WO2010064635A1 - 光導波路および光導波路形成用部材 - Google Patents
光導波路および光導波路形成用部材 Download PDFInfo
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- WO2010064635A1 WO2010064635A1 PCT/JP2009/070187 JP2009070187W WO2010064635A1 WO 2010064635 A1 WO2010064635 A1 WO 2010064635A1 JP 2009070187 W JP2009070187 W JP 2009070187W WO 2010064635 A1 WO2010064635 A1 WO 2010064635A1
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- optical waveguide
- mirror
- core
- clad
- forming
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
Definitions
- the present invention relates to an optical waveguide and an optical waveguide forming member.
- an optical waveguide is used as a means for guiding an optical carrier wave from one point to another point.
- the optical waveguide has, for example, a long core part and a clad part provided so as to surround the core part.
- the core part is made of a material that is substantially transparent to the light of the optical carrier wave
- the cladding part is made of a material having a refractive index lower than that of the core part.
- Such an optical waveguide is generally disposed on the surface of a wiring board.
- a light emitting element and a light receiving element are mounted on the wiring board, and an optical signal emitted from the light emitting element propagates through the optical waveguide and is received by the light receiving element.
- the optical waveguide described in Patent Document 1 includes a hole that is laser-processed so as to cross a core and a part of the clad, and the cut surface of the core and the clad exposed on the wall surface of the hole becomes a micromirror. It has become.
- An object of the present invention is to provide an optical waveguide having a mirror with high optical performance and capable of high-quality optical communication, and a mirror forming portion that can be used to form such an optical waveguide and can easily form a mirror with high optical performance.
- the object is to provide a member for forming an optical waveguide.
- the processing rate when processing the processing surface of the mirror can be made relatively uniform, so that the surface accuracy of the mirror can be further increased.
- the present invention provides: A long core, and A clad portion provided adjacent to the core portion; An optical waveguide having a mirror made of a processed surface that obliquely crosses an extension line of the optical axis of the core part, The mirror is an optical waveguide provided on an extension line of the core portion, and only a material other than a material constituting the core portion is exposed on the processed surface.
- the optical waveguide having the mirror with high surface accuracy and high optical performance is provided because the mirror having the processing surface from which the material capable of processing with uniform and high accuracy is exposed is provided. Can do.
- the material constituting the clad part when the material constituting the clad part is exposed on the mirror processing surface, the material constituting the clad part generally has a high degree of freedom in material selection, and moreover it is heat resistant compared to the material constituting the core part. Often it is a high material (or chemical structure). For this reason, the heat resistance of a mirror can be improved because the material which comprises a clad part is exposed to the processed surface of a mirror. As a result, an optical waveguide having sufficient heat resistance against heat treatment such as solder reflow can be provided.
- the material constituting at least a part of the cladding portion is exposed on the processed surface.
- the present invention provides: A core layer including an elongated core portion and a side clad portion provided so as to be adjacent to a side surface of the core portion; Two cladding layers laminated to sandwich the core layer; An optical waveguide having a mirror made of a processed surface that obliquely crosses an extension line of the optical axis of the core part, The mirror is provided on an extension line of the core portion, and only a material constituting the side clad portion is exposed on a processed surface corresponding to the core layer among the processed surfaces. It is an optical waveguide.
- the optical waveguide of the present invention it is preferable that only the material constituting the side clad portion and the material constituting the two clad layers are exposed on the processed surface.
- the material constituting the side clad portion is the same as the material constituting the two clad layers.
- the separation distance between the mirror and the core portion adjacent to the mirror is 5 to 250 ⁇ m on the extension line of the optical axis of the core portion.
- the processed surface is formed by laser processing.
- the core portion of the optical waveguide is composed of a norbornene polymer as a main material.
- the present invention provides: A long core, and A clad portion provided adjacent to the core portion; An optical waveguide forming member used for forming an optical waveguide, and a mirror forming portion provided for processing for forming a mirror,
- the mirror forming portion is an optical waveguide forming member that is provided on an extension line of the core portion and is a portion made of only a material other than the material constituting the core portion.
- an optical waveguide having a mirror having high surface accuracy and high optical performance can be easily formed.
- a possible member for forming an optical waveguide can be provided.
- the mirror forming portion is a portion composed only of a material constituting at least a part of the clad portion.
- the present invention provides: A core layer including an elongated core portion and a side clad portion provided so as to be adjacent to a side surface of the core portion; Two cladding layers laminated to sandwich the core layer; An optical waveguide forming member used for forming an optical waveguide, and a mirror forming portion provided for processing for forming a mirror,
- the mirror forming portion is a portion provided on an extension line of the core portion, and a portion corresponding to the core layer of the mirror forming portion is configured only by a material constituting the side clad portion. This is a member for forming an optical waveguide.
- the mirror forming portion is a portion formed only of a material constituting the side clad portion and a material constituting the two clad layers.
- the processing for forming the mirror is a processing for removing a part of the mirror forming portion.
- FIG. 1 is a perspective view showing an embodiment of an optical waveguide of the present invention (partially shown).
- FIG. 2 is a plan view when the optical waveguide of FIG. 1 is viewed from above.
- FIG. 3 is a cross-sectional view taken along line AA of the optical waveguide shown in FIG.
- FIG. 4 is a cross-sectional view schematically showing an example of steps in the method of manufacturing the optical waveguide shown in FIG.
- FIG. 5 is a cross-sectional view schematically showing an example of steps of the method of manufacturing the optical waveguide shown in FIG.
- FIG. 6 is a cross-sectional view schematically showing a process example of the method of manufacturing the optical waveguide shown in FIG. FIG.
- FIG. 7 is a cross-sectional view schematically showing a process example of the method of manufacturing the optical waveguide shown in FIG.
- FIG. 8 is a cross-sectional view schematically showing a process example of the method of manufacturing the optical waveguide shown in FIG.
- FIG. 9 is a perspective view (partially see through) of the optical waveguide forming member shown in FIG. 8 viewed from another angle.
- FIG. 10 is a cross-sectional view schematically showing an example of a process of the method for manufacturing the optical waveguide shown in FIG.
- FIG. 11 is a perspective view showing a conventional optical waveguide (partially shown).
- FIG. 12 is a plan view of the optical waveguide of FIG. 11 as viewed from above.
- 13 is a cross-sectional view of the optical waveguide shown in FIG. 12 taken along the line XX.
- FIG. 14 is a scatter diagram when the horizontal axis is the mirror angle and the vertical axis is the calculated insertion loss for the samples obtained in the examples and the comparativ
- FIG. 1 is a perspective view showing an embodiment of an optical waveguide according to the present invention (partially shown), FIG. 2 is a plan view when the optical waveguide of FIG. 1 is viewed from above, and FIG. FIG. 2 is a cross-sectional view taken along line AA of the optical waveguide shown in FIG.
- the upper side in FIGS. 1 and 3 is referred to as “upper” and the lower side is referred to as “lower”.
- An optical waveguide 10 shown in FIG. 1 is formed by laminating a clad layer 11, a core layer 13, and a clad layer 12 in this order from the lower side in FIG.
- the mirror forming portion 155 includes a laminate of a part of the cladding layer 11, a part of the side cladding part 15, and a part of the cladding layer 12.
