WO2014043865A1 - Apparatus for adjusting divergence angle of divergent beam - Google Patents
Apparatus for adjusting divergence angle of divergent beam Download PDFInfo
- Publication number
- WO2014043865A1 WO2014043865A1 PCT/CN2012/081604 CN2012081604W WO2014043865A1 WO 2014043865 A1 WO2014043865 A1 WO 2014043865A1 CN 2012081604 W CN2012081604 W CN 2012081604W WO 2014043865 A1 WO2014043865 A1 WO 2014043865A1
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- WIPO (PCT)
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- lens
- magnetic field
- adjusting
- angle
- ion implantation
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Definitions
- the invention relates to a device for adjusting the expansion angle of an expanding beam in an ion implanter system, in particular to an ideal position where the extraction electrode deviates from the design in the ion implanter, and the arc center of the arc chamber panel no longer coincides with the center of the arc of the extraction electrode.
- the distance between the lead-out electrode and the arc chamber lead-out surface is no longer uniform, and the angle of expansion of the extracted beam is no longer in accordance with the distribution state of the design, so as to ensure that the analysis remains after the direct distance of the lead-out electrode relative to the ion source arc chamber changes. Higher resolution, while the optical path still maintains high transmission efficiency. Background technique
- the effective arc angle is obtained by using the inter-heat cathode, the horizontal long slit and the arc-shaped panel. Requires greater than 16 degrees; to meet the analytical focus requirements of the analyzer and subsequent expansion of the optical path to the desired width, the Q1 horizontal focus lens is used to adjust the expansion angle of the dilated beam entering the divergent source analyzer to It is important to compensate for certain factors that cause beam current changes.
- the invention discloses a device for adjusting the expansion angle of an expanding beam in an ion implanter system, which is directed to when the extraction electrode deviates from the designed ideal position, the arc center of the arc chamber panel is no longer associated with the extraction electrode arc When the center overlaps, the spacing between the extraction electrode and the arc chamber exit surface is no longer uniform, and the angle of expansion of the extracted beam no longer meets the design requirements, the changes are compensated by the adjustment of Q1 to ensure the relative ions in the extraction electrode. After the direct distance of the source arc chamber changes, the analysis still maintains a high resolution, and the optical path still maintains a high transmission efficiency.
- a device for adjusting an expansion beam expansion angle in an ion implantation system comprising: a coil cover (1), a lens package (2), a magnetic field adjustment sheet (3), a lens core (4), and an aluminum plate ( 5), lens tube (6), 1/4 turn 1/8 joint ⁇ influent> (7), 1/4 turn 1/8 joint ⁇ backwater> (8), including 18 lens line packages (2 ), the middle 12 lens package (2) current is positive, 3 lens packages at both ends (2) current is negative, and the other side lens package (2) current layout is opposite; multiple lens lines
- the package (2) is superimposed with a magnetic field adjustment sheet (3) in between, the upper and lower lens line package (2) and the magnetic pole are symmetric, and 36 lens line packages (2) are connected in series according to a certain current and magnetic field direction, thereby being symmetric at the center.
- the plane produces a horizontally focused magnetic field.
- a device for adjusting an expansion beam expansion angle in an ion implantation system wherein a plurality of lens package (2) and a magnetic field adjustment sheet are fixed by a lens mandrel (4) ( 3)
- the lens mandrel (4) is made of DT4 material and has good magnetic permeability, which makes the horizontal focusing magnetic field maintain high resolution, while the optical path still maintains high transmission efficiency; through the lens mandrel (4) )
- a device for adjusting an expansion beam expansion angle in an ion implantation system wherein: the connecting aluminum plate (5) is respectively fixed to the upper and lower symmetrical lens mandrels by four flat head hexagon socket screws. (4) Above, the lens mandrel (4) is connected to the external wiring board by connecting the aluminum plate (5) to achieve precise adjustment of the magnetic field generated by the device. 4.
- the magnetic field adjusting sheet (3) is designed in two different shapes, and two semi-right angle magnetic field adjusting sheets (3) are disposed on both sides to generate a horizontal focusing magnetic field which meets the requirements.
- a device for adjusting an expansion beam expansion angle in an ion implantation system wherein: the coil cover (1) is fixed to the top and bottom of the device by screws, and has a mechanical protection lens package ( 2) The role of the magnetic field regulating sheet (3).
