WO2013168693A1 - セピアプテリン及びテトラヒドロラクトイルプテリンの製造法 - Google Patents
セピアプテリン及びテトラヒドロラクトイルプテリンの製造法 Download PDFInfo
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- WO2013168693A1 WO2013168693A1 PCT/JP2013/062817 JP2013062817W WO2013168693A1 WO 2013168693 A1 WO2013168693 A1 WO 2013168693A1 JP 2013062817 W JP2013062817 W JP 2013062817W WO 2013168693 A1 WO2013168693 A1 WO 2013168693A1
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- 0 CC(C(C(CNc1nc(N(*)*)n2)Nc1c2O*)=O)O* Chemical compound CC(C(C(CNc1nc(N(*)*)n2)Nc1c2O*)=O)O* 0.000 description 7
- VPVOXUSPXFPWBN-UHFFFAOYSA-N CC(C(C(CN1)=NC2=C1N=C(N)NC2=O)=O)O Chemical compound CC(C(C(CN1)=NC2=C1N=C(N)NC2=O)=O)O VPVOXUSPXFPWBN-UHFFFAOYSA-N 0.000 description 1
- NZCBEEFQSOUVCK-UHFFFAOYSA-N CC(C(c(cn1)nc2c1N=C(N)NC2=O)=O)O Chemical compound CC(C(c(cn1)nc2c1N=C(N)NC2=O)=O)O NZCBEEFQSOUVCK-UHFFFAOYSA-N 0.000 description 1
- HKCYZTKHPLJZDR-IUYQGCFVSA-N C[C@@H](C([C@@H](CN1)NC2=C1N=C(N)NC2=O)=O)O Chemical compound C[C@@H](C([C@@H](CN1)NC2=C1N=C(N)NC2=O)=O)O HKCYZTKHPLJZDR-IUYQGCFVSA-N 0.000 description 1
- HKCYZTKHPLJZDR-IMJSIDKUSA-N C[C@@H](C([C@H](CN1)NC2=C1N=C(N)NC2=O)=O)O Chemical compound C[C@@H](C([C@H](CN1)NC2=C1N=C(N)NC2=O)=O)O HKCYZTKHPLJZDR-IMJSIDKUSA-N 0.000 description 1
- NZCBEEFQSOUVCK-VKHMYHEASA-N C[C@@H](C(c(cn1)nc2c1N=C(N)NC2=O)=O)O Chemical compound C[C@@H](C(c(cn1)nc2c1N=C(N)NC2=O)=O)O NZCBEEFQSOUVCK-VKHMYHEASA-N 0.000 description 1
- QGAXDHMNFNTZQP-HNNXBMFYSA-N C[C@@H](C(c(nc12)cnc1nc(N(C(OC(C)(C)C)=O)C(OC(C)(C)C)=O)nc2OC(OC(C)(C)C)=O)=O)OC(OC(C)(C)C)=O Chemical compound C[C@@H](C(c(nc12)cnc1nc(N(C(OC(C)(C)C)=O)C(OC(C)(C)C)=O)nc2OC(OC(C)(C)C)=O)=O)OC(OC(C)(C)C)=O QGAXDHMNFNTZQP-HNNXBMFYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D475/00—Heterocyclic compounds containing pteridine ring systems
- C07D475/02—Heterocyclic compounds containing pteridine ring systems with an oxygen atom directly attached in position 4
- C07D475/04—Heterocyclic compounds containing pteridine ring systems with an oxygen atom directly attached in position 4 with a nitrogen atom directly attached in position 2
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P25/00—Drugs for disorders of the nervous system
Definitions
- the present invention relates to a method for producing sepiapterin, lactoylpterin and tetrahydrolactoylpterin useful as pharmaceuticals.
- Tetrahydrobiopterin controls the production of nitric oxide by vascular endothelial nitric oxide synthase (NOS), so various diseases involving nitric oxide produced from NOS, For example, cerebrovascular disorders such as Parkinson's disease, cerebral ischemia, postarachnoid hemorrhage, ischemia-reperfusion injury, myocarditis, coronary spasm, cardiac hypertrophy, arteriosclerosis, hypertension, thrombus, infection, endotoxin shock, cirrhosis It is considered effective for the treatment and improvement of hypertrophic pyloric stenosis, gastric mucosal disorder, pulmonary hypertension, renal disorder, impotence, hypoglycemic action and the like.
- NOS vascular endothelial nitric oxide synthase
- BH4 plays an important role in the biosynthetic pathway of neurotransmitters in the brain such as serotonin, dopamine, noradrenaline, and adrenaline. , Depression, bulimia, autism, disturbance of consciousness, cognitive impairment, etc.) and central movement disorders (muscle tone, stiffness, tremor, etc.). However, peripheral administration of BH4 does not improve these symptoms because BH4 is blocked at the blood-brain barrier and cannot reach brain neurons.
- sepiapterin is easier to cross the blood brain barrier than BH4 and to enter tissues. It is reported that if sepiapterin is administered from the periphery, it passes through the blood-brain barrier, changes to BH4 in the brain and increases BH4 in the brain, and administration of sepiapterin is useful as a therapeutic agent for preventing brain dysfunction (Patent Document 1).
- BH4 has various physiological activities, but it is very water-soluble, and most of the administered BH4 is immediately discharged into urine. Therefore, it is considered that sepiapterin, which is easily taken up into cells, has a higher bioavailability than BH4. Sepiapterin, which is a natural product, and lactoylpterin and tetrahydrolactoylpterin, which are analogs thereof, are highly safe and can be expected to have various activities.
- Sepiapterin is synthesized by a method of reacting 7,8-dihydropterin and ⁇ -keto- ⁇ -hydroxybutyric acid in the presence of zinc chloride (Non-patent Document 1), and a method of oxidizing BH4 in air for 6 days. (Non-Patent Document 2) is known. As a method for synthesizing lactoylpterin, it is known that it can be obtained by oxidizing sepiapterin (Non-patent Documents 3 and 4).
- Non-Patent Document 1 produces only a trace amount of sepiapterin and cannot be a stable supply method. Further, in the method of Non-Patent Document 2, very expensive BH4 is used as a raw material, and this cannot be a method that can be industrially stably supplied. Further, the method of Non-Patent Document 2 has a problem that the reaction time is long and many by-products such as biopterin in which BH4 is oxidized and deoxysepiapterin from which the ⁇ -position hydroxyl group of the side chain is eliminated are also generated. .
- an object of the present invention is to provide a novel production method capable of stably supplying sepiapterin, lactoylpterin and tetrahydrolactoylpterin, which have recently been found to be useful as pharmaceuticals.
- the present inventor has studied a method for synthesizing sepiapterin, lactoylpterin, and tetrahydrolactoylpterin using available raw materials.
- the compound of the following formula (1) or the compound of formula (7) is used as a starting material.
- sepiapterin, lactoylpterin and tetrahydrolactoylpterin can be obtained in good yield, and these compounds can be stably supplied as a medicine for the first time, thereby completing the present invention.
- the tetrahydrolactoylpterin represented by the formula (1) or a salt thereof is obtained, and then the compound (4) is oxidized.
- R a and R b represent the same or different protecting groups, and R c and R d represent a hydrogen atom or a protecting group.
- the manufacturing method of sepiapterin represented by these, or its salt.
- the oxidation reaction is oxidation with peracid or air oxidation under neutral or basic conditions, and the deprotection reaction is hydrolysis or solvolysis in the presence of a base or acid having a pKa of 12 or less, or fluorine.
- the manufacturing method of sepiapterin represented by these, or its salt.
- the reduction reaction is reduction with sulfite, hyposulfite or thiosulfate, or catalytic reduction under basic conditions, and the deprotection reaction is performed by hydrolysis or addition in the presence of a base or acid having a pKa of 12 or less.
- the production method according to [15] which is solvent decomposition or deprotection with a fluorine anion.
- the manufacturing method of sepiapterin represented by these, or its salt.
- the reduction reaction is reduction with sulfite, hyposulfite or thiosulfate, or catalytic reduction under basic conditions, and the oxidation reaction is oxidation with peracid or air under neutral or basic conditions
- the production method according to [17], which is oxidation and the deprotection reaction is hydrolysis or solvolysis in the presence of a base or acid having a pKa of 12 or less, or deprotection with a fluorine anion.
- Formula (1) Formula (1)
- the manufacturing method of sepiapterin represented by these, or its salt.
- the reduction reaction is reduction with sulfite, hyposulfite or thiosulfate, or catalytic reduction under basic conditions, and the deprotection reaction is hydrolysis or hydrolysis in the presence of a base or acid having a pKa of 12 or less.
- the production method according to [19] which is solvolysis or deprotection with a fluorine anion.
- a tetrahydrolactoylpterin represented by the formula (3) is obtained, and the compound (4) is oxidized.
