WO2013074111A1 - Outil coupant et procédé de fabrication - Google Patents
Outil coupant et procédé de fabrication Download PDFInfo
- Publication number
- WO2013074111A1 WO2013074111A1 PCT/US2011/061315 US2011061315W WO2013074111A1 WO 2013074111 A1 WO2013074111 A1 WO 2013074111A1 US 2011061315 W US2011061315 W US 2011061315W WO 2013074111 A1 WO2013074111 A1 WO 2013074111A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carbon
- max
- nanoparticles
- tool
- shards
- Prior art date
Links
- 238000005520 cutting process Methods 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 title claims description 24
- 238000004519 manufacturing process Methods 0.000 title description 4
- 239000000463 material Substances 0.000 claims abstract description 94
- 239000002105 nanoparticle Substances 0.000 claims description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 27
- 229910052799 carbon Inorganic materials 0.000 claims description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 19
- 150000004767 nitrides Chemical class 0.000 claims description 18
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 16
- 239000004917 carbon fiber Substances 0.000 claims description 16
- 239000000725 suspension Substances 0.000 claims description 16
- 239000000919 ceramic Substances 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 15
- 229910003460 diamond Inorganic materials 0.000 claims description 12
- 239000010432 diamond Substances 0.000 claims description 12
- 238000000137 annealing Methods 0.000 claims description 11
- 229910052723 transition metal Inorganic materials 0.000 claims description 11
- 239000002243 precursor Substances 0.000 claims description 10
- 230000000737 periodic effect Effects 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- 238000005234 chemical deposition Methods 0.000 claims description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 229910010293 ceramic material Inorganic materials 0.000 claims description 5
- 238000005507 spraying Methods 0.000 claims description 4
- 239000011852 carbon nanoparticle Substances 0.000 claims description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 3
- 239000000126 substance Substances 0.000 description 16
- 239000000243 solution Substances 0.000 description 12
- 239000012705 liquid precursor Substances 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229910000497 Amalgam Inorganic materials 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 238000005553 drilling Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 239000002131 composite material Substances 0.000 description 4
- 238000009718 spray deposition Methods 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- -1 organic acid salts Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 101150080898 GPA4 gene Proteins 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 239000002803 fossil fuel Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910000601 superalloy Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
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- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B10/00—Drill bits
- E21B10/46—Drill bits characterised by wear resisting parts, e.g. diamond inserts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1258—Spray pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
- C23C18/127—Preformed particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1291—Process of deposition of the inorganic material by heating of the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
Definitions
- the present invention generally relates to cutting tools, and in particular to drill bits used for drilling through geological formations.
- Drilling or cutting tools are prone to failure when cutting into very hard material compressed to high pressures and/or heated to high temperatures or when used in corrosive environments, such as those found in deep well oil drilling environments.
- Conventional cutting tools are comprised of a metal amalgam applied to a hard metal bit head, most often a titanium bit head.
- the metal amalgam is impregnated with diamond shards, which are the tool's actual cutting elements.
- a principal failure mode is caused by the temperature differential generated between the amalgam's cutting surface and the bit head to which it is attached. Friction induced by cutting into hard material, cutting into highly pressurized materials, or cutting into hot materials will frequently generate sufficient heat differentials between the cutting surface and the bit head to crack the tool. These conditions are quite often present when drilling for fossil fuels at greater depths. In these instances, mechanical failures have high carrying costs due to longer periods lost time encumbered in replacing the drill bit.
- amorphous material is herein understood to mean a material that does not comprise a periodic lattice of atomic elements, or lacks mid-range (over distances of lO's of nanometers) to long-range crystalline order (over distances of 100's of nanometers).
- compositional complexity is herein understood to refer to a material, such as a metal or superalloy, compound semiconductor, or ceramic that consists of three (3) or more elements from the periodic table.
- LCD is herein understood to mean a method that uses liquid precursor solutions to fabricate materials of arbitrary compositional or chemical complexity as an amorphous laminate or free-standing body or as a crystalline laminate or free-standing body that has atomic-scale chemical uniformity and a microstructure that is controllable down to nanoscale dimensions.
