WO2011076108A1 - Horizontal graphite boat - Google Patents

Horizontal graphite boat Download PDF

Info

Publication number
WO2011076108A1
WO2011076108A1 PCT/CN2010/080069 CN2010080069W WO2011076108A1 WO 2011076108 A1 WO2011076108 A1 WO 2011076108A1 CN 2010080069 W CN2010080069 W CN 2010080069W WO 2011076108 A1 WO2011076108 A1 WO 2011076108A1
Authority
WO
WIPO (PCT)
Prior art keywords
graphite boat
horizontal
silicon wafer
sheets
disposed
Prior art date
Application number
PCT/CN2010/080069
Other languages
French (fr)
Chinese (zh)
Inventor
吴晓松
翁建军
Original Assignee
无锡尚德太阳能电力有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 无锡尚德太阳能电力有限公司 filed Critical 无锡尚德太阳能电力有限公司
Publication of WO2011076108A1 publication Critical patent/WO2011076108A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67306—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by a material, a roughness, a coating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
    • H01L21/67343—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates characterized by a material, a roughness, a coating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports

Definitions

  • BACKGROUND OF THE INVENTION 1.
  • the present invention relates to the field of solar cell manufacturing technology, and more particularly to a graphite boat used in the production of solar cells.
  • BACKGROUND OF THE INVENTION In the manufacturing process of a silicon-based solar cell, a thin film deposition process is generally required for the deposition of a silicon wafer, for example, a silicon deposition process using a PECVD (Plasma Enhanced Chemical Vapour Deposition) process. The vacuum coating of silicon is performed to form an antireflection layer (passivation layer) on the surface of the silicon wafer.
  • PECVD Pullasma Enhanced Chemical Vapour Deposition
  • the vacuum coating of silicon is performed to form an antireflection layer (passivation layer) on the surface of the silicon wafer.
  • the following is an introduction to the silicon substrate solar cell manufacturing process.
  • the uncoated silicon wafer is inserted into the carrier of the PECVD vacuum coating equipment, usually the carrier is realized by a graphite boat, ⁇ ⁇ , uncoated
  • the carrier is realized by a graphite boat, ⁇ ⁇ , uncoated
  • the silicon wafer was inserted into the graphite boat, and then the graphite boat loaded with the silicon wafer was placed in a cavity of a PECVD vacuum coating apparatus, and the silicon wafer was coated by a PECVD process. After the coating is completed, the graphite boat is taken out from the cavity of the vacuum coating apparatus, and then the coated silicon wafer is removed from the graphite boat.
  • the graphite boat used in the existing vacuum coating equipment is generally a vertical graphite boat.
  • 1 is a top plan view of a vertical graphite boat in the prior art
  • FIG. 2 is a front view of one of the graphite boat pieces in FIG. 1
  • FIG. 3 is a vertical graphite boat with an electrode in the prior art
  • the vertical graphite boat is mainly composed of a plurality of mutually fixed graphite boat sheets arranged vertically at predetermined intervals, and each of the two surfaces of the graphite boat sheets is provided with a plurality of surfaces.
  • the plurality of graphite boat sheets are further provided with a plurality of ceramic rods 30 passing through the plurality of graphite boat sheets perpendicular to the surface of the graphite boat sheet, the ceramic rods. 30 is used to fix each layer of graphite boat sheets, and the ends of the ceramic rods 30 are fixed using graphite screws 40.
  • a ceramic sleeve 50 is disposed on the ceramic rod 30 between any two graphite boat sheets for spacing the graphite boat sheets away from the space for the silicon wafer to be taken and placed, and the graphite boat sheets between each layer can be ensured. Keep insulated.
  • the vertical graphite boat further includes a robot gripping block 60 disposed on both sides, and positive and negative electrodes 70 disposed on one side. Since both surfaces of each of the graphite boat sheets constituting the vertical graphite boat are provided The position of the silicon wafer can be placed, so that the silicon wafer can be unloaded by inserting the silicon wafer in a manner that the suction pen absorbs the surface of the silicon wafer and sucking the silicon wafer with a suction pen.
  • the present invention provides a horizontal graphite boat comprising a plurality of mutually fixed graphite boat sheets horizontally arranged at predetermined intervals, and an upper surface of each of the graphite boat sheets is disposed along a length thereof a plurality of recesses adapted to place silicon wafers, each of the recesses having an edge portion and a flat bottom portion, the edge portion of the recessed portion on one side in the longitudinal direction of the graphite boat sheet being configured to be adapted The silicon wafer is placed in the recess through the edge portion.
  • the edge portion of the concave portion on one side in the longitudinal direction of the graphite boat piece is configured as a slope or flush with the bottom of the concave portion so that the concave portion has an opening shape on one side.
  • the recessed portion has a recessed depth with respect to the upper surface of the graphite boat sheet that is smaller than a thickness of the silicon wafer.
  • the horizontal graphite boat further includes a graphite boat support fixedly disposed at a bottom of the plurality of graphite boat sheets.
  • the horizontal graphite boat further comprises a robotic gripping block fixedly disposed at both side ends of the plurality of graphite boat sheets in the longitudinal direction.
  • the plurality of graphite boat sheets are disposed on both sides in the width direction thereof with a plurality of ceramic rods vertically passing through the plurality of graphite boat sheets, the ceramic rods being located between the plurality of concave portions of the graphite boat sheets .
  • the horizontal graphite boat further comprises a graphite screw secured to the end of the ceramic rod.
  • the horizontal graphite boat further comprises a ceramic sleeve disposed on the ceramic rod between any two sheets of graphite boat.
