WO2014021657A1 - Touch panel having improved insulation layer and method for manufacturing same - Google Patents

Touch panel having improved insulation layer and method for manufacturing same Download PDF

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Publication number
WO2014021657A1
WO2014021657A1 PCT/KR2013/006948 KR2013006948W WO2014021657A1 WO 2014021657 A1 WO2014021657 A1 WO 2014021657A1 KR 2013006948 W KR2013006948 W KR 2013006948W WO 2014021657 A1 WO2014021657 A1 WO 2014021657A1
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WO
WIPO (PCT)
Prior art keywords
insulating layer
layer
sensor
substrate
forming
Prior art date
Application number
PCT/KR2013/006948
Other languages
French (fr)
Korean (ko)
Inventor
김근호
김현수
오유석
전성환
고용남
Original Assignee
(주)인터플렉스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from KR1020120085097A external-priority patent/KR20140018664A/en
Priority claimed from KR1020120085113A external-priority patent/KR20140018669A/en
Application filed by (주)인터플렉스 filed Critical (주)인터플렉스
Publication of WO2014021657A1 publication Critical patent/WO2014021657A1/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to a touch panel having an improved insulating layer and a method of manufacturing the same.
  • the input method of these portable devices has evolved from the conventional mouse or keyboard input method to the touch input method. Since the touch input method can directly select an icon or a program on the screen while viewing the screen, the user can not only provide intuitive usage but also have advantages in miniaturization and light weight of the device.
  • a touch panel is used as a means for inputting by such a touch.
  • the touch panel includes a sensor electrode for recognizing a touch and a lead wire for connecting the sensor electrode with a driving means or with an external input terminal.
  • the touch panel may be classified according to an input method or a recognition method. For example, a resistive type, a capacitive type, an electro-magnetic type, or a soy type (SAW Type; Surface Acoustic Wave Type) and Infrared Type touch panel.
  • SAW Type Surface Acoustic Wave Type
  • a plurality of sensor electrodes are formed on a substrate for touch recognition, and a lead wire is connected to the sensor electrodes to measure capacitance change.
  • the capacitive touch panel two types of sensor electrodes are formed, one sensor electrode is connected to each other in the Y-axis direction to form a sensor pattern (first sensor pattern), and the other sensor electrode is By connecting to each other in the X-axis direction to form a sensor pattern (second sensor pattern), there is a method of calculating the coordinates of the contact point by measuring the capacitance formed between the sensor electrodes included in the two types of sensor patterns.
  • Such capacitive touch panels are referred to as mutual capacitive touch panels.
  • the mutual capacitive touch panel may be divided into a two-layer structure and a single layer structure. Since the two-layer mutual capacitive touch panel has two types of sensor patterns arranged on different planes, the thickness increases.
  • the thickness of the touch panel may not increase.
  • an insulating layer is disposed between the connecting portions where the two sensor patterns intersect so that one connecting portion is wired under the insulating layer and the other connecting portion is wired over the insulating layer.
  • connection part wired on the insulating layer when the insulating layer side is straight, that is, when the inclination angle is 90 degrees, the internal stress generated at the edges of the insulating layer intensively decreases the adhesion of the connection part wired on the upper part, and thus the connection part is subjected to a small impact. There is a problem in that the resistance value rises due to a short circuit or cracks when wiring is formed.
  • the insulating layer has a low inclination angle of a certain thickness to distribute the internal stress concentrated on the edge of the insulating layer and to secure the adhesion to the second connection portion while increasing the overall visibility of the touch panel according to the implementation of the microcircuit
  • An object of the present invention is to provide a touch panel and a method of manufacturing the same, which can prevent a sudden increase in the resistance of the connection portion.
  • a substrate A plurality of first sensor patterns formed on one surface of the substrate in parallel with each other along a first direction; And a plurality of second sensor patterns spaced apart from the first sensor pattern and formed in parallel with each other along a second direction crossing the first direction, wherein the first sensor pattern includes a plurality of first sensor electrodes; And a first connection portion connecting the adjacent first sensor electrodes to each other, and the second sensor pattern includes a plurality of second sensor electrodes and a second connection portion connecting the adjacent second sensor electrodes to each other.
  • the first sensor pattern and the second sensor pattern intersect each other at the first connection part and the second connection part, and an insulating layer having an inclination angle is formed between the first connection part and the second connection part.
  • the substrate may be formed by any one of a polymer film, plastic and glass.
  • the first sensor electrode and the second sensor electrode may be formed by any one of a metal and TCO.
  • the first connection portion and the second connection portion may be formed by any one of a metal and a TCO.
  • the inclination angle of the insulating layer may be in a range of 10 degrees to 50 degrees.
  • an anti-reflection layer may be formed on the first connection portion.
  • the anti-reflection layer may be formed including at least one low refractive material layer and a high refractive material layer.
  • patterning the first sensor electrode, the first connection portion and the second sensor electrode on the substrate Forming an insulation layer pattern on the substrate on which the first sensor electrode, the first connection part, and the second sensor electrode have an inclination angle; Applying a material for forming a second connection portion on the entire surface of the substrate on which the insulating layer is formed; And etching the material for forming the second connection part to form a second connection part.
  • the forming of the insulating layer pattern to have the inclination angle may include applying an insulating layer forming material; And irradiating light, wherein the light irradiation may be performed on the back of the substrate.
  • the insulating layer forming material may be an uncured polymer material.
  • the insulation layer in the forming of the insulation layer pattern to have the inclination angle, may be formed to have an inclination angle with respect to the substrate in a range of 10 to 50 degrees.
  • the method may further include: applying an antireflective layer forming material on the entire surface of the second connecting portion forming material; And etching the material for forming the second connection portion and the material for forming the reflective ring layer to form a second connection portion.
  • the step of applying the entire surface of the antireflective layer forming material may include applying the entire surface of the low refractive index layer forming material; And applying the entire surface of the material for forming the high refractive index layer.
  • the step of applying the entire surface of the material for forming the low refractive index; And applying the entire surface of the material for forming the high refractive index layer may be performed two to five times, respectively.
  • the insulating layer formed between the first connecting portion and the second connecting portion connecting the sensor electrodes to each other is formed to have a thickness of 1 ⁇ m or more and 10 ⁇ m or less and an inclination angle of 10 degrees to 50 degrees. It is possible to prevent the increase in the resistance value of the connection part while increasing the overall visibility of the touch panel by forming the second connection part to be connected without disconnection.
  • FIG. 1 is a simplified plan view of a touch panel according to an example of the present invention.
  • FIG. 2 is a simplified cross-sectional view of a touch panel according to an example of the present invention.
  • FIG 3 is a partial cross-sectional view showing an insulating layer having an inclination angle in a touch panel according to an exemplary embodiment of the present invention.
  • FIG. 4 is a simplified cross-sectional view of a touch panel according to another exemplary embodiment of the present invention.
  • FIG. 5 is a simplified cross-sectional view of a touch panel according to another example of the present invention.
  • FIG. 6 is a graph showing a change in resistance of the second connection portion according to the inclination angle ⁇ 1 of the insulating layer.
  • FIG. 7 is a view for explaining a method of manufacturing a touch panel according to an embodiment of the present invention.
  • FIG. 8 is a graph showing the change of the inclination angle of the insulating layer according to the light irradiation amount in the insulating layer formed by the front light irradiation.
  • FIG 9 is a graph showing the change of the inclination angle of the insulating layer according to the light irradiation amount in the insulating layer formed by the back light irradiation.
  • FIG. 10 is a photograph showing an insulating layer formed by front light irradiation.
  • FIG. 11 is a photograph showing an insulating layer formed by back light irradiation.
  • each component and its shape may be briefly drawn or exaggerated for clarity, and the components in the actual product may not be represented and omitted.
  • the components in the actual product may not be represented and omitted.
  • in adding reference numerals to components of each drawing it should be noted that only those components having the same function have the same number as much as possible even if displayed on different drawings.
  • terms such as “first” and “second” are used to distinguish one component from another component, and the component is not limited by the terms.
  • FIG. 1 is a plan view of a touch panel according to an exemplary embodiment of the present invention.
  • the touch panel includes a substrate 100, a plurality of first sensor patterns 200 and the first sensor formed on the substrate 100 along a first direction.
  • a plurality of second sensor patterns 300 formed on the substrate in a second direction that is spaced apart from the pattern 200 and crosses the first direction.
  • the first sensor pattern 200 includes a plurality of first sensor electrodes 210 and a first connection part 220 connecting the first sensor electrodes 210 adjacent to each other along the first direction.
  • the second sensor pattern 300 includes a plurality of second sensor electrodes 310 and a second connection part 320 connecting the second sensor electrodes 310 adjacent to each other along the second direction.
  • first sensor pattern 200 and the second sensor pattern 300 are spaced apart from each other at the first connecting portion 220 and the second connecting portion 320 to cross each other, and the first connecting portion 220 is separated from each other.
  • An insulating layer 500 having an inclination angle is formed between the second connection parts 320.
  • the first direction becomes the Y-axis direction and the second direction becomes the X-axis direction.
  • the first direction and the second direction may be interchanged.
  • the substrate 100 provides a space in which the first sensor pattern 200 and the second sensor pattern 300 are to be formed.
  • the type of the substrate 100 is not particularly limited as long as it has transparency and a supporting force of a predetermined strength or more.
  • the substrate 100 for example, polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), polyethylene naphthalate (PEN), polyether sulfone (PES), cyclic olefin Polymer (COC), Triacetylcellulose (TAC) film, Polyvinyl alcohol (PVA) film, Polyimide (PI) film, Polystyrene (PS), Biaxially oriented polystyrene (K resin-containing biaxially oriented PS; BOPS ) Or glass may be used.
  • PET polyethylene terephthalate
  • PC polycarbonate
  • PMMA polymethyl methacrylate
  • PEN polyethylene naphthalate
  • PES polyether sulfone
  • COC cycl
  • the first sensor pattern 200 plays a role of generating a signal by a user's touch together with the second sensor pattern 300 to recognize touch coordinates.
  • the first sensor pattern 200 and the second sensor pattern 300 may be formed in a plurality of lines on the substrate 100. Although FIG. 1 illustrates that the first sensor pattern 200 is formed in five lines and the second sensor pattern 300 is formed in four lines, these may be formed in 5 to 20 lines, respectively, and 20 lines as necessary. It may be formed as described above.
  • the first sensor pattern 200 and the second sensor pattern 300 are formed to cross each other, in FIG. 1 is formed on one surface of the substrate 100 so as to vertically cross each other.
  • the first sensor pattern 200 is formed in parallel in the Y-axis direction
  • the second sensor pattern 300 is formed in parallel in the X-axis direction.
  • the first sensor pattern 200 may be formed to be parallel to the X axis direction
  • the first sensor pattern 300 may be formed to be parallel to the Y axis direction.
  • the first sensor pattern 200 may be formed of a transparent conductive oxide (TCO).
  • TCO transparent conductive oxide
  • ITO Indium Thin Oxide
  • the first sensor pattern may be formed using a conductive polymer having excellent flexibility and simple coating process. Examples of such conductive polymers include poly-3,4-ethylenedioxythiophene / polystyrenesulfonate (PEDOT / PSS), polyaniline, polyacetylene or polyphenylenevinylene.
  • the first sensor pattern 200 includes a plurality of first sensor electrodes 210 and a first connection part 220 connecting the first sensors to each other.
  • the first sensor electrode 210 serves to sense a user's touch
  • the first connection part 220 is formed at a point crossing the second connection part 320 of the second sensor pattern 300.
  • And serves to connect the adjacent first sensor electrodes 210 in the Y-axis direction.
  • the shape of the first sensor electrode 210 is not particularly limited. Although FIG. 1 illustrates a rhombus shape, the first sensor electrode 210 may be formed in a rectangular, octagonal or circular shape.
