WO2011077195A1 - Plasma source having improved life-time - Google Patents

Plasma source having improved life-time Download PDF

Info

Publication number
WO2011077195A1
WO2011077195A1 PCT/IB2009/056061 IB2009056061W WO2011077195A1 WO 2011077195 A1 WO2011077195 A1 WO 2011077195A1 IB 2009056061 W IB2009056061 W IB 2009056061W WO 2011077195 A1 WO2011077195 A1 WO 2011077195A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
conduit
hole
plasma source
outer side
Prior art date
Application number
PCT/IB2009/056061
Other languages
French (fr)
Inventor
Peter Choi
Raul Fernando Aliaga Rosser
Original Assignee
Nano Uv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nano Uv filed Critical Nano Uv
Priority to PCT/IB2009/056061 priority Critical patent/WO2011077195A1/en
Priority to TW099145410A priority patent/TW201143544A/en
Publication of WO2011077195A1 publication Critical patent/WO2011077195A1/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes

Definitions

  • the present invention relates to a plasma source having an improved life-time.
  • the invention also relates to a process implemented by said plasma source.
  • a discharge plasma source 100 as illustrated in figure 1 is already known .
  • This is the common configuration of a discharge tube, such as a neon light or a gas laser discharge tube.
  • This source 100 comprises a first electrode 200 and a second electrode 300, a conduit 700 linking the inner sides of the two electrodes 200 and 300 and arranged for guiding a gas inside the conduit 700 and through holes made in the electrodes, and an electric power supply 900 connected to the electrodes and arranged for generating an electric field between the two electrodes, said electric field being arranged for ionizing the gas guided inside the conduit.
  • Reference 800 illustrates field lines of the generated electric field .
  • Such a plasma source 100 can have a quite short life time, that is a quite short period after which the performances of the plasma source 100 are not as good as when it was new. This is generally due to the erosion of the electrodes and the deposition of the vaporized electrode material on the wall of the conduit.
  • the goal of the invention is to present a plasma source having an improved life-time compared to a plasma source 100 of the prior art, and a process implemented by the plasma source according to the invention.
  • An aspect of the invention concerns a plasma source, comprising a first electrode and a second electrode, each electrode comprising :
  • said source further comprising :
  • the conduit extends at least up to the outer side of this electrode.
  • the conduit can extend at least up to the outer side of the first electrode.
  • the conduit can extend beyond the outer side of the first electrode.
  • the conduit can extend beyond the outer side of the first electrode by a distance inferior or equal to half the diameter of the hole of the first electrode.
  • the conduit can extend beyond the outer side of the first electrode by a distance superior or equal to a quarter of the diameter of the hole of the first electrode.
  • the hole of the first electrode can be beveled on the outer side of the first electrode.
  • the conduit can extend at least up to the inner side of the second electrode, preferably at least up to an intermediate position between the inner side of the second electrode and the outer side of the second electrode, preferably at least up to the outer side of the second electrode.
  • the conduit extends up to an intermediate position between the inner side of the second electrode and the outer side of the second electrode, or the conduit can extend beyond the outer side of the second electrode.
  • the conduit can extend beyond the outer side of the second electrode by a distance inferior or equal to half a diameter of the hole of the second electrode.
  • the conduit can extend beyond the outer side of the second electrode by a distance superior or equal to a quarter of the diameter of the hole of the second electrode.
  • the hole of the second electrode can be beveled on the outer side of the second electrode.
  • An intermediate portion of the conduit comprised between the inner sides of the two electrodes can have a given inner diameter.
  • a portion of the conduit passing through the hole of the first electrode can have an inner diameter substantially equal to the inner diameter of the intermediate portion.
  • a portion of the conduit passing through the hole of the second electrode can have an inner diameter inferior to the inner diameter of the intermediate portion.
  • the hole of the second electrode can have a diameter substantially equal or inferior to the inner diameter of the intermediate portion of the conduit.
  • the hole of the first electrode can have a diameter superior to a diameter of the hole of the second electrode.
  • the first electrode can be an anode and the second electrode can be a cathode, or
  • the means for generating an electric field being preferably arranged for alternatively exchanging cathode and anode functions between the first electrode and the second electrode.
  • An other aspect of the invention concerns a process for creating a plasma in a plasma source according to the invention, said source comprising a first electrode and a second electrode, each electrode comprising :
  • said source further comprising a conduit linking the two electrodes, said process comprising :
  • the conduit generating an electric field between the two electrodes, said electric field ionizing the gas guided inside the conduit, characterized in that for at least one of the electrodes, the conduit extends at least up to the outer side of this electrode.
  • the first electrode, the second electrode and the conduit can be substantially symmetrical, and the process according to the invention can comprise supplying power to the electrodes such that cathode and anode functions are alternatively exchanged between the first electrode and the second electrode.
  • FIG. 1 illustrates a plasma source according to prior art
  • FIG. 2 is a schematic cross sectioned side view of a first embodiment of a plasma source according to the invention
  • FIG. 3 is a schematic cross sectioned side view of a second embodiment of a plasma source according to the invention.
  • FIG. 4 is a schematic cross sectioned side view of a third embodiment of a plasma source according to the invention, this third embodiment being the best realization mode of a plasma source according to the invention,
  • FIG. 5 is a schematic cross sectioned side view of a fourth embodiment of a plasma source according to the invention.
  • FIG. 6 is an incomplete schematic perspective view of the first, second, third and fourth embodiments of the source according to the invention of figures 2 to 5,
  • FIG. 7 and 8 illustrate variants of a beveled electrode in a plasma source according to the invention.
  • FIG. 9 to 11 illustrate variants of the third embodiment of a plasma source according to the invention of figure 4.
  • a current discharge plasma source 100 comprises a first electrode 200 and a second electrode 300, a conduit 700 linking the inner sides of the two electrodes 200 and 300 and arranged for g uid ing a gas inside the cond uit 700 and throug h holes made in the electrodes, and an electric power supply 900 connected to the electrodes and arranged for generating an electric field between the two electrodes, said electric field being arranged for ion izing the gas g uided inside the conduit.
  • Reference 800 il lustrates field lines of the generated electric field .
  • the gas When the gas is ionized, it creates a plasma inside the cond uit 700, electrons are flowing from the cathode 300 to the anode 200, and positive ions are flowing from the anode 200 to the cathode 300.
  • Some of the positive ions 11 come from the anode 200 that is heated d ue to the hig h power density of the electric current at the junction between the anode 200 and the conduit 700, and the some of the positive ions come from the ion ization of the gas.
  • the cond uit 700 must be made of an electrical insulating material, otherwise the cond uit 7 would electrical ly connect the two electrodes, no electric field or very smal l electric field would be created in the interelectrode reg ion, and no plasma wou ld be created .
