WO2015089862A1 - 配向紫外线烘烤装置 - Google Patents

配向紫外线烘烤装置 Download PDF

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Publication number
WO2015089862A1
WO2015089862A1 PCT/CN2013/090354 CN2013090354W WO2015089862A1 WO 2015089862 A1 WO2015089862 A1 WO 2015089862A1 CN 2013090354 W CN2013090354 W CN 2013090354W WO 2015089862 A1 WO2015089862 A1 WO 2015089862A1
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WO
WIPO (PCT)
Prior art keywords
groove
ultraviolet light
ultraviolet
baking device
reflective plate
Prior art date
Application number
PCT/CN2013/090354
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English (en)
French (fr)
Inventor
刘小成
Original Assignee
深圳市华星光电技术有限公司
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Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US14/235,362 priority Critical patent/US9281092B2/en
Publication of WO2015089862A1 publication Critical patent/WO2015089862A1/zh

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/02—Irradiation devices having no beam-forming means
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133715—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films by first depositing a monomer

Definitions

  • the invention relates to the technical field of display panel production, and in particular to an alignment ultraviolet baking device. Background technique
  • Liquid crystal display has many advantages such as thin body, power saving, and no radiation, and thus has been widely used.
  • Most of the liquid crystal display devices on the market are backlight type liquid crystal display devices, which include a liquid crystal display panel and a backlight module.
  • the working principle of the liquid crystal display panel is to place liquid crystal molecules in two parallel glass substrates, control the liquid crystal molecules to change direction by the voltage of the glass substrate, and refract the light of the backlight module to produce a picture.
  • the alignment control technique of liquid crystal molecules is one of the most important basic techniques for manufacturing liquid crystal displays.
  • the picture quality displayed by the liquid crystal display is related to the advantages and disadvantages of the liquid crystal alignment.
  • liquid crystal alignment layers A thin layer generally used to orient liquid crystal molecules is referred to as liquid crystal alignment layers.
  • PSVA Polymer Stabilized Vertical Alignment
  • PSA polymer-stabilized alignment
  • a reactive monomer In a PSVA liquid crystal display, it is first necessary to incorporate a reactive monomer into the liquid crystal between the two substrates to sufficiently mix with the liquid crystal molecules, and at the same time, the surface of each transparent substrate is coated with a polyimide.
  • Polyimide (PI) which acts as an alignment substrate.
  • UV ultraviolet
  • the reactive monomer is phase separated from the liquid crystal molecules, and a polymer is formed on the alignment substrate of the substrate. Due to the interaction between the polymer and the liquid crystal molecules, the liquid crystal molecules are aligned along the direction of the polymer molecules, and therefore, the liquid crystal molecules between the substrates may have a pre-til ea ngle.
  • the substrate In order to completely polymerize the reactive monomer, it is finally necessary to bake the substrate with ultraviolet light.
  • ultraviolet baking since the illuminance of the ultraviolet light in the ultraviolet curing apparatus is generally low, it takes a long time to completely react the reactive monomer. In order to shorten the reaction time and improve the work efficiency, it is necessary to increase the illumination and uniformity of the ultraviolet light.
  • the current method is to use a reflecting plate to increase the illumination and uniformity of the ultraviolet light. Referring to FIG.
  • a schematic diagram of an alignment ultraviolet baking apparatus provided by the prior art includes a plurality of ultraviolet light sources 300 and a reflection plate 200 placed far above the ultraviolet light, and a cooling groove 500 is further disposed above the reflection plate 200 at work. During the process, cooling water or cold air may be introduced into the cooling bath to lower the operating temperature of the reflector 200.
  • the reflecting surface 210 of the reflecting plate 200 facing the ultraviolet light source is a plane.
  • the substrate 400 to be baked is placed directly under the ultraviolet light source 300, a part of the light emitted from the ultraviolet light source 300 is directly irradiated onto the substrate 400, and the other portion is reflected by the reflection plate 200 and then irradiated onto the substrate 400, thereby Light that causes the ultraviolet light source 300 to emit upward can also be utilized.
  • the planar reflector 200 also has certain disadvantages: the ultraviolet light emitted from the ultraviolet light source 300 is reflected by the reflector 200, and the reflected light is relatively divergent, and the optical path is long, thereby causing energy loss, resulting in reflection.
  • the illuminance on the substrate 400 is correspondingly insufficient, and the uniformity of light irradiated onto the substrate 400 is also deteriorated. Summary of the invention
  • an object of the present invention is to provide an alignment ultraviolet baking device which can not only improve the illuminance of ultraviolet rays, but also ensure the uniformity of ultraviolet irradiation, thereby reducing the irradiation time. Improve work efficiency.
