WO2016119335A1 - 显示面板、显示装置及显示面板的制作方法 - Google Patents

显示面板、显示装置及显示面板的制作方法 Download PDF

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Publication number
WO2016119335A1
WO2016119335A1 PCT/CN2015/078919 CN2015078919W WO2016119335A1 WO 2016119335 A1 WO2016119335 A1 WO 2016119335A1 CN 2015078919 W CN2015078919 W CN 2015078919W WO 2016119335 A1 WO2016119335 A1 WO 2016119335A1
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Prior art keywords
substrate
array substrate
display panel
fabricating
insulating film
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PCT/CN2015/078919
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English (en)
French (fr)
Inventor
王炎
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京东方科技集团股份有限公司
合肥京东方光电科技有限公司
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Priority to US14/895,691 priority Critical patent/US9612483B2/en
Publication of WO2016119335A1 publication Critical patent/WO2016119335A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G02F1/13415—Drop filling process

Definitions

  • Embodiments of the present invention relate to a display panel, a display device, and a method of fabricating the display panel.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • the display panel is one of the main components of the TFT-LCD, and the structure generally includes: an array substrate and a color film substrate disposed opposite to each other, a sealant adhered between the array substrate and the color filter substrate, and a filling on the array substrate and color Liquid crystal in a box-like structure formed by a film substrate and a sealant.
  • the TFT of the gate line driving circuit is covered with an insulating film, and the insulating film can insulate the TFT, thereby reducing the influence of the outside on the operating characteristics of the TFT.
  • the embodiment of the invention provides a display panel, a display device and a manufacturing method of the display panel, so as to improve the adhesion of the sealant and improve the product quality of the display device.
  • At least one embodiment of the present invention provides a display panel including an array substrate and a counter substrate disposed opposite to each other, a sealant adhered between the array substrate and the opposite substrate, and an array substrate and a color film.
  • the peripheral region of the array substrate opposite to the frame sealant has a plurality of thin film transistors, and the surface of each of the thin film transistors is covered with a block insulating film, adjacent blocks
  • the insulating film has a recessed portion therebetween; and the opposite substrate is provided with a convex structure at a position corresponding to at least one of the recessed regions.
  • At least one embodiment of the present invention also provides a display device including the above display panel.
  • At least one embodiment of the present invention also provides a method of fabricating a display panel, the method comprising the steps of fabricating an array substrate, the step of fabricating an opposite substrate, and the step of fabricating a liquid crystal cell.
  • the step of fabricating the array substrate includes: forming a bulk insulating film over each of the thin film transistors in the peripheral region of the array substrate, the bulk insulating film covering the corresponding thin film transistor, and adjacent blocks The insulating film has a recessed region therebetween; the step of fabricating the opposite substrate comprises: forming a convex structure at a position corresponding to at least one of the recessed regions in the peripheral region of the opposite substrate.
  • FIG. 1 is a schematic cross-sectional view showing a peripheral region of a display panel according to an embodiment of the present invention
  • FIG. 2 is a schematic cross-sectional view showing a peripheral region of a display panel according to another embodiment of the present invention.
  • the inventors of the present application have noticed that the thickness of the insulating film on the TFT of the gate driving circuit is thick and the denseness is poor, and therefore, the adhesion of the sealant to the insulating film is inferior.
  • water vapor easily enters the liquid crystal cell through the peeling gap of the sealant and the insulating film, thereby affecting the product quality of the display device (for example, moisture entering the liquid crystal cell may cause display brightness of the display device) Not uniform).
  • the embodiment of the invention provides a display panel, a display device and a method for manufacturing the display panel.
  • the invention is further illustrated in the following examples.
  • At least one embodiment of the present invention provides a display panel including an array substrate 11 and a counter substrate 12 disposed opposite to each other, and a frame seal glue adhered between the array substrate 11 and the opposite substrate 12 .
  • a liquid crystal (not shown) filled in the box-like structure formed by the array substrate 11, the color filter substrate 12, and the sealant 13; the peripheral region of the array substrate 11 opposite to the sealant 13 has a plurality of regions
  • Each of the thin film transistors 14 is covered with a bulk insulating film 15 with a recessed region 16 between adjacent block insulating films 15; the opposite substrate 12 is provided with a bump corresponding to at least one recessed region 16 Structure (eg, raised spacer 17).
