WO2016208981A1 - Waste gas-treating scrubber formed of combination of gas-liquid contact means having multiple functions so as to be appropriate for treating according to waste gas properties - Google Patents

Waste gas-treating scrubber formed of combination of gas-liquid contact means having multiple functions so as to be appropriate for treating according to waste gas properties Download PDF

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Publication number
WO2016208981A1
WO2016208981A1 PCT/KR2016/006665 KR2016006665W WO2016208981A1 WO 2016208981 A1 WO2016208981 A1 WO 2016208981A1 KR 2016006665 W KR2016006665 W KR 2016006665W WO 2016208981 A1 WO2016208981 A1 WO 2016208981A1
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Prior art keywords
gas
liquid contact
contact means
waste gas
scrubber
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PCT/KR2016/006665
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French (fr)
Korean (ko)
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서익환
박대연
박승철
김지영
Original Assignee
주식회사 효진아이디에스
삼성엔지니어링 주식회사
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Publication of WO2016208981A1 publication Critical patent/WO2016208981A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Definitions

  • the present invention relates to a scrubber for treating waste gas, and more particularly, to a waste gas treating scrubber combined with a multi-functional gas-liquid contacting unit so as to be suitable for treatment according to the properties of toxic exhaust gas discharged from a semiconductor manufacturing process.
  • the exhaust gas (waste gas) discharged from a process of forming or etching a thin film on a wafer of a semiconductor manufacturing process includes acidic gases such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide and sulfurous acid gas, and alkaline gases such as ammonia. Since these components are not only harmful to human body but also cause environmental pollution, the exhaust gas emitted from the semiconductor manufacturing process should be discharged to the atmosphere after purification.
  • the cleaning solution is sprayed on the exhaust gas (waste gas), which is a wet method, to contact gas-liquid contact.
  • the scrubber method to be used is widely known, and in the related art, for example, in the case of installing a gas flow path device, a gas-liquid reaction device, and a dehumidification device in a housing in Korean Patent Publication No. 10-0816822, the gas flow path device is used.
  • a multi scrubber for simultaneously treating a complex pollutant characterized in that No. 10-1020258 includes a waste gas inlet formed on one side and a waste gas outlet formed on the other side, and a housing formed in a box shape and an acid gas introduced into one side of the housing and introduced into the housing.
  • It is formed to include a first injection unit for removing the acid gas by injecting water to the waste gas to be included and a discharge dust collector for collecting the acid mist introduced from the first injection unit by the corona discharge formed inside the other side of the housing
  • An acidic waste gas treatment system is disclosed.
  • the gas-liquid contact device used for the scrubber plate-shaped body 10 made of a predetermined shape in the Korean Patent Publication No. 10-1320638; It is composed of a bent portion 20 having a certain curvature by folding the center of the plate 10, the plate 10 is a polyolefin such as polyethylene, polypropylene, vinylidene chloride, polyester, nylon And organic fibers such as aramid and carbon fiber, inorganic fibers, and metal fibers, and the grid 10 has a grid 12 having a predetermined shape therein, and the grid 12 2 to 10 mm in width and 2 to 10 mm in length, and the bent portion 20 discloses a porous filter and a gas-liquid contact device using the same, wherein the cross-sectional shape is formed in a U shape or a V shape.
  • the plate 10 is a polyolefin such as polyethylene, polypropylene, vinylidene chloride, polyester, nylon And organic fibers such as aramid and carbon fiber, inorganic fibers, and metal fibers
  • the prior art has a problem in the separation and removal efficiency of the waste gas according to the type of waste gas because it is a technology for uniformly separating and removing the waste gas by the gas-liquid contact regardless of the type of the waste gas, that is, component, concentration.
  • the present invention differs in function according to the types and concentrations of toxic gas components such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide, ammonia sulfite and the like in the exhaust gases emitted from the semiconductor manufacturing process.
  • the present invention has been confirmed by improving the exhaust gas removal efficiency by applying a plurality of unit gas-liquid contact means in combination.
  • An object of the present invention is to provide a scrubber for removing toxic waste gas.
  • the gas is exhausted by a multi-layer gas-liquid contact means combination of a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be suitable for treatment according to the properties of the waste gas. It aims at providing the scrubber which processes a gas.
  • the present invention treats the exhaust gas by a multi-layer gas-liquid contact means combination comprising a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be suitable for the treatment according to the concentration of the alkaline exhaust gas discharged from the semiconductor manufacturing process.
  • the purpose is to provide a scrubber.
  • Exhaust gas, HF, HCl, Cl 2 Toxic waste gases which are acidic exhaust gases containing and the like, alkaline exhaust gases containing NH 3 , and combustible exhaust gases containing SiF 4 , HF and the like, are discharged, and the perfluorocarbon (PFC) exhaust gases, acidic exhaust gases, Alkaline exhaust gas and combustible exhaust gas are not only discharged depending on the conditions of the semiconductor manufacturing process, operating hours, and products, but also emitted at high concentrations (50 to 500 ppm) to low concentrations (less than 50 ppm).
  • PFC perfluorocarbon
  • the present invention is a waste gas treatment scrubber that combines two or more gas-liquid contact means units having different functions of gas-liquid contact by geometrical differences in order to optimize the treatment according to the type and concentration of the waste gas (G) to improve treatment efficiency. Is done.
  • the waste gas treatment scrubber combined with a multi-functional gas-liquid contact means to fit the characteristics of the waste gas is provided with an exhaust pipe (1a) for discharging the purification gas upwards, the inside In the upper part of the cleaning liquid injection nozzle (1b) is installed, the middle part of the gas-liquid contact means combination (MS), the lower part of the scrubber (1), the waste liquid storage tank (1c) is installed, and the waste liquid storage tank (1c) of In the scrubber comprising a waste gas inlet pipe (2) connected to one side and a cleaning liquid supply pipe (3) connected to the cleaning liquid injection nozzle (1b) installed on the inside of the scrubber (1), the gas-liquid contact means combination (MS) Is a plurality of gas-liquid contact means units (M1) and gas-liquid contact means units having different geometries so as to be suitable for treatment in accordance with a change in the concentration of alkaline exhaust gas containing NH 3 , which is an inflowing waste gas (G).
  • G inflowing waste gas
  • the present invention provides a plurality of gas-liquid contact means units (M1) combined with the gas-liquid contact means assembly (MS) according to the present invention in order to optimize the treatment according to the concentration of the waste gas (G), that is, alkaline exhaust gas, and to increase the treatment efficiency.
  • the gas-liquid contact means unit M2 have different geometrical structures, and the functions of the gas-liquid contact appear differently depending on the geometry.
  • the gas-liquid contact means unit body M1 is a mesh of a predetermined thickness woven in two layers. It is a structure of a filter structure in which sheets are arranged zigzag between a plurality of vertical bulkheads, and induces foaming to filter and absorb contaminated particulate matter contained in waste gas and particulate matter generated by gas-liquid contact, and mist by foaming.
  • gas-liquid contact means unit (M2) is a bar-shaped circular rods are arranged in a plurality of layers while being arranged in parallel with a plurality of spaced intervals, between the gaps and the circular rods are arranged alternately, the gas Reflow and coarsening are repeated according to the flow rate of, and thus it has a function of promoting gas absorption.
  • the scrubber 1 according to the present invention is the gas-liquid contact means unit (M1) and according to the concentration of the waste gas (G), that is, alkaline exhaust gas containing NH 3 and the like, that is, high concentration (50 ⁇ 500ppm) to low concentration (less than 50ppm) and
  • G waste gas
  • the gas-liquid contact means assembly MS is achieved.
  • the gas-liquid contact means assembly (MS) is at the top and bottom of the gas-liquid contact means assembly (MS) when the gas-liquid contact means unit (M1) and the gas-liquid contact means unit (M2) are constantly combined.