  • the horizontal graphite boat further includes positive and negative electrodes disposed on one of the end portions on both side ends of the plurality of graphite boat sheets in the longitudinal direction.
  • FIG. 1 is a schematic top plan view of a vertical graphite boat in the prior art
  • Figure 2 is a front elevational view of one of the graphite boat sheets of Figure 1;
  • FIG. 3 is a side elevational view of a side of a vertical graphite boat with electrodes on the prior art
  • FIG. 4 is a perspective view of an embodiment of a horizontal graphite boat of the present invention
  • FIG. 5 is a top plan view of the horizontal graphite boat of Figure 4.
  • Figure 4 is a perspective view showing one embodiment of a horizontal graphite boat of the present invention
  • Figure 5 is a plan view of the horizontal graphite boat of Figure 4.
  • the horizontal graphite boat in this embodiment includes a plurality of mutually fixed graphite boat sheets horizontally arranged at predetermined intervals, and the upper surface of each of the graphite boat sheets is disposed along the longitudinal direction thereof.
  • each of the recessed portions 1 has an edge portion 11 and a flat bottom portion 12 from the edge portion of the concave portion 1 on the side in the longitudinal direction of the graphite boat sheet 11 is placed in the recessed portion 1.
  • the size of the recessed portion 1 corresponds to the size of the silicon wafer actually used, and the lower surface thereof is fitted to the bottom portion 12 of the recessed portion 1 when the silicon wafer is placed.
  • the depth of the concave portion 1 recessed from the upper surface of the graphite boat sheet is preferably smaller than the thickness of the silicon wafer, so that the wafer can be quickly and accurately positioned while ensuring the wafer, and the silicon can be ensured.
  • the lower surface of the sheet is not in contact with the reaction gas during vacuum coating, and it is good to prevent the reaction gas from reacting with the lower surface of the silicon wafer to form a passivation layer.
  • the edge portion 11 of the recessed portion 1 on the side where the silicon wafer of the graphite boat is placed is configured as a slope, or is configured to be flush with the bottom portion 12 of the recessed portion 1 so that the recessed portion 1 is open on one side, It is advantageous to insert the silicon wafer into the recess 1 or to push the silicon wafer out of the recess 1 .
  • a plurality of ceramic rods 4 vertically passing through a plurality of graphite boat sheets are disposed on both sides in the width direction of the plurality of graphite boat sheets, and the graphite boat sheets are positioned, and each of the ceramic rods 4 is in the graphite boat sheet. Between adjacent two recesses 1 can therefore be used to position the position of each recess 1.
  • the horizontal graphite boat of the present embodiment may further include a graphite boat bracket 2 disposed at the bottom of the plurality of graphite boat sheets for supporting the horizontal graphite boat, and facilitating placing the horizontal graphite boat on the paddle of the vacuum coating device to the silicon The sheet is coated.
  • the horizontal graphite boat of the embodiment may further include a robot gripping block 3 fixedly disposed at two end portions of the plurality of graphite boat sheets in the longitudinal direction, so as to facilitate the robot of the vacuum coating device to put the horizontal graphite boat into the vacuum coating device.
  • the robotic grab block 3 can be fixedly connected to the graphite boat through the graphite rods at the ends of the graphite boat.
  • the horizontal graphite boat of this embodiment may further include a graphite screw 6 for fixing the end of the ceramic rod 4.
  • the horizontal graphite boat of the present embodiment may further include a ceramic sleeve 5 disposed on the ceramic rod 4 between any two graphite boat sheets for maintaining a predetermined interval between any two sheets of the graphite boat sheet and making the phase
  • the two adjacent graphite boat pieces are electrically insulated from each other.
  • the horizontal graphite boat of the present embodiment may further include positive and negative electrodes 7 disposed on one of the end portions of the both end portions in the longitudinal direction of the plurality of graphite boat sheets, which are connected to a power source for providing a reaction gas ion
  • the high-frequency voltage, the positive and negative electrodes 7 are respectively connected to the separated graphite boat sheets.
  • the positive electrode is connected with the first, third, fifth and seventh graphite boat pieces from the bottom.
  • the negative electrode is connected by a second, four, six, and eight graphite boat pieces from the top.
  • the silicon wafer can be pushed into the concave portion 1 from the edge portion of the inclined portion or the opening of the concave portion 1 of the graphite boat in the direction indicated by the arrow. Position the silicon wafer. After the coating is completed, when the silicon wafer is taken out from the horizontal graphite boat, it is only necessary to push the silicon wafer out of the concave portion 1 in the opposite direction of the direction of the arrow, that is, from the other side of the graphite boat.
  • the operator can touch the edge of the silicon wafer without touching the edge of the silicon wafer when pushing the silicon wafer into the concave portion 1 or pushing the silicon wafer out of the concave portion 1 , so the horizontal graphite boat can be applied.
  • New efficient solar power The process of the pool process; and the operation of placing the silicon wafer and unloading the silicon wafer does not cause the silicon wool surface to come into contact with the graphite boat sheet, and the silicon wafer surface is not easily worn, thereby improving the performance of the solar cell product; Since the silicon wafer is coated in a horizontal state, no additional silicon wafer fixing structure is required, no contact process point is generated, and the overall coating quality of the silicon wafer surface is improved.

