WO2016021408A1 - 防汚処理組成物、処理装置、処理方法および処理物品 - Google Patents
防汚処理組成物、処理装置、処理方法および処理物品 Download PDFInfo
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- WO2016021408A1 WO2016021408A1 PCT/JP2015/070865 JP2015070865W WO2016021408A1 WO 2016021408 A1 WO2016021408 A1 WO 2016021408A1 JP 2015070865 W JP2015070865 W JP 2015070865W WO 2016021408 A1 WO2016021408 A1 WO 2016021408A1
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- 0 CC(N(C)c1cccc([Si](C)(C)C*)c1)=O Chemical compound CC(N(C)c1cccc([Si](C)(C)C*)c1)=O 0.000 description 2
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1656—Antifouling paints; Underwater paints characterised by the film-forming substance
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
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- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
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- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
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- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
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- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
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- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C09D5/16—Antifouling paints; Underwater paints
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- C09D7/40—Additives
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- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
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- C—CHEMISTRY; METALLURGY
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/75—Hydrophilic and oleophilic coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/31—Pre-treatment
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Definitions
- the present invention relates to a surface treatment agent or an antifouling treatment composition comprising a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end.
- a layer obtained from a surface treatment agent containing a fluorine-containing silane compound (hereinafter also referred to as “surface treatment layer”) is applied as a so-called functional thin film to various substrates such as glass, plastic, fiber, and building materials. ing.
- a perfluoropolyether group-containing silane compound having a perfluoropolyether group in the molecular main chain and a hydrolyzable group bonded to an Si atom at the molecular terminal or terminal part is known.
- this surface treatment agent containing a perfluoropolyether group-containing silane compound is applied to a substrate, the hydrolyzable group bonded to the Si atom reacts with the substrate and between the compounds, and —Si—O— By forming Si-bonds, a surface treatment layer can be formed.
- the surface treatment layer as described above is bonded to the base material by a —Si—O—Si— bond.
- a —Si—O—Si— bond In an alkaline environment, particularly in a strong alkaline environment, for example, when sweat adheres, the bond is cut. As a result, the durability may be reduced.
- an object of the present invention is to provide a novel surface treatment agent capable of forming a layer having higher alkali resistance.
- the present inventors have introduced a carbon-carbon unsaturated bond at the molecular end of the fluorine-containing compound and reacted it with the Si—H bond or C—H bond of the base material. It has been found that a surface treatment layer having high alkali resistance can be formed by bonding the treatment layer by Si—C bond or C—C bond, and the present invention has been completed.
- a carbon-carbon unsaturated bond at the molecular end -YA (wherein Y represents a single bond, an oxygen atom or a divalent organic group, and A represents A surface treatment agent comprising a fluorine-containing compound having a group represented by —CH ⁇ CH 2 or —C ⁇ CH) is provided.
- an article comprising a base material and a layer formed on the surface of the base material from the surface treatment agent of the present invention.
- a method for forming a surface treatment layer on the surface of a substrate Performing a pretreatment on the substrate to form a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end on the surface; And a step of supplying the surface treatment agent of the present invention to a pretreated substrate to form a surface treatment layer on the surface of the substrate.
- a surface treatment layer forming apparatus for forming a surface treatment layer on the surface of a substrate, A pretreatment portion for performing a pretreatment on the surface of the base material to form a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end on the surface;
- a surface treatment layer forming apparatus characterized by having a surface treatment layer forming section for supplying the surface treatment agent of the present invention to a pretreated substrate to form a surface treatment layer on the surface of the substrate.
- a method for producing an article comprising a substrate and a surface treatment layer covering the surface of the substrate,
- the surface treatment agent of the present invention is brought into contact with the surface of the substrate, the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal contained in the surface treatment agent, and the Si—H part or C—H on the substrate surface
- a manufacturing method including forming a surface treatment layer on the surface of the base material by reacting with a part is provided.
- a surface treatment layer having high alkali resistance can be formed.
- FIG. 1 is a block diagram showing an embodiment of a surface treatment layer forming apparatus of the present invention for forming a surface treatment layer on a substrate.
- FIG. 2 is a schematic cross-sectional view showing an aspect of the pretreatment unit 200 of the surface treatment layer forming apparatus shown in FIG.
- divalent to decavalent organic group means a divalent to decavalent group containing carbon.
- the divalent to decavalent organic group is not particularly limited, and examples thereof include divalent to decavalent groups in which 1 to 9 hydrogen atoms are further eliminated from the hydrocarbon group.
- the divalent organic group is not particularly limited, and examples thereof include a divalent group in which one hydrogen atom is further eliminated from a hydrocarbon group.
- hydrocarbon group means a group containing carbon and hydrogen. Such hydrocarbon group is not particularly limited, but may be a hydrocarbon group having 1 to 20 carbon atoms which may be substituted by one or more substituents, such as an aliphatic hydrocarbon group, An aromatic hydrocarbon group etc. are mentioned.
- the “aliphatic hydrocarbon group” may be linear, branched or cyclic, and may be either saturated or unsaturated.
- the hydrocarbon group may also contain one or more ring structures.
- Such a hydrocarbon group may have one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy and the like at the terminal or molecular chain.
- the substituent of the “hydrocarbon group” is not particularly limited, but includes, for example, a halogen atom; C which may be substituted with one or more halogen atoms, 1-6 alkyl group, C 2-6 alkenyl group, C 2-6 alkynyl group, C 3-10 cycloalkyl group, C 3-10 unsaturated cycloalkyl group, 5-10 membered heterocyclyl group, 5-10 membered And one or more groups selected from an unsaturated heterocyclyl group, a C 6-10 aryl group, and a 5- to 10-membered heteroaryl group.
- a halogen atom C which may be substituted with one or more halogen atoms, 1-6 alkyl group, C 2-6 alkenyl group, C 2-6 alkynyl group, C 3-10 cycloalkyl group, C 3-10 unsaturated cycloalkyl group, 5-10 membered heterocyclyl group, 5-10 membered
- Y represents a single bond, an oxygen atom or a divalent organic group.
- Y is a single bond, an oxygen atom or —CR 14 2 —.
- R 14 represents a hydrogen atom or a lower alkyl group independently at each occurrence.
- the lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and still more preferably a methyl group.
- R 14 is preferably a hydrogen atom.
- A represents —CH ⁇ CH 2 or —C ⁇ CH.
- A is preferably —CH ⁇ CH 2 .
- the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end is represented by the following formulas (A1), (A2), (B1), (B2), (C1), (C2), (D1) and (D2): Or a compound represented by any of the following:
- formulas (A1), (A2), (B1), (B2), (C1), (C2), (D1) and (D2) will be described.
- Rf represents an alkyl group having 1 to 16 carbon atoms which may be substituted with one or more fluorine atoms.
- alkyl group having 1 to 16 carbon atoms in the alkyl group having 1 to 16 carbon atoms which may be substituted with one or more fluorine atoms may be linear or branched. Preferably, it is a linear or branched alkyl group having 1 to 6 carbon atoms, particularly 1 to 3 carbon atoms, and more preferably a linear alkyl group having 1 to 3 carbon atoms.
- Rf is preferably an alkyl group having 1 to 16 carbon atoms, which is substituted with one or more fluorine atoms, more preferably a CF 2 H—C 1-15 fluoroalkylene group, still more preferably Is a perfluoroalkyl group having 1 to 16 carbon atoms.
- the perfluoroalkyl group having 1 to 16 carbon atoms may be linear or branched, and preferably has 1 to 6 carbon atoms, particularly 1 to 6 carbon atoms. 3 perfluoroalkyl group, more preferably a linear perfluoroalkyl group having 1 to 3 carbon atoms, specifically —CF 3 , —CF 2 CF 3 , or —CF 2 CF 2 CF 3 . .
- PFPE represents-(OC 4 F 8 ) a- (OC 3 F 6 ) b- (OC 2 F 4 ) c- (OCF 2 ) d- and corresponds to a perfluoro (poly) ether group To do.
- a, b, c and d are each independently an integer of 0 or 1 and are not particularly limited as long as the sum of a, b, c and d is at least 1.
- a, b, c and d are each independently an integer of 0 to 200, for example, an integer of 1 to 200, more preferably an integer of 0 to 100, for example, 1 An integer of 100 or less.
- the sum of a, b, c and d is 10 or more, preferably 20 or more, and 200 or less, preferably 100 or less. Further, the order of presence of each repeating unit with a, b, c or d in parentheses is arbitrary in the formula.
- — (OC 4 F 8 ) — represents — (OCF 2 CF 2 CF 2 CF 2 ) —, — (OCF (CF 3 ) CF 2 CF 2 ) —, — (OCF 2 CF (CF 3 ) CF 2 )-,-(OCF 2 CF 2 CF (CF 3 ))-,-(OC (CF 3 ) 2 CF 2 )-,-(OCF 2 C (CF 3 ) 2 )-,-(OCF (CF 3 ) CF (CF 3 ))-,-(OCF (C 2 F 5 ) CF 2 )-and-(OCF 2 CF (C 2 F 5 ))-may be used, but preferably — (OCF 2 CF 2 CF 2 CF 2 ) —.
- -(OC 3 F 6 )- is any of-(OCF 2 CF 2 CF 2 )-,-(OCF (CF 3 ) CF 2 )-and-(OCF 2 CF (CF 3 ))- Preferably, it is — (OCF 2 CF 2 CF 2 ) —.
- — (OC 2 F 4 ) — may be any of — (OCF 2 CF 2 ) — and — (OCF (CF 3 )) —, preferably — (OCF 2 CF 2 ) —. is there.
- PFPE is — (OC 3 F 6 ) b — (wherein b is an integer of 1 to 200, preferably 10 to 100), preferably — (OCF 2 CF 2 CF 2 ) b — (wherein b is as defined above).
- PFPE has the following structure:-(OC 4 F 8 ) a- (OC 3 F 6 ) b- (OC 2 F 4 ) c- (OCF 2 ) d- (wherein a and b are each independently And are integers of 0 or more and 1 or more and 30 or less, preferably 0 or more and 10 or less, and c and d are each independently an integer of 1 or more and 200 or less, preferably 10 or more and 100 or less. The sum of c and d is not less than 10, preferably not less than 20, and not more than 200, preferably not more than 100.
- Presence order of each repeating unit in parentheses with the suffix a, b, c or d Is optional in the formula), preferably — (OCF 2 CF 2 CF 2 CF 2 ) a — (OCF 2 CF 2 CF 2 ) b — (OCF 2 CF 2 ) c — (OCF 2 ) d -(Wherein a, b, And d is a is) as defined above.
- PFPE may be — (OCF 2 CF 2 ) c — (OCF 2 ) d — (wherein c and d are as defined above).
- PFPE is a group represented by — (OC 2 F 4 —R 15 ) n ′′ —.
- R 15 represents OC 2 F 4 , OC 3 F 6 and OC 4 F.
- 8 is a group selected from, or independent of .OC 2 F 4, OC 3 F 6 and OC 4 F 8 is a combination of two or three groups independently selected from these groups The combination of 2 or 3 groups selected is not particularly limited.
- n ′′ is an integer of 2 to 100, preferably an integer of 2 to 50 is there.
- OC 2 F 4 , OC 3 F 6 and OC 4 F 8 may be either linear or branched, preferably linear.
- the PFPE is preferably — (OC 2 F 4 —OC 3 F 6 ) n ′′ — or — (OC 2 F 4 —OC 4 F 8 ) n ′′ —.
- R 11 independently represents a hydrogen atom or a halogen atom at each occurrence.
- the halogen atom is preferably an iodine atom, a chlorine atom, or a fluorine atom.
- R 12 each independently represents a hydrogen atom or a lower alkyl group at each occurrence.
- the lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms.
- X 1 each independently represents a single bond or a divalent to 10-valent organic group.
- X 1 is a perfluoropolyether part (Rf-PFPE part or -PFPE-part) that mainly provides water repellency and surface slipperiness in the compounds represented by formulas (A1) and (A2); It is understood as a linker that connects a group having a carbon-carbon unsaturated bond that provides the binding ability to a substrate (specifically, a group A or a group containing an A group). Therefore, X 1 may be any organic group as long as the compounds represented by formulas (A1) and (A2) can exist stably.