- the core layer 13 is formed with a long core portion 14 and a side cladding portion 15 adjacent to the core portion 14 so as to surround the side surface and one end portion of the core portion 14. That is, the core part 14 is surrounded by a clad part 16 including a clad layer 11 located below, a clad layer 12 located above, and a side clad part 15 located laterally.
- a clad part 16 including a clad layer 11 located below, a clad layer 12 located above, and a side clad part 15 located laterally.
- dots are given only to the core layer 13, and among these, relatively dense dots are given to the core portion 14, and relative to the side cladding portion 15. Sparse dots. 1 and 2 show the cladding layer 12 in a transparent state.
- the refractive index of the core part 14 is higher than the refractive index of the cladding part 16, and the difference is not particularly limited, but is preferably 0.5% or more, and more preferably 0.8% or more.
- the upper limit value of the refractive index difference need not be set, but is preferably about 5.5%. If the refractive index difference is less than the lower limit value, the effect of propagating light may be reduced, and even if the upper limit value is exceeded, further increase in the light propagation effect cannot be expected.
- refractive index difference (%)
- the core portion 14 is formed in a straight line shape in a plan view, but may be curved or branched in the middle, and the shape thereof is arbitrary.
- the cross-sectional shape of the core part 14 is a square such as a square or a rectangle (rectangle).
- the width and height of the core part 14 are not particularly limited, but are preferably about 1 to 200 ⁇ m, more preferably about 5 to 100 ⁇ m, and still more preferably about 10 to 60 ⁇ m.
- Each constituent material of the core part 14 and the clad part 16 is not particularly limited as long as the above-described refractive index difference is generated.
- acrylic resin, methacrylic resin, polycarbonate, polystyrene In addition to various resin materials such as epoxy resin, polyamide, polyimide, polybenzoxazole, polysilane, polysilazane, and cyclic olefin resins such as benzocyclobutene resin and norbornene resin, such as quartz glass and borosilicate glass A glass material or the like can be used.
- the core part 14 and the side cladding part 15 are comprised with the same base material (basic component), and the refractive index difference of the core part 14 and the side cladding part 15 is each different. It is expressed by the difference in the chemical structure of the constituent materials.
- each constituent material of the core part 14 and the side cladding part 15 is irradiated with active energy rays such as ultraviolet rays and electron beams (or by further heating). It is preferable to use a material whose refractive index changes.
- a chemical structure is formed by cutting at least part of bonds or detaching at least part of functional groups by irradiation with active energy rays or heating. Materials that can change are mentioned.
- silane-based resins such as polysilane (eg, polymethylphenylsilane), polysilazane (eg, perhydropolysilazane), and the resin serving as a base for materials with structural changes as described above include molecules on the molecular side.
- the following resins (1) to (6) having a functional group at the chain or terminal are mentioned.
- norbornene resins are particularly preferred.
- These norbornene-based polymers include, for example, ring-opening metathesis polymerization (ROMP), combination of ROMP and hydrogenation reaction, polymerization by radical or cation, polymerization using a cationic palladium polymerization initiator, and other polymerization initiators ( For example, it can be obtained by any known polymerization method such as polymerization using a polymerization initiator of nickel or another transition metal).
- the clad layers 11 and 12 constitute the clad portions located at the lower part and the upper part of the core part 14, respectively.
- the core portion 14 functions as a light guide path whose outer periphery is surrounded by the clad portion 16.
- the average thickness of the cladding layers 11 and 12 is preferably about 0.1 to 1.5 times the average thickness of the core layer 13 (the average height of the core portion 14), and preferably 0.2 to 1.25. More preferably, the average thickness of the cladding layers 11 and 12 is not particularly limited, but each is preferably about 1 to 200 ⁇ m and preferably about 5 to 100 ⁇ m. More preferably, the thickness is about 10 to 60 ⁇ m. Thereby, the function as a clad layer is suitably exhibited while preventing the optical waveguide 10 from being unnecessarily enlarged (thickened).
- constituent material of the cladding layers 11 and 12 for example, the same material as the constituent material of the core layer 13 described above can be used, but a norbornene polymer is particularly preferable.
- a different material is appropriately selected and used between the constituent material of the core layer 13 and the constituent materials of the cladding layers 11 and 12 in consideration of the difference in refractive index between the two. Is possible. Therefore, in order to ensure total reflection of light at the boundary between the core layer 13 and the cladding layers 11 and 12, a material may be selected so that a sufficient difference in refractive index is generated. Thereby, a sufficient refractive index difference is obtained in the thickness direction of the optical waveguide 10, and light can be prevented from leaking from the core portion 14 to the cladding layers 11 and 12. As a result, attenuation of light propagating through the core portion 14 can be suppressed.
- the adhesion between the core layer 13 and the cladding layers 11 and 12 is high. Therefore, the constituent material of the cladding layers 11 and 12 is any material as long as the refractive index is lower than that of the constituent material of the core layer 13 and the adhesiveness with the constituent material of the core layer 13 is high. May be.
- norbornene-based polymer having a relatively low refractive index those containing norbornene repeating units having a substituent containing an epoxy structure at the terminal are preferable.
- Such a norbornene-based polymer has a particularly low refractive index and good adhesion.
- the norbornene-based polymer preferably contains an alkylnorbornene repeating unit. Since a norbornene-based polymer containing an alkylnorbornene repeating unit has high flexibility, high flexibility (flexibility) can be imparted to the optical waveguide 10 by using such norbornene-based polymer.
- alkyl group contained in the alkylnorbornene repeating unit examples include a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, and a decyl group, and a hexyl group is particularly preferable.
- These alkyl groups may be either linear or branched.
- a norbornene-based polymer having a repeating unit of hexyl norbornene is preferable because it has excellent transmittance with respect to light in the wavelength region as described above (particularly in the wavelength region near 850 nm).
- Such an optical waveguide 10 varies slightly depending on the optical characteristics of the material of the core portion 14 and is not particularly limited.
- the optical waveguide 10 is preferably used in data communication using light in the wavelength region of about 600 to 1550 nm. Is done.
- the mirror forming portion 155 is set in the vicinity of one end portion of the laminate of the clad layer 11, the core layer 13, and the clad layer 12. In other words, as shown in FIG. 2, one end of the optical waveguide 10 is occupied by the mirror forming portion 155, and the core portion 14 is blocked by the mirror forming portion 155.
- a mirror 17 is provided in the mirror forming portion 155.
- the mirror 17 is formed with a V-shaped concave portion 170 so as to partially penetrate the mirror forming portion 155 in the thickness direction, and includes a part of a side surface (processed surface) of the concave portion 170.
- This side surface has a planar shape and is inclined 45 ° with respect to the axis M of the core portion 14. That is, the mirror 17 is formed so as to cross the extended line of the axis M of the core portion 14 at an angle of 45 °.
- the width and length of the mirror forming portion 155 when viewed from the light emitting element S are set to include the width and length of the concave portion 170. Thereby, the mirror forming part 155 is exposed to the mirror 17 as a whole, and the object of the present invention is reliably achieved.
- only one of the two side surfaces of the concave portion 170 (the one adjacent to the core portion 14) functions as the mirror 17, so the other may be omitted.
- the light emitted from the light emitting element S provided below the optical waveguide 10 is reflected by the mirror 17 and enters the core portion 14. Can do. That is, the optical path of the irradiated light is converted by 90 ° by the mirror 17.
