monomers known to those skilled in the art.
  • the functional coating layer composition may further include an initiator.
  • the initiator is used to cure the crosslinkable functional group, and one or more of a photocationic initiator and an optical radical initiator may be used, and these may be used alone or in combination of two or more thereof.
  • Photocationic initiators may be those known to those skilled in the art, specifically, it may be used an onium salt containing a cation and an anion.
  • diaryl such as diphenyl iodonium, 4-methoxy diphenyl iodonium, bis (4-methylphenyl) iodonium, bis (4-tert- butylphenyl) iodonium, bis (dodecylphenyl) iodonium, etc.
  • Triarylsulfoniums such as iodonium, triphenylsulfonium, diphenyl-4-thiophenoxyphenylsulfonium, and (4-tertbutylphenyl) diphenylsulfonium, bis [4- (diphenylsulfonio) Phenyl] sulfide, etc.
  • Hexafluoro Specific examples of the anionic phosphate (PF 6 -), tetrafluoroborate (BF 4 -), hexafluoroantimonate (SbF 6 -), hexafluoroantimonate are Senate (AsF 6 -), hexachloro Antimonate (SbCl 6 ⁇ ) and the like.
  • the radical photo initiator may be one known to those skilled in the art, and for example, one or more of thioxanthone, phosphorus, triazine, acetophenone, benzophenone, benzoin and oxime may be used.
  • the initiator may be included in an amount of about 0.1 parts by weight to about 10 parts by weight, specifically about 0.5 parts by weight to about 5 parts by weight, and more specifically about 1 part by weight to about 3 parts by weight, based on 100 parts by weight of the resin having a crosslinkable functional group based on a solid content.
  • Appropriate initiation, curing speed, curing rate in the above range may have a high hardness effect.
  • the functional coating layer composition may further include a crosslinkable monomer.
  • the crosslinkable monomer may be cured with a resin having a crosslinkable functional group to further increase the pencil hardness of the functional optical film.
  • the crosslinkable monomer may include a monomer having at least one of an epoxy group such as a (meth) acrylate group, an alicyclic epoxy group, a glycidyl group, and an oxetane group.
  • the crosslinkable monomer may be included in an amount of about 0.1 part by weight to about 40 parts by weight based on 100 parts by weight of the resin having a crosslinkable functional group based on solids. In the above range, there may be an effect of securing high hardness and flexibility of the functional coating layer.
  • the functional coating layer composition may further include a solvent such as methyl ethyl ketone and propylene glycol monomethyl ether for ease of coating.
  • a solvent such as methyl ethyl ketone and propylene glycol monomethyl ether for ease of coating.
  • composition for the functional coating layer may further include one or more of conventional additives known to those skilled in the art, for example, antioxidants, reaction inhibitors, adhesion enhancers, irregularity imparting agents, conductivity imparting agents, color regulators, stabilizers, antistatic agents.
  • the antistatic agent lowers the surface resistance of the functional film, and may include a material having a quaternary ammonium cation and an anion.
  • Anion include a halogen ion, HSO 4 - and the like can be, PO 4 3- -, SO 4 2-, NO 3.
  • the antistatic agent may include a quaternary ammonium cation, but may include an acrylic material containing a quaternary ammonium cation as a functional group in the molecule.
  • the additive may be included in about 0.01 parts by weight to about 10 parts by weight based on 100 parts by weight of the resin having a crosslinkable functional group.
  • the functional coating layer 120 has a thickness of about 1 ⁇ m to about 100 ⁇ m, specifically about 30 ⁇ m to about 60 ⁇ m, for example about 1, 5, 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100 ⁇ m. It can be used in the functional optical film in the above range.
  • the adhesive layer 130 is formed on the other surface of the base layer 110 to adhere the functional optical film 100 to a display element (not shown in FIG. 1), and may include a UV absorber.
  • a UV absorber to absorb and block light having a wavelength of 400 nm or less, it is possible to increase the external light stability of the display device to which the functional optical film of the present embodiment is applied.
  • the functional optical film 100 has a transmittance of about 20% or less at a wavelength of 400 nm, specifically about 0.1% to about 20%, for example, about 0.1, 0.5, 1, 1.5, 2, 2.5, 3, 3.5, 4 , 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, 10, 10.5, 11, 11.5, 12, 12.5, 13, 13.5, 14, 14.5, 15, 15.5, 16, 16.5 , 17, 17.5, 18, 18.5, 19, 19.5, 20%.
  • the functional optical film 100 has a transmittance of about 1% or less, specifically about 0.001% to about 1%, for example, about 0.001, 0.005, 0.01 or less at a wavelength of 390 nm or less, specifically, a wavelength of 380 nm to 390 nm, 380 nm or 390 nm. , 0.02, 0.03, 0.04, 0.05, 0.06, 0.07, 0.08, 0.09, 0.10, 0.15, 0.20, 0.25, 0.30, 0.35, 0.40, 0.45, 0.50, 0.55, 0.60, 0.65, 0.70, 0.75, 0.80, 0.85, 0.90 , 0.95, 1%.
  • the UV absorber may be included in about 3% to about 20% by weight of the adhesive layer 130, for example, about 4% to about 20% by weight, for example about 3, 4, 5, 6, 7 , 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20% by weight. In the above range, it is possible to increase the external light stability of the display device to which the functional optical film of the present embodiment is applied, and to prevent precipitation of white spots by including an excessive amount of the UV absorber.
  • the adhesive layer 130 may be formed of a pressure-sensitive adhesive (PSA) including a UV absorber, an adhesive layer composition such as an optical clear adhesive (OCA) including a UV absorber.
  • PSA pressure-sensitive adhesive
  • OCA optical clear adhesive
  • the pressure-sensitive adhesive layer 130 may be formed of a pressure-sensitive adhesive layer composition containing a (meth) acrylic pressure-sensitive adhesive resin, a curing agent and a UV absorber.
  • the (meth) acrylic adhesive resin has a (meth) acrylic monomer having an alkyl group, a (meth) acrylic monomer having a hydroxyl group, a (meth) acrylic monomer having an alicyclic group, a (meth) acrylic monomer having a heteroalicyclic group, and a carboxylic acid group ( It may be formed of a monomer mixture including one or more of the meth) acrylic monomers.
  • the (meth) acrylic monomer having an alkyl group may include an (meth) acrylic acid ester having an unsubstituted alkyl group having 1 to 10 carbon atoms.
  • the (meth) acrylic monomer having a hydroxyl group may include a (meth) acrylic acid ester having an alkyl group having 1 to 10 carbon atoms having at least one hydroxyl group.
  • the (meth) acrylic monomer having an alicyclic group may include a (meth) acrylic acid ester having an alicyclic group having 3 to 10 carbon atoms.
  • the (meth) acrylic monomer having a heteroalicyclic group may include a (meth) acrylic acid ester having a heterocycloaliphatic group having 3 to 10 carbon atoms having at least one of nitrogen, oxygen, or sulfur.
  • the (meth) acrylic monomer having a carboxylic acid group may include (meth) acrylic acid and the like.
  • the (meth) acrylic adhesive resin may be included in about 65% by weight to about 96% by weight in the composition for a solid-based adhesive layer, for example, about 80% to about 90% by weight, for example about 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96% by weight may be included. In the above range, there may be an effect of showing the optical properties such as the appropriate transmittance color and the appropriate adhesive force.
  • the curing agent may include at least one of an isocyanate curing agent, an epoxy curing agent, an imide curing agent, and a metal chelate curing agent, and these may be used alone or in combination of two or more kinds.
  • the curing agent is about 0.1% to about 15% by weight of the composition for the adhesive layer based on solid content, for example, about 0.1, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, It may be included in 14, 15% by weight. It is possible to secure the adhesive strength and appropriate modulus of the pressure-sensitive adhesive in the above range.
  • UV absorbers have an absorbance of about 0.20 AU or more, specifically about 0.20 AU to about 1.0 AU, about 0.40 AU to about 1.0 AU, for example about 0.20, for light at a wavelength of 380 nm for a concentration of 20 mg / L in toluene (path 1 cm). UV absorbers of 0.30, 0.40, 0.50, 0.60, 0.70, 0.80, 0.90, 1.0AU can be used. In the above range, the external light stability of the display device may be improved by sufficiently absorbing light at wavelengths of 380 nm to 400 nm and reducing the transmittance.
  • the UV absorber may be triazine-based, triazole-based, benzotriazole-based, indole-based, etc. More specifically, trade names Tinuvin 477 (triazine-based), Tinuvin 384 (benzotriazole-based), Tinuvin 326 (benzotriazole-based) Or it may include one or more of the dye BONASORB UA-3912 (Indole). The 'absorbance' can be measured by conventional methods known to those skilled in the art. UV absorbers may be included alone or in combination of two or more. The UV absorber may be included in about 3% by weight to about 20% by weight of the solids of the composition for the adhesive layer.
  • the adhesive layer composition may further include a silane coupling agent.
  • the silane coupling agent may improve physical properties such as modulus by increasing the degree of crosslinking of the adhesive layer.
  • the silane coupling agent may use a conventionally known silane coupling agent.
  • the silane coupling agent may contain epoxy structures such as 3-glycidoxyoxytrimethoxysilane, 3-glycidoxyoxymethyldimethoxysilane and 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane.
  • the silane coupling agent may be included in about 0.1 wt% to about 5 wt%, specifically about 0.1 wt% to about 1 wt%, based on the solids in the composition for the adhesive layer. It is possible to secure an appropriate modulus of the pressure-sensitive adhesive in the above range.
  • the adhesive layer 130 may have a thickness of about 1 ⁇ m to about 50 ⁇ m, specifically about 10 ⁇ m to about 30 ⁇ m. It can be used for the film for display in the above range.
  • the above-described UV absorber may be included in the functional coating layer 120 or the base layer 110. That is, at least one or more layers of the adhesive layer 130, the substrate layer 110, and the functional coating layer 120 may include the above-described UV absorber. In this case, the UV absorber may be included in about 0.1% to about 5% by weight, for example, about 0.1% to about 3% by weight of the functional coating layer 120. When the UV absorber is included in the base layer 110, the UV absorber may be included in about 3 wt% to about 20 wt% of the base layer 110, for example, about 3.0 wt% to about 15 wt%, About 4% to about 15% by weight. In the above range, it is possible to increase the external light stability of the display device to which the functional optical film of the present embodiment is applied.
  • FIG. 2 is a cross-sectional view of a functional optical film according to another embodiment of the present invention.
  • the functional optical film 200 is a functional optical film according to an embodiment of the present invention except that the adhesive layer 130 is formed between the base layer 110 and the functional coating layer 120. Substantially the same as 100).
  • the transparent display device of the embodiment of the present invention may include the film for display of the embodiments of the present invention.
  • the transparent display device may include a transparent organic light emitting display device including a flexible transparent organic light emitting display device, but is not limited thereto.
  • FIG. 3 is a cross-sectional view of a transparent display device according to an embodiment of the present invention.
  • the transparent organic light emitting diode display 300 includes a lower substrate 310, a buffer layer 331, thin film transistors 321 and 322, a gate insulating layer 332, and an interlayer insulating layer 333. And an over coating layer 334, reflective layers 345 and 346, anodes 341 and 342, bank layers 335, organic light emitting layers 350, cathodes 360, encapsulation 370, and upper substrate 380.
  • the substrate 380 may include a functional optical film of embodiments of the present invention. Therefore, the transparent display device 300 according to the present exemplary embodiment may compensate for a viewing angle with respect to external light without a polarizing plate, and may minimize damage, discoloration, or shortening of life of the organic light emitting diode.
  • the lower substrate 310 supports the transparent display device 300 and may be formed of transparent glass or a material having transparent flexibility, for example, silicon, polyimide, polycarbonate, polyacrylate, or the like.
  • the buffer layer 331 is formed on the lower substrate 310 to prevent penetration of external moisture and / or impurities through the lower substrate 310, and may be formed of a transparent material and may be omitted.
  • the thin film transistors 321 and 322 drive an organic light emitting device, and an active layer formed on the buffer layer 331, a gate electrode formed on the gate insulating layer 332, and a source electrode and a drain formed on the interlayer insulating layer 333, respectively. An electrode.
  • the overcoat layer 334 is formed on the thin film transistors 321 and 322 to planarize the lower substrate 310. Reflective layers 345 and 346 are formed on the overcoating layer 334 to increase light efficiency by reflecting light emitted from the organic emission layer 350 upwards.
  • an organic light emitting device including anodes 341 and 342, an organic light emitting layer 350, and a cathode 360 is formed to emit light.
  • An encapsulation portion 370 sealing the organic light emitting element is formed on the cathode 360.
  • the upper substrate 380 may be formed on the encapsulation 370 to protect the transparent display device 300.
  • a color filter may be formed on the lower surface of the upper substrate 380 to convert white light formed from the organic light emitting diode into red, green, or blue, respectively.
  • the bank layer 335 may divide a light emitting area into a red, green, or blue light emitting area.
  • the prepared adhesive layer composition was applied to one surface of a release film PET (polyethylene terephthalate) film (MRF38, Mitchibishi Co., Ltd.), and dried at 80 ° C. for 3 minutes to prepare a coating film for a pressure-sensitive adhesive layer having a thickness of 25 ⁇ m.
  • a release film PET polyethylene terephthalate film
  • MRF38 polyethylene terephthalate film
  • a silsesquioxane resin-containing solution having a cycloaliphatic epoxy functional group Solips, Epoxy Hybrimer, solid content of 90% by weight
  • 23 g of methyl ethyl ketone as a diluent were mixed to prepare a composition for a functional coating layer.
  • PC film (RM, Teijin, Re is 148 nm at a wavelength of 550 nm, and no UV absorber is included) as a base layer.
  • composition for the functional coating layer prepared above on one surface of the substrate layer and dried for 30 minutes at 100 °C, exposed to ultraviolet light of 1000mJ / cm 2 , to form a coating layer of 50 ⁇ m thickness, 24 hours in an 80 °C oven For a while.
  • the coating film for the pressure-sensitive adhesive layer prepared to remove the release film and left for 48 hours at a constant temperature and humidity of 30 °C and 75% relative humidity to prepare a functional film.
  • Example 1 the functional optical film in the same manner, except that a COP (cyclic olefin polymer) film (ZM16-138, Zeon, Re is 138nm at a wavelength of 550nm, does not include a UV absorber) as the substrate layer was prepared.
  • a COP (cyclic olefin polymer) film ZM16-138, Zeon, Re is 138nm at a wavelength of 550nm, does not include a UV absorber
  • Example 1 a functional optical film was prepared in the same manner except that a PC film (WRS-148, TEIJIN Co., Re is 135 nm at a wavelength of 550 nm and no UV absorber was included) was used as the base layer.
