WO2009141411A1 - Procédé et appareil permettant la production d’un module de cellule solaire à formation de motifs par laser intégrés - Google Patents

Procédé et appareil permettant la production d’un module de cellule solaire à formation de motifs par laser intégrés Download PDF

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Publication number
WO2009141411A1
WO2009141411A1 PCT/EP2009/056196 EP2009056196W WO2009141411A1 WO 2009141411 A1 WO2009141411 A1 WO 2009141411A1 EP 2009056196 W EP2009056196 W EP 2009056196W WO 2009141411 A1 WO2009141411 A1 WO 2009141411A1
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WO
WIPO (PCT)
Prior art keywords
patterning
chamber
treating
substrate
layer
Prior art date
Application number
PCT/EP2009/056196
Other languages
English (en)
Inventor
Stephan Wieder
Original Assignee
Applied Materials Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/124,720 external-priority patent/US20090291231A1/en
Priority claimed from EP08156693A external-priority patent/EP2124264A1/fr
Application filed by Applied Materials Inc. filed Critical Applied Materials Inc.
Publication of WO2009141411A1 publication Critical patent/WO2009141411A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention refers to an apparatus for producing a solar cell module having an array of photovoltaic cells on a common substrate, the apparatus comprising at least one treating chamber for depositing a layer on a substrate and at least one patterning means for patterning the deposited layer.
  • the present invention further refers to an appropriate method for producing a solar cell module.
  • the different designs of solar cells comprise single semiconductor junctions like p-n- junctions with a p-doped semiconductor and a n-doped semiconductor adjacent to each other as well as multiple semiconductor junctions like pin-structures or nip-structures. While in the past most solar cells were based on silicon substrates, where respective semiconductor junctions were formed, modern photovoltaic devices are based on the so-called thin film technology. This technology utilizes an insulating substrate, e.g. a glass substrate or a plastic foil, or a metallic substrate onto which different layers are deposited to form an appropriate photovoltaic device.
  • an insulating substrate e.g. a glass substrate or a plastic foil, or a metallic substrate onto which different layers are deposited to form an appropriate photovoltaic device.
  • US 6,168,968 Bl and US 6,288,325 Bl describe methods of producing thin film solar cells, where metallic or glass substrates are coated with a front or a back electrode layer, several semiconductor layers of doped and un-doped amorphous or micro-crystalline silicon as well as an appropriate back or front contact layer, respectively.
  • the front contact may be formed by a transparent conductive oxide TCO, for example formed by indium tin oxide ITO.
  • WO 2006/053129 A2 describes an apparatus and a method for manufacturing photovoltaic devices by which such layers like a conductive back layer, a p-type semiconductor layer, an n- type semiconductor layer and a transparent conductive front layer can be deposited continuously on a substrate.
  • WO 2006/053129 A2 is efficient for producing a layer stack of a solar cell or a photovoltaic structure
  • the described process may be disadvantageous for an industrially produced solar cell module in terms of efficiency and throughput.
  • Patterning which might also be designated as trenching, is most often performed by a laser beam which is scanned over the surface of the photovoltaic layer structure in order to remove one or more deposited layers and/or parts of the substrate along the movement path of the laser beam. Accordingly, this process is also designated as scribing. Although, structuring and patterning lead to an improved solar cell module, it is detrimental that this makes the overall production process very laborious and complex.
  • the inventive method as well as the inventive apparatus should ensure an efficient and simple process for producing a solar cell module having an array of independent photovoltaic devices on a common substrate while at the same time good quality of the solar cells and especially high output of electrical energy should be reached.
  • the apparatus for producing such a solar cell module should be easy to manufacture.
  • the present invention it is suggested to carry out the patterning or structuring of a photovoltaic layer structure by laser treatment, maser (microwave amplification by stimulated emission of radiation) treatment, ultrasonic treatment, mechanical cutting or milling or a similar treatment under technical vacuum conditions so that this process step can be integrated into a vacuum apparatus for depositing layers for a photovoltaic layer structure. Accordingly, the patterning step is performed in a treating or vacuum chamber.
  • the patterning step can be carried out in the same treating chamber in which one or several deposition steps are performed.
  • a treating chamber may provide different support positions for a substrate to be treated, in which different treating steps may be performed.
  • a separate treating chamber for carrying out the patterning step is preferable for continuous or dynamic treatment of the substrate which means that the substrate is moved during a single treatment step and/or between single treatment steps.