  • the present invention provides an alignment ultraviolet baking apparatus comprising a plurality of ultraviolet light sources and a reflecting plate, the reflecting plate comprising a reflecting surface facing the ultraviolet light source, wherein the reflecting plate further comprises a The first optical portion is formed in such a manner that the reflecting surface has a groove.
  • the first optical portion is composed of a plurality of first recesses extending along a length or a width direction of the reflector, and the plurality of first grooves are arranged in parallel along a width or a length direction of the reflector.
  • each of the ultraviolet light sources is parallel and corresponds to one of the first grooves.
  • the radius of curvature of the first groove is such that the light emitted by the ultraviolet light source is reflected by the first groove and then collected on the substrate corresponding to the position of the two adjacent ultraviolet light sources.
  • the first groove is a circular arc groove.
  • the first optical portion is composed of a plurality of second grooves arranged in a honeycomb shape.
  • the second groove is evenly distributed on the reflective surface of the reflector.
  • the radius of curvature of the second groove is such that the light emitted by the ultraviolet light source is reflected by the second groove and then collected on the substrate corresponding to the position between the two adjacent ultraviolet light sources.
  • the second groove is circular.
  • the reflector further comprises a groove on the at least two sides of the reflector a second optical portion formed by the formula.
  • Another object of the present invention is to provide an alignment ultraviolet baking apparatus comprising a plurality of ultraviolet light sources and a reflecting plate, the reflecting plate comprising a reflecting surface facing the ultraviolet light source, wherein the reflecting plate further comprises a first optical portion formed by the reflective surface having a groove, the first optical portion being composed of a plurality of first grooves extending along a length or a width direction of the reflector, and the plurality of the first grooves The width or length direction of the reflector is arranged in parallel.
  • the reflector further includes a second optical portion formed in a groove formed on at least two sides of the reflector.
  • each of the ultraviolet light sources is parallel and corresponds to one of the first grooves.
  • the radius of curvature of the first groove is such that the light emitted by the ultraviolet light source is reflected by the first groove and then collected on the substrate corresponding to the position of the two adjacent ultraviolet light sources.
  • the first groove is a circular arc groove.
  • a third object of the present invention is to provide an alignment ultraviolet baking apparatus comprising a plurality of ultraviolet light sources and a reflecting plate, the reflecting plate comprising a reflecting surface facing the ultraviolet light source, wherein the reflecting plate further comprises The reflective surface has a first optical portion formed by a groove, and the first optical portion is composed of a plurality of second grooves arranged in a honeycomb shape.
  • the reflector further includes a second optical portion formed in a groove formed on at least two sides of the reflector.
  • the second groove is evenly distributed on the reflective surface of the reflector.
  • the radius of curvature of the second groove is such that the light emitted by the ultraviolet light source is reflected by the second groove and then collected on the substrate corresponding to the position between the two adjacent ultraviolet light sources.
  • the alignment ultraviolet baking device provided by the invention increases the utilization ratio of the ultraviolet light by the first optical portion provided on the reflecting surface of the reflecting plate, and the reflected light of the ultraviolet light emitted from the ultraviolet light source is reflected by the reflecting plate.
  • the reflected light is prevented from being excessively diverged, resulting in loss of reflected light, thereby improving the utilization of ultraviolet light, increasing the illumination of the ultraviolet light and the uniformity of the illumination, thereby shortening the irradiation time and improving Work efficiency.
  • the ultraviolet baking device can further increase the illuminance of the ultraviolet light and the uniformity of the irradiation by using the second optical portion provided on the side of the reflecting plate.
  • FIG. 1 is a schematic view showing the structure of an alignment ultraviolet baking device provided by the prior art
  • 2 is a schematic structural view of a reflecting plate in an alignment ultraviolet baking apparatus according to Embodiment 1 of the present invention, wherein FIG. 2a is a structural schematic view of a reflecting surface of the reflecting plate, and FIG. 2b is a cross-sectional view along the AA direction of FIG. 2a;
  • FIG. 3 is a schematic structural view of an alignment ultraviolet baking apparatus according to Embodiment 1 of the present invention
  • FIG. 4 is a schematic structural view of a reflection plate in an alignment ultraviolet baking apparatus according to Embodiment 2 of the present invention, wherein FIG. 4a is a reflection surface of the reflection plate. 4b is a cross-sectional view taken along line BB of FIG. 4a;
  • FIG. 5 is a schematic structural view of an alignment ultraviolet baking apparatus according to Embodiment 2 of the present invention.
