WO2016145685A1 - Color filter substrate fabrication method, color filter substrate, and liquid crystal display panel - Google Patents

Color filter substrate fabrication method, color filter substrate, and liquid crystal display panel Download PDF

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Publication number
WO2016145685A1
WO2016145685A1 PCT/CN2015/075815 CN2015075815W WO2016145685A1 WO 2016145685 A1 WO2016145685 A1 WO 2016145685A1 CN 2015075815 W CN2015075815 W CN 2015075815W WO 2016145685 A1 WO2016145685 A1 WO 2016145685A1
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Prior art keywords
layer
black matrix
region
substrate
sub
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PCT/CN2015/075815
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French (fr)
Chinese (zh)
Inventor
谢畅
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深圳市华星光电技术有限公司
武汉华星光电技术有限公司
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Publication of WO2016145685A1 publication Critical patent/WO2016145685A1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method for fabricating a color filter substrate, a color filter substrate, and a liquid crystal display panel.
  • the principle of the RGBW liquid crystal display technology is to use a white (W) Subpixels are added to traditional RGB consisting of three colors: red (R), green (G), and blue (B).
  • the corresponding sub-pixel imaging technique is then applied to better arrange the sub-pixels in a manner that humans see the image. This ensures that images that are not visible to the human eye are generated without loss of display power and brightness.
  • the RGBW sub-pixel imaging technique individually addresses each sub-pixel and adds a white sub-pixel to the permutation mode to form an RGBW pixel design that is more traditional than RGB
  • the pixel-designed display should be brighter and have a higher resolution.
  • Transmittance and brightness are increased because more backlights can be illuminated by larger and semi-transparent W sub-pixels instead of being obscured by the tight arrangement of smaller red, green, and blue sub-pixels used by RGB stripes. .
  • white sub-pixels an increase in white luminance is achieved without an increase in power consumption. Therefore, the advantages of RGBW technology are to improve the utilization of backlight brightness, save power, reduce cost, and achieve higher brightness levels without reducing resolution or increasing power consumption. Therefore, RGBW LCD screens will become more and more widely used.
  • FIG. 1 is a schematic structural diagram of a color film substrate provided by the prior art.
  • the OC covers the W sub-pixel portion and a recessed area appears.
  • the surface of the recessed area is not flat, so that after the rubbing treatment of the alignment layer, the orientation layer may have a non-uniformity of rubbing orientation, which may cause light leakage problems; and the surface of the alignment layer is not flat and may contact the orientation layer.
  • the liquid crystal molecules have poor fluidity, which in turn causes problems such as chromatic aberration of compression.
  • An object of the present invention is to provide a method for fabricating a color filter substrate, a color filter substrate, and a liquid crystal display panel, which can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage caused by RGBW pixels, and effectively improving the problem of chromatic aberration of pressing.
  • a method for fabricating a color filter substrate comprising:
  • the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
  • an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a The thickness of the first OC layer of the W sub-pixel region is the same
  • a transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  • the step of coating the second OC layer on the substrate comprises:
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • a method for fabricating a color filter substrate comprises:
  • the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
  • RGB color resist layer Applying an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film is the same as a thickness of the first OC layer of the W sub-pixel region ;
  • a transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  • the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region is the same.
  • the first OC layer is patterned to retain the first OC layer of the W sub-pixel region, and the first OC layer of other regions
  • the steps of removing are specifically included:
  • the step of coating the second OC layer on the substrate comprises:
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • a color film substrate comprising:
  • a substrate comprising a color film region, a W sub-pixel region, and a black matrix region
  • a first OC layer disposed on the W sub-pixel region on the substrate
  • a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
  • the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  • a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a thickness of the first OC layer of the W sub-pixel region are both the same.
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • a liquid crystal display panel comprising: an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate;
  • the color film substrate comprises:
  • a substrate comprising a color film region, a W sub-pixel region, and a black matrix region
  • a first OC layer disposed on the W sub-pixel region on the substrate
  • a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
  • the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  • a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a thickness of the first OC layer of the W sub-pixel region are both the same.
  • the present invention firstly fabricates a first OC layer in a W sub-pixel region, and ensures that the R, G, and B color resist layers are consistent with the thickness of the first OC layer of the W sub-pixel region, so that the final coating is performed at the end. After the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
  • FIG. 1 is a schematic structural view of a color filter substrate provided by the prior art
  • FIG. 2 is a schematic flowchart of an implementation process of a method for fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 3 is an exploded perspective view showing a structure of a color filter substrate obtained in a process of fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 4 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention.
  • the first OC layer is first formed in the W sub-pixel region, and the thickness of the first OC layer of the R, G, and B color resist layers is ensured to be the same as the thickness of the first OC layer of the W sub-pixel region.
  • the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
  • FIG. 2 is a schematic diagram of an implementation process of a method for fabricating a color filter substrate according to an embodiment of the present invention
  • FIG. 3 is a color film obtained in the process of fabricating a color filter substrate according to an embodiment of the present invention
  • Schematic diagram of the decomposition of the substrate structure For the convenience of description, only parts related to the embodiment of the present invention are shown.
  • the method for fabricating the color film substrate mainly includes the following steps:
  • step S101 a substrate is provided, the substrate including a color film area, a W sub-pixel area, and a black matrix area;
  • the substrate provided may be a glass substrate, the substrate includes a color film region for forming an RGB color film, a W sub-pixel region for forming a white sub-pixel, and a black matrix for forming Black matrix area.
  • step S102 coating a first OC layer on the substrate
  • a first OC layer is applied over the entire surface of the substrate.