  • Some of the positive ions 1 1 coming from the anode 200 are projected against the inner wall of the conduit 700 because of the expansion 22 of the hot plasma, and these projections create a layer 13 of electrical ly conductive material on the condu it near the anode 200. A portion of the conduit 700 becomes electrical ly cond uctive . This phenomenon decreases the performances of the source 100.
  • some of the positive ions 12 go throug h the hole of the cathode 300 and erode and damage the portion 20 of the cathode 300 in which the hole of the cathode is formed . This phenomenon decreases the performances of the source 100.
  • the discharge plasma source 1 comprises a first electrode 2 and a second electrode 3.
  • the first electrode 2 comprises :
  • the first electrode 2 is a plate having a disk shape and two substantially parallel faces.
  • the hole 6 is centered in the middle of the disk shape of the electrode 2.
  • the first electrode is made of a material conducting electricity, preferably comprising a metal like stainless steel or copper coated with a high resistivity and high melting point material like titanium nitride or titanium aluminum nitride.
  • the second electrode 3 comprises :
  • the second electrode 3 is a plate having a disk shape and two parallel faces.
  • the hole 60 is centered in the middle of the disk shape of the electrode 3.
  • the second electrode 3 is made of a material conducting electricity, preferably comprising a metal like stainless steel, tungsten alloy or copper coated with a high resistivity and high melting point material like titanium nitride or titanium aluminum nitride. A material with a low sputtering coefficient is preferable.
  • the inner side 4 of the first electrode 2 is facing the inner side 40 of the second electrode 3
  • the inner side 40 of the second electrode 3 is facing the inner side 4 of the first electrode 2.
  • the typical diameter of each electrode 2, 3 is three centimeters, and the typical thickness of each electrode is three millimeters.
  • the two electrodes plates 2, 3 are substantially parallel .
  • the source 1 further comprises :
  • conduit 7 linking the two electrodes 2, 3 and arranged for guiding a gas inside the conduit 7 and through the holes 6, 60 of the electrodes, and
  • the generating means 9 for generating an electric field between the two electrodes, said electric field being arranged for ionizing the gas guided inside the conduit.
  • the generating means 9 comprise a power supply.
  • the electrodes 2, 3 are connected to the power supply like a capacitor.
  • Reference 8 illustrates field lines of the electric field generated between the electrodes 2, 3.
  • the gas flux is injected inside the conduit 7 through the hole 60 of the second electrode 3. In the figures, this gas flux is symbolized by an arrow 14.
  • the conduit links the two electrodes 2, 3.
  • the conduit 7 is in contact with the first electrode 2 at the hole 6, and is in contact with the second electrode 3 at the hole 60.
  • the conduit 7 is made of a material having electrical insulating properties, like ceramic. This way, the material of the conduit does not conduct electricity, and the conduit 7 does not electrically connect the two electrodes 2, 3.
  • the conduit 7 has a rectilinear shape, more precisely a cylindrical shape.
  • the conduit 7 has an inner wall 17 located inside the conduit and in contact with the gas flowing and guided in the conduit, and an outer wall 18 located at the periphery of the conduit and not in contact with the gas flowing in the conduit.
  • the inner wall 17 delimits the internal volume of the conduit in which the gas is guided and is flowing .
  • the walls 17, 18 have both a cylindrical shape.
  • the space 15 comprised between the two electrodes 2, 3 but not occupied by the conduit 7 is filled with a material having electrical insulating properties.
  • This insulating material can be a rigid material like ceramic, a compressible material like an elastomer, or a liquid like oil or deionized water.
  • the power supply 9 While the gas is guided inside the conduit 7 and through the holes 6, 60, the power supply 9 generates an electric field between the two electrodes.
  • the electric field generated by the generating means 9 ionizes the gas inside the conduit at least partially, preferably completely.
  • the conduit 7 is arranged for guiding the gas inside the conduit 7 and through the holes 6, 60 of the electrodes in its non ionized and/or ionized states.
  • the first electrode 2 is an anode and the second electrode 3 is a cathode.
  • the gas When the gas is ionized, it creates a plasma inside the conduit 7, electrons are flowing from the cathode 3 to the anode 2 along the field lines 8, and positive ions are flowing from the anode 2 to the cathode 3 along the field lines 8.
  • Some of the positive ions 10, 11 come from the anode 2 that is heated due to the high power density of the electric field at the junction between the anode 2 and the conduit 7, and some of the positive ions come from the ionization of the gas.
  • the conduit 7 extends from the inner side of this electrode and at least up to the outer side of this electrode. In other words, the conduit passes through the hole of this electrode and reaches at least the outer side of this electrode. This way, the previously described harmful effects of the layer 13 are avoided for the anode 2.
  • the conduit 7 extends from the inner side 4 of the electrode 2 and at least up to the outer side 5 of this electrode 2. In other words, the conduit passes through the hole 6 of this electrode 2 and reaches at least the outer side 5 of this electrode 2. More precisely, the conduit 7 extends from the inner side 4 of the first electrode 2 and beyond the outer side 5 of the first electrode 2. The conduit 7 is sticking out of the outer side 5 of the first electrode 2. The hole 6 and any other part of the electrode 2 are not visible from the inside of the conduit 7. A major part of positive ions 10 coming from the anode 2 are projected away, but not on the conduit.
  • the positive ions 11 coming from the anode 2 are projected against the outer wall 18 of the conduit 7, and these projections create a layer 13 of electrically conductive material on the outer wall 18 of the conduit near the anode 200.
  • the inner wall 17 of the conduit 7 does not contain a layer of electrically conductive material, and the performances of the source 1 are not decreased .
  • the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a distance 106 superior to a quarter of the diameter 102 of the hole 6 of the first electrode 2.
  • the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a distance 106 superior to the length of the layer 13 of electrically conductive material situated on the outer wall 18, and this layer does not reach the end of the conduit 7 located on the anode side.
  • a typical value of the diameter 102 of the hole 6 is six millimeters, and a typical value of the distance 106 is two millimeters.
  • the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a distance 106 inferior to half the diameter 102 of the hole 6 of the first electrode 2. This way, the conduit is not too long, and the quantity of heat deposited on the wall of conduit 7 near the end protruding beyond the first electrode 2 is not too high.
  • the conduit 7 extends beyond the inner side 40 of the cathode 3. More precisely, the conduit 7 extends beyond the inner side 40 of the electrode 3 but not up to the outer side 50 of this electrode 3. In other words, the conduit passes through the hole 60 of this electrode 3 and does not reach the outer 50 side of this electrode 3: electrode 3 extends over the conduit 7. More precisely, the conduit 7 extends from the inner side 40 of the second electrode 3 and up to an intermediate position between the inner side 40 of the second electrode 3 and the outer side 50 of the second electrode 3.
  • the conduit protects the electrode 3 at least partially, and the positive ions 12 going through the hole 60 of the cathode 3 can not erode or damage the portion of the cathode 3 in which the hole of the cathode is formed, and the performances of the source 1 are not decreased.