  • the second sensor pattern 300 generates a signal by a user's touch together with the first sensor pattern 200.
  • the second sensor pattern 300 is perpendicular to the first sensor pattern 200. It is formed on one surface of the substrate 100 in the X-axis direction.
  • the second sensor pattern 300 may also be formed of a TCO or conductive polymer including ITO.
  • the second sensor pattern 300 includes a plurality of second sensor electrodes 310 and a second connection part 320.
  • the second sensor electrode 310 detects a user's touch
  • the second connector 320 is formed at an intersection with the first connector 220 of the first sensor pattern 200 to be adjacent thereto.
  • the second sensor electrode 310 is connected in the X-axis direction.
  • an insulating layer 500 is interposed between the second connection part 320 and the first connection part 220 in order to prevent the second connection part 320 and the first connection part 220 from being electrically connected to each other.
  • the insulating layer 500 may be used without limitation as long as it is a transparent material capable of insulating electricity.
  • the material of the substrate 100 may be the material of the insulating layer 500.
  • the second sensor electrode 310 may be formed in a rhombus, a rectangle, an octagon, or a circular shape, but is not necessarily limited thereto.
  • Lead wires 410 and 420 receiving electrical signals from the first sensor pattern 200 and the second sensor pattern 300 are formed at one end of the first sensor pattern 200 and the second sensor pattern 300.
  • lead wires 411, 412, 413, 414, and 415 respectively extending from one end of the first sensor pattern 200 are extended to the lower side of the substrate, respectively, and terminal ends thereof are formed.
  • the lead wires 421, 422, 423, and 424 respectively extending from one end of the second sensor pattern 300 are drawn out to the side of the substrate and extend below the substrate to form connection terminals at ends thereof.
  • the lead wires 410 and 420 may be printed using a silk screen method, a gravure printing method, or an inkjet printing method.
  • a silver paste or a material composed of organic silver having excellent electrical conductivity may be used as the material of the lead wires 410 and 420.
  • the material of the lead wires 410 and 420 is not limited thereto, and a conductive polymer, carbon black, TCO, metals, or a low resistance metal may be used.
  • the lead wire is connected to one end of the first sensor pattern 200 and the second sensor pattern 300, but this is merely an example, and the first sensor pattern 200 and the second sensor pattern ( Of course, it may be connected to both ends of (300).
  • FIG. 2 is a cross-sectional view of a touch panel according to an example of the present invention.
  • the first sensor electrode 210, the first connector 220 (not shown), and the second sensor electrode 310 are patterned on the same layer on the substrate 100.
  • the first sensor electrode 210, the first connector 220, and the second sensor electrode 310 may be formed of a metal or a transparent material having conductivity.
  • a transparent material having such conductivity a transparent conductive oxide can be used.
  • TCO transparent conductive oxide
  • indium oxide-tin oxide, indium oxide-zinc oxide, AZO, zinc oxide, or the like can be used.
  • the insulating layer 500 is formed on the first connection part 220 (not shown), and allows the second connection part 320 and the first connection part 220 to be described later to be electrically insulated.
  • the insulating layer 500 may be formed of an electrically insulating transparent material such as a transparent synthetic resin.
  • the second connector 320 may be formed on the insulating layer 500.
  • the second connector 320 is formed in a bridge shape to connect two second sensor electrodes 310 spaced apart from each other.
  • the second connector 320 may be electrically insulated from the first connector 220 by the insulating layer 500, and may connect the plurality of second sensor electrodes 310 in a second direction.
  • a distance in the first direction of the insulating layer 500 and the second connection part 320 is referred to as a width, and a distance in the second direction is referred to as a length.
  • the second connector 320 should have a width smaller than that of the insulating layer 500 to prevent the second connector 320 from being electrically conductive with the first sensor electrode 210. Since the electrode 310 must be electrically conductive, the electrode 310 must be longer than the length of the insulating layer 500.
  • the second connection part 320 may be formed of a metal or a transparent material having conductivity.
  • a transparent material having such conductivity a transparent conductive oxide can be used.
  • ITO, IZO, AZO, ZnO, or the like may be used.
  • FIG 3 is a partial cross-sectional view showing an insulating layer having an inclination angle in a touch panel according to an exemplary embodiment of the present invention.
  • the insulating layer 500 is formed to have a gentle inclination.
  • the insulating layer 500 may be formed to have an inclination angle ⁇ 1 with respect to the substrate and a side inclination angle ⁇ 2 with respect to the upper surface of the insulating layer 500.
  • the inclination angle ⁇ 1 may be in a range of 10 degrees to 50 degrees, and the resistance of the second connection part 320 formed on the insulating layer is stable within the range. If the inclination angle ⁇ 1 is less than 10 degrees, there is difficulty in forming the insulating layer 500 to have a predetermined height. If the inclination angle ⁇ 1 is greater than 50 degrees, the resistance value of the second connector 320 increases. Problems may arise.
  • the value of the inclination angle ⁇ 2 of the side surface may vary according to the inclination angle ⁇ 1.
  • the second connection portions 320 formed on the upper portions of the insulating layer 500 may be formed to be smoothly connected without being short-circuited, and the resistance value may also be stabilized.
  • FIG. 6 is a graph illustrating the resistance change of the second connection part 310 according to the inclination angle ⁇ 1 of the insulating layer 500.
  • the resistance of the second connection part 310 is a value measured after maintaining a constant temperature for 240 hours at a temperature of 60 ° C. and a humidity of 90%. Referring to the graph shown in FIG. 6, when the inclination angle ⁇ 1 of the insulating layer 500 exceeds 50 degrees, it can be seen that the resistance of the second connection part 310 rises by 3 kV or more.
  • FIG. 4 is a cross-sectional view of a touch panel according to another exemplary embodiment of the present invention.
  • the insulating layer (1) on the substrate 100, the first sensor electrode 210, the first connection portion 220 (not shown) and the second sensor electrode 310 is patterned 500 and the second connection part 320 are sequentially disposed, and the anti-reflection layer 600 may be formed on the second connection part 320.
  • the anti-reflection layer 600 may be formed on the front surface including the second connection part 320.
  • the anti-reflection layer 600 may be formed of at least two or more thin films having different refractive indices. That is, the wavelengths of the light reflected from the interface of each thin film of the anti-reflection layer 600 interfere with each other and disappear.
  • the antireflection layer 600 may be formed of at least one low refractive index material layer and a high refractive index material layer.
  • the antireflection layer 600 may have a lower reflectance as the difference in refractive index between the low refractive index material layer and the high refractive index material layer increases.
  • the antireflection layer 600 may be formed by alternately stacking the low refractive index material layer and the high refractive index material layer. As the number of thin films stacked alternately as described above, the reflectance due to the anti-reflection layer 600 may be lowered.
  • FIG. 7 is a view for explaining a method of manufacturing a touch panel according to an embodiment of the present invention.
  • the first sensor electrode 210, the first connector 220, and the second sensor electrode 310 are patterned on the substrate 100, and the first sensor electrode 210 is formed. Forming a pattern of the insulating layer 500 on the substrate 100 on which the first connection part 220 and the second sensor electrode 310 are patterned; Applying a material to form a second connector 320 on the entire surface of the substrate 100 on which the insulating layer 500 is formed; And etching the material forming the second connector 320 to form the second connector 320.
  • the first sensor electrode 210, the first connector 220 (not shown), and the second sensor electrode 310 are patterned on the substrate 100.
  • the first sensor electrode 210, the first connector 220, and the second sensor electrode 310 may be formed of the same material or may be formed of different materials. In consideration of manufacturing convenience, the first sensor electrode 210, the first connector, and the second sensor electrode 310 may be formed by sputtering or depositing a transparent conductive oxide on the substrate 100. It may also be formed using a photo lithography method using a mask.
  • the insulating material 501 is coated on the entire surface of the substrate 100 on which the first sensor electrode 210, the first connector 220, and the second sensor electrode 310 are patterned.
  • the insulating material 501 may be an electrically insulating transparent material such as a transparent synthetic resin.
  • the insulating layer 500 is formed on the first connector 220, and the second connector 320 and the first connector 220 to be described later can be electrically insulated from each other.
  • the insulating material 501 is entirely formed on the substrate 100 on which the first sensor electrode 210, the first connection part 220, and the second sensor electrode 310 are patterned. After application, a photolithography method may be used that is etched using a mask.
  • the insulating material 501 is irradiated with light and developed, and then etched to form an insulating layer 500 pattern on a portion requiring insulation.
  • the insulating layer 500 may be formed to have a gentle inclination.
  • the insulating layer 500 may be formed to have an inclination angle ⁇ 1 with respect to the substrate and a side inclination angle ⁇ 2 with respect to the upper surface of the insulating layer 500.
  • the second connection part 320 may be formed on the insulating layer 500.
  • the second connector 320 may be formed in a bridge shape to connect two second sensor electrodes 310 spaced apart from each other.
  • the second connector 320 may be electrically insulated from the first connector 220 by the insulating layer 500, and may connect the plurality of second sensor electrodes 310 in a second direction.
  • FIG. 8 shows the inclination angle ⁇ 1 of the insulating layer depending on the amount of light irradiation when the insulating layer is formed by directly irradiating light from the front surface opposite to the substrate and developing and etching the light.
  • the light irradiated from the front surface directly reaches the material for forming an insulating layer, that is, the insulating material, and the difference of exposure to light in the part covered by the mask and the part not covered by the mask is large, and thus the degree of curing is very large.
  • a relatively steep slope is formed at the top of the insulating layer.
  • the etching takes place from the top, the inclination angle of the top is steep, the inclination of the bottom is also relatively steep.
  • the light irradiated from the back reaches the insulating layer forming material, that is, the insulating material after passing through the substrate and the sensor electrode, etc., first absorbing the light from the lower portion of the insulating material.
  • the insulating layer forming material that is, the insulating material after passing through the substrate and the sensor electrode, etc.
  • first absorbing the light from the lower portion of the insulating material when light is absorbed from the lower portion of the insulating material, light reaching the upper portion of the insulating material is relatively less.
  • the difference in the degree of cure between the portion covered by the mask and the portion not covered by the mask is relatively small in the upper portion of the insulating layer, and a relatively gentle slope is formed in the upper portion.
  • the etching takes place from the top, the inclination angle of the upper portion is relatively gentle, so the inclination angle of the lower portion is also relatively gentle.
  • the inclination angle ⁇ 1 of the insulating layer is small even when etching after the light irradiation, and the inclination angle ⁇ 1 is increased even when the light irradiation amount is increased. It does not increase significantly.
  • the inclination angle of the completed insulating layer may be 50 degrees or less, the inclination is gentle at the edge portion of the insulating layer.
  • the angle of inclination at the edge portion of the insulating layer is gentle as described above, even if the connecting portion made of a conductive material is formed on the insulating layer, separation of the conductive material does not occur at the edge portion, thereby forming a satisfactory conductive material layer. . As a result, the conductivity of the connection becomes good and there is little risk that the resistance at both terminals becomes unnecessarily large.
  • the size of the inclination angle in the insulating layer is advantageously 50 degrees or less, more specifically in the range of 10 degrees to 50 degrees.
  • FIG. 10 is a photograph showing an insulating layer formed by irradiating light from the front surface. Looking at Figure 10, it can be seen that the corner inclination angle of the insulating layer is urgent. As a result, a problem may occur in which the second connection part formed on the insulating layer is shorted or the resistance value increases rapidly.
  • FIG. 11 is a photograph showing a manufacturing method according to an example of the present invention, that is, an insulating layer formed by performing light irradiation on the rear surface, and it can be seen that the insulating layer has a gentle edge inclination angles ⁇ 1 and ⁇ 2.
  • the insulating layer has a gentle edge inclination angles ⁇ 1 and ⁇ 2.
