WO2010070454A3 - Helium recovery from semiconductor cluster tools - Google Patents

Helium recovery from semiconductor cluster tools Download PDF

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Publication number
WO2010070454A3
WO2010070454A3 PCT/IB2009/007974 IB2009007974W WO2010070454A3 WO 2010070454 A3 WO2010070454 A3 WO 2010070454A3 IB 2009007974 W IB2009007974 W IB 2009007974W WO 2010070454 A3 WO2010070454 A3 WO 2010070454A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas
recovery
rare gas
helium
cluster tools
Prior art date
Application number
PCT/IB2009/007974
Other languages
French (fr)
Other versions
WO2010070454A2 (en
Inventor
Niels Lose
William Robert Gerristead
Keonhwan Cho
Original Assignee
Linde Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/334,890 external-priority patent/US20090185969A1/en
Application filed by Linde Aktiengesellschaft filed Critical Linde Aktiengesellschaft
Publication of WO2010070454A2 publication Critical patent/WO2010070454A2/en
Publication of WO2010070454A3 publication Critical patent/WO2010070454A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C01B23/001—Purification or separation processes of noble gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/30—Controlling by gas-analysis apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/18—Noble gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0029—Obtaining noble gases
    • C01B2210/0031—Helium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Separation By Low-Temperature Treatments (AREA)

Abstract

Systems for the recovery of rare gas from a mixed gas stream are described. In particular, systems for the recovery of helium from cluster tools used in semiconductor fabrication are described. In one embodiment, these systems allow for the recovery of rare gas, such as helium, from the waste gas from a processing chamber, or a cluster tool, when a predetermined amount of rare gas is known to be present in the waste gas. In a further embodiment, analyzing means are used to determine the amount of rare gas, such as helium, present in the waste gas and when that amount warrants, the rare gas is recovered from the waste gas using a dedicated rare gas recovery process.
PCT/IB2009/007974 2008-12-15 2009-12-14 Helium recovery from semiconductor cluster tools WO2010070454A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/334,890 US20090185969A1 (en) 2008-01-22 2008-12-15 Helium recovery from semiconductor cluster tools
US12/334,890 2008-12-15

Publications (2)

Publication Number Publication Date
WO2010070454A2 WO2010070454A2 (en) 2010-06-24
WO2010070454A3 true WO2010070454A3 (en) 2011-04-21

Family

ID=42269507

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2009/007974 WO2010070454A2 (en) 2008-12-15 2009-12-14 Helium recovery from semiconductor cluster tools

Country Status (1)

Country Link
WO (1) WO2010070454A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4265322A1 (en) 2022-04-22 2023-10-25 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Helium recovery process

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001102281A (en) * 1999-09-28 2001-04-13 Canon Inc Load lock room, chamber, semiconductor manufacturing device, and device manufacturing apparatus
WO2003092778A1 (en) * 2002-05-02 2003-11-13 Sysadvance - Sistemas De Engenharia Lda Xenon external recycling unit for recovery, purification and reuse of xenon in anaesthesia circuits
EP1455233A2 (en) * 2003-03-07 2004-09-08 Canon Kabushiki Kaisha Processing method and system
US20050235828A1 (en) * 2004-04-27 2005-10-27 Taiyo Nippon Sanso Corporation Process for recovering rare gases using gas-recovering container

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001102281A (en) * 1999-09-28 2001-04-13 Canon Inc Load lock room, chamber, semiconductor manufacturing device, and device manufacturing apparatus
WO2003092778A1 (en) * 2002-05-02 2003-11-13 Sysadvance - Sistemas De Engenharia Lda Xenon external recycling unit for recovery, purification and reuse of xenon in anaesthesia circuits
EP1455233A2 (en) * 2003-03-07 2004-09-08 Canon Kabushiki Kaisha Processing method and system
US20050235828A1 (en) * 2004-04-27 2005-10-27 Taiyo Nippon Sanso Corporation Process for recovering rare gases using gas-recovering container

Also Published As

Publication number Publication date
WO2010070454A2 (en) 2010-06-24

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