WO2009000813A1 - Verfahren und vorrichtung zum schleusen eines substrats in eine und aus einer vakuumbeschichtungsanlage - Google Patents
Verfahren und vorrichtung zum schleusen eines substrats in eine und aus einer vakuumbeschichtungsanlage Download PDFInfo
- Publication number
- WO2009000813A1 WO2009000813A1 PCT/EP2008/057969 EP2008057969W WO2009000813A1 WO 2009000813 A1 WO2009000813 A1 WO 2009000813A1 EP 2008057969 W EP2008057969 W EP 2008057969W WO 2009000813 A1 WO2009000813 A1 WO 2009000813A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lock
- chamber
- substrate
- transfer chamber
- vacuum
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 109
- 239000000758 substrate Substances 0.000 title claims abstract description 79
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 38
- 238000009423 ventilation Methods 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000005086 pumping Methods 0.000 claims description 16
- 238000007599 discharging Methods 0.000 claims description 2
- 238000009434 installation Methods 0.000 description 6
- 230000008676 import Effects 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 2
- 238000005273 aeration Methods 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000001994 activation Methods 0.000 description 1
- 239000005328 architectural glass Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000026676 system process Effects 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
Definitions
- the invention relates to a method for locks of a substrate in a process chamber of a vacuum coating system, in which a process area, a lock chamber adjacent mer, the vacuum-tight closable Schleu ⁇ sentore from the surrounding atmosphere by two and is separable from the process area and the process area, at least one process ⁇ chamber and a transfer chamber amending Transportgeschwindig- comprises adjacent to the lock chamber area ness of the substrate by, for locks of a sub ⁇ strats a, Considered in the substrate transport direction, on the input side vacuum-tight gate of a lock system ge ⁇ opens is, wherein an output side, the vacuum-tight Gate of the lock system is closed, the substrate is transported into the lock system and the gate is closed, then the pressure in the lock system is adjusted to the pressure in the following direction in the transport direction and then abschli the lock system EATING ausgangsseiti ⁇ ges gate is opened and the substrate is transported from the lock system.
- the invention also relates to lock systems for Austrac ⁇ tion of Schleusungs vide.
- Lock systems of this type are to be found in various dimensions for vacuum coating systems in industrial use, in particular in such systems that are used for
- Coating of flat substrates such as architectural glass, plastic or metal substrates, substrates for displays, silicon wafers or other, serve in a continuous process.
- So-called three-chamber vacuum deposition equipment comprises in addition to the two sluice chambers for introducing and removing the substrates a process region that comprises at least one Pro ⁇ process chamber, as well as a transport device by means of the substrates through the vacuum system along a Trans ⁇ port path are movable.
- the process area often includes a transfer chamber on the input side. They are followed, viewed in the direction of transport, at least one, übli ⁇ chate several successive process chambers on, depending on réellemineder mecanicganberichtdem layer or layer system. Following this, an output-side trans ⁇ ferhunt is arranged.
- Layer system can also be arranged further process chambers for performing further process steps, such. for tempering or temperature treatment, for cleaning, passivation or activation of a substrate surface or otherwise. Also, the order of successive compartments may change.
- the individual compartments are interconnected by openings through which the substrate is passed from one compartment to the next.
- the lock chambers are vacuum-vacuum separable by means of vacuum-tightly closable installation gates at the entrance to the vacuum coating system and at their exit to the surrounding atmosphere.
- both lock chambers are to be vacuum-tightly separated from the adjacent process area by means of intermediate gates.
- These gates will be described below according to their function as Input or output during a transport process of a substrate through the individual chambers to be referred to as Schleuseneingangs ⁇ and lock exit gates.
- Schleuseneingangs ⁇ and lock exit gates will be described below according to their function as Input or output during a transport process of a substrate through the individual chambers to be referred to as Schleuseneingangs ⁇ and lock exit gates.
- the gate between the entrance lock chamber and the process area is the lock exit gate of the entrance lock
- the gate between the process area and the exit lock is the lock entrance gate of the exit lock.