- the manufacturing method of sepiapterin represented by these, or its salt.
- the deprotection reaction is hydrolysis or solvolysis in the presence of a base or acid having a pKa of 12 or less, or deprotection with a fluorine anion, and the oxidation reaction is oxidation with a peracid, or neutral or basic conditions.
- the production method according to [21] which is air oxidation below.
- a tetrahydrolactoylpterin represented by the formula (3) is obtained, and the compound (4) is oxidized.
- the manufacturing method of sepiapterin represented by these, or its salt.
- the reduction reaction is reduction with sulfite, hyposulfite or thiosulfate, or catalytic reduction under basic conditions, and the deprotection reaction is hydrolysis or hydrolysis in the presence of a base or acid having a pKa of 12 or less.
- the production method according to [23] which is solvolysis or deprotection with a fluorine anion, and the oxidation reaction is oxidation with a peracid or air oxidation under neutral or basic conditions.
- Formula (1) Formula (1)
- the manufacturing method of sepiapterin represented by these, or its salt.
- the deprotection reaction is hydrolysis or solvolysis in the presence of a pKa12 or lower base or acid, or deprotection with a fluorine anion, and the reduction reaction is reduction with sulfite, hyposulfite or thiosulfate. Or the process according to [25], which is catalytic reduction under basic conditions.
- the manufacturing method of the tetrahydrolactoyl pterin represented by these, or its salt [32]
- the reduction reaction is reduction with sulfite, hyposulfite or thiosulfate, or catalytic reduction under basic conditions, and the deprotection reaction is hydrolysis or hydrolysis in the presence of a base or acid having a pKa of 12 or less.
- the production method according to [31] which is solvolysis or deprotection with a fluorine anion.
- sepiapterin, lactoylpterin, and tetrahydrolactoylpterin useful as pharmaceuticals can be produced from readily available raw materials with good yield.
- the method of the present invention can be represented by the following reaction formula.
- the compound of formula (5) is a combination of the compound of formula (5-1) and the compound of formula (5-2) in the above reaction formula. Therefore, R a , R b , R C and R d are the same as R 1 , R 2 , R 3 , R 4 , R 5 and R 6 in formula (5-1) and formula (5-2). Is.
- the compound of formula (7) can also be obtained from the compound of formula (1).
- the compound of formula (7) can also be obtained directly from the compound of formula (2).
- the compounds in the above reaction formula include S-form, R-form and SR-form due to the configuration of hydroxyl group.
- the isomers of tetrahydrolactoylpterin of the formula (4) include the following.
- the protecting group represented by R 1 to R 6 is preferably a protecting group that is eliminated by hydrolysis, solvolysis, deprotection with a fluorine anion, or the like.
- Examples of the protecting group include an alkoxyalkyl group, an alkyl group, an acyl group, a silyl group, an alkoxycarbonyl group, and a trityl group.
- alkoxyalkyl group examples include a C 1-6 alkoxy C 1-6 alkyl group, and a methoxymethyl group, an ethoxymethyl group, a methoxyethoxymethyl group, a 2-tetrahydropyranyl group and the like are preferable.
- alkyl group examples include C 3 -C 8 linear, branched or cyclic alkyl groups, and a cyclopentyl group, a cyclohexyl group, an isopropyl group, a tert-butyl group and the like are preferable.
- acyl group examples include a formyl group, a C 1 -C 12 linear, branched or cyclic alkylcarbonyl group, a C 6 -C 14 arylcarbonyl group, and the like, and an acetyl group, a benzoyl group, and the like are preferable.
- silyl group examples include tri-C 1 -C 6 alkylsilyl group, alkyldiphenylsilyl group, triphenylsilyl group, and the like.
- Trimethylsilyl group triethylsilyl group, triisopropylsilyl group, tert-butyldimethylsilyl group, diphenylmethylsilyl group Group, tert-butyldiphenylsilyl group, triphenylmethyl group and the like are preferable.
- the alkoxycarbonyl group include a C 1 -C 14 alkoxycarbonyl group, and a methoxycarbonyl group, an ethoxycarbonyl group, a tert-butoxycarbonyl group, and a benzyloxycarbonyl group are preferable.
- the protecting groups for R 1 to R 6 may be the same or different.
- examples of R 1 and R 4 include an alkoxyalkyl group, an alkyl group, an acyl group, a silyl group, an alkoxycarbonyl group, and a trityl group.
- an alkoxyalkyl group, a branched or cyclic alkyl group, an acyl group, a silyl group, an alkoxycarbonyl group, or a trityl group which is a protecting group capable of leaving under a weak base to an acidic condition, and a protecting group capable of leaving under an acidic condition
- an alkoxyalkyl group, a branched or cyclic alkyl group, a silyl group, an alkoxycarbonyl group, and a trityl group More preferred are an alkoxyalkyl group, a branched or cyclic alkyl group, a silyl group, an alkoxycarbonyl group, and a trityl group.
- R 2 and R 3 include an alkoxyalkyl group, an alkyl group, an acyl group, a silyl group, an alkoxycarbonyl group, and a trityl group. From the viewpoint of suppressing by-products, neutral or weak base to acidic conditions An alkoxyalkyl group, a branched or cyclic alkyl group, an acyl group, a silyl group, an alkoxycarbonyl group, or a trityl group, which is a protective group that is eliminated under an acidic group, is preferred, and an alkoxyalkyl group that is a protective group that is eliminated under acidic conditions, a branched group Or a cyclic alkyl group, a silyl group, an alkoxycarbonyl group, and a trityl group are more preferable.
- R 5 and R 6 include an alkoxyalkyl group, an alkyl group, an acyl group, an alkoxycarbonyl group, and a trityl group. From the viewpoint of suppression of by-products, neutralization or removal from a weak base to an acidic condition is possible.
- An alkoxyalkyl group, a branched or cyclic alkyl group, an acyl group, an alkoxycarbonyl group, or a trityl group that is a protecting group to be released is preferable, and an alkoxyalkyl group, an alkoxycarbonyl group, or a trityl group that is a protecting group to be released under acidic conditions More preferred.
- the compound of the formula (1) as a raw material is a method described in Japanese Patent Application Laid-Open No. 2011-11976 and Heterocycles 71 (4), 911 (2007) previously filed by the present inventor as shown in the following reaction formula, for example. Can be manufactured by.
- the epoxy aldehyde compound (A) and the compound of the formula (B) are combined in a polar solvent to obtain a compound of the formula (C), which is iodine and / or Oxidized with hydrogen peroxide to give a compound of formula (D), which is then oxidized by reacting tetrapropylammonium perruthenate and 4-methylmorpholine N-oxide to give a compound of formula (1) be able to.
- the optically active epoxy aldehyde compound (A) can be produced, for example, by the method described in Tetrahedron Letters 7847 (2004).
- the compound (A) having a different configuration at the 4-position can be produced by using an R-lactic acid derivative as a raw material, sepiapterin, lactoylpterin and tetrahydrolacto having different configurations are used in the present invention.
- Ilpterin can be made separately.
- Step (a) and Step (f) This step is a step of deprotecting the compound of formula (1) or (5-2).
- Deprotection can be appropriately selected depending on the protecting group, such as hydrolysis, solvolysis, or deprotection with a fluorine anion.
- the hydrolysis and solvolysis are preferably carried out under weakly basic, neutral or acidic conditions, and more preferably carried out under acidic conditions. More specifically, the hydrolysis and solvolysis are preferably carried out in the presence of a base or acid having a pKa of 12 or less, and more preferably carried out in the presence of an acid having a pKa of 7 or less.
- the hydrolysis or solvolysis reaction is carried out at a temperature of 0 ° C. to reflux temperature in a solvent or mixed solution of water, lower alcohol, dimethoxyethane, dioxane, THF, DMSO, nitromethane, acetone, ethyl acetate, toluene, acetic acid and the like according to a conventional method. It can be carried out and is preferably carried out for 0.5 hour to 48 hours.
- the lower alcohol C 1 -C 4 alcohols such as methanol, ethanol, isopropanol and the like are used.
- the amount of the solvent such as water or lower alcohol used may be an amount that can dissolve a part of the raw material compound, and is 0.1 to 1000 with respect to 1 part by mass of the compound of the formula (1) or (5-2). Part by mass, more preferably 0.1 to 50 parts by mass is preferred.
- Examples of the deprotection reaction with a fluorine anion include a method using a hydrofluoric acid such as hydrofluoric acid or a hydrofluoric acid pyridine complex, or a fluorine ammonium salt such as tetrabutylammonium fluoride according to a conventional method. It is done.
- the reaction can be performed at 0 ° C. to reflux temperature in a solvent or mixed solution of water, lower alcohol, dimethoxyethane, dioxane, THF, DMSO, nitromethane, acetone, ethyl acetate, toluene, acetic acid, etc., and for 0.5 to 48 hours. It is preferable.
