WO2010093633A3 - Method and apparatus for the solution deposition of oxide material - Google Patents

Method and apparatus for the solution deposition of oxide material Download PDF

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Publication number
WO2010093633A3
WO2010093633A3 PCT/US2010/023636 US2010023636W WO2010093633A3 WO 2010093633 A3 WO2010093633 A3 WO 2010093633A3 US 2010023636 W US2010023636 W US 2010023636W WO 2010093633 A3 WO2010093633 A3 WO 2010093633A3
Authority
WO
WIPO (PCT)
Prior art keywords
deposition
oxide material
substrate
semiconductor devices
metal
Prior art date
Application number
PCT/US2010/023636
Other languages
French (fr)
Other versions
WO2010093633A2 (en
Inventor
Shengzhong Liu
Chaolan Hu
Yanhua Zhou
Arindam Banerjee
Jeffrey Yang
Subhendu Guha
Original Assignee
United Solar Ovonic Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Solar Ovonic Llc filed Critical United Solar Ovonic Llc
Publication of WO2010093633A2 publication Critical patent/WO2010093633A2/en
Publication of WO2010093633A3 publication Critical patent/WO2010093633A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20—Electroplating using ultrasonics, vibrations
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes

Abstract

A metal and oxygen material such as a transparent electrically conductive oxide material is electro deposited onto a substrate in a solution deposition process. Process parameters are controlled so as to result in the deposition of a high quality layer of material which is suitable for use in a back reflector structure of a high efficiency photovoltaic device. The deposition may be carried out in conjunction with a masking member which operates to restrict the deposition of the metal and oxygen material to specific portions of the substrate. In particular instances the deposition may be implemented in a continuous, roll-to-roll process. Further disclosed are semiconductor devices and components of semiconductor devices made by the present process, as well as apparatus for carrying out the process.
PCT/US2010/023636 2009-02-11 2010-02-09 Method and apparatus for the solution deposition of oxide material WO2010093633A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/369,022 2009-02-11
US12/369,022 US20100200411A1 (en) 2009-02-11 2009-02-11 Method and apparatus for the solution deposition of oxide

Publications (2)

Publication Number Publication Date
WO2010093633A2 WO2010093633A2 (en) 2010-08-19
WO2010093633A3 true WO2010093633A3 (en) 2010-11-04

Family

ID=42539497

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2010/023636 WO2010093633A2 (en) 2009-02-11 2010-02-09 Method and apparatus for the solution deposition of oxide material

Country Status (2)

Country Link
US (1) US20100200411A1 (en)
WO (1) WO2010093633A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100200060A1 (en) * 2009-02-11 2010-08-12 United Solar Ovonic Llc Solution based non-vacuum method and apparatus for preparing oxide materials
US8404302B2 (en) * 2010-07-14 2013-03-26 Sharp Laboratories Of America, Inc. Solution process for fabricating a textured transparent conductive oxide (TCO)
CN111005055B (en) * 2020-01-04 2021-04-09 焦作大学 Multi-source synchronous frequency oscillation type electrodeposition processing device and processing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10229212A (en) * 1996-12-13 1998-08-25 Canon Inc Manufacturing method of photovoltaic element
US6379521B1 (en) * 1998-01-06 2002-04-30 Canon Kabushiki Kaisha Method of producing zinc oxide film, method of producing photovoltaic element, and method of producing semiconductor element substrate
US6544877B1 (en) * 1998-11-24 2003-04-08 Canon Kabushiki Kaisha Method of producing thin film of zinc oxide, process for manufacturing photovoltaic element using its method, and photovoltaic element

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Publication number Priority date Publication date Assignee Title
US2380044A (en) * 1940-06-28 1945-07-10 Du Pont Process for producing electrodeposits
US3635730A (en) * 1969-12-03 1972-01-18 Western Electric Co Methods for selectively coating ferromagnetic articles
US3922208A (en) * 1973-11-05 1975-11-25 Ford Motor Co Method of improving the surface finish of as-plated elnisil coatings
US4272641A (en) * 1979-04-19 1981-06-09 Rca Corporation Tandem junction amorphous silicon solar cells
DE69702277T2 (en) * 1996-03-06 2001-03-01 Canon Kk A method of manufacturing a thin zinc oxide film and a method of manufacturing a substrate of a semiconductor device, and a method of manufacturing a photoelectric conversion device using this film
US6547936B1 (en) * 1996-11-22 2003-04-15 Chema Technology, Inc. Electroplating apparatus having a non-dissolvable anode
JP3327811B2 (en) * 1997-05-13 2002-09-24 キヤノン株式会社 Method for producing zinc oxide thin film, photovoltaic element and semiconductor element substrate using the same
US6113770A (en) * 1997-09-18 2000-09-05 Pioneer Metal Finishing Corporation Method for anodizing using single polarity pulses
US6238808B1 (en) * 1998-01-23 2001-05-29 Canon Kabushiki Kaisha Substrate with zinc oxide layer, method for producing zinc oxide layer, photovoltaic device, and method for producing photovoltaic device
US6224736B1 (en) * 1998-01-27 2001-05-01 Canon Kabushiki Kaisha Apparatus and method for forming thin film of zinc oxide
JP3423631B2 (en) * 1998-02-05 2003-07-07 キヤノン株式会社 Method for forming zinc oxide thin film, method for manufacturing semiconductor element substrate using the same, and method for manufacturing photovoltaic element
US6406611B1 (en) * 1999-12-08 2002-06-18 University Of Alabama In Huntsville Nickel cobalt phosphorous low stress electroplating
US6884335B2 (en) * 2003-05-20 2005-04-26 Novellus Systems, Inc. Electroplating using DC current interruption and variable rotation rate
EP2000013B1 (en) * 2006-03-30 2010-10-13 ATOTECH Deutschland GmbH Electrolytic method for filling holes and cavities with metals

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10229212A (en) * 1996-12-13 1998-08-25 Canon Inc Manufacturing method of photovoltaic element
US6379521B1 (en) * 1998-01-06 2002-04-30 Canon Kabushiki Kaisha Method of producing zinc oxide film, method of producing photovoltaic element, and method of producing semiconductor element substrate
US6544877B1 (en) * 1998-11-24 2003-04-08 Canon Kabushiki Kaisha Method of producing thin film of zinc oxide, process for manufacturing photovoltaic element using its method, and photovoltaic element

Also Published As

Publication number Publication date
WO2010093633A2 (en) 2010-08-19
US20100200411A1 (en) 2010-08-12

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