  • the specific type of the display panel is not limited.
  • the display panel may be a TN (Twisted Nematic) display panel, a VA (Vertical Alignment) mode display panel, or an IPS ( In-Plane-Switching (plane-direction conversion) or ADS (ADvanced Super Dimension Switch) mode display panel, and so on.
  • the opposite substrate 12 may be a color film substrate or a transparent substrate; in addition, the drawing of the embodiment of the present invention is described by taking each of the bulk insulating films 15 as a thin film transistor 14 as an example, and each block insulation is used.
  • the film 15 can also cover at least two thin film transistors 14.
  • the counter substrate 12 may include a spacer layer and a flat layer
  • the bump structure may be made of a material that forms an insulating layer such as a spacer layer or a flat layer on the opposite substrate 12.
  • the convex structure is a convex spacer 17 as an example.
  • the bulk insulating film 15 may be covered on the surface of each of the thin film transistors 14 of the gate line driving circuit.
  • the bulk insulating film 15 may be made of an organic material such as a resin or an inorganic material such as silicon nitride.
  • the bulk insulating film 15 can protect the thin film transistor 14 to reduce the influence of the outside on the operational characteristics of the thin film transistor 14.
  • the bulk insulating film 15 and the same material insulating film in the display region of the array substrate 11 can be formed in the same layer. Since the thickness of the insulating film is usually several micrometers, the thickness is larger than other films of the array substrate The layer, therefore, the height difference between the thin film transistor and the pixel opening region can be reduced after the insulating film is coated on the substrate, thereby making the array substrate more flat.
  • the sealant 13 can include a substrate and a spherical support 18 disposed within the substrate.
  • the spherical support 18 can be a silicon sphere that is evenly distributed within the substrate.
  • the addition of the spherical support 18 to the substrate serves as a support for the cell thickness of the liquid crystal cell to be easily controlled.
  • the sealant 13 may be applied to the peripheral region of the array substrate 11 and then vacuum-paired with the opposite substrate 12 on which the liquid crystal is dropped, thereby forming a liquid crystal cell; the sealant 13 may also be applied to the opposite substrate 12 The peripheral region is then vacuum-paired with the array substrate 11 on which the liquid crystal is dropped, thereby forming a liquid crystal cell.
  • the specific shape of the raised spacer 17 is not limited.
  • the raised spacers 17 are columnar raised spacers.
  • the raised spacers 17 are frustum-shaped raised spacers.
  • the raised spacer may also be a tapered raised spacer.
  • the height of the raised spacers 17 is equal to the depth of the recesses of the recessed areas 16. In this way, the filling thickness of the sealant 13 between the array substrate 11 and the counter substrate 12 can be made relatively uniform.
  • the opposing substrate 12 can be provided with a raised spacer 17 at a position corresponding to each of the recessed regions 16, which can further increase the adhesion area of the sealant to further enhance the adhesion effect.
  • the position of the opposite substrate 12 corresponding to at least a portion of the recessed portion 16 is designed with a convex spacer 17 protruding toward the recessed portion 16, when the opposite substrate 12 and the array substrate 11 are paired with the box,
  • the convex spacer 17 can apply a pressing force toward the recessed portion 16 to the sealant 13 so that the sealant 13 is sufficiently filled in the recessed portion 16 to reliably adhere to the surface of the recessed portion 16.
  • the thickness of the sealant 13 tends to be uniform, so that the thickness of the peripheral portion of the liquid crystal cell is relatively uniform.
  • the adhesion areas of the sealant 13 and the array substrate 11 and the opposite substrate 12 are greatly increased, and therefore, the adhesion of the sealant 13 is effectively improved.
  • the sealant 13 of the sealant 13 is better, and the water vapor is not easily entered into the liquid crystal cell, thereby improving the product quality of the display device.
  • the display device provided by the embodiment of the invention includes the display panel provided by any of the foregoing embodiments.
  • the adhesion of the sealant of the display panel is good, and the moisture does not easily enter the liquid crystal cell, and therefore, the product quality of the display device is high.
  • the specific type of the display device is not limited, and may be, for example, a liquid A display device such as a crystal display, a liquid crystal television, or an electronic paper.
  • At least one embodiment of the present invention further provides a method of fabricating a display panel, the method comprising the steps of: fabricating an array substrate, the step of fabricating the opposite substrate, and the steps of fabricating the liquid crystal cell, and the steps of fabricating the array substrate and The steps of fabricating the counter substrate will be described in detail.
