WO2012042577A1 - 光配向露光装置及び光配向露光方法 - Google Patents
光配向露光装置及び光配向露光方法 Download PDFInfo
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- WO2012042577A1 WO2012042577A1 PCT/JP2010/005915 JP2010005915W WO2012042577A1 WO 2012042577 A1 WO2012042577 A1 WO 2012042577A1 JP 2010005915 W JP2010005915 W JP 2010005915W WO 2012042577 A1 WO2012042577 A1 WO 2012042577A1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
- G02F1/133757—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle with different alignment orientations
Definitions
- the present invention is used in the field of manufacturing a liquid crystal display panel, and in particular, for imparting orientation to an alignment film so that liquid crystal molecules are aligned in a desired angle and direction on a substrate used in a liquid crystal display device.
- the present invention relates to a photo-alignment exposure apparatus and a photo-alignment exposure method.
- Patent Document 1 discloses a method for manufacturing a liquid crystal display substrate in which a plurality of alignment regions having different alignment directions are dividedly formed using an exposure mask for a method using such an optical rubbing method.
- Patent Document 2 discloses an electro-optic that performs photo-alignment processing by simultaneously irradiating the first polarized light emitted from the first region of the wire grid polarizer and the second polarized light emitted from the second region. An apparatus manufacturing method is disclosed.
- the orientation strength in the first region and the second region cannot be made uniform, and in particular, the viewing angle performance cannot be improved.
- the polarized light emitted from the wire grid polarizer is applied to the plate member via the condenser lens, and the image on the wire grid polarizer surface is formed on the plate member surface.
- a photo-alignment exposure apparatus includes polarized light irradiation means and a polarization control element, an irradiation optical system for irradiating a beam on a substrate having an alignment film on the surface, and the substrate or the irradiation optical system.
- Scanning means for moving at least a part and scanning the beam in a predetermined scanning direction with respect to the substrate, and the polarized light irradiation means emits linearly polarized light to the polarization control element, and the polarized light
- the control element has unit polarization control regions arranged in a direction orthogonal to the scanning direction, and the polarization direction of the beam emitted from the unit polarization control region periodically changes every predetermined number of unit polarization control regions. In addition, it is substantially symmetric with respect to a plane parallel to the scanning direction and perpendicular to the substrate within the period.
- the polarized light emitting means emits linearly polarized light in a direction substantially parallel to the scanning direction
- the polarization control element is constituted by a half-wave plate
- the high-speed axis of the unit polarization control region periodically changes for each predetermined number of unit polarization control regions, and is substantially symmetric with respect to a plane parallel to the scanning direction and perpendicular to the substrate within the period.
- the irradiation optical system includes an imaging optical system that forms an image on the substrate at least in the direction substantially orthogonal to the scanning direction. It is a feature.
- the irradiation optical system reduces and condenses the image on the surface of the polarization control element on the substrate in at least substantially the same direction as the scanning direction. It is characterized by having a system.
- the reduction optical system has at least one cylindrical lens, and a fire surface formed by the cylindrical lens intersects the substrate so that at least one fire line is formed. It is characterized by forming.
- the photo-alignment exposure method is a photo-alignment exposure method for irradiating a substrate having an alignment film on the surface with a beam that has passed through an irradiation optical system including a polarization control element. At least a portion is moved, and the beam is scanned in a predetermined scanning direction with respect to the substrate, and the polarization control element has unit polarization control regions arranged in a direction orthogonal to the scanning direction, The polarization direction of the beam irradiated from the unit polarization control region changes periodically for each predetermined number of unit polarization control regions, and is substantially symmetrical with respect to a plane parallel to the scanning direction and perpendicular to the substrate within the period. It is characterized by being.
- the present invention it is possible to form an alignment film with uniform alignment intensity by making the polarization direction of the beam irradiated from the unit polarization control region substantially symmetric with respect to the scanning direction every predetermined number. Furthermore, since the alignment state has symmetry, a liquid crystal display device having excellent viewing angle performance can be realized.
- the configuration can be simplified by using a half-wave plate for the polarization control element.