- Transfer area in which the transport speed of the substrates from discontinuous lock speed is adapted to the continuous process speed.
- transfer areas each have a transport device comprising sections with separate drives, a so-called Passing Band, in order to adapt the transport speed from the feed speed in the front part of the transfer chamber to the process speed during the coating or vice versa.
- the transfer chamber has one-sided or two-sided narrow
- the term "chamber” shall refer to a Filter restricted volume Bezie ⁇ hen, which is defined by a separate housing, or by partition walls which are arranged successively in the transport direction within a larger housing of the vacuum coating installation thereby. Enclosure or partition walls have to transport the substrate through the conditioning the above beschrie on ⁇ surrounded import and export ports.
- a vacuum-tight exhaust circuit of the individual volumes may be associated with the term "chamber", but is not required.
- a transfer Chamber of a vacuum coating system is described for example in DE 10 2005 024 180 Al.
- the substrate transport serving openings of a transfer chamber are designed so that no pressure equalization between the transfer chamber and the adjoining compartment can be adjusted alone on this open passage.
- the substrate passes through the opening in the export subsequent to the transfer chamber de compartment a, which may be a tikungskompartment Pumpkompartment or loading, and will be hereinafter are ⁇ .
- the transfer chamber is open at the intermediate door for importing a substrate at its front end through the Einstockedöff- opening to the vacuum atmosphere of the upstream lock chambers and is open at its rear end through the Ausnaturalö réelle to the subsequent compartment out, which prevails between the prevailing at the entry port Pressure and prevailing at the export opening high vacuum existing pressure gradient within the transfer chamber are maintained on ⁇ ⁇ in order to ermög ⁇ union in the subsequent to the transfer chamber compartments a high vacuum.
- a transfer chamber is also arranged in front of the serving for discharging the substrate load lock chamber.
- the overall length of the vacuum coating system has been reduced by at least one pump compartment.
- the length of a vacuum coating system is fundamentally by the size of the substrates, determined as a substrate or a multiple thereof, must fit into each chamber of the sluice systems as well as in each compartment both. In the case of large-area substrates in particular, this leads to very long and inflexible systems, in which each additional chamber brings about a complex and expensive increase in investment.
- the known vacuum coating systems of flat glass are usually adapted to the common dimensions of the discs in the sizes 6000mm x 3210mm, about 100 "x 126" (2540mm x 3210mm) or 100 "x 144" (2540mm x 3658mm), whereby the coating on Substrates of this size is limited.
- the buffer chamber is interposed in the five-chamber system, inserted by the a further pressure level and the pressure ⁇ difference between input and output of a lock chamber is reduced, so that significantly reduce the pumping times.
- the object of the present invention is to provide a vacuum coating system with an input side or output side or two-sided transfer chamber with low space requirement, which is suitable to flexibly coat such substrates whose length exceeds the length of a lock chamber.
- the description of the invention is mainly based on the example of the input-side smoothering of a substrate by means of the input-side transfer chamber.
- the exit-side smuggling is analogous.
- This additional lock valve which is made vacuum-tight, closes off the lock system in its extended mode to the adjacent process chamber in the same way as in the normal mode, ie in the coating of substrates which are shorter than the length of the lock chamber , is done by a floodgate.
- the term of the sluice valve is intended to be used here only to be ⁇ distinguished discrimination. A difference in construction or function of sluice gate and lock valve is possible, but not implemented by the different terminology alone.
- the vacuum coating system with the described lock system can continue to be operated in the traditional three-chamber mode with normal substrate sizes and with the lock valve always open, in which the transfer area is separated from a process chamber only by an opening.
- the structure of the vacuum coating equipment e.g. As a modular, convertible system, such a lock valve can also be integrated into existing systems.
- the assignment of the transfer chamber to the lock system has an influence on the process area with regard to the cycle times.
- a larger volume is to be evacuated to the locks and ventilated
- the adjacent to the lock system process chambers are coated discontinuously with substrates and made free.