- the light incident on the core part 14 is repeatedly totally reflected at the interface between the core part 14 and the clad part 16 and propagates to the emission side. Then, light can be received at the emission end (not shown), and optical communication can be performed based on the blinking pattern of the light. Note that the optical path described above can also propagate light in the opposite direction.
- the mirror forming portion 155 is exposed in the mirror 17 shown in FIG. 1, but more specifically, the exposed surface 171 of the material constituting the cladding layer 11 and the side cladding portion 15 are configured from the light emitting element S side.
- the exposed surface 173 of the material to be formed and the exposed surface 172 of the material constituting the cladding layer 12 are arranged in this order (see FIGS. 2 and 3).
- These exposed surfaces 171, 173, and 172 are all exposed only materials other than the material (core material) constituting the core portion 14, that is, only the material constituting the clad portion 16 (cladding material) is exposed. Since this material is adjacent to the external atmosphere (air), a difference in refractive index occurs at the contact interface.
- the mirror 17 can reflect light based on this refractive index difference.
- the light spread from the light emitting element S such as a semiconductor laser or a light emitting diode is generally a conical pattern that spreads uniformly around the optical axis. It is. For this reason, the largest amount of light is irradiated to the exposed surface 173 located at the center of the mirror 17 in the thickness direction. Therefore, it is considered that the optical performance of the mirror 17 is greatly influenced by the surface accuracy of the exposed surface 173.
- FIG. 11 is a perspective view showing a conventional optical waveguide (partially shown)
- FIG. 12 is a plan view when the optical waveguide of FIG. 11 is viewed from above
- FIG. 13 is the optical waveguide shown in FIG. FIG.
- the upper side in FIGS. 11 and 13 is referred to as “upper” and the lower side is referred to as “lower”.
- a conventional optical waveguide 90 shown in FIG. 11 is the same as the optical waveguide 10 shown in FIG. 1 except that the structure of the core layer 93 is different.
- the entire cross section of the core portion 94 and a part of the cross section of the side clad portion 95 (cladding portion 96) are exposed.
- a mirror 97 is formed.
- the mirror 97 is formed by digging a V-shaped recess 970 into the core layer 93 so as to cross all of the core portion 94 and a portion of the cladding portion 96 in the width direction. Formed as one of the side surfaces.
- dots are attached only to the core layer 93. Among these, relatively dense dots are attached to the core portion 94, and the side clad portion 95 and the mirror forming portion.
- Reference numeral 155 denotes a relatively sparse dot.
- the cladding layer 12 is shown in a transparent manner.
- the conventional optical waveguide 90 has a problem that the surface accuracy of the mirror 97 is low.
- the present inventor is that the processing rate when processing the core portion 94 is different from the processing rate when processing the cladding portion 96 when the recess 970 is dug. I found out. If the processing rates are different, for example, even if an attempt is made to form a planar mirror 97 that crosses the core portion 94 and a part of the cladding portion 96, the difference in the processing rates affects the processing result, The mirror 97 having the shape cannot be formed.
- One cause of the difference in processing rate is a difference in chemical structure between the constituent material of the core portion 94 and the constituent material of the clad portion 96.
- the mirror 17 is formed in a mirror forming portion 155 made of only a clad material. For this reason, the mirror 17 is composed of the exposed surfaces 171, 173, and 172 of three kinds of materials as described above.
- the material constituting the side clad portion 15 is exposed on the exposed surface 173 (conventionally, the material constituting the core portion 94 and the clad portion 96 are configured as shown in FIG. 11). Therefore, there is no difference in processing rate in the exposed surface 173. Therefore, at least in the exposed surface 173, the mirror 17 having a desired shape can be easily and uniformly formed, and surface accuracy (surface roughness, in-plane uniformity, etc.) and optical properties can be achieved without additional processing. A high-performance mirror 17 can be obtained. As a result, a high-quality optical waveguide 10 with little loss due to the mirror 17 and high transmission efficiency is obtained.
- the exposed surface 173 of the mirror 17 located at the center in the thickness direction is irradiated with the largest amount of light and governs the optical performance of the mirror 17, so that at least the exposed surface. If the surface accuracy (surface roughness, in-plane uniformity, etc.) of 173 is high, the optical performance of the entire mirror 17 can be greatly improved.
- the material constituting the clad layer 11 and the material constituting the clad layer 12 are also exposed. If each constituent material and each chemical structure of the clad layer 11 and the clad layer 12 are the same (same) as those of the side clad portion 15, not only the exposed surface 173 but also the entire surface of the mirror 17 has a difference in processing rate during processing. Since it does not occur, the surface accuracy and optical performance of the mirror 17 can be further improved. Even though the constituent materials and chemical structures of the clad layer 11 and the clad layer 12 are not exactly the same as those of the side clad part 15, they are both clad parts and have relatively similar physical properties. Therefore, in comparison with the conventional case where the core material and the cladding material are exposed on the mirror, the difference in processing rate can be remarkably reduced, and the surface accuracy and optical performance of the mirror 17 can be reduced. Improvements can be made.
- the mirror forming portion 155 is made of the constituent material of the side cladding portion 15 and the constituent materials of the cladding portions 11 and 12, but these cladding materials generally have a high degree of freedom in material selection and the core. There are many materials having higher heat resistance (or chemical structure having higher heat resistance) than materials. For this reason, the mirror 17 from which the cladding material is exposed has higher heat resistance than the conventional one. As a result, for example, when a heat treatment such as solder reflow is performed on the substrate on which the optical waveguide 10 is mounted, it is possible to prevent the mirror 17 from causing defects such as deformation due to the influence of heat.
- the clad material and the core material are the same material and only the chemical structure is different, the clad material has higher heat resistance than the core material. Therefore, the mirror 17 having high heat resistance can be easily obtained.
- the thermal expansion characteristics in each part in the plane of the mirror 17 are also uniform (or close values). Therefore, even when light is incident on the optical waveguide 10 for a long time and heat is accumulated in the mirror 17, the thermal expansion characteristics of each part are uniform (or close to each other). Deformation is prevented. For this reason, according to this invention, the optical waveguide 10 which can also suppress a temporal change of optical performance is obtained.
- the irradiated light when light is irradiated upward from the light emitting element S provided below the optical waveguide 10 as indicated by an arrow in FIG. 3, the irradiated light is applied to the cladding layer 11 and the side cladding 15. After sequentially transmitting, the light is reflected by the mirror 17. After reflection, the reflected light passes through the interface 145 between the side cladding portion 15 (mirror forming portion 155) and the core portion 14 and enters the core portion 14.
- the separation distance between the mirror 17 and the interface 145 on the axis M of the core portion 14 is preferably about 5 to 250 ⁇ m, and more preferably about 10 to 200 ⁇ m.
- a reflective film may be formed on the mirror 17 as necessary.
- the reflective film include metal films such as Au, Ag, and Al, and films made of materials having a refractive index lower than that of the mirror forming portion 155.
- Examples of the method for producing the metal film include physical vapor deposition methods such as vacuum vapor deposition, chemical vapor deposition methods such as CVD, and plating methods.
- the recess 170 penetrates at least the core layer 13. May not necessarily penetrate.
- the present invention can be particularly effective.