  • a PC film (WRS-148, TEIJIN Co., Re is 135 nm at a wavelength of 550 nm and no UV absorber was included) was used as the base layer.
  • UV absorber Tinuvin 384 (Basf) 2.4 g, with absorbance of 0.2 AU at a wavelength of 380 nm for a concentration of 20 mg / L of toluene (path 1 cm), 2.4 g of an indole dye BONASORB UA-3912 (orient chemical) (absorbance of 0.4 AU at a wavelength of 380 nm with respect to toluene 20 mg / L concentration (path 1 cm) absorbing UV region) was mixed to prepare an adhesive layer composition.
  • the prepared adhesive layer composition was applied to one surface of a release film PET (polyethylene terephthalate) film (MRF38, Mitchibishi Co., Ltd.), and dried at 80 ° C. for 3 minutes to prepare a coating film for a pressure-sensitive adhesive layer having a thickness of 25 ⁇ m.
  • a silsesquioxane resin having a cycloaliphatic epoxy functional group Solips, Epoxy Hybrimer, solid content of 90% by weight
  • 23 g of methyl ethyl ketone as a diluent were mixed to prepare a composition for a functional coating layer.
  • composition for the functional coating layer prepared on one side of the polycarbonate (PC) film (RM, Teijin, Re, 148nm at a wavelength of 550nm, does not include UV absorbers), and dried for 30 minutes at 100 °C And a coating layer having a thickness of 50 ⁇ m was formed by exposure to ultraviolet light of 1000 mJ / cm 2 and maintained in an 80 ° C. oven for 24 hours.
  • the coating film for the pressure-sensitive adhesive layer prepared to remove the release film and left for 48 hours at a constant temperature and humidity of 30 °C and 75% relative humidity to prepare a functional film.
  • Example 4 In Example 4, 4.8 g of indole dye BONASORB UA-3912, which absorbs the UV region instead of the UV absorber, A functional optical film was manufactured in the same manner except that Tingvin 384 2.4g was used.
  • a functional optical film was prepared in the same manner as in Example 4, except that the functional coating layer composition prepared above was used as the functional coating layer composition.
  • a functional optical film was manufactured in the same manner as in Example 5, except that the functional coating layer composition prepared above was used as the functional coating layer composition.
  • Example 1 using a PET film (Teijin-Dupon, KEL86W) as the substrate layer, and absorbance at a wavelength of 380nm for Tinuvin 326 (BASF) (toluene 20mg / L concentration (path 1cm) in place of Tinuvin 477 in the adhesive layer composition)
  • the functional optical film was prepared in the same manner except that 0.35AU) was used as the content of Table 1 below.
  • Wavelength Transmittance at 380 nm, 390 nm, and 400 nm The transmittance of each wavelength was measured using a Lambda 1050 UV spectRemeter (Perkin Elmer) for a functional optical film at a wavelength of 300 nm to 800 nm.
  • Retardation (Re) at wavelength 550 nm and 450 nm of functional optical film Re (550 nm) and Re (450 nm) of Re of functional optical film were measured at wavelengths of 550 nm and 450 nm using Axoscan (Axometric). .
  • Ratio of in-plane retardation (Re (450 nm) / Re (550 nm)) of the functional optical film Using Re (450 nm) and Re (550 nm) of (2), it was calculated according to Equation 1 above.
  • Pencil hardness Measured on the functional optical film.
  • the functional coating layer in the functional optical film was measured by a JIS K5400 method using a pencil hardness tester (Heidon).
  • Heidon a pencil hardness tester
  • Mitsubishi's 6B to 9H pencil was used, and the load of the pencil on the coating layer was 1 kg, the angle at which the pencil was drawn at 45 °, and the speed at which the pencil was drawn at 60 mm / min.
  • Pencil Hardness It was measured using a pencil below. If there were no scratches in all five evaluations, the hardness was determined as the pencil hardness.
  • One 2 UV absorber containing layer Adhesive layer Adhesive layer Adhesive layer Adhesive layer Adhesive layer Adhesive layer Adhesive layer Adhesive layer Adhesive layer Adhesive layer Substrate layer Adhesive layer First UV absorber Tinuvin477 Tinuvin477 Tinuvin477 BONASORB UA-3912 BONASORB UA-3912 BONASORB UA-3912 BONASORB UA-3912 Tinuvin 384 Tinuvin 326
  • First UV absorber content in the adhesive layer (wt%) 13.58 13.58 13.58 6.87 12.85 6.87 12.85 0 7.0
  • the functional optical film of the present invention can significantly reduce the transmittance for light having a wavelength of 400nm, 390nm, 380nm to ensure external light stability of the display device.
  • the functional optical film of the present invention by securing a ratio of 0.90 to 1.20 of the in-plane retardation, it is possible to implement a viewing angle compensation effect for external light without a polarizing plate.
  • Comparative Examples 1 and 2 in which the base layer is not a retardation film, had a problem in that the in-plane retardation ratio fell out of the level of 0.90 to 1.20, resulting in poor display sharpness.

Abstract

Provided are a functional optical film and a transparent display device comprising same, the functional optical film comprising: a base layer; a functional coating layer formed on one side of the base layer; and an adhesive layer formed on the other side of the base layer, wherein one or more of the base layer, the functional coating layer and the adhesive layer comprises a UV absorbing agent and the base layer comprises a phase difference film.

Description

기능성 광학필름 및 이를 포함하는 투명 디스플레이 장치Functional optical film and transparent display device including the same
본 발명은 기능성 광학필름 및 이를 포함하는 투명 디스플레이 장치에 관한 것이다.The present invention relates to a functional optical film and a transparent display device including the same.
투명 디스플레이는 디스플레이의 투과도가 높고 화면 뒷면도 보이는 디스플레이이다. 최근에는 평판 디스플레이뿐만 아니라 접고 펼 수 있는 플렉시블(flexible) 디스플레이에도 투명 디스플레이를 적용하고 있다. 투명 디스플레이는 OLED, LCD, TFEL(thin film electroluminescent) 등을 채용할 수 있다.Transparent displays are displays that have high transparency and are visible on the back of the screen. Recently, transparent displays have been applied to not only flat panel displays but also flexible displays that can be folded and unfolded. The transparent display may adopt OLED, LCD, thin film electroluminescent (TFEL), or the like.
투명 디스플레이는 외부에 노출되는 광고 등의 분야에서 사용될 수 있다. 유기발광소자는 장기적인 UV 노출에 의해 유기 발광 물질 특히 청색 발광 물질이 손상되어 변색이 일어날 수 있고 수명이 짧아질 수 있다. 기존의 디스플레이에서는 편광판에 UV 흡수제를 포함시켜 UV 흡수 기능을 부여하였다. 그러나, 투명 디스플레이는 편광판을 사용할 수 없다. 따라서, 기존 편광판에서 흡수될 수 있었던 단파장의 자외선들이 유기발광소자에까지 그대로 도달할 수 있다. 또한, 투명 디스플레이는 외광에 대한 시야각 보상 효과를 갖지 못하게 된다.The transparent display may be used in fields such as advertisements exposed to the outside. The organic light emitting diode may damage the organic light emitting material, in particular the blue light emitting material, by long-term UV exposure, thereby causing discoloration and shortening the lifespan. In the conventional display, a UV absorber is included in the polarizer to impart UV absorption. However, a transparent display cannot use a polarizing plate. Therefore, short-wavelength ultraviolet rays that can be absorbed by the polarizing plate can reach the organic light emitting device as it is. In addition, the transparent display does not have a viewing angle compensation effect against external light.
본 발명의 배경기술은 일본공개특허 제2011-145593호에 개시되어 있다.Background art of the present invention is disclosed in Japanese Patent Laid-Open No. 2011-145593.
본 발명이 해결하고자 하는 과제는 투명 디스플레이에 적용시 편광판 없이도 외광에 대한 시야각 보상 효과가 있는 기능성 광학필름을 제공하는 것이다.The problem to be solved by the present invention is to provide a functional optical film having a viewing angle compensation effect for the external light without a polarizing plate when applied to a transparent display.
본 발명이 해결하고자 하는 다른 과제는 파장 400nm 이하의 광에 대한 투과율이 낮아서 유기발광소자의 손상, 변색 또는 수명 단축을 최소화할 수 있는 기능성 광학필름을 제공하는 것이다.Another object of the present invention is to provide a functional optical film capable of minimizing damage, discoloration, or shortening of life of organic light emitting devices due to low transmittance of light having a wavelength of 400 nm or less.
본 발명이 해결하고자 하는 또 다른 과제는 파장 400nm 이하의 광을 차단할 수 있고 UV 흡수제의 석출이 없는 기능성 광학필름을 제공하는 것이다.Another problem to be solved by the present invention is to provide a functional optical film that can block light with a wavelength of less than 400nm and no precipitation of UV absorbers.
본 발명이 해결하고자 하는 또 다른 과제는 본 발명은 투명 디스플레이 장치 특히 투명 유기발광소자 디스플레이 장치에 적용할 수 있는 기능성 광학필름을 제공하는 것이다.Another object of the present invention is to provide a functional optical film that can be applied to a transparent display device, in particular a transparent organic light emitting display device.
본 발명의 기능성 광학필름은 기재층, 상기 기재층의 일면 상에 형성된 기능성 코팅층, 및 상기 기재층의 타면 상에 형성된 점착층을 포함하고, 상기 기재층, 상기 기능성 코팅층, 및 상기 점착층 중 적어도 하나 이상은 UV 흡수제를 포함하고, 상기 기재층은 위상차필름을 포함할 수 있다.The functional optical film of the present invention includes a base layer, a functional coating layer formed on one side of the base layer, and an adhesive layer formed on the other side of the base layer, and includes at least one of the base layer, the functional coating layer, and the adhesive layer. At least one includes a UV absorber, and the base layer may include a retardation film.
본 발명의 기능성 광학필름은 기재층, 상기 기재층 상에 형성된 점착층, 및 상기 점착층 상에 형성된 기능성 코팅층을 포함하고, 상기 기재층, 상기 점착층, 상기 기능성 코팅층 중 적어도 하나 이상은 UV 흡수제를 포함하고, 상기 기재층은 위상차필름을 포함할 수 있다.The functional optical film of the present invention includes a base layer, a pressure-sensitive adhesive layer formed on the base layer, and a functional coating layer formed on the pressure-sensitive adhesive layer, wherein at least one or more of the base layer, the pressure-sensitive adhesive layer, and the functional coating layer is a UV absorber. It includes, and the base layer may include a retardation film.
본 발명의 투명 디스플레이 장치는 본 발명의 기능성 광학필름을 포함할 수 있다.The transparent display device of the present invention may include the functional optical film of the present invention.
본 발명은 투명 디스플레이에 적용시 편광판 없이도 외광에 대한 시야각을 보상할 수 있는 기능성 광학필름을 제공하였다.The present invention provides a functional optical film capable of compensating a viewing angle for external light even without a polarizing plate when applied to a transparent display.
본 발명은 파장 400nm 이하의 광에 대한 투과율이 낮아서 유기발광소자의 손상, 변색 또는 수명 단축을 최소화할 수 있는 기능성 광학필름을 제공하였다.The present invention provides a functional optical film capable of minimizing damage, discoloration, or shortening of life of an organic light emitting device due to low transmittance of light having a wavelength of 400 nm or less.
본 발명은 파장 400nm 이하의 광을 차단할 수 있고 UV 흡수제의 석출이 없는 기능성 광학필름을 제공하였다.The present invention provides a functional optical film that can block light having a wavelength of 400 nm or less and is free of precipitation of a UV absorber.
본 발명은 투명 디스플레이 장치 특히 투명 유기발광소자 디스플레이 장치에 적용할 수 있는 기능성 광학필름을 제공하였다.The present invention provides a functional optical film that can be applied to a transparent display device, in particular a transparent organic light emitting display device.
도 1은 본 발명의 일 실시예에 따른 기능성 광학필름의 단면도이다.1 is a cross-sectional view of a functional optical film according to an embodiment of the present invention.
도 2는 본 발명의 다른 실시예에 따른 기능성 광학필름의 단면도이다.2 is a cross-sectional view of a functional optical film according to another embodiment of the present invention.
도 3은 본 발명의 일 실시예에 따른 투명 디스플레이 장치의 일부 단면도이다.3 is a partial cross-sectional view of a transparent display device according to an embodiment of the present invention.
첨부한 도면을 참고하여 실시예에 대하여 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다. 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다. 도면에서 본 발명을 명확하게 설명하기 위해서 설명과 관계없는 부분은 생략하였으며, 명세서 전체를 통하여 동일 또는 유사한 구성 요소에 대해서는 동일한 도면 부호를 붙였다.DETAILED DESCRIPTION Hereinafter, exemplary embodiments will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. The drawings and description are to be regarded as illustrative in nature and not restrictive. Like reference numerals designate like elements throughout the specification.
본 명세서에서 "상부"와 "하부"는 도면을 기준으로 정의한 것으로서, 시 관점에 따라 "상부"가 "하부"로 "하부"가 "상부"로 변경될 수 있고, "위(on)" 또는 "상(on)"으로 지칭되는 것은 바로 위뿐만 아니라 중간에 다른 구조를 개재한 경우도 포함할 수 있다. 반면, "직접 위(directly on)" 또는 "바로 위" 또는 "직접적으로 형성"으로 지칭되는 것은 중간에 다른 구조를 개재하지 않은 것을 의미한다.In the present specification, "upper" and "lower" are defined based on the drawings, and according to a viewpoint, "upper" may be changed to "lower" and "lower" to "upper", and "on" or What is referred to as “on” may include not only the above but also intervening other structures in the middle. On the other hand, what is referred to as "directly on" or "directly on" or "directly formed" means not intervening in the other structures.
본 명세서에서 "(메트)아크릴"은 아크릴 및/또는 메타아크릴을 의미한다.As used herein, "(meth) acryl" refers to acrylic and / or methacryl.