  • a separate treating chamber for only carrying out the patterning step is also useful for stationary treatment in order to avoid contamination problems.
  • the patterning step may comprise forming of trenches by removing of material of the substrate and/or deposited layers in order to separate regions of the substrate and/or deposited layers.
  • a cleaning device like suction devices or similar, may be present during the patterning step so that the material removed during patterning can be led away immediately.
  • further cleaning devices as described hereinafter may be provided.
  • the present invention is particularly beneficial with respect to a continuously working apparatus where different treating chambers and the corresponding treating steps are passed one after the other by the substrate to be treated.
  • Such a continuously working apparatus as well as the corresponding method are very advantageous with respect to reduced handling times for the substrate and the improved efficiency and throughput due to reduced locking processes and correspondingly reduced times for evacuation and filling the treating chambers with gas and/or cooling and heating of the substrates.
  • an apparatus may be equipped with transporting means for transporting a substrate from a first treating chamber for depositing a layer to a second treating chamber for patterning the deposited layer as well as for moving the substrate through the first and second treating chambers.
  • Such transporting means may be designed such that a common transport path through the first and second treating chambers or the whole apparatus is provided for, on which the substrate carriers supporting the substrate during movement through the apparatus can be moved in every conceivable manner. For example, sliding movement of the substrate carriers along rails as well as contactless movement achieved by magnetic forces of the substrate carriers may be used.
  • the transporting means may be designed such that continuous movement and/or a stepwise movement can be performed.
  • buffer chambers or the like may be provided for.
  • the substrate carrier for the substrate may be used during the whole movement of the substrate through the apparatus, i.e. the movement through all the different treating chambers of the apparatus.
  • the first treating chamber for depositing a layer as well as the second treating chamber for patterning the layer deposited in the first treating chamber are accordingly disposed such that the substrate can be moved from the first treating chamber to the second treating chamber without leaving the vacuum atmosphere of the apparatus or the treating chambers, respectively.
  • the first and second treating chambers may be disposed adjacent to each other. Particularly, no time-consuming lock-in and lock-out processes have to be carried out for moving the substrate from the first treating chamber to the second treating chamber. Accordingly, effort with respect to lock-in and lock-out devices can be saved.
  • a transfer opening may be present in the chamber walls of adjacent treating chambers to allow simple transfer from the substrate from one treating chamber to the other.
  • the common transport path may extend.
  • the apparatus can be simplified by using common vacuum means for producing technical vacuum conditions in adjacent treating chambers, like the first treating chamber for depositing a layer and the second treating chamber for patterning the layer.
  • means for pressure adjustment between the first and the second treating chamber may be provided for, like additional openings, which at the end would allow providing only vacuum means at one of two adjacent treating chambers.
  • the apparatus may comprise several first treating chambers for depositing different layers and several second treating chambers for patterning these layers.
  • the first and second treating chambers may be disposed alternately in-line.
  • the number of pairs of first and successive second treating chambers may be in a range of one to twenty.
  • first treating chambers are disposed one after the other adjacent to each other with only one second treating chamber at the end of the series of first treating chambers. This is possible, if the patterning can be carried out for more than one layer in a single process step so that several layers deposited one after the other can be removed by a single patterning step.
  • variations of the design of successive first and second treating chambers may be applied at the end of the apparatus, since a final patterning step may be carried out under normal atmospheric pressure, since at the end of the apparatus one lock-out process has to be carried out anyway. Accordingly, the last patterning step can be carried out under normal atmospheric pressure.
  • the apparatus may comprise a third treating chamber or several third treating chambers for carrying out a cleaning step, especially after the patterning step.
  • a third treating chamber for carrying out the cleaning step may be arranged after each second treating chamber for laser patterning the substrate.
  • This third treating chamber for cleaning the substrate may be disposed along the transport path of the substrate similar to the first and second treating chamber so as to form a row of first, second and third treating chambers. Such a design may be especially useful when the cleaning step in the third treating chamber is also carried out under vacuum conditions.
  • the third treating chamber can be disposed offset of the transport path of the substrate through the first and second treating chambers.
  • Such a design may be used, if the treating step is not carried out under vacuum conditions, but under normal atmospheric conditions so that in this case additional lock-in and lock-out processes have to be carried out. This can be done very efficiently, if the third treating chamber is not in-line with the first and the second treating chambers, since this place at the transport path may be used for a lock-in and a lock-out chamber.
  • the treating chamber may be designed similar to the first and second treating chambers.