  • the dispersion S1 having an equal distribution function of the cleaning liquid and the dispersion dispersion S2 having an equal distribution function of the cleaning liquid are respectively mounted.
  • Dispersion (S1) having an even distribution function of the cleaning solution is formed in a quadrangular through-hole is formed in four directions continuously by the partition wall, the four rectangular through-holes adjacent to the distribution structure in the center, the equal distribution of the cleaning solution Dispersion (S2) having a function is made of a structure in which the rectangular through-holes are arranged continuously in all directions by the partition wall.
  • the waste gas treatment scrubber combined with the multi-functional gas-liquid contact means to be suitable for the characteristics of the waste gas according to the present invention is optimized for treatment according to the concentration of the toxic waste gas (G), that is, the alkaline exhaust gas discharged from the semiconductor manufacturing process.
  • G toxic waste gas
  • the present invention has the advantage that can easily cope with the combination of gas-liquid contact means suitable for treatment for the concentration change of the waste gas has the advantage that the required cost of the change of the scrubber is reduced.
  • FIG. 1 is a front view schematically showing a scrubber of one embodiment according to the present invention
  • Figure 2 is a rear view schematically showing a scrubber of one embodiment according to the present invention
  • 3 to 6 is a view schematically showing a gas-liquid contact means unit and a dispersion in the present invention
  • FIG. 1 and 2 are front and rear views schematically showing a scrubber for treating a high concentration of waste gas G containing 50 to 500 ppm of alkaline exhaust gas according to an embodiment of the present invention. Reference will be made to the scrubber according to the present invention.
  • the scrubber 1 of the present invention is provided with an exhaust pipe 1a through which the purge gas is discharged at the upper end and a waste liquid storage tank 1c at the lower end thereof, and a cleaning liquid injection nozzle 1b is installed at the upper side of the scrubber 1.
  • a gas-liquid contact means combination MS is combined to be optimized for the treatment of the waste gas G which is a high concentration of alkaline exhaust gas flowing in.
  • the gas-liquid contact means combination is a dispersion (S1) having an even distribution function of the cleaning liquid sequentially from the top, induces the generation of bubbles, particulate matter contained in the waste gas by the foam and particles generated when the gas-liquid contact , Gas-liquid contact means unit (M1) having a function of filtering and absorbing mist, etc., gas-liquid contact means unit (M2) having a function of promoting resorption and coarsening by re-spreading and coarsening according to the flow rate of gas, and a cleaning liquid.
  • a dispersion (S2) having an even distribution function of is laminated.
  • the cleaning liquid supply pipe (3) is connected to the cleaning liquid injection nozzle (1b) to one side of the upper portion of the scrubber (1), the waste liquid storage tank (1c) installed at the lower end is introduced into the waste gas inlet pump (P 1 )
  • the waste gas inlet pipe 2 is connected, and on the other side, a waste liquid discharge pipe 1d is installed, and the cleaning liquid supply pipe 3 is equipped with a cleaning liquid supply pump P 2 for introducing the cleaning liquid from the cleaning liquid storage tank 3a.
  • the waste gas (G) is introduced into the waste liquid of the waste liquid storage tank (1c) through the waste gas inflow pipe (2) by the waste gas inflow pump (P 1 ), and the washing liquid from the washing liquid storage tank (3a) is supplied with the washing liquid supply pump (P 2).
  • the cleaning liquid is lowered while being injected into the scrubber 1 while being supplied to the cleaning liquid injection nozzle 1b installed inside the scrubber 1 through the cleaning liquid supply pipe 3.
  • waste gas introduced into the waste liquid of the waste liquid storage tank 1c is preliminarily treated by the waste liquid of the waste liquid storage tank 1c, and the gas-liquid contact means combination (MS) combined to be optimized for the treatment of the waste gas G, which is a high concentration of alkaline exhaust gas (MS).
  • Waste gas is purified and discharged to the outside through the exhaust pipe (1a) installed on the top of the scrubber (1) as the washing liquid and the gas-liquid contact made descending while passing through).
  • the sprayed and descending washing liquid is first lowered while being dispersed more widely by the dispersion (S1) having an equal distribution function of the washing liquid, and the rising waste gas also firstly has a dispersion having an equal distribution function of the washing liquid. It is evenly distributed by (S2) and rises correspondingly, foaming is generated by the gas-liquid contact means unit M1, and particulate matter and mist generated when contacting the polluted particles contained in the waste gas and gas-liquid by the foam.
  • the gas-liquid contact means unit (M2) repeats the re-scattering and coarsening according to the flow rate of the gas to promote the absorption of the gas while improving the gas-liquid contact, so that the high concentration of alkaline exhaust gas It is processed efficiently.
  • the gas-liquid contact means unit M1 having a function of filtering and absorbing the contaminant particles contained in the waste gas and the gas-liquid particles generated by the foam and mist by inducing foam generation has two layers inside the frame F. It consists of a structure of the filter structure arranged while zigzag passing between the vertical partition wall (5) of approximately ' ⁇ ' shape arranged at a predetermined interval of the network sheet (4) of the predetermined thickness, (b).
  • the gas-liquid contact means unit (M2) having a function of promoting resorption and coarsening by reflowing and coarsening according to the flow rate of the gas has a rod-shaped circular rod (6) at a predetermined interval within the frame (F). Dogs are arranged in parallel and arranged in a plurality of layers, and the gaps and the circular rods 6 are alternately arranged between the layers and the layers.
  • the dispersion (S1) having an even distribution function of the cleaning liquid has a structure in which the rectangular through hole (Ha) consisting of partitions in the frame (F) is formed in all four directions continuously, and adjacent four rectangular through holes (Ha) flow in the center.
  • Dispersion (S2) has a structure in which the rectangular through hole (Hb) consisting of partition walls in the frame (F) is arranged in a continuous direction.
  • the waste gas to be treated (G) is a low concentration exhaust gas containing less than 50 ppm of alkaline exhaust gas
  • the gas-liquid contacting means assembly (MS) has a dispersion (S1) and foam having an equal distribution function of the cleaning liquid sequentially from above.
  • Gas-liquid contact means unit (M1) having the function of filtering and absorbing the contaminated particulate matter contained in the waste gas and the gas-liquid particulate matter, mist, etc. by inducing generation and foaming, and re-splashing and adjusting according to the gas flow rate.
  • the gas-liquid contact means unit (M2) having a function of promoting gas absorption, inducing foaming, and filtering contaminated particulate matter contained in the waste gas by the foam and particulate matter generated by gas-liquid contact, mist, etc. It is the same as that of ⁇ Example 1> except that the gas-liquid contact means unit M1 having an absorbing function and the dispersion S2 having an equal distribution function of the cleaning liquid are stacked. The waste gas was processed by the one scrubber 1.
  • the gas-liquid contact means unit (M1) and (M2) is preferably manufactured in the same standard in order to be assembled integrally, the material of each gas-liquid contact means unit is preferably a synthetic resin material.
  • each gas-liquid contact means unit is not limited because it is determined according to the treatment capacity of the waste gas in the scrubber (1), if the skilled in the art belongs to the present invention can be produced without difficulty according to the treatment capacity of the waste gas. I can say that.
  • Waste gas treatment scrubber using the multi-functional gas-liquid contact means according to the present invention described above is applied to the gas-liquid contact means combination optimized for treatment according to the concentration of toxic waste gas (G), that is, alkaline exhaust gas discharged from the semiconductor manufacturing process.
  • G toxic waste gas
  • the gas treatment efficiency of the scrubber is improved, and the gas-liquid contact unit suitable for treatment can be easily coped with the change in the properties of the waste gas.
  • the scrubber of the present invention described above has the advantage that it can be easily replaced by a combination of gas-liquid contact means suitable for treatment with respect to the change and concentration of the waste gas, thereby achieving the effect of improving the gas treatment efficiency of the scrubber and at the same time changing the scrubber Due to the advantage that the required cost is also reduced, the industrial availability is very high.