본 명세서에서 "면내 위상차(Re)"는 하기 식 A로 표시될 수 있고, "두께 방향 위상차(Rth)"는 하기 식 B로 표시될 수 있다:In the present specification, the "in-plane retardation (Re)" may be represented by the following formula A, and the "thickness direction retardation (Rth)" may be represented by the following formula B:
<식 A><Formula A>
Re = (nx - ny) x dRe = (nx-ny) x d
<식 B><Formula B>
Rth = ((nx + ny)/2 - nz) x dRth = ((nx + ny) / 2-nz) x d
(상기 식 A와 식 B 에서, nx는 측정 파장에서 해당 광학 소자의 x축 방향의 굴절률, ny는 측정 파장에서 해당 광학소자의 y축 방향의 굴절률, nz는 측정 파장에서 해당 광학소자의 z축 방향의 굴절률, d는 해당 광학소자의 두께(단위:nm)) 상기 광학 소자가 기능성 광학필름인 경우, 기능성 광학필름의 x축, y축 및 z축의 방향은 각각 기능성 광학필름 중 기재층의 x축, y축 및 z축 방향과 동일 방향이다.(Wherein nx is the refractive index of the optical element in the x-axis direction at the measurement wavelength, ny is the refractive index in the y-axis direction of the optical element at the measurement wavelength, nz is the z-axis of the optical element at the measurement wavelength Direction refractive index, d is the thickness of the optical element (unit: nm)) When the optical element is a functional optical film, the directions of the x-axis, y-axis and z-axis of the functional optical film are x of the base layer of the functional optical film, respectively. It is the same direction as the axial, y-axis and z-axis directions.
본 명세서에서 "위상차필름"은 파장 550nm에서 Re가 약 5nm 이상인 필름을 의미하고, "고형분 기준"에서 "고형분"은 조성물 중 용매를 제외한 나머지 전체를 의미한다.As used herein, "retardation film" refers to a film having a Re of about 5 nm or more at a wavelength of 550 nm, and "solid content" in the "solid content basis" refers to the entirety of the composition except for the solvent.
이하, 도 1을 참고하여 본 발명의 일 실시예의 기능성 광학필름을 설명한다. 도 1은 본 발명의 일 실시예의 기능성 광학필름의 단면도이다.Hereinafter, a functional optical film of an embodiment of the present invention will be described with reference to FIG. 1. 1 is a cross-sectional view of a functional optical film of an embodiment of the present invention.
도 1을 참고하면, 본 실시예에 따른 기능성 광학필름(100)은 기능성 코팅층(120), 기재층(110), 점착층(130)을 포함할 수 있다.Referring to FIG. 1, the functional optical film 100 according to the present exemplary embodiment may include a functional coating layer 120, a base layer 110, and an adhesive layer 130.
기재층(110)은 기능성 광학필름(100)을 지지할 수 있다. The base layer 110 may support the functional optical film 100.
기재층(110)은 위상차필름을 포함할 수 있다. 따라서, 기능성 광학필름(100)은 소정의 위상차를 가질 수 있다. 또한, 기재층(110)은 기능성 코팅층(120) 또는 점착층(130)과 함께 작용함으로써 기능성 광학필름이 외광에 대한 반사방지 효과 및 시야각 보상 효과가 있을 수 있다. 구체적으로, 기능성 광학필름(100)은 하기 식 1의 면내 위상차의 비가 약 0.90 내지 약 1.20, 구체적으로 약 0.95 내지 약 1.10, 예를 들면 약 0.90, 0.95, 1.00, 1.05, 1.10, 1.15, 1.20이 될 수 있다. 상기 범위에서, 기능성 광학필름은 편광판 없이도 외광에 대한 반사방지 효과와 시야각 보상 효과가 있을 수 있다:The base layer 110 may include a retardation film. Therefore, the functional optical film 100 may have a predetermined phase difference. In addition, the base layer 110 may work together with the functional coating layer 120 or the adhesive layer 130 may have a functional anti-reflection effect and a viewing angle compensation effect against external light. Specifically, the functional optical film 100 has a ratio of in-plane retardation of the following formula 1 about 0.90 to about 1.20, specifically about 0.95 to about 1.10, for example, about 0.90, 0.95, 1.00, 1.05, 1.10, 1.15, 1.20 Can be. In the above range, the functional optical film may have an antireflection effect and a viewing angle compensation effect against external light without a polarizing plate:
<식 1><Equation 1>
면내 위상차의 비 = Re(450nm) / Re(550nm)Ratio of in-plane retardation = Re (450 nm) / Re (550 nm)
(상기 식 1에서, Re(450nm)는 파장 450nm에서 기능성 광학필름의 면내 위상차(단위:nm)이고, Re(550nm)는 파장 550nm에서 기능성 광학필름의 면내 위상차(단위:nm)이다). 기능성 광학필름(100)은 Re(450nm) 및 Re(550nm)가 각각 약 125nm 내지 약 160nm, 구체적으로 약 130nm 내지 약 155nm, 예를 들면 약 125, 130, 135, 140, 145, 150, 155, 160nm가 될 수 있다. 상기 범위에서, 외광에 대한 시야각 보상 효과가 있을 수 있다. 또한, 기능성 광학필름(100)은 파장 450nm 및 파장 550nm에서 두께 방향 위상차 Rth가 각각 약 50nm 내지 약 200nm, 예를 들면 약 50, 60, 70, 80, 90, 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200nm일 수 있다. 상기 범위에서, 시야각 보상 효과가 있을 수 있다. 따라서, 기능성 광학필름은 시야각 보상용 필름으로 사용될 수 있다.(In Formula 1, Re (450nm) is the in-plane retardation (unit: nm) of the functional optical film at wavelength 450nm, Re (550nm) is the in-plane retardation (unit: nm) of the functional optical film at a wavelength of 550nm. The functional optical film 100 has Re (450 nm) and Re (550 nm) of about 125 nm to about 160 nm, specifically about 130 nm to about 155 nm, for example, about 125, 130, 135, 140, 145, 150, 155, It can be 160 nm. In the above range, there may be a viewing angle compensation effect for the external light. In addition, the functional optical film 100 has a thickness direction retardation Rth of about 50 nm to about 200 nm, for example, about 50, 60, 70, 80, 90, 100, 110, 120, 130, and 140 at a wavelength of 450 nm and a wavelength of 550 nm, respectively. , 150, 160, 170, 180, 190, 200 nm. In this range, there may be a viewing angle compensation effect. Therefore, the functional optical film can be used as a viewing angle compensation film.
일 구체예에서, 기재층(110)은 파장 550nm 입사광에 대해 면내 위상차가 약 240nm 내지 약 300nm, 구체적으로 약 250nm 내지 약 300nm, 더 구체적으로 약 260nm 내지 약 280nm, 예를 들면 약 240, 241, 242, 243, 244, 245, 246, 247, 248, 249, 250, 251, 252, 253, 254, 255, 256, 257, 258, 259, 260, 261, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276, 277, 278, 279, 280, 281, 282, 283, 284, 285, 286, 287, 288, 289, 290, 291, 292, 293, 294, 295, 296, 297, 298, 299, 300nm인 위상차필름이 될 수 있다. 예를 들면 기재층은 λ/2 위상차필름이 될 수 있다. 다른 구체예에서, 기재층은 파장 550nm 입사광에 대해 면내 위상차가 약 110nm 내지 약 160nm, 구체적으로 약 130nm 내지 약 150nm, 예를 들면 약 110, 111, 112, 113, 114, 115, 116, 117, 118, 119, 120, 121, 122, 123, 124, 125, 126, 127, 128, 129, 130, 131, 132, 133, 134, 135, 136, 137, 138, 139, 140, 141, 142, 143, 144, 145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158, 159, 160nm인 위상차필름이 될 수 있다. 예를 들면 기재층은 λ/4 위상차필름이 될 수 있다. 바람직하게는 기재층은 λ/2 또는 λ/4 위상차필름이 될 수 있다.In one embodiment, the substrate layer 110 has an in-plane retardation of about 240 nm to about 300 nm, specifically about 250 nm to about 300 nm, more specifically about 260 nm to about 280 nm, for example about 240, 241, for wavelength 550 nm incident light. 242, 243, 244, 245, 246, 247, 248, 249, 250, 251, 252, 253, 254, 255, 256, 257, 258, 259, 260, 261, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276, 277, 278, 279, 280, 281, 282, 283, 284, 285, 286, 287, 288, 289, 290, 291, 292, 293, 294, 295, 296, 297, 298, 299, and 300 nm. For example, the substrate layer may be a λ / 2 retardation film. In other embodiments, the substrate layer has an in-plane retardation of about 110 nm to about 160 nm, specifically about 130 nm to about 150 nm, for example about 110, 111, 112, 113, 114, 115, 116, 117, for wavelength 550 nm incident light. 118, 119, 120, 121, 122, 123, 124, 125, 126, 127, 128, 129, 130, 131, 132, 133, 134, 135, 136, 137, 138, 139, 140, 141, 142, 143, 144, 145, 146, 147, 148, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158, 159, 160 nm. For example, the base layer may be a λ / 4 retardation film. Preferably, the substrate layer may be a λ / 2 or λ / 4 retardation film.
기재층(110)은 광학적으로 투명한 소재로 형성될 수 있다. 구체적으로, 기재층은 광학적으로 투명한 기재층 형성용 수지로 형성될 수 있다. 더 구체적으로, 기재층 형성용 수지는 폴리에틸렌테레프탈레이트(PET), 폴리에틸렌나프탈레이트(PEN), 폴리부틸렌테레프탈레이트, 폴리부틸렌나프탈레이트 등을 포함하는 폴리에스테르 수지, 폴리카보네이트(PC) 수지, 폴리이미드(PI) 수지, 폴리스티렌 수지, 폴리에테르술폰(PES) 수지, 폴리메틸메타아크릴레이트 등을 포함하는 폴리(메트)아크릴레이트 수지, 실리콘(silicone) 수지, 시클릭올레핀폴리머(COP) 중 하나 이상을 포함할 수 있지만, 이에 제한되지 않는다. The base layer 110 may be formed of an optically transparent material. Specifically, the base layer may be formed of an optically transparent base layer forming resin. More specifically, the resin for forming the base layer may be a polyester resin, a polycarbonate (PC) resin, or a poly-terephthalate (PET), a polyethylene naphthalate (PEN), a polybutylene terephthalate, a polybutylene naphthalate, or the like. At least one of a poly (meth) acrylate resin, a silicone resin, a cyclic olefin polymer (COP) including a mid (PI) resin, a polystyrene resin, a polyether sulfone (PES) resin, a polymethyl methacrylate, and the like It may include, but is not limited thereto.
기재층(110) 내에는 유리 섬유(glass fiber) 등의 보강재가 더 포함되어 기재층의 강도를 높일 수도 있다. The base layer 110 may further include a reinforcing material such as glass fiber to increase the strength of the base layer.
기재층(110)은 두께가 약 10㎛ 내지 약 200㎛, 구체적으로 약 30㎛ 내지 약 100㎛, 예를 들면 약 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200㎛가 될 수 있다. 상기 범위에서 기능성 광학필름에 사용될 수 있다.The base layer 110 has a thickness of about 10 μm to about 200 μm, specifically about 30 μm to about 100 μm, for example, about 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200 μm. It can be used in the functional optical film in the above range.
기능성 코팅층(120)은 기재층(110)의 일면에 형성되어, 기능성 광학필름(100)에 추가적인 기능을 제공할 수 있다. 예를 들면, 기능성 코팅층은 하드코팅 기능을 제공하여 기능성 광학필름의 경도를 높일 수 있다. 기능성 코팅층(120)은 기재층(110)에 직접적으로 형성될 수 있다. 구체적으로, 기능성 코팅층(120)은 하드코팅 기능을 제공함으로써, 기능성 광학필름(100)은 디스플레이 장치의 최 외곽에 위치되는 광학필름 즉 윈도우 필름으로 사용될 수 있다. The functional coating layer 120 may be formed on one surface of the base layer 110 to provide an additional function to the functional optical film 100. For example, the functional coating layer may provide a hard coating function to increase the hardness of the functional optical film. The functional coating layer 120 may be formed directly on the base layer 110. Specifically, since the functional coating layer 120 provides a hard coating function, the functional optical film 100 may be used as an optical film, that is, a window film, which is positioned at the outermost side of the display device.
일 구체예에서, 기능성 코팅층(120)은 하나 이상의 가교성 작용기를 갖는 수지를 포함하는 기능성 코팅층용 조성물로 형성될 수 있다. 하나 이상의 가교성 작용기를 갖는 수지는 가교 구조를 이루어 기능성 코팅층의 매트릭스를 형성하고 기능성 광학필름의 연필경도를 높일 수 있다. 구체적으로 기능성 광학필름(100)은 연필경도가 약 4H 이상 구체적으로 약 4H 내지 약 10H가 될 수 있다. 상기 범위에서 투명 디스플레이 장치의 윈도우 필름으로 사용되어 유기발광소자를 외부로부터 보호할 수 있다. 상기 "가교성 작용기"는 열 또는 광 또는 열과 광의 조합에 의해 경화되는 것으로, (메트)아크릴레이트기, 지환식 에폭시기 또는 글리시딜기 등을 포함하는 에폭시기, 비닐기, (메트)아크릴아마이드기 또는 알릴기를 포함할 수 있다.In one embodiment, the functional coating layer 120 may be formed of a composition for a functional coating layer comprising a resin having one or more crosslinkable functional groups. The resin having at least one crosslinkable functional group may form a crosslinked structure to form a matrix of the functional coating layer and increase the pencil hardness of the functional optical film. Specifically, the functional optical film 100 may have a pencil hardness of about 4H or more, specifically about 4H to about 10H. It can be used as a window film of the transparent display device in the above range can protect the organic light emitting device from the outside. The "crosslinkable functional group" is cured by heat or light or a combination of heat and light, and includes an epoxy group, a vinyl group, a (meth) acrylamide group or the like including a (meth) acrylate group, an alicyclic epoxy group or a glycidyl group, or the like. It may include allyl groups.
예를 들어, 상기 가교성 작용기를 갖는 수지는 가교성 작용기를 갖는 실록산 수지, 가교성 작용기를 갖는 (메트)아크릴계 수지 중 하나 이상을 포함할 수 있다. 이들은 단독 또는 2종 이상 혼합하여 포함될 수 있다. For example, the resin having a crosslinkable functional group may include at least one of a siloxane resin having a crosslinkable functional group and a (meth) acrylic resin having a crosslinkable functional group. These may be included alone or in combination of two or more.