  • step S103 the first OC layer is patterned, and the first OC layer of the W sub-pixel region is reserved, and the first OC layers of other regions are removed;
  • the first OC layer is subjected to a process operation such as exposure, development, and etching, and the first OC layer of the W sub-pixel region is retained, and the first OC layer of other regions is retained. All removed.
  • step S104 depositing a black matrix layer on the substrate
  • the thickness of the deposited black matrix layer is the same as the thickness of the first OC layer of the W sub-pixel region.
  • step S105 the black matrix layer is patterned to retain the black matrix layer of the black matrix region, and the black matrix layers of other regions are removed;
  • the black matrix layer is subjected to a process operation such as exposure, development, and etching, and the black matrix layer of the black matrix region is retained, and the black matrix layers of other regions are removed.
  • step S106 an RGB color resist layer is coated on the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film and the first of the W sub-pixel regions The thickness of the OC layer is the same;
  • a second OC layer is integrally coated on the substrate, specifically, on the RGB color resist layer of the color film region, on the black matrix layer of the black matrix region. And coating the second OC layer on the first OC layer of the W sub-pixel region.
  • one pixel of the color film substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • step S108 a transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  • the transparent metal layer may be composed of ITO.
  • the first OC layer is first formed in the W sub-pixel region, and the thickness of the first OC layer of the R, G, and B color resist layers is ensured to be the same as that of the W sub-pixel region.
  • the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
  • FIG. 4 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention. For the convenience of description, only parts related to the embodiment of the present invention are shown.
  • the color filter substrate includes a substrate 100, a first OC layer 200, a black matrix layer 300, an RGB color resist layer 400, a second OC layer 500, and a transparent metal layer 600.
  • the substrate 100 includes a color film region, a W sub-pixel region, and a black matrix region; the first OC layer 200 is disposed on the W sub-pixel region on the substrate 100; and the black matrix layer 300 is disposed.
  • the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  • the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the thickness of the first OC layer of the W sub-pixel region are the same.
  • the area covered by the second OC layer 500 is flat, so that after the rubbing treatment on the alignment layer, the orientation layer is not unevenly rubbed, and thus the light leakage problem is not caused; and, the alignment layer is The flat surface makes the liquid crystal molecules in contact with the alignment layer have better fluidity, and there is no problem such as chromatic aberration of pressing.
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • an embodiment of the present invention further provides a liquid crystal display panel.
  • the liquid crystal display panel includes an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate.
  • the color filter substrate includes a substrate 100, a first OC layer 200, a black matrix layer 300, an RGB color resist layer 400, a second OC layer 500, and a transparent metal layer 600.
  • the substrate 100 includes a color film region, a W sub-pixel region, and a black matrix region; the first OC layer 200 is disposed on the W sub-pixel region on the substrate 100; and the black matrix layer 300 is disposed.
  • the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the thickness of the first OC layer of the W sub-pixel region are the same.
  • the area covered by the second OC layer 500 is flat, so that after the rubbing treatment on the alignment layer, the orientation layer is not unevenly rubbed, and thus the light leakage problem is not caused; and, the alignment layer is The flat surface makes the liquid crystal molecules in contact with the alignment layer have better fluidity, and there is no problem such as chromatic aberration of pressing.
  • one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
  • the method for fabricating a color filter substrate, the color filter substrate, and the liquid crystal display panel provided by the embodiments of the present invention firstly fabricate a first OC layer in the W sub-pixel region, and ensure the R, G, and B color resist layers.
  • the thickness of the first OC layer of the W sub-pixel region is identical, such that after the final application of the second OC layer, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)

Abstract

Provided is a method for fabricating a color filter substrate: patterning a first OC layer (200), retaining the first OC layer (200) of a W subpixel region; patterning a black matrix layer (300), retaining the black matrix layer (300) of the black matrix layer region; forming an RGB color filter on the color filter region of a substrate (100), the RGB color filter having the same thickness as the first OC layer (200) of the W subpixel region; applying a second OC layer (500) onto the substrate (100); depositing a transparent metal layer (600) onto the second OC layer (500). The described fabrication method prevents recesses from appearing on the W subpixel region.

Description

一种彩膜基板的制作方法、彩膜基板以及液晶显示面板 Method for manufacturing color film substrate, color film substrate and liquid crystal display panel 技术领域Technical field
本发明涉及显示技术领域，特别涉及一种彩膜基板的制作方法、彩膜基板以及液晶显示面板。The present invention relates to the field of display technologies, and in particular, to a method for fabricating a color filter substrate, a color filter substrate, and a liquid crystal display panel.
