WO2009152301A3 - Low ion content, nanoparticle-containing resin systems - Google Patents
Low ion content, nanoparticle-containing resin systems Download PDFInfo
- Publication number
- WO2009152301A3 WO2009152301A3 PCT/US2009/047000 US2009047000W WO2009152301A3 WO 2009152301 A3 WO2009152301 A3 WO 2009152301A3 US 2009047000 W US2009047000 W US 2009047000W WO 2009152301 A3 WO2009152301 A3 WO 2009152301A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ion content
- low ion
- nanoparticle
- containing resin
- resin systems
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/005—Reinforced macromolecular compounds with nanosized materials, e.g. nanoparticles, nanofibres, nanotubes, nanowires, nanorods or nanolayered materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3063—Treatment with low-molecular organic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3072—Treatment with macro-molecular organic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
Various methods of treating surface-modified nanoparticles are described. Dual-ion exchange procedures (anion exchange and cation exchange), as well-as subsequent end-capping are described. Both ionically-bonded and covalently-bonded end-capping agents are discussed. The resulting low ion content, particularly low alkali metal and alkaline metal oxide ion content, treated, surface-modified nanoparticles, including such nanoparticles in a resin system, are also disclosed. Effects of low ion content on various properties of the resulting resin system, including blister-resistance, optical clarity, and rheology are included.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US6088108P | 2008-06-12 | 2008-06-12 | |
US61/060,881 | 2008-06-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2009152301A2 WO2009152301A2 (en) | 2009-12-17 |
WO2009152301A3 true WO2009152301A3 (en) | 2010-02-11 |
Family
ID=41050339
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/047000 WO2009152301A2 (en) | 2008-06-12 | 2009-06-11 | Low ion content, nanoparticle-containing resin systems |
PCT/US2009/046992 WO2009152296A1 (en) | 2008-06-12 | 2009-06-11 | End-capped curable resin sols |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2009/046992 WO2009152296A1 (en) | 2008-06-12 | 2009-06-11 | End-capped curable resin sols |
Country Status (1)
Country | Link |
---|---|
WO (2) | WO2009152301A2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102574678B (en) | 2009-10-21 | 2014-09-10 | 3M创新有限公司 | Solventless functionalization, milling, and compounding process with reactive diluents |
CN103124775B (en) * | 2010-10-22 | 2014-12-10 | 惠普发展公司,有限责任合伙企业 | Oxide pigment dispersion for inkjet ink |
RU2596826C2 (en) | 2011-02-02 | 2016-09-10 | Ашленд Лайсенсинг Энд Интеллектчуал Проперти Ллк. | Scratch resistant gel-like coating |
CA2855858A1 (en) | 2011-11-16 | 2013-05-23 | 3M Innovative Properties Company | Nanosilica containing polycyanate ester compositions |
US20150118409A1 (en) * | 2013-10-25 | 2015-04-30 | Nano And Advanced Materials Institute Limited | Release film with enhanced mechanical properties and method in preparing thereof |
CN105133422B (en) * | 2015-07-16 | 2017-10-10 | 吉翔宝(太仓)离型材料科技发展有限公司 | A kind of anti-scratch high-temperature resistant and antistatic release liners and preparation method thereof |
US10329460B2 (en) | 2016-09-14 | 2019-06-25 | 3M Innovative Properties Company | Fast curing optical adhesive |
CN109890750B (en) | 2016-11-07 | 2022-05-10 | 3M创新有限公司 | Curable resins comprising nanoparticles containing surface-bonded hydrophobically modified alkyl groups |
CN110526636B (en) * | 2019-09-19 | 2022-02-15 | 重庆兴渝新材料研究院有限公司 | Hydrophobic silica sol and preparation method thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030035888A1 (en) * | 2000-01-28 | 2003-02-20 | Yuichi Eriyama | Method for manufacturing hydrophobic colloidal silica |
US20050159001A1 (en) * | 2003-12-23 | 2005-07-21 | Taewan Kim | Insulating film composition having improved mechanical property |
US20070295446A1 (en) * | 2006-06-09 | 2007-12-27 | 3M Innovative Properties Company | Bonding method with flowable adhesive composition |
US20080057300A1 (en) * | 2004-10-12 | 2008-03-06 | 3M Innovative Properties Company | Protective Film Wear Layer |
WO2008027979A2 (en) * | 2006-08-29 | 2008-03-06 | 3M Innovative Properties Company | Resin systems including reactive surface-modified nanoparticles |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2254559A1 (en) * | 1998-11-20 | 2000-05-20 | Ahti August Koski | Process for hydrophobicizing particles, and their use in dispersions |
JP3970702B2 (en) * | 2001-09-27 | 2007-09-05 | 関東化学株式会社 | Method for producing ODS silica gel filler for liquid chromatography |
CA2458133C (en) * | 2003-02-18 | 2011-12-20 | Daiso Co., Ltd. | Packings for liquid chromatography, process for preparing and usage |
US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
US7767736B2 (en) * | 2005-12-05 | 2010-08-03 | 3M Innovative Properties Company | Flame retardant polymer composition |
-
2009
- 2009-06-11 WO PCT/US2009/047000 patent/WO2009152301A2/en active Application Filing
- 2009-06-11 WO PCT/US2009/046992 patent/WO2009152296A1/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030035888A1 (en) * | 2000-01-28 | 2003-02-20 | Yuichi Eriyama | Method for manufacturing hydrophobic colloidal silica |
US20050159001A1 (en) * | 2003-12-23 | 2005-07-21 | Taewan Kim | Insulating film composition having improved mechanical property |
US20080057300A1 (en) * | 2004-10-12 | 2008-03-06 | 3M Innovative Properties Company | Protective Film Wear Layer |
US20070295446A1 (en) * | 2006-06-09 | 2007-12-27 | 3M Innovative Properties Company | Bonding method with flowable adhesive composition |
WO2008027979A2 (en) * | 2006-08-29 | 2008-03-06 | 3M Innovative Properties Company | Resin systems including reactive surface-modified nanoparticles |
Also Published As
Publication number | Publication date |
---|---|
WO2009152296A1 (en) | 2009-12-17 |
WO2009152301A2 (en) | 2009-12-17 |
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