  • substrate 200 first sensor pattern
  • first sensor electrode 220 first connection portion

Abstract

The present invention provides a touch panel comprising: a substrate; a plurality of first sensor patterns, which are formed in lines along a first direction; and a plurality of second sensor patterns, which are formed in lines along a second direction crossing the first direction, wherein the first sensor patterns comprise a first connection portion for connecting a plurality of first sensor electrodes and adjacent first sensor electrodes, the second sensor patterns comprise a second connection portion for connecting a plurality of second sensor electrodes and adjacent second sensor electrodes, wherein the first sensor patterns and the second sensor patterns cross each other at the first connection portion and the second connection portion, and wherein an insulation layer having a tilt angle is formed between the first connection portion and the second connection portion.

Description

절연층이 개선된 터치패널 및 그의 제조방법Touch panel with improved insulating layer and manufacturing method thereof
본 발명은 절연층이 개선된 터치 패널 및 그의 제조방법에 관한 것으로서, 센서 전극들 상부에 배치된 절연층이 경사각을 갖도록 한 터치 패널 및 그의 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a touch panel having an improved insulating layer and a method of manufacturing the same.
최근 휴대용 장치의 발달로 스마트폰, 태블릿 컴퓨터, 게임기, 학습보조장치 및 카메라 등이 널리 사용되고 있다. 이러한 휴대용 장치들의 입력방식은, 기존의 마우스나 키보드 입력방식에서 현재는 터치 입력방식으로 진화하고 있다. 터치 입력방식은 화면을 보면서 직접 화면 위의 아이콘이나 프로그램을 선택하는 것이 가능하기 때문에 사용자로 하여금 직관적인 사용법을 제공할 수 있을 뿐만 아니라 장치의 소형화 및 경량화에도 장점이 있다.Recently, with the development of portable devices, smart phones, tablet computers, game consoles, learning aids, and cameras are widely used. The input method of these portable devices has evolved from the conventional mouse or keyboard input method to the touch input method. Since the touch input method can directly select an icon or a program on the screen while viewing the screen, the user can not only provide intuitive usage but also have advantages in miniaturization and light weight of the device.
상기와 같은 터치에 의한 입력을 하기 위한 수단으로서 터치패널이 사용된다. 일반적으로 터치패널은 터치를 인식하기 위한 센서전극과 상기 센서전극을 구동수단과 연결하거나 외부 입력단과 연결하기 위한 리드선을 포함한다. 이러한 터치패널의 종류는 입력방식 또는 인식방식에 따라 구별될 수 있는데, 예를 들어, 저항막 방식(Resistive Type), 정전용량방식(Capacitive Type), 전기자기장방식(Electro-Magnetic Type), 소오방식(SAW Type; Surface Acoustic Wave Type), 인프라레드 방식(Infrared Type)의 터치패널로 나누어질 수 있다. 이들 중 현재 각광받고 있는 방식은 내구성이 뛰어나고 반응속도가 빠를 뿐만 아니라 멀티터치가 가능한 정전용량방식 터치패널이다.A touch panel is used as a means for inputting by such a touch. In general, the touch panel includes a sensor electrode for recognizing a touch and a lead wire for connecting the sensor electrode with a driving means or with an external input terminal. The touch panel may be classified according to an input method or a recognition method. For example, a resistive type, a capacitive type, an electro-magnetic type, or a soy type (SAW Type; Surface Acoustic Wave Type) and Infrared Type touch panel. Among the methods that are currently in the spotlight are capacitive touch panels that are durable, have a fast response speed, and are capable of multi-touch.
정전용량방식 터치패널은 터치 인식을 위해서 기판에 복수의 센서전극을 형성되고 상기 센서전극에 리드선을 연결하여 정전용량 변화를 측정하는 것이다. 상기 정전용량방식 터치패널의 일례로서, 두 종류의 센서전극을 형성하되, 한 종류의 센서전극은 Y축 방향으로 서로 연결하여 센서패턴을 형성하고(제1 센서패턴), 다른 종류의 센서전극은 X축 방향으로 서로 연결하여 센서패턴을 형성하여(제2 센서패턴), 상기 두 종류의 센서패턴에 포함된 센서전극 사이에 형성되는 정전용량을 측정하여 접촉점의 좌표를 산출하는 방법이 있다. 이러한 정전용량방식의 터치패널을 상호 정전용량방식 터치패널이라고 한다.In the capacitive touch panel, a plurality of sensor electrodes are formed on a substrate for touch recognition, and a lead wire is connected to the sensor electrodes to measure capacitance change. As an example of the capacitive touch panel, two types of sensor electrodes are formed, one sensor electrode is connected to each other in the Y-axis direction to form a sensor pattern (first sensor pattern), and the other sensor electrode is By connecting to each other in the X-axis direction to form a sensor pattern (second sensor pattern), there is a method of calculating the coordinates of the contact point by measuring the capacitance formed between the sensor electrodes included in the two types of sensor patterns. Such capacitive touch panels are referred to as mutual capacitive touch panels.
이러한 상호 정전용량방식 터치패널은 이층 구조와 단층 구조로 구분될 수 있다. 이층 구조의 상호 정전용량방식 터치패널은 두 종류의 센서패턴이 서로 다른 평면에 배치하므로 두께가 증가하는 문제점이 있다. The mutual capacitive touch panel may be divided into a two-layer structure and a single layer structure. Since the two-layer mutual capacitive touch panel has two types of sensor patterns arranged on different planes, the thickness increases.
반면, 단층 구조의 상호 정전용량방식 터치패널은 두 종류의 센서패턴이 동일한 평면에 배치되기 때문에 터치패널의 두께가 증가하지 않을 수 있다. 그런데 상호 정전용량을 발생시키기 위해서는 두 종류의 센서패턴이 교차되는 것이 필요하다. 즉, 상기 단층 구조의 상호 정전용량방식 터치패널에서, 같은 종류의 센서전극들 중 동일방향에 배치된 센서전극들은 연결부에 의하여 서로 연결되어 센서패턴을 형성하는데, 서로 다른 두 센서패턴들은 상기 연결부에 의하여 서로 교차된다. 이때 상기 두 센서패턴은 전기적으로 서로 연결되지 않아야 한다. 이를 위하여 두 센서패턴이 교차되는 연결부 사이에 절연층을 배치하여 한쪽 연결부는 절연층 아래로, 다른쪽 연결부는 절연층 위로 배선되도록 한다.On the other hand, in the single layer mutual capacitive touch panel, since the two types of sensor patterns are disposed on the same plane, the thickness of the touch panel may not increase. However, in order to generate mutual capacitance, it is necessary to cross two types of sensor patterns. That is, in the single layer mutual capacitive touch panel, sensor electrodes arranged in the same direction among the same type of sensor electrodes are connected to each other by a connecting part to form a sensor pattern, and two different sensor patterns are connected to the connecting part. Cross each other. At this time, the two sensor patterns should not be electrically connected to each other. To this end, an insulating layer is disposed between the connecting portions where the two sensor patterns intersect so that one connecting portion is wired under the insulating layer and the other connecting portion is wired over the insulating layer.
그런데, 절연층 위에 배선되는 연결부의 경우 절연층 측면이 직선, 즉 경사각이 90도인 경우에 상기 절연층 모서리를 집중으로 발생하는 내부 응력으로 인해 상부에 배선되는 연결부의 밀착성이 저하되어 작은 충격에도 연결부가 단락되거나 배선 형성 시 크랙등이 발생하여 저항값이 상승하는 문제점이 있다.However, in the case of the connection part wired on the insulating layer, when the insulating layer side is straight, that is, when the inclination angle is 90 degrees, the internal stress generated at the edges of the insulating layer intensively decreases the adhesion of the connection part wired on the upper part, and thus the connection part is subjected to a small impact. There is a problem in that the resistance value rises due to a short circuit or cracks when wiring is formed.
이에 본 발명에서는, 상기 절연층이 특정 두께의 낮은 경사각을 갖도록 하여 절연층 모서리에 집중되는 내부 응력을 분산시키고 제2 연결부에 대한 밀착성을 확보하여 미세회로 구현에 따른 터치패널의 전체 시인성을 높이면서도 상기 연결부의 저항값의 급격한 상승을 방지할 수 있는 터치패널 및 그의 제조방법을 제공하고자 한다.In the present invention, the insulating layer has a low inclination angle of a certain thickness to distribute the internal stress concentrated on the edge of the insulating layer and to secure the adhesion to the second connection portion while increasing the overall visibility of the touch panel according to the implementation of the microcircuit An object of the present invention is to provide a touch panel and a method of manufacturing the same, which can prevent a sudden increase in the resistance of the connection portion.
본 발명의 일례에서는, 기판; 상기 기판의 일면에서, 제1 방향을 따라 서로 나란하게 형성된 복수개의 제1 센서패턴; 및 상기 제1 센서패턴과 이격되어, 상기 제1 방향과 교차되는 제2 방향을 따라 서로 나란하게 형성된 복수개의 제2 센서패턴;을 포함하며, 상기 제1 센서패턴은 복수개의 제1 센서전극 및 인접하는 상기 제1 센서전극을 서로 연결하는 제1 연결부를 포함하며, 상기 제2 센서패턴은 복수개의 제2 센서전극 및 인접하는 상기 제2 센서전극을 서로 연결하는 제2 연결부를 포함하며, 상기 제1 센서패턴과 상기 제2 센서패턴은 상기 제1 연결부와 상기 제2 연결부에서 서로 교차되며, 상기 제1 연결부와 상기 제2 연결부의 사이에는 경사각을 갖는 절연층이 형성되어 있는 것을 특징으로 하는 터치 패널을 제공한다.In one example of the invention, a substrate; A plurality of first sensor patterns formed on one surface of the substrate in parallel with each other along a first direction; And a plurality of second sensor patterns spaced apart from the first sensor pattern and formed in parallel with each other along a second direction crossing the first direction, wherein the first sensor pattern includes a plurality of first sensor electrodes; And a first connection portion connecting the adjacent first sensor electrodes to each other, and the second sensor pattern includes a plurality of second sensor electrodes and a second connection portion connecting the adjacent second sensor electrodes to each other. The first sensor pattern and the second sensor pattern intersect each other at the first connection part and the second connection part, and an insulating layer having an inclination angle is formed between the first connection part and the second connection part. Provide a touch panel.
본 발명의 일례에서는, 상기 기판은 고분자 필름, 플라스틱 및 유리 중 어느 하나에 의하여 형성될 수 있다.In one example of the present invention, the substrate may be formed by any one of a polymer film, plastic and glass.
본 발명의 일례에서는, 상기 제1 센서전극 및 제2 센서전극은 금속 및 TCO 중 어느 하나에 의하여 형성될 수 있다.In one example of the present invention, the first sensor electrode and the second sensor electrode may be formed by any one of a metal and TCO.
　　　　　　　본 발명의 일례에 따르면, 상기 제1 연결부 및 제2 연결부는 금속 및 TCO 중 어느 하나에 의하여 형성될 수 있다.According to an example of the present invention, the first connection portion and the second connection portion may be formed by any one of a metal and a TCO.
본 발명의 일례에 따르면, 상기 절연층은 기판에 대한 경사각이 10도 내지 50도 범위일 수 있다.According to the exemplary embodiment of the present invention, the inclination angle of the insulating layer may be in a range of 10 degrees to 50 degrees.
본 발명의 일례에서는, 상기 제1 연결부 상에 반사방지층이 형성될 수 있다.In one example of the present invention, an anti-reflection layer may be formed on the first connection portion.
본 발명의 일례에 따르면, 상기 반사방지층은 적어도 하나 이상의 저굴절 재료층 및 고굴절 재료층을 포함하여 형성될 수 있다.According to an example of the present invention, the anti-reflection layer may be formed including at least one low refractive material layer and a high refractive material layer.