  • the whole apparatus may comprise a plurality of identical modules which can be combined with each other and individually equipped according to the specific requirements of the apparatus.
  • One module may comprise one or several treating chambers, for example a pair of first and second treating chambers or a triple of first, second and third treating chambers.
  • the treating chambers may be equipped according to the methods and processes which are to be carried out in the treating chambers.
  • deposition of the different layers may be performed by chemical or physical vapor deposition processes CVD or PVD, especially low pressure chemical vapor deposition LPCVD, plasma enhanced chemical vapor deposition PECVD, cathode evaporation also designated as sputtering or reactive cathode evaporation (reactive sputtering).
  • the second treating chamber wherein the laser patterning step is carried out, may be equipped with a corresponding device inside the treating chamber or outside of the treating chamber, for example in case a laser is used as patterning means.
  • the treating chamber may comprise a transparent window for the laser irradiation in order to allow the laser beam to be directed onto the substrate to be laser treated.
  • vacuum feed throughs for supply lines may be provided for.
  • the cleaning processes carried out in the third treating chamber may comprise different cleaning methods or combinations thereof including fluid cleaning, chemical cleaning, electrostatic cleaning, blow cleaning and suction cleaning.
  • some of the cleaning processes may only be carried out under normal atmospheric pressure conditions, while others also can be used under vacuum conditions.
  • electrostatic cleaning using electronic forces for attracting charged particles can also be used in vacuum as blow cleaning or suction cleaning.
  • Blow cleaning uses a stream of inert gas to blow away particles from the surface of the substrate while suction cleaning utilizes suction means to attract particles.
  • blow cleaning and suction cleaning may be used in combination.
  • Fluid cleaning or chemical cleaning are preferably used under normal atmospheric pressure conditions, since the liquids used during this cleaning process may negatively affect vacuum atmosphere.
  • the solar cell is encapsulated so that the apparatus may also comprise an encapsulating unit.
  • this process may be carried out under normal atmospheric pressure so that no vacuum chamber is necessary for this process.
  • Fig. 1 a top view of an inventive apparatus
  • Fig. 2 a top view of a part of a second embodiment of an inventive apparatus
  • Fig. 3 a side view of a part of a third embodiment of the present invention.
  • Fig. 4 a top view of a fourth embodiment of the present invention.
  • Fig. 1 is a schematic top view on a first embodiment of the present invention.
  • the apparatus 1 shown in fig. 1 comprises a transport path 2 along which the substrates to be treated are moved through the apparatus 1.
  • a transport path 2 may comprise two tracks 3 and 4 which may support a substrate carrier on which the substrates may be supported during movement through the apparatus 1.
  • the substrate carrier may be designed such that the substrate carrier is movable in a gliding way along the tracks 3 and 4.
  • the apparatus 1 comprises 16 chambers which are disposed one after the other along the transport path 2. Accordingly, during operation the substrates to be treated in the apparatus 1 are moved through the chambers 5 to 20 successively.
  • the first chamber 5 is a lock chamber which allows locking in the substrates to be treated into the apparatus 1. Since the whole apparatus 1 is operated with technical vacuum conditions inside the chambers 6 to 19, the substrates have to run through a lock chamber 5 at the inlet as well as the outlet (lock chamber 20) to be brought from the normal atmospheric pressure outside the apparatus 1 to the near vacuum conditions inside the apparatus 1 and vice versa.
  • a first treating chamber 6 is provided for.
  • the treating chamber 6 is designed such so as to allow a deposition of a transparent conductive oxide layer onto the substrate which is preferably a glass substrate.
  • the transparent conducive oxide TCO may be deposited by a sputtering process, especially a reactive sputtering process or Low Pressure Chemical Vapour Deposition LPCVD, so that the treating chamber 6 is equipped with a cathode evaporation device.
  • the TCO layer deposited in the treating chamber 6 may be an aluminium doped zinc oxide layer, a fluorine doped tin oxide (F-SnO), indium doped tin oxide (ITO) or a similar layer used in photovoltaic industry for making the front contact.
  • F-SnO fluorine doped tin oxide
  • ITO indium doped tin oxide
  • the apparatus 1 is designed to handle large-area substrates in order to produce big-sized solar cell modules.
  • such large-area solar cell modules are made of an array of single photovoltaic cells being arranged in rows and columns adjacent to each other on the module.
  • the layers deposited to form a photovoltaic structure are patterned or structured in order to form trenches in the respective layers so as to separate specific areas forming single photovoltaic cells. Accordingly, this process is also designated as trenching.
