WO2016058465A1 - 光学防伪元件及光学防伪产品 - Google Patents
光学防伪元件及光学防伪产品 Download PDFInfo
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- WO2016058465A1 WO2016058465A1 PCT/CN2015/089408 CN2015089408W WO2016058465A1 WO 2016058465 A1 WO2016058465 A1 WO 2016058465A1 CN 2015089408 W CN2015089408 W CN 2015089408W WO 2016058465 A1 WO2016058465 A1 WO 2016058465A1
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Definitions
- the present invention relates to the field of optical security, and in particular to an optical security element and an optical security product.
- Multi-layer structure plating technology In order to prevent counterfeiting of various types of high-security or high-value-added printed matter such as banknotes, documents and product packaging, multi-layer structure plating technology is widely used. Multi-layer structure plating technology can present various color features or can display different colors under different viewing angles, and cannot be copied or copied by electronic devices such as cameras, scanners, printers, etc., so it has high anti-counterfeiting ability. However, the simple use of multi-layer plating technology has not been able to meet the needs of the field of anti-counterfeiting.
- an optically variable magnetic ink is formed by adding a magnetic layer to the optically variable structure, and the OVMI particles can be arranged in the direction of the magnetic induction line by magnetic field induction, thereby forming a specific graphic structure.
- the directional arrangement of the optically variable magnetic particles needs to rely on the magnetic field, it is restricted by the shape of the magnetic field, and the shape cannot be arbitrarily designed, and a specific orientation device and process are required.
- the technology integration method using interference multi-layer plating combined with holography and color matching technology is more complicated, and the effect is not ideal, and the improvement of the anti-counterfeiting capability of the interference multi-layer coating is still limited.
- the invention provides an optical security element, the optical security element comprising: a substrate;
- Subwavelength surface microstructures and optically reflective facets formed on the upper surface of the substrate; and formation A multilayer structure coating on the sub-wavelength surface microstructure and optically reflective facets.
- the sub-wavelength surface microstructure and the optically reflective facet partially overlap.
- the multilayer structure coating forms a Fabry-Perot resonant cavity.
- the multilayer structure coating forms a hollow pattern.
- the hollow pattern has a para-position with the sub-wavelength surface microstructure and/or the optically reflective facet.
- the sub-wavelength surface microstructure is a one-dimensional grating or a two-dimensional grating; the sub-wavelength surface microstructure has a groove shape of at least two of a sinusoidal shape, a rectangular shape, a zigzag shape, or a sinusoidal shape, a rectangular shape, and a zigzag shape. Splicing or combination.
- the sub-wavelength surface microstructure has a groove depth of from 10 nm to 500 nm.
- the sub-wavelength surface microstructure has a groove depth of 50 nm to 300 nm.
- the sub-wavelength surface microstructure has a feature size of 50 nm to 500 nm in a two-dimensional plane in which the sub-wavelength surface microstructure is located.
- the sub-wavelength surface microstructure has a feature size in the two-dimensional plane in which the sub-wavelength surface microstructure is located from 200 nm to 400 nm.
- the characteristic size of the optically reflecting facet in at least one dimension on a two-dimensional plane in which the optically reflective facet is located is between 1 ⁇ m and 300 ⁇ m.
- the characteristic size of the optically reflecting facet in at least one dimension on a two-dimensional plane in which the optically reflective facet is located is between 3 ⁇ m and 100 ⁇ m.
- the characteristic size of the optically reflective facet in at least one dimension on a two-dimensional plane in which the optically reflective facets are located is between 5 ⁇ m and 30 ⁇ m.
- diffractive optically variable features are formed on at least one of the substrate, the sub-wavelength surface microstructure, and the optically reflective facets At least one of magnetic, optical, electrical, and radioactive features.
- the multilayer structure plating layer is composed of an absorbing layer, a dielectric layer, and a reflective layer.
- the present invention provides an optical security product comprising the optical security element.
- the sub-wavelength surface microstructure and the region where the multi-layer structure plating layer and the optical reflection facet and the region where the multi-layer structure plating layer are formed form contrasting optical characteristics, thereby
- the optical security element or the optical security product with the security element is easily recognized and has strong anti-counterfeiting capability.