본 발명의 일례에서는, 기판 상에 제1 센서전극, 제1 연결부 및 제2 센서전극을 패터닝하는 단계; 상기 제1 센서전극, 제1 연결부 및 제2 센서전극이 패터닝된 기판 상에 경사각을 갖도록 절연층 패턴을 형성하는 단계; 상기 절연층이 형성된 기판의 전면에 제2 연결부 형성용 물질을 전면 도포하는 단계; 및 상기 제2 연결부 형성용 물질을 식각하여 제2 연결부를 형성하는 단계를 포함하는 터치패널의 제조방법을 제공한다.In one embodiment of the present invention, patterning the first sensor electrode, the first connection portion and the second sensor electrode on the substrate; Forming an insulation layer pattern on the substrate on which the first sensor electrode, the first connection part, and the second sensor electrode have an inclination angle; Applying a material for forming a second connection portion on the entire surface of the substrate on which the insulating layer is formed; And etching the material for forming the second connection part to form a second connection part.
본 발명의 일례에 따르면, 상기 경사각을 갖도록 절연층 패턴을 형성하는 단계는, 절연층 형성용 재료를 도포하는 단계; 및 광 조사하는 단계를 포함하며, 상기 광 조사는 기판 배면에서 실시할 수 있다.According to an example of the present invention, the forming of the insulating layer pattern to have the inclination angle may include applying an insulating layer forming material; And irradiating light, wherein the light irradiation may be performed on the back of the substrate.
본 발명의 일례에 따르면, 상기 절연층 형성용 재료는 미경화 고분자 재료일 수 있다.According to an example of the present invention, the insulating layer forming material may be an uncured polymer material.
본 발명의 일례에 따르면, 상기 경사각을 갖도록 절연층 패턴을 형성하는 단계에서 상기 절연층은 기판에 대한 경사각이 10 내지 50도 범위를 갖도록 형성할 수 있다.According to an example of the present invention, in the forming of the insulation layer pattern to have the inclination angle, the insulation layer may be formed to have an inclination angle with respect to the substrate in a range of 10 to 50 degrees.
본 발명의 일례에 따르면, 상기 전면 도포된 제2 연결부 형성용 물질 상에 반사방지층 형성용 물질을 전면 도포하는 단계; 및 상기 제2 연결부 형성용 물질 및 반사반지층 형성용 물질을 식각하여 제2 연결부를 형성하는 단계를 더 포함할 수 있다.According to an embodiment of the present invention, the method may further include: applying an antireflective layer forming material on the entire surface of the second connecting portion forming material; And etching the material for forming the second connection portion and the material for forming the reflective ring layer to form a second connection portion.
본 발명의 일례에서는, 상기 반사방지층 형성용 물질을 전면 도포하는 단계는 저굴절층 형성용 물질을 전면 도포하는 단계; 및 고굴절층 형성용 물질을 전면 도포하는 단계;를 포함할 수 있다.In one example of the present invention, the step of applying the entire surface of the antireflective layer forming material may include applying the entire surface of the low refractive index layer forming material; And applying the entire surface of the material for forming the high refractive index layer.
본 발명의 일례에서는, 상기 저굴절층 형성용 물질을 전면 도포하는 단계; 및 고굴절층 형성용 물질을 전면 도포하는 단계는 각각 2회 내지 5회 실시할 수 있다.In one example of the present invention, the step of applying the entire surface of the material for forming the low refractive index; And applying the entire surface of the material for forming the high refractive index layer may be performed two to five times, respectively.
본 발명에 의한 터치패널에서는 센서전극들을 서로 연결하는 제1 연결부와 제2 연결부 사이에 형성된 절연층이 1㎛ 이상 10㎛ 이하의 두께를 갖고 10도 내지 50도의 경사각을 갖도록 형성함으로써, 절연층 위에 형성되는 제2 연결부를 끊기지 않고 연결되도록 형성시켜 터치패널의 전체 시인성을 높이면서도 상기 연결부의 저항값 상승이 발생하는 것을 방지할 수 있다.In the touch panel according to the present invention, the insulating layer formed between the first connecting portion and the second connecting portion connecting the sensor electrodes to each other is formed to have a thickness of 1 μm or more and 10 μm or less and an inclination angle of 10 degrees to 50 degrees. It is possible to prevent the increase in the resistance value of the connection part while increasing the overall visibility of the touch panel by forming the second connection part to be connected without disconnection.
도 1은 본 발명의 일례에 따른 터치패널의 간략 평면도이다.1 is a simplified plan view of a touch panel according to an example of the present invention.
도 2는 본 발명의 일례에 따른 터치패널의 간략 단면도이다.2 is a simplified cross-sectional view of a touch panel according to an example of the present invention.
도 3은 본 발명의 일례에 따른 터치패널에서, 경사각을 갖는 절연층을 보여주는 부분 단면도이다.3 is a partial cross-sectional view showing an insulating layer having an inclination angle in a touch panel according to an exemplary embodiment of the present invention.
도 4는 본 발명의 다른 일례에 따른 터치패널의 간략 단면도이다.4 is a simplified cross-sectional view of a touch panel according to another exemplary embodiment of the present invention.
도 5는 본 발명의 또 다른 일례에 따른 터치패널의 간략 단면도이다.5 is a simplified cross-sectional view of a touch panel according to another example of the present invention.
도 6은 절연층의 경사각(θ1)에 따른 제2 연결부의 저항 변화를 보여주는 그래프이다.6 is a graph showing a change in resistance of the second connection portion according to the inclination angle θ1 of the insulating layer.
도 7은 본 발명의 일례에 따른 터치패널의 제조 방법을 설명하기 위한 도면들이다.7 is a view for explaining a method of manufacturing a touch panel according to an embodiment of the present invention.
도 8은 전면 광 조사에 의해 형성된 절연층에 있어서, 광 조사량에 따른 절연층 경사각의 변화를 나타내는 그래프이다.8 is a graph showing the change of the inclination angle of the insulating layer according to the light irradiation amount in the insulating layer formed by the front light irradiation.
도 9는 배면 광 조사에 의해 형성된 절연층에 있어서, 광 조사량에 따른 절연층 경사각의 변화를 나타내는 그래프이다.9 is a graph showing the change of the inclination angle of the insulating layer according to the light irradiation amount in the insulating layer formed by the back light irradiation.
도 10은 전면 광 조사에 의해 형성된 절연층을 보여주는 사진이다.10 is a photograph showing an insulating layer formed by front light irradiation.
도 11은 배면 광 조사에 의해 형성된 절연층을 보여주는 사진이다.11 is a photograph showing an insulating layer formed by back light irradiation.
이하, 도면에 개시된 일례들을 중심으로 본 발명은 상세하게 설명한다. 그러나, 본 발명의 범위가 하기 설명하는 도면이나 예들에 의하여 한정되는 것은 아니다. 도면은 다양한 실시예들 중 본 발명의 설명하기에 적합한 예를 선택하여 표현한 것일 뿐이다.Hereinafter, the present invention will be described in detail with reference to the examples disclosed in the drawings. However, the scope of the present invention is not limited by the drawings and examples described below. The drawings are merely selected and expressed as examples suitable for describing the present invention among the various embodiments.
도면에서는 이해를 돕기 위하여 각 구성요소와 그 형상 등이 간략하게 그려지거나 또는 과장되어 그려지기도 하며, 실제 제품에 있는 구성요소가 표현되지 않고 생략되기도 한다. 또한, 각 도면의 구성요소들에 참조번호를 부가함에 있어서, 동일한 기능을 갖는 구성 요소들에 한해서는 비록 다른 도면상에 표시되더라도 가능한 한 동일한 번호를 가지도록 하고 있음에 유의하여야 한다. 또한, "제1", "제2" 등의 용어는 하나의 구성요소를 다른 구성요소로부터 구별하기 위해 사용되는 것으로, 구성요소가 상기 용어들에 의해 제한되는 것은 아니다.In the drawings, each component and its shape may be briefly drawn or exaggerated for clarity, and the components in the actual product may not be represented and omitted. In addition, in adding reference numerals to components of each drawing, it should be noted that only those components having the same function have the same number as much as possible even if displayed on different drawings. In addition, terms such as “first” and “second” are used to distinguish one component from another component, and the component is not limited by the terms.
또한, 어떤 층이나 구성요소가 다른 층이나 또는 구성요소의 '상'에 있다라고 기재되는 경우에는, 상기 어떤 층이나 구성요소가 상기 다른 층이나 구성요소와 직접 접촉하여 배치된 경우뿐만 아니라, 그 사이에 제3의 층이 개재되어 배치된 경우까지 모두 포함하는 의미이다.In addition, when a layer or component is described as being on another layer or 'on' of a component, not only when the layer or component is disposed in direct contact with the other layer or component, It means including all until the case where a 3rd layer is interposed.
한편, 본 발명을 설명함에 있어서, 본 발명의 요지를 불필요하게 흐릴 수 있는 관련된 공지 기술에 대한 상세한 설명은 생략하도록 한다.Meanwhile, in describing the present invention, detailed descriptions of related well-known techniques that may unnecessarily obscure the subject matter of the present invention will be omitted.
도 1은 본 발명의 일례에 따른 터치패널의 평면도이다.1 is a plan view of a touch panel according to an exemplary embodiment of the present invention.
도 1에 도시된 바와 같이, 본 발명의 일례에 따른 터치패널은, 기판(100), 제1 방향을 따라 상기 기판(100)상에 형성된 복수개의 제1 센서패턴(200) 및 상기 제1 센서패턴(200)과 이격되어 상기 제1 방향과 교차되는 제2 방향을 따라 상기 기판상에 형성된 복수개의 제2 센서패턴(300)을 포함한다. 여기서, 상기 제1 센서패턴(200)은 복수개의 제1 센서전극(210) 및 상기 제1 방향을 따라 인접하는 상기 제1 센서전극(210)을 서로 연결하는 제1 연결부(220)를 포함하며, 상기 제2 센서패턴(300)은 복수개의 제2 센서전극(310) 및 상기 제2 방향을 따라 인접하는 상기 제2 센서전극(310)을 서로 연결하는 제2 연결부(320)를 포함한다. 한편, 상기 제1 센서패턴(200)과 상기 제2 센서패턴(300)은 상기 제1 연결부(220)와 상기 제2 연결부(320)에서 서로 이격되어 교차되며, 상기 제1 연결부(220)와 상기 제2 연결부(320) 사이에는 경사각을 갖는 절연층(500)이 형성되어 있다.As shown in FIG. 1, the touch panel according to an exemplary embodiment of the present invention includes a substrate 100, a plurality of first sensor patterns 200 and the first sensor formed on the substrate 100 along a first direction. A plurality of second sensor patterns 300 formed on the substrate in a second direction that is spaced apart from the pattern 200 and crosses the first direction. Here, the first sensor pattern 200 includes a plurality of first sensor electrodes 210 and a first connection part 220 connecting the first sensor electrodes 210 adjacent to each other along the first direction. The second sensor pattern 300 includes a plurality of second sensor electrodes 310 and a second connection part 320 connecting the second sensor electrodes 310 adjacent to each other along the second direction. Meanwhile, the first sensor pattern 200 and the second sensor pattern 300 are spaced apart from each other at the first connecting portion 220 and the second connecting portion 320 to cross each other, and the first connecting portion 220 is separated from each other. An insulating layer 500 having an inclination angle is formed between the second connection parts 320.
상기 도 1에 개시된 일례에서 상기 제1 방향은 Y축 방향이 되며, 제2 방향은 X축 방향이 된다. 다른 실시예에서는 상기 제1 방향과 제2 방향이 서로 바뀔 수도 있다.In the example disclosed in FIG. 1, the first direction becomes the Y-axis direction and the second direction becomes the X-axis direction. In another embodiment, the first direction and the second direction may be interchanged.