  • the alignment ultraviolet baking apparatus includes a plurality of ultraviolet light sources 300 and a reflection plate 100, wherein the reflection plate 100 includes a reflection surface facing the ultraviolet light source 300, and a reflection surface of the reflection plate 100.
  • a first optical portion formed by a groove is provided.
  • the first optical portion is composed of a plurality of first grooves 110 extending in the longitudinal direction of the reflecting plate 100, wherein the plurality of first grooves 110 are arranged in parallel along the width direction of the reflecting plate 100.
  • the first optical portion may also be composed of a plurality of first grooves 110 extending in the width direction of the reflection plate 100, wherein the plurality of first grooves 110 are parallel along the length direction of the reflection plate 100. arrangement.
  • the first groove 110 has a circular arc shape along a section perpendicular to the reflecting surface. Of course, in other embodiments, it may be an elliptical arc or a triangle.
  • the ultraviolet light source 300 is disposed below the reflective plate 100, wherein each of the ultraviolet light sources 300 is parallel and corresponds to a first recess 110.
  • the distance between the ultraviolet light source 300 and the reflecting plate 100 is related to the height of the alignment ultraviolet baking device, and also determines the radius of curvature of the first groove 110.
  • the radius of curvature of the first groove 110 is such that the ultraviolet light source 300 The emitted light is reflected by the first groove 110 and then collected on the substrate 400 corresponding to the position between the two adjacent ultraviolet light sources 300.
  • a cooling groove 500 is disposed above the reflecting plate 100. During operation, cooling water or cold air can be introduced into the cooling bath to lower the operating temperature of the reflecting plate 100.
  • the substrate 400 to be baked is placed directly under the ultraviolet light source 300, and part of the light emitted from the ultraviolet light source 300 is directly irradiated onto the substrate 400, and the other portion is reversed through the first groove 110.
  • the shot is irradiated onto the substrate 400 so that the light emitted upward from the ultraviolet light source 300 can also be utilized.
  • the first groove 110 has a radius of curvature such that the upwardly emitted light of the ultraviolet light source 300 is reflected by the first groove 110 and collected on the substrate 400 corresponding to the position of the two adjacent ultraviolet light sources 300, thereby reducing the reflected light due to the path.
  • the long-term loss thereby increasing the utilization of ultraviolet light, increasing the illumination of the ultraviolet light and the uniformity of the illumination, thereby shortening the irradiation time and improving the work efficiency.
  • a second optical portion is further disposed on at least two sides of the reflecting plate 100.
  • the second optical portion is a third groove 130 arranged in a honeycomb shape on the side surface, and the third concave portion The grooves 130 are evenly distributed on the side of the reflecting plate.
  • the third groove 130 has a circular arc shape along a cross section perpendicular to the side surface, and is used for reflecting the light emitted from the ultraviolet light source 300 not irradiated to the substrate 400 and the reflection plate 100 back to the substrate 400, thereby further improving the utilization rate of the ultraviolet light. , increase the illuminance of ultraviolet light.
  • the second optical portion may also be composed of a groove extending along the width or length direction of the reflecting plate 100, and the shape of the groove may also be an ellipse, a triangle or the like.
  • the alignment ultraviolet baking apparatus includes a plurality of ultraviolet light sources 300 and a reflection plate 200, wherein the reflection plate 200 includes a reflection surface facing the ultraviolet light source 300, a back surface opposite to the reflection surface, and A first optical portion formed to have a groove with respect to the back surface is provided on the reflecting surface of the reflecting plate 200 perpendicular to the side surface of the reflecting surface.
  • the first optical portion is composed of a plurality of second grooves 120 arranged in a honeycomb shape and uniformly distributed on the reflecting surface of the reflecting plate 200, wherein the second groove 120 is parallel to the reflecting surface. It is circular, of course, and may be elliptical or other shapes in other embodiments.
  • the ultraviolet light source 300 is disposed below the reflection plate 200.
  • the distance between the ultraviolet light source 300 and the reflector 200 is related to the height of the alignment ultraviolet baking device, and also determines the radius of curvature of the second groove 120.
  • the radius of curvature of the second groove 120 is such that the ultraviolet light source 300
  • the emitted light is reflected by the second groove 120 and is collected on the substrate 400 corresponding to the position between the two adjacent ultraviolet light sources 300.
  • a cooling tank 500 is disposed above the reflecting plate 100. During operation, cooling water or cold air can be introduced into the cooling tank to lower the operating temperature of the reflecting plate 100.