- liquid precursor solution is herein understood to mean a solution of hydrocarbon molecules that also contains soluble metalorganic compounds that may or may not be organic acid salts of the hydrocarbon molecules into which they are dissolved.
- MAX phase material is herein understood to define a chemically complex intermetallic ceramic material having the general chemical formula M( n+ i ⁇ AX n , wherein M is first row transition-metal element, A is an "A-group” element found in columns III-VI of the periodic table, and X is either carbon (C) or nitrogen (N).
- microstructure is herein understood to define the elemental composition and physical size of crystalline grains forming a material substance.
- nanoscale is herein understood to define physical dimensions measured in lengths ranging from 1 nanometer (nm) to 100's of nanometers (nm).
- solid solution is herein understood to be an amorphous material.
- the present invention instructs methods to fabricate a cutting tool that has a surface consisting of diamond shards (teeth) embedded within a mechanically strong, corrosion-resistant, thermal shock-resistant laminate.
- One embodiment of the present invention provides a cutting tool, comprising: a support substrate; and a complex ceramic cutting surface laminate formed on the support substrate and including hard shards, a first row transition-metal element, an element from columns III-VI of the periodic table and carbon and/or nitrogen.
- the laminate may include an M (stadium + i ⁇ AX n (MAX) phase material; where M is the first row transition-metal element, where A is an element from columns III-VI of the periodic table and where X is carbon and/or nitrogen.
- the MAX-phase material may have micro- Vickers hardness greater than 1 GPa.
- the MAX-phase material may have micro- Vickers hardness greater than 4 GPa.
- the MAX-phase material may further include particles embedded within it that include carbide, carbon fiber, coated-carbon fiber, and/or nitride particles.
- the hard shards may have hardness in the range of 8-10.
- the laminate may have a polycrystalline structure or fully crystalline structure except for the hard shards.
- the hard shards may comprise diamond.
- the substrate may be a drill bit.
- the laminate may be formed on the substrate by liquid chemical deposition of a colloidal solution of nanoparticles in dissolved metal-organic precursors.
- MAX-phase material comprising M (n+ i ) AX n (MAX) phase material; where M is the first row transition-metal element, where A is an element from columns III-VI of the periodic table and where X is carbon and nitrogen.
- the material may have atomic scale crystalline uniformity.
- the material may further comprise hard material shards and/or carbon fibers, coated carbon fibers, or carbon, carbide or nitride nanoparticles.
- the laminate may be formed by liquid chemical deposition of a colloidal solution of nanoparticles in dissolved metal-organic precursors
- Yet another embodiment of the present invention provides a method of forming a MAX-phase material, comprising the steps of: forming a stoichiometric colloidal suspension of metal-organic precursors in solution along with carbon, carbide and/or nitride
- nanoparticles spraying the colloidal suspension onto a heated substrate to deposit the suspension and to simultaneously decompose the precursors and leave an amorphous ceramic material with embedded carbon, carbide, and/or nitride nanoparticles on the substrate; and rapid plasma annealing the amorphous ceramic material to create crystalline structure with carbon and/or nitrogen integrated from the carbon, carbide, and/or nitride nanoparticles.
- the method may further comprise the step of repeating the steps of spraying and rapid plasma annealing to form a MAX-phase material having multiple layers.
- the method may still further comprise the step of repeating the step of forming to create different
- compositional mixtures in two or more of the multiple layers are compositional mixtures in two or more of the multiple layers.
- the colloidal suspension may include a super-stoichiometric relationship of the carbon, carbide and/or nitride nanoparticles to A-group elements for the MAX-phase material.
- the colloidal suspension may have a stoichiometry that produces a crystalline structure with a super stoichiometry of X group elements to A group elements.
- the colloidal suspension may have a super stoichiometry of X group elements of 1.1 x to 3x to A group elements
- the colloidal suspension may also include hard material shards, carbon or carbide nanoparticles, carbon fibers, coated carbon fibers, and/or nitride nanoparticles.
- the shards may be diamond.