Abstract

A horizontal graphite boat used in the process of manufacturing a solar battery is provided, which comprises a plurality of graphite boat sheets fixed each other which are disposed horizontally in a predetermined space. A plurality of concave parts (1) suitable for placing silicon wafers are disposed along a length direction on the top surface of each such graphite boat sheet. Each of the concave parts includes a periphery part (11) and a flat bottom (12). The periphery part of the concave part on the side of the length direction of the graphite boat sheet is configured as an inclined plane or flushes with the bottom. The graphite boat enables the operator not to touch a fluff manufacture face of the silicon wafer during the silicon wafer placing and removing operation, thereby suitable for a new high efficiency solar battery technical production; and enables the fluff surface of the silicon wafer not to be damaged during the silicon wafer placing and removing operation, thereby improving the performance of solar battery product.

Description

一种水平石墨舟 技术领域 本发明涉及太阳电池制造技术领域， 尤其涉及在太阳电池生产的过程中 使用的石墨舟。 背景技术 在硅基体太阳电池的制造工艺过程中， 通常需要采用薄膜沉积工艺进行 硅片的镀膜， 例如可采用 PECVD ( Plasma Enhanced Chemical Vapour Deposition, 等离子增强化学气相沉积）的沉积工艺对硅片进行氮化硅的真空 镀膜， 使在硅片表面形成防反射层（钝化层）。下面对硅基体太阳电池制造工 艺进行简介。  BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the field of solar cell manufacturing technology, and more particularly to a graphite boat used in the production of solar cells. BACKGROUND OF THE INVENTION In the manufacturing process of a silicon-based solar cell, a thin film deposition process is generally required for the deposition of a silicon wafer, for example, a silicon deposition process using a PECVD (Plasma Enhanced Chemical Vapour Deposition) process. The vacuum coating of silicon is performed to form an antireflection layer (passivation layer) on the surface of the silicon wafer. The following is an introduction to the silicon substrate solar cell manufacturing process.
在太阳电池制造过程中， 在进行硅片表面镀膜时， 将未镀膜的硅片*** PECVD 真空镀膜设备的载片器上， 通常载片器由石墨舟来实现， §Ρ， 将未 经镀膜的硅片***石墨舟， 然后， 将载有硅片的石墨舟放置在 PECVD真空 镀膜设备腔体内， 采用 PECVD工艺对硅片进行镀膜。 镀膜结束后， 从真空 镀膜设备腔体内取出石墨舟，然后再将经过镀膜的硅片从石墨舟上卸取下来。  In the solar cell manufacturing process, when the surface of the silicon wafer is coated, the uncoated silicon wafer is inserted into the carrier of the PECVD vacuum coating equipment, usually the carrier is realized by a graphite boat, § Ρ, uncoated The silicon wafer was inserted into the graphite boat, and then the graphite boat loaded with the silicon wafer was placed in a cavity of a PECVD vacuum coating apparatus, and the silicon wafer was coated by a PECVD process. After the coating is completed, the graphite boat is taken out from the cavity of the vacuum coating apparatus, and then the coated silicon wafer is removed from the graphite boat.
现有的真空镀膜设备所使用的石墨舟一般为垂直式石墨舟。 图 1所示为 现有技术中的垂直式石墨舟的俯视结构示意图； 图 2为图 1中的其中一片石 墨舟片的主视图； 图 3为现有技术中的垂直式石墨舟带有电极一侧的侧面主 视图。 如图 1、 图 2及图 3所示， 该垂直式石墨舟主要由以预定间隔垂直布 置的多片相互固定的石墨舟片组成， 每片石墨舟片的两个表面均设置有多个 用于放置硅片的位置 10及用于定位硅片的固定部 20， 多片石墨舟片上还设 置有多个垂直于石墨舟片表面而穿过多片石墨舟片的陶瓷棒 30，该陶瓷棒 30 用于将每一层的石墨舟片固定， 且陶瓷棒 30的端部使用石墨螺丝 40固定。 在任意两片石墨舟片之间的陶瓷棒 30上设置有陶瓷套 50， 用于将石墨舟片 隔开一定的距离留出硅片取放的空间， 且可以保证每层石墨舟片之间保持绝 缘。 该垂直式石墨舟还包括设置在两侧的机械手抓取块 60， 及设置在一侧的 正负电极 70。由于组成该垂直式石墨舟的每片石墨舟片的两个表面都设置有 可放置硅片的位置， 所以只能采用吸笔吸取硅片表面的方式对硅片进行插片 和采用吸笔吸取硅片绒面的方式对硅片进行卸片的操作。 The graphite boat used in the existing vacuum coating equipment is generally a vertical graphite boat. 1 is a top plan view of a vertical graphite boat in the prior art; FIG. 2 is a front view of one of the graphite boat pieces in FIG. 1; FIG. 3 is a vertical graphite boat with an electrode in the prior art; Side view of the side of the side. As shown in FIG. 1, FIG. 2 and FIG. 3, the vertical graphite boat is mainly composed of a plurality of mutually fixed graphite boat sheets arranged vertically at predetermined intervals, and each of the two surfaces of the graphite boat sheets is provided with a plurality of surfaces. In the position 10 for placing the silicon wafer and the fixing portion 20 for positioning the silicon wafer, the plurality of graphite boat sheets are further provided with a plurality of ceramic rods 30 passing through the plurality of graphite boat sheets perpendicular to the surface of the graphite boat sheet, the ceramic rods. 30 is used to fix each layer of graphite boat sheets, and the ends of the ceramic rods 30 are fixed using graphite screws 40. A ceramic sleeve 50 is disposed on the ceramic rod 30 between any two graphite boat sheets for spacing the graphite boat sheets away from the space for the silicon wafer to be taken and placed, and the graphite boat sheets between each layer can be ensured. Keep insulated. The vertical graphite boat further includes a robot gripping block 60 disposed on both sides, and positive and negative electrodes 70 disposed on one side. Since both surfaces of each of the graphite boat sheets constituting the vertical graphite boat are provided The position of the silicon wafer can be placed, so that the silicon wafer can be unloaded by inserting the silicon wafer in a manner that the suction pen absorbs the surface of the silicon wafer and sucking the silicon wafer with a suction pen.