  • the apparatus 1 comprises a second treating chamber 7 following successively the first treating chamber 6 along the transport path 2. Accordingly, the first treating chamber and the second treating chamber 7 have a common sidewall 21 with an opening (not shown) through which the substrate is moved along the transport path.
  • the patterning step in the treating chamber 7 is carried out by a laser process.
  • a laser having a focused laser beam may scan over the surface of the substrate or the layer deposited in the treating chamber 6, respectively, in order to cut a trench into said layer by removing, especially evaporation of material. Accordingly, this process is also designated as scribing a pattern or structure into a surface of the substrate.
  • the substrate may be moved with respect to the fixed laser beam or combined movement may be carried out. Such a relative movement can also be applied to other patterning methods like mechanical patterning or maser patterning.
  • the particles removed by laser cutting may be blown away by a blowing gas stream of inert gas directed onto the surface of the substrate to be treated and/or sucked off from the surface of the substrate by suction means.
  • nozzles for blowing inert gas onto the substrate as well as to suck off a surface area of the substrate may also be moved over the surface of the substrate similar to the laser beam.
  • other cleaning processes may be simultaneously carried out during the patterning step. For example, electrostatic cleaning may be used.
  • the substrate carrier as well as the substrate are set to a specific electric potential in order to charge the particles removed by the laser beam. Spaced apart from the substrate counter electrodes may be provided to electrically attract the charged particles and thereby remove the loose particles from the substrate.
  • a third treating chamber 8 for carrying out a cleaning step may be provided. While the embodiment shown in fig. 1 comprises such a cleaning chamber 8, this is not mandatory. Even the cleaning during patterning is not necessary in every case, if the patterning step under technical vacuum conditions leads to a sufficient clean surface of the substrate.
  • the next treating chamber 9 being also closely attached to the treating chamber 8 again is a treating chamber of the first type. Accordingly, in the treating chamber 9 a deposition process is carried out.
  • the treating chamber 9 is a CVD chamber wherein a chemical vapor deposition of a first semiconductor layer is carried out. Accordingly, treating chamber 10 is again a treating chamber of the second type in which the layer deposited in the CVD chamber 9 is patterned by a laser treatment. After the laser chamber 10 again a cleaning chamber 11 is disposed as seen in the transport direction of the transport path 2.
  • Chambers 12 to 14 and 15 to 18 form also triples of chambers like the chambers 9 to 11 comprising a deposition chamber 5, 15 and a laser chamber 13, 16 for trenching the layer deposited before as well as cleaning chambers 14, 17 to remove waste particles of the surface of the substrate.
  • the deposition chambers 9, 12 and 15 are used to deposite semiconductor layers by chemical vapor deposition CVD or especially plasma enhanced chemical vapor deposition PECVD in order to form a photovoltaic structure.
  • Semiconductor layers deposited in the chambers 9, 12, 15 may be p-doped, n-doped or intrinsic silicon layers, especially hydrogenated silicon layers of amorphous or micro-crystalline type in order to form pin- or nip-structures.
  • other types of photovoltaic structures formed of other layer structures or any other suitable semiconductor material for example semiconductors formed by elements of the groups III/V of the periodic table, are also conceivable. Accordingly, the numbers of deposition chambers as well as successive patterning chambers and cleaning chambers of the apparatus may be adapted to the specific requirements.
  • the apparatus 1 it is advantageous to design the apparatus 1 as a combination of a plurality of modules, one or more chambers forming one module.
  • the apparatus 1 can be designed specifically with respect to the solar cell module to be produced by combining the appropriate number of modules.
  • identical modules or chambers, respectively as a basic component of the apparatus 1.
  • Such a basic component or chamber can be equipped with the appropriate devices and means so as to form a treating chamber of a first type, a second type or a third type, i.e. a deposition chamber, a patterning chamber or a cleaning chamber.
  • a further treating chamber of the first type is disposed adjacent to the cleaning chamber 17.
  • the treating chamber 18 serves for producing a back contact layer, which might be a metallic layer, like aluminum.
  • a treating chamber 19 for patterning of the back contact is provided for.
  • a lock out chamber 20 is disposed in order to remove the treated substrate or the produced solar cell module from the apparatus 1 by bringing it to the normal atmospheric pressure outside the apparatus 1 without destroying the vacuum conditions being present inside the apparatus 1.
