WO2016058465A1 - 光学防伪元件及光学防伪产品 - Google Patents

光学防伪元件及光学防伪产品 Download PDF

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Publication number
WO2016058465A1
WO2016058465A1 PCT/CN2015/089408 CN2015089408W WO2016058465A1 WO 2016058465 A1 WO2016058465 A1 WO 2016058465A1 CN 2015089408 W CN2015089408 W CN 2015089408W WO 2016058465 A1 WO2016058465 A1 WO 2016058465A1
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Prior art keywords
security element
sub
optical security
layer
surface microstructure
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PCT/CN2015/089408
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English (en)
French (fr)
Inventor
张宝利
孙凯
张巍巍
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中钞特种防伪科技有限公司
中国印钞造币总公司
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Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52603795&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2016058465(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 中钞特种防伪科技有限公司, 中国印钞造币总公司 filed Critical 中钞特种防伪科技有限公司
Priority to RU2017115325A priority Critical patent/RU2670078C1/ru
Priority to US15/518,794 priority patent/US10421308B2/en
Priority to EP15850046.2A priority patent/EP3208099B1/en
Publication of WO2016058465A1 publication Critical patent/WO2016058465A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/328—Diffraction gratings; Holograms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/21—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose for multiple purposes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/24—Passports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/29—Securities; Bank notes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/369—Magnetised or magnetisable materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378—Special inks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/06009—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code with optically detectable marking
    • G06K19/06046—Constructional details
    • G06K19/06121—Constructional details the marking having been punched or cut out, e.g. a barcode machined in a metal work-piece
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/08—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code using markings of different kinds or more than one marking of the same kind in the same record carrier, e.g. one marking being sensed by optical and the other by magnetic means
    • G06K19/10—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code using markings of different kinds or more than one marking of the same kind in the same record carrier, e.g. one marking being sensed by optical and the other by magnetic means at least one kind of marking being used for authentication, e.g. of credit or identity cards
    • G06K19/14—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code using markings of different kinds or more than one marking of the same kind in the same record carrier, e.g. one marking being sensed by optical and the other by magnetic means at least one kind of marking being used for authentication, e.g. of credit or identity cards the marking being sensed by radiation

Definitions

  • the present invention relates to the field of optical security, and in particular to an optical security element and an optical security product.
  • Multi-layer structure plating technology In order to prevent counterfeiting of various types of high-security or high-value-added printed matter such as banknotes, documents and product packaging, multi-layer structure plating technology is widely used. Multi-layer structure plating technology can present various color features or can display different colors under different viewing angles, and cannot be copied or copied by electronic devices such as cameras, scanners, printers, etc., so it has high anti-counterfeiting ability. However, the simple use of multi-layer plating technology has not been able to meet the needs of the field of anti-counterfeiting.
  • an optically variable magnetic ink is formed by adding a magnetic layer to the optically variable structure, and the OVMI particles can be arranged in the direction of the magnetic induction line by magnetic field induction, thereby forming a specific graphic structure.
  • the directional arrangement of the optically variable magnetic particles needs to rely on the magnetic field, it is restricted by the shape of the magnetic field, and the shape cannot be arbitrarily designed, and a specific orientation device and process are required.
  • the technology integration method using interference multi-layer plating combined with holography and color matching technology is more complicated, and the effect is not ideal, and the improvement of the anti-counterfeiting capability of the interference multi-layer coating is still limited.
  • the invention provides an optical security element, the optical security element comprising: a substrate;
  • Subwavelength surface microstructures and optically reflective facets formed on the upper surface of the substrate; and formation A multilayer structure coating on the sub-wavelength surface microstructure and optically reflective facets.
  • the sub-wavelength surface microstructure and the optically reflective facet partially overlap.
  • the multilayer structure coating forms a Fabry-Perot resonant cavity.
  • the multilayer structure coating forms a hollow pattern.
  • the hollow pattern has a para-position with the sub-wavelength surface microstructure and/or the optically reflective facet.
  • the sub-wavelength surface microstructure is a one-dimensional grating or a two-dimensional grating; the sub-wavelength surface microstructure has a groove shape of at least two of a sinusoidal shape, a rectangular shape, a zigzag shape, or a sinusoidal shape, a rectangular shape, and a zigzag shape. Splicing or combination.
  • the sub-wavelength surface microstructure has a groove depth of from 10 nm to 500 nm.
  • the sub-wavelength surface microstructure has a groove depth of 50 nm to 300 nm.
  • the sub-wavelength surface microstructure has a feature size of 50 nm to 500 nm in a two-dimensional plane in which the sub-wavelength surface microstructure is located.
  • the sub-wavelength surface microstructure has a feature size in the two-dimensional plane in which the sub-wavelength surface microstructure is located from 200 nm to 400 nm.
  • the characteristic size of the optically reflecting facet in at least one dimension on a two-dimensional plane in which the optically reflective facet is located is between 1 ⁇ m and 300 ⁇ m.
  • the characteristic size of the optically reflecting facet in at least one dimension on a two-dimensional plane in which the optically reflective facet is located is between 3 ⁇ m and 100 ⁇ m.
  • the characteristic size of the optically reflective facet in at least one dimension on a two-dimensional plane in which the optically reflective facets are located is between 5 ⁇ m and 30 ⁇ m.
  • diffractive optically variable features are formed on at least one of the substrate, the sub-wavelength surface microstructure, and the optically reflective facets At least one of magnetic, optical, electrical, and radioactive features.
  • the multilayer structure plating layer is composed of an absorbing layer, a dielectric layer, and a reflective layer.
  • the present invention provides an optical security product comprising the optical security element.
  • the sub-wavelength surface microstructure and the region where the multi-layer structure plating layer and the optical reflection facet and the region where the multi-layer structure plating layer are formed form contrasting optical characteristics, thereby
  • the optical security element or the optical security product with the security element is easily recognized and has strong anti-counterfeiting capability.