- the imaging optical system in the irradiation optical system, it becomes possible to image the polarization control element surface on the surface of the substrate in a direction substantially orthogonal to the scanning direction. It is possible to suppress the influence of diffracted waves, scattered waves and the like generated between adjacent unit polarization control regions, and to form good alignment characteristics.
- the light that has passed through the polarization control element is reduced or condensed on the surface of the substrate in substantially the same direction as the scanning direction. Therefore, it is possible to suppress the influence when there is a defect such as a scratch on the surface of the polarization control element, and to form good alignment characteristics.
- produces with a polarization control element.
- FIG. 1 is a diagram showing a configuration of a photo-alignment exposure apparatus according to an embodiment of the present invention.
- the photo-alignment exposure apparatus of this embodiment has an irradiation optical system 11 and a scanning unit 15 as main components.
- the irradiation optical system 11 is a means for imparting alignment characteristics to the alignment film disposed on the substrate 2 by irradiating the alignment film formed on the surface of the substrate 2 with an ultraviolet light beam. In this embodiment, it is comprised by the polarized light irradiation means 12 and the polarization control element 14.
- the scanning unit 15 is a unit that scans the substrate 2 with the beam irradiated by the irradiation optical system 11 by moving the substrate 2 placed on the upper surface thereof in a predetermined scanning direction (Y-axis direction in the drawing). is there.
- a scanning method in addition to moving the substrate 2 in this way, the irradiation optical system 11 may be moved, or both the substrate 2 and the irradiation optical system 11 may be moved.
- the substrate 2 is directly irradiated with the irradiation light C from the polarization control element 14.
- a mask that restricts the irradiation region to a slit shape may be provided between the polarization control element 14 and the substrate 2. By providing the mask, it becomes possible to expose only the effective irradiation light to the substrate 2 and to improve the alignment performance.
- the substrate 2 to be exposed is installed.
- the substrate 2 is installed such that the scanning direction is the vertical direction or the horizontal direction when used as a liquid crystal display device.
- a photoreactive polymer such as polyimide is formed in a film shape.
- the polymer film is denatured by irradiating the polymer film with linearly polarized light and liquid crystal molecules are applied to the polymer film in a subsequent process (not shown), the liquid crystal molecules are affected by the polymer film and specified. Align (orient) in the direction of.
- a polymer film having this alignment characteristic is referred to as an alignment film.
- a polymer film before imparting alignment characteristics is also referred to as an alignment film.
- the molecular film is also referred to as an alignment film.
- the polarized light irradiation means 12 includes a light source 12a, a reflecting mirror 12b, and a polarizer 12c.
- the ultraviolet light irradiated from the light source 12a such as an ultraviolet lamp is adjusted to become parallel light by a reflecting mirror 12b such as a parabolic mirror, and irradiated as light source light A to the polarizer 12c side.
- the polarizer 12c is means for extracting a linearly polarized light component in a predetermined direction from the light source light A.
- linearly polarized light B substantially parallel to the Y-axis direction (scanning direction) is extracted from the light source light A by the polarizer 12c.
- linearly polarized light substantially perpendicular to the Y-axis direction (scanning direction) may be used.
- the polarization control element 14 is an element that rotates the polarization direction of the incident linearly polarized light by a predetermined angle, and is configured by a half-wave plate in the present embodiment.
- FIG. 2 is a diagram showing a state of polarization direction control in the polarization control element 14.
- FIG. 2A is a diagram showing the polarization direction of incident light incident on the polarization control element 14, and linearly polarized light B corresponds to this in FIG. 1.
- FIG. 2B is a partially enlarged view of the polarization control element 14.
- FIG. 2C is a diagram showing the polarization direction of the output light emitted from the polarization control element 14, and the irradiation light C corresponds to this in FIG.
- FIGS. 2A to 2C actually overlap in the Z-axis direction, but are shown here shifted in the Y-axis direction for explanation.
- the polarization control element 14 is formed to have unit polarization control regions 14a and 14b having a predetermined width in the X-axis direction, that is, the direction orthogonal to the scanning direction.
- the unit polarization control regions 14a and 14b have a width in the X-axis direction of about several ⁇ m to several tens of ⁇ m, and the direction of the high-speed axis is different for each adjacent region.
