WO2012050060A1 - 液晶表示装置の製造方法 - Google Patents
液晶表示装置の製造方法 Download PDFInfo
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- WO2012050060A1 WO2012050060A1 PCT/JP2011/073217 JP2011073217W WO2012050060A1 WO 2012050060 A1 WO2012050060 A1 WO 2012050060A1 JP 2011073217 W JP2011073217 W JP 2011073217W WO 2012050060 A1 WO2012050060 A1 WO 2012050060A1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
- B32B37/1009—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure using vacuum and fluid pressure
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
- G02F1/13415—Drop filling process
Definitions
- the present invention relates to a method for manufacturing a liquid crystal display device.
- a sealing material is formed on one surface of the first substrate and the second substrate, and after dropping the liquid crystal in a range surrounded by the sealing material, the first substrate and the second substrate Are sealed in a vacuum atmosphere to seal the liquid crystal.
- ODF One Drop Fill
- Patent Document 1 JP-A-2009-288364 (Patent Document 1) is a prior document disclosing a method for manufacturing a liquid crystal display device using ODF.
- the manufacturing method of the liquid crystal display device described in Patent Document 1 includes a step of applying a main seal to one of a counter substrate or a TFT (Thin Film Transistor) substrate, and applying at least the main seal of the counter substrate or the TFT substrate.
- TFT Thin Film Transistor
- the first substrate and the second substrate that are sealed so that the liquid crystal is sandwiched between them have different moisture adsorption amounts depending on the respective configurations. If the first substrate has a larger amount of moisture adsorption than the second substrate, after the liquid crystal is dropped on the first substrate, the first substrate and the second substrate are bonded together in a vacuum atmosphere. The water adsorbed on the liquid remains in the sealed liquid crystal without being substantially evaporated in a state covered with the liquid crystal. In this case, the distribution of the liquid crystal in the liquid crystal panel becomes non-uniform, and display unevenness occurs on the display screen of the liquid crystal display device.
- the present invention has been made in view of the above-described problems, and an object thereof is to provide a method for manufacturing an image display device that can improve the display quality of a liquid crystal display device.
- a method for manufacturing a liquid crystal display device drops a liquid crystal on a first substrate or a second substrate, and a liquid crystal dropping surface side of the first substrate or the second substrate is not a second substrate or a liquid crystal is dropped.
- This is a method of manufacturing a liquid crystal display device in which liquid crystal is injected by returning to atmospheric pressure after bonding in a vacuum while facing a first substrate.
- a method for manufacturing a liquid crystal display device includes a step of dropping a liquid crystal on a substrate having a smaller moisture adsorption amount of the first substrate and the second substrate, and a step of dropping the liquid crystal, And laminating in a vacuum.
- a liquid crystal display device is sequentially manufactured by repeatedly performing the above-described method for manufacturing a liquid crystal display device. First, the moisture absorption amount of the first substrate and the second substrate is small. In order to determine the other substrate, a step of measuring the moisture adsorption amount of the first substrate and the second substrate is performed. Thereafter, the step of dropping the liquid crystal is performed based on the above determination without repeating the step of measuring.
- the method further includes a step of subjecting the first substrate and the second substrate having a higher moisture adsorption amount to a reduced pressure process.
- the method further includes a step of heat-treating the substrate having the larger moisture adsorption amount among the first substrate and the second substrate.
- the method further includes a step of performing heat treatment while decompressing the substrate having the larger moisture adsorption amount of the first substrate and the second substrate.
- the substrate having a larger moisture adsorption amount in the heat treatment, is heated at a temperature of 40 ° C. or higher and 300 ° C. or lower.
- the substrate having the larger moisture adsorption amount is depressurized to a pressure of 100 Pa or less.
- the method includes a step of forming different resin films on the first substrate and the second substrate.
- the difference in moisture adsorption amount between the first substrate and the second substrate is determined by the difference in moisture adsorption amount between the different resin films.
- the substrate having the larger moisture adsorption amount in the heat treatment, is heated at a temperature of 40 ° C. or higher and 130 ° C. or lower.
- the display quality of the liquid crystal display device can be improved.
- Embodiment 1 of the present invention a method for manufacturing a liquid crystal display device according to Embodiment 1 of the present invention will be described with reference to the drawings.
