WO2014190676A1 - 曝光设备和曝光方法 - Google Patents
曝光设备和曝光方法 Download PDFInfo
- Publication number
- WO2014190676A1 WO2014190676A1 PCT/CN2013/086978 CN2013086978W WO2014190676A1 WO 2014190676 A1 WO2014190676 A1 WO 2014190676A1 CN 2013086978 W CN2013086978 W CN 2013086978W WO 2014190676 A1 WO2014190676 A1 WO 2014190676A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- diffusion sheet
- exposure
- source
- light source
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
Definitions
- Embodiments of the present invention relate to an exposure apparatus and an exposure method. Background technique
- TFT-LCD Thin Film Transistor-Liquid Crystal Display
- the method for preparing the metal conductive layer portion in the gate line or the data line on the TFT array substrate comprises: first forming a metal layer on the substrate, then coating the metal layer on the photoresist layer, and then passing the photoresist layer through the mask layer Exposure, development, and finally etching of the metal layer are obtained.
- the existing process for exposing the photoresist by using the exposure device is as follows: First, the substrate is put into the exposure process, the substrate is loaded on the substrate stage, pre-aligned, and then the substrate is adsorbed on the substrate stage by the vacuum adsorption device. Upper, adjusting the gap between the substrate and the mask, and achieving accurate alignment between the substrate and the mask. After the alignment is completed, the photoresist on the substrate is exposed by ultraviolet light, and then the substrate and the substrate are removed. The vacuum adsorption state between the stages unloads the substrate from the substrate stage. Summary of the invention
- Embodiments of the present invention provide an exposure apparatus and an exposure method capable of achieving uniform exposure of a photoresist on a substrate.
- An aspect of the invention provides an exposure apparatus including a light source and a diffusion sheet located under the light source, wherein a side of the diffusion sheet adjacent to the light source is a light incident surface, and the diffusion is opposite to the light incident surface The sheet is refracted, and after the light is diffused, it is uniformly emitted from the entire surface of the light exiting surface.
- one of the light incident surface and the light exit surface is a flat surface, and the other surface is a spherical convex surface.
- one of the light incident surface and the light exit surface is a flat surface, and the other surface has a central spherical surface and a plurality of concentric annular arc surfaces.
- the light source may be a point source located at a focus of the diffuser.
- the size of the diffusion sheet may be greater than or equal to the size of the substrate to be exposed.
- the exposure apparatus may further include a mask stage carrying a mask, the diffusion sheet being located between the light source and the mask.
- the diffuser is made of glass, crystal or transparent plastic.
- a second aspect of the present invention provides an exposure method using the above exposure apparatus, comprising: disposing a mask on a mask stage, placing a substrate to be exposed on a substrate stage; placing the diffusion sheet Between the light source and the mask stage, the diffusion sheet is configured to refract and diffuse light from the light source to uniformly emit the light from the diffusion sheet; and expose the substrate to be exposed
- FIG. 1 is a first schematic view of an exposure apparatus in an embodiment of the present invention
- FIG. 2a is a schematic view 2 of an exposure apparatus in an embodiment of the present invention
- FIG. 2b is a variant of the diffusion sheet of the exposure apparatus
- 3a-3d are schematic views showing a process of fabricating a diffusion sheet according to an embodiment of the present invention.
- FIG. 4 is a top plan view 1 of a diffusion sheet in an embodiment of the present invention.
- Figure 5 is a plan view 2 of the diffusion sheet in the embodiment of the present invention.
- Fig. 6 is a third schematic view of the exposure apparatus in the embodiment of the present invention.
- 1 a light source; 2 - a diffusion sheet; 21 - a light entrance surface;
- the inventors found that in the conventional exposure method, when exposing the photoresist on a substrate, the photoresist is exposed at the edge of the substrate due to adverse factors such as light diffraction and uneven light amount.