  • the substrate 400 to be baked is placed directly under the ultraviolet light source 300, a part of the light emitted from the ultraviolet light source 300 is directly irradiated onto the substrate 400, and another portion is reflected by the second groove 120 and irradiated onto the substrate 400.
  • the light emitted upward from the ultraviolet light source 300 can also be utilized.
  • the second groove 120 has a radius of curvature such that the upwardly emitted light of the ultraviolet light source 300 is reflected by the second groove 120 and collected on the substrate 400 corresponding to the position between the two adjacent ultraviolet light sources 300, thereby reducing the reflected light.
  • the alignment ultraviolet curing device since the depth of the second groove 120 is small, the alignment ultraviolet curing device provided by the embodiment requires a small space occupation rate and equipment cost.
  • a second optical portion is further disposed on at least two sides of the reflecting plate 100.
  • the second optical portion is a third groove 130 arranged in a honeycomb shape on the side surface, and the third concave portion
  • the grooves 130 are evenly distributed on the side of the reflecting plate.
  • the third groove 130 has a circular arc shape along a cross section perpendicular to the side surface, and is used for reflecting the light emitted from the ultraviolet light source 300 not irradiated to the substrate 400 and the reflection plate 100 back to the substrate 400, thereby further improving the utilization rate of the ultraviolet light. , increase the illuminance of ultraviolet light.
  • the second optical portion may also be composed of a groove extending along the width or length direction of the reflecting plate 100, and the shape of the groove may also be an ellipse, a triangle or the like.
  • the present invention provides an alignment ultraviolet baking device that increases the utilization of ultraviolet light by a first optical portion provided on a reflecting surface of the reflecting plate, so that the ultraviolet light emitted by the ultraviolet light source is reflected by the reflecting plate.