상기 기판(100)은 상기 제1 센서패턴(200) 및 상기 제2 센서패턴(300)이 형성될 공간을 제공한다. 상기 기판(100)은 투명성과 소정강도 이상의 지지력을 가진다면 그 종류가 특별히 제한되는 것은 아니다. 상기 기판(100)으로서, 예를 들어, 폴리에틸렌테레프탈레이트(PET), 폴리카보네이트(PC), 폴리메틸메타아크릴레이트(PMMA), 폴리에틸렌나프탈레이트(PEN), 폴리에테르술폰(PES), 고리형 올레핀 고분자(COC), TAC (Triacetylcellulose) 필름, 폴리비닐알코올(Polyvinyl alcohol; PVA) 필름, 폴리이미드(Polyimide; PI) 필름, 폴리스틸렌(Polystyrene; PS), 이축연신폴리스틸렌(K레진 함유 biaxially oriented PS; BOPS) 또는 유리 등이 사용될 수 있다.The substrate 100 provides a space in which the first sensor pattern 200 and the second sensor pattern 300 are to be formed. The type of the substrate 100 is not particularly limited as long as it has transparency and a supporting force of a predetermined strength or more. As the substrate 100, for example, polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), polyethylene naphthalate (PEN), polyether sulfone (PES), cyclic olefin Polymer (COC), Triacetylcellulose (TAC) film, Polyvinyl alcohol (PVA) film, Polyimide (PI) film, Polystyrene (PS), Biaxially oriented polystyrene (K resin-containing biaxially oriented PS; BOPS ) Or glass may be used.
상기 제1 센서패턴(200)은 상기 제2 센서패턴(300)과 함께 사용자의 터치에 의하여 신호를 발생시켜 터치 좌표를 인식할 수 있도록 하는 역할을 한다. 상기 제1 센서패턴(200)과 상기 제2 센서패턴(300)은 기판(100)상에 복수개로 라인형태로 형성될 수 있다. 도 1에서 상기 제1 센서패턴(200)은 5라인, 상기 제2 센서패턴(300)은 4라인으로 형성된 것을 도시하였지만, 이들은 각각 5 내지 20라인 정도로 형성될 수 있으며, 필요에 따라서는 20라인 이상으로 형성될 수도 있다.The first sensor pattern 200 plays a role of generating a signal by a user's touch together with the second sensor pattern 300 to recognize touch coordinates. The first sensor pattern 200 and the second sensor pattern 300 may be formed in a plurality of lines on the substrate 100. Although FIG. 1 illustrates that the first sensor pattern 200 is formed in five lines and the second sensor pattern 300 is formed in four lines, these may be formed in 5 to 20 lines, respectively, and 20 lines as necessary. It may be formed as described above.
이때, 제1 센서패턴(200)과 제2 센서패턴(300)은 서로 교차되도록 형성되는데, 도 1에서는 서로 수직으로 교차되도록 상기 기판(100)의 일면에 형성된다. 도 1에서 상기 제1 센서패턴(200)은 Y축 방향으로 평행하게 형성되고, 상기 제2 센서패턴(300)은 X축 방향으로 평행하게 형성된다. 다른 실시예에서는 상기 제1 센서패턴(200)이 X축 방향으로 평형하게 형성되고, 제1 센서패턴(300)이 Y축 방향으로 평행하게 형성될 수도 있음은 물론이다.In this case, the first sensor pattern 200 and the second sensor pattern 300 are formed to cross each other, in FIG. 1 is formed on one surface of the substrate 100 so as to vertically cross each other. In FIG. 1, the first sensor pattern 200 is formed in parallel in the Y-axis direction, and the second sensor pattern 300 is formed in parallel in the X-axis direction. In another embodiment, the first sensor pattern 200 may be formed to be parallel to the X axis direction, and the first sensor pattern 300 may be formed to be parallel to the Y axis direction.
상기 제1 센서패턴(200)은 투명도전성산화물(Transparent conductive oxide; TCO)에 의하여 형성될 수 있다. 이러한 TCO로서, ITO, IZO, AZO 등이 있으며, 그 중에서 ITO(Indium Thin Oxide)의 사용빈도가 높다. 상기와 같은 TCO 뿐만 아니라 유연성이 뛰어나고 코팅 공정이 단순한 전도성 고분자를 이용하여 상기 제1 센서패턴을 형성할 수도 있다. 이러한 전도성 고분자의 일례로서, 폴리-3,4-에틸렌디옥시티오펜/폴리스티렌설포네이트(PEDOT/PSS), 폴리아닐린, 폴리아세틸렌 또는 폴리페닐렌비닐렌 등이 있다.The first sensor pattern 200 may be formed of a transparent conductive oxide (TCO). As such TCO, there are ITO, IZO, AZO and the like, among which ITO (Indium Thin Oxide) is frequently used. In addition to the TCO as described above, the first sensor pattern may be formed using a conductive polymer having excellent flexibility and simple coating process. Examples of such conductive polymers include poly-3,4-ethylenedioxythiophene / polystyrenesulfonate (PEDOT / PSS), polyaniline, polyacetylene or polyphenylenevinylene.
상기 제1 센서패턴(200)은 복수개의 제1 센서전극(210)과 상기 제1 센서들을 서로 연결하는 제1 연결부(220)로 구성된다. 여기서, 상기 제1 센서전극(210)은 사용자의 터치를 감지하는 역할을 하고, 상기 제1 연결부(220)는 제2 센서패턴(300)의 제2 연결부(320)와 교차하는 지점에 형성되어, 인접하는 제1 센서전극(210)을 Y축 방향으로 연결하는 역할을 한다.The first sensor pattern 200 includes a plurality of first sensor electrodes 210 and a first connection part 220 connecting the first sensors to each other. Here, the first sensor electrode 210 serves to sense a user's touch, and the first connection part 220 is formed at a point crossing the second connection part 320 of the second sensor pattern 300. , And serves to connect the adjacent first sensor electrodes 210 in the Y-axis direction.
상기 제1 센서전극(210)의 형태에 특별한 제한이 있는 것은 아니다. 도 1에서는 마름모 형태를 갖는 것을 예시하고 있지만, 상기 제1 센서전극(210)은 직사각형, 팔각형 또는 원형으로 형성될 수도 있다.The shape of the first sensor electrode 210 is not particularly limited. Although FIG. 1 illustrates a rhombus shape, the first sensor electrode 210 may be formed in a rectangular, octagonal or circular shape.
상기 제2 센서패턴(300)은 전술한 바와 같이 상기 제1 센서패턴(200)과 함께 사용자의 터치에 의하여 신호를 발생하는 역할을 하는데, 도 1에서는 상기 제1 센서패턴(200)과 수직인 X축 방향으로 기판(100)의 일면에 형성된다. 상기 제2 센서패턴(300) 역시 상기 제1 센서패턴(200)과 마찬가지로 ITO를 포함하는 TCO 또는 전도성 고분자 등에 의하여 형성될 수 있다.As described above, the second sensor pattern 300 generates a signal by a user's touch together with the first sensor pattern 200. In FIG. 1, the second sensor pattern 300 is perpendicular to the first sensor pattern 200. It is formed on one surface of the substrate 100 in the X-axis direction. Like the first sensor pattern 200, the second sensor pattern 300 may also be formed of a TCO or conductive polymer including ITO.
상기 제2 센서패턴(300)은 복수개의 제2 센서전극(310)과 제2 연결부(320)를 포함한다. 여기서, 상기 제2 센서전극(310)은 사용자의 터치를 감지하고, 제2 연결부(320)는 상기 제1 센서패턴(200)의 상기 제1 연결부(220)와 교차하는 지점에 형성되어 인접하는 상기 제2 센서전극(310)을 X축 방향으로 연결한다. 이때, 제2 연결부(320)와 제1 연결부(220)가 전기적으로 연결되는 것을 방지하기 위해서 제2 연결부(320)와 제1 연결부(220) 사이에는 절연층(500)이 개재된다.The second sensor pattern 300 includes a plurality of second sensor electrodes 310 and a second connection part 320. Here, the second sensor electrode 310 detects a user's touch, and the second connector 320 is formed at an intersection with the first connector 220 of the first sensor pattern 200 to be adjacent thereto. The second sensor electrode 310 is connected in the X-axis direction. In this case, an insulating layer 500 is interposed between the second connection part 320 and the first connection part 220 in order to prevent the second connection part 320 and the first connection part 220 from being electrically connected to each other.
상기 절연층(500)은 전기를 절연시킬 수 있는 투명성 재료라면 제한없이 사용될 수 있다. 기판(100)의 재료가 상기 절연층(500)의 재료가 될 수도 있다.The insulating layer 500 may be used without limitation as long as it is a transparent material capable of insulating electricity. The material of the substrate 100 may be the material of the insulating layer 500.
상기 제2 센서전극(310) 역시 상기 제1 센서전극(210)와 마찬가지로 마름모, 직사각형, 팔각형 또는 원형 형상으로 형성할 수 있지만, 반드시 이에 한정되는 것은 아니다.Like the first sensor electrode 210, the second sensor electrode 310 may be formed in a rhombus, a rectangle, an octagon, or a circular shape, but is not necessarily limited thereto.
상기 제1 센서패턴(200)과 제2 센서패턴(300)의 일단에는 제1 센서패턴(200)과 제2 센서패턴(300)으로부터 전기적 신호를 전달받는 리드선(410, 420)이 형성된다. 구체적으로, 도 1에서 보면, 상기 제1 센서패턴(200)의 일단에서 각각 연장된 리드선들(411, 412, 413, 414, 415)은 각각 기판의 하부로 연장되어 말단에는 접속단자가 형성되어 있다. 또한 상기 제2 센서패턴(300)의 일단에서 각각 연장된 리드선들(421, 422, 423, 424)은 기판의 측면으로 인출되어 기판의 하부로 연장되어 말단에는 접속단자가 형성되어 있다.Lead wires 410 and 420 receiving electrical signals from the first sensor pattern 200 and the second sensor pattern 300 are formed at one end of the first sensor pattern 200 and the second sensor pattern 300. Specifically, in FIG. 1, lead wires 411, 412, 413, 414, and 415 respectively extending from one end of the first sensor pattern 200 are extended to the lower side of the substrate, respectively, and terminal ends thereof are formed. have. In addition, the lead wires 421, 422, 423, and 424 respectively extending from one end of the second sensor pattern 300 are drawn out to the side of the substrate and extend below the substrate to form connection terminals at ends thereof.
상기 리드선(410, 420)은 실크스크린법, 그라비아인쇄법 또는 잉크젯인쇄법 등을 이용하여 인쇄할 수 있다. 또한, 리드선(410, 420)의 재료로는 전기 전도도가 뛰어난 은 페이스트(Ag paste) 또는 유기은으로 조성된 물질을 사용할 수 있다. 상기 리드선(410, 420)의 재료는 이에 한정되는 것은 아니고 전도성 고분자, 카본블랙, TCO, 금속류 또는 저저항 금속을 사용할 수 있다.The lead wires 410 and 420 may be printed using a silk screen method, a gravure printing method, or an inkjet printing method. In addition, as the material of the lead wires 410 and 420, a silver paste or a material composed of organic silver having excellent electrical conductivity may be used. The material of the lead wires 410 and 420 is not limited thereto, and a conductive polymer, carbon black, TCO, metals, or a low resistance metal may be used.
도 1에서 상기 리드선은 제1 센서패턴(200)과 제2 센서패턴(300)의 일단에 연결되었지만 이는 예시적인 것으로, 터치패널의 방식에 따라 제1 센서패턴(200)과 제2 센서패턴(300)의 양단에 연결될 수도 있음은 물론이다.In FIG. 1, the lead wire is connected to one end of the first sensor pattern 200 and the second sensor pattern 300, but this is merely an example, and the first sensor pattern 200 and the second sensor pattern ( Of course, it may be connected to both ends of (300).
도 2는 본 발명의 일례에 따른 터치패널의 단면도이다.2 is a cross-sectional view of a touch panel according to an example of the present invention.