- the degree of exposure differs from that of the photoresist at the center of the substrate, which affects the quality of the resulting array substrate, which in turn affects the display quality of the finally prepared TFT-LCD.
- the exposure apparatus includes: a light source 1 and a diffusion sheet 2 under the light source 1.
- the diffusion sheet 2 is adjacent to the light source 1 and is light-introduced.
- the surface 21 and the surface opposite to the light incident surface 21 are the light exit surfaces 22.
- the light emitted from the light source 1 enters the diffusion sheet 2 from the light incident surface 21, is refracted in the diffusion sheet 2, and after the light is diffused, it is uniformly emitted from the light exit surface 22.
- An exposure apparatus includes a light source and a diffusion sheet under the light source.
- the diffusion sheet can refract light and uniformly concentrate the concentrated light from the light source to improve the substrate to be exposed.
- the photoresist receives the uniformity of the light, improves the exposure quality of the photoresist on the substrate, thereby improving the quality of the prepared array substrate, and improving the display effect of the prepared liquid crystal display, thereby finally improving the user experience.
- the specific structure of the diffusion sheet 2 can be various, and is applicable to the embodiment of the present invention as long as it can function to refract and diffuse concentrated light.
- one of the light incident surface 21 and the light exit surface 22 of the diffusion sheet 2 is a flat surface, and the other surface is a spherical convex surface, as shown in FIG. 2a; the light incident surface 21 of the diffusion sheet 2 is a spherical convex surface, and the light exit surface 22
- the light is inside the diffuser 2 or enters the diffuser 2, the light is refracted, and the more concentrated light is diffused by the diffuser 2, and is uniformly emitted from the light exiting surface 22, and the light is basically mutually parallel.
- Such a diffusion sheet 2 can effectively diverge the more concentrated light from the light source, thereby improving the uniformity of the light received by the photoresist on the substrate to be exposed.
- the diffusion sheet 2 may have a structure in which both faces are spherical convex.
- the structure of the spherical convex surfaces on the two faces can be different.
- the diffusion sheet 2 may include a lens array 2a formed on the light incident surface as shown in Fig. 2b.
- the thickness of the diffusion sheet 2 shown in Fig. 2a is large, when the exposure apparatus cannot accommodate the diffusion sheet 2 having such a large thickness, it is conceivable to deform the structure of the diffusion sheet 2 shown in Fig. 2a.
- An example of this variation can be as follows. First, the radius and focal length of the diffusion sheet 2 shown in FIG. 3a are designed, and the shape of the diffusion sheet is created by using simulation software such as CAD; then, as shown in FIG. 3b, the diffusion sheet 2 shown in FIG. 3a is found layer by layer. The part of the optical path (shaded in the figure) is not affected, and these parts are actually composed of a relatively flat cylindrical shape in which a plurality of central axes coincide; as shown in Fig.
- a diffusion sheet 2 as shown in Fig. 3d is finally formed, and the diffusion sheet shown in Fig. 3d has a plurality of protrusions, and the edge of the section of the protrusion located at the center is an arc, and the remaining protrusions
- the cross section is a right-angled triangle or a fan-shaped shape, which is symmetrically arranged on the left and right of the center protrusion from small to large (ie, the cross-sectional area or arc length of the protrusion).
- a right-angled triangle means a pattern having two mutually perpendicular right-angled sides and a curved line having a certain curvature; the lengths of two mutually perpendicular right-angled sides may be equal or unequal.
- the central angle of the sector is preferably 90°.
- a top view of the diffusion sheet 2 shown in Fig. 3d can be as shown in Fig. 4.
- the diffuser 2 may have a structure in which one of the light incident surface 21 and the light exit surface 22 is a flat surface, and the other surface has a central spherical surface and a plurality of concentric annular curved surfaces, that is, as shown in FIG. The same effect as the diffusion sheet 2 shown in Fig. 2a, and requiring less material and lower manufacturing cost.
