WO2011065421A1 - 発光装置 - Google Patents
発光装置 Download PDFInfo
- Publication number
- WO2011065421A1 WO2011065421A1 PCT/JP2010/071017 JP2010071017W WO2011065421A1 WO 2011065421 A1 WO2011065421 A1 WO 2011065421A1 JP 2010071017 W JP2010071017 W JP 2010071017W WO 2011065421 A1 WO2011065421 A1 WO 2011065421A1
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- WO
- WIPO (PCT)
- Prior art keywords
- light
- light emitting
- emitting element
- substrate
- pair
- Prior art date
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- 239000000758 substrate Substances 0.000 claims abstract description 83
- 239000010410 layer Substances 0.000 claims description 132
- 239000012790 adhesive layer Substances 0.000 claims description 46
- 238000006243 chemical reaction Methods 0.000 claims description 29
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 19
- 230000005284 excitation Effects 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 9
- 239000004020 conductor Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 8
- 239000010954 inorganic particle Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910007948 ZrB2 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- NWAIGJYBQQYSPW-UHFFFAOYSA-N azanylidyneindigane Chemical compound [In]#N NWAIGJYBQQYSPW-UHFFFAOYSA-N 0.000 description 1
- VWZIXVXBCBBRGP-UHFFFAOYSA-N boron;zirconium Chemical compound B#[Zr]#B VWZIXVXBCBBRGP-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000009415 formwork Methods 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
Definitions
- the present invention relates to a light emitting device including a light emitting element.
- a light emitting device having a light source including a light emitting element has been developed.
- a light-emitting device including a light-emitting element has attracted attention with respect to power consumption or product life.
- a light emitting device having this light emitting element is required to have a function of selectively emitting light of a plurality of color temperatures, for example, in the field of residential lighting.
- the light emitting device is required to improve the light emission efficiency of light extracted from the light emitting device.
- a light emitting device is mounted on a substrate, a pair of electrode layers provided on the substrate, and the pair of electrode layers with a space between the pair of electrode layers, A light-emitting element electrically connected to the pair of electrode layers; and a pair of reflective layers provided so as to overlap from one of the pair of electrode layers to the other when seen in a plan view. Further, in the light emitting device, the pair of reflective layers are provided so as to sandwich the light emitting element with a space between the light emitting element.
- FIG. 3 is a cross-sectional view of the light emitting device along X-X ′ shown in FIG. 2.
- FIG. 3 is a cross-sectional view of the light emitting device along Y-Y ′ shown in FIG. 2.
- the light emitting device 1 is provided on a substrate 2, a pair of electrode layers 3 provided on the substrate 2, a light emitting element 4 electrically connected to the electrode layer 3, and the substrate 2.
- the light emitting element 4 is, for example, a light emitting diode, and emits excitation light toward the outside when electrons and holes in a pn junction using a semiconductor are recombined.
- the substrate 2 has a mounting region R1 on which the light emitting element 4 is mounted.
- the substrate 2 is an insulating substrate and is made of a sintered body or a porous material such as aluminum oxide, titanium oxide, zirconium oxide or yttrium oxide.
- a porous material such as aluminum oxide, titanium oxide, zirconium oxide or yttrium oxide.
- many fine holes are formed on the surface of the substrate 2.
- the excitation light emitted from the light emitting element 4 is irradiated on the surface of the substrate 2 and diffusely reflected.
- the excitation light which the light emitting element 4 emits can be radiated
- the substrate 2 can be made of a ceramic material such as alumina, mullite, or glass ceramics, or a composite material obtained by mixing a plurality of these materials.
- the substrate 2 can be made of a polymer resin in which metal oxide fine particles are dispersed.
- the thermal conductivity of the substrate 2 is set to, for example, 1 [W / m ⁇ K] or more and 250 [W / m ⁇ K] or less.
- the substrate 2 is formed with a through conductor 6 that electrically connects the upper surface and the lower surface of the substrate 2.
