WO2013117130A1 - 无金属电极层非搭接一体式电容触摸屏及其制造方法 - Google Patents

无金属电极层非搭接一体式电容触摸屏及其制造方法 Download PDF

Info

Publication number
WO2013117130A1
WO2013117130A1 PCT/CN2013/070866 CN2013070866W WO2013117130A1 WO 2013117130 A1 WO2013117130 A1 WO 2013117130A1 CN 2013070866 W CN2013070866 W CN 2013070866W WO 2013117130 A1 WO2013117130 A1 WO 2013117130A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
ito
touch screen
layer
thickness
Prior art date
Application number
PCT/CN2013/070866
Other languages
English (en)
French (fr)
Inventor
曹晓星
Original Assignee
深圳市宝明科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市宝明科技股份有限公司 filed Critical 深圳市宝明科技股份有限公司
Publication of WO2013117130A1 publication Critical patent/WO2013117130A1/zh

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to the field of capacitive touch screen technologies, and in particular, to a non-lapped integrated capacitive touch screen without a metal electrode layer and a method of fabricating the same. Background technique
  • touch screens With the development of electronic technology, keyboards or mice for mobile phones, digital cameras, handheld game consoles, car DVDs, MP3s, instrumentation, etc. are gradually being replaced by touch screens.
  • the products of touch screens were not very hot a few years ago, and with the increasing contact with touch screen products, they have been recognized by more people in the past two years, and the speed of development has gradually accelerated.
  • the rapid growth of the touch screen has not only stimulated more intense industry competition, but also indirectly promoted the development of technology. Its multi-touch operation method has increased the influence of touch screen products to a new height, and has gradually been adopted by people. Concerned.
  • the touch screen is mainly composed of a touch detecting component and a touch screen controller.
  • the touch detecting component is installed in front of the display screen for detecting the touch position of the user, and is sent to the touch screen controller after receiving; and the main function of the touch screen controller is to receive from the touch point detecting device. Touch the information, convert it to the contact coordinates, and send it to the CPU. It can also receive commands from the CPU and execute them.
  • the touch screen can be divided into four types: resistive type, capacitive sensing type, infrared type and surface acoustic wave type.
  • resistive type capacitive sensing type
  • infrared type infrared type
  • surface acoustic wave type Currently, a resistive touch screen is widely used, which uses pressure sensing. Resistively controlled; Resistive touch screen is a multi-layer composite film, the main part of which is a resistive film screen that closely matches the surface of the display.
  • the resistive film screen is a layer of glass or hard plastic plate as a base layer coated with a transparent oxidized metal (transparent conductive resistor) ITO (Indium Tin Oxide) conductive layer, which is covered with an outer surface hardened smooth anti-scratch
  • ITO Indium Tin Oxide
  • the plastic layer whose inner surface is also coated with an ITO coating, has a number of small (less than 1/1000 inch) transparent isolation points between them to insulate the two conductive layers, when the finger touches the screen, two
  • the layer conductive layer has contact at the touch point position, the resistance changes, and a signal is generated in both X and Y directions, and then sent to the touch screen controller, and the controller detects the contact and calculates (X, Y) Position, then operate according to the way the mouse is simulated.
  • the basic principle of the capacitive touch screen is to use the current sensing of the human body.
  • the capacitive touch screen is a two-layer composite glass screen.
  • the inner surface of the glass screen is coated with a bismuth (indium tin oxide) conductive film (coated conductive glass).
  • the outer layer is a thin layer of bauxite glass protective layer, the ⁇ coating is used as the working surface, and four electrodes are led out at the four corners.
  • the capacitor is a direct conductor, so the finger sucks a small current from the contact point, which flows out from the electrodes on the four corners of the touch screen, and the current flowing through the four electrodes and the fingers to the four corners In proportion to the distance, the controller calculates the position of the touch point by accurately calculating the ratio of the four currents.
  • the projected capacitive touch screen is a widely used one, which has the characteristics of simple structure and high light transmittance.
  • a touch sensing component of a projected capacitive touch screen typically has a plurality of row and column electrodes staggered to form an inductive matrix.
  • the commonly used design method includes disposing the row electrode and the column electrode on both sides of the same transparent substrate to prevent short circuit at the staggered position; or disposing the row electrode and the column electrode on the same side of the same transparent substrate to form the same conductive film ( Generally, it is an ITO conductive film), and the row electrode and the column electrode are separated by providing an insulating layer at a position where the row electrode and the column electrode are staggered, and the row electrode and the column electrode are separated to ensure conduction in respective directions, which is effective. Prevent it from shorting in the staggered position.
  • a commonly adopted design is: one of the row electrodes or the column electrodes is continuously disposed on the conductive film, and the other electrode is disposed on the conductive film at intervals of electrodes arranged in a plurality of electrode blocks, and the conductive bridge is disposed at the position of the staggered point.
  • the adjacent electrode blocks are electrically connected to form a continuous electrode in the other direction; the conductive bridge is separated from the continuously disposed electrodes by an insulating layer, thereby effectively preventing the row electrode and the column electrode from being short-circuited at the staggered point.
  • the commonly adopted design scheme is as follows: (1) The laminated structure is a transparent substrate, a first direction electrode, an insulating layer, and a conductive bridge; or (2) the laminated structure is a transparent substrate, a conductive bridge, an insulating layer, and a first direction electrode.
  • the capacitive touch screen adopting the traditional design scheme may have the defects of low light transmittance and poor working stability.
  • the transmittance of the capacitive touch screen of the conventional design scheme is difficult to break through 80%, and the whole force is bent and deformed easily. Separation occurs at the interface, causing the electrode to open the touch to fail and the touch sensing component to be damaged.
  • One of the objectives of the present invention is to provide a non-lapped integrated capacitive touch screen without a metal electrode layer, which can effectively reduce the production cost and improve the reliability of the capacitive touch screen by rationally designing the laminated structure and the conduction mode of the capacitive touch screen. Sex, work stability.
  • the present invention adopts the following technical solutions:
  • a non-lapped integrated capacitive touch screen without a metal electrode layer comprising a transparent substrate, a black resin layer, an ITO electrode and an insulating layer laminated on the transparent substrate in sequence; wherein the ITO electrode is a horizontal or vertical conduction electrode;
  • the ITO electrode is composed of an ITO conductive electrode 1 and an ITO conductive electrode 2, and the ITO conductive electrode 1 and the ITO conductive electrode 2 are on the same layer, independent of each other, insulated from each other, and staggered;
  • the transparent substrate includes In the window area and non-window area, the black resin layer is distributed in the non-window area of the display.
  • the non-lap-on integrated touch screen is simplified in structure and production process, reducing the bridge or through-hole process required for the traditional lap-type integrated capacitive screen, reducing production costs and shortening process time .
  • the touch mode that can be realized by the non-lap-on integrated touch screen is single-touch and gesture recognition, and the lap-connected integrated (cross-bridge and through-hole) can achieve multi-touch (two or more points) and Gesture Recognition.
  • the non-lapped integrated capacitive touch screen and the non-lapped integrated touch screen without metal electrode layer are simplified in structure and production process, eliminating metal electrodes, reducing material cost, reducing the production process, and the touch function. Single touch and gesture recognition are available on both.
  • the maximum value of the conductive surface resistance of the ⁇ is much smaller than that of the non-lapped integrated touch screen.
  • the transparent substrate is a chemically strengthened glass substrate or a resin material substrate having a thickness of between 0.5 and 2.0 mm; the regular structure of the ITO electrode is triangular, or strip-shaped, or elliptical.
  • the black resin region has a trapezoidal structure with an intermediate thickness of 0.3um ⁇ 5um, and the edge bevel angle is between 6 and 60 degrees, and the angle is gentle.
  • the purpose is that the ITO electrode (ITO conduction electrode 1 and ITO conduction electrode 2) pass through the slope.
  • the ITO electrode is not broken due to a large difference in thickness.
  • the black resin layer can effectively block non- The visible area of the layer can be shaded, visible under the product such as wires.
  • the insulating layer protects the ITO electrode from being insulated from air.
  • a second object of the present invention is to provide a method for manufacturing a non-overlap integrated capacitive touch screen, which adopts the following technical solutions:
  • the black resin is uniformly coated on a transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the desired black resin area; the black resin area has a trapezoidal structure with an intermediate thickness of
