WO2011061694A3 - Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof - Google Patents

Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof Download PDF

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Publication number
WO2011061694A3
WO2011061694A3 PCT/IB2010/055221 IB2010055221W WO2011061694A3 WO 2011061694 A3 WO2011061694 A3 WO 2011061694A3 IB 2010055221 W IB2010055221 W IB 2010055221W WO 2011061694 A3 WO2011061694 A3 WO 2011061694A3
Authority
WO
WIPO (PCT)
Prior art keywords
photovoltaic cells
layer
manufacturing
produced
cells produced
Prior art date
Application number
PCT/IB2010/055221
Other languages
French (fr)
Other versions
WO2011061694A2 (en
Inventor
Marat Zaks
Galina Kolomoets
Andrey Sitnikov
Oleg Solodukha
Lev Kreinin
Naftali P. Eisenberg
Ninel Bordin
Original Assignee
Solar Wind Technologies, Inc.
B-Solar Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/591,390 external-priority patent/US8586862B2/en
Priority claimed from US12/591,391 external-priority patent/US20110114147A1/en
Application filed by Solar Wind Technologies, Inc., B-Solar Ltd. filed Critical Solar Wind Technologies, Inc.
Priority to JP2012539462A priority Critical patent/JP2013511839A/en
Priority to CA2780913A priority patent/CA2780913A1/en
Priority to EP10793317A priority patent/EP2502277A2/en
Priority to CN2010800616051A priority patent/CN102754215A/en
Publication of WO2011061694A2 publication Critical patent/WO2011061694A2/en
Publication of WO2011061694A3 publication Critical patent/WO2011061694A3/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/02168Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • H01L31/02363Special surface textures of the semiconductor body itself, e.g. textured active layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/032Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H01L31/0321Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 characterised by the doping material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • H01L31/0684Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells double emitter cells, e.g. bifacial solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

Novel methods of producing photovoltaic cells are provided herein, as well as photovoltaic cells produced thereby, and uses thereof. In some embodiments, a method as described herein comprises doping a substrate so as to form a p+ layer on one side and an n+ layer on an another side, applying an antireflective coating on the p+ layer, removing at least a portion of the n+ layer, and then forming a second n+ layer, such that a concentration of the n-dopant in the second n+ layer is variable throughout a surface of the substrate.
PCT/IB2010/055221 2009-11-18 2010-11-17 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof WO2011061694A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012539462A JP2013511839A (en) 2009-11-18 2010-11-17 Photovoltaic cell manufacturing method, photovoltaic cell manufactured thereby, and use thereof
CA2780913A CA2780913A1 (en) 2009-11-18 2010-11-17 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
EP10793317A EP2502277A2 (en) 2009-11-18 2010-11-17 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
CN2010800616051A CN102754215A (en) 2009-11-18 2010-11-17 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12/591,390 2009-11-18
US12/591,391 2009-11-18
US12/591,390 US8586862B2 (en) 2009-11-18 2009-11-18 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
US12/591,391 US20110114147A1 (en) 2009-11-18 2009-11-18 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof

Publications (2)

Publication Number Publication Date
WO2011061694A2 WO2011061694A2 (en) 2011-05-26
WO2011061694A3 true WO2011061694A3 (en) 2012-01-19

Family

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PCT/IB2010/055221 WO2011061694A2 (en) 2009-11-18 2010-11-17 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
PCT/IB2010/055219 WO2011061693A2 (en) 2009-11-18 2010-11-17 Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof

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Country Status (5)

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EP (2) EP2502277A2 (en)
JP (2) JP2013511839A (en)
CN (2) CN102725854B (en)
CA (2) CA2781085A1 (en)
WO (2) WO2011061694A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8796060B2 (en) 2009-11-18 2014-08-05 Solar Wind Technologies, Inc. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
US8586862B2 (en) 2009-11-18 2013-11-19 Solar Wind Technologies, Inc. Method of manufacturing photovoltaic cells, photovoltaic cells produced thereby and uses thereof
KR101627028B1 (en) * 2014-02-20 2016-06-03 제일모직주식회사 The method for preparing the bifacial solar cell
KR101627029B1 (en) * 2014-02-20 2016-06-03 제일모직주식회사 The method for preparing the ibc solar cell
CN104051575B (en) * 2014-06-20 2016-08-17 润峰电力有限公司 A kind of processing technology of bionical double-side photic solaode
US11075316B2 (en) 2015-10-25 2021-07-27 Solaround Ltd. Method of bifacial cell fabrication
CN107340785B (en) * 2016-12-15 2021-05-18 江苏林洋新能源科技有限公司 Double-sided photovoltaic cell module tracking method based on intelligent control and controller
CH713453A1 (en) 2017-02-13 2018-08-15 Evatec Ag Process for producing a substrate with a boron-doped surface.
US11171254B2 (en) * 2018-01-08 2021-11-09 Solaround Ltd. Bifacial photovoltaic cell and method of fabrication
CN114649427B (en) * 2021-09-14 2023-09-12 浙江晶科能源有限公司 Solar cell and photovoltaic module

