WO2012001180A1 - Polysilane mittlerer kettenlänge und verfahren zu deren herstellung - Google Patents
Polysilane mittlerer kettenlänge und verfahren zu deren herstellung Download PDFInfo
- Publication number
- WO2012001180A1 WO2012001180A1 PCT/EP2011/061258 EP2011061258W WO2012001180A1 WO 2012001180 A1 WO2012001180 A1 WO 2012001180A1 EP 2011061258 W EP2011061258 W EP 2011061258W WO 2012001180 A1 WO2012001180 A1 WO 2012001180A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polysilanes
- ppm
- chain length
- medium chain
- length according
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
Definitions
- the present invention relates to polysilanes of medium chain length as pure compound or mixture of
- composition the atomic ratio substituent: silicon is at least 1: 1, and method for their preparation.
- polysilanes are prepared by numerous methods, such as by heating gaseous chlorosilanes with or without reducing agent to relatively high temperatures (above 700 ° C).
- PCS chlorinated polysilanes
- the resulting chlorinated polysilanes (PCS) have only a high proportion of short-chain, branched and / or cyclic molecules and are also contaminated with solvent / catalyst or substances from the reactor walls.
- PCS chlorinated polysilanes
- the present invention is based on the object
- Polysilanes medium chain length as a pure compound or Mixture of compounds each having at least one direct bond Si-Si whose substituents consist exclusively of halogen and / or hydrogen and in whose composition the atomic ratio substituent: silicon is at least 1: 1, and a process for their
- polysilanes according to the invention of medium chain length are characterized in their chemical properties by the presence of direct bonds Si-Si, whereby these substances have a strong affinity for oxygen and chlorine and are suitable for binding these elements.
- these substances e.g. chlorinated oligosilanes too
- the vapor pressure is preferably above 1 hPa and below 1000 hPa at 200 ° C. Particularly noteworthy here is the property of all According to the invention polysilanes that from these due to their molecular composition by suitable processes, such as annealing at high temperatures, pure silicon can be obtained.
- All polysilanes according to the invention also have in common that they disproportionate in the thermal treatment, that is, disintegrate into longer and shorter-chain products.
- the brominated or hydrogenated polysilane is colorless to light yellow.
- the chlorinated polysilane is colorless to greenish yellow, intense orange or reddish brown.
- the polysilanes of medium chain length are liquid or viscous to solid depending on their molecular structure.
- polysilanes which are solids in pure form may also be completely or partially dissolved in liquid polysilanes.
- the polysilanes expediently have a metal content of less than 1%.
- polysilanes which are less than 2 atomic%.
- polysilanes are used which predominantly linear long chains and almost no short chain
- branch points of the short-chain Proportion based on the entire product, preferably less than 2%.
- the substituents of the polysilanes preferably consist exclusively of halogen or of halogen and hydrogen.
- the polysilanes of medium chain length can continue
- Polysilanes whose substituents are bromine have a) in 29 Si NMR spectra their significant product signals in the chemical shift range from -10 ppm to -42 ppm, from -46 ppm to -55 ppm and / or -63 ppm to -96 ppm , b) typical RAMAN intensities not outside the ranges 10 cm “1 to 150 cm “ 1 , 155 cm “1 to 350 cm “ 1 , at 390 cm “1 to 600 cm “ 1 and at 930 cm “1 to 1,000 cm “ 1 .
- Laser excitation T-sapphire laser, pumped by Ar ion laser
- confocal Raman and Lumineszenzmikroskop with liquid nitrogen cooled CCD detector, measuring temperature equal to room temperature, excitation wavelengths in the visible spectral range, u. a. 514.53 nm and 750 nm, measured.
- Bruker OPX 250 with pulse sequence zg30 recorded and against tetramethylsilane (TMS) as external standard [ ⁇ ( 29 Si) 0.0] referenced.
- Polysilanes of medium chain length Si n 2n + 2 and Si n 2n with n greater than 3 and less than 50, preferably greater than 3 and less than 9, more preferably greater than 3 and less than 7, and X F, Cl, Br, I and / or H is thereby characterized in that it contains one or more of the synthesis steps described below.
- the individual variants are below
- the polysilanes are through
- the polysilanes are obtained by plasma-assisted synthesis of halosilanes, where halogen is bromine.
- the polysilanes are obtained by plasma-assisted synthesis of H-silanes and / or H-oligosilanes.
- the polysilanes are obtained by plasma-assisted synthesis of halogenated oligosilanes, with particular preference being given to using halogenated di- and trisilanes.
- the polysilanes are prepared by plasma-assisted synthesis of mixtures which also contain organically substituted silanes and / or oligosilanes.
- methylchlorosilanes are used for this purpose.