  • the edge bevel angle is between 6 ⁇ 60 degrees, and the angle is gentle.
  • the purpose is that the ITO electrode (ITO conduction electrode 1 and ITO conduction electrode 2) will not break due to the thickness difference when the ITO electrode passes through the slope.
  • the black resin area is a non-window area of the display screen, and the purpose is to block the visible object underneath; the black resin is a photosensitive protective layer photoresist (commercially produced by Taiwan Everlight Chemical Institute EK410), which is a black negative photoresist material.
  • a transparent substrate forming a black resin layer is subjected to ITO coating to form a transparent and uniform thickness ITO film layer on the glass substrate, the thickness of which is 80 to 2000 angstroms (face resistance is 10 to 270 ohms); after ITO coating
  • the transparent substrate is coated on the surface of the ITO with a uniform thickness of the positive photoresist material, and the photoresist coating thickness is lum ⁇ 5um;
  • a thickness of 80 to 2000 angstroms (face resistance of 10 to 270 ohms) and a regular ITO pattern or electrode are formed;
  • the ITO electrode is a horizontal or vertical conduction electrode and has a regular pattern structure; the ITO electrode is composed of an ITO conduction electrode 1 and an ITO conduction electrode 2, and the ITO conduction electrode 1 and the ITO conduction electrode 2 are on the same level. , independent of each other, insulated from each other, staggered design;
  • the transparent substrate after the ITO electrode is coated with a uniform thickness of the negative photoresist material on the surface of the metal film, and the photoresist coating thickness is 0.5 um ⁇ 3 um;
  • the ITO is composed of In203 and Sn02, and the mass ratio thereof is 85 to 95: 5 to 15.
  • the ITO coating method can be vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, or sol gel.
  • the main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and positive photosensitive agent (trade name is TR400 produced by Taiwan New Materials Co., Ltd.); the main component of negative photoresist material is acetic acid Propylene glycol monomethyl ether ester, acrylic resin, epoxy resin and negative photosensitive agent (trade name: Taiwan Daxing Co., Ltd. POC A46) Coating photoresist materials are roller coating, spin coating, scraping and other methods.
  • the present invention has the following advantages and beneficial effects:
  • the invention realizes the touch function signal electrode and the black resin covering layer on a transparent substrate by reasonably setting the laminated structure, thereby greatly improving the yield of the product, reducing the cost, and improving the reliability of the product.
  • the thickness of the substrate is between 0.5mm and 2.0mm, and has the advantages of thin thickness and light weight; and the reasonable design of each layer makes the product reliability stable and the product yield is high.
  • the non-lapped integrated capacitive touch screen and the non-lapped integrated touch screen without the metal electrode layer are simplified in structure and production process, the metal electrode is eliminated, the material cost is reduced, and the production process is reduced.
  • Single touch and gesture recognition are available on the touch function.
  • FIG. 1 is a schematic structural view of a capacitive touch screen according to the present invention.
  • FIG. 2 is a schematic structural view of a glass substrate according to an embodiment of the present invention.
  • Figure 3 is a partial enlarged structural view
  • Figure 4 is a schematic cross-sectional structure
  • Fig. 5 is a cross-sectional view showing the structure of a metal-free electrode layer non-overlap integrated capacitive touch panel according to the present invention. detailed description
  • the non-lapped integrated capacitive touch screen capacitive touch screen of the metal-free electrode layer comprises a chemically strengthened glass substrate or a resin material substrate having a thickness of between 0.5 mm and 2.0 mm.
  • the black resin layer 12, the ITO electrode 13, and the insulating layer 14 are sequentially laminated on the transparent substrate; the ITO electrode is a horizontal or vertical conduction electrode, and has a regular pattern structure; the ITO electrode is an ITO conduction electrode 1 and
  • the ITO conduction electrode 2 is composed of the ITO conduction electrode 1 and the ITO conduction electrode 2 on the same layer, independent of each other, insulated from each other, and staggered.
  • the transparent substrate includes a window area and a non-window area, and the black resin layer is distributed in the non-window area of the display screen.
  • the black resin layer effectively blocks the layers in the non-visible area, and can be shielded from visible objects under the product such as wires and wires.
  • FIG. 3 to FIG. 5 are schematic diagrams showing a partial structure or a cross-sectional structure of the capacitive touch screen according to the embodiment: the ITO electrode 13 includes an ITO conductive electrode 1 42 and an ITO conductive electrode 2 43; and the insulating layer 45 protects the ITO conductive layer.
  • the edges of the through electrode 1 42 and the ITO via electrode 2 43 are routed to be insulated from the air.
  • the preparation process is as follows:
  • the black resin is uniformly coated on a transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the black resin is uniformly coated on the transparent glass substrate 41 ( 11 ) by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 ⁇ m, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the black resin area is required; the black resin area has a trapezoidal structure with an intermediate thickness of 0.3um ⁇ 5um, and the edge bevel angle is between 6 ⁇ 60 degrees, and the angle is gentle.
  • the purpose is ITO electrode (ITO conduction electrode 1 and ITO conduction) When the electrode 2) passes through the slope, the ITO electrode is not broken due to the large difference in thickness.
  • the black resin area is a non-window area of the display screen, and the purpose is to block the metal electrode;
  • the pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from lOOmj to 500mj, the developer is Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees.
  • Hard baked through the black resin layer the condition is 200 degrees to 300 degrees, the time is half an hour to 3 small
  • a black resin layer 51 having a thickness of 0.3 um to 5 um and having a regular pattern is finally formed.
  • a transparent substrate forming a black resin layer is formed by ITO coating to form a transparent and uniform thickness ITO film layer having a thickness of 80 to 2000 angstroms (face resistance is 10 to 270 ohms); ITO material is composed of In203 It is composed of Sn02 and its mass ratio is 85 ⁇ 95: 5 ⁇ 15.
  • the ITO coating methods include vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, and sol gel.
  • the ITO coated glass substrate is coated with a uniform thickness of positive photoresist material on the surface of the ITO.
  • the main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and photosensitive material;
  • the thickness of the cloth is lum ⁇ 5um. Coating photoresist materials are by roller coating, spin coating, and scraping.
  • the product is pre-baked, exposed, developed, etched, and stripped to a thickness of 80 to 2000 angstroms (face resistance of 10 to 270 ohms) and a regular ITO pattern or electrode.
  • the pre-bake temperature and time range is from 60 degrees to 150 degrees, from 50 seconds to 200 seconds, and the exposure energy is from lOOmj to 500mj.
  • the developer is made of Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees.
  • the ITO etching solution is a mixture of hydrochloric acid and nitric acid in a certain ratio, so that the pH of the acid falls between 1 and 3, and the etching temperature is between 40 and 50 degrees.
  • the photo-resist film solution is prepared by mixing dimethyl sulfoxide and ethanolamine in a certain ratio, the percentage is 70%: 30%, and the release temperature is between 40 and 80 degrees.
  • the ITO electrode is a horizontal or vertical conduction electrode and has a regular pattern structure; the ITO electrode is composed of an ITO conduction electrode 1 and an ITO conduction electrode 2, and the ITO conduction electrode 1 and the ITO conduction electrode 2 are on the same level. , independent of each other, insulated from each other, staggered design.
  • the glass substrate after passing through the ITO electrode is coated with a uniform thickness of negative photoresist material on the surface of the metal film.
  • the main components of the negative photoresist material are propylene glycol monomethyl ether acetate, acrylic resin, epoxy resin and negative photosensitive agent; the photoresist coating thickness is 0.5um ⁇ 3um.
  • the method of applying the negative photoresist material is spin coating, scraping, and the like.
  • the product is pre-baked, exposed, and developed by photoresist, and finally forms a pattern of a thickness of 0.5 to 3 um and a regular insulating layer.
  • Pre-bake temperature and time range: 60 degrees to 150 degrees, 50 seconds to 200 seconds, The exposure energy is from 100m to 500mj, the developer is Na-based or Ka-based alkaline solution, and the development temperature is operated at a constant temperature of 20 to 40 degrees. After hard baking through the insulating layer, the condition is 200 to 300 degrees, and the time is 0.5 hours to 3 hours. After the above process, a second insulating layer having a thickness of 0.5 um to 3 um and a regular pattern is finally formed.
  • the non-lapped integrated capacitive touch screen and the non-lapped integrated touch screen without metal electrode layer are simplified in structure and production process, eliminating metal electrodes, reducing material cost, reducing the production process, and the touch function. Single touch and gesture recognition are available on both.
  • the maximum value of the ITO conductive surface resistance is much smaller than that of the non-lapped integrated touch screen ITO surface resistance.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