  • the reflected light is concentrated on the substrate corresponding to the position of the two adjacent ultraviolet light sources, so as to prevent the reflected light from being excessively diverged and causing the loss of the reflected light, thereby improving the utilization of the ultraviolet light, increasing the illumination of the ultraviolet light and the uniformity of the illumination, and further Shorten the irradiation time and improve work efficiency.
  • the ultraviolet baking device can further increase the illuminance of the ultraviolet light and the uniformity of the irradiation by using the second optical portion provided on the side of the reflecting plate.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
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Abstract

一种配向紫外线烘烤装置，包括多个紫外光源（300）和反射板（100），其中，所述反射板（100）包括正对紫外光源的反射面，相对于所述反射面的背面以及垂直于反射面的侧面，所述反射板还包括设于反射面上的以相对于所述背面具有凹槽的方式形成的第一光学部。还提供了一种配向紫外线烘烤装置，通过在反射板（100）的反射面上设有的第一光学部以及反射板的侧面设有的第二光学部来使紫外光源（300）发出的未照射到基板（400）上的光反射到基板（400）上，从而增加紫外光的利用率，增加紫外光的照度及照射的均匀性，进而缩短照射时间，提高工作效率。

Description

说 明 书 配向紫外线烘烤装置 技术领域
本发明涉及显示面板生产技术领域， 尤其涉及一种配向紫外线烘烤装置。 背景技术
液晶显示装置 （LCD, Liquid Crystal Display)具有机身薄、 省电、 无辐射等 众多优点， 从而得到了广泛的应用。 现有市场上的液晶显示装置大部分为背光 型液晶显示装置， 其包括液晶显示面板及背光模组（backlight module)。液晶显 示面板的工作原理是在两片平行的玻璃基板当中放置液晶分子， 通过玻璃基板 通电电压来控制液晶分子改变方向， 将背光模组的光线折射出来产生画面。 液晶分子的配向控制技术是制造液晶显示器 （liquid crystal display)最重要 的基本技术之一。 液晶显示器所显示的画面质量与液晶配向的优劣有关， 只有 使面板内的液晶材料呈稳定且均匀地排列， 才能呈现高质量的画面。一般用来 使液晶分子定向排列的薄层， 称为液晶配向层 （alignment layers)。 目前， 由聚 合物稳定配向 (polymer— stabilized alignment, PSA)制程所制造而成的聚合物稳 定垂直配向型 (Polymer Stabilized Vertical Alignment, PSVA)液晶显示器，其可具 有广视角、 高开口率、 高对比及制程简单等优点， 因此得到广泛应用。
在 PSVA液晶显示器中， 首先需要在两基板之间的液晶内掺入反应型单体 (reactive monomer), 使其与液晶分子充分混合， 同时， 每一透明基板的表面均 涂布有聚酰亚胺 (polyimide, PI) , 其作为配向基材。 然后， 在两基板上施加电 压并利用紫外 （UV) 光照射基板， 此时， 反应型单体与液晶分子发生相分离 (phase separation),而在基板的配向基材上形成聚合物。由于聚合物跟液晶分子 之间的相互作用， 液晶分子会沿着聚合分子的方向来排列， 因此， 基板之间的 液晶分子可具有预倾角 (pre-tile angle)。 为了使反应型单体聚合完全， 最后还需 要利用紫外光对基板进行烘烤。 在对基板进行紫外光烘烤时， 由于配向紫外线烘烤装置中的紫外光的照度 通常较低， 因此， 如果想将反应型单体反应完全就需要较长的时间。 为了缩短 反应时间， 提升工作效率， 就需要提高紫外光的照度以及均匀性。 然而由配向 紫外线烘烤装置高度的限制， 目前常采用的方法是利用反射板来增加紫外光的 照度以及均匀度。