  • the step of fabricating the array substrate includes forming a bulk insulating film over each of the thin film transistors in the peripheral region of the array substrate, the bulk insulating film covering the corresponding thin film transistor, and having a recessed region between the adjacent bulk insulating films.
  • the step of fabricating the array substrate may further include: forming an insulating film on the display region of the array substrate, the insulating film being made of the same material and in the same layer as the bulk insulating film, that is, the block insulating layer located in the peripheral region.
  • the film and the insulating film located in the display region are formed by the same patterning process.
  • the step of fabricating the opposite substrate includes: forming a convex structure (for example, a raised spacer) at a position corresponding to the at least one recessed portion of the peripheral region of the opposite substrate, that is, forming a position corresponding to the at least partially recessed portion in the peripheral region of the opposite substrate Raised structure.
  • a convex structure for example, a raised spacer
  • the step of fabricating the opposite substrate may further include: forming a support spacer or a flat layer on the display area of the opposite substrate, the support spacer or the flat layer being the same material and the same as the convex structure, for example
  • the layer fabrication that is, the raised structure in the peripheral region and the support spacer or flat layer in the display area are formed by the same patterning process.
  • the water vapor is not easily entered into the liquid crystal cell, and the display panel is applied to the display device, which can greatly improve the product quality of the display device.
  • a convex structure for example, a raised spacer
  • a convex structure may be formed at a position corresponding to each recessed area of the opposite substrate when the opposite substrate is fabricated.
  • the step of fabricating the liquid crystal cell may include: injecting liquid crystal on the array substrate, and applying a sealant on the peripheral region of the opposite substrate; and the array substrate and the opposite substrate To the box, a liquid crystal cell is formed.