  • FIG. 1 is a cross-sectional view of an optical security element in accordance with one embodiment of the present invention.
  • FIGS. 2(a) and 2(b) are cross-sectional views of an optical security element according to another embodiment of the present invention.
  • FIG. 3 is a cross-sectional view of an optical security element in accordance with yet another embodiment of the present invention.
  • FIG. 4 is a top plan view of an optical security element in accordance with yet another embodiment of the present invention.
  • the present invention provides an optical security element 1, as shown in FIG. 1, the optical security element 1 comprises: a substrate 101, a sub-wavelength surface microstructure 1021, an optically reflective facet 1022, and a multilayer structure plating layer 103;
  • the structure 1021 is formed on the upper surface 102 of the substrate 101.
  • the sub-wavelength surface microstructure 1021 at least partially covers the upper surface 102.
  • the optical reflective surface 1022 is formed on the upper surface 102 of the substrate 101.
  • the optical reflective surface 1021 at least partially covers the upper surface.
  • the region where the sub-wavelength surface microstructure 1021 is located is the region A
  • the region where the optical reflective facet 1022 is located is the region B
  • the multi-layer structure plating layer 103 at least partially covers the region A and the region B. Since the multilayer structure plating layer 103 covers the area A and the area B, so that the colors of the area A and the area B are different; moreover, in the area B, the orientation of the optical facets has a substantially random distribution in the two-dimensional plane in which it is located.
  • the variation of the optical scattering features provided, and/or the orientation of the selected optical facet enables the region B to be perceived by the viewer as a surface that protrudes forward and/or backward relative to its actual spatial shape.
  • the sub-wavelength surface microstructure may be a one-dimensional grating or a two-dimensional grating, and the groove shape of the sub-wavelength surface microstructure may be sinusoidal, rectangular, zigzag or the like; the grid distribution of the two-dimensional grating may be an orthogonal structure, a honeycomb structure, Two-dimensional Brava lattice structure, random structure, etc. It should be understood that the structure of the sub-wavelength surface microstructure is not limited to the structures described above, and that splicing or combination of these sub-wavelength surface microstructures may be employed in actual optical security elements. By designing the sub-wavelength surface microstructure, patterns such as characters and logos required for anti-counterfeiting can be realized.
  • the subwavelength surface microstructure has a groove depth of from 10 nm to 500 nm, preferably from 50 nm to 300 nm. Further, the sub-wavelength surface microstructure has a feature size in the two-dimensional plane in which it is located from 50 nm to 500 nm, preferably from 200 nm to 400 nm. Preferably, when the feature size in one direction satisfies the requirement, the feature size in the other direction may not be limited.
  • the matching relationship can be expressed by the aspect ratio (ie, the ratio of the groove depth to the period), which can be based on The reproduction effect of the volume is calculated by the rigorous coupled wave theory design.
  • the aspect ratio is usually in the range of 0.3 to 2, preferably 0.4 to 1.
  • the aspect ratio of the sub-wavelength surface microstructure (ie, the ratio of the peak width of the grating to the period) is also an important parameter affecting the optical effect, which mainly affects the brightness and contrast of the optical security element, and generally requires a ratio of 0.3- 0.7, preferably 0.4-0.6.
  • the structure of the multilayer structure plating layer 103 employed in the optical security element 1 according to the present invention will be described below.
  • the multilayer structure plating layer 103 may have a multilayer dielectric film structure, that is, composed of different dielectric layers having high and low refractive indices. This structure is usually designed using a ⁇ /4 film system.
  • the material used for each dielectric layer may be one or more of inorganic plating materials such as MgF 2 , SiO 2 , Al 2 O 3 , MgO, HfO 2 , TiO 2 , ZnS, ZnO, and the like.
  • Each of the dielectric layers may also be a high molecular polymer or a combination of an inorganic plating material and a high molecular polymer.
  • the structure of the multi-layer structure plating layer 103 may also be a metal/dielectric multilayer film structure, and generally adopts a three-layer structure or a five-layer structure.
  • the structure of the multilayer structure plating layer 103 may include at least one of the following:
  • An absorbing layer, a dielectric layer, an absorbing layer, a dielectric layer and an absorbing layer which are sequentially formed on the sub-wavelength surface microstructure.
  • the multi-layer structure of the three-layer structure is a reflective layer, a dielectric layer and an absorbing layer, or an absorbing layer, a dielectric layer and an absorbing layer.
  • the former can only observe the light-changing effect on one side, and the latter can be in two. Observe the light change effect.
  • the five-layer structure of the multi-layer structure coating is an absorbing layer, a dielectric layer, a reflective layer, a dielectric layer and an absorbing layer, or an absorbing layer, a dielectric layer, an absorbing layer, a dielectric layer and an absorbing layer, and a five-layer structure of the multi-layer structure plating layer may Observing the light-changing effect on both sides, the light-changing effects observed on both sides can be designed to be the same or different, which is determined by the parameters and materials of the respective reflective layer, dielectric layer, and absorption layer.
  • the reflective layer is generally a metal layer having a relatively large thickness, and the thickness thereof is usually greater than 20 nm, and the material used may be one or more of gold, silver, copper, aluminum, iron, tin, zinc, nickel, chromium, and the like.
  • Each of the dielectric layers may be a single dielectric layer, and the dielectric material may be selected from inorganic coating materials such as MgF 2 , SiO 2 , Al 2 O 3 , MgO, PMMA, HfO 2 , TiO 2 , ZnS, ZnO, and the like.
  • the thickness of the high molecular polymer is determined by the optical effect to be achieved and the refractive index of the material, and may generally be from 10 nm to 1000 nm, preferably from 50 nm to 800 nm.
  • each dielectric layer may also be a multi-layer dielectric layer, and the dielectric material used may be selected from common inorganic materials such as MgF 2 , SiO 2 , Al 2 O 3 , MgO, PMMA, HfO 2 , TiO 2 , ZnS, ZnO, and the like.