- the extension of the pumping and venting times by the connected, enlarged volume of the lock system can be counteracted, for example, by the pumping power or by a special pumping regime and by the ventilation by appropriately sized ventilation units.
- the pump or aeration regime tunes the power, the vacuum range and depending on the connection of the pumps or valves from each other, if according to an embodiment of the method and the lock system used for both in the spin chamber and in the transfer chamber pumps and at least in the Lock chamber a ventilation unit angeord ⁇ net are used to adjust the pressure in the volume of the lock system.
- these components can also be used for the sluicing and coating of overlong substrates.
- a pressure gradient is set in the connected volume.
- This is entspre ⁇ accordingly to one embodiment of the lock system on import opening when introducing or opening export the outward transfer possible.
- These openings are considered tapers of the cross section of the transfer chamber in the transport direction at least at the end of the transfer chamber, which is adjacent to the lock chamber.
- Such a continuous opening ensures the transport of the substrate through the lock system, but reduces the pressure balance between transfer chamber and lock chamber in such a way that a pressure gradient between the two chambers can be constructed.
- This gradient has the lower pressure to the process chamber and the higher pressure to the plant gate, so that the evacuation accelerates and reduces the cycle times can be.
- such a gradient can be set and maintained in a targeted manner.
- the transfer chamber in addition to the ventilation system of the lock chamber, it is also possible for the transfer chamber to be assigned a ventilation system which is selectively activated or deactivated to accelerate the ventilation or to selectively set a pressure gradient.
- a uniform pressure in the lock and transfer chamber can also be set. This is possible both by a pressure equalization between the two chambers or optionally with an active support of the pumping system (s) or ventilation units.
- the pressure is adjusted in the entire or, if one
- Pressure gradient is to produce, in an area of the Schleu ⁇ sensystems on the pressure, which is set in the chamber, which is traversed by the lock system.
- This chamber can be a coating compartment according to the produced layer system, for example, or a ande ⁇ res, serving the primary or intermediate treatment compartment. If a partial pressure adjustment takes place, then in the region of the lock system adjacent to the following compartment.
- both in terms of pressure and the composition of the residual gas is an adaptation to the subsequent chamber done.
- such gas is introduced into the lock system, which gas is also used in the subsequent chamber as the process gas.
- the invention will be explained in more detail of an exemplary embodiment of a lock system for introduction of a sub ⁇ strats in a vacuum coating installation.
- the Fig. Is a sluice system 1 according to claim 10 for introducing a substrate 15 in a Vakuumbe ⁇ coating plant, whose length exceeds the length of the locks ⁇ chamber 3. Instead of a long substrate, a multiplicity of smaller substrates can likewise be introduced into or out of the vacuum coating system.
- the lock system 1 represents a part this vacuum coating plant and includes chambers and chamber areas, such as those from three-chamber
- Vacuum coating systems are known.
- the discharge and the lock system required for this purpose essentially correspond to the illustrated system, but with a reverse sequence. Consequently, the discharge takes place in reverse order. This is by means of a dashed Neten Drawn ⁇ arrow for the direction of transport 16 'and shows the direction of the emerging from the plant substrate 15th
- the lock system 1 comprises a lock chamber 3, which should be designated as the infeed chamber 3 for the described procedure of introduction.
- the A ⁇ schleushunt 3 is to be separated by a vacuum-tight closable Appendices ⁇ gentor 2 from the surrounding atmosphere.
- the Aniagentor 2 serves as an input of the vacuum coating system.
- Adjoining the infeed chamber 3 is the process area 5, the region of which adjoins the infeed chamber 3 being in the form of a transfer chamber 6, in the described example of the infeed as the first transfer chamber 6.
- Process area 5 and infeed chamber 3 are to be separated from one another by a lock exit gate 4 by vacuum technology.
- the transfer chamber 6 has an insertion opening 7 and an export opening 8.
- Adjoining the transfer chamber 6 is a process chamber 10 which, depending on the layer or layer sequence to be applied alone or as a succession of coating or pump compartments, forms that part of the vacuum coating system in which the treatment and coating of the substrate 15 take place and which via the export opening 8 is connected to the transfer chamber 6.