  • the step of fabricating the liquid crystal cell may include: injecting liquid crystal on the opposite substrate, and applying a sealant on the peripheral region of the array substrate; and the array substrate and the pair The substrate is placed on the box to form a liquid crystal cell.
  • the convex structure protruding toward the recessed area can apply a pressing force toward the recessed area to the sealant, thereby making the sealant full. Filled in the recessed area, and reliably adhered to the surface of the recessed area.
  • the thickness of the sealant is also uniform, so that the thickness of the peripheral region of the liquid crystal cell is relatively uniform.
  • the adhesion area of the frame sealant to the array substrate and the opposite substrate is greatly increased, thereby effectively improving the adhesion of the sealant. Whether in a general environment or in a high temperature and high humidity environment, the sealant of the sealant is better, and the water vapor does not easily enter the liquid crystal cell, thereby improving the product quality of the display device.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种显示面板、显示装置及显示面板的制作方法，该显示面板包括相对设置的阵列基板（11）与对置基板（12）、以及粘附于阵列基板（11）和对置基板（12）之间的封框胶（13）；阵列基板（11）与封框胶（13）位置相对的周边区域具有多个薄膜晶体管（14），每个薄膜晶体管（14）的表面覆盖有块状绝缘膜（15），相邻块状绝缘膜（15）之间具有凹陷区（16）；对置基板（12）对应凹陷区（16）的位置设置有凸起结构（17）。由于封框胶（13）与阵列基板（11）和对置基板（12）的粘附面积均大大增加，因此，有效提高了封框胶（13）的粘附力，提升了显示装置的产品品质。

Description

显示面板、显示装置及显示面板的制作方法 技术领域
本发明实施例涉及一种显示面板、显示装置及显示面板的制作方法。
背景技术
在平板显示装置中，薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display，TFT-LCD)具有体积小、功耗低、制造成本相对较低和无辐射等特点，在当前的平板显示器市场占据了主导地位。
显示面板作为TFT-LCD的主要部件之一，其结构通常包括：相对设置的阵列基板与彩膜基板、粘附于阵列基板和彩膜基板之间的封框胶，以及填充于阵列基板、彩膜基板和封框胶所形成的盒状结构内的液晶。在阵列基板的周边区域，栅线驱动电路的TFT的上方覆盖有绝缘膜，绝缘膜可以对TFT进行绝缘保护，从而减少外界对TFT工作特性的影响。
发明内容
本发明实施例提供一种显示面板、显示装置及显示面板的制作方法，以提高封框胶的粘附力，提升显示装置的产品品质。
本发明的至少一个实施例提供了一种显示面板，其包括相对设置的阵列基板与对置基板、粘附于阵列基板和对置基板之间的封框胶，以及填充于阵列基板、彩膜基板和封框胶所形成的盒状结构内的液晶；所述阵列基板与封框胶位置相对的周边区域具有多个薄膜晶体管，每个薄膜晶体管的表面覆盖有块状绝缘膜，相邻块状绝缘膜之间具有凹陷区；所述对置基板对应至少一个所述凹陷区的位置设置有凸起结构。
本发明的至少一个实施例还提供了一种显示装置，其包括上述显示面板。
本发明的至少一个实施例还提供了一种显示面板的制作方法，该方法包括制作阵列基板的步骤、制作对置基板的步骤，以及制作液晶盒的步骤。所述制作阵列基板的步骤包括：在阵列基板周边区域的每个薄膜晶体管的上方形成块状绝缘膜，所述块状绝缘膜覆盖对应的所述薄膜晶体管，且相邻块状 绝缘膜之间具有凹陷区；所述制作对置基板的步骤包括：在对置基板周边区域对应至少一个所述凹陷区的位置形成凸起结构。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1为本发明一实施例显示面板的周边区域的截面结构示意图；