背景技术Background technique
在现有技术中，RGBW液晶屏技术的原理是将一种白色 (W) 子像素填加到由红(R)、绿(G)、蓝(B)三色组成的传统RGB 像素中，然后再应用相应的子像素成像技术，以人类看见图像的方式对这些子像素进行更好的排列。这样便能够确保生成那些不能被人眼所看见的图像时，不会损耗显示屏功率及亮度源。RGBW子像素成像技术为每一个子像素单独编址，并且把一种白色子像素添加到排列模式中，形成一种RGBW像素设计，该设计比传统 RGB 像素设计的显示屏要更加明亮、且分辨率要更高一些。因为更多的背光能通过更大及半透的W子像素发光，而不是被RGB条纹采用的更小的红、绿、蓝子像素构成的紧密排列所遮挡，透射率及亮度均得到了增加。利用白色子象素，在功耗没有增加的情况下实现了白色亮度的增加。因而RGBW技术的优势是提升背光源亮度的利用率，节省功耗，降低成本，并且在不降低分辨率或增加功耗使用的情况下，获得更高亮度水平。因此，RGBW液晶屏会越来越广泛使用。In the prior art, the principle of the RGBW liquid crystal display technology is to use a white (W) Subpixels are added to traditional RGB consisting of three colors: red (R), green (G), and blue (B). In the pixel, the corresponding sub-pixel imaging technique is then applied to better arrange the sub-pixels in a manner that humans see the image. This ensures that images that are not visible to the human eye are generated without loss of display power and brightness. The RGBW sub-pixel imaging technique individually addresses each sub-pixel and adds a white sub-pixel to the permutation mode to form an RGBW pixel design that is more traditional than RGB The pixel-designed display should be brighter and have a higher resolution. Transmittance and brightness are increased because more backlights can be illuminated by larger and semi-transparent W sub-pixels instead of being obscured by the tight arrangement of smaller red, green, and blue sub-pixels used by RGB stripes. . With white sub-pixels, an increase in white luminance is achieved without an increase in power consumption. Therefore, the advantages of RGBW technology are to improve the utilization of backlight brightness, save power, reduce cost, and achieve higher brightness levels without reducing resolution or increasing power consumption. Therefore, RGBW LCD screens will become more and more widely used.
请参阅图1，是现有技术提供的彩膜基板的结构示意图，从图中可知，由于R、G、B子像素会使用相同厚度的色阻，而W子像素没有色阻，所以在整体涂覆一层OC后，OC覆盖在W子像素部分便会出现凹陷区域。凹陷区域表面不平坦，这样在对取向层进行摩擦处理后，会使取向层存在摩擦取向不均匀的现象，进而会导致漏光问题；并且，取向层的表面不平坦还会使与取向层相接触的液晶分子的流动性较差，进而会产生按压色差等问题。Please refer to FIG. 1 , which is a schematic structural diagram of a color film substrate provided by the prior art. As can be seen from the figure, since the R, G, and B sub-pixels use the same color resist and the W sub-pixel has no color resistance, the whole is After coating a layer of OC, the OC covers the W sub-pixel portion and a recessed area appears. The surface of the recessed area is not flat, so that after the rubbing treatment of the alignment layer, the orientation layer may have a non-uniformity of rubbing orientation, which may cause light leakage problems; and the surface of the alignment layer is not flat and may contact the orientation layer. The liquid crystal molecules have poor fluidity, which in turn causes problems such as chromatic aberration of compression.
故，有必要提出一种新的技术方案，以解决上述技术问题。Therefore, it is necessary to propose a new technical solution to solve the above technical problems.
技术问题technical problem
本发明的目的在于提供一种彩膜基板的制作方法、彩膜基板以及液晶显示面板，其能避免W子像素区域出现凹陷，从而有效避免RGBW像素出现的漏光，有效改善按压色差的问题。An object of the present invention is to provide a method for fabricating a color filter substrate, a color filter substrate, and a liquid crystal display panel, which can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage caused by RGBW pixels, and effectively improving the problem of chromatic aberration of pressing.
技术解决方案Technical solution
一种彩膜基板的制作方法，其中所述彩膜基板的制作方法包括：A method for fabricating a color filter substrate, wherein the method for fabricating the color filter substrate comprises:
提供一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；Providing a substrate, the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
在所述基板上涂覆一第一OC层；Coating a first OC layer on the substrate;
对所述第一OC层进行曝光、显影、以及刻蚀，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除；Exposing, developing, and etching the first OC layer, leaving the first OC layer of the W sub-pixel region, and removing the first OC layer of other regions;
在所述基板上沉积一黑色矩阵层；Depositing a black matrix layer on the substrate;
对所述黑色矩阵层进行图形化处理，保留所述黑色矩阵区域的所述黑色矩阵层，其他区域的所述黑色矩阵层均去除；Performing a patterning process on the black matrix layer, retaining the black matrix layer of the black matrix region, and removing the black matrix layers of other regions;
在所述基板上的所述彩膜区域涂布RGB色阻层，以形成RGB彩膜，其中，所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同Applying an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a The thickness of the first OC layer of the W sub-pixel region is the same
在所述基板上涂覆第二OC层；以及Coating a second OC layer on the substrate;
在所述第二OC层上沉积透明金属层，以形成透明电极。A transparent metal layer is deposited on the second OC layer to form a transparent electrode.
优选的，在所述彩膜基板的制作方法中，其中在所述基板上涂覆第二OC层的步骤，具体包括：Preferably, in the method for fabricating the color filter substrate, the step of coating the second OC layer on the substrate comprises:
在所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上均涂覆所述第二OC层。Coating the second on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region OC layer.
优选的，在所述彩膜基板的制作方法中，其中所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。Preferably, in the method for fabricating the color filter substrate, one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
一种彩膜基板的制作方法，所述彩膜基板的制作方法包括：A method for fabricating a color filter substrate, the method for fabricating the color filter substrate comprises:
提供一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；Providing a substrate, the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
在所述基板上涂覆一第一OC层；Coating a first OC layer on the substrate;
对所述第一OC层进行图形化处理，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除；Graphically processing the first OC layer, retaining the first OC layer of the W sub-pixel region, and removing the first OC layer of other regions;
在所述基板上沉积一黑色矩阵层；Depositing a black matrix layer on the substrate;
对所述黑色矩阵层进行图形化处理，保留所述黑色矩阵区域的所述黑色矩阵层，其他区域的所述黑色矩阵层均去除；Performing a patterning process on the black matrix layer, retaining the black matrix layer of the black matrix region, and removing the black matrix layers of other regions;
在所述基板上的所述彩膜区域涂布RGB色阻层，以形成RGB彩膜，其中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同；Applying an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film is the same as a thickness of the first OC layer of the W sub-pixel region ;
在所述基板上涂覆第二OC层；以及Coating a second OC layer on the substrate;
在所述第二OC层上沉积透明金属层，以形成透明电极。A transparent metal layer is deposited on the second OC layer to form a transparent electrode.