- the through conductor 6 is made of a conductive material such as tungsten, molybdenum, manganese, or copper.
- the through conductor 6 is obtained, for example, by printing a metal paste obtained by adding an organic solvent to a powder of tungsten or the like in a predetermined pattern on the upper surface of the substrate 2 in which the through hole is formed.
- a plating layer such as nickel or gold is deposited on the surface of the through conductor 6 exposed inside and outside the substrate 2 to prevent oxidation.
- a part of the through conductor 6 extends to the upper surface and the lower surface of the substrate 2.
- a part extending on the upper surface of the substrate 2 functions as a pair of electrode layers 3.
- the electrode layer 3 is formed on the upper surface of the substrate 2.
- the substrate 2 has an end region R2 where the electrode layer 3 is formed.
- the electrode layer 3 is formed on the end region R2 of the substrate 2 with the mounting region R1 interposed therebetween.
- the electrode layer 3 is made of a conductive material such as tungsten, molybdenum, manganese, or copper.
- the thermal conductivity of the electrode layer 3 is set to, for example, 100 [W / m ⁇ K] or more and 400 [W / m ⁇ K] or less.
- the electrode layer 3 has an extending portion 3 a extending toward the light emitting element 3. Then, the electrode layer 3 is formed with a space from the mounting region R1. As described later, the light emitting element 4 mounted in the mounting region R1 is electrically connected to the extending portion 3a via a bonding wire.
- the light emitting element 4 generates heat when self-luminous, but heat is concentrated on a part of the substrate 2 by forming the extended portion 3a having excellent thermal conductivity to the vicinity of the mounting region R1. It is possible to suppress the occurrence of cracks in the substrate 2 by effectively diffusing heat and spreading the heat.
- an adhesive layer 7 exposing a part of the extending portion 3a is formed on the electrode layer 3.
- a part of the end portion of the electrode layer 3 is covered with an adhesive layer 7.
- the adhesive layer 7 is formed from the upper surface of the electrode layer 3 to the upper surface of the substrate 2 via the side surface of the electrode layer 3.
- the adhesive layer 7 has a function of suppressing peeling of the electrode layer 3. By covering the end portion of the electrode layer 3 with the adhesive layer 7, it is possible to prevent the end portion of the electrode layer 3 from peeling off from the substrate 2.
- the adhesive layer 7 has a function of improving the adhesiveness between the electrode layer 3 and the reflective layer 5.
- the adhesive layer 7 is made of a light-transmitting organic material such as glass, epoxy resin, acrylic resin, or silicone resin made of a light-transmitting inorganic material.
- the adhesive layer 7 may contain inorganic particles such as aluminum oxide, titanium oxide, yttrium oxide or zirconia oxide, or may have a plurality of bubbles formed. Since inorganic particles or bubbles are contained in the adhesive layer 7, the light from the light emitting element 4 or the light emitted from the phosphor of the wavelength conversion unit 8 is caused by the inorganic particles or bubbles contained in the adhesive layer 7. It can be used as light reflected and emitted from the light emitting device 1. In particular, the light from the light emitting element 4 is reflected by the inorganic particles or bubbles contained in the adhesive layer 7 and is not easily absorbed by the electrode layer 3, so that the light whose wavelength is converted by the wavelength conversion unit 8 increases. The light output of the light emitting device 1 is significantly improved.
- inorganic particles or bubbles are contained in the adhesive layer 7, the light from the light emitting element 4 or the light emitted from the phosphor of the wavelength conversion unit 8 is caused by the inorganic particles or bubbles contained in the adhesive layer 7. It can be
- the adhesive layer 7 has a notch 7a that exposes a part of the upper surface of the extending portion 3a.
- the light emitting element 4 is electrically connected to the extending portion 3a, which is a part of the electrode layer 3 exposed from the notch 7a, via a bonding wire (no symbol).