图2为本发明另一实施例显示面板的周边区域的截面结构示意图。
附图标记：
11-阵列基板；
12-对置基板；
13-封框胶；
14-薄膜晶体管；
15-块状绝缘膜；
16-凹陷区；
17-凸起结构；
18-球状支撑物。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
在研究中，本申请的发明人注意到，栅极驱动电路的TFT上的绝缘膜的厚度较厚，并且致密性较差，因此，封框胶与绝缘膜的粘附性较差。在高温高湿环境下，水汽极易通过封框胶和绝缘膜的剥离缝隙进入到液晶盒内，从而影响到显示装置的产品品质(例如，水汽进入液晶盒内会导致显示装置的显示画面亮度不均匀)。
为了提高封框胶的粘附力，提升显示装置的产品品质，本发明实施例提供了一种显示面板、显示装置及显示面板的制作方法。以下举实施例对本发明作进一步详细说明。
如图1所示，本发明的至少一个实施例提供的显示面板，其包括相对设置的阵列基板11与对置基板12、以及粘附于阵列基板11和对置基板12之间的封框胶13，以及填充于阵列基板11、彩膜基板12和封框胶13所形成的盒状结构内的液晶(图中未示出)；阵列基板11与封框胶13位置相对的周边区域具有多个薄膜晶体管14，每个薄膜晶体管14的表面覆盖有块状绝缘膜15，相邻块状绝缘膜15之间具有凹陷区16；对置基板12对应至少一个凹陷区16的位置设置有凸起结构(例如凸起隔垫物17)。
在本发明的实施例中，显示面板的具体类型不限，例如显示面板可以为TN(Twisted Nematic，扭曲向列)模式的显示面板、VA(Vertical Alignment，垂直取向)模式的显示面板、IPS(In-Plane-Switching，平面方向转换)或者ADS(ADvanced Super Dimension Switch，高级超维场转换)模式的显示面板，等等。
需要说明的是，对置基板12可以为彩膜基板或透明基板；此外，本发明实施例的附图以每个块状绝缘膜15覆盖一个薄膜晶体管14为例进行说明，每个块状绝缘膜15还可以覆盖至少两个薄膜晶体管14。
在至少一个实施例中，对置基板12可以包括隔垫物层和平坦层，凸起结构可以利用形成对置基板12上的隔垫物层或平坦层等绝缘层的材料制作。本发明的以下实施例提供的显示面板中，以凸起结构为凸起隔垫物17为例进行说明。
在阵列基板11的周边区域，通常需要设计栅线驱动电路，本申请的至少一个实施例中，可以在栅线驱动电路的每个薄膜晶体管14的表面覆盖块状绝缘膜15。
例如，块状绝缘膜15既可以采用有机材质，例如树脂，也可以采用无机材质，例如氮化硅。该块状绝缘膜15可以对薄膜晶体管14进行保护，从而减少外界对薄膜晶体管14的工作特性的影响。
例如，块状绝缘膜15与阵列基板11的显示区域内的同材质绝缘膜可以同层制作。由于绝缘膜的厚度通常为几个微米，厚度大于阵列基板的其它膜 层，因此，在基板上涂覆绝缘膜后可以降低薄膜晶体管与像素开口区的高度差，从而使阵列基板更加平坦化。
在至少一个实施例中，如图1所示，封框胶13可以包括：基材以及分布于基材内的球状支撑物18。例如，球状支撑物18可以为硅球，均匀分布于基材内。在基材内加入球状支撑物18可以起到支撑作用，从而使液晶盒的盒厚尺寸易于管控。例如，封框胶13可以涂覆于阵列基板11的周边区域，然后与滴注上液晶的对置基板12真空对盒，从而形成液晶盒；封框胶13也可以涂覆于对置基板12的周边区域，然后与滴注上液晶的阵列基板11真空对盒，从而形成液晶盒。
凸起隔垫物17的具体形状不限。例如，如图1所示，在该实施例中，凸起隔垫物17为柱状凸起隔垫物。例如，如图2所示，在该实施例中，凸起隔垫物17为锥台状凸起隔垫物。此外，例如，凸起隔垫物也可以为锥状凸起隔垫物。在至少一个实施例中，凸起隔垫物17的高度等于凹陷区16的凹陷深度。这样可以使封框胶13在阵列基板11和对置基板12之间的填充厚度较为均匀。
在至少一个实施例中，对置基板12可在对应每一个凹陷区16的位置均设计有凸起隔垫物17，这样可以进一步增加封框胶的粘附面积，使粘附效果进一步提升。
在本发明实施例的技术方案中，对置基板12对应至少部分凹陷区16的位置设计有凸向凹陷区16的凸起隔垫物17，当对置基板12与阵列基板11对盒时，凸起隔垫物17可以对封框胶13施加朝向凹陷区16的挤压力，从而使封框胶13充分填充在凹陷区16内，与凹陷区16的表面可靠粘附。此外，由于凸起隔垫物17的挤压作用，封框胶13的厚度也趋于一致，这样可以使得液晶盒周边区域的盒厚较为均匀。采用本方案，封框胶13与阵列基板11和对置基板12的粘附面积均大大增加，因此，有效提高了封框胶13的粘附力。无论是在一般环境下，还是在高温高湿环境下，封框胶13的密封性均较佳，水汽不易进入液晶盒内，从而提升了显示装置的产品品质。
本发明实施例所提供的显示装置，包括前述任一实施例提供的显示面板。该显示装置中，显示面板的封框胶的粘附力较好，水汽不易进入液晶盒内，因此，显示装置的产品品质较高。显示装置的具体类型不限，例如可以为液 晶显示器、液晶电视或电子纸等显示装置。
