WO2013143309A1 - 黑矩阵的制作方法、彩色滤光片及显示装置 - Google Patents
黑矩阵的制作方法、彩色滤光片及显示装置 Download PDFInfo
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- WO2013143309A1 WO2013143309A1 PCT/CN2012/085283 CN2012085283W WO2013143309A1 WO 2013143309 A1 WO2013143309 A1 WO 2013143309A1 CN 2012085283 W CN2012085283 W CN 2012085283W WO 2013143309 A1 WO2013143309 A1 WO 2013143309A1
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- black matrix
- substrate
- photoresist
- color filter
- emulsion
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Definitions
- Embodiments of the present invention relate to a method of fabricating a black matrix, a color filter, and a display device. Background technique
- TFT-LCD thin film transistor liquid crystal display
- the structure of the prior art color filter is as shown in Fig. 1, and includes: a substrate 1, and a black matrix 2, a pixel resin layer 3, a transparent conductive layer 4, and a column spacer 5 which are sequentially formed on the substrate 1.
- the black matrix is made of a metal material such as chrome or a black resin material.
- a black matrix is made of a metal material, although the optical density can be achieved at a small film thickness (about ⁇ . ⁇ ), the reflectance is high, and the backlight light is reflected to the array substrate, causing light leakage. , which affects the display quality.
- the black matrix of the organic resin material has a low reflectance and avoids light leakage, if the optical density is > 3, the thickness thereof needs to be 1-2 ⁇ m, and the step difference above the edge of the black matrix after forming the pixel resin layer.
- the black matrix of the metal material is increased compared to the metal material, thereby affecting the surface flatness of the color filter. Summary of the invention
- Embodiments of the present invention provide a method for fabricating a black matrix pattern, comprising: adding a first liquid to a black matrix photoresist and performing ultrasonic vibration to form an emulsion-like black matrix photoresist; coating a layer on the substrate a photoresist for the emulsion-like black matrix; a first heat treatment of the substrate coated with the above-mentioned emulsion-like black matrix photoresist, so that the first liquid in the emulsion-like black matrix photoresist is evaporated Forming a black matrix film layer comprising a plurality of micropores on the substrate; exposing the black matrix film layer with a mask, and developing and second heat treating to form the black matrix on the substrate pattern.
- Another embodiment of the present invention provides a color filter, including: a substrate, a black matrix pattern formed on the substrate, and a pixel resin layer formed in a pixel region surrounded by the black matrix pattern, The micromatrix is formed in the black matrix pattern.
- Yet another embodiment of the present invention provides a display device including the above color filter.
- FIG. 1 is a schematic structural view of a prior art color filter
- FIGS. 2 to 4 are schematic cross-sectional views showing respective steps in a method of fabricating a black matrix pattern in accordance with an embodiment of the present invention
- Figure 5 is a schematic view showing the light reflection of the enlarged area of the micropore in Figure 4.
- FIG. 6 is a schematic structural view of a color filter according to an embodiment of the present invention. detailed description
- One of the technical problems to be solved by the present invention is to provide a method for fabricating a black matrix, a color filter, and a display device, so that the black matrix film has a large optical density while having a small thickness.
- Embodiments of the present invention provide a method for fabricating a black matrix.
- a first liquid is added to a photoresist for a black matrix, an emulsion photoresist is formed by ultrasonic oscillation, and a black matrix is formed by a photolithography process.
- the first liquid dispersed therein is evaporated by heat treatment to form micropores in the black matrix film layer.
- the micropores increase the scattering of light in the black matrix layer (as shown in Figure 5), increasing the optical density of the black matrix.
- the increase of the optical density of the black matrix is beneficial to the reduction of the thickness of the black matrix, and the thickness thereof can be reduced from the original 1-2 ⁇ m to 0.5-1 ⁇ m, which saves the amount of the photoresist for the black matrix and reduces the cost.
- the reduction of the thickness of the black matrix is advantageous for reducing the step difference generated when the pixel resin layer is formed, thereby improving the flatness of the color filter.