- the notch 7a is provided in the adhesive layer 7 around the extending portion 3a to which the bonding wire is connected, and the light emitted from the light emitting element 4 or the wavelength converting portion 8 by exposing a part of the extending portion 3a.
- the light diffusely reflected around the bonding wire connection portion irradiates the bonding wire from all directions around the bonding wire. If there is no notch 7a that exposes a part of the upper surface of the extending portion 3a, when the light from the light emitting element 4 is irradiated to the outside of the light emitting device 1, the effect of light absorption by the bonding wire is not affected. Is reflected on the irradiated surface, and a bright place or a dark place is formed on the irradiated face, which may cause uneven irradiation. However, by providing the notch 7a that exposes a part of the upper surface of the extending portion 3a, the occurrence of irradiation unevenness can be suppressed.
- unevenness in irradiation intensity on the irradiation surface specifically, light from the light emitting element 4 or light emitted from the phosphor of the wavelength conversion unit 8 is diffused in the extending portion 3a exposed by the notch 7a.
- the bonding wire is irradiated from all the surrounding directions by the diffusely reflected light, so that the shadow of the bonding wire can be thinned and the irradiated surface can be irradiated evenly.
- the reflectivity of gold decreases sharply with respect to light having a wavelength shorter than that of blue light.
- the effect of optical loss is great. Therefore, unevenness in irradiation intensity on the irradiation surface that occurs when the light emitting device 1 is driven, specifically, irradiation unevenness due to the shadow of the bonding wire appears clearly. Therefore, in the light emitting device 1 of the present invention, when the light emitted from the light emitting element 4 has a shorter wavelength than the light containing blue light and the bonding wire is made of gold, the unevenness of the irradiation intensity on the irradiated surface is reduced. And the irradiation surface can be irradiated evenly.
- a part of the adhesive layer 7 is interposed between the electrode layer 3 and the reflective layer 5. Since the adhesive layer 7 is interposed between the electrode layer 3 and the reflective layer 5, the adhesiveness between the two can be maintained well.
- the adhesive layer 7 is provided on the end region R2 of the substrate 2 when seen in a plan view, and is provided up to just below the opposing side surfaces of the pair of reflective layers 5.
- the reflection layer 5 is easily peeled off due to stress applied from the outside at the end portions of the opposing side surfaces of the pair of reflection layers 5, but by interposing the adhesive layer 7 between the reflection layers 5, Peeling can be suppressed.
- the adhesive layer 7 is provided on the end region R2 of the substrate 2 when seen in a plan view, and is provided to the lower side of the reflective layer 5 rather than the opposing side surfaces of the pair of reflective layers 5.
- the intermolecular bond of the material constituting the adhesive layer 7 may be cut by light having a short wavelength such as ultraviolet light, and the adhesiveness or mechanical strength of the adhesive layer 7 may be deteriorated. . Therefore, at the portion where the adhesive layer 7 is covered with the reflective layer 5, the light from the light emitting element 4 or the light from the phosphor 9 is reflected on the surface of the reflective layer 5, making it difficult for the light to travel to the adhesive layer 7. it can.
- the end portion of the adhesive layer 7 is covered with the reflective layer 5 so that the adhesive layer 7 becomes a substrate. 2 can be prevented from peeling off. As a result, the light emitting device 1 can operate normally over a long period of time.
- the light emitting element 4 is mounted on the mounting region R1 of the substrate 2 via, for example, resin.
- the light emitting element 4 has a mounting substrate and an optical semiconductor layer formed on the mounting substrate.
- the mounting substrate can grow an optical semiconductor layer using chemical vapor deposition such as metal organic chemical vapor deposition or molecular beam epitaxy.
- As a material used for the mounting substrate for example, sapphire, gallium nitride, aluminum nitride, zinc oxide, silicon carbide, silicon, or zirconium diboride can be used.
- the thickness of the mounting substrate is, for example, 100 ⁇ m or more and 1000 ⁇ m or less.
