WO2014190676A1 - 曝光设备和曝光方法 - Google Patents

曝光设备和曝光方法 Download PDF

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Publication number
WO2014190676A1
WO2014190676A1 PCT/CN2013/086978 CN2013086978W WO2014190676A1 WO 2014190676 A1 WO2014190676 A1 WO 2014190676A1 CN 2013086978 W CN2013086978 W CN 2013086978W WO 2014190676 A1 WO2014190676 A1 WO 2014190676A1
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WO
WIPO (PCT)
Prior art keywords
light
diffusion sheet
exposure
source
light source
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Application number
PCT/CN2013/086978
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English (en)
French (fr)
Inventor
王灿
于剑伟
Original Assignee
京东方科技集团股份有限公司
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Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/351,083 priority Critical patent/US9500955B2/en
Publication of WO2014190676A1 publication Critical patent/WO2014190676A1/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Definitions

  • Embodiments of the present invention relate to an exposure apparatus and an exposure method. Background technique
  • TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • the method for preparing the metal conductive layer portion in the gate line or the data line on the TFT array substrate comprises: first forming a metal layer on the substrate, then coating the metal layer on the photoresist layer, and then passing the photoresist layer through the mask layer Exposure, development, and finally etching of the metal layer are obtained.
  • the existing process for exposing the photoresist by using the exposure device is as follows: First, the substrate is put into the exposure process, the substrate is loaded on the substrate stage, pre-aligned, and then the substrate is adsorbed on the substrate stage by the vacuum adsorption device. Upper, adjusting the gap between the substrate and the mask, and achieving accurate alignment between the substrate and the mask. After the alignment is completed, the photoresist on the substrate is exposed by ultraviolet light, and then the substrate and the substrate are removed. The vacuum adsorption state between the stages unloads the substrate from the substrate stage. Summary of the invention
  • Embodiments of the present invention provide an exposure apparatus and an exposure method capable of achieving uniform exposure of a photoresist on a substrate.
  • An aspect of the invention provides an exposure apparatus including a light source and a diffusion sheet located under the light source, wherein a side of the diffusion sheet adjacent to the light source is a light incident surface, and the diffusion is opposite to the light incident surface The sheet is refracted, and after the light is diffused, it is uniformly emitted from the entire surface of the light exiting surface.
  • one of the light incident surface and the light exit surface is a flat surface, and the other surface is a spherical convex surface.
  • one of the light incident surface and the light exit surface is a flat surface, and the other surface has a central spherical surface and a plurality of concentric annular arc surfaces.
  • the light source may be a point source located at a focus of the diffuser.
  • the size of the diffusion sheet may be greater than or equal to the size of the substrate to be exposed.
  • the exposure apparatus may further include a mask stage carrying a mask, the diffusion sheet being located between the light source and the mask.
  • the diffuser is made of glass, crystal or transparent plastic.
  • a second aspect of the present invention provides an exposure method using the above exposure apparatus, comprising: disposing a mask on a mask stage, placing a substrate to be exposed on a substrate stage; placing the diffusion sheet Between the light source and the mask stage, the diffusion sheet is configured to refract and diffuse light from the light source to uniformly emit the light from the diffusion sheet; and expose the substrate to be exposed
  • FIG. 1 is a first schematic view of an exposure apparatus in an embodiment of the present invention
  • FIG. 2a is a schematic view 2 of an exposure apparatus in an embodiment of the present invention
  • FIG. 2b is a variant of the diffusion sheet of the exposure apparatus
  • 3a-3d are schematic views showing a process of fabricating a diffusion sheet according to an embodiment of the present invention.
  • FIG. 4 is a top plan view 1 of a diffusion sheet in an embodiment of the present invention.
  • Figure 5 is a plan view 2 of the diffusion sheet in the embodiment of the present invention.
  • Fig. 6 is a third schematic view of the exposure apparatus in the embodiment of the present invention.
  • 1 a light source; 2 - a diffusion sheet; 21 - a light entrance surface;
  • the inventors found that in the conventional exposure method, when exposing the photoresist on a substrate, the photoresist is exposed at the edge of the substrate due to adverse factors such as light diffraction and uneven light amount.