本发明公开了一种无金属电极层非搭接一体式电容触摸屏及其制造方法，所述无金属电极层非搭接一体式电容触摸屏包括透明基板，依次层叠于透明基板的黑色树脂层、ITO电极、绝缘层；所述的ITO电极为水平方向或垂直方向导通电极，具有规则图形结构；ITO电极为ITO导通电极1与ITO导通电极2 组成，ITO导通电极1与ITO导通电极2在同一层面，相互独立，相互绝缘，交错设计；所述透明基板包括视窗区和非视窗区，黑色树脂层分布在显示屏非视窗区。本发明通过对电容触摸屏的层叠结构导通方式进行合理的设计，有效降低生产成本、提高电容式触摸屏的可靠性，工作稳定性。

Description

无金属电极层非搭接一体式电容触摸屏及其制造方法 技术领域
本发明涉及电容触摸屏技术领域， 尤其是涉及一种无金属电极层的非搭接 一体式电容触摸屏及其制造方法。 背景技术
随着电子科技的发展， 目前手机、 数码相机、 掌上游戏机、 车载 DVD、 MP3、 仪表仪器等的键盘或鼠标逐渐被触摸屏替代。 触摸屏的产品在几年前并 不是十分火热， 而随着人们对于触屏产品的接触越来越多， 近两年也被更多人 所认可， 发展速度逐渐加快。 触摸屏迅速的成长， 不仅激起了更加激烈的行业 竞争， 也间接推动了技术的发展， 其多点触控的操作方式更是把触摸屏产品的 影响力提升到了一个新的高度， 也逐渐被人们所关注起来。
触摸屏主要由触摸检测部件和触摸屏控制器组成， 触摸检测部件安装在显 示器屏幕前面， 用于检测用户触摸位置， 接收后送触摸屏控制器； 而触摸屏控 制器的主要作用是从触摸点检测装置上接收触摸信息， 并将它转换成触点坐标， 再送给 CPU, 它同时能接收 CPU发来的命令并加以执行。
按照触摸屏的工作原理和传输信息的介质， 触摸屏可分为四种， 分别为电 阻式、 电容感应式、 红外线式以及表面声波式， 当前被广泛使用的是电阻式触 摸屏， 它是利用压力感应进行电阻控制的； 电阻式触摸屏是一种多层的复合薄 膜， 它的主要部分是一块与显示器表面非常配合的电阻薄膜屏。 电阻薄膜屏是 以一层玻璃或硬塑料平板作为基层， 表面涂有一层透明氧化金属 （透明的导电 电阻） ITO (氧化铟锡） 导电层， 上面再盖有一层外表面硬化处理光滑防擦的塑 料层，它的内表面也涂有一层 ITO涂层，在它们之间有许多细小的（小于 1/1000 英寸） 的透明隔离点把两层导电层隔开绝缘， 当手指触摸屏幕时， 两层导电层 在触摸点位置就有了接触， 电阻发生变化， 在 X和 Y两个方向上产生信号， 然 后送触摸屏控制器， 控制器侦测到这一接触并计算出 （X, Y) 的位置， 再根据 模拟鼠标的方式运作。 电容式触摸屏的基本原理是利用人体的电流感应进行工作的， 电容式触摸 屏是一块二层复合玻璃屏，玻璃屏的内表面夹层涂有 ΠΌ (氧化铟锡 )导电膜（镀 膜导电玻璃） ， 最外层是一薄层矽土玻璃保护层， ιτο涂层作为工作面， 四个角 上引出四个电极， 当手指触摸在屏幕上时， 由于人体电场， 用户和触摸屏表面 形成一个耦合电容， 对于高频电流来说， 电容是直接导体， 于是手指从接触点 吸走一个很小的电流， 这个电流分别从触摸屏的四角上的电极中流出， 并且流 经这四个电极的电流与手指到四角的距离成正比， 控制器通过对这四个电流比 例的精确计算， 得出触摸点的位置。
在电容式触摸屏中， 投射式电容触摸屏是当前应用较为广泛的一种， 具有 结构简单， 透光率高等特点。 投射式电容触摸屏的触摸感应部件一般为多个行 电极和列电极交错形成感应矩阵。 通常采用的设计方式包括将行电极和列电极 分别设置在同一透明基板的两面， 防止在交错位置出现短路； 或者将行电极和 列电极设置在同一透明基板的同侧， 形成于同一导电膜 （通常为 ITO导电膜） 上， 在行电极和列电极交错的位置通过设置绝缘层并架导电桥的方式隔开， 将 行电极和列电极隔开并保证在各自的方向上导通， 可以有效的防止其在交错位 置短路。
通常采用的设计方案为： 行电极或者列电极之一在导电膜上连续设置， 则 另一个电极在导电膜上以连续设置的电极为间隔设置成若干电极块， 在交错点 的位置通过导电桥将相邻的电极块电连接， 从而形成另一方向上的连续电极； 导电桥与连续设置的电极之间由绝缘层分隔， 从而有效的阻止行电极和列电极 在交错点短路。 通常采用的设计方案为： （1 ) 层叠结构依次为透明基板、 第一 方向电极、 绝缘层、 导电桥； 或者 （2) 层叠结构依次为透明基板、 导电桥、 绝 缘层、 第一方向电极。
但采用传统的设计方案的电容式触摸屏会存在透光率不高以及工作稳定性 差的缺陷， 传统的设计方案的电容式触摸屏透光率很难突破 80%, 且整体受力 弯曲变形时， 容易在界面出现分离， 导致电极断路触摸失效， 触摸感应部件损 坏。 发明内容
本发明的目的之一在于提供一种无金属电极层的非搭接一体式电容触摸 屏， 通过对电容触摸屏的层叠结构及导通方式进行合理的设计， 有效降低生产 成本， 提高电容式触摸屏的可靠性， 工作稳定性。
为实现上述目的， 本发明采用如下技术方案：
一种无金属电极层的非搭接一体式电容触摸屏， 包括透明基板， 依次层叠 于透明基板的黑色树脂层、 ITO电极、 绝缘层； 所述的 ITO电极为水平方向或 垂直方向导通电极， 具有规则图形结构； ITO电极为 ITO导通电极 1与 ITO导 通电极 2组成， ITO导通电极 1与 ITO导通电极 2在同一层面， 相互独立， 相 互绝缘， 交错设计； 所述透明基板包括视窗区和非视窗区， 黑色树脂层分布在 显示屏非视窗区。