- the same or corresponding parts in the drawings are denoted by the same reference numerals, and the description thereof will not be repeated.
- FIG. 1 is a diagram schematically showing a part of a process for manufacturing a liquid crystal panel in the method for manufacturing a liquid crystal display device according to Embodiment 1 of the present invention.
- FIG. 2 is a perspective view showing a state in which a sealing material is formed on a substrate having a smaller moisture adsorption amount.
- FIG. 3 is a perspective view showing a state in which liquid crystal is dropped on a substrate having a smaller moisture adsorption amount.
- FIG. 4 is a cross-sectional view showing a state in which two substrates are bonded together to seal a liquid crystal.
- a CF substrate is used as the first substrate and a TFT substrate is used as the second substrate.
- a TFT substrate is used as the second substrate.
- a glass substrate is used as the first substrate, and the second substrate is used.
- a color filter on array substrate may be used as the substrate.
- the chamber is sealed and evacuated while the substrate is placed in the chamber. Measure the change in pressure in the chamber over time when evacuating, and estimate the amount of moisture adsorbed on the substrate by comparing with the change in pressure over time when the substrate is not placed in the chamber. Can do.
- a sealing material 120 for sealing liquid crystal is formed on the CF substrate, which is the substrate 110 having the smaller moisture adsorption amount (S110).
- the sealing material 120 is formed in a rectangular shape, for example.
- a sealing material used in a conventional liquid crystal display device can be used.
- the liquid crystal 130 is dropped on the substrate 110 on which the sealing material 120 is formed (S120).
- the liquid crystal 130 is dropped in a lattice shape within a range surrounded by the sealing material 120.
- the liquid crystal 130 can be dropped using a dispenser or the like.
- the CF substrate which is the substrate 110 having the smaller moisture adsorption amount and the TFT substrate which is the substrate 140 having the larger moisture adsorption amount are bonded together in a vacuum.
- the liquid crystal 130 is injected by returning the pressure to the atmospheric pressure after the liquid crystal dropping surface side of the CF substrate is opposed to the TFT substrate and bonded in a vacuum.
- the liquid crystal 130 is sealed with the CF substrate, the TFT substrate, and the sealing material 120, most of the water adsorbed on the TFT substrate evaporates in a vacuum. In addition, it is possible to suppress the moisture adsorbed on the TFT substrate from remaining. As a result, the liquid crystal distribution in the liquid crystal panel can be made uniform, and the display quality of the liquid crystal display device can be improved.
- a sealing material 120 for sealing liquid crystal is formed on the TFT substrate, which is the substrate 110 having the smaller moisture adsorption amount (S210).
- the sealing material 120 is formed in a rectangular shape, for example.
- a sealing material used in a conventional liquid crystal display device can be used.
- the liquid crystal 130 is dropped on the substrate 110 on which the sealing material 120 is formed (S220).
- the liquid crystal 130 is dropped in a lattice shape within a range surrounded by the sealing material 120.
- the liquid crystal 130 can be dropped using a dispenser or the like.
- the TFT substrate which is the substrate 110 having the smaller moisture adsorption amount
- the CF substrate which is the substrate 140 having the larger moisture adsorption amount
- the liquid crystal 130 is injected by returning the atmospheric pressure after returning the liquid crystal dropping surface side of the TFT substrate to the CF substrate and bonding them in a vacuum.
- the liquid crystal 130 is sealed with the CF substrate, the TFT substrate, and the sealing material 120, most of the water adsorbed on the CF substrate evaporates in a vacuum. It is possible to suppress the moisture adsorbed on the CF substrate from remaining. As a result, the liquid crystal distribution in the liquid crystal panel can be made uniform, and the display quality of the liquid crystal display device can be improved.
- the moisture adsorption amount of the CF substrate and the TFT substrate is measured first (S100). No further steps will be performed.
- the measurement of the moisture adsorption amount (S100) is not repeated and the determination is made.
- the process of forming the sealing material 120 on the substrate 110 having the smaller moisture adsorption amount and the subsequent processes are performed.
- the manufacturing method of the liquid crystal display device according to the present embodiment is different from the manufacturing method of the liquid crystal display device according to the first embodiment only in that additional processing is performed on the substrate 140 having the larger amount of moisture adsorption. Do not repeat.
- FIG. 5 is a diagram schematically showing a part of a process of manufacturing a liquid crystal panel in the method of manufacturing a liquid crystal display device according to the second embodiment of the present invention.