  • the degree of exposure differs from that of the photoresist at the center of the substrate, which affects the quality of the resulting array substrate, which in turn affects the display quality of the finally prepared TFT-LCD.
  • the exposure apparatus includes: a light source 1 and a diffusion sheet 2 under the light source 1.
  • the diffusion sheet 2 is adjacent to the light source 1 and is light-introduced.
  • the surface 21 and the surface opposite to the light incident surface 21 are the light exit surfaces 22.
  • the light emitted from the light source 1 enters the diffusion sheet 2 from the light incident surface 21, is refracted in the diffusion sheet 2, and after the light is diffused, it is uniformly emitted from the light exit surface 22.
  • An exposure apparatus includes a light source and a diffusion sheet under the light source.
  • the diffusion sheet can refract light and uniformly concentrate the concentrated light from the light source to improve the substrate to be exposed.
  • the photoresist receives the uniformity of the light, improves the exposure quality of the photoresist on the substrate, thereby improving the quality of the prepared array substrate, and improving the display effect of the prepared liquid crystal display, thereby finally improving the user experience.
  • the specific structure of the diffusion sheet 2 can be various, and is applicable to the embodiment of the present invention as long as it can function to refract and diffuse concentrated light.
  • one of the light incident surface 21 and the light exit surface 22 of the diffusion sheet 2 is a flat surface, and the other surface is a spherical convex surface, as shown in FIG. 2a; the light incident surface 21 of the diffusion sheet 2 is a spherical convex surface, and the light exit surface 22
  • the light is inside the diffuser 2 or enters the diffuser 2, the light is refracted, and the more concentrated light is diffused by the diffuser 2, and is uniformly emitted from the light exiting surface 22, and the light is basically mutually parallel.
  • Such a diffusion sheet 2 can effectively diverge the more concentrated light from the light source, thereby improving the uniformity of the light received by the photoresist on the substrate to be exposed.
  • the diffusion sheet 2 may have a structure in which both faces are spherical convex.
  • the structure of the spherical convex surfaces on the two faces can be different.
  • the diffusion sheet 2 may include a lens array 2a formed on the light incident surface as shown in Fig. 2b.
  • the thickness of the diffusion sheet 2 shown in Fig. 2a is large, when the exposure apparatus cannot accommodate the diffusion sheet 2 having such a large thickness, it is conceivable to deform the structure of the diffusion sheet 2 shown in Fig. 2a.
  • An example of this variation can be as follows. First, the radius and focal length of the diffusion sheet 2 shown in FIG. 3a are designed, and the shape of the diffusion sheet is created by using simulation software such as CAD; then, as shown in FIG. 3b, the diffusion sheet 2 shown in FIG. 3a is found layer by layer. The part of the optical path (shaded in the figure) is not affected, and these parts are actually composed of a relatively flat cylindrical shape in which a plurality of central axes coincide; as shown in Fig.
  • a diffusion sheet 2 as shown in Fig. 3d is finally formed, and the diffusion sheet shown in Fig. 3d has a plurality of protrusions, and the edge of the section of the protrusion located at the center is an arc, and the remaining protrusions
  • the cross section is a right-angled triangle or a fan-shaped shape, which is symmetrically arranged on the left and right of the center protrusion from small to large (ie, the cross-sectional area or arc length of the protrusion).
  • a right-angled triangle means a pattern having two mutually perpendicular right-angled sides and a curved line having a certain curvature; the lengths of two mutually perpendicular right-angled sides may be equal or unequal.
  • the central angle of the sector is preferably 90°.
  • a top view of the diffusion sheet 2 shown in Fig. 3d can be as shown in Fig. 4.
  • the diffuser 2 may have a structure in which one of the light incident surface 21 and the light exit surface 22 is a flat surface, and the other surface has a central spherical surface and a plurality of concentric annular curved surfaces, that is, as shown in FIG. The same effect as the diffusion sheet 2 shown in Fig. 2a, and requiring less material and lower manufacturing cost.