- Reliable function It consists of multiple lens line packages (2) and magnetic field adjustment sheets (3), which are symmetrical up and down, so that the horizontal horizontal magnetic field can be generated in the middle to ensure the analysis rate and transmission efficiency of the optical path.
- a cross-sectional view of the Q1 horizontal focus lens shown in FIG. 1 includes: a coil cover (1), a lens package (2), a magnetic field adjustment sheet (3), a lens core (4), a connection aluminum plate (5), a lens Pipe (6), 1/4 turn 1/8 joint ⁇ inlet water> (7), 1/4 turn 1/8 joint ⁇ backwater> (8).
- the layout is reversed; multiple lens line packages (2) are superimposed, with magnetic field adjustment sheets (3) interposed therebetween, upper and lower lens line packages (2) and magnetic poles symmetric, and 36 lens line packages (2) with a certain current and
- the directions of the magnetic fields are connected in series to generate a horizontally focused magnetic field in the central symmetry plane; when the beam is extracted from the diverging source via the extraction structure, first enters the Q1 horizontal focusing lens through the lens entrance diaphragm, and then passes through the lens tube (6);
- the extraction electrode deviates from the ideal position of the design, the arc center of the arc chamber panel no longer coincides with the center of the arc of the extraction electrode, and the spacing between the extraction electrode and the arc chamber exit surface is no longer uniform, the angle of expansion of the extracted beam is no longer consistent.
- the distribution state required by the design; and the upper and lower lens package (2) and the magnetic field adjustment sheet (3) are welded to the lens core (4) according to a certain rule, and fixed by connecting the aluminum plate (5), and wiring through the outer
- the current level is precisely controlled on the board to produce a magnetic field that meets the analytical focus requirements of the analyzer and the subsequent expansion angle requirements for the optical path to extend to the desired width. Therefore, through the adjustment of Q1, these changes are compensated to ensure that the analysis still maintains a high resolution after the direct distance of the extraction electrode relative to the ion source arc chamber changes, while the optical path still maintains a high transmission efficiency.
- the Q1 horizontal focus lens system diagram, the magnetic field adjustment sheet (3) ⁇ shown in Figure 3> Calculated into two different shapes, two semi-right angle magnetic field adjustment sheets (3) are provided on both sides to increase the magnetic permeability; and the upper and lower lens line packages (2) are connected in series according to a certain current and magnetic field direction, and are accurately measured in the current.
- the timing is used to adjust the local magnetic field strength to produce a desired horizontal focus magnetic field, and ultimately to change the deflection angle of the ion beam passing through the region to meet the analytical focus requirements of the analyzer and subsequent expansion of the optical path to the desired width. Angle requirements.
- a coil cover (1) is attached to the top and bottom of the device by screws, and has a mechanical protection lens package (2) and a magnetic field adjustment sheet (3).
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Disclosed is an apparatus for adjusting the divergence angle of a divergent beam in an ion implantation system, belonging to the field of semiconductor manufacture. The apparatus comprises a coil cover (1), lens coils (2), a magnetic field adjustment film (3), a lens core shaft (4), a connecting aluminium plate (5), a lens channel (6), a 1/4 to 1/8 connector (7) used for incoming water, and a 1/4 to 1/8 connector (8) for return water, wherein the apparatus contains 18 lens coils (2) symmetrical from top to bottom, the electric current of the middle 12 lens coils (2) being positive, the electric current of each three lens coils (2) at the two ends being negative, and the electric current of the lens coils (2) on the other side being designed in reverse. The plurality of lens coils (2) overlap, the magnetic field adjustment film (3) is held in the middle, the lens coils (2) at the top and the bottom are symmetrical about a magnetic pole, and 36 lens coils (2) are connected in series according to a certain electric current and magnetic field direction, thereby generating a horizontal convergent magnetic field at the centre of the symmetrical plane.