- the optical semiconductor layer includes a first semiconductor layer formed on the mounting substrate, a light emitting layer formed on the first semiconductor layer, and a second semiconductor layer formed on the light emitting layer.
- the first semiconductor layer, the light emitting layer, and the second semiconductor layer are, for example, a group III nitride semiconductor, a group III-V semiconductor such as gallium phosphide or gallium arsenide, or a group III nitride such as gallium nitride, aluminum nitride, or indium nitride.
- a physical semiconductor or the like can be used.
- the thickness of the first semiconductor layer is, for example, 1 ⁇ m to 5 ⁇ m
- the thickness of the light emitting layer is, for example, 25 nm to 150 nm
- the thickness of the second semiconductor layer is, for example, 50 nm to 600 nm.
- an element that emits excitation light in a wavelength range of, for example, 370 nm to 420 nm can be used.
- the reflective layer 5 is formed so as to sandwich the light emitting element 4 with a space between the light emitting element 4 and the reflective layer 5.
- the reflective layer 5 has a function of reflecting excitation light emitted from the light emitting element 4 or a function of reflecting light emitted from the phosphor contained in the wavelength conversion unit 8.
- the reflective layer 5 is made of, for example, metal oxide particles made of aluminum oxide, titanium oxide, yttrium oxide, zirconium oxide, or the like, translucent resin such as epoxy resin, acrylic resin, or silicone resin, or translucent glass. What was contained in can be used.
- the thermal conductivity of the reflective layer 5 is set to, for example, 1 [W / m ⁇ K] or more and 12 [W / m ⁇ K] or less.
- the thickness of the reflective layer 5 is set to, for example, not less than 0.1 mm and not more than 1 mm, and is set to be thicker than the thickness of the light emitting element 4.
- the thickness of the reflective layer 5 is set to be greater than or equal to 0.1 mm and less than or equal to 0.9 mm than the thickness of the light emitting element 4.
- the reflection layer 5 is set to be thicker than the thickness of the light emitting element 4 and is provided so as to face a pair of side surfaces of the light emitting element 4, thereby reflecting excitation light emitted from the light emitting element 4, which will be described later. It can be advanced toward the wavelength converter 8.
- the thickness of the reflective layer 5 is larger than the thickness of the light emitting element 4, the excitation light traveling obliquely upward from the light emitting element 4 can be diffusely reflected effectively. And it can suppress that the light emitted from the light emitting element 4 concentrates on a specific location.
- the side surfaces of the pair of opposing reflective layers 5 when viewed in a plan view are arranged along bonding wires that electrically connect the pair of electrode layers 3 and the light emitting element 4.
- the phosphor 9 located at a position overlapping the bonding wire as seen through the plane is not easily irradiated with light from the light emitting element 4. Therefore, when the side surfaces of the pair of opposing reflective layers 5 are arranged along the bonding wires as seen in a plan view, the light from the light emitting element 4 is diffusely reflected on the side surfaces of the reflective layers 5 to irradiate the bonding wires. can do.
- the bonding wire is positioned on a straight line connecting the light emitting element 4 and the bonding wire when the light of the light emitting element 4 is irradiated from all directions through the side surface of the reflective layer 5.
- the phosphor 9 is irradiated, and the phosphor 9 excited by the light from the light emitting element 4 increases and the light output of the light emitting device 1 is improved.
- the side surfaces of the pair of opposing reflective layers 5 when viewed in plan are not arranged along the bonding wires that electrically connect the pair of electrode layers 3 and the light emitting elements 4, the side surfaces of the reflective layers 5
- the diffused and reflected light of the light emitting element 4 is not irradiated symmetrically about the light emitting element 4 to the pair of bonding wires, and the phosphor 9 positioned on the straight line connecting the light emitting element 4 and the bonding wire is used as the light emitting element 4. Difficult to irradiate symmetrically around the center. As a result, the amount of the phosphor excited by the light from the light emitting element 4 is uneven, the illuminance distribution is not uniform on the irradiation surface of the light emitting device 1, and there is a possibility that color variation occurs.