优选的，在所述彩膜基板的制作方法中，所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。Preferably, in the method of fabricating the color filter substrate, the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region The thickness is the same.
优选的，在所述彩膜基板的制作方法中，对所述第一OC层进行图形化处理，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除的步骤，具体包括：Preferably, in the method for fabricating the color filter substrate, the first OC layer is patterned to retain the first OC layer of the W sub-pixel region, and the first OC layer of other regions The steps of removing are specifically included:
对所述第一OC层进行曝光、显影、以及刻蚀，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除。Exposing, developing, and etching the first OC layer, leaving the first OC layer of the W sub-pixel region, and removing the first OC layer of other regions.
优选的，在所述彩膜基板的制作方法中，在所述基板上涂覆第二OC层的步骤，具体包括：Preferably, in the method for fabricating the color filter substrate, the step of coating the second OC layer on the substrate comprises:
在所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上均涂覆所述第二OC层。Coating the second on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region OC layer.
优选的，在所述彩膜基板的制作方法中，所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。Preferably, in the method for fabricating the color filter substrate, one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
一种彩膜基板，所述彩膜基板包括：A color film substrate, the color film substrate comprising:
一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；a substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
一第一OC层，设置于所述基板上的所述W子像素区域；a first OC layer disposed on the W sub-pixel region on the substrate;
一黑色矩阵层，设置于所述基板上的所述黑色矩阵区域；a black matrix layer disposed on the black matrix region on the substrate;
一RGB色阻层，设置于所述基板上的所述彩膜区域；An RGB color resist layer disposed on the color film area on the substrate;
一第二OC层，设置于所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上；a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
一透明金属层，设置于所述第二OC层上；a transparent metal layer disposed on the second OC layer;
其中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同。Wherein, the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
优选的，在所述彩膜基板中，所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。Preferably, in the color filter substrate, a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a thickness of the first OC layer of the W sub-pixel region are both the same.
优选的，在所述彩膜基板中，所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。Preferably, in the color filter substrate, one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
一种液晶显示面板，所述液晶显示面板包括：阵列基板、彩膜基板、以及设置于所述阵列基板与所述彩膜基板之间的液晶层；A liquid crystal display panel, comprising: an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate;
其中，所述彩膜基板包括：Wherein, the color film substrate comprises:
一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；a substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
一第一OC层，设置于所述基板上的所述W子像素区域；a first OC layer disposed on the W sub-pixel region on the substrate;
一黑色矩阵层，设置于所述基板上的所述黑色矩阵区域；a black matrix layer disposed on the black matrix region on the substrate;
一RGB色阻层，设置于所述基板上的所述彩膜区域；An RGB color resist layer disposed on the color film area on the substrate;
一第二OC层，设置于所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上；a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
一透明金属层，设置于所述第二OC层上；a transparent metal layer disposed on the second OC layer;
其中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同。Wherein, the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
优选的，在所述液晶显示面板中，所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。Preferably, in the liquid crystal display panel, a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a thickness of the first OC layer of the W sub-pixel region are both the same.
有益效果 Beneficial effect
相对现有技术，本发明通过在W子像素区域先制作第一OC层，并且，保证R、G、B色阻层与W子像素区域的第一OC层的厚度一致，这样在最后整体涂覆第二OC层后，第二OC层覆盖是平坦的。因此，本发明实施例能避免W子像素区域出现凹陷，从而有效避免RGBW像素出现的漏光，有效改善按压色差的问题。Compared with the prior art, the present invention firstly fabricates a first OC layer in a W sub-pixel region, and ensures that the R, G, and B color resist layers are consistent with the thickness of the first OC layer of the W sub-pixel region, so that the final coating is performed at the end. After the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
附图说明DRAWINGS
图1为现有技术提供的彩膜基板的结构示意图；1 is a schematic structural view of a color filter substrate provided by the prior art;
图2为本发明实施例提供的彩膜基板的制作方法的实现流程示意图；FIG. 2 is a schematic flowchart of an implementation process of a method for fabricating a color filter substrate according to an embodiment of the present invention; FIG.
图3为本发明实施例提供的在制作彩膜基板过程中得到的彩膜基板结构的分解示意图；3 is an exploded perspective view showing a structure of a color filter substrate obtained in a process of fabricating a color filter substrate according to an embodiment of the present invention;
图4为本发明实施例提供的彩膜基板的结构示意图。FIG. 4 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention.
本发明的最佳实施方式BEST MODE FOR CARRYING OUT THE INVENTION
本说明书所使用的词语“实施例”意指用作实例、示例或例证。此外，本说明书和所附权利要求中所使用的冠词“一”一般地可以被解释为意指“一个或多个”，除非另外指定或从上下文清楚导向单数形式。The word "embodiment" as used in this specification is intended to serve as an example, instance, or illustration. In addition, the articles "a" or "an" or "an"
在本发明实施例中，通过在W子像素区域先制作第一OC层，并且，保证R、G、B色阻层与W子像素区域的第一OC层的厚度一致，这样在最后整体涂覆第二OC层后，第二OC层覆盖是平坦的。因此，本发明实施例能避免W子像素区域出现凹陷，从而有效避免RGBW像素出现的漏光，有效改善按压色差的问题。In the embodiment of the present invention, the first OC layer is first formed in the W sub-pixel region, and the thickness of the first OC layer of the R, G, and B color resist layers is ensured to be the same as the thickness of the first OC layer of the W sub-pixel region. After the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
为了说明本发明所述的技术方案，下面通过具体实施例来进行说明。In order to explain the technical solution described in the present invention, the following description will be made by way of specific embodiments.