可见， 现有技术中的垂直式石墨舟存在如下缺点：  It can be seen that the vertical graphite boat in the prior art has the following disadvantages:
1、由于垂直石墨舟需要使用固定部固定硅片，所以在与固定部接触的硅 片处会产生工艺点， 即此处不能与反应气体充分反应形成有效钝化层， 影响 了硅片整个表面的镀膜质量；  1. Since the vertical graphite boat needs to use the fixing portion to fix the silicon wafer, a process point is generated at the silicon wafer in contact with the fixed portion, that is, the reactive gas cannot be sufficiently reacted to form an effective passivation layer, which affects the entire surface of the silicon wafer. Coating quality;
2、由于新的高效太阳电池的工艺要求不能碰触硅片的绒面， 因此现有的 垂直式石墨舟无法适用于新的高效太阳电池工艺生产。  2. Since the process requirements of the new high-efficiency solar cell cannot touch the suede of the silicon wafer, the existing vertical graphite boat cannot be applied to the new high-efficiency solar cell process.
3、在将硅片***垂直式石墨舟或从该垂直式石墨舟上卸取时，硅片容易 与石墨舟片发生碰触， 从而导致硅片绒面被磨损以致影响产品的性能以及会 造成硅片的裂纹或碎片。 发明内容 本发明的目的在于， 提供一种水平石墨舟， 该水平石墨舟使得操作者能 在不需碰触硅片的制绒面的情况下实现对硅片的插片和卸片， 从而可适用于 新的高效太阳电池工艺生产过程。  3. When the silicon wafer is inserted into or removed from the vertical graphite boat, the silicon wafer is easily in contact with the graphite boat sheet, which causes the silicon wafer to be worn to affect the performance of the product and may cause Cracks or fragments of the silicon wafer. SUMMARY OF THE INVENTION It is an object of the present invention to provide a horizontal graphite boat that enables an operator to insert and unload a silicon wafer without touching the textured surface of the silicon wafer. Suitable for new high efficiency solar cell process production processes.
为实现上述目的， 本发明提供一种水平石墨舟， 该水平石墨舟包括以预 定间隔水平布置的多片相互固定的石墨舟片， 每片所述石墨舟片的上表面沿 其长度方向设置有多个适于放置硅片的凹入部， 每个所述凹入部具有边缘部 和平坦的底部， 所述凹入部的处于所述石墨舟片的长度方向的一侧的边缘部 构造为适于将所述硅片经该边缘部置入所述凹入部。  In order to achieve the above object, the present invention provides a horizontal graphite boat comprising a plurality of mutually fixed graphite boat sheets horizontally arranged at predetermined intervals, and an upper surface of each of the graphite boat sheets is disposed along a length thereof a plurality of recesses adapted to place silicon wafers, each of the recesses having an edge portion and a flat bottom portion, the edge portion of the recessed portion on one side in the longitudinal direction of the graphite boat sheet being configured to be adapted The silicon wafer is placed in the recess through the edge portion.
作为优选， 所述凹入部的处于所述石墨舟片的长度方向的一侧的边缘部 构造为斜面或与凹入部的底部齐平以使凹入部在一侧呈开口状。  Preferably, the edge portion of the concave portion on one side in the longitudinal direction of the graphite boat piece is configured as a slope or flush with the bottom of the concave portion so that the concave portion has an opening shape on one side.
作为优选， 所述凹入部相对于所述石墨舟片的上表面的凹入深度小于所 述硅片的厚度。  Preferably, the recessed portion has a recessed depth with respect to the upper surface of the graphite boat sheet that is smaller than a thickness of the silicon wafer.
作为优选， 该水平石墨舟还包括固定设置在所述多片石墨舟片底部的石 墨舟支架。  Preferably, the horizontal graphite boat further includes a graphite boat support fixedly disposed at a bottom of the plurality of graphite boat sheets.
作为优选， 该水平石墨舟还包括固定设置在所述多片石墨舟片长度方向 上的两侧端部的机械手抓块。  Preferably, the horizontal graphite boat further comprises a robotic gripping block fixedly disposed at both side ends of the plurality of graphite boat sheets in the longitudinal direction.
作为优选， 所述多片石墨舟片的宽度方向上的两侧设置有多个垂直穿过 多片石墨舟片的陶瓷棒， 所述陶瓷棒处于所述石墨舟片的多个凹入部之间。 作为优选， 该水平石墨舟还包括固定于所述陶瓷棒端部的石墨螺丝。 作为优选， 该水平石墨舟还包括陶瓷套， 其设置在任意两片石墨舟片之 间的所述陶瓷棒上。 Preferably, the plurality of graphite boat sheets are disposed on both sides in the width direction thereof with a plurality of ceramic rods vertically passing through the plurality of graphite boat sheets, the ceramic rods being located between the plurality of concave portions of the graphite boat sheets . Preferably, the horizontal graphite boat further comprises a graphite screw secured to the end of the ceramic rod. Preferably, the horizontal graphite boat further comprises a ceramic sleeve disposed on the ceramic rod between any two sheets of graphite boat.