  • the hole 6 of the first electrode 2 has a diameter 102 substantially equal to a diameter 103 of the hole 60 of the second electrode 3, and the conduit has a substantially constant inner diameter:
  • an intermediate portion 71 of the conduit 7 comprised between the inner sides 4, 40 of the two electrodes 2, 3 has a given inner diameter 171;
  • the inner diameter 171 is the diameter of the inner cylindrical wall 17 of the conduit at the intermediate portion 71 of the conduit, and the value of this diameter 171 is typically one millimeter or at least 0.5 millimeter,
  • a portion 72 of the conduit passing through the hole 6 of the first electrode 2 has an inner diameter 172 substantially equal to the inner diameter 171 of the intermediate portion 71; the inner diameter 172 is the diameter of the inner cylindrical wall 17 of the conduit at the portion 72 of the conduit, and
  • a portion 73 of the conduit passing through the hole 60 of the second electrode 3 has an inner diameter 173 substantially equal to the inner diameter 171 of the intermediate portion 71; the inner diameter 173 is the diameter of the inner cylindrical wall 17 of the conduit at the portion 73 of the conduit; each of the previously listed characteristics allows facilitating the flow of gas inside the conduit 7 and through the holes 6, 60.
  • the conduit 7 extends from the inner side 40 of the electrode 3 and at least up to the outer side 50 of this electrode 3. In other words, the conduit passes through the hole 60 of this electrode 3 and reaches at least the outer 50 side of this electrode 3. More precisely, the conduit 7 extends from the inner side 40 of the second electrode 3 and up to the outer side 50 of the second electrode 3. The hole 60 and any other part of the electrode 3 are not visible from the inside of the conduit 7. This way, the conduit protects the electrode 3, and the positive ions 12 going through the hole 60 of the cathode 3 can not erode or damage the portion of the cathode 3 in which the hole of the cathode is formed, and the performances of the source 1 are not decreased .
  • this second embodiment of plasma source according to the invention comprises a bevel 16 : the hole 6 of the first electrode 2 is beveled on the outer side 5 of the first electrode 2. As illustrated in figures 3 to 6, the hole 6 of the first electrode 2 is beveled on the outer side 5 of the first electrode 2 so that the closer to the center of the hole 6, the thinner is the electrode 2. The fineness or the thickness of the electrode 2 is measured parallel to the passing direction of the rectilinear conduit 7 through the hole 6, i.e. substantially perpendicular to the electrode plate 2. In this case, the diameter 102 of the hole 6 is the diameter of the hole 6 at the thinner part of the electrode 2, i.e. the diameter of the hole 6 at the inner side 4.
  • This bevel 16 has many technical advantages :
  • the length of the cond uit 7 is inferior than the length of the conduit of the first embod iment ill ustrated in fig ure 2, even if in both first and second embodiments the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a d istance 106 superior to a q uarter of the diameter 102 of the hole 6 of the first electrode 2; by decreasing the length of the conduit, the inductance of the d ischarge circuit is also decreased .
  • the cond uit does not have a substantially constant inner diameter.
  • Each wall 17, 18 does not have a cyl indrical shape, but has a shape of an assembly of two concentric cylinders connected in series as il lustrated in fig ure 4.
  • the conduit 7 extends beyond the outer side 50 of the second electrode 3. More precisely, the conduit 7 extends beyond the outer side 50 of the second electrode 3 by a d istance 160 inferior to half the d iameter 103 of the hole 60 of the second electrode 3, and superior to a quarter of the d iameter 103 of the hole 60 of the second electrode 3.
  • the portion 73 of the cond uit passing throug h the hole 60 of the second electrode 3 has an inner d iameter 173 inferior to the inner d iameter 171 of the intermed iate portion 71 , and the hole 60 of the second electrode 3 has a diameter 103 substantial ly equal to the inner d iameter 171 of the intermed iate portion 71 of the cond uit.
  • the hole 60 of the second electrode 3 has a diameter 103 substantial ly inferior to the inner diameter 171 of the intermediate portion 71 of the conduit.
  • the dot l ines 19 ill ustrate the outl ines of the hole 60 in this particular variant.
  • the first electrode 2, the second electrode 3 and the conduit 7 are substantially symmetrical in relation to a plan 21 located between the two electrodes and preferably substantially parallel to the two electrodes, the means 9 for generating an electric field being arranged for alternatively exchang ing cathode and anode functions between the first electrode 2 and the second electrode 3.
  • the power supply 9 provides an alternating voltage. This way, the power supply 9 supplies power to the electrodes 2, 3 such that cathode and anode functions are alternatively exchanged between the first electrode 2 and the second electrode 3.
  • the fourth embodiment of plasma source accord ing to the invention comprises a second bevel 16 : the hole 60 of the second electrode 3 is beveled on the outer side 50 of the second electrode 3, so that the closer to the center of the hole 60, the thinner is the electrode 3.
  • the fineness or the thickness of the electrode 3 is measured parallel to the passing d irection of the rectil inear cond uit 7 throug h the hole 60, i .e . su bstantial ly perpend icular to the electrode plate 3.
  • the d iameter 103 of the hole 60 is the d iameter of the hole 60 at the thinner part of the electrode 3, i .e . the d iameter of the hole 60 at the inner side 40.
  • This second bevel has the same technical advantages as those described in reference to fig ure 3.
  • the beveled electrode 2 and/or 3 is beveled on its outer side respectively 5 or 50 so that this electrode is not thinner close to the center of the hole respectively 6 or 60.
  • the beveled electrode 2 and/or 3 is beveled on its outer side respectively 5 or 50 so that it has a substantially constant thickness, especially for increasing the mechanical strength of electrode 2 or 3.
  • the beveled electrode 2 and/or 3 is beveled on its outer side respectively 5 or 50 and is fitted with an additional thickness of material 23 near the hole respectively 6 or 60 in order to increase its mechanical strength. This additional thickness of material 23 is in contact with conduit 7.
  • Figures 9 to 11 are partial view of variants of the third embodiment of a plasma source according to the invention of figure 4 :
  • the hole 60 of the second electrode 3 has a diameter 103 substantially superior to the inner diameter 171 of the intermediate portion 71 of the conduit,
  • the hole 60 of the second electrode 3 has a diameter 103 substantially equal to the inner diameter 171 of the intermediate portion 71 of the conduit,
  • the hole 60 of the second electrode 3 has a diameter 103 substantially inferior to the inner diameter 171 of the intermediate portion 71 of the conduit.
  • the conduit 7 does not have a shape of an assembly of two concentric cylinders connected in series.
  • conduit 7 can extend beyond the outer side 50 of the second electrode 3 as described for the third embodiment of plasma source according to the invention and as illustrated by line 24 in figures 9 to
  • the conduit 7 can extend from the inner side 40 of the second electrode 3 and up to the outer side 50 of the second electrode 3 as described for the second embodiment of plasma source according to the invention and as illustrated by dot line 25 in figures 9 to 11, or - the conduit 7 can extend from the inner side 40 of the second electrode 3 and up to an intermediate position between the inner side 40 of the second electrode 3 and the outer side 50 of the second electrode 3 as described for the first embodiment of plasma source according to the invention and as illustrated by dot line 26 in figures 9 to 11.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