请一并参阅图2及图3，图2为本发明实施例提供的彩膜基板的制作方法的实现流程示意图；图3为本发明实施例提供的在制作彩膜基板过程中得到的彩膜基板结构的分解示意图。为了便于说明，仅示出了与本发明实施例相关的部分。2 and FIG. 3, FIG. 2 is a schematic diagram of an implementation process of a method for fabricating a color filter substrate according to an embodiment of the present invention; FIG. 3 is a color film obtained in the process of fabricating a color filter substrate according to an embodiment of the present invention; Schematic diagram of the decomposition of the substrate structure. For the convenience of description, only parts related to the embodiment of the present invention are shown.
在本发明实施例中，所述彩膜基板的制作方法主要包括以下步骤：In the embodiment of the present invention, the method for fabricating the color film substrate mainly includes the following steps:
在步骤S101中，提供一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；In step S101, a substrate is provided, the substrate including a color film area, a W sub-pixel area, and a black matrix area;
在本发明实施例中，提供的所述基板可为玻璃基板，所述基板包括用于形成RGB彩膜的彩膜区域、用于形成白色子像素的W子像素区域、以及用于形成黑色矩阵的黑色矩阵区域。In an embodiment of the invention, the substrate provided may be a glass substrate, the substrate includes a color film region for forming an RGB color film, a W sub-pixel region for forming a white sub-pixel, and a black matrix for forming Black matrix area.
在步骤S102中，在所述基板上涂覆一第一OC层；In step S102, coating a first OC layer on the substrate;
在本发明实施例中，在所述基板的整个表面上均涂覆一层第一OC层。In an embodiment of the invention, a first OC layer is applied over the entire surface of the substrate.
在步骤S103中，对所述第一OC层进行图形化处理，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除；In step S103, the first OC layer is patterned, and the first OC layer of the W sub-pixel region is reserved, and the first OC layers of other regions are removed;
在本发明实施例中，对所述第一OC层进行曝光、显影、以及刻蚀等工艺操作，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除。In the embodiment of the present invention, the first OC layer is subjected to a process operation such as exposure, development, and etching, and the first OC layer of the W sub-pixel region is retained, and the first OC layer of other regions is retained. All removed.
在步骤S104中，在所述基板上沉积一黑色矩阵层；In step S104, depositing a black matrix layer on the substrate;
在本发明实施例中，沉积的所述黑色矩阵层的厚度与所述W子像素区域的所述第一OC层的厚度相同。In an embodiment of the invention, the thickness of the deposited black matrix layer is the same as the thickness of the first OC layer of the W sub-pixel region.
在步骤S105中，对所述黑色矩阵层进行图形化处理，保留所述黑色矩阵区域的所述黑色矩阵层，其他区域的所述黑色矩阵层均去除；In step S105, the black matrix layer is patterned to retain the black matrix layer of the black matrix region, and the black matrix layers of other regions are removed;
在本发明实施例中，对所述黑色矩阵层进行曝光、显影、以及刻蚀等工艺操作，保留所述黑色矩阵区域的所述黑色矩阵层，其他区域的所述黑色矩阵层均去除。In the embodiment of the present invention, the black matrix layer is subjected to a process operation such as exposure, development, and etching, and the black matrix layer of the black matrix region is retained, and the black matrix layers of other regions are removed.
在步骤S106中，在所述基板上的所述彩膜区域涂布RGB色阻层，以形成RGB彩膜，其中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同；In step S106, an RGB color resist layer is coated on the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film and the first of the W sub-pixel regions The thickness of the OC layer is the same;
在步骤S107中，在所述基板上涂覆第二OC层；以及Applying a second OC layer on the substrate in step S107;
在本发明实施例中，在所述基板上整体涂覆第二OC层，具体的，在所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上均涂覆所述第二OC层。In an embodiment of the present invention, a second OC layer is integrally coated on the substrate, specifically, on the RGB color resist layer of the color film region, on the black matrix layer of the black matrix region. And coating the second OC layer on the first OC layer of the W sub-pixel region.
其中，所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。Wherein, one pixel of the color film substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
在步骤S108中，在所述第二OC层上沉积透明金属层，以形成透明电极。In step S108, a transparent metal layer is deposited on the second OC layer to form a transparent electrode.
在本发明实施例中，所述透明金属层可由ITO构成。In an embodiment of the invention, the transparent metal layer may be composed of ITO.
由上可知，本实施例通过在W子像素区域先制作第一OC层，并且，保证R、G、B色阻层与W子像素区域的第一OC层的厚度一致，这样在最后整体涂覆第二OC层后，第二OC层覆盖是平坦的。因此，本发明实施例能避免W子像素区域出现凹陷，从而有效避免RGBW像素出现的漏光，有效改善按压色差的问题。As can be seen from the above, in this embodiment, the first OC layer is first formed in the W sub-pixel region, and the thickness of the first OC layer of the R, G, and B color resist layers is ensured to be the same as that of the W sub-pixel region. After the second OC layer is overlaid, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
请参阅图4，为本发明实施例提供的彩膜基板的结构示意图。为了便于说明，仅示出了与本发明实施例相关的部分。FIG. 4 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention. For the convenience of description, only parts related to the embodiment of the present invention are shown.