Abstract

The present invention relates to a scrubber treating exhaust gas by means of a multilayer gas-liquid contact means assembly formed by combining a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be appropriate for treating alkaline exhaust gas according to the properties and concentration thereof, the alkaline exhaust gas being emitted from a semiconductor manufacturing process. The scrubber is a wet scrubber absorbing and purifying exhaust gas by having a cleaning solution come into contact with alkaline exhaust gas, wherein the gas-liquid contact means installed inside the scrubber is formed of a multilayer structure formed by combining a plurality of gas-liquid contact means unit bodies having different gas-liquid contact functions.

Description

폐가스 성상에 따라 처리에 적합하도록 복수기능의 기액접촉수단으로 조합된 폐가스 처리 스크러버Waste gas treatment scrubber combined with multi-functional gas-liquid contact means suitable for treatment according to waste gas properties
본 발명은 폐가스를 처리하는 스크러버에 관한 것이며, 보다 구체적으로는 반도체 제조공정에서 배출하는 유독성 배기가스의 성상에 따라 처리에 적합하도록 복수기능의 기액 접촉수단으로 조합한 폐가스 처리 스크러버에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scrubber for treating waste gas, and more particularly, to a waste gas treating scrubber combined with a multi-functional gas-liquid contacting unit so as to be suitable for treatment according to the properties of toxic exhaust gas discharged from a semiconductor manufacturing process.
일반적으로, 반도체 제조공정의 웨이퍼 상에 박막을 형성 또는 식각 등의 공정으로부터 배출되는 배기가스(폐가스)에는 불화수소, 황산화물, 질소산화물, 황화수소, 아황산가스 등의 산성가스 및 암모니아 등의 알칼리성 가스들을 포함하고 있으므로 인체에 유해할 뿐만 아니라 환경오염을 유발시키기 때문에 반도체 제조공정에서 배출되는 배기가스는 정화시킨 후에 대기 중에 배출하여야 한다.In general, the exhaust gas (waste gas) discharged from a process of forming or etching a thin film on a wafer of a semiconductor manufacturing process includes acidic gases such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide and sulfurous acid gas, and alkaline gases such as ammonia. Since these components are not only harmful to human body but also cause environmental pollution, the exhaust gas emitted from the semiconductor manufacturing process should be discharged to the atmosphere after purification.
상기 반도체 제조 공정에서 배출되는 불화수소, 황산화물, 질소산화물, 황화수소, 아황산가스 암모나아 등과 같은 유독성 가스성분을 제거하기 위한 방법으로 습식 방법인 배기가스(폐가스)에 세정용액을 분무하여 기액접촉을 이용하는 스크러버 방식이 널리 알려져 있으며, 이와 관련된 선행기술로 예를 들면, 국내 등록특허공보 제10-0816822호에 하우징에 가스유로장치와 기액반응장치 및 제습장치를 설치하여서 된 것에 있어서, 가스유로장치를 굴곡 유로판(21)과 사선 유로판(22)으로 구성시키고, 기액반응장치를 충전재층을 가진 반응기(31)와 분사장치로 형성시키되 분사장치를 기액반응장치의 상부와 입측에 설치하여 구성시켜서 된 것을 특징으로 하는 복합오염물질을 동시에 처리하는 멀티스크러버를 개시하고 있으며, 국내 등록특허공보 등록번호 제10-1020258호에는 일측에 형성되는 폐가스 유입구와, 타측에 형성되는 폐가스 유출구를 포함하며, 내부가 박스 형상으로 형성되는 하우징과 상기 하우징의 일측 내부에 형성되어 하우징의 내부로 유입되는 산성가스를 포함하는 폐가스에 물을 분사하여 산성 가스를 제거하는 제1분사부 및 상기 하우징의 타측 내부에 형성되어 코로나 방전에 의하여 상기 제1분사부로부터 유입되는 산미스트를 집진하는 방전 집진부를 포함하여 형성되는 것을 특징으로 하는 산성 폐가스 처리 시스템을 개시하고 있다.In order to remove toxic gas components such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide, sulfurous acid ammonium, etc. discharged from the semiconductor manufacturing process, the cleaning solution is sprayed on the exhaust gas (waste gas), which is a wet method, to contact gas-liquid contact. The scrubber method to be used is widely known, and in the related art, for example, in the case of installing a gas flow path device, a gas-liquid reaction device, and a dehumidification device in a housing in Korean Patent Publication No. 10-0816822, the gas flow path device is used. It consists of a curved flow path plate 21 and an oblique flow path plate 22, and the gas-liquid reaction device is formed of a reactor 31 having a filler layer and an injection device, the injection device is installed on the top and inlet side of the gas-liquid reaction device Disclosed is a multi scrubber for simultaneously treating a complex pollutant, characterized in that No. 10-1020258 includes a waste gas inlet formed on one side and a waste gas outlet formed on the other side, and a housing formed in a box shape and an acid gas introduced into one side of the housing and introduced into the housing. It is formed to include a first injection unit for removing the acid gas by injecting water to the waste gas to be included and a discharge dust collector for collecting the acid mist introduced from the first injection unit by the corona discharge formed inside the other side of the housing An acidic waste gas treatment system is disclosed.
또 스크러버에 이용되는 기액접촉장치와 관련하여 국내 등록특허공보 등록번호 제10-1320638호에 소정의 형상으로 이루어진 판상체(10)와; 상기 판상체(10)의 가운데를 접어서 일정한 곡률을 갖는 절곡부(20)로 구성되고, 상기 판상체(10)는 폴리에틸렌, 폴리프로필렌 등의 폴리올레핀(polyolefin)이나, 염화비닐리덴, 폴리에스테르, 나일론, 아라미드, 탄소섬유 등의 유기섬유나, 무기섬유, 금속섬유로 구성되며, 상기 판상체(10)에는 내부에 소정의 형상으로 이루어진 격자망(12)이 형성되며, 상기 격자망(12)은 가로 2∼10㎜, 세로 2∼10㎜로 형성되며, 상기 절곡부(20)는 단면형상이 U형 또는 V형으로 형성됨을 특징으로 하는 다공성 필터 및 이를 이용한 기액접촉장치를 개시하고 있다.In addition, with respect to the gas-liquid contact device used for the scrubber plate-shaped body 10 made of a predetermined shape in the Korean Patent Publication No. 10-1320638; It is composed of a bent portion 20 having a certain curvature by folding the center of the plate 10, the plate 10 is a polyolefin such as polyethylene, polypropylene, vinylidene chloride, polyester, nylon And organic fibers such as aramid and carbon fiber, inorganic fibers, and metal fibers, and the grid 10 has a grid 12 having a predetermined shape therein, and the grid 12 2 to 10 mm in width and 2 to 10 mm in length, and the bent portion 20 discloses a porous filter and a gas-liquid contact device using the same, wherein the cross-sectional shape is formed in a U shape or a V shape.
상기 선행기술들은 폐가스의 유형 즉 성분, 농도와 상관없이 일률적으로 기액접촉체에 의해 폐가스를 분리 제거 하는 기술이므로 폐가스의 유형에 따라 폐가스의 분리 제거효율에 문제점을 지니고 있다.The prior art has a problem in the separation and removal efficiency of the waste gas according to the type of waste gas because it is a technology for uniformly separating and removing the waste gas by the gas-liquid contact regardless of the type of the waste gas, that is, component, concentration.