- the optical waveguide 10 is manufactured by producing a clad layer 11, a core layer 13, and a clad layer 12, and laminating them.
- a specific manufacturing method of the core layer 13 is not particularly limited as long as the core part 14 and the side cladding part 15 can be formed in the same layer (core layer 13). , Photobleaching method, photolithography method, direct exposure method, nanoimprinting method, monomer diffusion method and the like.
- FIG. 4 to 10 are cross-sectional views schematically showing process examples of the method for manufacturing the optical waveguide 10 shown in FIG. 4 to 8 are cross-sectional views in the width direction perpendicular to the axis of the core portion of the optical waveguide, and FIG. 10 is a longitudinal section along a direction parallel to the axis of the core portion of the optical waveguide. It is a figure which shows a surface.
- the layer 110 is formed on the support substrate 161 (see FIG. 4).
- the layer 110 is formed by a method in which a core layer forming material (varnish) 100 is applied and cured (solidified).
- the layer 110 is formed by applying the core layer forming material 100 on the support substrate 161 to form a liquid film, and then placing the support substrate 161 on a ventilated level table so that the surface of the liquid film is not coated. It is formed by leveling the uniform part and evaporating (desolving) the solvent.
- the layer 110 is formed by a coating method
- examples thereof include a doctor blade method, a spin coating method, a dipping method, a table coating method, a spray method, an applicator method, a curtain coating method, a die coating method, and the like. It is not done.
- a silicon substrate for example, a silicon substrate, a silicon dioxide substrate, a glass substrate, a quartz substrate, a polyethylene terephthalate (PET) film, or the like is used.
- PET polyethylene terephthalate
- the core layer-forming material 100 contains a developable material composed of a polymer 115 and an additive 120 (including at least a monomer and a catalyst). It is a material that causes a reaction.
- the additive 120 is substantially uniformly and arbitrarily dispersed in the layer 110.
- the average thickness of the layer 110 is appropriately set according to the thickness of the core layer 13 to be formed, and is not particularly limited, but is preferably about 1 to 200 ⁇ m, and is preferably about 5 to 100 ⁇ m. More preferably, it is about 10 to 60 ⁇ m.
- the polymer 115 has sufficiently high transparency (colorless and transparent) and is compatible with the monomer described later, and the monomer can react (polymerization reaction or crosslinking reaction) as described later. Even after the monomers are polymerized, those having sufficient transparency are preferably used.
- “having compatibility” means that the monomer is at least mixed and does not cause phase separation with the polymer 115 in the core layer forming material 100 or the layer 110.
- the constituent material of the core layer 13 mentioned above is mentioned.
- the polymer 115 when a norbornene-based polymer is used as the polymer 115, since the polymer has high hydrophobicity, it is possible to obtain the core layer 13 that is less likely to cause a dimensional change due to water absorption.
- the norbornene-based polymer may be either a polymer having a single repeating unit (homopolymer) or a polymer having two or more norbornene-based repeating units (copolymer).
- a compound having a repeating unit represented by the following formula (1) is preferably used as an example of the copolymer.
- n represents an integer of 1 to 9.
- copolymer examples include those in which the two units of the above formula (1) are arranged in an arbitrary order (random), those in which they are arranged alternately, those in which each unit is solidified (in a block form), etc. Any of these forms may be used.
- an example of the additive 120 is preferably selected to include a norbornene-based monomer, a promoter (first substance), and a catalyst precursor (second substance). Is done.
- the norbornene-based monomer reacts in the active radiation irradiated region by irradiation with actinic radiation, which will be described later, and forms a reaction product. Due to the presence of this reactant, the layer 110 is irradiated in the irradiated region and in the non-active radiation irradiated region. , A compound capable of producing a refractive index difference.
- Examples of the reactant include a polymer (polymer) formed by polymerizing norbornene monomers in the polymer (matrix) 115, a crosslinked structure that cross-links the polymers 115, and a polymer 115 that is polymerized and branched from the polymer 115. At least one of the branched structures (branch polymer or side chain (pendant group)).
- a polymer 115 having a relatively low refractive index and a norbornene-based monomer having a high refractive index with respect to the polymer 115 are obtained.
- a polymer 115 having a relatively high refractive index and a norbornene-based monomer having a low refractive index with respect to the polymer 115 are combined. used.
- the portion becomes the side cladding portion 15, and when the refractive index of the irradiated region increases, the portion is It becomes the core part 14.
- the catalyst precursor (second substance) is a substance capable of initiating the above-described monomer reaction (polymerization reaction, crosslinking reaction, etc.), and is a promoter (first substance) activated by irradiation with actinic radiation described later. It is a substance whose activation temperature changes by the action of.
- any compound may be used as long as the activation temperature changes (increases or decreases) with irradiation of actinic radiation. Those whose activation temperature decreases with irradiation are preferred.
- the core layer 13 optical waveguide 10 can be formed by heat treatment at a relatively low temperature, and unnecessary heat is applied to the other layers, so that the characteristics (optical transmission performance) of the optical waveguide 10 are deteriorated. Can be prevented.
- a catalyst precursor containing (mainly) at least one of the compounds represented by the following formulas (Ia) and (Ib) is preferably used.
- E (R) 3 represents a neutral electron donor ligand of group 15, respectively, E represents an element selected from group 15 of the periodic table, and R represents , Represents a moiety containing a hydrogen atom (or one of its isotopes) or a hydrocarbon group, and Q represents an anionic ligand selected from carboxylate, thiocarboxylate and dithiocarboxylate.
- LB represents a Lewis base
- WCA represents a weakly coordinating anion
- a represents an integer of 1 to 3
- b represents an integer of 0 to 2
- a and b
- p and r represent numbers that balance the charge of the palladium cation and the weakly coordinated anion.
- Typical catalyst precursors according to Formula Ia include Pd (OAc) 2 (P (i-Pr) 3 ) 2 , Pd (OAc) 2 (P (Cy) 3 ) 2 , Pd (O 2 CCMe 3 ) 2 (P (Cy) 3 ) 2 , Pd (OAc) 2 (P (Cp) 3 ) 2 , Pd (O 2 CCF 3 ) 2 (P (Cy) 3 ) 2 , Pd (O 2 CC 6 H 5 ) 3 (P (Cy) 3 ) 2 may be mentioned, but is not limited thereto.
- Cp represents a cyclopentyl group
- Cy represents a cyclohexyl group.
- the catalyst precursor represented by the formula Ib is preferably a compound in which p and r are selected from integers of 1 and 2, respectively.
- Typical catalyst precursors according to such formula Ib include Pd (OAc) 2 (P (Cy) 3 ) 2 .
- Cy represents a cyclohexyl group
- Ac represents an acetyl group.
- catalyst precursors can efficiently react with a monomer (in the case of a norbornene-based monomer, an efficient polymerization reaction, a crosslinking reaction, etc. by an addition polymerization reaction).
- the cocatalyst (first substance) is a substance that can be activated by irradiation with actinic radiation to change the activation temperature of the catalyst precursor (procatalyst) (the temperature at which the monomer reacts).
- any compound can be used as long as it has a molecular structure that changes (reacts or decomposes) when activated by irradiation with actinic radiation.
- a compound (photoinitiator) that decomposes upon irradiation with actinic radiation and generates a cation such as a proton or other cation and a weakly coordinated anion (WCA) that can be substituted with a leaving group of the catalyst precursor ( (Mainly) is preferably used.