- additives for hydrolysis and solvolysis include sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, potassium acetate, t-butoxy potassium, potassium phosphate, and aqueous ammonia.
- Inorganic base imidazole, trimethylamine, triethylamine, diethylamine, propylamine, tetramethylammonium hydride, aniline, N, N-dimethylaniline, dimethylaminopyridine, diazabicycloundecene and other organic bases, hydrochloric acid, sulfuric acid, nitric acid, nitrous acid Inorganic acids such as chloric acid, perchloric acid, phosphoric acid and hydrobromic acid, and organic acids such as acetic acid, oxalic acid, formic acid, trifluoroacetic acid, methanesulfonic acid and p-toluenesulfonic acid.
- potassium carbonate sodium carbonate
- a base or acid having a pKa of 12 or less such as sodium hydrogen carbonate, potassium hydrogen carbonate, potassium acetate, potassium phosphate, ammonia water, trimethylamine, triethylamine, diethylamine, propylamine, N, N-dimethylaniline, is added,
- the addition of acid is more preferred.
- These acids and bases may be used alone or in combination of two or more. Of these, inorganic acids are preferable, and hydrochloric acid is particularly preferable.
- the additive is preferably added in an amount of 0.1 to 100 parts by weight, preferably 0.1 to 50 parts by weight, based on 1 part by weight of the compound of formula (1) or (5-2). Is more preferable.
- step (a) and the step (f) when R 1 and R 2 which are protecting groups are different, deprotection suitable for each protecting group can be performed.
- the deprotection can be performed stepwise or simultaneously.
- Step (b) and Step (e) This step is a step of reducing the compound of the formula (1) or (2) to obtain the compound of the formula (5-2) or (3).
- This reaction is a reaction that selectively reduces only the double bonds at the 7- and 8-positions of the pterin skeleton.
- This reduction reaction is performed by reduction with a reducing agent or catalytic reduction (hydrogenation reaction in the presence of a catalyst).
- a reducing agent include a reducing agent selected from sulfites, hyposulfites, thiosulfates, hydride reducing agents, and reducing metals.
- the sulfite include sodium sulfite (Na 2 SO 3 ) and potassium sulfite (K 2 SO 3 ).
- the hyposulfite include sodium hyposulfite (Na 2 S 2 O 4 ) and potassium hyposulfite (K 2 S 2 O 4 ).
- Examples of the thiosulfate include sodium thiosulfate (Na 2 S 2 O 3 ) and potassium thiosulfate (K 2 S 2 O 3 ).
- Examples of the hydride reducing agent include NaBH 4 , NaBH 3 CN, NaB (OAc) 1-3 Hx, NaB (OMe) 1-3 Hx, LiBH 4 , LiBH (Et) 3 , L-Selectride, K-Selectride, LiAlH 4. Etc. (x represents a number of 1 to 3).
- Examples of the reducing metal include Zn, Fe, Ni, Hg, Al, and Mg. Of these reducing agents, sulfites, hyposulfites, and thiosulfates are more preferable.
- the reduction reaction using a reducing agent is carried out by using the formula (1) or (2) in a solvent such as water, methanol, ethanol, dimethoxyethane, dioxane, dimethylformamide, dimethylacetamide, THF, DMSO, nitromethane, acetone, ethyl acetate, and acetic acid.
- a solvent such as water, methanol, ethanol, dimethoxyethane, dioxane, dimethylformamide, dimethylacetamide, THF, DMSO, nitromethane, acetone, ethyl acetate, and acetic acid.
- Examples of the catalyst used for catalytic reduction (hydrogenation reaction in the presence of a catalyst) include Pd, Ru, Rh, Pt, Ni, Cu and the like, and Pd and Pt are more preferable. These metals may be supported on a carrier such as carbon. Further, a metal poisoned with PdO, Pd (OH) 2 , a nitrogen compound such as ethylenediamine, a sulfur compound such as Ph 2 S, or the like is also used.
- Catalytic reduction includes water, alcohols such as methanol and ethanol, dimethoxyethane, dioxane, dimethylformamide, dimethylacetamide, THF, DMSO, nitromethane, acetone, ethyl acetate, toluene and acetic acid.
- alcohols, THF, ethyl acetate and toluene are preferable
- water, alcohols and dimethylformamide are preferable.
- the catalyst may be used in an amount of 0.01 to 5 parts by mass, preferably 0.1 to 2 parts by mass with respect to 1 part by mass of the compound.
- the hydrogen pressure is from normal pressure to 10 MPa, preferably from normal pressure to 0.5 MPa, and the reaction temperature is from 0 to 80 ° C., preferably from 20 to 50 ° C.
- the reaction time may be 1 to 72 hours, preferably 1 to 24 hours.
- a base from the viewpoint of the selectivity of the reaction and the yield of the target product.
- the base include sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, potassium acetate, t-butoxy potassium, potassium phosphate, aqueous ammonia and the like, or imidazole, trimethylamine,
- organic bases such as triethylamine, diethylamine, propylamine, tetramethylammonium hydride, aniline, N, N-dimethylaniline, dimethylaminopyridine, diazabicycloundecene.
- potassium carbonate PKa 8-12 inorganic bases such as sodium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, potassium acetate, potassium phosphate, aqueous ammonia, or trimethylamine, triethylamine, diethylamine, propylamine, N
- an organic base having a pKa of 8-12 such as N-dimethylaniline or aqueous ammonia
- an organic base having a pKa of 8-12 such as aqueous ammonia or trimethylamine, triethylamine, diethylamine, propylamine, N, N-dimethylaniline, etc. More preferred.
- These bases may be used alone or in combination of two or more.
- the amount of these bases used is preferably from 0.1 to 150 mol, more preferably from 1 to 50 mol, based on 1 mol of the compound of the formula (1) or (2).
- Step (c) This step is a step for producing tetrahydrolactoylpterin (4) or a salt thereof by reducing lactoylpterin of formula (2) without protection.
- This reduction reaction is preferably a reduction with a BH 3 -based reducing agent or a catalytic reduction under basic conditions from the viewpoint of selectively obtaining tetrahydrolactoylpterin (4). If reduction using a BH 3 -based reducing agent or catalytic reduction under basic conditions is performed, the reduction of the pteridine ring has priority, and the reduction reaction of the carbonyl group of the lactoyl group can be suppressed. Further, elimination of the hydroxyl group at the ⁇ -position of the lactoyl group does not occur.
- BH 3 -based reducing agents include B 2 H 6 , THF-BH 3 , NH 3 -BH 3 , Et 3 -NBH 3 , DEA-BH 3 , DIEA-BH 3 , SMe 2 -BH 3 , PPh 3 -BH 3, Py-BH 3, Pic -BH 3, but Morpholine-BH 3 and the like, Py-BH 3, Pic- BH 3, Et 3 N-BH 3 amine compounds such -BH 3 is particularly preferred.
- the reduction reaction using the BH 3 -based reducing agent is preferably performed under acidic conditions.
- Acids include hydrochloric acid, sulfuric acid, nitric acid, nitrous acid, chloric acid, perchloric acid, phosphoric acid, hydrobromic acid and other inorganic acids, acetic acid, oxalic acid, formic acid, trifluoroacetic acid, methanesulfonic acid, p-toluenesulfone
- An organic acid such as an acid may be mentioned, but it is more preferably carried out in the presence of an acid having a pKa of 7 or less such as hydrochloric acid or p-toluenesulfonic acid, and more preferably in the presence of hydrochloric acid from the viewpoint of availability.
- the reaction can be carried out in a solvent such as water, an alcohol such as methanol or ethanol, or a solvent such as tetrahydrofuran, and more preferably in water, an alcohol such as methanol or ethanol, or a mixed solvent thereof.
- the reaction may be performed at ⁇ 20 to 80 ° C., more preferably at ⁇ 20 to 10 ° C. for 0.5 to 24 hours.
- the catalytic reduction under basic conditions is preferably performed under the same conditions as the catalytic reduction in the step (b) and the step (e). That is, the contact, reaction solvent, reaction temperature, and reaction time used are the same as those in the steps (b) and (e). Further, the basic condition is the same as in step (b) and step (e).
- This step is a step of obtaining sepiapterin (3) by oxidizing the compound of formula (4).
- the oxidation reaction is performed by oxidation with an oxidizing agent or oxygen oxidation.
- Oxygen oxidation includes oxygen oxidation by air, oxygen, ozone, etc., and may be performed by adding a catalyst such as Pd, Ru, Rh, Pt, Ni, Cu.
- oxidation using a peracid or oxygen oxidation using air is preferable, and oxidation using a peracid or oxygen oxidation using air under neutral or basic conditions is more preferable.
- Oxygen oxidation using air is preferably performed under neutral or basic conditions.