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6147297A (en) * 1995-06-21 2000-11-14 Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Solar cell having an emitter provided with a surface texture and a process for the fabrication thereof
WO2009010585A2 (en) * 2007-07-18 2009-01-22 Interuniversitair Microelektronica Centrum Vzw Method for producing an emitter structure and emitter structures resulting therefrom

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4322571A (en) * 1980-07-17 1982-03-30 The Boeing Company Solar cells and methods for manufacture thereof
US4989059A (en) 1988-05-13 1991-01-29 Mobil Solar Energy Corporation Solar cell with trench through pn junction
JPH11512886A (en) * 1995-10-05 1999-11-02 エバラ・ソーラー・インコーポレーテッド Self-aligned partially deep diffused emitter solar cells.
US5871591A (en) 1996-11-01 1999-02-16 Sandia Corporation Silicon solar cells made by a self-aligned, selective-emitter, plasma-etchback process
US6552414B1 (en) 1996-12-24 2003-04-22 Imec Vzw Semiconductor device with selectively diffused regions
US6180869B1 (en) 1997-05-06 2001-01-30 Ebara Solar, Inc. Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices
RU2139601C1 (en) 1998-12-04 1999-10-10 ООО Научно-производственная фирма "Кварк" METHOD FOR MANUFACTURING n+-p-p+ STRUCTURE SOLAR CELL
TW419833B (en) 1999-07-23 2001-01-21 Ind Tech Res Inst Manufacturing method of solar cell
TW480737B (en) * 2000-10-06 2002-03-21 Shinetsu Handotai Kk Solar cell and method of manufacture thereof
JP4232597B2 (en) * 2003-10-10 2009-03-04 株式会社日立製作所 Silicon solar cell and manufacturing method thereof
DE102004036220B4 (en) 2004-07-26 2009-04-02 Jürgen H. Werner Method for laser doping of solids with a line-focused laser beam
US20070113881A1 (en) * 2005-11-22 2007-05-24 Guardian Industries Corp. Method of making solar cell with antireflective coating using combustion chemical vapor deposition (CCVD) and corresponding product
EP2077587A4 (en) * 2006-09-27 2016-10-26 Kyocera Corp Solar cell device and method for manufacturing the same
CN101179100A (en) * 2007-01-17 2008-05-14 江苏林洋新能源有限公司 Manufacturing method of large area low bending flexure ultra-thin type double face lighting solar cell
DE102007036921A1 (en) 2007-02-28 2008-09-04 Centrotherm Photovoltaics Technology Gmbh Method for producing solar cells, involves applying boron glass on part of surface of silicon wafer, and applying boron glass as etching barrier during etching of silicon wafer in texture etching solution
EP2259337A4 (en) * 2008-03-27 2011-08-24 Mitsubishi Electric Corp Photovolatic power device and method for manufacturing the same
CN102017187B (en) * 2008-04-30 2012-10-10 三菱电机株式会社 Photovoltaic device and its manufacturing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6147297A (en) * 1995-06-21 2000-11-14 Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Solar cell having an emitter provided with a surface texture and a process for the fabrication thereof
WO2009010585A2 (en) * 2007-07-18 2009-01-22 Interuniversitair Microelektronica Centrum Vzw Method for producing an emitter structure and emitter structures resulting therefrom

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
MIKHITARYAN ET AL: "Thick film contact paste for silicon solar cells with B-doped emitter", PROCEEDINGS OF THE 23RD EUROPEAN PHOTOVOLTAIC SOLAR ENERGY CONFERENCE, 1 September 2008 (2008-09-01) - 5 September 2008 (2008-09-05), Valencia, Spain, pages 1364 - 1366, XP007919734 *
NOBORU SHIBATA: "PHOTOCHEMICAL VAPOR-DEPOSITED SILICON OXYNITRIDE FILMS FOR SOLAR CELLS", ELECTRONICS & COMMUNICATIONS IN JAPAN, PART II - ELECTRONICS, WILEY, HOBOKEN, NJ, US, vol. 75, no. 7, 1 July 1992 (1992-07-01), pages 84 - 91, XP000331966, ISSN: 8756-663X *

Also Published As

Publication number Publication date
EP2502278A2 (en) 2012-09-26
JP2013511838A (en) 2013-04-04
WO2011061693A2 (en) 2011-05-26
CA2780913A1 (en) 2011-05-26
CN102754215A (en) 2012-10-24
WO2011061693A3 (en) 2012-01-05
CN102725854B (en) 2015-11-25
CA2781085A1 (en) 2011-05-26
EP2502277A2 (en) 2012-09-26
JP6027443B2 (en) 2016-11-16
JP2013511839A (en) 2013-04-04
CN102725854A (en) 2012-10-10
WO2011061694A2 (en) 2011-05-26

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