WO2016004660A1 - 一种操作平台 - Google Patents

一种操作平台 Download PDF

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Publication number
WO2016004660A1
WO2016004660A1 PCT/CN2014/083580 CN2014083580W WO2016004660A1 WO 2016004660 A1 WO2016004660 A1 WO 2016004660A1 CN 2014083580 W CN2014083580 W CN 2014083580W WO 2016004660 A1 WO2016004660 A1 WO 2016004660A1
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WO
WIPO (PCT)
Prior art keywords
gas
shielding gas
sensor group
operating platform
operating
Prior art date
Application number
PCT/CN2014/083580
Other languages
English (en)
French (fr)
Inventor
张凡
余威
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US14/417,218 priority Critical patent/US9595696B2/en
Publication of WO2016004660A1 publication Critical patent/WO2016004660A1/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/42—Auxiliary equipment or operation thereof
    • B01D46/44—Auxiliary equipment or operation thereof controlling filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/42—Auxiliary equipment or operation thereof
    • B01D46/44—Auxiliary equipment or operation thereof controlling filtration
    • B01D46/446—Auxiliary equipment or operation thereof controlling filtration by pressure measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B55/00—Preserving, protecting or purifying packages or package contents in association with packaging
    • B65B55/02—Sterilising, e.g. of complete packages
    • B65B55/027—Packaging in aseptic chambers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/87—Passivation; Containers; Encapsulations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B31/00—Packaging articles or materials under special atmospheric or gaseous conditions; Adding propellants to aerosol containers
    • B65B31/02—Filling, closing, or filling and closing, containers or wrappers in chambers maintained under vacuum or superatmospheric pressure or containing a special atmosphere, e.g. of inert gas
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/811—Controlling the atmosphere during processing

Definitions

  • the present invention relates to the field of organic light emitting display packages, and more particularly to an operating platform.
  • OLED Organic Light Emitting Display
  • OLED packaging technology has become one of the research hotspots.
  • OLED device materials Due to the special optoelectronic properties of OLED device materials, it is required to be packaged in a glove box under a lower water and oxygen environment, due to the high concentration of water or oxygen entering the glove box (glove Box) can cause damage to the device structure and affect device life.
  • the glove box is a laboratory equipment that fills the high-purity inert gas into the tank and circulates and removes the active substances therein. It is also called an inert gas protection box, a dry box, etc., and mainly removes O2, H2O, and organic gases. Widely used in anhydrous, oxygen-free, dust-free ultra-pure environment, such as: lithium-ion batteries and materials, semiconductors, super capacitors, special lamps, laser welding, brazing and so on.
  • the OLED packaging process needs to be carried out in a low concentration of water or oxygen (for example, 10 ppm or less (ppm represents the mass of the solute contained in one million parts per unit of the solution), and is generally filled with nitrogen during the OLED packaging process.
  • a purification device or a purification system is required (purify System) Purify the protective gas in the glove box to maintain a low water oxygen environment.
  • FIG. 1 is a schematic structural view of a purification device in the prior art.
  • the existing purification device 2 mainly includes a structural unit such as an inlet filter 21, a valve 22, a purification unit 23, a blower 24, a cooler 25, and an outlet filter 26. Under the action of the external circulation fan 24, the purification device 2 continuously circulates the shielding gas in the glove box 1 so that the water oxygen index in the glove box 1 is kept below 10 ppm.
  • the sensor group including the oxygen sensor 41 and the water sensor 42
  • the operating platform performs a purging operation, that is, the shielding gas is input through the air supply device 3, thereby Reduce the concentration of water and oxygen in the glove box 1.
  • the existing operating platform has the following drawbacks: when the gas supply or oxygen content of the shielding gas provided by the gas supply device 3 (shown by the dashed box) is too high, the existing operating platform cannot detect; the existing purification device 2 only sets a set of water oxygen. The sensor, when the glove box 1 and the purification device 2 are partially leaked or when the sensitivity of the probe of the water or oxygen sensor is lowered, the detection result is inaccurate, and the cause of high water or oxygen content (abnormality) cannot be checked.
  • An object of the present invention is to provide an operating platform for solving the problem that the existing operating platform cannot detect the water or oxygen content of the shielding gas provided by the air supply device; when the glove box and the purification device are partially leaked or when water or oxygen When the sensitivity of the sensor of the sensor is lowered, the detection result is inaccurate, and the technical problem of the cause of the abnormality cannot be checked.
  • the present invention constructs an operation platform, and the operation platform includes:
  • An operating space for providing an operating environment of an item to be operated wherein the operating space is provided with a shielding gas, wherein the shielding gas is used to prevent the item to be operated from being oxidized or corroded;
  • a purification device for purifying the shielding gas in the operating space, the purification device comprising a gas input end and a gas output end;
  • a first sensor group disposed at a gas input end of the purification device for detecting a water content and an oxygen content of the shielding gas in the operating space
  • a gas supply device configured to output to the operation space when the first sensor group detects that a water content in the shielding gas is greater than a first threshold or an oxygen content in the shielding gas is greater than a second threshold Protective gas; it includes:
  • a second sensor group for detecting a water content and an oxygen content of the shielding gas input by the inlet end
  • a first electromagnetic valve disposed between the air outlet end and the air inlet end, configured to control the air supply device to output the shielding gas to the operation space according to the detection result of the second sensor group;
  • the first solenoid valve is disposed between the second sensor group and the air outlet end;
  • a second solenoid valve is disposed between the second sensor group and the intake end.