- FIG. 1 is a cross-sectional view of an optical security element in accordance with one embodiment of the present invention.
- FIGS. 2(a) and 2(b) are cross-sectional views of an optical security element according to another embodiment of the present invention.
- FIG. 3 is a cross-sectional view of an optical security element in accordance with yet another embodiment of the present invention.
- FIG. 4 is a top plan view of an optical security element in accordance with yet another embodiment of the present invention.
- the present invention provides an optical security element 1, as shown in FIG. 1, the optical security element 1 comprises: a substrate 101, a sub-wavelength surface microstructure 1021, an optically reflective facet 1022, and a multilayer structure plating layer 103;
- the structure 1021 is formed on the upper surface 102 of the substrate 101.
- the sub-wavelength surface microstructure 1021 at least partially covers the upper surface 102.
- the optical reflective surface 1022 is formed on the upper surface 102 of the substrate 101.
- the optical reflective surface 1021 at least partially covers the upper surface.
- the region where the sub-wavelength surface microstructure 1021 is located is the region A
- the region where the optical reflective facet 1022 is located is the region B
- the multi-layer structure plating layer 103 at least partially covers the region A and the region B. Since the multilayer structure plating layer 103 covers the area A and the area B, so that the colors of the area A and the area B are different; moreover, in the area B, the orientation of the optical facets has a substantially random distribution in the two-dimensional plane in which it is located.
- the variation of the optical scattering features provided, and/or the orientation of the selected optical facet enables the region B to be perceived by the viewer as a surface that protrudes forward and/or backward relative to its actual spatial shape.
- the sub-wavelength surface microstructure may be a one-dimensional grating or a two-dimensional grating, and the groove shape of the sub-wavelength surface microstructure may be sinusoidal, rectangular, zigzag or the like; the grid distribution of the two-dimensional grating may be an orthogonal structure, a honeycomb structure, Two-dimensional Brava lattice structure, random structure, etc. It should be understood that the structure of the sub-wavelength surface microstructure is not limited to the structures described above, and that splicing or combination of these sub-wavelength surface microstructures may be employed in actual optical security elements. By designing the sub-wavelength surface microstructure, patterns such as characters and logos required for anti-counterfeiting can be realized.
- the subwavelength surface microstructure has a groove depth of from 10 nm to 500 nm, preferably from 50 nm to 300 nm. Further, the sub-wavelength surface microstructure has a feature size in the two-dimensional plane in which it is located from 50 nm to 500 nm, preferably from 200 nm to 400 nm. Preferably, when the feature size in one direction satisfies the requirement, the feature size in the other direction may not be limited.
- the matching relationship can be expressed by the aspect ratio (ie, the ratio of the groove depth to the period), which can be based on The reproduction effect of the volume is calculated by the rigorous coupled wave theory design.
- the aspect ratio is usually in the range of 0.3 to 2, preferably 0.4 to 1.
- the aspect ratio of the sub-wavelength surface microstructure (ie, the ratio of the peak width of the grating to the period) is also an important parameter affecting the optical effect, which mainly affects the brightness and contrast of the optical security element, and generally requires a ratio of 0.3- 0.7, preferably 0.4-0.6.
- the structure of the multilayer structure plating layer 103 employed in the optical security element 1 according to the present invention will be described below.
- the multilayer structure plating layer 103 may have a multilayer dielectric film structure, that is, composed of different dielectric layers having high and low refractive indices. This structure is usually designed using a ⁇ /4 film system.
- the material used for each dielectric layer may be one or more of inorganic plating materials such as MgF 2 , SiO 2 , Al 2 O 3 , MgO, HfO 2 , TiO 2 , ZnS, ZnO, and the like.
- Each of the dielectric layers may also be a high molecular polymer or a combination of an inorganic plating material and a high molecular polymer.
- the structure of the multi-layer structure plating layer 103 may also be a metal/dielectric multilayer film structure, and generally adopts a three-layer structure or a five-layer structure.
- the structure of the multilayer structure plating layer 103 may include at least one of the following:
- An absorbing layer, a dielectric layer, an absorbing layer, a dielectric layer and an absorbing layer which are sequentially formed on the sub-wavelength surface microstructure.