  • Coating materials, and multilayer dielectric films are usually designed with high and low refractive index ⁇ /4 film systems.
  • the material used for each absorption layer may be one or more of metals such as gold, silver, copper, aluminum, iron, tin, zinc, nickel, chromium, or a metal compound, and the thickness is usually not more than 20 nm, preferably 5-10 nm. Its function is to partially, partially transmit and partially absorb the illumination light.
  • the structure of the multilayer structure plating layer 103 according to the present invention is not limited to the structures described above, for example, a two-layer structure (ie, a reflective layer and a dielectric layer), a four-layer structure (ie, an absorption layer, a dielectric layer, Structures such as reflective layers and dielectric layers are also preferred.
  • the multilayer structure plating layer 103 can form a Fabry-Perot cavity, which selectively absorbs and reflects the incident white light, so that the emitted light only contains certain wavelength bands, thereby forming a specific color; when the light is incident or outgoing When the angle changes, the relative optical path changes, and the interference band also changes, so that the color presented to the observer also changes, thereby forming a light-changing effect of a specific color.
  • the parameter matching relationship, the specific principle and the optical characteristics are specifically defined by the Chinese patent CN102514443, and the contents of the specification are incorporated in the present invention.
  • the sub-wavelength surface microstructure 1021 is combined with the multi-layer structure plating 103 to form a color of the discoloration feature that occurs as the viewing angle changes, and which is distinguished from the color provided by the multi-layer coating of a flat or smooth surface.
  • optical features provided by the combination of the optically reflective facet 1022 and the multilayer structure plating 103 are illustrated below in conjunction with FIG.
  • the feature size or period (the facet may be periodic or non-periodic) of the optically reflective facet 1022 in at least one dimension on its two-dimensional plane is between 1 ⁇ m and 300 ⁇ m, preferably between 3 ⁇ m and 100 ⁇ m. It is particularly preferably between 5 ⁇ m and 30 ⁇ m.
  • the depth of the optically reflective facets is less than 10 ⁇ m, preferably between 1 ⁇ m and 5 ⁇ m. Thus, it does not have a diffractive effect on the visible wavelength range.
  • the orientation of the optically reflective facets can be determined by their angle of inclination and/or their azimuth.
  • optical characteristics of the optically reflective facet 1022 combined with the multi-layered structure plating layer 103 are defined by the Chinese patents CN102712207, CN102905909, CN103282212 and CN103229078, the contents of which are incorporated herein by reference.
  • the multilayer structure coating 103 on a flat surface include its color, as well as features of both color variations as a function of viewing angle.
  • the combination of the optically reflective facet 1022 and the multilayer structure coating 103 does not substantially alter the color characteristics provided by the multilayer structure coating 103, i.e., the multilayer structure coating has the same selectivity as the multilayer structure coating formed on the flat surface.
  • Absorption and reflection characteristics, and for a particular light source, only the direction of the outgoing light is changed for each optically reflective facet, thus substantially changing the viewing angle of the color change characteristic of the multilayer structure plating layer 103 on the area B The distribution on the dimension surface.
  • the above results determine the relationship between the region A and the region B using the same multilayer structure plating 103. There are different color features and color change characteristics.
  • the sub-wavelength surface microstructure 1021 and the optical reflection facet 1022 can be made into a master by a holographic interferometry, a laser direct writing technique, an electron beam etching technique, etc., and can be made into a working plate by an electroforming process, and then subjected to molding, UV replication, and the like.
  • the production process is transferred to the surface of the substrate 101.
  • the size parameters of the sub-wavelength surface microstructure and the optically reflective facet are greatly different in magnitude, there are different requirements for the photoresist material of the mother board or the process of making the mother board, so the two are actually combined in the same
  • the mother board or working version is quite complicated and difficult to be completed by a single process.
  • a two-step method can be used: firstly, a sub-wavelength surface microstructure is fabricated by using holographic interferometry, and then a laser is straight through the engraving process. Write and make optical reflective facets.
  • the multi-layer structure plating layer 103 can be generally realized by a vacuum coating process such as thermal evaporation, electron beam evaporation, high-frequency sputtering, magnetron sputtering, ion sputtering, reactive sputtering, ion plating, or electroless plating, electroplating, or coating. Processes such as cloth implement some of these layers.
  • the multi-layer structure coating covered by the surface of the sub-wavelength surface microstructure 1021 and the optical reflection facet 1022 is simultaneously completed in the same process, so the surfaces of 1021 and 1022 are The coating parameters of the multilayer structure are basically the same.
  • the film structure design of the multi-layer structure plating layer 103, the sub-wavelength surface microstructure 1021 and the optical reflection facet 1022 should be considered in the structural design calculation, so that the optical characteristics of the area A and the area B have strong color contrast.
  • the purpose of the security element is easy to identify and difficult to forge.
  • the optically reflective facet 1022 has optical scattering features provided by a substantially random variation distributed in a two-dimensional plane in which it is located, and the region is oriented according to the orientation of the selected optically reflective facet 1022 B can be perceived by the viewer as a feature of the surface that protrudes forward and/or backward relative to its actual spatial shape.
  • the structure of the optically reflective facet 1022 of different parameters shown in region B of Figure 2(a) has a random or pseudo-random arrangement in its two-dimensional plane, and the structural parameters include the depth, width, and tilt of the optically reflective facet.
  • the B region in Fig. 2(B) shows the use of the optically reflective facet 1022 to simulate the curved surface 1022' to form features that protrude from the surface 102, in which case any optically reflective facet on the two dimensional plane has a 1022 simulated with that position. 'The surfaces have roughly the same normal direction.
  • the optical security element 1 according to the present invention further increases the area C and its anti-counterfeiting feature in FIG. 1, wherein the sub-wavelength surface microstructure 1021 and the optical reflective facet 1022 are overlapped with each other to form a substrate 101.
  • the anti-counterfeiting feature includes the two anti-counterfeiting features mentioned above, that is, the sub-wavelength surface microstructure 1021 is combined with the multi-layer structure plating layer 103 to obtain the anti-counterfeiting feature and the optical reflective facet 1022 is combined with the multi-layer structure plating layer 103 to obtain the anti-counterfeiting feature.
  • the anti-counterfeiting feature of the region C has both the color and discoloration characteristics of the sub-wavelength surface microstructure 1021 and the multi-layer structure plating layer 10 which are different from the multi-layer structure plating layer, and the two-dimensional surface of the optical reflection facet 1022 in the region C.
  • the sub-wavelength surface microstructure 1021 is selected to be a sinusoidal groove type, a period of 300 nm, a depth of 95 nm, and an orthogonal two-dimensional grid distribution, and the multilayer structure plating layer 103 is sequentially selected to include Al (40 nm)/SiO2. (370 nm) / Cr (5 nm) (On a flat surface, the multilayer structure coating of this parameter has a feature of a golden color on the front side and a green color on the oblique side).
  • the area A has a red color on the front side and a yellow color on the left side;
  • the area B has a golden-green color feature provided by the multi-layer plating layer and a scattering characteristic provided by the optically reflective facet and/or protrudes from The features of the surface;
  • the region C has a red-yellow color feature formed by the sub-wavelength surface microstructure and the multi-layer structure plating and a scattering feature provided by the optically reflective facet and/or features protruding from the surface. All in all, the three regions A, B, and C have their own visual characteristics, forming a strong visual contrast with each other, thereby ensuring that the optical security component 1 has strong anti-counterfeiting capability.
  • the coverage of the multilayer structure plating layer in the optical security element of the present invention is patterned So, forming a hollow feature.
  • the patterning can be performed by patterning the entire multilayer structure plating layer, or alternatively, one or several layers can be separately patterned.
  • a patterned protective layer is applied by printing after forming a multi-layered plating, and then the plating outside the protected area is etched by a chemical solvent such as an alkali solution.
  • the release layer is printed before the formation of the multilayer structure plating layer, and after the formation of the multilayer structure plating layer, the plating layer above the release layer is peeled off by a certain liquid immersion (for example, water) to form a hollow pattern.
  • the hollow pattern 1031 of the multilayer structure plating layer 103 (the area not covered by the multilayer structure plating layer) and the sub-wavelength surface microstructure 1021 and There is a strict positional correspondence between the optically reflective facets 1022, so that the optical security element of the present invention has stronger identifiability and anti-counterfeiting capability.
  • A, B, and C respectively correspond to the three regions A, B, and C in Fig. 3, that is, "CBPM" and "ZSST" are formed by subwavelength surface microstructures having a multi-layer structure coating formed on the surface.
  • the color characteristics of B and area C and the characteristics of discoloration with observation angle is the optical scattering characteristic of the optically reflective facet formed with the multi-layer structure coating on the surface and the discoloration characteristic with the observation angle, and the area C is the surface formation.
  • the optically reflective facets of the layered coating produce features that visually protrude forward relative to their actual spatial shape and at the same time have a characteristic that discolors with viewing angle.
  • a method of forming the hollow region 1031 is exemplarily given below: a sinusoidal grating is formed in the region of 1031, and has an arrangement period of 350 nm and a depth of 300 nm (the surface microstructure of the region other than 1031 is set to have an aspect ratio). Then, a 5 nm thick Al layer and a 250 nm thick SiO 2 layer are sequentially deposited on the upper surface 102 side, and then the optical security element 1 is immersed in a 10% concentration NaOH solution until the Al layer in the 1031 region completely disappears. At this time, the area other than 1031 is still covered with the Al layer and the SiO 2 layer.
  • a cylindrical mirror is formed in the region 1031, the width is 30 ⁇ m, the gap between the cylindrical mirrors is 2 ⁇ m wide, and the height of the cylindrical mirror is 10 ⁇ m (this value is set) a height of 1.5 ⁇ m larger than the optically reflective facet, and an Al layer of 40 nm thick (thickness of the flat region), a 250 nm thick SiO 2 layer, and a 5 nm thick Cr layer are sequentially deposited on the 102 side, and formed by a coating process.
  • the protective layer (polyester material) had a thickness (relative to the flat surface) of 1 ⁇ m.
  • the optical security element was immersed in a 10% NaOH solution at 40 ° C until the Al/SiO 2 /Cr coating in the 1031 region completely disappeared, and the area other than 1031 was still covered with Al/SiO 2 /Cr plating, ie The preparation of the optical security element is completed. At this time, the observation direction is such that the optical security element is viewed from the upper surface 102 side, and Al/SiO 2 /Cr which is sequentially stacked on a region other than 1031 provides a multilayer structure plating layer, and a hollow pattern is formed in the 1031 region.
  • diffractive light-changing features and micro-nanostructure features may also be formed in and on the substrate 101 and its upper and lower surfaces and/or sub-wavelength surface microstructures and optically reflective facets. , printed features, fluorescent features, and one or more of the magnetic, optical, electrical, and radioactive features for machine readable.
  • the optical security element according to the present invention can be used as a label, a logo, a wide strip, a transparent window, a film, etc., and can be adhered to various articles by various bonding mechanisms. For example, transfer to high security products such as banknotes and credit cards and high value-added products.
  • Another aspect of the present invention provides a product with the optical security element, including but not limited to various types of high security products and high value-added products such as banknotes, credit cards, passports, and securities, and various types of wrapping paper. , packing boxes, etc.

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Abstract

一种光学防伪元件及光学防伪产品。该光学防伪元件（1）包括：基材（101）；形成于所述基材上表面（102）的亚波长表面微结构（1021）和光学反射小面（1022）；以及形成于所述亚波长表面微结构（1021）和光学反射小面（1022）上的多层结构镀层（103）。在采用相同的多层结构镀层（103）的情况下，亚波长表面微结构（1021）与多层结构镀层（103）所在的区域与光学反射小面（1022）与多层结构镀层（103）所在的区域形成了具有反差的光学特征，从而使该光学防伪元件或带有该防伪元件的光学防伪产品容易被识别且具有较强的防伪能力。

Description

光学防伪元件及光学防伪产品 技术领域
本发明涉及光学防伪领域，具体地，涉及一种光学防伪元件以及光学防伪产品。
背景技术
为了防止伪造钞票、证件和产品包装等各类高安全或高附加值印刷品，广泛采用了多层结构镀层技术。多层结构镀层技术能够呈现各种颜色特征或在不同的观察角度下能够呈现不同的颜色，并且无法利用照相机、扫描仪、打印机等电子设备模仿或复制，所以具有较高的防伪能力。但是，单纯采用多层镀层技术已经不能很好地满足防伪领域的需求。
现有技术中，通过在光变结构中增加一层磁性层就形成了光变磁性油墨(OVMI)，通过磁场诱导使得OVMI颗粒能够沿磁感线方向定向排布，从而形成特定的图文结构。但是由于光变磁性颗粒的定向排布需要依靠磁场，故受到磁场形状的制约，不能对形状进行任意设计，且需要特定的定向设备与工艺。另外采用干涉型多层镀层与全息、颜色配对等技术相结合的技术集成方式工艺较复杂，且效果不够理想，对干涉型多层镀层防伪能力的提升仍然有限。
发明内容
本发明的目的是提供一种光学防伪元件以及光学防伪产品，以提高产品的防伪性能。
本发明提供了一种光学防伪元件，该光学防伪元件包括：基材；
形成于所述基材上表面的亚波长表面微结构和光学反射小面；以及形成 于所述亚波长表面微结构和光学反射小面上的多层结构镀层。
优选地，所述亚波长表面微结构和所述光学反射小面部分重叠。
优选地，所述多层结构镀层形成法布里-泊罗谐振腔。
优选地，所述多层结构镀层形成镂空图案。
优选地，所述镂空图案与所述亚波长表面微结构和/或所述光学反射小面具有对位关系。
优选地，所述亚波长表面微结构为一维光栅或二维光栅；所述亚波长表面微结构的槽型为正弦形、矩形、锯齿形、或者正弦形、矩形和锯齿形中至少两者的拼接或组合。
优选地，所述亚波长表面微结构的槽深为10nm-500nm。
优选地，所述亚波长表面微结构的槽深为50nm-300nm。
优选地，所述亚波长表面微结构在所述亚波长表面微结构所在的二维平面内的特征尺寸为50nm-500nm。
优选地，所述亚波长表面微结构在所述亚波长表面微结构所在的二维平面内的特征尺寸为200nm-400nm。
优选地，所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在1μm-300μm之间。
优选地，所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在3μm-100μm之间。
优选地，所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在5μm-30μm之间。
优选地，在所述基材、所述亚波长表面微结构以及所述光学反射小面中的至少一者上形成衍射光变特征、微纳结构特征、印刷特征、荧光特征以及用于机读的磁、光、电、放射性特征中的至少一种。
优选地，多层结构镀层由吸收层、介质层、以及反射层组成。
本发明提供了一种光学防伪产品，该光学防伪产品包括所述的光学防伪元件。
本发明在采用相同的多层结构镀层的情况下，亚波长表面微结构与多层结构镀层所在的区域与光学反射小面与多层结构镀层所在的区域形成了具有反差的光学特征，从而使该光学防伪元件或带有该防伪元件的光学防伪产品容易被识别且具有较强的防伪能力。
本发明的其它特征和优点将在随后的具体实施方式部分予以详细说明。
附图说明
附图是用来提供对本发明的进一步理解，并且构成说明书的一部分，与下面的具体实施方式一起用于解释本发明，但并不构成对本发明的限制。在附图中：
图1为根据本发明一个实施方式的光学防伪元件的剖面图；
图2(a)和图2(b)为根据本发明另一实施方式的光学防伪元件的剖面图；
图3为根据本发明又一实施方式的光学防伪元件的剖面图；
图4为根据本发明又一实施方式的光学防伪元件的俯视图。
附图标记说明
101  基材          102    上表面
103  多层结构镀层  1021   亚波长表面微结构
1022 光学反射小面  1022’ 曲面
1    光学防伪元件
具体实施方式
以下结合附图对本发明的具体实施方式进行详细说明。应当理解的是， 此处所描述的具体实施方式仅用于说明和解释本发明，并不用于限制本发明。
本发明提供了光学防伪元件1，如图1所示，该光学防伪元件1包括：基材101、亚波长表面微结构1021、光学反射小面1022、以及多层结构镀层103；亚波长表面微结构1021形成于基材101上表面102，该亚波长表面微结构1021至少部分覆盖上表面102，光学反射小面1022形成于基材101上表面102，该光学反射小面1021至少部分覆盖上表面102；亚波长表面微结构1021所在区域为区域A，光学反射小面1022所在的区域为区域B；多层结构镀层103至少部分覆盖区域A和区域B。由于多层结构镀层103覆盖区域A和区域B，从而使得区域A和区域B的颜色不同；此外，在区域B中，根据光学小面的取向具有分布于其所在的二维平面内的大致随机的变化所提供的光学散射特征，和/或根据选择的光学小面的取向使得区域B能够被观察者感觉为相对于其实际空间形状向前和/或向后突出的表面。
亚波长表面微结构可以为一维光栅或二维光栅，亚波长表面微结构的槽型可以是正弦形、矩形、锯齿形等；二维光栅的栅格分布可以是正交结构、蜂窝结构、二维布拉维点阵结构、随机结构等。应当理解的是，亚波长表面微结构的结构并不局限于以上描述的结构，而且实际的光学防伪元件中可以采用这些亚波长表面微结构的拼接或组合。通过对亚波长表面微结构进行设计，会实现防伪所需的文字、标识等图案。
优选地，亚波长表面微结构的槽深为10nm-500nm，优选为50nm-300nm。另外，亚波长表面微结构在其所在的二维平面内的特征尺寸为50nm-500nm，优选为200nm-400nm。优选地，当一个方向上的特征尺寸满足要求时，另一个方向上的特征尺寸可以不受限制。
优选地，亚波长表面微结构的周期和槽深二者之间存在着一定的匹配关系，这种匹配关系可以用深宽比(即槽深与周期的比值)表示，其可以根据具 体的再现效果通过严格耦合波理论设计计算得到。优选地，深宽比的范围通常为0.3-2，优选为0.4-1。
优选地，亚波长表面微结构的占宽比(即光栅峰宽与周期的比值)也是影响光学效果的一个重要参数，其主要影响光学防伪元件的亮度及对比度，通常要求占宽比为0.3-0.7，优选为0.4-0.6。
下面对根据本发明的光学防伪元件1中所采用的多层结构镀层103的结构进行描述。
多层结构镀层103可以采用多层介质膜结构，即由具有高、低折射率的不同介质层构成。这种结构通常采用λ/4膜系设计。各个介质层所采用的材料可以为MgF2、SiO2、Al2O3、MgO、HfO2、TiO2、ZnS、ZnO等无机镀膜材料中的一种或多种。各个介质层也可以采用高分子聚合物，或者采用无机镀膜材料与高分子聚合物的组合。
多层结构镀层103的结构还可以是金属/介质多层膜结构，通常采用三层结构或五层结构。例如，多层结构镀层103的结构可以包括以下中的至少一者：
a、依次形成于亚波长表面微结构上的反射层、介质层和吸收层，以上三层顺序可颠倒；
b、依次形成于亚波长表面微结构上的吸收层、介质层和吸收层，以上三层顺序可颠倒；
c、依次形成于亚波长表面微结构上的吸收层、介质层、反射层、介质层和吸收层；
d、依次形成于亚波长表面微结构上的吸收层、介质层、吸收层、介质层和吸收层。
简言之，三层结构的多层结构镀层为反射层、介质层和吸收层，或者为吸收层、介质层和吸收层，前者只能在一面观察光变效果，后者则可以在两 面观察光变效果。五层结构的多层结构镀层为吸收层、介质层、反射层、介质层和吸收层，或者为吸收层、介质层、吸收层、介质层和吸收层，五层结构的多层结构镀层可以在两面观察光变效果，两面观察到的光变效果可以设计为相同，也可以设计为不同，这由各个反射层、介质层、吸收层的参数和材料决定。
上述的反射层一般为厚度较大的金属层，其厚度通常大于20nm，其所采用的材料可以为金、银、铜、铝、铁、锡、锌、镍、铬等中的一者或多者。上述的各个介质层可以是单层介质层，其所采用的介质材料可以选自MgF2、SiO2、Al2O3、MgO、PMMA、HfO2、TiO2、ZnS、ZnO等无机镀膜材料以及高分子聚合物，其厚度由要实现的光学效果及材料的折射率决定，一般厚度可以为10nm-1000nm，优选为50nm-800nm。当然，各个介质层也可以是多层介质层，其所采用的介质材料可以选自MgF2、SiO2、Al2O3、MgO、PMMA、HfO2、TiO2、ZnS、ZnO等常见的无机镀膜材料，并且多层介质膜通常采用高、低折射率λ/4膜系设计。各个吸收层所采用的材料可以为金、银、铜、铝、铁、锡、锌、镍、铬等金属或者金属化合物中的一者或多者，厚度通常不超过20nm，优选为5-10nm，其作用是使照明光部分反射、部分透射和部分吸收。
应当理解的是，根据本发明的多层结构镀层103的结构并不局限于上面描述的结构，例如，二层结构(即反射层和介质层)、四层结构(即吸收层、介质层、反射层和介质层)等结构也是可取的。
多层结构镀层103可以形成法布里-泊罗谐振腔，其对入射的白光具有选择性的吸收及反射作用，使得出射光线只包含某些波段，从而形成特定的颜色；当光入射或出射角度变化时，与之相对的光程发生变化，干涉波段也发生变化，从而导致呈现给观测者的颜色也随之变化，从而形成特定颜色的光变效果。
关于亚波长表面微结构与多层结构镀层结合获得的光学特征，其参数匹配关系、具体原理和光学特征由中国专利CN102514443具体定义，其说明书内容均纳入本发明。总之，亚波长表面微结构1021与多层结构镀层103结合，从而形成了随观察角度改变而出现的变色特征的颜色，且其区别于单纯由平坦或光滑的表面的多层结构镀层提供的颜色特征，进而形成独特的随观察角度的变色特征。
以下结合图1说明光学反射小面1022与多层结构镀层103的结合所提供的光学特征。
光学反射小面1022在其所在的二维平面上的至少一个维度上的特征尺寸或者周期(小面可以形成周期性的或者非周期性的)在1μm-300μm之间，优选在3μm-100μm之间，特别优选在5μm-30μm之间。光学反射小面的深度小于10μm，优选在1μm-5μm之间。从而使得其对可见光波长范围不起衍射作用。
光学反射小面的取向可由它们的倾斜角和/或它们的方位角确定。
光学反射小面1022与多层结构镀层103结合提供的光学特征，其具体参数设置、原理、光学特征由中国专利CN102712207、CN102905909、CN103282212和CN103229078所共同定义，其说明书内容均纳入本发明。
平坦表面上的多层结构镀层103的特征包括其颜色，以及随观察角度的变化而产生的颜色变化两方面的特征。光学反射小面1022与多层结构镀层103的结合实质上并未改变多层结构镀层103提供的颜色特征，即该多层结构镀层与在平坦表面形成的该多层结构镀层具有相同的选择性吸收和反射特性，而对于特定的光源，仅对应每个光学反射小面改变了其出射光的方向，因此实质上是改变了多层结构镀层103颜色变化特征的观察角度在区域B上的二维表面上的分布。
上述结果决定了区域A和区域B在采用相同的多层结构镀层103的情 况下具有不同的颜色特征和颜色变化特征。
亚波长表面微结构1021和光学反射小面1022可以通过全息干涉法、激光直写技术、电子束刻蚀技术等方法制作母版，通过电铸工艺制成工作版、再通过模压、UV复制等生产工艺转移到基材101的表面上。
由于亚波长表面微结构与光学反射小面的尺寸参数存在数量级上的巨大差异，其对母板的光刻胶材料或制作母板的工艺有不同的要求，因此实际上将二者结合在同一母板或工作版是具有相当的复杂度的，难以采用单一工艺完成，在实际操作中可例如采用两步法：先利用全息干涉法制作亚波长表面微结构，再通过套刻工艺采用激光直写制作光学反射小面。
多层结构镀层103通常可以通过热蒸发、电子束蒸发、高频溅射、磁控溅射、离子溅射、反应溅射、离子镀等真空镀膜工艺实现，也可以通过化学镀、电镀、涂布等工艺实现其中的某些层。
需要注意的是，通常来说，出于简化生产过程的考虑，亚波长表面微结构1021及光学反射小面1022表面覆盖的多层结构镀层是同一工艺过程中同时完成的，所以1021和1022表面多层结构镀层参数是基本一致的。那么，多层结构镀层103的膜系结构设计，亚波长表面微结构1021与光学反射小面1022的结构设计计算中需统筹考虑，从而使区域A和区域B的光学特征具有强烈的颜色反差，达到该防伪元件易识别难伪造的目的。
下面将结合图2(a)、图(b)分别说明光学防伪元件的光学特征。根据本发明的光学防伪元件1中，光学反射小面1022具有分布于其所在的二维平面内的大致随机的变化所提供的光学散射特征，并且根据选择的光学反射小面1022的取向使得区域B能够被观察者感觉为相对于其实际空间形状向前和/或向后突出的表面的特征。图2(a)中区域B所示的不同参数的光学反射小面1022的结构在其所在的二维平面内具有随机或伪随机的排列，结构参数包括光学反射小面的深度、宽度、倾斜角、方位角，从而使得入射光被光学反射 小面表面的多层结构镀层选择性吸收和反射后，反射光具有随机或伪随机的出射方向，从而形成光学散射特征。图2(B)中B区域示出了利用光学反射小面1022模拟曲面1022’从而形成突出于表面102的特征，此时二维平面上任意一光学反射小面具有与该位置被模拟的1022’曲面具有大致相同的法线方向。
图3为在图1中根据本发明的光学防伪元件1的基础上进一步增加区域C及其防伪特征的实施例，其中亚波长表面微结构1021和光学反射小面1022相互重叠形成于基材101的上表面102上的区域C。该防伪特征包括了上述提到的两种防伪特征，即亚波长表面微结构1021与多层结构镀层103结合得到防伪特征和光学反射小面1022与多层结构镀层103结合得到防伪特征。也就是说，区域C的防伪特征同时具有亚波长表面微结构1021与多层结构镀层103形成的区别于多层结构镀层的颜色及变色特征，以及光学反射小面1022在区域C的二维表面上的随机分布带来的光学散射特征和/或能够被观察者感觉为相对于区域C表面向前和/或向后突出的表面的特征。
例如，在图3中选取亚波长表面微结构1021为正弦槽型、周期为300nm、深度为95nm并呈正交的二维网格分布，选取多层结构镀层103依次包含Al(40nm)/SiO2(370nm)/Cr(5nm)(在平坦表面，该参数的多层结构镀层具有正面观察为金黄色，倾斜观察为绿色的特征)。那么，区域A由于1021的存在，其颜色为正面观察为红色，倾斜观察为黄色；区域B具有多层镀层提供的金黄变绿的颜色特征及光学反射小面提供的散射特征和/或突出于表面的特征；区域C具有由亚波长表面微结构与多层结构镀层共同形成的红变黄的颜色特征及光学反射小面提供的散射特征和/或突出于表面的特征。总而言之，A、B、C三个区域具有各自的视觉特征，彼此形成强烈的视觉反差，从而保证了光学防伪元件1具有较强的防伪能力。
优选地，本发明的光学防伪元件中多层结构镀层的覆盖范围是图案化 的，从而形成镂空特征。图案化可以通过对多层结构镀层整体进行图案化，也可选择对其中一层或几层分别进行图案化。例如，通过印刷方式在形成多层结构镀层后施加图案化的保护层，然后通过化学溶剂(例如碱液)对保护区域以外的镀层进行腐蚀。或者在形成多层结构镀层之前印刷剥离层，并在形成多层结构镀层后通过某种液体的浸泡(例如水)使剥离层以上的镀层脱落从而形成镂空图案。
优选地，如图4所示，本发明的光学防伪元件的一个实施例的俯视图中，多层结构镀层103的镂空图案1031(未覆盖多层结构镀层的区域)与亚波长表面微结构1021和/或光学反射小面1022之间具有严格的位置对应关系，从而使得本发明的光学防伪元件具有更强的易识别和防伪造能力。其中A、B、C分别对应图3中的A、B、C三个区域，即“CBPM”和“ZSST”为表面形成有多层结构镀层的亚波长表面微结构共同形成的具有区别于区域B及区域C的颜色特征及随观察角度变色的特征，区域B为表面形成有多层结构镀层的光学反射小面产生的光学散射特征及随观察角度的变色特征，区域C为表面形成有多层结构镀层的光学反射小面产生的视觉上相对于其实际空间形状向前突出的表面并同时具有随观察角度变色的特征。
下面示例性地给出形成镂空区域1031的一种方法：在1031所在区域形成有正弦形光栅，其排列周期为350nm，深300nm(设该结构深宽比大于1031以外区域的表面微结构)。然后在上表面102一侧依次沉积5nm厚的Al层及250nm厚的SiO2层，然后将光学防伪元件1置于10％浓度的NaOH溶液中浸泡，直至1031区域的Al层恰好完全消失为止，此时1031以外的区域上仍覆盖有Al层及SiO2层。然后在SiO2层上沉积40nm厚的Al层，并在新沉积的Al层的表面上沉积50nm厚的SiO2层，然后将光学防伪元件1置于5％的NaOH溶液中浸泡，直至1031区域上的Al层恰好完全消失为止。此时，规定观察方向为从101的下表面一侧观察光学防伪元件1，在1031 以外的区域提供了多层结构镀层。同时，1031上因无任何镀层而形成镂空图案。
下面示例性地给出形成镂空区域1031的另一种方法：在1031区域形成有柱面镜，其宽度为30μm、柱面镜之间的空隙宽2μm、柱面镜高度为10μm(设该值大于光学反射小面的高度1.5μm)，在102面一侧依次沉积40nm厚(平坦区域的厚度)的Al层、250nm厚的SiO2层及5nm厚的Cr层，以及通过涂布工艺形成的保护层(聚酯材料)，其厚度(相对于平坦表面而言)为1μm。将光学防伪元件置于40℃且10％浓度的NaOH溶液中浸泡，直至1031区域的Al/SiO2/Cr镀层恰好完全消失为止，1031以外区域上仍覆盖有Al/SiO2/Cr镀层，即完成光学防伪元件的制备。此时，规定观察方向为从上表面102一侧观察光学防伪元件，在1031以外的区域上依次堆叠的Al/SiO2/Cr提供了多层结构镀层，并在1031区域形成镂空图案。
在根据本发明的优选实施方式中，还可在所述基材101中及其上下表面和/或亚波长表面微结构及光学反射小面中及其上形成衍射光变特征、微纳结构特征、印刷特征、荧光特征以及用于机读的磁、光、电、放射性特征中的一种或多种特征。
根据本发明的光学防伪元件可用作标签、标识、宽条、透明窗口、覆膜等，可以通过各种粘结机理粘附在各种物品上。例如转移到钞票、***等高安全产品和高附加值产品上。
本发明另一方面提供了带有所述光学防伪元件的产品，所述产品包括但不限于钞票、***、护照、有价证券等各类高安全产品及高附加值产品，以及各类包装纸、包装盒等。
以上结合附图详细描述了本发明的优选实施方式，但是，本发明并不限于上述实施方式中的具体细节，在本发明的技术构思范围内，可以对本发明的技术方案进行多种简单变型，这些简单变型均属于本发明的保护范围。
另外需要说明的是，在上述具体实施方式中所描述的各个具体技术特征，在不矛盾的情况下，可以通过任何合适的方式进行组合。为了避免不必要的重复，本发明对各种可能的组合方式不再另行说明。
此外，本发明的各种不同的实施方式之间也可以进行任意组合，只要其不违背本发明的思想，其同样应当视为本发明所公开的内容。

Claims (16)

  1. 一种光学防伪元件，其特征在于，该光学防伪元件包括：
    基材；
    形成于所述基材上表面的亚波长表面微结构和光学反射小面；以及
    形成于所述亚波长表面微结构和光学反射小面上的多层结构镀层。
  2. 根据权利要求1所述的光学防伪元件，其特征在于，所述亚波长表面微结构和所述光学反射小面部分重叠。
  3. 根据权利要求1所述的光学防伪元件，其特征在于，所述多层结构镀层形成法布里-泊罗谐振腔。
  4. 根据权利要求1所述的光学防伪元件，其特征在于，所述多层结构镀层形成镂空图案。
  5. 根据权利要求4所述的光学防伪元件，其特征在于，所述镂空图案与所述亚波长表面微结构和/或所述光学反射小面具有对位关系。
  6. 根据权利要求1所述的光学防伪元件，其特征在于，所述亚波长表面微结构为一维光栅或二维光栅；所述亚波长表面微结构的槽型为正弦形、矩形、锯齿形、或者正弦形、矩形和锯齿形中至少两者的拼接或组合。
  7. 根据权利要求6所述的光学防伪元件，其特征在于，所述亚波长表面微结构的槽深为10nm-500nm。
  8. 根据权利要求7所述的光学防伪元件，其特征在于，所述亚波长表面微结构的槽深为50nm-300nm。
  9. 根据权利要求1所述的光学防伪元件，其特征在于，所述亚波长表面微结构在所述亚波长表面微结构所在的二维平面内的特征尺寸为50nm-500nm。
  10. 根据权利要求9所述的光学防伪元件，其特征在于，所述亚波长表面微结构在所述亚波长表面微结构所在的二维平面内的特征尺寸为200nm-400nm。
  11. 根据权利要求1所述的光学防伪元件，其特征在于，所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在1μm-300μm之间。
  12. 根据权利要求11所述的光学防伪元件，其特征在于，所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在3μm-100μm之间。
  13. 根据权利要求12所述的光学防伪元件，其特征在于，所述光学反射小面在所述光学反射小面所在的二维平面上的至少一个维度上的特征尺寸在5μm-30μm之间。
  14. 根据权利要求1所述的光学防伪元件，其特征在于，在所述基材、所述亚波长表面微结构以及所述光学反射小面中的至少一者上形成衍射光变特征、微纳结构特征、印刷特征、荧光特征以及用于机读的磁、光、电、 放射性特征中的至少一种。
  15. 根据权利要求1-14任意一项所述的光学防伪元件，其特征在于，多层结构镀层由吸收层、介质层、以及反射层中的至少两者组成，或者多层结构镀层由介质层组成。
  16. 一种光学防伪产品，其特征在于，该光学防伪产品包括根据权利要求1-15中任一项所述的光学防伪元件。
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