일 구체예에서, 상기 가교성 작용기를 갖는 실록산 수지는 가교성 작용기를 갖는 알콕시 실란 단독, 또는 가교성 작용기를 갖는 알콕시 실란과 가교성 작용기를 갖지 않는 이종의 알콕시 실란의 혼합물의 가수분해 및 축합 반응을 통해 제조될 수 있으나 이에 제한되는 것은 아니다. 상기 가교성 작용기를 갖는 알콕시 실란은 하기 화학식 1, 상기 가교성 작용기를 갖지 않는 이종의 알콕시 실란은 하기 화학식 2로 표시될 수 있다. 이들은 단독 또는 2종 이상 혼합하여 포함될 수 있다:In one embodiment, the siloxane resin having a crosslinkable functional group is a hydrolysis and condensation reaction of an alkoxy silane having a crosslinkable functional group alone, or a mixture of alkoxy silane having a crosslinkable functional group and a heterogeneous alkoxy silane having no crosslinkable functional group. It may be prepared through, but is not limited thereto. The alkoxy silane having the crosslinkable functional group may be represented by the following Chemical Formula 1, and the heterogeneous alkoxy silane having no crosslinkable functional group may be represented by the following Chemical Formula 2. These may be included alone or in combination of two or more:
<화학식 1><Formula 1>
R1 nSi(OR2)4 -n R 1 n Si (OR 2 ) 4 -n
(상기 화학식 1에서, R1은 가교성 작용기를 포함하는 선형 또는 분지형의 탄소수 1 내지 6의 알킬기이고, 상기 가교성 작용기는 (메트)아크릴레이트기, 지환식 에폭시기, 글리시딜기, 비닐기, (메트)아크릴아마이드기 또는 알릴기를 포함하고, R2는 선형 또는 분지형의 탄소수 1 내지 7의 알킬기이고, n은 1 내지 3의 정수이다).(In Formula 1, R 1 is a linear or branched alkyl group having 1 to 6 carbon atoms containing a crosslinkable functional group, wherein the crosslinkable functional group is a (meth) acrylate group, an alicyclic epoxy group, a glycidyl group, a vinyl group , (Meth) acrylamide group or allyl group, R 2 is a linear or branched alkyl group having 1 to 7 carbon atoms, n is an integer of 1 to 3).
<화학식 2><Formula 2>
R3 mSi(OR4)4 -m R 3 m Si (OR 4 ) 4 -m
(상기 화학식 2에서, R3 는 비치환된 탄소수 1 내지 20의 알킬기, 탄소수 3 내지 8의 사이클로알킬기, 탄소수 2 내지 20의 알케닐기, 탄소수 2 내지 20의 알키닐기, 탄소수 6 내지 20의 아릴기, 할로겐, 아미노기, 머캅토기, 에테르기, 에스테르기, 카르보닐기, 카르복실기, 나이트로기, 술폰기, 알키드기, 카르복시산기, 할로겐을 갖는 탄소수1 내지 20의 알킬기, 또는 아미노기를 갖는 탄소수1 내지 20의 알킬기이고, R4 는 탄소수 1 내지 7의 알킬기이고, m은 0 내지 3의 정수이다).(In Formula 2, R 3 is an unsubstituted alkyl group having 1 to 20 carbon atoms, cycloalkyl group having 3 to 8 carbon atoms, alkenyl group having 2 to 20 carbon atoms, alkynyl group having 2 to 20 carbon atoms, aryl group having 6 to 20 carbon atoms. C1-C20 having a halogen, an amino group, a mercapto group, an ether group, an ester group, a carbonyl group, a carboxyl group, a nitro group, a sulfone group, an alkyd group, a carboxylic acid group, an alkyl group having 1 to 20 carbon atoms or an amino group An alkyl group, R 4 is an alkyl group having 1 to 7 carbon atoms, and m is an integer of 0 to 3).
상기 화학식 1로 표시되는 알콕시 실란의 예로는, 2-(3,4-에폭시사이클로헥실)에틸트리메톡시실란, 2-(3,4-에폭시사이클로헥실)에틸트리에톡시실란, 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리프로폭시실란, N-(3-아크릴옥시-2-하이드록시프로필)-3-아미노프로필트리메톡시실란, N-(3-아크릴옥시-2-하이드록시프로필)-3-아미노프로필트리에톡시실란, N-(3-아크릴옥시-2-하이드록시프로필)-3-아미노프로필트리프로폭시실란, 3-아크릴옥시프로필메틸비스(트리메톡시)실란, 3-(메트)아크릴옥시프로필트리메톡시실란, 3-아크릴옥시프로필트리에톡시실란, 3-(메트)아크릴옥시프로필트리프로폭시실란, 3-(메트)아크릴옥시프로필트리메톡시실란, 3-(메트)아크릴옥시프로필트리에톡시실란, 3-(메트)아크릴옥시프로필트리프로폭시실란 등이 있으며 이에 제한되지 않는다.Examples of the alkoxy silane represented by the formula (1) include 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane and vinyltrimethoxy Silane, vinyltriethoxysilane, vinyltripropoxysilane, N- (3-acryloxy-2-hydroxypropyl) -3-aminopropyltrimethoxysilane, N- (3-acryloxy-2-hydroxy Propyl) -3-aminopropyltriethoxysilane, N- (3-acryloxy-2-hydroxypropyl) -3-aminopropyltripropoxysilane, 3-acryloxypropylmethylbis (trimethoxy) silane, 3- (meth) acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxysilane, 3- (meth) acryloxypropyltripropoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3 -(Meth) acryloxypropyltriethoxysilane, 3- (meth) acryloxypropyltripropoxysilane, and the like, but not limited thereto. No.
상기 화학식 2로 표시되는 알콕시 실란의 예로는, 테트라메톡시실란, 테트라에톡시실란, 메틸트리메톡시실란, 메틸트리에톡시실란, 메틸트리프로폭시실란, 다이메틸다이메톡시실란, 다이메틸다이에톡시실란, 페닐트리메톡시실란, 페닐트리에톡시실란, 다이페닐다이메톡시실란, 다이페닐다이에톡시실란, 트리페닐메톡시실란, 트리페닐에톡시실란, 에틸트리에톡시실란, 프로필에틸트리메톡시실란, N-(아미노에틸-3-아미노프로필)트리메톡시실란, N-(2-아미노에틸-3-아미노프로필)트리에톡시실란, 3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 클로로프로필트리메톡시실란, 클로로프로필트리에톡시실란, 헵타데카플루오르데실트리메톡시실란 등이 있으며 이에 제한되지 않는다.Examples of the alkoxy silane represented by the formula (2) include tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, dimethyldimethoxysilane and dimethyldi Ethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, triphenylmethoxysilane, triphenylethoxysilane, ethyltriethoxysilane, propylethyl Trimethoxysilane, N- (aminoethyl-3-aminopropyl) trimethoxysilane, N- (2-aminoethyl-3-aminopropyl) triethoxysilane, 3-aminopropyltrimethoxysilane, 3- Aminopropyltriethoxysilane, chloropropyltrimethoxysilane, chloropropyltriethoxysilane, heptadecafluorodecyltrimethoxysilane, and the like.
가수분해 및 축합반응은 당업자에게 통상적으로 알려져있다. 구체적으로, 가수분해 및 축합반응은 가교성 작용기와 알콕시실란기를 갖는 오르가노실란과 소정의 용제를 혼합하여 수행될 수 있는데, 반응 속도를 조절하기 위해 촉매를 더 포함할 수도 있다. 촉매는 염산, 아세트산, 불화수소, 질산, 황산, 클로로술폰산, 요오드산 등의 산 촉매; 암모니아, 수산화칼륨, 수산화나트륨, 수산화바륨, 이미다졸 등의 염기 촉매; Amberite IRA-400, IRA-67등의 이온 교환 수지 등이 사용될 수 있다. 가수분해 및 축합반응은 상온에서는 약 12시간 내지 약 7일 정도 수행될 수 있고, 반응을 촉진하기 위해서는 약 60℃ 내지 약 100℃에서 약 2시간 내지 약 72시간 수행될 수 있지만, 이에 제한되지 않는다. 가수분해 및 축합 반응시 용제는 특별히 제한되지 않는데, 예를 들면 물, 메탄올, 에탄올, 프로판올, 이소프로판올, n-부탄올, 터트-부탄올, 메톡시프로판올 단독 또는 2종 이상 혼합하여 사용할 수 있다. Hydrolysis and condensation reactions are commonly known to those skilled in the art. Specifically, the hydrolysis and condensation reaction may be performed by mixing a organosilane having a crosslinkable functional group and an alkoxysilane group and a predetermined solvent, and may further include a catalyst to control the reaction rate. The catalyst may be an acid catalyst such as hydrochloric acid, acetic acid, hydrogen fluoride, nitric acid, sulfuric acid, chlorosulfonic acid and iodic acid; Base catalysts such as ammonia, potassium hydroxide, sodium hydroxide, barium hydroxide and imidazole; Ion exchange resins such as Amberite IRA-400, IRA-67 and the like can be used. The hydrolysis and condensation reaction may be performed at room temperature for about 12 hours to about 7 days, and may be performed at about 60 ° C. to about 100 ° C. for about 2 hours to about 72 hours to facilitate the reaction, but is not limited thereto. . The solvent in the hydrolysis and condensation reaction is not particularly limited. For example, water, methanol, ethanol, propanol, isopropanol, n-butanol, tert-butanol, methoxypropanol may be used alone or in combination of two or more thereof.
다른 구체예에서, 상기 가교성 작용기를 갖는 실록산 수지는 하기 화학식 3로 표시될 수 있다:In another embodiment, the siloxane resin having the crosslinkable functional group may be represented by the following Chemical Formula 3:
<화학식 3><Formula 3>
(R1SiO3/2)x(R2R3SiO2/2)y(R4R5R6SiO1/2)z(SiO4/2)w (R 1 SiO 3/2) x ( R 2 R 3 SiO 2/2) y (R 4 R 5 R 6 SiO 1/2) z (SiO 4/2) w
(상기 화학식 3에서, R1은 가교성 작용기 또는 가교성 작용기 함유 작용기; (In Formula 3, R 1 is a crosslinkable functional group or a crosslinkable functional group-containing functional group;
R2 및 R3은 각각 독립적으로, 수소, 가교성 작용기, 가교성 작용기 함유 작용기, 비치환 또는 치환된 C1 내지 C20의 알킬기, 또는 비치환 또는 치환된 C5 내지 C20의 시클로알킬기; R4, R5 및 R6은 각각 독립적으로, 수소, 가교성 작용기, 가교성 작용기 함유 작용기, 비치환 또는 치환된 C1 내지 C20의 알킬기, 비치환 또는 치환된 C5 내지 C20의 시클로알킬기, 또는 비치환 또는 치환된 C6 내지 C30의 아릴기; 0<x≤1, 0≤y<1, 0≤z<1, 0≤w<1, x+y+z+w=1)일 수 있다.R 2 and R 3 are each independently hydrogen, a crosslinkable functional group, a crosslinkable functional group-containing functional group, an unsubstituted or substituted C1 to C20 alkyl group, or an unsubstituted or substituted C5 to C20 cycloalkyl group; R 4 , R 5 and R 6 are each independently hydrogen, a crosslinkable functional group, a crosslinkable functional group-containing functional group, an unsubstituted or substituted C1 to C20 alkyl group, an unsubstituted or substituted C5 to C20 cycloalkyl group, or non- Ring or substituted C6 to C30 aryl group; 0 <x ≦ 1, 0 ≦ y <1, 0 ≦ z <1, 0 ≦ w <1, and x + y + z + w = 1).
구체적으로, R1은 에폭시기 또는 에폭시기 함유 작용기, 예를 들면 에폭시화된 C4 내지 C20의 시클로알킬기를 갖는 C1 내지 C20의 알킬기, 글리시독시기를 갖는 C1 내지 C20의 알킬기, 더 구체적으로 에폭시시클로헥실에틸기 또는 글리시독시프로필기일 수 있다. R2 및 R3은 각각 독립적으로 에폭시화된 C4 내지 C20의 시클로알킬기를 갖는 C1 내지 C20의 알킬기, 비치환된 C1 내지 C10의 알킬기, 더 구체적으로 에폭시시클로헥실에틸기 또는 메틸기가 될 수 있다. 이 경우, 기능성 코팅층은 경도가 우수할 뿐만아니라 유연성이 우수하여 플렉서블 디스플레이 장치에 적용될 수 있다.Specifically, R 1 is an epoxy group or an epoxy group-containing functional group, for example, a C1 to C20 alkyl group having an epoxidized C4 to C20 cycloalkyl group, a C1 to C20 alkyl group having a glycidoxy group, more specifically an epoxycyclohexylethyl group Or a glycidoxypropyl group. R 2 and R 3 may each independently be a C1 to C20 alkyl group having an epoxidized C4 to C20 cycloalkyl group, an unsubstituted C1 to C10 alkyl group, more specifically an epoxycyclohexylethyl group or a methyl group. In this case, the functional coating layer is not only excellent in hardness but also excellent in flexibility and can be applied to a flexible display device.
바람직하게는, 상기 가교성 작용기를 갖는 실록산 수지는 지환식 에폭시기를 갖는 실록산 수지일 수 있다.Preferably, the siloxane resin having a crosslinkable functional group may be a siloxane resin having an alicyclic epoxy group.
또 다른 구체예에서, 상기 가교성 작용기를 갖는 실록산 수지는 지환식 에폭시기(예: 에폭시화된 C4 내지 C20의 시클로알킬기를 갖는 C1 내지 C20의 알킬기 또는 글리시독시기를 갖는 C1 내지 C20의 알킬기)를 갖는 폴리실세스퀴옥산 수지, 또는 (메트)아크릴레이트기를 갖는 폴리실세스퀴옥산 수지 중 하나 이상을 포함할 수 있다.In another embodiment, the siloxane resin having a crosslinkable functional group includes an alicyclic epoxy group (e.g., C1 to C20 alkyl group having epoxidized C4 to C20 cycloalkyl group or C1 to C20 alkyl group having glycidoxy group). One or more of the polysilsesquioxane resin which has, or the polysilsesquioxane resin which has a (meth) acrylate group can be included.
일 구체예에서, 가교성 작용기를 갖는 (메트)아크릴계 수지는 2관능 내지 10관능의 (메트)아크릴레이트계 수지를 포함할 수 있다. (메트)아크릴레이트계 수지는 당업자에게 알려진 통상의 (메트)아크릴계 단량체를 사용하여 합성하거나 상업적으로 판매되는 상품을 이용할 수 있다.In one embodiment, the (meth) acrylic resin having a crosslinkable functional group may include a bifunctional to 10 functional (meth) acrylate-based resin. The (meth) acrylate resin may be a product synthesized or commercially available using conventional (meth) acrylic monomers known to those skilled in the art.