作为优选， 所述水平石墨舟还包括设置在所述多片石墨舟片长度方向上 的两侧端部的其中一侧端部上的正负电极。  Preferably, the horizontal graphite boat further includes positive and negative electrodes disposed on one of the end portions on both side ends of the plurality of graphite boat sheets in the longitudinal direction.
本发明提供的水平石墨舟使得操作人员可以不需碰触硅片的制绒面而实 现对硅片进行放片和卸片的操作， 因此可以适用于新的高效太阳电池工艺生 产； 且放置硅片和卸取硅片的操作不易使硅片的制绒面被磨损， 从而提高了 太阳电池产品的性能； 而且由于硅片是在水平放置状态下进行镀膜， 无需额 外的硅片固定结构， 不会产生接触工艺点， 从而提高了硅片表面的整体镀膜 质量。 附图说明 图 1为现有技术中的垂直式石墨舟的俯视结构示意图；  The horizontal graphite boat provided by the invention enables the operator to perform the operation of releasing and unloading the silicon wafer without touching the lint surface of the silicon wafer, so that it can be applied to the new high-efficiency solar cell process production; The operation of the sheet and the unloading of the silicon wafer is not easy to wear the surface of the silicon wafer, thereby improving the performance of the solar cell product; and since the silicon wafer is coated in a horizontal state, no additional silicon wafer fixing structure is required, Contact process points are created, which improves the overall coating quality of the wafer surface. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic top plan view of a vertical graphite boat in the prior art;
图 2为图 1中其中一片石墨舟片的主视图；  Figure 2 is a front elevational view of one of the graphite boat sheets of Figure 1;
图 3为现有技术中的垂直式石墨舟带有电极一侧的侧面主视图； 图 4为本发明的水平石墨舟的一个实施例的立体结构示意图；  3 is a side elevational view of a side of a vertical graphite boat with electrodes on the prior art; FIG. 4 is a perspective view of an embodiment of a horizontal graphite boat of the present invention;
图 5为图 4中的水平石墨舟的俯视图。 具体实施方式 下面结合附图对本发明实施方式进行详细说明。  Figure 5 is a top plan view of the horizontal graphite boat of Figure 4. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
图 4为本发明的水平石墨舟的一个实施例的立体结构示意图； 图 5为图 4中的水平石墨舟的俯视图。 如图 4及图 5所示， 该实施例中的水平石墨舟 包括以预定间隔水平布置的多片相互固定的石墨舟片， 每片石墨舟片的上表 面沿其长度方向设置有多个适于放置硅片的凹入部 1， 每个凹入部 1具有边 缘部 11和平坦的底部 12， 所述硅片从所述凹入部 1的处于所述石墨舟片的 长度方向的一侧的边缘部 11置入所述凹入部 1。所述凹入部 1的大小与实际 使用的硅片的尺寸相对应，当硅片置入后其下表面与凹入部 1的底部 12贴合。  Figure 4 is a perspective view showing one embodiment of a horizontal graphite boat of the present invention; and Figure 5 is a plan view of the horizontal graphite boat of Figure 4. As shown in FIG. 4 and FIG. 5, the horizontal graphite boat in this embodiment includes a plurality of mutually fixed graphite boat sheets horizontally arranged at predetermined intervals, and the upper surface of each of the graphite boat sheets is disposed along the longitudinal direction thereof. In the recessed portion 1 in which the silicon wafer is placed, each of the recessed portions 1 has an edge portion 11 and a flat bottom portion 12 from the edge portion of the concave portion 1 on the side in the longitudinal direction of the graphite boat sheet 11 is placed in the recessed portion 1. The size of the recessed portion 1 corresponds to the size of the silicon wafer actually used, and the lower surface thereof is fitted to the bottom portion 12 of the recessed portion 1 when the silicon wafer is placed.
其中， 凹入部 1从该片石墨舟片的上表面凹入的深度优选为小于硅片的 厚度， 这样在保证装片时可以迅速准确的进行硅片定位的同时， 也能保证硅 片的下表面在真空镀膜时不与反应气体接触， 很好的避免反应气体与硅片的 下表面产生反应形成钝化层。 Wherein, the depth of the concave portion 1 recessed from the upper surface of the graphite boat sheet is preferably smaller than the thickness of the silicon wafer, so that the wafer can be quickly and accurately positioned while ensuring the wafer, and the silicon can be ensured. The lower surface of the sheet is not in contact with the reaction gas during vacuum coating, and it is good to prevent the reaction gas from reacting with the lower surface of the silicon wafer to form a passivation layer.
优选的，凹入部 1的处于石墨舟的硅片置入一侧的边缘部 11构造为斜面， 或构造为与凹入部 1的底部 12齐平以使凹入部 1在一侧呈开口状，以利于将 硅片置入凹入部 1或将硅片从凹入部 1中推出。  Preferably, the edge portion 11 of the recessed portion 1 on the side where the silicon wafer of the graphite boat is placed is configured as a slope, or is configured to be flush with the bottom portion 12 of the recessed portion 1 so that the recessed portion 1 is open on one side, It is advantageous to insert the silicon wafer into the recess 1 or to push the silicon wafer out of the recess 1 .
在多片石墨舟片的宽度方向上的两侧还设置有多个垂直穿过多片石墨舟 片的陶瓷棒 4， 可对石墨舟片进行定位， 并且每个陶瓷棒 4处于石墨舟片的 相邻两个凹入部 1之间， 因此可用于定位每个凹入部 1的位置。  A plurality of ceramic rods 4 vertically passing through a plurality of graphite boat sheets are disposed on both sides in the width direction of the plurality of graphite boat sheets, and the graphite boat sheets are positioned, and each of the ceramic rods 4 is in the graphite boat sheet. Between adjacent two recesses 1 can therefore be used to position the position of each recess 1.