Description
一种调节扩张束扩张角度的装置 Device for adjusting expansion angle of dilation beam
技术领域 Technical field
本发明涉及离子注入机***中一种用于调节扩张束扩张角度的装置，尤其 涉及离子注入机中对引出电极偏离设计理想位置、弧室面板圆弧中心不再与引 出电极圆弧中心重合、 引出电极和弧室引出面的间距不再均匀、 引出束流的扩 张角度也不再符合设计要求的分布状态时进行补偿，确保在引出电极相对离子 源弧室直接距离发生变化后， 分析依然保持较高的分辨能力， 同时光路依然保 持较高的传输效率。 背景技术 The invention relates to a device for adjusting the expansion angle of an expanding beam in an ion implanter system, in particular to an ideal position where the extraction electrode deviates from the design in the ion implanter, and the arc center of the arc chamber panel no longer coincides with the center of the arc of the extraction electrode. The distance between the lead-out electrode and the arc chamber lead-out surface is no longer uniform, and the angle of expansion of the extracted beam is no longer in accordance with the distribution state of the design, so as to ensure that the analysis remains after the direct distance of the lead-out electrode relative to the ion source arc chamber changes. Higher resolution, while the optical path still maintains high transmission efficiency. Background technique
随着半导体工艺的发展，束流的稳定性及其分析纯度对于离子注入***愈 发重要， 而采用间热式阴极， 水平长缝、 圆弧面板引出的扩张束离子源， 其有 效圆弧角度要求大于 16度； 为满足分析器的分析聚焦要求和后续进行光路扩 展到所需宽度的扩张角度的要求， 因而采用 Q1水平聚焦透镜用于调节进入扩 张源分析器的扩张束的扩张角度， 以补偿引起束流变化的某些因素就非常重 要。 With the development of semiconductor technology, the stability of the beam and its analytical purity are more and more important for the ion implantation system. The effective arc angle is obtained by using the inter-heat cathode, the horizontal long slit and the arc-shaped panel. Requires greater than 16 degrees; to meet the analytical focus requirements of the analyzer and subsequent expansion of the optical path to the desired width, the Q1 horizontal focus lens is used to adjust the expansion angle of the dilated beam entering the divergent source analyzer to It is important to compensate for certain factors that cause beam current changes.
目前对于扩张束离子源引出束流的要求，使得后续产生较高分辨能力的分 析、 较高传输效率的光路成为急需解决的问题。 发明内容 At present, the requirements for diverging the beam source from the expanded beam source make the subsequent analysis of higher resolution capability and higher transmission efficiency become an urgent problem to be solved. Summary of the invention
本发明公开了离子注入机***中一种用于调节扩张束扩张角度的装置，其 针对于当引出电极偏离设计理想位置、弧室面板圆弧中心不再与引出电极圆弧
中心重合、 引出电极和弧室引出面的间距不再均匀、 引出束流的扩张角度也不 再符合设计要求的分布状态时， 通过 Q1 的调节作用对这些变化进行补偿， 确 保在引出电极相对离子源弧室直接距离发生变化后，分析依然保持较高的分辨 能力， 同时光路依然保持较高的传输效率。 The invention discloses a device for adjusting the expansion angle of an expanding beam in an ion implanter system, which is directed to when the extraction electrode deviates from the designed ideal position, the arc center of the arc chamber panel is no longer associated with the extraction electrode arc When the center overlaps, the spacing between the extraction electrode and the arc chamber exit surface is no longer uniform, and the angle of expansion of the extracted beam no longer meets the design requirements, the changes are compensated by the adjustment of Q1 to ensure the relative ions in the extraction electrode. After the direct distance of the source arc chamber changes, the analysis still maintains a high resolution, and the optical path still maintains a high transmission efficiency.
本发明通过以下技术方案实现： The invention is achieved by the following technical solutions:
1.一种用于离子注入***中调节扩张束扩张角度的装置， 包括： 线圈罩 (1)、 透镜线包 (2)、 磁场调节薄片（3)、 透镜芯轴 (4)、 连接铝板 (5)、 透镜管 道（6)、 1/4转 1/8接头〈进水 > ( 7)、 1/4转 1/8接头〈回水 > (8)， 其中包含 18 个透镜线包（2)， 中间 12个透镜线包（2)电流为正， 两端各 3个透镜线包（2)电 流为负， 另一侧的透镜线包（2)电流布局与之相反； 多个透镜线包（2)相叠加， 中间夹有磁场调节薄片（3)， 上下透镜线包 (2)和磁极对称， 36个透镜线包（2) 按一定的电流和磁场方向串联连接， 从而在中心对称平面产生水平聚焦磁场。 A device for adjusting an expansion beam expansion angle in an ion implantation system, comprising: a coil cover (1), a lens package (2), a magnetic field adjustment sheet (3), a lens core (4), and an aluminum plate ( 5), lens tube (6), 1/4 turn 1/8 joint <influent> (7), 1/4 turn 1/8 joint <backwater> (8), including 18 lens line packages (2 ), the middle 12 lens package (2) current is positive, 3 lens packages at both ends (2) current is negative, and the other side lens package (2) current layout is opposite; multiple lens lines The package (2) is superimposed with a magnetic field adjustment sheet (3) in between, the upper and lower lens line package (2) and the magnetic pole are symmetric, and 36 lens line packages (2) are connected in series according to a certain current and magnetic field direction, thereby being symmetric at the center. The plane produces a horizontally focused magnetic field.