  • the whole apparatus 1 comprising treating chambers 6 to 19 is operated under technical vacuum conditions. Accordingly, means for producing such a vacuum (not shown) are provided for. Although, almost the same vacuum conditions may be present during operation in at least some of the treating chambers 6 to 19 of the apparatus 1, the single chambers 6 to 19 are separated by sidewalls 21 in order to enable a module concept and to avoid influences from one treating process carried out in one chamber to another treating process carried out in an adjacent chamber.
  • lock means like shutters or valves or the like may be provided at the openings or transitions between the chambers 6 to 19.
  • slit valves or lock-valves may be arranged between treating chambers in which different pressures and/or different gas atmospheres are present during processing of the substrates.
  • buffer chambers (not shown) may be disposed in the apparatus to allow adapting of processing speed in different chambers or parts of the apparatus to each other. Accordingly, buffer chambers may be used to speed down or accelerate the substrates in the continuously working apparatus. In addition, buffer chambers may allow operation of parts of the apparatus for a while during breakdown of other parts to thereby improve efficiency of the apparatus.
  • a second type of a cleaning chamber or a second kind of arrangement of a cleaning chamber, respectively, may be chosen.
  • An example is shown in fig. 2 showing only a part of an inventive apparatus for producing a solar cell module.
  • the part of the apparatus 100 shown in fig. 2 discloses a transport path 102 comprising tracks 103 and 104 comparable to the transport path 2 and the tracks 3 and 4 of the embodiment shown in fig. 1.
  • apparatus 100 comprises a deposition chamber 109 and a patterning chamber 110.
  • the cleaning chamber 111 is not disposed along the transport path 102, but offset of the transport path 102 so that adjacent to the patterning chamber 110 a transport chamber 115 is disposed.
  • the transport chamber 115 comprises a second transport path 112 transverse to the transport path 102.
  • the transport path 112 also comprises two tracks 113 and 114 along which the substrate carrier can be slidably moved.
  • the transport path 112 leads into the cleaning chamber 111 disposed offset the row of chambers 109, 110, 115 and 116. Accordingly, the chamber 115 is used as lock-in and lock- out chamber for the cleaning chamber 111.
  • shutters at the sidewalls of the chamber 115 being adjacent to the chambers 110 and 116, i.e. sidewalls 116 and 117, are closed and the shutter of sidewall 118 is opened.
  • the substrate in chamber 115 can now be moved into cleaning chamber 111, while at the same time the substrate already cleaned in chamber 111 may be moved to the chamber 115.
  • the shutter in the sidewall 118 is again closed and the chamber 115 is brought again to vacuum conditions.
  • Fig. 3 shows a part of the embodiment shown in fig. 1 in a side view.
  • the partial view of fig. 3 shows the cleaning chamber 8, the deposition chamber 9, the patterning chamber 10, the cleaning chamber 11 as well as a further deposition chamber 12 and a further patterning chamber 13.
  • the chambers 8, 9, 10, 11, 12 and 13 are separated by chamber walls which comprise transfer openings for the substrates to be moved along the transport path 2.
  • the chamber walls between the chambers 8 and 9, 9 and 10, 10 and 11 as well as 11 and 12 are designated with the reference numerals 28, 30, 32 and 34.
  • the corresponding transfer openings are designated by reference numerals 27, 29, 31 and 33.
  • the transfer openings may comprise shutters to close the openings as shown for the transfer opening 27 with shutter 50 which is slidably movable along the chamber wall 28. By means of the shutter 50 the chambers 8 and 9 can be separated so as to avoid detrimental influences of the processes carried out in each chamber.
  • the treating chamber 9 shown in fig. 3 is a chamber designed as a chamber for carrying out a plasma enhanced chemical vapor deposition PECVD.
  • an electrode 35 connected to an RF (radio frequency) power supply 36 is disposed in the chamber.
  • the substrate carrier 25 carrying substrate 26 may be used.
  • the carrier 25 is therefore grounded. Due to the RF power supply applied to the electrode 35, a plasma may be ignited between the electrode 35 and the substrate 26 when the process gas like argon is introduced through the gas supply 27 to the treating chamber 9.
  • reactive gases like silane, disilane or trimethylboron for depositing a semiconductor layer may be introduced to the gas supply 37.
  • a vacuum pump 38 which is serving for the adjacent chambers 9 and 10 is provided.
  • the vacuum pump 38 is connected to the chambers 9 and 10 by conducting pipes 39 and 40.
  • each chamber may have a separate vacuum pump as shown with the vacuum pump 44 and the conduction pipe 45 for the chamber 11.