도 2에서 보는 바와 같이, 기판(100) 상에는 제1 센서전극(210), 제1 연결부(220; 미도시) 및 제2 센서전극(310)이 동일층 상에 패터닝되어 형성된다.As shown in FIG. 2, the first sensor electrode 210, the first connector 220 (not shown), and the second sensor electrode 310 are patterned on the same layer on the substrate 100.
상기 제1 센서전극(210), 제1 연결부(220) 및 제2 센서전극(310)은 금속 또는 도전성을 갖는 투명재료로 형성될 수 있다. 이러한 도전성을 갖는 투명 재료로서 투명 전도성 산화물을 사용할 수 있다.The first sensor electrode 210, the first connector 220, and the second sensor electrode 310 may be formed of a metal or a transparent material having conductivity. As the transparent material having such conductivity, a transparent conductive oxide can be used.
이러한 투명 전도성 산화물(TCO)로는 산화인듐-산화주석, 산화인듐-산화아연, AZO, 산화아연 등을 사용할 수 있다.As the transparent conductive oxide (TCO), indium oxide-tin oxide, indium oxide-zinc oxide, AZO, zinc oxide, or the like can be used.
상기 절연층(500)은 상기 제1 연결부(220; 미도시) 상에 형성되며, 후술할 제2 연결부(320)와 제1 연결부(220)가 전기적으로 절연될 수 있도록 한다.The insulating layer 500 is formed on the first connection part 220 (not shown), and allows the second connection part 320 and the first connection part 220 to be described later to be electrically insulated.
상기 절연층(500)은 투명한 합성수지 등 전기 절연성의 투명한 재질로 형성될 수 있다.The insulating layer 500 may be formed of an electrically insulating transparent material such as a transparent synthetic resin.
상기 절연층(500) 상에는 제2 연결부(320)가 형성될 수 있다.The second connector 320 may be formed on the insulating layer 500.
도 2에서 보는 바와 같이 상기 제2 연결부(320)는 서로 이격되어 있는 두 개의 제2 센서전극(310)을 연결하기 위하여 브릿지 형태로 구성되어 있다. 상기 제2 연결부(320)는 상기 절연층(500)에 의해 상기 제1 연결부(220)와 전기적으로 절연되며, 상기 복수개의 제2 센서전극(310)을 제2 방향으로 연결시킬 수 있다.As shown in FIG. 2, the second connector 320 is formed in a bridge shape to connect two second sensor electrodes 310 spaced apart from each other. The second connector 320 may be electrically insulated from the first connector 220 by the insulating layer 500, and may connect the plurality of second sensor electrodes 310 in a second direction.
이하에서, 설명의 편의를 위하여 상기 절연층(500) 및 제2 연결부(320)의 제1 방향으로의 거리를 폭(width)이라고 하며, 제2 방향으로의 거리를 길이(length)라고 한다.Hereinafter, for convenience of description, a distance in the first direction of the insulating layer 500 and the second connection part 320 is referred to as a width, and a distance in the second direction is referred to as a length.
상기 제2 연결부(320)는 상기 제2 연결부(320)가 상기 제1 센서전극(210)과 도전되는 것을 방지하기 위하여 상기 절연층(500)의 폭보다 작은 폭을 가져야 하며, 상기 제2 센서전극(310)과는 도전되어야 하므로 상기 절연층(500)의 길이보다 길어야 한다.The second connector 320 should have a width smaller than that of the insulating layer 500 to prevent the second connector 320 from being electrically conductive with the first sensor electrode 210. Since the electrode 310 must be electrically conductive, the electrode 310 must be longer than the length of the insulating layer 500.
상기 제2 연결부(320)는 금속 또는 도전성을 갖는 투명재료로 형성될 수 있다. 이러한 도전성을 갖는 투명 재료로서 투명 전도성 산화물을 사용할 수 있다. 이러한 투명 전도성 산화물로는 ITO, IZO, AZO, ZnO 등을 사용할 수 있다.The second connection part 320 may be formed of a metal or a transparent material having conductivity. As the transparent material having such conductivity, a transparent conductive oxide can be used. As the transparent conductive oxide, ITO, IZO, AZO, ZnO, or the like may be used.
도 3은 본 발명의 일례에 따른 터치패널에서, 경사각을 갖는 절연층을 보여주는 부분 단면도이다.3 is a partial cross-sectional view showing an insulating layer having an inclination angle in a touch panel according to an exemplary embodiment of the present invention.
도 3에서 보는 바와 같이, 절연층(500)은 완만한 경사도를 갖도록 형성된다. 구체적으로, 상기 절연층(500)은 기판에 대한 경사각(θ1) 및 절연층(500)의 상부면에 대한 측면의 경사각(θ2)를 갖도록 형성될 수 있다. 상기 경사각(θ1)의 값은 10도 내지 50도 범위일 수 있으며, 상기 범위 내에서 상기 절연층 상에 형성되는 제2 연결부(320)의 저항값이 안정적이다. 상기 경사각(θ1)의 값이 10도 미만이면 소정의 높이를 갖도록 절연층(500)을 형성하는 데 있어서 공정상에 어려움이 있고, 50도보다 크면 제2 연결부(320)의 저항값이 상승하는 문제가 발생할 수 있다.As shown in FIG. 3, the insulating layer 500 is formed to have a gentle inclination. Specifically, the insulating layer 500 may be formed to have an inclination angle θ1 with respect to the substrate and a side inclination angle θ2 with respect to the upper surface of the insulating layer 500. The inclination angle θ1 may be in a range of 10 degrees to 50 degrees, and the resistance of the second connection part 320 formed on the insulating layer is stable within the range. If the inclination angle θ1 is less than 10 degrees, there is difficulty in forming the insulating layer 500 to have a predetermined height. If the inclination angle θ1 is greater than 50 degrees, the resistance value of the second connector 320 increases. Problems may arise.
상기 경사각(θ1)에 따라 상기 측면의 경사각(θ2)의 값이 변할 수 있다. 이와 같이 상기 절연층(500)이 완만한 경사도를 갖도록 형성됨으로써 상기 각 상부에 형성되는 제2 연결부(320)가 단락되지 않고 완만하게 연결되게 형성될 수 있을 뿐 아니라 저항값 또한 안정화할 수 있다.The value of the inclination angle θ2 of the side surface may vary according to the inclination angle θ1. As described above, since the insulating layer 500 is formed to have a gentle inclination, the second connection portions 320 formed on the upper portions of the insulating layer 500 may be formed to be smoothly connected without being short-circuited, and the resistance value may also be stabilized.
도 6은 절연층(500)의 경사각(θ1)에 따른 제2 연결부(310)의 저항 변화를 측정하여 그래프로 나타낸 것이다.FIG. 6 is a graph illustrating the resistance change of the second connection part 310 according to the inclination angle θ1 of the insulating layer 500.
이때, 제2 연결부(310)의 저항은 온도 60℃, 습도 90%의 조건에서 240시간 항온을 유지한 후에 측정한 값이다. 도 6에 도시된 그래프를 보면, 절연층(500)의 경사각(θ1)이 50도를 초과하는 경우 제2 연결부(310)의 저항값이 3㏀ 이상 상승하는 것을 확인할 수 있다.In this case, the resistance of the second connection part 310 is a value measured after maintaining a constant temperature for 240 hours at a temperature of 60 ° C. and a humidity of 90%. Referring to the graph shown in FIG. 6, when the inclination angle θ1 of the insulating layer 500 exceeds 50 degrees, it can be seen that the resistance of the second connection part 310 rises by 3 kV or more.
도 4는 본 발명의 다른 일례에 따른 터치패널의 단면도이다.4 is a cross-sectional view of a touch panel according to another exemplary embodiment of the present invention.
본 발명의 다른 일례에 따르면, 앞서 설명한 바와 같이, 제1 센서전극(210), 제1 연결부(220; 미도시) 및 제2 센서전극(310)이 패터닝된 기판(100) 상에 절연층(500) 및 제2 연결부(320)가 순차적으로 배치되어 있으며, 상기 제2 연결부(320) 상에는 반사방지층(600)이 형성될 수 있다.According to another example of the present invention, as described above, the insulating layer (1) on the substrate 100, the first sensor electrode 210, the first connection portion 220 (not shown) and the second sensor electrode 310 is patterned 500 and the second connection part 320 are sequentially disposed, and the anti-reflection layer 600 may be formed on the second connection part 320.
본 발명의 또 다른 일례에 따르면, 도 5에서 보는 바와 같이, 상기 반사방지층(600)이 상기 제2 연결부(320)를 포함한 전면에 형성될 수도 있다.According to another example of the present invention, as shown in FIG. 5, the anti-reflection layer 600 may be formed on the front surface including the second connection part 320.
상기 반사방지층(600)은 굴절율이 서로 다른 적어도 두 층 이상의 박막으로 형성될 수 있다. 즉, 상기 반사방지층(600)의 각 박막의 경계면에서 반사되는 빛의 파장들이 서로 간섭되어 소멸되도록 한다.The anti-reflection layer 600 may be formed of at least two or more thin films having different refractive indices. That is, the wavelengths of the light reflected from the interface of each thin film of the anti-reflection layer 600 interfere with each other and disappear.
상기 반사방지층(600)은 적어도 하나 이상의 저굴절율 재료층 및 고굴절율 재료층으로 형성될 수 있다. 여기서, 저굴절율 재료층은 상기 저굴절율 재료층(410)은 MgF2(n=1.38), NaF(n=1.33) 및 CaF2(n=1.44) 중 어느 하나가 선택적으로 사용될 수 있으며, 상기 고굴절율 재료층(420)으로는 CeF3(n=1.65), Al2O3(n=1.76), ZrO2(n=2.10) 및 TiO2(n=2.50) 중 어느 하나가 선택적으로 사용될 수 있다.The antireflection layer 600 may be formed of at least one low refractive index material layer and a high refractive index material layer. In the low refractive index material layer, the low refractive index material layer 410 may be any one selected from MgF 2 (n = 1.38), NaF (n = 1.33), and CaF 2 (n = 1.44). As the layer 420, any one of CeF 3 (n = 1.65), Al 2 O 3 (n = 1.76), ZrO 2 (n = 2.10), and TiO 2 (n = 2.50) may be selectively used.
상기 반사방지층(600)은 상기 저굴절율 재료층 및 고굴절율 재료층간의 굴절율 차이가 클수록 반사율이 낮아질 수 있다. 상기 반사방지층(600)은 상기 저굴절율 재료층 및 고굴절율 재료층이 교대로 적층되어 형성될 수 있다. 이와 같이 교대로 적층되는 박막의 개수가 많을수록 상기 반사방지층(600)으로 인한 반사율이 낮아질 수 있다.The antireflection layer 600 may have a lower reflectance as the difference in refractive index between the low refractive index material layer and the high refractive index material layer increases. The antireflection layer 600 may be formed by alternately stacking the low refractive index material layer and the high refractive index material layer. As the number of thin films stacked alternately as described above, the reflectance due to the anti-reflection layer 600 may be lowered.
도 7은 본 발명의 일례에 따른 터치패널의 제조 방법을 설명하기 위한 도면들이다.7 is a view for explaining a method of manufacturing a touch panel according to an embodiment of the present invention.
본 발명의 일례에 따른 터치패널은, 기판(100) 상에 제1 센서전극(210), 제1 연결부(220) 및 제2 센서전극(310)을 패터닝하는 단계, 상기 제1 센서전극(210), 제1 연결부(220) 및 제2 센서전극(310)이 패터닝된 기판(100) 상에 경사각을 갖도록 절연층(500) 패턴을 형성하는 단계; 상기 절연층(500)이 형성된 기판(100)의 전면에 제2 연결부(320)를 형성하는 물질을 전면 도포하는 단계; 및 상기 제2 연결부(320)를 형성하는 물질을 식각하여 제2 연결부(320)를 형성하는 단계를 거쳐 형성된다.In the touch panel according to the exemplary embodiment of the present invention, the first sensor electrode 210, the first connector 220, and the second sensor electrode 310 are patterned on the substrate 100, and the first sensor electrode 210 is formed. Forming a pattern of the insulating layer 500 on the substrate 100 on which the first connection part 220 and the second sensor electrode 310 are patterned; Applying a material to form a second connector 320 on the entire surface of the substrate 100 on which the insulating layer 500 is formed; And etching the material forming the second connector 320 to form the second connector 320.