2.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置，其特征在于：通过透镜芯轴（4)固定多个透镜线包（2)、磁场调节薄片（3) ; 透镜芯轴 （4) 采用 DT4材质， 具有良好的导磁效果， 使产生的水平聚焦磁场 保持较高的分辨能力，同时光路依然保持较高的传输效率；通过在透镜芯轴（4) 内设计水冷槽， 由 1/4转 1/8接头〈进水〉（7)、 1/4转 1/8接头〈回水 > (8)确保 装置处于正常的温度下运作。 2. A device for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein a plurality of lens package (2) and a magnetic field adjustment sheet are fixed by a lens mandrel (4) ( 3) The lens mandrel (4) is made of DT4 material and has good magnetic permeability, which makes the horizontal focusing magnetic field maintain high resolution, while the optical path still maintains high transmission efficiency; through the lens mandrel (4) ) Design the water cooling tank, from 1/4 turn 1/8 joint <inlet water> (7), 1/4 turn 1/8 joint <backwater> (8) to ensure that the device is operating at normal temperature.
3.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置， 其特征在于： 连接铝板（5)通过四个平头内六角螺钉分别固定在上下对称 的透镜芯轴 （4) 上， 透镜芯轴 （4) 通过连接铝板（5)与外接线板相连， 实现 对该装置产生磁场的精确调节作用。
4.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置， 其特征在于： 为使产生的磁场能精确补偿由于引出电极和弧室引出面的间 距不均匀引起的引出束流扩张角度的变化， 磁场调节薄片（3)设计成两种不同 形状， 两侧各设置两个半直角的磁场调节薄片（3)， 以产生符合要求的水平聚 焦磁场。 3. A device for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein: the connecting aluminum plate (5) is respectively fixed to the upper and lower symmetrical lens mandrels by four flat head hexagon socket screws. (4) Above, the lens mandrel (4) is connected to the external wiring board by connecting the aluminum plate (5) to achieve precise adjustment of the magnetic field generated by the device. 4. The apparatus for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein: the generated magnetic field is accurately compensated for the uneven spacing caused by the extraction electrode and the arc chamber lead-out surface. The angle of the beam expansion angle is changed. The magnetic field adjusting sheet (3) is designed in two different shapes, and two semi-right angle magnetic field adjusting sheets (3) are disposed on both sides to generate a horizontal focusing magnetic field which meets the requirements.
5.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置， 其特征在于： 线圈罩（1)通过螺钉固定于装置顶部及底部， 有机械保护透 镜线包 (2)、 磁场调节薄片（3)的作用。 5. A device for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein: the coil cover (1) is fixed to the top and bottom of the device by screws, and has a mechanical protection lens package ( 2) The role of the magnetic field regulating sheet (3).
本发明具有如下显著优点： The present invention has the following significant advantages:
1.结构简单： 仅由线圈罩（1)、 透镜线包 (2)、 磁场调节薄片（3)、 透镜芯 轴（4)、 连接铝板（5)、 透镜管道 (6)、 1/4转 1/8接头〈进水〉 ( 7)、 1/4转 1/8 接头〈回水 > (8)等部分构成， 呈上下对称两组， 易于加工制造。 1. Simple structure: only coil cover (1), lens package (2), magnetic field adjustment sheet (3), lens core (4), aluminum plate (5), lens tube (6), 1/4 turn 1/8 joint <inlet water> (7), 1/4 turn 1/8 joint <return water> (8) and other parts, two sets of upper and lower symmetry, easy to manufacture.
2.功能可靠： 由多个透镜线包 (2)及磁场调节薄片（3)构成， 上下对称， 从 而可以在中间产生符合要求的水平聚焦磁场， 以保证光路的分析率及传输效 率。 2. Reliable function: It consists of multiple lens line packages (2) and magnetic field adjustment sheets (3), which are symmetrical up and down, so that the horizontal horizontal magnetic field can be generated in the middle to ensure the analysis rate and transmission efficiency of the optical path.