- Step 101 adding a first liquid to the photoresist for the black matrix, and performing ultrasonic vibration to form milk Liquid photoresist;
- the first liquid may be pure water or other liquid capable of forming an emulsion with the photoresist.
- the pure water may be distilled water, deionized water or the like to prevent the impurity ions in the water from affecting the performance of the photoresist.
- the power of the ultrasonic oscillation may be 500-1000 W
- the ultrasonic time may be 500-1000 W
- Step 102 coating a layer of emulsion-like black matrix photoresist on the substrate;
- the substrate may be a glass substrate or other transparent material substrate.
- the emulsion-like black matrix photoresist 20 obtained in step 101 can be spin-coated or scraped on the glass substrate 10, and the emulsion-like black matrix photoresist layer 20 is, for example, uniformly distributed.
- the amount of the photoresist is determined according to the thickness of the black matrix film layer 21 to be formed later, and since the optical density is increased by forming micropores in the photoresist for the black matrix in the embodiment of the present invention, for the black matrix film layer of the same thickness, the amount of the photoresist for the black matrix in the embodiment of the present invention may be 30-60% of that of the prior art.
- Step 103 Perform heat treatment on the substrate in which step 102 is completed;
- This heat treatment is, for example, a pre-baking process in a photolithography process.
- droplets 6 of a plurality of first liquid uniformly dispersed in the photoresist layer 20 for the black matrix are evaporated by heat treatment to form a black matrix film layer having a plurality of micropores 7.
- the micropores formed are uniformly dispersed.
- Fig. 3 is only a schematic view, and may have a plurality of micropores in the thickness direction of the black matrix film layer, not only one layer as shown in the schematic.
- Step 104 The substrate of the step 103 is exposed, and after development and heat treatment, the black matrix pattern 22 is formed.
- the substrate is exposed by using a patterned mask, and then, after the exposed substrate is subjected to development and heat treatment (ie, post-baking process), a black matrix containing micropores 7 is formed.
- Pattern 22 first, the substrate is exposed by using a patterned mask, and then, after the exposed substrate is subjected to development and heat treatment (ie, post-baking process), a black matrix containing micropores 7 is formed. Pattern 22.
- the temperature of the heat treatment may be 150-250 ° C, and the heat treatment time may be 20-60 min.
- the embodiment of the present invention further provides a color filter.
- the color filter includes: a substrate 10, and a black matrix pattern 22, a pixel resin layer 30, and a transparent conductive layer 40 sequentially formed on the substrate 10. And a columnar spacer 50 in which micropores 7 are formed in the black matrix pattern 22.
- the manufacturing method of the color filter includes, in addition to the manufacturing step of the black matrix pattern 22, for example, further comprising forming a pixel resin layer in a pixel region surrounded by the black matrix by a photolithography process or an inkjet method, the pixel resin layer a red pixel resin layer 1, a green pixel resin layer G, and a blue pixel resin layer B; a transparent conductive layer is formed on the black matrix and the pixel resin layer by deposition or electroplating; and, in a transparent conductive process by a photolithography process A columnar spacer is formed on the layer.
- the embodiment of the invention further provides a display device comprising an array substrate, a color filter provided by the above embodiments, and a liquid crystal layer filled between the array substrate and the color filter.
- a first liquid is added to the photoresist for the black matrix, an emulsion-like photoresist is formed by ultrasonic wave oscillation, and a black matrix pattern is formed by a photolithography process.
- droplets of the plurality of first liquids dispersed therein are evaporated by heat treatment, thereby forming a plurality of micropores in the black matrix film layer.
- the micropores increase the scattering of light in the black matrix pattern, increasing the optical density of the black matrix pattern.
- the increase in the optical density of the black matrix pattern facilitates the reduction of the thickness of the black matrix pattern, which saves the amount of the photoresist for the black matrix and reduces the cost.
- the reduction in the thickness of the black matrix pattern is advantageous in reducing the step difference generated when the pixel resin layer is formed, thereby improving the flatness of the color filter.
- a method for fabricating a black matrix pattern comprising:
- the black matrix film layer is exposed with a mask and developed and a second heat treatment to form the black matrix pattern on the substrate.