The invention concerns a plasma source (1), comprising a first electrode (2) and a second electrode (3), each electrode (2, 3) comprising : an inner side (4; 40) oriented towards the other electrode an outer side (5; 50) oriented in a direction substantially opposed to the other electrode, a hole (6; 60) Connecting its inner side to its outer side, said source (1) further comprising : a conduit (7) linking the two electrodes (2, 3) and arranged for guiding a gas inside the conduit (7) and through the holes (6, 60) of the electrodes, means for generating an electric field between the two electrodes, said electric field being arranged for ionizing the gas guided inside the conduit, characterized in that for at least one of the electrodes, the conduit (7) extends at least up to the outer side of this electrode. The invention also relates to a process implemented by said plasma source.

Description

«Plasma source having improved life-time»
Technical field
The present invention relates to a plasma source having an improved life-time.
The invention also relates to a process implemented by said plasma source.
State of the Art
The arc discharge plasma source and the capacitively coupled plasma source (CCP) are two common types of industrial plasma sources. A discharge plasma source 100 as illustrated in figure 1 is already known . This is the common configuration of a discharge tube, such as a neon light or a gas laser discharge tube. This source 100 comprises a first electrode 200 and a second electrode 300, a conduit 700 linking the inner sides of the two electrodes 200 and 300 and arranged for guiding a gas inside the conduit 700 and through holes made in the electrodes, and an electric power supply 900 connected to the electrodes and arranged for generating an electric field between the two electrodes, said electric field being arranged for ionizing the gas guided inside the conduit. Reference 800 illustrates field lines of the generated electric field .
Such a plasma source 100 can have a quite short life time, that is a quite short period after which the performances of the plasma source 100 are not as good as when it was new. This is generally due to the erosion of the electrodes and the deposition of the vaporized electrode material on the wall of the conduit.
The goal of the invention is to present a plasma source having an improved life-time compared to a plasma source 100 of the prior art, and a process implemented by the plasma source according to the invention.
Summary of the Invention
An aspect of the invention concerns a plasma source, comprising a first electrode and a second electrode, each electrode comprising :
an inner side oriented towards the other electrode an outer side oriented in a direction substantially opposed to the other electrode,
a hole connecting its inner side to its outer side,
said source further comprising :
- a conduit linking the two electrodes and arranged for guiding a gas inside the conduit and through the holes of the electrodes,
means for generating an electric field between the two electrodes, said electric field being arranged for ionizing the gas guided inside the conduit,
characterized in that for at least one of the electrodes, the conduit extends at least up to the outer side of this electrode.
The conduit can extend at least up to the outer side of the first electrode. The conduit can extend beyond the outer side of the first electrode. The conduit can extend beyond the outer side of the first electrode by a distance inferior or equal to half the diameter of the hole of the first electrode. The conduit can extend beyond the outer side of the first electrode by a distance superior or equal to a quarter of the diameter of the hole of the first electrode.
The hole of the first electrode can be beveled on the outer side of the first electrode.
The conduit can extend at least up to the inner side of the second electrode, preferably at least up to an intermediate position between the inner side of the second electrode and the outer side of the second electrode, preferably at least up to the outer side of the second electrode. Preferably, the conduit extends up to an intermediate position between the inner side of the second electrode and the outer side of the second electrode, or the conduit can extend beyond the outer side of the second electrode. The conduit can extend beyond the outer side of the second electrode by a distance inferior or equal to half a diameter of the hole of the second electrode. The conduit can extend beyond the outer side of the second electrode by a distance superior or equal to a quarter of the diameter of the hole of the second electrode.
The hole of the second electrode can be beveled on the outer side of the second electrode. An intermediate portion of the conduit comprised between the inner sides of the two electrodes can have a given inner diameter. A portion of the conduit passing through the hole of the first electrode can have an inner diameter substantially equal to the inner diameter of the intermediate portion. A portion of the conduit passing through the hole of the second electrode can have an inner diameter inferior to the inner diameter of the intermediate portion.
The hole of the second electrode can have a diameter substantially equal or inferior to the inner diameter of the intermediate portion of the conduit.
The hole of the first electrode can have a diameter superior to a diameter of the hole of the second electrode.
Furthermore:
- the first electrode can be an anode and the second electrode can be a cathode, or
- the first electrode, the second electrode and the conduit can be substantially symmetrical, the means for generating an electric field being preferably arranged for alternatively exchanging cathode and anode functions between the first electrode and the second electrode.
An other aspect of the invention concerns a process for creating a plasma in a plasma source according to the invention, said source comprising a first electrode and a second electrode, each electrode comprising :
- an inner side oriented towards the other electrode
an outer side oriented in a direction substantially opposed to the other electrode,
a hole connecting its inner side to its outer side,
said source further comprising a conduit linking the two electrodes, said process comprising :
guiding a gas inside the conduit and through the holes of the electrodes,
generating an electric field between the two electrodes, said electric field ionizing the gas guided inside the conduit, characterized in that for at least one of the electrodes, the conduit extends at least up to the outer side of this electrode.
The first electrode, the second electrode and the conduit can be substantially symmetrical, and the process according to the invention can comprise supplying power to the electrodes such that cathode and anode functions are alternatively exchanged between the first electrode and the second electrode.
Detailed description of the figures
and of realization modes of the invention
Other advantages and characteristics of the invention will appear upon examination of the detailed description of embodiments which are in no way limitative, and of the appended drawings in which :