- the reflective layer 5 is provided so as to overlap from one side of the pair of electrode layers 3 to the other when viewed through a plane. A part of the heat generated while the light emitting element 4 emits light is transmitted to the reflective layer 5 through the electrode layer 3. Since the reflective layer 5 is formed in a wide band shape between one end and the other end of the substrate 2 on which the electrode layer 3 is formed, heat generated by the light emitting element 4 can be easily transmitted to the entire surface of the substrate 2, Concentration on a part of the substrate 2 can be suppressed, and the occurrence of cracks in the substrate 2 can be effectively suppressed.
- the reflective layer 5 is provided so as to overlap from one to the other of the pair of electrode layers 3, whereby the temperature transmitted to each of the pair of electrode layers 3 is shared by the pair of electrode layers 3 via the reflective layer 5.
- the temperature difference between the pair of electrode layers 3 can be reduced.
- the temperature distribution difference on the upper surface of the substrate 2 can be suppressed, and it is possible to reduce each layer on the substrate 2 from being peeled due to thermal stress.
- the occurrence of cracks in the substrate 2 can be suppressed.
- the wavelength conversion unit 8 is provided on the substrate 2 so as to cover the reflective layer 5 and the light emitting element 4.
- the wavelength converter 8 has a function of emitting visible light having a longer wavelength than the excitation light due to the excitation light emitted from the light emitting element 4.
- the wavelength conversion unit 8 is made of, for example, a silicone resin, an acrylic resin, or an epoxy resin.
- a blue phosphor emitting fluorescence of 430 nm to 490 nm for example, a green phosphor emitting fluorescence of 500 nm to 560 nm, for example, a yellow phosphor emitting fluorescence of 540 nm to 600 nm
- a phosphor 9 such as a red phosphor that emits fluorescence of 590 nm to 700 nm is contained. The phosphor 9 is uniformly dispersed in the wavelength conversion unit 8.
- the wavelength conversion unit 8 is designed to have a dome shape on the substrate 2 by dropping a material constituting the wavelength conversion unit 8 on the upper surface of the substrate 2 by using, for example, a potting method.
- the thickness of the wavelength conversion unit 8 is set to, for example, 0.3 mm or more and 10 mm or less, and is set so that the thickness directly above the light emitting element 4 is the largest.
- a part of the wavelength conversion unit 8 is filled in a gap between the pair of reflection layers 5.
- the adhesive force between the wavelength conversion unit 8 and the substrate 2 can be improved.
- the excitation light emitted from the light emitting element 4 is reflected by the reflective layer 5 and irradiated toward the entire wavelength conversion unit 5, thereby improving the wavelength conversion efficiency of the wavelength conversion unit 5.
- the luminous efficiency of the light emitting device 1 can be improved.
- the entire wavelength conversion unit 5 can be irradiated with excitation light, and the amount of excitation of the phosphor in the wavelength conversion unit 5 is adjusted to be substantially uniform over the entire surface of the wavelength conversion unit 5 in plan view. can do. As a result, the uniformity of the light extracted from the wavelength conversion unit 5 can be improved.
- the light reflected in the direction of the substrate 2 by the phosphor 9 contained in the wavelength conversion unit 8 is diffusely reflected by the reflecting layer 5 and irradiates the phosphor 9 again.
- the number of phosphors 9 excited by the light from the light emitting element 4 increases and the light emitted from the phosphors 9 increases, so that the light output of the light emitting device 1 is improved.
- the contact bonding layer 7 was formed so that only a part of extension part 3a of the electrode layer 3 might be exposed, it is not restricted to this.
- the adhesive layer 7 x may be formed so as to cover most of the region where the electrode layer 3 is not formed on the upper surface of the substrate 2.