非搭接一体式触摸屏在结构上与生产工艺上都有所简化， 减少了与传统的 搭接式一体式电容屏所需要的过桥或通孔工艺， 降低了生产成本和缩短了工艺 生产时间。 非搭接一体式触摸屏所能实现的触摸方式为单点触摸和手势识别， 而搭接式一体式 (过桥方式与通孔方式)所能实现的方式为多点触摸 (两点以上)和 手势识别。
无金属电极层的非搭接一体式电容触摸屏与非搭接一体式触摸屏在结构上 与生产工艺上都有所简化， 取消了金属电极， 降低了材料成本， 减少了上产流 程， 在触摸功能上均可实现单点触摸和手势识别。
无金属电极层的非搭接一体式电容触摸屏由于无金属电极， 其 ιτο导通电 极面阻的极大值远小于非搭接一体式触摸屏 ιτο面阻。
优选的是：
所述的透明基板为厚度在厚度 0.5~2.0毫米之间的化学强化玻璃基板或树脂 材料基板； 所述 ITO电极规则结构为三角形， 或条形， 或椭圆形。
黑色树脂区域呈梯形结构， 中间厚度为 0.3um~5um， 其边缘斜角为 6~60度 之间， 角度平缓， 目的为 ITO电极 (ITO 导通电极 1与 ITO 导通电极 2)通过斜 坡时不会由于厚度差异大导致 ITO电极断裂。 所述的黑色树脂层可有效遮挡非 可视区的图层， 可以遮光， 导线等产品下方的可见物。 绝缘层保护保护 ITO电 极使之与空气绝缘。
本发明的目的之二在于提供一种非搭接一体式电容触摸屏的制造方法， 采 用如下技术方案：
黑色树脂层的形成： 将黑色树脂经过旋转涂布方式或刮式涂布方式均匀涂 布在透明基板上， 涂布厚度为 0.3um~5um， 经过加热器预烤， 曝光， 显影， 使 之形成所需的黑色树脂区域； 黑色树脂区域呈梯形结构， 中间厚度为
0.3um~5um， 其边缘斜角为 6~60度之间， 角度平缓， 目的为 ITO电极 (ITO导通 电极 1与 ITO导通电极 2)通过斜坡时不会由于厚度差异大导致 ITO电极断裂。 黑色树脂区域为显示屏非视窗区， 目的为遮挡下方可见物； 所述黑色树脂是感 光性保护层光阻剂（商品为台湾永光化学所生产 EK410), 是一种黑色负性光阻 材料， 主要成分为： 亚克力树脂， 环氧树脂， 负性感光剂， 乙酸丙二醇单甲基 醚酯及黑色颜料， 具体比例为树脂类： 乙酸丙二醇单甲基醚酯： 黑色颜料及负 性感光剂 =15~30： 60-80： 1~10。
ITO电极层的形成：
形成黑色树脂层的透明基板， 经过 ITO镀膜， 使在玻璃基板上形成一层透 明及厚度均匀的 ITO膜层， 其厚度为 80~2000埃米 (面电阻为 10~270欧姆)； 经过 ITO镀膜的透明基板， 在其 ITO表面涂布一层厚度均匀的正性光阻材 料， 光阻涂布厚度为 lum~5um;
经过光阻预烤， 曝光， 显影， 蚀刻， 脱光阻膜， 最终形成厚度为 80~2000 埃米 (面电阻为 10~270欧姆)及规则 ITO图案或电极；
所述的 ITO电极为水平方向或垂直方向导通电极， 具有规则图形结构； ITO 电极为 ITO导通电极 1与 ITO导通电极 2组成， ITO导通电极 1与 ITO导通电 极 2在同一层面， 相互独立， 相互绝缘， 交错设计；
绝缘层的形成：
经过 ITO 电极后的透明基板， 在其金属膜面涂布一层厚度均匀的负性光阻 材料， 光阻涂布厚度为 0.5um~3um;
经过光阻预烤， 曝光， 显影， 最终形成厚度为 0.5~3um和规则的绝缘层图 案。
所述的 ITO由 In203和 Sn02组成， 其质量比为 85~95： 5~15。 ITO镀膜的 方式可以采用真空磁控溅镀， 化学气相沉积法， 热蒸镀， 溶胶凝胶。
所述的正性光阻材料主成分为乙酸丙二醇单甲基醚酯， 环氧树脂及正性感 光剂 （商品名为台湾新应材公司生产的 TR400); 负性光阻材料主成分为乙酸丙 二醇单甲基醚酯， 亚克力树脂， 环氧树脂及负性感光剂 （商品名为台湾达兴公 司生产 POC A46) 涂布光阻材料方式有滚涂， 旋涂， 刮涂等方式。
本发明与现有技术相比， 具有如下优点和有益效果：
本发明通过对层叠结构进行合理的设置， 在一层透明基板上完成触摸功能 信号电极和黑色树脂覆盖层， 大幅提升了产品的良率， 降低成本， 提升产品可 靠性。 本发明中基板厚度 0.5mm~2.0mm之间， 具有厚度薄， 质量轻等优势； 通 过对各层的合理设计， 使得产品可靠性稳定， 产品良率高。
本发明中无金属电极层的非搭接一体式电容触摸屏与非搭接一体式触摸屏 在结构上与生产工艺上都有所简化， 取消了金属电极， 降低了材料成本， 减少 了上产流程， 在触摸功能上均可实现单点触摸和手势识别。 附图说明
图 1为本发明所述的电容触摸屏的结构示意图；
图 2为本发明实施例所述的玻璃基板结构示意图；
图 3为局部放大结构示意图；
图 4为剖面结构示意图；
图 5为本发明所述的无金属电极层非搭接一体式电容触摸屏的剖面结构示 意图。 具体实施方式
下面结合具体实施例对本发明作进一步详细说明。
如图 1及图 2所示， 所述的无金属电极层的非搭接一体式电容触摸屏电容 触摸屏， 包括厚度在 0.5mm~2.0mm之间的化学强化玻璃基板或树脂材料基板 11，依次层叠于透明基板的黑色树脂层 12、 ITO电极 13、绝缘层 14;所述的 ITO 电极为水平方向或垂直方向导通电极， 具有规则图形结构； ITO电极为 ITO导 通电极 1与 ITO导通电极 2组成， ITO导通电极 1与 ITO导通电极 2在同一层 面， 相互独立， 相互绝缘， 交错设计。 透明基板包括视窗区和非视窗区， 黑色 树脂层分布在显示屏非视窗区。