  • the second sensor group is further configured to detect water of the shielding gas at a gas output end of the purification device Content and oxygen content.
  • the gas outlet end of the gas supply means is connected to the gas output end of the purification device.
  • the gas supply device further includes a filter membrane disposed between the second solenoid valve and the second sensor group.
  • the second sensor group detects that the water content in the shielding gas input to the intake end is greater than a third threshold or the oxygen content in the shielding gas is greater than the At the fourth threshold, the first solenoid valve is closed.
  • the operating platform further includes a pressure detecting device, wherein the air supply device is further configured to: when the pressure detecting device detects that the difference between the pressure of the shielding gas and the atmospheric pressure is less than a preset value The protective gas is output to the operation space.
  • the preset value ranges from 1 mbar to 2 mbar.
  • the shielding gas is nitrogen.
  • the present invention constructs an operating platform, the operating platform comprising:
  • An operating space for providing an operating environment of an item to be operated wherein the operating space is provided with a shielding gas, wherein the shielding gas is used to prevent the item to be operated from being oxidized or corroded;
  • a purification device for purifying the shielding gas in the operating space, the purification device comprising a gas input end and a gas output end;
  • a first sensor group disposed at a gas input end of the purification device for detecting a water content and an oxygen content of the shielding gas in the operating space
  • a gas supply device configured to output to the operation space when the first sensor group detects that a water content in the shielding gas is greater than a first threshold or an oxygen content in the shielding gas is greater than a second threshold Protective gas; it includes:
  • a second sensor group for detecting a water content and an oxygen content of the shielding gas input by the inlet end
  • a first electromagnetic valve disposed between the air outlet end and the air inlet end for controlling the air supply device to output the shielding gas to the operation space according to the detection result of the second sensor group.
  • the first solenoid valve is disposed between the second sensor group and the air outlet end.
  • the air supply device further includes a second solenoid valve disposed between the second sensor group and the intake end.
  • the second sensor group is further configured to detect water of the shielding gas at a gas output end of the purification device Content and oxygen content.
  • the gas outlet end of the gas supply means is connected to the gas output end of the purification device.
  • the gas supply device further includes a filter membrane disposed between the second solenoid valve and the second sensor group.
  • the second sensor group detects that the water content in the shielding gas input to the intake end is greater than a third threshold or the oxygen content in the shielding gas is greater than the At the fourth threshold, the first solenoid valve is closed.
  • the operating platform further includes a pressure detecting device, wherein the air supply device is further configured to: when the pressure detecting device detects that the difference between the pressure of the shielding gas and the atmospheric pressure is less than a preset value The protective gas is output to the operation space.
  • the preset value ranges from 1 mbar to 2 mbar.
  • the shielding gas is nitrogen.
  • the operating platform of the present invention can solve the technical problem of being able to detect the water or oxygen content in the shielding gas provided by the gas supply device, and improve the accuracy of the detection result and facilitate the troubleshooting of the abnormality by adding a set of sensors.
  • FIG. 1 is a schematic structural view of an operation platform in the prior art
  • FIG. 2 is a schematic structural diagram of an operation platform according to a first embodiment of the present invention.
  • FIG. 3 is a schematic structural view of a first connection mode of a gas supply device according to a second embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a gas supply device according to a second embodiment of the present invention.
  • FIG. 5 is a partially enlarged schematic view showing a first connection mode of a medium air supply device according to a second embodiment of the present invention.
  • FIG. 6 is a schematic structural view of a second connection mode of a gas supply device according to a second embodiment of the present invention.
  • FIG. 2 is a schematic structural diagram of an operation platform according to a first embodiment of the present invention.
  • the operating platform includes an operating space 10, a purification device 20, a first sensor group 40, and a gas supply device 30:
  • the operation space 10 is configured to provide an operating environment of an item to be operated, wherein the operation space is provided with a shielding gas, wherein the shielding gas is used to prevent the item to be operated from being oxidized or corroded; the operation space 10
  • a shielding gas used to prevent the item to be operated from being oxidized or corroded
  • the operation space 10 For example, a glove box used for packaging an OLED; the object to be handled is, for example, an OLED.
  • the purification device 20 is configured to purify a shielding gas in the operation space 10, the purification device 20 includes a gas input end 201 and a gas output end 202, wherein the shielding gas in the operation space 10 First entering the gas input end 201, and being outputted by the gas output end 202 after being purified by the purification device 20; the purification device 20 further includes an inlet filter 203, a valve 204, a purification unit 205, a circulation fan 206, A structural unit such as a cooler 207, an outlet filter 208, and the like.
  • the first sensor group 40 includes a water sensor and an oxygen sensor disposed at a gas input end 201 of the purification device for detecting a water content and an oxygen content of the shielding gas in the operating space 10;
  • the purification device 20 Since the purification device 20 has a limited ability to purify the shielding gas, when the water and oxygen content of the shielding gas in the operation space 10 is relatively large, the protective gas cannot be purified by the original purification device 20 alone. In order to save production costs, it is necessary to input the shielding gas into the operation space 10 through the air supply device 30 (shown by a broken line frame), that is, to perform ventilation. That is, when the first sensor group 40 detects that the water content in the shielding gas is greater than a first threshold or the oxygen content in the shielding gas is greater than a second threshold, the gas supply device 30 outputs to the operation space.