- ⁇ in the above formula is an integer of 1 to 9
- ⁇ ′ is an integer of 1 to 9.
- ⁇ and ⁇ ′ are determined according to the valence of X 1
- the sum of ⁇ and ⁇ ′ is the value of the valence of X 1 .
- X 1 is a 10-valent organic group
- the sum of ⁇ and ⁇ ′ is 10, for example, ⁇ is 9 and ⁇ ′ is 1, ⁇ is 5 and ⁇ ′ is 5, or ⁇ is 1 and ⁇ 'Can be nine.
- ⁇ and ⁇ ′ are 1.
- alpha is a value obtained by subtracting 1 from the valence of the value of X 1.
- X 1 is preferably a divalent organic group having 2 to 7 valences, more preferably 2 to 4 valences, and even more preferably a divalent organic group.
- Examples of X 1 are not particularly limited, but for example, the following formula: -(R 31 ) p ' -(X a ) q' -R 32- [Where: R 31 represents a single bond, — (CH 2 ) s ′ — or o-, m- or p-phenylene group, preferably — (CH 2 ) s ′ — R 32 represents a single bond, — (CH 2 ) t ′ — or o-, m- or p-phenylene group, preferably — (CH 2 ) t ′ — s ′ is an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, and even more preferably 1 or 2.
- t ′ is an integer of 1 to 20, preferably an integer of 2 to 6, more preferably an integer of 2 to 3,
- X a represents-(X b ) r ' - X b is independently at each occurrence —O—, —S—, o—, m- or p-phenylene, —C (O) O—, —CONR 34 —, —O—CONR 34 —.
- R 34 each independently represents a hydrogen atom, a phenyl group or a C 1-6 alkyl group (preferably a methyl group) at each occurrence;
- m ′ is independently an integer of 1 to 100, preferably an integer of 1 to 20, at each occurrence,
- n ′ is independently an integer of 1 to 20, preferably an integer of 1 to 6, more preferably an integer of 1 to 3, at each occurrence.
- r ′ is an integer of 1 to 10, preferably an integer of 1 to 5, more preferably an integer of 1 to 3, p ′ is 0 or 1; q ′ is 0 or 1, Here, at least one of p ′ and q ′ is 1, and the order of presence of each repeating unit in parentheses attached with p ′ or q ′ is arbitrary. ] The bivalent group represented by these is mentioned.
- X 1 is A C 1-20 alkylene group, -R 31 -X c -R 32- , or -X d -R 32- [Wherein, R 31 and R 32 are as defined above. ] It can be.
- said X 1 is A C 1-20 alkylene group, -(CH 2 ) s' -X c- , -(CH 2 ) s ' -X c- (CH 2 ) t'- -X d- , or -X d- (CH 2 ) t ' - [Wherein, s ′ and t ′ are as defined above]. ] It is.
- X c is -O-, -S-, -C (O) O-, -CONR 34 -, -O-CONR 34 -, -Si (R 33 ) 2- , -(Si (R 33 ) 2 O) m ' -Si (R 33 ) 2- , —O— (CH 2 ) u ′ — (Si (R 33 ) 2 O) m ′ —Si (R 33 ) 2 —, —CONR 34 — (CH 2 ) u ′ — (Si (R 33 ) 2 O) m ′ —Si (R 33 ) 2 —, —CONR 34 — (CH 2 ) u ′ — (Si (R 33 ) 2 O) m ′ —Si (R 33 ) 2 —, —CONR 34 — (CH 2 ) u ′ —N (R 34 ) —, or —CONR 34 — (
- X d is -S-, -C (O) O-, -CONR 34 -, —CONR 34 — (CH 2 ) u ′ — (Si (R 33 ) 2 O) m ′ —Si (R 33 ) 2 —, —CONR 34 — (CH 2 ) u ′ —N (R 34 ) —, or —CONR 34 — (o-, m- or p-phenylene) -Si (R 33 ) 2 — Represents.
- said X 1 is A C 1-20 alkylene group, — (CH 2 ) s ′ —X c — (CH 2 ) t ′ —, or —X d — (CH 2 ) t ′ — [Wherein each symbol is as defined above. ] It can be.
- said X 1 is A C 1-20 alkylene group, — (CH 2 ) s ′ —O— (CH 2 ) t ′ —, -(CH 2 ) s ' -Si (R 33 ) 2- (CH 2 ) t'- , - (CH 2) s' - (Si (R 33) 2 O) m '-Si (R 33) 2 - (CH 2) t' -, — (CH 2 ) s ′ —O— (CH 2 ) u ′ — (Si (R 33 ) 2 O) m ′ —Si (R 33 ) 2 — (CH 2 ) t ′ —, or — (CH 2 ) s′— O— (CH 2 ) t ′ —Si (R 33 ) 2 — (CH 2 ) t ′ —, or — (CH 2 ) s′— O— (CH 2 ) t ′ —S
- — (C v H 2v ) — may be linear or branched.
- the X 1 group is substituted with one or more substituents selected from a fluorine atom, a C 1-3 alkyl group, and a C 1-3 fluoroalkyl group (preferably a C 1-3 perfluoroalkyl group). May be.
- X 1 include, for example: —CH 2 O (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 —, —CH 2 O (CH 2 ) 6 —, —CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 OSi (CH 3 ) 2 (CH 2 ) 2 —, -CH 2 O (CH 2) 3 Si (CH 3) 2 OSi (CH 3) 2 OSi (CH 3) 2 (CH 2) 2 -, -CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 O (Si (CH 3 ) 2 O) 2 Si (CH 3 ) 2 (CH 2 ) 2- , —CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 O (Si (CH 3 ) 2 O) 3 Si (CH 3 ) 2 (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 Si (CH 3 ) 2 O (Si (CH 3 ) 2 O) 3 Si (CH 3 ) 2 (CH
- Examples of another X 1 group include the following groups: [Wherein, each R 41 independently represents a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a C 1-6 alkoxy group, preferably a methyl group; D is —CH 2 O (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 —, —CF 2 O (CH 2 ) 3 —, -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , —CON (Ph) — (CH 2 ) 3 — (wherein Ph represents phenyl), and (In the formula, each R 42 independently represents a hydrogen atom, a C 1-6 alkyl group or a C 1-6 alkoxy group, preferably a methyl group or a methoxy group, more preferably
- X 1 groups include the following groups: [Wherein, each R 41 independently represents a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or a C 1-6 alkoxy group, preferably a methyl group; In each X 1 group, any some of T are attached to the PFPE of the molecular backbone: —CH 2 O (CH 2 ) 2 —, —CH 2 O (CH 2 ) 3 —, —CF 2 O (CH 2 ) 3 —, -(CH 2 ) 2- , -(CH 2 ) 3- , - (CH 2) 4 -, -CONH- (CH 2 ) 3- , -CON (CH 3 )-(CH 2 ) 3- , —CON (Ph) — (CH 2 ) 3 — (wherein Ph represents phenyl), or [Wherein, each R 42 independently represents a hydrogen atom, a C 1-6 alkyl group or a C 1-6 alk
- T are — (CH 2 ) n ′′ — (n ′′ is an integer of 2 to 6) bonded to the opposite group of PFPE of the molecular main chain, Each independently represents a methyl group or a phenyl group.
- X 1 is a group represented by the formula: — (R 16 ) x — (CFR 17 ) y — (CH 2 ) z —.
- x, y and z are each independently an integer of 0 to 10, the sum of x, y and z is 1 or more, and the order in which each repeating unit enclosed in parentheses is in the formula Is optional.
- R 16 is independently an oxygen atom, phenylene, carbazolylene, —NR 20 — (wherein R 20 represents a hydrogen atom or an organic group) or a divalent organic group at each occurrence. is there.
- R 16 is an oxygen atom or a divalent polar group.
- the “divalent polar group” in Q is not particularly limited, but —C (O) —, —C ( ⁇ NR 21 ) —, and —C (O) NR 21 — (in these formulas, R 21 represents a hydrogen atom or a lower alkyl group).
- the “lower alkyl group” is, for example, an alkyl group having 1 to 6 carbon atoms, for example, methyl, ethyl, n-propyl, and these may be substituted with one or more fluorine atoms.
- R 17 is each independently a hydrogen atom, a fluorine atom or a lower fluoroalkyl group, preferably a fluorine atom, at each occurrence.
- the “lower fluoroalkyl group” is, for example, a fluoroalkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, more preferably a trifluoromethyl group, A pentafluoroethyl group, more preferably a trifluoromethyl group.
- X 1 is preferably of the formula: — (O) x — (CF 2 ) y — (CH 2 ) z —, wherein x, y and z are as defined above
- x, y and z are as defined above
- the order in which each repeating unit is included is arbitrary in the formula).
- Examples of the group represented by the above formula: — (O) x — (CF 2 ) y — (CH 2 ) z — include, for example, — (O) x ′ — (CH 2 ) z ′′ —O — [(CH 2 ) z ′ ′′ —O—] z ′′ ′′ , and — (O) x ′ — (CF 2 ) y ′′ — (CH 2 ) z ′′ —O — [(CH 2 ) z ′ ′′ ⁇ O-] z ′′ ′′ (wherein x ′ is 0 or 1, y ′′, z ′′ and z ′ ′′ are each independently an integer of 1 to 10, z ′ ′′ 'Is 0 or 1.) The left end of these groups is bonded to the PFPE side.
- X 1 is —O—CFR 13 — (CF 2 ) e —.
- Each R 13 independently represents a fluorine atom or a lower fluoroalkyl group.
- the lower fluoroalkyl group is, for example, a fluoroalkyl group having 1 to 3 carbon atoms, preferably a perfluoroalkyl group having 1 to 3 carbon atoms, more preferably a trifluoromethyl group, a pentafluoroethyl group, still more preferably a trifluoromethyl group. It is.
- the above e is 0 or 1 independently.
- R 13 is a fluorine atom and e is 1.
- t is each independently an integer of 1 to 10, preferably an integer of 1 to 6.
- X 2 independently represents a single bond or a divalent organic group at each occurrence.
- X 2 is preferably an alkylene group having 1 to 20 carbon atoms, more preferably — (CH 2 ) u — (wherein u is an integer of 0 to 2).
- the compounds represented by the above formulas (A1) and (A2) can be obtained by, for example, using a perfluoropolyether derivative corresponding to the Rf-PFPE- moiety as a raw material, introducing iodine at the terminal, and then —CH 2 CR 12 (X It can be obtained by reacting a vinyl monomer corresponding to 2 YA)-.
- the YA moiety is a precursor group and converting the precursor group into the YA moiety by a method known in the art.
- the conversion method is not particularly limited, and for example, a known reaction for forming a carbon-carbon unsaturated bond, for example, a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction may be used, or It can also be produced by adding or substituting a compound having a carbon-carbon unsaturated bond at the molecular end corresponding to the YA moiety.
- a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction
- a person skilled in the art can select an appropriate reaction and the reaction conditions depending on the structure of the compound.
- Rf, PFPE, Y and A have the same meanings as those described for the above formulas (A1) and (A2).
- X 3 each independently represents a single bond or a divalent to 10-valent organic group.
- X 3 is a perfluoropolyether part (Rf-PFPE part or -PFPE-part) mainly providing water repellency and surface slipperiness in the compounds represented by formulas (B1) and (B2); It is understood as a linker that connects a group having a carbon-carbon unsaturated bond that provides the binding ability to a substrate (specifically, a group A or a group containing an A group). Therefore, X 3 may be any organic group as long as the compounds represented by formulas (B1) and (B2) can exist stably.
- ⁇ is an integer of 1 to 9
- ⁇ ′ is an integer of 1 to 9.
- ⁇ and ⁇ ′ are determined according to the valence of X 3
- the sum of ⁇ and ⁇ ′ is the value of the valence of X 3 .
- X 3 is a 10-valent organic group
- the sum of ⁇ and ⁇ ′ is 10, for example, ⁇ is 9 and ⁇ ′ is 1, ⁇ is 5 and ⁇ ′ is 5, or ⁇ is 1 and ⁇ 'Can be nine.
- beta is a value obtained by subtracting 1 from the valence of the value of X 3.
- X 3 is preferably a divalent organic group having 2 to 7 valences, more preferably 2 to 4 valences, and even more preferably 2 valences.
- Examples of X 3 are not particularly limited, and examples thereof include those similar to those described with respect to X 1 .
- the compounds represented by the above formulas (B1) and (B2) correspond to, for example, a -YA moiety after introducing a hydroxyl group at the terminal using a perfluoropolyether derivative corresponding to the Rf-PFPE- moiety as a raw material. For example, by subjecting to a Williamson reaction with a compound having an alkyl halide at the terminal.
- the YA moiety is a precursor group and converting the precursor group into the YA moiety by a method known in the art.
- the conversion method is not particularly limited, and for example, a known reaction for forming a carbon-carbon unsaturated bond, for example, a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction may be used, or It can also be produced by adding or substituting a compound having a carbon-carbon unsaturated bond at the molecular end corresponding to the YA moiety.
- a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction
- a person skilled in the art can select an appropriate reaction and the reaction conditions depending on the structure of the compound.
- Rf and PFPE are the same as those described for the above formulas (A1) and (A2).
- X 4 each independently represents a single bond or a divalent to 10-valent organic group.
- the X 4 is a perfluoropolyether part (Rf-PFPE part or -PFPE-part) mainly providing water repellency and surface slipperiness in the compounds represented by the formulas (C1) and (C2); A group having a carbon-carbon unsaturated bond that provides the binding ability to the substrate (specifically, an A group or a group containing an A group (—SiR a k R b l R c m R d n group)); It is understood that the linker is linked. Accordingly, X 4 may be any organic group as long as the compounds represented by the formulas (C1) and (C2) can exist stably.
- ⁇ is an integer of 1 to 9
- ⁇ ′ is an integer of 1 to 9.
- ⁇ and ⁇ ′ are determined according to the valence of X 4
- the sum of ⁇ and ⁇ ′ is the value of the valence of X 4 .
- X 4 is a 10-valent organic group
- the sum of ⁇ and ⁇ ′ is 10, for example, ⁇ is 9 and ⁇ ′ is 1, ⁇ is 5 and ⁇ ′ is 5, or ⁇ is 1 and ⁇ .
- gamma is a value obtained by subtracting 1 from the valence of the value of X 4.
- X 4 is preferably a divalent organic group having 2 to 7 valences, more preferably 2 to 4 valences, and even more preferably a divalent organic group.
- Examples of X 4 are not particularly limited, and examples thereof include those similar to those described for X 1 .
- R a independently represents —Z—SiR 71 p R 72 q R 73 r R 74 s at each occurrence.
- Z represents an oxygen atom or a divalent organic group independently at each occurrence.
- Z is preferably a divalent organic group, and forms a siloxane bond with the Si atom (Si atom to which R a is bonded) at the end of the molecular main chain in formula (C1) or formula (C2). Does not include things.
- Z is preferably a C 1-6 alkylene group, — (CH 2 ) g —O— (CH 2 ) h —, wherein g is an integer of 0 to 6, for example, an integer of 1 to 6.
- H is an integer of 0-6, for example, an integer of 1-6, or -phenylene- (CH 2 ) i- (wherein i is an integer of 0-6), more preferably Is a C 1-3 alkylene group.
- These groups may be substituted with, for example, one or more substituents selected from a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group.
- R 71 represents R a ′ independently at each occurrence.
- R a ′ has the same meaning as R a .
- Si is connected to the linear through the Z group is a five at the maximum. That is, in the above R a , when at least one R 71 is present, there are two or more Si atoms linearly linked via a Z group in R a , The maximum number of Si atoms connected in a chain is five.
- the "number of Si atoms linearly linked via a Z group in R a" is equal to -Z-Si- repeating number of which is connected to a linear during R a.
- * means a site bonded to Si of the main chain, and ... means that a predetermined group other than ZSi is bonded, that is, all three bonds of Si atoms are ... In this case, it means the end point of ZSi repetition.
- the number on the right shoulder of Si means the number of appearances of Si connected in a straight line through the Z group counted from *. That is, the chain in which ZSi repeat is completed in Si 2 has “the number of Si atoms linearly linked through the Z group in Ra ”, and similarly, Si 3 , Si 4 And the chain in which the ZSi repetition is completed in Si 5 has “number of Si atoms linearly linked through the Z group in R a ” being 3, 4 and 5, respectively.
- R a but ZSi chain there are multiple, they need not be all the same length, each may be of any length.
- the number of Si atoms connected linearly via the Z group in R a is one (left formula) or two (right formula) in all chains. Formula).
- the number of Si atoms connected in a straight chain via a Z group in R a is 1 or 2, preferably 1.
- R 72 independently represents —X 5 —YA in each occurrence.
- Y and A are as defined above.
- X 5 is a single bond or a divalent organic group independently at each occurrence.
- X 5 is preferably a single bond, a C 1-6 alkylene group, — (CH 2 ) g —O— (CH 2 ) h — (wherein g is an integer of 1 to 6, and h is Or an integer of 1 to 6) or -phenylene- (CH 2 ) i- (wherein i is an integer of 0 to 6), more preferably a single bond or a C 1-3 alkylene group. is there.
- These groups may be substituted with, for example, one or more substituents selected from a fluorine atom, a C 1-6 alkyl group, a C 2-6 alkenyl group, and a C 2-6 alkynyl group. .
- R 72 is preferably —CH 2 —CH ⁇ CH 2 .
- R 73 independently represents a hydroxyl group or a hydrolyzable group at each occurrence.
- hydrolyzable group as used herein means a group capable of undergoing a hydrolysis reaction.
- hydrolyzable groups include —OR, —OCOR, —O—N ⁇ C (R) 2 , —N (R) 2 , —NHR, halogen (wherein R is substituted or unsubstituted Represents an alkyl group having 1 to 4 carbon atoms), preferably —OR (alkoxy group).
- R include unsubstituted alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, n-butyl group and isobutyl group; substituted alkyl groups such as chloromethyl group.
- an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
- the hydroxyl group is not particularly limited, but may be a group produced by hydrolysis of a hydrolyzable group.
- R 73 is —OR (wherein R represents a substituted or unsubstituted C 1-3 alkyl group, more preferably a methyl group).
- each of R 74 independently represents a hydrogen atom or a lower alkyl group at each occurrence.
- the lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and still more preferably a methyl group.
- p is independently an integer from 0 to 3 at each occurrence; q is independently an integer from 0 to 3 at each occurrence; and r is independently at each occurrence. S is an integer from 0 to 3 independently at each occurrence.
- p + q + r + s total of p, q, r and s is 3.
- '(if R a' is absent, R a) terminal of R a in R a in the above q is preferably 2 or more, for example 2 or 3, more preferably 3.
- R b independently represents —X 5 —YA in each occurrence.
- X 5 , Y and A are as defined above.
- R b is preferably —CH 2 —CH ⁇ CH 2 .
- R c independently represents a hydroxyl group or a hydrolyzable group at each occurrence.
- R c is preferably a hydroxyl group, —OR, —OCOR, —O—N ⁇ C (R) 2 , —N (R) 2 , —NHR, halogen (in these formulas, R is substituted or unsubstituted)
- An alkyl group having 1 to 4 carbon atoms preferably —OR.
- R includes an unsubstituted alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, and an isobutyl group; and a substituted alkyl group such as a chloromethyl group.
- an alkyl group particularly an unsubstituted alkyl group is preferable, and a methyl group or an ethyl group is more preferable.
- the hydroxyl group is not particularly limited, but may be a group produced by hydrolysis of a hydrolyzable group. More preferably, R c is —OR (wherein R represents a substituted or unsubstituted C 1-3 alkyl group, more preferably a methyl group).
- R d each independently represents a hydrogen atom or a lower alkyl group at each occurrence.
- the lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and still more preferably a methyl group.
- n is an integer from 0 to 3 independently at each occurrence.
- k + l + m + n is 3.
- the compounds represented by the above formulas (C1) and (C2) are, for example, a perfluoropolyether derivative corresponding to the Rf-PFPE- moiety by utilizing hydrosilylation or the like, by using —SiHal 3 group (Hal is halogen) And then reacted with a Grignard reagent corresponding to the —YA moiety, such as Hal—Mg—CH 2 —CH ⁇ CH 2 or the like.
- the YA moiety is a precursor group and converting the precursor group into the YA moiety by a method known in the art.
- the conversion method is not particularly limited, and for example, a known reaction for forming a carbon-carbon unsaturated bond, for example, a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction may be used, or It can also be produced by adding or substituting a compound having a carbon-carbon unsaturated bond at the molecular end corresponding to the YA moiety.
- a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction
- a person skilled in the art can select an appropriate reaction and the reaction conditions depending on the structure of the compound.
- X 6 each independently represents a single bond or a divalent to 10-valent organic group.
- X 6 is mainly composed of a fluoroalkyl moiety (R 91 —Rf′- or —Rf′-part) that provides water repellency and the like, a substrate, It is understood that this is a linker that links a group having a carbon-carbon unsaturated bond (specifically, group A or a group containing group A) that provides the binding ability of Therefore, X 6 may be any organic group as long as the compounds represented by formulas (D1) and (D2) can exist stably.
- ⁇ in the above formula is an integer of 1 to 9, and is determined according to the valence of X 6 .
- ⁇ is 9, and when X 6 is a divalent organic group, ⁇ is 1.
- ⁇ is an integer of 1 to 9
- ⁇ ′ is an integer of 1 to 9.
- ⁇ and ⁇ ′ are determined according to the valence of X 6
- the sum of ⁇ and ⁇ ′ is the value of the valence of X 6 .
- ⁇ and ⁇ ′ are 10
- ⁇ is 9 and ⁇ ′ is 1
- ⁇ is 5 and ⁇ ′ is 5, or ⁇ is 1 and ⁇ .
- [delta] is a value obtained by subtracting 1 from the valence of the values of X 6.
- X 6 is preferably a divalent organic group having 2 to 7 valences, more preferably 2 to 4 valences, and even more preferably 2 valences.
- Examples of X 6 are not particularly limited, and examples thereof include those similar to those described with respect to X 1 .
- R 91 represents a fluorine atom, —CHF 2 or —CF 3 , preferably a fluorine atom or —CF 3 .
- Rf ′ represents a perfluoroalkylene group having 1 to 20 carbon atoms.
- Rf ′ preferably has 1 to 12 carbon atoms, more preferably 1 to 6 carbon atoms, and still more preferably 3 to 6 carbon atoms.
- a perfluoropolyether derivative corresponding to the Rf-PFPE- moiety is used as a raw material, iodine is introduced into the terminal, and then the dehydrohalogenation reaction is performed. It can be obtained by attaching.
- the YA moiety is a precursor group and converting the precursor group into the YA moiety by a method known in the art.
- the conversion method is not particularly limited, and for example, a known reaction for forming a carbon-carbon unsaturated bond, for example, a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction may be used, or It can also be produced by adding or substituting a compound having a carbon-carbon unsaturated bond at the molecular end corresponding to the YA moiety.
- a desorption reaction such as a dehydration reaction or a dehydrohalogenation reaction
- a person skilled in the art can select an appropriate reaction and the reaction conditions depending on the structure of the compound.
- the surface treating agent of the present invention may be diluted with a solvent.
- a solvent is not particularly limited.
- perfluorohexane CF 3 CF 2 CHCl 2 , CF 3 CH 2 CF 2 CH 3 , CF 3 CHFCHFC 2 F 5 , 1,1,1, 2,2,3,3,4,5,5,6,6-tridecafluorooctane, 1,1,2,2,3,3,4-heptafluorocyclopentane (Zeorolla H (trade name) Etc.), C 4 F 9 OCH 3 , C 4 F 9 OC 2 H 5 , CF 3 CH 2 OCF 2 CHF 2 , C 6 F 13 CH ⁇ CH 2 , xylene hexafluoride, perfluorobenzene, methyl pentadecafluoro heptyl ketone, trifluoroethanol, pentafluoropropanol, hexafluoroisopropanol, HCF 2 CF 2 CH 2 OH
- the surface treatment agent of the present invention may contain other components in addition to the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end.
- Such other components are not particularly limited.
- fluorine-containing compounds preferably perfluoro (poly) ether compounds (hereinafter referred to as “containing”) that can be understood as fluorine-containing oils.
- fluorine oil perfluoro (poly) ether compounds
- silicone oil silicone oil
- catalysts and the like.
- Rf 1 represents a C 1-16 alkyl group (preferably a C 1-16 perfluoroalkyl group) optionally substituted by one or more fluorine atoms
- Rf 2 represents Represents a C 1-16 alkyl group (preferably a C 1-16 perfluoroalkyl group) optionally substituted by one or more fluorine atoms, a fluorine atom or a hydrogen atom
- Rf 1 and Rf 2 Are more preferably each independently a C 1-3 perfluoroalkyl group.
- a ′, b ′, c ′ and d ′ each represent the number of four types of repeating units of perfluoro (poly) ether constituting the main skeleton of the polymer, and are each independently an integer of 0 to 300, , A ′, b ′, c ′ and d ′ are at least 1, preferably 1 to 300, more preferably 20 to 300.
- the order of presence of each repeating unit in parentheses with subscripts a ′, b ′, c ′ or d ′ is arbitrary in the formula.
- — (OC 4 F 8 ) — represents — (OCF 2 CF 2 CF 2 CF 2 ) —, — (OCF (CF 3 ) CF 2 CF 2 ) —, — (OCF 2 CF (CF 3 ) CF 2 )-,-(OCF 2 CF 2 CF (CF 3 ))-,-(OC (CF 3 ) 2 CF 2 )-,-(OCF 2 C (CF 3 ) 2 )-,-(OCF (CF 3 ) CF (CF 3 ))-,-(OCF (C 2 F 5 ) CF 2 )-and-(OCF 2 CF (C 2 F 5 ))-may be used, but preferably — (OCF 2 CF 2 CF 2 CF 2 ) —.
- — (OCF 2 CF 2 ) — is preferable.
- — (OC 2 F 4 ) — may be either — (OCF 2 CF 2 ) — or — (OCF (CF 3 )) —, but is preferably — (OCF 2 CF 2 ) —.
- a compound represented by any one of the following general formulas (3a) and (3b) may be used. May be included).
- Rf 1- (OCF 2 CF 2 CF 2 ) b '' -Rf 2 (3a) Rf 1 — (OCF 2 CF 2 CF 2 ) a ′′ — (OCF 2 CF 2 CF 2 ) b ′′ — (OCF 2 CF 2 ) c ′′ — (OCF 2 ) d ′′ —Rf 2. ..
- Rf 1 and Rf 2 are as described above; in formula (3a), b ′′ is an integer of 1 to 100; in formula (3b), a ′′ and b ′′ are Each independently represents an integer of 1 to 30, and c ′′ and d ′′ are each independently an integer of 1 to 300.
- the order of existence of each repeating unit with subscripts a ′′, b ′′, c ′′, d ′′ and parentheses is arbitrary in the formula.
- the fluorine-containing oil may have an average molecular weight of 1,000 to 30,000. Thereby, high surface slipperiness can be obtained.
- the fluorine-containing oil is a total of 100 parts by mass of the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end (in the case of two or more, respectively, the total of these is also the same).
- 0 to 500 parts by mass preferably 0 to 400 parts by mass, more preferably 5 to 300 parts by mass.
- the compound represented by the general formula (3a) and the compound represented by the general formula (3b) may be used alone or in combination. It is preferable to use the compound represented by the general formula (3b) rather than the compound represented by the general formula (3a) because higher surface slip properties can be obtained.
- the mass ratio of the compound represented by the general formula (3a) and the compound represented by the general formula (3b) is preferably 1: 1 to 1:30, and preferably 1: 1 to 1 : 10 is more preferable. According to such a mass ratio, a surface treatment layer having an excellent balance between surface slipperiness and friction durability can be obtained.
- the fluorine-containing oil contains one or more compounds represented by the general formula (3b).
- the mass ratio of the total of fluorine-containing compounds having a carbon-carbon unsaturated bond at the molecular end in the surface treatment agent to the compound represented by formula (3b) is 4: 1 to 1: 4.
- the average molecular weight of the fluorinated oil may be larger than the average molecular weight of the fluorinated compound having a carbon-carbon unsaturated bond at the molecular end. . By setting such an average molecular weight, more excellent friction durability and surface slipperiness can be obtained.
- the fluorine-containing oil may be a compound represented by the general formula Rf 3 -F (wherein Rf 3 is a C 5-16 perfluoroalkyl group).
- a chlorotrifluoroethylene oligomer may be sufficient.
- the compound represented by Rf 3 -F and the chlorotrifluoroethylene oligomer are a compound represented by a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end, the terminal of which is a C 1-16 perfluoroalkyl group. This is preferable in that high affinity can be obtained.
- Fluorine-containing oil contributes to improving the surface slipperiness of the surface treatment layer.
- the silicone oil for example, a linear or cyclic silicone oil having a siloxane bond of 2,000 or less can be used.
- the linear silicone oil may be so-called straight silicone oil and modified silicone oil.
- the straight silicone oil include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil.
- modified silicone oil include those obtained by modifying straight silicone oil with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol and the like.
- Examples of the cyclic silicone oil include cyclic dimethylsiloxane oil.
- the silicone oil is used in a total of 100 parts by mass of the fluorine-containing compounds having a carbon-carbon unsaturated bond at the molecular end (in the case of two or more types, these are the same, the same applies hereinafter). For example, 0 to 300 parts by mass, preferably 0 to 200 parts by mass.
- Silicone oil contributes to improving the surface slipperiness of the surface treatment layer.
- the catalyst examples include acids (eg, acetic acid, trifluoroacetic acid, etc.), bases (eg, ammonia, triethylamine, diethylamine, etc.), transition metals (eg, Ti, Ni, Sn, etc.), and the like.
- acids eg, acetic acid, trifluoroacetic acid, etc.
- bases eg, ammonia, triethylamine, diethylamine, etc.
- transition metals eg, Ti, Ni, Sn, etc.
- the catalyst promotes the hydrolysis and dehydration condensation and promotes the formation of the surface treatment layer.
- the surface treatment agent of the present invention can be made into a pellet by impregnating a porous material such as a porous ceramic material or metal fiber such as steel wool hardened in a cotton form.
- the pellet can be used for, for example, vacuum deposition.
- a surface treatment layer is formed on the surface of the substrate, thereby having high alkali resistance.
- Water-based, oil-repellent, antifouling for example, preventing the adhesion of dirt such as fingerprints
- waterproofing for preventing water from entering electronic parts, etc.
- surface slipperiness or lubrication, for example, dirt such as fingerprints
- the surface treatment layer having wiping properties, excellent tactile sensation to the finger), UV resistance and the like can be obtained.
- the substrate usable in the present invention may be, for example, an inorganic material (for example, glass, sapphire glass), a resin (natural or synthetic resin, for example, a general plastic material, specifically, an acrylic resin, a polycarbonate resin). , Plate, film, etc.), metal (may be a single metal such as aluminum, copper, iron or a composite such as an alloy), ceramics, semiconductor (silicon, germanium, etc.), fiber ( Woven fabrics, non-woven fabrics, etc.), fur, leather, wood, ceramics, stones, construction materials, etc.
- an inorganic material for example, glass, sapphire glass
- a resin naturally or synthetic resin, for example, a general plastic material, specifically, an acrylic resin, a polycarbonate resin
- metal may be a single metal such as aluminum, copper, iron or a composite such as an alloy
- ceramics semiconductor (silicon, germanium, etc.), fiber ( Woven fabrics, non-woven fabrics, etc.), fur, leather, wood, ceramics, stones, construction materials, etc.
- the material constituting the surface of the substrate may be an optical member material such as glass or transparent plastic.
- the surface (for example, outermost layer) of the base material may have some layer (or film) such as a hard coat layer or an antireflection layer.
- the antireflection layer either a single-layer antireflection layer or a multilayer antireflection layer may be used.
- the article to be manufactured is an optical glass component for a touch panel
- a thin film using a transparent electrode such as indium tin oxide (ITO) or indium zinc oxide is provided on a part of the surface of the substrate (glass).
- the base material is an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating film layer, a polarizing film, a phase difference film, And a liquid crystal display module or the like.
- a preferred substrate is glass or sapphire glass.
- the glass is preferably soda lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystal glass, or quartz glass, chemically strengthened soda lime glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded. Borosilicate glass is particularly preferred.
- the shape of the substrate is not particularly limited.
- the surface region of the base material on which the surface treatment layer is to be formed may be at least part of the surface of the base material, and can be appropriately determined according to the use and specific specifications of the article to be manufactured.
- the substrate has Si—H bonds or C—H bonds on its surface.
- the Si—H bond or C—H bond may be introduced by pretreating the surface of the substrate.
- Si—H bond or C—H bond can be introduced into the substrate surface by plasma treatment of the substrate surface.
- the Si—H bond or C—H bond may be introduced by forming a layer having a Si—H bond or C—H bond on the surface of the substrate.
- a layer having a Si—H bond or C—H bond may be formed on the surface of the substrate.
- Si—H bonds or C—H bonds are formed on the substrate surface.
- a layer having can be formed.
- the substrate may have a hydroxyl group on the surface in addition to the Si—H bond or C—H bond.
- a base material for example, when a surface treatment agent containing a Si atom to which a hydrolyzable group is bonded in addition to a carbon-carbon unsaturated bond at the molecular end is used, the base material is more firmly formed. And the surface treatment layer can be combined.
- Examples of the method for forming the surface treatment layer on the surface of the substrate as described above include the following methods.
- the formation of the surface treatment layer can be carried out by applying the surface treatment agent to the surface of the substrate so as to cover the surface.
- the coating method is not particularly limited. For example, wet coating methods and dry coating methods can be used.
- wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating and similar methods.
- Examples of dry coating methods include vapor deposition (usually vacuum vapor deposition), sputtering, CVD, and similar methods.
- Specific examples of the vapor deposition method include resistance heating, high-frequency heating using an electron beam, microwave, and the like, an ion beam, and similar methods.
- Specific examples of the CVD method include plasma-CVD, optical CVD, thermal CVD, and similar methods.
- the surface treatment agent of the present invention can be applied to the substrate surface after being diluted with a solvent.
- the following solvents are preferably used: C 5-12 perfluoroaliphatic hydrocarbons (for example, perfluorohexane, perfluoromethylcyclohexane and Perfluoro-1,3-dimethylcyclohexane); polyfluoroaromatic hydrocarbons (eg bis (trifluoromethyl) benzene); polyfluoroaliphatic hydrocarbons (eg C 6 F 13 CH 2 CH 3 (eg Asahi Glass) Asahiclin (registered trademark) AC-6000 manufactured by Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (for example, ZEOLOR (registered trademark) H manufactured by ZEON CORPORATION) Hydrofluorocarbon (HFC) (for example, 1,1,
- alkyl perfluoroalkyl ethers such as perfluoroalkyl groups and the alkyl group may be straight or branched
- CF 3 CH 2 OCF 2 CHF 2 e.g., Asahi Glass ASAHIKLIN Co., Ltd. ( (Registered trademark) AE-3000)
- 1,2-dichloro-1,3,3,3-tetrafluoro-1-propene for example, Bertrell (registered trademark) Scion manufactured by Mitsui DuPont Fluorochemical Co., Ltd.
- solvents can be used alone or in combination as a mixture of two or more thereof, for example, for adjusting the solubility of a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal. It can also be mixed with another solvent.
- the surface treatment agent of the present invention may be directly subjected to the dry coating method, or may be diluted with the above-described solvent and then subjected to the dry coating method.
- the film formation is such that in the film the surface treatment agent of the present invention is present with a catalyst for reaction with the substrate, for example reaction with Si—H bonds or C—H bonds of the substrate.
- a catalyst for reaction with the substrate for example reaction with Si—H bonds or C—H bonds of the substrate.
- the catalyst may be added to the diluted solution of the surface treatment agent of the present invention immediately after the surface treatment agent of the present invention is diluted with a solvent and applied to the substrate surface.
- the surface treatment agent of the present invention to which the catalyst is added is directly vapor-deposited (usually vacuum deposition), or the porous material is impregnated with the surface treatment agent of the present invention to which the catalyst is added. Vapor deposition (usually vacuum deposition) may be performed using a substance.
- a catalyst may be present on the surface of the substrate before providing the surface treatment agent on the surface of the substrate.
- the catalyst is not particularly limited.
- a metal catalyst specifically platinum, palladium, rhodium, and ruthenium can be used, and platinum is particularly preferable.
- the membrane may be post-treated.
- the bond between the surface treatment layer and the substrate can be further strengthened, and the durability is improved.
- this post-processing is not specifically limited, For example, heat processing may be sufficient.
- the temperature of the heat treatment is not particularly limited, but is 60 ° C. or higher, preferably 100 ° C. or higher, and a temperature at which the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal is not decomposed, for example, 250 ° C. or lower, preferably 180 ° C. or lower.
- the heat treatment is preferably performed in an inert atmosphere, more preferably in a vacuum.
- a recess may be formed on the surface of the substrate before the surface of the substrate is treated with the surface treatment agent.
- the surface treatment agent is filled in the recess when the surface of the substrate is treated with the surface treatment agent. Since the surface treatment agent filled in the recesses acts to compensate for the consumed surface treatment agent when the surface treatment layer is consumed due to wear or the like due to use, the function of the surface treatment agent is maintained for a longer period of time. Can be made.
- the shape, dimensions, and quantity of the recesses are not particularly limited, but the surface state of the base material after the formation of the recesses and before the application of the surface treatment agent is such that the value of Rmax (maximum height) of the surface of the base material is Ra (The centerline average roughness is preferably about 10 to 50 times, preferably 20 to 40 times.
- the Ra and Rmax are defined in JIS B0601: 1982.
- the value of Ra is preferably 60 nm or less, more preferably 40 nm or less. By setting the value of Ra to about 1/10 or less of the visible light wavelength, the transparency of the substrate can be ensured.
- the method for forming the recess on the surface of the substrate is not particularly limited, and either a chemical method or a physical method may be used. Specifically, etching, sputtering, or the like can be used.
- the surface treatment layer performs a pretreatment on the surface to form a binding site with a compound in the surface treatment agent to be used on the surface, and the surface treatment agent is applied to the pretreated substrate. It forms by supplying and forming a surface treatment layer on the surface of a base material.
- the present invention is a method of forming a surface treatment layer on the surface of a substrate, Performing a pretreatment on the surface to form a binding site with a carbon-carbon unsaturated bond on the surface of the substrate;
- a method for forming a surface treatment layer is also provided, comprising the step of supplying the surface treatment agent of the present invention to the substrate after the pretreatment to form a surface treatment layer on the surface of the substrate.
- the present invention is an apparatus for carrying out the above method, that is, a surface treatment layer forming apparatus for forming a surface treatment layer on the surface of a substrate, A pretreatment portion for performing a pretreatment on the surface of the base material to form a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end on the surface; Also provided is a surface treatment layer forming apparatus characterized by having a surface treatment layer forming section for supplying a surface treatment agent of the present invention to a pretreated substrate and forming a surface treatment layer on the surface of the substrate. To do.
- FIG. 1 is a block diagram showing an embodiment of a surface treatment layer forming apparatus of the present invention for forming a surface treatment layer on a substrate.
- FIG. 2 is a cross-sectional view illustrating an aspect of the preprocessing unit 200.
- a surface treatment layer forming apparatus 100 includes a pretreatment unit 200 that performs pretreatment of a substrate, and a surface treatment layer formation unit 300 that forms a surface treatment layer on the substrate after the pretreatment.
- the substrate transport unit 400 that transports the substrate to and from the pretreatment unit 200 and the surface treatment layer forming unit 300, the substrate carry-in / out unit 500 that carries in and out the substrate, and each component of the surface treatment layer forming apparatus 100 are controlled. And a control unit 600.
- the surface treatment layer forming apparatus 100 is configured as a multi-chamber type apparatus.
- the substrate transfer unit 400 includes a transfer chamber held in a vacuum and a substrate transfer mechanism provided in the transfer chamber.
- the substrate carry-in / out unit 500 includes a substrate holding unit and a load lock chamber, conveys the substrate in the substrate holding unit to the load lock chamber, and carries in / out the substrate through the load lock chamber.
- the pretreatment unit 200 performs pretreatment for forming a binding site with a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end on the surface of the substrate.
- the surface treatment of the substrate is performed such that the surface state of the substrate on which the surface treatment layer is formed is in a state where a high-density surface treatment layer can be formed by the surface treatment agent used.
- the plasma processing apparatus is configured to control the amount of O and H on the surface portion of the substrate 220.
- the pre-processing unit 200 includes a chamber 201, a substrate holder 202 that holds the substrate 220 in the chamber 201, a plasma generation unit 203 that generates plasma and supplies the plasma into the chamber 201, and evacuates the chamber 201. And an exhaust mechanism 204.
- a loading / unloading port 211 for loading / unloading the substrate 220 is provided on the side wall of the chamber 201, and the loading / unloading port 211 can be opened and closed by a gate valve 212.
- the plasma generation unit 203 is supplied with a processing gas containing hydrogen gas, generates plasma containing hydrogen by an appropriate technique such as microwave plasma, inductively coupled plasma, capacitively coupled plasma, and supplies the plasma into the chamber 201.
- the exhaust mechanism 204 includes an exhaust pipe 213 connected to the lower portion of the chamber 201, a pressure adjustment valve 214 provided in the exhaust pipe 213, and a vacuum pump 215 that exhausts the inside of the chamber 201 through the exhaust pipe 213. ing.
- the substrate 220 is held on the substrate holder 202, the inside of the chamber 201 is held at a predetermined vacuum pressure, and in this state, plasma containing hydrogen is supplied into the chamber 201 from the plasma generation unit 203.
- the surface of the substrate 220 is treated with plasma.
- the plasma containing hydrogen include plasma containing hydrogen and a rare gas (for example, helium, neon, argon, krypton, or xenon), or plasma containing hydrogen alone.
- the substrate 220 surface-treated by the pretreatment unit 200 is moved to the organic molecular film formation unit 300, and SAM material gas is supplied to the vicinity of the substrate 220, thereby forming a SAM as a surface treatment layer on the surface of the substrate 220. To do.
- the control unit 600 has a controller including a microprocessor (computer) that controls each component of the device 100.
- the controller controls, for example, the output of the pretreatment unit 200, the gas flow rate, the degree of vacuum, the flow rate of the carrier gas of the surface treatment layer forming unit 300, the degree of vacuum, and the like.
- the controller is connected to a user interface having a keyboard for an operator to input commands for managing the device 100, a display for visualizing and displaying the operating status of the device 100, and the like.
- the controller causes each component of the apparatus 100 to execute a predetermined process in accordance with a control program and processing conditions for realizing a predetermined operation in the surface treatment executed by the apparatus 100 under the control of the controller.
- a storage unit storing a processing recipe, which is a control program, and various databases is connected.
- the processing recipe is stored in an appropriate storage medium in the storage unit.
- an arbitrary processing recipe is called from the storage unit and is executed by the controller, whereby a desired process in the apparatus 100 is performed under the control of the controller.
- the substrate used in the surface treatment layer forming method and the surface treatment forming apparatus of the present invention is not particularly limited, but a substrate having at least a surface structure having a network structure of Si and O is preferable.
- An example of such a substrate is glass.
- the present invention provides: A method of forming a surface treatment layer on the surface of a substrate having at least a surface portion having a network structure of Si and O, Performing a pretreatment for forming a Si—H bond on the surface of the substrate; Supplying a surface treatment agent containing a compound having a carbon-carbon unsaturated bond at a molecular end to a pretreated substrate to form a surface treatment layer on the surface of the substrate, A method for forming a surface treatment layer; and a method for producing an article comprising a substrate and a surface treatment layer covering the surface of the substrate,
- the surface treatment agent of the present invention is brought into contact with the surface of the substrate, the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular terminal contained in the surface treatment agent, and the Si—H part or C—H on the substrate surface
- a production method including forming a surface treatment layer on the surface of the base material by reacting with a part.
- the surface treatment agent of the present invention contains a fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end, and if a bonding site with this carbon-carbon unsaturated bond is present on the surface of the substrate, Such a surface treatment layer can be formed. Accordingly, the pretreatment is not limited as long as Si—H bonds can be formed on the surface of the substrate. For example, the following hydrogen atom treatment or heat treatment in a hydrogen atmosphere may be performed as the pretreatment.
- Hydrogen gas is supplied to an ultra-high vacuum (1 ⁇ 10 ⁇ 6 Pa or less) vacuum chamber at about 1 ⁇ 10 ⁇ 4 Pa, and hydrogen molecules are dissociated into hydrogen atoms by thermal electrons or plasma. Adsorb to the substrate surface.
- an organic monomolecular film preferably a self-assembled monomolecular film, can be formed on the surface of the substrate as the surface treatment layer.
- a layer having Si—H bonds or C—H bonds may be formed on the surface of the substrate.
- Si—H bonds or C—H bonds may be formed on the substrate surface.
- a layer having can be formed.
- the surface treatment layer derived from the film of the surface treatment agent of the present invention is formed on the surface of the substrate, and the article of the present invention is manufactured.
- the article of the present invention includes a base material and a layer (surface treatment layer) formed on the surface of the base material from the surface treatment agent of the present invention.
- the present invention also relates to a method for producing an article comprising a substrate and a surface treatment layer covering the surface of the substrate, wherein the surface treatment agent of the present invention is brought into contact with the surface of the substrate to form a surface treatment agent.
- a surface treatment layer is formed on the surface of the base material by reacting the fluorine-containing compound having a carbon-carbon unsaturated bond at the molecular end contained with the Si—H part or C—H part of the base material surface.
- a manufacturing method is also provided.
- the surface treatment layer obtained by the present invention is bonded to the base material by Si—C bond or C—C bond, in addition to high physical strength, it has high resistance to alkali and ultraviolet rays. Have.
- the surface treatment layer obtained according to the present invention has water repellency, oil repellency, antifouling properties (for example, preventing adhesion of dirt such as fingerprints), surface slip, etc., depending on the composition of the surface treatment agent used. Properties (or lubricity, for example, the ability to wipe off dirt such as fingerprints, and excellent tactile sensation to fingers), etc., and can be suitably used as a functional thin film.
- the present invention further provides an optical material having the cured product as an outermost layer.
- optical material in addition to optical materials relating to displays and the like exemplified below, a wide variety of optical materials are preferably mentioned: for example, cathode ray tube (CRT; eg, TV, personal computer monitor), liquid crystal display, plasma display, Organic EL display, inorganic thin-film EL dot matrix display, rear projection display, fluorescent display tube (VFD), field emission display (FED), or a protective plate of those displays, or reflection on the surface thereof Those with a protective film treatment.
- CTR cathode ray tube
- LCD liquid crystal display
- Organic EL display organic EL display
- inorganic thin-film EL dot matrix display rear projection display
- fluorescent display tube (VFD), field emission display (FED) or a protective plate of those displays, or reflection on the surface thereof Those with a protective film treatment.
- the article having the surface treatment layer obtained by the present invention is not particularly limited, but may be an optical member.
- optical members include: lenses such as eyeglasses; front protective plates, antireflection plates, polarizing plates, and antiglare plates for displays such as PDP and LCD; for devices such as mobile phones and portable information terminals.
- the article having the surface treatment layer obtained by the present invention may be a medical device or a medical material.
- the thickness of the surface treatment layer is not particularly limited.
- the thickness of the surface treatment layer is in the range of 1 to 50 nm, 1 to 30 nm, preferably 1 to 15 nm, from the viewpoint of optical performance, surface slipperiness, friction durability, and antifouling properties. preferable.
- the articles obtained using the surface treating agent of the present invention have been described in detail.
- the use of the surface treating agent of the present invention, the usage method, the manufacturing method of the article, and the like are not limited to those exemplified above.
- Example 1 -Formation of surface treatment layer Glass was prepared as a substrate, and the surface of the glass was plasma treated to form Si-H bonds on the glass surface.
- a surface treatment layer was formed on the surface of the treated glass by a vacuum deposition method under the following conditions using a surface treatment agent containing a fluorine-containing compound having the following average composition.
- Fluorine-containing compounds CF 3 CF 2 CF 2 O (CF 2 CF 2 CF 2 O) n CF 2 CF 2 OCH 2 CH ⁇ CH 2 (In the formula, n is an integer of 20.)
- Vacuum deposition conditions Equipment vacuum: 1E-5Pa Compound temperature during deposition: 200 ° C
- Substrate temperature Room temperature (not controlled)
- Deposition time 10 minutes
- CFx film After vacuum deposition, formation of a CFx film was confirmed by observing the C1s activation energy spectrum of the surface treatment layer using X-ray photoelectron spectroscopy (XPS). Moreover, the static contact angle of water of this surface treatment layer was measured with 5 ⁇ L of water under a 25 ° C. environment using a contact angle measuring device (manufactured by Kyowa Interface Science Co., Ltd.). The result was 110 ° or more.
- XPS X-ray photoelectron spectroscopy
- Test example 1 (alkali resistance test) An aqueous alkali solution (25 wt% KOH aqueous solution with a pH of 14) was dropped onto the surface of the glass on which the surface treatment layer obtained above was formed, and left still for 30 minutes. Then, the surface treatment layer was observed using XPS analysis. Since the peak shift of the C1s orbital did not change, no chemical change of the surface treatment layer could be confirmed even 30 minutes after the alkaline aqueous solution was dropped. Further, the static contact angle of water was measured in the same manner as described above. The result was 110 ° or more.
- Test example 2 artificial sweat resistance test
- an alkaline artificial sweat specified in JIS L 0848 “Testing method for dyeing fastness to sweat” was dropped and allowed to stand for 2 hours. Thereafter, the surface treatment layer thickness was measured using an ellipsometer. The change in the film thickness was 1 nm or less before and after the artificial sweat droplet, and the film was not deteriorated by sweat.
- the surface of the surface treatment layer before and after the dropping was observed using XPS analysis. Since the peak shift of the C1s orbit was not changed, no chemical change of the surface treatment layer could be confirmed even 2 hours after the artificial sweat droplet. Further, the static contact angle of water was measured in the same manner as described above. The result was 110 ° or more.
- the present invention can be suitably used for forming a surface treatment layer on the surface of a substrate, particularly an optical member.
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Abstract
Description
前記基材に対し、その表面に、分子末端に炭素-炭素不飽和結合を有する含フッ素化合物との結合サイトを形成する前処理を行う工程と、
前処理された基材に、本発明の表面処理剤を供給して基材の表面に表面処理層を形成する工程と
を含む、表面処理層の形成方法が提供される。
前記基材に対し、その表面に、分子末端に炭素-炭素不飽和結合を有する含フッ素化合物との結合サイトを形成する前処理を行う前処理部と、
前処理された基材に、本発明の表面処理剤を供給して基材の表面に表面処理層を形成する表面処理層形成部と
を有することを特徴とする表面処理層形成装置が提供される。
本発明の表面処理剤を基材の表面に接触させて、表面処理剤に含まれる分子末端に炭素-炭素不飽和結合を有する含フッ素化合物と、基材表面のSi-H部またはC-H部とを反応させることにより、該基材の表面に表面処理層を形成する
ことを含む、製造方法が提供される。
-(R31)p’-(Xa)q’-R32-
[式中:
R31は、単結合、-(CH2)s’-またはo-、m-もしくはp-フェニレン基を表し、好ましくは-(CH2)s’-であり、
R32は、単結合、-(CH2)t’-またはo-、m-もしくはp-フェニレン基を表し、好ましくは-(CH2)t’-であり、
s’は、1~20の整数、好ましくは1~6の整数、より好ましくは1~3の整数、さらにより好ましくは1または2であり、
t’は、1~20の整数、好ましくは2~6の整数、より好ましくは2~3の整数であり、
Xaは、-(Xb)r’-を表し、
Xbは、各出現においてそれぞれ独立して、-O-、-S-、o-、m-もしくはp-フェニレン基、-C(O)O-、-CONR34-、-O-CONR34-、-NR34-、-Si(R33)2-、-(Si(R33)2O)m’-Si(R33)2-、および-(CH2)n’-からなる群から選択される基を表し、
R33は、各出現においてそれぞれ独立して、フェニル基、C1-6アルキル基またはC1-6アルコキシ基を表し、好ましくはC1-6アルキル基、より好ましくはメチル基であり、
R34は、各出現においてそれぞれ独立して、水素原子、フェニル基またはC1-6アルキル基(好ましくはメチル基)を表し、
m’は、各出現において、それぞれ独立して、1~100の整数、好ましくは1~20の整数であり、
n’は、各出現において、それぞれ独立して、1~20の整数、好ましくは1~6の整数、より好ましくは1~3の整数であり、
r’は、1~10の整数、好ましくは1~5の整数、より好ましくは1~3の整数であり、
p’は、0または1であり、
q’は、0または1であり、
ここに、p’およびq’の少なくとも一方は1であり、p’またはq’を付して括弧でくくられた各繰り返し単位の存在順序は任意である。]
で表される2価の基が挙げられる。
C1-20アルキレン基、
-R31-Xc-R32-、または
-Xd-R32-
[式中、R31およびR32は、上記と同意義である。]
であり得る。
C1-20アルキレン基、
-(CH2)s’-Xc-、
-(CH2)s’-Xc-(CH2)t’-
-Xd-、または
-Xd-(CH2)t’-
[式中、s’およびt’は、上記と同意義である。]
である。
-O-、
-S-、
-C(O)O-、
-CONR34-、
-O-CONR34-、
-Si(R33)2-、
-(Si(R33)2O)m’-Si(R33)2-、
-O-(CH2)u’-(Si(R33)2O)m’-Si(R33)2-、
-CONR34-(CH2)u’-(Si(R33)2O)m’-Si(R33)2-、
-CONR34-(CH2)u’-N(R34)-、または
-CONR34-(o-、m-またはp-フェニレン)-Si(R33)2-
[式中、R33、R34およびm’は、上記と同意義であり、
u’は1~20の整数、好ましくは2~6の整数、より好ましくは2~3の整数である。]を表す。Xcは、好ましくは-O-である。
-S-、
-C(O)O-、
-CONR34-、
-CONR34-(CH2)u’-(Si(R33)2O)m’-Si(R33)2-、
-CONR34-(CH2)u’-N(R34)-、または
-CONR34-(o-、m-またはp-フェニレン)-Si(R33)2-
を表す。
C1-20アルキレン基、
-(CH2)s’-Xc-(CH2)t’-、または
-Xd-(CH2)t’-
[式中、各記号は、上記と同意義である。]
であり得る。
C1-20アルキレン基、
-(CH2)s’-O-(CH2)t’-、
-(CH2)s’-Si(R33)2-(CH2)t’-、
-(CH2)s’-(Si(R33)2O)m’-Si(R33)2-(CH2)t’-、
-(CH2)s’-O-(CH2)u’-(Si(R33)2O)m’-Si(R33)2-(CH2)t’-、または
-(CH2)s’-O-(CH2)t’-Si(R33)2 -(CH2)u’-Si(R33)2-(CvH2v)-
[式中、各記号は、上記と同意義であり、vは1~20の整数、好ましくは2~6の整数、より好ましくは2~3の整数である。]
である。
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CH2O(CH2)6-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、
-CH2OCF2CHFOCF2-、
-CH2OCF2CHFOCF2CF2-、
-CH2OCF2CHFOCF2CF2CF2-、
-CH2OCH2CF2CF2OCF2-、
-CH2OCH2CF2CF2OCF2CF2-、
-CH2OCH2CF2CF2OCF2CF2CF2-、
-CH2OCH2CF2CF2OCF(CF3)CF2OCF2-、
-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2-、
-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2CF2-、
-CH2OCH2CHFCF2OCF2-、
-CH2OCH2CHFCF2OCF2CF2-、
-CH2OCH2CHFCF2OCF2CF2CF2-、
-CH2OCH2CHFCF2OCF(CF3)CF2OCF2-、
-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2-、
-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2CF2-
-CH2OCH2(CH2)7CH2Si(OCH3)2OSi(OCH3)2(CH2)2Si(OCH3)2OSi(OCH3)2(CH2)2-、
-CH2OCH2CH2CH2Si(OCH3)2OSi(OCH3)2(CH2)3-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-(CH2)6-、
-(CH2)2-Si(CH3)2-(CH2)2-
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、
-CONH-(CH2)6-、
-CON(CH3)-(CH2)6-、
-CON(Ph)-(CH2)6-(式中、Phはフェニルを意味する)、
-CONH-(CH2)2NH(CH2)3-、
-CONH-(CH2)6NH(CH2)3-、
-CH2O-CONH-(CH2)3-、
-CH2O-CONH-(CH2)6-、
-S-(CH2)3-、
-(CH2)2S(CH2)3-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-
-C(O)O-(CH2)3-、
-C(O)O-(CH2)6-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-(CH2)2-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-CH(CH3)-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-(CH2)3-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-CH(CH3)-CH2-、
Dは、
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CF2O(CH2)3-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、および
から選択される基であり、
Eは、-(CH2)n-(nは2~6の整数)であり、
Dは、分子主鎖のPFPEに結合し、Eは、PFPEと反対の基に結合する。]