- weakly coordinating anions examples include tetrakis (pentafluorophenyl) borate ion (FABA ⁇ ), hexafluoroantimonate ion (SbF 6 ⁇ ), and the like.
- promoter photoacid generator or photobase generator
- examples of the promoter include tetrakis (pentafluorophenyl) borate and hexafluoroantimonate, tetrakis (pentafluorophenyl) gallate, and aluminates.
- a sensitizer may be added to the core layer forming material (varnish) 100 as necessary.
- the layer 110 is formed using the core layer forming material 100 as described above.
- the layer 110 has the first refractive index.
- This first refractive index is due to the action of the polymer 115 and monomers that are uniformly dispersed (distributed) in the layer 110.
- the monomer is a norbornene-based monomer
- a compound having a polymerizable site may be used, and acrylic acid (methacrylic acid) may be used.
- acrylic acid methacrylic acid
- examples of such monomers include epoxy monomers, epoxy monomers, and styrene monomers, and one or more of these can be used in combination.
- the catalyst in the additive 120 may be appropriately selected according to the type of monomer. For example, in the case of an acrylic acid monomer or an epoxy monomer, the addition of the catalyst precursor (second substance) is omitted. can do.
- a mask (masking) 135 in which an opening (window) 1351 is formed is prepared, and the layer 110 is irradiated with active radiation (active energy light) 130 through the mask 135 (FIG. 5). reference).
- the irradiation region 125 of the active radiation 130 becomes the side cladding portion 15 in the core layer 13.
- an opening (window) 1351 equivalent to the pattern of the side cladding portion 15 to be formed is formed in the mask 135.
- This opening 1351 forms a transmission part through which the active radiation 130 to be irradiated passes.
- the mask 135 may be formed in advance (separately formed) (for example, plate-shaped) or may be formed on the layer 110 by, for example, a vapor deposition method or a coating method.
- the actinic radiation 130 to be used is not limited as long as it can cause a photochemical reaction (change) with respect to the promoter.
- a photochemical reaction change
- visible light ultraviolet light, infrared light, laser light, an electron beam or X Lines or the like can also be used.
- the cocatalyst first substance: cocatalyst
- the cocatalyst present in the irradiation region 125 irradiated with the active radiation 130 reacts by the action of the active radiation 130. (Binding) or decomposition to release (generate) cations (protons or other cations) and weakly coordinating anions (WCA).
- the use of the mask 135 may be omitted when highly directional light such as laser light is used as the active radiation 130.
- the layer 110 is subjected to heat treatment (first heat treatment).
- first heat treatment the catalyst precursor of an active latent state is activated (it will be in an active state), and monomer reaction (a polymerization reaction or a crosslinking reaction) will arise.
- the monomer concentration in the irradiation region 125 gradually decreases. As a result, there is a difference in monomer concentration between the irradiated region 125 and the unirradiated region 140, and in order to eliminate this, the monomer diffuses from the unirradiated region 140 (monomer diffusion) and collects in the irradiated region 125. come.
- the monomer and its reaction product increase, and the structure derived from the monomer greatly affects the refractive index of the region, and the first refraction The second refractive index lower than the refractive index.
- the monomer polymer an addition (co) polymer is mainly produced.
- the amount of monomer decreases as the monomer diffuses from the region to the irradiated region 125, so that the influence of the polymer 115 appears greatly on the refractive index of the region, and the first refraction is performed.
- the third refractive index is higher than the refractive index.
- a refractive index difference (second refractive index ⁇ third refractive index) occurs between the irradiated region 125 and the non-irradiated region 140, and the core portion 14 (non-irradiated region 140) and the side cladding portion. 15 (irradiation region 125) is formed (see FIG. 6).
- the layer 110 is subjected to a second heat treatment.
- the catalyst precursor remaining in the unirradiated region 140 and / or the irradiated region 125 is activated (in an activated state) directly or with the activation of the cocatalyst.
- the remaining monomer is reacted.
- the core portion 14 and the side clad portion 15 obtained can be stabilized.
- the layer 110 is subjected to a third heat treatment. Thereby, reduction of the internal stress which arises in the core layer 13 obtained, and the further stabilization of the core part 14 and the side clad part 15 can be aimed at.
- the core layer 13 including the core portion 14 and the side clad portion 15 is obtained.
- Step [5] and step [4] may be omitted.
- the clad layer 11 (12) is formed on the support substrate 162 (see FIG. 7).
- a method for forming the clad layer 11 (12) As a method for forming the clad layer 11 (12), a method of applying and curing (solidifying) a varnish (clad layer forming material) including a clad material, and a method of applying and hardening (solidifying) a monomer composition having curability. Any method may be used.
- examples thereof include a spin coating method, a dipping method, a table coating method, a spray method, an applicator method, a curtain coating method, and a die coating method.
- the support substrate 162 As the support substrate 162, a substrate similar to the support substrate 161 can be used. As described above, the clad layer 11 (12) is formed on the support substrate 162.
- the core layer 13 is peeled from the support substrate 161, and the core layer 13 is sandwiched between the support substrate 162 on which the cladding layer 11 is formed and the support substrate 162 on which the cladding layer 12 is formed ( (See FIG. 8).
- the clad layers 11 and 12 and the core layer 13 are joined and integrated to obtain the optical waveguide forming member 10 '(the optical waveguide forming member of the present invention).
- FIG. 9 is a perspective view (partially shown) of the optical waveguide forming member shown in FIG.
- the upper side in FIG. 9 is referred to as “upper” and the lower side is referred to as “lower”.
- An optical waveguide forming member 10 ′ shown in FIG. 9 is formed by laminating a cladding layer 11, a core layer 13, and a cladding layer 12 in this order from the lower side.
- a side clad portion 15 adjacent to the side surface and one end portion of the core portion 14 is formed. That is, a part of the side clad portion 15 is arranged so as to block only one end portion of the core portion 14, and the other end surface of the core portion 14 is thereby exposed, but one end surface is It is in a state covered with the side clad portion 15.
- the laminated body of a part of the side clad part 15, a part of the clad layer 11 located below the part, and a part of the clad layer 12 located above the side clad part 15 constitutes the mirror forming part 155 described above. is doing.
- the mirror 17 is formed by processing the mirror forming portion 155, and the optical waveguide 10 described above can be obtained.
- the optical waveguide forming member 10 ′ has a mirror forming portion 155 provided for processing for forming the mirror 17 on the extension line of the core portion 14, and is used for forming the optical waveguide 10. It is a member to be.
- the above-described crimping operation is preferably performed under heating.
- the heating temperature is appropriately determined depending on the constituent materials of the clad layers 11 and 12 and the core layer 13, and is usually preferably about 80 to 200 ° C, more preferably about 120 to 180 ° C.
- the support substrate 162 is peeled off and removed from the cladding layers 11 and 12, respectively.
- the formation position of the concave portion 170 is set to be inside the mirror forming portion 155 in the core layer 13. Further, the broken line in FIG. 10 indicates a surface inclined by 45 ° with respect to the extension line of the axis M of the core portion 14.
- Examples of the method for forming the recess 170 include a laser processing method, a cutting method, and a grinding method. Of these, the laser processing method is preferably used.