본 발명은 폐가스의 유형 특히, 반도체 제조공정에서 배출되는 배기가스 중에 불화수소, 황산화물, 질소산화물, 황화수소, 아황산가스 암모니아 등과 같은 유독성 가스성분의 종류 및 농도에 따라 그 처리에 적합하게 기능이 상이한 단위 기액접촉수단을 복수개 조합하여 다층으로 적용함으로써 배기가스 제거효율을 향상시키는 것을 확인하고 본 발명을 완성하였다.The present invention differs in function according to the types and concentrations of toxic gas components such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide, ammonia sulfite and the like in the exhaust gases emitted from the semiconductor manufacturing process. The present invention has been confirmed by improving the exhaust gas removal efficiency by applying a plurality of unit gas-liquid contact means in combination.
본 발명은 유독성 폐가스를 제거하는 스크러버의 제공을 목적으로 하며, 구체적으로는 폐가스의 성상에 따라 처리에 적합하도록 기액접촉 기능이 상이한 단위 기액접촉수단을 복수개 조합한 다층의 기액접촉수단 조합체에 의해 배기가스를 처리하는 스크러버의 제공을 목적으로 하는 것이다.An object of the present invention is to provide a scrubber for removing toxic waste gas. Specifically, the gas is exhausted by a multi-layer gas-liquid contact means combination of a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be suitable for treatment according to the properties of the waste gas. It aims at providing the scrubber which processes a gas.
보다 구체적으로는 본 발명은 반도체 제조공정에서 배출하는 알칼리성 배기가스의 농도에 따라 그 처리에 적합하도록 기액접촉 기능이 상이한 단위 기액접촉수단을 복수개 조합한 다층의 기액접촉수단 조합체에 의해 배기가스를 처리하는 스크러버의 제공을 목적으로 하는 것이다.More specifically, the present invention treats the exhaust gas by a multi-layer gas-liquid contact means combination comprising a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be suitable for the treatment according to the concentration of the alkaline exhaust gas discharged from the semiconductor manufacturing process. The purpose is to provide a scrubber.
일반적으로 반도체 제조공정에서는 NF3, CF4, C2F6, C3F8, F2, OF2, SiO2, SiF4, NH3, HF 등을 함유하는 과불화탄소(PFC: Per-Fluorocompounds) 배기가스, HF, HCl, Cl2 등을 함유하는 산성 배기가스, NH3 등을 함유하는 알칼리성 배기가스 및 SiF4, HF 등을 함유하는 가연 배기가스인 유독성 폐가스가 배출되고 있으며, 상기 과불화탄소(PFC) 배기가스, 산성 배기가스, 알칼리성 배기가스, 가연 배기가스는 반도체 제조공정의 조건, 가동시간, 생산제품에 따라 유형을 달리하여 배출되고 있을 뿐 아니라 고농도(50~500ppm) 내지 저농도(50ppm 미만)로 배출되고 있다.Generally, in the semiconductor manufacturing process, perfluorofluorocompounds containing NF 3 , CF 4 , C 2 F 6 , C 3 F 8 , F 2 , OF 2 , SiO 2 , SiF 4 , NH 3 , HF, etc. ) Exhaust gas, HF, HCl, Cl 2 Toxic waste gases, which are acidic exhaust gases containing and the like, alkaline exhaust gases containing NH 3 , and combustible exhaust gases containing SiF 4 , HF and the like, are discharged, and the perfluorocarbon (PFC) exhaust gases, acidic exhaust gases, Alkaline exhaust gas and combustible exhaust gas are not only discharged depending on the conditions of the semiconductor manufacturing process, operating hours, and products, but also emitted at high concentrations (50 to 500 ppm) to low concentrations (less than 50 ppm).
본 발명은 상기 폐가스(G)의 유형과 농도에 따라 그 처리를 최적화하여 처리효율을 향상시키기 위하여 기하학적 구조의 상이성에 의해 기액접촉의 기능이 상이한 기액접촉수단 단위체를 2이상 조합한 폐가스 처리 스크러버로 이루어진다.The present invention is a waste gas treatment scrubber that combines two or more gas-liquid contact means units having different functions of gas-liquid contact by geometrical differences in order to optimize the treatment according to the type and concentration of the waste gas (G) to improve treatment efficiency. Is done.
구체적으로는 본 발명의 목적을 달성하기 위한 해결수단으로서, 폐가스의 성상에 적합하도록 복수기능의 기액접촉수단으로 조합한 폐가스 처리 스크러버는 상측으로 정화가스가 배출되는 배기관(1a)이 설치되며, 내부에는 상부에 세정액 분사노즐(1b)이 설치되고, 중간부에 기액접촉수단 조합체(MS)가 장착되며, 하부에 폐액저장조(1c)가 설치되는 스크러버(1)와, 상기 폐액저장조(1c)의 일측에 연결되는 폐가스 유입관(2) 및 스크러버(1)의 내부의 상부에 설치된 세정액 분사노즐(1b)에 연결되는 세정액 공급관(3)을 포함하는 스크러버에 있어서, 상기 기액접촉수단 조합체(MS)는 유입되는 폐가스(G)인 NH3 등을 함유하는 알칼리성 배기가스의 농도 변화에 따라 처리에 적합하도록 기하학적 구조가 상이한 복수개의 기액접촉수단 단위체(M1) 및 기액접촉수단 단위체(M2)를 일정하게 조합한 다층구조로 이루어진다.Specifically, as a solution for achieving the object of the present invention, the waste gas treatment scrubber combined with a multi-functional gas-liquid contact means to fit the characteristics of the waste gas is provided with an exhaust pipe (1a) for discharging the purification gas upwards, the inside In the upper part of the cleaning liquid injection nozzle (1b) is installed, the middle part of the gas-liquid contact means combination (MS), the lower part of the scrubber (1), the waste liquid storage tank (1c) is installed, and the waste liquid storage tank (1c) of In the scrubber comprising a waste gas inlet pipe (2) connected to one side and a cleaning liquid supply pipe (3) connected to the cleaning liquid injection nozzle (1b) installed on the inside of the scrubber (1), the gas-liquid contact means combination (MS) Is a plurality of gas-liquid contact means units (M1) and gas-liquid contact means units having different geometries so as to be suitable for treatment in accordance with a change in the concentration of alkaline exhaust gas containing NH 3 , which is an inflowing waste gas (G). It consists of a multilayer structure which fixedly combined the sieve M2.
본 발명은 상기한 폐가스(G) 즉 알칼리성 배기가스의 농도에 따라 그 처리를 최적화하고, 처리효율을 높이기 위하여 본 발명에 따른 기액접촉수단 조합체(MS)에 조합되는 복수개의 기액접촉수단 단위체(M1) 및 기액접촉수단 단위체(M2)는 상호 기하학적 구조를 달리하고 있으며, 기하학적 구조의 상이성에 의해 기액접촉의 기능이 상이하게 나타난다.The present invention provides a plurality of gas-liquid contact means units (M1) combined with the gas-liquid contact means assembly (MS) according to the present invention in order to optimize the treatment according to the concentration of the waste gas (G), that is, alkaline exhaust gas, and to increase the treatment efficiency. ) And the gas-liquid contact means unit M2 have different geometrical structures, and the functions of the gas-liquid contact appear differently depending on the geometry.
상기 본 발명에 따른 기액접촉수단 단위체(M1) 및 기액접촉수단 단위체(M2)의 기능 및 구조를 구체적으로 설명하면, (a)기액접촉수단 단위체(M1)는 2겹으로 엮어진 일정두께의 망상시트가 다수의 수직하는 격벽사이로 지그재그식으로 배치된 필터구조체의 구조이며, 거품발생을 유도하여 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트 등을 여과 및 흡수하는 기능을 가지며, (b)기액접촉수단 단위체(M2)는 막대형상의 원형봉이 간격을 두고 다수개 평행되게 배치되면서 다수의 층으로 설치되고, 층간에는 간격과 원형봉이 교대로 배치된 구조이며, 기체의 유속에 따라 재비산과 조대화가 반복되어 기체의 흡수를 촉진시키는 기능을 가지는 것으로 이루어진다.When explaining the function and structure of the gas-liquid contact means unit body M1 and the gas-liquid contact means unit body M2 according to the present invention in detail, (a) the gas-liquid contact means unit body M1 is a mesh of a predetermined thickness woven in two layers. It is a structure of a filter structure in which sheets are arranged zigzag between a plurality of vertical bulkheads, and induces foaming to filter and absorb contaminated particulate matter contained in waste gas and particulate matter generated by gas-liquid contact, and mist by foaming. (B) gas-liquid contact means unit (M2) is a bar-shaped circular rods are arranged in a plurality of layers while being arranged in parallel with a plurality of spaced intervals, between the gaps and the circular rods are arranged alternately, the gas Reflow and coarsening are repeated according to the flow rate of, and thus it has a function of promoting gas absorption.