各X1基において、Tのうち任意のいくつかは、分子主鎖のPFPEに結合する以下の基:
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CF2O(CH2)3-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、または
であり、別のTのいくつかは、分子主鎖のPFPEと反対の基に結合する-(CH2)n”-(n”は2~6の整数)であり、存在する場合、残りは、それぞれ独立して、メチル基またはフェニル基である。
Rf1-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-Rf2 ・・・(3)
式中、Rf1は、1個またはそれ以上のフッ素原子により置換されていてもよいC1-16のアルキル基(好ましくは、C1―16のパーフルオロアルキル基)を表し、Rf2は、1個またはそれ以上のフッ素原子により置換されていてもよいC1-16のアルキル基(好ましくは、C1-16のパーフルオロアルキル基)、フッ素原子または水素原子を表し、Rf1およびRf2は、より好ましくは、それぞれ独立して、C1-3のパーフルオロアルキル基である。
a’、b’、c’およびd’は、ポリマーの主骨格を構成するパーフルオロ(ポリ)エーテルの4種の繰り返し単位数をそれぞれ表し、互いに独立して0以上300以下の整数であって、a’、b’、c’およびd’の和は少なくとも1、好ましくは1~300、より好ましくは20~300である。添字a’、b’、c’またはd’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。これら繰り返し単位のうち、-(OC4F8)-は、-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-および-(OCF2CF(C2F5))-のいずれであってもよいが、好ましくは-(OCF2CF2CF2CF2)-である。-(OC3F6)-は、-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-および-(OCF2CF(CF3))-のいずれであってもよく、好ましくは-(OCF2CF2CF2)-である。-(OC2F4)-は、-(OCF2CF2)-および-(OCF(CF3))-のいずれであってもよいが、好ましくは-(OCF2CF2)-である。
Rf1-(OCF2CF2CF2)b’’-Rf2 ・・・(3a)
Rf1-(OCF2CF2CF2CF2)a’’-(OCF2CF2CF2)b’’-(OCF2CF2)c’’-(OCF2)d’’-Rf2 ・・・(3b)
これら式中、Rf1およびRf2は上記の通りであり;式(3a)において、b’’は1以上100以下の整数であり;式(3b)において、a’’およびb’’は、それぞれ独立して1以上30以下の整数であり、c’’およびd’’はそれぞれ独立して1以上300以下の整数である。添字a’’、b’’、c’’、d’’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。
前記基材に対し、その表面に、炭素-炭素不飽和結合との結合サイトを形成する前処理を行う工程と、
前記前処理後の基材に、本発明の表面処理剤を供給して基材の表面に表面処理層を形成する工程と
を含む、表面処理層の形成方法をも提供する。
前記基材に対し、その表面に、分子末端に炭素-炭素不飽和結合を有する含フッ素化合物との結合サイトを形成する前処理を行う前処理部と、
前処理された基材に、本発明の表面処理剤を供給して基材の表面に表面処理層を形成する表面処理層形成部と
を有することを特徴とする表面処理層形成装置をも提供する。
少なくとも表面部分がSiとOとのネットワーク構造を有する基材の表面に表面処理層を形成する方法であって、
前記基材の表面にSi-H結合を形成する前処理を行う工程と、
前処理された基材に、分子末端に炭素-炭素不飽和結合を有する化合物を含む表面処理剤を供給して基材の表面に表面処理層を形成する工程と
を含むことを特徴とする、表面処理層の形成方法;ならびに
基材および該基材の表面を被覆する表面処理層を含む物品の製造方法であって、
本発明の表面処理剤を基材の表面に接触させて、表面処理剤に含まれる分子末端に炭素-炭素不飽和結合を有する含フッ素化合物と、基材表面のSi-H部またはC-H部とを反応させることにより、該基材の表面に表面処理層を形成する
ことを含む、製造方法をも提供する。
超高真空(1×10-6Pa以下)の真空チャンバに水素ガスを1×10-4Pa程度供給し、熱電子あるいはプラズマで水素分子を水素原子に解離させて水素原子を基板表面に吸着させる。
真空引きの際に、水素をキャリアガスとして流すことでチャンバの大気を水素ガスに置換して水素雰囲気の真空状態(具体的には、10Pa以下の水素雰囲気)を作成し、この雰囲気中で基板を100~400℃程度に加熱し、水素を基板表面に吸着させる。
・表面処理層の形成
基材としてガラスを準備し、このガラスの表面をプラズマ処理し、ガラス表面にSi-H結合を形成した。処理されたガラスの表面に、下記平均組成を有する含フッ素化合物を含む表面処理剤を用いて、下記条件での真空蒸着法により、表面処理層を形成した。
含フッ素化合物:
CF3CF2CF2O(CF2CF2CF2O)nCF2CF2OCH2CH=CH2
(式中、nは20の整数である。)
真空蒸着条件
装置真空度:1E-5Pa
蒸着時の化合物温度:200℃
基板温度:室温(制御せず)
蒸着時間:10分
上記で得られた表面処理層を形成したガラスの表面に、アルカリ水溶液(pH14の25wt%KOH水溶液)を滴下し、30分間静置した。その後、XPS分析を用いて表面処理層を観察した。C1s軌道のピークシフトが変わらないことから、アルカリ水溶液滴下30分後も表面処理層の化学的な変化は確認できなかった。また、上記と同様に水の静的接触角を測定した。結果は110°以上であった。
上記で得られた表面処理層を形成したガラスの表面に、JIS L 0848「汗に対する染色堅ろう度試験方法」で規定されているアルカリ性人工汗液を滴下し、2時間静置した。その後、エリプソメーターを利用して表面処理層膜厚を測定した。人工汗液滴下前後で膜厚変化は1nm以下であり、汗によって膜の劣化は見られなかった。
200 … 前処理部
300 … 表面処理層形成部
400 … 基板搬送部
500 … 基板搬入出部
600 … 制御部
201 … チャンバ
202 … 基板ホルダ
203 … プラズマ生成部
204 … 排気機構
211 … 搬入出口
212 … ゲートバルブ
213 … 排気管
214 … 圧力調整バルブ
215 … 真空ポンプ
220 … 基板
Claims (54)
- 分子末端に炭素-炭素不飽和結合を、-Y-A(式中、Yは、単結合、酸素原子または2価の有機基を表し、Aは、-CH=CH2または-C≡CHを表す。)で表される基として有する含フッ素化合物を含んで成る表面処理剤。
- 分子末端に炭素-炭素不飽和結合を有する含フッ素化合物が、下記式(A1)、(A2)、(B1)、(B2)、(C1)、(C2)、(D1)および(D2):
Aは、各出現においてそれぞれ独立して、-CH=CH2または-C≡CHを表し;
Yは、各出現においてそれぞれ独立して、単結合、酸素原子または2価の有機基を表し;
Rfは、それぞれ独立して、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基を表し;
PFPEは、それぞれ独立して、-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-を表し、ここに、a、b、cおよびdは、それぞれ独立して0以上200以下の整数であって、a、b、cおよびdの和は少なくとも1であり、a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は式中において任意であり;
R11は、それぞれ独立して、水素原子またはハロゲン原子を表し;
R12は、各出現においてそれぞれ独立して、水素原子または低級アルキル基を表し;
X1は、それぞれ独立して、単結合または2~10価の有機基を表し;
X2は、各出現においてそれぞれ独立して、単結合または2価の有機基を表し;
tは、それぞれ独立して、1~10の整数であり;
αは、それぞれ独立して、1~9の整数であり;
α’は、それぞれ独立して、1~9の整数であり;
X3は、それぞれ独立して、単結合または2~10価の有機基を表し;
βは、それぞれ独立して、1~9の整数であり;
β’は、それぞれ独立して、1~9の整数であり;
X4は、それぞれ独立して、単結合または2~10価の有機基を表し;
γは、それぞれ独立して、1~9の整数であり;
γ’は、それぞれ独立して、1~9の整数であり;
Raは、各出現においてそれぞれ独立して、-Z-SiR71 pR72 qR73 rR74 sを表し;
Zは、各出現においてそれぞれ独立して、酸素原子または2価の有機基を表し;
R71は、各出現においてそれぞれ独立して、Ra’を表し;
Ra’は、Raと同意義であり;
Ra中、Z基を介して直鎖状に連結されるSiは最大で5個であり;
R72は、各出現においてそれぞれ独立して、-X5-Y-Aを表し;
X5は、各出現においてそれぞれ独立して、単結合または2価の有機基であり;
R73は、各出現においてそれぞれ独立して、水酸基または加水分解可能な基を表し;
R74は、各出現においてそれぞれ独立して、水素原子または低級アルキル基を表し;
pは、各出現においてそれぞれ独立して、0~3の整数であり;
qは、各出現においてそれぞれ独立して、0~3の整数であり;
rは、各出現においてそれぞれ独立して、0~3の整数であり;
sは、各出現においてそれぞれ独立して、0~3の整数であり;
ただし、p+q+r+sは、3であり;
Rbは、各出現においてそれぞれ独立して、-X5-Y-Aを表し;
Rcは、各出現においてそれぞれ独立して、水酸基または加水分解可能な基を表し;
Rdは、各出現においてそれぞれ独立して、水素原子または低級アルキル基を表し;
kは、各出現においてそれぞれ独立して、0~3の整数であり;
lは、各出現においてそれぞれ独立して、0~3の整数であり;
mは、各出現においてそれぞれ独立して、0~3の整数であり;
nは、各出現においてそれぞれ独立して、0~3の整数であり;
ただし、k+l+m+nは3であり、-(SiRa kRb lRc mRd n)rにおいて、少なくとも1つのY-A基が存在し;
X6は、それぞれ独立して、単結合または2~10価の有機基を表し;
δは、それぞれ独立して、1~9の整数であり;
δ’は、それぞれ独立して、1~9の整数であり;
R91は、フッ素原子、-CHF2または-CF3を表し;
Rf’は、炭素数1~20のパーフルオロアルキレン基を表す。]
のいずれかで表される少なくとも1種の化合物である、請求項1に記載の表面処理剤。 - Aが、-CH=CH2である、請求項1または2に記載の表面処理剤。
- Yが、単結合、酸素原子または-CR14 2-であり、
R14が、水素原子または低級アルキル基を表す、
請求項1~3のいずれかに記載の表面処理剤。 - Rfが、炭素数1~16のパーフルオロアルキル基である、請求項2~4のいずれかに記載の表面処理剤。
- PFPEが、下記式(a)~(c):
(a)-(OC3F6)b-
(式(a)中、bは1以上200以下の整数である);
(b)-(OC4F8)a-(OC3F6)b-(OC2F4)c-(OCF2)d-
(式(b)中、aおよびbは、それぞれ独立して、0以上30以下の整数であり、cおよびdは、それぞれ独立して、1以上200以下の整数であり、a、b、cおよびdの和は、10以上200以下の整数であり、添字a、b、cまたはdを付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。)
(c)-(OC2F4-R15)n”-
(式(c)中、R15は、それぞれ独立して、OC2F4、OC3F6およびOC4F8から選択される基であり、n”は、2~100の整数である。)
のいずれかである、請求項2~5のいずれかに記載の表面処理剤。 - PFPEにおいて:
OC4F8が、OCF2CF2CF2CF2であり、
OC3F6が、OCF2CF2CF2であり、
OC2F4が、OCF2CF2である、
請求項2~6のいずれかに記載の表面処理剤。 - X1、X3、X4およびX6が2~4価の有機基であり、α、β、γおよびδが1~3であり、α’、β’、γ’およびδ’が1である、請求項2~7のいずれかに記載の表面処理剤。
- X1、X3、X4およびX6が2価の有機基であり、α、β、γおよびδが1であり、α’、β’、γ’およびδ’が1である、請求項2~8のいずれかに記載の表面処理剤。
- X1、X3、X4およびX6が、それぞれ独立して、-(R31)p’-(Xa)q’-R32-
[式中:
R31は、単結合、-(CH2)s’-(式中、s’は、1~20の整数である)またはo-、m-もしくはp-フェニレン基を表し;
R32は、単結合、-(CH2)t’-(式中、t’は、1~20の整数である)またはo-、m-もしくはp-フェニレン基を表し;
Xaは、-(Xb)r’-(式中、r’は、1~10の整数である)を表し;
Xbは、各出現においてそれぞれ独立して、-O-、-S-、o-、m-もしくはp-フェニレン基、-C(O)O-、-Si(R33)2-、-(Si(R33)2O)m’-Si(R33)2-(式中、m’は1~100の整数である)、-CONR34-、-O-CONR34-、-NR34-および-(CH2)n’-(式中、n’は1~20の整数である)からなる群から選択される基を表し;
R33は、各出現においてそれぞれ独立して、フェニル基、C1-6アルキル基またはC1-6アルコキシ基を表し;
R34は、各出現においてそれぞれ独立して、水素原子、フェニル基またはC1-6アルキル基を表し;
p’は、0または1であり;
q’は、0または1であり;
ここに、p’およびq’の少なくとも一方は1であり、p’およびq’を付して括弧でくくられた各繰り返し単位の存在順序は式中において任意であり;
R31、R32およびXaは、フッ素原子、C1-3アルキル基およびC1-3フルオロアルキル基から選択される1個またはそれ以上の置換基により置換されていてもよい。]
で表される基である、請求項2~9のいずれかに記載の表面処理剤。 - X1、X3、X4およびX6が、それぞれ独立して:
-CH2O(CH2)2-、
-CH2O(CH2)3-、
-CH2O(CH2)6-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CH2O(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-、
-CH2OCF2CHFOCF2-、
-CH2OCF2CHFOCF2CF2-、
-CH2OCF2CHFOCF2CF2CF2-、
-CH2OCH2CF2CF2OCF2-、
-CH2OCH2CF2CF2OCF2CF2-、
-CH2OCH2CF2CF2OCF2CF2CF2-、
-CH2OCH2CF2CF2OCF(CF3)CF2OCF2-、