参阅图 1，为现有技术提供的配向紫外线烘烤装置的示意图， 包括多个紫外光源 300和置于紫外光远上方的反射板 200， 反射板 200的上方 还设有冷却槽 500， 在工作的过程中， 可以将冷却水或者冷风通入冷却槽内以 降低反射板 200的工作温度。 其中， 反射板 200的正对紫外光源的反射面 210 为一平面。 在工作时， 将需要烘烤的基板 400置于紫外光源 300的正下方， 紫 外光源 300射出来的光线一部分直接照射到基板 400上，另一部分经反射板 200 反射后照射到基板 400上，从而使得紫外光源 300向上发出的光也可以被利用。 然而， 这种平面式的反射板 200也存在一定的不足： 紫外光源 300向上发出的 紫外光经反射板 200反射后的反射光较为发散， 其光路较长， 从而造成能量的 损失，导致反射到基板 400上的照度相应的不足，同时也会造成照射到基板 400 上的光的均匀性变差。 发明内容
为解决上述现有技术所存在的问题， 本发明的目的在于提供一种配向紫外 线烘烤装置， 该装置不仅可以提高紫外线的照度， 同时还可以保证紫外线照射 的均匀性， 从而可以减少照射时间， 提高工作效率。
为了实现上述目的， 本发明提供的一种配向紫外线烘烤装置， 包括多个紫 外光源和反射板， 所述反射板包括正对紫外光源的反射面， 其中， 所述反射板 还包括设于所述反射面具有凹槽的方式形成的第一光学部。
其中， 所述第一光学部由多个沿所述反射板长度或宽度方向延伸的第一凹 槽组成， 多个所述第一凹槽沿所述反射板的宽度或长度方向平行排列。
其中， 每个所述紫外光源平行且对应于一个所述第一凹槽。
其中， 所述第一凹槽的曲率半径以使所述紫外光源发出的光经由第一凹槽 反射后聚集在两相邻的紫外光源中间位置对应的基板上为准。
其中， 所述第一凹槽为圆弧形凹槽。
其中， 所述第一光学部由多个呈蜂窝状排列的第二凹槽组成。
其中， 所述第二凹槽均匀分布在所述反射板的反射面上。
其中， 所述第二凹槽的曲率半径以使所述紫外光源发出的光经由第二凹槽 反射后聚集在两相邻的紫外光源中间位置对应的基板上为准。
其中， 所述第二凹槽为圆形。
其中， 所述反射板还包括设于所述反射板的至少两个侧面上的以凹槽的方 式形成的第二光学部。
本发明的另一目的在于提供一种配向紫外线烘烤装置， 包括多个紫外光源 和反射板， 所述反射板包括正对紫外光源的反射面， 其中， 所述反射板还包括 设于所述反射面具有凹槽的方式形成的第一光学部， 所述第一光学部由多个沿 所述反射板长度或宽度方向延伸的第一凹槽组成， 多个所述第一凹槽沿所述反 射板的宽度或长度方向平行排列。
其中， 所述反射板还包括设于所述反射板的至少两个侧面上的以凹槽的方 式形成的第二光学部。
其中， 每个所述紫外光源平行且对应于一个所述第一凹槽。
其中， 所述第一凹槽的曲率半径以使所述紫外光源发出的光经由第一凹槽 反射后聚集在两相邻的紫外光源中间位置对应的基板上为准。
其中， 所述第一凹槽为圆弧形凹槽。
本发明的第三目的在于提供一种配向紫外线烘烤装置， 包括多个紫外光源 和反射板， 所述反射板包括正对紫外光源的反射面， 其中， 所述反射板还包括 设于所述反射面具有凹槽的方式形成的第一光学部， 所述第一光学部由多个呈 蜂窝状排列的第二凹槽组成。
其中， 所述反射板还包括设于所述反射板的至少两个侧面上的以凹槽的方 式形成的第二光学部。
其中， 所述第二凹槽均匀分布在所述反射板的反射面上。
其中， 所述第二凹槽的曲率半径以使所述紫外光源发出的光经由第二凹槽 反射后聚集在两相邻的紫外光源中间位置对应的基板上为准。
其中， 所述第二凹槽为圆形。 本发明提供的配向紫外线烘烤装置， 通过在反射板的反射面上设有的第一 光学部来增加紫外光的利用率， 使紫外光源发出的紫外光经反射板反射后的反 射光聚集在两相邻的紫外光源中间位置对应的基板上， 避免反射光过于发散而 导致反射光的损失， 从而提高紫外光的利用率， 增加紫外光的照度及照射的均 匀性， 进而缩短照射时间， 提高工作效率。 同时， 该紫外线烘烤装置还可以利 用设于反射板侧面的第二光学部进一步增加紫外光的照度及照射的均匀性。 附图说明
图 1为现有技术提供的配向紫外线烘烤装置结构示意图； 图 2为本发明实施例 1 提供的配向紫外线烘烤装置中反射板的结构示意 图， 其中， 图 2a为反射板反射面的结构示意图， 图 2b为沿图 2a的 A-A方向 的剖视图；
图 3为本发明实施例 1提供的配向紫外线烘烤装置的结构示意图； 图 4为本发明实施例 2提供的配向紫外线烘烤装置中反射板的结构示意 图， 其中， 图 4a为反射板反射面的结构示意图， 图 4b为沿图 4a的 B-B方向 的剖视图； 图 5为本发明实施例 2提供的配向紫外线烘烤装置的结构示意图。 具体实施方式
现在对本发明实施例进行详细的描述， 其示例表示在附图中， 其中， 相同 的标号始终表示相同部件。 下面通过参照附图对实施例进行描述以解释本发 明。
实施例 1