기능성 코팅층용 조성물은 개시제를 더 포함할 수 있다. 개시제는 가교성 작용기를 경화시키는 것으로, 광양이온 개시제, 광라디칼 개시제 중 하나 이상을 사용할 수 있고, 이들은 단독 또는 2종 이상 혼합하여 사용될 수 있다. 광양이온 개시제는 당업자에게 통상적으로 알려진 것을 사용할 수 있는데, 구체적으로 양이온과 음이온을 포함하는 오늄염을 사용할 수 있다. 양이온의 구체예로서는 디페닐요오드늄, 4-메톡시디페닐요오드늄, 비스(4-메틸페닐)요오드늄, 비스(4-터트-부틸페닐)요오드늄, 비스(도데실페닐)요오드늄 등의 디아릴요오드늄, 트리페닐술포늄, 디페닐-4-티오페녹시페닐술포늄, (4-터트부틸페닐)디페닐술포늄 등의 트리아릴술포늄, 비스[4-(디페닐술포니오)페닐]술피드 등을 들 수 있다. 음이온의 구체예로서는 헥사플루오로포스페이트(PF6 -), 테트라플루오로보레이트(BF4 -), 헥사플루오로안티모네이트(SbF6 -), 헥사플루오로아르세네이트(AsF6 -), 헥사클로로안티모네이트(SbCl6 -) 등을 들 수 있다. 광라디칼 개시제는 당업자에게 통상적으로 알려진 것을 사용할 수 있는데, 예를 들면 티오크산톤계, 인계, 트리아진계, 아세토페논계, 벤조페논계, 벤조인계, 옥심계 중 하나 이상을 사용할 수 있다. 개시제는 고형분 기준 가교성 작용기를 갖는 수지 100중량부에 대해 약 0.1중량부 내지 약 10중량부, 구체적으로 약 0.5 중량부 내지 약 5중량부, 보다 구체적으로 약 1 중량부 내지 약 3 중량부로 포함될 수 있다. 상기 범위에서 적절한 개시 및 경화 속도, 경화율을 나타내어 고경도 효과가 있을 수 있다.The functional coating layer composition may further include an initiator. The initiator is used to cure the crosslinkable functional group, and one or more of a photocationic initiator and an optical radical initiator may be used, and these may be used alone or in combination of two or more thereof. Photocationic initiators may be those known to those skilled in the art, specifically, it may be used an onium salt containing a cation and an anion. As a specific example of a cation, diaryl, such as diphenyl iodonium, 4-methoxy diphenyl iodonium, bis (4-methylphenyl) iodonium, bis (4-tert- butylphenyl) iodonium, bis (dodecylphenyl) iodonium, etc. Triarylsulfoniums such as iodonium, triphenylsulfonium, diphenyl-4-thiophenoxyphenylsulfonium, and (4-tertbutylphenyl) diphenylsulfonium, bis [4- (diphenylsulfonio) Phenyl] sulfide, etc. are mentioned. Hexafluoro Specific examples of the anionic phosphate (PF 6 -), tetrafluoroborate (BF 4 -), hexafluoroantimonate (SbF 6 -), hexafluoroantimonate are Senate (AsF 6 -), hexachloro Antimonate (SbCl 6 ) and the like. The radical photo initiator may be one known to those skilled in the art, and for example, one or more of thioxanthone, phosphorus, triazine, acetophenone, benzophenone, benzoin and oxime may be used. The initiator may be included in an amount of about 0.1 parts by weight to about 10 parts by weight, specifically about 0.5 parts by weight to about 5 parts by weight, and more specifically about 1 part by weight to about 3 parts by weight, based on 100 parts by weight of the resin having a crosslinkable functional group based on a solid content. Can be. Appropriate initiation, curing speed, curing rate in the above range may have a high hardness effect.
기능성 코팅층용 조성물은 가교성 모노머를 더 포함할 수 있다.The functional coating layer composition may further include a crosslinkable monomer.
가교성 모노머는 가교성 작용기를 갖는 수지와 경화되어 기능성 광학필름의 연필경도를 더 높일 수 있다. 가교성 모노머는 (메트)아크릴레이트기, 지환식 에폭시기, 글리시딜기 등의 에폭시기, 옥세탄기 중 하나 이상을 갖는 모노머를 포함할 수 있다. 가교성 모노머는 고형분 기준 가교성 작용기를 갖는 수지 100중량부에 대해 약 0.1중량부 내지 약 40중량부로 포함될 수 있다. 상기 범위에서 기능성 코팅층의 고경도 발현 및 유연성 확보 효과가 있을 수 있다.The crosslinkable monomer may be cured with a resin having a crosslinkable functional group to further increase the pencil hardness of the functional optical film. The crosslinkable monomer may include a monomer having at least one of an epoxy group such as a (meth) acrylate group, an alicyclic epoxy group, a glycidyl group, and an oxetane group. The crosslinkable monomer may be included in an amount of about 0.1 part by weight to about 40 parts by weight based on 100 parts by weight of the resin having a crosslinkable functional group based on solids. In the above range, there may be an effect of securing high hardness and flexibility of the functional coating layer.
기능성 코팅층용 조성물은 코팅 용이성을 위해 메틸에틸케톤, 프로필렌글리콜 모노메틸 에테르 등의 용매를 더 포함할 수 있다.The functional coating layer composition may further include a solvent such as methyl ethyl ketone and propylene glycol monomethyl ether for ease of coating.
기능성 코팅층용 조성물은 당업자들에게 알려진 통상의 첨가제 예를 들면 산화 방지제, 반응 억제제, 접착성 향상제, 요번성 부여제, 도전성 부여제, 색소 조정제, 안정화제, 대전방지제 중 하나 이상을 더 포함할 수 있다. 예를 들면, 대전방지제는 기능성 필름의 표면 저항을 낮추는 것으로, 4급 암모늄 양이온과 음이온을 구비하는 재료를 포함할 수 있다. 음이온으로는 할로겐 이온, HSO4 -, SO4 2-, NO3 -, PO4 3- 등이 될 수 있다. 대전방지제는 4급 암모늄 양이온을 포함할 수도 있으나, 4급 암모늄 양이온을 관능기로서 분자 내에 포함하는 아크릴계 재료를 포함할 수 있다. 첨가제는 가교성 작용기를 갖는 수지 100중량부에 대해 약 0.01중량부 내지 약 10중량부로 포함될 수 있다. The composition for the functional coating layer may further include one or more of conventional additives known to those skilled in the art, for example, antioxidants, reaction inhibitors, adhesion enhancers, irregularity imparting agents, conductivity imparting agents, color regulators, stabilizers, antistatic agents. have. For example, the antistatic agent lowers the surface resistance of the functional film, and may include a material having a quaternary ammonium cation and an anion. Anion include a halogen ion, HSO 4 - and the like can be, PO 4 3- -, SO 4 2-, NO 3. The antistatic agent may include a quaternary ammonium cation, but may include an acrylic material containing a quaternary ammonium cation as a functional group in the molecule. The additive may be included in about 0.01 parts by weight to about 10 parts by weight based on 100 parts by weight of the resin having a crosslinkable functional group.
기능성 코팅층(120)은 두께가 약 1㎛ 내지 약 100㎛, 구체적으로 약 30㎛ 내지 약 60㎛, 예를 들면 약 1, 5, 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100㎛가 될 수 있다. 상기 범위에서 기능성 광학필름에 사용될 수 있다.The functional coating layer 120 has a thickness of about 1 μm to about 100 μm, specifically about 30 μm to about 60 μm, for example about 1, 5, 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100 μm. It can be used in the functional optical film in the above range.
점착층(130)은 기재층(110)의 타면에 형성되어, 기능성 광학필름(100)을 디스플레이 소자(도 1에서 도시되지 않음)에 점착시키는 것으로, UV 흡수제를 포함할 수 있다. UV 흡수제를 포함함으로써 파장 400nm 이하의 광을 흡수 및 차단함으로써 본 실시예의 기능성 광학필름이 적용되는 디스플레이 장치의 외광 안정성을 높일 수 있다.The adhesive layer 130 is formed on the other surface of the base layer 110 to adhere the functional optical film 100 to a display element (not shown in FIG. 1), and may include a UV absorber. By including a UV absorber to absorb and block light having a wavelength of 400 nm or less, it is possible to increase the external light stability of the display device to which the functional optical film of the present embodiment is applied.
따라서, 기능성 광학필름(100)은 파장 400nm에서 투과율이 약 20% 이하, 구체적으로 약 0.1% 내지 약 20%, 예를 들면 약 0.1, 0.5, 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, 10, 10.5, 11, 11.5, 12, 12.5, 13, 13.5, 14, 14.5, 15, 15.5, 16, 16.5, 17, 17.5, 18, 18.5, 19, 19.5, 20%가 될 수 있다. 또한, 기능성 광학필름(100)은 파장 390nm 이하, 구체적으로 파장 380nm 내지 390nm, 380nm 또는 390nm에서 투과율이 약 1% 이하, 구체적으로 약 0.001% 내지 약 1%, 예를 들면 약 0.001, 0.005, 0.01, 0.02, 0.03, 0.04, 0.05, 0.06, 0.07, 0.08, 0.09, 0.10, 0.15, 0.20, 0.25, 0.30, 0.35, 0.40, 0.45, 0.50, 0.55, 0.60, 0.65, 0.70, 0.75, 0.80, 0.85, 0.90, 0.95, 1% 가 될 수 있다. 상기 범위에서 기능성 광학필름의 하부에 형성되는 각종 디스플레이 소자 예를 들면 유기발광소자 등의 외광 안정성을 높일 수 있다. 특히, 기능성 광학필름이 투명 OLED 디스플레이에 사용되는 경우 외광에 의한 청색 발광물질의 손상을 충분히 막을 수 있다.Thus, the functional optical film 100 has a transmittance of about 20% or less at a wavelength of 400 nm, specifically about 0.1% to about 20%, for example, about 0.1, 0.5, 1, 1.5, 2, 2.5, 3, 3.5, 4 , 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, 10, 10.5, 11, 11.5, 12, 12.5, 13, 13.5, 14, 14.5, 15, 15.5, 16, 16.5 , 17, 17.5, 18, 18.5, 19, 19.5, 20%. In addition, the functional optical film 100 has a transmittance of about 1% or less, specifically about 0.001% to about 1%, for example, about 0.001, 0.005, 0.01 or less at a wavelength of 390 nm or less, specifically, a wavelength of 380 nm to 390 nm, 380 nm or 390 nm. , 0.02, 0.03, 0.04, 0.05, 0.06, 0.07, 0.08, 0.09, 0.10, 0.15, 0.20, 0.25, 0.30, 0.35, 0.40, 0.45, 0.50, 0.55, 0.60, 0.65, 0.70, 0.75, 0.80, 0.85, 0.90 , 0.95, 1%. In the above range, it is possible to increase external light stability of various display devices, for example, organic light emitting devices, which are formed under the functional optical film. In particular, when the functional optical film is used in a transparent OLED display, it is possible to sufficiently prevent the damage of the blue light emitting material by external light.
UV 흡수제는 점착층(130) 중 약 3중량% 내지 약 20중량%로 포함될 수 있으며, 예를 들어, 약 4중량% 내지 약 20중량%, 예를 들면 약 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20중량%로 포함될 수 있다. 상기 범위에서, 본 실시예의 기능성 광학필름이 적용되는 디스플레이 장치의 외광 안정성을 높일 수 있고 UV 흡수제가 과량 포함되어 백색의 반점으로 석출되는 것을 막을 수 있다.The UV absorber may be included in about 3% to about 20% by weight of the adhesive layer 130, for example, about 4% to about 20% by weight, for example about 3, 4, 5, 6, 7 , 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20% by weight. In the above range, it is possible to increase the external light stability of the display device to which the functional optical film of the present embodiment is applied, and to prevent precipitation of white spots by including an excessive amount of the UV absorber.
점착층(130)은 UV 흡수제를 포함하는 감압 점착제(PSA, pressure sensitive adhesive), UV 흡수제를 포함하는 OCA(optical clear adhesive) 등의 점착층용 조성물로 형성될 수 있다. 구체적으로, 점착층(130)은 (메트)아크릴계 점착 수지, 경화제 및 UV 흡수제를 포함하는 점착층용 조성물로 형성될 수 있다.The adhesive layer 130 may be formed of a pressure-sensitive adhesive (PSA) including a UV absorber, an adhesive layer composition such as an optical clear adhesive (OCA) including a UV absorber. Specifically, the pressure-sensitive adhesive layer 130 may be formed of a pressure-sensitive adhesive layer composition containing a (meth) acrylic pressure-sensitive adhesive resin, a curing agent and a UV absorber.
(메트)아크릴계 점착 수지는 알킬기를 갖는 (메트)아크릴계 단량체, 수산기를 갖는 (메트)아크릴계 단량체, 지환족기를 갖는 (메트)아크릴계 단량체, 헤테로지환족기를 갖는 (메트)아크릴계 단량체, 카르복시산기를 갖는 (메트)아크릴계 단량체 중 하나 이상을 포함하는 단량체 혼합물로 형성될 수 있다.The (meth) acrylic adhesive resin has a (meth) acrylic monomer having an alkyl group, a (meth) acrylic monomer having a hydroxyl group, a (meth) acrylic monomer having an alicyclic group, a (meth) acrylic monomer having a heteroalicyclic group, and a carboxylic acid group ( It may be formed of a monomer mixture including one or more of the meth) acrylic monomers.
알킬기를 갖는 (메트)아크릴계 단량체는 비치환된 탄소수 1 내지 10의 알킬기를 갖는 (메트)아크릴산 에스테르를 포함할 수 있다. 수산기를 갖는 (메트)아크릴계 단량체는 1개 이상의 수산기를 갖는 탄소수 1 내지 10의 알킬기를 갖는 (메트)아크릴산 에스테르를 포함할 수 있다. 지환족기를 갖는 (메트)아크릴계 단량체는 탄소수 3 내지 10의 지환족기를 갖는 (메트)아크릴산 에스테르를 포함할 수 있다. 헤테로지환족기를 갖는 (메트)아크릴계 단량체는 질소, 산소, 또는 황 중 하나 이상을 갖는 탄소수 3 내지 10의 헤테로지환족기를 갖는 (메트)아크릴산 에스테르를 포함할 수 있다. 카르복시산기를 갖는 (메트)아크릴계 단량체는 (메트)아크릴산 등을 포함할 수 있다. (메트)아크릴계 점착 수지는 고형분 기준 점착층용 조성물 중 약 65중량% 내지 약 96중량%로 포함될 수 있고, 예를 들어 약 80 중량% 내지 약 90중량%, 예를 들면 약 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96중량%로 포함될 수 있다. 상기 범위에서 적절한 투과도 color 등의 광학특성과 적절한 점착력을 나타내는 효과가 있을 수 있다.The (meth) acrylic monomer having an alkyl group may include an (meth) acrylic acid ester having an unsubstituted alkyl group having 1 to 10 carbon atoms. The (meth) acrylic monomer having a hydroxyl group may include a (meth) acrylic acid ester having an alkyl group having 1 to 10 carbon atoms having at least one hydroxyl group. The (meth) acrylic monomer having an alicyclic group may include a (meth) acrylic acid ester having an alicyclic group having 3 to 10 carbon atoms. The (meth) acrylic monomer having a heteroalicyclic group may include a (meth) acrylic acid ester having a heterocycloaliphatic group having 3 to 10 carbon atoms having at least one of nitrogen, oxygen, or sulfur. The (meth) acrylic monomer having a carboxylic acid group may include (meth) acrylic acid and the like. The (meth) acrylic adhesive resin may be included in about 65% by weight to about 96% by weight in the composition for a solid-based adhesive layer, for example, about 80% to about 90% by weight, for example about 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96% by weight may be included. In the above range, there may be an effect of showing the optical properties such as the appropriate transmittance color and the appropriate adhesive force.