- laser processing since processing is performed using laser light with high directivity, accurate processing with high dimensional accuracy is possible. Further, there is a risk that burrs or the like may occur on the cut surface in other processing methods.
- laser processing it is possible to perform processing while melting the workpiece depending on the type and wavelength of the laser. Thereby, it is possible to prevent the generation of burrs and to smooth the surface of the mirror 17 by covering the cut surface with the melt. As a result, it is possible to form a high-quality mirror 17 with a constant reflection angle and suppressed irregular reflection.
- Examples of laser light used for laser processing include a CO 2 laser using CO 2 gas as a laser medium, a YAG laser using a YAG crystal (yttrium, aluminum, garnet) as a laser medium, a fluorine laser (F 2 laser), and an ArF excimer.
- a CO 2 laser using CO 2 gas as a laser medium
- a YAG laser using a YAG crystal yttrium, aluminum, garnet
- F 2 laser fluorine laser
- ArF excimer ArF excimer
- the surface roughness (centerline average roughness Ra) is 0.20 ⁇ m although it differs slightly depending on the constituent material of the mirror forming portion 155, the laser processing conditions, and the like.
- the following highly smooth mirror 17 is obtained.
- the manufacturing method of the optical waveguide 10 by the monomer diffusion method has been described. However, as described above, other methods can be used for the manufacturing method of the optical waveguide 10.
- a release agent that is activated by irradiation with actinic radiation
- a main chain and a release agent that is branched from the main chain and activated, thereby causing at least one molecular structure.
- a core layer forming material containing a polymer having a leaving group (detachable pendant group) that can be detached from the main chain of the part is used. After this core layer forming material is formed into a layer, a part of this layer is irradiated with actinic radiation such as ultraviolet rays, whereby the leaving group is detached (cut), and the refractive index of the region changes. (Rise or fall).
- the active radiation irradiation region becomes the side cladding portion 15, and the other region becomes the core portion 14.
- the clad layers 11 and 12 are bonded to both surfaces of the core layer 13 as described above.
- the photolithography method for example, a layer of a material for forming a core part having a high refractive index is formed on the cladding layer 11, and a resist film having a shape corresponding to the core part 14 is further formed on the layer by a photolithography technique. Form. Then, using this resist film as a mask, the core portion forming material layer is etched. Thereby, the core part 14 is obtained. Thereafter, a relatively low refractive index clad part forming material is deposited so as to cover the core part 14, so that the region other than the core part 14 is filled with the clad part forming material, and the side clad part 15. Is obtained. Furthermore, the clad layer 12 is obtained by supplying the clad part forming material so as to cover these (the core part 14 and the side clad part 15). As described above, the optical waveguide 10 (the optical waveguide of the present invention) is obtained.
- the core part 14 and the side clad part 15 can be simultaneously formed in the same manufacturing process.
- the core part 14 and the side clad part 15 formed in this way are made of the same kind of material although having different chemical structures. For this reason, both have the same coefficient of thermal expansion, and it is possible to reduce defects such as deformation of the optical waveguide 10 and delamination due to temperature changes, as compared with the case where they are made of different materials.
- the method of forming the recess 170 in the laminate (optical waveguide forming member 10 ′) of the clad layer 11, the core layer 13, and the clad layer 12 has been described.
- the waveguide 10 may be obtained.
- the entire piece on the side including the mirror forming portion 155 is made of the same material, whereby the mirror 17 composed of an exposed surface from which the same material is exposed is obtained.
- the mirror 17 is particularly excellent in surface accuracy such as surface roughness and in-plane uniformity.
- such an individual piece can be manufactured by, for example, an extrusion molding method or the like.
- the piece on the side not including the mirror forming portion 155 is made of, for example, the material constituting the core portion 14 and the clad It can manufacture by extruding simultaneously with the material which comprises the part 16.
- optical waveguide and the optical waveguide forming member of the present invention have been described based on the illustrated embodiments. However, the present invention is not limited to these, and the configuration of each part can exhibit the same function. An arbitrary configuration can be substituted, and an arbitrary configuration may be added.
- the mirror angle of the mirror 17 (the angle formed between the axis M of the core portion 14 and the surface of the mirror 17) is 45 ° in the embodiment, but is not particularly limited, and other angles (for example, 30). About 60 °).
- the shape of the mirror 17 may be a curved surface that is curved so that the reflected light is condensed on the core portion 14.
- the light emitting element S is installed so that all irradiation light may be orthogonal to the axis line M of the core part 14, this installation direction is not specifically limited, For example, advancing of irradiation light The direction may not be orthogonal to the axis M as long as it faces the mirror 17. Further, the mirror 17 may be in the middle of the optical waveguide 10.
- the optical waveguide 10 comprised by the laminated body of the clad layer 11, the core layer 13, and the clad layer 12 was demonstrated, the optical waveguide of this invention is not such a laminated structure, but long. It may be a structure constituted by a shaped core portion and a clad portion provided so as to cover the side surface of the core portion.
- the clad part may be composed of a single clad material or may be composed of a combination of two or more kinds of clad materials.
- the clad portion is composed of two or more kinds of clad materials, two or more kinds of clad materials may be exposed on the mirror 17, but it is preferable that only one kind is exposed.
- such an optical waveguide of the present invention can be used for an optical wiring for optical communication, for example.
- this optical wiring can be combined with the existing electrical wiring on the substrate to constitute a so-called “photoelectric mixed substrate”.
- an opto-electric hybrid board for example, an optical signal transmitted through an optical wiring (core portion of an optical waveguide) is converted into an electric signal in an optical device and transmitted to the electric wiring.
- an arithmetic device such as a CPU or LSI
- a storage device such as a RAM
- opto-electric hybrid board is mounted on electronic devices that transmit high-capacity data at high speed, such as mobile phones, game machines, personal computers, televisions, home servers, etc.
- optical waveguide forming member shown in FIGS. 9 and 10 was prepared. This optical waveguide forming member is formed by laminating a core layer and a clad layer made of a norbornene-based polymer. Next, the mirror forming portion of the optical waveguide forming member was irradiated with a laser beam at a predetermined angle with respect to the extension line of the core portion, as shown in FIG. Thereby, a mirror was formed, and the optical waveguide shown in FIGS. 1 to 3 was obtained. In the obtained mirror of the optical waveguide, a material (cladding material) constituting the side clad part and a material (cladding material) constituting the clad layer are exposed. In the example, a total of 32 optical waveguide samples were produced by the same method, but the angles of the mirrors were different for each sample. The angle of the mirror is adjusted between each sample so as to be distributed almost uniformly between 40 ° and 50 °.
- Comparative Example 1 An optical waveguide was manufactured in the same manner as in the example except that the structure of the optical waveguide was changed to the structure shown in FIGS. In the obtained mirror of the optical waveguide, a material (core material) constituting the core portion, a material constituting the side clad portion, and a material constituting the clad layer are exposed. In Comparative Example 1, a total of 12 optical waveguide samples were produced by the same method, but each sample had a different mirror angle. The angle of the mirror is adjusted between each sample so as to be distributed almost uniformly between 40 ° and 50 °.