  • the size of the central spherical surface in the diffusion sheet 2 in Fig. 4 can be set according to the actual situation; the number of the plurality of concentric annular arc surfaces surrounding the central spherical surface, the size of any one of them, etc. can be set according to actual conditions.
  • the structure of the diffusion sheet 2 of FIG. 4 can be arranged closer to the central spherical surface, and the denser the concentric annular arc surface is arranged, the farther away from the central spherical surface, the more sparsely arranged the concentric annular arc surface, and the final effect is as shown in FIG. 5. Shown.
  • the concentric annular arc surface of the diffuser 2 correspondingly disposed at a relatively strong light intensity is dense, so that the diffusing effect of the diffusing sheet is more obvious, and the light intensity and density distribution from the light source 1 is improved.
  • the intensity of the light in the central region of the source 1 is greater than the intensity of the light from the central region.
  • the diffusion sheet 2 may be made of a transparent material such as glass, crystal or transparent plastic.
  • the material of the diffusion sheet 2 is plastic, it can be processed by an injection molding process.
  • the light source 1 is a point light source
  • the diffusion sheet 2 has the structure shown in FIG. 2a or FIG. 6, in order to enhance the diffusion of the concentrated light from the light source 1 by the diffusion sheet 2,
  • the light source 1 may be located at the focus of the diffusion sheet 2.
  • the size of the diffusion sheet 2 should be greater than or equal to the base to be exposed.
  • the size of the plate, the shape of the diffusion sheet 2 can also be set according to the shape of the substrate.
  • the exposure apparatus usually further includes a mask stage carrying a mask
  • the diffusion sheet 2 can be positioned between the light source 1 and the mask stage, and the exposure apparatus at this time is a proximity exposure apparatus.