本实施例的水平石墨舟还可包括设置在多片石墨舟片底部的石墨舟支架 2，其用于支持该水平石墨舟，并便于将该水平石墨舟放置在真空镀膜设备的 桨上对硅片进行镀膜。  The horizontal graphite boat of the present embodiment may further include a graphite boat bracket 2 disposed at the bottom of the plurality of graphite boat sheets for supporting the horizontal graphite boat, and facilitating placing the horizontal graphite boat on the paddle of the vacuum coating device to the silicon The sheet is coated.
本实施例的水平石墨舟还可包括固定设置在多片石墨舟片长度方向上的 两侧端部的机械手抓块 3， 以方便真空镀膜设备的机械手将该水平石墨舟放 入真空镀膜设备的桨上或从其上取下， 机械手抓块 3可通过石墨舟两侧端部 的石墨棒与石墨舟固定连接。  The horizontal graphite boat of the embodiment may further include a robot gripping block 3 fixedly disposed at two end portions of the plurality of graphite boat sheets in the longitudinal direction, so as to facilitate the robot of the vacuum coating device to put the horizontal graphite boat into the vacuum coating device. On or off the paddle, the robotic grab block 3 can be fixedly connected to the graphite boat through the graphite rods at the ends of the graphite boat.
本实施例的水平石墨舟还可包括石墨螺丝 6， 其用于固定陶瓷棒 4的端 部。  The horizontal graphite boat of this embodiment may further include a graphite screw 6 for fixing the end of the ceramic rod 4.
本实施例的水平石墨舟还可包括陶瓷套 5， 其设置在任意两片石墨舟片 之间的陶瓷棒 4上， 用于使石墨舟片的任意两片之间保持预定的间隔并使相 邻的两片石墨舟片相互保持电性绝缘。  The horizontal graphite boat of the present embodiment may further include a ceramic sleeve 5 disposed on the ceramic rod 4 between any two graphite boat sheets for maintaining a predetermined interval between any two sheets of the graphite boat sheet and making the phase The two adjacent graphite boat pieces are electrically insulated from each other.
本实施例的水平石墨舟还可包括设置在多片石墨舟片长度方向上的两侧 端部的其中一侧端部上的正负电极 7， 其与电源连接， 提供用于将反应气体 离子化的高频电压， 正负电极 7分别连接相隔的石墨舟片， 例如当石墨舟片 共为 8片时， 正电极连接由下自上的第一、 三、 五、 七片石墨舟片， 而负电 极连接由下自上的第二、 四、 六、 八片石墨舟片。  The horizontal graphite boat of the present embodiment may further include positive and negative electrodes 7 disposed on one of the end portions of the both end portions in the longitudinal direction of the plurality of graphite boat sheets, which are connected to a power source for providing a reaction gas ion The high-frequency voltage, the positive and negative electrodes 7 are respectively connected to the separated graphite boat sheets. For example, when the graphite boat sheets are a total of 8 pieces, the positive electrode is connected with the first, third, fifth and seventh graphite boat pieces from the bottom. The negative electrode is connected by a second, four, six, and eight graphite boat pieces from the top.
使用本实施例的水平石墨舟时， 如图 4所示， 按照箭头指示的方向， 将 硅片从石墨舟的凹入部 1的一侧的呈斜面或开口的边缘部推入凹入部 1即可 对硅片定位。 在镀膜完成之后， 从水平石墨舟上取出硅片时， 只需按照箭头 的方向的反方向， 即从石墨舟的另一侧将硅片推出凹入部 1即可。 可见， 操 作者在将硅片推入凹入部 1或将硅片从凹入部 1推出时， 只需碰触硅片的边 缘而无需碰触硅片的制绒面， 因而该水平石墨舟可以适用于新的高效太阳电 池工艺生产； 且放置硅片和卸取硅片的操作不会使硅片的制绒面与石墨舟片 发生接触， 不易使硅片绒面被磨损， 从而提高了太阳能电池产品的性能； 而 且由于硅片是在水平放置状态下进行镀膜， 无需额外的硅片固定结构， 不会 产生接触工艺点， 提高了硅片表面的整体镀膜质量。 When the horizontal graphite boat of the present embodiment is used, as shown in FIG. 4, the silicon wafer can be pushed into the concave portion 1 from the edge portion of the inclined portion or the opening of the concave portion 1 of the graphite boat in the direction indicated by the arrow. Position the silicon wafer. After the coating is completed, when the silicon wafer is taken out from the horizontal graphite boat, it is only necessary to push the silicon wafer out of the concave portion 1 in the opposite direction of the direction of the arrow, that is, from the other side of the graphite boat. It can be seen that the operator can touch the edge of the silicon wafer without touching the edge of the silicon wafer when pushing the silicon wafer into the concave portion 1 or pushing the silicon wafer out of the concave portion 1 , so the horizontal graphite boat can be applied. New efficient solar power The process of the pool process; and the operation of placing the silicon wafer and unloading the silicon wafer does not cause the silicon wool surface to come into contact with the graphite boat sheet, and the silicon wafer surface is not easily worn, thereby improving the performance of the solar cell product; Since the silicon wafer is coated in a horizontal state, no additional silicon wafer fixing structure is required, no contact process point is generated, and the overall coating quality of the silicon wafer surface is improved.
以上所述是本发明的优选实施方式， 应当指出， 对于本技术领域的普通 技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰， 这些改进和润饰也视为落在本发明的权利要求所要求的保护范围之内。  The above is a preferred embodiment of the present invention, and it should be noted that those skilled in the art can also make several improvements and retouchings without departing from the principles of the present invention. It is intended to fall within the scope of protection as claimed in the appended claims.