- the export opening 8 is a, in comparison to known three-chamber systems additional lock valve 11, z. B.
- a flapper valve arranged net, so that the process chamber 10 is vacuum-technically separate from the transfer chamber 6 such that even at atmospheric pressure in the transfer chamber 6, the process vacuum in the process chamber 10 can be maintained.
- other valves or gates can be used, which can realize the ⁇ distinguished function.
- the inward 3 for introduction of a substrate 15 through the Anlagentor 2, which is also the Schleuseneingangstor 2 the inward 3 in a vacuum coating installation advertising the transfer chamber 6 and infeed 3 of the process chamber 10 via the lock valve 11 vacuum-tight ge ⁇ separates.
- the lock exit gate 4 of the infeed chamber 3 is open.
- the lock system 1 is ventilated by means of a first aeration unit 12 of the inward transfer chamber 3, alternatively also be supplemented by a further ventilation unit 13 of the Trans ⁇ ferhunt 6.
- the Anlagentor 2 is opened.
- the substrate 15 can be transported by means of the transport system 17 into the lock system 1. Due to the open throughout the Einschleusvorganges locks ⁇ output port 4, a substrate 15 may be introduced to ⁇ whose length exceeds the length of the inward transfer. 3
- the opening of the installation gate 2 is coupled to the lock valve 11 in such a way that opening of the installation door 2 to the surrounding atmosphere can only take place if the lock valve 11 has been previously closed.
- a forcible opening of the lock exit door 4 during the entire lock process can be realized for the smuggling of overlong substrates in order to reliably avoid damage to the substrate 15.
- Roots pumps comprises, together with rotary vane pumps, to a fine vacuum pressure of about 10 ⁇ lowered 3 mbar.
- the pumps 18 can be connected by means of valves 19 with the Einschleushunt 3 or separate from her.
- pumps 18 and valves 19 further pumping systems 14 are connected, which gradually evacuate the transfer chamber 6 after reaching a form generated by the first pumping system 9, to a final transfer pressure. This is usually close to the process vacuum in the process chamber 10.
- the further pump system 14 in the transfer chamber 6 is typically a multi-stage high-vacuum ⁇ peripheral system with valves 19, comprising, for example, backing pumps and turbomolecular pumps, which in the transfer chamber 6, a high vacuum pressure of ca 10 ⁇ 4 mbar or less.
- a gas inlet 20 is arranged, through which a process gas fed from a source S can be admitted into the area of the transfer chamber 6 in a controllable or controllable manner by means of a valve 19.
- pressures and pumps mentioned here are only an example. Depending on the coating method to be carried out, other pressures in the process chamber and consequently also in the lock system can be set and other pumps can be used. Numerous configurations of single-stage or multi-stage pumping systems are available to the person skilled in the art for the various vacuum areas and the evacuation times to be achieved.
- This Schleusungsrea the substrate takes place after passing through the process area in analogous, reverse order by means of another lock system 1 until reaching atmospheric pressure.
- This lock system 1 is also formed by lock chamber 3, namely the discharge chamber in conjunction with an upstream transfer chamber 6, in that the lock entrance gate 4 between discharge chamber 3 and transfer chamber 6 remains open during the entire lock process and the lock system 1 with a further lock valve 11 of a adjacent process chamber 10 is separable.