- the multi-layer structure of the three-layer structure is a reflective layer, a dielectric layer and an absorbing layer, or an absorbing layer, a dielectric layer and an absorbing layer.
- the former can only observe the light-changing effect on one side, and the latter can be in two. Observe the light change effect.
- the five-layer structure of the multi-layer structure coating is an absorbing layer, a dielectric layer, a reflective layer, a dielectric layer and an absorbing layer, or an absorbing layer, a dielectric layer, an absorbing layer, a dielectric layer and an absorbing layer, and a five-layer structure of the multi-layer structure plating layer may Observing the light-changing effect on both sides, the light-changing effects observed on both sides can be designed to be the same or different, which is determined by the parameters and materials of the respective reflective layer, dielectric layer, and absorption layer.
- the reflective layer is generally a metal layer having a relatively large thickness, and the thickness thereof is usually greater than 20 nm, and the material used may be one or more of gold, silver, copper, aluminum, iron, tin, zinc, nickel, chromium, and the like.
- Each of the dielectric layers may be a single dielectric layer, and the dielectric material may be selected from inorganic coating materials such as MgF 2 , SiO 2 , Al 2 O 3 , MgO, PMMA, HfO 2 , TiO 2 , ZnS, ZnO, and the like.
- the thickness of the high molecular polymer is determined by the optical effect to be achieved and the refractive index of the material, and may generally be from 10 nm to 1000 nm, preferably from 50 nm to 800 nm.
- each dielectric layer may also be a multi-layer dielectric layer, and the dielectric material used may be selected from common inorganic materials such as MgF 2 , SiO 2 , Al 2 O 3 , MgO, PMMA, HfO 2 , TiO 2 , ZnS, ZnO, and the like.
- Coating materials, and multilayer dielectric films are usually designed with high and low refractive index ⁇ /4 film systems.
- the material used for each absorption layer may be one or more of metals such as gold, silver, copper, aluminum, iron, tin, zinc, nickel, chromium, or a metal compound, and the thickness is usually not more than 20 nm, preferably 5-10 nm. Its function is to partially, partially transmit and partially absorb the illumination light.
- the structure of the multilayer structure plating layer 103 according to the present invention is not limited to the structures described above, for example, a two-layer structure (ie, a reflective layer and a dielectric layer), a four-layer structure (ie, an absorption layer, a dielectric layer, Structures such as reflective layers and dielectric layers are also preferred.
- the multilayer structure plating layer 103 can form a Fabry-Perot cavity, which selectively absorbs and reflects the incident white light, so that the emitted light only contains certain wavelength bands, thereby forming a specific color; when the light is incident or outgoing When the angle changes, the relative optical path changes, and the interference band also changes, so that the color presented to the observer also changes, thereby forming a light-changing effect of a specific color.
- the parameter matching relationship, the specific principle and the optical characteristics are specifically defined by the Chinese patent CN102514443, and the contents of the specification are incorporated in the present invention.
- the sub-wavelength surface microstructure 1021 is combined with the multi-layer structure plating 103 to form a color of the discoloration feature that occurs as the viewing angle changes, and which is distinguished from the color provided by the multi-layer coating of a flat or smooth surface.
- optical features provided by the combination of the optically reflective facet 1022 and the multilayer structure plating 103 are illustrated below in conjunction with FIG.
- the feature size or period (the facet may be periodic or non-periodic) of the optically reflective facet 1022 in at least one dimension on its two-dimensional plane is between 1 ⁇ m and 300 ⁇ m, preferably between 3 ⁇ m and 100 ⁇ m. It is particularly preferably between 5 ⁇ m and 30 ⁇ m.
- the depth of the optically reflective facets is less than 10 ⁇ m, preferably between 1 ⁇ m and 5 ⁇ m. Thus, it does not have a diffractive effect on the visible wavelength range.
- the orientation of the optically reflective facets can be determined by their angle of inclination and/or their azimuth.
- optical characteristics of the optically reflective facet 1022 combined with the multi-layered structure plating layer 103 are defined by the Chinese patents CN102712207, CN102905909, CN103282212 and CN103229078, the contents of which are incorporated herein by reference.
- the multilayer structure coating 103 on a flat surface include its color, as well as features of both color variations as a function of viewing angle.