- an adhesive layer 7 x having a pair of through holes H is provided on the substrate 2 so as to expose a portion corresponding to the portion immediately above the extending portion 3 a of the electrode layer 3. Further, the mounting region R1 of the substrate 2 is covered with the adhesive layer 7x.
- the light emitting element 4 includes an adhesive containing inorganic particles having excellent thermal conductivity such as aluminum oxide, titanium oxide, yttrium oxide, or zirconia oxide on the adhesive layer 7x attached to the mounting region R1. Connected through. Further, from the through hole H, an extending portion 3 a that is a part of the electrode layer 3 is exposed. And the light emitting element 4 is electrically connected with the extension part 3a via the bonding wire.
- the adhesive layer 7x is provided on the substrate 2 and the electrode layer 3 except for a part of the extending portion 3a, the adhesiveness between the substrate 2 and the reflective layer 5 can be improved. Furthermore, since the adhesive layer 7 contains inorganic particles, the light emitted from the light-emitting element 4 is reflected upward by the adhesive layer 7 to significantly improve the light output of the light-emitting device 1. Can do.
- substrate 2 was made into the rectangular parallelepiped shape, it is not restricted to this.
- a structure in which a notch 2a is provided in a part of the upper surface of the substrate 2x may be used.
- the light emitting element 4 includes an adhesive or silver paste containing inorganic particles having excellent thermal conductivity such as aluminum oxide, titanium oxide, yttrium oxide or zirconia oxide in the notch 2a of the substrate 2x. Connected through.
- the height positions of the upper surface of the substrate 2x on which the electrode layer 3 is formed and the upper surface of the notch 2a of the substrate 2x on which the light emitting element 4 is mounted are different.
- the upper surface of the notch 2a of the substrate 2x on which the light emitting element 4 is mounted is set lower than the upper surface of the substrate 2x on which the electrode layer 3 is formed.
- the light emitting element 4 is connected to the upper surface of the notch 2a of the substrate 2x via an adhesive such as a conductive silver paste containing metal particles. If the notch 2a does not exist in the substrate 2x, the conductive adhesive material may leak and adhere to the extended portions 3a of the pair of electrode layers 3. When the extended portions 3a of the pair of electrode layers 3 are connected via a conductive adhesive, the extended portions 3a of the pair of electrode layers 3 are electrically short-circuited, and the light emitting device 1 operates normally. There is a possibility of not being able to. Therefore, the notch 2a can be provided at a place where the light emitting element 4 is mounted, and the existing portion 3a of the pair of electrode layers 3 can be effectively suppressed from being short-circuited.
- an adhesive such as a conductive silver paste containing metal particles.
- the substrate 2 is prepared.
- the substrate 2 is made of, for example, an aluminum oxide sintered body, an organic binder, a plasticizer, a solvent, or the like is added to and mixed with the aluminum oxide raw material powder to obtain a mixture.
- substrate 2 before sintering is taken out.
- a through hole is formed in the substrate 2 before sintering.
- a high melting point metal powder such as tungsten or molybdenum is prepared, and an organic binder, a plasticizer, a solvent, or the like is added to and mixed with the powder to obtain a metal paste.
- the pattern used as a pair of electrode layer 3 is printed with respect to the board
- the electrode layer 3 is patterned so that the extending portion 3 a is formed on the end region R ⁇ b> 2 of the substrate 2. And as shown in FIG. 5, the board
- a translucent material is used on the pair of electrode layers 3 by using, for example, a screen printing method and a sol-gel method so as to expose the extending portion 3a of the electrode layer 3.
- An adhesive layer 7 made of glass is formed.
- the adhesive layer 7 is formed so as to cover the electrode layer 3 excluding the extending portion 3a.
- the fired substrate 2 may be heated to about 1000 ° C. to remove the bubbles.
- the adhesive layer 7 may be formed by applying a glass-containing binder to a predetermined location using a printing method and firing at about 1000 ° C.