- the size of the central spherical surface in the diffusion sheet 2 in Fig. 4 can be set according to the actual situation; the number of the plurality of concentric annular arc surfaces surrounding the central spherical surface, the size of any one of them, etc. can be set according to actual conditions.
- the structure of the diffusion sheet 2 of FIG. 4 can be arranged closer to the central spherical surface, and the denser the concentric annular arc surface is arranged, the farther away from the central spherical surface, the more sparsely arranged the concentric annular arc surface, and the final effect is as shown in FIG. 5. Shown.
- the concentric annular arc surface of the diffuser 2 correspondingly disposed at a relatively strong light intensity is dense, so that the diffusing effect of the diffusing sheet is more obvious, and the light intensity and density distribution from the light source 1 is improved.
- the intensity of the light in the central region of the source 1 is greater than the intensity of the light from the central region.
- the diffusion sheet 2 may be made of a transparent material such as glass, crystal or transparent plastic.
- the material of the diffusion sheet 2 is plastic, it can be processed by an injection molding process.
- the light source 1 is a point light source
- the diffusion sheet 2 has the structure shown in FIG. 2a or FIG. 6, in order to enhance the diffusion of the concentrated light from the light source 1 by the diffusion sheet 2,
- the light source 1 may be located at the focus of the diffusion sheet 2.
- the size of the diffusion sheet 2 should be greater than or equal to the base to be exposed.
- the size of the plate, the shape of the diffusion sheet 2 can also be set according to the shape of the substrate.
- the exposure apparatus usually further includes a mask stage carrying a mask
- the diffusion sheet 2 can be positioned between the light source 1 and the mask stage, and the exposure apparatus at this time is a proximity exposure apparatus.
- the diffusion sheet 2 may be located between the light source 1 and the substrate stage, and the position of the mask is reserved by adjusting the distance between the diffusion sheet 2 and the substrate stage.
- the embodiment of the present invention also provides an exposure method using the above exposure apparatus, which may include the following process.
- Step S101 setting a mask on the mask stage, and placing the substrate to be exposed on the substrate stage;
- Step S102 placing a diffusion sheet between the light source and the mask stage, wherein the diffusion sheet is used for refracting and diffusing light from the light source to uniformly emit the light from the diffusion sheet;
- Step S103 Exposing the substrate to be exposed.
- the method of the embodiment can uniformly out the concentrated light from the light source, thereby improving the uniformity of the light received by the photoresist on the substrate to be exposed, improving the exposure quality of the photoresist on the substrate, and further Improve the quality of the prepared array substrate.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/351,083 US9500955B2 (en) | 2013-05-30 | 2013-11-12 | Exposure apparatus and exposure method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310210193.9 | 2013-05-30 | ||
CN2013102101939A CN103309172A (zh) | 2013-05-30 | 2013-05-30 | 曝光设备和曝光方法 |
Publications (1)
Publication Number | Publication Date |
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WO2014190676A1 true WO2014190676A1 (zh) | 2014-12-04 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/CN2013/086978 WO2014190676A1 (zh) | 2013-05-30 | 2013-11-12 | 曝光设备和曝光方法 |
Country Status (3)
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US (1) | US9500955B2 (zh) |
CN (1) | CN103309172A (zh) |
WO (1) | WO2014190676A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103309172A (zh) * | 2013-05-30 | 2013-09-18 | 京东方科技集团股份有限公司 | 曝光设备和曝光方法 |
EP3454126A1 (en) * | 2017-09-08 | 2019-03-13 | ASML Netherlands B.V. | Method for estimating overlay |
CN111458986A (zh) * | 2020-04-22 | 2020-07-28 | 安徽大学 | 一种倒置接触式光学曝光光刻设备及曝光方法 |
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Also Published As
Publication number | Publication date |
---|---|
US9500955B2 (en) | 2016-11-22 |
CN103309172A (zh) | 2013-09-18 |
US20150293455A1 (en) | 2015-10-15 |
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