3.易于控制：上下透镜线包（2)和磁极对称， 36个透镜线包（2)按一定的电 流和磁场方向串联连接；通过对电流大小精确控制以产生满足分析器的分析聚 焦要求和后续进行光路扩展到所需宽度的扩张角度要求。 附图说明 3. Easy to control: upper and lower lens line package (2) and magnetic pole symmetry, 36 lens line package (2) connected in series according to a certain current and magnetic field direction; by precisely controlling the current size to produce analytical focus requirements that meet the analyzer and Subsequent expansion of the optical path to the desired width is required. DRAWINGS
图 1 Q1水平聚焦透镜剖面图 Figure 1 Q1 horizontal focus lens profile
图 2 Q1水平聚焦透镜***图
图 3 磁场调节薄片 具体实施方式 Figure 2 Q1 horizontal focus lens system diagram Figure 3 Magnetic field adjustment sheet embodiment
下面结合附图 1和附图 2对本发明作进一步的介绍， 但不作为对本发明的 限定。 The invention will be further described with reference to the accompanying drawings 1 and 2, but is not to be construed as limiting the invention.
如图 1所示的 Q1水平聚焦透镜剖面图，其包括：线圈罩（1)、透镜线包 (2)、 磁场调节薄片（3)、 透镜芯轴 (4)、 连接铝板 (5)、 透镜管道 (6)、 1/4转 1/8接 头〈进水 > ( 7)、 1/4转 1/8接头〈回水 > (8)。 其中包含 18个透镜线包（2)， 中间 12个透镜线包（2)电流为正，两端各 3个透镜线包（2)电流为负， 另一侧的透镜 线包（2)电流布局与之相反； 多个透镜线包（2)相叠加， 中间夹有磁场调节薄片 (3)， 上下透镜线包（2)和磁极对称， 36个透镜线包（2)按一定的电流和磁场方 向串联连接， 从而在中心对称平面产生水平聚焦磁场； 当束流从扩张源经由引 出结构引出时， 首先通过透镜入口光栏进入 Q1水平聚焦透镜， 随之通过透镜 管道 (6) ; 若之前出现引出电极偏离设计理想位置、 弧室面板圆弧中心不再与 引出电极圆弧中心重合、 引出电极和弧室引出面的间距不再均匀等时， 使得引 出束流的扩张角度也不再符合设计要求的分布状态； 而将上下透镜线包（2)及 磁场调节薄片（3)按照一定规律焊接在透镜芯轴 (4)上， 并通过连接铝板 (5)固 定，通过在外接线板上对电流大小精确控制以产生满足分析器的分析聚焦要求 和后续进行光路扩展到所需宽度的扩张角度要求的磁场。 因此通过 Q1 的调节 作用， 对这些变化进行补偿， 确保在引出电极相对离子源弧室直接距离发生变 化后， 分析依然保持较高的分辨能力， 同时光路依然保持较高的传输效率。 A cross-sectional view of the Q1 horizontal focus lens shown in FIG. 1 includes: a coil cover (1), a lens package (2), a magnetic field adjustment sheet (3), a lens core (4), a connection aluminum plate (5), a lens Pipe (6), 1/4 turn 1/8 joint <inlet water> (7), 1/4 turn 1/8 joint <backwater> (8). It contains 18 lens package (2), the middle 12 lens package (2) current is positive, 3 lens packages at both ends (2) current is negative, the other side of the lens package (2) current The layout is reversed; multiple lens line packages (2) are superimposed, with magnetic field adjustment sheets (3) interposed therebetween, upper and lower lens line packages (2) and magnetic poles symmetric, and 36 lens line packages (2) with a certain current and The directions of the magnetic fields are connected in series to generate a horizontally focused magnetic field in the central symmetry plane; when the beam is extracted from the diverging source via the extraction structure, first enters the Q1 horizontal focusing lens through the lens entrance diaphragm, and then passes through the lens tube (6); When the extraction electrode deviates from the ideal position of the design, the arc center of the arc chamber panel no longer coincides with the center of the arc of the extraction electrode, and the spacing between the extraction electrode and the arc chamber exit surface is no longer uniform, the angle of expansion of the extracted beam is no longer consistent. The distribution state required by the design; and the upper and lower lens package (2) and the magnetic field adjustment sheet (3) are welded to the lens core (4) according to a certain rule, and fixed by connecting the aluminum plate (5), and wiring through the outer The current level is precisely controlled on the board to produce a magnetic field that meets the analytical focus requirements of the analyzer and the subsequent expansion angle requirements for the optical path to extend to the desired width. Therefore, through the adjustment of Q1, these changes are compensated to ensure that the analysis still maintains a high resolution after the direct distance of the extraction electrode relative to the ion source arc chamber changes, while the optical path still maintains a high transmission efficiency.