- Figure 1 illustrates a plasma source according to prior art,
- Figure 2 is a schematic cross sectioned side view of a first embodiment of a plasma source according to the invention,
- Figure 3 is a schematic cross sectioned side view of a second embodiment of a plasma source according to the invention,
- Figure 4 is a schematic cross sectioned side view of a third embodiment of a plasma source according to the invention, this third embodiment being the best realization mode of a plasma source according to the invention,
- Figure 5 is a schematic cross sectioned side view of a fourth embodiment of a plasma source according to the invention,
- Figure 6 is an incomplete schematic perspective view of the first, second, third and fourth embodiments of the source according to the invention of figures 2 to 5,
- Figures 7 and 8 illustrate variants of a beveled electrode in a plasma source according to the invention, and
- Figures 9 to 11 illustrate variants of the third embodiment of a plasma source according to the invention of figure 4.
As disclosed previously in reference to figure 1, a current discharge plasma source 100 according to the prior art comprises a first electrode 200 and a second electrode 300, a conduit 700 linking the inner sides of the two electrodes 200 and 300 and arranged for g uid ing a gas inside the cond uit 700 and throug h holes made in the electrodes, and an electric power supply 900 connected to the electrodes and arranged for generating an electric field between the two electrodes, said electric field being arranged for ion izing the gas g uided inside the conduit. Reference 800 il lustrates field lines of the generated electric field .
When the gas is ionized, it creates a plasma inside the cond uit 700, electrons are flowing from the cathode 300 to the anode 200, and positive ions are flowing from the anode 200 to the cathode 300. Some of the positive ions 11 come from the anode 200 that is heated d ue to the hig h power density of the electric current at the junction between the anode 200 and the conduit 700, and the some of the positive ions come from the ion ization of the gas.
The cond uit 700 must be made of an electrical insulating material, otherwise the cond uit 7 would electrical ly connect the two electrodes, no electric field or very smal l electric field would be created in the interelectrode reg ion, and no plasma wou ld be created . Some of the positive ions 1 1 coming from the anode 200 are projected against the inner wall of the conduit 700 because of the expansion 22 of the hot plasma, and these projections create a layer 13 of electrical ly conductive material on the condu it near the anode 200. A portion of the conduit 700 becomes electrical ly cond uctive . This phenomenon decreases the performances of the source 100.
Furthermore, some of the positive ions 12 go throug h the hole of the cathode 300 and erode and damage the portion 20 of the cathode 300 in which the hole of the cathode is formed . This phenomenon decreases the performances of the source 100.
We are now going to describe a first embod iment of a current discharge plasma source 1 according to the invention, in reference to figures 2 and 6. The discharge plasma source 1 comprises a first electrode 2 and a second electrode 3.
The first electrode 2 comprises :
an inner side 4 oriented towards the other electrode 3, an outer side 5 oriented in a direction substantially opposed to the other electrode 3, and
a hole 6 connecting its inner side 4 to its outer side 5.
The first electrode 2 is a plate having a disk shape and two substantially parallel faces. The hole 6 is centered in the middle of the disk shape of the electrode 2. The first electrode is made of a material conducting electricity, preferably comprising a metal like stainless steel or copper coated with a high resistivity and high melting point material like titanium nitride or titanium aluminum nitride.
The second electrode 3 comprises :
an inner side 40 oriented towards the other electrode 2, an outer side 50 oriented in a direction substantially opposed to the other electrode 2, and
- a hole 60 connecting its inner side 40 to its outer side 50.
The second electrode 3 is a plate having a disk shape and two parallel faces. The hole 60 is centered in the middle of the disk shape of the electrode 3. The second electrode 3 is made of a material conducting electricity, preferably comprising a metal like stainless steel, tungsten alloy or copper coated with a high resistivity and high melting point material like titanium nitride or titanium aluminum nitride. A material with a low sputtering coefficient is preferable.
Thus, the inner side 4 of the first electrode 2 is facing the inner side 40 of the second electrode 3, and the inner side 40 of the second electrode 3 is facing the inner side 4 of the first electrode 2. The typical diameter of each electrode 2, 3 is three centimeters, and the typical thickness of each electrode is three millimeters. The two electrodes plates 2, 3 are substantially parallel .
The source 1 further comprises :
a conduit 7 linking the two electrodes 2, 3 and arranged for guiding a gas inside the conduit 7 and through the holes 6, 60 of the electrodes, and
means 9 for generating an electric field between the two electrodes, said electric field being arranged for ionizing the gas guided inside the conduit. The generating means 9 comprise a power supply. The electrodes 2, 3 are connected to the power supply like a capacitor. Reference 8 illustrates field lines of the electric field generated between the electrodes 2, 3. The gas flux is injected inside the conduit 7 through the hole 60 of the second electrode 3. In the figures, this gas flux is symbolized by an arrow 14.
The conduit links the two electrodes 2, 3. The conduit 7 is in contact with the first electrode 2 at the hole 6, and is in contact with the second electrode 3 at the hole 60. The conduit 7 is made of a material having electrical insulating properties, like ceramic. This way, the material of the conduit does not conduct electricity, and the conduit 7 does not electrically connect the two electrodes 2, 3. The conduit 7 has a rectilinear shape, more precisely a cylindrical shape. The conduit 7 has an inner wall 17 located inside the conduit and in contact with the gas flowing and guided in the conduit, and an outer wall 18 located at the periphery of the conduit and not in contact with the gas flowing in the conduit. The inner wall 17 delimits the internal volume of the conduit in which the gas is guided and is flowing . The walls 17, 18 have both a cylindrical shape.
The space 15 comprised between the two electrodes 2, 3 but not occupied by the conduit 7 is filled with a material having electrical insulating properties. This insulating material can be a rigid material like ceramic, a compressible material like an elastomer, or a liquid like oil or deionized water.
While the gas is guided inside the conduit 7 and through the holes 6, 60, the power supply 9 generates an electric field between the two electrodes. The electric field generated by the generating means 9 ionizes the gas inside the conduit at least partially, preferably completely. The conduit 7 is arranged for guiding the gas inside the conduit 7 and through the holes 6, 60 of the electrodes in its non ionized and/or ionized states.