- the unit polarization control regions 14a and 14b are formed to have a repetitive pattern with a predetermined number (in this case, two) as a cycle. In the example shown in FIG. 2B, one period A1 and A2 is formed by the two unit polarization control regions 14a and 14b.
- the unit polarization control regions 14a and 14b in the respective periods A1 and A2 are formed so that their high-speed axes are substantially symmetric with respect to the Y-axis direction, that is, the scanning direction.
- the term “symmetry” as used herein is precisely divided into a plurality of units in the direction (X-axis direction) orthogonal to the scanning direction, such as a predetermined number (in this case, two) of unit polarization control regions 14a and 14b.
- the polarization direction or the direction of the high-speed axis of the wave plate is parallel to the scanning direction and is substantially symmetric with respect to a plane perpendicular to the substrate 2 not shown here.
- the high speed axis is inclined counterclockwise by the angle ⁇ with respect to the Y axis, whereas in the unit polarization control region 14b, the high speed axis is clockwise with respect to the Y axis. Is inclined at an angle ⁇ .
- the plane of polarization is rotated so as to be symmetric with respect to the high-speed axis. That is, as shown in FIG. 2C, the polarization plane of the irradiation light output from the unit polarization control region 14a rotates counterclockwise by 2 ⁇ with respect to the Y axis. On the other hand, the irradiation light emitted from the unit polarization control region 14b rotates by an angle 2 ⁇ clockwise with respect to the Y axis.
- the irradiation light irradiated from the polarization control element 14, that is, the irradiation light C irradiated onto the substrate 2 has a polarization direction with respect to the Y-axis direction for each of a predetermined number of unit polarization control regions 14a and 14b. It becomes almost symmetrical.
- ⁇ 22.5 °
- the polarization planes between adjacent unit polarization control regions 14a and 14b are orthogonal to each other (90 °). can do.
- the irradiation light C will give alignment characteristics to the alignment film of the substrate 2, but the polarization direction between the adjacent unit polarization control regions 14 a and 14 b is symmetric with respect to the scanning direction. It is possible to make the alignment strength of the alignment films uniform.
- the polarization direction can be made substantially symmetrical with respect to the vertical direction or the horizontal direction of the liquid crystal display device, and the orientation has excellent viewing angle characteristics. It becomes possible to form characteristics.
- the polarization direction of the incident light shown in FIG. 2A is not only parallel to the scanning direction as in the present embodiment, but also by making it perpendicular, the polarization direction of the irradiation light can be made symmetric. it can.
- FIG. 3 is a diagram showing an example of the positional relationship between the substrate 2 and the pixels when incorporated in a liquid crystal display device.
- each period A is arranged so as to correspond to one pixel 21.
- the polarization direction of the irradiation light C used for the alignment is shown, and the pixels 21a, 21b, and 21c correspond to the alignment regions of the periods A1, A2, and A3, respectively.
- Each orientation region is formed by a predetermined number (two) of unit polarization control regions 14a and 14b as described with reference to FIG.
- the orientation directions in each period are orthogonal to each other.
- ⁇ 22.5 °
- the high-speed axis of the polarization control element 14 is adjusted so that the alignment directions are orthogonal. Since the parameter used for the adjustment is only the angle ⁇ , it can be easily adjusted.
- the polarization direction of the irradiation light from the polarization control element 14 is substantially symmetric with respect to the scanning direction for each predetermined number of unit polarization control regions, an alignment film having good alignment characteristics can be formed. It becomes possible.
- the period A having two alignment regions is arranged corresponding to one pixel 21.
- the alignment region is appropriately selected depending on the performance of the liquid crystal display device or the usage application.
- Can be. 4 and 5 are diagrams showing a positional relationship between the substrate 2 and the pixels according to another embodiment.
- FIG. 4 shows an embodiment in which one pixel 21 is arranged in correspondence with a period A having four alignment regions. Also in this embodiment, the polarization direction of each period A is symmetric with respect to the scanning direction. For example, by forming the polarization direction so that the orientation direction of the substrate 2 has a relationship of ⁇ 30 ° and ⁇ 60 ° with respect to the Y axis in each period A, an orientation film having excellent viewing angle performance is formed. Is possible.