- the present invention provides a cutting tool that minimizes crack-forming differentials by embedding hardened shards, preferably diamond shards, in an ablative ceramic adhered to the bit head.
- the present invention provides means to fabricate chemically complex MAX phase materials on the surface of another material, or as a freestanding body.
- Figure 1 shows a cross-sectional depiction of a cutting tool constructed in accordance with one embodiment of the invention.
- Figures 2A through 2C are sectional views of material constructed in accordance with one or more embodiments of the present invention.
- Figure 3 is a sectional view of material constructed in accordance with amother embodiment of the present invention.
- Cutting tools generally locate shards of a very hard material, such as diamond, on the cutting surface of a bit head.
- the bit head is usually a mechanically hard substance, such as titanium, and is used to mechanically support the cutting surface.
- the hard material shards are located on the bit head cutting surface by impregnating them into a metal amalgam that is bonded to the bit head.
- the cutting process scrapes the hardened shards over the material to be cut. Repetitively scraping the surface with the hardened shards digs into and tears away the material through the application of frictional forces.
- Principal failure modes include the corrosive erosion of the metal amalgam and heat differentials generated between the bit head and the cutting surface that produce shear forces strong enough to crack the amalgam and/or the bit head itself.
- a preferred embodiment of the invention uses the liquid chemical deposition (LCD) process to produce a cutting tool 100 that consists of a MAX-phase ceramic laminate 102 impregnated with shards of a very hard material 103, preferably materials such as diamond that have hardness values in the range of 8-10, on the cutting surfaces 104,106 of a bit head 108.
- the bit head 108 may be any material, but preferably is a hard, shape- formable material, such as titanium.
- MAX-phase ceramics are mechanically hard, oxidation/corrosion-resistant, damage tolerant materials that have excellent high-temperature properties, and will typically exhibit micro- Vickers hardness in the range of 1 GPa - 4 GPa at elevated temperatures up to 700 °C. This combination of physical and chemical properties makes MAX-phase materials ideal for use in harsh environments, such as those found in deep well oil exploration, when formed as a laminate on a cutting surface.
- the MAX-phase ceramic laminate may optionally have additional elements 110 embedded within it to improve its ablative properties.
- Ablative ceramics are characterized by their ability to prevent the creation of strong thermal gradients (heat differentials) sufficient to crack the cutting tool by allowing tiny particles with high heat capacities to carry thermal energy from the laminate body as they are dislodged from its surface. Rather, heat generated by frictional forces on the surface of the ceramic is dissipated through surface particles ablated off of the heated surface. While ablative ceramics will wear, as the metal amalgams do, they can withstand significantly higher temperatures found in harsh environments. Additional elements 110 may consist of carbon-fibers, coated carbon fibers, or aluminum nitride particles or nanoscale particles consisting either of carbon or aluminum nitride.
- MAX-phase ceramics are impervious to many corrosive elements found in deep oil drilling environments, such as carbon dioxide and hydrogen sulfide gas.
- Previous fabrication techniques for MAX-phase ceramics consist of sintered powder preparations containing stoichiometric proportions of the desired elemental chemistry. Better results are achieved when the powder preparations are sintered using pulsed plasma discharges.
- the powder preparations are only used to make free-standing bodies, which are either machined or slip- cast to form a desired geometric shape. While it is possible to embed secondary phase components in powder-prepared MAX-phase materials, they cannot be applied to the surface of a pre-existing body as a laminate.
- FIG. 2A,2B,2C & 3 illustrate embodiments of the invention that relate to the synthesis of MAX-phase materials by LCD processes, and the integration of shards of very hard material 103 and additional elements 110 within the formed body.
- the LCD process forms a compositionally complex laminate 120 having atomic-scale chemical uniformity from a liquid precursor solution that is sprayed on a substrate 122 heated to 250-450 °C. Atomic-scale chemical uniformity is endowed to the laminate through the molecular-level subdivision of the metalorganic precursors that are achieved in solution, and their simultaneous decomposition on the substrate surface.