  • the first threshold is, for example, 10 ppm;
  • the second threshold is, for example, 10 ppm; (of course, the first threshold and the second threshold may be set according to an operating environment required for the item to be operated) .
  • the air supply device 30 includes an air inlet end 301 and an air outlet end 302; wherein the air inlet end 301 is connected to a shielding gas storage box for inputting the shielding gas; and the air outlet end 302 is used for the operating space. 10 outputting the shielding gas;
  • the air supply device 30 further includes a second sensor group 303 and a first electromagnetic valve 304.
  • the second sensor group 303 includes a water sensor and an oxygen sensor for detecting the water content of the shielding gas input by the air inlet end 301. And oxygen content;
  • the first electromagnetic valve 304 is disposed between the air outlet end 302 and the air inlet end 301 for controlling the air supply device 30 to perform the operation according to the detection result of the second sensor group 303.
  • the space 10 outputs the shielding gas.
  • the first solenoid valve 304 is disposed between the second sensor group 303 and the air outlet end 302.
  • the second sensor group 303 detection is that the water content in the shielding gas input by the intake end 301 is greater than the third threshold or the oxygen content in the shielding gas is greater than the fourth threshold
  • the first electromagnetic valve 304 is closed, and the air supply device 30 cannot output the shielding gas to the operating space 10; wherein the third threshold is smaller than the first threshold; the fourth threshold is smaller than Said second threshold;
  • the air supply device 30 can output the shielding gas to the operation space 10.
  • the operating platform further includes a pressure detecting device, wherein the pressure of the shielding gas is generally greater than one atmosphere, and when the pressure detecting device detects that the difference between the pressure of the shielding gas and the atmospheric pressure is less than a predetermined value,
  • the air supply device 30 outputs the shielding gas to the operation space 10.
  • the preset value ranges from 1 mbar to 2 mbar.
  • the second sensor 303 can conveniently find out the cause of abnormal water or oxygen content, and at the same time, any one of them When the sensor group detects that the water or oxygen content is high, an alarm is issued to facilitate timely treatment of abnormal water or oxygen content.
  • the protective gas is, for example, nitrogen.
  • the operation platform of the invention solves the technical problem of being able to detect the water or oxygen content in the shielding gas provided by the gas supply device, and improving the accuracy of the detection result and facilitating the troubleshooting of the abnormality by adding a set of sensors.
  • FIG. 3 is a schematic structural view of a first connection mode of a gas supply device according to a second embodiment of the present invention.
  • the operating platform includes an operating space 10, a purification device 20, a first sensor group 40, and a gas supply device 30:
  • the operation space 10 is configured to provide an operating environment of an item to be operated, wherein the operation space is provided with a shielding gas, wherein the shielding gas is used to prevent the item to be operated from being oxidized or corroded; the operation space 10
  • a shielding gas used to prevent the item to be operated from being oxidized or corroded
  • the operation space 10 For example, a glove box used for packaging an OLED; the object to be handled is, for example, an OLED.
  • the purification device 20 is configured to perform purification processing on the shielding gas in the operation space 10, the purification device 20 includes a gas input end 201 and a gas output end 202; wherein the shielding gas in the operation space 10 First entering the gas input end 201, and being outputted by the gas output end 202 after being purified by the purification device 20; the purification device 20 further includes an inlet filter 203, a valve 204, a purification unit 205, a circulation fan 206, A structural unit such as a cooler 207, an outlet filter 208, and the like.
  • the first sensor group 40 includes a water sensor and an oxygen sensor disposed at a gas input end 201 of the purification device for detecting a water content and an oxygen content of the shielding gas in the operating space 10;
  • the purification device 20 Since the purification device 20 has a limited ability to purify the shielding gas, when the water and oxygen content of the shielding gas in the operation space 10 is relatively large, the protective gas cannot be purified by the original purification device 20 alone.
  • the shielding gas needs to be input to the operating space 10 through the air supply device 30, that is, the ventilation is performed, that is, when the first sensor group 40 detects that the water content in the shielding gas is greater than the first
  • the gas supply device 30 outputs the shielding gas to the operating space when a threshold or an oxygen content in the shielding gas is greater than a second threshold;
  • the first threshold is, for example, 10 ppm; and the second threshold is, for example, 10 ppm; (of course, the first threshold and the second threshold may be set according to the operating environment required for the item to be operated).
  • the air supply device 30 includes an air inlet end 301 and an air outlet end 302; wherein the air inlet end 301 is connected to a shielding gas storage box for inputting the shielding gas; and the air outlet end 302 is used for the operating space. 10 outputting the shielding gas;
  • the air supply device 30 further includes a second sensor group 303 and a first electromagnetic valve 304.
  • the second sensor group 303 includes a water sensor and an oxygen sensor for detecting the water content of the shielding gas input by the air inlet end 301. And oxygen content;
  • the first electromagnetic valve 304 is disposed between the air outlet end 302 and the air inlet end 301 for controlling the air supply device 30 to perform the operation according to the detection result of the second sensor group 303.
  • the space 10 outputs the shielding gas.
  • the first solenoid valve 304 is disposed between the second sensor group 303 and the air outlet end 302.