- FIG. 5 shows that each pixel is associated with one alignment region, and one period A is formed by two adjacent pixels 21a and 21b.
- the relationship between the pixel 21 and the period A may not be a one-to-one relationship.
- the pixels 21a and 21c in the figure are used as the left-eye pixels, the pixels 21b and 21d are used as the right-eye pixels, and it is possible to observe stereoscopic images using polarized glasses having polarization filters corresponding to the respective pixels 21. .
- the substrate 2 is directly irradiated with the irradiation light C from the polarization control element 14.
- the polarization control element 14 that can accommodate a large liquid crystal display device. Therefore, as shown in FIG. 6, a plurality of polarization control element units 14A to 14C each having a width of about 30 cm are formed. It has been made. Since the connection portions of the adjacent polarization control element units 14A to 14C are discontinuous boundaries, diffracted waves, scattered waves, and the like are generated at the connection portions, and interfere with the waves transmitted through the polarization control element units 14A to 14C. Then, blur and interference fringes are generated on the substrate 2. This phenomenon also occurs between adjacent unit polarization control regions. In the present embodiment, in order to cope with such a problem, an imaging optical system is provided in the irradiation optical system 11.
- FIG. 7 is a diagram schematically showing a part of the irradiation optical system in the present embodiment.
- the imaging optical system in the present embodiment includes a first lens 16a and a second lens 16b disposed between the polarization control element 14 and the substrate 2.
- the first lens 16a is a lens having a focal length f1, and is arranged at a distance f1 from the surface of the polarization control element 14 to the image side.
- the second lens 16b is a lens having a focal length f1, and is disposed at a distance f1 from the substrate 2 toward the object side.
- the distance between the first lens 16a and the second lens 16b is set to 2 ⁇ f1.
- the parallel light that has passed through the polarization control element 14 is once condensed through the first lens 16a, and again irradiated to the substrate 2 as parallel light through the second lens 16b, so that an image of the polarization control element 14 is obtained. Is imaged on the substrate 2 at the same magnification.
- the imaging optical system of the present embodiment forms an image in at least the X-axis direction, that is, in a direction substantially orthogonal to the direction of the connection portion of the polarization control element units 14A to 14C (Y-axis direction: scanning direction). It is said. Accordingly, it is possible to suppress the influence of diffracted waves, scattered waves, etc. generated between adjacent polarization control element units 14A to 14C or between adjacent unit polarization control regions.
- FIG. 7 an arrow indicating the direction of the fast axis of the wave plate is written on the end face of the polarization control element 14, and an arrow indicating the polarization direction of each region is written on the end face of the substrate 2.
- these arrows should be described on the XY plane, but here, they are described on the paper for explanation.
- the focal lengths of the first lens 16a and the second lens 16b are both set to f1, and the distance between the polarization control element 14, the first lens 16a, the second lens 16b, and the substrate 2 is set to f1: 2f1. :
- the distance between the first lens 16a and the second lens 16b can be arbitrarily set.
- FIG. 8 is a diagram schematically showing a part of an irradiation optical system in another embodiment.
- the irradiation optical system 11 has both functions of an imaging optical system and a reduction optical system. I am trying to make it.
- the first lens 16a and the second lens 16b are arranged as in FIG. 7, and the polarization control element 14 and the first lens are arranged.
- a concave cylindrical lens 17 having no power in the XZ plane and having a negative power in the YZ plane is disposed between 16a.
- the concave cylindrical lens 17 (“cylindrical lens” in the present invention) is a lens having a focal length ⁇ f2, and is disposed at a distance f2 from the polarization control element 14.
- the surface of the polarization control element 14 is imaged on the surface of the substrate 2 in the XZ plane as described in the embodiment of FIG.
- the parallel light that has passed through the polarization control element 14 in the YZ plane is diverged by the concave cylindrical lens 17.
- the diverging light is changed into parallel light and emitted to the second lens 16b side.
- the parallel light is reduced and irradiated onto the substrate 2.