- Comparative Example 2 An optical waveguide was produced in the same manner as in Comparative Example 1 except that a polymer different from that in Comparative Example 1 was used. In the obtained mirror of the optical waveguide, the material constituting the core part, the material constituting the side cladding part, and the material constituting the cladding layer are exposed. In Comparative Example 2, a total of 30 optical waveguide samples were produced by the same method, but each sample had a different mirror angle. The angle of the mirror is adjusted between each sample so as to be distributed almost uniformly between 40 ° and 50 °.
- the minimum value of the insertion loss of the samples obtained in the examples was less than 1 dB, which was particularly good. Therefore, it can be said that the optical waveguide obtained in the example has high transmission efficiency. Furthermore, in the sample obtained in the example, it was revealed that the angle range of the mirror below 1.5 dB was sufficiently wide. This indicates that, in the embodiment, the tolerance of the manufacturing error of the mirror angle is relatively wide when forming a mirror capable of obtaining good transmission efficiency. Therefore, in the embodiment, it is not necessary to strictly control the angle of the mirror, and it has been clarified that a high-quality optical waveguide can be easily manufactured.
- An optical waveguide according to the present invention includes a long core portion, a clad portion provided so as to be adjacent to the core portion, and a mirror having a machining surface that obliquely crosses an extension line of the optical axis of the core portion.
- the mirror is provided on an extension line of the core portion, and only the material other than the material constituting the core portion is exposed on the processed surface. For this reason, the mirror is composed of a processing surface from which a material that can be processed uniformly and with high accuracy is exposed. Therefore, the surface accuracy and optical performance are high, and a high-quality optical waveguide with high transmission efficiency is obtained. Can be provided.
- the material constituting the clad part when the material constituting the clad part is exposed on the mirror processing surface, the material constituting the clad part generally has a high degree of freedom in material selection, and moreover it is heat resistant compared to the material constituting the core part. Often it is a high material (or chemical structure). For this reason, the heat resistance of a mirror can be improved because the material which comprises a clad part is exposed to the processed surface of a mirror. As a result, an optical waveguide having sufficient heat resistance against heat treatment such as solder reflow can be provided. Moreover, the optical waveguide forming member of the present invention can easily form the above optical waveguide. Therefore, the optical waveguide and the optical waveguide forming member of the present invention have industrial applicability.
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Abstract
Description
長尺状のコア部と、
該コア部に隣接するように設けられたクラッド部と、
前記コア部の光軸の延長線を斜めに横切る加工面からなるミラーとを有する光導波路であって、
前記ミラーは、前記コア部の延長線上に設けられ、前記加工面には、前記コア部を構成する材料以外の材料のみが露出していることを特徴とする光導波路である。
長尺状のコア部と、該コア部の側面に隣接するように設けられた側面クラッド部とを含むコア層と、
該コア層を挟むように積層された2つのクラッド層と、
前記コア部の光軸の延長線を斜めに横切る加工面からなるミラーとを有する光導波路であって、
前記ミラーは、前記コア部の延長線上に設けられ、前記加工面のうち、前記コア層に対応する加工面には、前記側面クラッド部を構成する材料のみが露出していることを特徴とする光導波路である。
長尺状のコア部と、
該コア部に隣接するように設けられたクラッド部と、
ミラーを形成するための加工に供されるミラー形成部とを有し、光導波路を形成するのに用いられる光導波路形成用部材であって、
前記ミラー形成部は、前記コア部の延長線上に設けられ、前記コア部を構成する材料以外の材料のみで構成された部位であることを特徴とする光導波路形成用部材である。
長尺状のコア部と、該コア部の側面に隣接するように設けられた側面クラッド部とを含むコア層と、
該コア層を挟むように積層された2つのクラッド層と、
ミラーを形成するための加工に供されるミラー形成部とを有し、光導波路を形成するのに用いられる光導波路形成用部材であって、
前記ミラー形成部は、前記コア部の延長線上に設けられた部位であり、かつ、前記ミラー形成部の前記コア層に対応する部分が、前記側面クラッド部を構成する材料のみで構成されていることを特徴とする光導波路形成用部材である。
コア層13には、長尺状のコア部14と、このコア部14の側面および一方の端部を囲むように、コア部14に隣接する側面クラッド部15とが形成されている。すなわち、コア部14は、その下方に位置するクラッド層11、上方に位置するクラッド層12、および側方に位置する側面クラッド部15からなるクラッド部16で囲まれている。なお、図1~3には、コア層13にのみドットが付されており、このうち、コア部14には、相対的に密なドットが付されており、側面クラッド部15には、相対的に疎なドットが付されている。また、図1、2では、クラッド層12を透過して示している。
屈折率差(%)=|A/B-1|×100
ミラー17は、ミラー形成部155を厚さ方向に一部貫通するようにV字状の凹部170を形成し、この凹部170の側面(加工面)の一部からなるものである。この側面は平面状をなし、コア部14の軸線Mに対して45°傾斜している。すなわち、ミラー17は、コア部14の軸線Mの延長線を斜め45°に横切るように形成されている。
図11は、従来の光導波路を示す(一部透過して示す)斜視図、図12は、図11の光導波路を上方から見たときの平面図、図13は、図12に示す光導波路のX-X線断面図である。なお、本明細書では、図11、13中の上側を「上」、下側を「下」という。