그리고 본 발명에 따른 스크러버(1)는 폐가스(G) 즉 NH3 등이 함유된 알칼리성 배기가스의 농도 즉 고농도(50 ~ 500ppm) 내지 저농도(50ppm 미만)에 따라 상기 기액접촉수단 단위체(M1) 및 기액접촉수단 단위체(M2)를 일정하게 조합함으로써 본 발명에 따른 기액접촉수단 조합체(MS)가 이루어진다.And the scrubber 1 according to the present invention is the gas-liquid contact means unit (M1) and according to the concentration of the waste gas (G), that is, alkaline exhaust gas containing NH 3 and the like, that is, high concentration (50 ~ 500ppm) to low concentration (less than 50ppm) and By constantly combining the gas-liquid contact means unit M2, the gas-liquid contact means assembly MS according to the present invention is achieved.
또 본 발명에 따른 기액접촉수단 조합체(MS)는 상기 기액접촉수단 단위체(M1) 및 기액접촉수단 단위체(M2)가 일정하게 조합될 때 기액접촉수단 조합체(MS)의 최상단 및 최하단에는 본 발명에 따른 세정액의 균등한 분배기능을 갖는 분산체(S1) 및 세정액의 균등한 분배기능을 갖는 분산체 분산체(S2)가 각각 장착된다.In addition, the gas-liquid contact means assembly (MS) according to the present invention is at the top and bottom of the gas-liquid contact means assembly (MS) when the gas-liquid contact means unit (M1) and the gas-liquid contact means unit (M2) are constantly combined. The dispersion S1 having an equal distribution function of the cleaning liquid and the dispersion dispersion S2 having an equal distribution function of the cleaning liquid are respectively mounted.
상기 세정액의 균등한 분배기능을 갖는 분산체(S1)은 격벽에 의해 4각형 통공이 사방연속으로 형성되며, 인접하는 4개의 사각형 통공이 중앙에서 유통되는 구조로 이루어지며, 상기 세정액의 균등한 분배기능을 갖는 분산체(S2)는 격벽에 의해 사각형 통공이 사방연속으로 배열된 구조로 이루어진다.Dispersion (S1) having an even distribution function of the cleaning solution is formed in a quadrangular through-hole is formed in four directions continuously by the partition wall, the four rectangular through-holes adjacent to the distribution structure in the center, the equal distribution of the cleaning solution Dispersion (S2) having a function is made of a structure in which the rectangular through-holes are arranged continuously in all directions by the partition wall.
상기한 본 발명에 따른 폐가스의 성상에 적합하도록 복수기능의 기액접촉수단 으로 조합한 폐가스 처리 스크러버는 반도체 제조공정에서 배출되는 유독성 폐가스(G) 즉 알칼리성 배기가스의 농도에 따라 처리에 적합하도록 최적화된 기액접촉수단 조합체를 적용함으로써 스크러버의 가스처리 효율을 향상시키는 작용효과를 나타낸다.The waste gas treatment scrubber combined with the multi-functional gas-liquid contact means to be suitable for the characteristics of the waste gas according to the present invention is optimized for treatment according to the concentration of the toxic waste gas (G), that is, the alkaline exhaust gas discharged from the semiconductor manufacturing process. By applying the gas-liquid contact means combination, there is an effect of improving the gas treatment efficiency of the scrubber.
또한 본 발명은 폐가스의 농도변화에 대하여 처리에 적합한 기액접촉수단 조합체로 간편하게 대처할 수 있는 장점이 있으므로 스크러버의 변경에 따른 소요경비도 감소되는 장점이 있다.In addition, the present invention has the advantage that can easily cope with the combination of gas-liquid contact means suitable for treatment for the concentration change of the waste gas has the advantage that the required cost of the change of the scrubber is reduced.
도 1은 본 발명에 따른 일 실시예의 스크러버를 개략적으로 나타내는 정면도 1 is a front view schematically showing a scrubber of one embodiment according to the present invention
도 2는 본 발명에 따른 일 실시예의 스크러버를 개략적으로 나타내는 배면도Figure 2 is a rear view schematically showing a scrubber of one embodiment according to the present invention
도 3 내지 도 6은 본 발명에 기액접촉수단 단위체 및 분산체를 개략적으로 나타내는 도면3 to 6 is a view schematically showing a gas-liquid contact means unit and a dispersion in the present invention
이하에서는 본 발명을 첨부한 도면에 의해 구체적으로 설명하기로 하겠으나, 본 발명은 하기의 설명에 의하여 제한되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings, but the present invention is not limited to the following description.
<실시예 1><Example 1>
도 1 및 도 2는 본 발명에 따른 일 실시예로 알칼리성 배기가스를 50 ~ 500ppm 함유하는 고농도의 폐가스(G)를 처리하기 위한 스크러버를 개략적으로 나타내는 정면도 및 배면도로써, 도 1 및 도 2를 참조하여, 본 발명에 따른 스크러버를 설명한다. 1 and 2 are front and rear views schematically showing a scrubber for treating a high concentration of waste gas G containing 50 to 500 ppm of alkaline exhaust gas according to an embodiment of the present invention. Reference will be made to the scrubber according to the present invention.
본 발명의 스크러버(1)는 그 상단에 정화가스가 배출되는 배기관(1a)과 하단에 폐액저장조(1c)가 설치되고, 스크러버(1)의 내측으로 상부에 세정액 분사노즐(1b)이 설치되고, 폐액저장조(1c)의 상측에는 유입되는 고농도의 알칼리성 배기가스인 폐가스(G)의 처리에 최적화되도록 조합된 기액접촉수단 조합체(MS)가 장착된다.The scrubber 1 of the present invention is provided with an exhaust pipe 1a through which the purge gas is discharged at the upper end and a waste liquid storage tank 1c at the lower end thereof, and a cleaning liquid injection nozzle 1b is installed at the upper side of the scrubber 1. On the upper side of the waste liquid storage tank 1c, a gas-liquid contact means combination MS is combined to be optimized for the treatment of the waste gas G which is a high concentration of alkaline exhaust gas flowing in.
상기 기액접촉수단 조합체(MS)는 위에서부터 순차적으로 세정액의 균등한 분배기능을 갖는 분산체(S1), 거품발생을 유도하여 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트 등을 여과 및 흡수하는 기능을 갖는 기액접촉수단 단위체(M1), 기체의 유속에 따라 재비산과 조대화가 반복되어 기체의 흡수를 촉진시키는 기능을 갖는 기액접촉수단 단위체(M2) 및 세정액의 균등한 분배기능을 갖는 분산체(S2)가 적층되어 있다.The gas-liquid contact means combination (MS) is a dispersion (S1) having an even distribution function of the cleaning liquid sequentially from the top, induces the generation of bubbles, particulate matter contained in the waste gas by the foam and particles generated when the gas-liquid contact , Gas-liquid contact means unit (M1) having a function of filtering and absorbing mist, etc., gas-liquid contact means unit (M2) having a function of promoting resorption and coarsening by re-spreading and coarsening according to the flow rate of gas, and a cleaning liquid. A dispersion (S2) having an even distribution function of is laminated.
