WO2012128481A3 - Method for duplicating pattern using exposure process on cylindrical mold - Google Patents
Method for duplicating pattern using exposure process on cylindrical mold Download PDFInfo
- Publication number
- WO2012128481A3 WO2012128481A3 PCT/KR2012/001467 KR2012001467W WO2012128481A3 WO 2012128481 A3 WO2012128481 A3 WO 2012128481A3 KR 2012001467 W KR2012001467 W KR 2012001467W WO 2012128481 A3 WO2012128481 A3 WO 2012128481A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pattern
- mold
- exposure process
- cylindrical mold
- duplicating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/18—Coating curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention relates to a method for duplicating a pattern using an exposure process on a cylindrical mold, and more specifically, to duplicating a pattern on a cylindrical mold, a method for duplicating a pattern using an exposure process on a cylindrical mold for generating a symmetrical pattern or an identical pattern using a cylindrical mold having a pattern generated thereon. The method for duplicating a pattern using an exposure process on a cylindrical mold comprises: a first step for coating an ink on a pattern of an original mold; a second step for generating a pattern by having the ink coated on the pattern of the original mold be printed on a duplicate mold uniformly coated with a photosensitizer; a third step for UV exposing and developing the duplicate mold; and a fourth step for etching the duplicate mold.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2011-0025351 | 2011-03-22 | ||
KR1020110025351A KR101389270B1 (en) | 2011-03-22 | 2011-03-22 | Method for reprinting pattern using exposure in cylindrical mold |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012128481A2 WO2012128481A2 (en) | 2012-09-27 |
WO2012128481A3 true WO2012128481A3 (en) | 2012-12-27 |
Family
ID=46879844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/001467 WO2012128481A2 (en) | 2011-03-22 | 2012-02-27 | Method for duplicating pattern using exposure process on cylindrical mold |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101389270B1 (en) |
WO (1) | WO2012128481A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101658956B1 (en) * | 2014-09-05 | 2016-09-23 | 한국기계연구원 | A method of manufacturing a printing roller using a film mask |
KR101658955B1 (en) * | 2014-09-05 | 2016-09-30 | 한국기계연구원 | A method of manufacturing a printing roller |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030013988A (en) * | 2001-08-10 | 2003-02-15 | 주식회사 알티즌 | Print template fabricating system and fabricating method thereof |
KR20050114968A (en) * | 2004-06-02 | 2005-12-07 | 엘지.필립스 엘시디 주식회사 | Method for fabricating patterns by printing method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005246712A (en) * | 2004-03-03 | 2005-09-15 | Hitachi Chem Co Ltd | Resist pattern forming method, electronic component manufacturing method and electronic component |
-
2011
- 2011-03-22 KR KR1020110025351A patent/KR101389270B1/en not_active IP Right Cessation
-
2012
- 2012-02-27 WO PCT/KR2012/001467 patent/WO2012128481A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030013988A (en) * | 2001-08-10 | 2003-02-15 | 주식회사 알티즌 | Print template fabricating system and fabricating method thereof |
KR20050114968A (en) * | 2004-06-02 | 2005-12-07 | 엘지.필립스 엘시디 주식회사 | Method for fabricating patterns by printing method |
Also Published As
Publication number | Publication date |
---|---|
KR101389270B1 (en) | 2014-04-30 |
WO2012128481A2 (en) | 2012-09-27 |
KR20120107695A (en) | 2012-10-04 |
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