  • the diffusion sheet 2 may be located between the light source 1 and the substrate stage, and the position of the mask is reserved by adjusting the distance between the diffusion sheet 2 and the substrate stage.
  • the embodiment of the present invention also provides an exposure method using the above exposure apparatus, which may include the following process.
  • Step S101 setting a mask on the mask stage, and placing the substrate to be exposed on the substrate stage;
  • Step S102 placing a diffusion sheet between the light source and the mask stage, wherein the diffusion sheet is used for refracting and diffusing light from the light source to uniformly emit the light from the diffusion sheet;
  • Step S103 Exposing the substrate to be exposed.
  • the method of the embodiment can uniformly out the concentrated light from the light source, thereby improving the uniformity of the light received by the photoresist on the substrate to be exposed, improving the exposure quality of the photoresist on the substrate, and further Improve the quality of the prepared array substrate.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种曝光设备，包括光源（1）和位于光源（1）下方的扩散片（2），扩散片（2）靠近光源（1）的一面为入光面（21），与入光面（21）相对的一面为出光面（22）；光源（1）发出的光自入光面（21）进入扩散片（2），在扩散片（2）内经过折射，光被扩散之后，自出光面（22）的各处均匀出射。曝光设备能够实现基板上的光刻胶的均匀曝光。还公开了一种使用曝光设备的曝光方法。

Description

曝光设备和曝光方法 技术领域
本发明的实施例涉及一种曝光设备和曝光方法。 背景技术
薄膜晶体管液晶显示器（Thin Film Transistor-Liquid Crystal Display, TFT-LCD ) 因其体积小、 功耗低、 无辐射等特点， 在当前的平板显示器市场 占据了主导地位。
TFT阵列基板上的栅线或数据线中的金属导电层部分的制备方法包括： 先在基板上形成金属层， 继而在金属层上涂覆光刻胶， 然后通过掩膜板对光 刻胶层进行曝光、 显影， 最后对金属层进行刻蚀后得到。
现有的利用曝光设备对光刻胶曝光的工艺流程为： 首先使基板进入曝光 流程中， 将基板装载在基板载台上， 进行预对位， 然后通过真空吸附装置将 基板吸附在基板载台上， 调整基板与掩膜板之间的间隙， 并实现基板与掩膜 板之间的精确对位， 对位完成后， 利用紫外光对基板上的光刻胶曝光， 然后 解除基板与基板载台之间的真空吸附状态， 将基板从基板载台上卸载下来。 发明内容
本发明的实施例提供了一种曝光设备和曝光方法， 能够实现对基板上的 光刻胶的均勾曝光。
本发明的一个方面提供了一种曝光设备， 包括光源和位于所述光源下方 的扩散片， 所述扩散片靠近所述光源的一面为入光面， 与所述入光面相对的 所述扩散片内经过折射，所述光被扩散之后， 自所述出光面的各处均匀出射。
例如， 所述扩散片中， 所述入光面和所述出光面中的一面为平面， 另一 面为球形凸面。
例如， 所述扩散片中， 所述入光面和所述出光面中的一面为平面， 另一 面具有中心球面和多个同心环弧面。 例如， 所述扩散片的同心环弧面中， 越靠近所述中心球面， 所述同心环 弧面排布越密集； 越远离所述中心球面， 所述同心环弧面排布越稀疏。
例如， 所述光源可以为点光源， 所述光源位于所述扩散片的焦点处。 例如， 所述扩散片的尺寸可以大于或等于待曝光的基板的尺寸。
例如， 所述曝光设备还可以包括承载掩膜板的掩膜板载台， 所述扩散片 位于所述光源和所述掩膜板之间。
例如， 所述扩散片的材质为玻璃、 水晶或透明的塑料。