- the combination of the optically reflective facet 1022 and the multilayer structure coating 103 does not substantially alter the color characteristics provided by the multilayer structure coating 103, i.e., the multilayer structure coating has the same selectivity as the multilayer structure coating formed on the flat surface.
- Absorption and reflection characteristics, and for a particular light source, only the direction of the outgoing light is changed for each optically reflective facet, thus substantially changing the viewing angle of the color change characteristic of the multilayer structure plating layer 103 on the area B The distribution on the dimension surface.
- the above results determine the relationship between the region A and the region B using the same multilayer structure plating 103. There are different color features and color change characteristics.
- the sub-wavelength surface microstructure 1021 and the optical reflection facet 1022 can be made into a master by a holographic interferometry, a laser direct writing technique, an electron beam etching technique, etc., and can be made into a working plate by an electroforming process, and then subjected to molding, UV replication, and the like.
- the production process is transferred to the surface of the substrate 101.
- the size parameters of the sub-wavelength surface microstructure and the optically reflective facet are greatly different in magnitude, there are different requirements for the photoresist material of the mother board or the process of making the mother board, so the two are actually combined in the same
- the mother board or working version is quite complicated and difficult to be completed by a single process.
- a two-step method can be used: firstly, a sub-wavelength surface microstructure is fabricated by using holographic interferometry, and then a laser is straight through the engraving process. Write and make optical reflective facets.
- the multi-layer structure plating layer 103 can be generally realized by a vacuum coating process such as thermal evaporation, electron beam evaporation, high-frequency sputtering, magnetron sputtering, ion sputtering, reactive sputtering, ion plating, or electroless plating, electroplating, or coating. Processes such as cloth implement some of these layers.
- the multi-layer structure coating covered by the surface of the sub-wavelength surface microstructure 1021 and the optical reflection facet 1022 is simultaneously completed in the same process, so the surfaces of 1021 and 1022 are The coating parameters of the multilayer structure are basically the same.
- the film structure design of the multi-layer structure plating layer 103, the sub-wavelength surface microstructure 1021 and the optical reflection facet 1022 should be considered in the structural design calculation, so that the optical characteristics of the area A and the area B have strong color contrast.
- the purpose of the security element is easy to identify and difficult to forge.
- the optically reflective facet 1022 has optical scattering features provided by a substantially random variation distributed in a two-dimensional plane in which it is located, and the region is oriented according to the orientation of the selected optically reflective facet 1022 B can be perceived by the viewer as a feature of the surface that protrudes forward and/or backward relative to its actual spatial shape.
- the structure of the optically reflective facet 1022 of different parameters shown in region B of Figure 2(a) has a random or pseudo-random arrangement in its two-dimensional plane, and the structural parameters include the depth, width, and tilt of the optically reflective facet.
- the B region in Fig. 2(B) shows the use of the optically reflective facet 1022 to simulate the curved surface 1022' to form features that protrude from the surface 102, in which case any optically reflective facet on the two dimensional plane has a 1022 simulated with that position. 'The surfaces have roughly the same normal direction.
- the optical security element 1 according to the present invention further increases the area C and its anti-counterfeiting feature in FIG. 1, wherein the sub-wavelength surface microstructure 1021 and the optical reflective facet 1022 are overlapped with each other to form a substrate 101.
- the anti-counterfeiting feature includes the two anti-counterfeiting features mentioned above, that is, the sub-wavelength surface microstructure 1021 is combined with the multi-layer structure plating layer 103 to obtain the anti-counterfeiting feature and the optical reflective facet 1022 is combined with the multi-layer structure plating layer 103 to obtain the anti-counterfeiting feature.
- the anti-counterfeiting feature of the region C has both the color and discoloration characteristics of the sub-wavelength surface microstructure 1021 and the multi-layer structure plating layer 10 which are different from the multi-layer structure plating layer, and the two-dimensional surface of the optical reflection facet 1022 in the region C.
- the sub-wavelength surface microstructure 1021 is selected to be a sinusoidal groove type, a period of 300 nm, a depth of 95 nm, and an orthogonal two-dimensional grid distribution, and the multilayer structure plating layer 103 is sequentially selected to include Al (40 nm)/SiO2. (370 nm) / Cr (5 nm) (On a flat surface, the multilayer structure coating of this parameter has a feature of a golden color on the front side and a green color on the oblique side).
