WO2009008194A1 - System for removing harm of exhaust gas - Google Patents

System for removing harm of exhaust gas Download PDF

Info

Publication number
WO2009008194A1
WO2009008194A1 PCT/JP2008/055382 JP2008055382W WO2009008194A1 WO 2009008194 A1 WO2009008194 A1 WO 2009008194A1 JP 2008055382 W JP2008055382 W JP 2008055382W WO 2009008194 A1 WO2009008194 A1 WO 2009008194A1
Authority
WO
WIPO (PCT)
Prior art keywords
exhaust gas
piping
removing harm
individual
exhaust
Prior art date
Application number
PCT/JP2008/055382
Other languages
French (fr)
Japanese (ja)
Inventor
Yoshihiko Inoue
Yoshinari Matsushita
Hiroshi Imamura
Original Assignee
Kanken Techno Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanken Techno Co., Ltd. filed Critical Kanken Techno Co., Ltd.
Priority to JP2008526706A priority Critical patent/JP5356813B2/en
Publication of WO2009008194A1 publication Critical patent/WO2009008194A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/68Halogens or halogen compounds
    • B01D53/70Organic halogen compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/346Controlling the process
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23GCREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/063Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating electric heating
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23GCREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/065Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating using gaseous or liquid fuel
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/206Organic halogen compounds
    • B01D2257/2066Fluorine
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/02Other waste gases
    • B01D2258/0216Other waste gases from CVD treatment or semi-conductor manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77Liquid phase processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)

Abstract

A system for removing harm of a large capacity of exhaust gas surely in safety while simplifying management of operation and exhibiting excellent maintainability. The system (10) for removing harm of exhaust gas comprises main piping (12) for collecting exhaust gas (E) discharged from a semiconductor production apparatus, a plurality of units (16) connected with the main piping (12) through individual inlet piping (14) in the inside and removing harm of exhaust gas (E) supplied via the individual inlet piping (14), and an exhaust duct (20) connected with each unit (16) through individual outlet piping (18) to which an exhaust fan (40) is fixed and discharging the exhaust gas (E) processed through each unit (16) while collecting into the atmosphere wherein an inlet pressure sensor (24) for measuring the pressure in each individual inlet piping (14) is fixed and a controller (22) controls the number of revolutions of each exhaust fan (40) such that the pressure measured by each inlet pressure sensor (24) becomes constant.
PCT/JP2008/055382 2007-07-06 2008-03-24 System for removing harm of exhaust gas WO2009008194A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008526706A JP5356813B2 (en) 2007-07-06 2008-03-24 Exhaust gas abatement system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-178224 2007-07-06
JP2007178224 2007-07-06

Publications (1)

Publication Number Publication Date
WO2009008194A1 true WO2009008194A1 (en) 2009-01-15

Family

ID=40228383

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/055382 WO2009008194A1 (en) 2007-07-06 2008-03-24 System for removing harm of exhaust gas

Country Status (2)

Country Link
JP (1) JP5356813B2 (en)
WO (1) WO2009008194A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010207771A (en) * 2009-03-12 2010-09-24 Jx Nippon Oil & Energy Corp Apparatus and method of exhaust gas treatment
TWI741880B (en) * 2019-11-21 2021-10-01 益科斯有限公司 Device for processing gaseous pollutants

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102467035B1 (en) * 2017-11-13 2022-11-14 에스케이하이닉스 주식회사 Control Method for Apparatus for Manufacturing of Semiconductor Device
KR102434335B1 (en) * 2020-11-27 2022-08-18 대구대학교 산학협력단 A collection system to remove pollutants from harmful gases emitted from the process after electronic components using a cyclone and catalysts

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004290901A (en) * 2003-03-28 2004-10-21 Nishimatsu Constr Co Ltd Removal apparatus of nitrogen oxide and removal method of nitrogen oxide
JP2005279320A (en) * 2004-03-26 2005-10-13 Toshiba Corp Exhaust gas treatment system, exhaust gas treatment method and exhaust gas treatment control system
JP2007029790A (en) * 2005-07-22 2007-02-08 Hitachi Ltd Treatment method for perfluoride-containing exhaust gas and treatment apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004290901A (en) * 2003-03-28 2004-10-21 Nishimatsu Constr Co Ltd Removal apparatus of nitrogen oxide and removal method of nitrogen oxide
JP2005279320A (en) * 2004-03-26 2005-10-13 Toshiba Corp Exhaust gas treatment system, exhaust gas treatment method and exhaust gas treatment control system
JP2007029790A (en) * 2005-07-22 2007-02-08 Hitachi Ltd Treatment method for perfluoride-containing exhaust gas and treatment apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010207771A (en) * 2009-03-12 2010-09-24 Jx Nippon Oil & Energy Corp Apparatus and method of exhaust gas treatment
TWI741880B (en) * 2019-11-21 2021-10-01 益科斯有限公司 Device for processing gaseous pollutants

Also Published As

Publication number Publication date
JP5356813B2 (en) 2013-12-04
JPWO2009008194A1 (en) 2010-09-02

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