구체적으로, S1 단계에서는, 기판(100) 상에 제1 센서전극(210), 제1 연결부(220; 미도시) 및 제2 센서전극(310)을 패터닝한다.In detail, in operation S1, the first sensor electrode 210, the first connector 220 (not shown), and the second sensor electrode 310 are patterned on the substrate 100.
상기 제1 센서전극(210), 제1 연결부(220) 및 제2 센서전극(310)은 동일한 재료에 의하여 형성될 수도 있고, 서로 다른 재료에 의하여 형성될 수도 있다. 제조상 편의성을 고려할 때 상기 제1 센서전극(210), 제1 연결부 및 제2 센서전극(310)은 상기 기판(100) 상에 투명 도전성 산화물을 스터퍼(sputtering)하거나 증착하여 형성될 수 있다. 또한 마스크를 이용한 포토 리소그라피(photo lithography) 방식을 사용하여 형성될 수도 있다.The first sensor electrode 210, the first connector 220, and the second sensor electrode 310 may be formed of the same material or may be formed of different materials. In consideration of manufacturing convenience, the first sensor electrode 210, the first connector, and the second sensor electrode 310 may be formed by sputtering or depositing a transparent conductive oxide on the substrate 100. It may also be formed using a photo lithography method using a mask.
S2 단계에서는, 상기 제1 센서전극(210), 제1 연결부(220) 및 제2 센서전극(310)이 패터닝된 기판(100) 상에 절연물질(501)을 전면 도포한다.In operation S2, the insulating material 501 is coated on the entire surface of the substrate 100 on which the first sensor electrode 210, the first connector 220, and the second sensor electrode 310 are patterned.
상기 절연물질(501)로는 투명한 합성수지 등 전기 절연성의 투명한 재질을 들 수 있다.The insulating material 501 may be an electrically insulating transparent material such as a transparent synthetic resin.
상기 절연층(500)은 상기 제1 연결부(220 미도시) 상에 형성되며, 후술할 제2 연결부(320)와 제1 연결부(220)가 전기적으로 절연될 수 있도록 한다.The insulating layer 500 is formed on the first connector 220, and the second connector 320 and the first connector 220 to be described later can be electrically insulated from each other.
상기 절연층(500)의 형성방법은 상기 제1 센서전극(210), 제1 연결부(220) 및 제2 센서전극(310)이 패터닝된 기판(100) 상에 상기 절연물질(501)을 전면 도포한 후, 마스크를 이용하여 식각하는 포토 리소그래피 방식을 사용할 수 있다.In the method of forming the insulating layer 500, the insulating material 501 is entirely formed on the substrate 100 on which the first sensor electrode 210, the first connection part 220, and the second sensor electrode 310 are patterned. After application, a photolithography method may be used that is etched using a mask.
본 발명의 일례에서는, S3 단계에서 보는 바와 같이, 상기 절연물질(501)에 광을 조사하고 현상한 후에 식각을 실시하여 절연이 필요한 부분에 절연층(500) 패턴을 형성한다.In one example of the present invention, as shown in step S3, the insulating material 501 is irradiated with light and developed, and then etched to form an insulating layer 500 pattern on a portion requiring insulation.
이때, 상기 광 조사를 기판(100) 배면쪽에서 실시함으로써, S4 단계에서와 같이, 절연층(500)이 경사각을 갖도록 절연층(500) 패턴을 형성할 수 있다. 도 3에서 보는 바와 같이, 절연층(500)이 완만한 경사도를 갖도록 형성할 수 있다. 구체적으로, 상기 절연층(500)은 기판에 대한 경사각(θ1) 및 절연층(500)의 상부면에 대한 측면의 경사각(θ2)를 갖도록 형성될 수 있다.At this time, by performing the light irradiation on the back side of the substrate 100, as in step S4, it is possible to form the insulating layer 500 pattern so that the insulating layer 500 has an inclination angle. As shown in FIG. 3, the insulating layer 500 may be formed to have a gentle inclination. Specifically, the insulating layer 500 may be formed to have an inclination angle θ1 with respect to the substrate and a side inclination angle θ2 with respect to the upper surface of the insulating layer 500.
다음으로, S5 단계에서 보는 바와 같이, 상기 절연층(500) 상에는 제2 연결부(320)를 형성할 수 있다. 상기 제2 연결부(320)는 서로 이격되어 있는 두 개의 제2 센서전극(310)을 연결하기 위하여 브릿지 형태로 구성할 수 있다. 상기 제2 연결부(320)는 상기 절연층(500)에 의해 상기 제1 연결부(220)와 전기적으로 절연되며, 상기 복수개의 제2 센서전극(310)을 제2 방향으로 연결시킬 수 있다.Next, as shown in step S5, the second connection part 320 may be formed on the insulating layer 500. The second connector 320 may be formed in a bridge shape to connect two second sensor electrodes 310 spaced apart from each other. The second connector 320 may be electrically insulated from the first connector 220 by the insulating layer 500, and may connect the plurality of second sensor electrodes 310 in a second direction.
도 8에서는, 기판의 반대쪽인 전면에서 직접 광을 조사한 후 현상 및 식각하여 절연층을 형성하는 경우, 광 조사량에 따른 절연층의 경사각(θ1)을 보여준다.FIG. 8 shows the inclination angle θ1 of the insulating layer depending on the amount of light irradiation when the insulating layer is formed by directly irradiating light from the front surface opposite to the substrate and developing and etching the light.
이 경우, 전면에서 조사한 광이 직접 절연층 형성용 재료, 즉 절연물질에 도달하게 되며, 마스크로 가려진 부분과 가려지지 않은 부분에서 빛에 노출되는 차이가 커서 경화도 차이가 매우 크다. 그 결과 절연층의 상부에서 상대적으로 가파른 경사가 형성된다. 한편 식각은 상부에서부터 일어나는데, 상부의 경사각이 가파른 관계로 하부의 경사각도 비교적 가파르게 된다.In this case, the light irradiated from the front surface directly reaches the material for forming an insulating layer, that is, the insulating material, and the difference of exposure to light in the part covered by the mask and the part not covered by the mask is large, and thus the degree of curing is very large. As a result, a relatively steep slope is formed at the top of the insulating layer. On the other hand, the etching takes place from the top, the inclination angle of the top is steep, the inclination of the bottom is also relatively steep.
상기와 같은 전면조사(전면노광)의 경우, 광조사량이 적으면 경사각(θ1)이 매우 크며, 광 조사량을 크게 하여도 경사각을 소정의 값 이하로 줄이기 어렵다. 그 결과, 절연층(500)의 에지 부분에서 경사각이 커지며, 상기 절연층 상에 도전재료로 된 연결부를 형성할 셩우, 상기 에지 부분에서 도전재의 이탈 등이 발생하여 만족스러운 도전재층을 형성하기 어렵고, 그 결과 연결부의 도전성이 좋지 않게 되면 연결부 양 단자에서의 저항이 커지게 된다. 참고로 상기 도면에서 'Insulation angle'은 절연층의 각도로서 θ1 값을 나타낸다.In the case of the above front irradiation (front exposure), when the light irradiation amount is small, the inclination angle θ1 is very large, and even when the light irradiation amount is large, it is difficult to reduce the inclination angle to a predetermined value or less. As a result, the inclination angle is increased at the edge portion of the insulating layer 500, and when a connection portion made of a conductive material is formed on the insulating layer, separation of the conductive material occurs at the edge portion, making it difficult to form a satisfactory conductive material layer. As a result, when the conductivity of the connection becomes poor, the resistance at both terminals of the connection increases. For reference, 'Insulation angle' in the drawing represents an angle θ1 as an angle of the insulating layer.
도 9에서는, 기판쪽인 배면에서 광을 조사한 후 현상 및 식각하여 절연층을 형성하는 경우, 광 조사량에 따른 절연층의 경사각(θ1)을 보여준다.9 shows the inclination angle θ1 of the insulating layer depending on the amount of light irradiation when the insulating layer is formed by developing and etching after irradiating light from the rear surface of the substrate.
이 경우, 배면에서 조사한 빛은 기판 및 센서전극 등을 통과한 후 절연층 형성용 재료, 즉 절연물질에 도달하게 되는데, 절연물질의 하부에서 먼저 빛을 흡수하게 된다. 이와 같이, 절연물질의 하부에서부터 빛을 흡수하게 되면 절연물질의 상부에 도달하는 빛은 상대적으로 적어지게 된다. 그 결과 절연층의 상부에서는 마스크로 가려진 부분과 가려지지 않은 부분의 경화도 차이가 상대적으로 적어져서 상부에서는 비교적 완만한 경사가 형성된다. 한편 식각은 상부에서부터 일어나는데, 상부의 경사각이 비교적 완만한 관계로 하부의 경사각도 비교적 완만하게 된다.In this case, the light irradiated from the back reaches the insulating layer forming material, that is, the insulating material after passing through the substrate and the sensor electrode, etc., first absorbing the light from the lower portion of the insulating material. As such, when light is absorbed from the lower portion of the insulating material, light reaching the upper portion of the insulating material is relatively less. As a result, the difference in the degree of cure between the portion covered by the mask and the portion not covered by the mask is relatively small in the upper portion of the insulating layer, and a relatively gentle slope is formed in the upper portion. On the other hand, the etching takes place from the top, the inclination angle of the upper portion is relatively gentle, so the inclination angle of the lower portion is also relatively gentle.
상기와 같은 배면조사(배면노광)의 경우, 즉 기판 쪽에서 광을 조사하는 경우, 상기 광조사 후에 식각을 하더라도 절연층의 경사각(θ1)이 작으며, 광조사량이 증가하여도 경사각(θ1)이 크게 증가하지 않는다. 상기 도 9 에서 보는 바와 같은 배면조사의 경우, 식각에 의하여 완성된 절연층의 경사각 크기가 50도 이하가 될 수 있기 때문에 상기 절연층의 에지 부분에서 경사가 완만하다.In the case of the above back irradiation (back exposure), that is, when the light is irradiated from the substrate side, the inclination angle θ1 of the insulating layer is small even when etching after the light irradiation, and the inclination angle θ1 is increased even when the light irradiation amount is increased. It does not increase significantly. In the backside irradiation as shown in FIG. 9, since the inclination angle of the completed insulating layer may be 50 degrees or less, the inclination is gentle at the edge portion of the insulating layer.
상기와 같이 절연층의 에지 부분에서의 경사각이 완만한 경우, 상기 절연층 상에 도전재료로 된 연결부를 형성하더라도 상기 에지 부분에서 도전재의 이탈 등이 발생하지 않아 만족스러운 도전재층을 형성할 수 있다. 그 결과 연결부의 도전성이 양호해지며 양 단자에서의 저항이 불필요하게 커지는 위험이 적다. 상기와 같이 배면조사를 이용할 경우, 상기 절연층에서의 경사각의 크기가 50도 이하, 보다 구체적으로는 10도 내지 50도 범위가 되도록 하는 데 유리하다.When the angle of inclination at the edge portion of the insulating layer is gentle as described above, even if the connecting portion made of a conductive material is formed on the insulating layer, separation of the conductive material does not occur at the edge portion, thereby forming a satisfactory conductive material layer. . As a result, the conductivity of the connection becomes good and there is little risk that the resistance at both terminals becomes unnecessarily large. When the back irradiation is used as described above, the size of the inclination angle in the insulating layer is advantageously 50 degrees or less, more specifically in the range of 10 degrees to 50 degrees.