如图 2所示的 Q1水平聚焦透镜***图，磁场调节薄片（3)〈如图 3所示〉设
计成两种不同形状， 两侧各设置两个半直角的磁场调节薄片（3)以增加导磁； 并且上下透镜线包（2)按照一定的电流和磁场方向串联连接， 在应运电流进行 精确控时用以调节局部的磁场强度， 产生符合要求的水平聚焦磁场， 最终改变 穿过该区域的离子束的偏转角度， 以满足分析器的分析聚焦要求和后续进行光 路扩展到所需宽度的扩张角度要求。 另外附有线圈罩（1)通过螺钉固定于装置 顶部及底部， 有机械保护透镜线包（2)、 磁场调节薄片（3)的作用。 As shown in Figure 2, the Q1 horizontal focus lens system diagram, the magnetic field adjustment sheet (3) <shown in Figure 3> Calculated into two different shapes, two semi-right angle magnetic field adjustment sheets (3) are provided on both sides to increase the magnetic permeability; and the upper and lower lens line packages (2) are connected in series according to a certain current and magnetic field direction, and are accurately measured in the current. The timing is used to adjust the local magnetic field strength to produce a desired horizontal focus magnetic field, and ultimately to change the deflection angle of the ion beam passing through the region to meet the analytical focus requirements of the analyzer and subsequent expansion of the optical path to the desired width. Angle requirements. In addition, a coil cover (1) is attached to the top and bottom of the device by screws, and has a mechanical protection lens package (2) and a magnetic field adjustment sheet (3).
本发明专利的特定实施例已对本发明专利的内容做了详尽说明。 对本领域 一般技术人员而言，在不背离本发明专利精神的前提下对它所做的任何显而易 见的改动， 都构成对本发明专利的侵犯， 将承担相应的法律责任。
The specific embodiments of the present invention have been described in detail with reference to the contents of the present invention. Any obvious changes made to the present invention without departing from the spirit of the patent of the present invention constitute a violation of the patent of the present invention and will bear corresponding legal liabilities.
Claims
1.一种用于离子注入***中调节扩张束扩张角度的装置，包括：线圈罩（1)、 透镜线包 (2)、 磁场调节薄片（3)、 透镜芯轴 (4)、 连接铝板 (5)、 透镜管道 (6)、 1/4转 1/8接头〈进水 > ( 7)、 1/4转 1/8接头〈回水 > (8)， 其中包含 18个透镜 线包（2)，中间 12个透镜线包（2)电流为正，两端各 3个透镜线包（2)电流为负， 另一侧的透镜线包（2)电流布局与之相反； 多个透镜线包（2)相叠加， 中间夹有 磁场调节薄片（3)， 上下透镜线包 (2)和磁极对称， 36个透镜线包（2)按一定的 电流和磁场方向串联连接， 从而在中心对称平面产生水平聚焦磁场。 A device for adjusting an expansion beam expansion angle in an ion implantation system, comprising: a coil cover (1), a lens package (2), a magnetic field adjustment sheet (3), a lens core (4), and an aluminum plate ( 5), lens tube (6), 1/4 turn 1/8 joint <influent> (7), 1/4 turn 1/8 joint <backwater> (8), including 18 lens line packages (2 ), the middle 12 lens package (2) current is positive, 3 lens packages at both ends (2) current is negative, the other side of the lens package (2) current layout is opposite; multiple lens lines The package (2) is superimposed with a magnetic field adjustment sheet (3), the upper and lower lens line packages (2) and the magnetic poles are symmetric, and 36 lens line packages (2) are connected in series according to a certain current and magnetic field direction, thereby being symmetric at the center. The plane produces a horizontally focused magnetic field.