本发明的第二方面提供了一种利用上述的曝光设备的曝光方法， 包括： 在掩膜板载台上设置好掩膜板， 将待曝光的基板放置在基板载台上； 将扩散 片放置在光源和所述掩膜板载台之间， 所述扩散片用于将来自光源的光进行 折射、 扩散， 使所述光自所述扩散片均匀出射； 对所述待曝光的基板进行曝
附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 筒单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1为本发明实施例中的曝光设备的示意图一；
图 2a为本发明实施例中的曝光设备的示意图二； 图 2b为曝光设备的扩 散片的一种变体；
图 3a~3d为本发明实施例中的扩散片的制作过程示意图；
图 4为本发明实施例中的扩散片的俯视图一；
图 5为本发明实施例中的扩散片的俯视图二；
图 6为本发明实施例中的曝光设备的示意图三。
附图标记：
1一光源； 2—扩散片； 21—入光面；
22—出光面。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图，对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
发明人在研究过程中发现， 在传统的曝光方法中， 在对一块基板上的光 刻胶进行曝光时， 由于受到光线衍射、 光量不均匀等不良因素的影响， 基板 边缘的光刻胶的曝光程度和基板中心的光刻胶的曝光程度有区别， 这影响了 所制得的阵列基板的质量， 进而影响了最后制备的 TFT-LCD的显示质量。
本发明实施例提供一种曝光设备， 如图 1所示， 该曝光设备包括： 光源 1和位于所述光源 1下方的扩散片 2,所述扩散片 2靠近所述光源 1的一面为 入光面 21 , 与所述入光面 21相对的一面为出光面 22。
所述光源 1发出的光自所述入光面 21进入所述扩散片 2,在所述扩散片 2内经过折射， 所述光被扩散之后， 自所述出光面 22的各处均匀出射。
本实施例提供的一种曝光设备包括光源和位于光源下的扩散片， 该扩散 片可通过对光进行折射， 将来自光源的较为集中的光均匀^:出去， 从而提 高待曝光的基板上的光刻胶接收到光线的均匀度， 提高了基板上的光刻胶的 曝光质量， 进而可以提高制备的阵列基板的质量， 以及提高制备的液晶显示 器的显示效果， 最终可提高用户的使用体验。
该扩散片 2的具体结构可以多种多样， 只要能够起到将集中的光折射、 扩散的作用， 都适用于本发明的实施例。例如， 该扩散片 2的入光面 21和所 述出光面 22中的一面为平面， 另一面为球形凸面， 如图 2a所示； 扩散片 2 的入光面 21为球形凸面， 出光面 22为平面， 光在扩散片 2内部或进入扩散 片 2之时， 经过光的折射， 较为聚拢的光被扩散片 2扩散开来， 自出光面 22 各处均匀发射出来， 且光线相互之间基本平行。 这样的扩散片 2可有效地将 来自光源的较为聚拢的光发散出去， 从而提高待曝光的基板上的光刻胶接收 到光线的均匀度。
类似的， 该扩散片 2可以为两个面均为球形凸面的结构。 例如， 两个面 上球形凸面的结构可以不同。 在另一个示例中， 扩散片 2可以包括形成在入 光面上的 透镜阵列 2a, 如图 2b所示。
由于图 2a所示的扩散片 2的厚度较大，当曝光设备无法容纳厚度这么大 的扩散片 2时， 可以考虑将图 2a所示的扩散片 2的结构进行变形。 该变形的一个示例可以如下所述。首先设计图 3a所示的扩散片 2的半径 和焦距， 并利用 CAD等仿真软件制作出该扩散片的外形； 之后， 如图 3b所 示， 逐层找出图 3a所示的扩散片 2中不影响光路的部分（图中阴影部分） ， 这些部分实际上是由多个中心轴重合的较扁的圓柱形组成；如图 3c所示，去 掉上述不影响光路的部分,并将剩余部分平移到图 3a所示的扩散片 2的底部， 最终形成如图 3d所示的扩散片 2, 图 3d所示的扩散片具有多个突起， 位于 中心的突起的截面的边缘为圓弧， 其余突起的截面为类直角三角形或扇形， 由小至大（即突起的截面面积或弧长）对称排列在中心的突起的左右。
这里， "类直角三角形" 指的是， 具有两条相互垂直的直角边和一条具 有一定弧度的曲线组成的图形；两条相互垂直的直角边长度可以相等或不等。
例如， 扇形的圓心角优选为 90°。
例如， 图 3d所示的扩散片 2的俯视图可如图 4所示。
因此， 该扩散片 2的结构还可为所述入光面 21和所述出光面 22中的一 面为平面， 另一面具有中心球面和多个同心环弧面， 即图 4所示， 也具有与 图 2a所示的扩散片 2—样的效果， 并且所需要的材料较少， 制作成本较低。
图 4中的扩散片 2中的中心球面的大小可以根据实际情况设置； 围绕中 心球面的多个同心环弧面的个数、 其中任何一个的大小等都可以根据实际情 况设置。 例如， 可以将图 4的扩散片 2的结构设置成越靠近中心球面， 同心 环弧面排布越密集， 越远离中心球面， 同心环弧面排布越稀疏， 最终所得到 的效果如图 5所示。 通过这种设计， 在光线强度相对较强的地方对应设置的 扩散片 2同心环弧面较为密集， 使得扩散片扩散作用越明显， 进而使得从光 源 1的光线强度和密集度分布情况得到改善， 变得均匀化。 通常， 光源 1的 中心区域的光线强度大于远离中心区域的光线强度。