- the area A has a red color on the front side and a yellow color on the left side;
- the area B has a golden-green color feature provided by the multi-layer plating layer and a scattering characteristic provided by the optically reflective facet and/or protrudes from The features of the surface;
- the region C has a red-yellow color feature formed by the sub-wavelength surface microstructure and the multi-layer structure plating and a scattering feature provided by the optically reflective facet and/or features protruding from the surface. All in all, the three regions A, B, and C have their own visual characteristics, forming a strong visual contrast with each other, thereby ensuring that the optical security component 1 has strong anti-counterfeiting capability.
- the coverage of the multilayer structure plating layer in the optical security element of the present invention is patterned So, forming a hollow feature.
- the patterning can be performed by patterning the entire multilayer structure plating layer, or alternatively, one or several layers can be separately patterned.
- a patterned protective layer is applied by printing after forming a multi-layered plating, and then the plating outside the protected area is etched by a chemical solvent such as an alkali solution.
- the release layer is printed before the formation of the multilayer structure plating layer, and after the formation of the multilayer structure plating layer, the plating layer above the release layer is peeled off by a certain liquid immersion (for example, water) to form a hollow pattern.
- the hollow pattern 1031 of the multilayer structure plating layer 103 (the area not covered by the multilayer structure plating layer) and the sub-wavelength surface microstructure 1021 and There is a strict positional correspondence between the optically reflective facets 1022, so that the optical security element of the present invention has stronger identifiability and anti-counterfeiting capability.
- A, B, and C respectively correspond to the three regions A, B, and C in Fig. 3, that is, "CBPM" and "ZSST" are formed by subwavelength surface microstructures having a multi-layer structure coating formed on the surface.
- the color characteristics of B and area C and the characteristics of discoloration with observation angle is the optical scattering characteristic of the optically reflective facet formed with the multi-layer structure coating on the surface and the discoloration characteristic with the observation angle, and the area C is the surface formation.
- the optically reflective facets of the layered coating produce features that visually protrude forward relative to their actual spatial shape and at the same time have a characteristic that discolors with viewing angle.
- a method of forming the hollow region 1031 is exemplarily given below: a sinusoidal grating is formed in the region of 1031, and has an arrangement period of 350 nm and a depth of 300 nm (the surface microstructure of the region other than 1031 is set to have an aspect ratio). Then, a 5 nm thick Al layer and a 250 nm thick SiO 2 layer are sequentially deposited on the upper surface 102 side, and then the optical security element 1 is immersed in a 10% concentration NaOH solution until the Al layer in the 1031 region completely disappears. At this time, the area other than 1031 is still covered with the Al layer and the SiO 2 layer.
- a cylindrical mirror is formed in the region 1031, the width is 30 ⁇ m, the gap between the cylindrical mirrors is 2 ⁇ m wide, and the height of the cylindrical mirror is 10 ⁇ m (this value is set) a height of 1.5 ⁇ m larger than the optically reflective facet, and an Al layer of 40 nm thick (thickness of the flat region), a 250 nm thick SiO 2 layer, and a 5 nm thick Cr layer are sequentially deposited on the 102 side, and formed by a coating process.
- the protective layer (polyester material) had a thickness (relative to the flat surface) of 1 ⁇ m.
- the optical security element was immersed in a 10% NaOH solution at 40 ° C until the Al/SiO 2 /Cr coating in the 1031 region completely disappeared, and the area other than 1031 was still covered with Al/SiO 2 /Cr plating, ie The preparation of the optical security element is completed. At this time, the observation direction is such that the optical security element is viewed from the upper surface 102 side, and Al/SiO 2 /Cr which is sequentially stacked on a region other than 1031 provides a multilayer structure plating layer, and a hollow pattern is formed in the 1031 region.
- diffractive light-changing features and micro-nanostructure features may also be formed in and on the substrate 101 and its upper and lower surfaces and/or sub-wavelength surface microstructures and optically reflective facets. , printed features, fluorescent features, and one or more of the magnetic, optical, electrical, and radioactive features for machine readable.