参阅图 2和图 3， 本实施例提供的配向紫外线烘烤装置包括多个紫外光源 300和反射板 100， 其中， 反射板 100包括正对紫外光源 300的反射面， 在反 射板 100的反射面上设有凹槽方式形成的第一光学部。 在本实施例中， 第一光 学部由多个沿反射板 100长度方向延伸的第一凹槽 110组成， 其中， 该多个第 一凹槽 110沿反射板 100的宽度方向平行排列。 当然， 在其他实施例中， 第一 光学部也可以由多个沿反射板 100宽度方向延伸的第一凹槽 110组成， 其中， 该多个第一凹槽 110沿反射板 100的长度方向平行排列。第一凹槽 110沿垂直 于反射面的剖面为一圆弧形， 当然， 在其他实施例中也可以为椭圆弧形或者三 角形。 紫外光源 300设于反射板 100的下方， 其中， 每个紫外光源 300平行且 对应于一个第一凹槽 110。 紫外光源 300与反射板 100之间的距离与配向紫外 线烘烤装置的高度有关， 同时也决定了第一凹槽 110的曲率半径， 具体地， 第 一凹槽 110的曲率半径以使紫外光源 300发出的光经由第一凹槽 110反射后聚 集在两相邻的紫外光源 300中间位置对应的基板 400上为准。反射板 100的上 方设有冷却槽 500， 在工作时， 可以将冷却水或者冷风通入冷却槽内以降低反 射板 100的工作温度。
在工作时， 将需要烘烤的基板 400置于紫外光源 300的正下方， 紫外光源 300射出来的光线一部分直接照射到基板 400上， 另一部分经第一凹槽 110反 射后照射到基板 400上， 从而使得紫外光源 300向上发出的光也可以被利用。 第一凹槽 110具有的曲率半径使得紫外光源 300向上发出的光经第一凹槽 110 反射后聚集在两相邻的紫外光源 300中间位置对应的基板 400上， 因此可以减 少反射光由于路径较长而造成的损失， 从而提高紫外光的利用率， 增加紫外光 的照度及照射的均匀性， 进而缩短照射时间， 提高工作效率。
进一步地， 在反射板 100的至少两个侧面上还设有第二光学部， 在本实施 例中， 第二光学部为设于侧面上的蜂窝状排列的第三凹槽 130， 第三凹槽 130 均匀地分布在反射板的侧面上。该第三凹槽 130沿垂直于侧面的剖面为圆弧形， 用于将紫外光源 300发出的未照射到基板 400和反射板 100的光反射回基板 400上， 从而进一步提高紫外光的利用率， 增加紫外光的照度。 当然， 在其他 实施例中，第二光学部也可以由沿反射板 100宽度或长度方向延伸的凹槽组成， 凹槽的形状也可以为椭圆形、 三角形等。
实施例 2
参阅图 4和图 5， 本实施例提供的配向紫外线烘烤装置包括多个紫外光源 300和反射板 200， 其中， 反射板 200包括正对紫外光源 300的反射面、 相对 于反射面的背面以及垂直于反射面的侧面， 在反射板 200的反射面上设有以相 对于背面具有凹槽的方式形成的第一光学部。 在本实施例中， 第一光学部由多 个呈蜂窝状排列的均匀地分布在反射板 200的反射面上第二凹槽 120组成， 其 中， 第二凹槽 120沿平行于反射面的剖面为圆形， 当然， 在其他实施例中也可 以为椭圆形或者其他形状。紫外光源 300设于反射板 200的下方。紫外光源 300 与反射板 200之间的距离与配向紫外线烘烤装置的高度有关， 同时也决定了第 二凹槽 120的曲率半径， 具体地， 第二凹槽 120的曲率半径以使紫外光源 300 发出的光经由第二凹槽 120反射后聚集在两相邻的紫外光源 300中间位置对应 的基板 400上为准。 反射板 100的上方设有冷却槽 500， 在工作时， 可以将冷 却水或者冷风通入冷却槽内以降低反射板 100的工作温度。
在工作时， 将需要烘烤的基板 400置于紫外光源 300的正下方， 紫外光源 300射出来的光线一部分直接照射到基板 400上， 另一部分经第二凹槽 120反 射后照射到基板 400上， 从而使得紫外光源 300向上发出的光也可以被利用。 优选地， 第二凹槽 120具有的曲率半径使得紫外光源 300向上发出的光经第二 凹槽 120反射后聚集在两相邻的紫外光源 300中间位置对应的基板 400上， 因 此可以减少反射光由于路径较长而造成的损失， 从而提高紫外光的利用率， 增 加紫外光的照度及照射的均匀性， 进而缩短照射时间， 提高工作效率。 同时， 由于第二凹槽 120的深度较小时即可达到要求， 因此本实施例提供的配向紫外 线烘烤装置需要较小的空间占用率及设备成本。