- a method for manufacturing a liquid crystal display device when the moisture adsorption amount of the TFT substrate is larger than the moisture adsorption amount of the CF substrate as a result of the measurement of the moisture adsorption amount (R100) will be described.
- the TFT substrate which is the substrate 140, is heat-treated while being decompressed (S140).
- the pressure is reduced to a pressure of 100 Pa or less.
- the substrate 140 is heated at a temperature of 40 ° C. or higher and 300 ° C. or lower. This is because when the heating temperature is lower than 40 ° C., the moisture adsorbed by the TFT substrate cannot be effectively evaporated, and when the heating temperature is higher than 300 ° C., the characteristics of the TFT substrate change. This is because the performance of the liquid crystal display device deteriorates.
- the moisture adsorbed on the TFT substrate can be evaporated.
- the TFT substrate from which moisture has evaporated slightly adsorbs moisture while being bonded to the CF substrate in a vacuum in the next step.
- the moisture adsorbed on the TFT substrate is suppressed from remaining in the sealed liquid crystal 130 by bonding the CF substrate and the TFT substrate in a vacuum. be able to.
- the liquid crystal distribution in the liquid crystal panel can be made uniform, and the display quality of the liquid crystal display device can be improved.
- the CF substrate which is the substrate 140 with the larger amount of moisture adsorption is subjected to a heat treatment while being decompressed. (S240).
- the pressure is reduced to a pressure of 100 Pa or less.
- the substrate 140 is heated at a temperature of 40 ° C. or higher and 130 ° C. or lower. This is because when the heating temperature is lower than 40 ° C., the moisture adsorbed by the CF substrate cannot be effectively evaporated, and when the heating temperature is higher than 130 ° C., the colored layer of the CF substrate is removed. This is because the performance of the liquid crystal display device is deteriorated due to the decomposition of the resin film to be formed.
- the CF substrate from which the moisture has evaporated slightly adsorbs moisture while being bonded to the TFT substrate in a vacuum in the next step.
- the moisture adsorbed on the CF substrate is suppressed from remaining in the sealed liquid crystal 130 by bonding the CF substrate and the TFT substrate in a vacuum. be able to.
- the liquid crystal distribution in the liquid crystal panel can be made uniform, and the display quality of the liquid crystal display device can be improved.
- the manufacturing method of the liquid crystal display device according to the present embodiment is different from the manufacturing method of the liquid crystal display device according to the second embodiment only in that different resin films are formed on the first substrate and the second substrate. Do not repeat.
- FIG. 6 is a diagram schematically showing a part of a process of manufacturing a liquid crystal panel in the method of manufacturing a liquid crystal display device according to Embodiment 3 of the present invention.
- the method for manufacturing a liquid crystal display device includes a step (S10) of forming a resin film to be a colored layer on a CF substrate which is a first substrate.
- the method for manufacturing a liquid crystal display device includes a step (S20) of forming a resin film serving as an insulating layer on the TFT substrate.
- the resin film formed on the TFT substrate is made of, for example, a novolac resin.
- This resin film for example, has a function of preventing unintentional alignment of the liquid crystal due to the wiring voltage in the TFT substrate, or a function of preventing a short circuit caused by a foreign substance such as a metal between the TFT substrate and the CF substrate. Have.
- the proportion of the moisture adsorption amount by the resin film included in each substrate is large. For this reason, the difference in moisture adsorption between the CF substrate and the TFT substrate is determined by the difference between the moisture adsorption amount of the resin film formed on the CF substrate and the moisture adsorption amount of the resin film formed on the TFT substrate.
- the moisture adsorption amount of the resin film formed on the TFT substrate is larger than the moisture adsorption amount of the resin film formed on the CF substrate, the moisture adsorption amount of the CF substrate is determined as a result of the measurement of the moisture adsorption amount (S100).
- the amount of moisture adsorption on the TFT substrate is larger (R100).
- a sealing material is formed on the CF substrate (S110), and liquid crystal is dropped on the CF substrate (S120).
- the TFT substrate which is the substrate 140 having the larger moisture adsorption amount, is heat-treated while being decompressed (S140).
- the TFT substrate is subjected to a decompression process or a heat treatment.
- the pressure is reduced to a pressure of 100 Pa or less.