- the laminate initially forms an amorphous solid due to the low deposition temperatures (250-450 °C).
- the LCD laminate will form an elemental solid solution if it is deposited in reducing or oxygen- free atmospheres, i.e., consisting of a chemically inert gas, hydrogen, or an oxidizing partial pressure ratio of carbon dioxide/carbon monoxide.
- the LCD laminate will form a metal oxide solid solution when it is formed in oxidizing atmospheres. As detailed in de Rochemont et al.
- secondary phase materials 124 which may comprise shards of very hard material 103 and additional elements 110, are embedded into the compositionally complex laminate 120 by forming a colloidal suspension that uniformly mixes the secondary phase materials 124 with the liquid precursor solution immediately prior to the spray deposition step.
- the amorphous deposit is rendered into a fully crystallized laminate 126 or poly-crystalline laminate 128 having uniform microstructure controllable down to nanoscale levels, by plasma annealing steps applied intermittently with the liquid precursor sprays.
- LCD allows a free-standing body that is amorphous, fully crystalline, or polycrystalline by optionally removing substrate 122 once the compositionally complex laminate(s) 120,126,128 have been formed to a thickness(es) that is (are) sufficient to mechanically support its (their) own weight.
- the surface adhesion of an LCD laminate to the substrate 122 is stronger than the tensile strength of most ceramics.
- the low deposition temperatures 250 °C to 450 °C) are insufficient to anneal any tempering applied to the bit head 108, thereby allowing cutting tool 100 to have higher intrinsic mechanical strength and not otherwise interfere with any prior heat treatments or tempering of the bit head 108.
- MAX-phase materials are attractive for use a laminate in these applications because they are elastically stiff, resistant to chemical and thermal shock, damage tolerant, have relatively low coefficients of thermal expansion, and have high corrosion resistance.
- the most basic form of MAX-phase materials are binary carbides or nitrides and maintain the following compositional relationship:
- M (n+1) AX n (1) where M is selected from the following transition-metal elements:
- M Sc, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn
- A is selected from the following "A-group” elements:
- A Al, Si, Ga, Ge, In, Sn, Sb
- n 1 , 2, or 3.
- LCD enables the fabrication of higher order MAX-phase materials that have wider ranging or tailor-made physical, chemical, or electro-chemical properties.
- Higher order MAX-phase materials maintain higher complexity compositional relationships, for instance:
- X is nitrogen (N), carbon (C), or a mixture of nitrogen and carbon
- n 1 ,2, or 3
- transition-metal or A-group elements include (micro) Vicker's hardness, Young's modulus, tensile strength, coefficient of thermal expansion, sound velocity, electrical and thermal conductivity. For instance, substituting transition-metal elements that form strong bonds with A-group elements will improve the finished MAX-phase material's hardness.
- a plurality of substitutions and additions are generally required to achieve specific optimization of one property without comprising the integrity of another desirable physical, chemical or electro-chemical property. Partial substitution of a nitride element for a carbide would be made to improve or alter thermal conductivity.
- the MAX-phase material is formed by first depositing an amorphous elemental preform material 150 on a substrate 152 heated to 250 - 450 °C using LCD processes, preferably in a reducing gas environment as noted above.
- the liquid precursor solution is prepared to endow the amorphous pre-form material 150 with the desired stoichiometric relationship between transition-metal elements (M group) and group-A elements.
- X-group nanoparticles 154 are incorporated into the amorphous elemental pre-form material 150 by forming a colloidal suspension in the liquid precursor solution prior to the spray deposition.
- Carbon nanoparticles, or nanoparticles comprising one or more desirable A-group elements with carbon, for instance, silicon carbide, aluminum carbide, are embedded into the amorphous element pre-form material 150 as X-group nanoparticles 154 when it is desirable to form a MAX-phase material consisting of carbide material, i.e., X C.
- the X- group nanoparticles 154 are the elemental source for the X-group element in the stoichiometry equations (1) and (2). It is preferred that the total weight of X-group nanoparticles 154 have a super-stoichiometric relationship to the group-A elements, such that the total weight of X- group nanoparticles 154 incorporated into the amorphous elemental pre-form material 150 comprise 1.lx - 3x the total number of moles A-group elements incorporated therein after spray deposition.