경화제는 이소시아네이트계 경화제, 에폭시계 경화제, 이미드계 경화제, 금속 킬레이트 경화제 중 하나 이상을 포함할 수 있고, 이들은 단독 또는 2종 이상 혼합하여 사용될 수 있다. 경화제는 고형분 기준 점착층용 조성물 중 약 0.1중량% 내지 약 15중량%, 예를 들면 약 0.1, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15중량%로 포함될 수 있다. 상기 범위에서 점착제의 점착력 및 적절한 모듈러스를 확보할 수 있다.The curing agent may include at least one of an isocyanate curing agent, an epoxy curing agent, an imide curing agent, and a metal chelate curing agent, and these may be used alone or in combination of two or more kinds. The curing agent is about 0.1% to about 15% by weight of the composition for the adhesive layer based on solid content, for example, about 0.1, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, It may be included in 14, 15% by weight. It is possible to secure the adhesive strength and appropriate modulus of the pressure-sensitive adhesive in the above range.
UV 흡수제는 톨루엔 중 20mg/L 농도에 대해(path 1cm) 파장 380nm의 광에 대한 흡광도가 약 0.20AU 이상 구체적으로 약 0.20AU 내지 약 1.0AU, 약 0.40AU 내지 약 1.0AU, 예를 들면 약 0.20, 0.30, 0.40, 0.50, 0.60, 0.70, 0.80, 0.90, 1.0AU인 UV 흡수제를 사용할 수 있다. 상기 범위에서 외광 중 파장 380nm 내지 400nm에서의 빛을 충분히 흡수하여 투과율을 낮춤으로써 디스플레이 소자의 외광 안정성을 높일 수 있다. 구체적으로, UV 흡수제는 트리아진계, 트리아졸계, 벤조트리아졸계, 인돌계 등을 사용할 수 있고, 더 구체적으로 상품명 Tinuvin 477(트리아진계), Tinuvin 384(벤조트리아졸계), Tinuvin 326(벤조트리아졸계) 혹은 염료인 BONASORB UA-3912(인돌계) 중 하나 이상을 포함할 수 있다. '흡광도'는 당업자에게 알려진 통상의 방법으로 측정될 수 있다. UV 흡수제는 단독 또는 2종 이상 혼합하여 포함될 수 있다. UV 흡수제는 점착층용 조성물의 고형분 중 약 3중량% 내지 약 20중량%로 포함될 수 있다. 상기 범위에서 파장 400nm에서 투과율 약 20% 이하, 파장 380nm 내지 390nm에서 투과율 약 1% 이하를 확보하여 외광 안정성을 높일 수 있고 UV 흡수제가 과량 포함되어 백색의 반점으로 석출되는 것을 막을 수 있다.UV absorbers have an absorbance of about 0.20 AU or more, specifically about 0.20 AU to about 1.0 AU, about 0.40 AU to about 1.0 AU, for example about 0.20, for light at a wavelength of 380 nm for a concentration of 20 mg / L in toluene (path 1 cm). UV absorbers of 0.30, 0.40, 0.50, 0.60, 0.70, 0.80, 0.90, 1.0AU can be used. In the above range, the external light stability of the display device may be improved by sufficiently absorbing light at wavelengths of 380 nm to 400 nm and reducing the transmittance. Specifically, the UV absorber may be triazine-based, triazole-based, benzotriazole-based, indole-based, etc. More specifically, trade names Tinuvin 477 (triazine-based), Tinuvin 384 (benzotriazole-based), Tinuvin 326 (benzotriazole-based) Or it may include one or more of the dye BONASORB UA-3912 (Indole). The 'absorbance' can be measured by conventional methods known to those skilled in the art. UV absorbers may be included alone or in combination of two or more. The UV absorber may be included in about 3% by weight to about 20% by weight of the solids of the composition for the adhesive layer. In the above range, about 20% or less transmittance at a wavelength of 400 nm and about 1% or less at a wavelength of 380 nm to 390 nm may be secured to increase external light stability, and an excessive amount of UV absorber may be included to prevent precipitation of white spots.
점착층용 조성물은 실란 커플링제를 더 포함할 수 있다. 실란 커플링제는 점착층의 가교도를 증가시켜 모듈러스 등 물성을 향상시킬 수 있다. 실란 커플링제는 통상의 알려진 실란 커플링제를 사용할 수 있다. 예를 들어, 실란 커플링제는 3-글리시드옥시프로필트리메톡시실란, 3-글리시드옥시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡실란 등의 에폭시 구조를 갖는 규소 화합물; 비닐 트리메톡시실란, 비닐트리에톡시실란, (메트)아크릴옥시프로필트리메톡시실란 등의 중합성 불포화기 함유 규소 화합물; 3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란 등의 아미노기 함유 규소 화합물; 및 3-클로로프로필 트리메톡시실란 중 하나 이상을 사용할 수 있으나, 이에 제한되지 않는다. 실란 커플링제는 점착층용 조성물 중 고형분 기준 약 0.1 중량% 내지 약 5 중량%, 구체적으로 약 0.1 중량% 내지 약 1 중량%로 포함될 수 있다. 상기 범위에서 점착제의 적절한 모듈러스를 확보할 수 있다.The adhesive layer composition may further include a silane coupling agent. The silane coupling agent may improve physical properties such as modulus by increasing the degree of crosslinking of the adhesive layer. The silane coupling agent may use a conventionally known silane coupling agent. For example, the silane coupling agent may contain epoxy structures such as 3-glycidoxyoxytrimethoxysilane, 3-glycidoxyoxymethyldimethoxysilane and 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. Silicon compounds having; Polymerizable unsaturated group-containing silicon compounds such as vinyl trimethoxysilane, vinyltriethoxysilane, and (meth) acryloxypropyltrimethoxysilane; 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyl Amino group-containing silicon compounds such as dimethoxysilane; And 3-chloropropyl trimethoxysilane may be used, but is not limited thereto. The silane coupling agent may be included in about 0.1 wt% to about 5 wt%, specifically about 0.1 wt% to about 1 wt%, based on the solids in the composition for the adhesive layer. It is possible to secure an appropriate modulus of the pressure-sensitive adhesive in the above range.
점착층(130)은 두께가 약 1㎛ 내지 약 50㎛, 구체적으로 약 10㎛ 내지 약 30㎛가 될 수 있다. 상기 범위에서 디스플레이용 필름에 사용될 수 있다. The adhesive layer 130 may have a thickness of about 1 μm to about 50 μm, specifically about 10 μm to about 30 μm. It can be used for the film for display in the above range.
상술한 UV 흡수제는 점착층(130) 이외에, 기능성 코팅층(120) 또는 기재층(110)에 포함될 수도 있다. 즉, 점착층(130), 기재층(110), 및 기능성 코팅층(120) 중 적어도 어느 하나 이상의 층은 상술한 UV 흡수제를 포함할 수 있다. 이 때, UV 흡수제는 기능성 코팅층(120) 중 약 0.1 중량% 내지 약 5 중량%, 예를 들어, 약 0.1 중량% 내지 약 3 중량%로 포함될 수 있다. 기재층(110)에 상기 UV 흡수제가 포함되는 경우 UV 흡수제는 기재층(110) 중 약 3 중량% 내지 약 20 중량%로 포함될 수 있으며, 예를 들어, 약 3.0 중량% 내지 약 15 중량%, 약 4 중량% 내지 약 15 중량%로 포함될 수 있다. 상기 범위에서, 본 실시예의 기능성 광학필름이 적용되는 디스플레이 장치의 외광 안정성을 높일 수 있다. In addition to the adhesive layer 130, the above-described UV absorber may be included in the functional coating layer 120 or the base layer 110. That is, at least one or more layers of the adhesive layer 130, the substrate layer 110, and the functional coating layer 120 may include the above-described UV absorber. In this case, the UV absorber may be included in about 0.1% to about 5% by weight, for example, about 0.1% to about 3% by weight of the functional coating layer 120. When the UV absorber is included in the base layer 110, the UV absorber may be included in about 3 wt% to about 20 wt% of the base layer 110, for example, about 3.0 wt% to about 15 wt%, About 4% to about 15% by weight. In the above range, it is possible to increase the external light stability of the display device to which the functional optical film of the present embodiment is applied.
이하, 도 2를 참조하여 본 발명의 다른 실시예에 따른 기능성 광학필름을 설명한다. 도 2는 본 발명의 다른 실시예에 따른 기능성 광학필름의 단면도이다.Hereinafter, a functional optical film according to another embodiment of the present invention will be described with reference to FIG. 2. 2 is a cross-sectional view of a functional optical film according to another embodiment of the present invention.
도 2를 참조하면, 기능성 광학필름(200)은 점착층(130)이 기재층(110)과 기능성 코팅층(120) 사이에 형성된 점을 제외하고는 본 발명의 일 실시예에 따른 기능성 광학필름(100)과 실질적으로 동일하다.Referring to FIG. 2, the functional optical film 200 is a functional optical film according to an embodiment of the present invention except that the adhesive layer 130 is formed between the base layer 110 and the functional coating layer 120. Substantially the same as 100).
본 발명의 실시예의 투명 디스플레이 장치는 본 발명의 실시예들의 디스플레이용 필름을 포함할 수 있다. 구체적으로, 투명 디스플레이 장치는 플렉시블 투명 유기발광소자 표시장치 등을 포함하는 투명 유기발광소자 표시장치를 들 수 있지만, 이에 제한되지 않는다.The transparent display device of the embodiment of the present invention may include the film for display of the embodiments of the present invention. Specifically, the transparent display device may include a transparent organic light emitting display device including a flexible transparent organic light emitting display device, but is not limited thereto.
이하, 도 3을 참고하여 본 발명의 일 실시예의 투명 디스플레이 장치에 대해 설명한다. 도 3은 본 발명의 일 실시예의 투명 디스플레이 장치의 단면도이다.Hereinafter, a transparent display device according to an exemplary embodiment of the present invention will be described with reference to FIG. 3. 3 is a cross-sectional view of a transparent display device according to an embodiment of the present invention.
도 3을 참조하면, 본 실시예에 따른 투명 유기 발광 표시 장치(300)는 하부 기판(310), 버퍼층(331), 박막 트랜지스터(321,322), 게이트 절연층(332), 층간 절연층(333), 오버 코팅층(334), 반사층(345,346), 애노드(341,342), 뱅크층(335), 유기발광층(350), 캐소드(360), 봉지부(370), 상부 기판(380)을 포함하고, 상부 기판(380)은 본 발명의 실시예들의 기능성 광학필름을 포함할 수 있다. 따라서, 본 실시예의 투명 디스플레이 장치(300)는 편광판 없이도 외광에 대한 시야각을 보상할 수 있고, 유기발광소자의 손상, 변색 또는 수명 단축을 최소화할 수 있다.Referring to FIG. 3, the transparent organic light emitting diode display 300 according to the present exemplary embodiment includes a lower substrate 310, a buffer layer 331, thin film transistors 321 and 322, a gate insulating layer 332, and an interlayer insulating layer 333. And an over coating layer 334, reflective layers 345 and 346, anodes 341 and 342, bank layers 335, organic light emitting layers 350, cathodes 360, encapsulation 370, and upper substrate 380. The substrate 380 may include a functional optical film of embodiments of the present invention. Therefore, the transparent display device 300 according to the present exemplary embodiment may compensate for a viewing angle with respect to external light without a polarizing plate, and may minimize damage, discoloration, or shortening of life of the organic light emitting diode.
하부 기판(310)은 투명 디스플레이 장치(300)을 지지하는 것으로 투명한 유리 또는 투명한 유연성을 갖는 재료 예를 들면 실리콘, 폴리이미드, 폴리카보네이트, 폴리아크릴레이트 등으로 형성될 수 있다. 버퍼층(331)은 하부 기판(310) 상에 형성되어, 하부 기판(310)을 통한 외부의 수분 및/또는 불순물의 침투를 방지하며, 투명한 재료로 형성될 수 있고, 생략 가능하다. 박막 트랜지스터(321,322)는 유기 발광 소자를 구동하는 것으로, 각각 버퍼층(331) 상에 형성된 액티브층, 게이트 절연층(332) 상에 형성된 게이트 전극, 층간 절연층(333) 상에 형성된 소스 전극과 드레인 전극을 포함한다. 오버 코팅층(334)은 박막 트랜지스터(321,322) 상에 형성되어, 하부 기판(310)의 평탄화 기능을 수행한다. 반사층(345,346)은 오버 코팅층(334) 상에 형성되어 유기 발광층(350)에서 발광된 빛을 상부로 반사시킴으로써 빛의 효율을 높인다. 오버 코팅층(334) 상에는 애노드(341,342), 유기발광층(350), 캐소드(360)를 포함하는 유기 발광 소자가 형성되어 빛을 발광한다. 캐소드(360) 상에는 유기 발광 소자를 밀봉하는 봉지부(370)가 형성된다. 상부 기판(380)은 봉지부(370) 상에 형성되어 투명 디스플레이 장치(300)를 보호할 수 있다. 도 3에서 도시되지 않았지만, 상부 기판(380) 하부면에는 컬러 필터가 형성되어 각각 유기발광소자로부터 형성된 백색광을 적색, 녹색 또는 청색으로 변환시킬 수 있다. 뱅크층(335)은 발광 영역을 적색, 녹색 또는 청색 발광 영역으로 구획할 수 있다. The lower substrate 310 supports the transparent display device 300 and may be formed of transparent glass or a material having transparent flexibility, for example, silicon, polyimide, polycarbonate, polyacrylate, or the like. The buffer layer 331 is formed on the lower substrate 310 to prevent penetration of external moisture and / or impurities through the lower substrate 310, and may be formed of a transparent material and may be omitted. The thin film transistors 321 and 322 drive an organic light emitting device, and an active layer formed on the buffer layer 331, a gate electrode formed on the gate insulating layer 332, and a source electrode and a drain formed on the interlayer insulating layer 333, respectively. An electrode. The overcoat layer 334 is formed on the thin film transistors 321 and 322 to planarize the lower substrate 310. Reflective layers 345 and 346 are formed on the overcoating layer 334 to increase light efficiency by reflecting light emitted from the organic emission layer 350 upwards. On the overcoat layer 334, an organic light emitting device including anodes 341 and 342, an organic light emitting layer 350, and a cathode 360 is formed to emit light. An encapsulation portion 370 sealing the organic light emitting element is formed on the cathode 360. The upper substrate 380 may be formed on the encapsulation 370 to protect the transparent display device 300. Although not shown in FIG. 3, a color filter may be formed on the lower surface of the upper substrate 380 to convert white light formed from the organic light emitting diode into red, green, or blue, respectively. The bank layer 335 may divide a light emitting area into a red, green, or blue light emitting area.
