WO2009075481A8 - A method for adsorption of nano-structure and adsorption matter using solid thin film mask - Google Patents

A method for adsorption of nano-structure and adsorption matter using solid thin film mask Download PDF

Info

Publication number
WO2009075481A8
WO2009075481A8 PCT/KR2008/006787 KR2008006787W WO2009075481A8 WO 2009075481 A8 WO2009075481 A8 WO 2009075481A8 KR 2008006787 W KR2008006787 W KR 2008006787W WO 2009075481 A8 WO2009075481 A8 WO 2009075481A8
Authority
WO
WIPO (PCT)
Prior art keywords
tip
nano
adsorption
mask
thin film
Prior art date
Application number
PCT/KR2008/006787
Other languages
French (fr)
Other versions
WO2009075481A2 (en
WO2009075481A3 (en
Inventor
Seung-Hun Hong
Tae-Kyeong Kim
Original Assignee
Seoul National University Industry Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020070127849A external-priority patent/KR20090015779A/en
Application filed by Seoul National University Industry Foundation filed Critical Seoul National University Industry Foundation
Priority to US12/747,396 priority Critical patent/US20100270265A1/en
Publication of WO2009075481A2 publication Critical patent/WO2009075481A2/en
Publication of WO2009075481A3 publication Critical patent/WO2009075481A3/en
Publication of WO2009075481A8 publication Critical patent/WO2009075481A8/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349—Creating layers of material on a substrate
    • B81C1/0038—Processes for creating layers of materials not provided for in groups B81C1/00357 - B81C1/00373
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/16—Probe manufacture
    • G01Q70/18—Functionalisation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/12—STM or AFM microtips

Abstract

A method of adsorbing a nano-structure and an adsorption material using a solid thin film mask, including; depositing the mask over the entire surface of a tip of a probe microscope, grinding the end of the tip having the mask against a solid, thus removing the mask from the end of the tip, depositing a linker molecule layer over the entire surface of the tip the end of which has no mask, immersing the tip having the deposited linker molecule layer in a nano-structure solution, thus adsorbing the nano-structure on the linker molecule, and removing the mask from the tip. The mask is used to prevent deformation of the tip, and the nano-structure and the adsorption material can be deposited only on the end of the tip, regardless of the properties of the nano-structure and the adsorption material and regardless of the surface material of the tip and the properties thereof.
PCT/KR2008/006787 2007-08-09 2008-11-18 A method for adsorption using solid thin film mask of nano-particle and adsorption matter WO2009075481A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/747,396 US20100270265A1 (en) 2007-08-09 2008-11-18 Method for adsorption of nano-structure and adsorption matter using solid thin film mask

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2007-0127849 2007-12-10
KR1020070127849A KR20090015779A (en) 2007-08-09 2007-12-10 A method for adsorption using solid thin film mask of nano-particle and adsorption matter

Publications (3)

Publication Number Publication Date
WO2009075481A2 WO2009075481A2 (en) 2009-06-18
WO2009075481A3 WO2009075481A3 (en) 2009-08-27
WO2009075481A8 true WO2009075481A8 (en) 2010-07-01

Family

ID=40756194

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/006787 WO2009075481A2 (en) 2007-08-09 2008-11-18 A method for adsorption using solid thin film mask of nano-particle and adsorption matter

Country Status (2)

Country Link
KR (1) KR20100087740A (en)
WO (1) WO2009075481A2 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3543967B2 (en) * 2000-09-21 2004-07-21 松下電器産業株式会社 SCANNING PROBE MICROSCOPE PROBE, METHOD OF MANUFACTURING THE SAME, SCANNING PROBE MICROSCOPE HAVING THE PROBE, AND MOLECULAR PROCESSING METHOD USING THE SAME
JP3557589B2 (en) * 2002-03-27 2004-08-25 株式会社ユニソク Method of manufacturing probe for scanning probe microscope, probe manufactured by the method, and manufacturing apparatus
KR100597280B1 (en) * 2004-07-01 2006-07-06 한국기계연구원 The attaching method of nano materials using Langmuir-Blodgett
KR100736358B1 (en) * 2004-11-12 2007-07-06 재단법인서울대학교산학협력재단 Method to assemble nanostructures at the end of scanning probe microscope's probe and scanning probe microscope with the probe
KR100781036B1 (en) * 2005-12-31 2007-11-29 성균관대학교산학협력단 Apparatus and method for manufacturing carbon nano-tube probe by using metallic vessel as a electrode

Also Published As

Publication number Publication date
KR20100087740A (en) 2010-08-05
WO2009075481A2 (en) 2009-06-18
WO2009075481A3 (en) 2009-08-27

Similar Documents

Publication Publication Date Title
WO2009147602A3 (en) Silicone rubber material for soft lithography
WO2009019147A3 (en) Deposition from ionic liquids
WO2009115192A3 (en) Ni-p layer system and process for its preparation
US20160137507A1 (en) Large-area graphene transfer method
EP1785770A3 (en) Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same
WO2005115630A3 (en) Method and apparatus for depositing material onto a surface
EP2375286A3 (en) Treated substratum with hydrophilic region and water-repellent region and process for producing the same
WO2007117668A3 (en) Methods and articles including nanomaterial
CN107107561B (en) Graphene and polymer-free method for transferring CVD grown graphene to hydrophobic substrates
WO2007084558A3 (en) Method of producing particles by physical vapor deposition in an ionic liquid
TW200741960A (en) Seed layers, cap layers, and thin films and methods of making thereof
EP2087404A1 (en) Composition for resist lower layer film formation and method for pattern formation
WO2009129194A3 (en) Large-area single- and few-layer graphene on arbitrary substrates
BRPI0411807B1 (en) Method for the preparation of a standardized article.
WO2007053326A3 (en) Compositions containing a silanol functional polymer and hydrophilic coating films
JP2010503205A5 (en)
WO2008060582A3 (en) Coated substrates, organometallic films and methods for applying organometallic films to substrates
WO2010141836A3 (en) Silicon pen nanolithography
WO2009035007A1 (en) Vanadium oxide thin film pattern and method of fabricating the same
TW200802544A (en) Composite substrate and method for making the same
WO2008094870A3 (en) Carbon nanotube device and process for manufacturing same
WO2008121186A3 (en) System and method for depositing thin layers on non-planar substrates by stamping
EP2498107A3 (en) Light-polarizing article and process for making same
WO2009077349A9 (en) Process for the preparation of semiconducting layers
WO2008027761A3 (en) Method and apparatus for workpiece surface modification for selective material deposition

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08859395

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 20107012837

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 12747396

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08859395

Country of ref document: EP

Kind code of ref document: A2