本发明的至少一个实施例还提供了一种显示面板的制作方法，该方法包括制作阵列基板的步骤、制作对置基板的步骤，以及制作液晶盒的步骤，下面分别对制作阵列基板的步骤和制作对置基板的步骤进行详细说明。
制作阵列基板的步骤包括：在阵列基板周边区域的每个薄膜晶体管的上方形成块状绝缘膜，块状绝缘膜覆盖对应的薄膜晶体管，且相邻块状绝缘膜之间具有凹陷区。
在至少一个实施例中，制作阵列基板的步骤还可以包括：在阵列基板的显示区域形成绝缘膜，该绝缘膜例如与块状绝缘膜材质相同且同层制作，即位于周边区域的块状绝缘膜和位于显示区域的绝缘膜通过同一次构图工艺形成。
制作对置基板的步骤包括：在对置基板周边区域对应至少一个凹陷区的位置形成凸起结构(例如凸起隔垫物)，即，在对置基板周边区域对应至少部分凹陷区的位置形成凸起结构。
在至少一个实施例中，制作对置基板的步骤还可以包括：在对置基板的显示区域形成支撑隔垫物或平坦层，该支撑隔垫物或平坦层例如与凸起结构材质相同且同层制作，即位于周边区域的凸起结构和位于显示区域的支撑隔垫物或平坦层通过同一次构图工艺形成。
采用上述方法制得的显示面板，水汽不易进入液晶盒内，将该显示面板应用于显示装置，能够大大提高显示装置的产品品质。
为了进一步增大封框胶的粘附面积，可以在制作对置基板时，在对置基板对应每一个凹陷区的位置均形成凸起结构(例如凸起隔垫物)。
在本发明的至少一个实施例提供的方法，制作液晶盒的步骤可以包括：在阵列基板上滴注液晶，及在对置基板的周边区域涂覆封框胶；以及将阵列基板和对置基板对盒，形成液晶盒。
在本发明的至少另一个实施例提供的方法中，制作液晶盒的步骤可以包括：在对置基板上滴注液晶，及在阵列基板的周边区域涂覆封框胶；以及将阵列基板和对置基板对盒，形成液晶盒。
采用上述实施例提供的方法，在将对置基板与阵列基板对盒时，凸向凹陷区的凸起结构可以对封框胶施加朝向凹陷区的挤压力，从而使封框胶充分 填充在凹陷区，与凹陷区的表面可靠粘附。此外，由于凸起结构的挤压作用，封框胶的厚度也趋于一致，从而使得液晶盒的周边区域的盒厚较为均匀。采用本发明实施例提供的方法，封框胶与阵列基板和对置基板的粘附面积均大大增加，因此，有效提高了封框胶的粘附力。无论是在一般环境下，还是在高温高湿环境下，封框胶的密封性均较佳，水汽不易进入液晶盒内，从而提升了显示装置的产品品质。
以上所述仅是本发明的示范性实施方式，而非用于限制本发明的保护范围，本发明的保护范围由所附的权利要求确定。
本申请要求于2015年1月30日递交的中国专利申请第201510050442.1号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (13)

  1. 一种显示面板，包括相对设置的阵列基板与对置基板、粘附于阵列基板和对置基板之间的封框胶，以及填充于阵列基板、彩膜基板和封框胶所形成的盒状结构内的液晶，其中，
    所述阵列基板的与封框胶位置相对的周边区域具有多个薄膜晶体管，每个薄膜晶体管的表面覆盖有块状绝缘膜，相邻块状绝缘膜之间具有凹陷区；所述对置基板对应至少一个所述凹陷区的位置设置有凸起结构。
  2. 如权利要求1所述的显示面板，其中，所述凸起结构包括柱状凸起结构、锥状凸起结构或锥台状凸起结构。
  3. 如权利要求1或2所述的显示面板，其中，所述凸起结构的高度等于所述凹陷区的凹陷深度。
  4. 如权利要求1～3任一项所述的显示面板，其中，所述对置基板对应每个所述凹陷区的位置设置有凸起结构。
  5. 如权利要求1～4任一项所述的显示面板，其中，所述块状绝缘膜包括有机材质的块状绝缘膜或无机材质的块状绝缘膜。
  6. 如权利要求1～5任一项所述的显示面板，其中，所述封框胶包括：基材以及分布于所述基材内的球状支撑物。
  7. 一种显示装置，包括如权利要求1～6任一项所述的显示面板。
  8. 一种显示面板的制作方法，包括制作阵列基板的步骤、制作对置基板的步骤，以及制作液晶盒的步骤，其中，
    所述制作阵列基板的步骤包括：在阵列基板周边区域的每个薄膜晶体管的上方形成块状绝缘膜，所述块状绝缘膜覆盖对应的所述薄膜晶体管，且相邻块状绝缘膜之间具有凹陷区；
    所述制作对置基板的步骤包括：在对置基板周边区域对应至少一个所述凹陷区的位置形成凸起结构。
  9. 如权利要求8所述的制作方法，其中，所述制作液晶盒的步骤包括：
    在阵列基板上滴注液晶，及在对置基板的周边区域涂覆封框胶；以及
    将阵列基板和对置基板对盒，形成液晶盒。
  10. 如权利要求8所述的制作方法，其中，所述制作液晶盒的步骤包括：
    在对置基板上滴注液晶，及在阵列基板的周边区域涂覆封框胶；以及
    将阵列基板和对置基板对盒，形成液晶盒。
  11. 如权利要求8～10任一项所述的制作方法，其中，
    在对置基板周边区域对应每个所述凹陷区的位置形成凸起结构。
  12. 如权利要求8～11任一项所述的制作方法，其中，
    所述制作阵列基板的步骤还包括：在阵列基板的显示区域形成绝缘膜，所述绝缘膜与块状绝缘膜材质相同且同层制作。
  13. 如权利要求8～12任一项所述的制作方法，其中，所述制作对置基板的步骤还包括：在对置基板的显示区域形成支撑隔垫物或平坦层，所述支撑隔垫物或所述平坦层与所述凸起结构材质相同且同层制作。
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