Claims

权利要求 Rights request
1、 一种水平石墨舟， 其特征在于， 所述水平石墨舟包括以预定间隔水平 布置的多片相互固定的石墨舟片， 每片所述石墨舟片的上表面沿其长度方向 设置有多个适于放置硅片的凹入部， 每个所述凹入部具有边缘部和平坦的底 部， 所述凹入部的处于所述石墨舟片的长度方向的一侧的边缘部构造为适于 将所述硅片经该边缘部置入所述凹入部。 A horizontal graphite boat, characterized in that the horizontal graphite boat comprises a plurality of mutually fixed graphite boat sheets arranged horizontally at predetermined intervals, and the upper surface of each of the graphite boat sheets is disposed along a length thereof Recessed portions adapted to be placed on the silicon wafer, each of the concave portions having an edge portion and a flat bottom portion, the edge portion of the concave portion on one side in the longitudinal direction of the graphite boat sheet being configured to be suitable for The silicon wafer is placed in the recess through the edge portion.
2、 根据权利要求 1所述水平石墨舟， 其特征在于， 所述凹入部的处于所 述石墨舟片的长度方向的一侧的边缘部构造为斜面。  The horizontal graphite boat according to claim 1, wherein an edge portion of the concave portion on one side in the longitudinal direction of the graphite boat piece is configured as a slope.
3、 根据权利要求 1所述水平石墨舟， 其特征在于， 所述凹入部的处于所 述石墨舟片的长度方向的一侧的边缘部构造为与凹入部的底部齐平以使所述 凹入部呈开口状。  3. The horizontal graphite boat according to claim 1, wherein an edge portion of the concave portion on one side in a longitudinal direction of the graphite boat piece is configured to be flush with a bottom portion of the concave portion to make the concave portion The entrance is open.
4、 根据权利要求 1所述的水平石墨舟， 其特征在于， 所述凹入部相对于 所述石墨舟片的上表面的凹入深度小于所述硅片的厚度。  The horizontal graphite boat according to claim 1, wherein a concave depth of the concave portion with respect to an upper surface of the graphite boat sheet is smaller than a thickness of the silicon wafer.
5、 根据权利要求 1所述的水平石墨舟， 其特征在于， 所述水平石墨舟还 包括固定设置在所述多片石墨舟片底部的石墨舟支架。  The horizontal graphite boat according to claim 1, wherein the horizontal graphite boat further comprises a graphite boat bracket fixedly disposed at a bottom of the plurality of graphite boat sheets.
6、 根据权利要求 1所述的水平石墨舟， 其特征在于， 所述水平石墨舟还 包括固定设置在所述多片石墨舟片长度方向上的两侧端部的机械手抓块。  6. The horizontal graphite boat according to claim 1, wherein the horizontal graphite boat further comprises a robot gripper fixedly disposed at both end portions of the plurality of graphite boat sheets in the longitudinal direction.
7、 根据权利要求 1所述的水平石墨舟， 其特征在于， 所述多片石墨舟片 的宽度方向上的两侧设置有多个垂直穿过所述多片石墨舟片的陶瓷棒。  The horizontal graphite boat according to claim 1, wherein a plurality of ceramic rods vertically passing through the plurality of graphite boat sheets are disposed on both sides in the width direction of the plurality of graphite boat sheets.
8、 根据权利要求 7所述的水平石墨舟， 其特征在于， 所述水平石墨舟还 包括固定于所述陶瓷棒端部的石墨螺丝。  8. The horizontal graphite boat according to claim 7, wherein the horizontal graphite boat further comprises a graphite screw fixed to an end of the ceramic rod.
9、 根据权利要求 7或 8所述的水平石墨舟， 其特征在于， 所述水平石墨 舟还包括陶瓷套， 其设置在任意两片石墨舟片之间的所述陶瓷棒上。  The horizontal graphite boat according to claim 7 or 8, wherein the horizontal graphite boat further comprises a ceramic sleeve disposed on the ceramic rod between any two graphite boat sheets.
10、 根据权利要求 2或 3所述的水平石墨舟， 其特征在于， 所述多片石 墨舟片的宽度方向上的两侧设置有多个垂直穿过所述多片石墨舟片的陶瓷 棒。  The horizontal graphite boat according to claim 2 or 3, wherein a plurality of ceramic rods vertically passing through the plurality of graphite boat sheets are disposed on both sides in the width direction of the plurality of graphite boat sheets .
11、 根据权利要求 10所述的水平石墨舟， 其特征在于， 所述水平石墨舟 还包括陶瓷套， 其设置在任意两片石墨舟片之间的所述陶瓷棒上。  11. The horizontal graphite boat according to claim 10, wherein the horizontal graphite boat further comprises a ceramic sleeve disposed on the ceramic rod between any two graphite boat sheets.
12、 根据权利要求 1 所述的水平石墨舟， 其特征在于， 所述水平石墨舟 还包括设置在所述多片石墨舟片长度方向上的两侧端部的其中一侧端部上的 正负电极。  12. The horizontal graphite boat according to claim 1, wherein the horizontal graphite boat further comprises a positive side of one of the two end portions of the plurality of graphite boat sheets in the longitudinal direction. Negative electrode.
PCT/CN2010/080069 2009-12-22 2010-12-21 Horizontal graphite boat WO2011076108A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2009102613593A CN102487109A (en) 2009-12-22 2009-12-22 Horizontal graphite boat
CN200910261359.3 2009-12-22