이하, 실시예를 통하여 본 발명을 보다 구체적으로 설명하고자 하나, 이러한 실시예들은 단지 설명의 목적을 위한 것으로, 본 발명을 제한하는 것으로 해석되어서는 안 된다.Hereinafter, the present invention will be described in more detail with reference to examples, but these examples are for illustrative purposes only and should not be construed as limiting the present invention.
실시예Example 1 One
(메트)아크릴레이트계 수지 CI207(Soken, 고형분 함량 30중량%) 80.2g, 이소시아네이트계 경화제인 TD75(Soken) 0.03g, 이소시아네이트계 경화제인 A50(Soken) 0.1g, 희석제인 메틸에틸케톤(대정화학) 16.0g, UV흡수제인 Tinuvin 477(BASF)(톨루엔 20mg/L 농도에 대해(path 1cm) 파장 380nm에서 흡광도가 0.4AU) 3.8g을 혼합하여 점착층용 조성물을 제조하였다. 제조한 점착층용 조성물을 이형 필름 PET(폴리에틸렌테레프탈레이트) 필름(MRF38, Mitchibishi사)의 일면에 도포하고, 80℃에서 3분 동안 건조시켜 두께 25㎛의 점착층용 도막을 제조하였다. 80.2 g of (meth) acrylate resin CI207 (Soken, solid content 30% by weight), 0.03 g of TD75 (Soken), an isocyanate-based curing agent, 0.1 g of A50 (Soken), an isocyanate-based curing agent, methyl ethyl ketone, a diluent ) 16.0 g, a UV absorber Tinuvin 477 (BASF) (with a absorbance of 0.4AU at a wavelength of 380nm to a concentration of 20mg / L toluene (path 1cm) 3.8g) was mixed to prepare a composition for the adhesive layer. The prepared adhesive layer composition was applied to one surface of a release film PET (polyethylene terephthalate) film (MRF38, Mitchibishi Co., Ltd.), and dried at 80 ° C. for 3 minutes to prepare a coating film for a pressure-sensitive adhesive layer having a thickness of 25 μm.
지환족 에폭시 작용기를 갖는 실세스퀴옥산 수지 함유 용액(Solips사, Epoxy Hybrimer, 고형분 함량 90중량%) 80g, 희석제인 메틸에틸케톤 23g을 혼합하여 기능성 코팅층용 조성물을 제조하였다.80 g of a silsesquioxane resin-containing solution having a cycloaliphatic epoxy functional group (Solips, Epoxy Hybrimer, solid content of 90% by weight) and 23 g of methyl ethyl ketone as a diluent were mixed to prepare a composition for a functional coating layer.
기재층으로 폴리카보네이트(PC) 필름(RM, Teijin社, 파장 550nm에서 Re는 148nm, UV 흡수제는 포함하지 않음)을 사용하였다. A polycarbonate (PC) film (RM, Teijin, Re is 148 nm at a wavelength of 550 nm, and no UV absorber is included) as a base layer.
기재층의 일면에 상기 제조한 기능성 코팅층용 조성물을 도포하고, 100℃에서 30분 동안 건조시키고, 1000mJ/cm2의 자외선에 노광하여, 두께 50㎛의 코팅층을 형성하고, 80℃ 오븐에서 24시간 동안 유지하였다. 기재층의 다른 일면에 상기 제조한 점착층용 도막을 합지하고 이형 필름을 제거한 후 30℃ 및 75% 상대습도의 항온 항습에서 48시간 동안 방치하여 기능성 필름을 제조하였다.Apply the composition for the functional coating layer prepared above on one surface of the substrate layer, and dried for 30 minutes at 100 ℃, exposed to ultraviolet light of 1000mJ / cm 2 , to form a coating layer of 50㎛ thickness, 24 hours in an 80 ℃ oven For a while. On the other side of the substrate layer was laminated the coating film for the pressure-sensitive adhesive layer prepared to remove the release film and left for 48 hours at a constant temperature and humidity of 30 ℃ and 75% relative humidity to prepare a functional film.
실시예Example 2 2
실시예 1에서, 기재층으로 COP(시클릭올레핀폴리머) 필름(ZM16-138, Zeon사, 파장 550nm에서 Re는 138nm, UV 흡수제는 포함하지 않음)을 사용한 것을 제외하고는 동일한 방법으로 기능성 광학필름을 제조하였다.In Example 1, the functional optical film in the same manner, except that a COP (cyclic olefin polymer) film (ZM16-138, Zeon, Re is 138nm at a wavelength of 550nm, does not include a UV absorber) as the substrate layer Was prepared.
실시예Example 3 3
실시예 1에서, 기재층으로 PC필름(WRS-148, TEIJIN사, 파장 550nm에서 Re는 135nm, UV 흡수제는 포함하지 않음)을 사용한 것을 제외하고는 동일한 방법으로 기능성 광학필름을 제조하였다.In Example 1, a functional optical film was prepared in the same manner except that a PC film (WRS-148, TEIJIN Co., Re is 135 nm at a wavelength of 550 nm and no UV absorber was included) was used as the base layer.
실시예Example 4 4
(메트)아크릴레이트계 수지 CI207(Soken, 고형분 함량 30중량%) 100g, 이소시아네이트계 경화제인 TD75(Soken) 0.02g, 이소시아네이트계 경화제인 A50(Soken) 0.125g, 희석제인 메틸에틸케톤(대정화학) 20g, UV 흡수제인 Tinuvin 384(Basf)(톨루엔 20mg/L 농도에 대해(path 1cm) 파장 380nm에서 흡광도가 0.2AU) 2.4g, UV영역을 흡수하는 인돌계 염료 BONASORB UA-3912(오리엔트 케미컬)(톨루엔 20mg/L 농도에 대해(path 1cm) 파장 380nm에서 흡광도가 0.4AU) 2.4g을 혼합하여 점착층용 조성물을 제조하였다. 제조한 점착층용 조성물을 이형 필름 PET(폴리에틸렌테레프탈레이트) 필름(MRF38, Mitchibishi사)의 일면에 도포하고, 80℃에서 3분 동안 건조시켜 두께 25㎛의 점착층용 도막을 제조하였다.100 g of (meth) acrylate resin CI207 (Soken, solid content of 30% by weight), 0.02 g of TD75 (Soken), an isocyanate curing agent, 0.125 g of A50 (Soken), an isocyanate curing agent, and methyl ethyl ketone, a diluent. 20 g, UV absorber Tinuvin 384 (Basf) 2.4 g, with absorbance of 0.2 AU at a wavelength of 380 nm for a concentration of 20 mg / L of toluene (path 1 cm), 2.4 g of an indole dye BONASORB UA-3912 (orient chemical) (absorbance of 0.4 AU at a wavelength of 380 nm with respect to toluene 20 mg / L concentration (path 1 cm) absorbing UV region) was mixed to prepare an adhesive layer composition. The prepared adhesive layer composition was applied to one surface of a release film PET (polyethylene terephthalate) film (MRF38, Mitchibishi Co., Ltd.), and dried at 80 ° C. for 3 minutes to prepare a coating film for a pressure-sensitive adhesive layer having a thickness of 25 μm.
지환족 에폭시 작용기를 갖는 실세스퀴옥산 수지(Solips사, Epoxy Hybrimer, 고형분 함량 90중량%) 80g, 희석제인 메틸에틸케톤 23g을 혼합하여 기능성 코팅층용 조성물을 제조하였다.80 g of a silsesquioxane resin having a cycloaliphatic epoxy functional group (Solips, Epoxy Hybrimer, solid content of 90% by weight) and 23 g of methyl ethyl ketone as a diluent were mixed to prepare a composition for a functional coating layer.
기재층으로 폴리카보네이트(PC) 필름(RM, Teijin社, 파장 550nm에서 Re는 148nm, UV 흡수제는 포함하지 않음)의 일면에 상기 제조한 기능성 코팅층용 조성물을 도포하고, 100℃에서 30분 동안 건조시키고, 1000mJ/cm2의 자외선에 노광하여, 두께 50㎛의 코팅층을 형성하고, 80℃ 오븐에서 24시간 동안 유지하였다. 기재층의 다른 일면에 상기 제조한 점착층용 도막을 합지하고 이형 필름을 제거한 후 30℃ 및 75% 상대습도의 항온 항습에서 48시간 동안 방치하여 기능성 필름을 제조하였다.Apply the composition for the functional coating layer prepared on one side of the polycarbonate (PC) film (RM, Teijin, Re, 148nm at a wavelength of 550nm, does not include UV absorbers), and dried for 30 minutes at 100 ℃ And a coating layer having a thickness of 50 μm was formed by exposure to ultraviolet light of 1000 mJ / cm 2 and maintained in an 80 ° C. oven for 24 hours. On the other side of the substrate layer was laminated the coating film for the pressure-sensitive adhesive layer prepared to remove the release film and left for 48 hours at a constant temperature and humidity of 30 ℃ and 75% relative humidity to prepare a functional film.
실시예Example 5 5
실시예 4에서, UV 흡수제 대신 UV영역을 흡수하는 인돌계 염료 BONASORB UA-3912 4.8g, Tinuvin 384 2.4g을 사용한 것을 제외하고는 동일한 방법으로 기능성 광학필름을 제조하였다.In Example 4, 4.8 g of indole dye BONASORB UA-3912, which absorbs the UV region instead of the UV absorber, A functional optical film was manufactured in the same manner except that Tingvin 384 2.4g was used.
실시예Example 6 6
(메트)아크릴계 수지 UP111(Entis) 31g, PGME(프로필렌글리콜 메틸 에테르, 삼전화학)36g, MEK(메틸에틸케톤, 삼전화학) 24g을 넣은 후 완전히 용해시킨다. Irgacure 184(BASF) 1.25g을 더 넣은 후 5분간 교반하였다. 대전방지제 TBAS-2(ARAKAWA) 9.4g을 더 넣은 후 20분간 교반하여 기능성 코팅층용 조성물을 제조하였다.31 g of (meth) acrylic resin UP111 (Entis), 36 g of PGME (propylene glycol methyl ether, trielectrochemical), and 24 g of MEK (methyl ethyl ketone, trielectric chemical) were completely dissolved. After adding 1.25 g of Irgacure 184 (BASF), the mixture was stirred for 5 minutes. After adding 9.4 g of antistatic agent TBAS-2 (ARAKAWA), the mixture was stirred for 20 minutes to prepare a composition for a functional coating layer.
실시예 4에서 기능성 코팅층용 조성물로 상기 제조한 기능성 코팅층용 조성물을 사용한 것을 제외하고는 동일한 방법으로 기능성 광학필름을 제조하였다.A functional optical film was prepared in the same manner as in Example 4, except that the functional coating layer composition prepared above was used as the functional coating layer composition.
실시예Example 7 7
(메트)아크릴계 수지 CN120C80(Sartomer) 31g, PGME(삼전화학)36g, MEK(삼전화학) 24g을 넣은 후 완전히 용해시켰다. Irgacure 184(BASF) 1.25g을 더 넣은 후 5분간 더 교반하였다. 대전방지제 TBAS-2(ARAKAWA) 9.4g을 더 넣은 후 20분간 교반하여 기능성 코팅층용 조성물을 제조하였다.31 g of (meth) acrylic resin CN120C80 (Sartomer), 36 g of PGME (Samjeon Chemical), and 24 g of MEK (Samjeon Chemical) were completely dissolved. After adding 1.25 g of Irgacure 184 (BASF), the mixture was further stirred for 5 minutes. After adding 9.4 g of antistatic agent TBAS-2 (ARAKAWA), the mixture was stirred for 20 minutes to prepare a composition for a functional coating layer.
실시예 5에서 기능성 코팅층용 조성물로 상기 제조한 기능성 코팅층용 조성물을 사용한 것을 제외하고는 동일한 방법으로 기능성 광학필름을 제조하였다.A functional optical film was manufactured in the same manner as in Example 5, except that the functional coating layer composition prepared above was used as the functional coating layer composition.
비교예Comparative example 1 One
(메트)아크릴레이트계 수지 CI207(Soken, 고형분 함량 30중량%) 80.2g, 이소시아네이트계 경화제인 TD75(Soken) 0.03g, 이소시아네이트계 경화제인 A50(Soken) 0.1g, 희석제인 메틸에틸케톤(대정화학) 16.0g을 혼합하여 점착층용 조성물을 제조하였다. 제조한 점착층용 조성물을 사용하고, 기재층으로 UV 흡수제 Tinuvin 384 8중량%를 포함하는 PET 필름을 사용한 것을 제외하고는 동일한 방법으로 기능성 광학필름을 제조하였다.80.2 g of (meth) acrylate resin CI207 (Soken, solid content 30% by weight), 0.03 g of TD75 (Soken), an isocyanate-based curing agent, 0.1 g of A50 (Soken), an isocyanate-based curing agent, methyl ethyl ketone, a diluent 16.0g) was mixed to prepare a composition for an adhesive layer. A functional optical film was prepared in the same manner except for using the prepared pressure-sensitive adhesive layer composition and using a PET film including 8 wt% of a UV absorber Tinuvin 384 as a base layer.