黑色树脂层可有效遮挡非可视区的图层， 可以遮光， 金属线等产品下方的 可见物。
图 3至图 5所示为本实施例所述电容触摸屏的局部结构放大示意图或者剖 面结构示意图： ITO电极 13包括 ITO导通电极 1 42和 ITO 导通电极 2 43; 绝 缘层 45保护保护 ITO导通电极 1 42和 ITO 导通电极 2 43的边缘走线， 使之与 空气绝缘。
其制备工艺如下：
黑色树脂层的形成： 将黑色树脂经过旋转涂布方式或刮式涂布方式均匀涂 布在透明基板上， 涂布厚度为 0.3um~5um， 经过加热器预烤， 曝光， 显影， 使 之形成所需的黑色树脂区域；
将黑色树脂经过旋转涂布方式或刮式涂布方式均匀涂布在透明玻璃基板 41 ( 11 ) 上， 涂布厚度为 0.3um~5um， 经过加热器预烤， 曝光， 显影， 使之形成 所需的黑色树脂区域； 黑色树脂区域呈梯形结构， 中间厚度为 0.3um~5um， 其 边缘斜角为 6~60度之间， 角度平缓， 目的为 ITO电极 (ITO导通电极 1和 ITO 导通电极 2)通过斜坡时不会由于厚度差异大导致 ITO电极断裂。 黑色树脂区域 为显示屏非视窗区， 目的为遮挡金属电极； 所述黑色树脂是感光性保护层光阻 剂（商品为台湾永光化学所生产 EK410), 是一种黑色负性光阻材料， 主要成分 为:亚克力树脂， 环氧树脂， 负性感光剂， 乙酸丙二醇单甲基醚酯及黑色颜料， 具体比例为树脂类： 乙酸丙二醇单甲基醚酯： 黑色颜料及负性感光剂 =15~30： 60-80： 1~10。
预烤温度及时间范围为: 60度~150度， 50秒到 200秒， 曝光能量采用 lOOmj 到 500mj， 显影液采用 Na系或 Ka系碱性溶液， 显影之温度采用 20~40度恒温 作业。 再经过黑色树脂层硬烤， 条件为 200度到 300度， 时间为半小时到 3小 时， 经过上述制程后， 最终形成厚度为 0.3um~5um， 图形规则的黑色树脂层 51。 ITO电极层的形成：
形成黑色树脂层的透明基板， 经过 ITO镀膜， 使在基板上形成一层透明及 厚度均匀的 ITO膜层， 其厚度为 80~2000埃米 (面电阻为 10~270欧姆)； ITO材 料由 In203和 Sn02组成， 其质量比为 85~95： 5~15。 ITO镀膜的方式有真空磁 控溅镀， 化学气相沉积法， 热蒸镀， 溶胶凝胶。
经过 ITO镀膜的玻璃基板， 在其 ITO表面涂布一层厚度均匀的正性光阻材 料， 正性光阻材料主成分为乙酸丙二醇单甲基醚酯， 环氧树脂及感光材料； 光 阻涂布厚度为 lum~5um。 涂布光阻材料方式有滚涂， 旋涂， 刮涂等方式。
经过上述制程之后产品经过光阻预烤， 曝光， 显影， 蚀刻， 脱光阻膜， 最 终形成厚度为 80~2000埃米 (面电阻为 10~270欧姆)及规则 ITO图案或电极。 预 烤温度及时间范围为 :60度~150度， 50秒到 200秒， 曝光能量采用 lOOmj 到 500mj， 显影液采用 Na系或 Ka系碱性溶液， 显影之温度采用 20~40度恒温作 业。 ITO蚀刻液采用盐酸及硝酸按一定比例混合而成的药液， 使其酸的 PH值落 在 1~3之间， 蚀刻温度在 40~50度之间作业。 脱光阻膜液采用二甲亚砜和乙醇 胺按一定的比例混合而成， 百分比为 70%: 30%, 脱膜温度在 40~80度之间作 业。
所述的 ITO电极为水平方向或垂直方向导通电极，具有规则图形结构； ITO 电极为 ITO导通电极 1与 ITO导通电极 2组成， ITO导通电极 1与 ITO导通电 极 2在同一层面， 相互独立， 相互绝缘， 交错设计。
绝缘层的形成：
经过 ITO 电极后的玻璃基板， 在其金属膜面涂布一层厚度均匀的负性光阻 材料，
负性光阻材料主成分为乙酸丙二醇单甲基醚酯， 亚克力树脂， 环氧树脂及 负性感光剂； 光阻涂布厚度为 0.5um~3um。 涂布负性光阻材料方式有旋涂， 刮 涂等方式。
经过上述制程之后产品经过光阻预烤，曝光，显影，最终形成厚度为 0.5~3um 和规则的绝缘层图案。 预烤温度及时间范围为: 60度~150度， 50秒到 200秒， 曝光能量采用 lOOmj到 500mj， 显影液采用 Na系或 Ka系碱性溶液， 显影之温 度采用 20~40度恒温作业。 再经过绝缘层硬烤， 条件为 200度到 300度， 时间 为 0.5小时到 3小时， 经过上述制程后， 最终形成厚度为 0.5um~3um， 图形规则 的第二绝缘层。
无金属电极层的非搭接一体式电容触摸屏与非搭接一体式触摸屏在结构上 与生产工艺上都有所简化， 取消了金属电极， 降低了材料成本， 减少了上产流 程， 在触摸功能上均可实现单点触摸和手势识别。
无金属电极层的非搭接一体式电容触摸屏由于无金属电极， 其 ITO导通电 极面阻的极大值远小于非搭接一体式触摸屏 ITO面阻。
以上内容是结合具体的优选实施方式对本发明所作的进一步详细说明， 不 能认定本发明的具体实施只局限于这些说明。 对于本发明所属技术领域的普通 技术人员来说， 在不脱离本发明构思的前提下， 还可以做出若干简单推演或替 换， 都应当视为属于本发明的保护范围。