The first electrode 2 is an anode and the second electrode 3 is a cathode.
When the gas is ionized, it creates a plasma inside the conduit 7, electrons are flowing from the cathode 3 to the anode 2 along the field lines 8, and positive ions are flowing from the anode 2 to the cathode 3 along the field lines 8. Some of the positive ions 10, 11 come from the anode 2 that is heated due to the high power density of the electric field at the junction between the anode 2 and the conduit 7, and some of the positive ions come from the ionization of the gas.
For at least one of the electrodes 2,3, in particular for the anode 2, the conduit 7 extends from the inner side of this electrode and at least up to the outer side of this electrode. In other words, the conduit passes through the hole of this electrode and reaches at least the outer side of this electrode. This way, the previously described harmful effects of the layer 13 are avoided for the anode 2.
Firstly, the conduit 7 extends from the inner side 4 of the electrode 2 and at least up to the outer side 5 of this electrode 2. In other words, the conduit passes through the hole 6 of this electrode 2 and reaches at least the outer side 5 of this electrode 2. More precisely, the conduit 7 extends from the inner side 4 of the first electrode 2 and beyond the outer side 5 of the first electrode 2. The conduit 7 is sticking out of the outer side 5 of the first electrode 2. The hole 6 and any other part of the electrode 2 are not visible from the inside of the conduit 7. A major part of positive ions 10 coming from the anode 2 are projected away, but not on the conduit. Some of the positive ions 11 coming from the anode 2 are projected against the outer wall 18 of the conduit 7, and these projections create a layer 13 of electrically conductive material on the outer wall 18 of the conduit near the anode 200. Thus, the inner wall 17 of the conduit 7 does not contain a layer of electrically conductive material, and the performances of the source 1 are not decreased . Furthermore, the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a distance 106 superior to a quarter of the diameter 102 of the hole 6 of the first electrode 2. This way, the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a distance 106 superior to the length of the layer 13 of electrically conductive material situated on the outer wall 18, and this layer does not reach the end of the conduit 7 located on the anode side. A typical value of the diameter 102 of the hole 6 is six millimeters, and a typical value of the distance 106 is two millimeters. Finally, the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a distance 106 inferior to half the diameter 102 of the hole 6 of the first electrode 2. This way, the conduit is not too long, and the quantity of heat deposited on the wall of conduit 7 near the end protruding beyond the first electrode 2 is not too high.
Secondly, the conduit 7 extends beyond the inner side 40 of the cathode 3. More precisely, the conduit 7 extends beyond the inner side 40 of the electrode 3 but not up to the outer side 50 of this electrode 3. In other words, the conduit passes through the hole 60 of this electrode 3 and does not reach the outer 50 side of this electrode 3: electrode 3 extends over the conduit 7. More precisely, the conduit 7 extends from the inner side 40 of the second electrode 3 and up to an intermediate position between the inner side 40 of the second electrode 3 and the outer side 50 of the second electrode 3. This way, the conduit protects the electrode 3 at least partially, and the positive ions 12 going through the hole 60 of the cathode 3 can not erode or damage the portion of the cathode 3 in which the hole of the cathode is formed, and the performances of the source 1 are not decreased.
The hole 6 of the first electrode 2 has a diameter 102 substantially equal to a diameter 103 of the hole 60 of the second electrode 3, and the conduit has a substantially constant inner diameter:
- an intermediate portion 71 of the conduit 7 comprised between the inner sides 4, 40 of the two electrodes 2, 3 has a given inner diameter 171; the inner diameter 171 is the diameter of the inner cylindrical wall 17 of the conduit at the intermediate portion 71 of the conduit, and the value of this diameter 171 is typically one millimeter or at least 0.5 millimeter,
- a portion 72 of the conduit passing through the hole 6 of the first electrode 2 has an inner diameter 172 substantially equal to the inner diameter 171 of the intermediate portion 71; the inner diameter 172 is the diameter of the inner cylindrical wall 17 of the conduit at the portion 72 of the conduit, and
- a portion 73 of the conduit passing through the hole 60 of the second electrode 3 has an inner diameter 173 substantially equal to the inner diameter 171 of the intermediate portion 71; the inner diameter 173 is the diameter of the inner cylindrical wall 17 of the conduit at the portion 73 of the conduit; each of the previously listed characteristics allows facilitating the flow of gas inside the conduit 7 and through the holes 6, 60.
In reference to figures 3 and 6, we are now going to describe a second embodiment of a plasma source 1 according to the invention only for its differences compared to the first embodiment of figure 2. The reference numbers previously described in reference to figure 2 and also illustrated in figure 3 will not be once again described .
In this second embodiment of a plasma source according to the invention, the conduit 7 extends from the inner side 40 of the electrode 3 and at least up to the outer side 50 of this electrode 3. In other words, the conduit passes through the hole 60 of this electrode 3 and reaches at least the outer 50 side of this electrode 3. More precisely, the conduit 7 extends from the inner side 40 of the second electrode 3 and up to the outer side 50 of the second electrode 3. The hole 60 and any other part of the electrode 3 are not visible from the inside of the conduit 7. This way, the conduit protects the electrode 3, and the positive ions 12 going through the hole 60 of the cathode 3 can not erode or damage the portion of the cathode 3 in which the hole of the cathode is formed, and the performances of the source 1 are not decreased .
Furthermore, this second embodiment of plasma source according to the invention comprises a bevel 16 : the hole 6 of the first electrode 2 is beveled on the outer side 5 of the first electrode 2. As illustrated in figures 3 to 6, the hole 6 of the first electrode 2 is beveled on the outer side 5 of the first electrode 2 so that the closer to the center of the hole 6, the thinner is the electrode 2. The fineness or the thickness of the electrode 2 is measured parallel to the passing direction of the rectilinear conduit 7 through the hole 6, i.e. substantially perpendicular to the electrode plate 2. In this case, the diameter 102 of the hole 6 is the diameter of the hole 6 at the thinner part of the electrode 2, i.e. the diameter of the hole 6 at the inner side 4. This bevel 16 has many technical advantages :