- the ultrasonic oscillation has a power of 500-1000 W and a duration of 20-40 minutes.
- the first heat treatment has a temperature of 100 to 120 ° C and a duration of 90 to 240 seconds.
- the second heat treatment has a temperature of from 150 to 250 ° C and a duration of from 20 to 60 minutes.
- the first liquid is pure water.
- a color filter comprising: a substrate; a black matrix pattern formed on the substrate; and a pixel resin layer formed in a pixel region surrounded by the black matrix pattern, wherein the black matrix pattern is formed Micropores.
- the black matrix pattern is produced by the production method according to any one of (1) to (5).
- the method further includes:
- a transparent conductive layer formed over the black matrix pattern and the pixel resin layer and a column spacer formed over the transparent conductive layer.
- a display device comprising the color filter of any one of (6) to (8).
- the present invention adds a first liquid to a photoresist for a black matrix, forms an emulsion-like photoresist by ultrasonic wave oscillation, and forms a black matrix by a photolithography process.
- a first liquid to a photoresist for a black matrix
- forms an emulsion-like photoresist by ultrasonic wave oscillation forms a black matrix by a photolithography process.
- droplets of the plurality of first liquids dispersed therein are evaporated by heat treatment, thereby forming a plurality of micropores in the black matrix film layer.
- the micropores increase the scattering of light in the black matrix layer and increase the optical density of the black matrix.
- the increase of the optical density of the black matrix is beneficial to the reduction of the thickness of the black matrix, which saves the amount of photoresist used for the black matrix and reduces the cost.