なお、クラッド層11およびクラッド層12の各構成材料および各化学構造が、側面クラッド部15と全く同じでなくても、両者はいずれもクラッド部であるので比較的物性が似通っている。よって、従来のようにミラーにコア材料とクラッド材料とが露出している場合に比べれば、いずれにしろ、加工レートの差を格段に小さくすることができ、ミラー17の面精度および光学性能の向上を図ることができる。
光導波路10は、クラッド層11と、コア層13と、クラッド層12とをそれぞれ作製し、これらを積層することにより製造される。
層110は、コア層形成用材料(ワニス)100を塗布し硬化(固化)させる方法により形成される。
このようなポリマー115としては、前述したコア層13の構成材料が挙げられる。
[(E(R)3)aPd(Q)(LB)b]p[WCA]r ・・・(Ib)
[式Ia、Ib中、それぞれ、E(R)3は、第15族の中性電子ドナー配位子を表し、Eは、周期律表の第15族から選択される元素を表し、Rは、水素原子(またはその同位体の1つ)または炭化水素基を含む部位を表し、Qは、カルボキシレート、チオカルボキシレートおよびジチオカルボキシレートから選択されるアニオン配位子を表す。また、式Ib中、LBは、ルイス塩基を表し、WCAは、弱配位アニオンを表し、aは、1~3の整数を表し、bは、0~2の整数を表し、aとbとの合計は、1~3であり、pおよびrは、パラジウムカチオンと弱配位アニオンとの電荷のバランスをとる数を表す。]
以上のようなコア層形成用材料100を用いて層110が形成される。
これにより、照射領域125内では、活性潜在状態の触媒前駆体が活性化して(活性状態となって)、モノマーの反応(重合反応や架橋反応)が生じる。
これにより、未照射領域140および/または照射領域125に残存する触媒前駆体を、直接または助触媒の活性化を伴って、活性化させる(活性状態とする)ことにより、各領域125、140に残存するモノマーを反応させる。
これにより、得られるコア層13に生じる内部応力の低減や、コア部14および側面クラッド部15の更なる安定化を図ることができる。
以上のようにして、支持基板162上に、クラッド層11(12)が形成される。
次いで、クラッド層11、12から、それぞれ、支持基板162を剥離、除去する。
以上のようにして、光導波路10(本発明の光導波路)が得られる。
さらに、ミラー17は、光導波路10の途中にあってもよい。
クラッド部が2種類以上のクラッド材料で構成されている場合、ミラー17には、2種類以上のクラッド材料が露出していてもよいが、1種類のみが露出しているのが好ましい。
(実施例)
まず、図9および図10に示す光導波路形成用部材を用意した。この光導波路形成用部材は、ノルボルネン系ポリマーで構成されたコア層およびクラッド層を積層してなるものである。
次いで、この光導波路形成用部材のミラー形成部に、図10に示すように、コア部の延長線に対して所定の角度でレーザ光を照射し、掘り込み加工を施した。これにより、ミラーを形成し、図1~図3に示す光導波路を得た。得られた光導波路のミラーには、側面クラッド部を構成する材料(クラッド材料)と、クラッド層を構成する材料(クラッド材料)とが露出している。
なお、実施例では、同様の方法で合計32個の光導波路のサンプルを作製したが、各サンプルでは、それぞれミラーの角度が異なっている。ミラーの角度は、40~50°の間にほぼ均等に分布するように、各サンプル間で調整されている。
光導波路の構造を、図11~図13に示す構造にした以外は、実施例と同様にして光導波路を作製した。得られた光導波路のミラーには、コア部を構成する材料(コア材料)と、側面クラッド部を構成する材料と、クラッド層を構成する材料とが露出している。
なお、比較例1では、同様の方法で合計12個の光導波路のサンプルを作製したが、各サンプルでは、それぞれミラーの角度が異なっている。ミラーの角度は、40~50°の間にほぼ均等に分布するように、各サンプル間で調整されている。
比較例1とは異なるポリマーを用いるようにした以外は、比較例1と同様にして光導波路を作製した。得られた光導波路のミラーには、コア部を構成する材料と、側面クラッド部を構成する材料と、クラッド層を構成する材料とが露出している。
なお、比較例2では、同様の方法で合計30個の光導波路のサンプルを作製したが、各サンプルでは、それぞれミラーの角度が異なっている。ミラーの角度は、40~50°の間にほぼ均等に分布するように、各サンプル間で調整されている。
実施例および各比較例で得られたサンプル(光導波路)について、それぞれのミラーの挿入損を以下の測定条件により測定した。
<測定条件>
・光源 :VCSEL 100μmφ(ミラー側オイルなし)
・光源の波長 :830nm
・光源の出力 :0.6mW
・入射光強度P0 :1.0V
なお、ミラーの挿入損は、ミラーへの入射光強度をP0とし、ミラーからの出射光強度をPとしたとき、以下の式により計算される。
(挿入損)=-10*log(P/P0)
そして、各サンプルについて、ミラーの角度(単位:度)を横軸、算出された挿入損(単位:dB)を縦軸として、散布図を作成した。得られた散布図のグラフを図14に示す。また、各サンプルのうち、挿入損の最小値、および、挿入損が1.5dBを下回るミラーの角度範囲(概算)を、表1に示す。
一方、各比較例で得られたサンプルでは、全体的に挿入損が大きいことが認められた。特に、実施例で得られたサンプルと、比較例1で得られたサンプルは、構成材料(ポリマー)の組成が同じであるにもかかわらず、挿入損の差が大きかった。
さらに、実施例で得られたサンプルでは、1.5dBを下回るミラーの角度範囲が十分に広いことが明らかとなった。これは、実施例においては、良好な伝送効率が得られるミラーを形成するにあたって、ミラーの角度の製造誤差の許容範囲が比較的広いことを示すものである。よって、実施例では、ミラーの角度を厳密に制御する必要がないので、高品質の光導波路を容易に作製可能であることが明らかとなった。
Claims (13)
- 長尺状のコア部と、
該コア部に隣接するように設けられたクラッド部と、
前記コア部の光軸の延長線を斜めに横切る加工面からなるミラーとを有する光導波路であって、
前記ミラーは、前記コア部の延長線上に設けられ、前記加工面には、前記コア部を構成する材料以外の材料のみが露出していることを特徴とする光導波路。 - 前記加工面には、前記クラッド部のうちの少なくとも一部を構成する材料のみが露出している請求項1に記載の光導波路。
- 長尺状のコア部と、該コア部の側面に隣接するように設けられた側面クラッド部とを含むコア層と、
該コア層を挟むように積層された2つのクラッド層と、
前記コア部の光軸の延長線を斜めに横切る加工面からなるミラーとを有する光導波路であって、
前記ミラーは、前記コア部の延長線上に設けられ、前記加工面のうち、前記コア層に対応する加工面には、前記側面クラッド部を構成する材料のみが露出していることを特徴とする光導波路。 - 前記加工面には、前記側面クラッド部を構成する材料、および、前記2つのクラッド層を構成する材料のみが露出している請求項3に記載の光導波路。
- 前記側面クラッド部を構成する材料は、前記2つのクラッド層を構成する材料と同一である請求項3に記載の光導波路。
- 前記ミラーとこれに隣接する前記コア部との離間距離は、前記コア部の光軸の延長線上において、5~250μmである請求項5に記載の光導波路。
- 前記加工面は、レーザ加工により形成される請求項6に記載の光導波路。
- 前記光導波路の前記コア部は、ノルボルネン系ポリマーを主材料として構成されている請求項7に記載の光導波路。
- 長尺状のコア部と、
該コア部に隣接するように設けられたクラッド部と、
ミラーを形成するための加工に供されるミラー形成部とを有し、光導波路を形成するのに用いられる光導波路形成用部材であって、
前記ミラー形成部は、前記コア部の延長線上に設けられ、前記コア部を構成する材料以外の材料のみで構成された部位であることを特徴とする光導波路形成用部材。 - 前記ミラー形成部は、前記クラッド部のうちの少なくとも一部を構成する材料のみで構成された部位である請求項9に記載の光導波路形成用部材。
- 長尺状のコア部と、該コア部の側面に隣接するように設けられた側面クラッド部とを含むコア層と、
該コア層を挟むように積層された2つのクラッド層と、
ミラーを形成するための加工に供されるミラー形成部とを有し、光導波路を形成するのに用いられる光導波路形成用部材であって、
前記ミラー形成部は、前記コア部の延長線上に設けられた部位であり、かつ、前記ミラー形成部の前記コア層に対応する部分が、前記側面クラッド部を構成する材料のみで構成されていることを特徴とする光導波路形成用部材。 - 前記ミラー形成部は、前記側面クラッド部を構成する材料、および、前記2つのクラッド層を構成する材料のみで構成された部位である請求項11に記載の光導波路形成用部材。
- 前記ミラーを形成するための加工は、前記ミラー形成部の一部を除去する加工である請求項9に記載の光導波路形成用部材。
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US13/132,735 US8774575B2 (en) | 2008-12-04 | 2009-12-01 | Optical waveguide and optical waveguide manufacturing member |
SG2011040821A SG171464A1 (en) | 2008-12-04 | 2009-12-01 | Optical waveguide and optical waveguide manufacturing member |
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JP2013228467A (ja) * | 2012-04-24 | 2013-11-07 | Nippon Mektron Ltd | 光電気混載フレキシブルプリント配線板、及びその製造方法 |
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