进一步地， 在反射板 100的至少两个侧面上还设有第二光学部， 在本实施 例中， 第二光学部为设于侧面上的蜂窝状排列的第三凹槽 130， 第三凹槽 130 均匀地分布在反射板的侧面上。该第三凹槽 130沿垂直于侧面的剖面为圆弧形， 用于将紫外光源 300发出的未照射到基板 400和反射板 100的光反射回基板 400上， 从而进一步提高紫外光的利用率， 增加紫外光的照度。 当然， 在其他 实施例中，第二光学部也可以由沿反射板 100宽度或长度方向延伸的凹槽组成， 凹槽的形状也可以为椭圆形、 三角形等。 综上所述， 本发明提供的配向紫外线烘烤装置， 通过在反射板的反射面上 设有的第一光学部来增加紫外光的利用率， 使紫外光源发出的紫外光经反射板 反射后的反射光聚集在两相邻的紫外光源中间位置对应的基板上， 避免反射光 过于发散而导致反射光的损失， 从而提高紫外光的利用率， 增加紫外光的照度 及照射的均匀性， 进而缩短照射时间， 提高工作效率。 同时， 该紫外线烘烤装 置还可以利用设于反射板侧面的第二光学部进一步增加紫外光的照度及照射 的均匀性。 需要说明的是， 在本文中， 诸如第一和第二等之类的关系术语仅仅用来将 一个实体或者操作与另一个实体或操作区分开来， 而不一定要求或者暗示这些 实体或操作之间存在任何这种实际的关系或者顺序。 而且， 术语"包括"、 "包 含"或者其任何其他变体意在涵盖非排他性的包含， 从而使得包括一系列要素 的过程、 方法、 物品或者设备不仅包括那些要素， 而且还包括没有明确列出的 其他要素， 或者是还包括为这种过程、 方法、 物品或者设备所固有的要素。 在 没有更多限制的情况下， 由语句 "包括一个 ...... "限定的要素， 并不排除在包括 所述要素的过程、 方法、 物品或者设备中还存在另外的相同要素。 虽然本发明是参照其示例性的实施例被具体描述和显示的，但是本领域的 普通技术人员应该理解， 在不脱离由权利要求限定的本发明的精神和范围的情 况下， 可以对其进行形式和细节的各种改变。

Claims

权利要求书
1、 一种配向紫外线烘烤装置， 包括多个紫外光源和反射板， 所述反射板 包括正对紫外光源的反射面， 其中， 所述反射板还包括设于所述反射面具有凹 槽的方式形成的第一光学部。
2、 根据权利要求 1所述的配向紫外线烘烤装置， 其中， 所述第一光学部 由多个沿所述反射板长度或宽度方向延伸的第一凹槽组成， 多个所述第一凹槽 沿所述反射板的宽度或长度方向平行排列。
3、 根据权利要求 2所述的配向紫外线烘烤装置， 其中， 每个所述紫外光 源平行且对应于一个所述第一凹槽。
4、 根据权利要求 3所述的配向紫外线烘烤装置， 其中， 所述第一凹槽的 曲率半径以使所述紫外光源发出的光经由第一凹槽反射后聚集在两相邻的紫 外光源中间位置对应的基板上为准。
5、 根据权利要求 2所述的配向紫外线烘烤装置， 其中， 所述第一凹槽为 圆弧形凹槽。
6、 根据权利要求 1所述的配向紫外线烘烤装置， 其中， 所述第一光学部 由多个呈蜂窝状排列的第二凹槽组成。
7、 根据权利要求 6所述的配向紫外线烘烤装置， 其中， 所述第二凹槽均 匀分布在所述反射板的反射面上。
8、 根据权利要求 6所述的配向紫外线烘烤装置， 其中， 所述第二凹槽的 曲率半径以使所述紫外光源发出的光经由第二凹槽反射后聚集在两相邻的紫 外光源中间位置对应的基板上为准。
9、 根据权利要求 6所述的配向紫外线烘烤装置， 其中， 所述第二凹槽为 圆形。
10、 根据权利要求 1所述的配向紫外线烘烤装置， 其中， 所述反射板还包 括设于所述反射板的至少两个侧面上的以凹槽的方式形成的第二光学部。
11、 一种配向紫外线烘烤装置， 包括多个紫外光源和反射板， 所述反射板 包括正对紫外光源的反射面， 其中， 所述反射板还包括设于所述反射面具有凹 槽的方式形成的第一光学部，所述第一光学部由多个沿所述反射板长度或宽度 方向延伸的第一凹槽组成， 多个所述第一凹槽沿所述反射板的宽度或长度方向 平行排列。
12、 根据权利要求 11 所述的配向紫外线烘烤装置， 其中， 所述反射板还 包括设于所述反射板的至少两个侧面上的以凹槽的方式形成的第二光学部。
13、 根据权利要求 11 所述的配向紫外线烘烤装置， 其中， 每个所述紫外 光源平行且对应于一个所述第一凹槽。
14、 根据权利要求 13所述的配向紫外线烘烤装置， 其中， 所述第一凹槽 的曲率半径以使所述紫外光源发出的光经由第一凹槽反射后聚集在两相邻的 紫外光源中间位置对应的基板上为准。
15、 根据权利要求 11 所述的配向紫外线烘烤装置， 其中， 所述第一凹槽 为圆弧形凹槽。
16、 一种配向紫外线烘烤装置， 包括多个紫外光源和反射板， 所述反射板 包括正对紫外光源的反射面， 其中， 所述反射板还包括设于所述反射面具有凹 槽的方式形成的第一光学部，所述第一光学部由多个呈蜂窝状排列的第二凹槽 组成。
17、 根据权利要求 16所述的配向紫外线烘烤装置， 其中， 所述反射板还 包括设于所述反射板的至少两个侧面上的以凹槽的方式形成的第二光学部。
18、 根据权利要求 16所述的配向紫外线烘烤装置， 其中， 所述第二凹槽 均匀分布在所述反射板的反射面上。
19、 根据权利要求 16所述的配向紫外线烘烤装置， 其中， 所述第二凹槽 的曲率半径以使所述紫外光源发出的光经由第二凹槽反射后聚集在两相邻的 紫外光源中间位置对应的基板上为准。
20、 根据权利要求 16所述的配向紫外线烘烤装置， 其中， 所述第二凹槽 为圆形。
PCT/CN2013/090354 2013-12-20 2013-12-24 配向紫外线烘烤装置 WO2015089862A1 (zh)

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