- a pair of reflective layers 5 made of an epoxy resin containing aluminum oxide particles is formed from one side of the pair of electrode layers 3 to the other as seen in a plan view using, for example, a screen printing method. To do. That is, the reflective layer 5 is formed from one of the pair of adhesive layers 7 to the other. At this time, the reflective layer 5 is not formed in the mounting region R1 of the substrate 2.
- the light emitting element 4 is mounted on the mounting region R1 located in the region sandwiched between the pair of reflective layers 5 of the substrate 2 through, for example, silver paste. And the light emitting element 4 and the extension part 3a of the electrode layer 3 are electrically connected through the bonding wire which consists of gold
- the wavelength conversion unit 8 uses a mixture of an uncured resin and a phosphor 9. And the material which comprises the wavelength conversion part 8 is dripped using the potting method from upper direction toward the downward direction with respect to the light emitting element 4 of the board
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Abstract
Description
本実施形態に係る発光装置1は、基板2と、基板2上に設けられた一対の電極層3と、電極層3と電気的に接続された発光素子4と、基板2上に設けられた一対の反射層5と、を含んでいる。なお、発光素子4は、例えば、発光ダイオードであって、半導体を用いたpn接合中の電子と正孔が再結合することによって、外部に向かって励起光を放出する。
なお、本発明は上述の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲において種々の変更、改良等が可能である。以下、本実施形態の変形例について説明する。なお、本実施形態の変形例に係る発光装置のうち、本実施形態に係る発光装置1と同様な部分については、同一の符号を付して適宜説明を省略する。
上記実施形態では、電極層3の延在部3aの一部のみを露出するように接着層7が形成されていたが、これに限られない。例えば、図9に示すように、基板2の上面の電極層3が形成されていない領域の多くを被覆するように接着層7xを形成してもよい。
上記実施形態では、基板2を直方体形状としたが、これに限られない。例えば、図10または図11に示すように、基板2xの上面の一部に切欠き2aを設ける構造であっても構わない。
ここで、図1または図2に示す発光装置の製造方法を説明する。なお、図5乃至図8は、発光装置の製造方法を説明するための平面図である。
Claims (6)
- 基板と、
前記基板上に設けられた一対の電極層と、
前記一対の電極層の間に当該一対の電極層と間を空けて実装され、前記一対の電極層と電気的に接続された発光素子と、
平面透視したときに前記一対の電極層の一方から他方にかけて重なるように設けられた一対の反射層と、を備え、
前記一対の反射層は、前記発光素子と間を空けて、前記発光素子を挟むように設けられていることを特徴とする発光装置。 - 請求項1に記載の発光装置であって、
前記一対の電極層は、前記発光素子に向かって延在している延在部を有しており、当該延在部にボンディングワイヤを介して前記発光素子が電気的に接続されていることを特徴とする発光装置。 - 請求項2に記載の発光装置であって、
前記一対の電極層上には、前記延在部の一部を露出する接着層が設けられており、前記接着層は、前記電極層の端部の一部を被覆していることを特徴とする発光装置。 - 請求項3に記載の発光装置であって、
前記接着層は、前記延在部の一部を露出する切欠きを有することを特徴とする発光装置。 - 請求項3または請求項4に記載の発光装置であって、
前記接着層は、前記電極層と前記反射層との間に介在していることを特徴とする発光装置。 - 請求項1乃至請求項5のいずれかに記載の発光装置であって、
前記基板上には、前記反射層および前記発光素子を被覆するように波長変換部が設けられていることを特徴とする発光装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011543295A JP5261578B2 (ja) | 2009-11-27 | 2010-11-25 | 発光装置 |
EP10833267.7A EP2506317A4 (en) | 2009-11-27 | 2010-11-25 | LIGHT-EMITTING DEVICE |
CN201080047802.8A CN102598321B (zh) | 2009-11-27 | 2010-11-25 | 发光装置 |
US13/503,604 US8581487B2 (en) | 2009-11-27 | 2010-11-25 | Light-emitting device with reflection layers |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2009270013 | 2009-11-27 | ||
JP2009-270013 | 2009-11-27 |
Publications (1)