- water alcohol solvent such as methanol, ethanol, etc., dimethoxyethane, dioxane, dimethylformamide, dimethylacetamide, THF, DMSO, nitromethane, acetone, ethyl acetate, preferably water, alcohol, etc.
- inorganic bases such as sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, potassium acetate, t-butoxy potassium, potassium phosphate, aqueous ammonia, etc.
- an organic base such as imidazole, trimethylamine, triethylamine, diethylamine, propylamine, tetramethylammonium hydride, aniline, N, N-dimethylaniline, dimethylaminopyridine, diazabicycloundecene may be added.
- Examples of the oxidation using peracid include peracid such as hydrogen peroxide, peracetic acid and perbenzoic acid, but hydrogen peroxide is more preferable.
- the amount of peracid used is preferably 0.5 to 3 moles, more preferably 0.9 to 1.1 moles per mole of the compound of the formula (4).
- the reaction is carried out in a solvent such as water, an alcohol solvent such as methanol or ethanol, a solvent such as dimethoxyethane, dioxane, dimethylformamide, dimethylacetamide, THF, DMSO, nitromethane, acetone, ethyl acetate or acetic acid, preferably in a solvent such as water or alcohol.
- the reaction temperature is ⁇ 15 ° C. to 60 ° C., preferably ⁇ 15 ° C. to 10 ° C., and the reaction time is 1 to 24 hours.
- Step (g) This step is a step of obtaining a compound of the formula (6) by reacting the compound of the formula (2) with R 3 X (X represents a leaving group, and R 3 is the same as described above).
- R 3 X for introducing a protecting group for example, the R 3 halide or acid anhydride of the protecting group can be used.
- the leaving group for R 3 X include a halogen atom and an acid anhydride residue.
- the reaction of the compound of formula (2) with R 3 X is carried out under neutral conditions or sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium bicarbonate, potassium bicarbonate, potassium acetate, t-butoxypotassium , Inorganic bases such as potassium phosphate and aqueous ammonia, and organic bases such as imidazole, trimethylamine, triethylamine, diethylamine, propylamine, tetramethylammonium hydride, aniline, N, N-dimethylaniline, dimethylaminopyridine, diazabicycloundecene From the viewpoint of by-product suppression, or under neutral conditions, for example, potassium carbonate, sodium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, potassium acetate, potassium phosphate, aqueous ammonia, trimethylamine, Triethylamine, di Ethylamine, propylamine, N, and more preferably carried out in the presence of a base pKa of 8
- the amount of the base used is preferably 0.01 to 10 mol, more preferably 0.05 to 3 mol, relative to 1 mol of the compound of the formula (2).
- the amount of R 3 X used is preferably 1 to 10 moles, more preferably 1 to 5 moles per mole of the compound of the formula (2).
- the reaction may be performed in a polar solvent such as dimethylformamide, dimethylacetamide, ethyl acetate, acetone, tetrahydrofuran, acetonitrile, N-methylpyrrolidone, and HMPA at 0 ° C. to reflux temperature for 30 minutes to 5 hours.
- a polar solvent such as dimethylformamide, dimethylacetamide, ethyl acetate, acetone, tetrahydrofuran, acetonitrile, N-methylpyrrolidone, and HMPA
- Step (h) In this step, the compound of formula (6) is reacted with R 4 X, R 5 X, R 6 X (R 4 and X are the same as above) to obtain the compound of formula (7).
- R 4 X, R 5 X, and R 6 X for introducing the protecting group for example, halides and acid anhydrides of the protecting groups R 4 , R 5 , and R 6 can be used.
- the reaction of the compound of formula (6) with R 4 X, R 5 X, R 6 X can be carried out under neutral conditions or sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium bicarbonate, potassium bicarbonate , Inorganic bases such as potassium acetate, t-butoxypotassium, potassium phosphate, aqueous ammonia, imidazole, trimethylamine, triethylamine, diethylamine, propylamine, tetramethylammonium hydride, aniline, N, N-dimethylaniline, dimethylaminopyridine, dia It is preferably carried out in the presence of an organic base such as zabicycloundecene.
- neutral conditions or, for example, potassium carbonate, sodium carbonate, sodium bicarbonate, potassium bicarbonate, potassium acetate, phosphorus Potassium acid, aqueous ammonia, trimethylamine, tri Ethylamine, diethylamine, propylamine, N, and more preferably carried out in the presence of a base pKa of 8 ⁇ 12, such as N- dimethylaniline.
- bases may be used alone or in combination of two or more.
- the amount of the base used is preferably 0.01 to 10 mol, more preferably 0.05 to 5 mol, relative to 1 mol of the compound of the formula (6).
- the amount of R 4 X, R 5 X and R 6 X to be used is preferably 1 to 10 mol, more preferably 2 to 5 mol, per 1 mol of the compound of the formula (6).
- the reaction may be performed in a polar solvent such as dimethylformamide, dimethylacetamide, ethyl acetate, acetone, tetrahydrofuran, acetonitrile, N-methylpyrrolidone, and HMPA at 0 ° C. to reflux temperature for 30 minutes to 5 hours.
- a polar solvent such as dimethylformamide, dimethylacetamide, ethyl acetate, acetone, tetrahydrofuran, acetonitrile, N-methylpyrrolidone, and HMPA
- Step (g) may be a one-step reaction when R 4 X, R 5 X and R 6 X are the same, but 2 when R 4 X, R 5 X and R 6 X are different from each other.
- a step or a three-step reaction may be used.
- step (g) and step (h) The compound of formula (7) can also be produced by simultaneously protecting all of the hydroxyl group, ketone group and amino group of the compound of formula (2) with the same protecting group.
- the compound of formula (7) can also be produced by reacting the compound of formula (1) with R 5 X and R 6 X. These protective group introduction reactions can be carried out under the same conditions as in step (g) and step (h).
- Step (j) This step is a step of reducing the compound of formula (7) to obtain the compound of formula (8).
- This reduction reaction can be performed in the same manner as in step (b) and step (e).
- the reduction reaction is preferably catalytic reduction (hydrogenation reaction in the presence of a catalyst) in the same manner as in steps (b) and (e), and more preferably catalytic reduction under basic conditions by adding a base.
- R 4 , R 5 and R 6 are preferably protected from the viewpoints of yield and by-product suppression.
- Examples of the catalyst used include Pd, Ru, Rh, Pt, Ni, Cu, and the like, and Pd and Pt are more preferable. These metals may be supported on a carrier such as carbon. Further, a metal poisoned with PdO, Pd (OH) 2 , a nitrogen compound such as ethylenediamine, a sulfur compound such as Ph 2 S, or the like is also used.
- Catalytic reduction is a solvent such as water, alcohols such as methanol and ethanol, dimethoxyethane, dioxane, dimethylformamide, dimethylacetamide, THF, DMSO, nitromethane, acetone, ethyl acetate, and tolueneacetic acid. Alcohols, THF, ethyl acetate, and toluene are preferable, and ethyl acetate is more preferable.
- the catalyst may be used in an amount of 0.01 to 5 parts by mass, preferably 0.1 to 2 parts by mass with respect to 1 part by mass of the compound.
- the hydrogen pressure is normal pressure to 10 MPa, preferably normal pressure to 0.5 MPa, more preferably normal pressure, and the reaction temperature is 0 to 80 ° C., preferably 20 to 50 ° C.
- the reaction time may be 1 to 72 hours, preferably 1 to 24 hours.
- a base from the viewpoint of the selectivity of the reaction and the yield of the target product.
- the base include sodium hydroxide, potassium hydroxide, potassium carbonate, sodium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, potassium acetate, t-butoxy potassium, potassium phosphate, aqueous ammonia and the like, or imidazole, trimethylamine,
- organic bases such as triethylamine, diethylamine, propylamine, tetramethylammonium hydride, aniline, N, N-dimethylaniline, dimethylaminopyridine, diazabicycloundecene.
- potassium carbonate PKa8-12 inorganic bases such as sodium carbonate, sodium bicarbonate, potassium bicarbonate, potassium acetate, potassium phosphate, aqueous ammonia, or trimethylamine, triethylamine, diethylamine, propylamine, , N- dimethylaniline, addition of an organic base pKa of 8 ⁇ 12 of aqueous ammonia is preferred.
- bases may be used alone or in combination of two or more. The amount of these bases used is preferably 1 to 50 mol with respect to 1 mol of the compound of the formula (7).
- step (j) it is preferable to make the reaction solution acidic immediately after completion of the reaction in terms of preventing side reactions.
- Step (k) In this step, the compound of formula (8) is oxidized to obtain the compound of formula (5-1).
- This reaction is a reaction that selectively oxidizes only the 5th and 6th positions of the pterin skeleton.
- the oxidation reaction is performed by oxidation with an oxidizing agent or oxygen oxidation.