또 상기 스크러버(1)의 상부에는 일 측으로 세정액 분사노즐(1b)에 세정액 공급관(3)이 연결되고, 그 하단에 설치된 폐액저장조(1c)에는 일 측으로 폐가스 유입펌프(P1)에 의해 유입되는 폐가스 유입관(2)이 접속되고, 타 측에는 폐액배출관(1d)이 설치되어 있으며, 상기 세정액 공급관(3)에는 세정액 저장조(3a)로부터 세정액을 유입시키기 위한 세정액 공급펌프(P2)가 장착되어 있다.In addition, the cleaning liquid supply pipe (3) is connected to the cleaning liquid injection nozzle (1b) to one side of the upper portion of the scrubber (1), the waste liquid storage tank (1c) installed at the lower end is introduced into the waste gas inlet pump (P 1 ) The waste gas inlet pipe 2 is connected, and on the other side, a waste liquid discharge pipe 1d is installed, and the cleaning liquid supply pipe 3 is equipped with a cleaning liquid supply pump P 2 for introducing the cleaning liquid from the cleaning liquid storage tank 3a. have.
상기 도 1 및 도 2를 참조하여, 상기한 본 발명에 따른 복수기능의 기액접촉수단(MS)을 이용하여 알칼리성 배기가스를 50 ~ 500ppm 함유하는 고농도의 폐가스(G)를 처리과정을 설명하면,1 and 2, a process of treating a high concentration of waste gas G containing 50 to 500 ppm of alkaline exhaust gas by using the multi-functional gas-liquid contact means MS according to the present invention will be described.
폐가스(G)를 폐가스 유입펌프(P1)에 의해 폐가스 유입관(2)을 통하여 폐액저장조(1c)의 폐액 내부로 유입시키고, 이와 함께 세정액 저장조(3a)로부터 세정액이 세정액 공급펌프(P2)에 의해 세정액 공급관(3)을 통하여 스크러버(1) 내부에 설치된 세정액 분사노즐(1b)에 공급되면서 세정액이 스크러버(1) 내부에 분사되면서 하강한다.The waste gas (G) is introduced into the waste liquid of the waste liquid storage tank (1c) through the waste gas inflow pipe (2) by the waste gas inflow pump (P 1 ), and the washing liquid from the washing liquid storage tank (3a) is supplied with the washing liquid supply pump (P 2). The cleaning liquid is lowered while being injected into the scrubber 1 while being supplied to the cleaning liquid injection nozzle 1b installed inside the scrubber 1 through the cleaning liquid supply pipe 3.
상기 폐액저장조(1c)의 폐액 내부로 유입된 폐가스는 폐액저장조(1c)의 폐액에의해 예비 처리되고, 고농도의 알칼리성 배기가스인 폐가스(G)의 처리에 최적화되도록 조합된 기액접촉수단 조합체(MS)를 통과하면서 하강하는 세정액과 기액접촉이 이루어지면서 폐가스는 정화되어 스크러버(1) 상단에 설치된 배기관(1a)을 통하여 외부로 배출된다.The waste gas introduced into the waste liquid of the waste liquid storage tank 1c is preliminarily treated by the waste liquid of the waste liquid storage tank 1c, and the gas-liquid contact means combination (MS) combined to be optimized for the treatment of the waste gas G, which is a high concentration of alkaline exhaust gas (MS). Waste gas is purified and discharged to the outside through the exhaust pipe (1a) installed on the top of the scrubber (1) as the washing liquid and the gas-liquid contact made descending while passing through).
상기 폐가스가 복수기능의 기액접촉수단(MS)을 통과하면서 하강하는 세정액과 기액접촉이 이루어지는 과정을 보다 구체적으로 설명하면,When the waste gas is passed through the gas-liquid contact means (MS) having a plurality of functions to be described in more detail the process of making the gas-liquid contact with the falling down liquid,
상기 분사되어 하강하는 세정액은 1차적으로 세정액의 균등한 분배기능을 갖는 분산체(S1)에 의해 보다 더 넓게 분산되면서 하강하고, 상승하는 폐가스 역시 1차적으로 세정액의 균등한 분배기능을 갖는 분산체(S2)에 의해 균등하게 분배되어 상응하게 상승하게 되며, 기액접촉수단 단위체(M1)에 의해 거품발생이 발생되고, 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트 등을 여과 및 흡수 작용이 수행되고, 기액접촉수단 단위체(M2)에 의해 기체의 유속에 따라 재비산과 조대화가 반복되어 기체의 흡수를 촉진되면서 기액접촉이 향상되어 고농도의 알칼리성 배기가스가 보다 효율적으로 처리된다.The sprayed and descending washing liquid is first lowered while being dispersed more widely by the dispersion (S1) having an equal distribution function of the washing liquid, and the rising waste gas also firstly has a dispersion having an equal distribution function of the washing liquid. It is evenly distributed by (S2) and rises correspondingly, foaming is generated by the gas-liquid contact means unit M1, and particulate matter and mist generated when contacting the polluted particles contained in the waste gas and gas-liquid by the foam. Filtration and absorption are carried out, and the gas-liquid contact means unit (M2) repeats the re-scattering and coarsening according to the flow rate of the gas to promote the absorption of the gas while improving the gas-liquid contact, so that the high concentration of alkaline exhaust gas It is processed efficiently.
<기액접촉단위체 및 분산체의 구체적 예><Specific examples of gas-liquid contact unit and dispersion>
그리고 3 도 내지 6도를 참조하여 본 발명에 따른 기액접촉수단 단위체(M1) 및 (M2)와 세정액의 균등한 분배기능을 갖는 분산체(S1) 및 (S2)를 아래에서 구체적으로 설명하면, (a). 거품발생을 유도하여 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트 등을 여과 및 흡수하는 기능을 갖는 기액접촉수단 단위체(M1)는 프레임(F) 내부에 2겹으로 엮어진 일정두께의 망상시트(4)가 일정간격으로 배치된 대략‘Π’형상의 수직하는 격벽(5)들 사이로 지그재그식으로 통과하면서 배치된 필터구조체의 구조로 이루어져 있으며, (b). 기체의 유속에 따라 재비산과 조대화가 반박되어 기체의 흡수를 촉진시키는 기능을 갖는 기액접촉수단 단위체(M2)는 프레임(F) 내부에 막대형상의 원형봉(6)이 일정간격을 두고 다수개 평행되게 배치되면서 다수의 층으로 설치되고, 층과 층간에는 간격과 원형봉(6)이 교대로 배치된 구조로 이루어져 있다. And the dispersion (S1) and (S2) having an equal distribution function of the gas-liquid contact means unit (M1) and (M2) and the cleaning liquid according to the present invention with reference to 3 to 6 will be described in detail below. (a). The gas-liquid contact means unit M1 having a function of filtering and absorbing the contaminant particles contained in the waste gas and the gas-liquid particles generated by the foam and mist by inducing foam generation has two layers inside the frame F. It consists of a structure of the filter structure arranged while zigzag passing between the vertical partition wall (5) of approximately 'Π' shape arranged at a predetermined interval of the network sheet (4) of the predetermined thickness, (b). The gas-liquid contact means unit (M2) having a function of promoting resorption and coarsening by reflowing and coarsening according to the flow rate of the gas has a rod-shaped circular rod (6) at a predetermined interval within the frame (F). Dogs are arranged in parallel and arranged in a plurality of layers, and the gaps and the circular rods 6 are alternately arranged between the layers and the layers.