- the polysilanes are through
- Hydrohalogenation may be assisted by catalysts such as ammonium salts.
- the polysilanes by catalytic coupling of disilanes and / or trisilanes with Organylphosphonium- and / or -ammoniumsalzen as
- the polysilanes are through
- Wurtzkupplung of lower halosilanes such as disilanes and / or trisilanes
- alkali metals and / or magnesium Especially preferred are activated metals, e.g. Rieke magnesium.
- the polysilanes are through
- the polysilanes are through
- the polysilanes are through
- Hydrogenation of polysilanes medium chain length obtained preference is given to using halogenated polysilanes.
- metal or metalloid hydrides are preferably used.
- the reactor parts in which the above reactions take place are at a temperature of -70 ° C to 500 ° C,
- the polysilanes are obtained by pyrolysis of polysilane by a
- Disproportionation and isolation of the polysilanes of the invention takes place from the vapor phase.
- the polysilanes are obtained by thermolytic chain extension on contact materials. It is after disproportionation of
- Starting material preferably the longer-chain fraction isolated from the product mixture.
- the polysilanes are obtained by thermal reaction of silicon with S1X. 4
- FIG. 1 shows a Si-NMR spectrum of a
- thermolysis A mixture of 300 sccm of H2 and 600 sccm of SiCl 4 (1: 2) is introduced into a quartz glass reactor, the process pressure being kept constant in the range from 1.5 to 1.6 hPa. The gas mixture is then by a high-frequency discharge in the
- the polychlorosilane mixture converted to a solid, highly crosslinked chlorinated polysilane (chloride-containing silicon) of the empirical formula SiClo, os to SiClo, o7 and short-chain chlorosilanes. After completion of the reaction, the container was allowed to cool and the solid product was taken out. Yields based on the
- a mixture of 200 sccm of H2 and 600 sccm of SiCl 4 vapor (1: 3) is introduced into a quartz glass reactor, the process pressure being kept constant in the range of 1.50-1.55 hPa.
- the gas mixture is then transferred by a high-frequency discharge in the plasma-shaped state, wherein the
- radiated power is 400W.
- the orange-yellow product is removed from the reactor by dissolving in a little SiCl 4 .
- 86.5 g of chlorinated polysilane remain in the form of an orange-yellow viscous mass.
- 80 g of a chlorinated polysilane obtained in this way are mixed with 36.5 g
- the chain length refers to the number of directly interconnected silicon atoms in a compound.
- the term "average chain length" those compounds in which 3 ⁇ n ⁇ 50, preferably 3 ⁇ n ⁇ 9, more preferably 3 ⁇ n ⁇ 7.
- longer-chain used here refers to those compounds in which n> 3. Where n is the
- Contaminants are present in the mixture than is usual at high levels of purity for fine chemicals (e.g.,> 99%). Therefore, here is meant a purity of at least 99.9%.
- polysilane such as SiCl 4 , benzene, toluene, paraffin, etc.
- the polysilane preferably meets the requirements for
- monosilanes can be used as starting materials for the process according to the invention
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Polymers (AREA)
- Silicon Compounds (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013517346A JP2013529591A (ja) | 2010-07-02 | 2011-07-04 | 中鎖長ポリシランおよびそれを製造する方法 |
US13/807,052 US20130216465A1 (en) | 2010-07-02 | 2011-07-04 | Polysilanes of medium chain length and a method for the production of same |
KR1020137002352A KR101569594B1 (ko) | 2010-07-02 | 2011-07-04 | 중간 사슬 길이의 폴리실란 및 그 제조방법 |
EP11730630.8A EP2588411A1 (de) | 2010-07-02 | 2011-07-04 | Polysilane mittlerer kettenlänge und verfahren zu deren herstellung |
CN2011800318131A CN103080006A (zh) | 2010-07-02 | 2011-07-04 | 中等链长的聚硅烷及其制备方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010025948.9 | 2010-07-02 | ||
DE102010025948A DE102010025948A1 (de) | 2010-07-02 | 2010-07-02 | Polysilane mittlerer Kettenlänge und Verfahren zu deren Herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012001180A1 true WO2012001180A1 (de) | 2012-01-05 |
Family
ID=44544097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2011/061258 WO2012001180A1 (de) | 2010-07-02 | 2011-07-04 | Polysilane mittlerer kettenlänge und verfahren zu deren herstellung |
Country Status (7)
Country | Link |
---|---|
US (1) | US20130216465A1 (de) |
EP (1) | EP2588411A1 (de) |
JP (1) | JP2013529591A (de) |
KR (1) | KR101569594B1 (de) |