- Oxygen oxidation includes oxygen oxidation by air, oxygen, ozone, etc., and may be performed by adding a catalyst such as Pd, Ru, Rh, Pt, Ni, Cu.
- oxidation using peracid or oxygen oxidation is preferable, and oxygen oxidation using air is more preferable.
- oxygen oxidation for example, air oxidation, a solution containing the compound of formula (8) may be stirred in air for 1 to 72 hours. Oxygen oxidation is preferably performed under neutral or basic conditions.
- Step (i) This step is a step of directly obtaining the compound of the formula (5-1) by reducing the compound of the formula (7).
- This reduction reaction can be performed in the same manner as in step (b) and step (e).
- the reduction reaction is preferably catalytic reduction (hydrogenation reaction in the presence of a catalyst) in the same manner as in steps (b) and (e), and more preferably catalytic reduction under basic conditions by adding a base.
- R 4 , R 5 and R 6 are preferably protected from the viewpoints of yield and by-product suppression.
- Step (l) This step is a step of obtaining sepiapterin (3) by deprotecting the compound of formula (5-1). This step can be performed in the same manner as step (a), step (f) and step (m).
- the compound of formula (4) can separate diastereomers (4a) and (4b) by the preferential crystallization method.
- the mixture of (4a) and (4b) is stirred in an aqueous solution such as water or hydrochloric acid, or an aqueous solution such as water or hydrochloric acid is added to an alcohol solvent such as methanol, ethanol or butanol, or an organic solvent such as acetone or acetonitrile.
- an alcohol solvent such as methanol, ethanol or butanol
- an organic solvent such as acetone or acetonitrile
- Sepiapterin, lactoylpterin or tetrahydrolactoylpterin can be an acid addition salt.
- the acid used include hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, p-toluenesulfonic acid, methanesulfonic acid, and acetic acid.
- sepiapterin, lactoylpterin or tetrahydrolactoylpterin may be added with an acid in a solvent such as water or alcohol.
- the precipitated crystals can be collected by filtration, and various chromatographies, recrystallizations, etc. can be performed. Is possible.
- Tetrapropylammonium perruthenate, 4-methylmorpholine N-oxide and compound (D) were added in acetonitrile in the presence of MS-4A in an argon atmosphere, and the mixture was stirred at 60 ° C. After 1 hour, the mixture was filtered through Celite TM 545, 10% aqueous ammonium chloride solution was added, and the mixture was extracted with ethyl acetate. After drying over magnesium sulfate, the mixture was concentrated, separated and purified by silica gel column chromatography, and decanted with toluene to obtain compound (1).
- Example 5 To 20 mg (0.085 mmol) of S-lactoylpterin were added 2 mL of saturated aqueous sodium hydrogen carbonate and 76 mg (0.44 mmol) of sodium dithionite, and the mixture was stirred at room temperature for 2 hours to give S-sepiapterin as a mixture.
- Example 6 A reaction was carried out in the same manner as in Example 5 except that 20% (0.085 mmol) of S-lactoylpterin was used and the saturated aqueous sodium bicarbonate solution was changed to an aqueous sodium borate solution to give S-sepiapterin as a mixture.
- Example 9 To 3.00 g (12.8 mmol) of S-lactoylpterin was added 150 mL of methanol, 15 mL of 6 mol / L hydrochloric acid, and 1.78 g (19.1 mmol) of borane pyridine complex, and the mixture was stirred at an external temperature of 0 ° C. for 1 hour. After completion of the reaction, 45 mL of concentrated hydrochloric acid was added, and the mixture was stirred overnight at the same temperature. The crystals were collected by filtration and dried under reduced pressure, and 1.63 g (5.2 mmol, yield) of 6S-S-tetrahydrolactoylpterin dihydrochloride (4a) 41%).
- Example 10 Methanol 5 mL, 6 mol / L hydrochloric acid 0.5 mL, and borane pyridine complex 59 mg (0.64 mmol) were added to 100 mg (0.43 mmol) of S-lactoylpterin, and the mixture was stirred overnight at an external temperature of 0 ° C. The precipitated crystals were collected by filtration and dried under reduced pressure to obtain 46 mg (0.15 mmol, yield 35%) of 6S—S-tetrahydrolactoylpterin dihydrochloride (4a). It was confirmed that the obtained compound was consistent with the spectrum data described in Example 8.
- Example 11 To 200 mg (0.85 mol) of S-lactoylpterin, 50 mL of methanol, 0.62 mL (5.95 mmol) of diethylamine and 100 mg of 8.4% Pd / C (Ph 2 S) (containing 50% water) were added, and the external temperature was 40 ° C. The hydrogenation reaction was carried out for 2.5 hours.
- Example 14 46 mg of S-sepiapterin was prepared in the same manner as in Example 13 except that 100 mg (0.32 mmol) of S-tetrahydrolactoylpterin dihydrochloride was changed to 68 mg (0.32 mmol) of 36% peracetic acid with 30% hydrogen peroxide. 0.19 mmol, 61% yield). It was confirmed that the obtained compound was consistent with the spectral data described in Example 4.
- Example 15 S-Sepia was prepared in the same manner as in Example 13 except that 100 mg (0.32 mmol) of S-tetrahydrolactoylpterin dihydrochloride was changed to 85 mg of m-CPBA (content 65%, 0.32 mmol) with 30% hydrogen peroxide. 35 mg (0.15 mmol, 46% yield) of pterin was obtained. It was confirmed that the obtained compound was consistent with the spectral data described in Example 4.
- Example 16 20 mL of methanol and 0.89 mL (6.40 mmol) of triethylamine were added to 200 mg (0.64 mmol) of S-tetrahydrolactoylpterin dihydrochloride, and the mixture was stirred at room temperature for 1 hour in air. The reaction mixture was concentrated under reduced pressure, water was added, the crystals were collected by filtration and dried under reduced pressure to obtain 105 mg (0.44 mmol, yield 69%) of S-sepiapterin. It was confirmed that the obtained compound was consistent with the spectral data described in Example 4.
- Example 17 Add 20 mL of methanol to 200 mg (0.64 mmol) of S-tetrahydrolactoylpterin dihydrochloride, neutralize with 0.16 mL (1.28 mmol) of 8 mol / L aqueous sodium hydroxide solution, and stir in air at room temperature for 1 hour did.
- the reaction mixture was concentrated under reduced pressure, water was added, the crystals were collected by filtration and dried under reduced pressure to obtain 87 mg (0.37 mmol, yield 58%) of S-sepiapterin. It was confirmed that the obtained compound was consistent with the spectral data described in Example 4.
- 2-amino-6- [2S- (triisopropylsilanyl) -propionyl] -3H- was prepared in the same manner as in Example 22 except that TBSCl was changed to TBDPSCl from 300 mg (1.28 mmol) of S-lactoylpterin. 498 mg (1.05 mmol, yield 82%) of pteridin-4-one (6) was obtained.
- Example 30 [4-tert-Butoxycarbonyl-2- (N, N-di-tert-butoxycarbonyl) aminopteridin-6-yl] -2S-tert-butyldimethylsilanyloxypropan-1-one 500 mg (0. 164 mg (0.53 mmol, 68% yield) of 6S—S-tetrahydrolactoylpterin dihydrochloride (4a) was obtained in the same manner as in Example 29 except that the amount of 10% Pd / C was changed to 100 mg from 77 mmol). Obtained. It was confirmed that the obtained compound was consistent with the spectrum data described in Example 8.