-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2-、
-CH2OCH2CF2CF2OCF(CF3)CF2OCF2CF2CF2-、
-CH2OCH2CHFCF2OCF2-、
-CH2OCH2CHFCF2OCF2CF2-、
-CH2OCH2CHFCF2OCF2CF2CF2-、
-CH2OCH2CHFCF2OCF(CF3)CF2OCF2-、
-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2-、
-CH2OCH2CHFCF2OCF(CF3)CF2OCF2CF2CF2-
-CH2OCH2(CH2)7CH2Si(OCH3)2OSi(OCH3)2(CH2)2Si(OCH3)2OSi(OCH3)2(CH2)2-、
-CH2OCH2CH2CH2Si(OCH3)2OSi(OCH3)2(CH2)3-、
-(CH2)2-、
-(CH2)3-、
-(CH2)4-、
-(CH2)6-、
-(CH2)2-Si(CH3)2-(CH2)2-
-CONH-(CH2)3-、
-CON(CH3)-(CH2)3-、
-CON(Ph)-(CH2)3-(式中、Phはフェニルを意味する)、
-CONH-(CH2)6-、
-CON(CH3)-(CH2)6-、
-CON(Ph)-(CH2)6-(式中、Phはフェニルを意味する)、
-CONH-(CH2)2NH(CH2)3-、
-CONH-(CH2)6NH(CH2)3-、
-CH2O-CONH-(CH2)3-、
-CH2O-CONH-(CH2)6-、
-S-(CH2)3-、
-(CH2)2S(CH2)3-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2OSi(CH3)2OSi(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)2Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)3Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)10Si(CH3)2(CH2)2-、
-CONH-(CH2)3Si(CH3)2O(Si(CH3)2O)20Si(CH3)2(CH2)2-
-C(O)O-(CH2)3-、
-C(O)O-(CH2)6-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-(CH2)2-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-CH(CH3)-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-(CH2)3-、
-CH2-O-(CH2)3-Si(CH3)2 -(CH2)2-Si(CH3)2-CH(CH3)-CH2-、
- X1が、-O-CFR13-(CF2)e-であり、
R13が、フッ素原子または低級フルオロアルキル基を表し、
eが、0または1である、
請求項2~11のいずれかに記載の表面処理剤。 - X2が、-(CH2)u-であり、
uが、0~2の整数である、
請求項2~12のいずれかに記載の表面処理剤。 - R91が、フッ素原子またはCF3である、請求項2~13のいずれかに記載の表面処理剤。
- 分子末端に炭素-炭素不飽和結合を有する含フッ素化合物が、式(A1)および(A2)のいずれかで表される少なくとも1種の化合物である、請求項2~14のいずれかに記載の表面処理剤。
- 分子末端に炭素-炭素不飽和結合を有する含フッ素化合物が、式(B1)および(B2)のいずれかで表される少なくとも1種の化合物である、請求項2~14のいずれかに記載の表面処理剤。
- 分子末端に炭素-炭素不飽和結合を有する含フッ素化合物が、式(C1)および(C2)のいずれかで表される少なくとも1種の化合物である、請求項2~14のいずれかに記載の表面処理剤。
- 分子末端に炭素-炭素不飽和結合を有する含フッ素化合物が、式(D1)および(D2)のいずれかで表される少なくとも1種の化合物である、請求項2~14のいずれかに記載の表面処理剤。
- 含フッ素オイル、シリコーンオイル、および触媒から選択される1種またはそれ以上の他の成分をさらに含有する、請求項1~18のいずれかに記載の表面処理剤。
- 含フッ素オイルが、式(3):
Rf1-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-RF2
・・・(3)
[式中:
Rf1は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基を表し;
Rf2は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基、フッ素原子または水素原子を表し;
a’、b’、c’およびd’は、ポリマーの主骨格を構成するパーフルオロ(ポリ)エーテルの4種の繰り返し単位数をそれぞれ表し、互いに独立して0以上300以下の整数であって、a’、b’、c’およびd’の和は少なくとも1であり、添字a’、b’、c’またはd’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。]
で表される1種またはそれ以上の化合物である、請求項19に記載の表面処理剤。 - 含フッ素オイルが、式(3a)または(3b):
Rf1-(OCF2CF2CF2)b’’-Rf2 ・・・(3a)
Rf1-(OCF2CF2CF2CF2)a’’-(OCF2CF2CF2)b’’-(OCF2CF2)c’’-(OCF2)d’’-Rf2 ・・・(3b)
[式中:
Rf1は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基を表し;
Rf2は、1個またはそれ以上のフッ素原子により置換されていてもよい炭素数1~16のアルキル基、フッ素原子または水素原子を表し;
式(3a)において、b’’は1以上100以下の整数であり;
式(3b)において、a’’およびb’’は、それぞれ独立して0以上30以下の整数であり、c’’およびd’’は、それぞれ独立して1以上300以下の整数であり;
添字a’’、b’’、c’’またはd’’を付して括弧でくくられた各繰り返し単位の存在順序は、式中において任意である。]
で表される1種またはそれ以上の化合物である、請求項19または20に記載の表面処理剤。 - さらに溶媒を含む、請求項1~21のいずれかに記載の表面処理剤。
- 防汚性コーティング剤または防水性コーティング剤として使用される、請求項1~22のいずれかに記載の表面処理剤。
- 基材と、該基材の表面に、請求項1~23のいずれかに記載の表面処理剤より形成された層とを含む物品。
- 基材がガラスまたはサファイアガラスである、請求項24に記載の物品。
- ガラスが、ソーダライムガラス、アルカリアルミノケイ酸塩ガラス、ホウ珪酸ガラス、無アルカリガラス、クリスタルガラスおよび石英ガラスから成る群から選択されるガラスである、請求項25に記載の物品。
- 基材が、ダイヤモンドライクカーボン層を有する、請求項24~26のいずれかに記載の物品。
- 前記物品が光学部材である、請求項24~27のいずれかに記載の物品。
- 基材の表面に表面処理層を形成する方法であって、
前記基材に対し、その表面に、分子末端に炭素-炭素不飽和結合を有する含フッ素化合物との結合サイトを形成する前処理を行う工程と、
前処理された基材に、請求項1~23のいずれかに記載の表面処理剤を供給して基材の表面に表面処理層を形成する工程と
を含む、表面処理層の形成方法。 - 前処理を行う工程において、水素を含むプラズマにより、使用する表面処理剤に応じて、基材表面のHの量およびOの量を制御することを特徴とする、請求項29に記載の表面処理層の形成方法。
- 前処理が、水素を含むプラズマを用いて行われ、このプラズマにより、基材表面に、分子末端に炭素-炭素不飽和結合を有する含フッ素化合物との結合サイトとして機能するSi-H結合が形成されることを特徴とする請求項29または30に記載の表面処理層の形成方法。
- 少なくとも表面部分がSiとOとのネットワーク構造を有する基材の表面に表面処理層を形成する方法であって、
前記基材の表面にSi-H結合を形成する前処理を行う工程と、
前処理された基材に、請求項1~23のいずれかに記載の表面処理剤を供給して基材の表面に表面処理層を形成する工程と
を含むことを特徴とする、表面処理層の形成方法。 - 前処理を、水素を含むプラズマにより行うことを特徴とする、請求項32に記載の表面処理層の形成方法。
- 前処理を、水素および希ガスのプラズマ、または水素単独のプラズマにより行うことを特徴とする、請求項32または33に記載の表面処理層の形成方法。
- 前処理を行う工程において、真空に保持されたチャンバに水素ガスを供給し、熱電子あるいはプラズマにより、水素分子を水素原子に解離させ、その水素原子を前記チャンバ内の基材の表面に吸着させることを特徴とする、請求項32に記載の表面処理層の形成方法。
- 前処理を行う工程において、チャンバ内を水素雰囲気の真空状態とし、前記チャンバ内で基材を加熱して水素を基材表面に吸着させることを特徴とする請求項32に記載の表面処理層の形成方法。
- 基材が、ガラスまたはサファイアガラスである、請求項29~36のいずれかに記載の表面処理層の形成方法。
- 表面処理層が、有機単分子膜である、請求項29~37のいずれかに記載の表面処理層の形成方法。
- 表面処理層が、自己組織化単分子膜である、請求項29~38のいずれかに記載の表面処理層の形成方法。
- 基材の表面に表面処理層を形成する表面処理層形成装置であって、
前記基材に対し、その表面に、分子末端に炭素-炭素不飽和結合を有する含フッ素化合物との結合サイトを形成する前処理を行う前処理部と、
前処理された基材に、請求項1~23のいずれかに記載の表面処理剤を供給して基材の表面に表面処理層を形成する表面処理層形成部と
を有することを特徴とする表面処理層形成装置。 - 前処理部において、水素を含むプラズマにより、使用する表面処理剤に応じて、基材表面のHの量およびOの量を制御することを特徴とする、請求項40に記載の表面処理層形成装置。
- 前処理部における前処理が、水素を含むプラズマを用いて行われ、このプラズマにより、基材表面に、分子末端に炭素-炭素不飽和結合を有する含フッ素化合物との結合サイトとして機能するSi-H結合が形成されることを特徴とする、請求項40または41に記載の表面処理層形成装置。
- 少なくとも表面部分がSiとOとのネットワーク構造を有する基材の表面に表面処理層を形成する表面処理層形成装置であって、
前記基材の表面にSi-H結合を形成する前処理を行う前処理部と、
前処理された基材に、請求項1~23のいずれかに記載の表面処理剤を供給して基材の表面に表面処理層を形成する表面処理層形成部と
を有することを特徴とする、表面処理層形成装置。 - 前処理部における前処理が、水素を含むプラズマにより行われることを特徴とする、請求項43に記載の表面処理層形成装置。
- 前処理部における前処理が、水素および希ガスのプラズマ、または水素単独のプラズマにより行われることを特徴とする、請求項43または44に記載の表面処理層形成装置。
- 前処理部における前処理が、真空に保持されたチャンバに水素ガスを供給し、熱電子あるいはプラズマにより、水素分子を水素原子に解離させ、その水素原子を前記チャンバ内の基材の表面に吸着させることにより行われることを特徴とする、請求項43に記載の表面処理層形成装置。
- 前処理部における前処理が、チャンバ内を水素雰囲気の真空状態とし、前記チャンバ内で基材を加熱して水素を基材表面に吸着させることにより行われることを特徴とする、請求項43に記載の表面処理層形成装置。
- 基材が、ガラスまたはサファイアガラスである、請求項40~47のいずれかに記載の表面処理層形成装置。
- 表面処理層が、有機単分子膜である、請求項40~48のいずれかに記載の表面処理層形成装置。
- 表面処理層が、自己組織化単分子膜である、請求項40~49のいずれかに記載の表面処理層形成装置。
- 基材および該基材の表面を被覆する表面処理層を含む物品の製造方法であって、
請求項1~23のいずれかに記載の表面処理剤を基材の表面に接触させて、表面処理剤に含まれる分子末端に炭素-炭素不飽和結合を有する含フッ素化合物と、基材表面のSi-H部またはC-H部とを反応させることにより、該基材の表面に表面処理層を形成する
ことを含む、製造方法。 - 請求項29~39のいずれかに記載の方法により、基材の表面に表面処理層を形成することを特徴とする、請求項51に記載の方法。
- 請求項40~50のいずれかに記載の表面処理層形成装置を用いて、基材の表面に表面処理層を形成することを特徴とする、請求項51に記載の方法。
- 基材表面にSi-H結合またはC-H結合を有する層を形成することにより、Si-H結合またはC-H結合を導入することを特徴とする、請求項51に記載の方法。
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WO2018012344A1 (ja) * | 2016-07-12 | 2018-01-18 | シャープ株式会社 | 防汚性フィルムの製造方法 |
WO2018110271A1 (ja) * | 2016-12-13 | 2018-06-21 | ダイキン工業株式会社 | 防汚性物品 |
JP2018094918A (ja) * | 2016-12-13 | 2018-06-21 | ダイキン工業株式会社 | 防汚性物品 |
KR20190043149A (ko) * | 2016-12-13 | 2019-04-25 | 다이킨 고교 가부시키가이샤 | 방오성 물품 |
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KR102155040B1 (ko) * | 2016-12-13 | 2020-09-11 | 다이킨 고교 가부시키가이샤 | 방오성 물품 |
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TW201612144A (en) | 2016-04-01 |
CN107075349A (zh) | 2017-08-18 |
EP3178899A1 (en) | 2017-06-14 |
EP3178899B1 (en) | 2019-12-25 |
JP5883531B1 (ja) | 2016-03-15 |
KR101943231B1 (ko) | 2019-01-28 |
US11453787B2 (en) | 2022-09-27 |
CN107075349B (zh) | 2020-08-21 |
TWI614233B (zh) | 2018-02-11 |
EP3178899A4 (en) | 2018-01-17 |
JP2016183319A (ja) | 2016-10-20 |
KR20170026605A (ko) | 2017-03-08 |
US20170233602A1 (en) | 2017-08-17 |
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