  • the second sensor group 303 detection is that the water content in the shielding gas input by the intake end 301 is greater than the third threshold or the oxygen content in the shielding gas is greater than the fourth threshold
  • the first electromagnetic valve 304 is closed, and the air supply device 30 cannot output the shielding gas to the operating space 10; wherein the third threshold is smaller than the first threshold; the fourth threshold is smaller than Said second threshold;
  • the air supply device 30 can output the shielding gas to the operation space 10.
  • the operating platform further includes a pressure detecting device, wherein the pressure of the shielding gas is generally greater than one atmosphere, and when the pressure detecting device detects that the difference between the pressure of the shielding gas and the atmospheric pressure is less than a predetermined value,
  • the air supply device 30 outputs the shielding gas to the operation space 10.
  • the preset value ranges from 1 mbar to 2 mbar.
  • the air supply device 30 (shown in the dashed box of FIG. 4) further includes a second electromagnetic valve 305, and the second electromagnetic valve 305 is disposed in the second sensor group 303. Between the inlet end 301 and the inlet.
  • FIG. 4 is a schematic structural view of a gas supply device according to a second embodiment of the present invention
  • FIG. 5 is a first embodiment of a gas supply device according to a second embodiment of the present invention.
  • the second electromagnetic valve 305 is closed at this time and the first electromagnetic valve 304 is opened, because the air supply device 30
  • the gas outlet end 302 is connected to the gas output end 202 of the purification device 20, so that the shielding gas can flow from the gas output end 202 of the purification device 20 to the gas outlet end 302 of the gas supply device 30, so that it can be used.
  • the second sensor group 303 detects the water content and the oxygen content in the protective gas of the purification device 20 after the purification treatment.
  • FIG. 6 is a schematic structural view of a second connection mode of a gas supply device according to a second embodiment of the present invention.
  • the air outlet end 302 of the air supply device 30 may also be disposed in the vicinity of the position of the gas output end 202 of the purification device 20 . Due to the position of the gas output end 202 of the purification device 20, the water content and oxygen content of the protective gas after purification, and the water content and oxygen content of the shielding gas at the gas output end of the purification device Substantially identical, it is also possible to function to detect the water content and the oxygen content of the purified gas after the purification treatment of the purification device 20.