it increases the surface of the electrode 2 near the hole 6; thus, it decreases the power per unit surface (also called power density) of the electrode 2 near the hole 6; thus, it decreases the temperature of the electrode 2 near the hole 6; thus, it reduces the projection of positive ions by the electrode 2.
the electrode being thinner at the hole 6, the length of the cond uit 7 is inferior than the length of the conduit of the first embod iment ill ustrated in fig ure 2, even if in both first and second embodiments the conduit 7 extends beyond the outer side 5 of the first electrode 2 by a d istance 106 superior to a q uarter of the diameter 102 of the hole 6 of the first electrode 2; by decreasing the length of the conduit, the inductance of the d ischarge circuit is also decreased .
In reference to fig ures 4 and 6, we are now going to describe a third embod iment of a plasma source 1 accord ing to the invention only for its d ifferences compared to the second embodiment of fig ure 3. The reference numbers previously described in reference to fig ure 3 and also il lustrated in figure 4 will not be once again described .
In the third embod iment of plasma source 1 , the cond uit does not have a substantially constant inner diameter. Each wall 17, 18 does not have a cyl indrical shape, but has a shape of an assembly of two concentric cylinders connected in series as il lustrated in fig ure 4.
The conduit 7 extends beyond the outer side 50 of the second electrode 3. More precisely, the conduit 7 extends beyond the outer side 50 of the second electrode 3 by a d istance 160 inferior to half the d iameter 103 of the hole 60 of the second electrode 3, and superior to a quarter of the d iameter 103 of the hole 60 of the second electrode 3.
The portion 73 of the cond uit passing throug h the hole 60 of the second electrode 3 has an inner d iameter 173 inferior to the inner d iameter 171 of the intermed iate portion 71 , and the hole 60 of the second electrode 3 has a diameter 103 substantial ly equal to the inner d iameter 171 of the intermed iate portion 71 of the cond uit.
In a variant of the third embod iment of plasma source 1 , the hole 60 of the second electrode 3 has a diameter 103 substantial ly inferior to the inner diameter 171 of the intermediate portion 71 of the conduit. In fig ure 4, the dot l ines 19 ill ustrate the outl ines of the hole 60 in this particular variant.
In reference to fig ures 5 and 6, we are now going to describe a fourth embod iment of a plasma source 1 accord ing to the invention only for its d ifferences compared to the second embodiment of fig ure 3. The reference numbers previously described in reference to figure 3 and also ill ustrated in figure 5 will not be once again described .
In the fourth embod iment of plasma source 1 , the first electrode 2, the second electrode 3 and the conduit 7are substantially symmetrical in relation to a plan 21 located between the two electrodes and preferably substantially parallel to the two electrodes, the means 9 for generating an electric field being arranged for alternatively exchang ing cathode and anode functions between the first electrode 2 and the second electrode 3. The power supply 9 provides an alternating voltage. This way, the power supply 9 supplies power to the electrodes 2, 3 such that cathode and anode functions are alternatively exchanged between the first electrode 2 and the second electrode 3. When the first electrode 200 is an anode then the second electrode 300 is a cathode, and when the first electrode 200 is a cathode then the second electrode 300 is an anode. Furthermore, the fourth embodiment of plasma source accord ing to the invention comprises a second bevel 16 : the hole 60 of the second electrode 3 is beveled on the outer side 50 of the second electrode 3, so that the closer to the center of the hole 60, the thinner is the electrode 3. The fineness or the thickness of the electrode 3 is measured parallel to the passing d irection of the rectil inear cond uit 7 throug h the hole 60, i .e . su bstantial ly perpend icular to the electrode plate 3. In this case, the d iameter 103 of the hole 60 is the d iameter of the hole 60 at the thinner part of the electrode 3, i .e . the d iameter of the hole 60 at the inner side 40. This second bevel has the same technical advantages as those described in reference to fig ure 3.
In reference to fig ures 7 and 8, for different variants of the second embodiment of fig ure 3 or of the third embod iment of figure 4 or of the fourth embod iment of figure 5, the beveled electrode 2 and/or 3 is beveled on its outer side respectively 5 or 50 so that this electrode is not thinner close to the center of the hole respectively 6 or 60.
In the variant of figure 7, the beveled electrode 2 and/or 3 is beveled on its outer side respectively 5 or 50 so that it has a substantially constant thickness, especially for increasing the mechanical strength of electrode 2 or 3.
In the variant of figure 8, the beveled electrode 2 and/or 3 is beveled on its outer side respectively 5 or 50 and is fitted with an additional thickness of material 23 near the hole respectively 6 or 60 in order to increase its mechanical strength. This additional thickness of material 23 is in contact with conduit 7.
Figures 9 to 11 are partial view of variants of the third embodiment of a plasma source according to the invention of figure 4 :
- in the variant of figure 9, the hole 60 of the second electrode 3 has a diameter 103 substantially superior to the inner diameter 171 of the intermediate portion 71 of the conduit,
in the variant of figure 10, the hole 60 of the second electrode 3 has a diameter 103 substantially equal to the inner diameter 171 of the intermediate portion 71 of the conduit,
in the variant of figure 11 , the hole 60 of the second electrode 3 has a diameter 103 substantially inferior to the inner diameter 171 of the intermediate portion 71 of the conduit.
Furthermore, in the variants of figures 9 and 11, the conduit 7 does not have a shape of an assembly of two concentric cylinders connected in series.
Finally, in all these variants of figures 9 to 11 :
- the conduit 7 can extend beyond the outer side 50 of the second electrode 3 as described for the third embodiment of plasma source according to the invention and as illustrated by line 24 in figures 9 to
11, or
- the conduit 7 can extend from the inner side 40 of the second electrode 3 and up to the outer side 50 of the second electrode 3 as described for the second embodiment of plasma source according to the invention and as illustrated by dot line 25 in figures 9 to 11, or - the conduit 7 can extend from the inner side 40 of the second electrode 3 and up to an intermediate position between the inner side 40 of the second electrode 3 and the outer side 50 of the second electrode 3 as described for the first embodiment of plasma source according to the invention and as illustrated by dot line 26 in figures 9 to 11.
Of course, the invention is not limited to the examples which have just been described and numerous amendments can be made to these examples without exceeding the scope of the invention.