- the reduction in the thickness of the black matrix is advantageous in reducing the step difference generated when the pixel resin layer is formed,
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Abstract
一种用于彩色滤光片及显示装置的黑矩阵的制作方法,所述黑矩阵的制作方法包括:在黑矩阵用光刻胶中加入第一液体并进行超声波振荡以形成乳液状的黑矩阵用光刻胶,所述乳液状的黑矩阵用光刻胶中分散有多个第一液体的液滴;在基板上涂覆一层所述乳液状的黑矩阵用光刻胶;对涂覆有上述乳液状的黑矩阵用光刻胶的基板进行第一热处理,使得乳液状的黑矩阵用光刻胶中的多个第一液体被蒸发,从而在基板上形成包含多个微孔的黑矩阵薄膜层;以及采用掩模板对所述黑矩阵薄膜层进行曝光,并经显影和第二热处理后,从而在所述基板上形成所述黑矩阵图案。
Description
黑矩阵的制作方法、 彩色滤光片及显示装置 技术领域
本发明的实施例涉及黑矩阵的制作方法、 彩色滤光片及显示装置。 背景技术
随着薄膜晶体管液晶显示器(TFT-LCD )技术的发展, 其成本的降低和 制造工艺的进一步完善,使其成为平板显示领域的主流技术。 TFT-LCD由彩 色滤光片和阵列基板对盒而成, 彩色滤光片主要为 TFT-LCD提供色彩。
现有技术的彩色滤光片的结构如图 1所示, 包括: 基板 1、 以及依次形 成于基板 1上的黑矩阵 2、 像素树脂层 3、 透明导电层 4和柱状隔垫物 5。 其 中黑矩阵使用例如铬的金属材料或者黑色的树脂材料制成。 当黑矩阵使用金 属材料时, 虽然能够在较小的膜厚(约为 Ο.ΐμπι )下实现光密度 > 3, 但其反 射率较高,会将背光源的光反射至阵列基板, 产生漏光,从而影响显示品质。 有机树脂材料的黑矩阵虽具有较低的反射率, 避免了漏光的产生, 但如果要 实现光密度 > 3 , 其厚度需要 1-2μπι, 在形成像素树脂层后, 在黑矩阵边缘上 方的段差相比较于釆用金属材料的黑矩阵就会增大, 从而影响彩色滤光片的 表面平整度。 发明内容
本发明的实施例提供黑矩阵图案的制作方法, 包括: 在黑矩阵用光刻胶 中加入第一液体并进行超声波振荡以形成乳液状的黑矩阵用光刻胶; 在基板 上涂覆一层所述乳液状的黑矩阵用光刻胶; 对涂覆有上述乳液状的黑矩阵用 光刻胶的基板进行第一热处理, 使得乳液状的黑矩阵用光刻胶中的第一液体 被蒸发, 从而在基板上形成包含多个微孔的黑矩阵薄膜层; 釆用掩模板对所 述黑矩阵薄膜层进行曝光, 并经显影和第二热处理, 从而在所述基板上形成 所述黑矩阵图案。
本发明的另一实施例提供彩色滤光片, 包括: 基板、 形成在基板上的黑 矩阵图案以及形成在所述黑矩阵图案所围成的像素区域内的像素树脂层, 其
中, 所述黑矩阵图案中形成有微孔。
本发明的又一实施例提供显示装置, 包括上述彩色滤光片。 附图说明
为了更清楚地说明本发明实施例的技术方案, 下面将对实施例或现有技 术描述中所需要使用的附图作简单地介绍, 显而易见地, 下面描述中的附图 仅仅涉及本发明的一些实施例, 并非对本发明的限制。
图 1为现有技术的彩色滤光片的结构示意图;
图 2至 4为本发明实施例中制作黑矩阵图案的方法中各个步骤的剖面示 意图;
图 5为对图 4中微孔所处的区域放大后的光线反射示意图;
图 6为本发明实施例的彩色滤光片的结构示意图。 具体实施方式
本发明所要解决的技术问题之一是提供黑矩阵的制作方法、 彩色滤光片 及显示装置,使得黑矩阵薄膜在具有较小的厚度的同时,具有较大的光密度。
下面将结合附图,对本发明实施例中的技术方案进行清楚、完整地描述, 显然, 所描述的实施例仅仅是本发明一部分实施例, 而不是全部的实施例。 基于本发明中的实施例, 本领域普通技术人员在没有做出创造性劳动前提下 所获得的所有其他实施例, 都属于本发明保护的范围。
