WO2009033639A3 - Method for cleaning vacuum chambers for extreme uv lithography devices - Google Patents

Method for cleaning vacuum chambers for extreme uv lithography devices Download PDF

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Publication number
WO2009033639A3
WO2009033639A3 PCT/EP2008/007384 EP2008007384W WO2009033639A3 WO 2009033639 A3 WO2009033639 A3 WO 2009033639A3 EP 2008007384 W EP2008007384 W EP 2008007384W WO 2009033639 A3 WO2009033639 A3 WO 2009033639A3
Authority
WO
WIPO (PCT)
Prior art keywords
extreme
vacuum chambers
cleaning vacuum
lithography devices
irradiation
Prior art date
Application number
PCT/EP2008/007384
Other languages
French (fr)
Other versions
WO2009033639A2 (en
Inventor
Dieter Kraus
Dirk Heinrich Ehm
Original Assignee
Zeiss Carl Smt Ag
Dieter Kraus
Dirk Heinrich Ehm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Dieter Kraus, Dirk Heinrich Ehm filed Critical Zeiss Carl Smt Ag
Publication of WO2009033639A2 publication Critical patent/WO2009033639A2/en
Publication of WO2009033639A3 publication Critical patent/WO2009033639A3/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
    • A61L2/08—Radiation
    • A61L2/10—Ultraviolet radiation
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
    • A61L2/08—Radiation
    • A61L2/087—Particle radiation, e.g. electron-beam, alpha or beta radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2202/00—Aspects relating to methods or apparatus for disinfecting or sterilising materials or objects
    • A61L2202/20—Targets to be treated
    • A61L2202/23—Containers, e.g. vials, bottles, syringes, mail

Landscapes

  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Veterinary Medicine (AREA)
  • General Health & Medical Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

In order to be able to clean and, if appropriate, also passivate a vacuum chamber (30) efficiently from contamination, it comprises a radiation source (31), which can in particular generate high-energy radiation (32). The irradiation is carried out with gradually increasing energy. In order to protect a multilayer mirror (35) against contamination during the irradiation, a protection element (37) is provided, which is mounted in a displaceable manner on a rail (39) and can be displaced out of a basic position (P2) into a protection position (P1) in front of the multilayer mirror (35).
PCT/EP2008/007384 2007-09-14 2008-09-10 Method for cleaning vacuum chambers for extreme uv lithography devices WO2009033639A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007043986.7 2007-09-14
DE102007043986 2007-09-14

Publications (2)

Publication Number Publication Date
WO2009033639A2 WO2009033639A2 (en) 2009-03-19
WO2009033639A3 true WO2009033639A3 (en) 2009-04-30

Family

ID=40149570

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/007384 WO2009033639A2 (en) 2007-09-14 2008-09-10 Method for cleaning vacuum chambers for extreme uv lithography devices

Country Status (2)

Country Link
DE (1) DE102008041628A1 (en)
WO (1) WO2009033639A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012215697A1 (en) * 2012-09-05 2014-03-06 Carl Zeiss Smt Gmbh Blocking element for the protection of optical elements in projection exposure systems
CN111954852A (en) * 2018-04-12 2020-11-17 Asml荷兰有限公司 Apparatus comprising an electrostatic chuck and method for operating the apparatus
CN111061129B (en) * 2018-10-17 2022-11-01 台湾积体电路制造股份有限公司 Lithography system and method for cleaning a lithography system
DE102022121000B4 (en) 2021-08-23 2024-03-07 Carl Zeiss Smt Gmbh Mirror arrangement for an EUV projection exposure system with a protective device for protecting the optical effective surface and EUV projection exposure system

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000003304A1 (en) * 1998-07-08 2000-01-20 Carl Zeiss Method for decontaminating microlithography projection lighting devices
US6252648B1 (en) * 1998-02-04 2001-06-26 Canon Kabushiki Kaisha Exposure apparatus and method of cleaning optical element of the same
US20010043734A1 (en) * 1998-07-16 2001-11-22 Jeffrey A. Brigante Method and apparatus for combined particle location and removal
WO2002054115A2 (en) * 2001-01-03 2002-07-11 Euv Limited Liability Corporation A self-cleaning optic for extreme ultraviolet lithography
WO2003075098A2 (en) * 2002-03-07 2003-09-12 Carl Zeiss Smt Ag Prevention of contamination of optical elements and cleaning said elements
US20040218157A1 (en) * 2002-12-20 2004-11-04 Asml Netherlands B.V. Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
EP1643310A1 (en) * 2004-10-04 2006-04-05 ASML Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
WO2006093781A2 (en) * 2005-02-25 2006-09-08 Cymer, Inc. Systems for protecting internal components of an euv light source from plasma-generated debris

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6252648B1 (en) * 1998-02-04 2001-06-26 Canon Kabushiki Kaisha Exposure apparatus and method of cleaning optical element of the same
WO2000003304A1 (en) * 1998-07-08 2000-01-20 Carl Zeiss Method for decontaminating microlithography projection lighting devices
US20010043734A1 (en) * 1998-07-16 2001-11-22 Jeffrey A. Brigante Method and apparatus for combined particle location and removal
WO2002054115A2 (en) * 2001-01-03 2002-07-11 Euv Limited Liability Corporation A self-cleaning optic for extreme ultraviolet lithography
WO2003075098A2 (en) * 2002-03-07 2003-09-12 Carl Zeiss Smt Ag Prevention of contamination of optical elements and cleaning said elements
US20040218157A1 (en) * 2002-12-20 2004-11-04 Asml Netherlands B.V. Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
EP1643310A1 (en) * 2004-10-04 2006-04-05 ASML Netherlands B.V. Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
WO2006093781A2 (en) * 2005-02-25 2006-09-08 Cymer, Inc. Systems for protecting internal components of an euv light source from plasma-generated debris

Also Published As

Publication number Publication date
WO2009033639A2 (en) 2009-03-19
DE102008041628A1 (en) 2009-03-19

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