- the TFT substrate 140 is heated at a temperature of 40 ° C. or higher and 130 ° C. or lower. This is because when the heating temperature is lower than 40 ° C., the moisture adsorbed by the TFT substrate cannot be effectively evaporated, and when the heating temperature is higher than 130 ° C., the insulating layer of the TFT substrate is removed. This is because the performance of the liquid crystal display device is deteriorated due to the decomposition of the resin film to be formed.
- the CF substrate and the TFT substrate are bonded together in a vacuum (S130).
- the liquid crystal 130 is injected by returning the pressure to the atmospheric pressure after the liquid crystal dropping surface side of the CF substrate is opposed to the TFT substrate and bonded in a vacuum.
- the liquid crystal display device By manufacturing the liquid crystal display device in this way, it is possible to suppress the moisture adsorbed on the CF substrate and the TFT substrate from remaining in the sealed liquid crystal 130. As a result, the liquid crystal distribution in the liquid crystal panel can be made uniform, and the display quality of the liquid crystal display device can be improved.
- the moisture adsorption amount of the resin film formed on the CF substrate is larger than the moisture adsorption amount of the resin film formed on the TFT substrate, the moisture adsorption amount of the CF substrate is determined as a result of the measurement of the moisture adsorption amount (S100). This is larger than the moisture adsorption amount of the TFT substrate (R200).
- a sealing material is formed on the TFT substrate (S210), and liquid crystal is dropped on the TFT substrate (S220).
- the CF substrate which is the substrate 140 with the larger amount of moisture adsorption, is heat-treated while being decompressed (S240).
- the CF substrate is subjected to a decompression process or a heat treatment.
- the pressure is reduced to a pressure of 100 Pa or less.
- the CF substrate 140 is heated at a temperature of 40 ° C. or higher and 130 ° C. or lower. This is because when the heating temperature is lower than 40 ° C., the moisture adsorbed by the CF substrate cannot be effectively evaporated, and when the heating temperature is higher than 130 ° C., the colored layer of the CF substrate is removed. This is because the performance of the liquid crystal display device is deteriorated due to the decomposition of the resin film to be formed.
- the CF substrate and the TFT substrate are bonded together in a vacuum (S230).
- the liquid crystal 130 is injected by returning the atmospheric pressure after returning the liquid crystal dropping surface side of the TFT substrate to the CF substrate and bonding them in a vacuum.
- the liquid crystal display device By manufacturing the liquid crystal display device in this way, it is possible to suppress the moisture adsorbed on the CF substrate and the TFT substrate from remaining in the sealed liquid crystal 130. As a result, the liquid crystal distribution in the liquid crystal panel can be made uniform, and the display quality of the liquid crystal display device can be improved.
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Abstract
Description
図1は、本発明の実施形態1に係る液晶表示装置の製造方法において、液晶パネルを作製する工程の一部を模式的に示す図である。図2は、水分吸着量の少ない方の基板にシール材を形成した状態を示す斜視図である。図3は、水分吸着量の少ない方の基板に液晶を滴下した状態を示す斜視図である。図4は、2枚の基板を貼り合わせて液晶を封止した状態を示す断面図である。