- the parallel light is condensed by arranging the substrate 2 at the rear focal position of the second lens 16b.
- this embodiment is characterized in that a reduction optical system that reduces or condenses the irradiation light from the polarization control element 14 on the substrate 2 in a direction substantially parallel to the scanning direction is provided.
- a reduction optical system that reduces or condenses the irradiation light from the polarization control element 14 on the substrate 2 in a direction substantially parallel to the scanning direction is provided.
- the concave cylindrical lens 17 is provided on the object side of the first lens 16a.
- the arrangement position may be on the image side.
- a convex cylindrical lens is used when realizing a reduction function in the case where the first lens 16a is disposed closer to the substrate 2 than the focal point on the image side.
- FIG. 9 is a diagram schematically showing a part of an irradiation optical system in another embodiment.
- the irradiation optical system 11 has functions of an imaging optical system and a reduction optical system. It is also given together.
- the first lens 16a and the second lens 16b function as an imaging optical system as in the previous embodiment.
- the convex cylindrical lens 17 has no power in the XZ plane, has a positive power (focal length f3) in the YZ plane, and is disposed on the image side of the second lens 16b.
- the convex cylindrical lens 18 has no power in the XZ plane, has a positive power (side focal length f4) in the YZ plane, and is disposed between the convex cylindrical lens 17 and the substrate 2. Yes.
- the distance between the convex cylindrical lens 18 and the convex cylindrical lens 17 is set to be the sum of the focal length f4 of the convex cylindrical lens 18 and the focal length f3 of the convex cylindrical lens 17, that is, to form a confocal system. .
- the parallel light emitted from the second lens 16b is again formed on the substrate 2 by forming parallel light by the convex cylindrical lenses 17 and 18 forming the confocal system.
- the focal length f3 of the convex cylindrical lens 17 is larger than the focal length f4 of the convex cylindrical lens, it is possible to combine the functions of the reduction optical system and the parallel optical system.
- the convex cylindrical lens 17 and the convex cylindrical lens 18 can achieve the same function even when a convex cylindrical lens and a concave cylindrical lens are combined.
- FIG. 10 is a diagram schematically showing a part of an irradiation optical system in another embodiment.
- a convex cylindrical lens 17 is used as a reduction optical system having the simplest configuration, and the focal point 31 is disposed so as to be farther from the substrate 2.
- the convex cylindrical lens 17 has no power in the XZ plane, has a positive power in the YZ plane, and is disposed on the image side of the second lens 16b.
- the cylindrical lens 17 does not have a lens action, so that the boundaries of the unit polarization regions 14a and 14b are imaged on the substrate 2 as in the previous embodiment. Is done.
- the light beam 32a passing through the vicinity of the optical axis is collected at the focal point 31 at the tip of the substrate 2.
- the light beam 32b slightly separated from the optical axis is still focused on the focal point 31 in the case of an ideal lens.
- the light beam far from the optical axis usually has a focal length in a convex lens. The light is shortened and condensed at a position closer to the cylindrical lens 17 than the focal point 31. Further, the light beam 32c far from the optical axis is condensed at a position closer to the cylindrical lens 17 than the light beam 32b.
- the envelope surfaces 33a, 33b are formed on both sides of the optical axis in the Y direction by the light beams 32a, 32b, 32c, 32d.
- the envelope surface is in contact with the light beams 32a, 32b, 32c, and 32d, but is drawn slightly apart for convenience of illustration. Looking at the position of each light beam on the substrate 2, the light beams 32b and 32c are positioned outside the light beam 32a, and the light beam 32d is positioned closer to the optical axis than the light beams 32b and 32c.
- the light rays 32a, 32b, 32c, and 32d that have been separated from the optical axis in the order of incidence on the substrate 2 are folded back on the substrate 2 around the light rays 32b and 32c. Therefore, the intensity is high because the light rays gather on the envelope surface for folding.
- the intersecting line between the envelope surface and the substrate 2 is a circle in the case of a spherical lens, and a pair of parallel straight lines in a cylindrical lens as in this embodiment.
- the line of intersection between the envelope surface (fire surface) and the substrate is defined as “fire line”.