  • the substrate 26 is moved to the chamber 10 wherein a patterning or structuring of the layer 51 is performed.
  • a laser device 41 is disposed outside the vacuum chamber 10.
  • the laser device 41 produces a focused laser beam 42 which is directed to the surface of the substrate 26 or the layer 51, respectively.
  • a window 43 being transparent for the laser light produced by the laser device 41 is disposed in the respective sidewall of the chamber 10.
  • the laser light beam 42 is moved over the surface of the substrate 26 in order to produce trenches 49 shown for the substrate 26 disposed in the chamber 11.
  • the layer 51 is divided into separate areas to form separate photovoltaic cells on a common substrate 26.
  • the chamber 11 serves for cleaning of the substrate 26 as well as of the trenches 49 and the layer areas 48 produced in the preceding chambers 9 and 10.
  • the cleaning process performed in the cleaning chamber 11 is an electrostatic cleaning.
  • the substrate carrier 25 is connected to an electrical voltage source 46 so that the substrate carrier as well as the substrate 26 and all particles adhered to the surface of the substrate 26 are set to a first potential.
  • the counter electrode 47 which is also connected to the power supply 46 is set to a second potential opposite to the first potential so that the particles electrically charged are attracted to the counter electrode 47. Accordingly, the surface of the substrate 26 is cleaned.
  • Fig. 4 discloses an apparatus for producing a flexible solar cell module on a flexible isolating substrate such as a plastic foil.
  • the substrate formed of a flexible band or foil is also designated as a web and therefore the apparatus is also called a web coating apparatus.
  • Such an apparatus 200 comprises a roll-off chamber 201 where the foil roll with the uncoated substrate is received to be rolled off.
  • a first coating chamber 203 Adjacent to the roll-off chamber 201 a first coating chamber 203 is arranged in which the transparent web is coated with a transparent conductive oxide file to form the front contact layer.
  • the web 211 is introduced into a first patterning chamber 204 in which a laser 210 is arranged for carrying out a patterning step. Since the first patterning chamber 204 is arranged directly adjacent to the first coating chamber 203, the band or web 211 to be coated does not have to leave vacuum, since vacuum conditions are set both in the first coating chamber 203 and the first patterning chamber 204.
  • a second coating chamber 205 for depositing the absorber layers or solar cell structure is provided for.
  • a second coating chamber 205 for depositing the absorber layers or solar cell structure may be arranged one after the other.
  • a second patterning chamber 206 is disposed which is similar to the first patterning chamber 204.
  • the second patterning chamber 206 also comprises a laser 210 for cutting trenches into the deposited layers in order to separate individual solar cell devices.
  • the apparatus 200 of fig. 4 further comprises a third coating chamber 207 for depositing a metallic back contact layer which can also be patterned in the following third patterning chamber 208. For this reason, a laser 210 is arranged in the third patterning chamber 208. At the end of the apparatus a roll-on chamber for winding of the coated web is arranged.
  • the web coating apparatus 200 comprises several vacuum pumps 202 in order to produce and maintain vacuum conditions throughout the whole apparatus 200. Especially, for each chamber 201, 203, 204, 205, 206, 207, 208 and 209 respective vacuum pumps 202 are provided for. However, it is also possible that adjacent vacuum chambers use common means for producing vacuum conditions.
  • the embodiment of fig. 4 shows that the present invention cannot only be used for producing thin film solar cells on isolating or metallic rigid substrates like glass plates, but also on flexible isolating or metallic substrates. While the embodiment shown in fig. 4 is designed for producing flexible solar cell modules on flexible, transparent substrates like plastic foils, a similar design can be set up for depositing solar cells on non-transparent, flexible substrates as metallic foils.
  • the layer sequence which has to be deposited is different to the layer sequence deposited on isolating, transparent substrates.
  • an isolating layer may be deposited onto which a conductive layer as back contact may be coated.
  • the absorber layers or a layer stack for generating a photovoltaic device is provided for.
  • the closing layer is a front contact formed from transparent conductive material like transparent conductive oxide.
  • a contact structure made by screen printing may be applied.
  • a patterning of the deposited layers can be carried out from both sides of the substrate, while for non-transparent substrates a patterning is carried out from the side where the layers are deposited. Accordingly, the laser or other suitable means for patterning may be arranged at different positions within the vacuum chamber with respect to the substrate.
