WO2013120839A3 - Device for the magnetic-field-compensated positioning of a component - Google Patents
Device for the magnetic-field-compensated positioning of a component Download PDFInfo
- Publication number
- WO2013120839A3 WO2013120839A3 PCT/EP2013/052763 EP2013052763W WO2013120839A3 WO 2013120839 A3 WO2013120839 A3 WO 2013120839A3 EP 2013052763 W EP2013052763 W EP 2013052763W WO 2013120839 A3 WO2013120839 A3 WO 2013120839A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- component
- field
- magnetic
- compensated positioning
- compensated
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
- G02B7/1827—Motorised alignment
- G02B7/1828—Motorised alignment using magnetic means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Measuring Magnetic Variables (AREA)
Abstract
A device (26) for the magnetic-field-compensated positioning of a component (25, 30) comprises a holding unit (27) for mounting the component (25, 30) and means (33) for at least partly compensating for an external magnetic field in the region of the holding unit (27).
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261598423P | 2012-02-14 | 2012-02-14 | |
US61/598423 | 2012-02-14 | ||
DE201210202167 DE102012202167A1 (en) | 2012-02-14 | 2012-02-14 | Device for magnetic-field-compensated positioning of a component |
DE102012202167.1 | 2012-02-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2013120839A2 WO2013120839A2 (en) | 2013-08-22 |
WO2013120839A3 true WO2013120839A3 (en) | 2013-12-27 |
Family
ID=48868362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2013/052763 WO2013120839A2 (en) | 2012-02-14 | 2013-02-12 | Device for the magnetic-field-compensated positioning of a component |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102012202167A1 (en) |
WO (1) | WO2013120839A2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013215203A1 (en) * | 2013-08-02 | 2014-08-28 | Carl Zeiss Smt Gmbh | Holder for mirror assembly of projection exposure system, has base body including magnet, which is arranged such that magnetic field is created in region of support surface |
DE102014216631A1 (en) * | 2014-08-21 | 2016-02-25 | Carl Zeiss Smt Gmbh | Microlithographic projection exposure apparatus, mirror module therefor, and method for operating the mirror module |
DE102015204995A1 (en) | 2015-03-19 | 2015-06-03 | Carl Zeiss Smt Gmbh | Apparatus and method for processing ceramic components, in particular mirror surface carriers |
DE102015208515A1 (en) | 2015-05-07 | 2015-07-09 | Carl Zeiss Smt Gmbh | Method and device for the revision of mirror surface carriers, as well as correspondingly processed mirror surface support itself |
DE102015211474A1 (en) * | 2015-06-22 | 2016-07-07 | Carl Zeiss Smt Gmbh | ACTUATOR DEVICE FOR A LITHOGRAPHIC SYSTEM AND LITHOGRAPHIC SYSTEM |
DE102016226079A1 (en) | 2016-12-22 | 2018-06-28 | Carl Zeiss Smt Gmbh | Method for positioning a component of an optical system |
DE102017200793A1 (en) | 2017-01-19 | 2018-01-11 | Carl Zeiss Smt Gmbh | Mirror system and projection exposure system |
DE102019218305B4 (en) | 2019-11-26 | 2022-02-24 | Carl Zeiss Smt Gmbh | Method for compensating for excitations when storing a component of a projection exposure system |
DE102021208879A1 (en) * | 2021-08-13 | 2023-02-16 | Carl Zeiss Smt Gmbh | OPTICAL ELEMENT, PROJECTION OPTICS AND PROJECTION EXPOSURE SYSTEM |
DE102022209902A1 (en) * | 2022-09-20 | 2024-03-21 | Carl Zeiss Smt Gmbh | BIPOD, OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020153495A1 (en) * | 2001-04-21 | 2002-10-24 | Nikon Corporation. | Magnetically shielded enclosures for housing charged-particle-beam systems |
US20110181851A1 (en) * | 2008-09-19 | 2011-07-28 | Carl Zeiss Smt Gmbh | Temperature-control device for an optical assembly |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
WO2005026801A2 (en) * | 2003-09-12 | 2005-03-24 | Carl Zeiss Smt Ag | Apparatus for manipulation of an optical element |
DE102006036064A1 (en) | 2006-08-02 | 2008-02-07 | Carl Zeiss Smt Ag | Illumination system for a projection exposure apparatus with wavelengths ≦ 193 nm |
EP2397905A1 (en) * | 2010-06-15 | 2011-12-21 | Applied Materials, Inc. | Magnetic holding device and method for holding a substrate |
DE102011006100A1 (en) * | 2011-03-25 | 2012-09-27 | Carl Zeiss Smt Gmbh | Mirror array |
-
2012
- 2012-02-14 DE DE201210202167 patent/DE102012202167A1/en not_active Ceased
-
2013
- 2013-02-12 WO PCT/EP2013/052763 patent/WO2013120839A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020153495A1 (en) * | 2001-04-21 | 2002-10-24 | Nikon Corporation. | Magnetically shielded enclosures for housing charged-particle-beam systems |
US20110181851A1 (en) * | 2008-09-19 | 2011-07-28 | Carl Zeiss Smt Gmbh | Temperature-control device for an optical assembly |
Also Published As
Publication number | Publication date |
---|---|
WO2013120839A2 (en) | 2013-08-22 |
DE102012202167A1 (en) | 2013-08-14 |
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