- first ventilation unit 13 further ventilation unit
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE112008000006T DE112008000006A5 (de) | 2007-06-22 | 2008-06-23 | Verfahren und Vorrichtung zum Schleusen eines Substrats in eine und aus einer Vakuumbeschichtungsanlage |
US12/665,953 US20100239762A1 (en) | 2007-06-22 | 2008-06-23 | Process and apparatus for the introduction and removal of a substrate into and from a vacuum coating unit |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007029286 | 2007-06-22 | ||
DE102007029286.6 | 2007-06-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009000813A1 true WO2009000813A1 (de) | 2008-12-31 |
Family
ID=39665880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2008/057969 WO2009000813A1 (de) | 2007-06-22 | 2008-06-23 | Verfahren und vorrichtung zum schleusen eines substrats in eine und aus einer vakuumbeschichtungsanlage |
Country Status (3)
Country | Link |
---|---|
US (1) | US20100239762A1 (de) |
DE (1) | DE112008000006A5 (de) |
WO (1) | WO2009000813A1 (de) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100162765A1 (en) * | 2008-12-25 | 2010-07-01 | Hangzhou Bluestar New Materials Technology Co. Ltd. | Atmosphere Regulator and Coating Apparatus for Coating on Float Glass Production Line |
DE102011007619A1 (de) | 2011-04-18 | 2012-10-18 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungsanlage |
WO2014154746A1 (de) * | 2013-03-28 | 2014-10-02 | Von Ardenne Gmbh | Schleusenverfahren und vakuumsubstratbehandlungsanlage |
US10150139B2 (en) | 2015-02-13 | 2018-12-11 | Bühler Alzenau Gmbh | Method for operating an inline coating system and inline coating system |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101509864B1 (ko) * | 2012-11-07 | 2015-04-06 | (주)엘지하우시스 | 비산 파우더 크리닝 장치 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0655515A1 (de) * | 1988-02-08 | 1995-05-31 | Optical Coating Laboratory, Inc. | Magnetronzerstäubungsanlage und -verfahren |
WO2005040452A1 (de) * | 2003-10-15 | 2005-05-06 | Von Ardenne Anlagentechnik Gmbh | Schleusensystem für eine vakuumanlage |
DE102004008598A1 (de) * | 2004-02-21 | 2005-09-15 | Applied Films Gmbh & Co. Kg | Verfahren für den Betrieb einer Inline-Beschichtungsanlage |
DE102005024180A1 (de) * | 2005-05-23 | 2006-11-30 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage und Transferkammer dafür |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3731444A1 (de) * | 1987-09-18 | 1989-03-30 | Leybold Ag | Vorrichtung zum beschichten von substraten |
JP4084293B2 (ja) * | 2002-12-05 | 2008-04-30 | 株式会社アドヴァンスド・ディスプレイ・プロセス・エンジニアリング | Fpd製造装置 |
-
2008
- 2008-06-23 DE DE112008000006T patent/DE112008000006A5/de not_active Ceased
- 2008-06-23 WO PCT/EP2008/057969 patent/WO2009000813A1/de active Application Filing
- 2008-06-23 US US12/665,953 patent/US20100239762A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0655515A1 (de) * | 1988-02-08 | 1995-05-31 | Optical Coating Laboratory, Inc. | Magnetronzerstäubungsanlage und -verfahren |
WO2005040452A1 (de) * | 2003-10-15 | 2005-05-06 | Von Ardenne Anlagentechnik Gmbh | Schleusensystem für eine vakuumanlage |
DE102004008598A1 (de) * | 2004-02-21 | 2005-09-15 | Applied Films Gmbh & Co. Kg | Verfahren für den Betrieb einer Inline-Beschichtungsanlage |
DE102005024180A1 (de) * | 2005-05-23 | 2006-11-30 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage und Transferkammer dafür |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100162765A1 (en) * | 2008-12-25 | 2010-07-01 | Hangzhou Bluestar New Materials Technology Co. Ltd. | Atmosphere Regulator and Coating Apparatus for Coating on Float Glass Production Line |
DE102011007619A1 (de) | 2011-04-18 | 2012-10-18 | Von Ardenne Anlagentechnik Gmbh | Substratbehandlungsanlage |
WO2014154746A1 (de) * | 2013-03-28 | 2014-10-02 | Von Ardenne Gmbh | Schleusenverfahren und vakuumsubstratbehandlungsanlage |
US10150139B2 (en) | 2015-02-13 | 2018-12-11 | Bühler Alzenau Gmbh | Method for operating an inline coating system and inline coating system |
Also Published As
Publication number | Publication date |
---|---|
DE112008000006A5 (de) | 2009-05-14 |
US20100239762A1 (en) | 2010-09-23 |
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