WO2009044564A1 - 電子源及び電子ビーム装置 - Google Patents

電子源及び電子ビーム装置 Download PDF

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Publication number
WO2009044564A1
WO2009044564A1 PCT/JP2008/054359 JP2008054359W WO2009044564A1 WO 2009044564 A1 WO2009044564 A1 WO 2009044564A1 JP 2008054359 W JP2008054359 W JP 2008054359W WO 2009044564 A1 WO2009044564 A1 WO 2009044564A1
Authority
WO
WIPO (PCT)
Prior art keywords
electron
electron source
filament
way
beam device
Prior art date
Application number
PCT/JP2008/054359
Other languages
English (en)
French (fr)
Inventor
Ryozo Nonogaki
Yoshinori Terui
Original Assignee
Denki Kagaku Kogyo Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo Kabushiki Kaisha filed Critical Denki Kagaku Kogyo Kabushiki Kaisha
Priority to PCT/JP2008/068077 priority Critical patent/WO2009044871A1/ja
Priority to JP2009536111A priority patent/JP5171836B2/ja
Priority to EP08836265.2A priority patent/EP2197015B1/en
Priority to US12/680,918 priority patent/US8519608B2/en
Publication of WO2009044564A1 publication Critical patent/WO2009044564A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/18—Supports; Vibration-damping arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

Abstract

　電子源を用いる装置が外部より振動を受けても、安定した電子線を与える電子源を提供する。絶縁碍子（５）と、絶縁碍子（５）に間隔を空けて配置された２つの導電端子（４）と、導電端子（４）の間に張られている長尺のフィラメント（３）と、フィラメント（３）に取り付けられ電子放射部を有する陰極（１）とを備える電子源であって、フィラメント（３）の軸方向に対する垂直断面形状が長方向と短方向を有し、長方向の最大長がその短方向の最大長の１．５倍以上５倍以下である電子源。
PCT/JP2008/054359 2007-10-05 2008-03-11 電子源及び電子ビーム装置 WO2009044564A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
PCT/JP2008/068077 WO2009044871A1 (ja) 2007-10-05 2008-10-03 電子源及び電子ビーム装置
JP2009536111A JP5171836B2 (ja) 2007-10-05 2008-10-03 電子源及び電子ビーム装置
EP08836265.2A EP2197015B1 (en) 2007-10-05 2008-10-03 Electron source and electron beam apparatus
US12/680,918 US8519608B2 (en) 2007-10-05 2008-10-03 Electron source and electron beam apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007262046 2007-10-05
JP2007-262046 2007-10-05

Publications (1)

Publication Number Publication Date
WO2009044564A1 true WO2009044564A1 (ja) 2009-04-09

Family

ID=40525996

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/JP2008/054359 WO2009044564A1 (ja) 2007-10-05 2008-03-11 電子源及び電子ビーム装置
PCT/JP2008/068077 WO2009044871A1 (ja) 2007-10-05 2008-10-03 電子源及び電子ビーム装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/068077 WO2009044871A1 (ja) 2007-10-05 2008-10-03 電子源及び電子ビーム装置

Country Status (4)

Country Link
US (1) US8519608B2 (ja)
EP (1) EP2197015B1 (ja)
JP (1) JP5171836B2 (ja)
WO (2) WO2009044564A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013054799A1 (ja) * 2011-10-12 2013-04-18 株式会社日立ハイテクノロジーズ イオン源およびそれを用いたイオンビーム装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8896195B2 (en) * 2010-10-21 2014-11-25 Hermes Microvision, Inc. Filament for electron source
KR20190032592A (ko) * 2016-08-08 2019-03-27 에이에스엠엘 네델란즈 비.브이. 전자 이미터 및 이의 제작 방법
WO2022138558A1 (ja) * 2020-12-25 2022-06-30 デンカ株式会社 電子源及びその製造方法、並びに電子源を備える装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4827623Y1 (ja) * 1969-12-26 1973-08-15
JPS55148339A (en) * 1979-05-09 1980-11-18 Mitsubishi Electric Corp Direct heat type cathode frame body
JP2005222945A (ja) * 2004-02-03 2005-08-18 Denki Kagaku Kogyo Kk 電子源の製造方法と使用方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4827623A (ja) 1971-07-16 1973-04-12
JPS5718655B2 (ja) 1974-11-12 1982-04-17
JPS53128971A (en) * 1977-04-18 1978-11-10 Hitachi Ltd Manufacture of electron radiation cathode
JPS55109343A (en) 1979-02-16 1980-08-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Cathode for electron gun
JPH0619956B2 (ja) 1986-03-19 1994-03-16 日本電気株式会社 線源グリツド
JPH04215231A (ja) 1990-12-10 1992-08-06 Hitachi Ltd 電子管用ヘリカルコイル陰極
JPH0541057A (ja) 1991-08-05 1993-02-19 Tdk Corp 磁気テープカセツトにおけるフロントリツド
JPH0541057U (ja) * 1991-10-31 1993-06-01 川崎製鉄株式会社 電子ビーム照射装置
JP4215231B2 (ja) 2001-05-21 2009-01-28 株式会社リコー 画像読み取り装置及び画像形成装置
JP3832402B2 (ja) * 2002-08-12 2006-10-11 株式会社日立製作所 カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置
JP4210131B2 (ja) 2003-02-03 2009-01-14 電気化学工業株式会社 電子源及び電子源の使用方法
JP2005332677A (ja) 2004-05-19 2005-12-02 Denki Kagaku Kogyo Kk 電子源の製造方法と使用方法
JP4292108B2 (ja) 2004-05-26 2009-07-08 電気化学工業株式会社 電子源及びその製造方法
EP1833784B1 (en) 2004-12-22 2010-10-20 E.I. Dupont De Nemours And Company Process for the synthesis of glycolonitrile
JP4827623B2 (ja) 2006-06-08 2011-11-30 新電元工業株式会社 圧入端子

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4827623Y1 (ja) * 1969-12-26 1973-08-15
JPS55148339A (en) * 1979-05-09 1980-11-18 Mitsubishi Electric Corp Direct heat type cathode frame body
JP2005222945A (ja) * 2004-02-03 2005-08-18 Denki Kagaku Kogyo Kk 電子源の製造方法と使用方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013054799A1 (ja) * 2011-10-12 2013-04-18 株式会社日立ハイテクノロジーズ イオン源およびそれを用いたイオンビーム装置

Also Published As

Publication number Publication date
JP5171836B2 (ja) 2013-03-27
EP2197015A4 (en) 2012-01-04
EP2197015B1 (en) 2014-02-19
US20100237762A1 (en) 2010-09-23
US8519608B2 (en) 2013-08-27
EP2197015A1 (en) 2010-06-16
JPWO2009044871A1 (ja) 2011-02-10
WO2009044871A1 (ja) 2009-04-09

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