本実施形態の液晶表示装置の製造方法は、水分吸着量の多い方の基板140について追加的処理を行なう点のみ実施形態1の液晶表示装置の製造方法と異なるため、その他の工程については説明を繰り返さない。
本実施形態の液晶表示装置の製造方法は、第1基板および第2基板に、それぞれ異なる樹脂膜を形成する点のみ実施形態2の液晶表示装置の製造方法と異なるため、その他の工程については説明を繰り返さない。
Claims (9)
- 第1基板または第2基板上に液晶(130)を滴下し、前記第1基板または前記第2基板の液晶滴下面側を、液晶(130)が滴下されていない前記第2基板または前記第1基板に対向させて真空中で貼り合わせてから大気圧に戻すことにより液晶注入を行なう液晶表示装置の製造方法であって、
前記第1基板および前記第2基板のうち水分吸着量が少ない方の基板(110)上に液晶(130)を滴下する工程(S120,S220)と、
前記液晶(130)を滴下する工程(S120,S220)の後、前記第1基板と前記第2基板とを真空中で貼り合わせる工程(S130,S230)と
を備える、液晶表示装置の製造方法。 - 請求項1に記載の液晶表示装置の製造方法を繰り返し行なうことにより液晶表示装置を順次製造する方法であって、
最初に、前記第1基板および前記第2基板のうち水分吸着量が少ない方の基板(110)を決定するために、前記第1基板および前記第2基板の水分吸着量を測定する工程(S100)を行ない、
以降、前記測定する工程(S100)を繰り返すことなく前記決定に基づいて、前記液晶(130)を滴下する工程(S120,S220)を行なう、請求項1に記載の液晶表示装置の製造方法。 - 前記第1基板および前記第2基板のうち水分吸着量が多い方の基板(140)を減圧処理する工程(S140,S240)をさらに備える、請求項1または2に記載の液晶表示装置の製造方法。
- 前記第1基板および前記第2基板のうち水分吸着量が多い方の基板(140)を加熱処理する工程(S140,S240)をさらに備える、請求項1または2に記載の液晶表示装置の製造方法。
- 前記第1基板および前記第2基板のうち水分吸着量が多い方の基板(140)を減圧処理しつつ加熱処理する工程(S140,S240)をさらに備える、請求項1または2に記載の液晶表示装置の製造方法。
- 前記加熱処理において、前記水分吸着量が多い方の基板(140)を40℃以上300℃以下の温度で加熱する、請求項4または5に記載の液晶表示装置の製造方法。
- 前記減圧処理において、前記水分吸着量が多い方の基板(140)を100Pa以下の圧力まで減圧する、請求項3または5に記載の液晶表示装置の製造方法。
- 前記第1基板および前記第2基板に、それぞれ異なる樹脂膜を形成する工程(S10,S20)を備え、
前記第1基板および前記第2基板における水分吸着量の違いは、前記それぞれ異なる樹脂膜の水分吸着量の違いによって決定される、請求項4または5に記載の液晶表示装置の製造方法。 - 前記加熱処理において、前記水分吸着量が多い方の基板(140)を40℃以上130℃以下の温度で加熱する、請求項8に記載の液晶表示装置の製造方法。
Priority Applications (3)
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US13/823,657 US20130168006A1 (en) | 2010-10-14 | 2011-10-07 | Method for manufacturing liquid crystal display device |
JP2012538667A JP5450830B2 (ja) | 2010-10-14 | 2011-10-07 | 液晶表示装置の製造方法 |
CN2011800493770A CN103154810A (zh) | 2010-10-14 | 2011-10-07 | 液晶显示装置的制造方法 |
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JP2010-231182 | 2010-10-14 | ||
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US20170160573A1 (en) * | 2012-10-12 | 2017-06-08 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and touch panel |
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CN105892168B (zh) | 2016-06-16 | 2018-05-11 | 武汉华星光电技术有限公司 | 液晶层的形成方法及液晶显示面板、液晶滴注装置 |
CN106353932A (zh) * | 2016-11-07 | 2017-01-25 | 深圳市华星光电技术有限公司 | 液晶面板贴合方法 |
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- 2011-10-07 WO PCT/JP2011/073217 patent/WO2012050060A1/ja active Application Filing
- 2011-10-07 CN CN2011800493770A patent/CN103154810A/zh active Pending
- 2011-10-07 US US13/823,657 patent/US20130168006A1/en not_active Abandoned
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JP2006154166A (ja) * | 2004-11-29 | 2006-06-15 | Seiko Epson Corp | 電気光学装置の貼り合わせ装置及び方法 |
JP2006201236A (ja) * | 2005-01-18 | 2006-08-03 | Seiko Epson Corp | 液晶装置の製造方法、液晶装置の製造装置 |
JP2007101638A (ja) * | 2005-09-30 | 2007-04-19 | Sharp Corp | 液晶表示装置の製造方法 |
Cited By (3)
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US20170160573A1 (en) * | 2012-10-12 | 2017-06-08 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and touch panel |
US10007133B2 (en) * | 2012-10-12 | 2018-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and touch panel |
US10401662B2 (en) | 2012-10-12 | 2019-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and touch panel |
Also Published As
Publication number | Publication date |
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CN103154810A (zh) | 2013-06-12 |
US20130168006A1 (en) | 2013-07-04 |
JP5450830B2 (ja) | 2014-03-26 |
JPWO2012050060A1 (ja) | 2014-02-24 |
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