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Abstract
Description
ラクトイルプテリンの合成法としては、セピアプテリンを酸化することにより得られることが知られている(非特許文献3、4)。
従って、本発明の課題は、医薬として有用であることが最近発見されたセピアプテリン、ラクトイルプテリン及びテトラヒドロラクトイルプテリンを安定して供給可能な新規製造法を提供することにある。
〔1〕式(2)
〔2〕還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下の接触還元である〔1〕記載の製造法。
〔3〕式(4)
〔4〕酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である〔3〕記載の製造法。
〔5〕式(2)
〔6〕還元反応が、BH3系還元剤による還元、又は塩基性条件下の接触還元である〔5〕記載の製造法。
〔7〕還元反応が、酸性条件下、BH3系還元剤による還元、又は塩基性条件下の接触還元である〔5〕記載の製造法。
〔8〕式(2)
〔9〕還元反応が、BH3系還元剤による還元、又は塩基性条件下の接触還元であり、酸化反応が過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である〔8〕記載の製造法。
〔10〕還元反応が、酸性条件下、BH3系還元剤による還元、又は塩基性条件下の接触還元である〔9〕記載の製造法。
〔11〕式(5)
で表される化合物を脱保護することを特徴とする、式(3)
〔12〕脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である〔11〕記載の製造法。
〔13〕式(8)
で表される化合物を酸化して式(5-1)
で表される化合物を得、次いで得られた化合物を脱保護することを特徴とする式(3)
〔14〕酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である〔13〕記載の製造法。
〔15〕式(7)
で表される化合物を還元して式(5-1)
で表される化合物を得、次いで得られた化合物を脱保護することを特徴とする式(3)
〔16〕還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下の接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解あるいはフッ素アニオンによる脱保護である〔15〕記載の製造法。
〔17〕式(7)
で表される化合物を還元して式(8)
で表される化合物を得、当該化合物(8)を酸化して式(5-1)
で表される化合物を得、次いで得られた化合物を脱保護することを特徴とする式(3)
〔18〕還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下の接触還元であり、酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である〔17〕記載の製造法。
〔19〕式(1)
で表される化合物を還元して式(5-2)
で表される化合物を得、当該化合物(5-2)を脱保護することを特徴とする、式(3)
〔20〕還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である〔19〕記載の製造法。
〔21〕式(8)
で表される化合物を脱保護して式(4)
〔22〕脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護であり、酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である〔21〕記載の製造法。
〔23〕式(7)
で表される化合物を還元して式(8)
で表される化合物を得、当該化合物(8)を脱保護して式(4)
〔24〕還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護であり、酸化反応が過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である〔23〕記載の製造法。
〔25〕式(1)
で表される化合物を脱保護して式(2)
〔26〕脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護であり、還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元である〔25〕記載の製造法。
〔27〕式(1)
で表される化合物を脱保護することを特徴とする式(2)
〔28〕脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である〔27〕記載の製造法。
〔29〕式(8)
で表される化合物を脱保護することを特徴とする、式(4)
〔30〕脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である〔29〕記載の製造法。
〔31〕式(7)
で表される化合物を還元して式(8)
で表される化合物を得、当該化合物(8)を脱保護することを特徴とする、式(4)
〔32〕還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である〔31〕記載の製造法。
これらの保護基のうち、R1、R4としては、アルコキシアルキル基、アルキル基、アシル基、シリル基、アルコキシカルボニル基、トリチル基等が挙げられるが、副生成物抑制の点から、中性、又は弱塩基~酸性条件下で脱離する保護基であるアルコキシアルキル基、分岐又は環状アルキル基、アシル基、シリル基、アルコキシカルボニル基、トリチル基が好ましく、酸性条件下で脱離する保護基であるアルコキシアルキル基、分岐又は環状アルキル基、シリル基、アルコキシカルボニル基、トリチル基がより好ましい。R2、R3としては、アルコキシアルキル基、アルキル基、アシル基、シリル基、アルコキシカルボニル基、トリチル基等が挙げられるが、副生成物抑制の点から、中性、又は弱塩基~酸性条件下で脱離する保護基であるアルコキシアルキル基、分岐又は環状アルキル基、アシル基、シリル基、アルコキシカルボニル基、トリチル基が好ましく、酸性条件下で脱離する保護基であるアルコキシアルキル基、分岐又は環状アルキル基、シリル基、アルコキシカルボニル基、トリチル基がより好ましい。R5、R6としては、アルコキシアルキル基、アルキル基、アシル基、アルコキシカルボニル基、トリチル基等が挙げられるが、副生成物抑制の点から、中性、又は弱塩基~酸性条件下で脱離する保護基であるアルコキシアルキル基、分岐又は環状アルキル基、アシル基、アルコキシカルボニル基、トリチル基が好ましく、酸性条件下で脱離する保護基であるアルコキシアルキル基、アルコキシカルボニル基、トリチル基がより好ましい。
この工程は、式(1)又は(5-2)の化合物の脱保護を行う工程である。脱保護は保護基に合わせて加水分解、加溶媒分解、フッ素アニオンによる脱保護など適宜選択することができる。副生成物抑制の点から加水分解及び加溶媒分解は弱塩基性、中性又は酸性条件下での実施が好ましく、酸性条件下での実施がより好ましい。より詳細には、加水分解及び加溶媒分解は、pKa12以下の塩基又は酸の存在下の実施が好ましく、pKa7以下の酸の存在下の実施がより好ましい。
このうち、無機酸が好ましく、特に塩酸が好ましい。具体的には、添加剤を、式(1)又は(5-2)の化合物1質量部に対して0.1~100質量部添加するのが好ましく、0.1~50質量部添加するのがより好ましい。
この工程は、式(1)又は(2)の化合物を還元して式(5-2)又は(3)の化合物を得る工程である。この反応は、プテリン骨格の7,8位の二重結合のみを選択的に還元する反応である。
この工程は、式(2)のラクトイルプテリンを無保護のまま還元してテトラヒドロラクトイルプテリン(4)又はその塩を製造する工程である。
この工程は、式(4)の化合物を酸化してセピアプテリン(3)を得る工程である。
酸化反応としては、酸化剤による酸化、又は酸素酸化により行われる。酸化剤としてはクロム酸、マンガン化合物等の金属を用いた酸化、DMSO、キノン、アセトン、超原子価ヨウ素化合物、TEMPO等の有機化合物を用いた酸化、過酸化水素、過酢酸、過安息香酸等の過酸を用いた酸化が挙げられる。酸素酸化は空気、酸素、オゾン等による酸素酸化が挙げられ、Pd、Ru、Rh、Pt、Ni、Cu等の触媒を添加して行っても良い。これら酸化反応としては過酸を用いた酸化、又は空気を用いた酸素酸化が好ましく、過酸を用いた酸化、又は中性若しくは塩基性条件下の空気を用いた酸素酸化がより好ましい。
この工程は、式(2)の化合物にR3X(Xは脱離基を示し、R3は前記と同じ)を反応させて、式(6)の化合物を得る工程である。
この工程は、式(6)の化合物にR4X、R5X、R6X(R4及びXは前記と同じ)を反応させて、式(7)の化合物を得る工程である。
式(7)の化合物は、式(2)の化合物の水酸基、ケトン基及びアミノ基の全てを、同一の保護基で同時に保護することによっても製造することができる。また、式(7)の化合物は、式(1)の化合物にR5X、R6Xを反応させることによっても製造することができる。
これらの保護基導入反応は、工程(g)及び工程(h)と同様の条件で行うことができる。
この工程は、式(7)の化合物を還元して式(8)の化合物を得る工程である。
この工程は、式(8)の化合物を酸化して式(5-1)の化合物を得る工程である。この反応は、プテリン骨格の5,6位のみを選択的に酸化する反応である。
酸素酸化、例えば空気酸化は、式(8)の化合物を含有する溶液を空気中で1~72時間撹拌すればよい。酸素酸化は、中性又は塩基性条件で行うのが好ましい。
この工程は、式(7)の化合物を還元して直接式(5-1)の化合物を得る工程である。
この還元反応は、工程(b)及び工程(e)と同様に行うことができる。還元反応は前記工程(b)及び工程(e)と同様に接触還元(触媒存在下の水素化反応)が好ましく、塩基を添加して塩基性条件下の接触還元がより好ましい。また、収率及び副生成物抑制の観点からR4、R5及びR6は保護されている方が好ましい。
この工程は、式(8)の化合物を脱保護して式(4)の化合物(テトラヒドロラクトイルプテリン)を得る工程である。
この工程は、工程(a)及び工程(f)と同様にして行うことができる。
この工程は、式(5-1)の化合物を脱保護してセピアプテリン(3)を得る工程である。
この工程は、工程(a)、工程(f)及び工程(m)と同様にして行うことができる。
S-ラクトイルプテリン(2)の合成
(S-ラクトイルプテリン:(2))
1H NMR(DMSO-d6):δ/ppm=1.32(d,3H,J=6.8Hz),5.16(br,1H),5.32(q,1H,J=6.8Hz),9.09(s,1H)