그리고 세정액의 균등한 분배기능을 갖는 분산체(S1)은 프레임(F) 내에 격벽으로 이루어진 사각형 통공(Ha)이 사방연속으로 형성되고, 인접하는 4개의 사각형 통공(Ha)이 중앙에서 유통되는 구조이며, 분산체(S2)는 프레임(F) 내에 격벽으로 이루어진 사각형 통공(Hb)이 사방연속으로 배열된 구조로 이루어진다.And the dispersion (S1) having an even distribution function of the cleaning liquid has a structure in which the rectangular through hole (Ha) consisting of partitions in the frame (F) is formed in all four directions continuously, and adjacent four rectangular through holes (Ha) flow in the center. Dispersion (S2) has a structure in which the rectangular through hole (Hb) consisting of partition walls in the frame (F) is arranged in a continuous direction.
<실시예 2><Example 2>
처리되는 폐가스(G)가 알칼리성성 배기가스를 50ppm 미만으로 함유하는 저농도의 배기가스이고, 기액접촉수단 조합체(MS)가 위에서부터 순차적으로 세정액의 균등한 분배기능을 갖는 분산체(S1), 거품발생을 유도하여 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트 등을 여과 및 흡수하는 기능을 갖는 기액접촉수단 단위체(M1), 기체의 유속에 따라 재비산과 조대화가 반복되어 기체의 흡수를 촉진시키는 기능을 갖는 기액접촉수단 단위체(M2), 거품발생을 유도하여 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트 등을 여과 및 흡수하는 기능을 갖는 기액접촉수단 단위체(M1) 및 세정액의 균등한 분배기능을 갖는 분산체(S2)가 적층되어 있는 것을 제외하고는 상기 <실시예 1>과 동일한 스크러버(1)에 의해 폐가스를 처리하였다. The waste gas to be treated (G) is a low concentration exhaust gas containing less than 50 ppm of alkaline exhaust gas, and the gas-liquid contacting means assembly (MS) has a dispersion (S1) and foam having an equal distribution function of the cleaning liquid sequentially from above. Gas-liquid contact means unit (M1) having the function of filtering and absorbing the contaminated particulate matter contained in the waste gas and the gas-liquid particulate matter, mist, etc. by inducing generation and foaming, and re-splashing and adjusting according to the gas flow rate. By repeating the dialogue, the gas-liquid contact means unit (M2) having a function of promoting gas absorption, inducing foaming, and filtering contaminated particulate matter contained in the waste gas by the foam and particulate matter generated by gas-liquid contact, mist, etc. It is the same as that of <Example 1> except that the gas-liquid contact means unit M1 having an absorbing function and the dispersion S2 having an equal distribution function of the cleaning liquid are stacked. The waste gas was processed by the one scrubber 1.
상기한 기액접촉수단 단위체(M1) 및 (M2)는 일체로 조립되기 위하여 동일한 규격으로 제작되는 것이 바람직하며, 각각의 기액접촉수단 단위체의 재질은 합성수지 재질이 바람직하다.The gas-liquid contact means unit (M1) and (M2) is preferably manufactured in the same standard in order to be assembled integrally, the material of each gas-liquid contact means unit is preferably a synthetic resin material.
또 상기 각각의 기액접촉수단 단위체의 규격의 크기 및 높이는 스크러버(1)에서 폐가스의 처리용량에 따라 정하여지므로 한정되는 것은 아니며, 본 발명이 속하는 기술분야의 숙련가이면 폐가스의 처리용량에 따라 어려움 없이 제작할 수가 있다고 하겠다.In addition, the size and height of the standard of each gas-liquid contact means unit is not limited because it is determined according to the treatment capacity of the waste gas in the scrubber (1), if the skilled in the art belongs to the present invention can be produced without difficulty according to the treatment capacity of the waste gas. I can say that.
상기에서 설명한 본 발명에 따른 복수기능의 기액접촉수단을 이용한 폐가스 처리 스크러버는 반도체 제조공정에서 배출되는 유독성 폐가스(G) 즉 알칼리성 배기가스 의 농도에 따라 처리에 적합하도록 최적화된 기액접촉수단 조합체를 적용함으로써 스크러버의 가스처리 효율을 향상시키는 작용효과를 나타내며, 폐가스의 성상변화에 대하여 처리에 적합한 기액접촉수단 조합체로 간편하게 대처할 수 있는 장점이 있다.Waste gas treatment scrubber using the multi-functional gas-liquid contact means according to the present invention described above is applied to the gas-liquid contact means combination optimized for treatment according to the concentration of toxic waste gas (G), that is, alkaline exhaust gas discharged from the semiconductor manufacturing process. As a result, the gas treatment efficiency of the scrubber is improved, and the gas-liquid contact unit suitable for treatment can be easily coped with the change in the properties of the waste gas.
상기한 본 발명의 스크러버는 폐가스의 성상변화 및 농도에 대하여 처리에 적합한 기액접촉수단 조합체로 간편하게 교체하여 대처할 수 있는 장점이 있으므로 스크러버의 가스처리 효율을 향상시키는 작용효과를 달성함과 동시에 스크러버의 변경에 따른 소요경비도 감소되는 장점이 있어 산업상 이용가능이 매우 높다.The scrubber of the present invention described above has the advantage that it can be easily replaced by a combination of gas-liquid contact means suitable for treatment with respect to the change and concentration of the waste gas, thereby achieving the effect of improving the gas treatment efficiency of the scrubber and at the same time changing the scrubber Due to the advantage that the required cost is also reduced, the industrial availability is very high.

Claims (2)

  1. 상측으로 정화가스가 배출되는 배기관(1a)이 설치되며, 내부에는 상부에 세정액 분사노즐(1b)이 설치되고, 분사노즐(1b)의 하측으로 위에서부터 세정액의 균등한 분배기능을 갖는 분산체(S1), 거품발생을 유도하여 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트를 여과 및 흡수하는 기능을 갖는 기액접촉수단 단위체(M1), 기체의 유속에 따라 재비산과 조대화가 반복되어 기체의 흡수를 촉진시키는 기능을 갖는 기액접촉수단 단위체(M2) 및 세정액의 균등한 분배기능을 갖는 분산체(S2)가 순차적으로 적층된 기액접촉수단 조합체(MS)가 장착되고, 하부에 폐액저장조(1c)가 설치되는 스크러버(1)와, 상기 폐액저장조(1c)의 일측에 연결되는 폐가스 유입관(2) 및 스크러버(1)의 내부의 상부에 설치된 세정액 분사노즐(1b)에 연결되는 세정액 공급관(3)을 포함하는 반도체 제조공정에서 배출되는 알칼리성 배기가스인 폐가스(G)를 처리하는 스크러버(1)에 있어서, An exhaust pipe 1a through which the purge gas is discharged is installed upward, and a cleaning liquid injection nozzle 1b is provided at an upper portion thereof, and a dispersion having an equal distribution function of the cleaning liquid from above to the injection nozzle 1b. S1), inducing foaming, contaminating particulate matter contained in the waste gas by the foam and particulate matter generated by gas-liquid contact, gas-liquid contact means unit (M1) having a function of filtering and absorbing mist, ash according to the flow rate of the gas The gas-liquid contact means assembly (MS) in which the gas-liquid contact means unit (M2) having a function of promoting scattering and coarsening to promote gas absorption and the dispersion (S2) having an even distribution function of the cleaning liquid are sequentially stacked Scrubber (1) is installed, the waste liquid storage tank (1c) is installed at the bottom, the waste gas inlet pipe (2) connected to one side of the waste liquid storage tank (1c) and the cleaning liquid injection nozzle installed in the upper portion of the scrubber (1) Connect to (1b) In the scrubber 1 which processes waste gas G which is alkaline waste gas discharged | emitted by the semiconductor manufacturing process containing the washing | cleaning liquid supply pipe 3 which becomes,
    상기 폐가스(G)가 알칼리성 배기가스를 50 ~ 500ppm의 고농도로 함유하고, 상기 기액접촉수단 단위체(M1)는 프레임(F) 내부에 2겹으로 엮어진 일정두께의 망상시트(4)가 일정간격으로 배치된 ‘Π’형상의 수직하는 격벽(5)들 사이로 지그재그식으로 통과하면서 배치된 필터구조체의 구조이고, 상기 기액접촉수단 단위체(M2)는 프레임(F) 내부에 막대형상의 원형봉(6)이 일정간격을 두고 다수개 평행되게 배치되면서 다수의 층으로 설치되고, 층과 층간에는 간격과 원형봉(6)이 교대로 배치된 구조이고, 또 상기 분산체(S1)은 프레임(F) 내에 격벽으로 이루어진 사각형 통공(Ha)이 사방연속으로 형성되고, 인접하는 4개의 사각형 통공(Ha)이 중앙에서 유통되는 구조이며, 상기 분산체(S2)는 프레임(F) 내에 격벽으로 이루어진 사각형 통공(Hb)이 사방연속으로 배열된 구조로 이루어진 것을 특징으로 하는 폐가스 성상의 처리에 적합하도록 복수기능의 기액접촉수단으로 조합된 폐가스 처리 스크러버.The waste gas (G) contains alkaline exhaust gas at a high concentration of 50 to 500 ppm, and the gas-liquid contact means unit (M1) is a double-thick mesh sheet (4) having a predetermined thickness interwoven in the frame (F) at a predetermined interval. It is a structure of a filter structure arranged while passing zigzag between the vertical partition (5) of the 'π' shape arranged, the gas-liquid contact means unit (M2) is a rod-shaped circular rod ( 6) are arranged in a plurality of layers while being arranged in parallel in a plurality spaced apart, the interval and the circular rods 6 are alternately arranged between the layers and layers, and the dispersion (S1) is a frame (F) The rectangular through hole (Ha) formed of the partition wall in the form of a continuous four-way, the adjacent four rectangular through holes (Ha) is a structure that is distributed in the center, the dispersion (S2) is a square consisting of a partition wall in the frame (F) Through-hole Hb is arranged continuously in all directions The waste gas treatment scrubber in combination with a gas-liquid contacting means of the plurality of functions to be suitable for treatment of waste gas, characterized in that the aqueous phase is made.