- the optical security element according to the present invention can be used as a label, a logo, a wide strip, a transparent window, a film, etc., and can be adhered to various articles by various bonding mechanisms. For example, transfer to high security products such as banknotes and credit cards and high value-added products.
- Another aspect of the present invention provides a product with the optical security element, including but not limited to various types of high security products and high value-added products such as banknotes, credit cards, passports, and securities, and various types of wrapping paper. , packing boxes, etc.
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- Finance (AREA)
- Credit Cards Or The Like (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims (16)
- 一种光学防伪元件,其特征在于,该光学防伪元件包括:基材;形成于所述基材上表面的亚波长表面微结构和光学反射小面;以及形成于所述亚波长表面微结构和光学反射小面上的多层结构镀层。
- 根据权利要求1所述的光学防伪元件,其特征在于,所述亚波长表面微结构和所述光学反射小面部分重叠。
- 根据权利要求1所述的光学防伪元件,其特征在于,所述多层结构镀层形成法布里-泊罗谐振腔。
- 根据权利要求1所述的光学防伪元件,其特征在于,所述多层结构镀层形成镂空图案。
- 根据权利要求4所述的光学防伪元件,其特征在于,所述镂空图案与所述亚波长表面微结构和/或所述光学反射小面具有对位关系。
- 根据权利要求1所述的光学防伪元件,其特征在于,所述亚波长表面微结构为一维光栅或二维光栅;所述亚波长表面微结构的槽型为正弦形、矩形、锯齿形、或者正弦形、矩形和锯齿形中至少两者的拼接或组合。
- 根据权利要求6所述的光学防伪元件,其特征在于,所述亚波长表面微结构的槽深为10nm-500nm。
- 根据权利要求7所述的光学防伪元件,其特征在于,所述亚波长表面微结构的槽深为50nm-300nm。
- 根据权利要求1所述的光学防伪元件,其特征在于,所述亚波长表面微结构在所述亚波长表面微结构所在的二维平面内的特征尺寸为50nm-500nm。
- 根据权利要求9所述的光学防伪元件,其特征在于,所述亚波长表面微结构在所述亚波长表面微结构所在的二维平面内的特征尺寸为200nm-400nm。
- 根据权利要求1所述的光学防伪元件,其特征在于,所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在1μm-300μm之间。
- 根据权利要求11所述的光学防伪元件,其特征在于,所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在3μm-100μm之间。
- 根据权利要求12所述的光学防伪元件,其特征在于,所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在5μm-30μm之间。
- 根据权利要求1所述的光学防伪元件,其特征在于,在所述基材、所述亚波长表面微结构以及所述光学反射小面中的至少一者上形成衍射光变特征、微纳结构特征、印刷特征、荧光特征以及用于机读的磁、光、电、 放射性特征中的至少一种。
- 根据权利要求1-14任意一项所述的光学防伪元件,其特征在于,多层结构镀层由吸收层、介质层、以及反射层中的至少两者组成,或者多层结构镀层由介质层组成。
- 一种光学防伪产品,其特征在于,该光学防伪产品包括根据权利要求1-15中任一项所述的光学防伪元件。
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RU2017115325A RU2670078C1 (ru) | 2014-10-16 | 2015-09-11 | Оптический компонент для защиты от подделок и изделие с оптической защитой от подделок |
US15/518,794 US10421308B2 (en) | 2014-10-16 | 2015-09-11 | Optical anti-counterfeiting component and optical anti-counterfeiting product |
EP15850046.2A EP3208099B1 (en) | 2014-10-16 | 2015-09-11 | Optical anti-counterfeiting element and optical anti-counterfeiting product |
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CN201410548750.2A CN104385800B (zh) | 2014-10-16 | 2014-10-16 | 光学防伪元件及光学防伪产品 |
CN201410548750.2 | 2014-10-16 |
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EP3208099A1 (en) | 2017-08-23 |
EP3208099B1 (en) | 2020-02-19 |
CN104385800A (zh) | 2015-03-04 |
US20170239972A1 (en) | 2017-08-24 |
EP3208099A4 (en) | 2018-04-18 |
US10421308B2 (en) | 2019-09-24 |
RU2670078C1 (ru) | 2018-10-17 |
CN104385800B (zh) | 2017-10-24 |
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