1H NMR(DMSO-d6):δ/ppm=1.38(d,3H,J=6.6Hz),1.37-1.79(m,8H),1.98-1.99(m,2H),5.20(d,1H,J=6.3Hz),5.34(d.q.,1H,J=6.6Hz),5.29-5.37(m,1H),7.68(br,1H),7.82(br,1H),9.22(s,1H)
S-ラクトイルプテリン塩酸塩の合成
(S-ラクトイルプテリン塩酸塩)
1H NMR(DMSO-d6):δ/ppm=1.34(d,3H,J=6.9Hz),3.91(br,3H),5.34(q,1H,J=6.9Hz),9.12(s,1H)
(S-セピアプテリン:(3))
1H NMR(DMSO-d6):δ/ppm=1.21(d,3H,J=6.6Hz),4.11(s,2H),4.89(d,1H,J=6.6Hz),5,10(quin.,1H,J=6.6Hz),6.81(br-s,2H),7.51(s,1H),10.26(s,1H)
S-ラクトイルプテリン20mg(0.085mmol)に飽和重曹水2mL、亜ジチオン酸ナトリウム76mg(0.44mmol)を加え、室温下で2時間撹拌したところ、S-セピアプテリンを混合物として与えた。
S-ラクトイルプテリン20mg(0.085mmol)より飽和重曹水をホウ酸ナトリウム水溶液に変えた以外は実施例5と同様の方法で反応を行い、S-セピアプテリンを混合物として与えた。
S-セピアプテリン塩酸塩の合成
(S-セピアプテリン塩酸塩)
1H NMR(DMSO-d6):δ/ppm=1.22(d,3H,J=6.9Hz),4.14(s,2H),4.89(d,1H,J=6.6Hz),5.11(q,1H,J=6.9Hz),7.40(br-s,4H),7.80(br-s,1H)
(6S-S-テトラヒドロラクトイルプテリン二塩酸塩:(4a))
1H NMR (DMSO-d6): δ/ppm = 1.24 (d, 3H, J=6.9Hz), 3.45 (dd, 1H, J=7.2, 13.5Hz), 3.87 (dd, 1H, J=3.3, 13.5Hz), 4.34 (q, 1H, J=6.9Hz), 4.53 (dd, 1H, J=3.3, 7.2Hz), 7.03 (br-s, 4H), 7.67 (br-s, 1H)
(6R-S-テトラヒドロラクトイルプテリン二塩酸塩:(4b))
1H NMR (DMSO-d6): δ/ppm = 1.24 (d, 3H, J=6.9Hz), 3.45 (dd, 1H, J=6.9, 13.5Hz), 3.91 (dd, 1H, J=3.3, 13.5Hz), 4.31 (q, 1H, J=6.6Hz), 4.55 (dd, 1H, J=3.3, 6.9Hz), 7.12 (br-s, 3H), 7.71 (br-s, 2H)
S-ラクトイルプテリン3.00g(12.8mmol)にメタノール150mL、6mol/L塩酸15mL、ボランピリジン錯体1.78g(19.1mmol)を加え、外温0℃で1時間撹拌した。反応終了後、濃塩酸45mLを加え、同温度で一晩撹拌し、結晶ろ取、減圧乾燥し、6S-S-テトラヒドロラクトイルプテリン二塩酸塩(4a)1.63g(5.2mmol、収率41%)を得た。また、ろ液を減圧濃縮、エタノールで共沸脱水後、エタノールを加え、結晶ろ取、減圧乾燥し、6R-S-テトラヒドロラクトイルプテリン二塩酸塩(4b)1.38g(4.4mmol、収率35%)を得た。得られた化合物は実施例8に記載のスペクトルデータと一致することを確認した。
S-ラクトイルプテリン100mg(0.43mmol)にメタノール5mL、6mol/L塩酸0.5mL、ボランピリジン錯体59mg(0.64mmol)を加え、外温0℃で一晩撹拌した。析出した結晶をろ取、減圧乾燥し、6S-S-テトラヒドロラクトイルプテリン二塩酸塩(4a)46mg(0.15mmol、収率35%)を得た。得られた化合物は実施例8に記載のスペクトルデータと一致することを確認した。
S-ラクトイルプテリン200mg(0.85mol)にメタノール50mL、ジエチルアミン0.62mL(5.95mmol)、8.4%Pd/C(Ph2S)(50%含水)100mgを加え、外温40℃、水素添加反応を2.5時間行った。反応終了後、濃塩酸を加え、触媒をろ別、減圧濃縮し、エタノールで共沸脱水後、エタノールを加え、結晶ろ取、減圧乾燥し、S-テトラヒドロラクトイルプテリン二塩酸塩(4a)と(4b)の混合物122mg(0.39mmol、収率46%)を得た。得られた化合物は実施例8に記載のスペクトルデータと一致することを確認した。
(S-テトラヒドロラクトイルプテリン二トルエンスルホン酸塩)
1H NMR (DMSO-d6): δ/ppm = 1.25 (d, 3H, J=7.2Hz), 2.29 (S, 6H), 3.35 (dd, 1H, J=7.5, 13.5Hz), 3.84 (dd, 1H, J=3.0, 13.5Hz), 4.35 (q, 1H, J=6.9Hz), 4.49 (dd, 1H, J=3.0, 7.5Hz), 6.72 (br-s, 2H), 7.13 (d, 4H, J=8.1Hz), 7.49 (d, 4H, J=8.1Hz), 7.62 (br-s, 1H), 10.66 (br-s, 1H)
1H NMR (DMSO-d6): δ/ppm = 1.25 (d, 3H, J=7.2Hz), 2.29 (S, 6H), 3.33 (dd, 1H, J=7.5, 13.5Hz), 3.84 (dd, 1H, J=3.0, 13.5Hz), 4.32 (q, 1H, J=6.9Hz), 4.49 (dd, 1H, J=3.0, 7.5Hz), 6.72 (br-s, 2H), 7.13 (d, 4H, J=8.1Hz), 7.49 (d, 4H, J=8.1Hz), 7.62 (br-s, 1H), 10.66 (br-s, 1H)
S-テトラヒドロラクトイルプテリン二塩酸塩100mg(0.32mmol)から30%過酸化水素を36%過酢酸68mg(0.32mmol)とした以外は実施例13と同様の方法によりS-セピアプテリン46mg(0.19mmol、収率61%)を得た。得られた化合物は実施例4に記載のスペクトルデータと一致することを確認した。
S-テトラヒドロラクトイルプテリン二塩酸塩100mg(0.32mmol)から30%過酸化水素をm-CPBA 85mg(含量65%,0.32mmol)とした以外は実施例13と同様の方法によりS-セピアプテリン35mg(0.15mmol、収率46%)を得た。得られた化合物は実施例4に記載のスペクトルデータと一致することを確認した。
S-テトラヒドロラクトイルプテリン二塩酸塩200mg(0.64mmol)にメタノール20mL、トリエチルアミン0.89mL(6.40mmol)を加え、室温下、空気中で1時間撹拌した。反応液を減圧濃縮し、水を加え、結晶ろ取、減圧乾燥し、S-セピアプテリン105mg(0.44mmol、収率69%)を得た。得られた化合物は実施例4に記載のスペクトルデータと一致することを確認した。
S-テトラヒドロラクトイルプテリン二塩酸塩200mg(0.64mmol)にメタノール20mLを加え、8mol/L水酸化ナトリウム水溶液0.16mL(1.28mmol)で中和し、室温下、空気中で1時間撹拌した。反応液を減圧濃縮し、水を加え、結晶ろ取、減圧乾燥し、S-セピアプテリン87mg(0.37mmol、収率58%)を得た。得られた化合物は実施例4に記載のスペクトルデータと一致することを確認した。
1H NMR (CDCl3): δ/ppm = 1.33-1.47 (m, 3H), 1.44 (d, 3H, J=6.9Hz), 1.54-1.63 (m, 3H), 1.79 (m, 2H), 1.91 (m, 2H), 3.37 (s, 3H), 4.36 (d, 1H, J=15.6), 4.43 (d, 1H, J=15.6), 4.71 (d, 1H, J=6.6Hz), 4.74 (d, 1H, J=6.6Hz), 4.90 (br-s, 2H), 5.00 (br-s, 1H), 5.05-5.11 (m, 1H), 5.34 (q, 1H, J=6.9Hz)
1H NMR (CDCl3): δ/ppm = 1.13 (m, 1H), 1.44 (d, 3H, J = 6.8 Hz),1.63 (m, 1H), 1.80 (m, 2H), 1.93 (m, 2H), 2.06 (m, 2H), 3.37 (s, 3H), 3.52 (m, 2H), 3.70 (t, J = 4.6 Hz, 2H), 4.40 (m, 2H), 4.81 (m, 2H), 5.11 (t.t, J = 3.9, 8.5 Hz, 1H), 5.35 (q, J = 6.8 Hz, 1H)
S-セピアプテリン(3)の合成
S-セピアプテリン(3)の合成
1H NMR (DMSO-d6): δ/ppm = 0.01 (s, 3H), 0.06 (s, 3H), 0.83 (s, 9H), 1.36 (d, 3H, J=6.9Hz), 5.55 (q, 1H, J=6.9Hz), 9.10 (s, 1H), 11.73 (br-s, 1H)
1H NMR (DMSO-d6): δ/ppm = 0.89-1.15 (m, 21H), 1.40 (d, 3H, J=6.9Hz), 5.71 (q, 1H, J=6.9Hz), 9.13 (s, 1H), 11.74 (br-s, 1H)
1H NMR (DMSO-d6): δ/ppm = 1.03 (s, 9H), 1.38 (d, 3H, J=6.9Hz), 5.71 (q, 1H, J=6.9Hz), 7.23-7.33 (m, 3H), 7.37-7.45 (m, 3H), 7.50-7.59 (m, 2H), 7.61-7.71 (m, 2H), 8.96 (s, 1H), 11.67 (br-s, 1H)
1H NMR (DMSO-d6): δ/ppm = 0.01 (s, 3H), 0.08 (s, 3H), 0.75 (s, 9H), 1.40 (d, 3H, J=6.6Hz), 1.48 (s, 18H), 1.71 (s, 9H), 5.59 (q, 1H, J=6.6Hz), 9.53 (s, 1H)
1H NMR (CDCl3): δ/ppm = 1.26 (s, 9H), 1.27 (d, 3H, J=7.2Hz), 1.45 (s, 18H), 1.71 (s, 9H), 6.11 (q, 1H, J=7.2Hz), 6.73 (s, 1H)
1H NMR (DMSO-d6): δ/ppm = 1.45-1.88 (m, 8H), 1.53 (s, 18H), 1.58 (d, 3H, J=6.9Hz), 2.10-2.14 (m, 2H), 3.38 (s, 3H), 4.78 (d, 1H, J=6.9Hz), 4.84 (d, 1H, J=6.9Hz), 5.36-5.45 (m, 1H), 5.55 (q, 1H, J=6.9Hz), 9.65 (s, 1H)