Claims

权利要求书
1、 一^1无金属电极层 搭接一体式电容触摸屏， 其特征在于： 包括透明 基板， 依次层叠于透明基板的黑色树脂层、 ΙΤΟ电极、 绝缘层； 所述的 ΙΤΟ电 极为水平方向或垂直方向导通电极， 具有规则图形结构； ΙΤΟ电极为 ΙΤΟ导通 电极 1与 ΙΤΟ导通电极 2组成， ΙΤΟ导通电极 1与 ΙΤΟ导通电极 2在同一层面， 相互独立， 相互绝缘， 交错设计； 所述透明基板包括视窗区和非视窗区， 黑色 树脂层分布在显示屏非视窗区。
2、如权利要求 1所述的无金属电极层非搭接一体式电容触摸屏，其特征是: 所述的透明基板为厚度在 0.5mm~2.0mm的化学强化玻璃基板或树脂材料基板； 所述 ITO电极规则结构为三角形， 或条形， 或椭圆形。
3、如权利要求 2所述的无金属电极层非搭接一体式电容触摸屏，其特征是: 所述的黑色树脂层厚度为 0.3um~5um; ITO电极层厚度为 80~2000埃米， 面电 阻为 10~270欧姆。
4、如权利要求 4所述的无金属电极层非搭接一体式电容触摸屏，其特征是: 所述的 ITO包括 In203和 Sn02， 其质量比为 85~95： 5~15。
5、 一种制备无金属电极层非搭接一体式电容触摸屏的方法， 包括步骤： 黑色树脂层的形成： 将黑色树脂经过旋转涂布方式或刮式涂布方式均匀涂 布在透明基板上， 涂布厚度为 0.3um~5um， 经过加热器预烤， 曝光， 显影， 使 之形成所需之黑色树脂区域；
所述黑色树脂是感光性保护层光阻剂， 所述光阻剂包括亚克力树脂， 环氧 树脂， 负性感光剂， 乙酸丙二醇单甲基醚酯及黑色颜料； 其比例为树脂类： 乙 酸丙二醇单甲基醚酯： 黑色颜料及负性感光剂 =15~30： 60-80： 1-10；
ITO电极层的形成：
形成黑色树脂层的透明基板， 经过 ITO镀膜， 使在玻璃基板上形成一层透 明及厚度均匀的 ITO膜层， 其厚度为 80~2000埃米， 面电阻为 10~270欧姆； 经过 ITO镀膜的透明基板， 在其 ITO表面涂布一层厚度均匀的正性光阻材 料， 光阻涂布厚度为 lum~5um;
经过光阻预烤， 曝光， 显影， 蚀刻， 脱光阻膜， 最终形成厚度为 80~2000 埃米， 面电阻为 10~270欧姆及规则 ITO图案或电极；
权利要求书
所述的 ITO电极为水平方向或垂直方向导通电极， 具有规则图形结构； ΙΤΟ 电极为 ΙΤΟ导通电极 1与 ΙΤΟ导通电极 2组成， ΙΤΟ导通电极 1与 ΙΤΟ导通电 极 2在同一层面， 相互独立， 相互绝缘， 交错设计；
绝缘层的形成：
经过 ΙΤΟ 电极后的透明基板， 在其金属膜面涂布一层厚度均匀的负性光阻 材料， 光阻涂布厚度为 0.5um~3um;
经过光阻预烤， 曝光， 显影， 最终形成厚度为 0.5~3um和规则的绝缘层图 案。
6、如权利要求 6所述的制备无金属电极层非搭接一体式电容触摸屏的方法， 其特征是： 所述的透明基板为厚度在 0.5~2.0毫米的化学强化玻璃基板或树脂材 料基板； 所述的 ITO包括 In203和 Sn02， 其质量比为 85~95： 5~15。
7、如权利要求 7所述的制备无金属电极层非搭接一体式电容触摸屏的方 法， 其特征是：
所述的正性光阻材料主成分为乙酸丙二醇单甲基醚酯， 环氧树脂及正性感 光剂； 负性光阻材料主成分为乙酸丙二醇单甲基醚酯， 亚克力树脂， 环氧树脂 及负性感光剂。
8、 如权利要求 6所述的制备无金属电极层非搭接一体式电容触摸屏的 方法， 其特征是： 所述的 ITO镀膜的方式为真空磁控溅镀， 或者为化学气相沉 积法， 或者为热蒸镀， 或者为溶胶凝胶。
PCT/CN2013/070866 2012-02-09 2013-01-23 无金属电极层非搭接一体式电容触摸屏及其制造方法 WO2013117130A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201210028557.7 2012-02-09
CN201210028557.7A CN102541383B (zh) 2012-02-09 2012-02-09 无金属电极层非搭接一体式电容触摸屏及其制造方法

