WO2008118865A3 - Optimized laser pyrolysis reactor and methods therefor - Google Patents

Optimized laser pyrolysis reactor and methods therefor Download PDF

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Publication number
WO2008118865A3
WO2008118865A3 PCT/US2008/058036 US2008058036W WO2008118865A3 WO 2008118865 A3 WO2008118865 A3 WO 2008118865A3 US 2008058036 W US2008058036 W US 2008058036W WO 2008118865 A3 WO2008118865 A3 WO 2008118865A3
Authority
WO
WIPO (PCT)
Prior art keywords
tubing assembly
precursor tubing
bottom plate
nozzle
primary
Prior art date
Application number
PCT/US2008/058036
Other languages
French (fr)
Other versions
WO2008118865A2 (en
Inventor
Xuegeng Li
David Jurbergs
Original Assignee
Innovalight, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/967,568 external-priority patent/US20080191193A1/en
Application filed by Innovalight, Inc. filed Critical Innovalight, Inc.
Publication of WO2008118865A2 publication Critical patent/WO2008118865A2/en
Publication of WO2008118865A3 publication Critical patent/WO2008118865A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/121—Coherent waves, e.g. laser beams
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0869—Feeding or evacuating the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0881—Two or more materials
    • B01J2219/0883—Gas-gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0881—Two or more materials
    • B01J2219/0884—Gas-liquid

Abstract

An apparatus for making a set of Group IV nanoparticles is disclosed. The apparatus includes a top plate, the top plate further including an outlet port; a bottom plate; and a casing extending between the top plate and the bottom plate. The apparatus also includes a particle collector assembly configured to be in fluid communication with the outlet port; and a primary precursor tubing assembly passing through the bottom plate into the casing, the primary precursor tubing assembly including a primary precursor tubing assembly nozzle. The apparatus further includes a set of secondary precursor tubing assemblies passing through the bottom plate into the casing, wherein each secondary precursor tubing assembly of the set of secondary precursor tubing assemblies further includes a set of secondary precursor tubing assembly nozzles positioned orthogonally to the primary precursor tubing assembly nozzle, the set of secondary precursor tubing assembly nozzles further configured to be adjusted to a first height above primary precursor tubing assembly nozzle. The apparatus also includes a laser configured to generate a laser beam, the laser beam being substantially perpendicular to the primary precursor tubing assembly nozzle in the reaction zone, wherein the laser may be adjusted to a second height above primary precursor tubing assembly nozzle.
PCT/US2008/058036 2007-03-27 2008-03-24 Optimized laser pyrolysis reactor and methods therefor WO2008118865A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US92047107P 2007-03-27 2007-03-27
US60/920,471 2007-03-27
US11/967,568 2007-12-31
US11/967,568 US20080191193A1 (en) 2007-01-22 2007-12-31 In situ modification of group iv nanoparticles using gas phase nanoparticle reactors

Publications (2)

Publication Number Publication Date
WO2008118865A2 WO2008118865A2 (en) 2008-10-02
WO2008118865A3 true WO2008118865A3 (en) 2011-02-17

Family

ID=39636869

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2008/058036 WO2008118865A2 (en) 2007-03-27 2008-03-24 Optimized laser pyrolysis reactor and methods therefor

Country Status (1)

Country Link
WO (1) WO2008118865A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9175174B2 (en) 2000-10-17 2015-11-03 Nanogram Corporation Dispersions of submicron doped silicon particles

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7226966B2 (en) 2001-08-03 2007-06-05 Nanogram Corporation Structures incorporating polymer-inorganic particle blends
US6599631B2 (en) 2001-01-26 2003-07-29 Nanogram Corporation Polymer-inorganic particle composites
US20090075083A1 (en) 1997-07-21 2009-03-19 Nanogram Corporation Nanoparticle production and corresponding structures
WO2008085806A1 (en) 2007-01-03 2008-07-17 Nanogram Corporation Nanoparticle inks based on silicon/germanium, doped particles, printing and processes for semiconductor applications
US8895962B2 (en) 2010-06-29 2014-11-25 Nanogram Corporation Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods
WO2014189886A1 (en) 2013-05-24 2014-11-27 Nanogram Corporation Printable inks with silicon/germanium based nanoparticles with high viscosity alcohol solvents
KR102176234B1 (en) 2017-09-07 2020-11-09 주식회사 엘지화학 Reactor for manufacturing nano particle

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4776937A (en) * 1984-05-14 1988-10-11 Allied Corporation Light induced production of ultrafine powders comprising metal silicide powder
WO2001007155A1 (en) * 1999-07-21 2001-02-01 Nanogram Corporation Particle production apparatus
US20030034486A1 (en) * 2001-07-02 2003-02-20 Korgel Brian A. Applications of light-emitting nanoparticles
US6761870B1 (en) * 1998-11-03 2004-07-13 William Marsh Rice University Gas-phase nucleation and growth of single-wall carbon nanotubes from high pressure CO
US20040229447A1 (en) * 2003-03-12 2004-11-18 Swihart Mark T. Process for producing luminescent silicon nanoparticles
WO2006009881A2 (en) * 2004-06-18 2006-01-26 Innovalight, Inc. Process and apparatus for forming nanoparticles using radiofrequency plasmas
US20060188707A1 (en) * 2005-02-24 2006-08-24 Samsung Electronics Co., Ltd. Nanoparticle electroluminescence and method of manufacturing the same

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4776937A (en) * 1984-05-14 1988-10-11 Allied Corporation Light induced production of ultrafine powders comprising metal silicide powder
US6761870B1 (en) * 1998-11-03 2004-07-13 William Marsh Rice University Gas-phase nucleation and growth of single-wall carbon nanotubes from high pressure CO
WO2001007155A1 (en) * 1999-07-21 2001-02-01 Nanogram Corporation Particle production apparatus
US20030034486A1 (en) * 2001-07-02 2003-02-20 Korgel Brian A. Applications of light-emitting nanoparticles
US20040229447A1 (en) * 2003-03-12 2004-11-18 Swihart Mark T. Process for producing luminescent silicon nanoparticles
WO2006009881A2 (en) * 2004-06-18 2006-01-26 Innovalight, Inc. Process and apparatus for forming nanoparticles using radiofrequency plasmas
US20060188707A1 (en) * 2005-02-24 2006-08-24 Samsung Electronics Co., Ltd. Nanoparticle electroluminescence and method of manufacturing the same

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JI J ET AL: "SURFACE MODIFICATION OF ERBIUM-DOPED SILICON NANOCRYSTALS", CHEMISTRY OF MATERIALS, AMERICAN CHEMICAL SOCIETY, WASHINGTON, US, vol. 13, no. 12, 1 December 2001 (2001-12-01), pages 4783 - 4786, XP001076945, ISSN: 0897-4756, DOI: DOI:10.1021/CM010644L *
LIAO Y-C ET AL: "Organic monolayer deposition on aerosolized silicon nanoparticles", COMPENDEX,, 1 January 2005 (2005-01-01), XP002537022 *
LIAO Y-C: "Functionalization and transport of nanoparticles", COMPENDEX,, 1 January 2005 (2005-01-01), XP002537021 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9175174B2 (en) 2000-10-17 2015-11-03 Nanogram Corporation Dispersions of submicron doped silicon particles

Also Published As

Publication number Publication date
WO2008118865A2 (en) 2008-10-02

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