Publications (1)

Publication Number Publication Date
WO2011076108A1 true WO2011076108A1 (en) 2011-06-30

Family

ID=44194955

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2010/080069 WO2011076108A1 (en) 2009-12-22 2010-12-21 Horizontal graphite boat

Country Status (2)

Country Link
CN (1) CN102487109A (en)
WO (1) WO2011076108A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107046080B (en) * 2017-02-22 2019-01-29 广东爱旭科技股份有限公司 A kind of contactless inserted sheet graphite boat
CN106848003B (en) * 2017-04-11 2018-04-13 常州亿晶光电科技有限公司 Graphite boat ceramic jacket rapid installation device
CN110931339B (en) * 2019-10-23 2022-04-22 深圳市拉普拉斯能源技术有限公司 Processing device for semiconductor or photovoltaic material
CN111118478A (en) * 2019-12-31 2020-05-08 湖南红太阳光电科技有限公司 PECVD equipment for preparing heterojunction battery thin film
CN112663030A (en) * 2020-12-28 2021-04-16 无锡松煜科技有限公司 Vertical photovoltaic cell passivation deposition device
CN112898049A (en) * 2021-01-28 2021-06-04 赛瑞特科技(福建)有限公司 Boron nitride coating evaporation boat and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1140509A (en) * 1997-07-22 1999-02-12 Kokusai Electric Co Ltd Boat of semiconductor manufacturing equipment
CN201222507Y (en) * 2008-06-06 2009-04-15 上海太阳能科技有限公司 Quartz boat for solar cell diffusion technology
CN201601140U (en) * 2009-12-22 2010-10-06 无锡尚德太阳能电力有限公司 Horizontal graphite boat

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI268265B (en) * 2004-08-13 2006-12-11 Au Optronics Corp Glass substrate cassette
CN101008081B (en) * 2007-01-29 2010-05-19 尤耀明 Graphite boat for silicon wafer production
DE102008019023B4 (en) * 2007-10-22 2009-09-24 Centrotherm Photovoltaics Ag Vacuum continuous flow system for the processing of substrates

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1140509A (en) * 1997-07-22 1999-02-12 Kokusai Electric Co Ltd Boat of semiconductor manufacturing equipment
CN201222507Y (en) * 2008-06-06 2009-04-15 上海太阳能科技有限公司 Quartz boat for solar cell diffusion technology
CN201601140U (en) * 2009-12-22 2010-10-06 无锡尚德太阳能电力有限公司 Horizontal graphite boat

Also Published As

Publication number Publication date
CN102487109A (en) 2012-06-06

Similar Documents

Publication Publication Date Title
WO2011076108A1 (en) Horizontal graphite boat
WO2012046418A1 (en) Substrate plasma treatment method
TWI331356B (en) Substrate treatment device
KR20170086637A (en) Substrate holding device, substrate transport device, processing arrangement and method for processing a substrate
TWI407525B (en) Transporting machine
CN102321877A (en) Electrode introduction device
JP4783094B2 (en) Annular parts for plasma processing, plasma processing apparatus, and outer annular member
CN104282519B (en) The clean method of plasma processing apparatus
CN201601140U (en) Horizontal graphite boat
EP2405475A1 (en) Plasma texturing apparatus
JP3898600B2 (en) Manufacturing method of solar cell
JP2000021947A (en) Dry type processor
CN100341120C (en) Plasma processing device and method thereof
CN102468118A (en) Jig and cleaning machine
CN104282518B (en) The clean method of plasma processing apparatus
TWI466188B (en) Sample holder
TW200935511A (en) Plasma etching chamber
TW202234573A (en) Electrostatic chuck with differentiated ceramics
CN108288659B (en) Extrusion-proof clamp for etching edge of single solar cell
JP6024417B2 (en) Sample holder
WO2013013588A1 (en) Chamber device and plasma processing apparatus having same
WO2022152020A1 (en) Bearing apparatus, and plasma-enhanced chemical vapor deposition device and method for using same
CN214321173U (en) Device for removing fragments in cavity
KR20110018229A (en) Appratus and method for treating substrate
WO2022152023A1 (en) Plasma enhanced chemical vapor deposition device and use method therefor

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10838671

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10838671

Country of ref document: EP

Kind code of ref document: A1