  • the second sensor 303 can conveniently find out the cause of abnormal water or oxygen content, and at the same time, any one of them When the sensor group detects that the water or oxygen content is high, an alarm is issued to facilitate timely treatment of abnormal water or oxygen content.
  • the air supply device 30 further includes a filter membrane 306 coupled between the second solenoid valve 305 and the second sensor group 303.
  • the protective gas input from the gas supply device 30 contains impurities and macromolecules (relative molecular masses of 5,000 or more) of water and oxygen. Since impurities and macromolecular water and oxygen oxidize the probe of the water sensor or the oxygen sensor, and if impurities and macromolecular water and oxygen are output to the operation space, damage to the object to be operated in the operation space is caused. Thus, by increasing the filter membrane 306, the water sensor, the oxygen sensor, and the item to be operated can be further protected.
  • the protective gas is, for example, nitrogen.
  • the operating platform of the present invention can solve the technical problem that the prior art cannot detect the water content and the oxygen content of the protective gas after the purification process is purified by adding a set of sensors.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • General Physics & Mathematics (AREA)
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Abstract

一种操作平台，所述操作平台包括：第一传感器组（40）以及供气装置（30），所述供气装置（30）包括：用于检测进气端（301）输入的保护气体的水含量以及氧含量的第二传感器组（303）以及第一电磁阀（304）。通过增加一组传感器，可以对供气装置（30）提供的保护气体中水或氧含量进行检测，解决检测结果不准确和异常原因难以排查的技术问题。

Description

一种操作平台 技术领域
本发明涉及有机发光显示器封装领域，特别是涉及一种操作平台。
 背景技术
随着OLED（Organic Light Emitting Display，有机发光显示器）技术发展迅猛，大量科研人员围绕OLED相关技术进行研发开发，而作为OLED技术关键技术之一，OLED封装技术也成为研究热点之一。
由于OLED器件材料的特殊光电性能，需要在较低水氧环境之下的手套箱内进行封装，由于高浓度的水或者氧进入手套箱（glove box）会导致器件结构被破坏，影响器件寿命。
手套箱是将高纯惰性气体充入箱体内，并循环过滤掉其中的活性物质的实验室设备，也称惰性气体保护箱、干箱等，主要对O2、H2O、有机气体的清除。广泛应用于无水、无氧、无尘的超纯环境，譬如：锂离子电池及材料、半导体、超级电容、特种灯、激光焊接、钎焊等。
因此，OLED封装制程需在低浓度的水或者氧环境下（譬如10ppm以下（ppm表示一百万份单位质量的溶液中所含溶质的质量））进行，一般在OLED封装过程中充入氮气，由于手套箱不是密闭的空间，在手套箱内气压降低时，空气中的水和氧分子会进入手套箱内，因此需要使用纯化装置或纯化***（purify system）对手套箱内的保护气体进行纯化处理，来维持低水氧环境。
请参阅图1，图1为现有技术中的纯化装置结构示意图。
现有的纯化装置2主要包括入口过滤器21、阀门22、纯化单元（reactor）23、循环风机（blower）24、冷却器（cooler）25、出口过滤器（filter）26等结构单元。在外置循环风机24的作用下，纯化装置2不断对手套箱1内的保护气体进行循环净化，使得手套箱1内水氧指标保持在10ppm以下。当传感器组（包括氧传感器41、水传感器42）检测手套箱1内水或者氧气的浓度值大于10ppm时，操作平台会进行换气（Purging）动作，即通过供气装置3输入保护气体，从而降低手套箱1内水和氧的浓度。但现有操作平台存在以下缺陷：当供气装置3（虚线框所示）提供的保护气体水或氧含量偏高，现有操作平台无法检测出；现有纯化装置2仅设置一组水氧传感器，当手套箱1与纯化装置2局部漏气时或者当水或氧传感器的探头灵敏度降低时，导致检测结果不准确，且无法对水或氧含量偏高（异常情况）的原因进行排查。
故，有必要完善现有的操作平台，以解决现有技术所存在的问题。
 技术问题