도 10은 전면에서 광 조사를 실시하여 형성된 절연층을 보여주는 사진이다. 도 10을 보면, 절연층의 모서리 경사각이 급한 것을 확인할 수 있다. 그 결과, 상기 절연층 상부에 형성되는 제2 연결부가 단락되거나 저항값이 급격하게 상승하는 문제가 발생할 수 있다.10 is a photograph showing an insulating layer formed by irradiating light from the front surface. Looking at Figure 10, it can be seen that the corner inclination angle of the insulating layer is urgent. As a result, a problem may occur in which the second connection part formed on the insulating layer is shorted or the resistance value increases rapidly.
이에 비해, 도 11은 본 발명의 일례에 따른 제조방법, 즉 배면에서 광 조사를 실시하여 형성된 절연층을 보여주는 사진으로서, 절연층이 완만한 모서리 경사각(θ1, θ2)을 갖는 것을 볼 수 있다. 그 결과, 전술한 바와 같이 상기 절연층 상부의 제2 연결부의 단락 및 저항값 상승을 방지할 수 있다.In contrast, FIG. 11 is a photograph showing a manufacturing method according to an example of the present invention, that is, an insulating layer formed by performing light irradiation on the rear surface, and it can be seen that the insulating layer has a gentle edge inclination angles θ1 and θ2. As a result, as described above, it is possible to prevent a short circuit and an increase in resistance value of the second connection portion above the insulating layer.
이상, 본 발명을 구체적인 실시예를 통하여 상세히 설명하였으나, 이는 본 발명을 구체적으로 설명하기 위한 것으로, 본 발명에 따른 터치패널은 이에 한정되지 않으며, 본 발명의 기술적 사상 내에서 당해 분야의 통상의 지식을 가진 자에 의해 그 변형이나 개량이 가능함은 명백하다고 할 것이다. 본 발명의 단순한 변형 내지 변경은 모두 본 발명의 영역에 속하는 것으로 본 발명의 구체적인 보호 범위는 첨부된 특허청구범위에 의하여 명확해질 것이다.As described above, the present invention has been described in detail through specific embodiments, which are intended to specifically describe the present invention, but the touch panel according to the present invention is not limited thereto, and the general knowledge in the art within the technical spirit of the present invention. It is obvious that modifications and improvements are possible by those who have them. All simple modifications and variations of the present invention fall within the scope of the present invention, and the specific scope of protection of the present invention will be apparent from the appended claims.
100: 기판 200: 제1 센서패턴100: substrate 200: first sensor pattern
210: 제1 센서전극 220: 제1 연결부210: first sensor electrode 220: first connection portion
300: 제2 센서패턴 310: 제2 센서전극300: second sensor pattern 310: second sensor electrode
320: 제2 연결부 410, 420: 리드선320: second connection portion 410, 420: lead wire
500: 절연층 600: 반사방지층500: insulation layer 600: antireflection layer

Claims (14)

  1. 기판;Board;
    상기 기판의 일면에서, 제1 방향을 따라 서로 나란하게 형성된 복수개의 제1 전극패턴; 및A plurality of first electrode patterns formed on one surface of the substrate in parallel with each other along a first direction; And
    상기 기판의 일면에서, 상기 제1 전극패턴과 이격되어, 상기 1 방향과 교차되는 제2 방향을 따라 서로 나란하게 형성된 복수개의 제2 전극패턴;을 포함하며,And a plurality of second electrode patterns spaced apart from the first electrode pattern on one surface of the substrate and formed in parallel with each other in a second direction crossing the first direction.
    상기 제1 전극패턴은 복수개의 제1 센서전극 및 인접하는 상기 제1 센서전극을 서로 연결하는 제1 연결부를 포함하며,The first electrode pattern includes a plurality of first sensor electrodes and a first connection part connecting the first sensor electrodes adjacent to each other.
    상기 제2 전극패턴은 복수개의 제2 센서전극 및 인접하는 상기 제2 센서전극을 서로 연결하는 제2 연결부를 포함하며,The second electrode pattern includes a plurality of second sensor electrodes and a second connection part connecting the adjacent second sensor electrodes to each other.
    상기 제1 전극패턴과 상기 제2 전극패턴은 상기 제1 연결부와 상기 제2 연결부에서 서로 교차되며,The first electrode pattern and the second electrode pattern cross each other at the first connection part and the second connection part,
    상기 제1 연결부와 상기 제2 연결부의 사이에는 경사각을 갖는 절연층이 형성되어 있는 것을 특징으로 하는 터치 패널.And an insulating layer having an inclination angle between the first connection portion and the second connection portion.
  2. 제 1 항에 있어서,The method of claim 1,
    상기 기판은 고분자 필름, 플라스틱 및 유리 중 어느 하나에 의하여 형성되는 것을 특징으로 하는 터치 패널.The substrate is a touch panel, characterized in that formed by any one of a polymer film, plastic and glass.
  3. 제 1 항에 있어서,The method of claim 1,
    상기 제1 센서전극 및 제2 센서전극은 투명 전도성 산화물(TCO:Transparent Conductive Oxide)을 포함하여 형성되는 것을 특징으로 하는 터치 패널.And the first sensor electrode and the second sensor electrode are formed of a transparent conductive oxide (TCO).
  4. 제 1 항에 있어서,The method of claim 1,
    상기 제1 연결부 및 제2 연결부는 투명 전도성 산화물(TCO:Transparent Conductive Oxide)을 포함하여 형성되는 것을 특징으로 하는 터치 패널.The first connection part and the second connection part may include a transparent conductive oxide (TCO).
  5. 제 1 항에 있어서,The method of claim 1,
    상기 절연층은 기판에 대한 경사각이 10도 내지 50도 범위를 갖는 것을 특징으로 하는 터치 패널.The insulating layer is a touch panel, characterized in that the inclination angle with respect to the substrate ranges from 10 degrees to 50 degrees.
  6. 제 1 항에 있어서,The method of claim 1,
    상기 제2 연결부 상에 반사방지층이 형성되어 있는 것을 특징으로 하는 터치 패널.The anti-reflection layer is formed on the second connection portion.
  7. 제 6 항에 있어서,The method of claim 6,
    상기 반사방지층은 적어도 하나 이상의 저굴절 재료층 및 고굴절 재료층을 포함하여 형성되는 것을 특징으로 하는 터치 패널.The anti-reflection layer is a touch panel, characterized in that it comprises at least one low refractive index material layer and a high refractive index material layer.
  8. 기판 상에 제1 센서전극, 제1 연결부 및 제2 센서전극을 패터닝하는 단계;Patterning a first sensor electrode, a first connector, and a second sensor electrode on a substrate;
    상기 제1 센서전극, 제1 연결부 및 제2 센서전극이 패터닝된 기판 상에 경사각을 갖도록 절연층 패턴을 형성하는 단계;Forming an insulation layer pattern on the substrate on which the first sensor electrode, the first connection part, and the second sensor electrode have an inclination angle;
    상기 절연층이 형성된 기판의 전면에 제2 연결부 형성용 물질을 전면 도포하는 단계; 및Applying a material for forming a second connection portion on the entire surface of the substrate on which the insulating layer is formed; And
    상기 제2 연결부 형성용 물질을 식각하여 제2 연결부를 형성하는 단계;를 포함하는 터치 패널 제조방법.And etching the material for forming the second connection portion to form a second connection portion.
  9. 제 8 항에 있어서,The method of claim 8,
    상기 경사각을 갖도록 절연층 패턴을 형성하는 단계는, 절연층 형성용 재료를 도포하는 단계; 및 광 조사하는 단계를 포함하며, 상기 광 조사는　기판 베면쪽에서 실시하는 것을 특징으로 하는 터치 패널 제조방법.The forming of the insulating layer pattern to have the inclination angle may include applying an insulating layer forming material; And irradiating light, wherein the light irradiation is performed at the bottom surface of the substrate.
  10. 제 9 항에 있어서,The method of claim 9,
    상기 절연층 형성용 재료는 미경화 고분자 재료인 것을 특징으로 하는 터치 패널 제조방법.The material for forming the insulating layer is a touch panel manufacturing method, characterized in that the uncured polymer material.
  11. 제 8 항에 있어서,The method of claim 8,
    상기 경사각을 갖도록 절연층 패턴을 형성하는 단계에서 상기 절연층이 기판에 대한 경사각이 10도 내지 50도 범위를 갖도록 형성하는 것을 특징으로 하는 터치 패널 제조방법.In the step of forming the insulating layer pattern to have the inclination angle, the insulating layer is a touch panel manufacturing method characterized in that the inclination angle with respect to the substrate is formed to have a range of 10 degrees to 50 degrees.
  12. 제 8 항에 있어서,The method of claim 8,
    상기 전면 도포된 제2 연결부 형성용 물질 상에 반사방지층 형성용 물질을 전면 도포하는 단계; 및 상기 제2 연결부 형성용 물질 및 반사방지층 형성용 물질을 식각하여 제2 연결부를 형성하는 단계를 더 포함하는 것을 특징으로 하는 터치 패널 제조방법.Applying an antireflective layer forming material on the entire surface of the second connecting portion forming material; And etching the material for forming the second connection portion and the material for forming the antireflection layer to form a second connection portion.
  13. 제 12 항에 있어서,The method of claim 12,
    상기 반사방지층 형성용 물질을 전면 도포하는 단계는 저굴절층 형성용 물질을 전면 도포하는 단계; 및 고굴절층 형성용 물질을 전면 도포하는 단계;를 포함하는 것을 특징으로 하는 터치 패널 제조방법.Full coating of the anti-reflective layer forming material may include applying a full coating of the low refractive layer forming material; And applying the entire surface of the material for forming the high refractive index layer.
  14. 제 13 항에 있어서, 상기 저굴절층 형성용 물질을 전면 도포하는 단계; 및 고굴절층 형성용 물질을 전면 도포하는 단계는 각각 2회 내지 5회 실시하는 것을 특징으로 하는 터치 패널 제조방법.The method of claim 13, further comprising: applying the entire surface of the low refractive index layer forming material; And applying the entire surface of the high refractive index layer forming material to each of two to five times.
PCT/KR2013/006948 2012-08-03 2013-08-01 Touch panel having improved insulation layer and method for manufacturing same WO2014021657A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230116411A1 (en) * 2020-11-26 2023-04-13 Hefei Xinsheng Optoelectronics Technology Co., Ltd. Touch panel, manufacturing method thereof, and display device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080110477A (en) * 2007-06-14 2008-12-18 엡슨 이미징 디바이스 가부시키가이샤 Capacitive input device
US20100007616A1 (en) * 2008-07-11 2010-01-14 Brent Jang Organic light emitting display device
KR20100008495U (en) * 2009-02-18 2010-08-26 영 패스트 옵토일렉트로닉스 씨오., 엘티디. Capacitive touch sensing assembly
KR20120061936A (en) * 2009-12-28 2012-06-13 쿄세라 코포레이션 Input device and display device provided with same
KR20120084206A (en) * 2011-01-19 2012-07-27 엘지이노텍 주식회사 Touch panel and method for manufacturing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080110477A (en) * 2007-06-14 2008-12-18 엡슨 이미징 디바이스 가부시키가이샤 Capacitive input device
US20100007616A1 (en) * 2008-07-11 2010-01-14 Brent Jang Organic light emitting display device
KR20100008495U (en) * 2009-02-18 2010-08-26 영 패스트 옵토일렉트로닉스 씨오., 엘티디. Capacitive touch sensing assembly
KR20120061936A (en) * 2009-12-28 2012-06-13 쿄세라 코포레이션 Input device and display device provided with same
KR20120084206A (en) * 2011-01-19 2012-07-27 엘지이노텍 주식회사 Touch panel and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230116411A1 (en) * 2020-11-26 2023-04-13 Hefei Xinsheng Optoelectronics Technology Co., Ltd. Touch panel, manufacturing method thereof, and display device

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