비교예Comparative example 2 2
실시예 1에서, 기재층으로 PET필름(Teijin-Dupon사, KEL86W)을 사용하고, 점착층용 조성물 중 Tinuvin 477 대신 Tinuvin 326(BASF)(톨루엔 20mg/L 농도에 대해(path 1cm) 파장 380nm에서 흡광도가 0.35AU)을 하기 표 1의 함량으로 사용한 것을 제외하고는 동일한 방법으로 기능성 광학필름을 제조하였다.In Example 1, using a PET film (Teijin-Dupon, KEL86W) as the substrate layer, and absorbance at a wavelength of 380nm for Tinuvin 326 (BASF) (toluene 20mg / L concentration (path 1cm) in place of Tinuvin 477 in the adhesive layer composition) The functional optical film was prepared in the same manner except that 0.35AU) was used as the content of Table 1 below.
실시예와 비교예의 기능성 광학필름의 구성을 하기 표 1에 나타내고, 하기 물성을 측정하고 하기 표 1에 나타내었다.The structure of the functional optical film of an Example and a comparative example is shown in following Table 1, the following physical property was measured, and it is shown in following Table 1.
(1)파장 380nm, 390nm, 400nm에서 투과율: 기능성 광학필름에 대해 파장 300nm 내지 800nm 파장에서 파장별 투과율을 Lambda 1050 UV spectRemeter(Perkin Elmer사)를 사용하여 측정하였다.(1) Wavelength Transmittance at 380 nm, 390 nm, and 400 nm: The transmittance of each wavelength was measured using a Lambda 1050 UV spectRemeter (Perkin Elmer) for a functional optical film at a wavelength of 300 nm to 800 nm.
(2)기능성 광학필름의 파장 550nm, 450nm에서의 위상차(Re): Axoscan(Axometric社)을 이용하여 파장 550nm, 450nm에서 각각 기능성 광학필름의 Re인 Re(550nm), Re(450nm)를 측정하였다.(2) Retardation (Re) at wavelength 550 nm and 450 nm of functional optical film: Re (550 nm) and Re (450 nm) of Re of functional optical film were measured at wavelengths of 550 nm and 450 nm using Axoscan (Axometric). .
(3)기능성 광학필름의 면내 위상차의 비(Re(450nm)/Re(550nm)): (2)의 Re(450nm), Re(550nm)을 이용하여, 상기 식 1에 따라 계산하였다.(3) Ratio of in-plane retardation (Re (450 nm) / Re (550 nm)) of the functional optical film: Using Re (450 nm) and Re (550 nm) of (2), it was calculated according to Equation 1 above.
(4)연필경도: 기능성 광학필름에 대해 측정하였다. 기능성 광학필름 중 기능성 코팅층에 대하여, 연필 경도계(Heidon)를 사용하여 JIS K5400 방법에 의해 측정하였다. 연필은 Mitsubishi 사의 6B 내지 9H의 연필을 사용하였고, 코팅층에 대한 연필의 하중은 1kg, 연필을 긋는 각도 45°, 연필을 긋는 속도 60mm/min로 하였고, 5회 평가하여 1회 이상 스크래치가 발생하면 연필 경도 아래 단계의 연필을 이용하여 측정하였다. 5회 평가시 5회 모두 스크래치가 없으면 해당 경도를 연필경도로 결정하였다.(4) Pencil hardness: Measured on the functional optical film. The functional coating layer in the functional optical film was measured by a JIS K5400 method using a pencil hardness tester (Heidon). For the pencil, Mitsubishi's 6B to 9H pencil was used, and the load of the pencil on the coating layer was 1 kg, the angle at which the pencil was drawn at 45 °, and the speed at which the pencil was drawn at 60 mm / min. Pencil Hardness It was measured using a pencil below. If there were no scratches in all five evaluations, the hardness was determined as the pencil hardness.
(5)보관안정성: 기능성 광학필름을 25℃, 상대습도 50%RH 조건에서 1000시간 동안 보관하고, 점착층 또는 기재층에서 백색 반점으로 석출이 일어나는 경우 X, 석출이 일어나지 않는 경우 ○로 평가하였다. 석출은 UV 흡수제에 의해 일어난다.(5) Storage stability: The functional optical film was stored at 25 ° C. and a relative humidity of 50% RH for 1000 hours and evaluated as X when precipitation occurred as white spots in the adhesive layer or the substrate layer, and as ○ when precipitation did not occur. . Precipitation is caused by a UV absorber.
실시예Example 비교예Comparative example
1One 22 33 44 55 66 77 1One 22
UV 흡수제 포함층UV absorber containing layer 점착층Adhesive layer 점착층Adhesive layer 점착층Adhesive layer 점착층Adhesive layer 점착층Adhesive layer 점착층Adhesive layer 점착층Adhesive layer 기재층Substrate layer 점착층Adhesive layer
제1 UV 흡수제First UV absorber Tinuvin477Tinuvin477 Tinuvin477Tinuvin477 Tinuvin477Tinuvin477 BONASORB UA-3912BONASORB UA-3912 BONASORB UA-3912BONASORB UA-3912 BONASORB UA-3912BONASORB UA-3912 BONASORB UA-3912BONASORB UA-3912 Tinuvin 384Tinuvin 384 Tinuvin 326Tinuvin 326
점착층 중 제1UV흡수제 함량(중량%)First UV absorber content in the adhesive layer (wt%) 13.5813.58 13.5813.58 13.5813.58 6.876.87 12.8512.85 6.876.87 12.8512.85 00 7.07.0
제2 UV흡수제2nd UV absorber -- -- -- Tinuvin 384Tinuvin 384 Tinuvin 384Tinuvin 384 Tinuvin 384Tinuvin 384 Tinuvin 384Tinuvin 384 -- --
점착층 중 제2 UV 흡수제 함량(중량%)Second UV absorber content (wt%) in the adhesive layer -- -- -- 6.876.87 6.426.42 6.876.87 6.426.42 -- --
기재층 중 UV 흡수제 함량(중량%)UV absorber content (% by weight) in the base layer 00 00 00 00 00 00 00 88 00
기재층의 Re@550nm(nm)Re @ 550nm (nm) of base layer 148148 138138 135135 148148 148148 148148 148148 0.6780.678 0.4270.427
투과율@380nm(%)Transmittance: 380nm (%) 0.070.07 0.230.23 0.120.12 0.0050.005 0.0050.005 0.0120.012 0.040.04 0.640.64 0.030.03
투과율@390nm(%)Transmittance: 390nm (%) 0.560.56 0.640.64 0.240.24 0.5240.524 0.0020.002 0.020.02 0.050.05 87.387.3 0.120.12
투과율@400nm(%)Transmittance: 400nm (%) 19.719.7 18.218.2 16.416.4 0.4100.410 0.1240.124 0.170.17 0.40.4 89.189.1 7.087.08
기능성 광학필름의 Re@550nm(nm)Re(550nm)Re @ 550nm (nm) Re (550nm) of functional optical film 152.40152.40 137.48137.48 130.40130.40 150.1150.1 149.84149.84 147.5147.5 148.2148.2 1.911.91 2.132.13
기능성 광학필름의 Re@450nm(nm)Re(450nm)Re @ 450nm (nm) Re (450nm) of functional optical film 148.41148.41 142.40142.40 134.50134.50 148.34148.34 147.98147.98 146.7146.7 147.2147.2 2.392.39 3.783.78
Re(450nm)/Re(550nm)Re (450nm) / Re (550nm) 0.970.97 1.041.04 1.031.03 0.990.99 0.990.99 0.990.99 0.990.99 1.251.25 1.771.77
연필경도Pencil hardness 8H8H 8H8H 8H8H 4H4H 4H4H 4H4H 4H4H 8H8H 8H8H
보관 안정성Storage stability ××
상기 표 1 에서 나타난 바와 같이, 본 발명의 기능성 광학필름은 파장 400nm, 390nm, 380nm의 광에 대한 투과율을 현저하게 낮추어 디스플레이 소자의 외광 안정성을 확보하게 할 수 있다. 또한, 본 발명의 기능성 광학필름은 면내 위상차의 비 0.90 내지 1.20을 확보함으로써, 편광판 없이도 외광에 대한 시야각 보상 효과를 구현할 수 있다.As shown in Table 1, the functional optical film of the present invention can significantly reduce the transmittance for light having a wavelength of 400nm, 390nm, 380nm to ensure external light stability of the display device. In addition, the functional optical film of the present invention by securing a ratio of 0.90 to 1.20 of the in-plane retardation, it is possible to implement a viewing angle compensation effect for external light without a polarizing plate.
반면에, 기재층이 위상차필름이 아닌 비교예 1과 비교예 2는 면내 위상차의 비가 0.90 내지 1.20의 수준을 벗어나 디스플레이의 선명도가 떨어지는 문제점이 있었다.On the other hand, Comparative Examples 1 and 2, in which the base layer is not a retardation film, had a problem in that the in-plane retardation ratio fell out of the level of 0.90 to 1.20, resulting in poor display sharpness.
본 발명의 단순한 변형 내지 변경은 이 분야의 통상의 지식을 가진 자에 의하여 용이하게 실시될 수 있으며, 이러한 변형이나 변경은 모두 본 발명의 영역에 포함되는 것으로 볼 수 있다. Simple modifications or changes of the present invention can be easily carried out by those skilled in the art, and all such modifications or changes can be seen to be included in the scope of the present invention.

Claims (13)

  1. 기재층, 상기 기재층의 일면 상에 형성된 기능성 코팅층, 및 상기 기재층의 타면 상에 형성된 점착층을 포함하고, A base layer, a functional coating layer formed on one side of the base layer, and an adhesive layer formed on the other side of the base layer,
    상기 기재층, 상기 기능성 코팅층, 및 상기 점착층 중 적어도 하나 이상은 UV 흡수제를 포함하고,At least one or more of the base layer, the functional coating layer, and the adhesive layer comprises a UV absorber,
    상기 기재층은 위상차필름을 포함하는 것인, 기능성 광학필름.The base layer is to include a retardation film, functional optical film.
  2. 제1항에 있어서, 상기 기능성 광학필름은 하기 식 1의 면내 위상차의 비가 약 0.90 내지 약 1.20인 것인, 기능성 광학필름:The functional optical film of claim 1, wherein the functional optical film has a ratio of in-plane retardation of about 1 to about 0.90 to about 1.20.
    <식 1><Equation 1>
    면내 위상차의 비 = Re(450nm) / Re(550nm)Ratio of in-plane retardation = Re (450nm) / Re (550nm)
    (상기 식 1에서, Re(450nm)는 파장 450nm에서 기능성 광학필름의 면내 위상차(단위:nm)이고, Re(550nm)는 파장 550nm에서 기능성 광학필름의 면내 위상차(단위:nm)이다).(In Formula 1, Re (450nm) is the in-plane retardation (unit: nm) of the functional optical film at wavelength 450nm, Re (550nm) is the in-plane retardation (unit: nm) of the functional optical film at a wavelength of 550nm.
  3. 제1항에 있어서, 상기 기능성 광학필름은 파장 550nm에서 면내 위상차 Re가 약 125nm 내지 약 160nm인 것인, 기능성 광학필름.The functional optical film of claim 1, wherein the functional optical film has an in-plane retardation Re of about 125 nm to about 160 nm at a wavelength of 550 nm.
  4. 제1항에 있어서, 상기 기능성 광학필름은 파장 390nm 이하에서 투과율이 약 1% 이하인 것인, 기능성 광학필름.The functional optical film of claim 1, wherein the functional optical film has a transmittance of about 1% or less at a wavelength of 390 nm or less.
  5. 제1항에 있어서, 상기 점착층, 상기 기재층 중 하나 이상은 상기 UV 흡수제를 각 층에 대해 약 3중량% 내지 약 20중량%로 포함하는 것인, 기능성 광학필름.The functional optical film of claim 1, wherein at least one of the adhesive layer and the base layer comprises about 3 wt% to about 20 wt% of the UV absorber based on each layer.
  6. 제1항에 있어서, 상기 UV 흡수제는 톨루엔 중 20mg/L 농도에 대해 파장 380nm에서의 흡광도가 약 0.2AU 이상인 것인, 기능성 광학필름.The functional optical film of claim 1, wherein the UV absorber has an absorbance of about 0.2 AU or more at a wavelength of 380 nm for a concentration of 20 mg / L in toluene.
  7. 제1항에 있어서, 상기 UV 흡수제는 벤조트리아졸계, 트리아진계, 인돌계 중 하나 이상을 포함하는 것인, 기능성 광학필름.The functional optical film of claim 1, wherein the UV absorber comprises at least one of benzotriazole-based, triazine-based, and indole-based compounds.
  8. 제1항에 있어서, 상기 기능성 코팅층은 가교성 작용기를 갖는 실록산 수지, 가교성 작용기를 갖는 (메트)아크릴계 수지 중 하나 이상을 포함하는 조성물로 형성되는 것인, 기능성 광학필름.The functional optical film of claim 1, wherein the functional coating layer is formed of a composition including at least one of a siloxane resin having a crosslinkable functional group and a (meth) acrylic resin having a crosslinkable functional group.
  9. 제8항에 있어서, 상기 가교성 작용기를 갖는 실록산 수지는 지환식 에폭시기를 갖는 실록산 수지를 포함하는 것인, 기능성 광학필름.The functional optical film of claim 8, wherein the siloxane resin having a crosslinkable functional group comprises a siloxane resin having an alicyclic epoxy group.
  10. 제1항에 있어서, 상기 기재층은 λ/2 위상차필름 또는 λ/4 위상차필름을 포함하는 것인, 기능성 광학필름.The functional optical film of claim 1, wherein the base layer comprises a λ / 2 retardation film or a λ / 4 retardation film.
  11. 제1항에 있어서, 상기 기능성 광학필름은 연필경도가 약 4H 이상인 것인, 기능성 광학필름.The functional optical film of claim 1, wherein the functional optical film has a pencil hardness of about 4H or more.
  12. 기재층, 상기 기재층 상에 형성된 점착층, 및 상기 점착층 상에 형성된 기능성 코팅층을 포함하고, A base layer, a pressure-sensitive adhesive layer formed on the base layer, and a functional coating layer formed on the pressure-sensitive adhesive layer,
    상기 기재층, 상기 점착층, 상기 기능성 코팅층 중 적어도 하나 이상은 UV 흡수제를 포함하고,At least one or more of the base layer, the adhesive layer, and the functional coating layer comprises a UV absorber,
    상기 기재층은 위상차필름을 포함하는 것인, 기능성 광학필름.The base layer is to include a retardation film, functional optical film.
  13. 제1항 내지 제12항 중 어느 한 항의 기능성 광학필름을 포함하는 투명 디스플레이 장치.A transparent display device comprising the functional optical film of claim 1.
PCT/KR2016/015183 2016-02-19 2016-12-23 Functional optical film and transparent display device comprising same WO2017142184A1 (en)

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