本发明的一个目的在于提供一种操作平台，以解决现有操作平台无法对供气装置所提供保护气体中水或氧含量进行检测；当手套箱与纯化装置局部漏气时或者当水或氧传感器的探头灵敏度降低时，导致检测结果不准确，且无法对异常原因进行排查的技术问题。
 技术解决方案
为解决上述技术问题，本发明构造了一种操作平台，所述操作平台包括：
操作空间，用于提供待操作物品的操作环境，所述操作空间内设置有保护气体，其中所述保护气体用于防止所述待操作物品被氧化或被腐蚀；
纯化装置，用于对所述操作空间中的保护气体进行纯化处理，所述纯化装置包括一气体输入端和一气体输出端；
第一传感器组，设置在所述纯化装置的气体输入端，用于检测所述操作空间中的所述保护气体的水含量以及氧含量；以及
供气装置，用于当所述第一传感器组检测到所述保护气体中的水含量大于第一阈值或所述保护气体中的氧含量大于第二阈值时，向所述操作空间输出所述保护气体；其包括：
进气端，用于输入所述保护气体；
出气端，用于向所述操作空间输出所述保护气体；
第二传感器组，用于检测所述进气端输入的所述保护气体的水含量以及氧含量；以及
第一电磁阀，设置在所述出气端和所述进气端之间，用于根据所述第二传感器组的检测结果，控制所述供气装置向所述操作空间输出所述保护气体；所述第一电磁阀设置在所述第二传感器组和所述出气端之间；
第二电磁阀，设置在所述第二传感器组与所述进气端之间。
在本发明的操作平台中，当所述第一电磁阀开启且所述第二电磁阀关闭时，所述第二传感器组还用于检测所述纯化装置的气体输出端的所述保护气体的水含量以及氧含量。
在本发明的操作平台中，所述供气装置的出气端与所述纯化装置的气体输出端连接。
在本发明的操作平台中，所述供气装置还包括过滤膜，所述过滤膜设置在所述第二电磁阀和所述第二传感器组之间。
在本发明的操作平台中，当所述第二传感器组检测的结果为所述进气端输入的所述保护气体中的水含量大于第三阈值或所述保护气体中的氧含量大于所述第四阈值时，所述第一电磁阀关闭。
在本发明的操作平台中，所述操作平台还包括压力检测装置，所述供气装置还用于当所述压力检测装置检测到所述保护气体的压力与大气压的差值小于一预设值时，向所述操作空间输出所述保护气体。
在本发明的操作平台中，所述预设值的范围为1毫巴至2毫巴。
在本发明的操作平台中，所述保护气体为氮气。
本发明构造了一种操作平台，所述操作平台包括：
操作空间，用于提供待操作物品的操作环境，所述操作空间内设置有保护气体，其中所述保护气体用于防止所述待操作物品被氧化或被腐蚀；
纯化装置，用于对所述操作空间中的保护气体进行纯化处理，所述纯化装置包括一气体输入端和一气体输出端；
第一传感器组，设置在所述纯化装置的气体输入端，用于检测所述操作空间中的所述保护气体的水含量以及氧含量；以及
供气装置，用于当所述第一传感器组检测到所述保护气体中的水含量大于第一阈值或所述保护气体中的氧含量大于第二阈值时，向所述操作空间输出所述保护气体；其包括：
进气端，用于输入所述保护气体；
出气端，用于向所述操作空间输出所述保护气体；
第二传感器组，用于检测所述进气端输入的所述保护气体的水含量以及氧含量；以及
第一电磁阀，设置在所述出气端和所述进气端之间，用于根据所述第二传感器组的检测结果，控制所述供气装置向所述操作空间输出所述保护气体。
在本发明的操作平台中，所述第一电磁阀设置在所述第二传感器组和所述出气端之间。
在本发明的操作平台中，所述供气装置还包括第二电磁阀，所述第二电磁阀设置在所述第二传感器组与所述进气端之间。
在本发明的操作平台中，当所述第一电磁阀开启且所述第二电磁阀关闭时，所述第二传感器组还用于检测所述纯化装置的气体输出端的所述保护气体的水含量以及氧含量。
在本发明的操作平台中，所述供气装置的出气端与所述纯化装置的气体输出端连接。
在本发明的操作平台中，所述供气装置还包括过滤膜，所述过滤膜设置在所述第二电磁阀和所述第二传感器组之间。
在本发明的操作平台中，当所述第二传感器组检测的结果为所述进气端输入的所述保护气体中的水含量大于第三阈值或所述保护气体中的氧含量大于所述第四阈值时，所述第一电磁阀关闭。
在本发明的操作平台中，所述操作平台还包括压力检测装置，所述供气装置还用于当所述压力检测装置检测到所述保护气体的压力与大气压的差值小于一预设值时，向所述操作空间输出所述保护气体。
在本发明的操作平台中，所述预设值的范围为1毫巴至2毫巴。
在本发明的操作平台中，所述保护气体为氮气。
 有益效果
本发明的操作平台，通过增加一组传感器，可以解决能够检测供气装置提供的保护气体中水或氧含量，以及提高检测结果的准确度、利于异常原因排查的技术问题。
 附图说明
图1为现有技术中操作平台结构示意图；
图2为本发明实施例中第一实施例的操作平台结构示意图；
图3为本发明实施例中第二实施例中供气装置的第一种连接方式的结构示意图；
图4为本发明实施例中第二实施例中供气装置的结构示意图；
图5为本发明实施例中第二实施例的中供气装置的第一种连接方式的局部放大示意图；
图6为本发明实施例中第二实施例中供气装置的第二种连接方式的结构示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是以相同标号表示。
图2为本发明实施例中第一实施例的操作平台结构示意图；
请参照图2，所述操作平台包括操作空间10、纯化装置20、第一传感器组40、供气装置30：
所述操作空间10，用来提供待操作物品的操作环境，所述操作空间内设置有保护气体，其中所述保护气体用于防止所述待操作物品被氧化或被腐蚀；所述操作空间10譬如为封装OLED使用的手套箱；所述待操作物品譬如为OLED。
所述纯化装置20，用来对所述操作空间10中的保护气体进行纯化处理，所述纯化装置20包括一气体输入端201和一气体输出端202，其中所述操作空间10中的保护气体首先进入所述气体输入端201，经所述纯化装置20纯化处理后由所述气体输出端202输出；所述纯化装置20还包括入口过滤器203、阀门204、纯化单元205、循环风机206、冷却器207、出口过滤器（filter）208等结构单元。
所述第一传感器组40包括水传感器和氧传感器，设置在所述纯化装置的气体输入端201，用来检测所述操作空间10中的所述保护气体的水含量以及氧含量；以及
由于纯化装置20对保护气体进行纯化处理的能力是有限的，当所述操作空间10中的保护气体的水和氧含量比较多时，仅靠原有的所述纯化装置20不能对保护气体进行纯化，为了节省生产成本，需要通过供气装置30（虚线框所示）向所述操作空间10输入所述保护气体，即进行换气。即当所述第一传感器组40检测到所述保护气体中的水含量大于第一阈值或所述保护气体中的氧含量大于第二阈值时，所述供气装置30向所述操作空间输出所述保护气体；所述第一阈值譬如为10ppm；所述第二阈值譬如为10ppm；（当然所述第一阈值和第二阈值可以根据所述待操作物品所需的操作环境自行设定）。