所述彩膜基板包括：一基板100、一第一OC层200、一黑色矩阵层300、一RGB色阻层400、一第二OC层500、以及一透明金属层600。其中，所述基板100包括彩膜区域、W子像素区域、以及黑色矩阵区域；所述第一OC层200设置于所述基板100上的所述W子像素区域；所述黑色矩阵层300设置于所述基板100上的所述黑色矩阵区域；所述RGB色阻层400设置于所述基板100上的所述彩膜区域；所述第二OC层500设置于所述彩膜区域的所述RGB色阻层400上、所述黑色矩阵区域的所述黑色矩阵层300上、以及所述W子像素区域的所述第一OC层200上；所述透明金属层600设置于所述第二OC层500上。The color filter substrate includes a substrate 100, a first OC layer 200, a black matrix layer 300, an RGB color resist layer 400, a second OC layer 500, and a transparent metal layer 600. The substrate 100 includes a color film region, a W sub-pixel region, and a black matrix region; the first OC layer 200 is disposed on the W sub-pixel region on the substrate 100; and the black matrix layer 300 is disposed. The black matrix region on the substrate 100; the RGB color resist layer 400 is disposed on the color film region on the substrate 100; and the second OC layer 500 is disposed on the color film region The RGB color resist layer 400, the black matrix layer 300 of the black matrix region, and the first OC layer 200 of the W sub-pixel region; the transparent metal layer 600 is disposed on the first Two OC layers 500.
在本发明实施例中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同。In an embodiment of the invention, the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
作为本发明一优选实施例，所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。这样使得第二OC层500覆盖的区域是平坦的，这样在对取向层进行摩擦处理后，不会使取向层存在摩擦取向不均匀的现象，进而也不会导致漏光问题；并且，取向层的表面平坦会使与取向层相接触的液晶分子的流动性较好，进而不会产生按压色差等问题。As a preferred embodiment of the present invention, the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the thickness of the first OC layer of the W sub-pixel region are the same. In this way, the area covered by the second OC layer 500 is flat, so that after the rubbing treatment on the alignment layer, the orientation layer is not unevenly rubbed, and thus the light leakage problem is not caused; and, the alignment layer is The flat surface makes the liquid crystal molecules in contact with the alignment layer have better fluidity, and there is no problem such as chromatic aberration of pressing.
作为本发明另一优选实施例，所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。As another preferred embodiment of the present invention, one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
请参阅图4，本发明实施例还提供了一种液晶显示面板。为了便于说明，仅示出了与本发明实施例相关的部分。所述液晶显示面板包括阵列基板、彩膜基板、以及设置于所述阵列基板与彩膜基板之间的液晶层。Referring to FIG. 4, an embodiment of the present invention further provides a liquid crystal display panel. For the convenience of description, only parts related to the embodiment of the present invention are shown. The liquid crystal display panel includes an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate.
所述彩膜基板包括：一基板100、一第一OC层200、一黑色矩阵层300、一RGB色阻层400、一第二OC层500、以及一透明金属层600。其中，所述基板100包括彩膜区域、W子像素区域、以及黑色矩阵区域；所述第一OC层200设置于所述基板100上的所述W子像素区域；所述黑色矩阵层300设置于所述基板100上的所述黑色矩阵区域；所述RGB色阻层400设置于所述基板100上的所述彩膜区域；所述第二OC层500设置于所述彩膜区域的所述RGB色阻层400上、所述黑色矩阵区域的所述黑色矩阵层300上、以及所述W子像素区域的所述第一OC层200上；所述透明金属层600设置于所述第二OC层500上。The color filter substrate includes a substrate 100, a first OC layer 200, a black matrix layer 300, an RGB color resist layer 400, a second OC layer 500, and a transparent metal layer 600. The substrate 100 includes a color film region, a W sub-pixel region, and a black matrix region; the first OC layer 200 is disposed on the W sub-pixel region on the substrate 100; and the black matrix layer 300 is disposed. The black matrix region on the substrate 100; the RGB color resist layer 400 is disposed on the color film region on the substrate 100; and the second OC layer 500 is disposed on the color film region The RGB color resist layer 400, the black matrix layer 300 of the black matrix region, and the first OC layer 200 of the W sub-pixel region; the transparent metal layer 600 is disposed on the first Two OC layers 500.
作为本发明一优选实施例，所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。这样使得第二OC层500覆盖的区域是平坦的，这样在对取向层进行摩擦处理后，不会使取向层存在摩擦取向不均匀的现象，进而也不会导致漏光问题；并且，取向层的表面平坦会使与取向层相接触的液晶分子的流动性较好，进而不会产生按压色差等问题。As a preferred embodiment of the present invention, the thickness of the RGB color film, the thickness of the black matrix layer of the black matrix region, and the thickness of the first OC layer of the W sub-pixel region are the same. In this way, the area covered by the second OC layer 500 is flat, so that after the rubbing treatment on the alignment layer, the orientation layer is not unevenly rubbed, and thus the light leakage problem is not caused; and, the alignment layer is The flat surface makes the liquid crystal molecules in contact with the alignment layer have better fluidity, and there is no problem such as chromatic aberration of pressing.
作为本发明另一优选实施例，所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。As another preferred embodiment of the present invention, one pixel of the color filter substrate corresponds to one R color film, one G color film, one B color film, and one W sub-pixel.