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WO2011065421A1 true WO2011065421A1 (ja) | 2011-06-03 |
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PCT/JP2010/071017 WO2011065421A1 (ja) | 2009-11-27 | 2010-11-25 | 発光装置 |
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US (1) | US8581487B2 (ja) |
EP (1) | EP2506317A4 (ja) |
JP (1) | JP5261578B2 (ja) |
CN (1) | CN102598321B (ja) |
WO (1) | WO2011065421A1 (ja) |
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DE102012215524A1 (de) * | 2012-08-31 | 2014-03-06 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauteil |
JP6024957B2 (ja) * | 2012-09-24 | 2016-11-16 | 東芝ライテック株式会社 | 発光装置および照明装置 |
Citations (5)
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JPS59176166U (ja) * | 1983-05-11 | 1984-11-24 | 株式会社東芝 | 光半導体装置 |
JP2001036150A (ja) * | 1999-07-19 | 2001-02-09 | Citizen Electronics Co Ltd | 発光ダイオード |
JP2006012884A (ja) * | 2004-06-22 | 2006-01-12 | Bairong Electron Co Ltd | 発光デバイス |
JP2007201171A (ja) | 2006-01-26 | 2007-08-09 | Sony Corp | 光源装置、表示装置 |
JP2009260078A (ja) * | 2008-04-17 | 2009-11-05 | Toshiba Corp | 発光装置およびリードフレーム |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1107321A4 (en) * | 1999-06-23 | 2006-08-30 | Citizen Electronics | LIGHT-EMITTING DIODE |
JP2003023183A (ja) * | 2001-07-06 | 2003-01-24 | Stanley Electric Co Ltd | 面実装型ledランプ |
JP2003051620A (ja) * | 2001-08-08 | 2003-02-21 | Rohm Co Ltd | 半導体発光装置 |
KR20040092512A (ko) * | 2003-04-24 | 2004-11-04 | (주)그래픽테크노재팬 | 방열 기능을 갖는 반사판이 구비된 반도체 발광장치 |
-
2010
- 2010-11-25 EP EP10833267.7A patent/EP2506317A4/en not_active Withdrawn
- 2010-11-25 CN CN201080047802.8A patent/CN102598321B/zh not_active Expired - Fee Related
- 2010-11-25 JP JP2011543295A patent/JP5261578B2/ja not_active Expired - Fee Related
- 2010-11-25 US US13/503,604 patent/US8581487B2/en not_active Expired - Fee Related
- 2010-11-25 WO PCT/JP2010/071017 patent/WO2011065421A1/ja active Application Filing
Patent Citations (5)
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JPS59176166U (ja) * | 1983-05-11 | 1984-11-24 | 株式会社東芝 | 光半導体装置 |
JP2001036150A (ja) * | 1999-07-19 | 2001-02-09 | Citizen Electronics Co Ltd | 発光ダイオード |
JP2006012884A (ja) * | 2004-06-22 | 2006-01-12 | Bairong Electron Co Ltd | 発光デバイス |
JP2007201171A (ja) | 2006-01-26 | 2007-08-09 | Sony Corp | 光源装置、表示装置 |
JP2009260078A (ja) * | 2008-04-17 | 2009-11-05 | Toshiba Corp | 発光装置およびリードフレーム |
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Also Published As
Publication number | Publication date |
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EP2506317A1 (en) | 2012-10-03 |
CN102598321B (zh) | 2015-01-21 |
JPWO2011065421A1 (ja) | 2013-04-18 |
US8581487B2 (en) | 2013-11-12 |
EP2506317A4 (en) | 2014-08-20 |
CN102598321A (zh) | 2012-07-18 |
JP5261578B2 (ja) | 2013-08-14 |
US20120212124A1 (en) | 2012-08-23 |
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