所述供气装置30包括进气端301和出气端302；其中所述进气端301连接保护气体存储箱，用来输入所述保护气体；所述出气端302，用来向所述操作空间10输出所述保护气体；
所述供气装置30还包括第二传感器组303和第一电磁阀304，第二传感器组303包括水传感器和氧传感器，用于检测所述进气端301输入的所述保护气体的水含量以及氧含量；以及
所述第一电磁阀304，设置在所述出气端302和所述进气端301之间，用来根据所述第二传感器组303的检测结果，控制所述供气装置30向所述操作空间10输出所述保护气体。
优选地，所述第一电磁阀304设置在第二传感器组303和所述出气端302之间。
当所述第二传感器组303检测的结果为所述进气端301输入的所述保护气体中的水含量大于所述第三阈值或所述保护气体中的氧含量大于所述第四阈值时，所述第一电磁阀304关闭，所述供气装置30不能向所述操作空间10输出所述保护气体；其中，所述第三阈值小于所述第一阈值；所述第四阈值小于所述第二阈值；
当所述第二传感器组303检测的结果为所述进气端301输入的所述保护气体中的水含量小于所述第三阈值和所述保护气体中的氧含量小于所述第四阈值时，所述第一电磁阀304开启，所述供气装置30能够向所述操作空间10输出所述保护气体。
优选地，所述操作平台还包括压力检测装置，通常所述保护气体的压力大于一个大气压，当所述压力检测装置检测到所述保护气体的压力与大气压的差值小于一预设值时，所述供气装置30向所述操作空间10输出所述保护气体。所述预设值的范围为1毫巴至2毫巴。
当所述第一传感器组40不够灵敏，或者纯化装置20漏气导致的水或者氧含量偏高，通过所述第二传感器303能够方便找出水或者氧含量异常原因，同时当其中任意一组传感器组检测到水或者氧含量偏高时，进行报警，利于对水或者氧含量异常及时处理。
所述保护气体譬如为氮气。
本发明的操作平台，通过增加一组传感器，解决了能够检测供气装置提供的保护气体中水或氧含量，以及提高检测结果的准确度和利于异常原因排查的技术问题。
图3为本发明实施例中第二实施例中供气装置的第一种连接方式的结构示意图；
请参照图3，所述操作平台包括操作空间10、纯化装置20、第一传感器组40、供气装置30：
所述操作空间10，用来提供待操作物品的操作环境，所述操作空间内设置有保护气体，其中所述保护气体用于防止所述待操作物品被氧化或被腐蚀；所述操作空间10譬如为封装OLED使用的手套箱；所述待操作物品譬如为OLED。
所述纯化装置20，用来对所述操作空间10中的保护气体进行纯化处理，所述纯化装置20包括一气体输入端201和一气体输出端202；其中所述操作空间10中的保护气体首先进入所述气体输入端201，经所述纯化装置20纯化处理后由所述气体输出端202输出；所述纯化装置20还包括入口过滤器203、阀门204、纯化单元205、循环风机206、冷却器207、出口过滤器（filter）208等结构单元。
所述第一传感器组40包括水传感器和氧传感器，设置在所述纯化装置的气体输入端201，用来检测所述操作空间10中的所述保护气体的水含量以及氧含量；以及
由于纯化装置20对保护气体进行纯化处理的能力是有限的，当所述操作空间10中的保护气体的水和氧含量比较多时，仅靠原有的所述纯化装置20不能对保护气体进行纯化，为了节省生产成本，需要通过供气装置30向所述操作空间10输入所述保护气体，即进行换气，即当所述第一传感器组40检测到所述保护气体中的水含量大于第一阈值或所述保护气体中的氧含量大于第二阈值时，所述供气装置30向所述操作空间输出所述保护气体；所述第一阈值譬如为10ppm；所述第二阈值譬如为10ppm；（当然所述第一阈值和第二阈值可以根据所述待操作物品所需的操作环境自行设定）。
所述供气装置30包括进气端301和出气端302；其中所述进气端301连接保护气体存储箱，用来输入所述保护气体；所述出气端302，用来向所述操作空间10输出所述保护气体；
所述供气装置30还包括第二传感器组303和第一电磁阀304，第二传感器组303包括水传感器和氧传感器，用于检测所述进气端301输入的所述保护气体的水含量以及氧含量；以及
所述第一电磁阀304，设置在所述出气端302和所述进气端301之间，用来根据所述第二传感器组303的检测结果，控制所述供气装置30向所述操作空间10输出所述保护气体。
优选地，所述第一电磁阀304设置在第二传感器组303和所述出气端302之间。
当所述第二传感器组303检测的结果为所述进气端301输入的所述保护气体中的水含量大于所述第三阈值或所述保护气体中的氧含量大于所述第四阈值时，所述第一电磁阀304关闭，所述供气装置30不能向所述操作空间10输出所述保护气体；其中，所述第三阈值小于所述第一阈值；所述第四阈值小于所述第二阈值；
当所述第二传感器组303检测的结果为所述进气端301输入的所述保护气体中的水含量小于所述第三阈值和所述保护气体中的氧含量小于所述第四阈值时，所述第一电磁阀304开启，所述供气装置30能够向所述操作空间10输出所述保护气体。
优选地，所述操作平台还包括压力检测装置，通常所述保护气体的压力大于一个大气压，当所述压力检测装置检测到所述保护气体的压力与大气压的差值小于一预设值时，所述供气装置30向所述操作空间10输出所述保护气体。所述预设值的范围为1毫巴至2毫巴。
本实施例和第一实施例的区别在于：所述供气装置30（如图4虚线框所示），还包括第二电磁阀305，所述第二电磁阀305设置在第二传感器组303与所述进气端301之间。
请参照图4和图5，其中图4为本发明实施例中第二实施例中供气装置的结构示意图，图5为本发明实施例中第二实施例的中供气装置的第一种连接方式的局部放大示意图；
当所述供气装置30不向所述操作空间10输出所述保护气体时，此时将所述第二电磁阀305关闭且将所述第一电磁阀304开启，由于所述供气装置30的出气端302与所述纯化装置20的气体输出端202连接，使得所述保护气体能够从所述纯化装置20的气体输出端202流向所述供气装置30的出气端302，因此可以使用所述第二传感器组303检测所述纯化装置20的经过纯化处理后的所述保护气体中的水含量以及氧含量。
图6为本发明实施例中第二实施例中供气装置的第二种连接方式的结构示意图；