综上所述，本发明实施例提供的彩膜基板的制作方法、彩膜基板以及液晶显示面板，通过在W子像素区域先制作第一OC层，并且，保证R、G、B色阻层与W子像素区域的第一OC层的厚度一致，这样在最后整体涂覆第二OC层后，第二OC层覆盖是平坦的。因此，本发明实施例能避免W子像素区域出现凹陷，从而有效避免RGBW像素出现的漏光，有效改善按压色差的问题。In summary, the method for fabricating a color filter substrate, the color filter substrate, and the liquid crystal display panel provided by the embodiments of the present invention firstly fabricate a first OC layer in the W sub-pixel region, and ensure the R, G, and B color resist layers. The thickness of the first OC layer of the W sub-pixel region is identical, such that after the final application of the second OC layer, the second OC layer coverage is flat. Therefore, the embodiment of the present invention can avoid the occurrence of dishing in the W sub-pixel region, thereby effectively avoiding light leakage occurring in the RGBW pixel, and effectively improving the problem of pressing chromatic aberration.
尽管已经相对于一个或多个实现方式示出并描述了本发明，但是本领域技术人员基于对本说明书和附图的阅读和理解将会想到等价变型和修改。本发明包括所有这样的修改和变型，并且仅由所附权利要求的范围限制。特别地关于由上述组件执行的各种功能，用于描述这样的组件的术语旨在对应于执行所述组件的指定功能（例如其在功能上是等价的）的任意组件（除非另外指示），即使在结构上与执行本文所示的本说明书的示范性实现方式中的功能的公开结构不等同。此外，尽管本说明书的特定特征已经相对于若干实现方式中的仅一个被公开，但是这种特征可以与如可以对给定或特定应用而言是期望和有利的其他实现方式的一个或多个其他特征组合。而且，就术语“包括”、“具有”、“含有”或其变形被用在具体实施方式或权利要求中而言，这样的术语旨在以与术语“包含”相似的方式包括。Although the present invention has been shown and described with respect to the embodiments of the invention, The invention includes all such modifications and variations, and is only limited by the scope of the appended claims. With particular regard to the various functions performed by the above-described components, the terms used to describe such components are intended to correspond to any component that performs the specified function of the component (eg, which is functionally equivalent) (unless otherwise indicated) Even if it is structurally not identical to the disclosed structure for performing the functions in the exemplary implementation of the present specification shown herein. Moreover, although specific features of the specification have been disclosed with respect to only one of several implementations, such features may be combined with one or more other implementations as may be desired and advantageous for a given or particular application. Other feature combinations. Furthermore, the terms "comprising," "having," "having," or "include" or "comprising" are used in the particular embodiments or claims, and such terms are intended to be encompassed in a manner similar to the term "comprising."
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。In the above, the present invention has been disclosed in the above preferred embodiments, but the preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various modifications without departing from the spirit and scope of the invention. The invention is modified and retouched, and the scope of the invention is defined by the scope defined by the claims.

Claims (13)

  1. 一种彩膜基板的制作方法，其中所述彩膜基板的制作方法包括：A method for fabricating a color filter substrate, wherein the method for fabricating the color filter substrate comprises:
    提供一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；Providing a substrate, the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
    在所述基板上涂覆一第一OC层；Coating a first OC layer on the substrate;
    对所述第一OC层进行曝光、显影、以及刻蚀，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除；Exposing, developing, and etching the first OC layer, leaving the first OC layer of the W sub-pixel region, and removing the first OC layer of other regions;
    在所述基板上沉积一黑色矩阵层；Depositing a black matrix layer on the substrate;
    对所述黑色矩阵层进行图形化处理，保留所述黑色矩阵区域的所述黑色矩阵层，其他区域的所述黑色矩阵层均去除；Performing a patterning process on the black matrix layer, retaining the black matrix layer of the black matrix region, and removing the black matrix layers of other regions;
    在所述基板上的所述彩膜区域涂布RGB色阻层，以形成RGB彩膜，其中，所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同Applying an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film, a thickness of the black matrix layer of the black matrix region, and a The thickness of the first OC layer of the W sub-pixel region is the same
    在所述基板上涂覆第二OC层；以及Coating a second OC layer on the substrate;
    在所述第二OC层上沉积透明金属层，以形成透明电极。A transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  2. 根据权利要求1所述的彩膜基板的制作方法，其中在所述基板上涂覆第二OC层的步骤，具体包括：The method of fabricating a color filter substrate according to claim 1, wherein the step of coating the second OC layer on the substrate comprises:
    在所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上均涂覆所述第二OC层。Coating the second on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region OC layer.
  3. 根据权利要求1所述的彩膜基板的制作方法，其中所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。The method of fabricating a color filter substrate according to claim 1, wherein one pixel of the color filter substrate corresponds to an R color film, a G color film, a B color film, and a W sub-pixel.
  4. 一种彩膜基板的制作方法，其中所述彩膜基板的制作方法包括：A method for fabricating a color filter substrate, wherein the method for fabricating the color filter substrate comprises:
    提供一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；Providing a substrate, the substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
    在所述基板上涂覆一第一OC层；Coating a first OC layer on the substrate;
    对所述第一OC层进行图形化处理，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除；Graphically processing the first OC layer, retaining the first OC layer of the W sub-pixel region, and removing the first OC layer of other regions;
    在所述基板上沉积一黑色矩阵层；Depositing a black matrix layer on the substrate;
    对所述黑色矩阵层进行图形化处理，保留所述黑色矩阵区域的所述黑色矩阵层，其他区域的所述黑色矩阵层均去除；Performing a patterning process on the black matrix layer, retaining the black matrix layer of the black matrix region, and removing the black matrix layers of other regions;
    在所述基板上的所述彩膜区域涂布RGB色阻层，以形成RGB彩膜，其中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同；Applying an RGB color resist layer to the color film region on the substrate to form an RGB color film, wherein a thickness of the RGB color film is the same as a thickness of the first OC layer of the W sub-pixel region ;
    在所述基板上涂覆第二OC层；以及Coating a second OC layer on the substrate;
    在所述第二OC层上沉积透明金属层，以形成透明电极。A transparent metal layer is deposited on the second OC layer to form a transparent electrode.