- a bake-out step that heats the amorphous elemental pre-form material to temperatures in the range of 450 °C - 600 °C is used to remove any undecomposed residual metalorganic precursor material from the amorphous elemental pre-form material 150 prior to subsequent processing steps.
- the X- group nanoparticles 154 are then reacted with the amorphous elemental preform material 150 by plasma annealing the deposit for 5-60 seconds at RF powers in the range of 10-300 W in gas mixtures that may contain argon, helium, and/or xenon at atmospheric pressures ranging between 1.5 to 5 Torr (1500 to 5000 mTorr), with partial pressures of carbon dioxide and carbon monoxide to prevent the evolution of carbon by-products from the laminate during processing. Nitrogen may be added to the ionized plasma when in it is desirable to use nitrogen (N) and an elemental component (X material) in the finished deposit.
- the substrate 152 is heated to a temperature in the range of 50 °C to 500 °C prior to initiating the plasma annealing steps. Shorter plasma annealing times, in the range of 5 seconds to 30 seconds, are used to form polycrystalline 128 laminates. Longer plasma annealing times, in the range of 30 seconds to 60 seconds, are used to form fully crystalline laminates 126, except for hard material 103. Any excess X-group nanoparticles 154 remaining in the laminate may be used as an additional element 110 that improves the ablative properties of the formed MAX-phase material.
- Additional elements 110 may also comprise carbon fiber, coated- carbon fiber, aluminum nitride particles, and very hard material 103, comprising diamond shards or dust, are introduced into the amorphous pre-form material 150 as a colloidal suspension in the liquid precursor solution immediately prior to the deposition step. Greater thicknesses, including thicknesses sufficient to support the weight of the laminate as a freestanding body when the substrate 152 is optionally removed, are achieved by repeating the spray deposition, bake-out, and annealing steps a plurality of times. Additional, multi-layer MAX-phase material structures may formed with varied composition in different layers by sequentially depositing and plasma annealing a plurality of different MAX-phase
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Abstract
L'invention concerne un matériau de MAX-phase pour un outil coupant et d'autres applications.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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PCT/US2011/061315 WO2013074111A1 (fr) | 2011-11-18 | 2011-11-18 | Outil coupant et procédé de fabrication |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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PCT/US2011/061315 WO2013074111A1 (fr) | 2011-11-18 | 2011-11-18 | Outil coupant et procédé de fabrication |
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PCT/US2011/061315 WO2013074111A1 (fr) | 2011-11-18 | 2011-11-18 | Outil coupant et procédé de fabrication |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5503912A (en) * | 1992-10-12 | 1996-04-02 | Sumitomo Electric Industries, Ltd. | Ultra-thin film laminate |
US5656561A (en) * | 1991-12-03 | 1997-08-12 | Advanced Composite Materials Corporation | Pressureless sintering of whisker reinforced alumina composites |
US6227188B1 (en) * | 1997-06-17 | 2001-05-08 | Norton Company | Method for improving wear resistance of abrasive tools |
US6742611B1 (en) * | 1998-09-16 | 2004-06-01 | Baker Hughes Incorporated | Laminated and composite impregnated cutting structures for drill bits |
-
2011
- 2011-11-18 WO PCT/US2011/061315 patent/WO2013074111A1/fr active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5656561A (en) * | 1991-12-03 | 1997-08-12 | Advanced Composite Materials Corporation | Pressureless sintering of whisker reinforced alumina composites |
US5503912A (en) * | 1992-10-12 | 1996-04-02 | Sumitomo Electric Industries, Ltd. | Ultra-thin film laminate |
US6227188B1 (en) * | 1997-06-17 | 2001-05-08 | Norton Company | Method for improving wear resistance of abrasive tools |
US6742611B1 (en) * | 1998-09-16 | 2004-06-01 | Baker Hughes Incorporated | Laminated and composite impregnated cutting structures for drill bits |
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