WO2012169747A3 - 벨트형 자석을 포함한 플라즈마 발생원 및 이를 이용한 박막 증착 시스템 - Google Patents
벨트형 자석을 포함한 플라즈마 발생원 및 이를 이용한 박막 증착 시스템 Download PDFInfo
- Publication number
- WO2012169747A3 WO2012169747A3 PCT/KR2012/004345 KR2012004345W WO2012169747A3 WO 2012169747 A3 WO2012169747 A3 WO 2012169747A3 KR 2012004345 W KR2012004345 W KR 2012004345W WO 2012169747 A3 WO2012169747 A3 WO 2012169747A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plasma
- generating source
- belt
- thin
- deposition system
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/357—Microwaves, e.g. electron cyclotron resonance enhanced sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
- Particle Accelerators (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15191835.6A EP3002996B1 (en) | 2011-06-09 | 2012-06-01 | Neutral particle beam source including belt-type magnets and microwave irradiating equipment |
CN201280026487.XA CN103766002B (zh) | 2011-06-09 | 2012-06-01 | 包括带状磁铁的等离子产生源及利用此的薄膜沉积*** |
US14/124,571 US9589772B2 (en) | 2011-06-09 | 2012-06-01 | Plasma generation source including belt-type magnet and thin film deposition system using this |
JP2014513443A JP5774778B2 (ja) | 2011-06-09 | 2012-06-01 | プラズマ発生源、スパッタリング装置、中性粒子ビーム発生源及び薄膜蒸着システム |
EP12797155.4A EP2720518B1 (en) | 2011-06-09 | 2012-06-01 | Plasma-generating source comprising a belt-type magnet, and thin-film deposition system using same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2011-0055417 | 2011-06-09 | ||
KR1020110055417A KR101307019B1 (ko) | 2011-06-09 | 2011-06-09 | 벨트형 자석을 포함한 중성입자 빔 발생장치 |
KR1020120049386A KR101383530B1 (ko) | 2012-05-09 | 2012-05-09 | 벨트형 자석을 포함한 플라즈마 발생원 |
KR10-2012-0049386 | 2012-05-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012169747A2 WO2012169747A2 (ko) | 2012-12-13 |
WO2012169747A3 true WO2012169747A3 (ko) | 2013-03-28 |
Family
ID=47296564
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/004345 WO2012169747A2 (ko) | 2011-06-09 | 2012-06-01 | 벨트형 자석을 포함한 플라즈마 발생원 및 이를 이용한 박막 증착 시스템 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9589772B2 (ko) |
EP (2) | EP3002996B1 (ko) |
JP (2) | JP5774778B2 (ko) |
CN (1) | CN103766002B (ko) |
WO (1) | WO2012169747A2 (ko) |
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Also Published As
Publication number | Publication date |
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CN103766002A (zh) | 2014-04-30 |
US9589772B2 (en) | 2017-03-07 |
WO2012169747A2 (ko) | 2012-12-13 |
EP2720518A2 (en) | 2014-04-16 |
EP3002996B1 (en) | 2020-03-25 |
EP3002996A1 (en) | 2016-04-06 |
JP2015133321A (ja) | 2015-07-23 |
US20140124364A1 (en) | 2014-05-08 |
JP2014522551A (ja) | 2014-09-04 |
EP2720518A4 (en) | 2015-05-27 |
CN103766002B (zh) | 2017-03-22 |
JP5774778B2 (ja) | 2015-09-09 |
EP2720518B1 (en) | 2016-12-28 |
JP6006286B2 (ja) | 2016-10-12 |
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