- the intensity distribution of the beam in the Y direction on the substrate 2 is bright because the middle of the fire line is focused, extremely bright on the fire line, and the beam intensity is zero outside the fire line. In other words, a straight beam having a very steep boundary can be obtained by using a fire wire. As a result, alignment characteristics can be effectively imparted to the alignment film.
- the two cylindrical heating lines 34a and 34b are formed on the base material 2 by the convex cylindrical lens 17.
- the other optical systems shown so far can use the beam including the horizontal heating line. The merits of obtaining a linear beam with a sharp boundary are the same.
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012536033A JP5564695B2 (ja) | 2010-10-01 | 2010-10-01 | 光配向露光装置及び光配向露光方法 |
CN201080070445.7A CN103403614B (zh) | 2010-10-01 | 2010-10-01 | 光取向曝光装置及光取向曝光方法 |
KR1020137007734A KR101462272B1 (ko) | 2010-10-01 | 2010-10-01 | 광 배향 노광 장치 및 광 배향 노광 방법 |
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Cited By (4)
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JP5105567B1 (ja) * | 2012-04-19 | 2012-12-26 | 信越エンジニアリング株式会社 | 光配向照射装置 |
JP5131886B1 (ja) * | 2012-04-19 | 2013-01-30 | 信越エンジニアリング株式会社 | 光配向照射装置 |
CN104395832A (zh) * | 2012-07-05 | 2015-03-04 | 株式会社V技术 | 光取向曝光装置及光取向曝光方法 |
JP2021101207A (ja) * | 2019-12-24 | 2021-07-08 | ウシオ電機株式会社 | 偏光光照射装置および偏光光照射方法 |
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CN104267542B (zh) * | 2014-09-26 | 2017-06-30 | 京东方科技集团股份有限公司 | 一种光配向装置、控制装置及光配向方法 |
KR102387205B1 (ko) * | 2015-07-31 | 2022-04-15 | 엘지디스플레이 주식회사 | 광배향 장치 및 이를 이용한 광배향 방법 |
CN113031349B (zh) * | 2021-03-22 | 2021-12-31 | 惠科股份有限公司 | 光配向装置及光配向方法 |
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JP2002277877A (ja) * | 2001-03-21 | 2002-09-25 | Sharp Corp | 液晶表示装置およびその製造方法 |
JP2008145700A (ja) * | 2006-12-08 | 2008-06-26 | Sharp Corp | 液晶表示装置およびその製造法 |
JP2010091906A (ja) * | 2008-10-10 | 2010-04-22 | Seiko Epson Corp | 電気光学装置の製造方法 |
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JP5105567B1 (ja) * | 2012-04-19 | 2012-12-26 | 信越エンジニアリング株式会社 | 光配向照射装置 |
JP5131886B1 (ja) * | 2012-04-19 | 2013-01-30 | 信越エンジニアリング株式会社 | 光配向照射装置 |
WO2013157113A1 (ja) * | 2012-04-19 | 2013-10-24 | 信越エンジニアリング株式会社 | 光配向照射装置 |
WO2013157114A1 (ja) * | 2012-04-19 | 2013-10-24 | 信越エンジニアリング株式会社 | 光配向照射装置 |
CN103765303A (zh) * | 2012-04-19 | 2014-04-30 | 信越工程株式会社 | 光定向照射装置 |
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CN104395832A (zh) * | 2012-07-05 | 2015-03-04 | 株式会社V技术 | 光取向曝光装置及光取向曝光方法 |
JP2021101207A (ja) * | 2019-12-24 | 2021-07-08 | ウシオ電機株式会社 | 偏光光照射装置および偏光光照射方法 |
JP7415545B2 (ja) | 2019-12-24 | 2024-01-17 | ウシオ電機株式会社 | 偏光光照射装置および偏光光照射方法 |
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CN103403614A (zh) | 2013-11-20 |
KR101462272B1 (ko) | 2014-11-17 |
JPWO2012042577A1 (ja) | 2014-02-03 |
KR20130069773A (ko) | 2013-06-26 |
CN103403614B (zh) | 2016-06-29 |
JP5564695B2 (ja) | 2014-07-30 |
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