  2. 상측으로 정화가스가 배출되는 배기관(1a)이 설치되며, 내부에는 상부에 세정액 분사노즐(1b)이 설치되고, 분사노즐(1b)의 하측으로 위에서부터 세정액의 균등한 분배기능을 갖는 분산체(S1), 거품발생을 유도하여 거품에 의해 폐가스에 함유된 오염입자물질 및 기액 접촉시 발생하는 입자물질, 미스트를 여과 및 흡수하는 기능을 갖는 기액접촉수단 단위체(M1), 기체의 유속에 따라 재비산과 조대화가 반복되어 기체의 흡수를 촉진시키는 기능을 갖는 기액접촉수단 단위체(M2), 상기 기액접촉수단 단위체(M1) 및 세정액의 균등한 분배기능을 갖는 분산체(S2)가 순차적으로 적층된 기액접촉수단 조합체(MS)가 장착되고, 하부에 폐액저장조(1c)가 설치되는 스크러버(1)와, 상기 폐액저장조(1c)의 일측에 연결되는 폐가스 유입관(2) 및 스크러버(1)의 내부의 상부에 설치된 세정액 분사노즐(1b)에 연결되는 세정액 공급관(3)을 포함하는 반도체 제조공정에서 배출되는 알칼리성 배기가스인 폐가스(G)를 처리하는 스크러버(1)에 있어서, An exhaust pipe 1a through which the purge gas is discharged is installed upward, and a cleaning liquid injection nozzle 1b is provided at an upper portion thereof, and a dispersion having an equal distribution function of the cleaning liquid from above to the injection nozzle 1b. S1), inducing foaming, contaminating particulate matter contained in the waste gas by the foam and particulate matter generated by gas-liquid contact, gas-liquid contact means unit (M1) having a function of filtering and absorbing mist, ash according to the flow rate of the gas The gas-liquid contact means unit M2 having a function of promoting scattering and coarsening to promote the absorption of gas, the gas-liquid contact means unit M1 and the dispersion S2 having an equal distribution function of the cleaning liquid are sequentially stacked. And a scrubber 1 having a gas-liquid contact means combination MS installed thereon, and a waste liquid storage tank 1c installed at a lower portion thereof, and a waste gas inlet pipe 2 and a scrubber 1 connected to one side of the waste liquid storage tank 1c. In the upper part of the interior of the In the cleaning liquid injection nozzles (1b) a scrubber (1) for processing the waste gas (G) an alkaline exhaust gas discharged from a semiconductor manufacturing process including a cleaning liquid supply pipe 3 which is connected to,
    상기 폐가스(G)가 알칼리성 배기가스를 50ppm 미만의 저농도로 함유하고, 상기 기액접촉수단 단위체(M1)는 프레임(F) 내부에 2겹으로 엮어진 일정두께의 망상시트(4)가 일정간격으로 배치된 ‘Π’형상의 수직하는 격벽(5)들 사이로 지그재그식으로 통과하면서 배치된 필터구조체의 구조이고, 상기 기액접촉수단 단위체(M2)는 프레임(F) 내부에 막대형상의 원형봉(6)이 일정간격을 두고 다수개 평행되게 배치되면서 다수의 층으로 설치되고, 층과 층간에는 간격과 원형봉(6)이 교대로 배치된 구조이고, 또 상기 분산체(S1)은 프레임(F) 내에 격벽으로 이루어진 사각형 통공(Ha)이 사방연속으로 형성되고, 인접하는 4개의 사각형 통공(Ha)이 중앙에서 유통되는 구조이며, 상기 분산체(S2)는 프레임(F) 내에 격벽으로 이루어진 사각형 통공(Hb)이 사방연속으로 배열된 구조로 이루어진 것을 특징으로 하는 폐가스 성상의 처리에 적합하도록 복수기능의 기액접촉수단으로 조합된 폐가스 처리 스크러버.The waste gas (G) contains an alkaline exhaust gas at a low concentration of less than 50 ppm, and the gas-liquid contact means unit (M1) is a double-thick network sheet (4) of a certain thickness interwoven in the frame (F) at regular intervals. It is a structure of a filter structure arranged while passing zigzag between the vertical partition (5) of the 'π' shape, the gas-liquid contact means unit (M2) is a rod-shaped circular rod (6) in the frame (F) ) Is installed in a plurality of layers while being arranged in parallel with a plurality of intervals, the interval and the circular rods 6 are alternately arranged between the layers and layers, and the dispersion (S1) is a frame (F) The rectangular through hole (Ha) formed of partitions in the inside is continuous in all directions, the adjacent four rectangular through holes (Ha) is a structure that is distributed in the center, the dispersion (S2) is a rectangular through hole consisting of partitions in the frame (F). (Hb) arranged continuously Waste gas treatment scrubber combined with a multi-functional gas-liquid contact means suitable for the treatment of waste gas properties, characterized in that consisting of.
PCT/KR2016/006665 2015-06-26 2016-06-23 Waste gas-treating scrubber formed of combination of gas-liquid contact means having multiple functions so as to be appropriate for treating according to waste gas properties WO2016208981A1 (en)

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KR101947733B1 (en) * 2016-07-28 2019-05-10 주식회사 효진엔지니어링 Horizontal Type Scrubber to remove waste gases by combination of gas-liquid contact device with multi function
KR101844749B1 (en) * 2016-07-28 2018-05-18 (주)효진아이디에스 Horizontal Type Scrubber to remove waste gases by combination of gas-liquid contact device with multi function
KR102192344B1 (en) 2019-04-16 2020-12-17 주식회사 효진엔지니어링 Gas-liquid contact device for Waste gas removal scrub and Waste gas removal scrub using the same
KR102402387B1 (en) 2020-10-14 2022-05-26 주식회사 효진엔지니어링 Gas-liquid contact device for Waste gas removal scrub and Waste gas removal scrub using the same

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