Claims

CLAI MS
1. Plasma source ( 1 ), comprising a first electrode (2) and a second electrode (3), each electrode (2, 3) comprising :
- an inner side (4; 40) oriented towards the other electrode
an outer side (5; 50) oriented in a d irection substantial ly opposed to the other electrode,
a hole (6; 60) connecting its inner side to its outer side, said source ( 1 ) further comprising :
- a conduit (7) l inking the two electrodes (2, 3) and arranged for g uid ing a gas inside the cond uit (7) and th rough the holes (6, 60) of the electrodes,
means for generating an electric field between the two electrodes, said electric field being arranged for ionizing the gas guided inside the cond uit,
characterized in that for at least one of the electrodes, the conduit (7) extends at least up to the outer side of th is electrode .
2. Plasma source accord ing to claim 1 , characterized in that the cond uit (7) extends at least u p to the outer side (5) of the first electrode
(2) .
3. Plasma source accord ing to claim 2, characterized in that the conduit (7) extends beyond the outer side (5) of the first electrode (2) .
4. Plasma source according to claim 2 or 3, characterized in that the conduit (7) extends beyond the outer side (5) of the first electrode (2) by a distance ( 106) inferior or equal to half the diameter ( 102) of the hole (6) of the first electrode (2) .
5. Plasma source according to any one of claims 2 to 4, characterized in that the cond uit (7) extends beyond the outer side (5) of the first electrode (2) by a distance ( 106) superior or eq ual to a quarter of the d iameter ( 102) of the hole (6) of the first electrode (2) .
6. Plasma source according to any one of the previous claims, characterized in that the hole (6) of the first electrode (2) is beveled on the outer side (5) of the first electrode (2).
7. Plasma source according to any one of the previous claims, characterized in that the conduit (7) extends at least up to an intermediate position between the inner side (40) of the second electrode (3) and the outer side (50) of the second electrode (3).
8. Plasma source according to claim 7, characterized in that the conduit (7) extends beyond the outer side (50) of the second electrode (3) by a distance (160) inferior or equal to half a diameter (103) of the hole (60) of the second electrode (3).
9. Plasma source according to any one of the previous claims, characterized in that an intermediate portion (71) of the conduit (7) comprised between the inner sides (4, 40) of the two electrodes (2, 3) has a given inner diameter (171).
10. Plasma source according to claim 9, characterized in that a portion (72) of the conduit passing through the hole (6) of the first electrode (2) has an inner diameter (172) substantially equal to the inner diameter (171) of the intermediate portion (71).
11. Plasma source according to claim 9 or 10, characterized in that a portion (73) of the conduit passing through the hole (60) of the second electrode (3) has an inner diameter (173) inferior to the inner diameter (171) of the intermediate portion (71).
12. Plasma source according to any one of claims 9 to 11, characterized in that the hole (60) of the second electrode (3) has a diameter (103) substantially equal or inferior to the inner diameter (171) of the intermediate portion (71) of the conduit.
13. Plasma source according to any one of the previous claims, characterized in that the hole (6) of the first electrode (2) has a diameter ( 102) superior to a diameter (103) of the hole (60) of the second electrode (3) .
14. Plasma source according to any one of the previous claims, characterized in that the first electrode (2) is an anode and the second electrode (3) is a cathode.
15. Plasma source according to any one of claims 1 to 10, characterized in that the first electrode, the second electrode and the conduit are substantially symmetrical, the means (9) for generating an electric field being arranged for alternatively exchanging cathode and anode functions between the first electrode (2) and the second electrode (3) .
16. Process for creating a plasma in a source according to any one of the previous claims, said source comprising a first electrode and a second electrode, each electrode comprising :
- an inner side oriented towards the other electrode
an outer side oriented in a direction substantially opposed to the other electrode,
a hole connecting its inner side to its outer side,
said source further comprising a conduit linking the two electrodes, said process comprising :
guiding a gas inside the conduit and through the holes of the electrodes,
generating an electric field between the two electrodes, said electric field ionizing the gas guided inside the conduit,
characterized in that for at least one of the electrodes, the conduit extends at least up to the outer side of this electrode.
17. Process according to claim 16, characterized in that the first electrode, the second electrode and the conduit are substantially symmetrical, the process comprising supplying power to the electrodes such that cathode and anode functions are alternatively exchanged between the first electrode (2) and the second electrode (3).
PCT/IB2009/056061 2009-12-24 2009-12-24 Plasma source having improved life-time WO2011077195A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/IB2009/056061 WO2011077195A1 (en) 2009-12-24 2009-12-24 Plasma source having improved life-time
TW099145410A TW201143544A (en) 2009-12-24 2010-12-23 Plasma source having improved life-time

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IB2009/056061 WO2011077195A1 (en) 2009-12-24 2009-12-24 Plasma source having improved life-time

Publications (1)

Publication Number Publication Date
WO2011077195A1 true WO2011077195A1 (en) 2011-06-30

Family

ID=42651386

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2009/056061 WO2011077195A1 (en) 2009-12-24 2009-12-24 Plasma source having improved life-time

Country Status (2)

Country Link
TW (1) TW201143544A (en)
WO (1) WO2011077195A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1115141A1 (en) * 2000-01-06 2001-07-11 TePla AG Method and device for the surface treatment of a filamentary body
US6465964B1 (en) * 1999-10-25 2002-10-15 Matsushita Electric Works, Ltd. Plasma treatment apparatus and plasma generation method using the apparatus
EP1441577A1 (en) * 2002-02-20 2004-07-28 Matsushita Electric Works, Ltd. Plasma processing device and plasma processing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6465964B1 (en) * 1999-10-25 2002-10-15 Matsushita Electric Works, Ltd. Plasma treatment apparatus and plasma generation method using the apparatus
EP1115141A1 (en) * 2000-01-06 2001-07-11 TePla AG Method and device for the surface treatment of a filamentary body
EP1441577A1 (en) * 2002-02-20 2004-07-28 Matsushita Electric Works, Ltd. Plasma processing device and plasma processing method

Also Published As

Publication number Publication date
TW201143544A (en) 2011-12-01

Similar Documents

Publication Publication Date Title
KR101594636B1 (en) High frequency antenna unit and plasma processing apparatus
JP2010529621A5 (en)
JPWO2009142016A1 (en) Plasma generating apparatus and plasma processing apparatus
WO2011130929A1 (en) Laser triggered vacuum switch
WO2014203873A1 (en) Ignition plug and plasma generation device
CN104752127A (en) Supporting structure and ion generator using the same
US20100172064A1 (en) Electric apparatus for electric power
TW201842530A (en) Antenna for generating plasma, and plasma treatment device and antenna structure provided with antenna for generating plasma
EP1755141B1 (en) Capacitor of magnetron
WO2011077195A1 (en) Plasma source having improved life-time
WO2007117122A1 (en) Compound plasma source and method for dissociating gases using the same
US5170091A (en) Linear ultraviolet flash lamp with self-replenishing cathode
KR20040010898A (en) Igniting device of Microwave Plasma Discharge System
US20210123827A1 (en) Ionization gauge and cartridge
KR20020011919A (en) Plasma processing method and apparatus thereof
JP7114368B2 (en) Sputtering equipment
CN111180298A (en) Radio frequency ion source starts filament device
CN215499638U (en) Novel insulating electrode body
CN103021768A (en) High-voltage and high-current discharge switching tube
SU531682A1 (en) Torch for welding and surfacing in vacuum
US10984989B2 (en) Charge neutralizer and plasma generator
US20210074514A1 (en) Substrate treating apparatus
US3467883A (en) Microwave switching device
KR200235003Y1 (en) Arc prevention and thermal cut-off device of ion nitriding device
SU1593844A1 (en) Electron-beam gun

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09813860

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE