WO2016038821A1 - Électrode, son procédé de fabrication, panneau tactile et substrat électroluminescent (el) organique dont chacun est pourvu de ladite électrode - Google Patents

Électrode, son procédé de fabrication, panneau tactile et substrat électroluminescent (el) organique dont chacun est pourvu de ladite électrode Download PDF

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WO2016038821A1
WO2016038821A1 PCT/JP2015/004273 JP2015004273W WO2016038821A1 WO 2016038821 A1 WO2016038821 A1 WO 2016038821A1 JP 2015004273 W JP2015004273 W JP 2015004273W WO 2016038821 A1 WO2016038821 A1 WO 2016038821A1
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substrate
electrode
metal nanowire
dispersion
base material
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PCT/JP2015/004273
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English (en)
Japanese (ja)
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井上　純一
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デクセリアルズ株式会社
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/12—Applying particulate materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • H05B33/28—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode of translucent electrodes

Definitions

  • the present invention relates to an electrode, a manufacturing method thereof, a touch panel including the electrode, and an organic EL substrate, and in particular, an electrode on which a metal nanowire layer including a metal nanowire is formed as a conductive film, a manufacturing method thereof, and the electrode.
  • the present invention relates to a touch panel and an organic EL substrate.
  • Metal oxides such as indium tin oxide (ITO) have been used for transparent conductive films that require light transmission, such as transparent conductive films formed on plastic substrates.
  • the transparent conductive film using the metal nanowire is, for example, a dispersion containing the metal nanowire is formed by using a coating method such as flat plate slit die coating, wire bar coating, applicator coating, capillary coating, and spin coating. It is formed on the base material by being applied onto the substrate and drying the applied dispersion.
  • a transparent conductive film using metal nanowires can not only reduce resistance, but can also be formed by coating by dispersing in a solvent, so it can be constructed with simple equipment unlike ITO. It is advantageous in some respects.
  • the transparent conductive film obtained by coating using the above coating method has no problem as long as the thickness of the base material is uniform, but when the thickness of the base material is not uniform, that is, the in-plane thickness of the base material.
  • the distribution ⁇ T (Tmax ⁇ Tmin) is large, the in-plane distribution ⁇ of the resistance value in a sufficiently narrow range cannot be obtained (for example, when the in-plane thickness distribution ⁇ T of the substrate is 30 ⁇ m, the resistance value in-plane The distribution ⁇ is 20 ⁇ / sq).
  • Patent Document 3 does not suppress the flow after the droplets reach (land) the substrate, and does not relate to nanowires.
  • the present invention makes it a subject to solve the said various problems in the past and to achieve the following objectives. That is, the present invention can easily form a low-resistance metal nanowire layer (conductive film) and has a non-uniform thickness (low smoothness) (for example, 50 in FIG. 3). It is another object of the present invention to provide an electrode capable of forming a metal nanowire layer (for example, 30 in FIG. 3) having a uniform thickness, a manufacturing method thereof, a touch panel including the electrode, and an organic EL substrate.
  • the present inventors have sprayed a dispersion when spraying a dispersion containing metal nanowires on a substrate having a non-uniform thickness by a spray method.
  • a spray method By adjusting the average droplet diameter of the liquid and the boiling point of the solvent, a low-resistance metal nanowire layer (conductive film) can be easily formed, and the thickness is non-uniform (low smoothness).
  • the present inventors have found that a metal nanowire layer having a uniform thickness can be formed even on a substrate, and have completed the present invention.
  • the present invention is based on the above findings by the present inventors, and means for solving the above problems are as follows. That is, ⁇ 1> A spray process of spraying a dispersion liquid in which metal nanowires are dispersed in a solvent toward a base material by spraying, and drying a dispersion film formed of the dispersion liquid formed on the base material. And a metal nanowire layer forming step of forming a metal nanowire layer on the electrode, wherein the dispersion liquid sprayed in the spraying step has an average droplet diameter of 5 ⁇ m to 50 ⁇ m, and the solvent The electrode has a boiling point of 138 ° C. or lower.
  • the droplets are sprayed to reach the substrate (landing) ),
  • the solvent in the droplets volatilizes, and after the droplets reach (land) the substrate, it becomes difficult to flow, and a film having a uniform thickness is formed.
  • a low-resistance metal nanowire layer conductive film
  • the thickness is non-uniform (low smoothness).
  • a metal nanowire layer having a uniform thickness can be formed on the substrate.
  • spraying means that the discharge port of the spray nozzle is directed toward the substrate, and the dispersion (droplet) is directed from the spray toward the substrate.
  • the discharge port of the spray nozzle is directed in the opposite direction to the substrate, and the dispersion liquid (droplet) is discharged from the spray in the opposite direction to the substrate. This includes the case where the dispersion liquid (droplet) is sprayed toward the substrate due to the influence of external force (gravity, wind, etc.).
  • the “electrode” means “a structure including a base material and a metal nanowire layer formed on the base material”.
  • average droplet diameter is the cumulative value calculated from the small diameter side in the particle size distribution measured using a laser diffraction spray particle size distribution measuring device. It refers to the “particle diameter at which the volume is 50%”.
  • ⁇ 3> The method for producing an electrode according to ⁇ 1> or ⁇ 2>, wherein the metal nanowire content in the dispersion is less than 1% by mass.
  • ⁇ 4> The electrode manufacturing method according to any one of ⁇ 1> to ⁇ 3>, wherein a standard deviation of a resistance value of the metal nanowire layer is 20 or less.
  • the substrate is a method for producing an electrode according to any one of ⁇ 1> to ⁇ 4>, wherein a difference between a maximum value and a minimum value of the thickness is 38 ⁇ m or more. is there.
  • ⁇ 6> The method for producing an electrode according to any one of ⁇ 1> to ⁇ 5>, wherein the spray is a two-fluid spray.
  • ⁇ 7> The method for producing an electrode according to any one of ⁇ 1> to ⁇ 6>, wherein the metal nanowire is a silver nanowire.
  • ⁇ 8> The method for producing an electrode according to any one of ⁇ 1> to ⁇ 7>, further including a patterning step of patterning the metal nanowire layer formed on the substrate.
  • a touch panel comprising the electrode according to ⁇ 9>.
  • ⁇ 11> An organic EL substrate comprising the electrode according to ⁇ 9>.
  • the conventional problems can be solved, the object can be achieved, a low-resistance metal nanowire layer (conductive film) can be easily formed, and the thickness is not uniform. It is possible to provide an electrode capable of forming a metal nanowire layer having a uniform thickness even on a non-smooth substrate (low smoothness), a manufacturing method thereof, a touch panel including the electrode, and an organic EL substrate.
  • FIG. 1 is a schematic diagram of a touch panel according to an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of an organic EL substrate according to an embodiment of the present invention.
  • FIG. 3 is a schematic view of an electrode according to an embodiment of the present invention.
  • FIG. 4 is a schematic view showing a process of a conventional electrode manufacturing method.
  • the method for producing a transparent conductive film of the present invention includes at least a spraying step and a metal nanowire layer forming step, and further includes other steps such as a patterning step, which are appropriately selected as necessary.
  • the said spraying process is a process of spraying the dispersion liquid which metal nanowire disperse
  • the transparent base material which consists of material which has transparency with respect to visible light, such as an inorganic material and a plastic material, is preferable.
  • the transparent substrate has a film thickness required for a transparent electrode having a transparent conductive film.
  • the film is formed into a film (sheet) thinned to such an extent that flexible flexibility can be realized, or an appropriate amount. It can be made into the flat form which has a film thickness of the grade which can implement
  • limiting in particular as said inorganic material According to the objective, it can select suitably, For example, quartz, sapphire, glass, etc. are mentioned.
  • a triacetyl cellulose TAC
  • polyester TPE
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PA polyimide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PE polyacrylate
  • PE polyether sulfone
  • PP polypropylene
  • PP diacetyl cellulose
  • PVC polyvinyl chloride
  • acrylic resin PMMA
  • PC polycarbonate
  • Known polymer materials such as resin, urea resin, urethane resin, melamine resin, and cycloolefin polymer (COP) can be used.
  • the film thickness of the transparent substrate is preferably 5 ⁇ m to 500 ⁇ m from the viewpoint of productivity, but is not particularly limited to this range.
  • the difference between the maximum value and the minimum value of the thickness of the base material is less than 38 ⁇ m, for example, a metal nanowire layer having a uniform thickness is formed even when coating with a flat plate slit die or a wire bar is performed. There are things you can do. However, when the difference between the maximum value and the minimum value of the thickness of the base material is 38 ⁇ m or more, the coating thickness of the metal nanowire layer varies greatly without using the electrode manufacturing method of the present invention. The resistance value of the nanowire layer also varies. In addition, the thickness of a base material can be measured in MD direction (flow direction) and TD direction (perpendicular to a flow) using a micro gauge.
  • the dispersion includes at least metal nanowires and a solvent, and further includes carbon nanotubes, a transparent resin material (binder), a dispersant, and other components as necessary.
  • the dispersion method of the dispersion is not particularly limited and may be appropriately selected depending on the purpose. For example, stirring, ultrasonic dispersion, bead dispersion, kneading, homogenizer treatment, pressure dispersion treatment, and the like are preferable. It is mentioned in.
  • the viscosity of the dispersion is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 1 mPa ⁇ s to 50 mPa ⁇ s, and more preferably 10 mPa ⁇ s to 40 mPa ⁇ s.
  • the viscosity of the dispersion is less than 1 mPa ⁇ s or more than 50 mPa ⁇ s, it may cause a poor formation of the dispersion film in the dispersion film forming step, and the surface resistance distribution may be non-uniform.
  • the viscosity of the dispersion is within the more preferable range, it is advantageous in that formation failure of the dispersion film can be prevented and the distribution of surface resistance can be made uniform.
  • the metal nanowire is composed of a metal and is a fine wire having a diameter on the order of nm, and has an aspect ratio of 1: 100 or more.
  • the aspect ratio is not particularly limited as long as it is 1: 100 or more, and can be appropriately selected according to the purpose. However, it is preferably 1: 500 or more from the viewpoint of forming a conductive film network.
  • metal nanowires are used in the electrode manufacturing method of the present invention.
  • the constituent element of the metal nanowire is not particularly limited as long as it is a metal element, and can be appropriately selected according to the purpose.
  • a metal element for example, Ag, Au, Ni, Cu, Pd, Pt, Rh, Ir, Examples include Ru, Os, Fe, Co, Sn, Al, Tl, Zn, Nb, Ti, In, W, Mo, Cr, Fe, V, Ta, and the like. These may be used individually by 1 type and may use 2 or more types together. Among these, Ag and Cu are preferable in terms of low resistance and high conductivity.
  • the average minor axis diameter of the metal nanowire is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably more than 1 nm and not more than 500 nm, and more preferably 10 nm to 100 nm.
  • the average minor axis diameter of the metal nanowire is 1 nm or less, the conductivity of the metal nanowire deteriorates, and the transparent conductive film containing the metal nanowire may not function as a conductive film. If it exceeds, the total light transmittance and haze of the transparent conductive film containing the metal nanowires may deteriorate.
  • the average minor axis diameter of the metal nanowire is within the more preferable range, it is advantageous in that the transparent conductive film including the metal nanowire has high conductivity and high transparency.
  • the average major axis length of the metal nanowire is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 1 ⁇ m to 1000 ⁇ m, and more preferably 1 ⁇ m to 100 ⁇ m.
  • the metal nanowires are not easily connected to each other, and the transparent conductive film containing the metal nanowires may not function as a conductive film.
  • the total light transmittance and haze of the transparent conductive film containing the metal nanowire may be deteriorated, or the dispersibility of the metal nanowire in the dispersion used when forming the transparent conductive film may be deteriorated.
  • the metal nanowire may have a wire shape in which metal nanoparticles are connected in a bead shape.
  • the length of the metal nanowire is not limited.
  • the weight per unit area of the metal nanowires is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.001g / m 2 ⁇ 1.000g / m 2, 0.003g / m 2 ⁇ 0.3 g / m 2 is more preferable.
  • the basis weight of the metal nanowire is less than 0.001 g / m 2 , the metal nanowire is not sufficiently present in the metal nanowire layer, and the conductivity of the transparent conductive film may be deteriorated. If it exceeds .000 g / m 2 , the total light transmittance and haze of the transparent conductive film may deteriorate.
  • the basis weight of the metal nanowire is within the more preferable range, it is advantageous in that the conductivity of the transparent conductive film is high and the transparency is high.
  • the content of the metal nanowires in the dispersion is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably less than 1% by mass, preferably 0.05% by mass to 0.5% by mass. Is more preferable.
  • the average droplet diameter average particle diameter of the droplets
  • the spray head may be clogged.
  • the average droplet diameter the average particle diameter of the droplets
  • the metal nanowire network means a network structure formed by connecting a plurality of metal nanowires to each other in a network.
  • the said metal nanowire network is formed by passing through the pressurization process mentioned later.
  • the solvent is not particularly limited as long as it is a highly volatile solvent having a boiling point of 138 ° C. or lower, and can be appropriately selected according to the purpose.
  • water (boiling point 100 ° C.); methanol (boiling point 65 ° C.) Ethanol (boiling point 78 ° C.), n-propyl alcohol (boiling point 97 ° C.), i-propyl alcohol (boiling point 82 ° C.), n-butyl alcohol (boiling point 117 ° C.), i-butyl alcohol (boiling point 108 ° C.), sec- Examples thereof include alcohols such as butyl alcohol (boiling point 100 ° C.) and tert-butyl alcohol (boiling point 83 ° C.); aromatic compounds such as p-xylene.
  • a mixed solvent of water and ethanol is preferable in terms of dispersibility of the metal nanowires.
  • a dispersion film having a uniform thickness can be formed by using a highly volatile solvent. Since the boiling point is generally used as a high volatility index, the use of a low boiling point solvent of 138 ° C. or lower is effective for this application.
  • combined by the conventional synthesis method may be sufficient, and a commercially available thing may be used.
  • combining method of the said carbon nanotube According to the objective, it can select suitably, For example, an arc discharge method, a laser evaporation method, a thermal CVD method etc. are mentioned.
  • limiting in particular as said carbon nanotube According to the objective, it can select suitably, A single-walled carbon nanotube (SWNT) may be sufficient, and a multi-walled carbon nanotube (MWNT) may be sufficient. However, the single-walled carbon nanotube is preferable.
  • the carbon nanotube may be a mixture of metallic and semiconducting carbon nanotubes, or may be a selectively separated semiconducting carbon nanotube.
  • Carbon nanotube network-- The carbon nanotube network means a network structure formed by connecting a plurality of carbon nanotubes in a network.
  • the carbon nanotube network is formed through a pressure treatment described later.
  • the transparent resin material (binder) disperses the metal nanowires and the carbon nanotubes optionally included.
  • transparent resin material (binder) disperses the metal nanowires and the carbon nanotubes optionally included.
  • transparent resin material (binder) there is no restriction
  • a known transparent natural polymer resin, synthetic polymer resin, etc. are mentioned,
  • Thermoplastic It may be a resin, or may be a heat (light) curable resin that is cured by heat, light, electron beam, or radiation. These may be used individually by 1 type and may use 2 or more types together.
  • the thermoplastic resin is not particularly limited and may be appropriately selected depending on the intended purpose.
  • thermosetting (photo) curable resin is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include silicon resins such as melamine acrylate, urethane acrylate, isocyanate, epoxy resin, polyimide resin, and acrylic-modified silicate. And a polymer in which a photosensitive group such as an azide group or a diazirine group is introduced into at least one of a main chain and a side chain.
  • the dispersant is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include polyvinyl pyrrolidone (PVP); amino group-containing compounds such as polyethyleneimine; sulfo groups (including sulfonates) and sulfonyl groups.
  • PVP polyvinyl pyrrolidone
  • amino group-containing compounds such as polyethyleneimine
  • sulfo groups including sulfonates
  • the dispersant when added to the dispersion, it is preferable to add the dispersant so as not to deteriorate the conductivity of the finally obtained conductive film.
  • the said dispersing agent can be made to adsorb
  • the other components are not particularly limited and may be appropriately selected depending on the purpose.
  • a leveling agent e.g., a surfactant, a viscosity modifier, a curing accelerator catalyst, plasticity, an antioxidant, an antioxidant, and the like.
  • Stabilizers e.g., sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium
  • the spray is not particularly limited as long as the dispersion can be sprayed onto the substrate, and can be appropriately selected according to the purpose.
  • a two-fluid nozzle for spraying may be used.
  • the two-fluid nozzle is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include a two-fluid nozzle disclosed in Japanese Patent Application Laid-Open No. 2010-199087.
  • the smoothness of the coating surface (base material) contributes to the surface accuracy of the coating film.
  • MEMS micromachines
  • the droplet diameter of the droplets discharged from the spray nozzle can be reduced, so that the droplets are quickly dried after reaching (landing) the coating surface (base material). It is possible. As a result, a metal nanowire layer excellent in resistance distribution can be formed regardless of the smoothness of the coating surface (base material).
  • the average droplet diameter (average particle diameter of the droplet) of the dispersion (droplet) sprayed by the spray is not particularly limited as long as it is 5 ⁇ m to 50 ⁇ m, and can be appropriately selected according to the purpose. Is preferably 5 ⁇ m to 40 ⁇ m, more preferably 5 ⁇ m to 30 ⁇ m.
  • the average droplet diameter (average particle size of the droplet) is less than 5 ⁇ m, the metal nanowires clog the nozzle, and when it exceeds 50 ⁇ m, the ratio of the surface area to the volume becomes small, and the solvent volatilization in the droplets occurs. Is not enough.
  • the average droplet diameter (average particle diameter of the droplets) can be adjusted by adjusting the size of the nozzle used for the spray and the position of the needle disposed on the nozzle used for the spray.
  • the average droplet diameter (average particle diameter of the droplet) can be measured based on a laser diffraction method using a spray particle size distribution measuring device “LDASA-3500A” manufactured by Nikkiso Co., Ltd.
  • the time from when the droplets are ejected from the spray until they reach the substrate There is no particular limitation on the time from when the droplets are ejected from the spray until the droplets reach the substrate, and can be appropriately selected according to the purpose, but is preferably 0.01 seconds to 3 seconds, 0 .01 seconds to 1 second is more preferable. If the time from when the droplets are ejected from the spray to reach the substrate is less than 0.01 seconds, the degree of volatilization of the solvent in the droplets may not be sufficient, and 0.5 seconds If it exceeds 1, the spray pressure is insufficient or the distance between the spray nozzle and the substrate is inappropriate, so that the necessary conductivity cannot be obtained.
  • the time from when the droplets are ejected from the spray to when the droplets reach the substrate is within the more preferable range.
  • the time from when the droplet is ejected from the spray until it reaches the substrate is the distance between the substrate and the spray, the ejection speed of the droplet, the surface of the substrate in the spray direction of the droplet It can be controlled by adjusting the angle with respect to.
  • the distance between the substrate and the spray is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 30 mm to 150 mm, more preferably 50 mm to 120 mm. If the distance between the substrate and the spray is less than 30 mm, the degree of volatilization of the solvent in the droplets may not be sufficient, and if it exceeds 150 mm, the required conductivity cannot be obtained due to poor deposition. There is. On the other hand, when the distance between the substrate and the spray is within the more preferable range, it is advantageous from the viewpoint of volatilization degree and droplet deposition stability.
  • the angle of the droplet spraying direction with respect to the surface of the base material is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 5 ° to 50 °, more preferably 10 ° to 40 °. If the angle of the droplet spraying direction relative to the surface of the substrate is less than 5 °, the coating may not be possible over a wide area, and if it exceeds 50 °, the required conductivity may not be obtained. On the other hand, if the angle of the droplet spraying direction relative to the surface of the substrate is within the more preferable range, it is advantageous from the viewpoint of droplet landing stability.
  • the said metal nanowire layer formation process is a process of drying the dispersion film which consists of a dispersion formed on the said base material, and forming a metal nanowire layer on the said base material.
  • the heating temperature in the drying is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 60 ° C to 140 ° C, more preferably 80 ° C to 120 ° C, and particularly preferably about 120 ° C.
  • the heating temperature in the drying is less than 60 ° C., the time required for drying becomes long and workability may be deteriorated.
  • the heating temperature exceeds 140 ° C. it is based on the balance with the glass transition temperature (Tg) of the substrate. The material may be distorted.
  • Tg glass transition temperature
  • the heating temperature is within the more preferable range or the particularly preferable temperature, it is advantageous in terms of forming a network of metal nanowires.
  • the heating time in the drying is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 1 minute to 30 minutes, more preferably 2 minutes to 10 minutes, and particularly preferably about 5 minutes. If the heating time in the drying is less than 1 minute, the solvent may not be sufficiently removed, and if it exceeds 30 minutes, workability and electrode productivity may be deteriorated. On the other hand, when the heating time is within the more preferable range or the particularly preferable time, it is advantageous in terms of network formation of metal nanowires, workability, and electrode productivity.
  • Metal nanowire layer is formed using a dispersion, and the dispersion is as described above. Further, the metal nanowires, the solvent, the carbon nanotubes, the transparent resin material (binder), the dispersant, and other components that can be contained in the dispersion are all as described above in the description of the dispersion.
  • the resistance value of the metal nanowire layer is measured in the MD direction (flow direction) and the TD direction (perpendicular to the flow) by using a resistivity meter EC-80P to bring the measurement probe into contact with the surface of the metal nanowire layer. It can be measured every 20 mm. Usually, 20 points or more are measured.
  • the thickness of the metal nanowire layer is not particularly limited and may be appropriately selected depending on the intended purpose.
  • the wet thickness of the dispersion film is preferably 3 ⁇ m to 20 ⁇ m, and more preferably 5 ⁇ m to 15 ⁇ m. If the dispersion film has a wet thickness of less than 3 ⁇ m, it may be difficult to form a metal nanowire layer. If the thickness of the dispersion film exceeds 20 ⁇ m, the distribution of the surface resistance of the transparent conductive film obtained may be uneven. is there. On the other hand, when the wet thickness of the dispersion film is within the more preferable range, it is advantageous in terms of good formation of the dispersion film and uniformity of the surface resistance distribution of the transparent conductive film obtained.
  • the said patterning process is a process of patterning the metal nanowire layer formed on the said base material.
  • the method of the said patterning According to the objective, it can select suitably, For example, the patterning using a mask, the patterning by a laser, etc. are mentioned. Among these, laser patterning is preferable in that finer processing is possible than patterning using a mask.
  • the electrode of the present invention is an electrode manufactured by the manufacturing method of the present invention, and has at least a base material and a metal nanowire layer formed on the base material. It has a member.
  • the base material and the metal nanowire layer are as described above. There is no restriction
  • FIG. 1 is a schematic diagram of a touch panel according to an embodiment of the present invention.
  • a touch panel 100 is formed on an image display member 1 having an electrode of the present invention, a light-transmitting cured resin layer 2 formed on the image display member 1, and a light-transmitting cured resin layer 2.
  • a light transmissive cover member 4 and a light shielding layer 3 interposed between the light transmissive cured resin layer 2 and the light transmissive cover member 4 are provided.
  • FIG. 2 is a schematic diagram of an organic EL substrate according to an embodiment of the present invention.
  • the organic EL substrate 200 of the present invention includes a base material 11 made of glass or the like, an anode 12 formed on the surface of the base material 11, and an organic light emitting layer 13 formed on the surface of the anode 12.
  • An adhesive 17 for bonding the material 11 and the periphery of the sealing material 15 is provided.
  • the base material 11 and the anode 12 constitute an electrode of the present invention.
  • a silver nanowire ink (dispersion) was prepared with the following composition.
  • Metal nanowire Silver nanowire (manufactured by Seashell Technology, AgNW-25, average minor axis diameter 25 nm (manufacturer value), average major axis length 23 ⁇ m (maker value)): compounding amount 0.500 parts by mass (2 )
  • Binder Hydroxypropyl methylcellulose (manufactured by Aldrich, viscosity 80 cP to 120 cP of 2% aqueous solution at 20 ° C. (reference value)): blending amount 0.125 parts by mass
  • solvent (i) water: blending amount 89.375 Parts by mass, (ii) ethanol: blending amount 10.000 parts by mass
  • ⁇ Preparation of silver nanowire transparent conductive film The prepared silver nanowire ink (dispersion) was spray-coated using a two-fluid nozzle (manufactured by Acing Technology) to produce a base material A-1 (manufactured by Mitsubishi Gas Chemical Company, trade name: “Iupilon Sheet FE-”). 2000 ”, thickness of about 100 ⁇ m) was applied so as to have the wet thickness shown in Table 1, and then dried at 100 ° C./60 minutes in a clean oven to prepare a transparent conductive film.
  • the coating conditions by the spray coating method were as follows.
  • the resistance value of the silver nanowire transparent conductive film was measured as follows. An effective coating area on the surface of the transparent conductive film (silver nanowire layer) by contacting a measurement probe of a manual nondestructive resistance measuring device (Napson Co., Ltd., EC-80P) to the surface of the transparent conductive film (silver nanowire layer) (MD direction: 200 mm, TD direction: 360 mm), the average value ave and the in-plane distribution ⁇ were calculated from the measured values after measurement every 20 mm. The calculation results are shown in Table 1. ⁇ Evaluation of in-plane distribution ⁇ >> The in-plane distribution ⁇ of the resistance value calculated as described above was evaluated in four stages.
  • Example 2 In Example 1, instead of using the base material A-1 having a thickness of about 100 ⁇ m, a base material A-2 having a thickness of about 180 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company) was used. Except for the above, a transparent electrode was produced in the same manner as in Example 1, and the produced transparent electrode was evaluated for a substrate, measured for a resistance value, and evaluated for an in-plane distribution ⁇ . The evaluation results are shown in Table 1.
  • Example 3 In Example 1, instead of using the base material A-1 having a thickness of about 100 ⁇ m, a base material A-3 having a thickness of about 300 ⁇ m (manufactured by Mitsubishi Gas Chemical Company, trade name: “Iupilon Sheet FE-2000”) was used. Except for the above, a transparent electrode was produced in the same manner as in Example 1, and the produced transparent electrode was evaluated for a substrate, measured for a resistance value, and evaluated for an in-plane distribution ⁇ . The evaluation results are shown in Table 1.
  • Example 4 In Example 1, instead of using the base material A-1 having a thickness of about 100 ⁇ m, the base material A-4 having a thickness of about 500 ⁇ m (manufactured by Mitsubishi Gas Chemical Company, trade name: “Iupilon Sheet FE-2000”) was used. Except for the above, a transparent electrode was produced in the same manner as in Example 1, and the produced transparent electrode was evaluated for a substrate, measured for a resistance value, and evaluated for an in-plane distribution ⁇ . The evaluation results are shown in Table 1.
  • Example 5 (Example 5) In Example 1, instead of using the base material A-1 having a thickness of about 100 ⁇ m, the base material B-1 having a thickness of about 100 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company) was used. A transparent electrode was prepared in the same manner as in Example 1 except that the following post-treatment was used), and evaluation of the base material, measurement of resistance value, and surface were performed on the produced transparent electrode. The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Example 6 In Example 1, instead of using the base material A-1 having a thickness of about 100 ⁇ m, the base material B-2 having a thickness of about 180 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company) was used. In the same manner as in Example 1 except that the above-described post-treatment) was used, a transparent electrode was produced, and the produced transparent electrode was subjected to evaluation of the substrate, measurement of resistance value, and surface. The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Example 7 In Example 1, instead of using the base material A-1 having a thickness of about 100 ⁇ m, the base material B-3 having a thickness of about 300 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company) was used. In the same manner as in Example 1 except that the above-described post-treatment) was used, a transparent electrode was produced, and the produced transparent electrode was subjected to evaluation of the substrate, measurement of resistance value, and surface. The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Example 8 In Example 1, instead of using the base material A-1 having a thickness of about 100 ⁇ m, the base material B-4 having a thickness of about 500 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company) was used. In the same manner as in Example 1 except that the above-described post-treatment) was used, a transparent electrode was produced, and the produced transparent electrode was subjected to evaluation of the substrate, measurement of resistance value, and surface. The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Example 9 In Example 4, as a solvent for the silver nanowire ink (dispersion), water (boiling point 100 ° C.) was used instead of water (boiling point 100 ° C.) and ethanol (boiling point 78 ° C.). In the same manner as in Example 4, a transparent electrode was produced, and the produced transparent electrode was subjected to substrate evaluation, resistance value measurement, and in-plane distribution ⁇ evaluation. The evaluation results are shown in Table 1.
  • Example 10 (Example 10) In Example 4, instead of using a mixed solution of water (boiling point 100 ° C.) and ethanol (boiling point 78 ° C.) as a solvent for the silver nanowire ink (dispersion), ethanol (boiling point 78 ° C.) was used. In the same manner as in Example 4, a transparent electrode was produced, and the produced transparent electrode was subjected to substrate evaluation, resistance value measurement, and in-plane distribution ⁇ evaluation. The evaluation results are shown in Table 1.
  • Example 11 In Example 4, p-xylene (boiling point 138 ° C.) was used as a solvent for the silver nanowire ink (dispersion) instead of using a mixed solution of water (boiling point 100 ° C.) and ethanol (boiling point 78 ° C.). Except for the above, a transparent electrode was produced in the same manner as in Example 4, and the produced transparent electrode was subjected to substrate evaluation, resistance value measurement, and in-plane distribution ⁇ evaluation. The evaluation results are shown in Table 1.
  • Example 4 (Comparative Example 1) In Example 4, instead of using a mixed liquid of water (boiling point 100 ° C.) and ethanol (boiling point 78 ° C.) as a solvent for the silver nanowire ink (dispersion), N, N-dimethylformamide (boiling point 153 ° C.) was used. A transparent electrode was produced in the same manner as in Example 4 except that it was used, and the produced transparent electrode was evaluated for a substrate, measured for a resistance value, and evaluated for an in-plane distribution ⁇ . The evaluation results are shown in Table 1.
  • Example 2 Comparative Example 2
  • ⁇ -butyrolactone (boiling point 204 ° C.) was used as a solvent for the silver nanowire ink (dispersion) instead of using a mixed solution of water (boiling point 100 ° C.) and ethanol (boiling point 78 ° C.).
  • a transparent electrode was produced in the same manner as in Example 4, and the produced transparent electrode was subjected to substrate evaluation, resistance value measurement, and in-plane distribution ⁇ evaluation. The evaluation results are shown in Table 1.
  • Example 3 a transparent electrode was produced in the same manner as in Example 4 except that the atomization pressure was changed so that the average droplet diameter (average particle size of the droplets) was changed from 10 ⁇ m to 3 ⁇ m. With respect to the transparent electrode, evaluation of the substrate, measurement of the resistance value, and evaluation of the in-plane distribution ⁇ were performed. The evaluation results are shown in Table 1.
  • Example 12 In Example 4, a transparent electrode was produced in the same manner as in Example 4 except that the atomization pressure was changed so that the average droplet diameter (average particle size of the droplets) was changed from 10 ⁇ m to 5 ⁇ m. With respect to the transparent electrode, evaluation of the substrate, measurement of the resistance value, and evaluation of the in-plane distribution ⁇ were performed. The evaluation results are shown in Table 1.
  • Example 13 In Example 4, a transparent electrode was produced in the same manner as in Example 4 except that the atomization pressure was changed so that the average droplet diameter (average particle size of the droplets) was changed from 10 ⁇ m to 50 ⁇ m. With respect to the transparent electrode, evaluation of the substrate, measurement of the resistance value, and evaluation of the in-plane distribution ⁇ were performed. The evaluation results are shown in Table 1.
  • Example 4 a transparent electrode was produced in the same manner as in Example 4 except that the atomization pressure was changed so that the average droplet diameter (average particle size of the droplets) was changed from 10 ⁇ m to 60 ⁇ m. With respect to the transparent electrode, evaluation of the substrate, measurement of the resistance value, and evaluation of the in-plane distribution ⁇ were performed. The evaluation results are shown in Table 1.
  • Example 14 In Example 1, instead of using the silver nanowire ink having the composition described in Example 1 (the silver nanowire content is 0.50% by mass: the dilution concentration is 99.50% by mass), the silver nanowire having the following composition is used. A transparent electrode was prepared in the same manner as in Example 1 except that the wire ink (the content of silver nanowires was 1.0 mass%: the dilution concentration was 99.00 mass%) was used. The substrate was evaluated, the resistance value was measured, and the in-plane distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Metal nanowire Silver nanowire (manufactured by Seashell Technology, AgNW-25, average minor axis diameter 25 nm (manufacturer value), average major axis length 23 ⁇ m (manufacturer value)): 1.00 parts by mass (2 )
  • Binder Hydroxypropyl methylcellulose (manufactured by Aldrich, viscosity 80 cP to 120 cP of 2% aqueous solution at 20 ° C. (reference value)): blending amount 0.125 parts by mass (3) solvent: (i) water: blending amount 88.875 Parts by mass, (ii) ethanol: blending amount 10.000 parts by mass
  • Example 15 In Example 1, instead of using the silver nanowire ink having the composition described in Example 1 (the silver nanowire content is 0.50% by mass: the dilution concentration is 99.50% by mass), the silver nanowire having the following composition is used.
  • a transparent electrode was produced in the same manner as in Example 1 except that wire ink (silver nanowire content: 0.10% by mass: dilution concentration: 99.90% by mass) was used.
  • the substrate was evaluated, the resistance value was measured, and the in-plane distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Metal nanowire Silver nanowire (manufactured by Seashell Technology, AgNW-25, average minor axis diameter 25 nm (manufacturer value), average major axis length 23 ⁇ m (manufacturer value)): compounding amount 0.10 parts by mass (2 )
  • Binder Hydroxypropyl methylcellulose (manufactured by Aldrich, viscosity 80 cP to 120 cP of 2% aqueous solution at 20 ° C. (reference value)): blending amount 0.125 parts by mass (3) solvent: (i) water: blending amount 89.775 Parts by mass, (ii) ethanol: blending amount 10.000 parts by mass
  • Example 5 (Comparative Example 5) In Example 1, instead of using silver nanowires, a transparent electrode was prepared in the same manner as in Example 1 except that silver nanoparticles (trade name “T-YP808” manufactured by Seiko PMC) were used. The produced transparent electrode was subjected to substrate evaluation, resistance value measurement, and in-plane distribution ⁇ evaluation. The evaluation results are shown in Table 1.
  • Example A In Example 1, instead of using silver nanowires, Example 1 was used except that copper nanowires (manufactured by NOVARILS, manufactured by the company, trade name “NovaWireCu01”, average minor axis diameter 30 nm (manufacturer value)) were used. In the same manner as described above, a transparent electrode was produced, and the produced transparent electrode was subjected to substrate evaluation, resistance value measurement, and in-plane distribution ⁇ evaluation. The evaluation results are shown in Table 1.
  • Example 6 (Comparative Example 6) In Example 4, instead of coating the prepared silver nanowire ink (dispersed liquid) by spray coating, the prepared silver nanowire ink (dispersed liquid) was used with a flat plate slit die (manufactured by Toray Engineering Co., Ltd.). A transparent electrode was prepared in the same manner as in Example 4 except that coating was performed by a flat plate slit die coating method. Evaluation of the substrate, measurement of resistance value, and in-plane distribution ⁇ Evaluation was performed. The evaluation results are shown in Table 1. The coating conditions by the flat plate slit die coating method were as follows. (1) Slit gap: 100um (2) Coating gap: 100um (3) Coating thickness: 20um (4) Coating speed: 100 mm / second
  • Comparative Example 7 In Comparative Example 6, instead of using the base material A-4 having a thickness of about 500 ⁇ m, a base material B-3 having a thickness of about 300 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company) was used. In the same manner as in Comparative Example 6 except that the above-described post-treatment) was used, a transparent electrode was produced, and the produced transparent electrode was subjected to substrate evaluation, resistance measurement, and surface The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Comparative Example 8 In Comparative Example 6, instead of using the base material A-4 having a thickness of about 500 ⁇ m, the base material B-4 having a thickness of about 500 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company, Inc.) In the same manner as in Comparative Example 6 except that the above-described post-treatment) was used, a transparent electrode was produced, and the produced transparent electrode was subjected to substrate evaluation, resistance measurement, and surface The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Example 3 In Example 3, instead of applying the prepared silver nanowire ink (dispersion) by spray coating, the prepared silver nanowire ink (dispersion) was applied to a wire bar using a wire bar (count 10). A transparent electrode was produced in the same manner as in Example 3 except that the coating was applied in the same manner as in Example 3. Evaluation of the substrate, measurement of the resistance value, and evaluation of the in-plane distribution ⁇ were performed on the produced transparent electrode. The evaluation results are shown in Table 1. The basis weight of the silver nanowires was about 0.01 g / m 2 .
  • Comparative Example 10 a transparent electrode was produced in the same manner as in Comparative Example 9 except that instead of using the base material A-3 having a thickness of about 300 ⁇ m, the base material A-4 having a thickness of about 500 ⁇ m was used. With respect to the transparent electrode, evaluation of the substrate, measurement of the resistance value, and evaluation of the in-plane distribution ⁇ were performed. The evaluation results are shown in Table 1.
  • Comparative Example 11 In Comparative Example 9, instead of using the base material A-3 having a thickness of about 300 ⁇ m, a base material B-3 having a thickness of about 300 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company, Inc.) In the same manner as in Comparative Example 9 except that the above-described post-treatment) was used, a transparent electrode was produced, and the produced transparent electrode was subjected to evaluation of the substrate, measurement of resistance value, and surface. The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Comparative Example 12 In Comparative Example 9, instead of using the base material A-3 having a thickness of about 300 ⁇ m, a base material B-4 having a thickness of about 500 ⁇ m (trade name: “Iupilon Sheet FE-2000” manufactured by Mitsubishi Gas Chemical Company) was used. In the same manner as in Comparative Example 9 except that the above-described post-treatment) was used, a transparent electrode was produced, and the produced transparent electrode was subjected to evaluation of the substrate, measurement of resistance value, and surface. The internal distribution ⁇ was evaluated. The evaluation results are shown in Table 1.
  • Examples 1 to 16 in which the average droplet diameter of the dispersion liquid is 5 ⁇ m to 50 ⁇ m and the boiling point of the solvent is 138 ° C. or less are as follows: A low-resistance metal nanowire layer (conductive film) can be easily formed, and a metal nanowire layer with a uniform thickness can be formed on a substrate with a non-uniform thickness (low smoothness) You can see that you can.
  • the electrode of the present invention is an alternative to an electrode formed with a conductive film using a metal oxide such as indium tin oxide (ITO) used in electronic devices such as notebook computers, smartphones, touch panels, LEDs, and liquid crystal panels.
  • ITO indium tin oxide

Abstract

La présente invention concerne : une électrode dans laquelle une couche de nanofils métalliques (film conducteur) ayant une résistance faible peut être facilement formée et une couche de nanofils métalliques ayant une épaisseur uniforme peut être formée même sur une base dont l'épaisseur est irrégulière (lissé faible); un procédé de fabrication de cette électrode; un panneau tactile et un substrat électroluminescent (EL) organique dont chacun est pourvu de cette électrode. Un procédé de fabrication d'une électrode selon la présente invention comprend les étapes suivantes : la pulvérisation d'un liquide de dispersion, qui est obtenu par dispersion de nanofils métalliques dans un solvant, sur une base au moyen d'une pulvérisation; la formation d'une couche de nanofils métalliques sur la base par séchage d'un film de dispersion qui est formé du liquide de dispersion et sur la base. Le diamètre moyen de gouttelette du liquide de dispersion pulvérisé, dans l'étape de pulvérisation, est de 5 à 50 µm, et le point d'ébullition du solvant est de 138 °C au maximum.
PCT/JP2015/004273 2014-09-11 2015-08-25 Électrode, son procédé de fabrication, panneau tactile et substrat électroluminescent (el) organique dont chacun est pourvu de ladite électrode WO2016038821A1 (fr)

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JP2011513534A (ja) * 2008-02-26 2011-04-28 カンブリオス テクノロジーズ コーポレイション 導電性特徴のインクジェット蒸着のための方法および組成物
JP2012216535A (ja) * 2011-03-31 2012-11-08 Mitsubishi Chemicals Corp 金属ナノワイヤー含有透明導電膜及びその塗布液

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JP2011513534A (ja) * 2008-02-26 2011-04-28 カンブリオス テクノロジーズ コーポレイション 導電性特徴のインクジェット蒸着のための方法および組成物
JP2012216535A (ja) * 2011-03-31 2012-11-08 Mitsubishi Chemicals Corp 金属ナノワイヤー含有透明導電膜及びその塗布液

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