WO2008152716A1 - Method of washing object and object washing system - Google Patents

Method of washing object and object washing system Download PDF

Info

Publication number
WO2008152716A1
WO2008152716A1 PCT/JP2007/061969 JP2007061969W WO2008152716A1 WO 2008152716 A1 WO2008152716 A1 WO 2008152716A1 JP 2007061969 W JP2007061969 W JP 2007061969W WO 2008152716 A1 WO2008152716 A1 WO 2008152716A1
Authority
WO
WIPO (PCT)
Prior art keywords
washing
droplets
mixed
phase fluid
collision
Prior art date
Application number
PCT/JP2007/061969
Other languages
French (fr)
Japanese (ja)
Inventor
Masao Yamase
Yoshihisa Morita
Masao Watanabe
Toshiyuki Sanada
Minori Shirota
Original Assignee
Aqua Science Corporation
Kyushu University, National University Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aqua Science Corporation, Kyushu University, National University Corporation filed Critical Aqua Science Corporation
Priority to PCT/JP2007/061969 priority Critical patent/WO2008152716A1/en
Priority to PCT/JP2008/060793 priority patent/WO2008153107A1/en
Priority to JP2008551374A priority patent/JPWO2008153107A1/en
Publication of WO2008152716A1 publication Critical patent/WO2008152716A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

A method of washing an object by exposing the same to a mixed-phase fluid containing a gas and droplets, characterized in that a desired impact strength is produced by regulating of the degree of cavitation at droplet collision which can be generated upon collision of the droplets of the mixed-phase fluid with the object.
PCT/JP2007/061969 2007-06-14 2007-06-14 Method of washing object and object washing system WO2008152716A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
PCT/JP2007/061969 WO2008152716A1 (en) 2007-06-14 2007-06-14 Method of washing object and object washing system
PCT/JP2008/060793 WO2008153107A1 (en) 2007-06-14 2008-06-12 Method of cleaning object and object cleaning system
JP2008551374A JPWO2008153107A1 (en) 2007-06-14 2008-06-12 Object cleaning method and object cleaning system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/061969 WO2008152716A1 (en) 2007-06-14 2007-06-14 Method of washing object and object washing system

Publications (1)

Publication Number Publication Date
WO2008152716A1 true WO2008152716A1 (en) 2008-12-18

Family

ID=40129333

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/JP2007/061969 WO2008152716A1 (en) 2007-06-14 2007-06-14 Method of washing object and object washing system
PCT/JP2008/060793 WO2008153107A1 (en) 2007-06-14 2008-06-12 Method of cleaning object and object cleaning system

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060793 WO2008153107A1 (en) 2007-06-14 2008-06-12 Method of cleaning object and object cleaning system

Country Status (2)

Country Link
JP (1) JPWO2008153107A1 (en)
WO (2) WO2008152716A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI772294B (en) 2016-05-09 2022-08-01 日商荏原製作所股份有限公司 Substrate cleaning device
JP6612176B2 (en) * 2016-05-09 2019-11-27 株式会社荏原製作所 Substrate cleaning device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197597A (en) * 2001-12-26 2003-07-11 Dainippon Screen Mfg Co Ltd Substrate processing device and substrate processing method
JP2003332288A (en) * 2002-05-10 2003-11-21 Lam Research Kk Water feeding method and water feeding apparatus
JP2004202316A (en) * 2002-12-24 2004-07-22 Mitsubishi Chemicals Corp Two-fluid nozzle for cleaning and cleaning method
JP2006187752A (en) * 2005-01-06 2006-07-20 Hitachi Industrial Equipment Systems Co Ltd Special two-fluid washing nozzle

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2654874B2 (en) * 1991-06-19 1997-09-17 日立造船株式会社 Substrate cleaning method
JP2005191261A (en) * 2003-12-25 2005-07-14 Aqua Science Kk Apparatus and method for object processing
JP2005216908A (en) * 2004-01-27 2005-08-11 Aqua Science Kk Apparatus and method of treating object
JP2006223995A (en) * 2005-02-17 2006-08-31 Sony Corp Washing method and washing device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197597A (en) * 2001-12-26 2003-07-11 Dainippon Screen Mfg Co Ltd Substrate processing device and substrate processing method
JP2003332288A (en) * 2002-05-10 2003-11-21 Lam Research Kk Water feeding method and water feeding apparatus
JP2004202316A (en) * 2002-12-24 2004-07-22 Mitsubishi Chemicals Corp Two-fluid nozzle for cleaning and cleaning method
JP2006187752A (en) * 2005-01-06 2006-07-20 Hitachi Industrial Equipment Systems Co Ltd Special two-fluid washing nozzle

Also Published As

Publication number Publication date
JPWO2008153107A1 (en) 2010-08-26
WO2008153107A1 (en) 2008-12-18

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