通常， 所述扩散片 2可采用玻璃、 水晶或透明的塑料等透明材质制成。 当扩散片 2的材质为塑料时， 可采用注塑工艺加工而成。
例如， 所述光源 1为点光源， 当扩散片 2为图 2a或图 6所示的结构时， 为了提高该扩散片 2所起到的对来自光源 1的较为集中的光进行扩散的作用， 所述光源 1可位于所述扩散片 2的焦点处。
进一步的， 为了保证在曝光过程中， 待曝光的基板上的光刻胶的各个部 分都可接收到光强差不多的光， 该扩散片 2的尺寸应大于或等于待曝光的基 板的尺寸， 还可根据基板的形状设置扩散片 2的形状。
由于曝光设备中通常还包括承载掩膜板的掩膜板载台， 该扩散片 2可位 于所述光源 1和所述掩膜板载台之间， 此时的曝光设备为接近式曝光设备。
当曝光设备为接触式曝光设备时， 该扩散片 2可位于光源 1和基板载台 之间， 通过调整扩散片 2和基板载台之间的距离， 预留设置掩膜板的位置。
本发明实施例还提供了一种利用上述曝光设备的曝光方法， 该曝光方法 可包括如下工艺。
步骤 S101、在掩膜板载台上设置好掩膜板， 将待曝光的基板放置在基板 载台上；
步骤 S102、将扩散片放置在光源和所述掩膜板载台之间， 所述扩散片用 于将来自所述光源的光进行折射、 扩散， 使所述光自所述扩散片均匀出射； 步骤 S103、 对所述待曝光的基板进行曝光。
采用本实施例的方法可以将来自光源的较为集中的光均匀 出去， 从 而提高待曝光的基板上的光刻胶接收到光线的均匀度， 提高了基板上的光刻 胶的曝光质量， 进而可以提高制备的阵列基板的质量。
以上所述仅是本发明的示范性实施方式， 而非用于限制本发明的保护范 围， 本发明的保护范围由所附的权利要求确定。

Claims

权利要求书
11、、 一一种种曝曝光光设设备备，， 包包括括光光源源和和位位于于所所述述光光源源下下方方的的扩扩散散片片，， 其其中中，， 所所述述 扩扩散散片片靠靠近近所所述述光光源源的的一一面面为为入入光光面面，， 与与所所述述入入光光面面相相对对的的一一面面为为出出光光面面；； 所所述述光光被被扩扩散散之之后后，， 自自所所述述出出光光面面的的各各处处均均匀匀出出射射。。
22、、根根据据权权利利要要求求 11所所述述的的曝曝光光设设备备，， 其其中中，， 所所述述入入光光面面和和所所述述出出光光面面中中 的的一一面面为为平平面面，， 另另一一面面为为球球形形凸凸面面。。
33、、根根据据权权利利要要求求 11所所述述的的曝曝光光设设备备，， 其其中中，， 所所述述入入光光面面和和所所述述出出光光面面中中 1100 的的一一面面为为平平面面，， 另另一一面面具具有有中中心心球球面面和和多多个个同同心心环环弧弧面面。。
44、、 根根据据权权利利要要求求 33所所述述的的曝曝光光设设备备，， 其其中中，， 越越靠靠近近所所述述中中心心球球面面，， 所所述述 同同心心环环弧弧面面排排布布越越密密集集；；越越远远离离所所述述中中心心球球面面，，所所述述同同心心环环弧弧面面排排布布越越稀稀疏疏。。
55、、 根根据据权权利利要要求求 22--44任任一一所所述述的的曝曝光光设设备备，， 其其中中，， 所所述述光光源源为为点点光光源源，， 所所述述光光源源位位于于所所述述扩扩散散片片的的焦焦点点处处。。
1155 66、、 根根据据权权利利要要求求 11--55任任一一所所述述的的曝曝光光设设备备，， 其其中中，， 所所述述扩扩散散片片的的尺尺寸寸大大 于于或或等等于于待待曝曝光光的的基基板板的的尺尺寸寸。。
77、、根根据据权权利利要要求求 11--66任任一一所所述述的的曝曝光光设设备备，，还还包包括括承承载载掩掩膜膜板板的的掩掩膜膜板板 载载台台，， 其其中中，， 所所述述扩扩散散片片位位于于所所述述光光源源和和所所述述掩掩膜膜板板载载台台之之间间。。
88、、 根根据据权权利利要要求求 11--77任任一一所所述述的的曝曝光光设设备备，， 其其中中，， 所所述述扩扩散散片片的的材材质质为为 2200 玻玻璃璃、、 水水晶晶或或透透明明的的塑塑料料。。
99、、 一一种种利利用用权权利利要要求求 11--88任任一一项项所所述述的的曝曝光光设设备备的的曝曝光光方方法法，， 包包括括：： 在在掩掩膜膜板板载载台台上上设设置置掩掩膜膜板板，， 将将待待曝曝光光的的基基««置置在在基基板板载载台台上上；； 将将扩扩散散片片放放置置在在光光源源和和所所述述掩掩膜膜板板载载台台之之间间，， 所所述述扩扩散散片片用用于于将将来来自自光光 源源的的光光进进行行折折射射、、 扩扩散散，， 使使所所述述光光自自所所述述扩扩散散片片均均匀匀出出射射；；
25 *
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