  5. 根据权利要求4所述的彩膜基板的制作方法，其中所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。The method of fabricating a color filter substrate according to claim 4, wherein a thickness of said RGB color film, a thickness of said black matrix layer of said black matrix region, and said first OC of said W sub-pixel region The thickness of the layers is the same.
  6. 根据权利要求4所述的彩膜基板的制作方法，其中对所述第一OC层进行图形化处理，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除的步骤，具体包括：The method of fabricating a color filter substrate according to claim 4, wherein the first OC layer is patterned to retain the first OC layer of the W sub-pixel region, and the first OC of other regions The steps of removing the layers include:
    对所述第一OC层进行曝光、显影、以及刻蚀，保留所述W子像素区域的所述第一OC层，其他区域的所述第一OC层均去除。Exposing, developing, and etching the first OC layer, leaving the first OC layer of the W sub-pixel region, and removing the first OC layer of other regions.
  7. 根据权利要求4所述的彩膜基板的制作方法，其中在所述基板上涂覆第二OC层的步骤，具体包括：The method of fabricating a color filter substrate according to claim 4, wherein the step of coating the second OC layer on the substrate comprises:
    在所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上均涂覆所述第二OC层。Coating the second on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region OC layer.
  8. 根据权利要求4所述的彩膜基板的制作方法，其中所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。The method of fabricating a color filter substrate according to claim 4, wherein one pixel of the color filter substrate corresponds to an R color film, a G color film, a B color film, and a W sub-pixel.
  9. 一种彩膜基板，其中所述彩膜基板包括：A color film substrate, wherein the color film substrate comprises:
    一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；a substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
    一第一OC层，设置于所述基板上的所述W子像素区域；a first OC layer disposed on the W sub-pixel region on the substrate;
    一黑色矩阵层，设置于所述基板上的所述黑色矩阵区域；a black matrix layer disposed on the black matrix region on the substrate;
    一RGB色阻层，设置于所述基板上的所述彩膜区域；An RGB color resist layer disposed on the color film area on the substrate;
    一第二OC层，设置于所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上；a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
    一透明金属层，设置于所述第二OC层上；a transparent metal layer disposed on the second OC layer;
    其中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同。Wherein, the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  10. 根据权利要求9所述的彩膜基板，其中所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。The color filter substrate according to claim 9, wherein a thickness of said RGB color film, a thickness of said black matrix layer of said black matrix region, and a thickness of said first OC layer of said W sub-pixel region All the same.
  11. 根据权利要求9所述的彩膜基板，其中所述彩膜基板的一个像素对应一个R彩膜、一个G彩膜、一个B彩膜、以及一个W子像素。The color filter substrate according to claim 9, wherein one pixel of the color filter substrate corresponds to an R color film, a G color film, a B color film, and a W sub-pixel.
  12. 一种液晶显示面板，其中所述液晶显示面板包括：阵列基板、彩膜基板、以及设置于所述阵列基板与所述彩膜基板之间的液晶层；A liquid crystal display panel, wherein the liquid crystal display panel comprises: an array substrate, a color filter substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate;
    其中，所述彩膜基板包括：Wherein, the color film substrate comprises:
    一基板，所述基板包括彩膜区域、W子像素区域、以及黑色矩阵区域；a substrate comprising a color film region, a W sub-pixel region, and a black matrix region;
    一第一OC层，设置于所述基板上的所述W子像素区域；a first OC layer disposed on the W sub-pixel region on the substrate;
    一黑色矩阵层，设置于所述基板上的所述黑色矩阵区域；a black matrix layer disposed on the black matrix region on the substrate;
    一RGB色阻层，设置于所述基板上的所述彩膜区域；An RGB color resist layer disposed on the color film area on the substrate;
    一第二OC层，设置于所述彩膜区域的所述RGB色阻层上、所述黑色矩阵区域的所述黑色矩阵层上、以及所述W子像素区域的所述第一OC层上；a second OC layer disposed on the RGB color resist layer of the color film region, the black matrix layer of the black matrix region, and the first OC layer of the W sub-pixel region ;
    一透明金属层，设置于所述第二OC层上；a transparent metal layer disposed on the second OC layer;
    其中，所述RGB彩膜的厚度与所述W子像素区域的所述第一OC层的厚度相同。Wherein, the thickness of the RGB color film is the same as the thickness of the first OC layer of the W sub-pixel region.
  13. 根据权利要求12所述的液晶显示面板，其中所述RGB彩膜的厚度、所述黑色矩阵区域的所述黑色矩阵层的厚度、以及所述W子像素区域的所述第一OC层的厚度均相同。The liquid crystal display panel according to claim 12, wherein a thickness of said RGB color film, a thickness of said black matrix layer of said black matrix region, and a thickness of said first OC layer of said W sub-pixel region All the same.
PCT/CN2015/075815 2015-03-18 2015-04-02 Color filter substrate fabrication method, color filter substrate, and liquid crystal display panel WO2016145685A1 (en)

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