Publications (1)

Publication Number Publication Date
WO2013117130A1 true WO2013117130A1 (zh) 2013-08-15

Family

ID=46348393

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2013/070866 WO2013117130A1 (zh) 2012-02-09 2013-01-23 无金属电极层非搭接一体式电容触摸屏及其制造方法

Country Status (2)

Country Link
CN (1) CN102541383B (zh)
WO (1) WO2013117130A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102541383B (zh) * 2012-02-09 2014-11-26 深圳市宝明科技股份有限公司 无金属电极层非搭接一体式电容触摸屏及其制造方法
CN102830880A (zh) * 2012-08-21 2012-12-19 深圳市宝明科技股份有限公司 新型ito层非搭接一体式电容触摸屏及其制造方法
CN102955615B (zh) * 2012-11-09 2016-04-06 北京京东方光电科技有限公司 一种触摸屏、触控显示装置及一种触摸屏的制造方法
CN103926809B (zh) * 2014-03-24 2016-08-17 京东方科技集团股份有限公司 一种基板的制备方法
CN104716144B (zh) 2015-03-06 2018-02-16 京东方科技集团股份有限公司 阵列基板及其制作方法、显示装置
CN112078266B (zh) * 2020-09-16 2022-05-06 台州星星光电科技有限公司 一种3d表盖的表面一体黑的加工方法

Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102207808A (zh) * 2011-06-24 2011-10-05 苏州瀚瑞微电子有限公司 电容式触摸屏
CN102236492A (zh) * 2011-08-16 2011-11-09 深圳市宝明科技股份有限公司 一种ito过桥电容触摸屏及制造方法
CN102253782A (zh) * 2011-08-16 2011-11-23 深圳市宝明科技股份有限公司 Ito过桥一体式电容触摸屏及制造方法
CN102253781A (zh) * 2011-08-16 2011-11-23 深圳市宝明科技股份有限公司 金属过桥一体式电容触摸屏及制造方法
CN102289334A (zh) * 2011-08-16 2011-12-21 深圳市宝明科技股份有限公司 一种ito通孔电容触摸屏及其制造方法
CN102298475A (zh) * 2011-08-16 2011-12-28 深圳市宝明科技股份有限公司 Ito通孔一体式电容触摸屏及制造方法
CN202171796U (zh) * 2011-08-16 2012-03-21 深圳市宝明科技股份有限公司 一种ito通孔电容式触摸屏
CN202177885U (zh) * 2011-08-16 2012-03-28 深圳市宝明科技股份有限公司 Ito过桥一体式电容触摸屏
CN202183091U (zh) * 2011-08-16 2012-04-04 深圳市宝明科技股份有限公司 一种ito过桥电容式触摸屏
CN202230465U (zh) * 2011-08-16 2012-05-23 深圳市宝明科技股份有限公司 Ito通孔一体式电容触摸屏
CN102541383A (zh) * 2012-02-09 2012-07-04 深圳市宝明科技股份有限公司 无金属电极层非搭接一体式电容触摸屏及其制造方法
CN202331415U (zh) * 2011-08-16 2012-07-11 深圳市宝明科技股份有限公司 金属过桥一体式电容触摸屏
CN102591543A (zh) * 2012-02-09 2012-07-18 深圳市宝明科技股份有限公司 非搭接一体式电容触摸屏及其制造方法
CN102629176A (zh) * 2012-03-27 2012-08-08 深圳市宝明科技股份有限公司 新型金属过桥一体式电容触摸屏及其制造方法
CN102637101A (zh) * 2012-03-27 2012-08-15 深圳市宝明科技股份有限公司 新型ito通孔一体式电容触摸屏及其制造方法
CN102637102A (zh) * 2012-03-27 2012-08-15 深圳市宝明科技股份有限公司 新型非搭接一体式电容触摸屏及其制造方法
CN102662543A (zh) * 2012-03-27 2012-09-12 深圳市宝明科技股份有限公司 新型ito过桥一体式电容触摸屏及其制造方法
CN102662542A (zh) * 2012-03-27 2012-09-12 深圳市宝明科技股份有限公司 新型无金属电极层非搭接一体式电容触摸屏及其制造方法
CN202486760U (zh) * 2012-02-09 2012-10-10 深圳市宝明科技股份有限公司 无金属电极层非搭接一体式电容触摸屏
CN202486761U (zh) * 2012-02-09 2012-10-10 深圳市宝明科技股份有限公司 非搭接一体式电容触摸屏
CN102830880A (zh) * 2012-08-21 2012-12-19 深圳市宝明科技股份有限公司 新型ito层非搭接一体式电容触摸屏及其制造方法
CN202711212U (zh) * 2012-03-27 2013-01-30 深圳市宝明科技股份有限公司 新型无金属电极层非搭接一体式电容触摸屏