CN (1) | CN103080006A (de) |
DE (1) | DE102010025948A1 (de) |
WO (1) | WO2012001180A1 (de) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014013250A1 (de) * | 2014-09-08 | 2016-03-10 | Psc Polysilane Chemicals Gmbh | Verfahren zur Aufreinigung halogenierter Oligosilane |
WO2020077182A1 (en) | 2018-10-11 | 2020-04-16 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process for producing isomer enriched higher silanes |
US10752507B2 (en) | 2018-10-11 | 2020-08-25 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Process for producing liquid polysilanes and isomer enriched higher silanes |
US11097953B2 (en) | 2018-10-11 | 2021-08-24 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Process for producing liquid polysilanes and isomer enriched higher silanes |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013021306A1 (de) * | 2013-12-19 | 2015-06-25 | Johann Wolfgang Goethe-Universität | Verfahren zum Herstellen von linearen, cyclischen und/oder käfigartigen perhalogenierten Oligo- und Polysilyl-Anionen |
DE102014109275A1 (de) * | 2014-07-02 | 2016-01-07 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Nanopartikeln, Nanopartikel und deren Verwendung |
US20200283297A1 (en) * | 2016-02-16 | 2020-09-10 | Showa Denko K.K. | Method for producing oligosilane |
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US4683147A (en) * | 1984-04-16 | 1987-07-28 | Canon Kabushiki Kaisha | Method of forming deposition film |
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US4374182A (en) | 1980-07-07 | 1983-02-15 | Dow Corning Corporation | Preparation of silicon metal through polymer degradation |
JPS591505A (ja) * | 1982-06-28 | 1984-01-06 | Tdk Corp | 低摩擦薄膜付き物品 |
JPS59182222A (ja) * | 1983-03-30 | 1984-10-17 | Mitsui Toatsu Chem Inc | ポリクロロシランの製造方法 |
JPS60218473A (ja) * | 1984-04-16 | 1985-11-01 | Canon Inc | 堆積膜形成方法 |
JPS6389414A (ja) * | 1986-10-03 | 1988-04-20 | Mitsubishi Metal Corp | クロロポリシランの製造方法 |
JPH01100010A (ja) * | 1987-10-14 | 1989-04-18 | Canon Inc | 非晶質水素化シリコン微粒子膜及びその製造方法 |
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JP2003313299A (ja) * | 2002-04-22 | 2003-11-06 | Seiko Epson Corp | 高次シラン組成物及び該組成物を用いたシリコン膜の形成方法 |
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2010
- 2010-07-02 DE DE102010025948A patent/DE102010025948A1/de not_active Withdrawn
-
2011
- 2011-07-04 EP EP11730630.8A patent/EP2588411A1/de not_active Withdrawn
- 2011-07-04 KR KR1020137002352A patent/KR101569594B1/ko active IP Right Grant
- 2011-07-04 CN CN2011800318131A patent/CN103080006A/zh active Pending
- 2011-07-04 JP JP2013517346A patent/JP2013529591A/ja active Pending
- 2011-07-04 US US13/807,052 patent/US20130216465A1/en not_active Abandoned
- 2011-07-04 WO PCT/EP2011/061258 patent/WO2012001180A1/de active Application Filing
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014013250A1 (de) * | 2014-09-08 | 2016-03-10 | Psc Polysilane Chemicals Gmbh | Verfahren zur Aufreinigung halogenierter Oligosilane |
US10457559B2 (en) | 2014-09-08 | 2019-10-29 | Psc Polysilane Chemicals Gmbh | Method for purifying halogenated oligosilanes |
DE102014013250B4 (de) | 2014-09-08 | 2021-11-25 | Christian Bauch | Verfahren zur Aufreinigung halogenierter Oligosilane |
WO2020077182A1 (en) | 2018-10-11 | 2020-04-16 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process for producing isomer enriched higher silanes |
US10752507B2 (en) | 2018-10-11 | 2020-08-25 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Process for producing liquid polysilanes and isomer enriched higher silanes |
US11097953B2 (en) | 2018-10-11 | 2021-08-24 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Process for producing liquid polysilanes and isomer enriched higher silanes |
US11377359B2 (en) | 2018-10-11 | 2022-07-05 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Process for producing liquid polysilanes and isomer enriched higher silanes |
US11401166B2 (en) | 2018-10-11 | 2022-08-02 | L'Air Liaquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Process for producing isomer enriched higher silanes |
Also Published As
Publication number | Publication date |
---|---|
KR20130072237A (ko) | 2013-07-01 |
EP2588411A1 (de) | 2013-05-08 |
CN103080006A (zh) | 2013-05-01 |
DE102010025948A1 (de) | 2012-01-05 |
US20130216465A1 (en) | 2013-08-22 |
JP2013529591A (ja) | 2013-07-22 |
KR101569594B1 (ko) | 2015-11-16 |
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