1H NMR (DMSO-d6): δ/ppm = 0.01 (s, 3H), 0.07 (s, 3H), 0.82 (s, 9H), 1.24 (d, 3H, J=6.6Hz), 1.42 (s, 18H), 1.53 (s, 9H), 4.23 (d, 1H, J=16.5Hz), 4.32 (d, 1H, J=16.5Hz), 5.39 (q, 1H, J=6.6Hz), 7.92 (s, 1H)
1-[4-tert-ブトキシカルボニル-2-(N,N-ジ-tert-ブトキシカルボニル)アミノプテリジン-6-イル]-2S-tert-ブチルジメチルシラニルオキシプロパン-1-オン500mg(0.77mmol)から10%Pd/Cの量を100mgとした以外は実施例29と同様の方法により6S-S-テトラヒドロラクトイルプテリン二塩酸塩(4a)164mg(0.53mmol、収率68%)を得た。得られた化合物は実施例8に記載のスペクトルデータと一致することを確認した。
(8a)
1H NMR (DMSO-d6): δ/ppm = 0.08 (s, 3H), 0.09 (s, 3H), 0.89 (s, 9H), 1.21 (d, 3H, J=6.6Hz), 1.37 (s, 18H), 1.49 (s, 9H), 3.56-3.67 (m, 2H), 4.39 (m, 1H), 4.42 (q, 1H, J=6.6Hz), 4.79 (s, 1H), 7.00 (s, 1H)
(8b)
1H NMR (DMSO-d6): δ/ppm = 0.08 (s, 3H), 0.09 (s, 3H), 0.89 (s, 9H), 1.23 (d, 3H, J=6.6Hz), 1.37 (s, 18H), 1.49 (s, 9H), 3.40-3.53 (m, 2H), 4.35 (m, 1H), 4.44 (q, 1H, J=6.6Hz), 4.93 (s, 1H), 7.09 (s, 1H)
1H NMR (DMSO-d6): δ/ppm = 1.21 (d, 3H, J=6.9Hz), 1.32-1.37 (m, 3H), 1.38 (s, 18H), 1.43-1.51 (m, 3H), 1.73 (m, 2H), 1.89-1.91 (m, 2H), 3.27 (s, 3H), 3.51-3.56 (m, 2H), 4.33-4.35 (m, 1H), 4.41 (q, 1H, J=6.9Hz), 4.59 (d, 1H, J=6.9Hz), 4.67 (d, 1H, J=6.9Hz), 4.86-4.89 (m, 1H), 4.95 (d, 1H, J=2.7Hz), 7.08 (s, 1H)
1H NMR (DMSO-d6): δ/ppm = 1.24 (d, 3H, J=6.9Hz), 1.32-1.37 (m, 3H), 1.38 (s, 18H), 1.43-1.51 (m, 3H), 1.73 (m, 2H), 1.89-1.91 (m, 2H), 3.32 (s, 3H), 3.51-3.56 (m, 2H), 4.33-4.35 (m, 1H), 4.39 (q, 1H, J=6.9Hz), 4.59 (d, 1H, J=6.9Hz), 4.67 (d, 1H, J=6.9Hz), 4.86-4.89 (m, 1H), 5.01 (d, 1H, J=2.4Hz), 7.08 (s, 1H)
Claims (32)
- 還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下の接触還元である請求項1記載の製造法。
- 酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である請求項3記載の製造法。
- 還元反応が、BH3系還元剤による還元、又は塩基性条件下の接触還元である請求項5記載の製造法。
- 還元反応が、酸性条件下、BH3系還元剤による還元、又は塩基性条件下の接触還元である請求項5記載の製造法。
- 還元反応が、BH3系還元剤による還元、又は塩基性条件下の接触還元であり、酸化反応が過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である請求項8記載の製造法。
- 還元反応が、酸性条件下、BH3系還元剤による還元、又は塩基性条件下の接触還元である請求項9記載の製造法。
- 脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である請求項11記載の製造法。
- 酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である請求項13記載の製造法。
- 還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下の接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解あるいはフッ素アニオンによる脱保護である請求項15記載の製造法。
- 還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下の接触還元であり、酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である請求項17記載の製造法。
- 還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である請求項19記載の製造法。
- 脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護であり、酸化反応が、過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である請求項21記載の製造法。
- 還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護であり、酸化反応が過酸による酸化、又は中性若しくは塩基性条件下の空気酸化である請求項23記載の製造法。
- 脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護であり、還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元である請求項25記載の製造法。
- 脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である請求項27記載の製造法。
- 脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である請求項29記載の製造法。
- 還元反応が、亜硫酸塩、次亜硫酸塩若しくはチオ硫酸塩による還元、又は塩基性条件下での接触還元であり、脱保護反応が、pKa12以下の塩基又は酸の存在下の加水分解又は加溶媒分解、あるいはフッ素アニオンによる脱保護である請求項31記載の製造法。
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JP2017095358A (ja) * | 2015-11-18 | 2017-06-01 | 白鳥製薬株式会社 | プテリン誘導体又はその塩 |
KR20190086686A (ko) * | 2016-11-29 | 2019-07-23 | 센사 파마슈티칼즈 인크. | 세피아프테린의 다형체 및 그의 염 |
JP2020500931A (ja) * | 2016-11-29 | 2020-01-16 | センサ ファーマシューティカルズ インコーポレイテッドCensa Pharmaceuticals Inc. | セピプテリンの多形 |
JP2021527031A (ja) * | 2018-05-30 | 2021-10-11 | ピーティーシー セラピューティクス エムピー,インコーポレイテッド | セピアプテリンの薬学的に許容される塩 |
US11752154B2 (en) | 2017-09-01 | 2023-09-12 | Ptc Therapeutics Mp, Inc. | Pharmaceutical compositions comprising sepiapterin and uses thereof |
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US20130197000A1 (en) | 2010-04-22 | 2013-08-01 | Nihon University | Drug and food/drink for preventing or improving cerebral dysfunction |
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JP2017095358A (ja) * | 2015-11-18 | 2017-06-01 | 白鳥製薬株式会社 | プテリン誘導体又はその塩 |
KR20190086686A (ko) * | 2016-11-29 | 2019-07-23 | 센사 파마슈티칼즈 인크. | 세피아프테린의 다형체 및 그의 염 |
JP2019535836A (ja) * | 2016-11-29 | 2019-12-12 | センサ ファーマシューティカルズ インコーポレイテッドCensa Pharmaceuticals Inc. | セピプテリン及びその塩の多形 |
JP2020500931A (ja) * | 2016-11-29 | 2020-01-16 | センサ ファーマシューティカルズ インコーポレイテッドCensa Pharmaceuticals Inc. | セピプテリンの多形 |
JP7148533B2 (ja) | 2016-11-29 | 2022-10-05 | ピーティーシー セラピューティクス エムピー,インコーポレイテッド | セピプテリン及びその塩の多形 |
JP7148532B2 (ja) | 2016-11-29 | 2022-10-05 | ピーティーシー セラピューティクス エムピー,インコーポレイテッド | セピプテリンの多形 |
JP2023002532A (ja) * | 2016-11-29 | 2023-01-10 | ピーティーシー セラピューティクス エムピー,インコーポレイテッド | セピプテリン及びその塩の多形 |
KR102561697B1 (ko) | 2016-11-29 | 2023-07-28 | 피티씨 테라퓨틱스 엠피, 인크. | 세피아프테린의 다형체 및 그의 염 |
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US11752154B2 (en) | 2017-09-01 | 2023-09-12 | Ptc Therapeutics Mp, Inc. | Pharmaceutical compositions comprising sepiapterin and uses thereof |
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