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4132191B2 (ja) * 1998-02-27 2008-08-13 グンゼ株式会社 抵抗膜型透明タッチパネル用電極部材
CN101976149A (zh) * 2010-11-05 2011-02-16 牧东光电（苏州）有限公司 硬化结构触控面板及其制造方法

Patent Citations (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102207808A (zh) * 2011-06-24 2011-10-05 苏州瀚瑞微电子有限公司 电容式触摸屏
CN202331415U (zh) * 2011-08-16 2012-07-11 深圳市宝明科技股份有限公司 金属过桥一体式电容触摸屏
CN102236492A (zh) * 2011-08-16 2011-11-09 深圳市宝明科技股份有限公司 一种ito过桥电容触摸屏及制造方法
CN102253782A (zh) * 2011-08-16 2011-11-23 深圳市宝明科技股份有限公司 Ito过桥一体式电容触摸屏及制造方法
CN102253781A (zh) * 2011-08-16 2011-11-23 深圳市宝明科技股份有限公司 金属过桥一体式电容触摸屏及制造方法
CN102289334A (zh) * 2011-08-16 2011-12-21 深圳市宝明科技股份有限公司 一种ito通孔电容触摸屏及其制造方法
CN102298475A (zh) * 2011-08-16 2011-12-28 深圳市宝明科技股份有限公司 Ito通孔一体式电容触摸屏及制造方法
CN202171796U (zh) * 2011-08-16 2012-03-21 深圳市宝明科技股份有限公司 一种ito通孔电容式触摸屏
CN202177885U (zh) * 2011-08-16 2012-03-28 深圳市宝明科技股份有限公司 Ito过桥一体式电容触摸屏
CN202183091U (zh) * 2011-08-16 2012-04-04 深圳市宝明科技股份有限公司 一种ito过桥电容式触摸屏
CN202230465U (zh) * 2011-08-16 2012-05-23 深圳市宝明科技股份有限公司 Ito通孔一体式电容触摸屏
CN102541383A (zh) * 2012-02-09 2012-07-04 深圳市宝明科技股份有限公司 无金属电极层非搭接一体式电容触摸屏及其制造方法
CN102591543A (zh) * 2012-02-09 2012-07-18 深圳市宝明科技股份有限公司 非搭接一体式电容触摸屏及其制造方法
CN202486760U (zh) * 2012-02-09 2012-10-10 深圳市宝明科技股份有限公司 无金属电极层非搭接一体式电容触摸屏
CN202486761U (zh) * 2012-02-09 2012-10-10 深圳市宝明科技股份有限公司 非搭接一体式电容触摸屏
CN102629176A (zh) * 2012-03-27 2012-08-08 深圳市宝明科技股份有限公司 新型金属过桥一体式电容触摸屏及其制造方法
CN102637101A (zh) * 2012-03-27 2012-08-15 深圳市宝明科技股份有限公司 新型ito通孔一体式电容触摸屏及其制造方法
CN102637102A (zh) * 2012-03-27 2012-08-15 深圳市宝明科技股份有限公司 新型非搭接一体式电容触摸屏及其制造方法
CN102662543A (zh) * 2012-03-27 2012-09-12 深圳市宝明科技股份有限公司 新型ito过桥一体式电容触摸屏及其制造方法
CN102662542A (zh) * 2012-03-27 2012-09-12 深圳市宝明科技股份有限公司 新型无金属电极层非搭接一体式电容触摸屏及其制造方法
CN202711212U (zh) * 2012-03-27 2013-01-30 深圳市宝明科技股份有限公司 新型无金属电极层非搭接一体式电容触摸屏
CN102830880A (zh) * 2012-08-21 2012-12-19 深圳市宝明科技股份有限公司 新型ito层非搭接一体式电容触摸屏及其制造方法

Also Published As

Publication number Publication date
CN102541383B (zh) 2014-11-26
CN102541383A (zh) 2012-07-04

Similar Documents

Publication Publication Date Title
WO2013023489A1 (zh) 金属过桥一体式电容触摸屏及制造方法
WO2013023492A1 (zh) 一种ito过桥电容触摸屏及制造方法
WO2013023482A1 (zh) Ito过桥一体式电容触摸屏及制造方法
WO2014029200A1 (zh) 新型ito层非搭接一体式电容触摸屏及其制造方法
WO2013143397A1 (zh) 新型ito过桥一体式电容触摸屏及其制备方法
WO2013023491A1 (zh) Ito通孔一体式电容触摸屏及制造方法
US9933896B2 (en) Touch panel and method of manufacturing a touch panel
WO2013117130A1 (zh) 无金属电极层非搭接一体式电容触摸屏及其制造方法
US9454267B2 (en) Touch sensing circuit and method for making the same
WO2013023493A1 (zh) 一种ito通孔电容触摸屏及其制造方法
CN104407734B (zh) 触控屏的制造方法及触控屏
CN104035644A (zh) 一种彩色电容触摸屏及其制造方法
TW200941323A (en) Sensing structure of touch panel and touch panel having the same
CN102629176A (zh) 新型金属过桥一体式电容触摸屏及其制造方法
CN202183091U (zh) 一种ito过桥电容式触摸屏
CN202171796U (zh) 一种ito通孔电容式触摸屏
CN203882300U (zh) 一种彩色电容触摸屏
CN102637101A (zh) 新型ito通孔一体式电容触摸屏及其制造方法
CN102662542A (zh) 新型无金属电极层非搭接一体式电容触摸屏及其制造方法
CN202177885U (zh) Ito过桥一体式电容触摸屏
CN202230465U (zh) Ito通孔一体式电容触摸屏
CN202486760U (zh) 无金属电极层非搭接一体式电容触摸屏
TWI447476B (zh) 觸控面板製造方法
CN202331415U (zh) 金属过桥一体式电容触摸屏
CN202486761U (zh) 非搭接一体式电容触摸屏

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 13747311

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 13747311

Country of ref document: EP

Kind code of ref document: A1