本发明实施例提供黑矩阵的制作方法, 在黑矩阵用光刻胶中加入第一液 体, 通过超声波振荡形成乳液状光刻胶, 釆用光刻工艺形成黑矩阵。 在形成 黑矩阵过程中, 分散于其中的第一液体经热处理被蒸发, 从而在黑矩阵薄膜 层中形成微孔。 所述微孔增加了光线在黑矩阵层中的散射(如图 5所示) , 提高了黑矩阵的光密度。 黑矩阵光密度的提高, 有利于黑矩阵厚度的减小, 其厚度可由原先的 1-2μπι减小至 0.5-1μηι, 节省了黑矩阵用光刻胶的用量, 降低了成本。黑矩阵厚度的减小,有利于减小形成像素树脂层时产生的段差, 从而提高彩色滤光片的平整度。
本发明实施例的黑矩阵的制作方法, 可以包括如下步骤:
步骤 101 : 在黑矩阵用光刻胶中加入第一液体, 进行超声波振荡形成乳
液状光刻胶;
所述第一液体可以是纯水,也可以是能够与光刻胶形成乳液的其他液体。 所述纯水可以釆用蒸馏水、 去离子水等, 以防止水中的杂质离子对光刻胶的 性能造成影响。
其中, 所述超声波振荡的功率可以为 500-1000W , 超声时间可以为
20-40min。
步骤 102: 在基板上涂覆一层乳液状黑矩阵用光刻胶;
基板可以釆用玻璃基板或其他透明材料基板。 如图 2所示, 可以在玻璃 基板 10上旋涂或刮涂一层步骤 101得到的乳液状的黑矩阵用光刻胶 20, 乳 液状的黑矩阵用光刻胶层 20中例如均勾分布有多个第一液体的液滴 6,例如, 水滴。
其中,光刻胶的用量根据后续要形成的黑矩阵薄膜层 21的厚度确定, 由 于本发明的实施例中通过在黑矩阵用光刻胶中形成微孔来提高其光密度, 因 此, 对于形成同样厚度的黑矩阵薄膜层, 本发明实施例中的黑矩阵用光刻胶 的用量可以为现有技术的 30-60%。
步骤 103: 对完成步骤 102 的基板进行热处理;
此热处理例如为光刻工艺中的前烘过程。 如图 3所示, 黑矩阵用光刻胶 层 20中均匀分散的多个第一液体的液滴 6经热处理被蒸发,从而形成具有多 个微孔 7的黑矩阵薄膜层。 所形成的微孔为均匀分散的。 图 3仅为示意图, 在黑矩阵薄膜层的厚度方向上可具有多层(个)微孔, 并非示意图中所示仅 一层。
其中,所述热处理温度可以为 100-120°C ,热处理的时间可以为 90-240s。 步骤 104: 对完成步骤 103的基板进行曝光, 并经显影和热处理后, 形 成黑矩阵图案 22。
如图 4所示, 首先, 釆用刻画有图形的掩模板对基板进行曝光, 然后, 对曝光后的基板进行显影和热处理(即后烘过程)后, 便形成了含有微孔 7 的黑矩阵图案 22。
其中, 所述热处理的温度可以为 150-250 °C , 热处理的时间可以为 20-60min。
从图 5可以看出, 光线入射到黑矩阵图案 22中的微孔 7后, 会在微孔 7
中进行多次的散射, 如此, 提高了黑矩阵 22的光密度。
本发明实施例还提供一种彩色滤光片, 参照图 6, 所述彩色滤光片包括: 基板 10、 以及依次形成于基板 10上的黑矩阵图案 22、 像素树脂层 30、 透明 导电层 40和柱状隔垫物 50, 其中, 黑矩阵图案 22中形成有微孔 7。
该彩色滤光片的制作方法除了包括前述黑矩阵图案 22 的制作步骤例如 还包括釆用光刻工艺或喷墨方式在黑矩阵所围成的像素区域内形成像素树脂 层, 所述像素树脂层包括红色像素树脂层1、 绿色像素树脂层 G和蓝色像素 树脂层 B;釆用沉积或电镀的方式在黑矩阵和像素树脂层上形成透明导电层; 以及, 釆用光刻工艺在透明导电层上形成柱状隔垫物。
本发明实施例还提供一种显示装置, 所述显示装置包括阵列基板、 上述 实施例提供的彩色滤光片, 以及, 填充在所述阵列基板和所述彩色滤光片之 间的液晶层。
综上所述, 本发明实施例在黑矩阵用光刻胶中加入第一液体, 通过超声 波振荡形成乳液状光刻胶, 釆用光刻工艺形成黑矩阵图案。 在形成黑矩阵图 案过程中, 分散于其中的多个第一液体的液滴经热处理被蒸发, 从而在黑矩 阵薄膜层中形成多个微孔。 所述微孔增加了光线在黑矩阵图案中的散射, 提 高了黑矩阵图案的光密度。 黑矩阵图案的光密度的提高, 有利于黑矩阵图案 的厚度减小, 节省了黑矩阵用光刻胶的用量, 降低了成本。 黑矩阵图案的厚 度的减小, 有利于减小形成像素树脂层时产生的段差, 从而提高彩色滤光片 的平整度。
( 1 )黑矩阵图案的制作方法, 包括:
在黑矩阵用光刻胶中加入第一液体并进行超声波振荡以形成乳液状的黑 矩阵用光刻胶,所述乳液状的黑矩阵用光刻胶中分散有多个第一液体的液滴; 在基板上涂覆一层所述乳液状的黑矩阵用光刻胶;
对涂覆有上述乳液状的黑矩阵用光刻胶的基板进行第一热处理, 使得乳 液状的黑矩阵用光刻胶中的多个第一液体的液滴被蒸发, 从而在基板上形成 包含多个微孔的黑矩阵薄膜层;
釆用掩模板对所述黑矩阵薄膜层进行曝光, 并经显影和第二热处理, 从 而在所述基板上形成所述黑矩阵图案。
(2)根据(1) 的制作方法, 其中:
所述超声振荡的功率为 500-1000W, 持续时间为 20-40分钟。
(3)根据(1) 的制作方法, 其中:
所述第一热处理的温度为 100-120 °C , 持续时间为 90-240秒。
(4)根据(1) 的制作方法, 其中:
所述第二热处理的温度为 150-250°C, 持续时间为 20-60分钟。
(5)根据(1) 的制作方法, 其中:
所述第一液体为纯水。
(6)彩色滤光片, 包括, 基板、 形成在基板上的黑矩阵图案以及形成在 所述黑矩阵图案所围成的像素区域内的像素树脂层, 其中, 所述黑矩阵图案 中形成有微孔。
(7)根据 (6) 的彩色滤光片, 其中:
所述黑矩阵图案按照 (1 )至(5) 中任一项的制作方法制作得到。
(8)根据 (6) 的彩色滤光片, 还包括:
形成在黑矩阵图案和像素树脂层上方的透明导电层和形成在透明导电层 上方的柱状隔垫物。
(9)显示装置, 包括(6)至(8) 中任一项的彩色滤光片。
与现有技术相比, 本发明在黑矩阵用光刻胶中加入第一液体, 通过超声 波振荡形成乳液状光刻胶,釆用光刻工艺形成黑矩阵。在形成黑矩阵过程中, 分散于其中的多个第一液体的液滴经热处理被蒸发, 从而在黑矩阵薄膜层中 形成多个微孔。 所述微孔增加了光线在黑矩阵层中的散射, 提高了黑矩阵的 光密度。 黑矩阵光密度的提高, 有利于黑矩阵厚度的减小, 节省了黑矩阵用 光刻胶的用量, 降低了成本。 黑矩阵厚度的减小, 有利于减小形成像素树脂 层时产生的段差, 从而提高彩色滤光片的平整度。
虽然上文中已经用一般性说明及具体实施方式, 对本发明作了详尽的描 述, 但在本发明基础上, 可以对之作一些修改或改进, 这对本领域技术人员 而言是显而易见的。 因此, 在不偏离本发明精神的基础上所做的这些修改或 改进, 均属于本发明要求保护的范围
Claims
1.黑矩阵图案的制作方法, 包括:
在黑矩阵用光刻胶中加入第一液体并进行超声波振荡以形成乳液状的黑 矩阵用光刻胶,所述乳液状的黑矩阵用光刻胶中分散有多个第一液体的液滴; 在基板上涂覆一层所述乳液状的黑矩阵用光刻胶;
对涂覆有上述乳液状的黑矩阵用光刻胶的基板进行第一热处理, 使得乳 液状的黑矩阵用光刻胶中的多个第一液体的液滴被蒸发, 从而在基板上形成 包含多个微孔的黑矩阵薄膜层; 以及
釆用掩模板对所述黑矩阵薄膜层进行曝光, 并经显影和第二热处理, 从 而在所述基板上形成所述黑矩阵图案。
2. 如权利要求 1所述的制作方法, 其中:
所述超声振荡的功率为 500-1000W, 持续时间为 20-40分钟。
3. 如权利要求 1所述的制作方法, 其中:
所述第一热处理的温度为 100-120 °C , 持续时间为 90-240秒。
4. 如权利要求 1所述的制作方法, 其中:
所述第二热处理的温度为 150-250°C , 持续时间为 20-60分钟。
5. 如权利要求 1所述的制作方法, 其中:
所述第一液体为纯水。
6.彩色滤光片, 包括, 基板、 形成在基板上的黑矩阵图案以及形成在所 述黑矩阵图案所围成的像素区域内的像素树脂层, 其中, 所述黑矩阵图案中 形成有微孔。
7. 如权利要求 6所述的彩色滤光片, 其中:
所述黑矩阵图案按照权利要求 1至 5中任一项所述的制作方法制作得到。
8. 如权利要求 6所述的彩色滤光片, 还包括:
形成在黑矩阵图案和像素树脂层上方的透明导电层和形成在透明导电层 上方的柱状隔垫物。
9. 显示装置, 包括权利要求 6至 8中任一项所述的彩色滤光片。
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