  • the invention is especially defined by the following features:
  • Apparatus for producing a solar cell module having an array of photovoltaic cells on a common substrate comprising at least one treating chamber for depositing a layer on a substrate and at least one patterning for patterning the deposited layer, wherein a treating chamber for patterning comprising means for setting up technical vacuum conditions is provided for.
  • Apparatus according to feature 1 wherein a first treating chamber for depositing a layer and a second treating chamber for patterning the deposited layer are different treating chambers.
  • transporting means are provided for transporting a substrate from a first treating chamber for depositing a layer to a second treating chamber for patterning the deposited layer and through the first and second treating chambers.
  • Apparatus according to feature 4 wherein the substrate is supported by a substrate carrier used during movement through the first and the second treating chamber.
  • Apparatus according to feature 2 wherein a first treating chamber for depositing a layer and a second treating chamber for patterning the layer deposited in the first treating chamber are arranged adjacent to each other with a common opening in between through which a common transport path of the substrate is extending.
  • Apparatus according to feature 2 wherein a first treating chamber for depositing a layer and a second treating chamber for patterning the layer comprise means for pressure equilibrium between first and second treating chamber.
  • Apparatus according to feature 1 wherein several first treating chambers for depositing different layers and several second treating chambers for patterning these layers are provided.
  • Apparatus according to feature 10 wherein along a common transport path for a substrate n pairs of first and successive second treating chambers with n being an integer between 1 and 20 and a last first or second treating chamber are arranged.
  • Apparatus according to feature 13 wherein at least one third treating chamber is arranged for cleaning the substrate.
  • Apparatus according to feature 13 wherein several third treating chambers are arranged each after a second treating chamber. 16. Apparatus according to feature 13, wherein the third treating chamber is arranged along the transport path of the substrate through the first and second treating chambers in a row after the first and second treating chamber.
  • Apparatus according to feature 16 wherein the third treating chamber comprises at least part of the same transporting means for transporting a substrate as first treating and second treating chambers.
  • Apparatus according to feature 16 wherein the third treating chamber for cleaning the substrate is arranged adjacent to another treating chamber with a common opening in between through which a common transport path of the substrate is extending.
  • Apparatus according to feature 16 wherein the third treating chamber and another treating chamber have common vacuum means for producing technical vacuum conditions.
  • 21 Apparatus according to feature 1 , wherein the first treating chamber is equipped such that at least one of the treatments of the group comprising physical vapour deposition PVD, chemical vapour deposition CVD, low pressure chemical vapour deposition LPCVD, plasma enhanced chemical vapour deposition PECVD, cathode evaporation (sputtering) and reactive cathode evaporation
  • Apparatus according to feature 1 wherein the treating chamber for patterning is equipped such that the patterning can be performed by at least one out of the group comprising a laser, a maser, a ultrasonics device, a scarificator, and a gouge, the patterning means cutting trenches into the substrate and the layers deposited thereon.
  • the second treating chamber comprises a laser arranged inside the treating chamber.
  • Apparatus according to feature 1 wherein a sputter deposition chamber for depositing transparent conductive oxide TCO, a laser chamber for patterning the TCO layer, several CVD chambers for depositing semiconductor layers followed by one common laser chamber at the end of a row of several CVD chambers for patterning a layer stack or several laser chambers each after a CVD chamber for patterning each single layer deposited by the CVD chambers and a sputter deposition layer for depositing a back contact layer are provided for.
  • a sputter deposition chamber for depositing transparent conductive oxide TCO a laser chamber for patterning the TCO layer
  • several CVD chambers for depositing semiconductor layers followed by one common laser chamber at the end of a row of several CVD chambers for patterning a layer stack or several laser chambers each after a CVD chamber for patterning each single layer deposited by the CVD chambers and a sputter deposition layer for depositing a back contact layer are provided for.
  • Apparatus according to feature 16 wherein the third treating chamber is equipped such that at least one of the treatments of the group comprising fluid cleaning, chemical cleaning, electrostatic cleaning, blow cleaning and suction cleaning can be performed.
  • Apparatus according to feature 1 wherein an encapsulating unit is provided at the end of a transport path through the apparatus.
  • Method for producing a solar cell module having an array of photovoltaic cells on a common substrate comprising several steps of depositing various layers and several steps of patterning the deposited layers to form a plurality of separated photovoltaic cells in an array, wherein the step of patterning the deposited layer is carried out under technical vacuum conditions.