2.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置，其特征在于：通过透镜芯轴（4)固定多个透镜线包（2)、磁场调节薄片（3) ; 透镜芯轴 （4) 采用 DT4材质， 具有良好的导磁效果， 使产生的水平聚焦磁场 保持较高的分辨能力，同时光路依然保持较高的传输效率；通过在透镜芯轴（4) 内设计水冷槽， 由 1/4转 1/8接头〈进水〉（7)、 1/4转 1/8接头〈回水 > (8)确保 装置处于正常的温度下运作。 2. A device for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein a plurality of lens package (2) and a magnetic field adjustment sheet are fixed by a lens mandrel (4) ( 3) The lens mandrel (4) is made of DT4 material and has good magnetic permeability, which makes the horizontal focusing magnetic field maintain high resolution, while the optical path still maintains high transmission efficiency; through the lens mandrel (4) ) Design the water cooling tank, from 1/4 turn 1/8 joint <inlet water> (7), 1/4 turn 1/8 joint <backwater> (8) to ensure that the device is operating at normal temperature.
3.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置， 其特征在于： 连接铝板（5)通过四个平头内六角螺钉分别固定在上下对称 的透镜芯轴 （4) 上， 透镜芯轴 （4) 通过连接铝板（5)与外接线板相连， 实现 对该装置产生磁场的精确调节作用。 3. A device for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein: the connecting aluminum plate (5) is respectively fixed to the upper and lower symmetrical lens mandrels by four flat head hexagon socket screws. (4) Above, the lens mandrel (4) is connected to the external wiring board by connecting the aluminum plate (5) to achieve precise adjustment of the magnetic field generated by the device.
4.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置， 其特征在于： 为使产生的磁场能精确补偿由于引出电极和弧室引出面的间 距不均匀引起的引出束流扩张角度的变化， 磁场调节薄片（3)设计成两种不同 形状， 两侧各设置两个半直角的磁场调节薄片（3)， 以产生符合要求的水平聚
焦磁场。 4. The apparatus for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein: the generated magnetic field is accurately compensated for the uneven spacing caused by the extraction electrode and the arc chamber lead-out surface. The angle of the beam expansion angle is changed. The magnetic field adjusting sheet (3) is designed in two different shapes, and two semi-right angle magnetic field adjusting sheets (3) are arranged on both sides to produce a desired horizontal level. Focus magnetic field.
5.如权利要求 1所述的一种用于离子注入***中调节扩张束扩张角度的装 置， 其特征在于： 线圈罩（1)通过螺钉固定于装置顶部及底部， 有机械保护透 镜线包 (2)、 磁场调节薄片（3)的作用。
5. A device for adjusting an expansion beam expansion angle in an ion implantation system according to claim 1, wherein: the coil cover (1) is fixed to the top and bottom of the device by screws, and has a mechanical protection lens package ( 2) The role of the magnetic field regulating sheet (3).
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| Application Number | Priority Date | Filing Date | Title |
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| PCT/CN2012/081604 WO2014043865A1 (en) | 2012-09-19 | 2012-09-19 | Apparatus for adjusting divergence angle of divergent beam |
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| Application Number | Priority Date | Filing Date | Title |
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| PCT/CN2012/081604 WO2014043865A1 (en) | 2012-09-19 | 2012-09-19 | Apparatus for adjusting divergence angle of divergent beam |
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| WO2014043865A1 true WO2014043865A1 (en) | 2014-03-27 |
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| PCT/CN2012/081604 WO2014043865A1 (en) | 2012-09-19 | 2012-09-19 | Apparatus for adjusting divergence angle of divergent beam |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104037044A (en) * | 2014-07-09 | 2014-09-10 | 北京中科信电子装备有限公司 | Vertical focusing device for ion beam |
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| CN1700402A (en) * | 2004-05-14 | 2005-11-23 | 日新意旺机械股份公司 | Ion implanting apparatus |
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| CN102110570A (en) * | 2009-11-19 | 2011-06-29 | 特温克里克技术公司 | Method and apparatus for modifying ribbon-shaped ion beam |
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| CN1830054A (en) * | 2003-06-10 | 2006-09-06 | 瓦里安半导体设备公司 | Ion implanter having enhanced low energy ion beam transport |
| CN1700402A (en) * | 2004-05-14 | 2005-11-23 | 日新意旺机械股份公司 | Ion implanting apparatus |
| CN1979749A (en) * | 2005-12-05 | 2007-06-13 | 北京中科信电子装备有限公司 | Uniform magnetic-field parallel beam lens system |
| CN102110570A (en) * | 2009-11-19 | 2011-06-29 | 特温克里克技术公司 | Method and apparatus for modifying ribbon-shaped ion beam |
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