请参照图6，当然所述供气装置30的出气端302也可以设置在所述纯化装置20的气体输出端202位置的附近。由于靠近所述纯化装置20的气体输出端202位置处，经过纯化处理后的所述保护气体的水含量以及氧含量，和所述纯化装置的气体输出端的所述保护气体的水含量以及氧含量基本一致，同样能够起到检测所述纯化装置20的经过纯化处理后的所述保护气体的水含量以及氧含量的作用。
当所述第一传感器组40不够灵敏，或者纯化装置20漏气导致的水或者氧含量偏高，通过所述第二传感器303能够方便找出水或者氧含量异常原因，同时当其中任意一组传感器组检测到水或者氧含量偏高时，进行报警，利于对水或者氧含量异常及时处理。
结合图4，所述供气装置30还包括过滤膜306，所述过滤膜306连接在所述第二电磁阀305和所述第二传感器组303之间。由于所述供气装置30输入的保护气体中含有杂质和大分子（相对分子质量在5000以上）的水和氧。由于杂质和大分子的水和氧气会氧化水传感器或者氧传感器的探头，同时如果杂质和大分子的水和氧气被输出到操作空间时，会对所述操作空间内的待操作物品造成损坏。因而增加所述过滤膜306，可以进一步对水传感器、氧传感器、以及待操作物品起到保护作用。所述保护气体譬如为氮气。
本发明的操作平台，通过增加一组传感器，可以解决现有技术不能够检测所述纯化装置经过纯化处理后的所述保护气体的水含量以及氧含量的技术问题。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (18)

  1. 一种操作平台，其包括：
    操作空间，用于提供待操作物品的操作环境，所述操作空间内设置有保护气体，其中所述保护气体用于防止所述待操作物品被氧化或被腐蚀；
    纯化装置，用于对所述操作空间中的保护气体进行纯化处理，所述纯化装置包括一气体输入端和一气体输出端；
    第一传感器组，设置在所述纯化装置的气体输入端，用于检测所述操作空间中的所述保护气体的水含量以及氧含量；以及
    供气装置，用于当所述第一传感器组检测到所述保护气体中的水含量大于第一阈值或所述保护气体中的氧含量大于第二阈值时，向所述操作空间输出所述保护气体；其包括：
    进气端，用于输入所述保护气体；
    出气端，用于向所述操作空间输出所述保护气体；
    第二传感器组，用于检测所述进气端输入的所述保护气体的水含量以及氧含量；以及
    第一电磁阀，设置在所述出气端和所述进气端之间，用于根据所述第二传感器组的检测结果，控制所述供气装置向所述操作空间输出所述保护气体；所述第一电磁阀设置在所述第二传感器组和所述出气端之间；
    第二电磁阀，设置在所述第二传感器组与所述进气端之间。
  2. 根据权利要求1所述的操作平台，其中当所述第一电磁阀开启且所述第二电磁阀关闭时，所述第二传感器组还用于检测所述纯化装置的气体输出端的所述保护气体的水含量以及氧含量。
  3. 根据权利要求2所述的操作平台，其中所述供气装置的出气端与所述纯化装置的气体输出端连接。
  4. 根据权利要求1所述的操作平台，其中所述供气装置还包括过滤膜，所述过滤膜设置在所述第二电磁阀和所述第二传感器组之间。
  5. 根据权利要求1所述的操作平台，其中当所述第二传感器组检测的结果为所述进气端输入的所述保护气体中的水含量大于第三阈值或所述保护气体中的氧含量大于所述第四阈值时，所述第一电磁阀关闭。
  6. 根据权利要求1所述的操作平台，其中所述操作平台还包括压力检测装置，所述供气装置还用于当所述压力检测装置检测到所述保护气体的压力与大气压的差值小于一预设值时，向所述操作空间输出所述保护气体。
  7. 根据权利要求6所述的操作平台，其中所述预设值的范围为1毫巴至2毫巴。
  8. 根据权利要求1所述的操作平台，其中所述保护气体为氮气。
  9. 一种操作平台，其包括：
    操作空间，用于提供待操作物品的操作环境，所述操作空间内设置有保护气体，其中所述保护气体用于防止所述待操作物品被氧化或被腐蚀；
    纯化装置，用于对所述操作空间中的保护气体进行纯化处理，所述纯化装置包括一气体输入端和一气体输出端；
    第一传感器组，设置在所述纯化装置的气体输入端，用于检测所述操作空间中的所述保护气体的水含量以及氧含量；以及
    供气装置，用于当所述第一传感器组检测到所述保护气体中的水含量大于第一阈值或所述保护气体中的氧含量大于第二阈值时，向所述操作空间输出所述保护气体；其包括：
    进气端，用于输入所述保护气体；
    出气端，用于向所述操作空间输出所述保护气体；
    第二传感器组，用于检测所述进气端输入的所述保护气体的水含量以及氧含量；以及
    第一电磁阀，设置在所述出气端和所述进气端之间，用于根据所述第二传感器组的检测结果，控制所述供气装置向所述操作空间输出所述保护气体。
  10. 根据权利要求9所述的操作平台，其中所述第一电磁阀设置在所述第二传感器组和所述出气端之间。
  11. 根据权利要求9所述的操作平台，其中所述供气装置还包括第二电磁阀，所述第二电磁阀设置在所述第二传感器组与所述进气端之间。
  12. 根据权利要求11所述的操作平台，其中当所述第一电磁阀开启且所述第二电磁阀关闭时，所述第二传感器组还用于检测所述纯化装置的气体输出端的所述保护气体的水含量以及氧含量。
  13. 根据权利要求12所述的操作平台，其中所述供气装置的出气端与所述纯化装置的气体输出端连接。
  14. 根据权利要求11所述的操作平台，其中所述供气装置还包括过滤膜，所述过滤膜设置在所述第二电磁阀和所述第二传感器组之间。
  15. 根据权利要求9所述的操作平台，其中当所述第二传感器组检测的结果为所述进气端输入的所述保护气体中的水含量大于第三阈值或所述保护气体中的氧含量大于所述第四阈值时，所述第一电磁阀关闭。
  16. 根据权利要求9所述的操作平台，其中所述操作平台还包括压力检测装置，所述供气装置还用于当所述压力检测装置检测到所述保护气体的压力与大气压的差值小于一预设值时，向所述操作空间输出所述保护气体。
  17. 根据权利要求16所述的操作平台，其中所述预设值的范围为1毫巴至2毫巴。
  18. 根据权利要求9所述的操作平台，其中所述保护气体为氮气。
PCT/CN2014/083580 2014-07-10 2014-08-01 一种操作平台 WO2016004660A1 (zh)

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