  • Method for producing a solar cell module having an array of photovoltaic cells on a common substrate comprising several steps of depositing various layers and several steps of patterning the deposited layers to form a plurality of separated photovoltaic cells in an array, wherein the substrate is kept under vacuum conditions defined by a pressure below atmospheric pressure during at least one depositing step and at least one successive patterning step without leaving vacuum area.
  • PECVD cathode evaporation
  • sputtering cathode evaporation
  • reactive cathode evaporation reactive sputtering

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Photovoltaic Devices (AREA)

Abstract

La présente invention concerne un procédé ainsi qu’un appareil permettant la production d’un module de cellule solaire présentant un réseau de cellules photovoltaïques sur un substrat commun, l’appareil comportant au moins une enceinte de traitement pour le dépôt d’une couche sur un substrat et au moins un laser pour le modelage de contours de la couche déposée, une enceinte de traitement pur le modelage de contours au laser comprenant des moyens pour établir les conditions techniques de mise sous vide.
PCT/EP2009/056196 2008-05-21 2009-05-20 Procédé et appareil permettant la production d’un module de cellule solaire à formation de motifs par laser intégrés WO2009141411A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12/124,720 US20090291231A1 (en) 2008-05-21 2008-05-21 Method and apparatus for producing a solar cell module with integrated laser patterning
EP08156693A EP2124264A1 (fr) 2008-05-21 2008-05-21 Procédé et appareil de production d'un module de cellule solaire avec une formation de motifs par laser intégré
EP08156693.7 2008-05-21
US12/124,720 2008-05-21

Publications (1)

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WO2009141411A1 true WO2009141411A1 (fr) 2009-11-26

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WO (1) WO2009141411A1 (fr)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06260436A (ja) * 1992-12-04 1994-09-16 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法及び半導体処理装置
JPH09293680A (ja) * 1996-04-26 1997-11-11 Japan Steel Works Ltd:The 半導体結晶膜および該結晶膜の製造方法ならびに該結晶膜の製造装置
GB2339963A (en) * 1998-07-14 2000-02-09 Bp Solarex Photovoltaic module
EP1069625A2 (fr) * 1999-07-14 2001-01-17 Canon Kabushiki Kaisha Composant photovoltaique microcristallin connecté en série, sa méthode de fabrication, matériau de construction et dispositif de production d'énergie utilisant ce composant
US20030160239A1 (en) * 1999-07-13 2003-08-28 Youmei Shinagawa Semiconductor thin film and liquid crystal display apparatus using the same, and method of fabricating the same
US20040063320A1 (en) * 2002-09-30 2004-04-01 Hollars Dennis R. Manufacturing apparatus and method for large-scale production of thin-film solar cells
US20050158891A1 (en) * 2000-05-30 2005-07-21 Barth Kurt L. Apparatus and processes for the mass production of photovoltaic modules
WO2006053129A2 (fr) * 2004-11-10 2006-05-18 Daystar Technologies, Inc. Procede et appareil de formation d'une cellule solaire a couche mince utilisant un procede en continu
US20070169806A1 (en) * 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06260436A (ja) * 1992-12-04 1994-09-16 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法及び半導体処理装置
JPH09293680A (ja) * 1996-04-26 1997-11-11 Japan Steel Works Ltd:The 半導体結晶膜および該結晶膜の製造方法ならびに該結晶膜の製造装置
GB2339963A (en) * 1998-07-14 2000-02-09 Bp Solarex Photovoltaic module
US6288325B1 (en) * 1998-07-14 2001-09-11 Bp Corporation North America Inc. Producing thin film photovoltaic modules with high integrity interconnects and dual layer contacts
US20030160239A1 (en) * 1999-07-13 2003-08-28 Youmei Shinagawa Semiconductor thin film and liquid crystal display apparatus using the same, and method of fabricating the same
EP1069625A2 (fr) * 1999-07-14 2001-01-17 Canon Kabushiki Kaisha Composant photovoltaique microcristallin connecté en série, sa méthode de fabrication, matériau de construction et dispositif de production d'énergie utilisant ce composant
US20050158891A1 (en) * 2000-05-30 2005-07-21 Barth Kurt L. Apparatus and processes for the mass production of photovoltaic modules
US20040063320A1 (en) * 2002-09-30 2004-04-01 Hollars Dennis R. Manufacturing apparatus and method for large-scale production of thin-film solar cells
WO2006053129A2 (fr) * 2004-11-10 2006-05-18 Daystar Technologies, Inc. Procede et appareil de formation d'une cellule solaire a couche mince utilisant un procede en continu
US20070169806A1 (en) * 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization

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